Stepped structure optical filter

Abstract

To enable provision of a filter ensuring that each wavelength of light of a plurality of wavelengths of the light is directed toward a different sensor when detecting the plurality of wavelengths of light.SOLUTION: A multispectral filter 100 may include a substrate 110. The multispectral filter may include a stepped medium 120 disposed on the substrate. The multispectral filter may include a first mirror 130-1 disposed on the stepped medium. The first mirror may form a stepped mirror surface. Each step of the stepped mirror surface may correspond to a channel of the filter. The filter may include a spacer 140 disposed on the stepped mirror surface. The filter may include a second mirror 130-2 disposed on a different surface of the spacer.SELECTED DRAWING: Figure 1

Description

[Background technology]

[0001] The optical transmitter may emit light toward a target object. For example, in a gesture recognition system, the optical transmitter may The transmitter may transmit near infrared light toward the user, and the near infrared light may be directed from the user to the optical receiver. In this case, the optical receiver may obtain information regarding the near infrared light, That information can be used to identify the gesture being performed by the user. In another example, information about visible light, such as information about different wavelengths of visible light, may be obtained. Thus, an image of the object can be captured.

[0002] However, light of the wavelength of interest may be received while propagating to and / or from the object. During reflection towards the receiver, ambient light may be introduced along with the wavelength of interest. When an optical receiver receives near infrared light reflected from an object (such as a light bulb or the sun), The optical receiver can also receive visible light (from another source). Therefore, the optical receiver filters out the ambient light. band to allow one or more wavelengths of light to pass through to the optical receiver. Additionally or alternatively, the optical filter may be optically coupled to an optical filter such as a double-pass filter. When detecting multiple wavelengths of light, each wavelength of light is directed toward a different sensor. To ensure that the signal is received, a filter may be provided.

[0003] The multispectral sensor device may be an optical receiver that receives information about multiple wavelengths of light. The multispectral sensor device can be used to obtain information and A set of sensor elements (e.g., optical sensors, spectral For example, an array of sensor elements may include a sensor array (e.g., a sensor array having a plurality of sensors ... and / or an image sensor). A multispectral filter may be used to obtain information related to multiple frequencies. The sensor may direct light corresponding to a different frequency to each sensor element. A single binary multispectral filter is used to cover each sensor element of the array. The sensor elements may be arranged in a plurality of rows and columns, and may form a channel set for the array of sensor elements. Summary of the Invention

[0004] According to some possible embodiments, the filter may include a substrate. The filter may include a stepped media disposed on a plate. The filter may be disposed on the stepped media. The first mirror may include a stepped mirror surface. Each step on the stepped mirror surface corresponds to a channel or set of channels in the filter. The filter may include a spacer disposed on the stepped mirror surface. The spacer may include a second mirror disposed on another surface of the spacer.

[0005] According to some possible embodiments, the system includes a plurality of cells associated with a plurality of channels. The system may include a sensor element array having a variable spacer filter. The variable spacer filter may include a first substrate. The variable spacer filter may include a stepped medium disposed on a first substrate. The first mirror may include a first mirror disposed on the stepped medium. Each step of the stepped mirror surface may form a step surface. The variable spacer filter may correspond to a set of first mirrors. The cavity may include a second mirror that is alignable with the first mirror. The second mirror may be separated from the first mirror by a distance of 0.01 mm. The first mirror may be translatable relative to the first mirror so as to be variable.

[0006] According to some possible embodiments, the multi-channel filter is configured to form a staircase structure. The multi-channel filter may be disposed on the stepped structure, and the stepped structure may include a medium for passing the multi-channel filter. The first mirror may include a stepped mirror structure. Each step of the stepped mirror structure may include a mirror. The wavelength channels of the multi-channel filter may be formed by a first The first surface of the spacer may be disposed on the first mirror. a second surface of the spacer disposed relative to the first mirror to form a stepped surface; The multichannel filter is located on the second side of the spacer, forming a flat surface. A second mirror is placed on the surface to form a flat mirror for the multichannel filter. It may include. [Brief description of the drawings]

[0007] [Figure 1] FIG. 2 is a diagram of an exemplary embodiment of a multi-spectral filter as described herein. [Diagram 2] 1 is a diagram of an example embodiment of response balancing of filter channels of a multi-spectral filter described herein. [Figure 3A] FIG. 2 is a diagram of an exemplary embodiment of a multi-spectral filter as described herein. [Figure 3B] FIG. 2 is a diagram of an exemplary embodiment of a multi-spectral filter as described herein. [Figure 3C] FIG. 2 is a diagram of an exemplary embodiment of a multi-spectral filter as described herein. [Figure 3D] FIG. 2 is a diagram of an exemplary embodiment of a multi-spectral filter as described herein. [Figure 4] 1 is a diagram of an exemplary process for manufacturing a multispectral filter as described herein. [Figure 5A] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 5B] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 5C] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 5D] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 5E] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 5F] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 5G] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 5H] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 5I] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 5J] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 5K] FIG. 5 is a diagram of an example embodiment of a multi-spectral filter associated with the example process in FIG. 4. [Figure 6]FIG. 1 illustrates an example embodiment of a sensor system including a multi-spectral filter as described herein. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0008] The following detailed description of the embodiments refers to the accompanying drawings. Reference numbers may identify the same or similar elements.

[0009] The sensor element (e.g., an optical sensor) receives information about a set of electromagnetic frequencies (e.g., For example, the optical sensor device may be incorporated to acquire the following: The optical sensor device may be an image sensor, a multispectral sensor, and / or Other light sensor measurements may also be performed. The optical sensor device is based on complementary metal oxide semiconductor (CMOS) technology, charge coupled device (CCD ) technology and / or one or more other sensor technologies. The device includes multiple sensors, each configured to capture information about different frequencies of light. The sensor element may include a sensor element (e.g., an array of sensor elements).

[0010] The sensor element may be associated with a filter that filters light to the sensor element. For example, the sensor element is a linear variable filter (LVF), a circular barrier CVF, Fabry-Perot filters and / or other alignment The Fabry-Perot method may further comprise the step of filtering a portion of the light directed to the sensor element. In the case of a binary filter structure such as a quartz filter, the reflector (for example A spacer may be placed between the reflector layer, the spacer layer and / or the mirror. In other cases, the refractive index, thickness and / or other configurations may result in a binary filter structure. It may be possible to configure the structure to configure a set of channels. It may be part of a filter that directs long range light onto the sensor elements of the sensor element array. In this way, the array of sensor elements may obtain information about multiple different wavelengths of light.

[0011] However, depending on the selected refractive index, spacer thickness and / or other factors, at least A fixed set of channels configured based in part on the fact that the sensor element array is Therefore, multi-channel filters and A binary multispectral filter, also called a binary multispectral filter, is configured to capture light at wavelengths of interest. To ensure that the binary multispectral filter is may be designed with more than 100 channels and sensor elements, and accordingly, the sensor elements The array may include an amount of sensor elements that exceeds a threshold. This allows for binary multiscanning. To allow flexibility in using spectral filters, size and / or cost may become excessive.

[0012] In addition, some binary multispectral filters use different spacer thicknesses. These binary multispectral frames are then used to form different channels at different wavelength ranges. The filter consists of multiple layers of spacer material on top of a first flat mirror that is placed directly on the substrate. By disposing the spacer material over a plurality of layers, different spacer thicknesses can be formed. The layers are arranged to form a spacer with a stepped structure, and the second mirror is attached to the stepped structure of the spacer. However, placing multiple layers of spacer material creates imperfections This may result in degradation of the optical performance of the binary multispectral filter. For example, if hydrogenated silicon is used as the spacer material, the surface of each layer of hydrogenated silicon The surface may be partially oxidized to silicon dioxide between the layers to reduce transmission and angle shift. This may cause an increase, and / or other.

[0013] Some embodiments described herein include a multi-spaced casing with improved spacers. For example, a binary multispectral filter may include: A stepped medium may be disposed between the substrate and the first mirror, the first mirror having a stepped a stepped surface; a monolithic spacer disposed on the stepped surface of the mirror; and and a second mirror disposed on the planar surface of the spacer. Forming the spacer in a single step, rather than building up a stepped structure by stacking layers Based on this, defects such as surface oxidation may be avoided, which may improve optical performance. For example, monolithic spacers can provide improved transmission, reduced angular shift, and / or Others may be possible.

[0014] Additionally, some embodiments described herein may be implemented such that the second mirror is directly on the spacer. The second mirror is arranged adjacent to the first mirror and moves relative to the first mirror, rather than being located in a fixed position. For example, the second mirror may be translatable relative to the first mirror. (i.e., either the first mirror or the second mirror, or Both the mirror and the second mirror may be moved, thereby eliminating the gap formed by the spacers. A gap can be provided between the first and second mirrors, and the second mirror can be As the laser moves, its thickness changes. In this way, the wavelength range of a series of channels can be varied. This allows the signal that can be acquired by a sensor element aligned with a series of channels to be reconfigured dynamically. In this way, it is possible to increase the amount of spectral bandwidth. The amount of multispectral filter channels to cover is determined by the fixed gap between the mirrors. compared to a fixed multispectral filter, thereby reducing size, cost Reductions in and / or other factors are achieved.

[0015] FIG. 1 is an exemplary embodiment of a multispectral filter 100 as described herein. As shown in FIG. 1, a multispectral filter 100 (e.g., a binary The optical filter array of this structure includes a substrate 110, a medium 120, a first mirror 130-1, a second mirror 130-2, and a third mirror 130-3. The optical axis may include a second mirror 130-1, a second mirror 130-2, and a spacer 140.

[0016] In some embodiments, the substrate 110 may be associated with an optical sensor device. For example, the substrate 110 may be a substrate for a sensor element for acquiring information (e.g., spectral data). Additionally or alternatively, the substrate 110 does not include a sensor element. The multi-spectral filter 100 is aligned to a sensor element disposed on a separate substrate. Additionally or alternatively, the multi-spectral filter 100 may be formed on a substrate 1. For example, the multi-spectral filter 100 may be designed without the on a substrate of an optical sensor device that is not part of the multispectral filter 100; and / or may be placed in other.

[0017] In some embodiments, the multi-spectral filter 100 is configured to filter a particular spectral range. For example, the multi-spectral filter 100 may be configured to Infrared (NIR) spectral range, mid-infrared (MIR) spectral range and / or It may also be associated with multiple other channels, in which case the multispectral filter 100 is approximately 300 nanometers (nm) to 2500 nm, 360 nanometers (nm ) to 2500 nm, about 600 nm to about 2000 nm, about 350 nm to about 750 nm , 380nm to about 780nm, about 750nm to about 1500nm, 750nm to about 1 100 nm, 900 nm to about 2500 nm, about 900 nm to about 1700 nm, about 90 0 nm to approximately 1500 nm, and / or other spectral ranges. In some embodiments, the multi-spectral filter 100 may include eight or more channels. 16 or more channels, 32 or more channels, 64 or more channels, 128 or more channels, 256 It is possible to include more than one and / or other threshold amounts of channels.

[0018] As further shown in FIG. 1, the medium 120 is For example, the present invention may be associated with a stepped structure that may form a set of channels. As will be described in detail later, photolithography procedures are used to form the staircase structure. In some embodiments, medium 120 may be formed by 20 is stepped along a single axis (i.e. stepped in one dimension) For example, the medium 120 may be a matrix of eight different channels extending along a single axis. In some embodiments, the medium 120 may be stepped to form a set. , if stepped along multiple axes (i.e. stepped in two dimensions) For example, the medium 120 may be stepped orthogonally along a single axis, resulting in a total of 64 different In some embodiments, the medium 120 may include one or more repeating For example, as shown, the channel formed by the medium 120 may include a The multispectral filter 7 may be disposed at the end of the multispectral filter 100. In some embodiments, the medium 120 may provide structural stability to the filter 100. One or more channels may be inactive. For example, one or more of the medium 120 forming channel 7 may be inactive. The portions of the first mirror 130-1 and the second mirror 130-2 aligned with the pillars are Sometimes, a portion of the pacer 140 is not clamped. This causes channel 7 to become inactive. may be removed (but remain for structural support). A part of the spacer 140 is sandwiched between the first mirror 130-1 and the second mirror 130-2. So channel 7 may be the active channel.

[0019] In some embodiments, the medium 120 may be formed using a particular material. For example, The medium 120 is a wavelength range over which the multispectral filter 100 acquires spectral data. In this case, the material may be a tantalum-based medium material, a niobium-based medium material, or a tantalum-based medium material. Silicon dioxide-based media materials, oxide-based media materials, III-V semiconductor-based media Materials, Gallium phosphide-based media materials, Germanium-based media materials, Germanium silicon-based media Body materials, dielectric media materials, polymer media materials, nitride media materials, phosphide media materials The materials may include, for example, ceramic, carbide-based media materials, combinations thereof and / or others.

[0020] As further shown in FIG. 1, the first mirror 130-1 and the second mirror 130-2 are In other words, the spacer 140 may sandwich the first mirror 130- The first and second mirrors 130-2 may be separated by a set distance and / or spaced apart. The surface of the mirror 140 is surrounded by a first mirror 130-1 and a second mirror 130-2. In this case, a set of distances may form different channels. For example, the channels 0 aligned first mirror 130-1 and first portion of second mirror 130-2 may be separated by a first distance and define a first channel passing a first wavelength band of light. Similarly, a first mirror 130-1 aligned with channel 1 and The second portion of the second mirror 130-2 is spaced a second distance apart as described. As a result, the medium 120 has a stepped structure, and the spacer 140 has a stepped structure. and a second filter that passes a second band of wavelengths of light, as described in more detail herein. A channel may be formed, where the first channel is aligned with the first sensor element. a first component flow for obtaining spectral data relating to a first spectral range; A filter may be formed, the second channel being aligned with the second sensor element and the second scan Form a second component filter that obtains spectral data for the spectral range. This is also fine.

[0021] In some embodiments, the mirror 130 may be associated with a particular material. The mirror 130 is made up of a set of metal mirror layers (e.g., silver), a set of dielectric mirror layers (e.g., copper), and a set of dielectric mirror layers (e.g., copper). Alternating silicon hydride layers and silicon dioxide layers) and / or multiple sources of light. The spectral filter 100 directs a portion of the light toward the associated sensor element. In some embodiments, the mirror 130 mirrors each channel of the multi-spectral filter 100. may be aligned with each sensor element of the sensor element array associated with

[0022] In some embodiments, the spacer 140 may be, as described in more detail herein, For example, the spacer 140 may be a first mirror. The first surface of the spacer 140 at the interface with the laser 130-1 is a stepped surface, and the second surface of the spacer 140 is a stepped surface. The second surface of the spacer 140 at the interface with the second mirror 130-2 is a flat surface. The stepped surface of the first mirror 130-1 may be formed by depositing a material on the stepped surface of the first mirror 130-1, as shown in FIG. In some embodiments, the spacer 140 is configured to accommodate the multi-spectral filter 100. A certain wavelength range, transmittance (e.g., greater than 50%, greater than 70%, greater than 90%, greater than 95%, greater than 99%, 99.9%, 99.99%, etc.), and / or other characteristics. For example, the spacer 140 may be made of a hydrogenated silicon based spacer. S, oxide-based spacer, germanium-based spacer, silicon-germanium-based spacers, polymer-based spacers, combinations thereof, and / or others. In some embodiments, the spacer 140 may have a refractive index greater than 1.5, Refractive index greater than 1.7, Refractive index greater than 2.5, Refractive index greater than 3.0, Refractive index less than 3.5 The refractive index may be greater than or equal to 100 and / or other refractive indices.

[0023] In some embodiments, the spacer 140 may include a non-solid spacer material. For example, the spacer 140 is formed by adjusting the size of the spacer 140 (i.e., the first mirror 130-1 and the second mirror 130-2) may be expanded or reduced as described in more detail herein. To allow the material to shrink, a gaseous material (e.g., air or another gaseous material) or In some embodiments, the spacer 140 may be formed from a liquid material. For example, the spacer 140 may include a material that forms a first portion of the spacer 140. A solid spacer covering the first mirror 130-1 and a second part of the spacer 140 are formed. The second mirror 130-2 can be translated relative to the first mirror 130-1. Similarly, the spacer 140 may include a liquid spacer that supports the first mirror 130-1. a first solid spacer covering the second mirror 130-1; a second solid spacer covering the second mirror 130-2; and To allow the mirror 130-2 to be translated relative to the first mirror 130-1 may include a third liquid spacer disposed between the first solid spacer and the second solid spacer. In this way, the spacer 140 has a multi-spec Different portions of the filter 100 pass different wavelength bands of light to form different channels. Furthermore, it allows the formation of a thin film without multiple layers of material or below a threshold of layers of material. In accordance with the amount of the spacer 140 formed, the spacer 140 is formed so as to have a surface oxidation threshold within the spacer 140. The amount of the defect may be less than a threshold value, such as an amount less than a threshold value, thereby Improves the optical performance of the Ruta 100.

[0024] In some embodiments, for example, the medium 120, the first mirror 130-1, the second mirror The layers forming the junction 130-2, the spacer 140 and / or the like may be layers of high refractive index material. For example, a silicon layer, a hydrogenated silicon layer, a silicon germanium layer, silicon germanium (SiGe) layer, hydrogenated germanium layer, hydrogenated silicon germanium layer and / or or other layers. In some embodiments, for example, the medium 120, the first 130-1, the second mirror 130-2, the spacer 140, and / or the like. The layers may include a set of low refractive index materials (L layers). For example, silicon dioxide layers, silicon nitride layers, TiO2 layer, tantalum pentoxide (Ta2O5) layer, niobium pentoxide (Nb2O5) layer, titanium dioxide layer TiO2 layer, aluminum oxide (Al2O3) layer, zirconium oxide (ZrO2) layers, yttrium oxide (Y2O3) layers, silicon nitride (Si3N4) layers, and combinations thereof. Some layers may be made of certain materials such as silicon germanium. Although some layers may be described as materials, they contain (small amounts of) phosphors, boron, nitrides and and / or others.

[0025] In some embodiments, for example, the medium 120, the first mirror 130-1, the second mirror The layers forming the spacer 140 and / or the like may range from 2 to 200 layers. The refractive index of the layer is determined by the amount of the material, such as alternating high and low refractive index layers in the range of layers. In some embodiments, one or more layers may be formed by sputtering procedures, photolithography, Roughing procedure, etching procedure, lift-off procedure, scraping procedure, annealing procedure , by molding procedures, casting procedures, machining procedures, stamping procedures and / or the like. may be manufactured.

[0026] In some embodiments, for example, the medium 120, the first mirror 130-1, the second mirror Each layer forming the spacer 130-2, spacer 140 and / or the like may have a particular thickness. For example, each layer may be between about 1 nm and about 1500 nm, about 10 nm to about 100 to about 500 nm, and / or other thicknesses. Alternatively, the multi-spectral filter 100 may have a wavelength range of about 0.1 μm to about 100 μm. , about 0.25 μm to about 100 μm, and / or other thicknesses. stomach.

[0027] In this manner, the multi-spectral filter 100 is formed by removing the defects formed in the spacer 140. Multiple channels to obtain spectral data for multiple wavelength ranges with reduced amount of defects 3, thereby improving the optical performance of the multi-spectral filter 100.

[0028] As noted above, FIG. 1 is provided as an example only. Other examples are possible and are not limited to those shown in FIG. The actual operating conditions may vary from those described in this document.

[0029] FIG. 2 is an exemplary embodiment of a multispectral filter 200 as described herein. As shown in FIG. 2, the multi-spectral filter 200 includes a first substrate 110- 1, second substrate 110-2, medium 120, first mirror 130-1, second mirror 130- 2, and a spacer 140.

[0030] In some embodiments, the second substrate 110-2 is stacked on the second mirror 130-2. For example, the second mirror 130-2 may be disposed on a spacer 140. , the second substrate 110-2 may be disposed on the second mirror 130-2. Alternatively, the second mirror 130-2 may be disposed on the second substrate 110-2. For example, the medium 120 may be disposed on a first substrate 110-1, and the first mirror 130-1 may be disposed on the first substrate 110-2. 20, a spacer 140 may be disposed on the first mirror 130-1, and a spacer 140 may be disposed on the second mirror The second mirror 130-2 may be disposed on the second substrate 110-2, and the second mirror 130-2 and The first mirror 130-1 and the second substrate 110-2 are aligned with the first mirror 130-1 and the first substrate 110-1. may be combined.

[0031] As noted above, FIG. 2 is provided as an example only. Other examples are possible and are not intended to be limiting. The actual product may differ from that described above.

[0032] 3A-3D are exemplary diagrams of a multi-spectral filter 300 as described herein. As shown in FIG. 3A, the multi-spectral filter 300 includes a first A substrate 110-1, a second substrate 110-2, a medium 120, a first mirror 130-1, a second mirror As further shown in FIG. 3A, the matrix 130 may include a matrix 130-2, and a spacer 140. The multispectral filter 300 is attached to one or more translation devices 310. .

[0033] As further shown in FIG. 3A, the second mirror 130 of the multi-spectral filter 300 -2 is movable relative to the first mirror 130-1 to vary the thickness of the spacer 140; Multispectral filters allow you to change the spectral range of light passing through each channel. Some implementations described herein use a fixed first mirror 130-1. Although the present invention will be described with respect to a second mirror 130-2 that is translated, tilted, or moved in accordance with the first embodiment, The first mirror 130-1 may be moved relative to the second mirror 130-2, and the first mirror Both the first mirror 130-1 and the second mirror 130-2 are connected to a translation device 310 and / or or otherwise.

[0034] As shown in FIG. 3B, the second mirror 130-2 is rotated relative to the first mirror 130-1. The second substrate 110-1 and the second substrate 110-2 are translated by the translation device 310. The mirror 130-2 is aligned with the first substrate 110-1 and the first substrate 110-2 relative to the position shown in FIG. 3A. In some embodiments, the mirror 130-1 may be moved further away from the mirror 130-2. The translation device 310 may be a focusing element, a voice coil motor, a piezoelectric transducer, a sine wave transducer, or the like. Microelectromechanical systems (MEMS) devices, thermomechanical devices, bistable beam switches The present invention may be implemented using a multi-layered structure, and / or other methods.

[0035] As shown in FIG. 3C, the second mirror 130-2 is The mirror 130-1 may be translated by the translation device 310 so as to tilt relative to the mirror 130-1. For example, the second substrate 110-2 may include a tilt device, a plurality of translation devices, and / or In this manner, the multi-spectral filter 300 may be attached to the The wavelength range of the channel is further divided by a second mirror 130-2 and a second mirror 130-3 for the first portion of the channel. A second mirror 130-1 is located at a second position on the second portion of the channel, and the distance between the first mirror 130-1 is reduced. For the third part, the distance between the mirror 130-2 and the first mirror 130-1 is increased. and / or by maintaining the distance between the second mirror 130-2 and the first mirror 130-1. or other.

[0036] In some embodiments, the mobile device may receive a first A second mirror 130-2 may be moved relative to the mirror 130-1. During readout of a sensor element aligned with a channel of the spectral filter 300, the sensor element is moved The device is activated to move the second mirror 130-2 to illuminate some channels with different wavelengths. A long range may be associated with a channel and other channels may be maintained in a predefined wavelength range. When a spectral filter contains multiple channels with a common wavelength range, as shown in FIG. For multiple channels 7 as shown in FIG. 2, the mobile device may communicate with the A first sensor element of a first channel associated with the second mirror 130-2 reads the second mirror 130-2 at a first position. and a second sensor element of a second channel associated with the common wavelength range. The second mirror 130-2 may be actuated to be read out in a second position. In this manner, the multi-spectral filter 200 can provide multiple spectral filters using a common channel. Further, the moving device may be configured to move the first sensor element to the first position. and a second location, resulting in multiple scans using a single channel. You can get the spectrum range.

[0037] In some embodiments, the spacer 140 is a second mirror relative to the first mirror 130-1. To allow the spacer width to be variable based on the translation of mirror 130-2. For example, the spacer 140 may be constrained by a multi-spectral filter 300. The second mirror 130-2 may be a gas spacer or a liquid spacer that can be sealed. As it translates relative to the first mirror 130-1, the gas or liquid spacer Additionally or alternatively, the spacer 140 may be An additional gas or liquid spacer material is provided between the second mirror 130-2 and the first mirror 130-3. 130-1 and / or may be removed from the gap. The spacers may be constrained to have a variable thickness.

[0038] As shown in FIG. 3D, a first spacer 140-1 and a second spacer 140-2, etc. A plurality of spacers 140 are disposed between the first mirror 130-1 and the second mirror 130-2. For example, the first spacer 140-1 may be arranged to cover the first mirror 130-1. The second spacer 140-2, which may be a solid spacer, is disposed between the first mirror 130-1 and the second mirror 130-2. The spacer is a gas (or liquid) spacer that allows for variable separation between the first and second mirrors 130-1 and 130-2. That's fine.

[0039] As noted above, Figures 3A-3D are provided as examples only. Other examples are possible. There may be variations from those described with respect to Figures 3A-3D.

[0040] FIG. 4 illustrates an exemplary process for manufacturing the multispectral filters described herein. 4 is a flowchart of a process 400. In some embodiments, one or more of the processes in FIG. The process block is used for etching devices, sputtering devices, photolithography devices, etc. This may be performed by a placement device during the manufacturing procedure, such as by a vice and / or the like.

[0041] As shown in FIG. 4, the process 400 includes disposing a medium on a substrate to form a stepped structure. For example, the placement device may place the medium on the substrate (block 410). In some embodiments, the positioning device may be configured to position a plurality of layers of the medium. For example, multiple layers of photolithographic material may be stacked to form a stepped structure. The layers may be overlapped and multiple layers of the medium may be stacked to form a stepped structure. Multiple layers of photolithographic material can be exposed with respect to a photomask, The roughening material is selectively removed to form a stepped structure in the layers of the media. The photolithographic formation of the shaped structures is described in detail with respect to FIGS. 5A-5K. Additionally or alternatively, a medium may be placed on the substrate and an etching procedure may be used to create a stepped For example, the medium may be deposited on a substrate and then etched away. Some embodiments described herein may be formed by photolithography. Although the method is described with respect to a lithographic or etching procedure, it is not possible to form a stepped medium structure. Other procedures for achieving this are possible.

[0042] As shown in FIG. 4, a process 400 is performed by multi-layering to form a stepped mirror structure. 4. The method may include disposing a first mirror for the channel filter on the medium (block 420 For example, the positioning device may position a first mirror on the medium. The mirrors are arranged in a stepped structure based on a medium having a stepped structure, on which a first mirror is arranged. may be formed.

[0043] As shown in FIG. 4, a process 400 is provided for fabricating spacers for a multi-channel filter. The method may include placing the alignment device on the mirror of the first embodiment (block 430). For example, the alignment device may include: A spacer may be placed on the first mirror, in which case the spacer may be placed using a single placement procedure. Alternatively, the spacers may be solid spacers disposed in a layered pattern, which may require multiple deposition and etching steps. Reduced surface layer oxidation-based effects on optical performance compared to the spacer arrangement used Additionally or alternatively, the spacer may be provided between the first mirror and the second mirror. The spacer may be a liquid or gas spacer that can be inserted into a cavity formed by the This allows the development of a variable spacer binary multispectral filter with a translatable mirror. In some embodiments, the spacer may form a flat surface. For example, the spacer may have a stepped first surface that interfaces with the stepped mirror surface of the first mirror. and a second surface opposite the spacer may be disposed on the first mirror such that the second surface is flat. In this case, the spacer is etched to remove part of it and form a flat surface. In some embodiments, the first mirror or medium may have etched spacers. etch stop to form a flat surface.

[0044] As shown in FIG. 4, the process 400 includes forming a second mirror on a second surface of the spacer. to form a flat mirror for a multi-channel filter (block For example, the positioning device may be configured to position the first of the spacers so that the mirror is a flat mirror. A second mirror may be disposed on the second surface. In some embodiments, the second mirror is The second mirror may be aligned to the first mirror, for example by placing the second mirror on a separate substrate. Alternatively, a second mirror and another substrate may be aligned with the first mirror to form a first mirror and a second mirror and another substrate. The substrate may be translated relative to the first mirror to form a variable thickness spacer. In this manner, a multi-spectral filter may be formed with multiple channels.

[0045] Although FIG. 4 illustrates exemplary blocks of a process 400, in some embodiments, the process The process 400 may include additional blocks, fewer blocks, different Additionally or alternatively, the process may include a process for determining whether a block is a sigma-based block or a process for determining whether a block is a sigma-based block. Two or more blocks of process 400 may be executed in parallel.

[0046] 5A-5K are diagrams of an exemplary embodiment relating to process 400. K is an exemplary process for manufacturing a multispectral filter as described herein. Indicates the service.

[0047] As shown by diagram 500 in FIG. 5A, photoresist 552 is applied to substrate 1. 10. As shown by diagram 502, photomask 554 and 556 may be disposed on top of the photoresist 552 .

[0048] As shown by diagram 504 in FIG. 5B, photomasks 554 and 55 6, and photoresist 552 is covered by photomasks 554 and 556. As shown in diagram 506, based on the exposure, The portions of the photoresist 552 that are not covered by the photomasks 554 and 556 , may remain disposed on the substrate 110.

[0049] As shown by diagram 508 in FIG. 5C, the layer of medium 120 is bonded to the substrate 110 and The remaining portion of the photoresist 552 can be stacked. The remaining portions of the photoresist 552 are removed so that the photoresist 552 is not formed on the substrate 110. The remaining portions of the photoresist 552 are removed, leaving a portion of the layer of the substrate 120 that was placed on the substrate. As shown in diagram 512, another photoresist may be formed. A layer of resist 552 may be disposed over the medium 120 and the substrate 110 .

[0050] As shown by diagram 514 in FIG. 5D, another photomask (not shown) Based on the use and exposure of the photoresist 552, only a portion of the other layer may remain. As shown by diagram 516, another layer of medium 120 may be disposed.

[0051] As shown by diagram 518 in FIG. 5E, the other portions of the photoresist 552 A layer may be removed, resulting in media 120 forming two stages. As shown, another layer of photoresist 552 is applied over medium 120 and substrate 110. can be placed in

[0052] As shown by diagram 522 in FIG. 5F, another photomask (not shown) Based on the use of and exposure to light, only a portion of the other layer of photoresist 552 may remain. As shown by diagram 524, another layer of medium 120 can be placed.

[0053] As shown by diagram 526 in FIG. 5G, the other portions of the photoresist 552 Layers may be removed resulting in media 120 forming three tiers. Diagram 5 Another layer of photoresist 552 is then applied to the medium 120 and the substrate 1 as shown by 28. It can be placed on 10.

[0054] As shown by diagram 530 in FIG. 5H, another photomask 554 and 556 (not shown) and exposure to light, a portion of another layer of photoresist 552 As shown by diagram 532, only another layer of medium 120 may remain. may be arranged.

[0055] Another layer of photoresist 552, as shown by diagram 534 in FIG. may be removed, resulting in the media 120 forming four stages. After further photolithography steps, the multispectral filter is A set of six stages is formed by the medium 120, in which the channels at each edge of the medium are common channels. It can be done.

[0056] As shown by diagram 538 in FIG. 5J, a first mirror 558 is 20. As shown in diagram 540, A spacer 560 may be disposed on the first mirror 558 so that the first mirror 558 The first surface of the spacer 560 at the interface with the first mirror 5 has a stepped surface. 58. Additionally, the second surface of the spacer 560 is a non-flat surface. It is.

[0057] As shown by diagram 542 in FIG. 5K, the etching procedure removes spacers 560. A portion of the second surface of the spacer 560 may be removed to provide a flat second surface. As shown in diagram 544, the second mirror 562 is aligned with the flat first surface of the spacer 560. In this case, the step-like first surface and the flat second surface are the basis for the In this case, the spacer 560 can be multi-specular without disposing multiple layers on the spacer 560. The present invention forms multiple channels for a tunable filter.

[0058] As noted above, Figures 5A-5K are provided as examples only. Other examples are possible. There may be variations from those described with respect to Figures 5A-5K.

[0059] FIG. 6 is a diagram of an example embodiment 600 described herein. As shown in FIG. As such, embodiment 600 includes a sensor system 610. Sensor system 610 includes an optical system. The sensor may be part of a system and may provide an electrical output corresponding to the sensor measurement. The system 610 is used in biometric authentication systems, security systems, and health monitoring systems. systems, object identification systems, spectroscopic identification systems, imaging systems and / or others The sensor system 610 may be part of an optical filter including an optical filter 630. The optical sensor 600 includes a sensor structure 620 and a set of optical sensors 640 (e.g., an array of sensor elements). For example, the optical filter structure 620 may provide bandpass blocking functions and / or other In some embodiments, the optical filter 630 may include an optical filter 630 that performs The paper presents multispectral filters with stepped media and monolithic spacers, as well as tunable Multispectral filters with thickness spacers and / or other multispectral The sensor system 610 may transmit an optical signal to a target 660 (e.g., The optical transmitter 650 transmits light toward a target (e.g., a person, an object, etc.).

[0060] The embodiments described herein may be described with respect to optical filters in a sensor system. However, the embodiments described herein may be used in other types of systems and may include The present invention may be used outside the sensor system and / or elsewhere.

[0061] In some embodiments, alternative arrangements of the optical filter 630 and the optical sensor 640 may be utilized. For example, the optical filter 630 may filter the second portion of the optical signal in the same manner as the input optical signal. Instead of passing the second portion of the optical signal through a straight line, the second portion of the optical signal is directed to a separate optical sensor 640. In some embodiments, the optical sensor 640 can be oriented in a different direction. Ransche photodiode, Indium gallium arsenide (InGaAs) detector, infrared detector It may be an extractor and / or other.

[0062] As further shown in FIG. 6 and reference numeral 670, the input optical signal is passed through an optical filter 670. The input optical signal is directed to the structure 620. The input optical signal is a visible, near infrared, or IR, mid-infrared and / or other, and the environment in which the sensor system 610 is utilized. For example, the optical filter 630 may include a multi-channel In the case of a multi-spectral filter, the optical transmitter 650 may be a near field optical transmitter for spectroscopic measurements. A range of wavelengths of infrared light may be directed at the target, and the optical sensor 640 may detect multiple wavelengths of near infrared light. To be able to perform range measurements, the near infrared light is focused on a target 660 (e.g. The ambient light may be reflected by one or more surrounding objects toward the optical sensor 640. Light may be directed from a light source (eg, a light bulb or the sun) towards the optical sensor 640 .

[0063] In another example, as shown, multiple beams of light may be directed at a target 660, with multiple subbeams of light being directed at the target 660. The set may be reflected towards an optical filter structure 620, which in turn reflects the light. The optical sensor 640 may be positioned at an oblique angle. In some embodiments, a different oblique angle may be used. In some embodiments, the optical filter structure 620 may be used to filter the optical sensor 6 40, and from the optical sensor 640 and / or other It may be placed at a distance (e.g., via free space optical communication), e.g., optical filters The structure 620 can be formed, for example, by photolithography, sputter deposition techniques (e.g., Inert gas mixtures of argon and helium, and / or other can be used to coat and pattern onto the optical sensor 640.

[0064] In another example, the optical transmitter 650 detects gestures using a gesture recognition system. Detecting objects in close proximity to both the blind and visually impaired; Detecting objects in close proximity to objects (e.g., using LIDAR technology) and / or other The target 660 may be of a type similar to that described above, as well as near infrared and ambient light. 640.

[0065] In some embodiments, a portion of the optical signal is passed through the optical filter 630 and the optical filter structure. For example, different spacer thicknesses in different channels of the optical filter 630 Thus, a first portion of the light may be reflected and a second portion of the light may be allowed to pass. The optical filter 630 has a number of channels formed by spacers associated with a stepped medium. Additionally or alternatively, the optical fiber may include a plurality of channels, each of which may pass a different wavelength of light. , two or more channels may pass a common wavelength of light.

[0066] As further shown in FIG. 6 and reference numeral 680, the optical sensor 640 Based in part on the optical signal, the optical sensor 640 may provide the sensor system 610 with spectroscopic measurements, Recognizing user gestures, detecting the presence of objects and / or other The force may provide an electrical signal.

[0067] As noted above, FIG. 6 is provided as an example only. Other examples are possible and are not intended to be limiting. The actual product may differ from that described above.

[0068] The foregoing disclosure provides illustrations and descriptions, but is not intended to be exhaustive or to disclose embodiments. It is not intended to be limiting to the precise form disclosed herein. Modifications and variations are possible in light of the above disclosure. Changes may be made or modifications and variations may be obtained from the embodiments.

[0069] Some embodiments are described herein with reference to a threshold value. As used herein, Satisfying the threshold means being greater than the threshold, more than the threshold, higher than the threshold, or equal to or greater than the threshold. Smaller than, less than threshold, lower than threshold, less than or equal to threshold, equal to threshold and / or other It may point to a value.

[0070] Certain combinations of features may be claimed and / or disclosed in the specification. However, these combinations are not intended to limit the disclosure of possible embodiments. Indeed, many of these features may be included without being specifically recited in the claims. or in a manner not disclosed in the specification. Each dependent claim may depend directly on only one claim, but the disclosure of possible embodiments is not intended to be limiting. includes each dependent claim in combination with every other claim in the set of claims.

[0071] Any elements, acts, or instructions used in this document are not intended to be used interchangeably unless expressly stated. In addition, the phrase "based on" should not be construed as being essential or required. Unless otherwise specified, "based at least in part on" is intended to mean "based at least in part on." [Explanation of symbols]

[0072] 100 Multispectral Filters 110 Substrate 110-1 First substrate 110-2 Second board 120 Medium 130-1 First mirror 130-2 Second Mirror 140 Spacer 140-1 First spacer 140-2 Second spacer 200 Multispectral Filters 300 Multispectral Filters 310 Parallel Movement Device 400 Exemplary Process for Manufacturing a Multispectral Filter 410 Process for forming a stepped structure by placing a medium on a substrate 420 A first mirror for a multi-channel filter to form a stepped mirror structure The process of placing the 430 Process for placing spacers for multi-channel filters on the first mirror 440 A second mirror is placed on the second surface of the spacer for multichannel filtering. Process for forming flat mirrors 552 Photoresist 554 Photomask 556 Photomask 558 First Mirror 560 Spacer 562 Second Mirror 610 Sensor System 620 Optical Filter Structure 630 Optical Filters 640 Optical Sensor 650 Optical Transmitter 660 Target 670 Input optical signal 680 Output Electrical Signal

Claims

1. A first mirror having a stepped surface; a monolithic spacer disposed on the stepped surface of the first mirror; a second mirror disposed on the flat surface of the monolithic spacer; The filter, wherein the first mirror and the second mirror sandwich at least a portion of the monolithic spacer.

2. Further comprising a stepped medium, the first mirror is disposed on the stepped medium; The filter of claim 1 .

3. A filter as described in claim 2, wherein the stepped medium is stepped along a single axis.

4. A filter as described in claim 2, wherein the stepped medium is stepped along multiple axes.

5. The filter of claim 1, wherein the monolithic spacer comprises a hydrogenated silicon based spacer.

6. Further comprising a substrate, The filter of claim 1 , wherein a portion of the stepped surface of the first mirror is disposed on a portion of the substrate.

7. A substrate including an array of sensor elements; a stepped medium between the substrate and the stepped surface of the first mirror; The filter of claim 1 further comprising:

8. A first portion of the first mirror and a first portion of the second mirror are separated by a first distance and configured to pass light of a first wavelength band and form a first channel aligned with a first sensor element; a second portion of the first mirror and a second portion of the second mirror separated by a second distance and configured to pass light of a second wavelength band and form a second channel aligned with a second sensor element; The filter of claim 1 .

9. A filter as described in claim 1, wherein the second mirror is configured to be movable relative to the first mirror.

10. A mirror having a stepped surface; Spacers formed in a single step and Equipped with the spacer is disposed on a portion of the stepped surface of the mirror; filter.

11. A substrate; a stepped medium between the substrate and the stepped surface of the mirror; The filter of claim 10 further comprising:

12. The spacer is a gas spacer, or Liquid Spacer The filter of claim 10 comprising:

13. The filter of claim 10, wherein the spacer comprises a hydrogenated silicon-based spacer.

14. Equipped with different mirrors, the first portions of the different mirrors are disposed on different portions of the stepped surface of the mirror; a second portion of the different mirror disposed on a flat surface of the spacer; The filter of claim 10.

15. A method for detecting a reflection of a light beam from a first mirror having a stepped mirror structure for a filter; disposing spacers for the filter on the first mirror using a single deposition procedure; disposing a second mirror having a flat mirror structure on at least the flat surface of the spacer; A method comprising:

16. The method of claim 15, wherein the spacer comprises a hydrogenated silicon-based spacer.

17. The method described in claim 16, wherein positioning the second mirror includes positioning the second mirror on the flat surface of the spacer and a portion of the first mirror.

18. The method of claim 15, further comprising forming a stepped structure of the medium on the substrate of the filter using one or more photolithography materials or etching procedures.

19. The method of claim 18, wherein positioning the first mirror includes positioning the first mirror on the stair-like structure of the medium.

20. The method of claim 18, further comprising depositing a different substrate on the second mirror.

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