Image formation device

Abstract

To facilitate increasing the size of an opening that allows communication between the interior and the exterior of a supply device for supplying a developer to a developing device, as compared with a case where openings are arranged at opposing parts of end surfaces of a developer container accommodating the developer.SOLUTION: A plurality of openings 505 are provided. The plurality of openings 505 are arranged at opposing portions on an outer peripheral surface 81A of a developer container 80 mounted on an attached portion 701. The openings 505 are provided at mutually different positions in a circumferential direction of the developer container 80. Each of the plurality of openings 505 is provided so as to extend in the axial direction of the developer container 80. Further, each of the openings 505 is provided from the opposing position at one end of the developer container 80 to the opposing position at the other end of the developer container 80.SELECTED DRAWING: Figure 27

Description

[Technical Field]

[0001] The present invention relates to an image forming apparatus. [Background technology]

[0002] Patent document 1 discloses a configuration in which the developer storage section of a developing device is provided with a partition plate that divides the developer storage section into two sections, positioned between a first screw and a second screw, and openings provided at both ends of the partition plate. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent No. 4633419 Summary of the Invention [Problem to be solved by the invention]

[0004] An image forming apparatus may be provided with a developing device that applies developer to an image carrier, and may further include a supplying device that supplies developer discharged from a cylindrical developer storage container to the developing device. Here, if an opening is provided in the supply device that connects the inside and outside of the supply device, the gas inside the supply device can be discharged to the outside. Also, the outer surface of the developer container installed in the image forming apparatus tends to have a large area. In this case, it is easy to increase the size of the object installed in the position opposite this outer surface. The object of the present invention is to make it easier to enlarge the opening that connects the inside and outside of a supply device that supplies developer to a developing device, compared to when the opening is located at the opposite end of a developer storage container that contains developer. [Means for solving the problem]

[0005] The invention described in claim 1 is an image forming apparatus comprising: an image carrier; a developing device that adheres developer to the image carrier; an attachment portion to which a cylindrical developer storage container containing developer is attached; and a supply device that supplies developer from the developer storage container to the developing device, the supply device having an opening that connects the inside and outside of the supply device and is located at a location opposite the outer peripheral surface of the developer storage container attached to the attachment portion. A second aspect of the present invention is the image forming apparatus according to the first aspect, wherein the opening is provided so as to extend in the axial direction of the developer accommodating container attached to the attachment portion. The invention described in claim 3 is an image forming apparatus described in claim 2, wherein the opening is provided from a position opposite one end in the axial direction of the developer storage container attached to the mounting portion to a position opposite the other end in the axial direction of the developer storage container. A fourth aspect of the present invention is the image forming apparatus according to the first aspect, wherein a plurality of the openings are provided. The invention described in claim 5 is an image forming device described in claim 4, in which the multiple openings are arranged at different positions in the circumferential direction of the developer storage container attached to the attachment portion. A sixth aspect of the present invention is the image forming apparatus according to the first aspect, wherein the opening is provided facing the opposite side to the side where the developer storage container is installed. [Effects of the Invention]

[0006] According to the invention of claim 1, it is easier to enlarge the opening that connects the inside and outside of the supply device that supplies developer to the developing device, compared to when the opening is located at the opposite end of the developer storage container that contains the developer. According to the invention of claim 2, it is easier to increase the size of the opening compared to when the opening is not provided so as to extend in the axial direction of the developer accommodating container. According to the invention of claim 3, the opening can be made larger than when the size of the opening in the axial direction is smaller than the distance between one end and the other end of the developer container in this axial direction. According to the invention of claim 4, it is possible to make the total area of ​​the openings larger than when a single opening is provided. According to the invention of claim 5, it is possible to dispose the plurality of openings in a state where they are shifted from one another in the circumferential direction of the developer accommodating container. According to the invention of claim 6, it is possible to make the gas discharge from the opening smoother compared to when the opening is provided facing the side where the developer storage container is installed. [Brief explanation of the drawings]

[0007] [Figure 1] FIG. 1 is a diagram illustrating an image forming apparatus. [Figure 2] FIG. 2 is a diagram of the developing device as seen from above. [Figure 3] 3 is a cross-sectional view of the developing device taken along line III-III in FIG. 2. [Figure 4] 4 is a cross-sectional view of the developing device taken along line IV-IV in FIG. 2. [Figure 5] 3 is a cross-sectional view of the developing device taken along line VV in FIG. 2. [Figure 6] 6 is a cross-sectional view of the developing device taken along line VI-VI in FIG. 5. [Figure 7] FIG. 2 is a perspective view of the supply device as seen from the rear side of the image forming apparatus. [Figure 8] FIG. 2 is a diagram illustrating a developer storage portion. [Figure 9] 10(A) and 10(B) are diagrams showing the filling portion and the gas flow path. [Figure 10] FIG. 2 is a perspective view of the developer storage portion as viewed from above. [Figure 11] FIG. 2 is an enlarged view of one end A of the developer storage portion. [Figure 12] FIG. 10 is a diagram showing the state in which the upper member is attached onto the lower container. [Figure 13] 13 is a cross-sectional view of the supply device taken along line XIII-XIII in FIG. 7. [Figure 14] 3 is a cross-sectional view of the supply device taken along a plane perpendicular to the longitudinal direction of the developer storage container. FIG. [Figure 15] FIG. 4 is a diagram showing the flow of gas when the supply device is viewed from above. [Figure 16] FIG. 10 is a diagram showing another example of the configuration of the supply device. [Figure 17] FIG. 10 is a diagram illustrating a supply device according to a second embodiment. [Figure 18] 10(A) and 10(B) are diagrams illustrating the lower flow path. [Figure 19] FIG. 10 is a diagram of a developer storage portion according to a second embodiment, as viewed from above. [Figure 20] FIG. 18 is a cross-sectional view of the supply device taken along line XX-XX in FIG. [Figure 21] (A) and (B) are diagrams showing the cross-sectional state. [Figure 22] 10A and 10B are diagrams illustrating a state in which developer is transported in a lower flow path. [Figure 23] 23 is a cross-sectional view of the lower flow path taken along the line XXIII-XXIII in FIG. 22. [Figure 24] 10A and 10B are diagrams showing other configuration examples of the lower flow path. [Figure 25] 10A and 10B are diagrams illustrating other configuration examples of the lower flow path and the lower conveying member. [Figure 26] 10A and 10B are diagrams illustrating another example of the configuration of the lower conveying member. [Figure 27] FIG. 10 is a diagram showing another example of the configuration of the supply device. [Figure 28] FIG. 10 is a diagram showing another example of the configuration of the supply device. [Figure 29] FIG. 10 is a diagram showing another example of the configuration of the supply device. [Figure 30] FIG. 10 is a diagram showing another example of the configuration of the supply device. [Figure 31] FIG. 10 is a diagram showing another example of the configuration of the supply device. [Figure 32] FIG. 10 is a diagram showing another example of the configuration of the supply device. DETAILED DESCRIPTION OF THE INVENTION

[0008] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. Fig. 1 is a diagram showing an image forming apparatus 100 according to this embodiment. Fig. 1 shows the image forming apparatus 100 as viewed from the front side. The image forming apparatus 100 is an intermediate transfer type image forming apparatus called a tandem type. This image forming apparatus 100 is provided with a plurality of image forming sections 200. Each of the image forming sections 200 forms an image to be transferred onto a sheet of paper P, which is an example of a recording medium.

[0009] Each of the image forming units 200 includes a photosensitive drum 11 as an example of an image carrier. Each of the image forming units 200 uses a developer containing toner to form a toner image, which is an image to be transferred to paper P, on the photosensitive drum 11. In other words, each of the image forming units 200 uses a powder developer to form a toner image on the photosensitive drum 11. The developer of this embodiment is composed of a dry carrier and a dry toner. Each of the image forming units 200 forms a toner image on the photosensitive drum 11 using the carrier and the toner.

[0010] The six image forming units 200 form toner images on the photosensitive drums 11 using different types of developers. Of the six image forming units 200, four image forming units 200 form toner images using developers of basic colors. More specifically, the four image forming units 200 form toner images using developers of yellow, magenta, cyan, and black. The remaining two image forming units 200 form toner images using developers other than the basic colors. The remaining two image forming units 200 form toner images using developers such as clear, white, gold, or silver, or alternatively, the remaining two image forming units 200 form toner images using developers such as pink, green, or orange.

[0011] Other examples of developers other than the basic colors include developers containing magnetic toner, developers containing conductive toner, and developers containing toner that emits light when irradiated with light such as ultraviolet or infrared light. In this embodiment, the developer used is a so-called two-component developer in which a carrier and a toner are mixed, but a so-called one-component developer composed only of toner may also be used.

[0012] The image forming apparatus 100 is also provided with an intermediate transfer belt 15. The image forming apparatus 100 is also provided with a primary transfer unit 10. The toner images formed in the image forming units 200 are transferred to the intermediate transfer belt 15 in the primary transfer unit 10. Furthermore, the image forming apparatus 100 is provided with a secondary transfer unit 20. The toner image transferred onto the intermediate transfer belt 15 is transferred onto a sheet of paper P in the secondary transfer unit 20. The image forming apparatus 100 is also provided with a fixing device 60 that fixes the toner image transferred onto the paper P onto the paper P.

[0013] Furthermore, the image forming apparatus 100 is provided with a control unit 40 having a CPU that executes a program. The control unit 40 controls each unit in the image forming apparatus 100. The image forming apparatus 100 is also provided with a UI (User Interface) 45. The UI 45 is configured with a display panel and the like. The UI 45 accepts instructions from a user. The UI 45 also displays information to the user.

[0014] Each of the image forming units 200 is provided with a developing device 14. Furthermore, each of the image forming units 200 is provided with a supply device 70. The developing device 14 deposits the developer onto the photosensitive drum 11. The supplying device 70 supplies the developer to the developing device 14. When the developing device 14 deposits developer onto the photosensitive drum 11, the electrostatic latent image on the photosensitive drum 11 is made visible by the toner. The developing device 14 develops the photosensitive drum 11, which is an image carrier. As a result, an image made of toner is formed on the photosensitive drum 11.

[0015] The supply device 70 supplies new developer to the developing device 14 . A developer container 80 is attached to the image forming apparatus 100. The supply device 70 transports the developer from the developer container 80 to the developing device 14. In this way, the developer is supplied to the developing device 14. As described above, the developer is composed of a carrier and a toner. The supply device 70 supplies the carrier and the toner as the developer to the developing device 14. In this embodiment, the carrier has a positive charge polarity, and the toner has a negative charge polarity.

[0016] In each of the image forming units 200, a photosensitive drum 11, which is an example of an image carrier, rotates in the direction of arrow A. Each of the image forming sections 200 is provided with a charger 12. Each of the image forming sections 200 is also provided with an exposure device 13. The charger 12 charges the photosensitive drum 11. The exposure device 13 forms an electrostatic latent image on the photosensitive drum 11. The exposure device 13 includes a light source such as an LED. The exposure device 13 irradiates the photosensitive drum 11 with light to form an electrostatic latent image on the photosensitive drum 11.

[0017] Each image forming unit 200 is provided with a primary transfer roll 16. The primary transfer roll 16 is provided in the primary transfer unit 10. The primary transfer roll 16 is used to transfer a toner image from the photosensitive drum 11 to the intermediate transfer belt 15. Each image forming unit 200 is provided with a drum cleaner 17 that removes developer remaining on the photosensitive drum 11.

[0018] The intermediate transfer belt 15 is circulated by a driving roll 31 at a predetermined speed in the direction of arrow B shown in Fig. 1. The driving roll 31 is driven by a motor (not shown) and rotates counterclockwise in the figure. The primary transfer unit 10 includes a primary transfer roll 16 disposed opposite the photosensitive drum 11 with an intermediate transfer belt 15 sandwiched therebetween. The toner image on the photosensitive drum 11 moves to the intermediate transfer belt 15 in the primary transfer unit 10. As a result, a toner image is formed on the intermediate transfer belt 15.

[0019] The secondary transfer unit 20, which is an example of a transfer unit, is provided with a secondary transfer roll 22 that is disposed on the outer surface side of the intermediate transfer belt 15. The secondary transfer unit 20 also is provided with a backup roll 25 that is disposed on the inner surface side of the intermediate transfer belt 15. In the secondary transfer section 20, the toner image formed on the intermediate transfer belt 15 is transferred onto the paper P that has been transported to the secondary transfer section 20.

[0020] Furthermore, a reversing mechanism 900 for reversing the paper P is provided. The reversing mechanism 900 reverses the paper P, one side of which has a toner image transferred thereon, by the secondary transfer unit 20. Then, the reversing mechanism 900 supplies the paper P, which has been reversed, to the secondary transfer unit 20 again. As a result, toner images are formed on both sides of the paper P.

[0021] The reversing mechanism 900 sends the paper P, which has passed through the fixing device 60, to a branch path R2 branching from the paper transport path R1. After the sheet P passes through the branching section BP, the reversing mechanism 900 transports the sheet P in the opposite direction. Furthermore, the reversing mechanism 900 sends the sheet P to the branching path R2. Branch path R2 merges with paper transport path R1 upstream of secondary transfer unit 20. As a result, paper P sent to branch path R2 is supplied again to secondary transfer unit 20. Paper P is supplied again to secondary transfer unit 20 with its front and back inverted. In this case, a toner image is formed not only on one side of the paper P but also on the other side thereof. As a result, toner images are formed on both sides of the paper P.

[0022] The flow of processing performed by the image forming apparatus 100 will be described. The image forming apparatus 100 receives image data output from, for example, an image reading device or a computer (not shown). The image forming apparatus 100 then performs image processing on the image data. As a result, image data corresponding to each of the multiple image forming units 200 is generated. Specifically, image data corresponding to each of the four basic colors, yellow, magenta, cyan, and black, is generated, and in addition, image data corresponding to colors other than the basic colors is generated. The generated image data is output to the exposure device 13 provided in the image forming section 200.

[0023] The exposure device 13 irradiates the photosensitive drum 11 with light emitted from a light source in accordance with input image data. Before the exposure device 13 irradiates the photosensitive drums 11 with light, the surfaces of the photosensitive drums 11 are charged by the chargers 12. After the charging, the exposure device 13 irradiates the surfaces with light. As a result, an electrostatic latent image is formed on the surfaces of the photosensitive drums 11. Next, development is performed by the developing device 14, and the toner contained in the developer adheres to the photosensitive drum 11. As a result, a toner image is formed on the photosensitive drum 11. This toner image is transferred onto the intermediate transfer belt 15 at the primary transfer unit 10.

[0024] After the toner image is transferred onto the intermediate transfer belt 15, the toner image moves to the secondary transfer unit 20 as the intermediate transfer belt 15 moves. At this time, the paper P from the first paper storage unit 53 or the second paper storage unit 54 is transported to the secondary transfer unit 20 by the transport rolls 52 etc. Then, the toner images on the intermediate transfer belt 15 are electrostatically transferred onto the paper P all at once in the secondary transfer unit 20.

[0025] Thereafter, the paper P onto which the toner image has been transferred is peeled off from the intermediate transfer belt 15 and conveyed to the conveyor belt 55. The conveyor belt 55 conveys the paper P to the fixing device 60. The paper P conveyed to the fixing device 60 is heated and pressurized in the fixing device 60. As a result, the toner image on the paper P is fixed to the paper P. Then, the paper P is discharged from the image forming apparatus 100.

[0026] When toner images are formed on both sides of the paper P, the paper P is transported to branch path R2 after passing through fixing device 60. At this time, a toner image is formed on one side of the paper P. Thereafter, the paper P passes through secondary transfer unit 20 again. In the secondary transfer unit 20, a toner image is transferred to the other side of the paper P. Thereafter, the paper P passes through the fixing device 60 again, and the toner image transferred to the other side is fixed to the paper P.

[0027] The developing device 14 will now be described. FIG. 2 is a diagram of the developing device 14 as seen from above. When installed in image forming apparatus 100, developing device 14 is arranged along the depth direction of image forming apparatus 100. Developing device 14 has one end 141 and the other end 142 that are located at different positions in the longitudinal direction. When the developing device 14 is installed in the image forming apparatus 100, one end 141 is located on the rear side of the image forming apparatus 100, and the other end 142 is located on the front side of the image forming apparatus 100.

[0028] A driving force receiving portion 143 that receives a driving force is provided at one end 141 of the developing device 14. The driving force is transmitted to the driving force receiving portion 143 from a driving source (not shown) such as a motor provided on the main body side of the image forming apparatus 100. The driving force receiving portion 143 is interlocked with a transport member and the like (described later) provided inside the developing device 14. When a driving force from a drive source is transmitted to the driving force receiving portion 143, the transport member and the like rotate.

[0029] Fig. 3 is a cross-sectional view of the developing device 14 taken along line III-III in Fig. 2. Fig. 3 shows a cross-sectional view of the developing device 14 at the center in the longitudinal direction. The developing device 14 is provided with a unidirectional movement path 191 along which the developer moves in one direction. The developing device 14 is also provided with an opposite direction movement path 192 along which the developer moves in the opposite direction to the one direction. The opposite direction movement path 192 is disposed below the one direction movement path 191.

[0030] In the one-way movement path 191, the developer moves in a direction perpendicular to the paper surface of Fig. 3 and toward the back side of the paper surface. In the opposite-way movement path 192, the developer moves in a direction perpendicular to the paper surface of Fig. 3 and toward the front side of the paper surface. The one-way movement path 191 is provided with a one-way transport member 410 for transporting the developer. The one-way transport member 410 rotates around a rotation axis 411 extending along the one-way movement path 191. This rotation of the one-way transport member 410 moves the developer toward the depth of the paper surface of FIG.

[0031] A reverse direction transport member 420 that transports the developer is provided on the reverse direction movement path 192. The reverse direction transport member 420 is disposed below the one direction transport member 410. The opposite direction transport member 420 rotates around a rotation axis 421 extending along the opposite direction movement path 192. As a result, the developer transported by the opposite direction transport member 420 moves toward the front side of the paper surface of FIG. The opposite direction transport member 420 transports the developer in the opposite direction to the above-mentioned one direction.

[0032] Furthermore, a rotating body 430 is provided on the left side of the one-way transport member 410. The rotating body 430 is used to supply developer to the photosensitive drum 11, which is an example of an image carrier. Furthermore, the developing device 14 is provided with an opposing opening 480. The opposing opening 480 is disposed at a position opposite the photosensitive drum 11. A rotating body 430 is installed in the opposing opening 480. In this embodiment, a part of the rotating body 430 is exposed through this opposing opening 480. The rotating body 430 supplies the developer supplied to it from the one-way transport member 410 to the photosensitive drum 11. The rotating body 430 receives the developer supplied from the one-way transport member 410 and supplies the developer to the photosensitive drum 11. Rotating body 430 is made of a cylindrical body and is made of metal such as SUS.

[0033] Rotating body 430 rotates counterclockwise in the drawing around shaft center 431. Rotating body 430 moves the developer supplied from unidirectional transport member 410 and adhering to its outer circumferential surface to photosensitive drum 11. As a result, the developer is supplied to the photosensitive drum 11, and the toner contained in the developer adheres to the surface of the photosensitive drum 11. Furthermore, a first movement regulating portion 450 is provided between the rotating body 430 and the one-way transport member 410. The first movement regulating portion 450 regulates the movement of a portion of the developer that attempts to move from the one-way transport member 410 to the rotating body 430. In this embodiment, a part of the developer on the one-way movement path 191 passes over this first movement regulating portion 450. In this embodiment, the developer that has passed over the first movement regulating portion 450 is supplied to the rotating body 430.

[0034] Furthermore, below the rotating body 430, a lower conveying member 440 is provided. The lower transport member 440 is a rotary member that rotates around an axis 440A along the one direction. The lower transport member 440 is disposed closer to the photosensitive drum 11 than the opposite direction transport member 420. The lower transport member 440 transports the developer that has separated from the rotating body 430 in a direction perpendicular to the paper surface of FIG. 3 and toward the depth of the paper surface. The lower transport member 440 transports the developer that has separated from the rotating body 430 in the one direction, whereby the developer is supplied to one end side of the opposite direction transport member 420 (details will be described later).

[0035] Furthermore, a second movement regulating portion 452 is provided between the lower transport member 440 and the opposite direction transport member 420. The second movement regulating portion 452 regulates the movement of the developer from the opposite direction transport member 420 to the lower transport member 440. Further, a third movement restricting portion 453 is provided between the rotating body 430 and the opposite direction transport member 420. The third movement restricting portion 453 restricts the movement of the developer from the opposite direction transport member 420 to the rotating body 430.

[0036] Furthermore, a fourth movement restricting portion 454 is provided between the one-way conveying member 410 and the opposite-way conveying member 420. The fourth movement regulating portion 454 regulates the movement of developer from the one-way transport member 410 to the opposite-way transport member 420. The fourth movement regulating portion 454 also regulates the movement of developer from the opposite-way transport member 420 to the one-way transport member 410. Furthermore, a fifth movement restricting portion 455 is provided between the rotating body 430 and the lower transport member 440. The fifth movement restricting portion 455 restricts the movement of the developer from the lower transport member 440 to the rotating body 430.

[0037] Inside the rotor 430, a magnet roll 145B is provided. The magnet roll 145B is provided with five magnetic poles 121 to 125 arranged along the circumferential direction of the magnet roll 145B. The magnetic pole 121 is a pickup pole, and attracts the developer supplied from the one-way movement path 191. As a result, the developer adheres to the surface of the rotating body 430.

[0038] The magnetic poles 122 to 124 function as transport poles, and move the developer on the surface of the rotating body 430 downstream in the direction of rotation of the rotating body 430. In the rotation direction of rotor 430, opposing restriction portion 127 is provided downstream of magnetic pole 122 and upstream of magnetic pole 123. Opposing restriction portion 127 is arranged at an opposing position on the outer circumferential surface of rotor 430. Counter regulating portion 127 is disposed with a gap between it and rotating body 430. Counter regulating portion 127 regulates the movement of a portion of the developer adhering to the surface of rotating body 430. As a result, the thickness of the developer adhering to the surface of rotating body 430 becomes a predetermined thickness.

[0039] The developer on the surface of the rotating body 430 moves downstream in the rotation direction of the rotating body 430. Thereafter, the developer moves to the surface of the photosensitive drum 11, and the toner contained in the developer adheres to the photosensitive drum 11. As a result, development is carried out and a toner image is formed on the surface of the photosensitive drum 11. This toner image is temporarily held by the photosensitive drum 11. Then, this toner image is moved to the primary transfer unit 10 (see FIG. 1) by the rotating photosensitive drum 11. Then, this toner image is transferred to the intermediate transfer belt 15.

[0040] The magnetic pole 125 (see FIG. 3) serves as a pick-off pole. The magnetic pole 125 generates a repulsive magnetic field, which separates the developer adhering to the surface of the rotating body 430 from the rotating body 430. The magnetic pole 125 separates the developer that has not been transferred to the photosensitive drum 11 from the rotating body 430 . The developer separated from the rotating body 430 moves downward and reaches the downward movement path 193 . The developer that has reached the downward movement path 193 is moved toward one end 141 (see FIG. 2) of the developing device 14 by the downward transport member 440. Then, the developer moves to the opposite direction movement path 192 (details will be described later).

[0041] FIG. 4 is a cross-sectional view of the developing device 14 taken along line IV-IV in FIG. FIG. 4 shows a cross section of the other end 142 of the developing device 14. An upward movement path 196 arranged along the vertical direction is provided at the other end 142 of the developing device 14. The developer that has moved through the opposite direction movement path 192 passes through this upward movement path 196 and heads toward the one-way movement path 191. In this embodiment, the developer accumulates at the end of the opposite direction movement path 192 located on the downstream side in the direction of movement of the developer. In this embodiment, the developer accumulated at this end is pressed by the developer sequentially conveyed from the upstream side. As a result, the developer accumulated at this end moves upward through the upward movement path 196. As a result, the developer on the opposite direction movement path 192 passes through the upward movement path 196 and heads toward the one direction movement path 191 .

[0042] Fig. 5 is a cross-sectional view of the developing device 14 taken along line VV in Fig. 2. Fig. 6 is a cross-sectional view of the developing device 14 taken along line VI-VI in Fig. 5. FIG. 5 shows a cross section of one end 141 of the developing device 14. As shown in FIG. 5, one end 141 of the developing device 14 is provided with a downward movement path 197 that is arranged along the up-down direction. The developer that has moved through the one-way movement path 191 passes through this downward movement path 197 and heads toward the opposite-way movement path 192 .

[0043] 5 and 6, a connecting path 190 is provided in this embodiment. The connecting path 190 extends in the horizontal direction and connects the downward movement path 193 and the opposite direction movement path 192. In this embodiment, the developer is moved along the downward movement path 193 by the lower conveying member 440. Then, the developer that has moved along the downward movement path 193 passes through the connecting path 190 and moves to the opposite direction movement path 192.

[0044] In this embodiment, the developer accumulates at the end of the downward movement path 193 that is located downstream in the direction of movement of the developer. In this embodiment, the developer accumulated at this end is pressed by the developer sequentially conveyed from the upstream side, causing the developer accumulated at this end to move through the connecting path 190 to the opposite direction movement path 192.

[0045] In this embodiment, the developer moves along a one-way movement path 191 (see FIG. 3) and an opposite-way movement path 192. As a result, in this embodiment, the developer moves circulatingly. In this embodiment, a part of the developer moving along the one-way movement path 191 is supplied to the rotating body 430. This developer is supplied to the photosensitive drum 11 via the rotating body 430. The developer that has not been supplied to the photosensitive drum 11 and remains on the surface of the rotating body 430 separates from the rotating body 430 and moves to the downward movement path 193. Then, this developer moves to the opposite direction movement path 192 via the downward movement path 193.

[0046] 2, the developing device 14 is provided with a first receiving port 151 for receiving the developer. The developing device 14 receives the developer sent from the supply device 70 through the first receiving port 151. As shown in FIG. 5, the developer sent from the supply device 70 enters the inside of the developing device 14 through the first receiving port 151. In this embodiment, a second receiving port 152 is provided at a location indicated by reference symbol 2A in FIG.

[0047] In this embodiment, a user can manually supply new developer to the developing device 14 using a jig (not shown). When the user manually supplies new developer, the user first peels off the blocking member 153. Then, the user supplies the developer to the developing device 14 through the second receiving port 152 that appears when the blocking member 153 is peeled off. Furthermore, as shown in FIG. 3, the developing device 14 of this embodiment is provided with an opposing opening 480 in which the rotating body 430 is installed. In this embodiment, a first receiving port 151, a second receiving port 152, and an opposing opening 480 are provided as openings.

[0048] In this embodiment, the developing device 14 is not provided with any openings other than the first receiving opening 151, the second receiving opening 152, and the opposing opening 480. The developing device 14 of this embodiment is provided with a connection opening, which is an opening that connects the inside and outside of the developing device 14. In this embodiment, the developing device 14 is not provided with any connection openings other than the first receiving opening 151, the second receiving opening 152, and the opposing opening 480.

[0049] In this embodiment, the internal pressure of the developing device 14 is released not through a connection opening provided in the developing device 14 but through an opening provided in the supply device 70 . In this embodiment, the developer adhering to the surface of the rotating body 430 is returned to the inside of the developing device 14 without being transferred to the photosensitive drum 11. At this time, air outside the developing device 14 is taken into the inside of the developing device 14. As a result, the internal pressure of the developing device 14 increases.

[0050] As the internal pressure of the developing device 14 increases, gas tends to move from the inside to the outside of the developing device 14. In this embodiment, the gas that tries to move from the inside to the outside of the developing device 14 is directed toward the supply device 70 (see FIG. 1). Then, this gas is discharged to the outside of the supply device 70 through an opening (not shown in FIG. 1) provided in the supply device 70. The gas may be, for example, air.

[0051] When the gas is discharged only through the connection opening provided in the developing device 14, the gas in a high pressure state is easily discharged. In contrast to this, in this embodiment, the gas is discharged through an opening provided in the supply device 70 that is separated from the developing device 14. In this case, the gas in a relaxed pressure state is discharged through the opening. When the gas in a relaxed pressure state is discharged, the amount of developer that attempts to move to the outside through the opening provided in the supply device 70 is reduced. In this case, the filter installed in the opening is less likely to become dirty, and the life of the filter can be extended.

[0052] It should be noted that this does not mean that a connecting opening may be provided in the developing device 14. A connecting opening may be provided in the developing device 14, and an opening may also be provided in the supply device 70. In this case, the gas inside the developing device 14 is discharged to the outside of the developing device 14 through the connection opening. In this case, the gas inside the developing device 14 is discharged to the outside of the developing device 14 through an opening provided in the supply device 70.

[0053] 7 is a perspective view of the supply device 70 as seen from the rear side of the image forming apparatus 100. In FIG. 7, a state in which the developer container 80 is attached is shown. The developer storage container 80 stores, for example, unused developer. In this embodiment, the developer storage container 80 is detachable from the image forming apparatus 100 (see FIG. 1). The developer storage container 80 is attached to an attachment portion 701 of the supply device 70.

[0054] When the developer container 80 is attached to the image forming apparatus 100, the developer container 80 moves in the direction indicated by the arrow 7A in FIG. The developer storage container 80 is formed in a cylindrical shape. Specifically, the developer storage container 80 is formed in a cylindrical shape. However, the shape of the developer storage container 80 is not limited to a cylindrical shape. The developer storage container 80 may also be formed in a prismatic shape.

[0055] When the developer storage container 80 is attached to the image forming apparatus 100, the supply device 70 is located below the developer storage container 80. In this embodiment, the supply device 70 supplies the developer from the developer storage container 80 to the developing device 14 (not shown in FIG. 7). The developer storage container 80 has one end 81 that is located at the front when the developer storage container 80 is attached to the image forming apparatus 100. The developer storage container 80 also has another end 82 that is located on the opposite side to the one end 81. A developer outlet is provided at the bottom of one end 81 of the developer storage container 80. The developer in the developer storage container 80 passes through this outlet and moves to the supply device 70 located below.

[0056] The feeding device 70 has one end 71 and another end 72 . One end 71 of the supply device 70 is located on the rear side of the image forming apparatus 100. The other end 72 of the supply device 70 is located on the front side of the image forming apparatus 100. The supply device 70 is provided at one end 71 side with a receiving port (not shown in FIG. 7) for receiving the developer from the developer storage container 80. In this embodiment, the developer is transported from the upstream side of the supply device 70 in the developer transport direction to the supply device 70. The supply device 70 is provided with a receiving port that receives the developer transported from the upstream side thereof.

[0057] The developer storage container 80 has a function of sending out the developer stored therein to the outside. Inside the developer storage container 80, a member for sending out the developer to the outside of the developer storage container 80 is provided. In the developer transport direction, the developer storage container 80 is located upstream of the supply device 70. The receiving port of the supply device 70 receives the developer supplied from the developer storage container 80 located upstream.

[0058] Furthermore, the supply device 70 is provided with a developer storage section 500 for storing the developer that has entered the supply device 70 through the receiving port. The developer supplied from the developer container 80 to the supply device 70 is temporarily stored in the developer storage section 500 . The developer storage section 500 temporarily stores the developer.

[0059] The developer moves through the inside of the developer storage section 500 and is then discharged from a discharge port 74 provided at one end 71 of the supply device 70 . The supply device 70 is provided with a discharge port 74 used to discharge the developer received at the receiving port. The developer discharged from the discharge port 74 is supplied to the developing device 14 (not shown in FIG. 7) located below the discharge port 74.

[0060] In this embodiment, a first receiving port 151 (see FIG. 2) provided in the developing device 14 is disposed directly below the discharge port 74 of the supply device 70. The developer discharged from the discharge port 74 moves into the developing device 14 through this first receiving port 151. In this way, the developer is supplied from the supply device 70 to the developing device 14.

[0061] The developer storage section 500 temporarily stores the developer. This allows the supply of developer from the supply device 70 to the developing device 14 even if the developer container 80 is removed. As the developer container 80 becomes empty, the developer container 80 is removed. In this embodiment, even if the developer container 80 is removed, the developer in the developer storage section 500 is supplied to the developing device 14.

[0062] This allows the supply of developer from the supply device 70 to the developing device 14 even if the developer container 80 is removed. In this case, it is possible to avoid an immediate stop of the image forming operation even when the developer storage container 80 is removed, and image formation can be continued until a new developer storage container 80 is attached.

[0063] The supply device 70 is provided with an opening 505 that connects the inside and outside of the supply device 70. The opening 505 is located at a position facing the outer circumferential surface 81A of the developer accommodating container 80 attached to the attachment portion 701. "Positioned at an opposing position" refers to a state in which opening 505 is positioned in a space positioned at an opposing position on outer peripheral surface 81A. Even if a member exists between opening 505 and outer peripheral surface 81A, this also falls under the category of "located at an opposing position." Also, even if opening 505 faces the opposite side to the side on which outer peripheral surface 81A is located, this also falls under the category of "located at an opposing position."

[0064] FIG. 8 is a diagram illustrating the developer storage unit 500. As shown in FIG. The developer storage unit 500 is provided with a developer flow path 510 through which the developer flows toward the developing device 14. The developer flow path 510 is provided so as to extend from the inside of the developer storage unit 500 toward the outside. A filling portion 511 is present above the developer flow path 510. In the filling portion 511, the developer is filled over the entire cross section of the developer flow path 510. In this specification, the "cross section" of the developer flow path 510 refers to the cross section of the developer flow path 510 in a plane perpendicular to the extension direction of the developer flow path 510.

[0065] A cylindrical portion 512 is provided around the filling portion 511. In this embodiment, the inside of this cylindrical portion 512 becomes the filling portion 511. On a cross section perpendicular to the axial direction of the cylindrical portion 512, the developer is filled throughout the entire inside of the cylindrical portion 512. As a result, the developer becomes dense on a cross section perpendicular to the axial direction of the cylindrical portion 512.

[0066] As a result, in this embodiment, a filled portion 511 is formed inside the cylindrical portion 512, where the developer is filled. In the configuration in which the filling portion 511 is formed, the amount of developer supplied from the supply device 70 to the developing device 14 per unit time is stabilized. If the filling portion 511 does not exist, the developer flowing toward the developing device 14 tends to vary in density. In this case, the amount of developer supplied from the supply device 70 to the developing device 14 per unit time tends to fluctuate.

[0067] In the developer transport direction, downstream of the filling portion 511, the developer flow path 510 changes direction and faces downward. The developer flow path 510 is provided with a horizontal flow path 513 extending in the horizontal direction and a vertical flow path 514 extending in the vertical direction. The developer that has passed through the filling portion 511 moves through the horizontal flow path 513 in a direction away from the filling portion 511. Thereafter, the developer moves downward through the vertical flow path 514. The developer falls in the vertical flow path 514.

[0068] An outlet 74 of the supply device 70 and a first inlet 151 of the developing device 14 are provided below the vertical flow path 514. The developer flowing downward through the vertical flow path 514 is supplied to the developing device 14. Furthermore, a gas flow path 530 is provided as a flow path through which gas that has flowed from the developing device 14 to the supply device 70 passes. The gas flow path 530 is provided separately from the developer flow path 510. In this embodiment, as described above, as the internal pressure of the developing device 14 increases, gas flows from the developing device 14 toward the supply device 70. The gas flowing from the developing device 14 to the supply device 70 enters the inside of the supply device 70 through the outlet 74 of the supply device 70 .

[0069] Thereafter, the gas flows upward through a vertical flow path 514, which is an example of a falling portion, and then enters a gas flow path 530 that is provided by branching off from the developer flow path 510. The gas that enters the gas flow path 530 flows toward an opening 505 provided in the supply device 70 and is discharged from this opening 505. A filter 506 is provided in the opening 505. In FIG. 8, the opening 505 is provided behind the filter 506.

[0070] 9(A) and (B) are diagrams showing the filling portion 511 and the gas flow path 530. FIG. Fig. 9(A) is a perspective view of the filling portion 511 and the gas flow path 530. Fig. 9(B) is a view of the filling portion 511 and the gas flow path 530 when viewed from the direction indicated by arrow IXB in Fig. 9(A). 9(A), the present embodiment is provided with a developer flow path 510. The developer flow path 510 runs from the inside of the developer storage unit 500 to the outside. A filling portion 511 is present on the developer flow path 510 and inside the cylindrical portion 512. Furthermore, a gas flow path 530 is provided above the cylindrical portion 512 in the figure. The gas flow path 530 is provided above the filling portion 511.

[0071] As shown in FIG. 8, the gas flow path 530 is provided in a form branching off from the developer flow path 510. There is a branching portion 98, which is an example of a branching point where the gas flow path 530 branches off from the developer flow path 510. This branching portion 98 is located downstream of the filling portion 511 in the developer transport direction. A gas flow path 530 branches off from the developer flow path 510 downstream of the filling portion 511 in the developer transport direction.

[0072] The gas flow path 530 branches off from the developer flow path 510 and then passes above the filling portion 511 as shown in FIG. 9(A). The gas passing through the gas flow path 530 passes above the filling portion 511. The gas passing through the gas flow path 530 passes through a portion other than the filling portion 511 and moves toward the upstream side in the moving direction of the developer. In the filling portion 511, the developer is dense and it is difficult for the gas to pass through. Therefore, in this embodiment, a gas flow path 530 for passing the gas is provided in a location other than the filling portion 511.

[0073] 8, the gas flow path 530 extends from the branching portion 98 toward the side where the cylindrical portion 512 is provided. The gas flow path 530 further passes above the cylindrical portion 512 and extends toward the upstream side in the moving direction of the developer. Then, as will be described later, the gas flow path 530 is again connected to the internal space of the supply device 70. In other words, the gas flow path 530 enters the internal space of the supply device 70. The gas flow path 530 is connected again to the space inside the supply device 70 on the upstream side of the filling portion 511 in the moving direction of the developer.

[0074] The gas flow path 530 is connected again to the internal space of the supply device 70 at a location other than the branching portion 98 . In this embodiment, there is a branching portion 98 where the gas flow path 530 branches off from the developer flow path 510. The gas flow path 530 is connected again to the internal space of the supply device 70 at a location separate from this branching portion 98.

[0075] 9(B), the gas from the developing device 14 first passes through a vertical flow path 514 provided as a part of the developer flow path 510. The vertical flow path 514 provided as a part of the developer flow path 510 is a falling portion through which the developer moves while falling. The gas from the developing device 14 passes through this vertical flow path 514, which is an example of a falling portion. The gas passes through this vertical flow path 514 and heads toward the upstream side in the moving direction of the developer. The gas flowing from the developing device 14 to the supply device 70 passes through the developer flow path 510. The gas passing through the developer flow path 510 then heads upstream in the direction of movement of the developer.

[0076] A filling portion 511 is provided on the developer flow path 510. In the filling portion 511, as described above, the developer is filled over the entire cross section of the developer flow path 510. Furthermore, above the developer flow path 510, a vertical flow path 514 is provided as an example of a drop portion. The vertical flow path 514 is located downstream of the filling portion 511 in the direction of movement of the developer.

[0077] Hereinafter, in this specification, a direction intersecting the vertical direction may be referred to as a "crossing direction." The filling section 511 and the vertical flow path 514 are arranged so that their positions in the intersecting direction are different from each other. The developer that has passed through the filling portion 511 advances in this intersecting direction and reaches the vertical flow path 514. In the vertical flow path 514, the developer falls and heads downward.

[0078] The gas flowing from the developing device 14 to the supply device 70 first passes through the vertical flow path 514 shown in FIG. 9(B) and then moves upward. The gas then enters the lateral flow channel 513, and then enters the gas flow channel 530 located above the lateral flow channel 513. The gas then passes through the gas flow channel 530 and moves leftward in the figure. 9(B), the gas flow path 530 extends in the horizontal direction. In other words, the gas flow path 530 extends in the cross direction. The gas flow path 530 is provided with a horizontal portion 531 that is a portion that extends in the horizontal direction.

[0079] 9(A), a slope 532 inclined relative to the horizontal direction is provided on the bottom surface of the lateral portion 531. This slope 532 is an inclination that increases toward the upstream side in the movement direction of the gas passing through the gas flow path 530. By providing the bottom surface with the slope 532, the developer is less likely to accumulate on this bottom surface. The developer that sits on the portion of the bottom surface of the gas flow path 530 where the slope 532 is provided slides and moves. As a result, the developer moves in the lower right direction in FIG. 9(A). On the downstream side in the lower right direction is located the lateral flow passage 513. The developer placed on the bottom surface of the gas flow passage 530 moves to this lateral flow passage 513.

[0080] 9(B), the cross-sectional area of ​​the vertical flow path 514, which is an example of a falling portion, is larger than the cross-sectional area of ​​the filling portion 511. In this embodiment, the cross-sectional area of ​​the vertical flow path 514 is 1.1 times or more the cross-sectional area of ​​the filling portion 511. This allows the gas from the developing device 14 to pass through the vertical flow path 514 more easily. If the cross-sectional area of ​​the vertical flow passage 514 is larger than the cross-sectional area of ​​the filling portion 511, the area of ​​the developer occupying the cross section of the vertical flow passage 514 becomes small. In this case, compared to when the cross-sectional area is the same, the area occupied by the developer in the cross section of the vertical flow path 514 becomes smaller. In this case, the gas from the developing device 14 can more easily pass through the vertical flow path 514.

[0081] 9(B), in a direction intersecting the vertical direction, a space 571 exists between the filling portion 511 and the vertical flow path 514. This space 571 is a space through which both the developer and the gas pass. The developer moving from the filling portion 511 to the vertical flow path 514 passes through this space 571. In addition, the gas moving from the vertical flow path 514 to the filling portion 511 side also passes through this space 571. In this embodiment, the cross-sectional area of ​​the space 571 is larger than the cross-sectional area of ​​the filling portion 511. The cross-sectional area of ​​the space 571 is also larger than the cross-sectional area of ​​the vertical flow path 514.

[0082] The cross-sectional area of ​​the space 571 refers to the cross-sectional area on an imaginary plane 9H along the vertical direction. The cross-sectional area of ​​the filling portion 511 refers to the cross-sectional area of ​​the inner region, which is the region located inside the inner circumferential surface of the cylindrical portion 512. The cross-sectional area of ​​the filling portion 511 refers to the cross-sectional area of ​​the inner region in a virtual plane perpendicular to the axial direction of the cylindrical portion 512. In this embodiment, the filling section 511 is provided with a central conveying member 526 having a rotation shaft 526A. In this case, the value obtained by subtracting the cross-sectional area of ​​rotating shaft 526A is set to the cross-sectional area of ​​filling portion 511. The value obtained by subtracting the cross-sectional area of ​​rotating shaft 526A from the cross-sectional area of ​​the inner region is set to the cross-sectional area of ​​filling portion 511. The central conveying member 526 will be described in detail later.

[0083] 21(A) and (B) are diagrams showing the cross-sectional state. Figure 21(A) shows a cross-sectional state of the filling portion 511. Note that in Figure 21(A), the protruding portion 526B of the central conveying member 526 is not shown. FIG. 21(B) shows a cross-sectional view in the case where the central conveying member 526 is not provided. It is not essential to provide the central conveying member 526 in the filling portion 511. If the central conveying member 526 is not provided in the filling portion 511, the cross section of the filling portion 511 will be in the state shown in Figure 21(B).

[0084] 21(B), the "cross-sectional area of ​​the filling portion 511" basically refers to the cross-sectional area of ​​the inner region 572. More specifically, it refers to the cross-sectional area of ​​the inner region 572 in a virtual plane perpendicular to the axial direction of the cylindrical portion 512. The inner region 572 is a region located inside the inner circumferential surface 512A of the cylindrical portion 512 and surrounded by this inner circumferential surface 512A.

[0085] On the other hand, when a central conveying member 526 is provided as shown in FIG. 21(A), the cross-sectional area of ​​the rotating shaft 526A is also taken into consideration. When central conveying member 526 is provided, the cross-sectional area of ​​rotating shaft 526A is subtracted from the area of ​​inner region 572 (see FIG. 21(B)). The value obtained by subtracting the cross-sectional area of ​​rotating shaft 526A is then set as the cross-sectional area of ​​filling portion 511. In this embodiment, the cross-sectional area of ​​the vertical flow path 514 is larger than the cross-sectional area of ​​the filled portion 511 obtained as described above.

[0086] The cross-sectional area of ​​the vertical flow path 514 (see FIG. 9(B)) refers to the cross-sectional area in an imaginary plane perpendicular to the extension direction of the vertical flow path 514. In this embodiment, the imaginary plane perpendicular to the extension direction of the vertical flow path 514 is a horizontal plane. In this embodiment, the cross-sectional area of ​​the vertical flow path 514 refers to the cross-sectional area in the horizontal plane. In other words, the cross-sectional area of ​​the vertical flow path 514 refers to the cross-sectional area in a virtual plane perpendicular to the moving direction of the developer. The "moving direction" here refers to the moving direction of the developer passing through the vertical flow path 514.

[0087] In this embodiment, the vertical flow path 514 is a flow path along the vertical direction. However, this is not limiting, and the vertical flow path 514 may be inclined with respect to the vertical direction. The vertical flow path 514 also includes a flow path that is arranged in a state inclined with respect to the vertical direction.

[0088] Fig. 10 is a perspective view of the developer accumulating section 500 as seen from above. Fig. 11 is an enlarged view of one end 500A of the developer accumulating section 500. FIG. 10 shows the developer storage unit 500 as viewed from the other end 500B side of the developer storage unit 500.

[0089] 10, the developer storage unit 500 is provided with a rectangular parallelepiped lower container 518. The developer supplied from the developer storage container 80 (not shown in FIG. 10) is first stored in this lower container 518. A one-way transport member 521 that transports the developer in one direction is provided inside lower container 518. Also, a reverse direction transport member 522 that transports the developer in the direction opposite to the one direction is provided inside lower container 518.

[0090] The one-way transport member 521 and the opposite-way transport member 522 are arranged parallel to each other. The one-way transport member 521 and the opposite-way transport member 522 are also arranged along the longitudinal direction of the lower container 518. Furthermore, a driving source such as a motor (not shown) is provided to drive the one-way transport member 521. Also, a driving source such as a motor (not shown) is provided to drive the opposite-way transport member 522.

[0091] The unidirectional conveying member 521 is made of a coil. In other words, the unidirectional conveying member 521 is made of a wire material bent into a spiral shape. A rod-shaped rotation shaft (not shown) is provided on the opposite direction conveying member 522. This rotation shaft is provided along the longitudinal direction of the lower container 518. Further, a protrusion 522A that protrudes from the outer circumferential surface of the rotating shaft is provided on the opposite direction conveying member 522. The protrusion 522A is disposed around the rotating shaft and is provided in a spiral shape.

[0092] The opposite direction conveying member 522 may be a conveying member made of a coil, similar to the one direction conveying member 521. Similarly to the opposite direction conveying member 522, the one-way conveying member 521 may be a conveying member having a rotation shaft and a spiral protrusion. Moreover, both the one-way transport member 521 and the opposite-way transport member 522 may be transport members made of coils. Moreover, both the one-way transport member 521 and the opposite-way transport member 522 may be transport members each having a rotation shaft and a spiral protrusion.

[0093] In this embodiment, the coil-shaped one-way transport member 521 rotates around a rotation axis along the axial direction of the one-way transport member 521. As a result, the developer gradually moves in the axial direction of the one-way transport member 521. More specifically, the developer moves toward one end 521A of the one-way transport member 521 in the axial direction.

[0094] In this embodiment, the opposite direction conveying member 522 rotates around a rotation axis. As a result, the developer is pushed out by the protrusion 522A provided on the opposite direction transport member 522. In response to this, the developer moves in the axial direction of the opposite direction transport member 522. More specifically, the developer moves toward the other end 522B of the opposite direction transport member 522 in the axial direction.

[0095] Furthermore, inside the lower container 518, a one-way flow path 541 is provided, which is a flow path through which the developer moves in one direction. Furthermore, inside the lower container 518, there is provided an opposite direction flow path 542, which is a flow path through which the developer passes when moving in the opposite direction to the one direction. The one-way flow path 541 and the opposite-direction flow path 542 are provided parallel to each other. The one-way flow path 541 and the opposite-direction flow path 542 are also provided along the longitudinal direction of the lower container 518.

[0096] A one-way transport member 521 is disposed in the one-way flow path 541. The developer transported by the one-way transport member 521 moves within the one-way flow path 541. The opposite direction transport member 522 is disposed in the opposite direction flow path 542. The developer transported by the opposite direction transport member 522 moves within the opposite direction flow path 542.

[0097] Furthermore, a one end side connecting flow path 543 is provided. The one-end-side connecting flow path 543 is provided at one end 500A of the developer storage unit 500 and inside the lower container 518. The one-end-side connecting flow path 543 connects one end 541A of the one-way flow path 541 and one end 542A of the opposite-direction flow path 542. Also, the other end side connecting flow path 544 is provided. The other-end-side connecting flow path 544 is provided at the other end 500B of the developer storage portion 500 and inside the lower container 518. The other-end-side connecting flow path 544 connects the other end 541B of the one-way flow path 541 and the other end 542B of the opposite-direction flow path 542.

[0098] Furthermore, as shown in FIG. 10, the lower container 518 is provided with an annular wall portion 550 inside, which is a wall portion provided in an annular shape. When the lower container 518 is viewed from above, the annular wall portion 550 has an annular shape. When the lower container 518 is viewed from above, the annular wall portion 550 has a rectangular shape. The annular wall portion 550 is provided between the one-way flow path 541 and the opposite-way flow path 542. The annular wall portion 550 is also provided between the one-end side connecting flow path 543 and the other-end side connecting flow path 544.

[0099] 10, the annular wall portion 550 is provided so as to protrude upward from the bottom surface of the lower container 518. Furthermore, the annular wall portion 550 is provided so as to extend along the longitudinal direction of the lower container 518. A one-way flow path 541 and an opposite-way flow path 542 are provided around the annular wall portion 550. Also, a one-end side connecting flow path 543 and an other-end side connecting flow path 544 are provided around the annular wall portion 550.

[0100] In this embodiment, the developer is transported by one-way transport member 521 and opposite-way transport member 522. The transported developer moves through a space located around annular wall portion 550 within the space inside lower container 518. The transported developer passes through one-way flow passage 541 and then reaches one-end side connecting flow passage 543. Thereafter, the developer moves from one-end side connecting flow passage 543 to opposite-direction flow passage 542. Next, the developer passes through opposite-direction flow passage 542 and moves to other-end side connecting flow passage 544. Then, the developer passes through other-end side connecting flow passage 544 and moves to one-way flow passage 541.

[0101] The transported developer circulates by moving along the periphery of the annular wall portion 550. In this embodiment, an annular circulation flow path 590 is provided around the annular wall portion 550, through which the developer circulates. A circulation flow path 590 as an example of an annular flow path is made up of a one-way flow path 541, a one-end side connecting flow path 543, an opposite-way flow path 542, and an other-end side connecting flow path 544.

[0102] The developer transported by the one-way transport member 521 flows toward one end 541A of the one-way flow path 541. Then, this developer reaches one end 541 A. Furthermore, the developer is sequentially transported by one-way transport member 521 from the upstream side to one end 541 A. The developer that has reached the one end 541A is pressed by the developer transported from the upstream side, whereby the developer that has reached the one end 541A moves to the one end side connecting flow path 543. Then, the developer moves through the one end side connecting flow path 543 to the opposite direction flow path 542 .

[0103] The developer that has moved to the opposite direction flow path 542 moves toward the other end 542B of the opposite direction flow path 542. The developer that has moved to the opposite direction flow path 542 is moved toward the other end 542B by the opposite direction transport member 522. As a result, the developer reaches the other end 542B. The developer that reaches the other end 542B of the opposite direction flow passage 542 flows toward the other end side connecting flow passage 544.

[0104] In this embodiment, the developer is sequentially transported from the upstream side to the other end 542B by the opposite direction transport member 522. The developer that reaches the other end 542B is pressed by the developer sequentially transported from the upstream side to the other end 542B. As a result, the developer enters the other end side connecting flow path 544. Thereafter, the developer reaches the one-way flow path 541. As a result, in this embodiment, the developer moves around the annular wall portion 550. In other words, the developer moves along the circulation flow path 590. As a result, in this embodiment, the developer circulates.

[0105] The annular wall portion 550 is made up of four wall portions. The annular wall 550 is provided with two axial walls 551 . The two axial wall portions 551 are aligned along the axial direction of the one-way conveying member 521. The two axial wall portions 551 are aligned along the axial direction of the opposite-direction conveying member 522. The two axial wall portions 551 are disposed opposite to each other, and are also disposed parallel to each other.

[0106] 11, the annular wall portion 550 is provided with a one-end side wall portion 552. The one-end side wall portion 552 is located at one end in the longitudinal direction of the annular wall portion 550. The one-end side wall portion 552 connects the two axial wall portions 551. 10, the annular wall portion 550 is provided with an other end side wall portion 553. The other end side wall portion 553 is located at the other end in the longitudinal direction of the annular wall portion 550. The other end side wall portion 553 connects the two axial direction walls 551.

[0107] 11, an opening 507 through which the gas flow path 530 passes is provided at one end 500A of the developer storage unit 500. The gas from the developing device 14 passing through the gas flow path 530 passes through this opening 507. Furthermore, as shown in FIG. 10, an upwardly extending wall portion 519 is provided. The wall portion 519 is provided above one side wall 518A extending along the longitudinal direction of the lower container 518.

[0108] Lower container 518 has four side walls, and side wall 518A extends along the longitudinal direction of lower container 518. Wall portion 519 is provided above side wall 518A extending along the longitudinal direction of lower container 518. The wall portion 519 is provided so as to extend along the longitudinal direction of the lower container 518 . The wall portion 519 is provided with an opening 505 used to exhaust gas that has flowed from the developing device 14. The opening 505 allows the inside and outside of the supply device 70 to communicate with each other.

[0109] A plurality of openings 505 are provided. The plurality of openings 505 are arranged in the longitudinal direction of the lower container 518. Furthermore, each of the openings 505 is provided so as to extend in the axial direction of the developer accommodating container 80 that is to be mounted in the mounting portion 701 (see FIG. 7). The gas that has passed through the gas flow path 530 (see FIG. 11) is finally discharged to the outside of the supply device 70 from this opening 505.

[0110] As shown in FIG. 11, an inner wall space 556, which is a space located inside the annular wall 550, is provided inside the annular wall 550. In this embodiment, the gas that has flowed through the gas flow path 530 then enters this wall space 556 as shown by arrow 11A. Thereafter, the gas passes through the wall space 556 and flows toward the other end 500B of the developer storage section 500 (see FIG. 10). The gas then flows toward one-way flow path 541 as shown by arrow 10E in FIG. The gas then moves along wall 519, as shown by arrow 10F, toward opening 505 formed in wall 519. The gas then moves through opening 505 to the outside of supply device 70.

[0111] As shown in FIG. 11, the developer storage section 500 is provided at one end 500A with the filling portion 511 described above. Furthermore, there is also provided a central conveying member 526 that passes through this filling portion 511. The central conveying member 526 is provided in the center of the lower container 518 in the short side direction of the lower container 518. The central transport member 526 is disposed between the one-way transport member 521 and the opposite-way transport member 522. The central transport member 526 is provided along the longitudinal direction of the lower container 518. Furthermore, a drive source (not shown) such as a motor for driving the central transport member 526 is provided.

[0112] The central conveying member 526 includes a rod-shaped rotating shaft 526A and a protruding portion 526B. Protrusion 526B is arranged around rotation shaft 526A in a spiral shape and protrudes from the outer circumferential surface of rotation shaft 526A. In this embodiment, the central transport member 526 is rotated around the rotation shaft 526A by the drive source, whereby the developer is pushed out by the protrusion 526B, and the developer moves in the axial direction of the central transport member 526. In this embodiment, the developer in the one end side connecting flow path 543 is sent to the filling portion 511 by the central transport member 526 .

[0113] The developer transported by the one-way transport member 521 accumulates in the one-end side connection flow path 543 . Between the filling portion 511 and the one end side wall portion 552, a space 94 (hereinafter referred to as the "pre-filling space 94") is provided. The one end side connecting flow path 543 passes through this pre-filling space 94. In the pre-filling space 94, the developer transported by the one-way transport member 521 accumulates.

[0114] In this embodiment, the developer accumulated in the pre-filling space 94 is pushed into the filling portion 511 by the central conveying member 526. As a result, the developer is filled into the filling portion 511, and then the developer is supplied downstream. The developer that has passed through the filling portion 511 flows toward a horizontal flow path 513 (see FIG. 9B) located downstream of the filling portion 511. Thereafter, the developer flows toward the developing device 14 through a vertical flow path 514.

[0115] As shown in FIG. 10, the central conveying member 526 is provided from one end to the other end of the lower container 518 in the longitudinal direction. Furthermore, central conveying member 526 is provided so as to pass through inside annular wall portion 550. In other words, central conveying member 526 is provided so that a portion of it is located in intra-wall space 556. 11, a groove 552A is formed in one end side wall portion 552 of the annular wall portion 550. The central conveying member 526 passes through this groove 552A.

[0116] The one end side wall portion 552 is provided to prevent the developer from entering the wall portion intra-space 556. More specifically, the developer in the pre-filling space 94 is prevented from entering the wall portion intra-space 556. 10, an opening 553A is provided in the side wall portion 553 at the other end of the annular wall portion 550. The central conveying member 526 is provided so as to pass through this opening 553A. In this embodiment, the other-end side wall portion 553 is provided, thereby preventing the developer from entering the wall portion inner space 556. More specifically, the developer in the other-end side connection flow path 544 is prevented from entering the wall portion inner space 556.

[0117] FIG. 12 is a diagram showing a state in which an upper member 561 is attached onto the lower container 518. In the supply device 70 , an upper member 561 is attached on top of the lower container 518 . The upper member 561 includes a blocking portion 562. The blocking portion 562 is provided to extend in the horizontal direction. The blocking portion 562 blocks a part of the opening 518X located at the top of the lower container 518.

[0118] The upper member 561 further includes a wall portion 563 . The wall portion 563 is connected to the closing portion 562. The wall portion 563 is provided so as to extend upward from the closing portion 562. The wall portion 563 is provided so as to face the wall portion 519 provided in the lower container 518. A gap is provided between the wall portion 563 and the wall portion 519 to allow gas to pass through. In other words, a space (described later) for passing gas is provided between wall portion 563 and wall portion 519.

[0119] The gas passes through an opening 507 provided at one end 500A of the developer reservoir 500 (see FIG. 11). The gas that passes through the opening 507 moves as shown by arrow 12A in FIG. The gas that has passed through the opening 507 passes through the gap between the lower container 518 and the upper member 561, as indicated by an arrow 12A. The gas then flows toward the other end 500B of the developer storage section 500. The gas flow path 530 (see FIG. 11) is provided between the lower container 518 and the upper member 561 (not shown in FIG. 11).

[0120] The gas that has passed through the opening 507 passes through this gas flow path 530 located between the lower container 518 and the upper member 561. Then, the gas flows toward the other end 500B of the developer storage section 500, as shown by an arrow 12A in FIG. The gas then enters the wall space 556 as indicated by arrow 11A in Figure 11. The gas then passes through the wall space 556 and flows toward the other end 500B (see Figure 12) of the developer storage section 500.

[0121] Thereafter, the gas flows toward the one-way flow path 541 through the recess 561C provided in the lower surface of the upper member 561 (see FIG. 12). The gas then passes above this one-way flow path 541 and moves to the space located between wall portion 563 and wall portion 519 . The gas then moves upward through this space and then out of the supply device 70 through the opening 505 (see FIG. 10) formed in the wall 519.

[0122] Fig. 13 is a cross-sectional view of the supply device 70 taken along line XIII-XIII in Fig. 7. Note that in Fig. 13, the developer storage container 80 shown in Fig. 7 is omitted. The gas flow in the supply device 70 will be further explained with reference to FIG. In this embodiment, first, gas from the developing device 14 (not shown in FIG. 13) enters the supply device 70. Then, the gas flows upward through the vertical flow path 514 that constitutes a part of the developer flow path 510. Thereafter, the gas passes through a gas flow path 530 that is provided in a form branching off from the developer flow path 510 and heads toward the other end 72 of the supply device 70 .

[0123] The gas flow path 530 is again connected to the internal space of the supply device 70 at the location indicated by reference numeral 13A. Below the location indicated by reference numeral 13A, there is an inner wall space 556 located inside the annular wall 550 (not shown in FIG. 13). The gas flow path 530 is connected at a location indicated by reference numeral 13A to an inner wall space 556 located inside the annular wall 550. This inner wall space 556 is a space located inside the supply device .

[0124] The gas flow path 530 then passes through the intra-wall space 556 . The wall portion inner space 556 is a space that is not positioned above the developer flow path 510. The wall portion inner space 556 is a space that is positioned at a location away from the developer flow path 510. The gas flow path 530 is connected to a wall space 556, which is a portion of the internal space of the supply device 70 that is not the developer flow path 510. The gas flow path 530 passes through this wall space 556.

[0125] The wall space 556 can be regarded as a non-flow path portion that is not a part of the developer flow path 510. The gas flow path 530 is connected to this non-flow path portion, which is a portion of the supply device 70 that is not the developer flow path 510. The gas flow path 530 passes through this non-flow path portion.

[0126] In this embodiment, as shown in FIG. 10, a circulation flow path 590 is provided as a part of the developer flow path 510. In this embodiment, it can also be said that the gas flow path 530 is connected to the enclosed space. In this embodiment, the gas flow path 530 passes through this enclosed space. The "enclosed space" refers to the space within the supply device 70 that is surrounded by the circulation flow path 590. In this embodiment, the wall space 556 corresponds to this enclosed space.

[0127] The gas flow path 530 is connected to this wall space 556 which is the space inside the supply device 70 . The circulation flow path 590 is disposed on an imaginary plane 850 (see FIG. 13) that extends along a direction intersecting the vertical direction. As shown by an arrow 11A in FIG. 11, the gas flow path 530 is connected to the wall interior space 556 from the upper side of the wall interior space 556.

[0128] The gas that enters the wall space 556 moves along the longitudinal direction of the wall space 556 . The gas flow path 530 passes through the intra-wall space 556. The gas flow path 530 is provided so as to extend in the longitudinal direction of the intra-wall space 556. Therefore, the gas that enters the intra-wall space 556 moves along the longitudinal direction of the intra-wall space 556. The gas flow path 530 flows toward the recess 561C (see FIG. 12) after passing through the wall inner space 556. The gas passing through the gas flow path 530 flows toward this recess 561C.

[0129] Thereafter, the gas flow path 530 passes through the upper part of the one-way flow path 541 and heads toward the opening 505 (see FIG. 10). After passing through the upper part of the one-way flow path 541, the gas flow path 530 passes between the wall portion 563 and the wall portion 519 and heads toward the opening 505. The gas in wall space 556 passes through recess 561C (see FIG. 12) and reaches the upper part of unidirectional flow path 541. Thereafter, the gas reaches opening 505 formed in wall 519 (see FIG. 10). Then, the gas passes through opening 505 and moves to the outside of supply device 70.

[0130] Figure 14 is a cross-sectional view of the supply device 70 taken along a plane perpendicular to the longitudinal direction of the developer container 80. In Figure 14, the developer container 80 is indicated by a broken line. The supply device 70 is provided with a protruding portion 76 that extends obliquely upward and has a hollow interior. In this embodiment, the protruding portion 76 is provided with an opening 505. In this embodiment, the lower container 518 is provided with a wall portion 519. The upper member 561 is also provided with a wall portion 563. In this embodiment, the protrusion 76 is formed by the wall portion 519 and the wall portion 563. The wall portion 563 and the wall portion 519 protrude upward. The wall portion 563 and the wall portion 519 are disposed so as to face each other.

[0131] In this embodiment, a part of the upwardly extending protrusion 76 is located to the side of the developer container 80 . The protruding portion 76 has a facing surface 761 that faces the developer accommodating container 80. The protruding portion 76 also has an opposite surface 762 that is located on the opposite side to the facing surface 761. An opening 505 is provided on an opposite surface 762 of the multiple surfaces of the protruding portion 76. The opening 505 is provided in a manner facing away from the side on which the developer accommodating container 80 is installed. In this case, gas is more easily discharged from the opening 505 than when the opening 505 faces the side where the developer accommodating container 80 is installed. As described above, the filter 506 is installed at a position opposite the opening 505.

[0132] The supply device 70 is provided with a receiving port 79A for receiving the developer from the developer storage container 80. The supply device 70 is also provided with a discharge port 74 for discharging the developer. The opening 505 provided in the protruding portion 76 is provided above the receiving port 79A. Furthermore, the opening 505 is provided above the discharge port 74 which is provided below the receiving port 79A.

[0133] Furthermore, the opening 505 is provided at a position away from the developer flow path 510. The developer flow path 510 is provided inside the developer storage unit 500. The opening 505 is provided at a position away from the developer flow path 510 inside the developer storage unit 500. The filling portion 511 (not shown in FIG. 14) also constitutes a part of the developer flow path 510. In addition, a portion located downstream of the filling portion 511 in the moving direction of the developer also constitutes a part of the developer flow path 510. The opening 505 is provided at a location away from the developer flow path 510 .

[0134] Furthermore, the opening 505 is provided above the uppermost portion of the developer flow path 510. In this embodiment, the one-way flow path 541 is the uppermost portion of the developer flow path 510. The opposite-way flow path 542 is also the uppermost portion of the developer flow path 510. The filling portion 511 (not shown in FIG. 14) is also the uppermost portion of the developer flow path 510. The lateral flow path 513 (not shown in FIG. 14) is also the uppermost portion of the developer flow path 510. The opening 505 is located above the uppermost portion of the developer flow path 510 .

[0135] An opening 505 provided in the protruding portion 76 is an opening that allows the inside and outside of the supply device 70 to communicate with each other. The supply device 70 is provided with an opening 505 in addition to the receiving port 79A and the discharge port 74. The gas flowing from the developing device 14 is discharged to the outside of the supply device 70 through this opening 505.

[0136] 15 is a diagram showing the flow of gas when the supply device 70 is viewed from above. In FIG. 15, the upper member 561 and the like are not shown. The gas flowing from the developing device 14 passes through an outlet 74 provided in the supply device 70 and enters the inside of the supply device 70. The gas that has entered the inside of the supply device 70 passes through the vertical flow path 514 and then enters the gas flow path 530.

[0137] The gas then passes through the gas flow path 530 and heads toward the wall interior space 556. The gas then passes through the wall interior space 556 and heads toward the other end 72 of the supply device . The gas flow path 530 is provided so as to pass through the wall space 556. Therefore, the gas passes through the wall space 556 and heads toward the other end 72 of the supply device . The developer is not transported in the wall portion inner space 556. Therefore, the amount of developer in the wall portion inner space 556 is small.

[0138] Next, the gas flows from wall portion inner space 556 toward one-way flow channel 541. More specifically, the gas flows toward a location of one-way flow channel 541 other than one end 541A. The gas flowing toward one-way flow channel 541 flows toward a portion of one-way flow channel 541 that is located upstream of one end 541A. This "upstream side" refers to the upstream side in the direction of movement of the developer in one-way flow channel 541.

[0139] In this embodiment, as shown in FIG. 12, a recess 561C is provided on the lower surface of the upper member 561. 15, a connection flow path 594 that constitutes a part of the gas flow path 530 is provided at the location where this recess 561C is provided. The connection flow path 594 is a flow path that connects the wall portion inner space 556 and the one-way flow path 541.

[0140] As shown in FIG. 15, the connection flow path 594 is connected to the central portion 541C of the one-way flow path 541 in the longitudinal direction. 15, the connection flow path 594 is also connected to the other end portion 541T of the one-way flow path 541. The other end portion 541T is a portion located closer to the other end portion 541B than the central portion 541C.

[0141] Therefore, the gas that has passed through wall interior space 556 flows toward central portion 541C when heading toward one-way flow path 541. Furthermore, the gas that has passed through wall interior space 556 flows toward other end portion 541T when heading toward one-way flow path 541. The gas then passes through the space inside the protrusion 76 (see FIG. 14) and heads toward the opening 505 provided in the protrusion 76.

[0142] The developer transported by the unidirectional transport member 521 accumulates at one end 541A of the unidirectional flow path 541 (see FIG. 15). As a result, the height of the upper surface of the developer increases at this one end 541A. It is also possible to consider a mode in which the gas in wall portion space 556 passes above one end 541A and is directed toward opening 505. In this case, it becomes difficult for the gas to pass above one end 541A. In contrast, when the gas passes above the central portion 541C or above the other end portion 541T, the gas flows more easily. In this case, the gas passes through a portion where the height of the upper surface of the developer is low, and the gas flows more easily.

[0143] The central conveying member 526 is also provided in the wall space 556 . The central transport member 526, which is an example of a moving member, moves the developer accumulated in the wall space 556. Gas passing through the gas flow path 530 is supplied into the wall interior space 556. In this case, the developer contained in this gas accumulates in the wall interior space 556. The developer accumulated in the wall space 556 is transported to the pre-filling space 94 by the central transport member 526. The developer in the wall space 556 is discharged from the wall space 556.

[0144] The central transport member 526 transports the developer in the wall space 556 toward the pre-filling space 94 located above the developer flow path 510. A one-end side wall portion 552 (see FIG. 11) is provided at one end in the longitudinal direction of the wall portion inner space 556. This one-end side wall portion 552 is provided with a groove 552A. The developer transported by the central transport member 526 passes through this groove 552A and moves to the pre-fill space 94.

[0145] 10, the developer in the wall space 556 may be transported to the side where the other-end side wall 553 is provided. In this case, the developer passes through an opening 553A provided in the other-end side wall 553 and moves to the other-end side connecting flow path 544. Furthermore, the developer in the wall space 556 may be transported to both the one end side wall 552 side and the other end side wall 553 side. In this case, the central conveying member 526 is provided with two types of protrusions 526B that have different rotation directions.

[0146] Two types of protrusions 526B will be described. When two types of protrusions 526B are provided, one type of protrusion 526B is provided first. The one type of protrusion 526B is a protrusion that extends clockwise in the axial direction of the central conveying member 526 and in one direction. Another type of protrusion 526B is also provided. The other type of protrusion 526B is a protrusion that extends counterclockwise in the axial direction of the central conveying member 526 and in one direction. Moreover, one type of protrusion 526B is provided on the other end side wall 553 side, and the other type of protrusion 526B is provided on the one end side wall 552 (see FIG. 11).

[0147] In this case, the developer is moved to the one end side wall portion 552 (see FIG. 11) side by the other type of protrusion portion 526B. The developer located at the location where the other type of protrusion 526B is provided moves toward the one end side wall portion 552. Thereafter, this developer moves to the developer flow path 510. Furthermore, the one type of protrusion 526B moves the developer toward the other end side wall 553 (see FIG. 10). The developer located at the location where the one type of protrusion 526B is provided moves toward the other end side wall 553. Thereafter, this developer moves to the developer flow path 510.

[0148] The central transport member 526, which is an example of a moving member, moves the developer in the wall space 556 to the developer flow path 510. In other words, the central transport member 526 moves the developer in the gas flow path 530 to the developer flow path 510.

[0149] 13, the gas flow path 530 passes above the filling portion 511 and then connects to the intra-wall space 556. The gas flow path 530 then passes through the intra-wall space 556. In this case, the gas containing the developer passes through the wall space 556, and the developer accumulates in the wall space 556. The developer accumulated in the wall space 556 is moved to the developer flow path 510 by the central transport member 526 .

[0150] The central transport member 526 is disposed not only in the developer flow path 510 but also in the gas flow path 530. As a result, the developer in this gas flow path 530 also moves. As shown in FIG. 11, a portion of the central transport member 526 is provided in a one-end-side connecting flow path 543 that constitutes a part of the developer flow path 510 . In other words, a portion of the central transport member 526 is provided in the pre-filling space 94 located above the developer flow path 510. In this embodiment, this portion of the central transport member 526 also moves the developer within the developer flow path 510 .

[0151] The central transport member 526 is provided from the wall inner space 556 to the developer flow path 510. The central transport member 526 is disposed so as to extend to the developer flow path 510. In this embodiment, the developer in the developer flow path 510 is moved by the central transport member 526. The central transport member 526 moves the developer in the developer flow path 510 toward the filling portion 511.

[0152] In this embodiment, one central transport member 526 moves the developer located at each of the two locations. In this embodiment, the developer in the wall portion intra-space 556 is conveyed by one central conveying member 526. The developer in the pre-filling space 94 is also moved by this one central conveying member 526. However, the manner in which the developer moves is not limited to this. For example, a dedicated moving member may be provided for moving the developer in the wall portion inner space 556. Then, a dedicated moving member for moving the developer in the pre-filling space 94 may be provided separately from this moving member.

[0153] In this embodiment, as shown in FIG. 10, a circulation flow path 590 formed in an annular shape is provided as a part of the developer flow path 510. The gas flow path 530 passes through an enclosed space, which is a space enclosed by the circulation flow path 590, within the space inside the supply device 70. As described above, the enclosed space corresponds to the wall portion inner space 556. The gas flow path 530 passes through a location where an intra-wall space 556 is provided. In this embodiment, the central conveying member 526 is provided in this intra-wall space 556, which is an example of an enclosed space.

[0154] The central conveying member 526 will be further described with reference to FIG. 9(B). Central conveying member 526 is provided with cylindrical inner portion 526E located inside cylindrical portion 512. Central conveying member 526 is also provided with outer portion 526F located outside cylindrical portion 512.

[0155] In the developer transport direction, the external portion 526F is located downstream of the cylindrical portion inner portion 526E. The external portion 526F is located inside the lateral flow path 513 that constitutes a part of the developer flow path 510. In this embodiment, the developer transporting capacity of the outer portion 526F is greater than the developer transporting capacity of the cylindrical portion inner portion 526E.

[0156] The filling portion 511 is provided with an upstream transport portion that transports the developer toward the side where the vertical flow path 514 is located. In this embodiment, the cylindrical portion inner portion 526E corresponds to this upstream transport portion. Further, a downstream transport portion is provided downstream of the filling portion 511 to transport the developer that has passed through the filling portion 511 toward the vertical flow path 514. In this embodiment, the external portion 526F corresponds to this downstream transport portion. In this embodiment, the developer transporting capacity of the outer portion 526F is greater than the developer transporting capacity of the cylindrical portion inner portion 526E. In other words, in this embodiment, the developer transport capacity of the downstream transport section is greater than the developer transport capacity of the upstream transport section.

[0157] A protrusion 526B is provided on the cylindrical inner portion 526E, which functions as the upstream transfer portion, and also on the outer portion 526F, which functions as the downstream transfer portion. Hereinafter, protrusion 526B provided on cylindrical portion inner portion 526E will be referred to as an "internal protrusion." Also, protrusion 526B provided on external portion 526F will be referred to as an "external protrusion." In this embodiment, when comparing the outer diameters of the protrusions 526B, the outer diameter of the outer protrusion is larger than the outer diameter of the inner protrusion.

[0158] A rotation shaft 526A along the developer flow path 510 is provided in each of the cylindrical portion inner portion 526E and the outer portion 526F. Furthermore, each of the cylindrical portion inner portion 526E and the outer portion 526F is provided with a pushing portion for pushing out the developer. The pushing portion provided on the cylindrical portion inner portion 526E is configured by the above-mentioned inner protrusion, and the pushing portion provided on the outer portion 526F is configured by the above-mentioned outer protrusion. The pushing portion is provided around the rotation axis 526A and is provided in a spiral shape.

[0159] Each of the cylindrical portion inner portion 526E and the outer portion 526F uses a protruding portion 526B as an example of a pushing portion to push out the developer, and the developer is transported by this pushing. Here, the size of the arrangement pitch of the internal protrusions provided on cylindrical portion inner portion 526E is referred to as arrangement pitch P1, and the size of the arrangement pitch of the external protrusions provided on external portion 526F is referred to as arrangement pitch P2. In this specification, the term "arrangement pitch" refers to the distance between adjacent protrusions. In this embodiment, the arrangement pitch P2 is larger than the arrangement pitch P1. More specifically, in this embodiment, the arrangement pitch P2 is 1.1 times or more the arrangement pitch P1.

[0160] In this embodiment, the cylindrical portion inner portion 526E does not have two adjacent inner protrusions. In this case, the arrangement pitch P1 is determined using the protrusion 526B located immediately upstream of one of the internal protrusions located in the cylindrical portion inner portion 526E. In this case, the distance between the internal protrusion and the protrusion 526B located immediately upstream of this internal protrusion is defined as the arrangement pitch P1.

[0161] In this embodiment, the arrangement pitch P2 is larger than the arrangement pitch P1. In this case, the developer transport speed in the lateral flow passage 513 is higher than the developer transport speed in the cylindrical portion 512 . Here, the transport speed of the developer inside the cylindrical portion 512 is referred to as the "internal transport speed." Also, the transport speed of the developer in the lateral flow path 513 is referred to as the "external transport speed." In this embodiment, the external transport speed is higher than the internal transport speed.

[0162] The height of the upper surface of the developer located inside the cylindrical portion 512 is referred to as the "internal height." The height of the upper surface of the developer located in the lateral flow path 513 is referred to as the "external height." In this embodiment, the external height is smaller than the internal height. When the external transport speed is higher than the internal transport speed as in this embodiment, the external height is smaller than the internal height.

[0163] If the outer height is smaller than the inner height, the height of the upper surface of the developer is smaller than when the outer height is not smaller. Specifically, the height of the upper surface of the developer is smaller at the location where the outer portion 526F is provided. In this case, it becomes difficult for the developer located below the gas flow path 530 to enter the gas flow path 530. In this case, the cross-sectional area of ​​the gas flow path 530 becomes large.

[0164] Furthermore, if the external height is smaller than the internal height, the gas flows more easily in the vertical flow path 514 than if the external height is not smaller. When the external height is smaller than the internal height, the area occupied by the developer is reduced compared to when the external height is not smaller. Specifically, the area occupied by the developer in the cross section of the vertical flow path 514 is reduced. In this case, gas flows more easily upward through the vertical flow path 514.

[0165] The structure around the gas flow path 530 will be further described with reference to FIG. 9(B). The gas flow path 530 has an upstream end 530C at the right end in the figure. The upstream end 530C is the end located most upstream in the gas flow path 530 in the direction of gas movement. The vertical flow path 514 has an upstream end 514D and a downstream end 514C. The position of the upstream end 514D is different from the position of the downstream end 514C. The upstream end 514D and the downstream end 514C are located at different positions in the gas flow path 530 in the direction of gas movement. The upstream end 514D and the downstream end 514C are located at different radial positions of the vertical flow passage 514.

[0166] In the gas flow path 530, the upstream end 530C is located further upstream than the downstream end 514C in the gas movement direction. Here, the position of the upstream end 530C of the gas flow path 530 and the position of the downstream end 514C of the vertical flow path 514 are compared. In this embodiment, the upstream end 530C is located more upstream than the downstream end 514C. In the direction of gas movement in the gas flow path 530, the upstream end 530C is located more upstream than the downstream end 514C.

[0167] In FIG. 9(B), the direction of gas movement in the gas flow path 530 is from right to left in FIG. 9(B). When upstream end 530C is located more upstream than downstream end 514C, gas flows more easily. Gas flows more easily when upstream end 530C is located more downstream than downstream end 514C.

[0168] For example, assume that the upstream end 530C of the gas flow path 530 is located at the position indicated by the reference symbol 9X. That is, assume that the upstream end 530C is located downstream of the downstream end 514C of the vertical flow path 514. In this case, the flow path through which the gas flows becomes narrower, making it difficult for the gas to flow. In contrast to this, if upstream end 530C is positioned more upstream than downstream end 514C, the flow path through which the gas flows will be expanded, making it easier for the gas to flow.

[0169] In the above, an example has been described in which the cylindrical portion inner portion 526E and the outer portion 526F are configured from one common member. Specifically, the case where the cylindrical portion inner portion 526E and the outer portion 526F are configured by one central conveying member 526 has been described as an example. However, the present invention is not limited to this, and cylindrical portion inner portion 526E and outer portion 526F may be provided separately. A member that serves as cylindrical portion inner portion 526E and a member that serves as outer portion 526F may be provided separately.

[0170] The size of the arrangement pitch P1 of the protrusions 526B provided on the cylindrical portion inner portion 526E is compared with the size 9L of the inlet portion 514E. In other words, the size of the arrangement pitch P1 of the internal protrusions is compared with the size 9L of the inlet portion 514E. "Inlet portion 514E" refers to the inlet portion of vertical flow path 514. Also, "size 9L of inlet portion 514E" refers to the size in the moving direction of the developer when the developer from filling portion 511 reaches this inlet portion 514E.

[0171] In this embodiment, the size 9L of the inlet portion 514E is larger than the size of the arrangement pitch P1 of the internal protrusions. In this embodiment, the size 9L of the inlet portion 514E is 1.1 times or more the size of the arrangement pitch P1 of the internal protrusions. In this embodiment, the distance between the downstream end 514C and the upstream end 514D is equal to the size 9L.

[0172] As described above, there is a space 571 between the filling portion 511 and the vertical flow path 514, which is an example of a fall flow path. In the intersecting direction, which is a direction intersecting the vertical direction, the space 571 is located between the filling portion 511 and the vertical flow path 514. In this embodiment, both the developer and the gas pass through this space 571 . The developer moving from the filling portion 511 to the vertical flow path 514 passes through this space 571. Also, the gas moving from the vertical flow path 514 to the filling portion 511 side passes through this space 571.

[0173] The cross-sectional area of ​​this space 571 on a plane 9H along the vertical direction is defined as a cross-sectional area S1. The cross-sectional area S1 is larger than the cross-sectional area of ​​the filling portion 511. The cross-sectional area S1 of the space is also larger than the cross-sectional area of ​​the vertical flow path 514. Moreover, the cross-sectional area S1 of the space is larger than the sum of the cross-sectional area of ​​the filling portion 511 and the cross-sectional area of ​​the vertical flow path 514.

[0174] FIG. 16 is a diagram showing another example of the configuration of the supply device 70. In FIG. In this configuration example shown in FIG. 16, a moving member 800 for moving the developer accumulated in the gas flow path 530 is provided. 16 , in this embodiment, a part of the gas flow path 530 is located above the filling portion 511 and above the lateral flow path 513. The gas flow path 530 has an upper part which is located above the filling portion 511 and above the lateral flow path 513.

[0175] The moving member 800 moves the developer that accumulates in this upper portion of the gas flow path 530 . The transfer member 800 is disposed within this upper portion of the gas flow path 530 . The moving member 800 includes a rotating shaft 801 that is rotated by a driving source (not shown) such as a motor. The moving member 800 further includes a protruding portion 802. The protruding portion 802 protrudes from the outer circumferential surface of the rotating shaft 801 and is provided in a spiral shape.

[0176] The gas passing through the upper portion of the gas flow passage 530 contains the developer, so that the developer accumulates in this upper portion of the gas flow passage 530. 16, the moving member 800 rotates. As a result, the developer accumulated in the upper part of the gas flow path 530 moves to the right in the drawing. The developer moving to the right in the drawing falls downward and is supplied to the lateral flow path 513 located below. The moving member 800 moves the developer in the upper portion to the lateral flow path 513 that forms part of the developer flow path 510 .

[0177] Referring again to FIG. 11, the configuration of one end 500A of the developer storage section 500 will be further described. A regulating portion 95 is provided above one end portion 541A of the one-way flow path 541. The regulating portion 95 is made of a plate-shaped member. The regulating portion 95 regulates the developer in the one-way flow path 541 from moving upward. The developer accumulates at one end 541A of the one-way flow path 541. Accordingly, the height of the upper surface of the developer increases at this one end 541A and in the pre-filling space 94.

[0178] In this case, the developer is likely to enter the gas flow path 530 located above the pre-filling space 94. In this case, the gas may not easily flow in the gas flow path 530. In contrast to this, when the regulating portion 95 is provided, the upper surface of the developer in the pre-filling space 94 is less likely to face upward. In this case, the developer is prevented from entering the gas flow path 530. This makes it easier for the gas to flow through the gas flow path 530. The restricting portion 95 may be provided not only above the one end portion 541A of the one-way flow path 541 but also above the pre-filling space 94. In this case, the gas flow path 530 is provided above the restricting portion 95.

[0179] Second Embodiment FIG. 17 is a diagram illustrating a supply device 70 according to the second embodiment. The following description will focus on the differences from the first embodiment shown in FIGS. 17, the loading portion 511 is located on the other end 72 side of the feeding device 70. In other words, the loading portion 511 is located on the front side of the image forming apparatus 100.

[0180] Furthermore, in this supply device 70, an intermediate flow path 581 that constitutes a part of the developer flow path 510 is provided below the developer storage section 500. Furthermore, below the intermediate flow path 581, a lower flow path 582 that constitutes another part of the developer flow path 510 is provided.

[0181] An intermediate transport member 631 is provided in the intermediate flow path 581 to transport the developer in this intermediate flow path 581. A lower transport member 632 is provided in the lower flow path 582 to transport the developer in this lower flow path 582. Each of intermediate conveying member 631 and lower conveying member 632 includes a rotation shaft 633A. Additionally, each of intermediate conveying member 631 and lower conveying member 632 includes a protrusion 633B.

[0182] The protruding portion 633B is provided in a spiral shape and protrudes from the outer circumferential surface of the rotary shaft 633A. The protruding portion 633B functions as a pushing portion that pushes out the developer. Furthermore, the supply device 70 is provided with a drive source (not shown) for driving the intermediate conveying member 631 to rotate, and a drive source (not shown) for driving the lower conveying member 632 to rotate.

[0183] In the second embodiment, the developer that has passed through the filling portion 511 flows toward the lateral flow path 513. Thereafter, the developer reaches the intermediate flow path 581 located below the developer storage section 500. Then, the developer passes through the intermediate flow path 581 and flows toward the lower flow path 582 located below the intermediate flow path 581. The developer then passes through the lower flow passage 582 and heads toward one end 582A of the lower flow passage 582. Thereafter, the developer flows toward the discharge port 74 through the vertical flow path 514 that extends downward from one end 582A of the lower flow path 582.

[0184] In the second embodiment, a gas flow path 530 is provided at a location indicated by reference numeral 17A in the drawing. The gas flow path 530 is provided in a manner branching off from the developer flow path 510, as described above. Specifically, the gas flow path 530 is provided so as to branch off from the intermediate flow path 581. The gas flow path 530 extends from a branch portion 581X branching off from the intermediate flow path 581 toward the developer accumulation portion 500 located above. In the second embodiment, a portion extending in the vertical direction is provided in the gas flow path 530. In other words, the gas flow path 530 has a portion extending in the up-down direction. The gas flow path 530 may be arranged in a state inclined with respect to the vertical direction.

[0185] In the second embodiment, gas also enters the supply device 70 through the outlet 74 . Thereafter, the gas passes through the downstream portion 586 of the developer flow path 510 and heads upstream in the direction of movement of the developer. The gas flowing from the developing device 14 to the supply device 70 passes through the developer flow path 510 and heads upstream in the direction of movement of the developer.

[0186] Here, the "downstream portion 586" refers to a portion of the developer flow path 510 that is located downstream of the filling portion 511. Here, the direction of movement of the developer moving through the developer flow path 510 is assumed. The "downstream portion 586" refers to a portion located downstream of the filling portion 511 in the direction of movement. In the second embodiment, the downstream portion 586 is formed by the lateral flow path 513 and the intermediate flow path 581. The downstream portion 586 is also formed by the lower flow path 582 and the vertical flow path 514.

[0187] The gas that has entered the supply device 70 from the discharge port 74 flows upstream in the direction of movement of the developer. The gas passes through the downstream portion 586 and flows upstream in the direction of movement of the developer. The gas then enters the gas flow path 530 that branches off from the downstream portion 586 and flows upward.

[0188] The gas flow path 530 is provided by branching off from an intermediate flow path 581 that constitutes part of the downstream section 586. The gas enters the gas flow path 530 that is provided by branching off from the intermediate flow path 581 and flows upward. The gas then enters the wall space 556 defined in the developer accumulator 500 . The gas flow path 530 is connected to the wall space 556, which is an example of an enclosed space, from the bottom side of the wall space 556. In other words, the gas flow path 530 enters the wall space 556 from the bottom side. The gas flow path 530 heads leftward in the drawing after entering the wall space 556. Also, the gas flow path 530 heads rightward in the drawing after entering the wall space 556.

[0189] In the second embodiment, the downstream portion 586 has a larger developer transporting capacity than the filling portion 511. The loading section 511 is provided with a central conveying member 526 which passes through the loading section 511 . In the second embodiment, the developer transport capacity of the intermediate transport member 631 is greater than that of the central transport member 526. Also, the developer transport capacity of the lower transport member 632 is greater than that of the central transport member 526.

[0190] Hereinafter, the protrusion 526B provided on the portion of the central conveying member 526 located inside the filling section 511 will be referred to as an "internal protrusion." In the second embodiment, the outer diameter of the protrusion 633B provided on the intermediate conveying member 631 is larger than the outer diameter of the internal protrusion. Also, the outer diameter of the protrusion 633B provided on the lower conveying member 632 is larger than the outer diameter of the internal protrusion. Furthermore, the arrangement pitch of the protrusions 633B provided on the intermediate conveying member 631 is greater than the arrangement pitch of the internal protrusions. Also, the arrangement pitch of the protrusions 633B provided on the lower conveying member 632 is greater than the arrangement pitch of the internal protrusions.

[0191] Hereinafter, the movement speed of the developer moving through the filling portion 511 will be referred to as the "filling portion movement speed." Furthermore, the movement speed of the developer moving through the downstream portion 586 will be referred to as the "post-passage movement speed." In the downstream portion 586, the developer that has passed through the filling portion 511 moves at this post-passage movement speed. In this specification, the moving speed of the developer moving through the intermediate flow path 581 is referred to as the "intermediate portion moving speed." In addition, the moving speed of the developer moving through the lower flow path 582 is referred to as the "downstream portion moving speed."

[0192] In the second embodiment, the post-passage moving speed is greater than the filling portion moving speed. In the second embodiment, the intermediate section moving speed is higher than the filling section moving speed, and the downstream section moving speed is higher than the filling section moving speed. As a result, in the second embodiment, the height of the upper surface of the developer is reduced in the downstream portion 586. This facilitates the flow of gas toward the upstream side through the downstream portion 586. The developer is not filled over the entire cross section of the downstream portion 586.

[0193] Furthermore, in the second embodiment, the transport capacity of the lower transport member 632 is greater than the transport capacity of the intermediate transport member 631. Here, the outer diameter of the protruding portion 633B of the lower conveying member 632 and the outer diameter of the protruding portion 633B of the intermediate conveying member 631 are compared. In the second embodiment, the outer diameter of the protruding portion 633B of the lower conveying member 632 is larger than the outer diameter of the protruding portion 633B of the intermediate conveying member 631. Furthermore, the arrangement pitch of the protrusions 633B of the lower transport member 632 and the arrangement pitch of the protrusions 633B of the intermediate transport member 631 are compared. In the second embodiment, the arrangement pitch of the lower conveying member 632 is greater than the arrangement pitch of the intermediate conveying member 631.

[0194] In this case, the downstream section movement speed is greater than the intermediate section movement speed, and the height of the upper surface of the developer becomes even smaller in the lower flow passage 582. In this case, the gas flowing upstream through the lower flow passage 582 becomes even easier. In the second embodiment, the moving speed of the developer moving through the lower flow path 582 is higher than the moving speed of the developer moving through the intermediate flow path 581. In addition, the moving speed of the developer moving through the intermediate flow path 581 is higher than the moving speed of the developer moving through the filling portion 511.

[0195] Alternatively, the rotation speed of the intermediate conveying member 631 and the lower conveying member 632 may be set to be greater than the rotation speed of the central conveying member 526 . The rotation speed of the lower conveying member 632 may be set to be greater than the rotation speed of the intermediate conveying member 631 . In addition, both the following first setting and second setting may be performed. First setting: The rotation speed of the lower conveying member 632 is set to be greater than the rotation speed of the intermediate conveying member 631. Second setting: The rotation speed of the intermediate conveying member 631 is set to be greater than the rotation speed of the central conveying member 526 .

[0196] In the second embodiment, the gas entering the supply device 70 flows upstream in the direction of developer movement through the developer flow path 510. The gas then enters the gas flow path 530 that branches off from the developer flow path 510. More specifically, the gas that has entered the supply device 70 flows toward the upstream side in the moving direction of the developer through the downstream portion 586. The gas then enters the gas flow path 530 that branches off from the downstream portion 586. Thereafter, the gas passes through wall space 556 and the upper portion of one-way flow path 541 (not shown in FIG. 17), as described above. Furthermore, the gas passes through the space inside protrusion 76 (not shown in FIG. 17). Then, the gas reaches opening 505 (not shown in FIG. 17) and is discharged to the outside of supply device 70.

[0197] It can also be said that the supply device 70 is provided with a transport section that transports the developer in the developer flow path 510 downstream. As a part of the transport section, a cylindrical portion inner portion 526E as an example of an upstream transport section is provided. As described above, cylindrical portion inner portion 526E refers to the portion of central transport member 526 that is located inside cylindrical portion 512. Furthermore, as another part of the transport section, a lower transport member 632 as an example of a downstream transport section is provided. The cylindrical portion inner portion 526E is located on the upstream side in the developer transport direction. The lower transport member 632 is located on the downstream side in the developer transport direction relative to the cylindrical portion inner portion 526E.

[0198] The developer transport capacity of the cylindrical portion inner portion 526E and the developer transport capacity of the lower transport member 632 will be described. Hereinafter, the developer transport speed by the cylindrical portion inner portion 526E will be referred to as the “upstream transport speed.” Furthermore, the developer transport speed by the lower transport member 632 will be referred to as the “downstream transport speed.” In this embodiment, the developer transport capacity of the lower transport member 632 is greater than the developer transport capacity of the cylindrical portion inner portion 526E. In other words, in this embodiment, the downstream transport speed is greater than the upstream transport speed.

[0199] Each of the cylindrical portion inner portion 526E and the lower transport member 632 rotates around a rotation axis along the developer flow path 510 to transport the developer. In this embodiment, the rotation speed of the lower transport member 632 is higher than the rotation speed of the cylindrical portion inner portion 526E, so that the downstream transport speed is higher than the upstream transport speed in this embodiment.

[0200] The cylindrical portion inner portion 526E includes a rotation shaft 526A. The cylindrical portion inner portion 526E includes the rotation shaft 526A located within the filling portion 511 as a rotation shaft along the developer flow path 510. Rotation axis 526A, which is located inside filling portion 511, is provided along filling portion 511. Furthermore, cylindrical portion inner portion 526E includes spiral protrusion 526B provided around rotation axis 526A. Cylindrical portion inner portion 526E uses protruding portion 526B as an example of a pushing portion to push out the developer, thereby transporting the developer. Cylindrical portion inner portion 526E uses protruding portion 526B to transport the developer in filling portion 511.

[0201] The lower transport member 632 also has a rotation shaft that is aligned with the developer flow path 510. Specifically, the lower transport member 632 has a rotation shaft 633A that is aligned with the lower flow path 582. The lower transport member 632 also includes a spiral protrusion 633B provided around the rotation shaft 633A. The lower transport member 632 also uses the protruding portion 633B, which is an example of a pushing portion, to push out the developer and transport the developer.

[0202] The arrangement pitch of the protrusions 526B of the cylindrical portion inner portion 526E is set as an arrangement pitch P3. The arrangement pitch of the protrusions 633B of the lower conveying member 632 is set to an arrangement pitch P4. In this embodiment, the arrangement pitch P4 is larger than the arrangement pitch P3.

[0203] Furthermore, in this embodiment, the rotation speed of the lower conveying member 632 is greater than the rotation speed of the cylindrical portion inner portion 526E. The outer diameter of protrusion 526B of cylindrical portion inner portion 526E is defined as outer diameter G1, and the outer diameter of protrusion 633B of lower conveying member 632 is defined as outer diameter G2. In this embodiment, the outer diameter G2 is larger than the outer diameter G1.

[0204] As a result, in this embodiment, the developer transport capacity of the lower transport member 632 is greater. Here, the developer transporting capacity of the cylindrical portion inner portion 526E is referred to as the loaded portion transporting capacity. In this embodiment, the developer transporting capacity of the lower transport member 632 is greater than the filled portion transporting capacity. In this embodiment, the developer transport capacity of the lower transport member 632 is 3.4 times or more the transport capacity of the filled portion. When the developer width is 3.4 times or more, a space for passing gas is more easily formed in the lower flow path 582 than when the developer width is less than 3.4 times. In this embodiment, when the developer width is 3.4 times or more, the area of ​​the developer occupies 60% or less of the cross-sectional area of ​​the lower flow path 582. In this case, the gas can more easily pass through the lower flow path 582. "3.4 times or more" refers to the ratio of the amount of developer transported per unit time. Here, the amount of developer transported by cylindrical portion inner portion 526E per unit time is set to 1. In this embodiment, the amount of developer transported by lower transport member 632 per unit time is 3.4 or more.

[0205] In this embodiment, the branch portion 581X is provided downstream of the location where the cylindrical portion inner portion 526E is provided. The downstream side refers to the downstream side in the developer transport direction. The gas flow path 530 branches off from the developer flow path 510 downstream of the location where the cylindrical portion inside portion 526E is provided. In this embodiment, the gas enters the supply device 70 through the outlet 74. Then, the gas flows through the developer flow path 510 toward the upstream side in the developer transport direction. Then, the gas passes through the gas flow path 530.

[0206] The lower transport member 632 has a downstream end 632G, which is an end located downstream in the developer transport direction. The gas flow path 530 branches off from the developer flow path 510 upstream of the downstream end 632G in the developer transport direction. At the location where the cylindrical portion inner portion 526E is provided, the developer is filled over the entire cross section of the developer flow path 510. The developer is filled at the filling portion 511 where the cylindrical portion inner portion 526E is provided. In this embodiment, the gas flow path 530 branches off from the developer flow path 510 downstream of the location where the cylindrical portion inner portion 526E is located. In this case, the gas entering the supply device 70 moves around the filled portion 511, which is difficult for the gas to pass through.

[0207] In the above description, the upstream and downstream conveying portions are configured as separate components. The member that configures cylindrical portion inner portion 526E, which is the upstream conveying portion, is central conveying member 526. The member that configures the downstream conveying portion is lower conveying member 632. In this embodiment, the central conveying member 526 and the lower conveying member 632 are separate members.

[0208] However, the present invention is not limited to this, and it is also possible to consider a mode in which the members constituting the upstream transport section and the downstream transport section are integrated into one member. It is also possible to install the downstream transport section on an extension of the upstream transport section, in which case the components constituting the upstream transport section and the downstream transport section may be integrated into a single component. When they are formed as one member, the arrangement pitch of the protrusions on the downstream conveying section is made larger than the arrangement pitch of the protrusions on the upstream conveying section, and / or the outer diameter of the protrusions on the downstream conveying section is made larger than the outer diameter of the protrusions on the upstream conveying section. In this case, the developer transport capacity of the downstream transport section is improved, and also in this case, the gas can easily pass through the downstream transport section.

[0209] 9B can also be said to be a configuration in which an upstream transport section and a downstream transport section are provided, and in which the components constituting the upstream transport section and the downstream transport section are integrated into a single component. 9(B), the cylindrical portion inner portion 526E corresponds to the upstream transfer portion, and the outer portion 526F corresponds to the downstream transfer portion. In the first embodiment shown in FIG. 9B, the developer transport capacity of the downstream transport section is also greater than the developer transport capacity of the upstream transport section.

[0210] In the first embodiment shown in FIG. 9(B), the upstream transport section and the downstream transport section are configured as a single member. In the first embodiment shown in FIG. 9(B), one member, a central conveying member 526, is provided. A part of this central conveying member 526 is a cylindrical inner part 526E that functions as an upstream conveying part, and another part of this central conveying member 526 is an outer part 526F that functions as a downstream conveying part.

[0211] 17, as described above, the downstream portion 586 is provided. As described above, the downstream portion 586 refers to the portion of the developer flow path 510 that is located downstream of the filling portion 511. Here, it can be said that the first embodiment shown in FIG. 9(B) also has a downstream portion 586. In the first embodiment, the gas also passes through the downstream portion 586. The gas passes through this downstream portion 586 and heads toward the upstream side in the moving direction of the developer.

[0212] Also in the first embodiment, as described above, first, the gas enters the supply device 70 from the outlet 74 of the supply device 70. Then, the gas passes through the downstream portion 586 and heads toward the upstream side in the moving direction of the developer. In the first embodiment shown in FIG. 9(B), the downstream portion 586 is composed of a lateral flow path 513 and a vertical flow path 514.

[0213] 9(B), the gas that enters the supply device 70 from the discharge port 74 also passes through the downstream portion 586. The gas passes through the downstream portion 586 and heads toward the upstream side in the moving direction of the developer. The gas then enters the gas flow path 530 that is provided in a branched manner from the downstream portion 586, and moves to the left in the drawing. Then, as described above, the gas reaches the space within the wall portion 556 (not shown in FIG. 9(B)). Next, the gas reaches the one-way flow path 541, and then reaches the space within the protrusion 76. Thereafter, the gas flows toward the opening 505.

[0214] In the first embodiment, as described above, the upstream conveying section and the downstream conveying section are configured as a single member. In the first embodiment, the upstream conveying section is the cylindrical section inner portion 526E. The downstream conveying section is the outer portion 526F. In the first embodiment, as described above, the arrangement pitch P2 is larger than the arrangement pitch P1. Arrangement pitch P1 is the size of the arrangement pitch of the internal protrusions provided on cylindrical portion inner portion 526E, and arrangement pitch P2 is the size of the arrangement pitch of the external protrusions provided on external portion 526F. In the first embodiment as well, the transport capacity of the downstream transport section is greater than the transport capacity of the upstream transport section, and in the first embodiment as well, gas can easily pass through the location where the downstream transport section is installed.

[0215] The first embodiment shown in FIG. 9(B) will be further explained. Hereinafter, the developer transport capacity of the portion of central transport member 526 located in filling portion 511 will be referred to as the "filling portion transport capacity." In other words, the developer transport capacity of cylindrical portion inner portion 526E will be referred to as the "filling portion transport capacity." The developer transport capacity of the portion of the central transport member 526 located in the downstream portion 586 is referred to as the “post-passage transport capacity.” In other words, the developer transport capacity of the outer portion 526F is referred to as the “post-passage transport capacity.” In the first embodiment, the post-passage conveying capacity is greater than the packed portion conveying capacity. In the first embodiment, the post-passage moving speed is greater than the filling portion moving speed.

[0216] In this case, the height of the upper surface of the developer is lowered in the lateral flow path 513 that constitutes a part of the downstream section 586. In this case, the cross-sectional area of ​​the gas flow path 530 located above the lateral flow path 513 becomes larger. In the cross section of the lateral flow passage 513 that forms part of the downstream section 586, the developer is not filled over the entire cross section. Furthermore, if the post-passage transport capacity is greater than the filled portion transport capacity, the developer occupies a smaller area in the cross section of the vertical flow path 514. In this case, gas flows more easily in the vertical flow path 514.

[0217] 18(A) and (B) are diagrams illustrating the lower flow path 582. FIG. Figure 18(A) is a diagram showing a cross section of the lower flow path 582 taken along line XVIII-XVIII in Figure 17. In other words, Figure 18(A) is a diagram showing a cross section of the downstream portion 586 of the developer flow path 510. FIG. 18B is a diagram showing a cross section of the lower flow path 582 in a state where the lower conveying member 632 is not shown.

[0218] As shown in FIG. 18(A), the lower flow path 582 is provided with a lower transport member 632 as another example of a moving member. The lower transport member 632 rotates about a rotation axis 633A that is aligned with the lower flow path 582. As a result, the developer in the lower flow path 582 moves downstream. In this embodiment, as shown in FIG. 18, the cross section of the lower flow path 582 is non-circular.

[0219] 17, the lower flow passage 582 extends in the lateral direction. In other words, the lower flow passage 582 extends in the horizontal direction. In other words, the lower flow passage 582 is provided to extend in a direction intersecting the vertical direction. The cross section of this lower flow path 582 extending in the horizontal direction is as shown in FIG. 18(A).

[0220] In this embodiment, upper left portion 582G is convex in a direction away from rotation shaft 633A of lower conveying member 632. Upper left portion 582G is located at the upper left of outer circumferential edge 582F of lower flow path 582 in the figure. When such a convex portion is provided, a passage for gas is more easily secured than when no convex portion is provided. In this case, gas moves more easily through the lower flow path 582.

[0221] The convex portion is not limited to upper left portion 582G located at the upper left of outer circumferential edge 582F of lower flow path 582. Upper right portion 582H located at the upper right may be configured to be convex in the direction away from rotation axis 633A. Alternatively, both upper left portion 582G and upper right portion 582H may be convex. In other words, both of these portions may be convex in the direction away from rotation shaft 633A of lower conveying member 632. The cross section of lower flow path 582 may be U-shaped, in which case both upper left portion 582G and upper right portion 582H are convex.

[0222] FIG. 18B shows a cross section of the lower flow path 582 in a state where the lower conveying member 632 is not shown. In the cross section of lower flow path 582, there is an inner region 752, which is a region inside inner circumferential surface 582E of lower flow path 582. Inner region 752 is a region located inside inner circumferential surface 582E of inner flow path 582, and is surrounded by this inner circumferential surface 582E. Here, a horizontal line 584H extending along the cross section of the lower flow path 582 and passing through the rotation center 632C of the lower conveying member 632 is assumed. The horizontal line 584H is aligned along a direction perpendicular to the extension direction of the lower flow passage 582. The horizontal line 584H is aligned along the radial direction of the lower flow passage 582.

[0223] Furthermore, consider an upper portion 752A of inner region 752 that is located above horizontal line 584H, and a lower portion 752B of inner region 752 that is located below horizontal line 584H. In this embodiment, the area of ​​the upper portion 752A is larger than the area of ​​the lower portion 752B. In the cross section of lower flow path 582, part of inner circumferential surface 582E of lower flow path 582 protrudes in a direction away from rotation center 632C. Specifically, part of inner circumferential surface 582E, a portion positioned above horizontal line 584H, protrudes.

[0224] In this embodiment, upper left portion 582G protrudes in a direction away from rotation center 632C. At the location where upper left portion 582G is located, a part of inner circumferential surface 582E protrudes in a direction away from rotation center 632C. In this embodiment, due to this protrusion of part of inner circumferential surface 582E, the area of ​​upper portion 752A is larger than the area of ​​lower portion 752B.

[0225] FIG. 22 is a diagram showing a state of developer transport in the lower flow path 582. As shown in FIG. In the lower flow path 582, the developer is transported while being concentrated on one side in the width direction of the lower flow path 582. The width direction of the lower flow path 582 is synonymous with the direction perpendicular to the extension direction of the lower flow path 582 and parallel to the horizontal direction. In this embodiment, the developer is transported while being concentrated on one side in the width direction of the lower flow passage 582. In this case, the upper surface of the developer in the cross section of the lower flow passage 582 is inclined.

[0226] FIG. 23 is a cross-sectional view of the lower flow passage 582 taken along the line XXIII-XXIII in FIG. 23 shows a portion of protrusion 633B provided on lower conveying member 632 that is positioned below rotation shaft 633A. Hereinafter, this lower portion of protrusion 633B will be referred to as "lower portion 633C." The lower portion 633C is disposed in a state inclined with respect to the axial direction of the lower conveying member 632 and the radial direction of the lower conveying member 632.

[0227] Further, the lower portion 633C is inclined toward the downstream side in the developer transport direction as it approaches the other side. Furthermore, in this embodiment, the portion 633E located on the other side of the lower portion 633C passes below the rotation shaft 633A and approaches one side. In this embodiment, when the lower conveying member 632 rotates, the portion 633E located on the other side moves so as to approach one side. In this case, the developer is transported in a state where it is concentrated on one side of the lower flow path 582 in the width direction.

[0228] The explanation will be continued with reference to FIG. 18(B) again. The protruding portion of inner circumferential surface 582E of lower flow path 582 is located on the other side in the width direction of lower flow path 582. In addition, this portion is located above horizontal line 584H. 18A is located on the other side in the width direction of the lower flow path 582. Furthermore, the upper left portion 582G is located above the horizontal line 584H. In this embodiment, the upper left portion 582G located on the other side protrudes in a direction away from the rotation center 632C.

[0229] As shown in FIG. 18(A), a first gap 591 and a second gap 592 are further provided. The first gap 591 is located between the outer periphery 632H of the lower conveying member 632 and the inner periphery 582E of the lower flow path 582. The second gap 592 is also located between the outer periphery 632H of the lower conveying member 632 and the inner periphery 582E of the lower flow path 582.

[0230] Here, as shown in FIG. 23, a projection surface 632X that is perpendicular to the axial direction of the lower transport member 632 is assumed. Also, assume that lower conveying member 632 and lower flow path 582 are projected onto projection surface 632X. When this projection is performed, the projection is performed in the axial direction of lower conveying member 632 and onto projection surface 632X. In this embodiment, the first gap 591 and the second gap 592 are created on the projection surface 632X.

[0231] As shown in FIG. 18(A), the second gap 592 is larger than the first gap 591. In the rotation direction of the lower conveying member 632, the position of the first gap 591 and the position of the second gap 592 are different. The larger gap, second gap 592, is located above rotation center 632C of lower conveying member 632. Second gap 592 is also located above horizontal line 584H (see FIG. 18B).

[0232] 18A is located below the rotation center 632C of the lower conveying member 632. In contrast to this, the first gap 591 indicated by the reference numeral 18A in FIG. Furthermore, as indicated by reference numeral 18B, the first gap 591 is located not only below the rotation center 632C but also above the rotation center 632C of the lower conveying member 632. In contrast, the second gap 592 is located only above the rotation center 632C of the lower conveying member 632. In other words, the second gap 592 is located only above the horizontal line 584H.

[0233] 18, as described above, the cross section of lower flow path 582 has a non-circular shape. In other words, inner circumferential surface 582E has a non-circular shape. In this embodiment, a part of inner circumferential surface 582E comes into contact with the transported developer, as shown in Fig. 22. Hereinafter, the part of inner circumferential surface 582E that comes into contact with the developer will be referred to as contact portion 58X. The developer does not come into contact with the entire area of ​​the inner circumferential surface 582E in the circumferential direction, but comes into contact with a contact portion 58X that is a portion of the inner circumferential surface 582E in the circumferential direction.

[0234] In this configuration example, the contact portion 58X is given a shape that follows the outer periphery 632H of the lower conveying member 632. This prevents unconveyed developer from remaining between the contact portion 58X of the inner circumferential surface 582E and the outer circumferential portion 632H of the lower transport member 632. It is assumed that a protruding portion that protrudes in a direction away from the rotation center 632C is provided on the contact portion 58X. In this case, the developer that is not transported continues to accumulate at the location where the protruding portion is provided.

[0235] In contrast, in this embodiment, the contact portion 58X is given a shape that follows the outer circumferential portion 632H of the lower conveying member 632. More specifically, the contact portion 58X of the inner circumferential surface 582E is given an arc shape. This prevents the gap from becoming larger between the contact portion 58X and the outer circumferential portion 632H of the lower transport member 632. This makes it less likely that the developer will remain between the contact portion 58X and the outer circumferential portion 632H of the lower transport member 632.

[0236] FIG. 24 is a diagram showing another example of the configuration of the lower flow path 582. In FIG. In this configuration example, the shape of inner circumferential surface 582E of lower flow path 582 is U-shaped. In this configuration example, the upper surface of the transported developer is lower than in the transport form shown in Fig. 22. In such a case, another part of inner circumferential surface 582E located at the upper right in the figure may also be made to protrude. 24, two protruding portions are provided on inner circumferential surface 582E. In this case, the area of ​​the flow path through which gas passes is larger than in the configuration example shown in FIG.

[0237] FIG. 25 is a diagram showing another example of the configuration of the lower flow path 582 and the lower transport member 632. In FIG. In this configuration example, the diameter of inner circumferential surface 582E is larger than the diameter of inner circumferential surface 582E shown in FIG. Furthermore, in this configuration example, the rotation center 632C of the lower conveying member 632 is located below the central portion 582C. In this configuration example, the central portion 582C and the rotation center 632C are not arranged on the same axis. "Central portion 582C" refers to the central portion in the radial direction of inner circumferential surface 582E.

[0238] In this configuration example, as in the above, the area of ​​the upper portion 752A is larger than the area of ​​the lower portion 752B. In this configuration example, the developer located below the lower flow path 582 is transported downstream by the lower transport member 632. Also, above the lower flow path 582, a space is created through which gas can pass.

[0239] 18 and 24 have described configuration examples in which the shape of inner circumferential surface 582E is devised. Also, FIG. 25 has described configuration examples in which the positional relationship between inner circumferential surface 582E and lower conveying member 632 is devised. Alternatively, the lower conveying member 632 may be modified to provide a space for gas passage.

[0240] FIG. 26 is a diagram showing another example of the configuration of the lower conveying member 632. In FIG. In this configuration example, a flow path 633U for passing gas is provided in lower conveying member 632. Flow path 633U is provided in the center in the radial direction of rotation shaft 633A of lower conveying member 632. Flow path 633U is also provided to extend along the axial direction of rotation shaft 633A. In this configuration example, the gas from the developing device 14 moves through this flow path 633U formed in the rotary shaft 633A. The gas passes through this flow path 633U and heads upstream in the developer transport direction. Alternatively, a through hole or a notch may be formed in the protruding portion 633B provided on the lower conveying member 632. More specifically, a through hole or a notch may be formed connecting the front and rear surfaces of the protruding portion 633B. In this case, the gas passes through the through-holes or the notches and flows upstream in the developer transport direction.

[0241] FIG. 19 is a diagram of the developer storage unit 500 of the second embodiment as viewed from above. In the second embodiment, the gas flow path 530 extends from below the wall intra-space 556 toward the wall intra-space 556. The gas flow path 530 is connected to a bottom 556A of the wall intra-space 556. The bottom portion 556A is provided with an opening 556B for passing the gas flow path 530 therethrough. The gas flow path 530 enters the intra-wall space 556 from the bottom 556A side of the intra-wall space 556. Specifically, the gas flow path 530 passes through an opening 556B and enters the intra-wall space 556. The gas flow path 530 then extends in the longitudinal direction of the intra-wall space 556.

[0242] Gas enters intra-wall space 556 through gas flow passage 530. Gas enters intra-wall space 556 at bottom 556A of intra-wall space 556. Gas enters intra-wall space 556 through opening 556B. The gas then moves along the longitudinal direction of the wall space 556 . Thereafter, the gas passes above the one-way flow path 541 and heads toward the space inside the protrusion 76 (not shown in FIG. 19), in the same manner as above. After passing through this internal space, the gas is discharged to the outside of the supply device 70 through an opening 505 provided on the side of the protruding portion 76 .

[0243] As described above, the gas flow path 530 heading from below the intra-wall space 556 toward the intra-wall space 556 passes through the opening 556B. The gas flow path 530 heads toward the opening 556B from below the opening 556B and passes through the opening 556B. The gas flow path 530 enters the wall space 556 at the bottom 556A of the wall space 556 . The gas flow path 530 passes through the opening 556B and then heads in the left-right direction in the figure. The left-right portion of the gas flow path 530 passes through the space 556 inside the wall portion. The developer gradually accumulates in the portion of the gas flow path 530 that passes through the wall space 556. This developer is moved in a direction away from the opening 556B by the central transport member 526, which is an example of a moving member.

[0244] 19, developer that accumulates to the right of opening 556B in the figure moves to the right in the figure, and developer that accumulates to the left of opening 556B in the figure moves to the left in the figure. The central conveying member 526 is provided with two types of protrusions 526B that rotate in different directions. One of the two types of protrusions 526B is provided to the left of the opening 556B in the drawing, and the other type of protrusion 526B is provided to the right of the opening 556B in the drawing.

[0245] As a result, the developer located to the right of the opening 556B in the drawing and the developer located to the left of the opening 556B in the drawing move in opposite directions. In this configuration example, the developer located to the right of the opening 556B in the figure flows to the right, whereas the developer located to the left of the opening 556B in the figure flows to the left, which is the opposite direction to the right.

[0246] The developer moving to the right in the figure moves to the outside of the wall portion space 556. Specifically, the developer moving to the right in the figure moves to the circulation flow path 590. Furthermore, the developer moving leftward in the figure also moves to the outside of the wall portion space 556. Specifically, the developer moving leftward in the figure also moves to the circulation flow path 590. Furthermore, in this embodiment, the central transport member 526 is also provided at a position facing the opening 556B, so that the developer accumulated in the opening 556B also moves to the right and left of the opening 556B.

[0247] Figure 20 is a cross-sectional view of the supply device 70 taken along the line XX-XX in Figure 17. Figure 20 shows the supply device 70 as seen from one end 71 (see Figure 17) side of the supply device 70. In the second embodiment, too, a developer flow path 510 is provided below the developer storage container 80. The developer from the developer storage container 80 passes through this developer flow path 510. In the second embodiment, a part of the developer flow path 510 is located at a position not directly below the developer accommodating container 80. Specifically, a part of the one-way flow path 541, indicated by reference symbol 20A, is located at a position not directly below the developer accommodating container 80.

[0248] In this configuration example, above the one-way flow path 541, a protrusion 76 extending upward is provided. As in the first embodiment shown in FIGS. 7 to 16, the internal space of this protrusion 76 shown in FIG. In the second embodiment, a part of the developer flow path 510 is located at a position that is not directly below the developer accommodating container 80. In the second embodiment, a protruding portion 76 that extends upward is provided above this part. This part is a part of the one-way flow path 541 that is not located directly below the developer accommodating container 80.

[0249] As in the above, the inside of the protrusion 76 is hollow, and there is a space inside the protrusion 76 for allowing gas to pass through. The gas that reaches the upper part of one-way flow path 541 passes through the space inside protruding portion 76. Then, this gas heads toward opening 505 provided on the side of protruding portion 76. Then, the gas is discharged from this opening 505 for discharging gas to the outside of supply device 70. In this embodiment, the gas flow path 530 finally reaches the opening 505. The gas that has passed through the gas flow path 530 is finally discharged from the opening 505.

[0250] The opening 505 provided in the protrusion 76 is provided on the opposite surface 762, as described above. The protruding portion 76 has a facing surface 761 that faces the developer accommodating container 80 and an opposite surface 762 that is located on the opposite side of the facing surface 761. The opening 505 is provided in the opposite surface 762 that the protruding portion 76 has. The opening 505 is provided above a space 556 within the wall portion, which is an example of a non-flow path portion. The supply device 70 is provided with an opening 505 for discharging the gas supplied into the wall space 556 through the gas flow path 530. In this embodiment, the gas is discharged to the outside of the supply device 70 through this opening 505.

[0251] 27 and 28 are diagrams showing other configuration examples of the supply device 70. Fig. 28 is a diagram of the supply device 70 as seen from the direction indicated by the arrow XXVIII in Fig. 27. In this configuration example, as shown in FIG. 27, a plurality of openings 505 are provided. The plurality of openings 505 are arranged at positions facing the outer circumferential surface 81A of the developer accommodating container 80 attached to the attachment portion 701, as described above. The openings 505 are provided at different positions in the circumferential direction of the developer accommodating container 80 . As shown in FIG. 28, each of the openings 505 is provided so as to extend in the axial direction of the developer container 80.

[0252] Furthermore, as shown in FIG. 28, each of the openings 505 is provided from a position facing one end 81 to a position facing the other end 82. Here, the one end 81 refers to one end in the axial direction of the developer accommodating container 80. The other end 82 refers to the other end in the axial direction of the developer accommodating container 80. In this case, the area of ​​opening 505 is larger than when the length of opening 505 is smaller than the distance between one end 81 and the other end 82 .

[0253] Note that some of the multiple openings 505 may be provided from a position facing one end 81 to a position facing the other end 82. The length of the other openings 505 may be shorter than the length of some of the openings 505.

[0254] 27, each of the openings 505 faces the opposite side to the side where the developer accommodating container 80 is installed. Furthermore, each of the openings 505 is provided with a filter 506. Note that the plurality of openings 505 may have a configuration other than the configuration in which all of them face the opposite side to the side where the developer accommodating container 80 is installed. For example, only some of the openings 505 may face the opposite side, and the other openings 505 may face the side where the developer container 80 is installed. Furthermore, the number of openings 505 is not limited to three, but may be one or two, or may be four or more.

[0255] In this embodiment, as described above, the openings 505 are arranged as follows. "Opening 505 is provided from a position facing one end 81 to a position facing the other end 82." This arrangement also includes an arrangement in which a plurality of openings 505 are arranged side by side from the position facing one end 81 to the position facing the other end 82 . The present invention is not limited to an embodiment in which a single opening 505 is provided from a position facing one end 81 to a position facing the other end 82 . 7, a plurality of openings 505 may be arranged in a row along the axial direction of the developer accommodating container 80. A configuration may be adopted in which the plurality of openings 505 arranged in this manner are provided from a position facing one end 81 to a position facing the other end 82.

[0256] Furthermore, in the configuration example shown in FIG. 27, a plurality of openings 505 are provided between one end 70C and the other end 70D. One end 70C and the other end 70D are end portions of the supply device 70. In the width direction of the supply device 70, the position of one end 70C and the position of the other end 70D are different from each other. In this configuration, the supply device 70 can be easily made smaller. Assume that some or all of the plurality of openings 505 are located at positions that are not between one end 70C and the other end 70D. Compared to this case, the configuration shown in Fig. 27 makes it easier to reduce the size of supply device 70. Now, let us compare the positions in the width direction of supply device 70. In this configuration example shown in Fig. 27, multiple openings 505 are located closer to the other end 70D than one end 70C. Furthermore, multiple openings 505 are located closer to one end 70C than the other end 70D.

[0257] 27, all of the openings 505 are located closer to the other end 70D than to the one end 70C. Also, all of the openings 505 are located closer to the one end 70C than to the other end 70D. Here, one end 70C refers to the location farthest from the other end 70D in the width direction of the supply device 70. Also, the other end 70D refers to the location farthest from one end 70C in the width direction of the supply device 70. The width direction of the supply device 70 is a direction perpendicular to the axial direction of the developer container 80, and is the same direction as the horizontal direction.

[0258] 27, a cover member 901 is provided at the top of wall interior space 556, which is an example of an enclosed space. Cover member 901 is provided with opening 901A. Furthermore, a flow path 901B connected to the opening 901A is provided. The flow path 901B is connected to an opening 505 located on the upper side of the developer storage container 80. The flow path 901B is also connected to an opening 505 located on the right side of the developer storage container 80. The flow path 901B is provided so as to pass through a position facing the end surface 89A of the developer container 80 (see FIG. 17).

[0259] Hereinafter, in this specification, the opening 505 located on the upper side of the developer storage container 80 (see FIG. 27) will be referred to as the upper opening 505. The opening 505 located on the right side of the developer storage container 80 will be referred to as the right opening 505. The opening 505 located on the left side of the developer storage container 80 will be referred to as the left opening 505. In this configuration example shown in FIG. 27, gas moves from the wall interior space 556 to the outside of the wall interior space 556 through the opening 901A. The gas that has moved to the outside of the wall space 556 passes through the flow path 901B and heads toward the upper opening 505 and the right opening 505.

[0260] Gas flowing toward the upper opening 505 does not pass through the circulation flow path 590, but instead passes toward the upper opening 505. Gas flowing toward the right opening 505 also does not pass through the circulation flow path 590, but instead passes toward the right opening 505. The gas is then discharged to the outside of the supply device 70 through the upper opening 505 and the right opening 505 . The gas flowing from the wall interior space 556 toward the left opening 505 passes through the same path as described above toward the left opening 505. That is, the gas flowing toward the left opening 505 passes above a part of the flow paths that configure the circulation flow path 590 before passing toward the left opening 505.

[0261] FIG. 29 is a diagram showing another example of the configuration of the supply device 70. In FIG. In this configuration example, a plurality of openings 505 are provided only at positions facing the small diameter portion of the developer storage container 80. One end 81 of the developer storage container 80 has a smaller diameter than the other end . In the configuration example shown in FIG. 29, a plurality of openings 505 are provided only at positions facing one end 81, which is the small diameter portion of the developer accommodating container 80. When the opening 505 is provided at a position facing the one end 81, which is the small diameter portion, the position of the opening 505 can be made closer to the axis of the developer accommodating container 80. In this case, it is easier to make the supplying device 70 smaller than when the opening 505 is provided at a position facing the other end 82, which is the large diameter portion.

[0262] When a plurality of openings 505 are provided, all of the openings 505 may be provided only at positions facing the one end 81, which is the small diameter portion. Alternatively, only some of the openings 505 may be provided at positions facing one end 81. The other openings 505 may be provided, for example, as described above, from the position facing one end 81 to the position facing the other end 82. The other openings may be provided, for example, at the position facing the other end 82, which is the large diameter portion.

[0263] FIG. 30 is a diagram showing another example of the configuration of the supply device 70. 30 shows a cross-sectional view of the supply device 70 on a horizontal plane. More specifically, it shows a cross-sectional view of the supply device 70 on a horizontal plane that crosses the intra-wall space 556. The supply device 70 shown in FIG. 30 is also provided with a discharge port 74 used for discharging the developer. Furthermore, similarly to the above, there is provided a circulation flow path 590 that constitutes a part of the developer flow path 510. In this configuration example as well, the developer circulates along the circulation flow path 590.

[0264] In this configuration example, the portion of the circulation flow path 590 designated by the reference symbol 30A is a supply portion 626. Above the supply portion 626, a receiving port (not shown) that receives the developer from the developer storage container 80 is provided. New developer from the developer container 80 is supplied to this supply location 626 in the circulation flow path 590 . In this configuration example shown in FIG. 30, the position of the supplied point 626 is different from the position in the embodiment described above.

[0265] In the embodiment described above, for example, the portion indicated by the reference numeral 10X in FIG. In the embodiment shown in FIG. 10, a supply location 626 is provided in the flow path on the left side of the drawing. When viewed from the front side of image forming apparatus 100 (see FIG. 1), supply destination 626 is provided in the left flow path in FIG. 10. Specifically, supply destination 626 is provided in opposite direction flow path 542 located on the left side.

[0266] 30, on the other hand, supplied point 626 is provided in the flow path located on the right side when viewed from the front side of image forming apparatus 100. There is no particular limitation on the position of the supply destination 626. The supply destination 626 may be provided in the flow path located on the left side, or in the flow path located on the right side.

[0267] In the configuration example shown in FIG. 30, a connection flow path 628 that is a flow path connected to the circulation flow path 590 is provided. The connection flow path 628 is connected to the circulation flow path 590 at a connecting point 629 . The connecting flow path 628 extends from this connected point 629 of the circulation flow path 590 to the discharge port 74 . The connecting flow path 628 is made up of the filling portion 511, the lateral flow path 513, and the intermediate flow path 581 (not shown in FIG. 30). The connecting flow path 628 is also made up of the lower flow path 582 and the vertical flow path 514. The developer in the circulation flow path 590 flows toward the discharge port 74 through this connecting flow path 628 .

[0268] Furthermore, similar to the above, there is provided an opening 505 used to discharge gas from inside the supply device 70. This opening 505 is connected to the circulation flow path 590, similar to the above. Circulation flow path 590 includes first portion 596, which is a portion where a large amount of developer is transported, and second portion 597, which is a portion where a small amount of developer is transported.

[0269] The first portion 596 is located downstream of the supply point 626 and upstream of the connection point 629 in the moving direction of the developer. The second portion 597 is located upstream of the supply point 626 and downstream of the connection point 629 in the developer movement direction. Here, the “moving direction of the developer” refers to the moving direction of the developer in the circulation flow path 590.

[0270] The developer supplied to the supply destination 626 always passes through the first portion 596. Then, a part of the developer that has passed through the first portion 596 heads toward the connecting flow path 628. The remaining developer that has not headed toward the connecting flow path 628 is supplied to the second portion 597. In this case, a larger amount of developer is transported in the first portion 596. A smaller amount of developer is transported in the second portion 597 than in the first portion 596.

[0271] The opening 505 is connected to a second portion 597 of the circulation flow path 590. The opening 505 is connected to the second portion 597 of the circulation flow path 590, through which the amount of transported developer is small. In this embodiment, the gas that enters the second portion 597 through the opening 556B goes toward the opening 505 without passing through the first portion 596. The phrase "opening 505 is connected to second portion 597" can also be interpreted as meaning that the gas in second portion 597 flows toward opening 505 without passing through first portion 596.

[0272] A first linear portion 691 formed in a straight line is provided in the circulation flow path 590. The developer flowing toward the side where the connected portion 629 is provided passes through this first linear portion 691. Further, a second linear portion 692 formed in a straight line is provided in the circulation flow path 590. The developer flowing in the direction opposite to the side where the connected portion 629 is provided passes through this second linear portion 692. The supplied point 626 is provided in the first linear portion 691. The opening 505 is connected to the second linear portion 692. The second linear portion 692 constitutes a part of the second portion 597 described above.

[0273] The second linear portion 692 has one end 692A located on the side where the connection portion 629 is provided. The second linear portion 692 also has an opposite end 692B located on the opposite side from the side where the connection portion 629 is provided. The opening 505 is connected to a portion of the second linear portion 692 that is positioned away from the opposite end portion 692B. Here, the developer movement direction, which is the direction in which the developer passes through the second linear portion 692, is assumed. The second linear portion 692 has an upstream portion 692C that is located upstream of the opposite end portion 692B in the developer movement direction.

[0274] The opening 505 is connected to this upstream portion 692C of the second straight portion 692. In this embodiment, the gas flow path 530 is provided in a manner that leads from this upstream portion 692C toward the opening 505. Developer tends to accumulate at opposite end 692B of second straight portion 692. At opposite end 692B of second straight portion 692, the height of the upper surface of the developer tends to be large. In contrast, the developer is less likely to accumulate in the upstream portion 692C of the second straight portion 692. The opening 505 is connected to the upstream portion 692C of the second linear portion 692 where developer is less likely to accumulate.

[0275] In this configuration example shown in FIG. 30, the opening 505 is provided above the circulation flow path 590, similar to the configuration example shown in FIG. 14, a protrusion 76 is also provided in the configuration example shown in Fig. 30. A protrusion 76 is also provided in the configuration example shown in Fig. 30, as in the configuration example shown in Fig. 14. In this configuration example shown in FIG. 30, the gas flow path 530 also passes through the inside of the protruding portion 76.

[0276] The gas heading from the circulation flow path 590 to the opening 505 passes through the gas flow path 530 and heads toward the opening 505. The gas heading from the upstream portion 692C to the opening 505 passes through the gas flow path 530 and heads toward the opening 505. In this configuration example, the gas flow path 530 also reaches the opening 505. The gas flow path 530 extends upward from the upstream portion 692C and is connected to the opening 505.

[0277] FIG. 31 is a diagram showing another example of the configuration of the supply device 70. In FIG. 31 , supplied location 626 is provided in one linear portion, second linear portion 692. Furthermore, in this configuration example, opening 505 is connected to this one linear portion, second linear portion 692. In this configuration example, the linear portion where the supplied portion 626 is provided and the linear portion to which the opening 505 is connected are the same.

[0278] In this configuration example, as in the above, opening 505 is connected to second straight portion 692 of circulation flow path 590. Furthermore, in this configuration example, second straight portion 692 is provided with supply location 626. Hereinafter, the portion of the second linear portion 692 to which the opening 505 is connected will be referred to as the "opening connecting portion 631A." In this configuration example, in the moving direction of the developer, the supply portion 626 is located downstream of the opening connecting portion 631A. Here, the "moving direction of the developer" refers to the moving direction of the developer in the second linear portion 692.

[0279] Furthermore, in this configuration example, similar to the above, opening 505 is connected to second portion 597 of circulation flow path 590, which conveys a smaller amount of developer. In this configuration example, similar to the above, the amount of developer flowing toward opening 505 is reduced.

[0280] FIG. 32 is a diagram showing another example of the configuration of the supply device 70. In FIG. In this configuration example, the basic configuration is the same as the configuration shown in FIG. 20, except for the position of the opening 505. In this configuration example, similarly to the above, the gas sent from the developing device 14 is supplied to the wall portion inner space 556, which is an example of a supply space. In this configuration example, an opening 505 is provided in an upper portion of intra-wall space 556. Opening 505 is provided in wall 792 that forms intra-wall space 556. A filter 506 is installed in opening 505.

[0281] The gas supplied to the wall space 556 is discharged to the outside of the supply device 70 through the opening 505 . As in the above, opening 505 is an opening that connects the inside and outside of supply device 70. The gas supplied to wall portion inner space 556 moves to the outside of supply device 70 through opening 505. The opening 505 is provided along the longitudinal direction of the space 556 within the wall portion. In this configuration example, the gas in the wall space 556 flows toward the opening 505 without passing through the circulation channel 590. In other words, the gas in the wall space 556 flows toward the opening 505 without passing through the circulation channel 590.

[0282] Then, the gas is discharged to the outside of supply device 70 through opening 505. The gas in wall portion inner space 556 is discharged to the outside of supply device 70 without passing through circulation flow path 590. The gas in the wall space 556 does not pass through the circulation flow path 590. In this case, the developer in the circulation flow path 590 is prevented from being included in the gas. After leaving the opening 505, the gas in the wall space 556 enters the gap 756 located between the wall 792 and the developer container 80. The gas then passes through the gap 756 and moves in the axial direction of the developer container 80. The gap 756 has an open end in the axial direction of the developer accommodating container 80. The gas moving through the gap 756 moves to the end of the gap 756.

[0283] In this configuration example, similarly to the above, a wall space 556 is provided, which is a space to which gas flowing from the developing device 14 is supplied. Furthermore, in this configuration example, similar to the above, a circulation flow path 590 through which the developer circulates is provided around the wall space 556. In this configuration example, the gas in the wall space 556 flows toward the opening 505 without passing through the circulation flow path 590 located around the wall space 556 .

[0284] (Addendum) (((1))) an image carrier; a developing device that deposits a developer onto the image carrier; a mounting portion to which a cylindrical developer container containing a developer is mounted; a supply device that supplies the developer from the developer storage container to the developing device, the supply device having an opening that communicates the inside and outside of the supply device and is located at a position facing an outer circumferential surface of the developer storage container attached to the attachment portion; An image forming apparatus comprising: (((2))) The image forming apparatus according to (((1))), wherein the opening is provided so as to extend in the axial direction of the developer storage container attached to the attachment portion. (((3))) The opening is provided from a position opposite one end of the developer storage container attached to the attachment portion in the axial direction to a position opposite the other end of the developer storage container in the axial direction (((2))). (((4))) The image forming apparatus according to any one of (((1))) to (((3))), wherein a plurality of openings are provided. (((5))) The image forming apparatus according to (((4))), wherein the plurality of openings are provided at mutually different positions in the circumferential direction of the developer accommodating container attached to the attachment portion. (((6))) The image forming apparatus according to any one of ((1))) to ((5))), wherein the opening is provided facing the opposite side to the side where the developer container is installed.

[0285] According to the image forming device of (((1))), it is easier to enlarge the opening that connects the inside and outside of the supply device that supplies developer to the developing device, compared to when the opening is located at the opposite end of the developer storage container that contains the developer. According to the image forming apparatus of (((2))), it is easier to increase the size of the opening compared to when the opening is not provided so as to extend in the axial direction of the developer container. According to the image forming device of (((3))), the opening can be made larger than when the size of the opening in the axial direction is smaller than the distance between one end and the other end of the developer container in the axial direction. According to the image forming apparatus of (((4))), the total area of ​​the openings can be made larger than when only one opening is provided. According to the image forming apparatus of (((5))), it is possible to dispose the plurality of openings in a state where they are offset from one another in the circumferential direction of the developer container. According to the image forming device of (((6))), it is possible to more smoothly exhaust gas from the opening compared to when the opening is provided facing the side where the developer container is installed. [Explanation of symbols]

[0286] 11...photosensitive drum, 14...developing device, 70...supply device, 80...developer container, 81...one end, 81A...outer circumferential surface, 82...other end, 100...image forming device, 505...opening, 510...developer flow path, 511...filling portion, 514...vertical flow path, 514E...inlet portion, 526...central conveying member, 526E...cylindrical portion inside, 526F...external portion, 530...gas flow path, 556...wall portion inside space, 556B...opening, 571...space, 590...circulation flow path, 591...first gap, 592...second gap, 701...mounted portion, 752...inner region, 752A...upper portion, 752B...lower portion

Claims

1. an image carrier; a developing device that deposits a developer onto the image carrier; a mounting portion to which a cylindrical developer container containing a developer is mounted; a supply device that supplies the developer from the developer storage container to the developing device, the supply device having an opening that communicates the inside and outside of the supply device and is located at a position facing an outer circumferential surface of the developer storage container attached to the attachment portion; An image forming apparatus comprising:

2. 2. The image forming apparatus according to claim 1, wherein the opening is provided so as to extend in an axial direction of the developer container attached to the attachment portion.

3. 3. The image forming apparatus according to claim 2, wherein the opening extends from a position facing one end of the developer container attached to the attachment portion in the axial direction to a position facing the other end of the developer container in the axial direction.

4. The image forming apparatus according to claim 1 , wherein a plurality of the openings are provided.

5. The image forming apparatus according to claim 4 , wherein the plurality of openings are provided at mutually different positions in the circumferential direction of the developer accommodating container attached to the attachment portion.

6. 2. The image forming apparatus according to claim 1, wherein the opening is provided facing a side opposite to a side where the developer container is installed.

Images