Optoelectronic device including EM radiation transparent regions between emitting regions - Patents.com

Abstract

The display panel comprises at least one display section including a display section (sub)pixel array including a plurality of emissive regions each corresponding to a (sub)pixel, and at least one signal exchange section including a signal exchange section (sub)pixel array including at least one transmissive region and a plurality of emissive regions each corresponding to a (sub)pixel, the signal exchange section (sub)pixel array accommodating the at least one transmissive region by differing from the display section (sub)pixel array in at least one characteristic selected from at least one of the size, shape, configuration, and orientation of at least one (sub)pixel in the signal exchange section (sub)pixel array, pixel density, and pitch of the (sub)pixels in the signal exchange section (sub)pixel array.

Description

[Technical Field]

[0001] (CROSS-REFERENCE TO RELATED APPLICATIONS) This disclosure claims the benefit of priority to U.S. Provisional Patent Application Nos. 63 / 180,612, filed April 27, 2021, 63 / 183,512, filed May 3, 2021, 63 / 194,110, filed May 27, 2021, and 63 / 239,782, filed September 1, 2021, the contents of each of which are incorporated by reference in their entirety.

[0002] The present disclosure relates to optoelectronic devices, and more particularly to optoelectronic devices having EM radiation transparent regions. [Background technology]

[0003] In an optoelectronic device, such as an organic light emitting diode (OLED), at least one semiconductor layer is disposed between a pair of electrodes, such as an anode and a cathode. The anode and cathode are electrically coupled to a power source and generate holes and electrons, respectively, that migrate toward each other through the at least one semiconductor layer. When a hole-electron pair combines, EM radiation can be emitted in the form of a photon.

[0004] An OLED display panel can include a plurality of (sub)pixels, each having an associated pair of electrodes and at least one semiconductor layer therebetween. In some non-limiting examples, the (sub)pixels can be selectively driven by a drive circuit including a plurality of thin-film transistor (TFT) structures electrically coupled by conductive metal lines, in some non-limiting examples, within a substrate on which the electrodes and at least one semiconductor layer are deposited. The various layers and coatings of such panels are typically formed by vacuum-based deposition processes.

[0005] Such display panels may be used in electronic devices such as mobile phones, in some non-limiting examples.

[0006] In some applications, it may be a goal to allow light to be emitted from at least a portion of a display panel while making that portion substantially transparent. In some non-limiting examples, the substantially transparent portion may allow EM radiation, including but not limited to EM signals, to be exchanged therethrough. In some non-limiting examples, such a portion of the display panel may be referred to as its signal exchange portion. In some non-limiting examples, the signal exchange portion of the display panel may comprise at least one (EM signal) transmissive region and at least one (EM signal) emissive region. In some non-limiting examples, the at least one emissive region may correspond to a (sub)pixel of the display panel.

[0007] U.S. Patent No. 11,145,702, filed by Google LLC on March 26, 2020, and issued on October 12, 2021, entitled "Boundary panel layout for artifact compensation in multi-pixel density display panel," discloses a display panel including a plurality of array sites arranged in an array defined by a plurality of rows and a plurality of columns. The display panel includes a first area of ​​the array having a first pixel density and a second area of ​​the array having a second pixel density lower than the first pixel density. The second area of ​​the array includes a plurality of array sites that are pixel-free. Rows of the second area adjacent to the first area include at least one pixel, and columns of the second area adjacent to the first area include at least one pixel.

[0008] PCT International Patent Application Publication No. 2020 / 219267, filed April 8, 2020, and entitled "Methods and configurations for improving the performance of sensors under a display," discloses an electronic device that may include a display and a sensor below the display. The display may include an array of subpixels for displaying an image to a user of the electronic device. At least a portion of the array of subpixels may be selectively removed in pixel removal regions to improve light transmission through the display to the sensor. The pixel removal regions may include a plurality of pixel-free regions that are free of thin-film transistor structures, free of power lines, have continuous open areas with rerouted row / column lines, are partially free of touch circuitry, optionally include dummy contacts, and / or have selectively patterned display layers.

[0009] Chinese Patent Application No. 113745271, entitled "Display panel and display device," filed by Huawei Technologies Co., Ltd. on May 29, 2020, discloses a display panel and a display device including a first display area and a second display area, wherein the pixel density of the first display area is lower than that of the second display area, and the first area includes a plurality of first pixel units, each of which includes a first subpixel, a second subpixel, and a third subpixel, and the minimum distance between the first subpixel in each first pixel unit and the second subpixel in an adjacent first pixel unit is 1.2 to 2.5 times the distance between the first subpixel and the second subpixel in a first pixel unit. An embodiment of the present application provides a display panel and a display device that can reduce the diffraction phenomenon after light passes through the display panel and improve the optical effect of optical elements below the screen.

[0010] Chinese Patent Application No. 112436029, entitled "Pixel arrangement structure, display panel and display device," filed on July 1, 2020, by Kunshan Govisionox Optoelectronics Co., Ltd., discloses a pixel arrangement structure in which, in a first pixel unit, the centers of a first subpixel, a second subpixel, a third subpixel, and a fourth subpixel form a common-sided triangle with non-overlapping areas, with the center of the first subpixel and the center of the second subpixel serving as vertices of the common-sided triangle. The second subpixel has a second major axis and a second minor axis, and the center line of the second subpixel along the major axis direction does not pass through the center of the third subpixel and / or the fourth subpixel in the first pixel unit. This pixel arrangement structure prevents subpixels emitting light of the same color from being independently arranged in a row when the subpixels are staggered under limited conditions, thereby improving the color edge problem at the display edge. A display panel and a display device are also provided.

[0011] Chinese Application No. 112436030, entitled "Pixel arrangement structure, display panel and display device," filed on July 1, 2020 by Kunshan Govisionox Optoelectronics Co., Ltd., discloses a pixel arrangement structure comprising a plurality of first pixel units and a plurality of second pixel units, the first pixel units and the second pixel units being arranged at intervals in a first direction and a second direction, each of the first pixel unit and the second pixel unit comprising a first subpixel, a second subpixel, a third subpixel and a fourth subpixel, the first subpixel being located on one side of a central connecting line between the third subpixel and the fourth subpixel, and the second subpixel being located on the other side of the central connecting line between the third subpixel and the fourth subpixel, and after rotating by a predetermined angle, each subpixel structure in the second pixel unit is mirror-symmetric with each subpixel structure in the first pixel unit. The pixel array structure can take into consideration the arrangement compactness of the sub-pixels and the spacing between the sub-pixels, and a balance between the arrangement compactness and the spacing between the sub-pixels is required, and the pixel array structure has high resolution and is beneficial for reducing the risk of color mixing and color cast, improving color edges, and improving visual graininess. A display panel and a display device are also provided.

[0012] China Application No. 112436031, entitled "Pixel arrangement structure, display panel and display device," filed on July 1, 2020 by Kunshan Govisionox Optoelectronics Co., Ltd., discloses a pixel arrangement structure comprising a first subpixel, a second subpixel, a third subpixel, and a fourth subpixel, wherein the centers of two aligned first subpixels and the centers of two aligned second subpixels are vertex-connecting lines to form a virtual rectangle, the virtual rectangle having two opposite sides, a short side and a long side, the short side and the long side being arranged opposite to each other and connected to the vertices of the two opposite sides, the short side of the virtual rectangle being not parallel to the long side of the virtual rectangle, and a third subpixel or a fourth subpixel being arranged within the virtual rectangle, wherein the emission color of the third subpixel is the same as that of the fourth subpixel. In this pixel arrangement structure, the sub-pixels are arranged in a staggered manner under a limited condition, thereby preventing the sub-pixels emitting light of the same color from being independently arranged in a line, and improving the color edge problem at the display edge. A display panel and a display device are also provided.

[0013] "Display panel and display" filed on July 1, 2020 by Kunshan Govisionox Optoelectronics Co. Ltd. Chinese Patent Application No. 112436032, entitled "Display panel including a plurality of subpixels and a plurality of light-transmitting reserved areas," discloses a display panel including a plurality of subpixels and a plurality of light-transmitting reserved areas, the plurality of subpixels including a plurality of first subpixels, a plurality of second subpixels, and a plurality of third subpixels, wherein one second subpixel and one light-transmitting reserved area are adjacently arranged to form a combined area; the display panel has a plurality of first pixel rows and a plurality of second pixel rows, the first pixel rows and the second pixel rows are alternately arranged with intervals between them, each first pixel row has a plurality of first subpixels and a plurality of combined areas, the first pixel rows have a plurality of first subpixels and a plurality of combined areas alternately arranged with intervals between them, and each second pixel row has a plurality of third subpixels, and in two adjacent first pixel rows, the arrangement structure of the combined areas in one first pixel row is different from the arrangement structure of the combined areas in the other first pixel row, but the combined areas are the same after being rotated 90 degrees. The display panel is beneficial in reducing the risk of color mixing and color cast.A display device is also provided.

[0014] Chinese Patent Application No. 112054048, entitled "Light-transmitting display module, display panel and preparation method thereof," filed on September 17, 2020 by Hefei Visionox Technology Co., Ltd., discloses a transmissive display module, a display panel and a manufacturing method thereof, wherein the transmissive display module has a pixel definition layer comprising isolation structures and pixel openings surrounded by the isolation structures, a nucleation blocking layer positioned on a side of the pixel definition layer away from the substrate and comprising a plurality of blocking units, a first orthogonal projection of the blocking units onto the pixel definition layer covering at least a portion of the isolation structures, at least a portion of the blocking units being discontinuously arranged, a first common electrode positioned on a side of the pixel definition layer away from the substrate, and a second orthogonal projection of the first common electrode onto the pixel definition layer covering at least a portion of the area other than the first orthogonal projection. The light-transmitting display module provided by the embodiment of the present invention can improve the light transmittance of the light-transmitting display module under conditions that do not affect the normal display of the light-transmitting display module, and a photosensitive component can be conveniently integrated under the screen on one side of the light-transmitting display module.

[0015] Chinese Application No. 112103318, entitled "Display panel, preparation method display panel and display device," filed by Hefei Visionox Technology Co., Ltd. on September 17, 2020, discloses a display panel, a method for manufacturing a display panel, and a display device, wherein the display panel has a first display area and a second display area, the light transmittance of the first display area being greater than the light transmittance of the second display area, the display panel has a substrate, and the pixel definition layer is positioned on the substrate and includes an isolation structure, a pixel opening formed by surrounding the isolation structure, and a nucleation prevention layer including a first preventing unit in the pixel opening of the transition display area, the first orthogonal projection of the pixel definition layer covering the transition display area, the common electrode includes a first common electrode and a second common electrode, the second common electrode is formed in the second display area and the transition display area, and the second orthogonal projection of the first common electrode on the pixel definition layer covers at least a portion of the area excluding the first orthogonal projection in the first display area and the transition display area. At least some area of ​​the display panel may be light-transmitting and visible, and the photosensitive assembly may be conveniently incorporated below the screen.

[0016] U.S. Patent No. 11,222,929, titled "Display panel and display device," filed on April 16, 2021, and issued on January 11, 2022, by Xiamen Tianma Microelectronics Co., Ltd., discloses a display panel and a display device. The display panel includes a first display area, a second display area, and a transition display area between the first display area and the second display area. The second display area includes second pixel units, the transition display area includes third pixel units, and each second pixel unit and each third pixel unit both include a first sub-pixel, a second sub-pixel, a third sub-pixel, and a white sub-pixel. The ratio of the total opening area of the white sub-pixels in the second pixel unit to the total area of the second pixel unit is A, the ratio of the total opening area of the white sub-pixels in the third pixel unit to the total area of the third pixel unit is B, and B < A. The white sub-pixels are turned on or off during the display stage of the display panel.

[0017] U.S. Patent Application Publication No. 2021 / 0240026, titled "Pixel Design for Electronic Display Devices," filed on April 23, 2021, by Apple Inc., discloses a system and method for through-display imaging. The display includes an imaging aperture defined through an opaque backing. An optical imaging array is aligned with the aperture. Above the aperture, the display is arranged and / or configured to increase the light transmittance. For example, the area of the display above or adjacent to the imaging aperture may be formed with a lower pixel density than other areas of the display, thereby increasing the inter-pixel distance (e.g., pitch) and increasing the area through which light can cross the display and reach the optical imaging array.

[0018] Chinese Patent Application No. CN113327972, entitled "Display panel, preparation method and display device," filed on July 1, 2021, by Wuhan Tianma Microelectronics Co., Ltd., discloses a display panel, a manufacturing method, and a display device. The pixel structure includes a plurality of first subpixels, a second subpixel, and a third subpixel, the plurality of third subpixels forming a first virtual trapezoid, the first subpixels being located within the first virtual trapezoid, the plurality of first subpixels and the plurality of second subpixels forming a second virtual trapezoid, the third subpixel being located within the second virtual trapezoid, the first virtual trapezoid including a first long side, a first oblique side, a first short side, and a second oblique side, the second virtual trapezoid including a second long side, a The flange includes a third oblique side, a second short side, and a fourth oblique side, wherein the first long side and the first bevel edge form a first included angle, the first long side and the second bevel edge form a second included angle, the second long side and the third inclined side form a third included angle, and the second long side and the fourth inclined side form a fourth included angle, the sum of the first included angle and the second included angle is a first angle, the sum of the third included angle and the fourth included angle is a second angle, and a difference between the first angle and the second angle is within a first preset range.

[0019] Chinese Patent Application No. 113327973, entitled "Display panel and display device," filed on July 1, 2021, by Wuhan Tianma Microelectronics Co., Ltd., discloses a display panel and a display device, the display panel including a plurality of pixel repeat units arranged in an array, each pixel repeat unit including two first subpixels, two second subpixels, and four third subpixels, wherein one first subpixel is located between the four third subpixels, one second subpixel is located between the four third subpixels, and a third subpixel is located between two first subpixels and two second subpixels, the centers of the four third subpixels surrounding the first subpixel form a first trapezoid, and two pairs of opposite sides of the first trapezoid have different lengths. The technical solution of an embodiment of the present invention can improve the display effect of the display panel.

[0020] PCT International Patent Application Publication No. 2022 / 035527, entitled "Displays Having Transparent Openings," filed July 7, 2021, by Apple Inc., discloses an electronic device that may include a display and a light sensor formed below the display. The electronic device may include multiple transparent windows overlapping the light sensor. The resolution of the display panel may be reduced in some areas due to the presence of the transparent windows. To mitigate diffraction artifacts, a first sensor (13-1) may sense light passing through a first pixel-removed region having transparent windows arranged according to a first pattern. A second sensor (13-2) may sense light through a second pixel-removed region having transparent windows arranged according to a second pattern different from the first pattern. The first and second patterns of the transparent windows may result in the first and second sensors having different diffraction artifacts. Therefore, the image from the first sensor can be corrected for diffraction artifacts based on the image from the second sensor.

[0021] U.S. Patent Application Publication No. 2022 / 0102446, filed on December 9, 2021 by Samsung Display Co. Ltd., discloses a display device including a display area including a first display area and a second display area, wherein the first display area includes a plurality of first pixels, the second display area includes a plurality of second pixels and at least one light-transmitting area, the light-transmitting area having a light transmittance higher than that of the first pixels and the second pixels, and the second display area having a light transmittance higher than that of the first display area.

[0022] In some non-limiting examples, at least one transmissive region may be interspersed between at least one emissive region. Because emissive regions generally include layers, coatings, and / or components that may attenuate or inhibit the transmission of EM radiation through such regions, in some non-limiting examples, transmissive regions may generally be provided in non-emissive regions of the display panel that may be substantially free of such layers, coatings, and / or components.

[0023] In some non-limiting examples, the objective may be to provide at least one transmissive region in at least a portion of a display panel, while also providing at least one emissive region in such portion of the display panel, to maintain at least one of an aperture ratio and a relatively high pixel density of the at least one emissive region relative to portions of the display panel that are substantially free of such at least one transmissive region. [Brief explanation of the drawings]

[0024] Examples of the present disclosure will now be described with reference to the following figures, in which identical reference numbers in different figures indicate identical, and / or in some non-limiting examples, similar and / or corresponding elements: [Figure 1]1 is a simplified block diagram from a cross section of an exemplary device having multiple layers on a side surface formed by selective deposition of a patterned film on a first portion of the lateral surface, followed by deposition of a closed film of deposition material on a second portion thereof, according to an example of the present disclosure. [Figure 2A] FIG. 1 is a schematic diagram illustrating an exemplary cross-sectional view of an exemplary display panel having multiple layers with at least one opening therein through which at least one electromagnetic (EM) signal is exchanged, according to one example of the present disclosure. [Figure 2B] 1 is a schematic diagram illustrating, in plan view, a display panel including a signal exchange portion and a display portion according to an example of the present disclosure. [Figure 2C] 1 is a schematic diagram illustrating, in plan view, a display panel including a signal exchange portion and a display portion according to an example of the present disclosure. [Figure 2D] 1 is a schematic diagram illustrating, in plan view, a display panel including a signal exchange portion and a display portion according to an example of the present disclosure. [Figure 3A] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3B] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3C] 3B is a schematic diagram illustrating, in plan, at least a fraction of the signal exchange area occupied by the exemplary (sub)pixel array of FIG. 3A; [Figure 3D] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3E] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3F] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3G] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3H]1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3I] 3H is a schematic diagram illustrating, in plan, at least a fraction of the signal exchange area occupied by the exemplary (sub)pixel array of FIG. 3G. [Figure 3J] 1 is a schematic diagram illustrating an exemplary (sub)pixel arrangement in plan view according to an example of the present disclosure; [Figure 3K] 3E and 3F. FIG. 3F is a schematic diagram showing, in plan, at least a portion of a signal exchange portion occupied by the exemplary (sub)pixel array of FIGS. [Figure 3L] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3M] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3N] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3O] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3P] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3Q] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3R] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 3S] 1A-1C are schematic diagrams illustrating respective exemplary (sub)pixel arrangements in plan view, according to examples of the present disclosure. [Figure 4A] 1A-1C are schematic diagrams showing, in plan view, exemplary fragments of (sub)pixel arrays in both the signal exchange section and the display section, according to examples of the present disclosure. [Figure 4B] 1A-1C are schematic diagrams showing, in plan view, exemplary fragments of (sub)pixel arrays in both the signal exchange section and the display section, according to examples of the present disclosure. [Figure 4C]1A-1C are schematic diagrams showing, in plan view, exemplary fragments of (sub)pixel arrays in both the signal exchange section and the display section, according to examples of the present disclosure. [Figure 4D] 1A-1C are schematic diagrams showing, in plan view, exemplary fragments of (sub)pixel arrays in both the signal exchange section and the display section, according to examples of the present disclosure. [Figure 5A] 1A and 1B are schematic diagrams showing, in plan view, exemplary fragments of (sub)pixel arrays in each of the signal exchange section, transition region, and display section, according to examples of the present disclosure. [Figure 5B] 1A and 1B are schematic diagrams showing, in plan view, exemplary fragments of (sub)pixel arrays in each of the signal exchange section, transition region, and display section, according to examples of the present disclosure. [Figure 6] 2 is a schematic diagram illustrating an exemplary process for depositing a patterned coating in a pattern onto an exposed layer surface of an underlying layer in an exemplary version of the device of FIG. 1 according to one example of the present disclosure. [Figure 7] 7 is a schematic diagram illustrating an exemplary process for depositing a deposition material onto a second portion of the exposed layer surface including the deposition pattern of the patterned coating of FIG. 6, where the patterned coating is a nucleation-inhibiting coating (NIC). [Figure 8A] FIG. 2 is a schematic diagram illustrating an exemplary version of the device of FIG. 1 in cross section. [Figure 8B] FIG. 8B is a schematic diagram showing a supplemental plan view of the device of FIG. 8A. [Figure 8C] FIG. 2 is a schematic diagram illustrating an exemplary version of the device of FIG. 1 in cross section. [Figure 8D] 8D is a schematic diagram showing the device of FIG. 8C in a complementary plan view. [Figure 8E] FIG. 2 is a schematic cross-sectional view of an example of the device of FIG. 1. [Figure 8F] FIG. 2 is a schematic cross-sectional view of an example of the device of FIG. 1. [Figure 8G] FIG. 2 is a schematic cross-sectional view of an example of the device of FIG. 1. [Figure 9A]2A-2C are schematic diagrams illustrating various potential behaviors of the NIC at the deposition interface with the deposition layer in an exemplary version of the device of FIG. 1, according to various examples of the present disclosure. [Figure 9B] 2A-2C are schematic diagrams illustrating various potential behaviors of the NIC at the deposition interface with the deposition layer in an exemplary version of the device of FIG. 1, according to various examples of the present disclosure. [Figure 9C] 2A-2C are schematic diagrams illustrating various potential behaviors of the NIC at the deposition interface with the deposition layer in an exemplary version of the device of FIG. 1, according to various examples of the present disclosure. [Figure 9D] 2A-2C are schematic diagrams illustrating various potential behaviors of the NIC at the deposition interface with the deposition layer in an exemplary version of the device of FIG. 1, according to various examples of the present disclosure. [Figure 9E] 2A-2C are schematic diagrams illustrating various potential behaviors of the NIC at the deposition interface with the deposition layer in an exemplary version of the device of FIG. 1, according to various examples of the present disclosure. [Figure 9F] 2A-2C are schematic diagrams illustrating various potential behaviors of the NIC at the deposition interface with the deposition layer in an exemplary version of the device of FIG. 1, according to various examples of the present disclosure. [Figure 9G] 2A-2C are schematic diagrams illustrating various potential behaviors of the NIC at the deposition interface with the deposition layer in an exemplary version of the device of FIG. 1, according to various examples of the present disclosure. [Figure 9H] 2A-2C are schematic diagrams illustrating various potential behaviors of the NIC at the deposition interface with the deposition layer in an exemplary version of the device of FIG. 1, according to various examples of the present disclosure. [Figure 9I] 2A-2C are schematic diagrams illustrating various potential behaviors of the NIC at the deposition interface with the deposition layer in an exemplary version of the device of FIG. 1, according to various examples of the present disclosure. [Figure 10] 1 is a block diagram of an exemplary electroluminescent device from a cross section according to one example of the present disclosure. [Figure 11] FIG. 2 is a cross-sectional view of the device of FIG. 1. [Figure 12]FIG. 12 is a schematic diagram illustrating, in plan view, an exemplary patterned electrode suitable for use in a version of the device of FIG. 11, according to one example of the present disclosure. [Figure 13] FIG. 13 is a schematic diagram illustrating an exemplary cross-sectional view of the device of FIG. 12 taken along line 13-13. [Figure 14A] 12A-12C are schematic diagrams illustrating, in plan view, several exemplary patterns of electrodes suitable for use in an exemplary version of the device of FIG. 11, according to one example of the present disclosure. [Figure 14B] 14B-14B are schematic diagrams illustrating exemplary cross-sectional views of the device of FIG. 14A at intermediate stages along line 14B-14B. [Figure 14C] FIG. 14C is a schematic diagram illustrating an exemplary cross-sectional view of the device of FIG. 14A taken along line 14C-14C. [Figure 15] FIG. 12 is a schematic diagram illustrating a cross-sectional view of an exemplary version of the device of FIG. 11 with an exemplary patterned auxiliary electrode, according to one example of the present disclosure. [Figure 16] 1 is a schematic diagram illustrating, in plan view, an exemplary pattern of auxiliary electrodes overlapping at least one emitting region and at least one non-emitting region, according to an example of the present disclosure. [Figure 17A] 12 is a schematic diagram illustrating, in plan view, an example pattern of an example version of the device of FIG. 11 having multiple groups of emitting regions in a diamond configuration, according to an example of the present disclosure. FIG. [Figure 17B] FIG. 17B is a schematic diagram illustrating an exemplary cross-sectional view of the device of FIG. 17A taken along line 17B-17B. [Figure 17C] FIG. 17C is a schematic diagram illustrating an exemplary cross-sectional view of the device of FIG. 17A taken along line 17C-17C. [Figure 18] 12 is a schematic diagram illustrating an exemplary cross-sectional view of an exemplary version of the device of FIG. 11 having an additional exemplary deposition step, according to an example of the present disclosure. [Figure 19] 12 is a schematic diagram illustrating an exemplary cross-sectional view of an exemplary version of the device of FIG. 11 having an additional exemplary deposition step, according to an example of the present disclosure. [Figure 20]12 is a schematic diagram illustrating an exemplary cross-sectional view of an exemplary version of the device of FIG. 11 having an additional exemplary deposition step, according to an example of the present disclosure. [Figure 21] 12 is a schematic diagram illustrating an exemplary cross-sectional view of an exemplary version of the device of FIG. 11 having an additional exemplary deposition step, according to an example of the present disclosure. [Figure 22A] FIG. 12 is a schematic diagram illustrating, in plan view, an example of a transparent version of the device of FIG. 11 including at least one exemplary pixel region and at least one exemplary light-transmitting region having at least one auxiliary electrode, according to an example of the present disclosure. [Figure 22B] FIG. 22B is a schematic diagram illustrating an exemplary cross-sectional view of the device of FIG. 22A taken along line 22B-22B. [Figure 23A] 12 is a schematic diagram illustrating in plan view an example of a transparent version of the device of FIG. 11 including at least one exemplary pixel region and at least one exemplary light-transmitting region, according to an example of the present disclosure. FIG. [Figure 23B] FIG. 23B is a schematic diagram illustrating an exemplary cross-sectional view of the device of FIG. 23A taken along line 23-23. [Figure 23C] FIG. 23B is a schematic diagram illustrating an exemplary cross-sectional view of the device of FIG. 23A taken along line 23-23. [Figure 24] 12A-12C are schematic diagrams that may illustrate exemplary stages in an exemplary process for fabricating an exemplary version of the device of FIG. 11 having subpixel regions with second electrodes of different thicknesses, according to an example of the present disclosure. [Figure 25] FIG. 15 is a schematic diagram illustrating an example cross-sectional view of an example version of the device of FIG. 14, in which the second electrode is coupled with an auxiliary electrode, according to an example of the present disclosure. [Figure 26] 15 is a schematic diagram illustrating an example cross-sectional view of an example version of the device of FIG. 14 having a partition and a shielding region, such as a recess, in a non-emitting region, according to an example of the present disclosure. [Figure 27A] 15 is a schematic diagram illustrating an example cross-sectional view of an example version of the device of FIG. 14 having a partition and a shielding region, such as an opening, in a non-emitting region, according to various examples of the present disclosure. [Figure 27B] 15 is a schematic diagram illustrating an example cross-sectional view of an example version of the device of FIG. 14 having a partition and a shielding region, such as an opening, in a non-emitting region, according to various examples of the present disclosure. [Figure 28] 15A-15C are schematic diagrams illustrating exemplary stages of an exemplary process for depositing a deposition layer in a pattern on an exposed layer surface of an exemplary version of the device of FIG. 14 by a selective deposition and subsequent removal process according to an example of the present disclosure. [Figure 29] 1 is an exemplary energy profile illustrating the relative energy states of adatoms absorbed on a surface, according to an example of the present disclosure. [Figure 30] FIG. 1 is a schematic diagram illustrating the formation of membrane nuclei according to an example of the present disclosure.

[0025] In this disclosure, a reference number accompanied by at least one numerical value (including, but not limited to, a suffix) and / or lowercase alphabetic character (including, but not limited to, a lowercase character) may be considered to refer to a particular instance and / or subset of the element or feature described by that reference number. Reference to a reference number without reference to an accompanying value and / or character may generally refer to the element or feature described by the reference number and / or the set of all instances described thereby, as the context dictates. Similarly, a reference number may have the letter "x" in place of a number. Reference to such a reference number may generally refer to the element or feature described by the reference number with the letter "x" replaced by the number, and / or the set of all instances described thereby, as the context dictates.

[0026] In this disclosure, for purposes of explanation and not limitation, specific details including, but not limited to, particular architectures, interfaces, and / or techniques are set forth in order to provide a thorough understanding of the present disclosure. In some instances, detailed descriptions of well-known systems, techniques, components, devices, circuits, methods, and applications are omitted so as not to obscure the description of the present disclosure with unnecessary detail.

[0027] It will also be appreciated that the block diagrams reproduced herein may represent conceptual views of illustrative components embodying the principles of the present technology.

[0028] Accordingly, the components of the systems and methods have been represented, where necessary, by conventional symbols in the drawings so as not to obscure the disclosure with details that will be readily apparent to those skilled in the art having the benefit of the description herein, and only those specific details relevant to understanding the examples of the disclosure have been shown.

[0029] Any drawings provided herein may not be drawn to scale and may not be considered as limiting the present disclosure in any way.

[0030] Any features or actions shown in dashed outline may, in some instances, be considered optional. Summary of the Invention

[0031] It is an object of the present disclosure to obviate or mitigate at least one disadvantage of the prior art.

[0032] The present disclosure relates to a display panel including at least one display portion including a display portion (sub)pixel array including a plurality of emissive regions each corresponding to a (sub)pixel, and at least one signal exchange portion including a signal exchange portion (sub)pixel array including at least one transmissive region and a plurality of emissive regions each corresponding to a (sub)pixel, wherein the signal exchange portion (sub)pixel array accommodates the at least one transmissive region by differing from the display portion (sub)pixel array in at least one characteristic selected from the size, shape, configuration, and orientation of the at least one (sub)pixel in the signal exchange portion (sub)pixel array, pixel density, and pitch of the (sub)pixels in the signal exchange portion (sub)pixel array.

[0033] According to a broad aspect, a display panel is disclosed that includes at least one display portion including a display portion (sub)pixel array including a plurality of emissive regions each corresponding to a (sub)pixel, and at least one signal exchange portion including a signal exchange portion (sub)pixel array including at least one transmissive region and a plurality of emissive regions each corresponding to a (sub)pixel, wherein the signal exchange portion (sub)pixel array accommodates the at least one transmissive region by differing from the display portion (sub)pixel array in at least one characteristic selected from at least one of: size, shape, configuration, and orientation of at least one (sub)pixel in the signal exchange portion (sub)pixel array; pixel density; and pitch of the (sub)pixels in the signal exchange portion (sub)pixel array.

[0034] In some non-limiting examples, at least one signal exchange portion may be positioned proximate an edge of the display panel.

[0035] In some non-limiting examples, the at least one display portion may substantially surround the at least one signal exchange portion.

[0036] In some non-limiting examples, the separation between the boundary of the at least one transparent region and the boundary of the subpixel adjacent to the at least one transparent region can be one of at least about 5 microns, at least about 6 microns, at least about 8 microns, at least about 10 microns, at least about 11 microns, and at least about 12 microns.

[0037] In some non-limiting examples, the separation between the boundary of the at least one transparent region and the boundary of the subpixel adjacent to the at least one transparent region in the signal exchange portion may be one of about 5-15 microns, about 6-12 microns, and about 8-10 microns.

[0038] In some non-limiting examples, the size of each transparent region may be at least 10 microns.

[0039] In some non-limiting examples, the size of each permeable region may be one of about 10-150 microns, about 10-130 microns, about 15-120 microns, about 15-100 microns, about 20-80 microns, about 20-65 microns, about 25-60 microns, and about 30-50 microns.

[0040] In some non-limiting examples, the total aperture ratio of all of the emissive and transmissive regions in the signal exchange portion may be one of about 60%, about 55%, about 50%, about 45%, and about 40% or less.

[0041] In some non-limiting examples, the total aperture ratio of all of the emissive and transmissive regions within the signal exchange portion may be one of about 30-60%, about 35-60%, about 40-60%, about 35-55%, about 40-50%, about 45-55%, and about 45-50%.

[0042] In some non-limiting examples, at least one permeable region can have a boundary defined by a plurality of permeable boundary segments.

[0043] In some non-limiting examples, the alignment layer can include at least one additional element.

[0044] In some non-limiting examples, the majority of a permeable boundary segment may be substantially parallel to the portion of the boundary of the emissive region corresponding to its adjacent (sub)pixel.

[0045] In some non-limiting examples, at least one transmissive region can be substantially devoid of cathodic material.

[0046] In some non-limiting examples, the cathode material can be substantially prevented from nucleating in the at least one transparent region by depositing a patterned coating in the at least one transparent region prior to deposition of the cathode material.

[0047] In some non-limiting examples, the cathode material may be removed from at least one transparent region by laser ablation thereof.

[0048] In some non-limiting examples, the at least one characteristic may be at least one of size, shape, and configuration, and the signal exchange portion (sub)pixel array and the display portion (sub)pixel array have a pixel density of at least one (sub)pixel in common.

[0049] In some non-limiting examples, the signal exchange portion (sub)pixel array and the display portion (sub)pixel array may have a common pitch for at least one (sub)pixel in the signal exchange portion (sub)pixel array and the display portion (sub)pixel array.

[0050] In some non-limiting examples, the size of at least one of the (sub)pixels in the signal exchange portion (sub)pixel array may be smaller than the size of the corresponding (sub)pixel in the display portion (sub)pixel array.

[0051] In some non-limiting examples, the size of each (sub)pixel in the signal exchange portion (sub)pixel array may be smaller than the size of the corresponding (sub)pixel in the display portion (sub)pixel array.

[0052] In some non-limiting examples, sub-pixels of a pixel in a signal exchange (sub)pixel array may be laterally spaced apart in at least two dimensions.

[0053] In some non-limiting examples, the signal exchange (sub)pixel array may include a plurality of pixels, each including a first subpixel, a second subpixel, and a third subpixel.

[0054] In some non-limiting examples, the pixel of the signal exchange portion (sub)pixel array may further include a second sub-pixel.

[0055] In some non-limiting examples, a region defined by multiple non-overlapping vectors each having endpoints located within an emission region associated with a pair of sub-pixels of a pixel in the signal exchange (sub)pixel array can define a contour associated with the pixel.

[0056] In some non-limiting examples, the compound can be a fluoropolymer.

[0057] In some non-limiting examples, each vector may have an end point located at the centroid of the emissive area of ​​the sub-pixel.

[0058] In some non-limiting examples, the contour may include four vectors defining a box, and a unit cell containing four adjacent boxes each with a common vertex defines the minimal repeating unit of the signal exchange (sub)pixel array.

[0059] In some non-limiting examples, at least one permeable region may be disposed at least one contour within the unit cell.

[0060] In some non-limiting examples, the at least one transmissive region may lie entirely within the single at least one contour.

[0061] In some non-limiting examples, the aperture ratio of the transmissive region of the signal exchange portion may be one of approximately 50% or less, 45% or less, 40% or less, 35% or less, 33% or less, and 25% or less.

[0062] In some non-limiting examples, the aperture of the transmissive region of the signal exchange portion may be one of at least about 5%, at least about 10%, and at least about 15%.

[0063] In some non-limiting examples, the aperture ratio of all radiating areas of the signal exchange portion may be one of about 20% or less, about 15% or less, and about 10% or less.

[0064] In some non-limiting examples, the aperture ratio of all emissive regions in the signal exchange portion may be about 5-10%, and the aperture ratio of all transmissive regions in the signal exchange portion may be about 30-50%.

[0065] In some non-limiting examples, the aperture ratio of all emissive regions of the signal exchange portion may be about 6-9%, and the aperture ratio of all transmissive regions therein may be about 35-45%.

[0066] In some non-limiting examples, the at least one characteristic may be pixel density, and the signal exchange (sub)pixel array and the display (sub)pixel array have at least one of the size, shape, configuration, orientation, and pitch of at least one (sub)pixel in the signal exchange (sub)pixel array and the display (sub)pixel array in common.

[0067] In some non-limiting examples, the signal exchange portion (sub)pixel array and the display portion (sub)pixel array may each share the size, shape, configuration, orientation, and pitch of at least one (sub)pixel in the signal exchange portion (sub)pixel array and the display portion (sub)pixel array.

[0068] In some non-limiting examples, the signal exchange portion (sub)pixel array and the display portion (sub)pixel array may have a common pitch for at least one (sub)pixel in the signal exchange portion (sub)pixel array and the display portion (sub)pixel array.

[0069] In some non-limiting examples, the pixel density of the signal exchange portion (sub)pixel array may be less than the pixel density of the display portion (sub)pixel array.

[0070] In some non-limiting examples, at least one subpixel of at least one pixel corresponding to a subpixel of a pixel in the display portion (sub)pixel array may be omitted in the signal exchange portion (sub)pixel array.

[0071] In some non-limiting examples, all subpixels of at least one pixel corresponding to subpixels of a pixel present in the display section (sub)pixel array may be omitted in the signal exchange section (sub)pixel array.

[0072] In some non-limiting examples, all subpixels of every other pixel corresponding to subpixels of a pixel present in the display section (sub)pixel array may be omitted in the signal exchange section (sub)pixel array.

[0073] In some non-limiting examples, the omitted subpixels may be selected to maximize the size of at least one void formed by the omitted subpixels.

[0074] In some non-limiting examples, the pixel density in the signal exchange portion (sub)pixel array may be one of 50%, 62.5%, and 75% of the pixel density in the display portion (sub)pixel array.

[0075] In some non-limiting examples, the at least one transparent region may be disposed within at least one void formed by omitting at least one subpixel of at least one pixel in the signal exchange portion (sub)pixel array.

[0076] In some non-limiting examples, the aperture ratio of the transmissive region of the signal exchange portion may be one of about 15-40%, about 20-40%, about 15-35%, and about 20-35%.

[0077] In some non-limiting examples, the aperture of the transmissive region of the signal exchange portion may be one of at least about 5%, at least about 10%, and at least about 15%.

[0078] In some non-limiting examples, the aperture ratio of all radiating areas of the signal exchange portion may be about 12-25%.

[0079] In some non-limiting examples, the aperture ratio of all emissive regions of the signal exchange portion may be about 12-25%, and the aperture ratio of all transmissive regions therein may be about 30-45%.

[0080] In some non-limiting examples, the at least one characteristic may be pitch, and the pitch of the (sub)pixels in the signal exchange portion (sub)pixel array may be smaller than the pitch of the (sub)pixels in the display portion (sub)pixel array.

[0081] In some non-limiting examples, the at least one non-uniformity can include a metallic element.

[0082] In some non-limiting examples, the display panel may further comprise at least one transition region disposed between the display portion and the signal exchange portion, the transition region comprising a transition region (sub)pixel array including a plurality of emissive regions each corresponding to a (sub)pixel, the transition region (sub)pixel array differing in at least one characteristic from both the display portion (sub)pixel array and the signal exchange (sub)pixel array, such that the interposition of the at least one transition region between the display portion (sub)pixel array and the signal exchange (sub)pixel array reduces a visually perceived difference between the display portion (sub)pixel array and the signal exchange (sub)pixel array.

[0083] In some non-limiting examples, the at least one transition region can include at least one transmissive region.

[0084] In some non-limiting examples, at least one transition region may be disposed around a boundary of the signal exchange portion.

[0085] In some non-limiting examples, at least one transition area may surround at least one signal exchange portion, and at least one display portion may surround at least one transition area.

[0086] In some non-limiting examples, the at least one transition region may include a first transition region and a second transition region, the first transition region being disposed between the display portion and the second transition region, the second transition region being disposed between the first transition region and the signal exchange portion, and the transition region (sub)pixel arrangement of the second transition region differing in at least one characteristic from both the transition region (sub)pixel arrangement and the signal exchange portion (sub)pixel arrangement of the first transition region, such that the interposition of the second transition region between the transition region (sub)pixel arrangement and the signal exchange portion (sub)pixel arrangement reduces the visually perceived difference between the transition region (sub)pixel arrangement and the signal exchange portion (sub)pixel arrangement. DETAILED DESCRIPTION OF THE INVENTION

[0087] Layered Devices The present disclosure relates generally to stacked semiconductor devices, and more particularly to optoelectronic devices. Optoelectronic devices may generally include any device that converts electrical signals into photons and vice versa. Non-limiting examples of optoelectronic devices include organic light-emitting diodes (OLEDs).

[0088] An organic optoelectronic device may include any optoelectronic device in which one or more active layers and / or layers thereof are formed primarily from organic (carbon-containing) materials, more particularly organic semiconductor materials.

[0089] 1, there can be seen a cross-sectional view of an exemplary layered semiconductor device 100. In some non-limiting examples, as shown in more detail in FIG. 10, device 100 can comprise multiple layers deposited on a substrate 10.

[0090] A lateral axis identified as the X-axis may be shown along with a longitudinal axis identified as the Z-axis. A second lateral axis identified as the Y-axis may be shown as being substantially transverse to both the X-axis and the Z-axis. At least one of the lateral axes may define a lateral surface of the device 100. The longitudinal axis may define a longitudinal surface of the device 100.

[0091] The layers of device 100 may extend laterally, substantially parallel to a plane defined by the lateral axis. Those skilled in the art will understand that the substantially planar representation shown in FIG. 1 may, in some non-limiting examples, be abstracted for purposes of explanation. In some non-limiting examples, there may be localized substantially planar layers of different thicknesses and dimensions across the lateral extent of device 100, and in some non-limiting examples, layers may be substantially entirely absent and / or may include layers separated by non-planar transition areas (including lateral gaps and even discontinuities).

[0092] Thus, for purposes of illustration, device 100 may be shown in its lateral plane as a substantially layered structure of substantially parallel planar layers, although such a device may locally illustrate a variety of topographies for defining features, each of which may substantially exhibit the layered profile considered in cross-sectional plane.

[0093] In some non-limiting examples, a lateral surface of exposed layer surface 11 of device 100 can include a first portion 101 and a second portion 102. In some non-limiting examples, second portion 102 can include that portion of exposed layer surface 11 of device 100 that is beyond first portion 101.

[0094] Display Panel and User Device 2A , there may be shown a cross-sectional view of an exemplary layered device such as display panel 200. In some non-limiting examples, display panel 200 may include multiple layers deposited on substrate 10, terminating in an outermost layer forming its face 201. In some non-limiting examples, display panel 200 may be a version of device 100.

[0095] 2B-2D, in some non-limiting examples, the display panel 200 may comprise at least one signal exchange portion 203 and at least one display portion 207. The at least one signal exchange portion 203 may comprise at least one (EM radiation) transparent region 31x FIG. 3A and at least one (light) emissive region 1401 FIG. 14A.

[0096] At least one display portion 207 may comprise at least one emissive region 1401. In some non-limiting examples, at least one display portion 207 may further comprise at least one region or portion that allows a greater or lesser degree of transmission of EM radiation therethrough.

[0097] In some non-limiting examples, the at least one display portion 207, individually and / or together with at least one other display portion 207, may substantially surround the at least one signal exchange portion 203. In some non-limiting examples, the at least one signal exchange portion 203 may be positioned proximate an edge of the display panel 200. In some non-limiting examples, the at least one signal exchange portion 203 may be positioned proximate an edge and configured such that the at least one display portion 207 does not completely surround the at least one signal exchange portion 203.

[0098] In some non-limiting examples, at least one signal exchange unit 203 may be positioned near an edge of the display panel 200, including, but not limited to, an edge as shown in FIG. 2B or a corner as shown in FIG. 2C.

[0099] In some non-limiting examples, the at least one signal exchange unit 203 may be positioned substantially centrally within the lateral plane of the display panel 200, as shown in FIG. 2D.

[0100] As shown in FIG. 2B, in some non-limiting examples, at least one signal exchange unit 203 may have a polygonal outline, including, but not limited to, at least one of a substantially square and a rectangular configuration.

[0101] As shown in FIG. 2C, in some non-limiting examples, at least one signal exchange portion 203 may have a curved contour, including, but not limited to, at least one of a substantially circular, oval, and elliptical configuration.

[0102] Those skilled in the art will understand that there are scenarios that require the layout of the (sub)pixels 2210 / 32x in the signal exchange section 203 of the display panel 200 to be more or less similar to the layout of the (sub)pixels 2210 / 32x in the display section 207 of the display panel, including but not limited to simplifying manufacturing, including but not limited to enabling the use of a fine metal mask (FMM) having an aperture layout that is substantially the same for both the signal exchange section 203 and the display section 207 of the display panel, including but not limited to the size, shape, and configuration of the (sub)pixel apertures, and the spacing ("pitch") between adjacent (sub)pixels 2210 / 32x in the signal exchange section 203 being either the same as or an integer multiple of that pitch in the display section 207.

[0103] That being said, examples in the present disclosure may have applicability in scenarios where the layout of the (sub)pixels 2210 / 32x in the signal exchange section 203 may be substantially different from its layout in the display section 207 of the display panel 200.

[0104] In some non-limiting examples, the aperture ratio of the at least one emissive region 1401 of the at least one signal exchanging portion 203 may be substantially the same as the aperture ratio of the at least one emissive region 1401 of the at least one display portion 207, at least in the area adjacent and / or substantially proximate to the at least one signal exchanging portion 203. In some non-limiting examples, the aperture ratio of the display panel 200 may be substantially uniform across it. In at least some applications, there may be scenarios that require the at least one signal exchanging portion 203 and the at least one display portion 207 to have substantially the same aperture ratio, such that the apparent brightness of the display panel 200 may be substantially the same across both the at least one signal exchanging portion 203 and the at least one display portion 207.

[0105] In some non-limiting examples, the pixel density of the at least one emissive region 1401 of the at least one signal exchanging unit 203 may be substantially the same as the pixel density of the at least one emissive region 1401 of the at least one display unit 207, at least in the area adjacent and / or substantially proximate to the at least one signal exchanging unit 203. In some non-limiting examples, the pixel density of the display panel 200 may be substantially uniform across it. In at least some applications, there may be scenarios that require the at least one signal exchanging unit 203 and the at least one display unit 207 to have substantially the same pixel density, such that the resolution of the display panel 200 may be substantially the same across both the at least one signal exchanging unit 203 and the at least one display unit 207, including, but not limited to,

[0106] In some non-limiting examples, the arrangement of the at least one emissive region 1401 of the at least one signal exchanging unit 203 may be substantially the same as the arrangement of the at least one emissive region 1401 of the at least one display unit 207, at least in the area adjacent and / or substantially proximate to the at least one signal exchanging unit 203. In some non-limiting examples, the (sub)pixel layout of the at least one signal exchanging unit 203 may be substantially the same as the (sub)pixel layout of the at least one display unit 207.

[0107] In this disclosure, the term "transmissive region" refers to a region of the display panel 200 that exclusively includes at least one transmissive region 31x that may be configured to allow a greater portion of EM radiation incident on the display panel 200 to be transmitted, at least as compared to another region of the display panel 200 that is not a transmissive region 31x.

[0108] In some non-limiting examples, at least one transmissive region 31x may include and / or be formed by and / or from a transparent conducting material, such as at least one transparent conducting oxide (TCO), including but not limited to ITO, IZO, and / or IGZO, in some non-limiting examples.

[0109] In some non-limiting examples, where the display panel 200 includes, but is not limited to, an OLED display device, at least one emissive region 1401 may emit EM radiation therefrom, including, but not limited to, the form of at least one photon. In some non-limiting examples, a given emissive region 1401 may correspond to a pixel 2210 ( FIG. 22A ) and / or a sub-pixel 32× ( FIG. 3A ) of such pixel 2210. In some non-limiting examples, the pixel 2210 may comprise multiple (sub)pixels 2210 / 32×, each configured to emit EM radiation corresponding to a respective color, including, but not limited to, R (red), G (green), and B (blue), including, but not limited to, the form of photons in a given wavelength range, in some non-limiting examples.

[0110] In some non-limiting examples, pixel 2210 may comprise three (sub)pixels 2210 / 32x, each corresponding to a single (sub)pixel 2210 / 32x for each of three colors, including, but not limited to, R (red) 321, G (red) 322, and B (blue) 323.

[0111] In some non-limiting examples, pixel 2210 can include four (sub)pixels 2210 / 32x, each corresponding to a single (sub)pixel 2210 / 32x of each of two colors, including but not limited to R (red) 321 and B (blue) 323, and two (sub)pixels 2210 / 32x of a third color, including but not limited to G (red) 322.

[0112] In some non-limiting examples, the size and / or shape (“geometry”) of (sub)pixels 2210 / 32x of a given color may be substantially the same or different across multiple pixels 2210.

[0113] In some non-limiting examples, the size and / or geometry of the (sub)pixels 2210 / 32x of the first color may be substantially the same as or different from the size and / or geometry of at least one (sub)pixel 2210 / 32x of the second color and the third color.

[0114] In some non-limiting examples, the relative geometry of at least one (sub)pixel 2210 / 32x of the first color, second color, and third color, and / or the wavelength range emitted by the (sub)pixel 2210 / 32x, may be selected taking into account how various wavelengths are visually processed and / or the presence of engineering constraints, including, but not limited to, power consumption, device reliability, and / or device lifetime.

[0115] Those skilled in the art will appreciate that the particular arrangement of the (sub)pixels 2210 / 32x may vary depending on the design of the display panel 200. In some non-limiting examples, the (sub)pixels 2210 / 32x may be arranged according to known arrangement schemes, including, but not limited to, RGB side-by-side, diamond, and / or PenTile®.

[0116] In some non-limiting examples, the (sub)pixels 2210 / 32x may be arranged in a side-by-side arrangement. In some non-limiting examples, the (color) order of the (sub)pixels 2210 / 32x of the first pixel 2210 may be the same as the (color) order of the (sub)pixels 2210 / 32x of the second pixel 2210. In some non-limiting examples, the (color) order of the (sub)pixels 2210 / 32x of the first pixel 2210 may be different from the (color) order of the (sub)pixels 2210 / 32x of the second pixel 2210.

[0117] In some non-limiting examples, the (sub)pixels 2210 / 32x of adjacent pixels 2210 may be aligned in at least one of a row, a column, and an array arrangement.

[0118] In some non-limiting examples, at least one of the first rows and columns of aligned (sub)pixels 2210 / 32x of adjacent pixels 2210 may include (sub)pixels 2210 / 32x of the same or different colors.

[0119] In some non-limiting examples, at least one of the first of the rows and columns of aligned (sub)pixels 2210 / 32x of an adjacent pixel 2210 may be aligned with at least one of the second and third of the rows and columns of aligned (sub)pixels 2210 / 32x of an adjacent pixel.

[0120] In some non-limiting examples, at least one of the first of the rows and columns of aligned (sub)pixels 2210 / 32x of an adjacent pixel 2210 may be offset or misaligned with at least one of the second and third of the rows and columns of aligned (sub)pixels 2210 / 32x of an adjacent pixel 2210.

[0121] In some non-limiting examples, the (sub)pixels 2210 / 32x of at least one such first, second, and / or third adjacent pixel 2210 in a row and column may be arranged such that the corresponding (sub)pixels 2210 / 32x of each of the first, second, and / or third at least one of the rows and columns may be of a common color.

[0122] In some non-limiting examples, the (sub)pixels 2210 / 32x of at least one such first, second, and / or third adjacent pixel 2210 in a row and column may be arranged such that the corresponding (sub)pixels 2210 / 32x of each of at least one of the first, second, and / or third adjacent pixel 2210 in a row and column may be different colors.

[0123] In some non-limiting examples, in at least one signal exchange unit 203, at least one transmissive region 31x may be disposed between multiple emissive regions 1401. In some non-limiting examples, at least one transmissive region 31x may be disposed between adjacent (sub)pixels 2210 / 32x. In some non-limiting examples, adjacent (sub)pixels 2210 / 32x surrounding at least one transmissive region 31x may form part of a common pixel 2210. In some non-limiting examples, adjacent (sub)pixels 2210 / 32x surrounding at least one transmissive region 31x may be associated with different pixels 2210.

[0124] 2A , face 201 of display panel 200 may extend across its lateral surfaces substantially along a plane defined by a lateral axis. In some non-limiting examples, face 201, or indeed display panel 200, may serve as a face of a user device 210 through which at least one EM signal 231 may be exchanged at an angle relative to the plane of face 201. In some non-limiting examples, user device 210 may be a computing device such as, but not limited to, a smartphone, a tablet, a laptop, and / or an e-reader, and / or some other electronic device such as, but not limited to, a monitor, a television set, and / or a smart device, including, but not limited to, an automobile display and / or windshield, a domestic appliance, and / or a medical, commercial, and / or industrial device.

[0125] In some non-limiting examples, the surface 201 may correspond to and / or mate with the body 220 and / or opening 221 therein in which at least one under-display component 230 may be housed.

[0126] In some non-limiting examples, at least one under-display component 230 may be formed integrally with or as an assembled module with display panel 200 on its surface opposite face 201. In some non-limiting examples, at least one under-display component 230 may be formed on a surface of substrate 10 of display panel 200 opposite face 201.

[0127] In some non-limiting examples, at least one opening 204 can be formed in the display panel 200 to allow exchange of at least one EM signal 231 through the face 201 of the display panel 200 at an angle relative to a horizontal axis of the display panel 200 or a plane defined by a concomitant layer, including but not limited to, the face 201 of the display panel 200. In some non-limiting examples, the at least one EM signal 231 can be exchanged between the at least one under-display component 230 and an external object 20, including but not limited to, a user of the user device 210.

[0128] In some non-limiting examples, the at least one aperture 204 may correspond to at least one transmissive region 31x of the at least one signal exchange portion 203. In some non-limiting examples, a given signal exchange portion 203 may include a plurality of the at least one aperture 204.

[0129] In some non-limiting examples, at least one opening 204 may be understood to include a lack and / or reduction in thickness and / or opacity of a substantially opaque coating that is otherwise disposed across the display panel 200.

[0130] In other words, the at least one EM signal 231 can pass through the at least one opening 204 as it passes through the surface 201. As a result, the at least one EM signal 231 can be considered to exclude any EM radiation that may extend along a plane defined by the lateral axis, including, but not limited to, any current that may be conducted across the deposited layer 130 laterally across the display panel 200.

[0131] Furthermore, those skilled in the art will understand that at least one EM signal 231 may be distinguished from EM radiation itself, including, but not limited to, electrical current and / or the electric field generated thereby, in that at least one EM signal 231, alone or in conjunction with other EM signals 231, may convey some information content, including, but not limited to, an identifier that may distinguish at least one EM signal 231 from other EM signals 231. In some non-limiting examples, information content may be conveyed by specifying, altering, and / or modulating at least one of the wavelength, frequency, phase, timing, bandwidth, and / or other characteristics of at least one EM signal 231.

[0132] In some non-limiting examples, the at least one EM signal 231 passing through the at least one opening 204 of the display panel 200 may include at least one photon and, in some non-limiting examples, may have a wavelength spectrum within at least one of, but not limited to, the visible spectrum, the IR spectrum, and / or the NIR spectrum.

[0133] In some non-limiting examples, the at least one EM signal 231 passing through the at least one opening 204 of the display panel 200 may include ambient light incident thereon.

[0134] In some non-limiting examples, at least one EM signal 231 exchanged through at least one opening 204 in the display panel 200 may be transmitted and / or received by at least one under-display component 230.

[0135] In some non-limiting examples, the at least one under-display component 230 may have a size larger than a single transmissive region 31x, but may also underlie multiple transmissive regions 31x as well as at least one emissive region 1401 extending therebetween. Similarly, in some non-limiting examples, the at least one under-display component 230 may have a size larger than a single one of the at least one opening 204.

[0136] In some non-limiting examples, the at least one under-display component 230 may include a receiver 230 adapted to receive and process at least one EM signal 231 passing over the user device 210 and then passing through the at least one aperture 204. r Such a receiver 230 may include r Non-limiting examples include an under-display camera (UDC) and / or sensors including, but not limited to, an IR sensor, a NIR sensor, a LIDAR detection module, a fingerprint detection module, a light detection module, an IR (proximity) detection module, an iris recognition detection module, and / or a facial recognition detection module.

[0137] In some non-limiting examples, the at least one under-display component 230 includes a transmitter 230 adapted to emit at least one EM signal 231 through the at least one aperture 204 beyond the user device 210. t Such a transmitter 230 may include tNon-limiting examples include EM radiation sources including, but not limited to, a built-in flash, a flashlight, an IR emitter, and / or an NIR emitter, and / or a LIDAR detection module, a fingerprint detection module, a light detection module, an IR (proximity) detection module, an iris recognition detection module, and / or a facial recognition detection module.

[0138] In some non-limiting examples, at least one EM signal 231 passing through at least one opening 204 in the display panel 200 beyond the user device 210 may include, but is not limited to, a transmitter 230 t and emitting from the display panel 200 through at least one opening 204 in the display panel 200 to the receiver 230. r , and the at least one under-display component 230 comprising:

[0139] In some non-limiting examples, there may be multiple under-display components 230 within the user device 210, a first of which may include a transmitter 230 for emitting at least one EM signal 231 through at least one aperture 204 beyond the user device 210. t a second component of which is a receiver 230 for receiving at least one EM signal 231; r In some non-limiting examples, such a transmitter 230 t and receiver 230 r may be embodied in a single common one of the at least one under-display component 230.

[0140] In some non-limiting examples, at least one under-display component 230 may not emit an EM signal 231, but the display panel 200 may include optoelectronic devices, including but not limited to photoluminescent devices, including but not limited to OLED devices, that emit at least one EM signal 231.

[0141] In some non-limiting examples, object 20 may present a surface for reflecting at least one EM signal 231. In some non-limiting examples, at least one EM signal 231 may be light, which may be ambient light reflected from a surface of object 20, as a non-limiting example.

[0142] Pixel arrangement with interspersed transparent regions in a signal exchange section to maintain pixel density in a display section Referring now to FIG. 3A, there is shown, by way of non-limiting example, an exemplary (sub)pixel arrangement 300a in plan view that may be applied across the signal exchange portion 203 of the display panel 200.

[0143] In some non-limiting examples, the pixel density of the signal exchange portion 203 of the display panel 200 may be substantially the same as the pixel density of the display portion 207 of the display panel 200 .

[0144] In some non-limiting examples, the aperture ratio of the at least one emissive region 1401 of the at least one signal exchanging unit 203 may be substantially the same as the aperture ratio of the at least one emissive region 1401 of the at least one display unit 207, at least in the area adjacent and / or substantially proximate to the at least one signal exchanging unit 203. In some non-limiting examples, this can be achieved by making at least one of the size, shape, and orientation of the emissive region 1401 corresponding to the (sub)pixel 2210 / 32x substantially the same in both the at least one signal exchanging unit 203 and the at least one display unit 207.

[0145] In some non-limiting examples, at least one of the size, shape, and configuration of the (sub)pixels 2210 / 32x in the signal exchange portion 203 of the display panel 200 may be different, including but not limited to, reduced in size, from the size, shape, and configuration of the display portion 207 of the display panel 200 to provide space to accommodate additional transparent regions 31x, including but not limited to, maximizing the aperture ratio of the transparent regions 31x in the signal exchange portion 203.

[0146] Those skilled in the art will readily understand that changing at least one of the size, shape, and orientation of the emissive region 1401 of the (sub)pixel 2210 / 32x between the signal exchange portion 203 and the display portion 207 of the display panel 200 may, in some non-limiting examples, change the aperture ratio therebetween, but the pixel density therebetween may remain unchanged.

[0147] In some non-limiting examples, the aperture ratio of all emissive areas 1401 of (sub)pixels 2210 / 32x in the signal exchange section 203 of the display panel 200 may be one of about 20% or less, about 15% or less, and about 10% or less.

[0148] In some non-limiting examples, the aperture ratio of the transmissive regions 31x in the signal exchanging portion 203 of the display panel 200 may be the sum of the aperture ratios of all the transmissive regions 31x present in such portion, and may be one of about 50% or less, about 45% or less, about 40% or less, about 35% or less, about 33% or less, about 30% or less, and about 25% or less. In some non-limiting examples, the aperture ratio of the transmissive regions 31x may be one of at least about 5%, at least about 10%, and at least about 15%.

[0149] In some non-limiting examples, the aperture ratio of all emissive regions 1401 of (sub)pixels 2210 / 32x in the signal exchanging portion 203 of the display panel 200 may be the sum of the aperture ratios of all (sub)pixels 2210 / 32x present within such portion, including but not limited to the first subpixel 321, the second subpixel 322, and the third subpixel 323, and may be approximately 5-10%, and the aperture ratio of the transmissive region 31x therein may be approximately 30-50%.

[0150] In some non-limiting examples, the aperture ratio of all emissive regions 1401 of (sub)pixels 2210 / 32x within the signal exchange portion 203 of the display panel 200 may be the sum of the aperture ratios of all (sub)pixels 2210 / 32x present within such portion, including but not limited to the first subpixel 321, the second subpixel 322, and the third subpixel 323, and may be approximately 6-9%, and the aperture ratio of the transmissive regions 31x therein may be approximately 35-45%.

[0151] In some non-limiting examples, the total aperture ratio of all emissive regions 1401 and transmissive regions 31x of (sub)pixels 2210 / 32x in the signal exchanging portion 203 of the display panel 200 may be one of about 60% or less, about 55% or less, about 50% or less, about 45% or less, and about 40% or less. In some non-limiting examples, the total aperture ratio of all emissive regions 1401 and transmissive regions 31x of (sub)pixels 2210 / 32x in the signal exchanging portion 203 of the display panel 200 may be one of about 30-60%, about 35-60%, about 40-60%, about 35-55%, about 40-50%, about 45-55%, and about 45-50%.

[0152] In some non-limiting examples, the size of at least one transmissive region 31x can be at least about 10 microns. In some non-limiting examples, the size of at least one transmissive region 31x can be one of about 10-150 microns, about 10-130 microns, about 15-100 microns, about 20-80 microns, about 20-65 microns, about 25-60 microns, and about 30-50 microns.

[0153] In some non-limiting examples, the apparent or visually perceived difference, such as between the signal exchange portion 203 and the display portion 207, as a result of such a change in aperture ratio may be reduced by at least one means including, but not limited to, the following: maintaining a relative ratio between at least one of the aperture ratio, size, and shape of the emissive area 1401 of the (sub)pixel 2210 / 32x, such as between the signal exchange portion 203 and the display portion 207 of the display panel 200; and modifying at least one characteristic of at least one of the (sub)pixels 2210 / 32x in at least one of the signal exchange portion 203 and the display portion 207 of the display panel 200, including but not limited to the intensity and current density of the emitted radiation; Establishing at least one transition region around and / or between at least one of the signal exchange portion 203 and the display portion 207 of the display panel 200, each having an intermediate aperture ratio, size, shape, orientation, and / or pitch to distribute such apparent or visually perceived difference therebetween over an increased lateral surface of the display panel 200.

[0154] A pixel with four subpixels in a 1:2:1 ratio In some non-limiting examples, the (sub)pixel array 300a may comprise a single transmissive region 31x and multiple emissive regions 1401, which in some non-limiting examples may correspond to four (sub)pixels 2210 / 32x of the pixel 2210. In some non-limiting examples, the transmissive region 31x may be located within and surrounded by the emissive region 1401 corresponding to the four (sub)pixels 2210 / 32x.

[0155] In some non-limiting examples, the (sub)pixel array 300a may be defined by a first composition axis 340 and a second composition axis 345, which may both lie in the lateral plane of the display panel 200 and intersect at an intersection point. In some non-limiting examples, the first composition axis 340 may be substantially orthogonal to the second composition axis 345.

[0156] In some non-limiting examples, transmissive region 31x may be centered in plan view at the intersection of first configuration axis 340 and second configuration axis 345.

[0157] In some non-limiting examples, the lateral extent of permeable region 31x may be defined by its closed permeable boundary or perimeter 315. In some non-limiting examples, permeable boundary 315 may be symmetrical about at least one of first configuration axis 340 and second configuration axis 345. In some non-limiting examples, as shown, permeable boundary 315 may be symmetrical about both first configuration axis 340 and second configuration axis 345.

[0158] In some non-limiting examples, the permeable region 310 may have a substantially quadrilateral permeable boundary 315 defined by and including a plurality of linear permeable boundary segments 391-394. In some non-limiting examples, at least one of the permeable boundary segments 391, 393 may be substantially parallel to the first configuration axis 340. In some non-limiting examples, there may be two of such permeable boundary segments 391, 393 that are substantially parallel to the first configuration axis 340. In some non-limiting examples, at least one of the permeable boundary segments 392, 394 may be substantially parallel to the second configuration axis 345. In some non-limiting examples, there may be two of such permeable boundary segments 392, 394 that are substantially parallel to the second configuration axis 345.

[0159] In some non-limiting examples, none of the permeable boundary segments 391-394 may be parallel to one another.

[0160] In some non-limiting examples, such as that shown in FIG. 3A, each of the permeable boundary segments 391-394 may be of substantially equal length.

[0161] In some non-limiting examples, none of the permeable boundary segments 391-394 may have substantially equal lengths.

[0162] 3B, there is shown, by way of non-limiting example, an exemplary (sub)pixel arrangement 300b in plan view that may be applied across the signal exchange portion 203 of the display panel 200. The (sub)pixel arrangement 300b may appear different from the (sub)pixel arrangement 300a in that the transmissive regions 31x (and (sub)pixels 2210 / 32x) exhibit substantially rounded corners.

[0163] As described herein, without wishing to be bound by any particular theory, it can be hypothesized that when the closing boundary of the transmissive region 31x includes at least one nonlinear and / or curved segment, the EM signal incident thereon and transmitted therethrough can exhibit a less distinctive and / or more uniform diffraction pattern that facilitates mitigation of interference caused by the diffraction pattern.

[0164] In some non-limiting examples, multiple permeable boundary segments 391-394 may be joined by, or may extend between, at least one substantially curved permeable boundary segment 396-399. Thus, in some non-limiting examples, an endpoint of each of the linear permeable boundary segments 391-394 may be joined to an endpoint of a curved permeable boundary segment 396-399.

[0165] In some non-limiting examples, at least one of the curved permeable boundary segments 396-399 may have a minimum radius of curvature. In some non-limiting examples, such a minimum radius of curvature, which may correlate with constraints in the manufacturing process, may be one of about 8 microns and about 10 microns.

[0166] In some non-limiting examples, the pair of second subpixels 322 may be positioned symmetrically with respect to at least one of the first configuration axis 340 and the second configuration axis 345, in some non-limiting examples, the first configuration axis 340, with the transmissive region 31x positioned therebetween. In some non-limiting examples, the first subpixel 321 and the third subpixel 323 may be positioned symmetrically with respect to at least one of the first configuration axis 340 and the second configuration axis 345, in some non-limiting examples, the second configuration axis 345, with the transmissive region 31x positioned therebetween.

[0167] In some non-limiting examples, at least one of the radiating regions 1401 may have a substantially quadrilateral boundary or contour defined by a plurality of linear segments.

[0168] In the (sub)pixel array 300a, the four (sub)pixels 2210 / 32x may correspond, in some non-limiting examples, to a first subpixel 321, a pair of second subpixels 322, and a third subpixel 323. In some non-limiting examples, the first subpixel 321 may correspond to the color R (red), the second subpixel 322 may correspond to the color G (green), and the third subpixel 323 may correspond to the color B (blue).

[0169] In some non-limiting examples, the transmissive region 31x may be positioned between a pair of second subpixels 322 corresponding to a common pixel 2210. In some non-limiting examples, the transmissive region 31x may be positioned between a second subpixel 322 corresponding to a first pixel 2210 and a second subpixel 322 corresponding to a second pixel 2210. In some non-limiting examples, the spacing between such a transmissive region 31x and the first second subpixel 322 may be substantially the same as the spacing between such a transmissive region 31x and the second second subpixel 322.

[0170] In some non-limiting examples, the transmissive region 31x may be positioned between the first subpixel 321 and the third subpixel 323 corresponding to the common pixel 2210. In some non-limiting examples, the transmissive region 31x may be positioned between the first subpixel 321 corresponding to the first pixel 2210 and the third subpixel 323 corresponding to the second pixel 2210. In some non-limiting examples, the spacing between such a transmissive region 31x and the first subpixel 321 may be substantially the same as the spacing between such a transmissive region 31x and the third subpixel 323.

[0171] In some non-limiting examples, a given transparent region 31x may be positioned both between the first subpixel 321 and the third subpixel 323 and between two second subpixels 322.

[0172] In some non-limiting examples, the lateral extent of the first subpixel 321 may be defined by its closed first subpixel boundary 355. As shown, in some non-limiting examples, the first subpixel boundary 355 may comprise a plurality of substantially linear first subpixel segments 351-354. In some non-limiting examples, at least one of the first subpixel segments 352, 354 may be substantially parallel to, adjacent to, and in some non-limiting examples, adjacent to a corresponding at least one of the transparent boundary segments 392, 394 of the transparent region 31x.

[0173] In some non-limiting examples, the majority of the permeable boundary segments 391-394 may be substantially parallel to the adjacent sub-pixel boundary segments 351-354, 361-364, 371-374.

[0174] In some non-limiting examples, as shown, for first subpixel 321, first subpixel segment 354 may be adjacent to, and / or in some non-limiting examples, adjacent to, the corresponding permeable boundary segment 392.

[0175] In some non-limiting examples, at least one first subpixel segment 354 and its corresponding at least one adjacent permeable boundary segment 392 may be separated by a minimum distance. In some non-limiting examples, such minimum distance may be one of about 5 microns, about 6 microns, about 8 microns, about 10 microns, about 11 microns, and about 12 microns, although this may be correlated to constraints in the manufacturing process. In some non-limiting examples, such minimum distance may be one of about 5-15 microns, about 6-12 microns, and about 8-10 microns.

[0176] 3B, multiple linear first sub-pixel segments 351-354 may be joined by or extend between at least one substantially curved first sub-pixel segment 356-359. Thus, in some non-limiting examples, an endpoint of each of the linear first sub-pixel segments 351-354 may be joined to an endpoint of a curved first sub-pixel segment 356-359.

[0177] In some non-limiting examples, at least one of the curved first subpixel segments 356-359 may have a minimum radius of curvature. In some non-limiting examples, such a minimum radius of curvature, which may correlate with constraints in the manufacturing process, may be one of about 8 microns and about 10 microns.

[0178] In some non-limiting examples, the lateral extent of one of the second subpixels 322 may be defined by its closed second subpixel boundary 365. As shown, in some non-limiting examples, the second subpixel boundary 365 may comprise a plurality of substantially linear second subpixel segments 361-364. In some non-limiting examples, at least one of the second subpixel segments 361, 363 may be substantially parallel to, adjacent to, and in some non-limiting examples, adjacent to a corresponding at least one of the transparent boundary segments 391, 393 of the transparent region 31x.

[0179] In some non-limiting examples, as shown, the second subpixel 322 a With respect to the second sub-pixel segment 363, the second sub-pixel segment 363 may be adjacent to the corresponding permeable boundary segment 391 and / or may be adjacent, in some non-limiting examples.

[0180] In some non-limiting examples, as shown, the second subpixel 322 bWith respect to the second sub-pixel segment 361, the second sub-pixel segment 361 may be adjacent to the corresponding permeable boundary segment 393 and / or may be adjacent, in some non-limiting examples.

[0181] In some non-limiting examples, at least one second subpixel segment 363 and at least one corresponding permeable boundary segment 391 of an adjacent permeable region 31x may be separated by a minimum distance. In some non-limiting examples, at least one second subpixel segment 361 and at least one corresponding permeable boundary segment 393 of an adjacent permeable region 31x may be separated by a minimum distance. In some non-limiting examples, such minimum distance may be one of about 5 microns, about 6 microns, about 8 microns, about 10 microns, about 11 microns, and about 12 microns, although this may be correlated to constraints in the manufacturing process. In some non-limiting examples, such minimum distance may be one of about 5-15 microns, about 6-12 microns, and about 8-10 microns.

[0182] 3B, multiple linear second subpixel segments 361-364 may be joined by or extend between at least one substantially curved second subpixel segment 366-369. Thus, in some non-limiting examples, an endpoint of each of the linear second subpixel segments 361-364 may be joined to an endpoint of a curved second subpixel segment 366-369.

[0183] In some non-limiting examples, at least one of the curved second subpixel segments 366-369 may have a minimum radius of curvature. In some non-limiting examples, such a minimum radius of curvature, which may correlate with constraints in the manufacturing process, may be one of about 8 microns and about 10 microns.

[0184] In some non-limiting examples, the lateral extent of the third subpixel 323 may be defined by its closed third subpixel boundary 375. As shown, in some non-limiting examples, the third subpixel boundary 375 may comprise a plurality of substantially linear third subpixel segments 371-374. In some non-limiting examples, at least one of the third subpixel segments 372, 374 may be substantially parallel to, adjacent to, and in some non-limiting examples, adjacent to a corresponding at least one of the transparent boundary segments 392, 394 of the transparent region 31x.

[0185] In some non-limiting examples, as shown, for the third subpixel 323, the third subpixel segment 372 may be adjacent to the corresponding permeable boundary segment 394, and / or may be adjacent in some non-limiting examples.

[0186] In some non-limiting examples, at least one third subpixel segment 372 and at least one corresponding permeable boundary segment 394 of an adjacent permeable region 31x may be separated by a minimum distance. In some non-limiting examples, such minimum distance may be one of about 5 microns, about 6 microns, about 8 microns, about 10 microns, about 11 microns, and about 12 microns, although this may be correlated to constraints in the manufacturing process. In some non-limiting examples, such minimum distance may be one of about 5-15 microns, about 6-12 microns, and about 8-10 microns.

[0187] 3B, multiple linear third subpixel segments 371-374 may be joined by or extend between at least one substantially curved third subpixel segment 376-379. Thus, in some non-limiting examples, an endpoint of each of the linear third subpixel segments 371-374 may be joined to an endpoint of a curved third subpixel segment 376-379.

[0188] In some non-limiting examples, at least one of the curved third subpixel segments 376-379 may have a minimum radius of curvature. In some non-limiting examples, such a minimum radius of curvature, which may correlate with constraints in the manufacturing process, may be one of about 8 microns and about 10 microns.

[0189] Thus, the (sub)pixel array 300a maintains both a high aperture ratio and a high sub-pixel density of the (sub)pixels 2210 / 32x, while providing therein a transparent region 31x having an area that allows exchange of the EM signal 231 through the signal exchange section 203 of the display panel 200.

[0190] In some non-limiting examples, the (sub)pixel array 300a may be configured such that a plurality of connected non-overlapping contour vectors 331-334, including but not limited to four, each beginning at an end point located within, but not limited to, the centroid of the first emitting region 1401, and ending at an end point located within, but not limited to, the centroid of the second emitting region 1401, where the first and second emitting regions 1401 are associated with a pair of sub-pixels 32x without passing through the transparent region 31x, define a contour 330, 336, 337, which may resemble a quadrilateral or box 330, in some non-limiting examples.

[0191] In some non-limiting examples, the first radiation region 1401 and the second radiation region 1401 may substantially abut one another such that corresponding contour vectors 331-334 may extend laterally across at least a portion of the first radiation region 1401 and at least a portion of the second radiation region 1401 with nothing between them.

[0192] In some non-limiting examples, the first radiation region 1401 and the second radiation region 1401 may be spaced apart such that corresponding contour vectors 331-334 may extend laterally across at least a portion of the first radiation region 1401 and at least a portion of the second radiation region 1401 with nothing between them.

[0193] In some non-limiting examples, the positions of the first subpixel 321, the pair of second subpixels 322, and the third subpixel 323 may be such that the box 330 may define at least one of a square, a rectangle, a parallelogram, and a trapezoid. In some non-limiting examples, the positions of the first subpixel 321, the pair of second subpixels 322, and the third subpixel 323 may be such that none of the contour vectors 331-334 may be substantially equal in length. In some non-limiting examples, the positions of the first subpixel 321, the pair of second subpixels 322, and the third subpixel 323 may be such that at least two of the contour vectors 331-334 may be substantially equal in length. In some non-limiting examples, the positions of the first subpixel 321, the pair of second subpixels 322, and the third subpixel 323 may be such that none of the contour vectors 331-334 may be parallel to one another.

[0194] In some non-limiting examples, contour 330 can occlude at least one permeable region 31x. In some non-limiting examples, contour vectors 331-334 of contours 330, 336, 337 can surround permeable region 31x and, in some non-limiting examples, can avoid passing through permeable region 31x.

[0195] 3C, the signal exchange portion 203 of the display panel 200 is shown with the (sub)pixel array 300a replicated across its lateral faces. It can be seen that a plurality of adjacent contours 330, 336, 337, including but not limited to four adjacent boxes 330, each having a line segment passing through the centroid of a common (sub)pixel 2210 / 32x, can be combined to define a unit cell 335. In the figure, the unit cell 335 b may have a B (blue) subpixel 323 as the common (sub)pixel 2210 / 32x, but those skilled in the art will recognize that in some non-limiting examples, the common (sub)pixel 2210 / 32x may also have an R (red) subpixel 321 (unit cell 335 r ) or one of the pair of G (green) subpixels 322 (unit cell 335 ga or 335 gb This may be, in some non-limiting examples, 335 ga It will be understood that the common (sub)pixel 2210 / 32x may be considered to be a vertically or horizontally flipped version of, or a version rotated substantially about 90° in either a clockwise or counterclockwise direction. Whatever the color of the common (sub)pixel 2210 / 32x, in some non-limiting examples, adjacent unit cells 335 have common (sub)pixels 2210 / 32x of the same color.

[0196] Those skilled in the art will appreciate that in some non-limiting examples, the unit cell 335 may constitute a repeating unit of an array of (sub)pixels 2210 / 32x in the signal exchange portion 203. In some non-limiting examples, the unit cell 335 may be the smallest size repeating unit.

[0197] Those skilled in the art will recognize that, in some non-limiting examples, unit cell 335 is a R (red) subpixel 321 (unit cell 335 r ) or one of the pair of G (green) subpixels 322 (unit cell 335 ga or 335 gb) or B (blue) subpixel 323 (unit cell 335 b ) can be considered as a repetition of the unit cell 335.

[0198] In some non-limiting examples, at least one contour 330, 336, 337 of a unit cell 335 can occlude at least one permeable region 31x. In some non-limiting examples, each of the contours 330, 336, 337 of a unit cell 335 can occlude at least one permeable region 31x.

[0199] In some non-limiting examples, the unit cell 335 may include multiple contours 330, 336, 337 of substantially similar shapes and sizes. In some non-limiting examples, the unit cell 335 may include contours 330, 336, 337, none of which have at least one of substantially equal shapes and sizes.

[0200] 3D , there is shown, by way of non-limiting example, an exemplary (sub)pixel arrangement 300d in plan view that may be applied across the signal exchange portion 203 of the display panel 200. The (sub)pixel arrangement 300d may appear different from the (sub)pixel arrangement 300a in that the transmissive regions 31x are substantially rotated by about 90° (in either the clockwise or counterclockwise direction).

[0201] Therefore, a parallel relationship between the linear transparent boundary segments 391-394 and at least one of the linear first sub-pixel segments 351-354, the linear second sub-pixel segments 361-364, and the linear third sub-pixel segments 371-374 may not be maintained.

[0202] In some non-limiting examples, the first configuration axis 340 and the second configuration axis 345 can each be considered to be rotated substantially by about 90 degrees (in either the clockwise or counterclockwise direction).

[0203] If so, in some non-limiting examples, parallelism may be maintained between at least one of the first composition axis 340 and the second composition axis 345 and the linear permeable boundary segments 391-394. However, in such cases, parallelism may not be considered to be maintained between at least one of the first composition axis 340 and the second composition axis 345 and at least one of the linear first sub-pixel segments 351-354, the linear second sub-pixel segments 361-364, and the linear third sub-pixel segments 371-374.

[0204] In some non-limiting examples, at least one of the contour vectors 331-334, including but not limited to at least one of the contour vectors 332, 334, may be substantially parallel to the first composition axis 340. In some non-limiting examples, at least one of the contour vectors 331-334, including but not limited to at least one of the contour vectors 331, 333, may be substantially parallel to the second composition axis 340.

[0205] 3E, there is shown, by way of non-limiting example, an exemplary (sub)pixel arrangement 300e in plan view that may be applied across the signal exchange portion 203 of the display panel 200. The (sub)pixel arrangement 300e may appear different from the (sub)pixel arrangement 300d in that at least one of the transmissive boundary segments 391, 393 may be of a first length and at least one of the transmissive boundary segments 392, 394 may be of a second length that is different from the first length.

[0206] 3F, there is shown, by way of non-limiting example, an exemplary (sub)pixel arrangement 300f in plan view that may be applied across the signal exchange portion 203 of the display panel 200. The (sub)pixel arrangement 300f may appear different from the (sub)pixel arrangement 300e in that the transmissive regions 31x are substantially rotated by about 90° (in either the clockwise or counterclockwise direction).

[0207] 3G, there is shown, by way of non-limiting example, an exemplary (sub)pixel arrangement 300g in plan view that may be applied across the signal exchange portion 203 of the display panel 200. The (sub)pixel arrangement 300g may appear to differ from the (sub)pixel arrangement 300a in that at least one of the first subpixel 321, the second subpixel 322, and the third subpixel 323 is substantially rotated by approximately 90° (in either a clockwise or counterclockwise direction).

[0208] Therefore, a parallel relationship between the linear transparent boundary segments 391-394 and at least one of the linear first sub-pixel segments 351-354, the linear second sub-pixel segments 361-364, and the linear third sub-pixel segments 371-374 may not be maintained.

[0209] In some non-limiting examples, it may be assumed that a parallel relationship is maintained between at least one of the first composition axis 340 and the second composition axis 345 and at least one of the linear first sub-pixel segments 351-354, the linear second sub-pixel segments 361-364, and the linear third sub-pixel segments 371-374. However, in such cases, in some non-limiting examples, a parallel relationship may not be maintained between at least one of the first composition axis 340 and the second composition axis 345 and the linear transmissive boundary segments 391-394.

[0210] 3H, there is shown, by way of non-limiting example, an exemplary (sub)pixel arrangement 300h in a plan view that may be applied across the signal exchange portion 203 of the display panel 200. The (sub)pixel arrangement 300h may appear to differ from the (sub)pixel arrangement 300g in that at least one of the linear first sub-pixel segments 351-354, the linear second sub-pixel segments 361-364, and the linear third sub-pixel segments 371-374 (shown as the linear second sub-pixel segments 361-364) are not all of substantially equal length, and may, in some non-limiting examples, be joined by and extend between at least one respective of the at least one curved first sub-pixel segment 356-359, the at least one curved second sub-pixel segment 366-369, and the at least one curved third sub-pixel segment 376-379 (shown as each of them).

[0211] In some non-limiting examples, at least one of the first subpixel segments 351-354, including but not limited to segments 351 and 353, may have a first length, and at least one of the first subpixel segments 351-354, including but not limited to segments 352 and 354, may have a second length that is different from the first length.

[0212] In some non-limiting examples, at least one of the second subpixel segments 361-364, including but not limited to segments 361 and 363, may have a first length, and at least one of the second subpixel segments 361-364, including but not limited to segments 362 and 364, may have a second length that is different from the first length.

[0213] In some non-limiting examples, at least one of the third subpixel segments 371-374, including but not limited to segments 371, 373, may have a first length, and at least one of the third subpixel segments 371-374, including but not limited to segments 372, 374, may have a second length that is different from the first length.

[0214] In FIG. 3I, the signal exchange part 203 of the display panel 200 is shown with a (sub)pixel array 300g replicated across its lateral faces.

[0215] Referring now to FIG. 3J, an exemplary (sub)pixel arrangement 300j in plan view that may be applied across the signal exchange portion 203 of the display panel 200 is shown, by way of non-limiting example. In some non-limiting examples, at least one of the size, shape, and orientation of the emissive region 1401 corresponding to at least one (sub)pixel 2210 / 32x in the signal exchanging portion 203 of the display panel 200 may be substantially identical to at least one of the size, shape, and orientation of the emissive region 1401 corresponding to at least one (sub)pixel 2210 / 32x in the display portion 207 of the display panel 200, as described herein in connection with at least one (sub)pixel array 300a, although in some non-limiting examples, at least one of the size, shape, and orientation of the emissive region 1401 corresponding to at least one (sub)pixel 2210 / 32x in the signal exchanging portion 203 of the display panel 200 may be different from at least one of the size, shape, and orientation of the emissive region 1401 corresponding to at least one (sub)pixel 2210 / 32x in the display portion 207 of the display panel 200.

[0216] In the (sub)pixel array 300j, the first subpixel 321 may be shown as having an emissive region 1401 in the signal exchange portion 203 having an exemplary size, shape, and orientation as indicated by the signal exchange first subpixel outline 350, which may be compared and contrasted with the exemplary size, shape, and orientation of the corresponding emissive region 1401 in the display portion 207 as indicated by the display first subpixel outline 355 superimposed thereon. Similarly, the second subpixel 322 may be shown as having an emissive region 1401 in the signal exchange portion 203 having an exemplary size, shape, and orientation as indicated by the signal exchange second subpixel outline 360, which may be compared and contrasted with the exemplary size, shape, and orientation of the corresponding emissive region 1401 in the display portion 207 as indicated by the display second subpixel outline 365 superimposed thereon, and the third subpixel 323 may be shown as having an emissive region 1401 in the signal exchange portion 203 having an exemplary size, shape, and orientation as indicated by the signal exchange third subpixel outline 370, which may be compared and contrasted with the exemplary size, shape, and orientation of the corresponding emissive region 1401 in the display portion 207 as indicated by the display third subpixel outline 375 superimposed thereon.

[0217] In some non-limiting examples, the size of the at least one emissive region 1401 of a first subpixel 321, including but not limited to the signal exchange portion 203 of the display panel 200, may exceed the size of the corresponding at least one emissive region 1401 of the second subpixel 322. In some non-limiting examples, the size of the at least one emissive region 1401 of the third subpixel 323 may exceed the size of the corresponding at least one emissive region 1401 of the first subpixel 321.

[0218] As shown in (sub)pixel array 300j, in some non-limiting examples, the orientation of the emissive region 1401 of (sub)pixel 2210 / 32x in the signal exchange portion 203 of display panel 200 is the orientation of the emissive region 1401 of (sub)pixel 2210 / 32x in the display portion of display panel 200 by rotating the emissive region 1401 by substantially about 90° (in either a clockwise or counterclockwise direction) relative to the emissive region 1401 of (sub)pixel 2210 / 32x in the display panel 200.

[0219] As shown in (sub)pixel array 300j, in some non-limiting examples, the size of at least one emissive region 1401 of at least one (sub)pixel 2210 / 32x in the signal interchange portion 203 of the display panel 200 may be such that the diagonal length of the at least one emissive region 1401 of at least one (sub)pixel 2210 / 32x in the signal interchange portion 203 of the display panel 200 is greater than or equal to the size of the corresponding emissive region 1401 of the corresponding (sub)pixel 2210 / 32x in the display portion of the display panel 200. Alternatively and / or additionally, at least one emissive region 1401 of at least one (sub)pixel 2210 / 32x in the signal exchange portion 203 of the display panel 200 may be reduced in size so as to be substantially equal to one of the straight line segments of the boundary of the corresponding emissive region 1401 of the corresponding (sub)pixel 2210 / 32x in the display portion 207 of the display panel 200, so that when superimposed as shown, the emissive region 1401 of at least one (sub)pixel 2210 / 32x in the signal exchange portion 203 of the display panel 200 appears to be substantially surrounded by the edge of the corresponding emissive region 1401 of the corresponding (sub)pixel 2210 / 32x in the display portion 207 of the display panel 200.

[0220] In some non-limiting examples, the length of at least one of the linear first subpixel segments 351-354 in the (sub)pixel array 300j may be, but is not limited to, approximately 11.6 microns. In some non-limiting examples, the length of at least one of the linear second subpixel segments 361-364 in the (sub)pixel array 300j may be, but is not limited to, approximately 8.7 microns. In some non-limiting examples, the length of at least one of the linear third subpixel segments 371-374 in the (sub)pixel array 300j may be, but is not limited to, approximately 14.5 microns.

[0221] In some non-limiting examples, both rotating and reducing the size of at least one emissive region 1401 of at least one (sub)pixel 2210 / 32x in the signal exchange portion 203 of the display panel 200 relative to the corresponding emissive region 1401 of the corresponding (sub)pixel 2210 / 32x in the display portion 207 of the display panel 200 can provide separation between multiple adjacent (sub)pixels 2210 / 32x in the signal exchange portion 203 of the display panel 200 such that at least one transmissive region 31x can be introduced therebetween without changing the pixel density between the signal exchange portion 203 and the display portion 207 of the display panel 200.

[0222] In some non-limiting examples, the pixel density exhibited by the signal exchange portion 203 of the display panel 200, including but not limited to the (sub)pixel array 300j, may be one of at least about 300 ppi, at least about 350 ppi, and at least about 400 ppi. In some non-limiting examples, the pixel density exhibited by the signal exchange portion 203 of the display panel 200, including but not limited to the (sub)pixel array 300j, may be about 430 ppi.

[0223] FIG. 3K shows signal exchange portion 203 of display panel 200 with alternating instances of (sub)pixel array 300e and (sub)pixel array 300f replicated across its lateral faces (with some features omitted, including but not limited to linear second sub-pixel segments 361-364 having different lengths, and intervening rounded sub-pixel segments between the linear sub-pixel segments).

[0224] In some non-limiting examples, the transmissive regions 31x may be regularly spaced along at least one configuration axis 340, 345.

[0225] In some non-limiting examples, the first sub-pixel 321 defines a second transmissive region 31x b a first transparent region 31x separated from the a may be spaced apart by a first separation distance as represented by arrow 381 in (sub)pixel array 300k, but is not limited to such, and in some non-limiting examples, the first separation distance may be substantially about 57.66 microns.

[0226] In some non-limiting examples, the second sub-pixel 322 defines a third transmissive region 31x c a second transparent region 31x separated from the b may be spaced apart by a second separation distance as represented by arrow 382 in (sub)pixel array 300k, but is not limited to this, and in some non-limiting examples, the second separation distance may be substantially about 59.11 microns.

[0227] In some non-limiting examples, the third sub-pixel 323 defines a fourth transmissive region 31x d a third permeable region 31x separated from the c may be spaced apart by a third separation distance as represented by arrow 383 in (sub)pixel array 300k, but is not limited thereto, and the third separation distance may be substantially about 60.56 microns in some non-limiting examples.

[0228] In some non-limiting examples, the distance between the center of a first subpixel 321 and its adjacent third subpixel 323, including but not limited to, as represented by any one of the dashed lines 384 in the (sub)pixel array 300k, may be substantially about 59.11 microns.

[0229] In some non-limiting examples, a third separation distance, including but not limited to, as represented by arrow 383 in (sub)pixel array 300k, may exceed a first separation distance, including but not limited to, as represented by arrow 381 in (sub)pixel array 300k.

[0230] In some non-limiting examples, the array of transparent regions 31x may be arranged such that the distance between adjacent transparent regions 31x in such an array alternates along at least one composition axis 340, 345 between a first separation distance, as represented by arrow 381 in (sub)pixel array 300k, and a third separation distance, as represented by arrow 383 in (sub)pixel array 300k.

[0231] In some non-limiting examples, the transmissive regions 31x may be irregularly spaced along at least one axis of configuration 340, 345.

[0232] In some non-limiting examples, the area of ​​each transparent region 31x in the example of FIG. 3K may be substantially about 597.9 square microns, but is not limited to such.

[0233] In some non-limiting examples, the transparent region 31x may occupy substantially about 34.2% of the area enclosed by the dashed line 384 in the example of FIG. 3K, but is not limited to this.

[0234] In some non-limiting examples, the transparent regions 31x may be arranged in an alternating pattern. l and 31xr In some non-limiting examples, the first subset 31x l the transparent region 31x and the second subset 31x r There may be no difference between the transparent regions 31x.

[0235] In some non-limiting examples, the first subset 31x l At least one of the size, shape, and orientation of the transparent regions 31x of the second subset 31x r The size, shape, and / or orientation of the first subset 31x may vary from the size, shape, and / or orientation of the first subset 31x, including, but not limited to, maximizing the aperture ratio of at least one of the first subset 31x and the emissive region 1401. In some non-limiting examples, when viewed in plan view in the field of view disclosed in FIG. l The transparent regions 31x of the second subset 31x may be oriented to the left. r The transparent area 31x may be oriented to the right.

[0236] In some non-limiting examples, the first subset 31x l , 31x r The transparent regions 31x of the first FMM may correspond to respective apertures of the second subset 31x l , 31x r The transparent regions 31x may correspond to respective apertures of the second FMM.

[0237] In some non-limiting examples, the transparent regions 31x may be arranged in multiple subsets 31x to achieve a maximum number and / or minimum spacing of apertures for a given FMM, including but not limited to maintaining threshold structural integrity of the FMM. l , 31x r It may be divided into

[0238] In some non-limiting examples, the permeable boundary 31x may have a shape other than a quadrilateral, or a quadrilateral with rounded corners (a (rounded) quadrilateral) as shown in some non-limiting examples thereof, including, but not limited to, one of a (rounded) polygon (including, but not limited to, a (rounded) triangle, a circle, an oval, and a star).

[0239] In some non-limiting examples, the subpixel boundaries 350, 360, 370 of the respective emissive regions 1401 of at least one of the first subpixel 321, the second subpixel 322, and the third subpixel 323 may have a shape other than a (rounded) rectangle, as shown in some non-limiting examples herein, including, but not limited to, one of a (rounded) polygon (including, but not limited to, a (rounded) triangle, a circle, an oval, an ellipse, and a star).

[0240] In some non-limiting examples, the shapes of the transmissive boundary 31x and at least one sub-pixel boundary 350, 360, 370 may be complementary in that at least a portion of the sub-pixel boundary 350, 360, 370 is substantially uniformly spaced from a corresponding portion of the transmissive boundary 31x, facilitating an increase in the proportion of the panel area in the signal exchanging portion 203 of the display panel that is used for transmitting and / or emitting EM radiation, thereby increasing the aperture ratio of the transmissive region 31x and / or the emitting region 1401, respectively.

[0241] 3L, the signal exchange portion 203 of the display panel 200 is shown with an exemplary (sub)pixel array 300l replicated across its lateral faces. In the (sub)pixel array 300l, the rectangular transparent border 31x may be replaced by a circular transparent border 391.

[0242] In some non-limiting examples, the emissive region 1401 of the third subpixel 323 can have a substantially star-shaped signal exchange third subpixel contour 3701, which can be formed by joining multiple (including but not limited to four) curved vertices, including but not limited to a concave portion (including but not limited to a quarter) of a curved perimeter, including but not limited to one of a circle, an oval, and an ellipse, in some non-limiting examples.

[0243] In some non-limiting examples, replacing a polygonal subpixel contour with a star-shaped subpixel contour for at least one (sub)pixel 2210 / 32x can facilitate increasing the aperture ratio of the (sub)pixel 2210 / 32x, including, but not limited to, when the transparent region 31x has a transparent boundary that is one of a circle, an oval, and an ellipse.

[0244] In some non-limiting examples, the radius of curvature of the curved perimeter of star-shaped signal exchange third subpixel contour 3701 may be substantially equal to the radius of curvature of one of the circular, oval, and elliptical shapes defining its adjacent permeable boundary 31x so as to maintain a substantially constant separation between permeable boundary 391 and the curved perimeter of third subpixel boundary 3701. In some non-limiting examples, such separation may be one of at least about 8 microns, at least about 10 microns, at least about 11 microns, and at least about 12 microns.

[0245] By way of comparison, at least one instance of signal exchange first subpixel contour 350 in (sub)pixel array 300l is shown superimposed on a corresponding example of display first subpixel contour 355. In some non-limiting examples, the lateral extent of signal exchange first subpixel contour 350 may not overlap the lateral extent of display first subpixel contour 355 or the lateral extent of at least one transparent region 311. In some non-limiting examples, the lateral extent of display first subpixel contour 355 may overlap the lateral extent of at least one transparent region 311.

[0246] By way of comparison, at least one instance of signal exchange second subpixel contour 360 in (sub)pixel array 300l is shown superimposed on a corresponding example of display second subpixel contour 365. In some non-limiting examples, the lateral extent of signal exchange second subpixel contour 360 may not overlap with the lateral extent of display second subpixel contour 365 or the lateral extent of at least one transparent region 311. In some non-limiting examples, the lateral extent of display second subpixel contour 365 may not overlap with the lateral extent of at least one transparent region 311.

[0247] By way of comparison, at least one instance of star-shaped signal-exchanged third subpixel contour 3701 in (sub)pixel array 300l is shown superimposed on a corresponding example of displayed third subpixel contour 375. In some non-limiting examples, the vertices of star-shaped signal-exchanged third subpixel contour 3701 may extend beyond the lateral extent of such displayed third subpixel contour 375. In some non-limiting examples, the lateral extent of displayed third subpixel contour 375 may overlap with the lateral extent of at least one transparent region 311. However, due to its shape, in some non-limiting examples, the lateral extent of star-shaped signal-exchanged third subpixel contour 3701 may not overlap with the lateral extent of at least one transparent region 311.

[0248] 3M, the signal exchange portion 203 of the display panel 200 is shown with an exemplary (sub)pixel array 300m replicated across its lateral surface. (Sub)pixel array 300m differs from (sub)pixel array 300l in that the emissive region 1401 of the first sub-pixel 321 can have a substantially star-shaped signal exchange first sub-pixel contour 3501, which in some non-limiting examples may be formed by joining multiple (including but not limited to four) curved vertices, including but not limited to a concave portion (including but not limited to a quarter) of a curved perimeter, including but not limited to one of a circle, an oval, and an ellipse.

[0249] This can, in some non-limiting examples, increase the aperture ratio of the (sub)pixels 2210 / 32x. Although not shown, in some non-limiting examples, the aperture ratio of the (sub)pixels 2210 / 32x may be further increased by replacing at least one of the signal exchange second sub-pixel contours 360 with a substantially star-shaped second sub-pixel contour.

[0250] By way of comparison, at least one instance of a star-shaped signal exchanged first subpixel contour 3501 in (sub)pixel array 300m is shown superimposed on an example of a corresponding display first subpixel contour 355. In some non-limiting examples, the vertices of the star-shaped signal exchanged first subpixel contour 3501 may extend beyond the lateral extent of such display first subpixel contour 355. In some non-limiting examples, the lateral extent of the display first subpixel contour 355 may overlap with the lateral extent of at least one transparent region 311. However, due to its shape, in some non-limiting examples, the lateral extent of the star-shaped signal exchanged first subpixel contour 3501 may not overlap with the lateral extent of at least one transparent region 311.

[0251] 3N, the signal exchange portion 203 of the display panel 200 is shown with an exemplary (sub)pixel array 300n replicated across its lateral surface. The (sub)pixel array 300n includes rectangular transparent regions 31x arranged in multiple subsets 312 of elliptical transparent regions 312. l , 312 r In some non-limiting examples, when viewed in plan view in the field of view disclosed in FIG. l The transparent regions 312 of the second subset 312 may be oriented to the left. r The transparent area 312 may be oriented to the right.

[0252] 3O, the signal exchange portion 203 of the display panel 200 is shown with an exemplary (sub)pixel array 300o replicated across its lateral surface. (Sub)pixel array 300n differs from (sub)pixel array 300n in that the signal exchange third subpixel outline 350 of the third subpixel 323 is replaced by the star-shaped signal exchange third subpixel outline 3701 of the third subpixel 323 shown in FIG. 3L.

[0253] A pixel with three subpixels in a 1:1:1 ratio 3P, the signal exchange portion 203 of the display panel 200 is shown with an exemplary (sub)pixel array 300p replicated across its lateral surface. The (sub)pixel array 300p differs from the (sub)pixel array 300n in that the signal exchange subpixel contours 350, 360, 370 of the first subpixel 321, the second subpixel 322, and the third subpixel 323, respectively, have been replaced by circular signal exchange subpixel contours 3502, 3602, 3702, respectively.

[0254] Additionally, the subpixel configuration of pixel 2210 has been changed from a rectangular four-subpixel (RGB in a 1:2:1 ratio) configuration to a triangular three-subpixel (RGB in a 1:1:1 ratio) delta configuration, indicated by dashed outlines 336, each surrounding an elliptical transparent area 312. In some non-limiting examples, the area of ​​the second subpixels 322 may be increased to compensate for the reduction in the number of second subpixels 322 in such a three-subpixel configuration relative to the number of second subpixels 322 in a four-subpixel configuration.

[0255] In some non-limiting examples, the transparent regions 312 may be arranged in an alternating pattern. a , 312 b , and 312 c In some non-limiting examples, the first subset 312 a a first subset 312 of transparent regions 312; b a third subset 312 c There may not be any difference between the transparent regions 312.

[0256] Those skilled in the art will understand that in some non-limiting examples, the (sub)pixel array 300p can be understood to include a first row of alternating columns of first subpixels 321, second subpixels 322, and third subpixels 323, and a second row of similar alternating columns laterally offset by a spacing of approximately 1.5 subpixels, with a row of (alternating columns of a subset of) transmissive regions 312 disposed therebetween.

[0257] 3Q, the signal exchange portion 203 of the display panel 200 is shown with an exemplary (sub)pixel array 300q replicated across its lateral surface. The (sub)pixel array 300q includes (a subset of) the elliptical transparent region 312, which is separated by multiple subsets 313 of substantially triangular transparent regions 313. a , 313 b , 313 cIt differs from the (sub)pixel array 300p in that it is replaced by

[0258] In some non-limiting examples, there may be some scenarios requiring a substantially triangular transparent region 313, including, but not limited to, when the (sub)pixels 2210 / 32x of pixel 2210 are arranged in a triangular three-pixel delta configuration, such as (sub)pixel array 300q, to ​​substantially increase the aperture ratio of the transparent region 313 relative to the aperture ratio of the substantially elliptical transparent region 312 of (sub)pixel array 300p.

[0259] In some non-limiting examples, as shown, the apex of the triangle is truncated such that the perimeter has a substantially hexagonal configuration, with three elongated linear segments joined by and extending between the three truncated linear segments. Although not shown, in some non-limiting examples, the apex of the triangle may be present. Although not shown, in some non-limiting examples, the three elongated linear segments may be joined by and extending between three substantially curved segments.

[0260] Although not shown, in some non-limiting examples, the aperture ratio of the transmissive region 313 can be increased by replacing the substantially circular signal exchange subpixel contours 3502, 3602, 3702 of the first subpixel 321, the second subpixel 322, and the third subpixel 323, respectively, with triangular signal exchange subpixel contours.

[0261] 3R, the signal exchange portion 203 of the display panel 200 is shown with an exemplary (sub)pixel array 300r replicated across its lateral surface. In some non-limiting examples, the (sub)pixel array 300r includes a first 3 (sub)pixel 2210 / 32x pixel 2210 positioned in a substantially conventional RGB configuration, but one of the (sub)pixels 2210 / 32x (shown as the third subpixel 323) is shifted laterally to one side, and in the second 3 (sub)pixel 2210 / 32x pixel 2210, the corresponding (sub)pixel 2210 / 32x is shifted laterally to the opposite side, such that transparent regions 310 may be inserted between instances of the shifted (sub)pixels 2210 / 32x. In some non-limiting examples, there may be a substantially quadrilateral outline 337 occluding each pixel 2210. In some non-limiting examples, the transparent region 310 may overlap the boundary of the contour 337.

[0262] 3S, the signal exchange portion 203 of the display panel 200 is shown with an exemplary (sub)pixel array 300s replicated across its lateral surfaces. In some non-limiting examples, the (sub)pixel array 300s includes an alternating array of subpixel groups 325 and transmissive regions 31x. In some non-limiting examples, the subpixel groups 325 and transmissive regions 31x are arranged in a checkerboard pattern. In some non-limiting examples, the subpixel groups 325 and / or the transmissive regions 31x may define a generally rectangular configuration.

[0263] In some non-limiting examples, the subpixel group 325 can include multiple first subpixels 321, multiple second subpixels 322, and multiple third subpixels 323. In some non-limiting examples, the subpixel group 325 can include two first subpixels 321 and two third subpixels 323, and four second subpixels 322, such that the subpixel group 325 can be considered equivalent to two four-subpixel (RGB in a 1:2:1 ratio) pixels 2210.

[0264] In some non-limiting examples, each of the plurality of second subpixels 322 may have substantially the same size and configuration. In some non-limiting examples, each of the plurality of second subpixels 322 may have a substantially rectangular configuration having a major axis and a minor axis. In some non-limiting examples, the plurality of second subpixels 322 may be aligned along a subpixel group axis 326 of the subpixel group 325. In some non-limiting examples, the subpixel group axis 326 may substantially bisect the subpixel group 325. In some non-limiting examples, the subpixel group axis 326 may be substantially parallel to the minor axis of the second subpixel 322.

[0265] In some non-limiting examples, each of the plurality of first subpixels 321 may have substantially the same size and configuration. In some non-limiting examples, a first subpixel of the first subpixels 321 may be disposed on one side of the plurality of second subpixels 322, toward one end of the subpixel group 325 in the direction of the subpixel axis 326, and substantially parallel to the subpixel axis 326, and a second subpixel of the first subpixels 321 may be disposed on the opposite side of the plurality of second subpixels 322, toward the opposite end of the subpixel group 325 in the direction of the subpixel axis 326. In some non-limiting examples, the configuration of the second subpixel of the first subpixels 321 may be rotated 180 degrees relative to the configuration of the first subpixel of the first subpixels 321.

[0266] In some non-limiting examples, each of the plurality of third subpixels 323 may have substantially the same size and configuration. In some non-limiting examples, a first subpixel of the third subpixels 323 may be disposed on one side of the plurality of second subpixels 322, toward one end of the subpixel group 325 in the direction of the subpixel axis 326, and substantially parallel to the subpixel axis 326, and a second subpixel of the third subpixels 321 may be disposed on the opposite side of the plurality of second subpixels 322, toward the opposite end of the subpixel group 325 in the direction of the subpixel axis 326. In some non-limiting examples, the first subpixel of the third subpixels 323 may be disposed on the same side of the plurality of second subpixels 322, or toward the opposite end of the subpixel group 325 relative to the first subpixel of the first subpixels 321. In some non-limiting examples, the configuration of the second subpixel of the third subpixels 321 may be rotated 180° relative to the configuration of the first subpixel of the third subpixels 321.

[0267] In some non-limiting examples, the aperture ratio of the emission area 1401 in the signal exchange portion 203 of the display panel 200, in some non-limiting examples, the aperture ratio taking into account all of the emission area 1401 of the first subpixel 321, the emission area 1401 of the second subpixel 322, and the emission area 1401 of the third subpixel 323, may be one of at least about 20%, at least about 15%, at least about 10%, and at least about 8%.

[0268] In some non-limiting examples, the aperture ratio of the transmissive region 31x in the signal exchange portion 203 of the display panel 200 can be one of at least about 50%, at least about 45%, at least about 40%, at least about 35%, at least about 33%, at least about 30%, and at least about 25%.

[0269] In some non-limiting examples, the total aperture ratio of the emissive region 1401 and the transmissive region 31x in the signal exchange portion 203 of the display panel 200 may be one of about 30-60%, about 35-60%, about 40-60%, about 35-55%, about 40-50%, about 45-55%, and about 45-50%.

[0270] In some non-limiting examples, in the signal exchanging portion 203 of the display panel 200, the aperture ratio of the emissive region 1401 may be about 5-10%, and the aperture ratio of the transmissive region 31x may be about 30-50%. In some non-limiting examples, in the signal exchanging portion 203 of the display panel 200, the aperture ratio of the emissive region 1401 may be about 6-9%, and the aperture ratio of the transmissive region 31x may be about 35-45%.

[0271] ** Reducing the pixels of the signal exchange section relative to the display section to accommodate the transparent area In some non-limiting examples, the pixel density of the signal exchange portion 203 of the display panel 200 may be less than the pixel density of the display portion 207 of the display panel 200 .

[0272] In some non-limiting examples, at least one of the size, shape, configuration, and pitch of the (sub)pixels 2210 / 32x in the signal exchange portion 203 of the display panel 200 may be substantially identical to the size, shape, configuration, and pitch of the (sub)pixels 2210 / 32x in the display portion 207 of the display panel 200, but the number of such (sub)pixels 2210 / 32x may be reduced in the signal exchange portion 203 of the display panel 200. In such a scenario, a common FMM may be used for both the signal exchange portion 203 and the display portion 207, thereby reducing manufacturing costs and complexity. In such a scenario, openings in the FMM corresponding to the absent (omitted) (sub)pixels 2210 / 32x in the signal exchange portion 203 may be covered or blocked so that at least one air gap may result therefrom when used with the signal exchange portion 203.

[0273] In some non-limiting examples, at least one transmissive region 31x may be formed in a gap corresponding to a (sub)pixel 2210 / 32x that has been omitted from the signal exchange portion 203.

[0274] In some non-limiting examples, the aperture ratio of all emissive areas 1401 of the (sub)pixels 2210 / 32x in the signal exchange portion 203 of the display panel 200 may be one of about 12 to 25%.

[0275] In some non-limiting examples, the aperture ratio of the transmissive regions 31x in the signal exchange portion 203 of the display panel 200 may be the sum of the aperture ratios of all the transmissive regions 31x present in such portion, and may be one of approximately 15 to 40%, approximately 20 to 40%, approximately 15 to 35%, and approximately 20 to 35%.

[0276] In some non-limiting examples, the aperture ratio of all emissive regions 1401 of (sub)pixels 2210 / 32x in the signal exchanging portion 203 of the display panel 200 may be the sum of the aperture ratios of all (sub)pixels 2210 / 32x present within such portion, including but not limited to the first subpixel 321, the second subpixel 322, and the third subpixel 323, and may be approximately 12-25%, and the aperture ratio of the transmissive region 31x therein may be approximately 30-45%.

[0277] In some non-limiting examples, the total aperture ratio of all emissive regions 1401 and transmissive regions 31x of (sub)pixels 2210 / 32x in the signal exchanging portion 203 of the display panel 200 may be one of about 60% or less, about 55% or less, about 50% or less, about 45% or less, and about 40% or less. In some non-limiting examples, the total aperture ratio of all emissive regions 1401 and transmissive regions 31x of (sub)pixels 2210 / 32x in the signal exchanging portion 203 of the display panel 200 may be one of about 30-60%, about 35-60%, about 40-60%, about 35-55%, about 40-50%, about 45-55%, and about 45-50%.

[0278] In some non-limiting examples, the size of at least one transmissive region 31x can be at least about 10 microns. In some non-limiting examples, the size of at least one transmissive region 31x can be one of about 10-150 microns, about 10-130 microns, about 15-100 microns, about 20-80 microns, about 20-65 microns, about 25-60 microns, and about 30-50 microns.

[0279] In some non-limiting examples, at least one subpixel segment 351-354, 361-364, 371-374 and its corresponding at least one adjacent permeable boundary segment 391-394 may be separated by a minimum distance. In some non-limiting examples, such minimum distance may be one of about 5 microns, about 6 microns, about 8 microns, about 10 microns, about 11 microns, and about 12 microns, although this may be correlated to manufacturing process constraints. In some non-limiting examples, such minimum distance may be one of about 5-15 microns, about 6-12 microns, and about 8-10 microns.

[0280] In some non-limiting examples, at least one pixel 2210 may be omitted entirely from the signal exchange portion 203 .

[0281] 4A , a fragment 203a of signal exchange portion 203 and a fragment 207a of display portion 207 of display panel 200 are shown in plan view. For illustrative purposes, some example pixels 2210 are shown in dashed outline in display portion fragment 207a. It will be understood that between the illustrated signal exchange portion fragment 203a and display portion fragment 207a there may be other portions of display panel 200 which may include at least one of: (a fragment of) the same signal exchange portion 203, at least one different signal exchange portion 203, (a fragment of) the same display portion 207, at least one different display portion 207, and at least one transition region 500.

[0282] In some non-limiting examples, the size, shape, configuration, and pitch of the (sub)pixels 2210 / 32x in the signal exchange unit 203 are the same as those in the display unit 207. However, comparing the signal exchange unit segment 203a with the display unit segment 207a, in the signal exchange unit 203, and in some non-limiting examples, in the display unit 207 (shown with increased transparency) in which at least one transmissive region 31x may be disposed, there may be an air gap corresponding to each second pixel 2210. It will therefore be appreciated that the pixel density of the signal exchange unit 203 is approximately 50% of the pixel density of the display unit 207.

[0283] The sub-pixels 32x have a substantially circular shape, a substantially uniform size and pitch in each fragment 203a, 207a, and are shown for illustrative purposes only in a four sub-pixel (RGB in a 1:2:1 ratio) pixel 2210 box configuration, including but not limited to any of the (sub-)pixel configurations in the (sub-)pixel array 300 (with or without the (sub-)pixels 2210 / 32x and / or transparent regions 31x omitted). The examples described herein should not be considered to limit in any way the size, shape, configuration, orientation, and pitch of the (sub-)pixels 2210 / 32x in either the signal exchange section 203 or the display section 207.

[0284] While the transparent regions 31x are shown to have a substantially rectangular shape and a substantially uniform size and orientation, this is for illustrative purposes only, and the examples described herein, including but not limited to any of the (sub)pixel configurations in the (sub)pixel array 300 (with or without the omission of (sub)pixels and / or transparent regions 31x), should not be considered to limit in any way any of the size, shape, configuration, and orientation of the transparent regions 31x in the signal exchange unit 203.

[0285] 4B, fragment 203b of signal exchange portion 203 and fragment 207b of display portion 207 of display panel 200 are shown in plan view. Comparing signal exchange portion fragment 203b with display portion fragment 207b, in signal exchange portion 203, and in some non-limiting examples, in display portion 207 (shown with increased transparency) in which at least one transmissive region 31x may be disposed, there may be voids corresponding to three of the four subpixels 32x of each second pixel 2210. It will therefore be appreciated that the pixel density of signal exchange portion 203 is approximately 62.5% of the pixel density of display portion 207.

[0286] In some non-limiting examples, the three omitted subpixels 32x can correspond to any combination of three of the four subpixels 32x of each second pixel 2210, including, but not limited to, one each of the first subpixel 321, the second subpixel 322, and the third subpixel 323, as shown.

[0287] In some non-limiting examples, the three omitted sub-pixels 32x may be different contiguous second pixels 2210. As a non-limiting example, referring now to Figure 4C, fragment 203c of signal exchange portion 203 and fragment 207c of display portion 207 of display panel 200 are shown in plan view. Signal exchange portion fragment 203c differs from signal exchange portion fragment 203b in that, in each block of second pixels 2210, the three omitted sub-pixels 32x include different ones of the second sub-pixels 322.

[0288] 4D , fragment 203d of signal exchange portion 203 and fragment 207d of display portion 207 of display panel 200 are shown in plan view. Comparing signal exchange portion fragment 203d with display portion fragment 207d, in signal exchange portion 203, and in some non-limiting examples, in display portion 207 (shown with increased transparency) in which at least one transmissive region 31x may be disposed, there may be voids corresponding to two of the four sub-pixels 32x of each second pixel 2210. It will therefore be appreciated that the pixel density of signal exchange portion 203 is approximately 75% of the pixel density of display portion 207.

[0289] In some non-limiting examples, the two omitted subpixels 32x can correspond to any combination of two of the four subpixels 32x of each second pixel 2210, and as shown, in each second block of the second pixel 2210, the two subpixels 32x include, but are not limited to, different ones of the second subpixels 322 and different ones of the first subpixel 321 and the third subpixel 323.

[0290] ** Changing the (sub)pixel pitch in the signal exchange section to a number other than a multiple of the display section pitch In some non-limiting examples, there may be scenarios that require the pitch in the signal exchange portion 203 of the display panel 200 to be substantially equal to or an integer multiple of the pitch in the display portion 207 of the display panel 200, including but not limited to simplifying manufacturing, including but not limited to enabling the use of FMM for both the signal exchange portion 200 and the display portion 203 of the display panel 203, and in some non-limiting examples, by changing the pitch of the (sub)pixels 2210 / 32x in the signal exchange portion 203 of the display panel 200 to a value that is a non-integer multiple of the pitch in the display portion 207 of the display panel 200, the (sub)pixel arrangement of the signal exchange portion may be changed to accommodate the introduction of transparent areas 31x therein.

[0291] Hybrid approach Examples of various approaches to accommodate the introduction of transmissive regions 31x in the signal switching portion 203 of the display panel 207 are provided, including but not limited to the following: Reducing at least one of the size, shape, and configuration of the (sub)pixels 2210 / 32x in the signal exchange section 203 of the display panel Reducing the number and / or density of (sub)pixels 2210 / 32x in the signal exchange part 203 of the display panel The pitch of the (sub)pixels 2210 / 32x in the signal conversion unit 203 is changed to a value that is a non-integer multiple of the pitch in the display unit 207 of the display panel 200.

[0292] Those skilled in the art will appreciate that in some non-limiting examples, multiple or all of such approaches can be combined in a hybrid approach to accommodate the introduction of transparent regions 31x in the signal exchange portion 203 of the display panel 200.

[0293] It will further be understood that the adoption of one or more of the foregoing approaches and / or hybrid combinations thereof may be combined with at least one other approach to accommodate the introduction of transparent regions 31x in the signal exchange portion 203 of the display panel 200 without departing from the spirit or scope of the present disclosure.

[0294] ** Introducing a transition area between the signal exchange section and the display section to reduce the apparent difference between them In some non-limiting examples, one means for reducing the apparent or visually perceived difference between at least one of the aperture ratios and pixel densities of the emissive regions 1401 in the signal exchange portion 203 and the display portion 207 of the display panel 200 may include establishing at least one transition region 500 around and / or between at least one of the signal exchange portion 203 and the display portion 207 of the display panel 200, each transition region having an aperture ratio, size, shape, orientation, and / or pitch intermediate to the emissive regions 1401, to distribute such apparent or visually perceived difference therebetween over an increased lateral surface of the display panel 200.

[0295] In some non-limiting examples, such a transition region 500 may be introduced whether the signal exchange unit 203 is characterized by a pixel density substantially equal to that of the display unit 207 and is characterized by a reduction in at least one of the size, shape, and configuration of the (sub)pixels 2210 / 32x in the signal exchange unit to accommodate the introduction of the transparent region 31x; whether the signal exchange unit 203 is characterized by a reduction in the number and / or density of the (sub)pixels 2210 / 32x in the signal exchange unit 203 to accommodate the introduction of the transparent region 31x; whether the signal exchange unit 203 is characterized by a change in the pitch of the (sub)pixels in the signal exchange unit 203 of the display panel 200 to a value that is a non-integer multiple of the pitch in the display unit 207 of the display panel 200; or whether the signal exchange unit 203 is characterized by any hybrid combination of any of the above.

[0296] In some non-limiting examples, at least one transition region 500 may be positioned along the periphery or boundary surrounding at least one of the signal exchange section 203 and the display section 207, but is not limited to this.

[0297] 5A , there is shown in plan view a fragment 203e of signal exchange portion 203, a fragment 207e of display portion 207, and a fragment 500a of at least one transition region 500 extending laterally therebetween. For illustrative purposes, some example pixels 2210 are shown in dashed outline in both display portion fragment 207e and transition region fragment 500a. It will be understood that between the illustrated display portion fragment 207e and transition region fragment 500a there may be other portions of display panel 200 that may include at least one of the same display portion 207 (fragment), at least one different display portion 207 (fragment), the same transition region 500 (fragment), and at least one different transition region 500.

[0298] In some non-limiting examples, the pixel density of the (sub)pixels 2210 / 32x in the signal exchange unit 203 is the same as in the transition region 500 and the display portion 207. However, comparison of the signal exchange unit segment 203e with both the transition region segment 500a and the display portion segment 207e reveals that in some non-limiting examples, at least one of the size, shape, configuration, and pitch of the (sub)pixels 2210 / 32x in the transition region 500 may be changed, including but not limited to, a reduction in size relative to the corresponding at least one of their size, shape, configuration, and pitch in the display portion 207, and in some non-limiting examples, at least one of the size, shape, configuration, and pitch of the (sub)pixels 2210 / 32x in the signal exchange unit 203 may be changed, including but not limited to, a reduction in size relative to the corresponding at least one of their size, shape, configuration, and pitch in the transition region 500.

[0299] Therefore, by interposing at least one transition region 500 between the signal exchange unit 203 and the display unit 207, it may be easier to reduce the apparent or visually perceived difference between the pixel density in the signal exchange unit 203 and the pixel density in the display unit 207.

[0300] The subpixels 32x are substantially rectangular in shape in each fragment 203e, 500a, 207e and have different sizes ranging from the third subpixel 323 (largest) to the first subpixel 321 to the second subpixel 322 (smallest), and are shown in a 4-subpixel (RGB in a 1:2:1 ratio) pixel 2210 box configuration for illustrative purposes only, and include, but are not limited to, any of the (sub)pixel configurations in the (sub)pixel array 300 (with or without the (sub)pixels 2210 / 32x and / or the transmissive region 31x). The examples described herein should not be considered to limit in any way the size, shape, configuration, orientation, pixel density and pitch of the (sub)pixels 2210 / 32x in either the signal exchange section 203, the transition region 500, or the display section 207.

[0301] While the transmissive regions 31x are shown as having a substantially circular shape and a substantially uniform size and orientation in each segment, this is for illustrative purposes only, and the examples described herein, including but not limited to any of the (sub)pixel configurations in the (sub)pixel array 300, with or without the omission of (sub)pixels and / or transmissive regions 31x, should not be considered to limit in any way any of the size, shape, configuration, orientation, pixel density, and pitch of the (sub)pixels 2210 / 32x in either the signal exchange section 203, the transition region 500, or the display section 207.

[0302] 5B , there is shown in plan view fragment 203f of signal exchange portion 203, fragment 207f of display portion 207, and fragment 500b of at least one transition region 500 extending laterally therebetween. Comparing transition region fragment 500b to display portion 207f, in some non-limiting examples, in transition region 500, there may be voids corresponding to three of the four sub-pixels 32x of each second pixel 2210 in display portion 207 (shown with increased transparency) in which at least one transmissive region 31x may be disposed.

[0303] In some non-limiting examples, the three omitted subpixels 32x can correspond to any combination of three of the four subpixels 32x of each second pixel 2210, including, but not limited to, one each of the first subpixel 321, the second subpixel 322, and the third subpixel 323, as shown.

[0304] Comparing the signal exchange section 203 with the transition region 500, in the signal exchange section 203, in the transition region 500 (shown with increased transparency) where at least one (increased size) transparent region 31x may be arranged, there may be voids corresponding to the remaining subpixels 32x of each second subpixel 2210.

[0305] Therefore, it can be understood that the pixel density in the transition region 500 may be substantially about 62.5% of the pixel density in the display section 207, and the pixel density in the signal exchange section 203 may be substantially about 50% of the pixel density in the display section 207.

[0306] In this disclosure, the transmissive regions 31x are shown as separate features disposed between the emissive regions 1401 in the signal exchange portion 203 of the display panel 200, but in some non-limiting examples, not shown, at least one transmissive region 31x may be continuously formed so as to extend laterally across and substantially surround multiple emissive regions 1401.

[0307] In some non-limiting examples, at least in each emission region 1401, multiple layers may be disposed on the substrate 10, including a first electrode 1020 ( FIG. 10 ) and a second electrode 1040 ( FIG. 10 ) surrounding at least one organic and / or semiconductor layer 1030 ( FIG. 10 ), and the electrodes 1020, 1040 may be electrically coupled to a power source 1005 ( FIG. 10 ). When energized, one of the electrodes 1020, 1040 (the “anode”) may generate electrons, and the other electrode 1020, 1040 (the “cathode”) may generate holes, which tend to migrate toward each other through the at least one semiconductor layer 1030, eventually combining to emit EM radiation therefrom in the form of photons.

[0308] In some non-limiting examples, the transmissive region 31x may be configured to omit or reduce the presence of at least one layer or material to enhance transmission of external EM radiation therethrough. In some non-limiting examples, the average layer thickness of the second electrode 1040 in the transmissive region 31x may be equal to or less than the average layer thickness in other regions of the display panel 200. In some non-limiting examples, the average layer thickness of the second electrode 1040 in the transmissive region 31x may be equal to or less than its average layer thickness in the emissive region 1401. In some non-limiting examples, the transmissive region 31x may be substantially devoid of an occlusive coating 140 of the material for forming the second electrode 1040 (“second electrode material”).

[0309] In some non-limiting examples, regions substantially devoid of occlusive coating 140 of second electrode material (“cathode-free regions”), including but not limited to at least one transmissive region 31x, may exhibit different optoelectronic properties than other regions, including but not limited to at least one emissive region 1401. In some non-limiting examples, such cathode-free regions may nevertheless contain some second electrode material, including but not limited to in the form of at least one grain structure 841 ( FIG. 8C ) or a discontinuous layer 840 ( FIG. 8C ) of at least one instance of such grain structure 841.

[0310] In some non-limiting examples, this may be achieved by laser ablation of the second electrode material, however, in some non-limiting examples, laser ablation may create a debris cloud, which may affect the deposition process.

[0311] In some non-limiting examples, this may be achieved by disposing a patterned coating 110, which in some non-limiting examples may be a nucleation inhibitor coating (NIC), in a pattern using FMM on the exposed layer surface 11 of at least one semiconductor layer 1030 prior to depositing a deposition material 731 for forming the second electrode 1040 thereon.

[0312] In some non-limiting examples, the patterned coating 110 may be adapted to influence the tendency of vapor flux of the deposition material 731 to be deposited thereon, including, but not limited to, an initial sticking probability for deposition of the deposition material 711 that is less than or equal to the initial sticking probability for deposition of the deposition material 731 on the exposed layer surface 11 of at least one semiconductor layer 1030.

[0313] In some non-limiting examples, the patterned coating 110 may be deposited in a pattern that may correspond to a first portion 101 of the forward direction surface, including, but not limited to, at least some of the transparent regions 31x.

[0314] In some non-limiting examples, the patterned film 110 may include different subsets 340 of the transparent regions 31x. a , 340 b The first portion 101 may be deposited in multiple stages, each using a different FMM that defines a different pattern in the first portion 101, corresponding to each of the FMMs.

[0315] In some non-limiting examples, following deposition of the patterned coating 110 (at all stages), the display panel 200 may be exposed to a vapor flux of deposition material 731 in at least one of an open mask and / or a mask-free deposition process to form a second electrode 1040 for each of the emission regions 1401 corresponding to the (sub)pixel 34x in at least the second portion 102 of the side surface but not in the first portion 101 of the side surface.

[0316] Patterning In some non-limiting examples, in first portion 101, patterned film 110 including patterning material 611 (which in some non-limiting examples may be a NIC material) may be selectively deposited as a closed film 140 on exposed layer surfaces 11 of underlying layers (including, but not limited to, substrate 10) of device 100 only in first portion 101. However, in second portion 102, the exposed layer surfaces 11 of underlying layers may be substantially devoid of closed film 140 of patterning material 611.

[0317] Patterned Coating The patterned coating 110 can include a patterning material 611. In some non-limiting examples, the patterned coating 110 can include a closure coating 140 of the patterning material 611.

[0318] The patterned film 110 can provide an exposed layer surface 11 with a relatively low initial sticking probability (in some non-limiting examples, under conditions specified in the dual QCM technique described by Walker et al.) for the deposition of deposition material 731 deposited thereon upon exposing such surface to a vapor flux, which initial sticking probability can, in some non-limiting examples, be substantially lower than the initial sticking probability for the deposition of deposition material 731 deposited on the underlying exposed layer surface 11 of the device 100 on which the patterned film 110 is deposited.

[0319] Due to attributes including, but not limited to, the low initial adhesion probability of the patterned film 110 and / or patterning material 611 relative to the deposition of the deposition material 731, in some non-limiting examples, when deposited as a film and / or some form of coating, and under conditions similar to the deposition of the patterned film 110 within the device 100, the first portion 101 including the patterned film 110 may substantially lack a closed film 140 of the deposition material 731.

[0320] However, exposure of device 100 to a vapor flux of deposition material 731 may, in some non-limiting examples, result in the formation of a closed coating 140 of deposition layer 130 of deposition material 731 in second portion 102, with the exposed layer surface 11 of the underlying layer being substantially devoid of patterned coating 110.

[0321] Attributes of the patterned coating and / or patterned material initial sticking probability In some non-limiting examples, the patterned film 110 and / or patterning material 611, when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned film 110 in the device 100, may have an initial sticking probability against deposition of the deposition material 731 that is at least one of about 0.3 or less, about 0.2 or less, about 0.15 or less, about 0.1 or less, about 0.08 or less, about 0.05 or less, about 0.03 or less, about 0.02 or less, about 0.01 or less, about 0.008 or less, about 0.005 or less, about 0.003, about 0.001 or less, about 0.0008 or less, about 0.0005 or less, about 0.0003 or less, or about 0.0001 or less, when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned film 110 in the device 100.

[0322] In some non-limiting examples, the patterned film 110 and / or patterning material 611, when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned film 110 in the device 100, may have an initial sticking probability against Ag and / or Mg deposition that is at least one of about 0.3 or less, about 0.2 or less, about 0.15 or less, about 0.1 or less, about 0.08 or less, about 0.05 or less, about 0.03 or less, about 0.02 or less, about 0.01 or less, about 0.008 or less, about 0.005 or less, about 0.003 or less, about 0.001 or less, about 0.0008 or less, about 0.0005 or less, about 0.0003 or less, or about 0.0001 or less, when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned film 110 in the device 100.

[0323] In some non-limiting examples, the patterned film 110 and / or patterning material 611, when deposited as a film and / or some form of coating and under conditions similar to the deposition of the patterned film 110 in the device 100, may have a viscosity of about 0.15-0.0001, about 0.1-0.0003, about 0.08-0.0005, about 0.08-0.00 08, approx. 0.05 to 0.001, approx. 0.03 to 0.0001, approx. 0.03 to 0.0003, approx. 0.03 to 0.0005, approx. 0.03 to 0.0008, approx. 0.03 to 0.001, approx. 0.03 to 0.005, approx. 0.03 to 0.008, approx. 0.03 to 0.01, approx. 0.02 to 0.0001, approx. 0.02 to 0.0003, approx. 0.02 to 0.0005, approx. 0.02 to 0.000 8, approximately 0.02 to 0.001, approximately 0.02 to 0.005, approximately 0.02 to 0.008, approximately 0.02 to 0.01, approximately 0.01 to 0.0001, approximately 0.01 to 0.0003, approximately 0.01 to 0.0005, approximately 0.01 to 0.0008, approximately 0.01 to 0.001, approximately 0.01 to 0.005, approximately 0.01 to 0.008, approximately 0.008 to 0.0001, approximately 0.008 to 0.000 3, may have an initial sticking probability resisting deposition of the deposition material 731 of at least one of about 0.008-0.0005, about 0.008-0.0008, about 0.008-0.001, about 0.008-0.005, about 0.005-0.0001, about 0.005-0.0003, about 0.005-0.0005, about 0.005-0.0008, and about 0.005-0.001.

[0324] In some non-limiting examples, the patterned film 110 and / or patterning material 611, when deposited, in some non-limiting examples, as a film and / or some form of coating and under circumstances similar to the deposition of the patterned film 110 in the device 100, can have an initial sticking probability against deposition of the plurality of deposition materials 731 that is less than or equal to a threshold value. In some non-limiting examples, such threshold value can be at least one of about 0.3, about 0.2, about 0.18, about 0.15, about 0.13, about 0.1, about 0.08, about 0.05, about 0.03, about 0.02, about 0.01, about 0.008, about 0.005, about 0.003, and about 0.001.

[0325] In some non-limiting examples, the patterned film 110 and / or patterning material 611, when deposited as a film and / or some form of coating, in some non-limiting examples, can have an initial sticking probability that is below such a threshold against deposition of a plurality of deposition materials 731 selected from at least one of Ag, Mg, ytterbium (Yb), cadmium (Cd), and zinc (Zn) under circumstances similar to the deposition of the patterned film 110 in the device 100. In some further non-limiting examples, the patterned film 110 can exhibit such a sub-threshold initial sticking probability against deposition of a plurality of deposition materials 731 selected from at least one of Ag, Mg, and Yb.

[0326] In some non-limiting examples, the patterned film 110 and / or patterning material 611, when deposited as a film and / or some form of coating and under conditions similar to the deposition of the patterned film 110 in the device 100, can exhibit an initial sticking probability against deposition of the first deposition material 731 below a first threshold and an initial sticking probability against deposition of the second deposition material 731 below a second threshold. In some non-limiting examples, the first deposition material 731 can be Ag and the second deposition material 731 can be Mg. In some other non-limiting examples, the first deposition material 731 can be Ag and the second deposition material 731 can be Yb. In some other non-limiting examples, the first deposition material 731 can be Yb and the second deposition material 731 can be Mg. In some non-limiting examples, the first deposition material 731 can be Yb and the second deposition material 731 can be Mg. In some non-limiting examples, the first threshold can be greater than the second threshold.

[0327] In some non-limiting examples, scenarios may exist that require providing a patterned coating 110 to cause the formation of a discontinuous layer 840 of at least one grain structure 841 when the patterned coating 110 is subjected to a vapor flux of deposition material 731. In at least some applications, the patterned coating 110 may exhibit a sufficiently low initial sticking probability such that a discontinuous layer 840 of at least one grain structure 841 having at least one characteristic may form in the first portion 101 on the patterned coating 110, while a closure coat 140 of deposition material may form in the second portion 102, which may be substantially devoid of the patterned coating 110. In some non-limiting examples, scenarios may exist that require the formation of a discontinuous layer 840 of at least one grain structure 841 of deposition material 731, which may be a metal or metal alloy in some non-limiting examples, while depositing a closure coat 140 of deposition material 731 having a thickness of, for example, at least one of about 100 nm or less, about 50 nm or less, about 25 nm or less, and about 15 nm or less, in the second portion 102. In some non-limiting examples, the relative amount of deposition material 731 deposited as the discontinuous layer 840 of at least one grain structure 841 in the first portion 101 may correspond to at least one of about 1-50%, about 2-25%, about 5-20%, and about 7-10% of the amount of deposition material 731 deposited as the closure coat 140 in the second portion 102, which may correspond to a thickness of, for non-limiting examples, one of about 100 nm or less, about 75 nm or less, about 50 nm or less, about 25 nm or less, and about 15 nm or less.

[0328] Without wishing to be bound by any particular theory, it has been found that a patterned film 110 containing a material that exhibits a relatively high surface energy when deposited as a thin film can form a discontinuous layer 840 of at least one grain structure 841 of the deposited material 731 in the first portion 101 and a closed film 140 of the deposited material 731 in the second portion 202, in some non-limiting examples, including but not limited to, when the thickness of the closed film is less than or equal to at least one of about 100 nm, about 75 nm, about 50 nm, about 25 nm, or about 15 nm.

[0329] Transmittance In some non-limiting examples, the patterned film 110 and / or patterning material 611 may have a transmittance to EM radiation of at least a threshold transmittance value when deposited as a film and / or some form of coating, and after being exposed to a vapor flux of deposition material 731, including but not limited to Ag, under conditions similar to the deposition of the patterned film 110 in device 100.

[0330] In some non-limiting examples, such transmittance may be measured after exposing the patterned coating 110 and / or exposed layer surface 11 of the patterned material 611 formed as a thin film to a vapor flux of deposition material 731, including but not limited to Ag, under typical conditions that may be used to deposit an electrode of an optoelectronic device, which in some non-limiting examples may be the cathode of an organic light-emitting diode (OLED) device.

[0331] In some non-limiting examples, the conditions for subjecting the exposed layer surface 11 to a vapor flux of deposition material 731, including but not limited to Ag, include (i) a temperature of about 10 -4 Torr and approximately 10 -5 a vacuum pressure of one Torr, (ii) a vapor flux of the deposition material 731, including but not limited to Ag, substantially corresponds to a reference deposition rate of about 1 angstrom (Å) / second, which may be monitored and / or measured using a QCM in some non-limiting examples, (iii) the vapor flux of the deposition material 731 is directed toward the exposed layer surface 11 at an angle substantially close to perpendicular to the plane of the exposed layer surface 11, and (iv) the exposed layer surface 11 is subjected to a vapor flux of the deposition material 731, including but not limited to Ag, until a reference average layer thickness of about 15 nm is reached, at which point the exposed layer surface 11 is no longer subjected to a vapor flux of the deposition material, including but not limited to Ag.

[0332] In some non-limiting examples, the exposed layer surface 11 subjected to the vapor flux of deposition material 731, including but not limited to Ag, may be at substantially room temperature (e.g., about 25° C.). In some non-limiting examples, the exposed layer surface 11 subjected to the vapor flux of deposition material 731, including but not limited to Ag, may be positioned about 65 cm away from an evaporation source that evaporates deposition material 731, including but not limited to Ag.

[0333] In some non-limiting examples, the threshold transmittance value may be measured at a wavelength in the visible spectrum. In some non-limiting examples, the threshold transmittance value may be measured at a wavelength of about 460 nm. In some non-limiting examples, the threshold transmittance value may be measured at a wavelength in the IR and / or NIR spectrum. In some non-limiting examples, the threshold transmittance value may be measured at one of a wavelength of about 700 nm, about 900 nm, and about 1000 nm. In some non-limiting examples, the threshold transmittance value may be expressed as a percentage of incident EM power that can be transmitted through the sample. In some non-limiting examples, the threshold transmittance value may be at least one of at least about 60%, at least about 65%, at least about 70%, at least about 75%, at least about 80%, at least about 85%, and at least about 90%.

[0334] In some non-limiting examples, there may be a positive correlation between the initial adhesion probability of the patterned film 110 and / or patterned material 611, in some non-limiting examples, when deposited in the form of a film and / or film and under conditions similar to the deposition of the patterned film 110 in the device 100, and the average layer thickness of the deposited material 731 thereon.

[0335] Those skilled in the art will appreciate that a high transmittance may generally indicate the absence of a closed coat 140 of deposited material 731, which may be Ag in some non-limiting examples. On the other hand, a thin metal film, particularly when formed as a closed coat 140, may exhibit a high degree of absorption of EM radiation, so a low transmittance may generally indicate the presence of a closed coat 140 of deposited material 731, including, but not limited to, at least one of Ag, Mg, and Yb.

[0336] It may further be hypothesized that exposed layer surfaces 11 that exhibit a low initial sticking probability to deposited materials 731, including but not limited to Ag, Mg, and Yb, may exhibit high permeability. On the other hand, exposed layer surfaces 11 that exhibit a high sticking probability to deposited materials 731, including but not limited to Ag, Mg, and Yb, may exhibit low permeability.

[0337] A series of samples were prepared to measure the transmittance of the exemplary materials and to visually observe whether a closed coating 140 of Ag was formed on the exposed layer surface 11 of such example materials. Each sample was prepared by depositing an approximately 50 nm thick coating of the exemplary material on a glass substrate 10 and then subjecting the exposed layer surface 11 of the coating to an Ag vapor flux 732 at a rate of approximately 1 Å / sec until a nominal layer thickness of approximately 15 nm was reached. Each sample was then visually analyzed, and the transmittance through each sample was measured.

[0338] The molecular structures of exemplary materials used in the samples herein are set forth in Table 1 below.

[0339] [Table 1-1]

[0340] [Table 1-2]

[0341] [Table 1-3]

[0342] Samples on which a substantially occlusive coating 140 of Ag had formed were visually identified, and the presence of such a coating in these samples was further confirmed by measuring the transmittance through them, which showed transmittance of about 50% or less at a wavelength of about 460 nm.

[0343] Samples were also identified in which no occlusive coating 140 of Ag had formed, and the absence of such a coating in these samples was further confirmed by measuring the transmittance through them, which showed a transmittance of greater than about 70% at a wavelength of about 460 nm.

[0344] The results are summarized in Table 2 below.

[0345] [Table 2]

[0346] Based on the above, it has been found that the materials used in the first seven samples (HT211 to Exemplary Material 2) in Tables 1 and 2 may not be well suited to inhibiting deposition of deposition materials 731 thereon, including, but not limited to, Ag and / or Ag-containing materials.

[0347] On the other hand, it has been found that exemplary materials 3 through 9 may be suitable, at least in some non-limiting applications, to function as patterned coatings 110 to inhibit the deposition of deposition materials 731, including, but not limited to, Ag and / or Ag-containing materials.

[0348] Deposition contrast In some non-limiting examples, materials including, but not limited to, patterning material 611 that can function as NICs for a given at least one of metals and alloys (metal / alloys), including, but not limited to, at least one of Mg, Ag, and MgAg, can have substantially high deposition contrast when deposited on substrate 10.

[0349] In some non-limiting examples, when the substrate 10 is coated with a material including but not limited to a patterning material 611 that tends to function as a nucleation promoting coating (NPC) 920 and a portion of which may tend to function as a NIC for the deposition of a given metal / alloy, including but not limited to at least one of Mg, Ag, and MgAg, the coated portion (first portion 101) and the uncoated portion (second portion 102) may tend to have different initial sticking probabilities and / or nucleation rates, such that the metal / alloy deposited thereon may tend to have different average film thicknesses.

[0350] As used herein, deposition contrast may generally refer to the ratio of average film thickness between the first portion 101 and the second portion 102 of the substrate 10. Thus, if the deposition contrast is substantially high, the average film thickness of the metal / alloy in the second portion 102 may be substantially greater than the average film thickness of the metal / alloy in the first portion 101.

[0351] In some non-limiting examples, if the deposition contrast is substantially high, there may be little or no deposition material deposited in the first portion 101 when there is sufficient metal / alloy deposition to form the metal / alloy closure coating 140 in the second portion 102.

[0352] In some non-limiting examples, when the deposition contrast is substantially low, there may be a discontinuous layer 840 of at least one grain structure 841 of metal / alloy deposited in the first portion 101 when there is sufficient metal / alloy deposition to form a closed coating 140 in the second portion 102.

[0353] In some non-limiting examples, a material, including but not limited to, a patterning material 611 having a substantially high deposition contrast for deposition of a given metal / alloy, including but not limited to, at least one of Mg, Ag, and MgAg, may have reduced applicability in some scenarios requiring reduced deposition contrast, including but not limited to, in some scenarios requiring deposition of a discontinuous layer 840 of at least one grain structure 841 in the second portion 102, where the average layer thickness of the metal / alloy in the first portion 101 is substantially small, including but not limited to, one of about 100 nm or less, about 50 nm or less, about 25 nm or less, and about 15 nm or less.

[0354] In some non-limiting examples, scenarios may exist requiring the formation of a discontinuous layer 840 of at least one grain structure 841 of metal / alloy in the second portion 102 when the average layer thickness of the metal / alloy occlusive coating 140 in the first portion 101 is substantially small, including but not limited to one of about 100 nm or less, about 50 nm or less, about 25 nm or less, and about 15 nm or less, including but not limited to the formation of nanoparticles (NPs) in the second portion 102 required for the absorption of EM radiation by such NPs, including but not limited to protecting the underlying layer from EM radiation having a wavelength of about 460 nm or less.

[0355] In some non-limiting examples, in such a scenario, there may be applicability to deposition contrasts of about 2-100, about 4-50, about 5-20, and about 10-15.

[0356] In some non-limiting examples, a material, including but not limited to, patterning material 611, having a substantially low deposition contrast for deposition of a given metal / alloy, including but not limited to at least one of Mg, Ag, and MgAg, may have reduced applicability in some scenarios requiring a substantially high deposition contrast if the average layer thickness of the metal / alloy in first portion 101 is large, including but not limited to one of at least about 95 nm, at least about 45 nm, at least about 20 nm, at least about 10 nm, and at least about 8 nm.

[0357] In some non-limiting examples, materials including, but not limited to, patterning material 611 having a substantially low deposition contrast for deposition of a given metal / alloy, including, but not limited to, at least one of Mg, Ag, and MgAg, may have reduced applicability when the average layer thickness of the metal / alloy in first portion 101 is large, including, but not limited to, one of at least about 95 nm, at least about 45 nm, at least about 20 nm, at least about 10 nm, and at least about 8 nm; in some scenarios requiring a substantially high deposition contrast, including, but not limited to, scenarios requiring a substantial absence of continuous coating 140 or a high density of grain structure 841 in first portion 101; and in some scenarios requiring a substantial absence of absorption of EM radiation in at least one of the visible and NIR spectrum, including, but not limited to, scenarios requiring increased transparency to EM radiation having a wavelength that is at least about 460 nm.

[0358] In some non-limiting examples, materials including but not limited to the patterning material 611 for deposition of a given metal / alloy, including but not limited to at least one of Mg, Ag, and MgAg, may have applicability in some scenarios requiring a discontinuous layer 840 or low density of the metal / alloy grain structure 841 in the first portion 101, if the average layer thickness of the metal / alloy closure coating 140 in the second portion 102 is substantially high, including but not limited to one of at least about 95 nm, at least about 45 nm, at least about 20 nm, at least about 10 nm, and at least about 8 nm. As non-limiting examples, a deposition contrast of about 2-100, about 4-50, about 5-20, and about 10-15 may be applicable in some scenarios where the average layer thickness of the metal / alloy in the second portion 102 is substantially higher, including, but not limited to, one of at least about 95 nm, at least about 45 nm, at least about 20 nm, at least about 10 nm, and at least about 8 nm.

[0359] In some non-limiting examples, materials, including but not limited to, patterning material 611, may tend to have substantially lower deposition contrast when the initial sticking probability of such materials relative to deposition of metals / alloys, including but not limited to at least one of Mg, Ag, and MgAg, is substantially higher.

[0360] Surface Energy Characteristic surface energy, when used herein particularly with respect to a material, may generally refer to the surface energy determined from such a material. In some non-limiting examples, characteristic surface energy may be measured from a surface formed by a material deposited and / or coated in thin film form. Various methods and theories are known for determining the surface energy of a solid. In some non-limiting examples, surface energy may be calculated and / or derived based on a series of contact angle measurements in which various liquids are brought into contact with the surface of the solid to measure the contact angle between the liquid-vapor interface and the surface. In some non-limiting examples, the surface energy of a solid surface may be equal to the surface tension of the liquid with the highest surface tension that completely wets the surface. In some non-limiting examples, a Zisman plot may be used to determine the highest surface tension value that results in complete wetting with the surface (i.e., a contact angle of 0°).

[0361] In some non-limiting examples, the critical surface tension of a surface can be determined according to the Zisman method, as further detailed in W. A. ​​Zisman, Advances in Chemistry 43 (1964), pp. 1-51.

[0362] By way of non-limiting example, a series of samples were prepared to measure the critical surface tension of surfaces formed by various materials, and the results are summarized in Table 3 below.

[0363] [Table 3]

[0364] Based on the above-described measurements of critical surface tensions in Table 3 and previous observations regarding the presence or absence of a substantially occlusive coating 140 of Ag, it has been found that a material that forms a low surface energy surface when deposited as a coating may be a material having at least one critical surface tension of, by way of non-limiting example, about 13-20 dynes / cm, or about 13-19 dynes / cm, and may be suitable for inhibiting the deposition of deposition materials 731, including, but not limited to, Ag and / or Ag-containing materials, thereon to form a patterned coating 110.

[0365] Without wishing to be bound by any particular theory, it may be hypothesized, by way of non-limiting example, that materials that form surfaces with surface energies lower than about 13 dynes / cm may be less suitable as patterning material 611 in certain applications because such materials may exhibit relatively poor adhesion to layers surrounding them, may exhibit low melting points, and / or may exhibit low sublimation temperatures.

[0366] In some non-limiting examples, the surface energy of a material, including but not limited to, the patterning material 611 in a coating, including but not limited to, the patterned coating 110, can be determined by depositing the material as a neat coating on the substrate 10 and measuring its contact angle with a suitable series of probe liquids.

[0367] In some non-limiting examples, patterning material 611, which may tend to function as a NIC for a given metal / alloy, including but not limited to, at least one of Mg, Ag, and MgAg, may tend to exhibit a substantially low surface energy when coated onto exposed layer surface 11.

[0368] In some non-limiting examples, materials, including but not limited to patterning material 611, may tend to exhibit substantially low surface energy when deposited as a thin film or coating on exposed layer surface 11.

[0369] In some non-limiting examples, materials, including but not limited to patterning material 611, that have substantially low surface energy may tend to exhibit substantially low intermolecular forces.

[0370] In some non-limiting examples, materials, including but not limited to patterning material 611, may tend to have a substantially high initial adhesion probability for metal / alloy deposition if the material has a substantially high surface energy.

[0371] In some non-limiting examples, scenarios may exist that require a patterning material 611 that has a substantially low surface energy that is not excessively low.

[0372] In some non-limiting examples, materials including but not limited to patterning material 611 that have a substantially high surface energy may have applicability in some scenarios for detecting films of such materials using optical techniques.

[0373] Without wishing to be bound by any particular theory, it can be hypothesized that, in some non-limiting examples, materials including but not limited to patterning material 611 having a substantially high surface energy may have applicability for some scenarios requiring substantially high temperature reliability.

[0374] In some non-limiting examples, patterning material 611 having a substantially low, but not excessively low, surface tension may have applicability in some scenarios requiring a substantially high melting point.

[0375] In some non-limiting examples, a patterned coating 110 having a substantially low surface energy and a substantially high melting point may have applicability in some scenarios requiring high temperature reliability, and in some non-limiting examples, challenges may exist in achieving such a combination from a single material, given that a single material with a low surface energy may tend to exhibit a low melting point.

[0376] In some non-limiting examples, materials including but not limited to patterning material 611 having a substantially low surface energy may have applicability in some scenarios requiring weak or substantially no photoluminescence or absorption in a wavelength range that is one of at least about 365 nm and at least about 460 nm.

[0377] In some non-limiting examples, a patterning material 611 having a substantially high surface energy, including but not limited to, a material that can function as a NIC for metals / alloys including but not limited to at least one of Mg, Ag, and MgAg, may have applicability in some scenarios requiring a discontinuous layer 840 or low density of the metal / alloy grain structure 841 in the first portion 101, if the average layer thickness of the continuous coating 140 of the metal / alloy in the second portion 102 is substantially low, including but not limited to, one of about 100 nm or less, about 50 nm or less, about 25 nm or less, and about 15 nm or less.

[0378] In some non-limiting examples, a patterning material 611 having a substantially low surface energy, including but not limited to, a material that can function as a NIC for metals / alloys including but not limited to at least one of Mg, Ag, and MgAg, may have applicability in some scenarios requiring a discontinuous layer 840 or low density of the metal / alloy grain structure 841 in the first portion 101, if the average layer thickness of the continuous coating 140 of the metal / alloy in the second portion 102 is substantially high, including but not limited to, one of at least about 95 nm, at least about 45 nm, at least about 20 nm, at least about 10 nm, and at least about 8 nm.

[0379] In some non-limiting examples, the surface of a NIC and / or patterned coating containing a compound described herein may exhibit a surface energy of less than or equal to at least one of about 24 dynes / cm, about 22 dynes / cm, about 20 dynes / cm, about 19 dynes / cm, about 18 dynes / cm, about 16 dynes / cm, about 15 dynes / cm, about 13 dynes / cm, about 12 dynes / cm, and about 11 dynes / cm. In some non-limiting examples, the surface values ​​in the various non-limiting examples herein may correspond to such values ​​measured near normal temperature and pressure (NTP), which may correspond to a temperature of 20°C and an absolute pressure of 1 atm.

[0380] In some non-limiting examples, the surface energy can be at least one of at least about 6 dynes / cm, at least about 7 dynes / cm, and at least about 8 dynes / cm.

[0381] In some non-limiting examples, the surface energy can be at least one of about 10-22 dynes / cm, about 11-21 dynes / cm, about 13-20 dynes / cm, and about 13-19 dynes / cm.

[0382] Without wishing to be bound by any particular theory, in some non-limiting examples, it may be hypothesized that materials forming surfaces with surface energies of about 13 dynes / cm or less may be less suitable as patterning material 611 in some scenarios because such materials may exhibit substantially weaker adhesion to layers surrounding them, may exhibit substantially lower melting points, and / or may exhibit substantially lower sublimation temperatures.

[0383] It has now been discovered, somewhat surprisingly, that patterned coatings 110 formed from compounds exhibiting relatively low surface energies can also exhibit relatively low refractive indices n.

[0384] temperature Glass transition temperature In some non-limiting examples, the patterned film 110 and / or patterning material 611, when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned film 110 in the device 100, may have a glass transition temperature that is one of: (i) at least about 300°C or higher, at least about 150°C or higher, at least about 130°C or higher, and (ii) one of about 30°C or lower, about 0°C or lower, about -30°C or lower, or about -50°C or lower.

[0385] sublimation temperature In some non-limiting examples, materials including, but not limited to, patterning material 611 that have substantially lower intermolecular forces may tend to exhibit substantially lower sublimation temperatures.

[0386] In some non-limiting examples, materials including but not limited to patterning material 611 having substantially low sublimation temperatures may have reduced applicability to manufacturing processes that may require substantially precise control of the average layer thickness of the deposited film of the material.

[0387] In some non-limiting examples, materials including, but not limited to, patterning material 611 having a sublimation temperature that is one of about 140°C or less, about 120°C or less, about 110°C or less, about 100°C or less, and about 90°C or less may tend to encounter constraints on at least one of the deposition rate and average layer thickness of films including such materials that can be deposited using known vapor deposition methods, including, but not limited to, vacuum thermal evaporation.

[0388] In some non-limiting examples, materials including but not limited to patterning material 611 may have applicability in some scenarios requiring substantially high precision in controlling the average layer thickness of films including such materials.

[0389] In some non-limiting examples, materials including but not limited to patterning material 611 having a substantially low, but not excessively low, surface tension may have applicability in some scenarios requiring substantially high sublimation temperatures.

[0390] In some non-limiting examples, coatings including but not limited to patterned coatings 110 constructed from materials including but not limited to patterning materials 611 having substantially low surface energies and substantially high sublimation temperatures may have applications in some scenarios requiring substantially high precision in controlling the average layer thickness of films comprising such materials.

[0391] In some non-limiting examples, the patterning material can have a sublimation temperature of at least one of about 100-320° C., about 120-300° C., about 140-280° C., and about 150-250° C. In some non-limiting examples, such a sublimation temperature can allow the patterning material 611 to be substantially readily deposited as a film using PVD.

[0392] In some non-limiting examples, materials with substantially low intermolecular forces may exhibit substantially low sublimation temperatures. In some non-limiting examples, materials with low sublimation temperatures may have reduced applicability to manufacturing processes requiring a substantially high degree of control over the thickness of deposited films of the material. In some non-limiting examples, materials with sublimation temperatures of about 140°C or less, about 120°C or less, about 110°C or less, about 100°C or less, and about 90°C or less may impose constraints on controlling the deposition rate and thickness of films deposited using vapor deposition methods, including, but not limited to, vacuum thermal evaporation. In some non-limiting examples, materials with substantially high sublimation temperatures may have applications in scenarios requiring a substantially high degree of control over film thickness.

[0393] The sublimation temperature of materials, including but not limited to patterning material 611, can be determined using a variety of methods apparent to those skilled in the relevant art, including heating the material in a crucible under a substantially high vacuum; Observing the onset of deposition of material onto the exposed layer surface 11 on a QCM mounted at a fixed distance from the crucible; observing a specific deposition rate, in some non-limiting examples 0.1 Å / sec, onto the exposed layer surface 11 on a QCM mounted at a fixed distance from the crucible; and / or In some non-limiting examples, approximately 10 -4 or 10 -5 These include, but are not limited to, determining the temperature that can be achieved to reach the material's threshold vapor pressure in Torr.

[0394] In some non-limiting examples, the sublimation temperature of materials, including but not limited to, patterning material 611, can be substantially in a high vacuum environment (for non-limiting examples, about 10 -4 This can be determined by heating the material in the evaporation source at temperatures below 1000 K (Torr) and determining the temperature that can be reached to evaporate the material, so that in some non-limiting examples, a vapor flux sufficient to cause deposition of the material onto a surface on a QCM mounted a fixed distance from the source is generated at a deposition rate of about 0.1 Å / sec onto the exposed layer surface 11.

[0395] In some non-limiting examples, the QCM can be mounted approximately 65 cm from the crucible for purposes of determining the sublimation temperature.

[0396] In some non-limiting examples, the patterning material 611 can have a sublimation temperature of one of about 100-320°C, about 100-300°C, about 120-300°C, about 100-250°C, about 140-280°C, about 120-230°C, about 130-220°C, about 140-210°C, about 140-200°C, about 150-250°C, and about 140-190°C.

[0397] Melting point In some non-limiting examples, materials including, but not limited to, patterning material 611 that have substantially low intermolecular forces may tend to exhibit substantially low melting points.

[0398] In some non-limiting examples, materials including but not limited to patterning material 611 having a substantially low melting point may have reduced applicability in some scenarios requiring sufficient temperature reliability for temperatures of about 60°C or less, about 80°C or less, and about 100°C or less due to changes in the physical properties of such materials at operating temperatures approaching their melting points.

[0399] In some non-limiting examples, a material having a melting point of about 120°C may have reduced applicability in some scenarios requiring substantially higher temperature reliability, including, but not limited to, at least about 100°C.

[0400] In some non-limiting examples, materials including but not limited to patterning material 611 having a substantially high melting point may have applicability in some scenarios requiring substantially high temperature reliability.

[0401] In some non-limiting examples, the patterned coating 110 and / or its compounds may have a melting temperature that is one of at least about 90°C, at least about 100°C, at least about 110°C, at least about 120°C, at least about 140°C, at least about 150°C, and at least about 180°C.

[0402] cohesive energy According to Young's equation, the cohesive energy (or fracture toughness or cohesive strength) of a material may tend to be proportional to its surface energy (see Young, Thomas (1805) "An essay on the cohesion of fluids" Philosophical Transactions of the Royal Society of London, 95:65-87).

[0403] According to Lindemann's criterion, the cohesive energy of a material can tend to be proportional to its melting temperature [see Nanda, KK, Sahu, SN, and Behera, SN (2002) "Liquid-drop model for the size-dependent melting of low-dimensional systems" Phys. Rev. A. 66(1):013208].

[0404] In some non-limiting examples, materials, including but not limited to patterning material 611, that have substantially low intermolecular forces may tend to exhibit substantially low cohesive energy.

[0405] In some non-limiting examples, materials including, but not limited to, patterning material 611 having substantially low cohesive energy may have reduced applicability in some scenarios requiring sufficient fracture toughness, including, but not limited to, devices that may be prone to shear stresses and / or bending stresses during at least one of fabrication and / or use, and therefore, in such scenarios, the material may be prone to cracking or breaking. In some non-limiting examples, materials including, but not limited to, patterning material 611 having a cohesive energy of about 30 dynes / cm or less may have reduced applicability in some scenarios in devices fabricated on flexible substrates 10.

[0406] In some non-limiting examples, materials including, but not limited to, patterning material 611 having a substantially high cohesive energy may have applicability in some scenarios requiring substantially high reliability under at least one of shear stress and bending stress, including, but not limited to, devices fabricated on flexible substrates 10.

[0407] In some non-limiting examples, materials including, but not limited to, patterning material 611 having a substantially low, but not excessively low, surface energy may have applicability in some scenarios requiring sufficient reliability under at least one of shear stress and bending stress, including, but not limited to, devices fabricated on flexible substrates 10.

[0408] In some non-limiting examples, materials including, but not limited to, patterning material 611 having substantially low surface energy and substantially high cohesive energy may have applicability in some scenarios requiring substantially high reliability under at least one of shear stress and bending stress. Given that, in some non-limiting examples, a single material having substantially low surface energy may also tend to exhibit substantially low cohesive energy, in some non-limiting examples, challenges may exist in achieving such a combination from a single material.

[0409] In some non-limiting examples, coatings including but not limited to patterned coating 110 having substantially low surface energy, substantially high cohesive energy, and substantially high melting point may have applicability in some scenarios requiring substantially high reliability under various conditions. Given that, in some non-limiting examples, a single material having a substantially low surface energy may tend to also exhibit a substantially low cohesive energy and a substantially low melting point, in some non-limiting examples, challenges may exist in achieving such a combination from a single material.

[0410] Optical gap or band gap In the present disclosure, a semiconductor material may generally be described as a material that exhibits a band gap. In some non-limiting examples, the band gap may be formed between the highest occupied molecular orbital (HOMO) and the lowest unoccupied molecular orbital (LUMO) of the semiconductor material. Thus, semiconductor materials may tend to exhibit electrical conductivities that are substantially less than or equal to those of conductive materials (including, but not limited to, metals), but at least as substantially greater than those of insulating materials (including, but not limited to, glass). In some non-limiting examples, the semiconductor material may include an organic semiconductor material. In some non-limiting examples, the semiconductor material may include an inorganic semiconductor material.

[0411] In some non-limiting examples, materials, including but not limited to, patterning material 611, that have substantially low surface energy may tend to exhibit substantially large or wide optical gaps. In some non-limiting examples, the optical gaps of materials, including but not limited to, patterning material 611, may tend to correspond to the HOMO-LUMO gaps of the materials.

[0412] In some non-limiting examples, materials including, but not limited to, patterning material 611 having a substantially large or wide optical gap (and / or HOMO-LUMO gap) may tend to exhibit substantially weak or substantially no photoluminescence in at least one of the deep B (blue) region of the visible spectrum, the near UV spectrum, the visible spectrum, and / or the NIR spectrum.

[0413] In some non-limiting examples, coatings including but not limited to patterning coating 110 constructed from materials including but not limited to patterning material 611 that have substantially weak or substantially no photoluminescence or absorption in one of the wavelength ranges of at least about 365 nm and at least about 460 nm may tend not to function as either photoluminescent or absorbing coatings and may have applicability in some scenarios requiring substantially high transparency in at least one of the visible and NIR spectra.

[0414] In some non-limiting examples, such materials may tend to exhibit substantially lower photoluminescence when subjected to EM radiation having a wavelength of about 365 nm, a common wavelength for radiation sources used in fluorescence microscopy. The presence of such materials, including but not limited to patterning material 611, particularly when deposited as a thin film, in some non-limiting examples, may reduce the applicability in some scenarios requiring typical optical detection techniques, including but not limited to fluorescence microscopy. This may impose constraints in some scenarios where material is selectively deposited over portions of substrate 10, such as through an FMM, since there may be some scenarios where the portions where such material is present can be determined following deposition of the material.

[0415] In some non-limiting examples, materials with relatively large HOMO-LUMO gaps may have applicability in some scenarios requiring weak or substantially no photoluminescence or absorption in one of the wavelength ranges of at least about 365 nm and at least about 460 nm.

[0416] In some non-limiting examples, materials with substantially small HOMO-LUMO gaps may have applicability in scenarios where films of the material are detected using optical techniques.

[0417] Refractive index and extinction coefficient In some non-limiting examples, the patterned film 110 and / or patterned material 611 may have a low refractive index when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned film 110 in the device 100.

[0418] In some non-limiting examples, the patterned coating 110 and / or patterning material 611, in some non-limiting examples, when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned coating 110 in the device 100, can have a refractive index for EM radiation at a wavelength of 550 nm that can be at least one of about 1.55 or less, about 1.5 or less, about 1.45 or less, about 1.43 or less, about 1.4 or less, about 1.39 or less, about 1.37 or less, about 1.35 or less, about 1.32 or less, and about 1.3 or less.

[0419] In some non-limiting examples, the refractive index n of the patterned coating 110 can be about 1.7 or less. For example, the refractive index of the patterned coating 110 can be one of about 1.6 or less, about 1.5 or less, about 1.4 or less, and about 1.3 or less. In some non-limiting examples, the refractive index n of the patterned coating 110 can be at least one of about 1.2-1.6, about 1.2-1.5, and about 1.25-1.45. As further explained in the various non-limiting examples above, a patterned coating 110 exhibiting a substantially low refractive index may find use in some scenarios to enhance the optical properties and / or performance of an optoelectronic device, for example, by enhancing the outcoupling of EM radiation emitted by the device.

[0420] Without wishing to be bound by any particular theory, it has been observed that providing a patterned coating 110 with a substantially low refractive index can increase the transmittance of external EM radiation through its second portion 102 in at least some devices 100. In some non-limiting examples, a device 100 including air gaps therein, which may be disposed near or adjacent to a patterned coating 110, can exhibit substantially higher transmittance when the patterned coating 110 has a substantially low refractive index compared to a similarly configured device that was not provided with such a low refractive index patterned coating 110.

[0421] By way of non-limiting example, a series of samples were prepared to measure the refractive index at a wavelength of 550 nm of coatings formed from some of the various exemplary materials, and the results are summarized in Table 4 below.

[0422] [Table 4]

[0423] Based on the aforementioned measurements of refractive index in Table 4 and previous observations regarding the presence or absence of a substantially closed coating 140 of Ag in Table 4, it has been found that a material that forms a low refractive index coating may be a material having a refractive index less than or equal to at least one of, by way of non-limiting example, about 1.4 or about 1.38, and may be suitable for inhibiting the deposition of deposition materials 731, including, but not limited to, Ag and / or Ag-containing materials, thereon to form a patterned coating 110.

[0424] In some non-limiting examples, the patterned film 110 and / or patterned material 611 may have a low refractive index when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned film 110 in the device 100.

[0425] In some non-limiting examples, the patterned coating 110 and / or patterning material 611, in some non-limiting examples, when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned coating 110 in the device 100, can have a refractive index for EM radiation at a wavelength of 550 nm that can be at least one of about 1.55 or less, about 1.5 or less, about 1.45 or less, about 1.43 or less, about 1.4 or less, about 1.39 or less, about 1.37 or less, about 1.35 or less, about 1.32 or less, and about 1.3 or less.

[0426] In some non-limiting examples, the patterned coating 110 and / or patterning material 611 can exhibit a surface energy of about 25 dynes / cm or less and a refractive index of about 1.45 or less. In some non-limiting examples, the patterned coating 110 and / or patterning material 611 can include a material that exhibits a surface energy of about 20 dynes / cm or less and a refractive index of about 1.4 or less.

[0427] In some non-limiting examples, the patterned coating 110 can be substantially transparent and / or EM radiation transmissive.

[0428] In some non-limiting examples, the patterned film 110 and / or patterning material 611, in some non-limiting examples, when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned film 110 in the device 100, can have an extinction coefficient that can be about 0.01 or less for photons at wavelengths that are at least one of at least about 600 nm, at least about 500 nm, at least about 460 nm, at least about 420 nm, and at least about 410 nm.

[0429] In some non-limiting examples, the patterned coating 110 may exhibit an extinction coefficient κ in the visible light spectrum of less than or equal to one of about 0.1, about 0.08, about 0.05, about 0.03, and about 0.01.

[0430] Photoluminescence, absorption and other optical effects In some non-limiting examples, materials that exhibit substantially low or substantially no photoluminescence at wavelengths that are at least one of about 365 nm and at least about 460 nm may have applicability in some scenarios requiring substantially high transparency in at least one of the visible and NIR spectra.

[0431] In some non-limiting examples, materials that have substantially low or substantially no absorption at wavelengths that are at least one of about 365 nm and at least about 460 nm may have applicability in some scenarios requiring substantially high transparency in at least one of the visible and NIR spectra.

[0432] In some non-limiting examples, the patterned film 110 and / or patterning material 611, when deposited as a film and / or some form of coating and under conditions similar to the deposition of the patterned film 110 in the device 100, may not substantially attenuate EM radiation passing therethrough, at least in the visible spectrum.

[0433] In some non-limiting examples, the patterned coating 110 and / or patterning material 611, when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned coating 110 in the device 100, may not substantially attenuate EM radiation passing therethrough, at least in the IR and / or NIR spectrum.

[0434] In some non-limiting examples, the patterned coating 110 and / or patterning material 611, in some non-limiting examples, when deposited in the form of a film and / or coating and under conditions similar to the deposition of the patterned coating 110 in the device 100, can have an extinction coefficient that can be one of at least about 0.05, at least about 0.1, at least about 0.2, and at least about 0.5 for EM radiation at wavelengths that are one of about 400 nm or less, about 390 nm or less, about 380 nm or less, and about 370 nm or less.

[0435] In this manner, patterned coating 110 and / or patterning material 611, when deposited in the form of a film and / or coating and under conditions similar to the deposition of patterned coating 110 in device 100, can absorb EM radiation in the UVA spectrum incident on device 100, thereby reducing the likelihood that EM radiation in the UVA spectrum can impose limitations on device performance, device stability, device reliability, and / or device lifetime.

[0436] In some non-limiting examples, the patterned coating 110 can function as an optical coating. In some non-limiting examples, the patterned coating 110 can modify at least one property and / or characteristic of the EM radiation (including, but not limited to, the form of photons) emitted by the device 100. In some non-limiting examples, the patterned coating 110 can exhibit a degree of haze, scattering the emitted EM radiation. In some non-limiting examples, the patterned coating 110 can include a crystalline material for scattering EM radiation transmitted therethrough. Such scattering of EM radiation can, in some non-limiting examples, facilitate enhanced outcoupling of EM radiation from the device 100. In some non-limiting examples, the patterned coating 110 can initially be deposited as a substantially amorphous coating, including, but not limited to, a substantially amorphous coating, whereupon, after its deposition, the patterned coating 110 can be crystallized and then serve as an optical coupling.

[0437] In some non-limiting examples, patterned coating 110 may not exhibit any substantial EM radiation absorption at any wavelength corresponding to the visible light spectrum.

[0438] weight Without wishing to be bound by any particular theory, it can be hypothesized that for compounds adapted to form surfaces with substantially low surface energy, there may be scenarios in which the molecular weight of such compounds, at least in some applications, would require one of about 800 to 3,000 g / mol, about 900 to 2,000 g / mol, about 900 to 1,800 g / mol, and about 900 to 1,600 g / mol.

[0439] Without wishing to be bound by any particular theory, it can be hypothesized that such compounds may exhibit at least one property that may have applicability in some scenarios for forming films and / or layers having one of: (i) a substantially high melting point, in some non-limiting examples, of at least 100°C; (ii) a substantially low surface energy; and / or (iii) in some non-limiting examples, a substantially amorphous structure when deposited using a vacuum-based thermal evaporation process.

[0440] In some non-limiting examples, the molecular weight of the compound can be about 5,000 g / mol or less, hi some non-limiting examples, the molecular weight of the compound can be about 4,500 g / mol or less, about 4,000 g / mol or less, about 3,500 g / mol or less, and about 3,000 g / mol or less.

[0441] In some non-limiting examples, the molecular weight of the compound can be at least about 800 g / mol. In some non-limiting examples, the molecular weight of the compound can be one of at least about 900 g / mol, at least about 1,000 g / mol, at least about 1,100 g / mol, at least about 1,200 g / mol, at least about 1,300 g / mol, at least about 1,500 g / mol, and at least about 1,700 g / mol.

[0442] In some non-limiting examples, the molecular weight of the compound can be one of about 800-3,000 g / mol, about 900-2,000 g / mol, about 900-1,800 g / mol, or about 900-1,600 g / mol.

[0443] In some non-limiting examples, the percentage of the molar weight of such compounds that can be attributed to the presence of F atoms can be one of about 40-90%, about 45-85%, about 50-80%, about 55-75%, and about 60-75%. In some non-limiting examples, the F atoms can constitute a majority of the molar weight of such compounds.

[0444] In some non-limiting examples, the quotient of F atoms contained in the compound / C atoms contained in the compound can be one of at least about 0.5, at least about 0.7, at least about 1, at least about 1.5, at least about 2, and at least about 2.5. In some non-limiting examples, the quotient of F atoms / Si atoms can be one of about 5 or less, about 4 or less, and about 3 or less.

[0445] Without wishing to be bound by any particular theory, it can be hypothesized that such compounds may exhibit at least one property that may be suitable for forming films and / or layers having a substantially amorphous structure when deposited using a vacuum-based thermal evaporation process, (i) a relatively high melting point, in some non-limiting examples, of at least 100°C; (ii) a relatively low surface energy; and / or (iii) in some non-limiting examples.

[0446] In some non-limiting examples, the patterned coating 110 may be disposed in a pattern that may be defined by at least one region therein that may be substantially devoid of the occlusive coating 140 of the patterned coating 110. In some non-limiting examples, the at least one region may separate the patterned coating 110 into a plurality of individual pieces thereof. In some non-limiting examples, the plurality of individual pieces of the patterned coating 110 may be physically separated from one another on their lateral surfaces. In some non-limiting examples, the plurality of individual pieces of the patterned coating 110 may be arranged in an ordered structure, including, but not limited to, an array or matrix, such that, in some non-limiting examples, the individual pieces of the patterned coating 110 may be arranged in a repeating pattern.

[0447] In some non-limiting examples, at least one of the plurality of individual segments of patterned coating 110 may each correspond to an emissive region 1401 .

[0448] In some non-limiting examples, the aperture ratio of emitting region 1401 can be at least one of about 50% or less, about 40% or less, about 30% or less, and about 20% or less.

[0449] In some non-limiting examples, the patterned coating 110 can be formed as a single monolithic coating.

[0450] In some non-limiting examples, the patterned film 110 may have and / or provide at least one nucleation site for the deposition material 731 for reasons including, but not limited to, the patterning material 611 used and / or the deposition environment.

[0451] In some non-limiting examples, the patterned coating 110 may be doped, coated, and / or supplemented with another material that can function as a seed or inhomogeneity to serve as such nucleation sites for the deposited material 731. In some non-limiting examples, such other material may include NPC920 material. In some non-limiting examples, such other material may include organic materials, such as polycyclic aromatic compounds, and / or materials containing non-metallic elements, such as, but not limited to, at least one of O, S, N, and C, the presence of which may otherwise be contaminants in the source material, the equipment used for deposition, and / or the vacuum chamber environment. In some non-limiting examples, such other material may be deposited in a layer thickness that is a fraction of a monolayer to avoid forming a closure coating 140 thereof. Rather, monomers of such other material may tend to be laterally spaced to form separate nucleation sites for the deposited material.

[0452] In some non-limiting examples, the patterned coating 110 can function as an optical coating. In some non-limiting examples, the patterned coating 110 can modify at least one property and / or characteristic of the EM radiation (including, but not limited to, the form of photons) emitted by the device 100. In some non-limiting examples, the patterned coating 110 can exhibit a degree of haze and scatter the emitted EM radiation. In some non-limiting examples, the patterned coating 110 can include a crystalline material for scattering EM radiation transmitted therethrough. Such scattering of EM radiation can, in some non-limiting examples, facilitate enhanced outcoupling of EM radiation from the device. In some non-limiting examples, the patterned coating 110 can initially be deposited as a substantially amorphous coating, including, but not limited to, a substantially amorphous coating, whereupon, after its deposition, the patterned coating 110 can be crystallized and then serve as an optical coupling.

[0453] In some non-limiting examples, the objective may be to provide a patterned coating 110 to cause the formation of a discontinuous layer 840 of at least one grain structure 841 when the patterned coating 110 is subjected to a vapor flux 732 of deposition material 731. In at least some applications, the patterned coating 110 may exhibit a sufficiently low initial sticking probability such that a discontinuous layer 840 of at least one grain structure 841 having at least one characteristic may form in the first portion 101 on the patterned coating 110, while a closure coat 140 of the deposition material 731 may form in the second portion 102, which may be substantially devoid of the patterned coating 110. In some non-limiting examples, the goal may be to form a discontinuous layer 840 of at least one grain structure 841 of deposition material 731, which may be, by way of non-limiting example, a metal or metal alloy, in the second portion 102 while depositing a closure coat 140 of deposition material 731 having a thickness of, for example, one of about 100 nm or less, about 50 nm or less, about 25 nm or less, or about 15 nm or less. In some non-limiting examples, the relative amount of deposition material 731 deposited as the discontinuous layer 840 of the at least one grain structure 841 in the first portion 101 may correspond to at least one of about 1-50%, about 2-25%, about 5-20%, and about 7-10% of the amount of deposition material 731 deposited as the closure coat 140 in the second portion 102, which may correspond to a thickness of, by way of non-limiting example, one of about 100 nm or less, about 75 nm or less, about 50 nm or less, about 25 nm or less, and about 15 nm or less.

[0454] composition In some non-limiting examples, patterning film 110 and / or patterning material 611 can include fluorine (F) atoms and / or Si atoms. As a non-limiting example, patterning material 611 for forming patterning film 110 can be a compound including F and / or Si.

[0455] In some non-limiting examples, patterning material 611 can include a compound containing F. In some non-limiting examples, patterning material 611 can include a compound containing F and carbon atoms. In some non-limiting examples, patterning material 611 can include a compound containing F and C in an atomic ratio corresponding to a quotient F / C of at least one of at least about 1, at least about 1.5, or at least about 2. In some non-limiting examples, the atomic ratio of F to C counts all of the F atoms present in the compound structure and, for C atoms, counts the sp atoms present in the compound structure. 3 It can be determined by counting only hybridized C atoms. In some non-limiting examples, patterning material 611 can include a compound that includes, as part of its molecular substructure, a moiety that includes F and C in an atomic ratio corresponding to a quotient F / C of at least about 1, at least about 1.5, or at least about 2.

[0456] In some non-limiting examples, the compound of patterning material 611 can include an organic-inorganic hybrid material.

[0457] In some non-limiting examples, patterning material 611 may be or include an oligomer.

[0458] In some non-limiting examples, patterning material 611 may be or may include a compound having a molecular structure containing a backbone and at least one functional group attached to the backbone, in some non-limiting examples, the backbone may be an inorganic moiety and the at least one functional group may be an organic moiety.

[0459] In some non-limiting examples, such compounds can have molecular structures that include siloxane groups. In some non-limiting examples, the siloxane groups can be linear, branched, or cyclic siloxane groups. In some non-limiting examples, the backbone can be or include siloxane groups. In some non-limiting examples, the backbone can be or include siloxane groups and at least one functional group containing F. In some non-limiting examples, the at least one functional group containing F can be a fluoroalkyl group. Non-limiting examples of such compounds include fluorosiloxanes. Non-limiting examples of such compounds are Exemplary Material 6 and Exemplary Material 9.

[0460] In some non-limiting examples, the compound can have a molecular structure including a silsesquioxane group. In some non-limiting examples, the silsesquioxane group can be a POSS. In some non-limiting examples, the backbone can be or include a silsesquioxane group. In some non-limiting examples, the backbone can be or include a silsesquioxane group and at least one functional group including F. In some non-limiting examples, the at least one functional group including F can be a fluoroalkyl group. Non-limiting examples of such compounds include fluoro-silsesquioxane and / or fluoro-POSS. A non-limiting example of such a compound is Exemplary Material 8.

[0461] In some non-limiting examples, the compound may have a molecular structure including a substituted or unsubstituted aryl group and / or a substituted or unsubstituted heteroaryl group. In some non-limiting examples, the aryl group may be phenyl or naphthyl. In some non-limiting examples, at least one C atom of the aryl group may be replaced by a heteroatom (which may be, for non-limiting examples, O, N, and / or S) to derive a heteroaryl group. In some non-limiting examples, the backbone may be or may include a substituted or unsubstituted aryl group and / or a substituted or unsubstituted heteroaryl group. In some non-limiting examples, the backbone may be or may include a substituted or unsubstituted aryl group and / or a substituted or unsubstituted heteroaryl group, and at least one functional group containing F. In some non-limiting examples, the at least one functional group containing F may be a fluoroalkyl group.

[0462] In some non-limiting examples, the compounds may have molecular structures comprising substituted or unsubstituted linear, branched, or cyclic hydrocarbon groups. In some non-limiting examples, one or more C atoms of the hydrocarbon group may be replaced by a heteroatom, which may be, by way of non-limiting example, O, N, and / or S.

[0463] In some non-limiting examples, the compound can have a molecular structure that includes a phosphazene group. In some non-limiting examples, the phosphazene group can be a linear, branched, or cyclic phosphazene group. In some non-limiting examples, the backbone can be or include a phosphazene group. In some non-limiting examples, the backbone can be or include a phosphazene group and at least one functional group that includes F. In some non-limiting examples, the at least one functional group that includes F can be a fluoroalkyl group. Non-limiting examples of such compounds include fluorophosphazenes. A non-limiting example of such a compound is Exemplary Material 4.

[0464] In some non-limiting examples, the compound can be a fluoropolymer. In some non-limiting examples, the compound can be a block copolymer comprising F. In some non-limiting examples, the compound can be an oligomer. In some non-limiting examples, the oligomer can be a fluoro-oligomer. In some non-limiting examples, the compound can be a block oligomer comprising F. Non-limiting examples of fluoropolymers and / or fluoro-oligomers are those having the molecular structure of Exemplary Material 3, Exemplary Material 5, and / or Exemplary Material 7.

[0465] In some non-limiting examples, the compound can be a metal complex. In some non-limiting examples, the metal complex can be an organometallic complex. In some non-limiting examples, the organometallic complex can include F. In some non-limiting examples, the organometallic complex can include at least one ligand that includes F. In some non-limiting examples, the at least one ligand that includes F can be or include a fluoroalkyl group.

[0466] In some non-limiting examples, patterning material 611 may be or include an organic-inorganic hybrid material.

[0467] In some non-limiting examples, patterning material 611 can include multiple different materials.

[0468] In some non-limiting examples, the patterned coating 110 can include multiple materials. In some non-limiting examples, the patterned coating 110 can include a first material and a second material.

[0469] In some non-limiting examples, at least one of the materials of patterned coating 110 can serve as a NIC when deposited as a thin film.

[0470] In some non-limiting examples, at least one of the materials of patterned coating 110 can serve as a NIC when deposited as a film, and another material can form NPC 920 when deposited as a thin film. In some non-limiting examples, a first material can form NPC 920 when deposited as a thin film, and a second material can form NIC when deposited as a thin film. In some non-limiting examples, the presence of a first material in patterned coating 110 can result in an increased initial adhesion probability compared to when patterned coating 110 is formed from the second material and is substantially devoid of the first material.

[0471] In some non-limiting examples, at least one of the materials of patterned coating 110 can be adapted to form a surface having a low surface energy when deposited as a thin film. In some non-limiting examples, a first material can be adapted to form a surface having a lower surface energy when deposited as a thin film than a surface provided by a thin film including a second material.

[0472] In some non-limiting examples, the patterned coating 110 may exhibit photoluminescence, including but not limited to including a material that exhibits photoluminescence.

[0473] In some non-limiting examples, the patterned coating 110 may exhibit photoluminescence at wavelengths corresponding to the UV spectrum and / or the visible spectrum. In some non-limiting examples, the photoluminescence may occur at wavelengths (ranges) corresponding to the UV spectrum, including but not limited to the UVA spectrum and / or the UVB spectrum. In some non-limiting examples, the photoluminescence may occur at wavelengths (ranges) corresponding to the visible spectrum. In some non-limiting examples, the photoluminescence may occur at wavelengths (ranges) corresponding to deep blue or near UV.

[0474] In some non-limiting examples, the first material can have a first optical gap and the second material can have a second optical gap. In some non-limiting examples, the second optical gap can be larger than the first optical gap. In some non-limiting examples, the difference between the first and second optical gaps can be greater than at least one of approximately 0.3 eV, 0.5 eV, 0.7 eV, 1 eV, 1.3 eV, 1.5 eV, 1.7 eV, 2 eV, 2.5 eV, and / or 3 eV.

[0475] In some non-limiting examples, the first optical gap may be less than or equal to at least one of about 4.1 eV, 3.5 eV, or 3.4 eV, and in some non-limiting examples, the second optical gap may be greater than at least one of about 3.4 eV, about 3.5 eV, about 4.1 eV, about 5 eV, or about 6.2 eV.

[0476] In some non-limiting examples, the first optical gap and / or the second optical gap may correspond to a HOMO-LUMO gap.

[0477] In some non-limiting examples, the first material may exhibit photoluminescence at wavelengths corresponding to the UV spectrum and / or the visible spectrum. In some non-limiting examples, the photoluminescence may occur at wavelengths corresponding to the UV spectrum, including but not limited to the UVA spectrum and / or the UVB spectrum. In some non-limiting examples, the photoluminescence may occur at wavelengths corresponding to the visible spectrum. In some non-limiting examples, the photoluminescence may occur at wavelengths corresponding to the deep B (blue) region of the visible spectrum.

[0478] In some non-limiting examples, the first material may exhibit photoluminescence at wavelengths corresponding to the visible spectrum, and the second material may not exhibit substantial photoluminescence at any wavelengths corresponding to the visible spectrum.

[0479] In some non-limiting examples, at least one of the materials of the patterned coating 110 that may exhibit photoluminescence may include at least one of a conjugated bond, an aryl moiety, a donor-acceptor group, or a heavy metal complex.

[0480] As a non-limiting example, photoluminescence of a coating and / or material can be observed through a photoexcitation process. In a photoexcitation process, the coating and / or material can be subjected to EM radiation emitted by a source, including, but not limited to, a UV lamp. When the emitted EM radiation is absorbed by the coating and / or material, its electrons can be temporarily excited. Following the excitation, at least one relaxation process, including, but not limited to, fluorescence and / or phosphorescence, can occur, in which EM radiation can be emitted from the coating and / or material. The EM radiation emitted from the coating and / or material during such a process can be detected, for example, by a photodetector, to characterize the photoluminescence properties of the coating and / or material. As used herein, the wavelength of photoluminescence with respect to a coating and / or material can generally refer to the wavelength of EM radiation emitted by such coating and / or material as a result of relaxation of electrons from an excited state. As will be understood by those skilled in the art, the wavelength of light emitted by a coating and / or material as a result of the photoexcitation process may, in some non-limiting examples, be longer than the wavelength of the radiation used to initiate the photoexcitation. Photoluminescence may be detected and / or characterized using various techniques known in the art, including, but not limited to, fluorescence microscopy. As used herein, a photoluminescent coating or material may exhibit photoluminescence at a wavelength when irradiated with excitation radiation of a particular wavelength. In some non-limiting examples, a photoluminescent coating or material may exhibit photoluminescence at wavelengths greater than about 365 nm when irradiated with excitation radiation having a wavelength of 365 nm. Photoluminescent coatings may be detected on substrate 10 using standard optical techniques, including, but not limited to, fluorescence microscopy, which may quantify, measure, and / or investigate the presence of such coatings or materials.

[0481] In some non-limiting examples, the optical gaps of the various coatings and / or materials, including but not limited to the first optical gap and / or the second optical gap, may correspond to the energy gaps of the coatings and / or materials where EM radiation is absorbed or emitted during the photoexcitation process.

[0482] In some non-limiting examples, photoluminescence can be detected and / or characterized by subjecting the coating and / or material to EM radiation having a wavelength corresponding to the UV spectrum, including but not limited to the UVA spectrum or the UVB spectrum. In some non-limiting examples, the EM radiation for initiating photoexcitation can have a wavelength of about 365 nm.

[0483] In some non-limiting examples, the second material may exhibit substantially no photoluminescence at any wavelength corresponding to the visible spectrum. In some non-limiting examples, the second material may exhibit no photoluminescence when subjected to EM radiation having at least one of wavelengths of at least about 300 nm, at least about 320 nm, at least about 350 nm, or at least about 365 nm. In some non-limiting examples, the second material may exhibit little and / or no detectable absorption when subjected to such EM radiation. In some non-limiting examples, the second optical gap of the second material may be wider than the photon energy of the EM radiation emitted by the source such that the second material does not undergo photoexcitation when subjected to such EM radiation. However, in some non-limiting examples, a patterned coating 110 containing such a second material may nevertheless exhibit photoluminescence when subjected to EM radiation because the first material exhibits photoluminescence. In some non-limiting examples, the presence of patterned coating 110 may be detected and / or observed using routine characterization techniques, such as fluorescence microscopy, during deposition of patterned coating 110.

[0484] In some non-limiting examples, the concentration of the first material in patterned coating 110 can be less than or equal to the concentration of the second material in patterned coating 110, including but not limited to, the concentration of the first material in patterned coating 110. In some non-limiting examples, patterned coating 110 can include at least about 0.1 wt%, at least about 0.2 wt%, at least about 0.5 wt%, at least about 0.8 wt%, at least about 1 wt%, at least about 3 wt%, at least about 5 wt%, at least about 8 wt%, at least about 10 wt%, at least about 15 wt%, or at least about 20 wt% of at least one of the first materials. In some non-limiting examples, the patterned coating 110 can include about 50% by weight or less, about 40% by weight or less, about 30% by weight or less, about 25% by weight or less, about 20% by weight or less, about 15% by weight or less, about 10% by weight or less, about 8% by weight or less, about 5% by weight or less, about 3% by weight or less, or about 1% by weight or less of at least one of the first materials. In some non-limiting examples, the remainder of the patterned coating 110 can consist essentially of the second material. In some non-limiting examples, the patterned coating 110 can include additional materials, including, but not limited to, a third material and / or a fourth material.

[0485] In some non-limiting examples, at least one of the materials of the patterned coating 110, including but not limited to the first material and / or the second material, can include at least one of F and Si. As a non-limiting example, at least one of the first material and the second material can include at least one of F and Si. In some further non-limiting examples, the first material can include F and / or Si, and the second material can include F and / or Si. In some non-limiting examples, the first material and the second material can both include F. In some non-limiting examples, the first material and the second material can both include Si. In some non-limiting examples, each of the first material and the second material can include F and / or Si.

[0486] In some non-limiting examples, at least one of the first material and the second material can include both F and Si. In some non-limiting examples, one of the first material and the second material can be free of F and / or Si. In some non-limiting examples, the second material can include F and / or Si, and the first material can be free of F and / or Si.

[0487] In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include F, and at least one of the other materials of the patterned coating 110 may include sp 2 In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include F, and at least one of the other materials of the patterned coating 110 may include sp 3 In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may contain F and sp 3 The patterned coating 110 may include carbon and at least one of the other materials may include sp 2 In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may contain F and sp 3 carbon, and all F bonded to the carbon (C) are sp 3 The carbon may be bonded to at least one of the other materials of the patterned coating 110. 2 In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may contain F and sp 3 may contain carbon, and all F bonded to C may be sp 3 The carbon may be bonded to at least one of the other materials of the patterned coating 110. 2It may include carbon and may not include F. As a non-limiting example, in any of the above non-limiting examples, "at least one of the materials of patterned coating 110" may correspond to the second material, and "at least one of the other materials of patterned coating 110" may correspond to the first material.

[0488] As will be appreciated by those skilled in the art, F,sp 2 Carbon, sp 3 The presence of materials in the coating that include at least one of carbon, aromatic hydrocarbon moieties, and / or other functional groups or moieties can be detected using various methods known in the art, including, by way of non-limiting example, X-ray Photoelectron Spectroscopy (XPS).

[0489] In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include F, and at least one of the other materials of the patterned coating 110 may include an aromatic hydrocarbon moiety. In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include F, and at least one of the materials of the patterned coating 110 may not include an aromatic hydrocarbon moiety. In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include F and may not include an aromatic hydrocarbon moiety, and at least one of the other materials of the patterned coating 110 may include an aromatic hydrocarbon moiety. In some non-limiting examples, at least one of the materials of patterned coating 110, which may be, for example, the first material and / or the second material, may include F and may not include an aromatic hydrocarbon moiety, and at least one of the other materials of patterned coating 110 may include an aromatic hydrocarbon moiety and may not include F. Non-limiting examples of aromatic hydrocarbon moieties include at least one of a substituted polycyclic aromatic hydrocarbon moiety, an unsubstituted polycyclic aromatic hydrocarbon moiety, a substituted phenyl moiety, and an unsubstituted phenyl moiety.

[0490] In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include F, and at least one of the other materials of the patterned coating 110 may include a polycyclic aromatic hydrocarbon moiety. In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include F, and at least one of the materials of the patterned coating 110 may not include a polycyclic aromatic hydrocarbon moiety. In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include F, and may not include a polycyclic aromatic hydrocarbon moiety, and at least one of the other materials of the patterned coating 110 may include a polycyclic aromatic hydrocarbon moiety. In some non-limiting examples, at least one of the materials of patterned coating 110, which may be, for example, the first material and / or the second material, may include F and may be free of polycyclic aromatic hydrocarbon moieties, and at least one of the other materials of patterned coating 110 may include polycyclic aromatic hydrocarbon moieties and may be free of F.

[0491] In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include at least one of a fluorocarbon moiety and a siloxane moiety, and at least one of the other materials of the patterned coating 110 may include a polycyclic aromatic hydrocarbon moiety. In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include at least one of a fluorocarbon moiety and a siloxane moiety, and at least one of the materials of the patterned coating 110 may not include a polycyclic aromatic hydrocarbon moiety. In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include at least one of a fluorocarbon moiety and a siloxane moiety, and may not include a polycyclic aromatic hydrocarbon moiety, and at least one of the other materials of the patterned coating 110 may include a polycyclic aromatic hydrocarbon moiety. In some non-limiting examples, at least one of the materials of the patterned film 110, which may be, for example, the first material and / or the second material, may include at least one of a fluorocarbon moiety and a siloxane moiety and may not include a polycyclic aromatic hydrocarbon moiety, and at least one of the other materials of the patterned film 110 may include a polycyclic aromatic hydrocarbon moiety and may not include a fluorocarbon moiety or a siloxane moiety.

[0492] In some non-limiting examples, at least one of the materials of patterned coating 110, which may be, for example, the first material and / or the second material, may include F, and at least one of the other materials of patterned coating 110 may include a phenyl moiety. In some non-limiting examples, at least one of the materials of patterned coating 110, which may be, for example, the first material and / or the second material, may include F, and at least one of the materials of patterned coating 110 may not include a phenyl moiety. In some non-limiting examples, at least one of the materials of patterned coating 110, which may be, for example, the first material and / or the second material, may include F and may not include a phenyl moiety, and at least one of the other materials of patterned coating 110 may include a phenyl moiety. In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include F and may not include a phenyl moiety, and at least one of the other materials of the patterned coating 110 may include a phenyl moiety and may not include F.

[0493] In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include at least one of a fluorocarbon moiety and a siloxane moiety, and at least one of the other materials of the patterned coating 110 may include a phenyl moiety. In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include at least one of a fluorocarbon moiety and a siloxane moiety, and at least one of the materials of the patterned coating 110 may not include a phenyl moiety. In some non-limiting examples, at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may include at least one of a fluorocarbon moiety and a siloxane moiety, and may not include a phenyl moiety, and at least one of the other materials of the patterned coating 110 may include a phenyl moiety. In some non-limiting examples, at least one of the materials of the patterned film 110, which may be, for example, the first material and / or the second material, may include at least one of a fluorocarbon moiety and a siloxane moiety and may not include a phenyl moiety, and at least one of the other materials of the patterned film 110 may include a phenyl moiety and may not include a fluorocarbon moiety or a siloxane moiety.

[0494] In general, the molecular structures and / or molecular compositions of the materials of the patterned coating 110, which may be, for example, the first and second materials, may differ from one another. In some non-limiting examples, the materials may be selected to have at least one property that is substantially similar to or different from one another, including, but not limited to, at least one of the following: monomer molecular structure, monomer backbone, and / or functional groups, presence of common elements, similarity of molecular structure, characteristic surface energy, refractive index, molecular weight, and thermal properties, including, but not limited to, melting point, sublimation temperature, glass transition temperature, or thermal decomposition temperature.

[0495] Characteristic surface energy, when used herein particularly with respect to a material, may generally refer to the surface energy determined from such a material. As a non-limiting example, characteristic surface energy may be measured from a surface formed by a material deposited and / or coated in thin film form. Various methods and theories are known for determining the surface energy of a solid. As a non-limiting example, surface energy may be calculated and / or derived based on a series of contact angle measurements in which various liquids are brought into contact with the surface of the solid to measure the contact angle between the liquid-vapor interface and the surface. In some non-limiting examples, the surface energy of a solid surface may be equal to the surface tension of the liquid with the highest surface tension that completely wets the surface. As a non-limiting example, a Zisman plot may be used to determine the highest surface tension value that results in complete wetting with the surface (i.e., a contact angle of 0°).

[0496] In some non-limiting examples, at least one of the first material and the second material of the patterned coating 110 can be an oligomer.

[0497] In some non-limiting examples, the first material can include a first oligomer and the second material can include a second oligomer. Each of the first oligomer and the second oligomer can include multiple monomers.

[0498] In some non-limiting examples, at least a fraction of the molecular structure of at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may be represented by the following formula: (Mon) n (I) During the ceremony, Mon represents a monomer, n is an integer of at least two.

[0499] In some non-limiting examples, n can be at least one integer of about 2-00, about 2-50, about 3-20, about 3-15, about 3-10, or about 3-7.

[0500] In some non-limiting examples, the molecular structures of the first material and the second material of the patterned coating 110 can each independently be represented by formula (I). As a non-limiting example, n of the monomer and / or the first material can be different from that of the second material. In some non-limiting examples, n of the first material can be the same as n of the second material. In some non-limiting examples, n of the first material can be different from n of the second material. In some non-limiting examples, n of the first material can be different from n of the second material. In some non-limiting examples, the first material and the second material can be oligomers.

[0501] In some non-limiting examples, the monomer can include at least one of F and Si.

[0502] In some non-limiting examples, the monomer may include a functional group. In some non-limiting examples, at least one functional group of the monomer may have low surface tension. In some non-limiting examples, at least one functional group of the monomer may include at least one of F and Si. Non-limiting examples of such functional groups include at least one of a fluorocarbon group and a siloxane group. In some non-limiting examples, the monomer may include a silsesquioxane group.

[0503] Although some non-limiting examples have been described herein with respect to a first material and a second material, it will be understood that the patterned film may further include at least one additional material, and the descriptions regarding the molecular structure and / or properties of the first material, second material, first oligomer, and / or second oligomer may be applicable with respect to the additional material that may be contained in the patterned film.

[0504] Surface tensions attributable to fragments of molecular structures, including but not limited to, monomers, monomer backbone units, linkers, or functional groups, can be determined using various methods known in the art. Non-limiting examples of such methods include the use of parachor, as may be further described, by way of non-limiting example, in "Conception and Significance of the Pa," Nature 196:890-891. In some non-limiting examples, at least one monomer functional group may have a surface tension of less than or equal to at least one of about 25 dynes / cm, 21 dynes / cm, 20 dynes / cm, 19 dynes / cm, 18 dynes / cm, 17 dynes / cm, 16 dynes / cm, 15 dynes / cm, 14 dynes / cm, 13 dynes / cm, 12 dynes / cm, 11 dynes / cm, or 10 dynes / cm.

[0505] In some non-limiting examples, the monomer may include at least one of a CF2 and a CF2H moiety. In some non-limiting examples, the monomer may include at least one of a CF2 and a CF3 moiety. In some non-limiting examples, the monomer may include a CH2CF3 moiety. In some non-limiting examples, the monomer may include at least one of a C and an O. In some non-limiting examples, the monomer may include a fluorocarbon monomer. In some non-limiting examples, the monomer may include at least one of a vinyl fluoride moiety, a vinylidene fluoride moiety, a tetrafluoroethylene moiety, a chlorotrifluoroethylene moiety, a hexafluoropropylene moiety, or a fluorinated 1,3-dioxole moiety.

[0506] In some non-limiting examples, a monomer may comprise a monomer backbone and a functional group. In some non-limiting examples, the functional group may be attached to the monomer backbone directly or through a linker group. In some non-limiting examples, a monomer may comprise a linker group, and the linker group may be attached to the monomer backbone and the functional group. In some non-limiting examples, a monomer may comprise multiple functional groups, which may be the same as or different from one another. In such examples, each functional group may be attached to the monomer backbone directly or through a linker group. In some non-limiting examples, when multiple functional groups are present, multiple linker groups may also be present.

[0507] In some non-limiting examples, the molecular structure of at least one of the materials of the patterned coating 110, which may be the first material and / or the second material, may include a plurality of different monomers. In some non-limiting examples, such molecular structure may include monomer species having different molecular compositions and / or molecular structures. Non-limiting examples of such molecular structures include those represented by the following formula: (Mon A ) k (Mon B ) m (I-1) (Mon A ) k (Mon A ) m (Mon C ) o (I-2) During the ceremony, Mon A , Mon B , and Mon C represent the monomer species, k, m, and o each represent an integer of at least two.

[0508] In some non-limiting examples, k, m, and o each represent at least one integer from about 2 to 100, about 2 to 50, about 3 to 20, about 3 to 15, about 3 to 10, or about 3 to 7. Those skilled in the art will recognize that the various non-limiting examples and descriptions of the monomer, Mon, are Mon. A , MonB , and Mon C It will be understood that the above may be applicable with respect to each of the above.

[0509] In some non-limiting examples, the monomer may be represented by the following formula: M-(LR x ) y (II) During the ceremony, M represents a monomer backbone unit; L represents a linker group; R represents a functional group; x is an integer from 1 to 4, y is an integer of 1 to 3.

[0510] In some non-limiting examples, the linker group may be represented by at least one of a single bond, O, N, NH, C, CH, CH, and S.

[0511] The various non-limiting examples of functional groups described herein can be applied with respect to R in Formula (II). In some non-limiting examples, the functional group R can comprise an oligomeric unit, which can further comprise a plurality of functional group monomeric units. In some non-limiting examples, the functional group monomeric unit can be at least one of CH or CF. In some non-limiting examples, the functional group can comprise a CHCF moiety. For example, such functional group monomeric units can be linked together to form at least one of alkyl or fluoroalkyl oligomeric units. In some non-limiting examples, the oligomeric unit can further comprise a functional terminal unit. In some non-limiting examples, the functional terminal unit can be located at the end of the oligomeric unit and bonded to the functional monomeric unit. In some non-limiting examples, the end at which the functional terminal unit can be located can correspond to a functional fragment that can be distal to the monomer backbone unit. In some non-limiting examples, the functional terminal unit can comprise at least one of CFH or CF.

[0512] In some non-limiting examples, the monomeric skeletal unit M can have a high surface tension. In some non-limiting examples, the monomeric skeletal unit can have a higher surface tension than at least one of the functional groups R attached to it. In some non-limiting examples, the monomeric skeletal unit can have a higher surface tension than any of the functional groups R attached to it. In some non-limiting examples, the monomeric skeletal unit can have a higher surface tension than any of the functional groups R attached to it.

[0513] In some non-limiting examples, the monomer backbone unit can have a surface tension of at least one of at least about 25 dynes / cm, at least about 30 dynes / cm, at least about 40 dynes / cm, at least about 50 dynes / cm, at least about 75 dynes / cm, at least about 100 dynes / cm, at least about 150 dynes / cm, at least about 200 dynes / cm, at least about 250 dynes / cm, at least about 500 dynes / cm, at least about 1,000 dynes / cm, at least about 1,500 dynes / cm, or at least about 2,000 dynes / cm.

[0514] In some non-limiting examples, the monomer backbone unit may include phosphorus (P) and N, including but not limited to phosphazenes, where a double bond exists between P and N, which may be represented as "NP" or "N=P". In some non-limiting examples, the monomer backbone unit may include SiO 3 / 2 The silsesquioxanes may contain Si and O, including but not limited to, silsesquioxanes, which may be represented as:

[0515] In some non-limiting examples, at least a portion of the molecular structure of at least one of the materials of patterned coating 110, which may be, for example, the first material and / or the second material, is represented by the following formula: (NP-(LR x ) y ) n (III) During the ceremony, NP represents a phosphazene monomer backbone unit; L represents a linker group; R represents a functional group; x is an integer from 1 to 4, y is an integer from 1 to 3, n is an integer of at least two.

[0516] In some non-limiting examples, the molecular structure of the first material and / or the second material can be represented by Formula (III). In some non-limiting examples, at least one of the first material and the second material can be cyclophosphazene. In some non-limiting examples, the molecular structure of cyclophosphazene can be represented by Formula (III).

[0517] In some non-limiting examples, L may represent oxygen, x may be 1, and R may represent a fluoroalkyl group. In some non-limiting examples, at least a portion of the molecular structure of at least one material of patterned coating 110, which may be, for example, the first material and / or the second material, may be represented by the following formula: (NP(OR f )2) n (IV) During the ceremony, R f represents a fluoroalkyl group, n is an integer of 3 to 7.

[0518] In some non-limiting examples, the fluoroalkyl group may include at least one of a CF2 group, a CF2H group, a CH2CF3 group, and a CF3 group. In some non-limiting examples, the fluoroalkyl group may be represented by the following formula:

[0519] [ka] During the ceremony, p is an integer from 1 to 5, q is an integer from 6 to 20; Z represents hydrogen or F.

[0520] In some non-limiting examples, p can be 1 and q can be an integer from 6 to 20.

[0521] In some non-limiting examples, the fluoroalkyl group R f can be represented by formula (V).

[0522] In some non-limiting examples, at least a fraction of the molecular structure of at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may be represented by the following formula: (SiO 3 / 2 -(LR)) n (VI) During the ceremony, L represents a linker group; R represents a functional group; n is an integer from 6 to 12.

[0523] In some non-limiting embodiments, L can represent at least one occurrence of a single bond, O, substituted alkyl, or unsubstituted alkyl. In some non-limiting examples, n can be 8, 10, or 12. In some non-limiting examples, R can include a functional group having low surface tension. In some non-limiting examples, R can include at least one of an F-containing group and a Si-containing group. In some non-limiting examples, R can include at least one of a fluorocarbon group and a siloxane-containing group. In some non-limiting examples, R can include at least one of a CF2 group and a CF2H group. In some non-limiting examples, R can include at least one of a CF2 and a CF3 group. In some non-limiting examples, R can include a CH2CF3 group. In some non-limiting examples, the material represented by Formula (VI) can be a polyoctahedral silsesquioxane.

[0524] In some non-limiting examples, at least a fraction of the molecular structure of at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may be represented by the following formula: (SiO3 / 2-Rf)n (VII) During the ceremony, n is an integer from 6 to 12, R f represents a fluoroalkyl group.

[0525] In some non-limiting examples, n may be 8, 10, or 12. In some non-limiting examples, R f may include functional groups with low surface tension. In some non-limiting examples, R f can include at least one of a CF2 moiety and a CF2H moiety. In some non-limiting examples, R f can include at least one of a CF2 moiety and a CF3 moiety. In some non-limiting examples, R f may include a CHCF moiety. In some non-limiting examples, the material represented by formula (VII) may be a polyoctahedral silsesquioxane.

[0526] In some non-limiting examples, the fluoroalkyl group, R f can be represented by formula (V).

[0527] In some non-limiting examples, at least a fraction of the molecular structure of at least one of the materials of the patterned coating 110, which may be, for example, the first material and / or the second material, may be represented by the following formula: (SiO 3 / 2 -(CH2) x (CF3)) n (VIII) During the ceremony, x is an integer from 1 to 5, n is an integer from 6 to 12.

[0528] In some non-limiting examples, n may be 8, 10, or 12.

[0529] In some non-limiting examples, the compound represented by formula (VIII) can be a polyoctahedral silsesquioxane.

[0530] In some non-limiting examples, the functional group R and / or the fluoroalkyl group R f may be independently selected at each occurrence of such group in any of the foregoing formulas. It will also be understood that any of the foregoing formulas may represent a substructure of a compound, and that additional groups or moieties may be present that are not explicitly shown in the formula above. It will also be understood that the various formulas provided in this application may represent linear, branched, cyclic, cyclic-linear, and / or bridged structures.

[0531] In some non-limiting examples, the patterned coating 110 may include at least one material represented by at least one of the following formulas: (I), (I-1), (I-2), (II), (III), (IV), (VI), (VII), and (VIII), and at least one material having at least one of the following properties: (a) including an aromatic hydrocarbon moiety; (b) including sp2 carbon; (c) including a phenyl moiety; (d) having a characteristic surface energy greater than about 20 dynes / cm; and (e) exhibiting photoluminescence, including but not limited to, exhibiting photoluminescence at a wavelength of at least about 365 nm, when irradiated with excitation radiation having a wavelength of about 365 nm.

[0532] In some non-limiting examples, the patterned film can further include a third material different from the first material and the second material, hi some non-limiting examples, the third material can include a monomer in common with at least one of the first material and the second material.

[0533] In some non-limiting examples, the difference in sublimation temperatures of the materials of patterned coating 110, including but not limited to the difference between the first and second materials, can be no more than about one of 5° C., 10° C., 15° C., 20° C., 30° C., 40° C., or 50° C. In some non-limiting examples, at least one of the materials of patterned coating 110, including but not limited to the first and / or second materials, can include at least one of F and Si, and the sublimation temperatures of the materials of patterned coating 110 can differ by no more than about one of 5° C., 10° C., 15° C., 20° C., 25° C., 40° C., or 50° C. In some non-limiting examples, at least one of the materials of the patterned coating 110, including but not limited to the first material and / or the second material, may include at least one of a fluorocarbon portion and a siloxane portion, and the sublimation temperatures of the materials of the patterned coating 110 may differ by at least one of about 5°C, about 10°C, about 15°C, about 20°C, about 25°C, about 40°C, or about 50°C.

[0534] In some non-limiting examples, the difference in melting temperatures of the materials of patterned coating 110, including but not limited to the difference between the first and second NIC materials, may be no more than at least one of about 5° C., about 10° C., about 15° C., about 20° C., about 30° C., about 40° C., or about 50° C. In some non-limiting examples, at least one of the materials of patterned coating 110, including but not limited to the first material and / or the second material, may comprise at least one of F and Si, and the melting temperatures of the materials of patterned coating 110 may differ by no more than at least one of about 5° C., about 10° C., about 15° C., about 20° C., about 25° C., about 40° C., or about 50° C. In some non-limiting examples, at least one of the materials of the patterned coating 110, including but not limited to the first material and / or the second material, may include at least one of a fluorocarbon portion and a siloxane portion, and the melting temperatures of the materials of the patterned coating 110 may differ by at least one of about 5°C, about 10°C, about 15°C, about 20°C, about 25°C, about 40°C, or about 50°C.

[0535] In some non-limiting examples, at least one of the materials of the patterned coating 110, including but not limited to the first material and / or the second material, can have a low characteristic surface energy. In some non-limiting examples, at least one of the materials of the patterned coating 110, including but not limited to the first material and / or the second material, can have a low characteristic surface energy, and at least one of the materials of the patterned coating 110 can include at least one of F and Si. In some non-limiting examples, at least one of the materials of the patterned coating 110, including but not limited to the first material and / or the second material, can have a low characteristic surface energy and include at least one of F and Si, and at least one other material of the patterned coating 110 can have a high characteristic surface energy. In some non-limiting examples, the presence of F and Si can be explained by the presence of fluorocarbon moieties and siloxane moieties, respectively. In some non-limiting examples, at least one of the materials, including but not limited to the second material, may have a low characteristic surface energy of at least one of about 10-20 dynes / cm, about 12-20 dynes / cm, about 15-20 dynes / cm, or about 17-19 dynes / cm, and another material, including but not limited to the first material, may have a high characteristic surface energy of at least one of about 20-100 dynes / cm, about 20-50 dynes / cm, or about 25-45 dynes / cm. In some non-limiting examples, at least one of the materials may include at least one of F and Si. In some non-limiting examples, the second material may include at least one of F or Si.

[0536] In some non-limiting examples, at least one of the materials of the patterned coating 110, including but not limited to the second material, may have a low specific surface energy of about 20 dynes / cm or less and may include at least one of F and / or Si, and another material, including but not limited to the first material, may have a specific surface energy of at least about 20 dynes / cm.

[0537] In some non-limiting examples, at least one of the materials of the patterned coating 110, including but not limited to the second material, may have a low specific surface energy of about 20 dynes / cm or less and may include at least one of a fluorocarbon moiety and a siloxane moiety, and another material of the patterned coating 110, including but not limited to the first material, may have a specific surface energy of at least about 20 dynes / cm.

[0538] In some non-limiting examples, the surface energy of each of the two or more materials of the patterned coating 110, including but not limited to the surface energies of the first material and the second material, is less than about 25 dynes / cm, less than about 21 dynes / cm, less than about 20 dynes / cm, less than about 19 dynes / cm, less than about 18 dynes / cm, less than about 17 dynes / cm, less than about 16 dynes / cm, less than about 15 dynes / cm, less than about 14 dynes / cm, less than about 13 dynes / cm, less than about 12 dynes / cm, less than about 11 dynes / cm, or less than about 10 dynes / cm.

[0539] In some non-limiting examples, at least one of the materials of patterned coating 110, including but not limited to the first material and the second material, can have a refractive index at at least one of wavelengths of 500 nm and 460 nm that is less than or equal to at least one of about 1.5, about 1.45, about 1.44, about 1.43, about 1.42, or about 1.41. In some non-limiting examples, patterned coating 110 can include at least one material that exhibits photoluminescence, and patterned coating 110 can have a refractive index at at least one of wavelengths of 500 nm and 460 nm that is less than or equal to at least one of about 1.5, about 1.45, about 1.44, about 1.43, about 1.42, or about 1.41.

[0540] In some non-limiting examples, the molecular weight of at least one of the materials of the patterned coating 110, including but not limited to the first material and the second material, may be greater than at least one of about 750, about 1,000, about 1,500, about 2,000, about 2,500, or about 3,000 g / mol.

[0541] In some non-limiting examples, the molecular weight of at least one of the materials of the patterned coating 110, including but not limited to the first material and the second material, may be less than or equal to at least one of about 10,000, about 7,500, or about 5,000 g / mol.

[0542] In some non-limiting examples, the patterned coating 110 may include multiple materials that exhibit similar thermal properties, and at least one of the materials may exhibit photoluminescence. In some non-limiting examples, the patterned coating 110 may include multiple materials with similar thermal properties, and at least one of the materials may be photoluminescent, and at least one of the materials may include F or Si. In some non-limiting examples, the patterned coating 110 may include multiple materials with similar thermal properties, including but not limited to the melting or sublimation temperatures of the materials, and at least one of the materials may exhibit photoluminescence at a wavelength of at least about 365 nm when excited by radiation having an excitation wavelength of about 365 nm, and at least one of the materials may include at least one of F and Si.

[0543] In some non-limiting examples, the patterned coating 110 may include a plurality of materials having at least one common element or at least one common substructure, and at least one of the materials may exhibit photoluminescence. In some non-limiting examples, at least one of the materials may include F and Si. In some non-limiting examples, the patterned coating 110 may include a plurality of materials having similar thermal properties, and at least one of the materials may exhibit photoluminescence at wavelengths greater than about 365 nm when excited by radiation having an excitation wavelength of about 365 nm, and at least one of the materials may include at least one of F and Si. In some non-limiting examples, the at least one common element may include at least one of F and Si. In some non-limiting examples, the at least one particle structure may include at least one of a fluorocarbon and a siloxyl.

[0544] In some non-limiting examples, a method for manufacturing an optoelectronic device 100 may include the acts of depositing a patterned coating on a first exposed layer surface 11 of the device 100 in a first portion 101 of its lateral surface, and depositing a deposition material 731 on a second exposed layer surface 11 of the device 100 in a second portion 102 of its lateral surface. An initial sticking probability against deposition of the deposition material 731 on the exposed layer surface 11 of the patterned coating 110 in the first portion 101 may be substantially less than an initial sticking probability against deposition of the deposition material 731 on the exposed layer surface 11 in the second portion 102, such that the exposed layer surface 11 of the patterned coating 110 in the first portion 101 may be substantially devoid of a closure coat 140 of the deposition material 731. The patterned coating 110 deposited on the first exposed layer surface 11 of the device 100 may include a first material and a second material.

[0545] In some non-limiting examples, depositing patterned film 110 on first exposed layer surface 11 of device 100 may include providing a mixture containing multiple materials and depositing the mixture on first exposed layer surface 11 of device 100 to form patterned film 110 thereon. In some non-limiting examples, the mixture may include a first material and a second material. In some non-limiting examples, both the first material and the second material may be deposited on first exposed layer surface 11 to form patterned film 110 thereon.

[0546] In some non-limiting examples, a mixture containing multiple materials may be deposited on first exposed layer surface 11 of device 100 by a PVD process, including, but not limited to, thermal evaporation. In some non-limiting examples, patterned coating 110 may be formed by evaporating a mixture from a common evaporation source and depositing the mixture on first exposed layer surface 11 of device 100. In some non-limiting examples, by way of non-limiting example, a mixture containing a first material and a second material may be placed in a common crucible and / or evaporation source that is heated under vacuum. Upon reaching the evaporation temperature of the materials, vapor flux 732 generated therefrom may be directed toward first exposed layer surface 11 of device 100 to deposit patterned coating 110 thereon.

[0547] In some non-limiting examples, the patterned coating 110 may be deposited by co-evaporation of a first material and a second material. In some non-limiting examples, a first material may be evaporated from a first crucible and / or a first evaporation source, and a second material may be co-evaporated from a second crucible and / or a second evaporation source to form a mixture in the vapor phase and co-deposited on the first exposed layer surface 11 to provide the patterned coating 110 thereon.

[0548] To evaluate the properties of a particular exemplary patterned coating 110 containing at least two materials, a series of samples were prepared by depositing in vacuum an approximately 20 nm thick layer of an organic material that can be used as an HTL material, followed by depositing nucleation-modifying coatings having various compositions on top of the organic material layer, as summarized in Table 5 below.

[0549] [Table 5]

[0550] In this example, the patterning material is selected such that when deposited, for example as a thin film, the patterning material exhibits a low initial sticking probability that resists deposition of the deposition material 731, which includes, but is not limited to, at least one of Ag and Yb.

[0551] In this example, PL material 1 and PL material 2 were selected such that, by way of non-limiting example, when deposited as a thin film, each of PL material 1 and PL material 2 can exhibit photoluminescence detectable by standard optical measurement techniques, including, but not limited to, fluorescence microscopy.

[0552] In Table 5, Sample 1 is a comparative sample in which a nucleation modification coating was provided by depositing a patterning material. Sample 2 is an exemplary sample in which a nucleation modification coating was provided by co-depositing a patterning material and PL material 1 together to form a coating containing PL material 1 at a concentration of 0.5% by volume. Sample 3 is an exemplary sample in which a nucleation modification coating was provided by co-depositing a patterning material and PL material 2 together to form a coating containing PL material 2 at a concentration of 0.5% by volume. Sample 4 is a comparative sample in which a nucleation modification coating was provided by depositing PL material 1. Sample 5 is a comparative sample in which a nucleation modification coating was provided by depositing PL material 2. Sample 6 is a comparative sample in which a nucleation modification coating was not provided on the organic material layer.

[0553] Next, each of Samples 1-6 was subjected to open-mask deposition of Yb followed by Ag. Specifically, the samples were subjected to open-mask deposition of Yb followed by Ag on the surface of the nucleation modification coating formed by the above materials. More specifically, each sample was subjected to Yb vapor flux 732 until a reference thickness of approximately 1 nm was reached, and then to Ag vapor flux 732 until a reference thickness of approximately 12 nm was reached. Once the samples were prepared, optical transmission measurements were performed to determine the relative amounts of Yb and / or Ag deposited on the exposed layer surface 11 of the nucleation modification coating. As will be appreciated, samples with relatively little or no metal thereon may be substantially transparent, while samples having metal deposited thereon, particularly as a closed coating 140, may generally exhibit substantially lower optical transmittance. Therefore, the relative performance of various exemplary coatings as patterned coating 110 can be evaluated by measuring the EM radiation transmittance, which can be directly correlated to the amount or thickness of metal deposition material deposited thereon from deposition of either Ag, Yb, or both.

[0554] The loss in light transmittance at a wavelength of 600 nm after subjecting each sample to an Ag vapor flux was measured and is summarized in Table 6 below.

[0555] [Table 6]

[0556] Specifically, the percent transmittance loss for each sample in Table 6 was determined by measuring the light transmittance through the sample before and after exposure to the Yb and Ag vapor flux 732 and expressing the loss in EM radiation transmittance as a percentage.

[0557] As can be seen, Samples 1, 2, and 3 exhibited relatively low transmittance losses of less than 2%, or in the case of Samples 1 and 3, less than 1%. Thus, it can be observed that the nucleation modification coatings provided on these samples functioned as NICs. In contrast, Sample 4 exhibited a transmittance loss of 43%, Sample 5 a 47%, and Sample 6 a 45%, respectively. Thus, the nucleation modification coatings provided on these samples did not function as NICs, but may in fact have functioned as NPC920.

[0558] Additionally, Sample 1, in which patterned coating 110 consists essentially of NIC material, was found to not exhibit photoluminescence. However, Samples 2 and 3, in which patterned coating 110 includes PL material 1 and PL material 2, respectively, in addition to the NIC material, were found to exhibit photoluminescence while also functioning as a NIC by providing a surface with a low initial sticking probability that resists the deposition of deposition material 731.

[0559] sedimentary layer In some non-limiting examples, in the second portion 102 of the side of the device 100, the deposition layer 130 including the deposition material 731 may be disposed as a closed coating 140 on the underlying exposed layer surface 11, including but not limited to the substrate 10.

[0560] In some non-limiting examples, the deposition layer 130 can include a deposition material 731 .

[0561] In some non-limiting examples, the deposition material 731 may include an element selected from at least one of potassium (K), sodium (Na), lithium (Li), barium (Ba), cesium (Cs), Yb, Ag, gold (Au), Cu, aluminum (Al), Mg, Zn, Cd, tin (Sn), and yttrium (Y). In some non-limiting examples, the element may include at least one of K, Na, Li, Ba, Cs, Yb, Ag, Au, Cu, Al, and Mg. In some non-limiting examples, the element may include at least one of Cu, Ag, and Au. In some non-limiting examples, the element may be Cu. In some non-limiting examples, the element may be Al. In some non-limiting examples, the element may include at least one of Mg, Zn, Cd, and Yb. In some non-limiting examples, the element may include at least one of Mg, Ag, Al, Yb, and Li. In some non-limiting examples, the element can include at least one of Mg, Ag, and Yb. In some non-limiting examples, the element can include at least one of Mg and Ag. In some non-limiting examples, the element can be Ag.

[0562] In some non-limiting examples, the deposition material 731 may be and / or include a pure metal. In some non-limiting examples, the deposition material 731 may be at least one of pure Ag or substantially pure Ag. In some non-limiting examples, the substantially pure Ag may have a purity of at least about 95%, at least about 99%, at least about 99.9%, at least about 99.99%, at least about 99.999%, and at least about 99.9995%. In some non-limiting examples, the deposition material 731 may be at least one of pure Mg or substantially pure Mg. In some non-limiting examples, the substantially pure Mg may have a purity of at least about 95%, at least about 99%, at least about 99.9%, at least about 99.9%, at least about 99.99%, at least about 99.999%, and at least about 99.9995%.

[0563] In some non-limiting examples, the deposition material 731 can include an alloy. In some non-limiting examples, the alloy can be at least one of an Ag-containing alloy, an Mg-containing alloy, or an AgMg-containing alloy. In some non-limiting examples, the AgMg-containing alloy can have an alloy composition that can range from about 1:10 (Ag:Mg) to about 10:1 by volume.

[0564] In some non-limiting examples, the deposition material 731 may include other metals in place of and / or in combination with Ag. In some non-limiting examples, the deposition material 731 may include an alloy of Ag and at least one other metal. In some non-limiting examples, the deposition material 731 may include an alloy of Ag and at least one of Mg or Yb. In some non-limiting examples, such an alloy may be a binary alloy having a composition of about 5-95% Ag by volume, with the remainder being the other metal. In some non-limiting examples, the deposition material 731 may include Ag and Mg. In some non-limiting examples, the deposition material 731 may include an Ag:Mg alloy having a composition of about 1:10 to 10:1 by volume. In some non-limiting examples, the deposition material 731 may include Ag and Yb. In some non-limiting examples, the deposition material 731 may include a Yb:Ag alloy having a composition of about 1:20 to 10:1 by volume. In some non-limiting examples, the deposition material 731 can include Mg and Yb. In some non-limiting examples, the deposition material 731 can include a Mg:Yb alloy. In some non-limiting examples, the deposition material 731 can include Ag, Mg, and Yb. In some non-limiting examples, the deposition layer 130 can include a Ag:Mg:Yb alloy.

[0565] In some non-limiting examples, the deposited layer 130 can include at least one additional element. In some non-limiting examples, such additional element can be a non-metallic element. In some non-limiting examples, the non-metallic element can be at least one of O, S, N, and C. Those skilled in the art will appreciate that in some non-limiting examples, such additional elements can be incorporated into the deposited layer 130 as contaminants due to the presence of such additional elements in the source materials, the equipment used for deposition, and / or the vacuum chamber environment. In some non-limiting examples, the concentration of such additional elements can be limited to be below a threshold concentration. In some non-limiting examples, such additional elements can form compounds with other elements of the deposited layer 130. In some non-limiting examples, the concentration of non-metallic elements in the deposition material 731 can be one of about 1% or less, about 0.1% or less, about 0.01% or less, about 0.001% or less, about 0.0001% or less, about 0.00001% or less, about 0.000001% or less, and about 0.0000001% or less. In some non-limiting examples, the deposition layer 130 can have a composition in which the total amount of O and C therein can be one of about 10% or less, about 5% or less, about 1% or less, about 0.1% or less, about 0.01% or less, about 0.001% or less, about 0.0001% or less, about 0.00001% or less, about 0.000001% or less, and about 0.0000001% or less.

[0566] It has now been somewhat surprisingly discovered that selective deposition of the deposition layer 130 can be facilitated by reducing the concentration of certain non-metallic elements in the deposition layer 130, particularly where the deposition layer 130 may be substantially composed of metals and / or metal alloys. Without wishing to be bound by any particular theory, in some non-limiting examples, it can be hypothesized that certain non-metallic elements, such as O or C, when present in the vapor flux 732 of the deposition layer 130 and / or in the deposition chamber and / or in the environment, can deposit on the surface of the patterned coating 110 and act as nucleation sites for the metal elements of the deposition layer 130. It can be hypothesized that reducing the concentration of such non-metallic elements that can function as nucleation sites can facilitate reducing the amount of deposition material 731 deposited on the exposed layer surface 11 of the patterned coating 110.

[0567] In some non-limiting examples, the deposition material 731 can be deposited on a metal-containing underlayer. In some non-limiting examples, the deposition material 731 and the underlying underlayer can include a common metal.

[0568] In some non-limiting examples, the deposition layer 130 can include multiple layers of deposition material 731. In some non-limiting examples, the deposition material 731 of a first layer of the multiple layers can be different from the deposition material 731 of a second layer of the multiple layers. In some non-limiting examples, the deposition layer 130 can include a multilayer coating. In some non-limiting examples, such a multilayer coating can be one of Yb / Ag, Yb / Mg, Yb / Mg:Ag, Yb / Yb:Ag, Yb / Ag / Mg, and Yb / Mg / Ag. The device described in at least one clause herein is at least one of Yb / Ag, Yb / Mg, Yb / Ag / Mg, and Yb / Mg / Ag.

[0569] In some non-limiting examples, the deposition material 731 can include a metal having a bond dissociation energy of one of about 300 kJ / mol or less, about 200 kJ / mol or less, about 165 kJ / mol or less, about 150 kJ / mol or less, about 100 kJ / mol or less, about 50 kJ / mol or less, and about 20 kJ / mol or less.

[0570] In some non-limiting examples, the deposition material 731 can include a metal having an electronegativity that is one of about 1.4 or less, about 1.3 or less, and about 1.2 or less.

[0571] In some non-limiting examples, the sheet resistance of the deposited layer 130 may generally correspond to the sheet resistance of the deposited layer 130 measured or determined in isolation from other components, layers, and / or portions of the device 100. In some non-limiting examples, the deposited layer 130 may be formed as a thin film. Thus, in some non-limiting examples, the characteristic sheet resistance of the deposited layer 130 may be determined and / or calculated based on the composition, thickness, and / or morphology of such a thin film. In some non-limiting examples, the sheet resistance may be one of about 10 Ω / □ or less, about 5 Ω / □ or less, about 1 Ω / □ or less, about 0.5 Ω / □ or less, about 0.2 Ω / □ or less, and about 0.1 Ω / □ or less.

[0572] In some non-limiting examples, the deposition layer 130 may be disposed in a pattern that may be defined by at least one region that is substantially devoid of the closure coat 140 of the deposition layer 130. In some non-limiting examples, the at least one region may separate the deposition layer 130 into a plurality of individual pieces thereof. In some non-limiting examples, each individual piece of the deposition layer 130 may be a separate second portion 102. In some non-limiting examples, the plurality of individual pieces of the deposition layer 130 may be physically separated from one another on their lateral surfaces. In some non-limiting examples, at least two of the plurality of individual pieces of the deposition layer 130 may be electrically coupled. In some non-limiting examples, at least two of the plurality of individual pieces of the deposition layer 130 may each be electrically coupled to a common conductive layer or coating, including, but not limited to, an underlying surface, to enable current flow therebetween. In some non-limiting examples, at least two of the plurality of individual pieces of the deposition layer 130 may be electrically insulated from one another.

[0573] Selective deposition using patterned coatings FIG. 6 is an illustrative schematic diagram illustrating a non-limiting example of an evaporation deposition process, generally designated 600, in a chamber 620 for selectively depositing a patterned film 110 onto a first portion 101 of an exposed layer surface 11 of an underlayer.

[0574] In process 600, a quantity of patterning material 611 is heated under vacuum to evaporate and / or sublimate patterning material 611. In some non-limiting examples, patterning material 611 may comprise entirely and / or substantially the material used to form patterned coating 110. In some non-limiting examples, such material may comprise an organic material.

[0575] A vaporized flux 612 of patterning material 611 may flow through chamber 620, including in the direction indicated by arrow 61, toward exposed layer surface 11. As vaporized flux 612 impinges on exposed layer surface 11, a patterned film 110 may be formed thereon.

[0576] In some non-limiting examples, as shown in the diagram of process 600, patterned film 110 may be selectively deposited only on a portion of exposed layer surface 11, in the illustrated example, first portion 101, by interposing a shadow mask 615, which in some non-limiting examples may be an FMM, between vaporized flux 612 and exposed layer surface 11. In some non-limiting examples, such a shadow mask 615 may be used to form relatively small features, in some non-limiting examples, having feature sizes on the order of tens of microns or less.

[0577] The shadow mask 615 can have at least one opening 616 extending therethrough such that a portion of the vaporized flux 612 can pass through the opening 616 and impinge on the exposed layer surface 11 to form the patterned coating 110. If the vaporized flux 612 does not pass through the opening 616 and impinges on the surface 617 of the shadow mask 615, it is prevented from being disposed on the exposed layer surface 11 to form the patterned coating 110. In some non-limiting examples, the shadow mask 615 can be configured such that the vaporized flux 612 passing through the opening 616 can impinge on the first portion 101 but not on the second portion 102. Thus, the second portion 102 of the exposed layer surface 11 can be substantially devoid of the patterned coating 110. In some non-limiting examples (not shown), the patterned material 611 incident on the shadow mask 615 can be deposited on its surface 617.

[0578] Thus, once deposition of the patterned coating 110 is complete, a patterned surface may be produced.

[0579] FIG. 7 illustrates a method for selectively depositing a closure coating 140 of a deposition layer 130 on a second portion 102 of an exposed layer surface 11 of an underlying layer that is substantially devoid of the patterned coating 110 selectively deposited on the first portion 101, including but not limited to by the evaporation process 600 of FIG. 6 . a 1 is an illustrative schematic diagram illustrating a non-limiting example of the results of the evaporation process generally shown in FIG.

[0580] In some non-limiting examples, the deposition layer 130 may be composed of a deposition material 731, which in some non-limiting examples includes at least one metal. It will be understood by those skilled in the art that typically the vaporization temperature of organic materials is lower than the vaporization temperature of metals, such as may be employed as the deposition material 731.

[0581] Thus, in some non-limiting examples, there may be fewer constraints when using a shadow mask 615 to selectively deposit a patterned coating 110 in a pattern compared to directly patterning a deposition layer 130 using such a shadow mask 615.

[0582] Once the patterned coating 110 is deposited on a first portion 101 of the underlying exposed layer surface 11, a closed coating 140 of deposition material 731 can be deposited as a deposition layer 130 on a second portion 102 of the exposed layer surface 11 that is substantially devoid of the patterned coating 110.

[0583] Process 700 a In this case, a quantity of deposition material 731 can be heated under vacuum to evaporate and / or sublimate deposition material 731. In some non-limiting examples, deposition material 731 can completely and / or substantially comprise the material used to form deposition layer 130.

[0584] A vaporized flux 732 of deposition material 731 may be directed toward the exposed layer surface 11 of the first portion 101 and the second portion 102, inside the chamber 620, including in the direction indicated by arrow 71. When the vaporized flux 732 is incident on the second portion 102 of the exposed layer surface 11, a closed film 140 of deposition material 731 may be formed thereon as a deposition layer 130.

[0585] In some non-limiting examples, deposition of deposition material 731 may be performed using an open mask and / or a mask-free deposition process.

[0586] It will be understood by those skilled in the art that, in contrast to the shadow mask 615, the f...

Claims

1. 1. A display panel comprising at least one display portion comprising a display portion (sub)pixel array comprising a plurality of emissive regions each corresponding to a (sub)pixel, and at least one signal exchange portion comprising a signal exchange portion (sub)pixel array comprising at least one transmissive region and a plurality of emissive regions each corresponding to a (sub)pixel, said signal exchange portion (sub)pixel array comprising: At least one of a size, a shape, a configuration, and an orientation of at least one (sub)pixel in the signal exchange portion (sub)pixel array; Pixel density and the pitch of the (sub)pixels in the signal exchange portion (sub)pixel array; and a display panel accommodating said at least one transmissive region by differing from said display portion (sub)pixel array in at least one characteristic selected from:

2. 2. The display panel of claim 1, wherein a separation between a boundary of the at least one transparent region and a boundary of a subpixel adjacent to the at least one transparent region is one of at least about 5 microns, at least about 6 microns, at least about 8 microns, at least about 10 microns, at least about 11 microns, and at least about 12 microns.

3. 10. The display panel of claim 1, wherein the size of each transmissive area is at least 10 microns.

4. 2. The display panel of claim 1, wherein a total aperture ratio of all of the emissive regions and the transmissive regions in the signal exchange portion is one of about 60% or less, about 55% or less, about 50% or less, about 45% or less, and about 40% or less.

5. The display panel of claim 1 , wherein the at least one transmissive region has a boundary defined by a plurality of transmissive border segments.

6. The display panel of claim 5 , wherein the transmissive boundary segment includes at least one curved segment.

7. The display panel of claim 5 , wherein a majority of the transmissive boundary segments are substantially parallel to a portion of a boundary of an emissive region corresponding to a (sub)pixel adjacent to the transmissive boundary segment.

8. 10. The display panel of claim 1, wherein the at least one transmissive region is substantially devoid of cathode material.

9. 9. The display panel of claim 8, wherein the cathode material is substantially prevented from nucleating in the at least one transmissive region by depositing a patterned coating in the at least one transmissive region prior to deposition of the cathode material.

10. 10. The display panel of claim 8, wherein the cathode material is removed from the at least one transmissive region by laser ablation of the cathode material.

11. 11. The display panel according to claim 1, wherein the at least one characteristic is at least one of a size, a shape, and a configuration, and the signal exchange section (sub)pixel array and the display section (sub)pixel array have a common pixel density of the at least one (sub)pixel in the signal exchange section (sub)pixel array and the display section (sub)pixel array.

12. 12. The display panel of claim 11, wherein the signal exchange section (sub)pixel array and the display section (sub)pixel array have a common pitch of the at least one (sub)pixel in the signal exchange section (sub)pixel array and the display section (sub)pixel array.

13. 12. The display panel of claim 11, wherein a size of at least one of the (sub)pixels in the signal exchange portion (sub)pixel array is smaller than a size of a corresponding (sub)pixel in the display portion (sub)pixel array.

14. 12. The display panel of claim 11, wherein an area defined by a plurality of non-overlapping vectors each having an end point located within the emission area associated with the pair of sub-pixels of the pixel of the signal exchange portion (sub)pixel array defines a contour associated with the pixel.

15. 15. The display panel of claim 14, wherein each vector is a linear vector.

16. The display panel of claim 14 , wherein each vector has an endpoint located at a centroid of the emissive area of ​​the sub-pixel.

17. 15. The display panel of claim 14, wherein the contour includes four vectors that define a box, and a unit cell including four adjacent boxes each having a common vertex defines a minimal repeating unit of the signal exchange portion (sub)pixel array.

18. 20. The display panel of claim 17, wherein at least one transmissive region is disposed at at least one perimeter within the unit cell.

19. 15. The display panel of claim 14, wherein the at least one transmissive region is entirely within a single at least one contour.

20. 12. The display panel of claim 11, wherein the aperture ratio of the transmissive area of ​​the signal exchange portion is one of about 50% or less, about 45% or less, about 40% or less, about 35% or less, about 33% or less, and about 25% or less.

21. 12. The display panel of claim 11, wherein the aperture ratio of the transmissive area of ​​the signal exchange portion is one of at least about 5%, at least about 10%, and at least about 15%.

22. 12. The display panel of claim 11, wherein an aperture ratio of all emissive areas of the signal exchange portion is one of about 20% or less, about 15% or less, and about 10% or less.

23. 11. The display panel of claim 1, wherein the at least one characteristic is pixel density, and the signal exchange portion (sub)pixel array and the display portion (sub)pixel array have at least one of a size, a shape, a configuration, an orientation, and a pitch of at least one (sub)pixel in the signal exchange portion (sub)pixel array and the display portion (sub)pixel array in common.

24. 24. The display panel of claim 23, wherein the signal exchange portion (sub)pixel array and the display portion (sub)pixel array have a common pitch of the at least one (sub)pixel in the signal exchange portion (sub)pixel array and the display portion (sub)pixel array.

25. 24. The display panel of claim 23, wherein a pixel density of the signal exchange portion (sub) pixel array is smaller than a pixel density of the display portion (sub) pixel array.

26. 24. The display panel of claim 23, wherein at least one subpixel of at least one pixel corresponding to a subpixel of a pixel in the display section (sub)pixel array is omitted in the signal exchange section (sub)pixel array.

27. 27. The display panel of claim 26, wherein the omitted subpixels are selected to maximize a size of at least one void formed by the omitted subpixels.

28. 27. The display panel of claim 26, wherein a pixel density in the signal exchange portion (sub)pixel array is one of 50%, 62.5%, and 75% of a pixel density in the display portion (sub)pixel array.

29. 24. The display panel of claim 23, wherein at least one transmissive region is disposed in at least one void formed by omitting at least one subpixel of at least one pixel in the signal exchange portion (sub)pixel array.

30. 24. The display panel of claim 23, wherein the aperture ratio of the transmissive area of ​​the signal exchange portion is one of about 15-40%, about 20-40%, about 15-35%, and about 20-35%.

31. 24. The display panel of claim 23, wherein the aperture ratio of the transmissive area of ​​the signal exchange portion is one of at least about 5%, at least about 10%, and at least about 15%.

32. 24. The display panel according to claim 23, wherein the aperture ratio of all the emissive areas of the signal exchange portion is about 12-25%.

33. 11. The display panel according to claim 1, wherein the at least one feature is a pitch, and the pitch of the (sub)pixels in the signal exchange section (sub)pixel array is smaller than the pitch of the (sub)pixels in the display section (sub)pixel array.

34. The display panel of claim 1 , wherein the at least one feature comprises a plurality of the features.

35. 2. The display panel of claim 1, further comprising at least one transition area disposed between the display portion and the signal exchange portion, the transition area comprising a transition area (sub)pixel array including a plurality of emissive areas each corresponding to a (sub)pixel, the transition area (sub)pixel array differing from both the display portion (sub)pixel array and the signal exchange (sub)pixel array in the at least one characteristic, such that the interposition of the at least one transition area between the display portion (sub)pixel array and the signal exchange (sub)pixel array reduces a visually perceived difference between the display portion (sub)pixel array and the signal exchange (sub)pixel array.

36. 36. The display panel of claim 35, wherein the at least one transition region comprises at least one transmissive region.

Images