Pixel-defining layer

Abstract

To not only ensure vivid colors but also increase the display reliability and lifespan by implementing a colored pattern with a low amount of outgas on an electrode substrate by using a fluorine-free leveling agent rather than existing fluorine-based additives.SOLUTION: In other words, if the amount of outgas in a panel after post-heat treatment is 40 ppm or more, then it causes a decrease in the luminance and a decrease in the lifespan due to pixel shrinkage and, if the contact angle with water is 100 degrees (°) or more, then the surface energy is lowered and peeling of the deposit occurs.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a pixel definition layer of a light-emitting display device using a photosensitive composition.

Background Art

[0002] Flat panel display devices such as liquid crystal display devices (LCDs) and organic light-emitting display devices (OLEDs) are widely used. Among these, organic light-emitting display devices have advantages such as low power consumption, fast response speed, high color reproducibility, high brightness, and wide viewing angle.

[0003] In the case of the organic light-emitting display device, a polarizing film is used to block the light reflected from the panel when external light is incident. However, when applying the polarizing film to a flexible device, there is a disadvantage that it is not suitable due to insufficient bending characteristics.

[0004] As a method for solving the above problems, a method of forming an inorganic film for blocking light on the upper substrate in addition to a color filter and a black matrix has been proposed. However, the method has limitations in obtaining a desired level of antireflection effect and does not specifically present a method for replacing the polarizing film.

[0005] On the other hand, the coloring pattern is a red, green, or blue color filter and is used not only in liquid crystal displays but also in organic light-emitting displays.

[0006] When manufacturing the coloring pattern, not only various types of organic pigments and the like but also carbon black and inorganic pigments are used as coloring agents, and a pigment dispersion liquid in which these are dispersed is mixed with other compositions to form a pattern.

[0007] An organic light-emitting display made of pixels formed in this way can achieve brighter colors. A pattern using the coloring composition uses a small amount of leveling agent to ensure good coating over a large area, and the main component is fluorine-based, which has the best characteristics. However, at present, its use is restricted by the fluorine compound regulation (PFAS), and the use of alternative additives that are not fluorine-based is unavoidable. The alternative additives may have inferior characteristics compared to fluorine-based additives, which may result in a high filter differential pressure in the process, a high contact angle in the pattern, high flatness of the coating film, and a high amount of outgassing. If there is a lot of outgassing, problems such as pixel shrinkage, dark spots, and electrode oxidation may occur, which may reduce the life and brightness of the organic light-emitting display. Summary of the Invention [Problem to be solved by the invention]

[0008] In an attempt to solve the problems of the prior art, one embodiment of the present invention is to realize a colored pattern on an electrode substrate that has a low contact angle, coating flatness, and outgassing amount at the same content as a conventional fluorine-based leveling agent by using a fluorine-free leveling agent, thereby improving not only the color but also the reliability and lifespan of the display.

[0009] That is, the objective is to develop a photosensitive resin composition in which the contact angle in the panel after post-heat treatment satisfies 60° to 100°, the pattern thickness is controlled to 3.5μm or less in the substrate, and the outgas amount is 40ppm or less. If the outgas amount is 40ppm or more, it may cause a decrease in brightness and a decrease in lifespan due to pixel shrinkage, so in order to minimize the amount of outgas after the post-heat treatment process, the objective is to generate sufficient fumes in the post-heat treatment stage to minimize the generation of outgas in the panel state.

[0010] Another exemplary embodiment is for providing an organic light-emitting display device including a pixel definition layer manufactured by the above method.

[0011] Another exemplary embodiment is for providing an electronic device including the organic light-emitting display device. Means for Solving the Problems of the Invention

[0012] The pixel definition layer according to the present invention includes a photosensitive composition including a leveling agent not containing fluorine, and the pixel definition layer preferably includes a half-tone layer.

[0013] The leveling agent preferably includes a silicon-based compound.

[0014] The molecular weight of the silicon-based compound is preferably from 5,000 g / mol to 15,000 g / mol, and more preferably from 5,000 g / mol to 10,000 g / mol.

[0015] The viscosity of the silicon-based compound is 100,000 mm 2 / s to 500,000 mm 2 / s.

[0016] The viscosity of the silicon-based compound is 10 mm 2 / s to 40 mm 2 / s when measured at 20 °C for a mixture of 50 wt% of the silicon-based compound and 50 wt% of propylene glycol methyl ether acetate, more preferably 10 mm 2 / s to 30 mm 2 / s, and even more preferably 10 mm

[0017] The silicon-based compound is a C1-C 40 alkyl group; a C1-C 40 alkenyl group; a C1-C 40 alkynyl group; a C1-C 40 alkoxy group; a C6-C 40 aryloxy group; a C1-C 40Preferably, it contains a substituent selected from the group consisting of an alkoxycarbonyl group; a carbonyl group; an ether group; an ester group; a carboxyl group or a combination thereof.

[0018] Preferably, the photosensitive composition contains a leveling agent that does not contain fluorine in an amount of 0.01 to 0.5% by weight based on the total amount thereof.

[0019] Preferably, the photosensitive composition contains a resin containing an acrylic binder resin; a cardo binder resin or a combination thereof.

[0020] Preferably, the weight average molecular weight of the acrylic binder resin is from 3,000 g / mol to 150,000 g / mol.

[0021] Preferably, the cardo binder resin contains a repeating structure of the following Chemical Formula 1.

[0022]

Chemical formula

[0023] In the Chemical Formula 1,

[0024] 1) R 1 and R 2 are each independently hydrogen; deuterium; halogen; an aryl group having 6 to C 30 ; a heterocyclic group having 2 to C 30 containing at least one heteroatom of O, N, S, Si and P; a fused ring group of an aliphatic ring and an aromatic ring having 6 to C 30 ; an alkyl group having 1 to C 20 ; an alkenyl group having 2 to C 20 ; an alkynyl group having 2 to C 20 ; an alkoxy group having 1 to C 20 ; an aryloxy group having 6 to C 30 ; a fluorenyl group; a carbonyl group; an ether group; or an alkoxycarbonyl group having 1 to C 20 and,

[0025] 2) R1 and R2 can form a ring with adjacent groups,

[0026] 3) m or n is independently an integer from 0 to 4,

[0027] 4) A1 and A2 are independently of each other the following Chemical Formula 2 or Chemical Formula 3,

[0028]

Chemical Formula

[0029]

Chemical Formula

[0030] In the above Chemical Formula 2 and Chemical Formula 3,

[0031] 4-1) * indicates the connecting site,

[0032] 4-2) R3 to R6 are independently of each other hydrogen; deuterium; halogen; C6 - C 30 aryl group; C2 - C containing at least one heteroatom of O, N, S, Si and P 30 heterocyclic group; C6 - C 30 fused ring group of an aliphatic ring and an aromatic ring; C1 - C 20 alkyl group; C2 - C 20 alkenyl group; C2 - C 20 alkynyl group; C1 - C 20 alkoxy group; C6 - C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1 - C 20 alkoxycarbonyl group,

[0033] 4-3) R3 to R6 can form a ring with adjacent groups,

[0034] 4-4) Y1 and Y2 are independently of each other the following Chemical Formula 6 or Chemical Formula 7,

[0035]

Chem.

[0036]

Chem.

[0037] In the above Chemical Formula 6 and Chemical Formula 7,

[0038] 4-4-1)* indicates the bonding position,

[0039] 4-4-2) R9 is hydrogen or methyl,

[0040] 4-4-3) R 10 or R 13 are independently of each other hydrogen; deuterium; halogen; C6-C 30 aryl group; C2-C containing at least one heteroatom of O, N, S, Si and P 30 heterocyclic group; C6-C 30 fused ring group of aliphatic ring and aromatic ring; C1-C 20 alkyl group; C2-C 20 alkenyl group; C2-C 20 alkynyl group; C1-C 20 alkoxy group; C6-C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1-C 20 alkoxycarbonyl group,

[0041] 4-4-4) L1 to L3 are independently of each other a single bond; fluorenylene group; C2-C 30 alkylene; C6-C 30 arylene; C2-C 30 heterocycle; C1-C 30 alkoxyalkylene; C2-C 30 alkyleneoxy; C6-C 30 aryloxy group; C2-C 30is a polyethyleneoxy group,

[0042] 4-4-5) q and r are each independently an integer of 0 to 3; provided that q + r = 3,

[0043] 5) The ratio of A1 to A2 in the polymer chain of the resin containing the repeating unit represented by Chemical Formula 1 is 9:1 to 1:9,

[0044] 6) X1 is a single bond; O; CO; SO2; CR’R”; SiR’R”; the following Chemical Formula 4; or Chemical Formula 5,

[0045] 6-1) R’ and R” are each independently hydrogen; deuterium; halogen; an aryl group of C6~C 30 a heterocyclic group containing at least one heteroatom of O, N, S, Si and P and having C2~C 30 a fused ring group of an aliphatic ring and an aromatic ring having C6~C 30 an alkyl group of C1~C 20 an alkenyl group of C2~C 20 an alkynyl group of C2~C 20 an alkoxy group of C1~C 20 an aryloxy group of C6~C 30 a fluorenyl group; a carbonyl group; an ether group; or an alkoxycarbonyl group of C1~C 20 and are,

[0046] 6-2) R’ and R” can form a ring with adjacent groups,

[0047]

Chemical formula

[0048]

Chemical formula

[0049] In the above Chemical Formula 4 and Chemical Formula 5,

[0050] (6-3)* indicates the bonding position,

[0051] (6-4) R7 and R8 are each independently hydrogen; deuterium; halogen; C6-C 30 aryl group; C2-C containing at least one heteroatom of O, N, S, Si and P 30 heterocyclic group; C6-C 30 fused ring group of aliphatic ring and aromatic ring; C1-C 20 alkyl group; C2-C 20 alkenyl group; C2-C 20 alkynyl group; C1-C 20 alkoxy group; C6-C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1-C 20 alkoxycarbonyl group,

[0052] (6-5) o and p are each independently an integer from 0 to 4,

[0053] (7) X2 is a C6-C 30 aryl group; C2-C containing at least one heteroatom of O, N, S, Si and P 30 heterocyclic group; C6-C 30 fused ring group of aliphatic ring and aromatic ring; C1-C 20 alkyl group; C2-C 20 alkenyl group; C2-C 20 alkynyl group; C1-C 20 alkoxy group; C6-C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1-C 20 alkoxycarbonyl group,

[0054] (8) The said R’, R”, X2, L1 to L3, R1 to R8 and R 10 to R 13 are each deuterium; halogen; a silane group substituted or unsubstituted with a C1-C 30 alkyl group or a C6-C 30 aryl group; siloxane group; boron group; germanium group; cyano group; amino group; nitro group; C1-C30 an alkylthio group; C1-C 30 an alkoxy group; C6-C 30 an arylalkoxy group; C1-C 30 an alkyl group; C2-C 30 an alkenyl group; C2-C 30 an alkynyl group; C6-C 30 an aryl group; C6-C substituted with deuterium 30 an aryl group; a fluorenyl group; C2-C containing at least one heteroatom selected from the group consisting of O, N, S, Si and P 30 a heterocyclic group; C3-C 30 an aliphatic ring group; C7-C 30 an arylalkyl group; C8-C 30 an arylalkenyl group; and can be further substituted with one or more substituents selected from the group consisting of combinations thereof, and adjacent substituents can form a ring with each other.

[0055] The weight average molecular weight of the cardo resin is preferably 1,000 to 100,000 g / mol.

[0056] The cardo resin is preferably contained in an amount of 1 to 30% by weight based on the total amount of the photosensitive composition.

[0057] The photosensitive composition preferably contains a colorant.

[0058] The colorant preferably contains one or more of inorganic dyes, organic dyes, inorganic pigments and organic pigments.

[0059] The colorant is preferably contained in an amount of 1 to 40% by weight based on the total amount of the photosensitive composition.

[0060] The colorant is preferably pretreated using a dispersant; or a water-soluble inorganic salt and a wetting agent.

[0061] The average particle size of the colorant is preferably 20 nm to 110 nm.

[0062] The photosensitive composition preferably contains a reactive unsaturated compound.

[0063] The photosensitive composition preferably contains 1 to 40% by weight of the reactive unsaturated compound based on the total amount of the photosensitive composition.

[0064] The photosensitive composition preferably contains a photoinitiator.

[0065] The photosensitive composition preferably contains 0.01 to 10% by weight of a photoinitiator based on the total weight of the photosensitive composition.

[0066] The pixel defining layer preferably has a contact angle of 60° to 100° with the interface when 2 to 10 microliters (μl) of water is brought into contact with the surface at a temperature condition of 25±3° C.

[0067] More preferably, the contact angle with the interface is between 65° and 95°.

[0068] Preferably, said pixel defining layer is residue free.

[0069] The pixel defining layer is preferably prepared by subjecting a photosensitive composition including a fluorine-free leveling agent to a post-heat treatment.

[0070] The post heat treatment step is preferably carried out at a temperature of 210°C to 300°C.

[0071] More preferably, the temperature of the post heat treatment step is 250°C to 270°C.

[0072] The post-heat treatment step is preferably carried out for 30 to 120 minutes.

[0073] More preferably, the post-treatment step lasts from 60 minutes to 120 minutes.

[0074] It is preferable that the amount of outgas generated after the post-heat treatment step is 40 ppm or less.

[0075] The pixel defining layer is preferably manufactured by further including steps of applying and coating a photosensitive composition; pre-baking; exposing; developing; post-exposing.

[0076] The pixel defining layer preferably divides the photomask transmittance into three intervals of 0% (non-exposed part), 20 - 50% (Half-tone), and 100% (Full-tone), and forms a half-tone layer and a full-tone layer in a single exposure and development process.

[0077] It is preferable that the temperature of the pre-baking step is 80°C to 150°C.

[0078] It is preferable that the pre-baking step is performed for 50 seconds to 200 seconds.

[0079] It is preferable to irradiate actinic rays of 20 mJ / cm 2 to 350 mJ / cm 2 in the exposure step.

[0080] It is more preferable to irradiate actinic rays of 20 mJ / cm 2 to 150 mJ / cm 2 in the exposure step.

[0081] After the development step, it is preferable that the thickness of the half-tone is 1.30 to 1.95 μm.

[0082] After the development step, it is preferable that the thickness of the full-tone is 3.20 to 3.40 μm.

[0083] It is preferable to irradiate actinic rays of 50 to 1,000 mJ / cm 2 in the post-exposure step.

[0084] After the post-heat treatment step, the half-tone preferably has a thickness of 1.00 to 1.90 μm.

[0085] After the post-heat treatment step, the full-tone has a thickness of preferably 2.80 to 3.20 μm.

[0086] In still another embodiment, the present invention preferably provides an organic light emitting display device including the pixel defining layer.

[0087] In still another embodiment, the present invention preferably provides an electronic device including the display device and a control unit that drives the display device. Effect of the Invention

[0088] The present invention uses a fluorine-free leveling agent to realize a colored pattern on an electrode substrate with a low amount of outgassing equivalent to that of existing fluorine-based additives, and satisfies the same level of contact angle and flatness to not only provide clear colors but also improve the reliability and lifespan of the display. That is, if the contact angle after post-heat treatment is 100° or more, the surface energy decreases and the adhesive strength of the substrate and interface decreases, which may cause film peeling during the deposition process of the pattern and organic light-emitting material, and if the amount of outgassing in the panel is 40ppm or more, it may cause a decrease in brightness and a decrease in lifespan due to pixel shrinkage, so the present invention includes a suitable additive to minimize the contact angle and amount of outgassing after the post-heat treatment process. [Brief description of the drawings]

[0089]

Figure 1

Figure 2

Figure 3

Best Mode for Carrying Out the Invention

[0090] Hereinafter, some embodiments of the present invention will be described in detail with reference to exemplary drawings. When adding reference numerals to the components of each drawing, the same components shall have the same numerals as much as possible even if they are shown on other drawings.

[0091] In the description of the present invention, if it is determined that a specific description of a related known configuration or function may obscure the gist of the present invention, the detailed description thereof may be omitted. When terms such as "including", "having", and "comprising" mentioned in this specification are used, other parts may be added as long as "only" is not used. When a component is expressed in the singular, it includes a plurality unless there is a special explicit description.

[0092] Also, in the description of the components of the present invention, terms such as first, second, A, B, (a), (b), etc. can be used. Such terms are for distinguishing the component from other components, and the essence, order, sequence, or number of the component is not limited by such terms.

[0093] In the description of the positional relationship of components, when it is described that two or more components are "connected", "coupled", or "joined", it should be understood that two or more components may be directly "connected", "coupled", or "joined", but two or more components and other components may also be "interposed" and then "connected" or "joined". Here, the other components may be included in one or more of the two or more components that are "connected", "coupled", or "joined" to each other.

[0094] Also, when it is stated that a component such as a layer, film, region, plate, etc. is "on" or "above" another component, this should be understood to include not only the case where it is directly above the other component, but also the case where there is another component in between. Conversely, when it is stated that a certain component is "directly above" another part, it should be understood to mean that there is no other part in between.

[0095] In the description of the temporal flow relationship related to components, operation methods, manufacturing methods, etc., for example, when the temporal before-and-after relationship or flow before-and-after relationship is described such as "after ~", "subsequent to ~", "next to ~", "before ~", etc., it includes cases where it is not continuous unless "immediately" or "directly" is used.

[0096] On the other hand, when a numerical value or its corresponding information for a component is mentioned, even without a separate explicit description, the numerical value or its corresponding information can be interpreted as including the error range that can occur due to various factors (e.g., process factors, internal or external impacts, noise, etc.).

[0097] The terms used in this specification and the appended claims are as follows, unless otherwise stated, within the scope not departing from the spirit of the present invention.

[0098] The term "halo" or "halogen" used in this application includes fluorine (F), chlorine (Cl), bromine (Br), and iodine (I) unless otherwise explained.

[0099] The term "alkyl" or "alkyl group" used in this application means a radical of a saturated aliphatic functional group having 1 to 60 carbons connected by a single bond, including a straight-chain alkyl group, a branched-chain alkyl group, a cycloalkyl (alicyclic) group, an alkyl-substituted cycloalkyl group, a cycloalkyl-substituted alkyl group, etc., unless otherwise explained.

[0100] The term "haloalkyl group" or "halogenalkyl group" used in this application means an alkyl group substituted with a halogen unless otherwise explained.

[0101] As used in this application, the terms "alkenyl" or "alkynyl" each have a double bond or a triple bond, include linear or branched chain groups, and have 2 to 60 carbon atoms, but are not limited thereto, unless otherwise specified.

[0102] As used in this application, the term "cycloalkyl" means alkyl forming a ring having 3 to 60 carbon atoms, but is not limited thereto, unless otherwise specified.

[0103] As used in this application, the terms "alkoxy group" or "alkyloxy group" mean an alkyl group to which an oxygen radical is bonded, and have 1 to 60 carbon atoms, but are not limited thereto, unless otherwise specified.

[0104] As used in this application, the terms "alkeneoxyl group", "alkeneoxy group", "alkenyloxyl group", or "alkenyloxy group" mean an alkenyl group to which an oxygen radical is attached, and have 2 to 60 carbon atoms, but are not limited thereto, unless otherwise specified.

[0105] As used in this application, the terms "aryl group" and "arylene group" each have 6 to 60 carbon atoms, but are not limited thereto, unless otherwise specified. In this application, the aryl group or arylene group includes a single cyclic, ring aggregate, a plurality of joined ring systems, etc. For example, the aryl group includes a phenyl group, a monovalent functional group of biphenyl, a monovalent functional group of naphthalene, a fluorenyl group, a substituted fluorenyl group, and the arylene group includes a fluorenylene group, a substituted fluorenylene group.

[0106] As used herein, the term "ring assemblies" means that two or more ring systems (single rings or fused ring systems) are directly linked to each other by single or double bonds, and the number of such direct linkages between rings is one less than the total number of ring systems contained in the compound. Ring assemblies can have the same or different ring systems directly linked to each other by single or double bonds.

[0107] Since the aryl group in this application includes ring assemblies, the aryl group includes biphenyl and terphenyl in which a benzene ring, which is a single aromatic ring, is linked by a single bond. Also, since the aryl group includes compounds in which an aromatic ring system joined to an aromatic single ring is linked by a single bond, for example, it also includes compounds in which fluorene, which is an aromatic ring system joined to a benzene ring, which is an aromatic single ring, is linked by a single bond.

[0108] As used herein, the term "fused multiple ring systems" means a fused ring form that shares at least two atoms, and includes forms in which two or more hydrocarbon ring systems are fused and forms in which at least one hetero ring system containing at least one hetero atom is fused. Such fused multiple ring systems may be aromatic rings, heteroaromatic rings, aliphatic rings, or combinations of these rings. For example, in the case of an aryl group, it may be a naphthalenyl group, a phenanthrenyl group, a fluorenyl group, etc., but is not limited thereto.

[0109] As used herein, the term "spiro compound" has a "spiro union", and the spiro union means a linkage formed by two rings sharing only one atom. At this time, the atom shared by the two rings is called a "spiro atom", and depending on the number of spiro atoms in a single compound, these are referred to as "monospiro-", "dispiro-", and "trispiro-" compounds, respectively.

[0110] As used in this application, the terms "fluorenyl group", "fluorenylene group", and "fluorenetriyl group" mean monovalent, divalent, or trivalent functional groups in which R, R', R", and R'" are all hydrogen in the following structures, respectively, unless otherwise specified. "Substituted fluorenyl group", "substituted fluorenylene group", or "substituted fluorenetriyl group" means that at least one of the substituents R, R', R", and R'" is a substituent other than hydrogen, including the case where R and R' are bonded to each other to form a spiro compound together with the carbon to which they are bonded. In this specification, regardless of the valence such as monovalent, divalent, or trivalent, the fluorenyl group, fluorenylene group, and fluorenetriyl group can all be named fluorenyl group.

[0111]

Chemical formula

[0112] Also, R, R', R", and R'" are each independently an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or a heterocyclic group having 2 to 30 carbon atoms. For example, the aryl group is phenyl, biphenyl, naphthalene, anthracene, or phenanthrene, and the heterocyclic group can be pyrrole, furan, thiophene, pyrazole, imidazole, triazole, pyridine, pyrimidine, pyridazine, pyrazine, triazine, indole, benzofuran, quinazoline, or quinoxaline. For example, the substituted fluorenyl group and fluorenylene group can be monovalent or divalent functional groups of 9,9-dimethylfluorene, 9,9-diphenylfluorene, and 9,9'-spirobi[9H-fluorene], respectively.

[0113] As used herein, the term "heterocyclic group" includes not only aromatic rings such as "heteroaryl group" or "heteroarylene group", but also non-aromatic rings, and means a ring having 2 to 60 carbon atoms containing one or more heteroatoms each, unless otherwise specified, but is not limited thereto. As used herein, the term "heteroatom" means N, O, S, P or Si unless otherwise specified, and the heterocyclic group means a single cyclic ring, a ring assembly, a plurality of joined ring systems, a spiro compound, etc. containing a heteroatom.

[0114] For example, the "heterocyclic group" may also include compounds containing heteroatomic groups such as SO2, P=O, etc. as shown in the following compounds instead of carbon atoms forming the ring.

[0115]

Chemical formula

[0116] As used herein, the term "ring" includes single rings and polycycles, including hydrocarbon rings as well as heterocyclic rings containing at least one heteroatom, and including aromatic and non-aromatic rings.

[0117] As used herein, the term "polycycle" includes ring assemblies such as biphenyl, terphenyl, etc., a plurality of fused ring systems and spiro compounds, including both aromatic and non-aromatic ones, including hydrocarbon rings as well as heterocyclic rings containing at least one heteroatom.

[0118] As used herein, the term "aliphatic cyclic group" means a cyclic hydrocarbon excluding aromatic hydrocarbons, including single cyclic rings, ring assemblies, a plurality of joined ring systems, spiro compounds, etc., and means a ring having 3 to 60 carbon atoms unless otherwise specified, but is not limited thereto. For example, it also applies to an aliphatic ring when benzene, an aromatic ring, and cyclohexane, a non-aromatic ring, are fused.

[0119] Also, when prefixes are named consecutively, it means that the substituents are listed in the order described. For example, in the case of an arylalkoxy group, it means an alkoxy group substituted with an aryl group; in the case of an alkoxycarbonyl group, it means a carbonyl group substituted with an alkoxy group; and in the case of an arylcarbonylalkenyl group, it means an alkenyl group substituted with an arylcarbonyl group, where the arylcarbonyl group is a carbonyl group substituted with an aryl group.

[0120] Also, unless otherwise explicitly stated, in the term "substituted or unsubstituted" used in this application, "substituted" means deuterium, halogen, amino group, nitrile group, nitro group, C1-C 30 alkyl group, C1-C 30 alkoxy group, C1-C 30 alkylamine group, C1-C 30 alkylthiophene group, C6-C 30 arylthiophene group, C2-C 30 alkenyl group, C2-C 30 alkynyl group, C3-C 30 cycloalkyl group, C6-C 30 aryl group, C6-C substituted with deuterium 30 aryl group, C8-C 30 arylalkenyl group, silane group, boron group, germanium group, and one or more substituents selected from the group consisting of C2-C heterocyclic groups containing at least one heteroatom selected from the group consisting of O, N, S, Si, and P. 30 It means being substituted with one or more substituents selected from the group consisting of, and is not limited to these substituents.

[0121] In this application, for the aryl group, arylene group, heterocyclic group, etc. exemplified as examples of each symbol and its substituent, the "functional group name" corresponding thereto may be described as the "name of the functional group reflecting the valence", but may also be described as the "name of the parent compound". For example, in the case of "phenanthrene", which is a kind of aryl group, the monovalent "group" can be described as "phenanthryl (group)", the divalent group can be described as "phenanthrylene (group)", etc., by classifying the valence, but it can also be described as "phenanthrene", which is the name of the parent compound regardless of the valence.

[0122] Similarly, in the case of pyrimidine, it can be described as "pyrimidine" regardless of the valence, or in the case of monovalence, it can be described as "pyrimidinyl (group)", and in the case of divalence, it can be described as "pyrimidinylene (group)", etc., as the "name of the group" of the corresponding valence. Therefore, when the type of substituent is described by the name of the parent compound in this application, it may mean an n-valent "group" formed by the elimination of the hydrogen atom bonded to the carbon atom and / or heteroatom of the parent compound.

[0123] Also, in this specification, when describing the compound name and substituent name, the numbers, alphabets, etc. indicating the position may sometimes be omitted. For example, pyrido[4,3-d]pyrimidine can be described as pyridopyrimidine, benzofuro[2,3-d]pyrimidine can be described as benzofuropyrimidine, 9,9-dimethyl-9H-fluorene can be described as dimethylfluorene, etc. Therefore, both benzo[g]quinoxaline and benzo[f]quinoxaline can be described as benzoquinoxaline.

[0124] Also, unless otherwise explicitly stated, the chemical formulas used in this application are applied in the same way as the substituent definition by the exponent definition of the following chemical formulas.

[0125]

Chemical formula

[0126] Here, when a is an integer of 0, the substituent R 1means non-existence, that is, when a is 0, it means that all hydrogens are bonded to the carbons forming the benzene ring. At this time, the display of the hydrogens bonded to the carbons can be omitted, and the chemical formula or compound may be described. Also, when a is an integer of 1, one substituent R 1 is bonded to any one of the carbons forming the benzene ring. When a is an integer of 2 or 3, for example, it can be bonded as follows. When a is an integer of 4 to 6, it is also bonded to the carbons of the benzene ring in a similar manner. When a is an integer of 2 or more, R 1 may be the same as or different from each other.

[0127]

Chemical formula

[0128] In this application, unless otherwise stated, forming a ring means that adjacent groups are bonded to each other to form a single ring or a plurality of joined rings. The single ring and the plurality of joined rings formed include hydrocarbon rings as well as heterocyclic rings containing at least one heteroatom, and include aromatic and non-aromatic rings.

[0129] Also, unless otherwise stated in this specification, when indicating a condensed ring, in "number-condensed ring", the number indicates the number of rings to be condensed. For example, a form in which three rings are condensed with each other, such as anthracene, phenanthrene, benzobenzoxazole, etc., can be expressed as 3-condensed ring.

[0130] On the other hand, unless otherwise stated, the term "bridged bicyclic compound" used in this application refers to a compound in which two rings share three or more atoms to form a ring. At this time, the shared atoms include carbon or heteroatoms.

[0131] In this application, the organic electronic element may mean a component(s) between the positive electrode and the negative electrode, or may mean an organic light-emitting diode including the positive electrode, the negative electrode, and the component(s) located therebetween.

[0132] Also, in some cases, the display device in the present application may mean an organic electronic element, an organic light-emitting diode, a panel and a display device including the same, or an electronic device including the panel, the display device, and a circuit. Here, for example, the electronic device may include all of a lighting device, a solar cell, a portable or mobile terminal (e.g., smartphone, tablet, PDA, electronic dictionary, PMP, etc.), a navigation terminal, a game machine, various TVs, various computer monitors, etc., and without being limited thereto, any form of device may be used as long as it includes the above-mentioned component(s).

[0133] In another exemplary embodiment, the pixel definition layer manufactured using the aforementioned photosensitive composition can be patterned in the pixel separation part of the organic light-emitting display device.

[0134] Hereinafter, referring to FIG. 1, the organic light-emitting display device will be described. The organic light-emitting display device according to an exemplary embodiment of the present invention may include a substrate 1, a TFT layer 2 on the substrate, a planarization layer 3 on the TFT layer, a pixel electrode 4 on the planarization layer, an organic light-emitting layer 5 on the pixel electrode, a counter electrode 7 disposed on the organic light-emitting layer, a sealing layer 8 disposed on the counter electrode, a touch panel 9 disposed on the sealing layer, a color filter 10 disposed on the touch panel, an OCA layer 11 disposed on the color filter, and a cover glass layer 12 disposed on the OCA layer.

[0135] The pixel definition layer 6 according to the present invention is preferably formed on the pixel electrode 4.

[0136] The pixel definition layer 6 is preferably formed to include a Full-tone layer 6a and a Half-tone layer 6b provided on the Full-tone layer 6a.

[0137] It is preferable that the pixel definition layer 6 is formed by dividing the photomask transmittance into three sections, namely, 0% (non-exposed area), 20% to 50% (half-tone), and 100% (full-tone), on a photomask on which a pattern is formed, and forming a full-tone layer 6a and a half-tone layer 6b in a single exposure and development process.

[0138] The pixel defining layer 6 uses a fluorine-free leveling agent to realize a colored pattern on the electrode substrate with a low contact angle, coating film flatness, and outgassing amount at the same content as a conventional fluorine-based material, thereby not only providing vivid colors but also increasing the reliability and lifespan of the OLED display device.

[0139] Hereinafter, the implementation of the present invention will be described in detail, but it should be understood that the present invention is not limited to the above embodiment, and is defined only by the scope of the claims that follow.

[0140] The photosensitive composition according to an embodiment of the present invention is used to manufacture a pixel defining layer, a red pattern, a green pattern, a blue pattern, a black matrix, or the like.

[0141] The pixel defining layer according to an embodiment of the present invention may further include an organic black pigment or a black dye as an additional colorant other than the colorant contained in the colorant. For example, an organic pigment may be used alone or an organic pigment may be mixed with a color pigment, and in this case, since a color pigment with insufficient light blocking properties is mixed, there is an advantage that the strength of the film (layer) or adhesion to the substrate is not reduced even if the amount of the colorant increases relatively. The negative pixel defining layer (Negative PDL) according to an embodiment of the present invention may include a black pigment or a black dye as an additional colorant instead of the colorant contained in the colorant.

[0142] Each component will be specifically described below.

[0143] I. Compositions Constituting the Pixel Defining Layer

[0144] (1) Levelling agent

[0145] The photosensitive composition of the present invention contains a levelling agent in order to prevent stains and spots during coating, improve the smoothness and fluidity of the coating film, improve the levelling performance for preventing color unevenness and defects, and also prevent the generation of residues due to undevelopment.

[0146] The levelling agent of the present invention preferably does not contain fluorine.

[0147] The levelling agent is preferably a silicone-based levelling agent.

[0148] The molecular weight of the silicone-based compound is preferably 5,000 g / mol to 15,000 g / mol, and more desirably particularly 5,000 g / mol to 10,000 g / mol.

[0149] The viscosity of the silicone-based compound is 100,000 mm 2 / s to 500,000 mm 2 / s.

[0150] The viscosity of the silicone-based compound is 10 mm 2 / s to 40 mm 2 / s when measured for a mixture of 50 wt% of the silicone-based compound and 50 wt% of propylene glycol methyl ether acetate under the condition of 20 °C, more desirably 10 mm 2 / s to 30 mm 2 / s.

[0151] The silicone-based levelling agent has an alkyl group of C1 to C 40 ; an alkenyl group of C1 to C 40 ; an alkynyl group of C1 to C 40 ; an alkoxy group of C1 to C 40 ; an aryloxy group of C6 to C 40 ; an alkyl group of C1 to C 40Preferably, it contains a substituent selected from the group consisting of an alkoxycarbonyl group; a carbonyl group; an ether group; an ester group; a carboxyl group; or a combination thereof.

[0152] Specific examples of the silicone leveling agent include EFS-101, EFS-104, EFS-106, EFS-109, EFS-120, EFS-121, EFS-134, EFS-135, EFS-201, EFS-203, EFS-204, EFS-210, EFS-220, EFS-301, EFS-302, EFS-303, EFS-314, EFS-317, EFS-318, EFS-326, EFS-329, EFS-333, EFS-349, EFS-355, EFS-358, EFS-359, EFS-362, EFS-362, EFS-601, EFS-701, EFS-801, RS-55 and RS-56 of DIC Corporation; silicone leveling agents commercially available under the names such as BYK-333, BYK-378, BYK-3550, BYK-3751, BYK-3754 of BYK Corporation may be used.

[0153] Preferably, the leveling agent is contained in an amount of 0.01 part by weight to 0.5 part by weight based on 100 parts by weight of the photosensitive resin composition.

[0154] When the leveling agent is contained within the above range, the coating uniformity of the photosensitive composition is ensured, bleeding does not occur, and the wettability to the glass substrate is excellent.

[0155] In addition, the pixel definition layer formed of the photosensitive composition containing the silicone leveling agent of the present invention is excellent in contact angle and coating flatness, and the amount of outgas is low. Therefore, not only the color is vivid when applied to a display, but also the reliability and lifespan can be enhanced.

[0156] (2) Resin for patterning

[0157] The resin for patterning according to an embodiment of the present invention can include an acrylic binder resin, a cardo binder resin, or a combination thereof.

[0158] The acrylic binder resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin containing one or more acrylic repeating units.

[0159] The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing one or more carboxy groups, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof. The first ethylenically unsaturated monomer may be contained in an amount of 5% by weight to 50% by weight, for example, 10% by weight to 40% by weight, based on the total amount of the acrylic binder resin.

[0160] The second ethylenically unsaturated monomer includes aromatic vinyl compounds such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl methyl ether; unsaturated carboxylic acid ester compounds such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate; unsaturated carboxylic acid aminoalkyl ester compounds such as 2-aminoethyl (meth)acrylate, 2-dimethylaminoethyl (meth)acrylate, vinyl carboxylate compounds such as vinyl acetate, unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth)acrylate; vinyl cyanide compounds such as (meth)acrylonitrile; unsaturated amide compounds such as (meth)acrylamide; and these can be used alone or in combination of two or more.

[0161] Specific examples of the acrylic binder resin include, but are not limited to, (meth)acrylic acid / benzyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene copolymer, (meth)acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, etc. These may be used alone or in combination of two or more. The weight average molecular weight of the acrylic binder resin may be 3,000 g / mol to 150,000 g / mol, for example, 5,000 g / mol to 50,000 g / mol, for example, 20,000 g / mol to 30,000 g / mol.

[0162] The cald resin contains a repeating structure as shown in Chemical Formula 1 below.

[0163]

Chemical Formula

[0164] In Chemical Formula 1 above,

[0165] 1) R1 and R2 are independently of each other hydrogen; deuterium; halogen; an aryl group having 6 to 30 a heteroatom-containing C2 to 30 a heterocyclic group of 6 to 30 a fused ring group of an aliphatic ring and an aromatic ring of 6 to 20 an alkyl group of 1 to 20 an alkenyl group of 2 to 20 an alkynyl group of 2 to 20 an alkoxy group of 1 to 30 an aryloxy group of 6 to 20 a fluorenyl group; a carbonyl group; an ether group; or an alkoxycarbonyl group of 1 to

[0166] 2) R’ and R” can form a ring with adjacent groups

[0167] 3) m or n is independently an integer from 0 to 4,

[0168] 4) A1 and A2 are independently one of the following Chemical Formula 2 or Chemical Formula 3,

[0169]

Chem.

[0170]

Chem.

[0171] In the above Chemical Formula 2 and Chemical Formula 3,

[0172] 4-1) * indicates a linking site,

[0173] 4-2) R3 to R6 are independently hydrogen; deuterium; halogen; an aryl group having 6 to 30 carbon atoms; a heterocyclic group having 2 to 30 carbon atoms and containing at least one heteroatom selected from O, N, S, Si and P; a fused ring group of an aliphatic ring and an aromatic ring having 6 to 30 carbon atoms; an alkyl group having 1 to 20 carbon atoms; an alkenyl group having 2 to 20 carbon atoms; an alkynyl group having 2 to 20 carbon atoms; an alkoxy group having 1 to 20 carbon atoms; an aryloxy group having 6 to 30 carbon atoms; a fluorenyl group; a carbonyl group; an ether group; or an alkoxycarbonyl group having 1 to 20 carbon atoms,

[0174] 4-3) R3 to R6 can form a ring with adjacent groups,

[0175] 4-4) Y1 and Y2 are independently one of the following Chemical Formula 6 or Chemical Formula 7,

[0176]

Chem.

[0177]

Chemical formula

[0178] In the above Chemical formula 6 and Chemical formula 7,

[0179] 4-4-1)* indicates the bonding position,

[0180] 4-4-2) R9 is hydrogen or methyl,

[0181] 4-4-3) R 10 or R 13 are each independently hydrogen; deuterium; halogen; an aryl group of C6~C 30 a heterocyclic group of C2~C containing at least one heteroatom of O, N, S, Si and P 30 an aryl group of C6~C 30 a fused ring group of an aliphatic ring and an aromatic ring of C1~C 20 an alkyl group of C1~C 20 an alkenyl group of C2~C 20 an alkynyl group of C2~C 20 an alkoxy group of C1~C 30 an aryloxy group of C6~C 20 a fluorenyl group; a carbonyl group; an ether group; or an alkoxycarbonyl group of C1~C

[0182] 4-4-4) L1 to L3 are each independently a single bond; a fluorenylene group; an alkylene of C2~C 30 an arylene of C6~C 30 a heterocycle of C2~C 30 an alkoxylene of C1~C 30 an alkyleneoxy of C2~C 30 an aryloxy group of C6~C 30 a polyethyleneoxy group of C2~C 30 and are

[0183] 4-4-5) q and r are independently integers from 0 to 3; provided that q + r = 3,

[0184] 5) The ratio of A1 to A2 in the polymer chain of the resin containing the repeating unit represented by Chemical Formula 1 is from 9:1 to 1:9,

[0185] 6) X1 is a single bond; O; CO; SO2; CR’R”; SiR’R”; the following Chemical Formula 4; or Chemical Formula 5,

[0186] 6-1) R’ and R” are independently hydrogen; deuterium; halogen; an aryl group having 6 to C 30 a heteroaryl group having at least one heteroatom of O, N, S, Si and P and having 2 to C 30 a fused ring group of an aliphatic ring and an aromatic ring having 6 to C 30 an alkyl group having 1 to C 20 an alkenyl group having 2 to C 20 an alkynyl group having 2 to C 20 an alkoxy group having 1 to C 20 an aryloxy group having 6 to C 30 a fluorenyl group; a carbonyl group; an ether group; or an alkoxycarbonyl group having 1 to C 20 and are,

[0187] 6-2) R’ and R” can form a ring with adjacent groups,

[0188]

Chemical formula

[0189]

Chemical formula

[0190] In the above Chemical Formulas 4 and 5,

[0191] 6-3) * indicates the bonding position,

[0192] 6-4) R7 and R8 are each independently hydrogen; deuterium; halogen; a C6-C 30 aryl group; a C2-C 30 heterocyclic group containing at least one heteroatom of O, N, S, Si and P; a C6-C 30 fused ring group of an aliphatic ring and an aromatic ring; a C1-C 20 alkyl group; a C2-C 20 alkenyl group; a C2-C 20 alkynyl group; a C1-C 20 alkoxy group; a C6-C 30 aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 alkoxycarbonyl group,

[0193] 6-5) o and p are each independently an integer from 0 to 4,

[0194] 7) X2 is a C6-C 30 aryl group; a C2-C 30 heterocyclic group containing at least one heteroatom of O, N, S, Si and P; a C6-C 30 fused ring group of an aliphatic ring and an aromatic ring; a C1-C 20 alkyl group; a C2-C 20 alkenyl group; a C2-C 20 alkynyl group; a C1-C 20 alkoxy group; a C6-C 30 aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 alkoxycarbonyl group,

[0195] 8) The R’, R”, X2, L1 to L3, R1 to R8 and R 10 to R 13 are each deuterium; halogen; a silane group substituted or unsubstituted with a C1-C 30 alkyl group or a C6-C 30 aryl group; a siloxane group; a boron group; a germanium group; a cyano group; an amino group; a nitro group; a C1-C 30 alkylthio group; a C1-C 30 alkoxy group; a C6-C30 an aryloxy group; C1-C 30 an alkyl group; C2-C 30 an alkenyl group; C2-C 30 an alkynyl group; C6-C 30 an aryl group; C6-C substituted with deuterium 30 an aryl group; a fluorenyl group; a C2-C containing at least one heteroatom selected from the group consisting of O, N, S, Si and P 30 a heterocyclic group; C3-C 30 an aliphatic cyclic group; C7-C 30 an arylalkyl group; C8-C 30 an arylalkenyl group; and can be further substituted with one or more substituents selected from the group consisting of combinations thereof, and adjacent substituents can form a ring with each other.

[0196] When the R', R", X2, L1 to L3, R1 to R8 and R 10 to R 13 is an aryl group, preferably a C6-C 30 aryl group, more preferably a C6-C 18 aryl group, for example, phenyl, biphenyl, naphthyl, terphenyl and the like.

[0197] When the R', R", X2, L1 to L3, R1 to R8 and R 10 to R 13 is a heterocyclic group, preferably a C2-C 30 heterocyclic group, more preferably a C2-C 18 heterocyclic group, for example, dibenzofuran, dibenzothiophene, naphthobenzothiophene, naphthobenzofuran and the like.

[0198] When the R', R", R1 to R8 and R 10 to R 13 is a fluorenyl group, preferably 9,9-dimethyl-9H-fluorene, 9,9-diphenyl-9H-fluorenyl group, 9,9'-spirobifluorene and the like.

[0199] When L1 to L3 are arylene groups, preferably, they are arylene groups having 6 to C 30 atoms, more preferably, arylene groups having 6 to C 18 atoms, and can be, for example, phenyl, biphenyl, naphthyl, terphenyl, etc.

[0200] When R’, R”, X2, R1 to R8 and R 10 to R 13 are alkyl groups, preferably, they are alkyl groups having 1 to C 10 atoms, and can be, for example, methyl, t-butyl, etc.

[0201] When R’, R”, X2, R1 to R8 and R 10 to R 13 are alkoxy groups, preferably, they are alkoxy groups having 1 to C 20 atoms, more preferably, alkoxy groups having 1 to C 10 atoms, and can be, for example, methoxy, t-butoxy, etc.

[0202] When the adjacent groups of R’, R”, X2, L1 to L3, R1 to R8 and R 10 to R 13 are bonded to each other to form a ring, the ring is an aromatic ring group having 6 to C 60 atoms; a fluorenyl group; a heterocyclic group having 2 to C 60 atoms containing at least one heteroatom of O, N, S, Si and P; or an aliphatic ring group having 3 to C 60 atoms. For example, when the adjacent groups are bonded to each other to form an aromatic ring, preferably, it is an aromatic ring having 6 to C 20 atoms, more preferably, an aromatic ring having 6 to C 14 atoms, and can form, for example, benzene, naphthalene, phenanthrene, etc.

[0203] The cardo resin can be produced by mixing two or more of, for example, fluorene-containing compounds such as 9,9-bis(4-oxiranylmethoxyphenyl)fluorene; anhydride compounds such as benzene tetracarboxylic dianhydride, naphthalene tetracarboxylic dianhydride, biphenyl tetracarboxylic dianhydride, benzophenone tetracarboxylic dianhydride, pyromellitic dianhydride, cyclobutane tetracarboxylic dianhydride, perylene tetracarboxylic dianhydride, tetrahydrofuran tetracarboxylic dianhydride, and tetrahydrophthalic anhydride; glycol compounds such as ethylene glycol, propylene glycol, and polyethylene glycol; alcohol compounds such as methanol, ethanol, propanol, n-butanol, cyclohexanol, and benzyl alcohol; solvent compounds such as propylene glycol methyl ether acetate (PGMEA) and N-methylpyrrolidone; phosphorus compounds such as triphenylphosphine; and amine or ammonium salt compounds such as tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, and benzyltriethylammonium chloride.

[0204] The weight-average molecular weight of the cardo resin can be 1,000 to 100,000 g / mol, preferably 1,000 to 50,000 g / mol, and more preferably 1,000 to 30,000 g / mol. When the weight-average molecular weight of the resin is within the above range, pattern formation can be successfully performed without residue during the production of the light-shielding layer, there is no loss of film thickness during development, and a good pattern can be obtained. The resin may be contained in an amount of 1 to 30% by weight, more preferably 3 to 20% by weight, based on the total amount of the photosensitive resin composition. When the resin is contained within the above range, excellent sensitivity, developability, and adhesion (adhesion strength) can be obtained.

[0205] (3) Reactive unsaturated compound

[0206] The reactive unsaturated compound that is always necessary for a negative pattern has an ethylenically unsaturated double bond, so that sufficient polymerization occurs during exposure in the pattern formation process, and a pattern excellent in heat resistance, light resistance, and chemical resistance can be formed.

[0207] Specific examples of the reactive unsaturated compound include ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, 1,6 - hexanediol diacrylate, 1,6 - hexanediol dimethacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, bisphenol A epoxy acrylate, ethylene glycol monomethyl ether acrylate, trimethylolpropane triacrylate, tripentaerythritol octaacrylate, and the like.

[0208] Examples of commercially available products of the reactive unsaturated compound are as follows.

[0209] Examples of the bifunctional esters of the (meth)acrylic acid include Aronix M - 210, M - 240, M - 6200, etc. of Toagosei Co., Ltd.; KAYARAD HDDA, HX - 220, R - 604, etc. of Nippon Kayaku Co., Ltd.; V - 260, V - 312, V - 335HP, etc. of Osaka Organic Chemical Industry Co., Ltd.

[0210] Examples of the trifunctional esters of the (meth)acrylic acid include Aronix M - 309, M - 400, M - 405, M - 450, M - 7100, M - 8030, M - 8060, etc. of Toagosei Co., Ltd.; KAYARAD TMPTA, DPCA - 20, DPCA - 60, DPCA - 120, etc. of Nippon Kayaku Co., Ltd.; V - 295, V - 300, V - 360, etc. of Osaka Organic Chemical Industry Co., Ltd.

[0211] The above products can be used alone or in combination of two or more.

[0212] The reactive unsaturated compound can also be used after being treated with an acid anhydride in order to impart better developability. The reactive unsaturated compound may be contained in an amount of 1 to 40% by weight, for example, 1 to 20% by weight based on the total amount of the photosensitive resin composition. When the reactive unsaturated compound is contained within the above range, curing occurs sufficiently during exposure in the pattern forming process, resulting in excellent reliability, heat resistance, light resistance, and chemical resistance of the pattern, as well as excellent resolution and adhesion.

[0213] (4) Photoinitiator

[0214] In order to realize a negative pattern by photolithography, a photo radical initiator must be used. The photoinitiator has a molar absorption coefficient of 10,000 (L / mol·cm) or more in the wavelength range of 330 to 380 nm and the 5% weight loss occurs at 270 °C or lower. Here, the molar absorption coefficient can be calculated by the beer-Lambert Law. The weight loss was measured using TGA while heating up to 300 °C at a rate of 5 °C per minute in a nitrogen atmosphere.

[0215] The photopolymerization initiator is an initiator generally used in photosensitive resin compositions. For example, acetophenone-based compounds, benzophenone-based compounds, thioxanthone-based compounds, benzoin-based compounds, triazine-based compounds, oxime-based compounds, or mixtures thereof may be used.

[0216] Examples of the acetophenone-based compounds include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, p-t-butyltrichloroacetophenone, p-t-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-(morpholinophenyl)-butan-1-one, and the like.

[0217] Examples of the benzophenone-based compounds include benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.

[0218] Examples of the thioxanthone-based compounds include thioxanthone, 2-chlorothioxanthone, 2-methyloxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone, and the like.

[0219] Examples of the benzoin-based compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethyl ketal, and the like.

[0220] Examples of the triazine-based compounds include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3’,4’-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4’-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphth-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphth-1-yl) 4,6-bis(trichloromethyl)-s-triazine, 2-4-trichloromethyl(piperonyl)-6-triazine, 2-4-trichloromethyl(4’-methoxystyryl)-6-triazine, and the like.

[0221] Examples of the oxime-based compounds include 2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(o-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, (E)-1(((3-cyclopentyl-1-(9-ethyl-6-(2-methylbenzoyl)9H-carbazol-3-yl)propylidene)amino)oxy)ethane-1-one (PBG-304, Trony), and the like.

[0222] In addition to the above compounds, the photoinitiator can also use carbazole-based compounds, diketone compounds, sulfonium borate compounds, diazo compounds, imidazole compounds, non-imidazole compounds, and the like.

[0223] As the radical polymerization initiator, the photoinitiator can use peroxide-based compounds, azobis compounds, and the like.

[0224] Examples of the peroxide compounds include ketone peroxides such as methyl ethyl ketone peroxide, methyl isobutyl ketone peroxide, cyclohexanone peroxide, methyl cyclohexanone peroxide, and acetylacetone peroxide; diacyl peroxides such as isobutyryl peroxide, 2,4-dichlorobenzoyl peroxide, o-methylbenzoyl peroxide, and bis-3,5,5-trimethylhexanoyl peroxide; hydroperoxides such as 2,4,4-trimethylpentyl-2-hydroperoxide, diisopropylbenzene hydroperoxide, cumene hydroperoxide, and t-butyl hydroperoxide; dialkyl peroxides such as dicumyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, 1,3-bis(t-butyloxyisopropyl)benzene, and t-butyl peroxyvalerate n-butyl ester; alkyl peresters such as 2,4,4-trimethylpentyl peroxyphenoxyacetate, α-cumyl peroxyneodecanoate, t-butyl peroxybenzoate, and di-t-butyl peroxytriethyl adipate; percarbonates such as di-3-methoxybutyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, bis-4-t-butylcyclohexyl peroxydicarbonate, diisopropyl peroxydicarbonate, acetylcyclohexylsulfonyl peroxide, and t-butyl peroxyallyl carbonate, and the like.

[0225] Examples of the azo compounds include 1,1'-azobiscyclohexane-1-carbonitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2'-azobis(methyl isobutyrate), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), α,α'-azobis(isobutyl nitrile), and 4,4'-azobis(4-cyanovaleric acid).

[0226] The photoinitiator may be used together with a photochromic agent that causes a chemical reaction by absorbing light and then transferring its energy after becoming excited. Examples of the photosensitizer include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, and the like.

[0227] The photoinitiator may be contained in an amount of 0.01 to 10% by weight, for example, 0.1 to 5% by weight based on the total amount of the photosensitive composition. When the photoinitiator is contained within this range, sufficient curing occurs during exposure in the pattern forming process, and excellent reliability can be obtained. The pattern has excellent heat resistance, light resistance, and chemical resistance, as well as excellent resolution and adhesion, and can prevent a decrease in transmittance due to unreacted initiator.

[0228] (5) Colorant

[0229] All of organic pigments, inorganic pigments, and dyes can be used as the colorant.

[0230] As the colorant, red pigments, green pigments, blue pigments, yellow pigments, black pigments, and the like can be used.

[0231] Examples of the red pigment include C.I. Pigment Red 254, C.I. Pigment Red 255, C.I. Pigment Red 264, C.I. Pigment Red 270, C.I. Pigment Red 272, C.I. Pigment Red 177, C.I. Pigment Red 89, and the like.

[0232] Examples of the green pigment include copper phthalocyanine pigments substituted with halogens such as C.I. Pigment Green 36 and C.I. Pigment Green 7.

[0233] Examples of the cyan pigment include copper phthalocyanine pigments such as C.I. Pigment Blue 15:6, C.I. Pigment Blue 15, C.I. Pigment Blue 15:1, C.I. Pigment Blue 15:2, C.I. Pigment Blue 15:3, C.I. Pigment Blue 15:4, C.I. Pigment Blue 15:5, and C.I. Pigment Blue 16.

[0234] Examples of the yellow pigment include isoindoline pigments such as C.I. Pigment Yellow 139, quinophthalone pigments such as C.I. Pigment Yellow 138, and nickel complex pigments such as C.I. Pigment Yellow 150.

[0235] Examples of the black pigment include lactam black, aniline black, perylene black, titanium black, and carbon black.

[0236] In addition, the colorant in the photosensitive resin composition according to the implementation example may include a pigment, a dye, or a combination thereof. For example, the dye may include a phthalocyanine compound.

[0237] The pigment and the dye may be used alone or in combination of two or more, and are not limited to these examples.

[0238] Among these, the black pigment can be used to efficiently block light in the light-shielding layer. When using the black pigment, it can also be used together with a color corrector such as an anthraquinone-based pigment, a perylene-based pigment, a phthalocyanine-based pigment, or an azo-based pigment.

[0239] A dispersant can be used together to disperse the pigment in the photosensitive resin composition. Specifically, the pigment can be used after surface treatment with a dispersant in advance, or a dispersant can be added together with the pigment during the production of the photosensitive resin composition for use.

[0240] As the dispersant, a nonionic dispersant, an anionic dispersant, a cationic dispersant, etc. can be used. Specific examples of the dispersant include polyalkylene glycol and its esters, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonates, carboxylic acid esters, carboxylates, alkylamide alkylene oxide adducts, alkylamines, etc. These can be used alone or in admixture of two or more.

[0241] Examples of commercially available products of the dispersant include DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc. of BYK; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc. of EFKA Chemicals; Solsperse5000, Solsperse12000, Solsperse13240, Solsperse13940, Solsperse17000, Solsperse20000, Solsperse24000GR, Solsperse27000, Solsperse28000, etc. of Zeneka; or PB711, PB821, etc. of Ajinomoto.

[0242] The dispersant can be contained in an amount of 0.1% by weight to 15% by weight based on the total amount of the photosensitive resin composition. When the dispersant is contained within the above range, since the dispersibility of the composition is excellent, the stability, developability and patternability during the production of the light-shielding layer are excellent.

[0243] The pigment may be pretreated with a water-soluble inorganic salt and a wetting agent before use. When the pigment is pretreated, the average particle size of the pigment may be reduced.

[0244] The pretreatment includes kneading the pigment with a water-soluble inorganic salt and a wetting agent, and filtering and washing the pigment obtained from the kneading step.

[0245] The kneading is carried out at a temperature of 40° C. to 100° C., and the filtering and washing are carried out by washing the inorganic salt with water or the like and then filtering.

[0246] Examples of the water-soluble inorganic salt include, but are not limited to, sodium chloride and potassium chloride.

[0247] The wetting agent serves as a medium for uniformly mixing the pigment and the water-soluble inorganic salt to facilitate grinding of the pigment. Examples of the wetting agent include alkylene glycol monoalkyl ethers such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, etc.; alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerin polyethylene glycol, etc., and these can be used alone or in combination of two or more.

[0248] The pigment having undergone the kneading step may have an average particle size of 20 nm to 110 nm. When the average particle size of the pigment is within this range, it is possible to effectively form a fine pattern while having excellent heat resistance and light resistance.

[0249] The pigment may be contained in an amount of 1 to 40% by weight, more specifically 2 to 30% by weight, based on the total amount of the photosensitive resin composition. When the pigment is contained within the above range, the color reproduction rate is excellent, and the curing property and adhesion of the pattern are excellent.

[0250] (6) Solvent

[0251] The solvent used is one having compatibility with the cardo resin, the reactive unsaturated compound, the pigment, the cardo compound and the initiator, but is a non-reactive substance.

[0252] Examples of the solvent include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methyl phenyl ether, and tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate (PGMEA) and propylene glycol propyl ether acetate; aromatic hydrocarbons such as toluene and xylene; ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, and isobutyl acetate; lactate esters such as methyl lactate and ethyl lactate; oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; alkoxyacetic acid alkyl esters such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, and ethyl ethoxyacetate; 3-oxypropionic acid alkyl esters such as methyl 3-oxypropionate and ethyl 3-oxypropionate; 3-alkoxypropionic acid alkyl esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, and methyl 3-ethoxypropionate; 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, and propyl 2-oxypropionate;2-alkoxypropionic acid alkyl esters such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, methyl 2-ethoxypropionate; 2-oxy-2-methylpropionic acid esters such as methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate; 2-alkoxy-2-methylpropionic acid alkyl esters such as methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, etc., which are monooxy monocarboxylic acid alkyl esters; esters such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutyrate; ketone acid esters such as ethyl pyruvate, etc.

[0253] In addition, high-boiling solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformanilide, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate can also be used.

[0254] Among the above solvents, glycol ethers such as ethylene glycol monoethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; carbitols such as diethylene glycol monomethyl ether; propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate, propylene glycol propyl ether acetate can be used considering their compatibility and reactivity.

[0255] The solvent can be included as the remaining amount with respect to the total amount of the photosensitive resin composition, specifically, it is included in an amount of 40 to 90% by weight. When the solvent is included within the above range, the photosensitive resin composition has an appropriate viscosity, and thus is excellent in processability during the production of the pattern layer.

[0256] II. Manufacturing Process of Pixel Definition Layer

[0257] (1) Coating and Coating Stage

[0258] The photosensitive composition is a low-viscosity liquid sample. In order to coat it with a certain thickness after coating on a substrate, a spin coater or a slit coater is used. The faster the rotation speed of the spin coater, the thinner the thickness, but the flatness deviation in terms of area decreases. For coating a large-area substrate, a slit coater is preferred over a spin coater. After coating, the remaining solvent makes the surface have fluidity, and thus there is a disadvantage that the flatness deteriorates. In order to overcome this, a part of the solvent is removed using a VCD (vacuum chamber dry) to lower the fluidity on the surface.

[0259] (2) Pre-baking Stage

[0260] This is a process of heating the coated substrate on a hot plate or in an oven at a certain temperature and time to remove a part of the solvent contained in the coating film. If the surface or the depth of the coating film is not dried, contamination of the photomask will occur during exposure in the next process, and curing will not be successfully carried out in the exposed area during ultraviolet light irradiation, and the pattern will not be formed and will be removed in the development process due to non-curing.

[0261] (3) Exposure Stage

[0262] When the pre-baking process is completed, it is a process of curing the film formed by irradiating actinic rays (ultraviolet rays) using a photomask with a pattern formed thereon. The types of lamps that generate actinic rays include LED lamps or metal (mercury) lamps, and the wavelengths are g-line (436 nm), h-line (405 nm), i-line (365 nm), Deep UV (<260 nm), and they can be used individually or in combination.

[0263] (4) Development stage

[0264] During the exposure stage, when actinic rays are irradiated, the photomask divides the exposed area and the non-exposed area. In the case of a positive type, the exposed area becomes soluble in the developer, and the non-exposed area withstands the developer and the pattern remains. In the case of a negative type, the exposed area hardens and has resistance to the developer, and the non-exposed area is developed. The black pixel definition layer (Black PDL) manufactured with the composition containing the colorant of the present invention is of the negative type, and is divided into an exposed area (hardened) and a non-exposed area (developed) to form a pattern.

[0265] (5) Post-exposure stage

[0266] This is a process of irradiating the developed substrate with actinic rays (ultraviolet rays) without a photomask to additionally cure the developed film and increase the strength of the film. The types of lamps that generate actinic rays include LED lamps or metal (mercury) lamps, and the wavelengths are g-line (436 nm), h-line (405 nm), i-line (365 nm), Deep UV (<260 nm), and they can be used individually or in combination.

[0267] (6) Post-heat treatment stage

[0268] A step of applying heat to the substrate exposed later at a high temperature of 210°C to 300°C to remove the remaining solvent and fumes. If the solvent and fumes are not completely removed in the corresponding step, outgassing will occur in the subsequent heat treatment process, affecting the element, and thereby affecting dark spots or pixel shrinkage.

[0269] Another embodiment can pattern the pixel separation part of the organic light-emitting element electrode using the aforementioned photosensitive resin composition.

[0270] Hereinafter, synthesis examples and examples according to the present invention will be specifically described, but the synthesis examples and examples of the present invention are not limited thereto.

[0271] (Manufacture of black photosensitive composition)

[0272] Synthesis Example 1: (Production of 9,9-Bis[4-(glycidyloxy)phenyl]fluorene of Chemical Formula 8)

[0273] 20 g of 9,9'-bisphenol fluorene (Sigma aldrich), 8.67 g of glycidyl chloride (Sigma aldrich), and 30 g of anhydrous potassium carbonate were placed in a 300 ml three-necked round-bottom flask equipped with a dimethylformamide of 100 ml and a distillation tube, heated to 80°C and reacted for 4 hours. After that, the temperature was lowered to 25°C, the reaction solution was filtered, the filtrate was added dropwise to 1000 ml of water with stirring, the precipitated powder was filtered, washed with water, and dried under reduced pressure at 40°C to obtain 25 g of 9,9-Bis[4-(glycidyloxy)phenyl]fluorene of the following Chemical Formula 8. The obtained powder was analyzed for purity by HPLC, and as a result, it showed a purity of 98%.

[0274]

Chemical formula

[0275] Synthesis Example 2: Production of cardo-based binder resin

[0276] 25 g (54 mmol) of Compound 1 obtained from Synthesis Example 1, 8 g of acrylic acid (Daejung Chemicals & Metals), 0.2 g of benzyltriethylammonium chloride (Daejung Chemicals & Metals), and 0.2 g of hydroquinone (Daejung Chemicals & Metals) were placed in a 300 ml three-necked round-bottom flask equipped with a distillation tube together with 52 g of propylene glycol methyl ether acetate (Sigma aldrich), and stirred at 110 °C for 6 hours. After completion of the reaction, 8 g of biphenyltetracarboxylic dianhydride (Mitsubishi Gas) and 1.8 g of tetrahydrophthalic acid (Sigma aldrich) were added, and then stirred again at 110 °C for 6 hours. After completion of the reaction, the reaction solution was recovered and analyzed, and as a result, a cardo-based binder resin with a solid content of 45% and a molecular weight of 4,580 was obtained.

[0277] Production Example 1: Production of black pigment dispersion

[0278] 15 g of Irgaphor Black S 100 CF (black pigment / BASF), 8.5 g of Disperbyk 163 (BYK), and 6.5 g of SR-3613 (SMS) were dispersed with 70 g of propylene glycol methyl ether acetate using a paint shaker (Asada) with 100 g of zirconia beads (Toray) having a diameter of 0.5 mm for 10 hours to obtain a dispersion.

[0279] A photosensitive composition solution was produced with the composition as shown in Table 1 below.

[0280] Specifically, after dissolving the initiator in the solvent and stirring at room temperature, the binder resin and the polymerizable compound were added thereto and stirred at room temperature. Subsequently, the colorant and other additives were added to the obtained reactant and stirred at room temperature. Subsequently, the product was filtered three times to remove impurities, thereby producing a photosensitive resin composition.

[0281]

Table 1

[0282] The acrylic resin used was SR-3100 (SMS Co., a resin containing double bonds with an average molecular weight of 6,000 to 8,000), the reactive unsaturated compound was Miraemer M600 (Miwon Specialty Chemical Co.), the photoinitiator was PBG-304 (Trony Co.), and the solvent used was propylene glycol methyl ether acetate.

[0283] The molecular weight of the silicone leveling agent used in the compositions 1-1 to 1-5 was 10,000 g / mol to 10,000 g / mol.

[0284] The molecular weight was measured using GPC (1260 Infinity) from Agilent Co. After dissolving 100 mg of the sample to be measured in 10 g of Tetrahydrofuran (THF), the measurement was carried out. The GPC Column was analyzed using a combination of Shodex Co. (GPC-802, 803, 804), and measured for 1 hour at a rate of 1 ml / min using an RI detector.

[0285] The viscosity of the silicone leveling agent itself was 100,000 mm 2 / s to 500,000 mm 2 / s, and the viscosity measured at 20 °C for a mixture of 50 wt% of the silicone leveling agent and 50 wt% of propylene glycol methyl ether acetate was 10 mm 2 / s to 40 mm 2 / s.

[0286] The viscosity was measured using a viscometer (LVDVNX-CP) manufactured by Brookfield Co. 1 ml of the sample was placed in a sample cup and measured at a temperature of 20 ± 3 °C for 1 minute. The spindle (Z-40) used during the measurement was used, and the rotational speed (rpm) during the analysis was measured in the range of 10 to 15.

[0287] The manufacturing method of a negative pixel definition layer (negative PDL) using the photosensitive composition is as follows.

[0288] (1) Coating and coating step

[0289] After applying the photosensitive composition to a 10 cm * 10 cm metal-evaporated substrate that has been washed at a certain thickness using a spin coater, a part of the solvent is removed using VCD (vacuum chamber dry) to form a coating film. The coating thickness of the photosensitive composition forms a film with a thickness of 3.3 to 3.5 micrometers after VCD.

[0290] (2) Pre-baking step

[0291] In order to remove the solvent contained in the obtained coating film, it is heated on a hot plate at 90 °C to 120 °C for 100 seconds to 150 seconds. By removing a certain amount of solvent in this process, pixel-shaped mask contamination can be reduced during the next step (exposure) step, and a clean pattern can be made.

[0292] (3) Exposure step

[0293] After interposing a pixel-shaped mask to obtain the necessary pattern formation and a certain thickness on the obtained coating film, a pattern can be formed by irradiating a light source of a metal or LED lamp having actinic rays of 190 nm to 600 nm, preferably ghi-line, using an exposure machine. The exposure amount irradiated for pattern formation is 80 to 110 mJ / cm 2 and the formed pixel definition layer is of the negative type. The transmittance of the photomask used during exposure has three transmittance intervals of 0% (non-exposed part), 15 - 60% (Half-tone), and 100% (Full-tone) to form a pattern.

[0294] (4) Development step

[0295] Following the exposure step, after developing with a 2.38 wt% TMAH (tetramethylammonium hydroxide) developer at 23 ± 2 °C for a certain time (minutes) by the dipping method and then rinsing with ultrapure water (DI water), the unexposed portion is dissolved and removed to leave only the exposed portion to form an image pattern. The thickness of the coating film is 1.30 to 1.95 μm based on the Half-tone standard and 3.20 to 3.40 μm based on the Full-tone standard.

[0296] (5) Post-exposure step

[0297] Following the development step, in order to prevent the pattern from collapsing after post-heat treatment, the entire area can be irradiated with actinic rays of 190 nm to 600 nm, preferably the light source of a metal or LED lamp having ghi-line, by an exposure machine without a photomask to increase the strength of the coating film. The exposure dose irradiated to increase the strength is 50 to 1,000 mJ / cm 2 is.

[0298] (6) Post-heat treatment step

[0299] To obtain the image pattern obtained by the development, post-baking is performed at 210 °C to 300 °C for 60 minutes to 120 minutes to completely remove the solvent, cure the pattern to form a film, and then measure the outgas.

[0300] After the post-heat treatment step, it is preferable that the thickness of the half-tone is 1.00 to 1.90 μm and the thickness of the full-tone is 2.80 to 3.20 μm.

[0301] (7) Element reliability evaluation

[0302] As shown in FIGS. 2 and 3, electrodes were formed on the glass surface with a thickness of ITO (80 - 120 Å)-Ag (900 - 1,100 Å)-ITO (80 - 120 Å) according to each condition of the composition for evaluating device reliability such as pixel shrinkage and dark spots. The photosensitive composition of the present invention was provided with a pixel definition layer according to the above (1) to (6) steps on the electrodes to manufacture an evaluation substrate, and reliability verification elements were confirmed.

[0303] (8) Outgassing measurement

[0304] After forming a pattern on the substrate by the above (1) to (6) steps with the photosensitive composition, the outgassing in an area of 10 cm × 10 cm was measured. The coating thickness was 2.90 μm to 3.10 μm after post-heat treatment. After coating and post-heat treatment of the photosensitive composition on a 10 cm × 10 cm substrate, the weight was 11 g to 12 g. The outgassing of the substrate was collected at 250 °C for 30 minutes using JTD-505III of JAI. After measuring toluene calibration samples (5, 10, 50 ppm) using QP2020 GC / MS of Shimadzu, a calibration curve was created, and the outgassing generation amount of the collected samples was measured by extrapolation. Samples were samples with changed process conditions such as development time and temperature in the development stage, heating temperature and heat treatment time in the post-heat treatment stage, and the detected amounts of the measured outgassing of each were compared.

[0305] (9) Contact angle measurement method

[0306] Ultra-pure water (DI water) is dropped onto the film with a thickness of 1.45 μm to 1.55 μm that has been coated, exposed, developed, and post-heat treated to measure the contact angle with the surface. The equipment for measuring the contact angle uses the DSA25 equipment of KRUSS. Ultra-pure water is put into a microsyringe and 2 microliters are dropped to measure the contact angle with the interface. The contact angle measures the average of the values on the left and right sides of the water droplet.

[0307]

Table 2

[0308] In Table 2, referring to the results of Comparative Example 1 and Examples 4 to 6, it was confirmed that at the same post-heat treatment temperature, the results of the examples showed that the outgas amount after the post-heat treatment was even lower, at 40 ppm or less. This is judged to be the result of the silicon-based leveling agent of the present invention contained in the photosensitive composition having even better thermal stability at high temperatures than the fluorine-based leveling agent.

[0309] Also, referring to Table 2 and FIG. 2, in the case of the examples where the post-heat treatment temperature was adjusted in the range of 210°C to 300°C, it was confirmed that the amount of outgas decreased compared to the result of Comparative Example 2 with a lower post-heat treatment temperature, and the contact angle was included in the range of 60° to 100°. Comparing with the result of Comparative Example 3 with a higher post-heat treatment temperature, it was confirmed that the amount of outgas was at a similar level, but the contact angle was included within the range limited by the present invention.

[0310] Also, referring to Table 2 and FIG. 3 above, in the case of the examples where the pixel definition layer was manufactured by applying a post-heat treatment temperature within the appropriate range of 210°C to 300°C, it was confirmed that since the residue and pixel shrinkage development of the pixel definition layer did not occur, excellent reliability could be ensured in the device configuration.

[0311] On the contrary, when the post-heat treatment temperature was as low as less than 210°C as in the result of Comparative Example 2, it was confirmed that the amount of outgas increased after the post-heat treatment and dark spots occurred in the device. When the post-heat treatment temperature was 300°C or higher as in Comparative Example 3, it was confirmed that the pixel definition layer could not withstand the high temperature and pixel shrinkage development occurred due to the additional outgas generated during device driving.

[0312] The above description merely exemplifies the present invention, and those with ordinary knowledge in the technical field to which the present invention pertains can make various modifications without departing from the essential characteristics of the present invention.

[0313] Therefore, the embodiments disclosed in this specification are not for limiting the present invention, but for explaining it. The idea and scope of the present invention are not limited by such embodiments. The protection scope of the present invention should be interpreted according to the claims, and all technologies within the equivalent scope should be interpreted as being included in the scope of rights of the present invention.

Explanation of Reference Numerals

[0314] 1: Substrate 2: TFT layer 3: Flat layer 4: Pixel electrode 5: Light-emitting layer 6: Pixel definition layer 7: Counter electrode 8: Encapsulation layer 9: Touch panel 10: Color filter 11: OCA layer 12: Cover glass layer

Claims

1. A pixel definition layer including a photosensitive composition containing a leveling agent not containing fluorine and including a half-tone layer.

2. The pixel definition layer according to claim 1, wherein the leveling agent contains a silicon-based compound.

3. The pixel definition layer according to claim 2, wherein the molecular weight of the silicon-based compound is 5,000 g / mol to 15,000 g / mol.

4. The viscosity of the silicon-based compound is 100,000 mm ２ / s to 500,000 mm ２ 3. The pixel defining layer of claim 2, wherein:

5. The silicon-based compound is C １ to C 4０ alkyl group; C １ to C 4０ alkenyl group; C １ to C ３０ alkynyl group; C １ to C 4０ alkoxy group; C ６ to C 4０ aryloxy group; C １ to C 4０ alkoxycarbonyl group; carbonyl group; ether group; ester group; carboxyl group or a substituent of a group consisting of a combination thereof. The pixel definition layer according to claim 2.

6. The pixel definition layer according to claim 1, which is manufactured including a step of post-heat treating the photosensitive composition.

7. The pixel definition layer according to claim 6, wherein the post-heat treatment step is performed at a temperature of 210°C to 300°C for 30 minutes to 120 minutes.

8. The pixel definition layer according to claim 6, which is further manufactured including steps of coating and applying the photosensitive composition; pre-baking; exposing; developing; and post-exposing.

9. The pixel definition layer according to claim 8, wherein the photosmask transmittance is divided into three intervals of 0% (non-exposed part), 20 - 50% (Half-tone), and 100% (Full-tone), and the half-tone layer and the full-tone layer are formed in one exposure and development process.

10. The pixel definition layer according to claim 1, wherein the photosensitive composition contains a leveling agent not containing fluorine in an amount of 0.01 to 0.5% by weight based on the total amount thereof.

11. The pixel definition layer according to claim 1, wherein the photosensitive composition contains a resin including an acrylic binder resin; a caldo binder resin or a combination thereof.

12. The pixel definition layer according to claim 1, wherein the photosensitive composition contains a colorant; a reactive unsaturated compound; and a photoinitiator.

13. The pixel definition layer according to claim 1, wherein when 2 to 10 microliters (μl) of water is brought into contact with the surface under a temperature condition of 25 ± 3°C, the contact angle with the interface is 60° to 100°.

14. The pixel definition layer according to claim 1, wherein after the post-heat treatment step, the thickness of the half-tone is 1.00 to 1.90 μm.

15. The pixel definition layer according to claim 1, wherein after the post-heat treatment step, the thickness of the full-tone is 2.80 to 3.20 μm.

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