Display device and manufacturing method therefor

Abstract

To provide a display device having a transmissive zone and a manufacturing method therefor.SOLUTION: A display device provided herein comprises a first substrate and a display unit having a display zone and a transmissive zone. The display unit comprises an auxiliary layer disposed in correspondence with the transmissive zone, and a second electrode disposed in correspondence with just the display zone so as not to overlap with the auxiliary layer. The auxiliary layer contains a first material and the second electrode contains a second material, where the first material and the second material satisfy the following expression 1: ST2-ST1>0 mJ / m2 ...(expression 1), where ST1 represents surface energy of the first material at 25°C, and ST2 represents surface energy of the second material at 25°C.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a display device, and more particularly to a display device having a transmissive region and a manufacturing method thereof. [Background technology]

[0002] Recently, display devices have become more and more versatile, and their thickness and weight have become thinner and lighter, so that the range of their use has become wider.

[0003] For example, there has been ongoing research into implementing transparency or translucency in display devices. Specifically, there have been attempts to form a transparent display device by making the thin film transistors or display panel inside the device transparent.

[0004] To realize a transparent display device, it is necessary to optimize various variables such as the composition, arrangement, thickness, etc. of various materials such as a substrate, an electrode, an insulating film, a capping film, etc. For example, in the case of an organic light emitting display device, a number of conductive films and insulating films containing different materials are stacked, which reduces optical properties and makes it difficult to obtain desired transmittance or transparency. Summary of the Invention [Problem to be solved by the invention]

[0005] The present invention has been devised to solve the above problems, and provides a display device with high transmittance for external light and a manufacturing method thereof. An embodiment of the present invention can provide a display device in which a common electrode is not substantially formed in the transmissive region.

[0006] The technical problems that the present invention aims to solve are not limited to the above-mentioned technical problems, and other technical problems not disclosed will be clearly understood by a person having ordinary skill in the art from the description of the present invention. [Means for solving the problem]

[0007] According to an embodiment of the present invention, there is provided a display device comprising: a first substrate and a display unit; The display unit includes a display area and a transmissive area. the display unit includes an auxiliary layer disposed in correspondence with the transmissive region and a second electrode disposed in correspondence with only the display region; the auxiliary layer comprises a first material; the second electrode comprises a second material; The first material and the second material satisfy the following formula 1, ST2-ST1>0mJ / m 2 <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25°C.

[0008] In this embodiment, the second electrode is absent in the transmissive area.

[0009] In the above example, ST1 is 0 mJ / m 2 Greater than 30mJ / m 2 The following is the result.

[0010] In the embodiment, the first material contains 20 at % or more of fluorine.

[0011] In the embodiment, the first material includes a fluorine-containing silane compound, a fluorine-based polymer compound, and a combination thereof.

[0012] In the embodiment, the second material includes magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), and combinations thereof.

[0013] According to another embodiment of the present invention, there is provided a display device comprising a first substrate and a display unit, The display unit includes a display area and a transmissive area. the display unit includes an auxiliary layer disposed corresponding to the transmissive region, and a second electrode disposed corresponding to the display region and at least a portion of the transmissive region; the auxiliary layer comprises a first material; the second electrode comprises a second material; The first material and the second material satisfy the following formula 1, ST2-ST1>0mJ / m 2 <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25°C.

[0014] In the embodiment, the second electrodes are disposed corresponding to the display area and all of the transmissive areas; a first portion of the second electrode is disposed in correspondence with the display area; a second portion of the second electrode is disposed in correspondence with the transmissive region; The thickness T of the first portion 1 and the thickness T of the second portion 2 satisfies the following formula 2. T 1 >T 2 <Formula 2>

[0015] In the above embodiment, T 2 is greater than 0 nm and equal to or less than 1 nm.

[0016] In the embodiment, the second electrode is disposed corresponding to the display area and a part of the transmissive area; The portion of the second electrode arranged corresponding to the portion of the transmissive region is made of a plurality of particles including the second material.

[0017] In this embodiment, the thickness of the portion of the second electrode disposed corresponding to the display area is greater than an average diameter of the plurality of particles.

[0018] In the above example, ST1 is 0 mJ / m2 Greater than 30mJ / m 2 The following is the result.

[0019] In the embodiment, the first material contains 20 at % or more of fluorine.

[0020] In the embodiment, the first material includes a fluorine-containing silane compound, a fluorine-based polymer compound, and a combination thereof.

[0021] In the embodiment, the second material includes magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), and combinations thereof.

[0022] In the above embodiment, the display device further includes a first electrode and an intermediate layer; The intermediate layer is interposed between the first electrode and the second electrode.

[0023] According to an embodiment of the present invention, a method for manufacturing a display device includes the steps of: providing a first substrate; providing a display unit on the first substrate, the display unit including a display area and a transmissive area; providing the display unit includes providing an auxiliary layer only in the transmissive region; and providing a second electrode on the display region or on the display region and the transmissive region; the auxiliary layer comprises a first material; the second electrode comprises a second material; The first material and the second material satisfy the following formula 1, ST2-ST1>0mJ / m 2 <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25°C.

[0024] In the embodiment, the second electrode is provided by evaporating the second material using an open mask.

[0025] In the above embodiment, the display device further includes a first electrode and an intermediate layer; After providing an intermediate layer on the first electrode, providing an auxiliary layer only in said transmissive areas; A second electrode may be provided on the intermediate layer, or on the intermediate layer and on the auxiliary layer.

[0026] In the above embodiment, the display device further includes a first electrode and an intermediate layer; After providing an auxiliary layer only in the transmissive areas, An intermediate layer is provided on the first electrode, and a second electrode is provided on the intermediate layer, or on the intermediate layer and the auxiliary layer. Effect of the Invention

[0027] According to various exemplary embodiments of the present invention, since a common electrode is not substantially formed in a transmissive region, a display device having a relatively high transmittance and a manufacturing method thereof can be provided.

[0028] However, the above-mentioned effects are merely examples, and the effects of the embodiments will be described in detail below. [Brief description of the drawings]

[0029] [Figure 1] 1 is a structural diagram illustrating a display device according to an embodiment of the present invention; [Diagram 2] 1 is a cross-sectional view illustrating a display device according to an embodiment of the present invention. [Diagram 3] 1 is a plan view illustrating a display device according to an embodiment of the present invention; [Figure 4] 3 is a cross-sectional view illustrating a display device according to another embodiment of the display device of FIG. 2. FIG. [Diagram 5] FIG. 5 is a cross-sectional view showing the display portion of FIG. 4 in further detail. [Figure 6] 1 is a cross-sectional view illustrating a display device according to another embodiment of the present invention. [Figure 7] FIG. 11 is a plan view illustrating a display device according to another embodiment of the present invention. [Figure 8] 7 is a cross-sectional view illustrating a display device according to another embodiment of the display device of FIG. 6. [Figure 9] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 10] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 11] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 12] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 13] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 14] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 15] 5A to 5C are cross-sectional views illustrating a method of manufacturing a display device according to another embodiment of the present invention. [Figure 16] 5A to 5C are cross-sectional views illustrating a method of manufacturing a display device according to another embodiment of the present invention. [Figure 17] 1 is a block diagram illustrating a schematic configuration of an electronic device according to an embodiment of the present invention. [Figure 18A] 1 is a perspective view illustrating an electronic device according to an embodiment of the present invention. [Figure 18B] 1 is a perspective view illustrating an electronic device according to an embodiment of the present invention. [Figure 19] 1 is a graph showing transmittance versus wavelength for Example 1 and Comparative Examples 1 and 2. [Figure 20] 1 is a graph showing transmittance versus wavelength in Example 2 and Comparative Example 3. [Figure 21A] 1 is a transmission electron microscope (TEM) image of Example 2. [Figure 21B] 1 is a TEM image of Comparative Example 3. [Figure 21C] FIG. 21B is a partially enlarged view of FIG. 21A. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0030] The present invention can be modified in various ways and can have various embodiments, and specific embodiments will be described in detail by way of example in the drawings. The advantages and features of the present invention, as well as methods for achieving the same, will become apparent from the following detailed description of the embodiments in conjunction with the drawings. However, the present invention is not limited to the following embodiments, and may be embodied in various forms.

[0031] Hereinafter, an embodiment of the present invention will be described in detail with reference to the accompanying drawings. When describing with reference to the drawings, identical or corresponding components are designated by the same reference numerals and duplicate descriptions thereof will be omitted.

[0032] In the following examples, the terms "first", "second" and the like are not used in a limiting sense but are used to distinguish one component from another component.

[0033] In the following examples, singular expressions include plural expressions unless the context clearly indicates otherwise.

[0034] In the following examples, terms such as "comprise" or "have" mean the presence of a feature or component described in the specification, but do not preclude the possibility that one or more other features or components may be added.

[0035] In the following examples, when a part such as a film, region, or component is said to be on or above another part, this does not only include the case where it is directly on the other part, but also the case where another film, region, component, etc. is interposed therebetween.

[0036] In the drawings, the size of components may be exaggerated or reduced for convenience of explanation. For example, the size and thickness of each component shown in the drawings are arbitrarily shown for convenience of explanation, and the present invention is not necessarily limited to what is shown in the drawings.

[0037] When an embodiment can be implemented differently, the order of certain steps may be different than that described. For example, two steps described in succession may be performed substantially simultaneously or may be performed in the reverse order from that described.

[0038] In the following examples, when a membrane, region, component, etc. is said to be connected, this includes not only the case where the membrane, region, or component is directly connected, but also the case where the membrane, region, or component is indirectly connected with another membrane, region, or component interposed between them. For example, in this specification, when a membrane, region, component, etc. is said to be electrically connected, this includes the case where the membrane, region, component, etc. is directly connected. This includes not only cases where they are electrically connected, but also cases where they are indirectly electrically connected via another film, region, component, etc. interposed therebetween.

[0039] FIG. 1 is a cross-sectional view illustrating a display device according to an embodiment of the present invention.

[0040] 1, a display device 1 according to an embodiment of the present invention includes a first substrate 10 and a display unit 20. The display unit 20 includes a display area 100 where an image is displayed, and a transmissive area 200 through which external light is transmitted. In the display device 1, external light is incident by transmitting through the first substrate 10 and the display unit 20.

[0041] In the display unit 20, an image is displayed through the display area 100, and external light is transmitted through the transmissive area 200. A user (U) can see an external image through the transmissive area 200. That is, the display device 1 is realized as a display in which the display area 100 and the transmissive area 200 have different transmittances.

[0042] Although a front-emitting display device in which a user (U) positioned on the side where an image is displayed observes an image outside the first substrate 10 has been described as an example, the display device of the present invention is not limited thereto. As another example, the display device may be a rear-emitting type in which an image is displayed on the first substrate 10 side from the display unit 20.

[0043] By not disposing a thin film transistor, a capacitor, etc. in the transmissive region 200, the external light transmittance in the transmissive region 200 is increased, and as a result, the external light transmittance of the display device is increased and distortion of the transmissive image caused by interference from the thin film transistor, the capacitor, etc. is prevented.

[0044] The display device 1 further includes a second substrate 30 facing the first substrate 10. In this case, the display unit 20 is interposed between the first substrate 10 and the second substrate 30.

[0045] The second substrate 30 is formed of a transparent glass or plastic substrate, and allows an image from the display unit 20 to be displayed, while blocking the intrusion of outside air and moisture into the display unit 20. The first substrate 10 and the second substrate 30 are connected at their edges by a sealant, and the space between the first substrate 10 and the second substrate 30 is sealed. A moisture absorbent or a filler is placed in the space. Alternatively, the space is sealed by forming a thin film of the second substrate 30 on the first substrate 10 and the display unit 20. In this case, both the first substrate 10 and the second substrate 30 are provided to be flexible.

[0046] In the following, an organic light emitting display device will be described as an example of a display device 1 according to an embodiment of the present invention, but the display device of the present invention is not limited to this embodiment. In other embodiments, various types of display devices such as an inorganic light emitting display device and a quantum dot light emitting display device can be used.

[0047] 2 and 3 are a cross-sectional view and a plan view, respectively, of a display device 1A according to an embodiment of the present invention. Specifically, FIG 3 is a plan view showing adjacent first pixels PX1, for example, a first red pixel Pr, a first green pixel Pg, and a first blue pixel Pb, and FIG 2 is a cross-sectional view taken along line A-A' in FIG 3.

[0048] 2, the display unit 20 includes a display area 100 where an image is displayed, and a transmissive area 200 adjacent thereto through which external light is transmitted. Here, the external light is external light that is distinct from the light emitted by the light emitting element EL1 of the first pixel PX1. The external light may be ambient light or light emitted by other electronic elements.

[0049] In the transmissive region 200, no element containing an opaque material is disposed, and only a substantially transparent auxiliary layer, insulating film, etc. are disposed, so that an image outside the display device 1A can be transmitted as it is.

[0050] The transmissive region 200 allows a first external light 61 and a second external light 62 to pass therethrough. The first external light 61 is external light passing from the outside of the display unit 20 toward the outside of the first substrate 10 (from the display unit 20 toward the first substrate 10). The second external light 62 is external light passing from the outside of the first substrate 10 toward the outside of the display unit 20 (from the first substrate 10 toward the display unit 20). Since elements and wiring are arranged to bypass the transmissive region 200, no elements or wiring are arranged in the transmissive region 200. The transmissive region 200 does not include at least a fourth insulating film 15. The third insulating film 14 arranged in the transmissive region 200 includes a transparent insulating material.

[0051] The display area 100 includes a light-emitting area 102 and a circuit area 101. A first pixel PX1 is disposed in the display area 100. A light-emitting element EL1 of the first pixel PX1 is disposed in the light-emitting area 102. A pixel circuit of the first pixel PX1, which is electrically connected to the light-emitting element EL1 and includes a thin-film transistor TR1, is disposed in the circuit area 101. The circuit area 101 and the light-emitting area 102 do not overlap. Therefore, the light-emitting element EL1 and the pixel circuit are disposed adjacent to each other so as not to overlap. The circuit area 101 is not limited to having one thin-film transistor TR1 disposed therein as shown in the figure, but further includes a number of thin-film transistors and capacitors, and further includes wiring such as scan lines, data lines, and power lines connected thereto.

[0052] The thin film transistor TR1 includes a semiconductor layer 111 on a buffer film 11, a gate electrode 112, a source electrode 113, and a drain electrode 114. A first insulating film 12 between the semiconductor layer 111 and the gate electrode 112 functions as a gate insulating film, and a second insulating film 13 between the gate electrode 112 and the source electrode 113 / drain electrode 114 functions as an interlayer insulating film.

[0053] The light-emitting element EL1 includes a first electrode 116 on a third insulating film 14 covering the thin-film transistor TR1, a second electrode 130 facing the first electrode 116, and an intermediate layer 117 between the first electrode 116 and the second electrode 130.

[0054] The edge of the first electrode 116 is covered by the fourth insulating film 15, and the center of the first electrode 116 is exposed. The fourth insulating film 15 is provided so as to cover the display region 100, but is not necessarily provided so as to cover the entire display region 100. It is sufficient if the fourth insulating film 15 can cover at least a part of the display region 100, particularly the edge of the first electrode 116.

[0055] An auxiliary layer 118 is provided on the third insulating film 14 corresponding to the transmissive region 200 exposed from the fourth insulating film 15. That is, the auxiliary layer 118 is disposed without overlapping with the intermediate layer 117.

[0056] The thickness of the auxiliary layer 118 may be 1 nm or more and 2,000 nm or less. The thickness of the auxiliary layer 118 may be, but is not limited to, 1 nm to 50 nm. If the thickness falls within this range, the effect of patterning the second electrode can be sufficiently obtained, as described below, while the transmittance of the transmissive region 200 can be relatively high.

[0057] The auxiliary layer 118 includes a first material.

[0058] A second electrode 130 is provided on the intermediate layer 117. The second electrode 130 is disposed corresponding to only the display area 100, and is not disposed in the transmissive area 200.

[0059] The second electrode 130 includes a second material.

[0060] The first material and the second material satisfy the following formula 1. ST2-ST1>0mJ / m 2 <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25°C.

[0061] The first material is deposited in a dry process, for example, using a fine metal mask, so as to correspond to the transmissive region 200, or is coated in a wet process so as to correspond to the transmissive region 200. Then, the second material is deposited in both the display region 100 and the transmissive region 200 using an open mask. At this time, the surface energies of the first material and the second material are controlled to be different from each other, so that the second material is not substantially disposed in the region where the first material is disposed. That is, the second material is relatively easily deposited on the intermediate layer 117, but is relatively difficult to deposit on the auxiliary layer 118 including the first material. Therefore, since the auxiliary layer 118 including the first material is disposed in correspondence with the transmissive region 200, the second electrode 130 including the second material is not substantially provided in the transmissive region 200, but is disposed only in correspondence with the display region 100.

[0062] 2 and 3, the auxiliary layer 118 is disposed in an area where the second electrode 130 should not be disposed, and the auxiliary layer 118 is not disposed in an area where the second electrode 130 should be disposed. As a result, even if the second material is deposited in both the display area 100 and the transmissive area 200 of all pixels using an open mask, the metal is substantially deposited only on the exposed surface of the intermediate layer 117 and is not substantially deposited on the surface of the auxiliary layer 118, so that the effect of patterning the second electrode 130 is obtained.

[0063] In order to increase the transmittance of the transmissive region 200, the second electrode 130 should not be substantially disposed in the transmissive region 200. However, if a fine metal mask is used to form the second electrode 130 disposed only in the display region 100, the deposition temperature is quite high, and the fine metal mask may deform over long-term use. This creates a very unstable process, such as causing problems such as a shadow phenomenon. However, the display device 1 according to the embodiment of the present invention is advantageous in terms of process, since the patterning effect of the second electrode 130 is automatically obtained as described above.

[0064] Furthermore, since the second electrode 130 is not substantially disposed in the transmissive region 200, the transmittance of the transmissive region 200 is improved. That is, the second electrode 130 is disposed only in the display region 100, and since the second electrode 130 does not exist in the transmissive region 200, the transmittance of the transmissive region 200 is improved.

[0065] For example, ST2-ST1 is 30mJ / m 2 More specifically, 50 mJ / m 2 If the above range is satisfied, the second material is not substantially deposited on the first material.

[0066] For example, ST1 is 0 mJ / m 2 Greater than 30mJ / m 2 If this range is satisfied, the second material is not substantially deposited on the first material. Specifically, ST1 is 20 mJ / m or less. 2 It may be, but is not limited to, the following:

[0067] In one embodiment, the first material is an organic compound. Specifically, the first material is a fluorine-containing organic compound. More specifically, the first material may be an organic compound with a relatively high fluorine content.

[0068] For example, the first material contains 20 at % or more of fluorine. If this range is satisfied, the surface energy of the first material is low enough that the second material is not substantially deposited on the first material. The fluorine content of the first material is obtained by analyzing the first material using X-ray photoelectron spectroscopy (XPS). Specifically, the first material is %, but is not limited to, 50 at % or more of fluorine.

[0069] For example, as described above, the first material is made of an organic compound, and the first material includes a fluorine-containing silane compound, a fluorine-based polymer compound, and a combination thereof.

[0070] The fluorine-containing silane compound is trichloro(1H,1H,2H,2H-perfluorodecyl)silane. Trichloro(1H,1H,2H,2H-perfluorodecyl)silane, Trichloro(1H,1H,2H,2H-perfluoro-n-octyl)silane, Triethoxy-1H,1H,2H,2H-perfluorodecylsilane, 1H,1H,2H,2H-Nonafluorohexyltriethoxysilane, 1H,1H,2H,2H-Tridecafluoro-n-octyltriethoxysilane Silane (1H,1H,2H,2H-Tridecafluoro-n-octyltriethoxysilane), 1H,1H,2H,2H-Heptadecafluorodecyltrimethoxysilane, 1H,1H,2H,2H-Nonafluorohexyltrimethoxysilane, Trimethoxy(1H,1H,2H,2H-perfluoro-n-octyl)silane Ran[Trimethoxy(1H,1H,2H,2H-perfluoro-n-octyl)silane], 1,1,1-trifluoro-3- (Trimethoxysilyl)propane [1,1,1-Trifluoro-3-(trimethoxysilyl)propane], (Triethylsilyl)trifluoromethane [(Triethylsilyl)trifluoromethane], Triethoxy[5,5,6,6,7,7,7-heptafluoro-4,4-bis(trifluoromethyl)heptyl]silane Including, but not limited to, Trichloro(3,3,3-trifluoropropyl)silane, Dimethoxy(methyl)(3,3,3-trifluoropropyl)silane, and Dichloro(methyl)(3,3,3-trifluoropropyl)silane. It is not something that is done.

[0071] The fluorine-based polymer compound is, for example, poly(hexafluoropropylene oxide), poly(tetrafluoroethylene-co-hexafluoropropylene), poly(decafluorooctyl acrylate), polytetrafluoro-3-(heptafluoropropionate), or poly(hexafluoropropionate). Poly(tetrafluoro-3-(heptafluoropropoxy)propyl acrylate), polytetrafluoro-3-(heptafluoroethoxy)propyl acrylate Ethylene (poly(tetrafluoroehtylene)), tetrafluoroethylene hexafluoropropionate Poly(pentafluorovinyl propionate), poly(heptafluorobutyl acrylate), poly(pent ... acrylate), poly(trifluorovinyl acetate), Poly(1,1,1,3,3,3-hexafluoroisopropyl acrylate), poly(octafluoropentyl acrylate), poly(methyl3,3,3-trifluoropropyl siloxane), poly2,2,3,3,4,4,4-heptafluorobutyl methacrylate poly(2,2,3,3,4,4,4-heptafluorobutyl methacrylate), poly(pentafluoropropyl acrylate), poly(2,2,3,3,3-pentafluoropropyl acrylate), poly(2,2,3,3,3-pentafluoropropyl acrylate), Poly(2-heptafluorobutoxy)ethylacrylate, poly(chlorotrifluoroethylene) and poly(1,1,1,3,3,3- Hexafluoroisopropyl methacrylate (poly(1,1,1,3,3,3-hexafluoroisopropyl Examples of suitable fluoropolymers include, but are not limited to, fluorophenyl ether (methaacrylate).

[0072] The greater the difference between ST2 and ST1, the less likely it is that the second material will be deposited on the first material, but to do so, ST2 must be less than 30 mJ / m 2 It could be bigger Or, ST2 is 100mJ / m 2 It may be, but is not limited to, isn't it.

[0073] In one embodiment, the second material is an inorganic compound, particularly a metal-containing inorganic compound.

[0074] For example, the second material includes magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), and combinations thereof. Specifically, the second material includes Mg, Ag, Al, and combinations thereof.

[0075] The first pixel PX1 may be, for example, a first red pixel Pr, a first green pixel Pg, and a first blue pixel Pb, but the present invention is not limited thereto and any color combination is possible as long as it can realize white light by combination.

[0076] Fig. 4 is a cross-sectional view showing a display device 1B according to another embodiment of the display device of Fig. 2. Fig. 5 is a cross-sectional view showing the display unit 20 of Fig. 4 in more detail.

[0077] The auxiliary layer 118 is disposed only in the transmissive region 200 using a fine metal mask for patterning. Meanwhile, the second electrode 130 is disposed corresponding to both the display region 100 and at least a part of the transmissive region 200, unlike in FIG. 2. That is, the second electrode 130 is disposed corresponding to all or a part of the transmissive region 200.

[0078] Hereinafter, an embodiment in which the second electrodes 130 are arranged corresponding to the display area 100 and all the transmissive areas 200 will be specifically described.

[0079] 5, when the second material is evaporated using an open mask, the first portion 130a of the second electrode 130 is disposed on the intermediate layer 117 in correspondence with the display area 100, and the second portion 130b of the second electrode 130 is disposed on the auxiliary layer 118 in correspondence with the transmissive area 200. 1 and the thickness T of the second portion 130b 2 satisfies the following formula 2. T 1 >T 2 <Formula 2>

[0080] Since the formula 2 is satisfied, the decrease in transmittance caused by the second portion 130b can be reduced.

[0081] Here, T 1 means the average thickness of the second electrode in all the first parts, and T 2 means the average thickness of the second electrode in all second portions, where the area in which the second material is deposited as an open mask consists of the sum of all first portions and all second portions.

[0082] However, the above-mentioned content may occur due to agglomeration of the second electrode in a part of the transmissive region 200. The case where the second electrode is deposited is not excluded, and the second electrode may be deposited in an island shape in the transmissive region 200 .

[0083] Specifically, T 2 is greater than 0 nm and less than or equal to 1 nm. More specifically, T2 is greater than 0 nm and equal to or less than 0.1 nm. If this range is satisfied, the second electrode 130 is not substantially disposed in the transmissive region 200.

[0084] In the following, an embodiment in which the second electrode 130 is disposed corresponding to the display area 100 and a part of the transmissive area 200 will be specifically described. That is, the second electrode 130 is not disposed in at least a part of the transmissive area 200.

[0085] The portion of the second electrode 130 disposed corresponding to a portion of the transmissive region is made of a plurality of particles including the second material.

[0086] Specifically, the thickness of the portion of the second electrode 130 disposed corresponding to the display area 100 is greater than the average diameter of the particles. More specifically, the thickness T E and a front surface disposed corresponding to a part of the transparent region 200 The average diameter D of the particles M The ratio R is 0.9 or less. More specifically, R is 0 The transmittance may be, but is not limited to, 0.01 or more, 0.1 or more, 0.8 or less, 0.7 or less, 0.6 or less, or 0.5 or less. If R satisfies the above-mentioned range, a display device 1 having a desired level of transmittance can be provided. R={thickness T of the portion of the second electrode 130 disposed corresponding to the display area 100 E} / {Toru The average diameter D of the plurality of particles arranged corresponding to a portion of the over region 200 M} For example, T E When is 10 nm, D M is about 5 nm or less. As another example, T E but When it is 20 nm, D M is about 10 nm or less.

[0087] Since each component has the same or similar function as the corresponding component in the embodiment of FIG. 2 and FIG. 3 described above, detailed description thereof will be omitted.

[0088] 6 and 7 are a cross-sectional view and a plan view showing a display device 2A according to another embodiment of the present invention, in which FIG 7 is a plan view showing adjacent first pixels PX1, for example, a first red pixel Pr, a first green pixel Pg, and a first blue pixel Pb, and FIG 6 is a cross-sectional view taken along line A-A' of FIG 7.

[0089] Unlike the display device 1A shown in Figures 2 and 3, the display device 2A shown in Figures 6 and 7 has a circuit region 101 and a light-emitting region 102 included in a display region 100 that are arranged so as to overlap each other in a plane.

[0090] Furthermore, the transmissive regions 200 adjacent to a plurality of first pixels PX1, for example, the first red pixel Pr, the first green pixel Pg, and the first blue pixel Pb, are connected to each other to form a common transmissive region 200. In this case, the area of ​​the transmissive region 200 is larger than that in the embodiment of Figures 2 and 3. This can increase the transmittance of the display device 2A.

[0091] Since each component has the same or similar function as the corresponding component in the embodiment of FIG. 2 and FIG. 3 described above, detailed description thereof will be omitted.

[0092] FIG. 8 is a cross-sectional view that illustrates a display device 2B according to another embodiment of the display device of FIG.

[0093] The auxiliary layer 118 is patterned only in the transmissive region 200 using a fine metal mask. 6, the second electrode 130 is disposed to correspond to both the display area 100 and at least a part of the transmissive area 200. That is, the second electrode 130 is disposed to correspond to all or a part of the transmissive area 200.

[0094] Hereinafter, an embodiment in which the second electrodes 130 are arranged corresponding to the display area 100 and all the transmissive areas 200 will be described in detail.

[0095] When the second material is evaporated using an open mask, a first portion 130a of the second electrode 130 is disposed on the intermediate layer 117 in correspondence with the display area 100, and a second portion 130b of the second electrode 130 is disposed on the auxiliary layer 118 in correspondence with the transmissive area 200. The thickness of the first portion 130a is equal to a first thickness T 1 and the thickness of the second portion 130b is a second thickness T 2 and the second thickness T 2 and the first thickness T 1 satisfies the following formula 2. T 1 >T 2 <Formula 2> In the above formula 2, T 1 is the thickness of the second electrode in the display area, T 2 is the thickness of the second electrode in the transmissive region.

[0096] Since the formula 2 is satisfied, the decrease in transmittance caused by the second portion 130b can be reduced.

[0097] Specifically, T 2 is greater than 0 nm and less than or equal to 1 nm. More specifically, T 2 is greater than 0 nm and equal to or less than 0.1 nm. If this range is satisfied, the second electrode 130 is not substantially disposed in the transmissive region 200.

[0098] Hereinafter, a specific embodiment will be described in which the second electrode 130 is disposed corresponding to the display area 100 and a part of the transmissive area 200. That is, the second electrode 130 is not disposed in at least a part of the transmissive area 200.

[0099] The portion of the second electrode 130 disposed corresponding to a portion of the transmissive region is made of a plurality of particles including the second material.

[0100] Specifically, the thickness of the portion of the second electrode 130 disposed corresponding to the display area 100 is greater than the average diameter of the particles. More specifically, the thickness T E and arranged corresponding to a part of the transparent region 200 The average diameter D of the plurality of particles M The ratio R is 0.9 or less. More specifically, R is The transmittance may be, but is not limited to, 0.01 or more, 0.1 or more, 0.8 or less, 0.7 or less, 0.6 or less, or 0.5 or less. If R satisfies the above range, a display device 1 having a desired level of transmittance can be provided. R={thickness T of the portion of the second electrode 130 disposed corresponding to the display area 100 E} / {Toru The average diameter D of the plurality of particles arranged corresponding to a portion of the over region 200 M} For example, T E When is 10 nm, D M is about 5 nm or less. As another example, T E but When it is 20 nm, D M is about 10 nm or less.

[0101] Since the functions of each component are the same or similar to those of the corresponding components in the embodiment of FIGS. 2 to 4 described above, detailed description thereof will be omitted.

[0102] 9 to 14 are cross-sectional views showing a method for manufacturing a display device 1A according to an embodiment of the present invention.

[0103] 9 to 14, a method of manufacturing a display device 1A according to an embodiment of the present invention includes the steps of providing a first substrate, and forming a display unit including a display region and a transmissive region on the first substrate. providing a display unit including a step of providing an auxiliary layer only in the transmissive region, and a step of providing a second electrode on the display region or on the display region and the transmissive region, the auxiliary layer including a first material and the second electrode including a second material, the first material and the second material being described above.

[0104] A method for manufacturing a display device 1A according to an embodiment of the present invention will now be described in detail with reference to the drawings.

[0105] 9, a buffer film 11 is provided on a first substrate 10, and a pixel circuit including a thin film transistor TR1 is provided on the buffer film 11.

[0106] The first substrate 10 includes a glass material, a ceramic material, a metal material, a plastic material, or a material having flexible or bendable properties.

[0107] The buffer film 11 has the function of blocking the intrusion of impurity elements through the first substrate 10 and planarizing the surface, and is formed of a single layer or multiple layers of an inorganic material such as silicon nitride (SiNx) and / or silicon oxide (SiOx). The buffer film 11 may be omitted.

[0108] A semiconductor layer 111 of the first pixel PX1 of the display device 1A is provided on the buffer layer 11. The semiconductor layer 111 may include various materials. For example, the semiconductor layer 111 may include an inorganic semiconductor material such as amorphous silicon or crystalline silicon. As another example, the semiconductor layer 111 may include an oxide semiconductor or an organic semiconductor material.

[0109] A first insulating film 12 is provided on the buffer film 11 so as to cover the semiconductor layer 111, and a gate electrode 112 of the first pixel PX1 is provided on the first insulating film 12.

[0110] The first insulating film 12 is made of SiO 2 ,SiN x , SiON, Al 2 O3 , TiO 2 , Ta 2 O 5 , HfO 2 , ZrO 2 , BST, or PZT is formed as a single layer or multiple layers of the insulating film. The first insulating film 12 may be an inorganic insulating film.

[0111] The gate electrode 112 is formed of various conductive materials. For example, the gate electrode 112 is formed of one or more materials selected from aluminum (Al), platinum (Pt), palladium (Pd), silver (Ag), magnesium (Mg), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), chromium (Cr), lithium (Li), calcium (Ca), molybdenum (Mo), titanium (Ti), tungsten (W), and copper (Cu) in a single layer or multiple layers. For example, the gate electrode 112 is formed of three layers of Mo / Al / Mo or Ti / Al / Ti.

[0112] A second insulating film 13 is provided on the first insulating film 12 so as to cover the gate electrode 112, and a source electrode 113 and a drain electrode 114 of the first pixel PX1 are provided on the second insulating film 13, and are each electrically connected to the semiconductor layer 111 through a contact hole.

[0113] The second insulating film 13 may be an inorganic insulating film. 2 ,SiN x , SiON, Al 2 O 3 , TiO 2 , Ta 2 O 5 , HfO 2 , ZrO 2 , BST, PZT, one or more selected insulating films are formed in a single layer or multiple layers. In another embodiment, the second insulating film 13 may be an organic insulating film.

[0114] The source electrode 113 and the drain electrode 114 are formed of various conductive materials, such as aluminum (Al), platinum (Pt), palladium (Pd), silver (Ag), magnesium (Mg), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), The source electrode 113 and the drain electrode 114 are formed in a single layer or multiple layers using one or more materials selected from the group consisting of chromium (Cr), lithium (Li), calcium (Ca), molybdenum (Mo), titanium (Ti), tungsten (W), and copper (Cu). For example, the source electrode 113 and the drain electrode 114 are formed in two or more layers.

[0115] The structure of the thin film transistor TR1 is not necessarily limited to that shown in the drawing, and it goes without saying that various types of thin film transistor structures are applicable.

[0116] A third insulating film 14 is provided so as to cover the thin film transistor TR1 of the first pixel PX1.

[0117] The third insulating film 14 is formed of a single-layer or multi-layer organic insulating film with a flattened upper surface. The third insulating film 14 includes a general-purpose polymer (PMMA, PS), a polymer derivative having a phenol group, an acrylic polymer, an imide polymer, an aryl ether polymer, an amide polymer, a fluorine-based polymer, a p-xylene-based polymer, a vinyl alcohol-based polymer, and blends thereof. For example, the third insulating film 14 includes polyimide, polyamide, acrylic resin, etc.

[0118] Generally, the surface energy of the compound contained in the third insulating film 14 is 100 mJ / m 2 Below Therefore, if the second material is directly deposited on both the display area 100 and the transmissive area 200 using an open mask without forming the auxiliary layer 118 on the transmissive area 200, the surface energy of the compound contained in the third insulating film 14 and the surface energy of the second material are the same or similar, so that the effect of patterning the second electrode 130 cannot be obtained at all.

[0119] A first electrode 116 of the light-emitting element EL1 electrically connected to the thin film transistor TR1 of the first pixel PX1 is provided on the third insulating film 14. The first electrode 116 is provided corresponding to the display region 100.

[0120] When the light-emitting element EL1 is a front light-emitting element, the first electrode 116 is formed as a reflective electrode. The reflective electrode includes a reflective layer containing Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, or a compound thereof, and a transparent or semi-transparent electrode layer formed on the reflective layer. When the light-emitting element EL1 is a rear light-emitting element, the first electrode 116 is formed of ITO, IZO, ZnO, or In. 2 O 3 and is composed of transparent or semi-transparent electrodes.

[0121] 9, the buffer film 11, the first insulating film 12, the second insulating film 13, and the third insulating film 14 are provided to cover both the display region 100 and the transmissive region 200, respectively. However, the embodiment of the present invention is not limited thereto, and at least one of the buffer film 11, the first insulating film 12, the second insulating film 13, and the third insulating film 14 may have an opening (not shown) at a position corresponding to the transmissive region 200, thereby further increasing the external light transmission efficiency of the transmissive region 200.

[0122] External light is perceived by a user by passing through the transmissive region 200. Therefore, only a transparent insulating film or the like is disposed in the transmissive region 200, and the transmittance of the transmissive region 200 can be increased by minimizing reflection occurring at the boundary surface of the film disposed in the transmissive region 200.

[0123] The interface reflection increases as the difference in refractive index between adjacent films increases. According to an embodiment, the buffer film 11, the first insulating film 12, the second insulating film 13, and the third insulating film 14 may be a single film having substantially the same refractive index. The buffer film 11, the first insulating film 12, the second insulating film 13, and the third insulating film 14 arranged in the transmissive region 200 may all have the same refractive index. By forming the film in one position, it is possible to minimize the interfacial reflection occurring between the films and increase the transmittance of the transmission region 200 .

[0124] 10, a fourth insulating film 15 is provided on the third insulating film 14 to cover the edge of the first electrode 116. The fourth insulating film 15 is formed of a single layer or multiple layers of an inorganic insulating film or an organic insulating film.

[0125] The fourth insulating film 15 is arranged to cover the display area 100 of the display device 1A, but does not necessarily have to cover the entire display area 100; it is sufficient to cover at least a portion of it, in particular only the edge of the first electrode 116 of the first pixel PX1.

[0126] The fourth insulating film 15 has a first opening 15a exposing at least a part of the first electrode 116 of the first pixel PX1, and a second opening 15b at a position corresponding to the transmissive region 200. The fourth insulating film 15 is not located in the transmissive region 200. Therefore, the external light transmittance efficiency of the transmissive region 200 is further increased.

[0127] Referring to FIG. 11, an intermediate layer 117 is provided on the first electrode 116 exposed through the first opening 15a of the first pixel PX1.

[0128] The intermediate layer 117 includes a light-emitting layer that emits light, and further includes at least one functional layer selected from a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL). However, the present embodiment is not limited thereto, and various functional layers may be further disposed on the first electrode 116.

[0129] The light emitting layer may be a red light emitting layer, a green light emitting layer, or a blue light emitting layer, or may have a multi-layer structure in which a red light emitting layer, a green light emitting layer, and a blue light emitting layer are stacked to emit white light, or may have a single layer structure containing a red light emitting material, a green light emitting material, and a blue light emitting material.

[0130] In one embodiment, the intermediate layer 117 is provided only in the light emitting region 102 using a mask, for example a fine metal mask (FMM), having an opening M11 corresponding to the light emitting region 102 of the display device 1A.

[0131] In another embodiment, of the intermediate layer 117, the light-emitting layer is provided only in the light-emitting region 102 using an FMM (Fine Metal Mask) having an opening M11 corresponding to the light-emitting region 102 of the display device 1A, and the other functional layers are provided on the front side of the first substrate 10 using an open mask.

[0132] In an embodiment of the present invention, the transmissive area 200 of the display device 1A is at least not provided with a light-emitting layer.

[0133] Referring to FIG. 12, an auxiliary layer 118 is provided on the third insulating layer 14 exposed through the second opening 15b.

[0134] In one embodiment, the auxiliary layer 118 is applied only to the transmissive areas 200 using a dry process, for example a fine metal mask having openings M21 corresponding to the transmissive areas 200.

[0135] In another embodiment, the auxiliary layer 118 is coated only onto the transmissive areas 200 using a wet process.

[0136] Referring to FIG. 13, in one embodiment, a second electrode 130 is provided on the intermediate layer 117 or on the intermediate layer 117 and the auxiliary layer 118 .

[0137] The second electrode 130 is provided by depositing the second material using an open mask. At this time, the surface energies of the first material of the auxiliary layer 118 and the second material of the second electrode 130 are controlled to be different from each other, so that the second material is not substantially provided in the transmissive region 200 where the first material is provided. That is, the second material is easily deposited on the intermediate layer 117, but is difficult to deposit on the auxiliary layer 118 including the first material. Therefore, since the auxiliary layer 118 including the first material is disposed corresponding to the transmissive region 200, the second electrode 130 including the second material is not substantially provided in the transmissive region 200, but is disposed only corresponding to the display region 100.

[0138] Referring to FIG. 14, the second substrate 30 may be aligned on the top of the first substrate 10, and then the first substrate 10 and the second substrate 30 may be bonded together.

[0139] The second substrate 30 includes a glass material, a ceramic material, a metal material, a plastic material, or a material having flexible or bendable properties.

[0140] A black matrix (BM) and a color filter (CF) are arranged on the surface of the second substrate 30 facing the first substrate 10. The color filter (CF) is arranged to correspond to the light-emitting region 102 of the display device 1A. The black matrix (BM) is arranged to correspond to an area excluding the light-emitting region 102 and the transmissive region 200 of the display device 1A. In other words, the black matrix (BM) is not arranged in the transmissive region 200 of the display device 1A.

[0141] Although not shown, a protective layer is further disposed on the second electrode 130 before bonding the second substrate 30 to the first substrate 10. The protective layer may be a single layer or multiple layers of an inorganic film and / or an organic film.

[0142] Although not shown, various functional layers may be further provided on the upper surface of the second substrate 30. For example, the functional layers may be an anti-reflection layer that minimizes reflection on the upper surface of the second substrate 30, or an anti-contamination layer that prevents contamination such as a user's handprint (e.g., a fingerprint).

[0143] In another embodiment, a thin film encapsulation layer is disposed on the first substrate 10 instead of the second substrate 30 described above. The thin film encapsulation layer includes an inorganic encapsulation layer made of at least one inorganic material and an organic encapsulation layer made of at least one organic material. In some embodiments, the thin film encapsulation layer has a structure in which a first inorganic encapsulation layer / an organic encapsulation layer / a second inorganic encapsulation layer are stacked.

[0144] 15 and 16 are cross-sectional views showing a method for manufacturing a display device according to another embodiment of the present invention.

[0145] In another embodiment, after the process shown in Fig. 10, the process shown in Fig. 15 may be performed, and then the process shown in Fig. 16 may be performed, so that the second electrode 130 may be provided as a common layer on the intermediate layer 117 and the auxiliary layer 118 on the front surface of the first substrate 10 as shown in Fig. 13. Specifically, after the process shown in Fig. 10, the auxiliary layer 118 may be provided on the third insulating film 14 exposed through the second opening 15b as shown in Fig. 15. Then, the intermediate layer 117 may be provided on the first electrode 116 exposed through the first opening 15a of the first pixel PX1 as shown in Fig. 16.

[0146] If only the second electrode 130 is formed after the auxiliary layer 118 is formed, various process variations are possible.

[0147] The display device 1 is a mobile phone, a video phone, a smart ... The present invention is embodied as electronic devices 1000 such as smartphones, smart watches, tablet PCs, notebook computers, computer monitors, televisions, digital broadcasting terminals, PDAs (Personal Digital Assistants), PMPs (Portable Multimedia Players), head mounted displays (HMDs), and vehicle navigation systems.

[0148] Fig. 17 is a block diagram showing a schematic configuration of an electronic device according to an embodiment of the present invention, and Fig. 18A and Fig. 18B are perspective views showing a schematic configuration of an electronic device according to an embodiment of the present invention.

[0149] 17, an electronic device 1000 includes a processor 1010, a memory device 1020, a storage device 1030, an input / output device 1040, a power supply 1050, and a display device 1060. In this case, the display device 1060 corresponds to the display device 1 of Fig. 1. The electronic device 1000 further includes a number of ports for communicating with a video card, a sound card, a memory card, a USB device, etc., or for communicating with other systems.

[0150] In one embodiment, the electronic device 1000 is embodied as a television as shown in Fig. 18A. In another embodiment, the electronic device 1000 is embodied as a smartphone as shown in Fig. 18B. However, these are merely examples and the electronic device 1000 is not limited thereto.

[0151] 19 and 20, the formation of the second electrode 130 with and without the auxiliary layer 118 will be described. The transmittance of Comparative Examples 1 to 3, Example 1, and Example 2 was measured at wavelengths of 300 nm to 1,000 nm.

[0152] The graph displayed in Comparative Example 1 is a transmittance graph of Sample 1. Sample 1 is a glass substrate having a thickness of 0.5 mm. The graph displayed in Comparative Example 2 is a transmittance graph of Sample 2. Sample 2 is a substrate in which a 9 nm-thick AgMg thin film is formed by evaporating AgMg (weight ratio = 10:1) on a 0.5 mm-thick glass substrate. The graph displayed in Example 1 is a transmittance graph of Sample 3. Sample 3 is a substrate manufactured by forming an auxiliary layer having a thickness of 10 nm on a 0.5 mm-thick glass substrate and then evaporating AgMg. The closer the transmittance graph is to that of Comparative Example 1, the less the second electrode is formed.

[0153] 19, it can be seen that the graph of Example 1 is significantly closer to the graph of Comparative Example 1 than the graph of Comparative Example 2. This confirms that the second electrode is not substantially formed by forming the auxiliary layer.

[0154] The graph labeled Comparative Example 3 is a transmittance graph of Sample 4. Sample 4 is a substrate in which a mixed electron transport layer of 36 nm is formed on a glass substrate of 0.5 mm thickness, and then a Yb thin film of 1.3 nm thickness is formed. The graph labeled Example 2 is a transmittance graph of Sample 5. Sample 5 is a substrate manufactured by forming a mixed electron transport layer of 36 nm thickness on a glass substrate of 0.5 mm thickness, forming an auxiliary layer of 10 nm thickness, forming a Yb thin film of 1.3 nm thickness, and then evaporating AgMg (weight ratio = 10:1). The closer the transmittance graph is to that of Comparative Example 3, the less the second electrode is formed.

[0155] Referring to FIG. 20, it can be seen that the graph of Example 2 is significantly similar to the graph of Comparative Example 3. This confirms that the formation of the auxiliary layer does not substantially form the second electrode. In addition, the average transmittance of Example 2 is 87.15%, and the average transmittance of Comparative Example 3 is 87.45%, which is very similar.

[0156] Next, referring to Fig. 21A, it can be seen that the second electrode formed on the auxiliary layer has a particle shape in Example 2. Fig. 21C is a partially enlarged view of Fig. 21A.

[0157] Although the present invention has been described based on the embodiments shown in the drawings, these are merely illustrative, and a person skilled in the art will understand that various modifications and variations of the embodiments are possible. Therefore, the true technical scope of the present invention should be determined by the technical ideas of the claims. [Explanation of symbols]

[0158] 1 Display device 10 First board 11 Buffer film 12 First insulating film 13 Second insulating film 14 Third insulating film 15 Fourth insulating film 20 Display section 30 Second board 1A display device 61 First Outdoor Light 62 Second Pane 100 display area 101 Circuit area 102 Light-emitting area 111 Semiconductor layer 112 Gate electrode 113 Source Electrode 114 Drain electrode 116 1st electrode 117 Middle Class 118 Auxiliary layer 130 2nd electrode 200 Transparent area TR1 Thin Film Transistor PX1 1st pixel EL1 light emitting element

Claims

[Claim 1] A first substrate and a display unit are provided. The display unit includes a display area and a transmissive area. the display unit includes an auxiliary layer disposed in correspondence with the transmissive region, and a second electrode disposed in correspondence with only the display region so as not to overlap with the auxiliary layer, the auxiliary layer includes a first material; the second electrode comprises a second material; The first material and the second material satisfy the following formula 1, ST2-ST1>0mJ / m ２ <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25° C.

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