Plasma processing apparatus for bath

Abstract

To provide a plasma processing apparatus for a bath capable of efficiently cleaning a bath facility.SOLUTION: The plasma processing apparatus for a bath includes: a plasma generation unit 10 that includes at least a dielectric layer and a pair of electrode layers provided on both sides of the dielectric layer and generates plasma, a power supply unit that applies an AC voltage to the pair of electrode layers; a gas flow unit 20 that causes gas to flow through the plasma generation unit 10 in order to treat the gas with plasma; a plasma water generation unit 40 that receives the gas converted into plasma by the gas flow unit 20 and generates water converted into plasma; and a water guide unit 50 that supplies the water converted into plasma from the plasma water generation unit 40 to a bath facility 300.SELECTED DRAWING: Figure 6

Description

Technical Field

[0001] The present invention relates to a plasma processing apparatus for a bath.

Background Art

[0002] In recent years, regarding plasma processing technology, a method called dielectric barrier discharge has been developed, making it possible to generate low-temperature plasma under atmospheric pressure. As a result, the application range of plasma processing has expanded and it is being increasingly used in various applications. The purposes of plasma processing include sterilization, deodorization, surface modification, decomposition of chemical substances, etc. Also, the substances to be subjected to plasma processing can be any of solids, liquids, and gases.

[0003] In order to continuously perform plasma processing while flowing air, various plasma processing apparatuses have been developed. For example, Patent Document 1 discloses a plasma generation apparatus in which plasma generation units provided with a flat plate-shaped first electrode and a second electrode facing each other with a gap therebetween are stacked in two or more layers.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] It is desired to apply the cleaning ability of plasma in a bathroom (also referred to as bath facilities).

[0006] In view of such a background, an object of the present invention is to provide a plasma processing apparatus for a bath that can efficiently clean bath facilities.

Means for Solving the Problems

[0007] In order to solve the above-described problems, the present invention includes at least a plasma generation unit that generates plasma and includes a dielectric layer and a pair of electrode layers provided on both sides of the dielectric layer, a power supply unit that applies an alternating voltage to the pair of electrode layers, a gas flow unit that flows gas through the plasma generation unit to process the gas with plasma, a plasma water generation unit that receives the gas plasmaized by the gas flow unit and generates plasmaized water, and a water conduit unit that supplies the plasmaized water from the plasma water generation unit to a bath facility.

[0008] According to the present invention, by supplying the plasmaized gas contained in water (this water is also referred to as plasma water) by the plasma water generation unit to the bath facility, the propagation of bacteria can be suppressed and efficient cleaning can be achieved.

[0009] Further, the water conduit unit preferably includes a water conduit provided on at least one of the floor and wall of the bath facility and having a plurality of communication holes, a pipe connecting the water conduit and the plasma water generation unit, and a water conduit pump that sends the plasmaized water from the plasma water generation unit to the water conduit through the pipe.

[0010] According to the present invention, the water conduit unit can be easily configured.

[0011] Further, it preferably includes a human presence sensor provided in the bath facility for detecting the presence or absence of a person, and a control unit that receives the detection result of the human presence sensor, transmits a signal for applying an alternating voltage to the power supply unit based on the detection result, and transmits a signal to the water conduit pump.

[0012] According to the present invention, plasma water can be efficiently supplied according to the presence or absence of a person using the bath facility.

[0013] Further, it preferably includes a control unit that transmits a signal for applying an alternating voltage to the power supply unit based on a timer unit that measures time, and transmits a signal to the water conduit pump.

[0014] According to the present invention, plasma water can be efficiently supplied according to time.

[0015] Further, it is preferable that the gas flow portion flows gas to the plasma generation portion to process the gas with plasma, and supplies the plasma-converted gas to at least one of the bathtub of the bath facility and the bathroom of the bath facility.

[0016] According to the present invention, by supplying plasma water to a bath facility and supplying plasma gas to at least one of a bathtub and a bathroom, the bath facility can be cleaned more efficiently as a whole.

[0017] Further, it covers the plasma generation portion and has a housing partitioned into a plurality of spaces by the dielectric layer. The housing includes an inflow portion through which gas flows into each of the spaces and an outflow portion through which gas flows out for each of the spaces, and is configured such that gases having different pressures flow through each of the spaces.

[0018] According to the present invention, a plurality of plasma-converted gases (also referred to as plasma gases) having different pressures can be supplied from one plasma generation portion. That is, plasma gases having different atmospheric pressures can be supplied according to the load of the supply destination.

Effects of the Invention

[0019] According to the plasma processing apparatus for a bath of the present invention, a bath facility can be efficiently cleaned.

Brief Description of the Drawings

[0020]

Figure 1

Figure 2

Figure 3

Figure 4

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Figure 6

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Figure 8

Figure 9

Figure 10

Figure 11

Mode for Carrying Out the Invention

[0021] Hereinafter, embodiments of the present invention will be described in detail. However, the embodiments of the present invention are not limited to the embodiments described below. Each embodiment and modification example can be applied in appropriate combination. Also, directions such as "up and down" in the description are used for convenience of explanation and do not limit the direction of the present invention.

[0022] The bus plasma processing apparatus of the present embodiment has a plasma generation unit having a multilayer structure including a dielectric layer, an electrode layer, and a mask layer (optional), a power supply unit capable of applying an alternating voltage between a pair of electrode layers, and a gas flow unit capable of flowing gas through the plasma generation unit, in order to continuously plasma-process the gas. In dielectric barrier discharge, a dielectric layer is provided between two electrode layers, and by applying an alternating voltage between both electrode layers, plasma can be generated in the dielectric layer sandwiched between both electrode layers. First, the plasma generation unit will be described.

[0023] <Basic Structure of Plasma Generation Unit> As shown in FIGS. 1 and 2, the plasma generation unit 10 includes a dielectric layer 11, an upper electrode 12, a lower electrode 13, an upper mask layer 14, and a lower mask layer 15. The plasma generation unit 10 is a thin film member and has flexibility.

[0024] As shown in FIGS. 1 to 3, the dielectric layer 11 is a layered member installed between the upper electrode 12 and the lower electrode 13. As the material of the dielectric layer 11, an insulating material with a high breakdown voltage is used so that discharge does not easily occur between the upper electrode 12 and the lower electrode 13. Further, since the material of the dielectric layer 11 is to be exposed to the generated plasma, it is preferably a material having durability against the active substances generated in the plasma. The material of the dielectric layer 11 is preferably a material mainly selected from glass, ceramics, and synthetic resins. "Mainly" means that the component composition is 50% by mass or more (the same applies hereinafter).

[0025] Examples of the glass include soda lime glass (soda glass), borosilicate glass, quartz glass, lead glass, and oxide glass. Synthetic resins include thermoplastic resins and thermosetting resins. Examples of the thermoplastic resins include general-purpose resins such as polyolefin, polystyrene, polyvinyl acetate, polyurethane, polylactic acid, ABS resin, AS resin, acrylic resin, polyvinyl chloride, and polyvinylidene chloride, engineering plastics such as polyamide, polyacetal, polycarbonate, modified polyphenylene ether, polyester, and cyclic polyolefin, polyphenylene sulfide, polysulfone, polyethersulfone, polyarylate, liquid crystal polymer, polyetheretherketone, polyimide, polyamideimide, polyetherimide, fluorine-based resin, unsaturated polyester resin, and polyurethane resin. Among these synthetic resins, silicone-based resins having excellent durability are particularly preferable. The thickness of the dielectric layer 11 is not particularly limited, but is preferably 0.1 mm to 5.0 mm, more preferably 0.1 mm to 3.0 mm, and even more preferably 0.1 to 1.0 mm in order to achieve light weight and miniaturization.

[0026] The upper electrode (electrode layer) 12 and the lower electrode (electrode layer) 13 are layered members provided on the front and back of the dielectric layer 11 as shown in FIGS. 2 and 3. The upper electrode 12 and the lower electrode 13 are each provided with a through hole 16 penetrating in the thickness direction. In this embodiment, the through hole 16 is oblong and five are formed, but the shape and number are not limited. The through hole 16 may be omitted, but the presence of the through hole can improve the utilization efficiency of plasma. Also, the presence of the through hole can make it easier to generate plasma.

[0027] The upper electrode (electrode layer) 12 and the lower electrode (electrode layer) 13 are formed of a conductive material, and a metal plate (including metal foil), a conductive paint, a conductive polymer, a conductive film, etc. can be used. The thicknesses of the upper electrode 12 and the lower electrode 13 are not particularly limited, but in order to obtain a flexible, lightweight and compact processing device, 5 μm to 1.0 mm are preferable, 5 μm to 0.2 mm are more preferable, and 5 μm to 0.1 mm are even more preferable.

[0028] The dielectric layer 11, the upper electrode 12, and the lower electrode 13 may be laminated without using an adhesive, or may be adhered with an adhesive. The adhesive is preferably a material having durability against active substances generated in the plasma. Examples of the adhesive include epoxy-based, acrylic-based, urethane-based, phenol-based, urea-based, silicone-based, cyanoacrylate-based, rubber-based, and vinyl acetate-based adhesives. Among these, from the viewpoint of durability, silicone-based adhesives and UV-curable epoxy-based adhesives are preferable, and silicone-based adhesives are more preferable. The thickness of the adhesive is preferably 0.01 to 0.2 mm, and more preferably 0.01 to 0.1 mm. Also, in FIGS. 1 and 2, the dielectric layer is shown as one material, but the dielectric layer does not have to be one material, and the same effect can be obtained by laminating a plurality of dielectrics. Furthermore, even if an air layer (air can also be considered as a dielectric with a relative permittivity of 1) is provided between the dielectric layers, the same effect can be obtained, but in order to obtain the effect of barrier discharge, it is desirable to use a material with a large relative permittivity and a certain thickness of the dielectric.

[0029] The upper mask layer (mask layer) 14 and the lower mask layer (mask layer) 15 are members respectively installed outside the upper electrode 12 and the lower electrode 13 as shown in FIG. 3. More specifically, the upper mask layer 14 is installed on the upper surface of the upper electrode 12. The lower mask layer 15 is installed on the lower surface of the lower electrode 13. Through holes 17 are respectively provided in the upper mask layer 14 and the lower mask layer 15. In this embodiment, the through holes 17 are oblong and five are formed, but the shape and the number are not limited. The through holes 17 may be omitted, but the presence of the through holes enables the plasma to contact the gas on the back side of the electrode (the back side is the portion located on the side opposite to the direction of the counter electrode where the plasma is generated), and the utilization efficiency of the plasma can be increased. Also, the presence of the through holes can make it easier to generate plasma.

[0030] As shown in FIGS. 2 and 3, the through holes 17 communicate with the through holes 16. The dielectric layer 11 is exposed to the outside through the through holes 16 and 17. In other words, the surface of the dielectric layer 11 is exposed to the outside at a plurality of locations where the through holes 16 and 17 are formed. Also, the hole walls (cross-sectional portions) 16a and 17a of the through holes 16 and 17 are also exposed to the outside respectively.

[0031] The upper mask layer 14 and the lower mask layer 15 are formed of an insulating material. Also, it is preferable that the hardness of the upper mask layer 14 and the lower mask layer 15 be equal to or smaller than the hardness of the upper electrode 12 and the lower electrode 13. Since the plasma generation unit 10 is a thin member, there is a problem that it is difficult to handle, but the handleability can be improved by providing the upper mask layer 14 and the lower mask layer 15. The thicknesses of the upper mask layer 14 and the lower mask layer 15 are not particularly limited. However, in order to provide a flexible, lightweight, and compact processing device, they are preferably 5 μm to 1.0 mm, more preferably 5 μm to 0.2 mm, and even more preferably 5 μm to 0.1 mm, respectively. Although the thicknesses of the upper mask layer 14 and the lower mask layer 15 may be set as appropriate, in the present embodiment, they are formed to be larger than the thicknesses of the upper electrode 12 and the lower electrode 13.

[0032] Since the plasma generation unit 10 is extremely thin and flexible, there is a problem that it becomes difficult to handle during assembly, for example. Further, since the upper electrode 12 and the lower electrode 13 are formed of a conductive material such as a metal having conductivity or a conductive dielectric, they may be eroded by a liquid or a gas. For example, the upper electrode 12 and the lower electrode 13 are oxidized by a gas having a strong oxidizing power and eroded by sulfuric acid, hydrochloric acid, or the like. Further, although the plasma generation unit 10 is installed along the shape of the object to be attached, if only the upper electrode 12 and the lower electrode 13 are provided without the upper mask layer 14 and the lower mask layer 15, there is a problem that if the electrode is a thin metal, wrinkles may occur in the metal constituting the electrode or a gap may be formed between the electrode and the dielectric layer 11. If a gap is formed between the upper electrode 12 and the lower electrode 13 and the dielectric layer 11, it may also cause abnormal discharge. In this regard, according to the present embodiment, the upper mask layer 14 and the lower mask layer 15 can protect the upper electrode 12 and the lower electrode 13, and at the same time, the plasma generation unit 10 becomes easier to handle, and the workability and the assemblability can be improved. Further, by providing the upper mask layer 14 and the lower mask layer 15, it can be installed on the object to be attached without forming wrinkles or gaps. Further, when a plurality of pairs of electrodes are provided in multiple stages, since the upper mask layer 14 and the lower mask layer 15 also become a part of the dielectric constituting the barrier discharge, abnormal discharge is less likely to occur even if a gap is formed during installation. Depending on the situation, the same effect can be obtained with either the upper or the lower mask layer alone.

[0033] In addition, the upper electrode 12 and the lower electrode 13 may have their outer edges sealed with an insulator (not shown) so that the outer edges are not exposed to the outside and do not deteriorate over time, and so that there is no discharge through the outer edges other than the through-holes 16. Similarly, the upper mask layer 14 and the lower mask layer 15 may have their outer edges sealed with an insulator (not shown) so that the outer edges are not exposed to the outside and do not react with substances in the outside and deteriorate over time, and so that there is no discharge through the outer edges other than the through-holes 17.

[0034] When the longitudinal directions of the through-holes 16 and 17 are parallel to the gas flow direction, the resistance of the gas flow becomes small and the gas flow becomes smooth. On the other hand, when the longitudinal directions of the through-holes 16 and 17 are perpendicular to the gas flow direction, the resistance of the gas flow becomes large, the gas flow is disturbed, and the gas is agitated.

[0035] How to set the shapes, numbers, and directions of the through-holes 16 and 17 with respect to the gas flow can be appropriately selected and implemented according to the purpose of the plasma treatment, the effect of the plasma treatment, etc. Also, the shapes of the through-holes may be different on the front side and the back side of the plasma generation unit 10. Also, through-holes may be provided on the front side of the plasma generation unit 10 and not provided on the back side.

[0036] <First Modified Example of Plasma Generation Unit> FIG. 4 is a perspective view for explaining the plasma generation unit according to the first modified example. The plasma generation unit 10A according to the first modified example is different from the above-described basic structure in that the upper mask layer 14 is not provided. Like the plasma generation unit according to the first modified example, the mask layer may be provided only on one side of the plasma generation unit 10A.

[0037] <Second Modified Example of Plasma Generation Unit> FIG. 5 is a perspective view for explaining a plasma generation unit according to a second modified example. The plasma generation unit 10B according to the second modified example is different from the above-described basic structure in that the upper mask layer 14 and the lower mask layer 15 are not provided. As in the plasma generation unit according to the second modified example, the upper mask layer 14 and the lower mask layer 15 may be omitted. That is, by configuring the plasma generation unit 10B with the dielectric layer 11, the upper electrode 12, and the lower electrode 13, it is possible to further reduce the size and reduce the number of components.

[0038] Also, as in the first modified example and the second modified example, by omitting both or one of the upper mask layer 14 and the lower mask layer 15, the upper electrode 12 and the lower electrode 13 can be brought into direct contact with the gas, and the plasma and the gas can be brought into contact at the ends of the electrodes, so that the plasma gas can be easily extracted.

[0039] Functions exhibited by plasma-treating a gas include sterilization, virus inactivation, deodorization, surface modification, decomposition of chemical substances, and the like. As mechanisms by which these functions are exhibited, plasma treatment generates reactive oxygen species such as singlet oxygen, hydrogen peroxide, OH radicals, peroxyl radicals, and ozone in the gas, and it is considered that these cause the target microorganisms to die or the chemical substances to be decomposed or modified through oxidation reactions and the like. Examples of microorganisms include various bacteria, viruses, and molds.

[0040] The gas treated with plasma is sterilized, deodorized, etc. by killing microorganisms present in the gas or decomposing chemical substances by the reactive oxygen species generated by the plasma. Furthermore, reactive oxygen species are present (remaining) in the gas treated with plasma. Therefore, by spraying the gas treated with plasma generated by the plasma treatment apparatus of this embodiment onto an object, microorganisms present in the object are killed or chemical substances are decomposed, and the object is sterilized, deodorized, etc.

[0041] <First Embodiment> Next, a plasma processing apparatus according to a first embodiment of the present invention will be described. As shown in FIGS. 6 and 7, the plasma processing apparatus 100 for a bath is provided in a bath facility 300. The bath facility 300 includes a bathroom 301, a bathtub 302, a floor 303, and a drain 304.

[0042] The bathroom 301 is a closed space including the bathtub 302 and the floor 303. The floor 303 slopes gently toward the drain 304. Therefore, the water flowing on the floor 303 flows down into the drain 304 and is drained from a drain pipe (not shown).

[0043] As shown in FIGS. 6 and 7, the plasma processing apparatus 100 for a bath includes a plasma generation unit 10, a gas flow unit 20, a power supply unit 30, a human sensor 45, a water conduction unit 50, and a control unit 60. The plasma generation unit 10 of the present embodiment has the same basic structure as the plasma generation unit described above, but the first modification example and the second modification example of the plasma generation unit may be used. The plasma generation unit 10 may be one or a plurality may be installed.

[0044] The gas flow unit 20 is a part that flows gas to the plasma generation unit 10 in order to process the gas with plasma and supplies the plasmaized gas to the plasma water generation unit 40. As also shown in FIG. 8, the gas flow unit 20 includes a housing 21, an inflow tube (inflow part) 22, an outflow tube (outflow part) 23, and a blower 24. The housing 21 is a box-shaped body that covers the plasma generation unit 10.

[0045] The inflow tube 22 is a flexible cylindrical body that connects the blower 24 and the housing 21. The outflow tube 23 is a flexible cylindrical body that connects the housing 21 and the plasma water generation unit 40. The tip of the outflow tube 23 is located inside the water stored in the plasma water generation unit 40. The inflow tube 22 may have other forms as long as it functions as an inflow part that can supply gas to the plasma generation unit 10. Also, the outflow tube 23 may have other forms as long as it functions as an outflow part that allows the plasma gas plasmaized in the plasma generation unit 10 to flow out.

[0046] The blower 24 is a device that supplies air to the plasma generation unit 10 and supplies the plasmaized air to the plasma water generation unit 40, and a known device can be appropriately selected and used. As the driving device for flowing the gas, known devices such as a centrifugal blower (e.g., a sirocco fan, a radial fan, a turbo fan), an axial flow blower (e.g., a propeller fan), an inclined flow blower (e.g., a line fan), a cross flow blower, a blower, and a compressor can be appropriately used. The blower 24 operates or stops based on a control signal from the control unit 60.

[0047] The power supply unit 30 applies an alternating voltage between the upper electrode 12 and the lower electrode 13 that face each other with the dielectric layer 11 interposed therebetween. The power supply unit 30 is connected to, for example, a power connector 31. The power supply unit 30 is not particularly limited as long as it can apply an alternating voltage with a predetermined voltage at a predetermined frequency to each electrode of the plasma generation unit 10, and a known power supply device can be used. As the frequency of the alternating voltage, 50 Hz to 30 MHz is preferable, and 50 Hz to 100 kHz is more preferable. Also, as the alternating voltage, 0.1 to 50 kV is preferable, and 0.2 to 10 kV is more preferable.

[0048] The plasma water generation unit 40 is a part that receives the plasma gas generated by the plasma generation unit 10, atomizes the stored water, and generates plasma water. The plasma water generation unit 40 includes a container in which water is stored. The plasma water generated by the plasma water generation unit 40 is supplied into the bathroom 301 via the water guiding unit 50, and thus, new water is replenished by the amount that has decreased to maintain a constant water level.

[0049] The human presence sensor 45 is a sensor that detects the presence or absence of a person in the bathroom 301. The detection result is transmitted to the control unit 60. The human presence sensor 45 is installed inside the bathroom 301.

[0050] The water guiding unit 50 is a part that supplies the plasma water generated by the plasma water generation unit 40 into the bathroom 301. In this embodiment, the plasma water is supplied to the floor 303. The water guiding unit 50 includes a water conduit 51, a pipe 52, and a pump 53 for the water conduit. The water conduit 51 is provided on the floor 303 and has a plurality of communication holes 51a. The water conduit 51 is preferably installed, for example, on the higher side of the inclined surface of the floor 303 in terms of height position.

[0051] The pipe 52 is a pipe that connects the plasma water generation unit 40 and the water conduit 51. The pump 53 for the water conduit is provided in a part of the water conduit 51. The pump 53 for the water conduit is the power for sending the plasma water of the plasma water generation unit 40 to the water conduit 51. The pump 53 for the water conduit operates or stops based on a control signal from the control unit 60.

[0052] The control unit 60 is a part that transmits control signals to and controls each part of the bus plasma processing apparatus 100. The control unit 60 is installed inside the housing 21. The control unit 60 includes at least an arithmetic unit (central processing unit) and a storage unit. The control unit 60 is connected to the power connector 31 via the control unit power supply 61. The control unit power supply 61 is a part that turns the control unit 60 on or off. The control unit 60 transmits a control signal to the power supply unit 30 via a high-voltage control unit (not shown) provided in the control unit 60 to apply an alternating voltage to each electrode layer (upper electrode 12 and lower electrode 13). Further, the control unit 60 transmits a control signal to the blower 24 in synchronization with the application of the alternating voltage to circulate air through the plasma generation unit 10. The timing at which the control unit 60 applies the alternating voltage can be set as appropriate. This timing will be described later. Also, the control unit 60 transmits a control signal to the water pipe pump 53 to supply plasma water to the bus facility 300.

[0053] Next, the operation and effects according to this embodiment will be described. When the user enters the bathroom 301 and exits the bathroom 301 after a predetermined time, the control unit 60 recognizes that the bus facility 300 has been used based on the detection signal from the human sensor 45 and stores it in the storage unit together with the date and time.

[0054] After the user uses the bus facility 300, the control unit 60 transmits a control signal for applying an alternating voltage to the power supply unit 30 and operates the blower 24. As a result, gas flows through the inflow tube 22, the housing 21, and the outflow tube 23, and the gas is plasmaized by the plasma generated in the plasma generation unit 10, and the plasma gas is supplied into the water in the plasma water generation unit 40. Thereby, the water in the plasma water generation unit 40 is plasmaized and plasma water is generated.

[0055] Next, the control unit 60 transmits a control signal to the aqueduct pump 53 to cause the plasma water to flow out from the communication hole 51a of the aqueduct 51 for a predetermined time (or a predetermined amount). According to the present embodiment, since the plasma water having a sterilizing effect flows in the order of the floor 303, the drain groove 304, and the drain pipe (not shown), the generation of bacteria on the floor 303 can be suppressed, and the sterilization of the drain groove 304 and the drain pipe can also be performed. Thereby, the bath facility 300 can be efficiently cleaned.

[0056] In addition, since the presence or absence of a person (whether the bath facility 300 is used or not) can be detected by the human sensor 45, by controlling the timing of generating plasma according to the use by the user, plasma water can be generated more efficiently and the electricity cost can be saved. That is, the timing of generating plasma can be set as appropriate, but by promptly supplying the plasma water to the bath facility 300 after the bath facility 300 is used, the propagation of bacteria can be promptly suppressed.

[0057] In addition, the plasma generation unit 10 is covered with the housing 21 and is attached, for example, outside the bathroom 301. Thereby, it does not interfere with the use of the bath facility 300, and the plasma generation unit 10 and water can be separated. Thereby, the failure of the device due to water can be prevented. Moreover, according to the bath plasma treatment apparatus 100 of the present embodiment, it can be easily attached not only to a newly installed bath facility 300 but also to an existing bath facility 300.

[0058] Regarding the timing of generating plasma, it may be set as appropriate. For example, the control unit 60 may be provided with a timer unit capable of managing the date and time, and the plasma may be generated according to the timer unit. Since the effect of the plasma water weakens over time after it is generated, for example, by generating the plasma at a certain time, the water in the plasma water generation unit 40 can always be plasma water with a high effect (plasma water with a high plasma density). Also, by not generating plasma during late-night hours when the usage frequency is low, or increasing the number of plasma generations during high-usage time periods, the control of plasma generation can be efficiently performed according to the usage frequency.

[0059] In this embodiment, the water conduit 51 is provided on the floor 303, but it may also be provided on the wall of the bathroom 301, or on both the floor 303 and the wall. Also, the plasma gas generated by the plasma generation unit 10 may be directly supplied into the bathroom 301. Thereby, the space of the bathroom 301 can be sterilized, and the propagation of bacteria in the bathroom 301 can be prevented. Also, the water discarded from the bathtub 302 may be used as the replenishing water for the plasma water generation unit 40. In this case, for example, it is preferable to provide a circulation pipe connecting the bathtub 302 and the plasma water generation unit 40. Thereby, the water can be recycled.

[0060] Also, a wireless interface electrically connected to the control unit 60 may be provided. The wireless interface is a part that wirelessly provides information to a mobile terminal device, a terminal device, etc. The control unit 60 transmits information regarding plasma generation to the wireless interface. Information regarding plasma generation is, for example, the number of plasma generations, the generation amount (plasma density), the amount of electricity, the electricity charge, error information, etc. Also, as information to be transmitted to the mobile terminal device, etc., for example, the number of times the bath is used may be included. Thereby, the user can grasp the plasma generation status, etc. from the outside. The wireless interface can use, for example, Bluetooth (registered trademark). The mobile terminal device can use, for example, a smartphone, a mobile phone, etc. The terminal device can use, for example, a personal computer.

[0061] <Second Embodiment> Next, as shown in FIG. 9, the bus plasma processing apparatus 100A according to the second embodiment of the present invention will be described. The bus plasma processing apparatus 100A is different from the first embodiment in that it includes a bathtub pipe 65. In this embodiment, the description will focus on the parts that are different from the first embodiment.

[0062] The bathtub pipe 65 is a pipe that connects the plasma generation unit 10 and the bathtub 302. One end of the bathtub pipe 65 is connected to the housing 21 and serves as an outflow portion of the plasma gas. The other end of the bathtub pipe 65 is located inside the water of the bathtub 302.

[0063] In this embodiment, in the same manner as in the first embodiment, plasma water is supplied into the bath facility 300. Further, since the plasma gas generated by the plasma generation unit 10 is supplied into the bathtub 302 through the bathtub pipe 65, the water in the bathtub 302 can be made into plasma water. Thereby, in addition to the floor 303, the breeding of bacteria in the bathtub 302 can be prevented, and the drain pipe (not shown) extending from the bathtub 302 can also be sterilized.

[0064] <Third Embodiment> Next, the bus plasma processing apparatus 100B according to the third embodiment of the present invention will be described. The bus plasma processing apparatus 100B is different from the first embodiment in that a plurality of spaces are provided in the housing 21B and gases with different pressures can be taken out. In this embodiment, the description will focus on the parts that are different from the first embodiment.

[0065] The gas flow portion 20B includes the housing 21B, the inflow tubes 22A, 22B, 22C, the outflow tubes 23A, 23B, 23C, and a blower (not shown) connected to each of the inflow tubes 22A, 22B, 22C. Each blower can send gas at a different wind speed (wind pressure).

[0066] The housing 21B is provided with a partition wall 21Ba that separates a space in the height direction at the center. Further, the housing 21B includes a layered dielectric layer 11Ba, a dielectric layer 11Bb, a dielectric layer 11Bc, and a dielectric layer 11Bd, and divides the interior of the housing 21B into three spaces: a first space 71, a second space 72, and a third space 73. An upper layer electrode 12 is installed on the lower surface of the dielectric layer 11Ba, and a lower layer electrode 13 is installed on the lower surface of the dielectric layer 11Bb. Also, an upper layer electrode 12 is installed on the lower surface of the dielectric layer 11Bc, and a lower layer electrode 13 is installed on the lower surface of the dielectric layer 11Bd.

[0067] Each of the upper layer electrodes 12 and the lower layer electrodes 13 is electrically connected to the power supply unit 30. By applying an alternating voltage to each of the upper layer electrodes 12 and the lower layer electrodes 13, the gas flowing through the first space 71, the second space 72, and the third space 73 can be turned into plasma.

[0068] In the first space 71, gas flows in from the inflow tube (inflow section) 22A, and the plasma gas is taken out from the outflow tube (outflow section) 23A. Also, in the second space 72, gas flows in from the inflow tube (inflow section) 22B, and the plasma gas is taken out from the outflow tube (outflow section) 23B. Also, in the third space 73, gas flows in from the inflow tube (inflow section) 22C, and the plasma gas is taken out from the outflow tube (outflow section) 23C.

[0069] Since the plasma gases taken out from each space have different pressures (atmospheric pressures), the supply destination of the plasma gas can be selected according to each atmospheric pressure. For example, when sending air into the water in the bathtub 302, a large pressure is required, so the plasma gas with the highest pressure is supplied to the bathtub 302. Also, the plasma gas with the next highest pressure is supplied to the plasma water generation unit 40. Further, the plasma gas with the lowest pressure is supplied to the space in the bathroom 301.

[0070] According to this embodiment, the gas flow section 20B can extract plasma gases at a plurality of different pressures (atmospheric pressures) for one plasma generation section. As a result, even when the gas pressure loads at the supply destinations are different, such as in the water in the bathtub 302, the water in the plasma water generation section 40, and the space in the bathroom 301, the plasma gas can be efficiently supplied. In this embodiment, three spaces are provided, but two spaces may be provided, or four or more spaces may be provided.

[0071] The gas load varies depending on the situation at the supply destination. For example, when sending gas into water, a higher pressure is required compared to sending gas into the atmosphere. In such a case, if plasma generation sections are provided for each atmospheric pressure, the cost will increase accordingly, and the installation space will also increase. Also, it is conceivable to provide a plurality of valves for each atmospheric pressure on the outflow section side to distribute the gas, but if there is a problem with the valve, the plasma generation section may have to be stopped, or events such as gas concentrating and leaking at the low-pressure part may occur, and there is a risk that the expected results cannot be obtained.

[0072] In this regard, according to this embodiment, an inflow tube (inflow section) and an outflow tube (outflow section) are provided for each space, and since the three spaces are independent of each other, for example, even if there is a problem in one space, plasma generation can continue in other spaces, so the reliability of the entire device can be improved.

[0073] In the plasma generation section as in this embodiment, a configuration may be adopted in which a pair of electrode layers are provided on the upper and lower surfaces of the dielectric layer as in the above-described basic structure, or a configuration may be adopted in which an air layer (space) exists between the pair of electrode layers via the dielectric layer as in this embodiment. Even in the latter case, plasma can be generated. Also, the pressure (atmospheric pressure) of the plasma gas sent to each space only needs to be different from that of other spaces at at least one location, and it is not necessary for all of them to be different.

[0074] <Fourth Embodiment> Next, the bus plasma processing apparatus 100C according to the fourth embodiment of the present invention will be described. The bus plasma processing apparatus 100C is different from the first embodiment in that a plurality of spaces are provided in the housing 21C and gases with different pressures can be taken out. In this embodiment, the description will focus on the parts that are different from the first embodiment.

[0075] The gas flow unit 20C includes a housing 21C, inflow tubes 22A, 22B, 22C, 22D, 22E, outflow tubes 23A, 23B, 23C, 23D, 23E, and a blower device (not shown) connected to each of the inflow tubes 22A, 22B, 22C, 22D, 22E. Each blower device can send gas at a different wind speed (wind pressure).

[0076] The housing 21C includes a layered dielectric layer 11Ca, a dielectric layer 11Cb, a dielectric layer 11Cc, and a dielectric layer 11Dd, and divides the inside of the housing 21C into five spaces: a first space 71, a second space 72, a third space 73, a fourth space 74, and a fifth space 75. An upper layer electrode 12 is installed on the upper surface of the dielectric layer 11Ca, and a lower layer electrode 13 is installed on the lower surface of the dielectric layer 11Cb. Also, an upper layer electrode 12 is installed on the lower surface of the dielectric layer 11Cc, and a lower layer electrode 13 is installed on the lower surface of the dielectric layer 11Cd.

[0077] Each upper layer electrode 12 and lower layer electrode 13 are electrically connected to the power supply unit 30. By applying an alternating voltage to each upper layer electrode 12 and lower layer electrode 13, the gas flowing through the first space 71, the second space 72, the third space 73, the fourth space 74, and the fifth space 75 can be turned into plasma.

[0078] In the first space 71, gas flows in from the inflow tube (inflow section) 22A, and the plasma gas is taken out from the outflow tube (outflow section) 23A. Also, in the second space 72, gas flows in from the inflow tube (inflow section) 22B, and the plasma gas is taken out from the outflow tube (outflow section) 23B. Further, in the third space 73, gas flows in from the inflow tube (inflow section) 22C, and the plasma gas is taken out from the outflow tube (outflow section) 23C. Additionally, in the fourth space 74, gas flows in from the inflow tube (inflow section) 22D, and the plasma gas is taken out from the outflow tube (outflow section) 23D. Moreover, in the fifth space 75, gas flows in from the inflow tube (inflow section) 22E, and the plasma gas is taken out from the outflow tube (outflow section) 23E.

[0079] Since the spaces 71, 72, 73, 74, and 75 are partitioned into individual spaces, the pressure within each space can be changed. Therefore, the pressure within the space can be changed according to the load connected to the outflow tubes (outflow sections) 23A, 23B, 23C, 23D, and 23E of the space. That is, different load supply destinations can be selected. For example, when sending air into the water of the bathtub 302, a large pressure is required, so the plasma gas with the highest pressure is supplied to the bathtub 302. Also, the plasma gas with the second highest pressure is supplied to the plasma water generation unit 40. Further, the plasma gas with the third highest pressure is supplied to the space in the bathroom 301. For the remaining two systems, for example, they may be supplied to a dressing room adjacent to the bathroom 301 or other spaces. In this way, the plasma generation space can be appropriately formed according to the usage purpose (the load of the gas at the supply destination), and plasma gases with different atmospheric pressures can be supplied. In the conventional method, it was necessary to prepare the number of plasma generators according to the load, or to use valves and branch paths for adjusting the pressure, and finely adjust the pressure and supply it to each load. However, in this embodiment, with a single plasma generator, plasma can be simultaneously supplied to a plurality of different loads. In the method using a branch path or a pressure regulating valve, if there is a problem with the operation of the valve due to dust or the like, or if the desired performance cannot be obtained due to rust or aging deterioration, the distributed pressure cannot be obtained as designed, and the overall pressure distribution is different from that at the design time, affecting the overall performance. When such a situation occurs, it affects the performance of the entire device. However, if the spaces are made independent in this way, the influence can be limited to only the problematic channel, thus improving the reliability of the device.

[0080] Although the embodiments of the present invention have been described above, design changes can be appropriately made without departing from the spirit of the present invention. For example, an input section (such as a touch panel) and a display section (a monitor) may be provided in the control unit 60. For example, plasma may be generated based on an instruction input from the input section. Also, information regarding plasma generation, the amount of electricity, the amount of water supply, etc. may be displayed on the display section.

Explanation of Reference Numerals

[0081] 10 Plasma generation unit 11 Dielectric layer 12 Upper electrode (electrode layer) 13 Lower electrode (electrode layer) 14 Upper mask layer (mask layer) 15 Lower mask layer (mask layer) 20 Gas flow part 21 Housing 22 Inflow tube (inflow part) 23 Outflow tube (outflow part) 30 Power supply unit 40 Plasma water generation unit 45 Human presence sensor 50 Water conduction part 51 Water conduction pipe 52 Pipe 53 Water conduction pipe pump 60 Control unit 100 Plasma processing device for buses 300 Bus facility 301 Bathroom 302 Bathtub 303 Floor

Claims

1. A plasma generation unit that generates plasma, comprising at least a dielectric layer and a pair of electrode layers provided on both sides of the dielectric layer; A power supply unit that applies an alternating voltage to the pair of electrode layers; A gas flow unit that flows gas through the plasma generation unit to process the gas with plasma; A plasma water generation unit that receives the gas converted into plasma by the gas flow unit and generates plasma-treated water; A plasma treatment apparatus for a bath, comprising a water conduit that supplies the plasma-treated water from the plasma water generation unit to bath facilities.

2. The water conduit includes: A water conduit provided on at least one of the floor and wall of the bath facilities and having a plurality of communication holes; A pipe that connects the water conduit and the plasma water generation unit; A water conduit pump that sends the plasma-treated water from the plasma water generation unit to the water conduit through the pipe. The plasma treatment apparatus for a bath according to claim 1, characterized by comprising the above.

3. A human presence sensor provided in the bath facilities for detecting the presence or absence of a person; A control unit that receives the detection result of the human presence sensor, transmits a signal to apply an alternating voltage to the power supply unit based on the detection result, and transmits a signal to the water conduit pump. The plasma treatment apparatus for a bath according to claim 2, characterized by comprising the above.

4. A control unit that transmits a signal to apply an alternating voltage to the power supply unit based on a timer unit that measures time, and transmits a signal to the water conduit pump. The plasma treatment apparatus for a bath according to claim 2, characterized by comprising the above.

5. The gas flow unit flows gas through the plasma generation unit to process the gas with plasma, and supplies the gas converted into plasma to at least one of the bathtub in the bath facilities and the bathroom in the bath facilities. The plasma treatment apparatus for a bath according to claim 1 or claim 2, characterized by comprising the above.

6. It has a housing that covers the plasma generation unit and is partitioned into a plurality of spaces by the dielectric layer, The housing is provided with an inflow part through which gas flows into each of the spaces and an outflow part through which gas flows out for each of the spaces, and is configured such that gases with different pressures flow through each of the spaces. The plasma treatment apparatus for a bath according to claim 1 or claim 2, characterized by comprising the above.

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