Filter device for adjusting the atmosphere in a manufacturing facility and manufacturing facility for additive manufacturing processes

Abstract

The present invention relates to an automatable manufacturing facility FA based on optical interactions, in particular a manufacturing facility for selective laser melting (SLM), and an integrated filter device FV, which, by selective insertion of the device elements, makes it possible to avoid contamination with different particle residues in the manufacturing facility FA and to form a manufacturing atmosphere defined by a homogeneous process gas flow.Furthermore, the present invention relates to a manufacturing system for the automated manufacturing of workpieces by irradiation of the material to be processed, which manufacturing system makes it possible to generate the aforementioned manufacturing atmosphere, in particular independently of the manufacturing material used, by means of controlled adaptation of the process gas introduced into the manufacturing facility FA to the properties of the filter device FV.

Description

[Technical Field]

[0001] The present invention relates to an automatable manufacturing facility based on optical interaction, in particular a manufacturing facility for selective laser melting (SLM), and an integrated filter device that, by selective insertion of device elements, makes it possible to avoid contamination with different particle residues in the manufacturing facility and to create a manufacturing atmosphere defined by a homogeneous process gas flow.Furthermore, the present invention relates to a manufacturing system for the automated production of workpieces by irradiation of the material to be processed, which allows the generation of the aforementioned manufacturing atmosphere, in particular independently of the manufacturing material used, by means of controlled adaptation of the process gas introduced into the manufacturing facility to the properties of the filter device. [Background technology]

[0002] As work processes become increasingly complex and as a result modern manufacturing equipment is required to be able to manufacture as accurately as possible over large areas in an automated manner, the manufacturing and processing of workpieces based on optical interaction processes has become established as an effective and important work platform.

[0003] Common manufacturing facilities known from the state of the art and based on optical interactions, such as laser-induced manufacturing facilities and / or manufacturing facilities based on additive manufacturing steps such as selective laser melting, typically comprise one or more high-intensity light sources coupled to a number of finely tuned optical elements (lenses, mirrors, filters, etc.) that can be controlled in an automated manner via a computer system, thus enabling the plastic manipulation of a desired workpiece or material by generating a focused beam of light focused on a specific manufacturing point. For example, a selective laser melting manufacturing facility has at least one laser light source that, via software-supported optics, is able to focus a focused laser beam on a powder-like layer of the material to be processed, thus generating a highly effective three-dimensional manufacturing process by local fusion that can be connected layer by layer.

[0004] However, despite the continuous further development of such manufacturing equipment, in most of such systems, problems still arise that due to particle residues that fall during the manufacturing process, such as rising spray particles, condensate, or soot, the components necessary for the passage of the optical processing beam can be contaminated or even damaged, which, in the case of continuous manufacturing processes, results in a decrease in the exposure accuracy and, consequently, in a decrease in the quality of the manufactured workpieces. In this regard, state-of-the-art manufacturing equipment provides, for example, for the introduction of gas flows into the processing chambers of the manufacturing equipment used, so that any interfering process by-products can be effectively removed already during the individual manufacturing steps.

[0005] However, despite the above-mentioned advantages, the use of simple gas inflow within manufacturing equipment always presents many drawbacks. For example, due to the turbulent nature of the inflowing gas flow, some of the particles to be separated may also enter the respective gas supply circuit, resulting in the problem that, for example, in the case of replacing the provided material, a complex purification process is required to prevent subsequent contamination by accumulated material residues. Furthermore, introduction mechanisms such as valves or inlet openings, which are usually only locally connected to the working area of ​​the manufacturing equipment, only result in an uneven distribution of the used gas flow, so that the purification quality within the existing manufacturing equipment changes locally and therefore the effectiveness of the manufacturing process is significantly reduced.

[0006] Therefore, the object of the present invention is to solve the above-mentioned problems of the state of the art, and in particular to provide a filter device that is suitable for manufacturing facilities based on optical interaction and that can effectively reduce the risk of contamination in said manufacturing facilities, even when additional circulating gases are used.Furthermore, the object of the present invention is to use and adjust said filter device in the manufacturing facility to be improved, in particular in the gas supply system of said manufacturing facility, in order to likewise optimize the flow characteristics of the gases used, so that not only can the resulting production particles be effectively separated from the existing working area of ​​the manufacturing facility, but also each gas flow can be individually adapted to any situation present in the manufacturing facility. Summary of the Invention [Means for solving the problem]

[0007] To solve the above mentioned object, the features of the independent claims are proposed. The dependent claims relate to preferred exemplary embodiments of the invention.

[0008] The filter device of the present invention preferably comprises at least one distribution element for planar introduction of the process gas flow, i.e., the gas typically introduced for the production process (e.g., hydrogen, helium, carbon dioxide, ethene, or argon), into the working area of ​​the respective production facility, and a filter element for purifying the introduced process gas, preferably by preventing material deposits in the gas supply lines used, which are preferably configured to improve the quality of the initially used process gas flow, particularly by capturing potentially harmful material particles with the filter element, and thus introduce residue-free gas into the aforementioned working area over as wide an area as possible through interaction with the components of the distribution element. Thus, the present invention preferably forms an at least two-part device system, using a first element (filter element) to prevent harmful residual particles from entering the provided gas supply lines (through which the gas supply may continue), while a second element (distribution element) simultaneously ensures as wide as possible and therefore a high-quality gas flow profile. Therefore, in contrast to the state of the art, the present invention allows the existing process gas flow to be optimally guided through the existing construction process with respect to both the material composition of the process gas flow and its hydrodynamic properties, thereby ensuring ideal quality characteristics of the workpieces produced.

[0009] For the above purposes, the described distribution element can preferably first comprise at least one perforated plate, which allows the distribution element to spread the process gas flow impinging on the filter device in the gas supply system, particularly for the introduction of a wide area into the working area of ​​the production facility, preferably by multiple diffusion processes in the perforations present in the perforated plate. Here, the general configuration of the perforated plate described above is not initially limited to a specific shape or geometric shape, but can be considered initially as at least any type of three-dimensional structure that can perform spatial redistribution of the gas flowing through it based on multiple perforations. Particularly preferably, the perforated plate is a perforated plate or a perforated plate.

[0010] Thus, in particularly preferred exemplary embodiments, the at least one perforated plate can be formed, for example, as an industrially produced perforated plate made of metal, synthetic, or natural materials (wood, carbon, etc.), or as a perforated plate that can produce a hydrodynamic distribution effect by selectively introducing perforations and thus produce an adjustable widening of the process gas flow used, for example, in accordance with DIN 4185-2 and DIN 24041. However, in further exemplary embodiments, to achieve a similar effect, textured or irregularly shaped materials, such as perforated polymer layers, layered plates, or various fabrics, can also preferably be used for this purpose, so that individually adjusted distribution elements can preferably be used depending on the process gas used and the supported production equipment.

[0011] In order to provide an optimally set process gas flow for the respective working process, the characteristics of the perforated plates can also be preferably selectively adapted to the requirements of the respective manufacturing facility and / or the manufacturing process being carried out. Thus, for example, in a particularly preferred exemplary embodiment, the hole size of at least the existing perforations, their spatial distribution in the perforated plates, and / or the thickness of at least one perforated plate can be formed in such a way that by changing or adjusting one of the above-mentioned characteristics, a change in the profile of the process gas flow entering the working area can likewise be generated, and thus the characteristics of the introduced process gas can be actively influenced by the characteristics of the at least one perforated plate.

[0012] Based on these principles, the at least one perforated plate can be configured not only to expand the process gas flow introduced into the working area, but also to generate a flow profile adapted to at least the respective manufacturing process, for example, by the above-mentioned diffusion effect and characteristics of the at least one perforated plate adapted to the circumstances of the respective manufacturing equipment or the manufacturing process used (e.g., the dimensions of the working area, the velocity of the introduced gas flow, the amount of discharged material particles). Preferably, the at least one perforated plate can be configured to thereby generate a process gas flow that is constant in time and / or space in the working area of ​​the manufacturing equipment by flowing the process gas through the perforations of the perforated plate. In other cases, it may be further considered preferable to also form a laminar flow in the working area by adding a perforated plate, for example, so as to effectively prevent any turbulence in the process gas profile that would interfere with the particle discharge process. In this respect, the gas influence in the manufacturing equipment can already be generated by a single element of the present invention, which is much more optimized than the state of the art, and as a result, the corresponding manufacturing quality can be correspondingly improved.

[0013] The filter elements also provided by the filter device and used for particle filtration can be preferably arranged near the distribution element, preferably on the distribution element itself or on at least one of its perforated plates, so as not only to achieve the smallest possible volume of the filter device, but also to minimize the free space in the filter device that occurs between the distribution element and the filter element and therefore potentially can be affected by particle residues. Here, in a preferred exemplary embodiment, the filter elements can be particularly preferably arranged on the side of at least one perforated plate facing the respective process gas flow, so that the process gas flow generated by the perforated plate can be introduced into the working area of ​​the production facility preferably without interference and / or interaction.

[0014] In order to be able to further perform the above-mentioned shielding function of the filter device, the filter element may further comprise at least one filter material configured for particle filtration, such as a filter fleece, a polymer filter, an antistatic filter cloth, or any other material that can be used as a particle filter, which at least enables the filter element to prevent the ingress of the last-mentioned material particles into the supply system (valves, pipes, etc.) that is to be protected and that incorporates the filter device. Thus, in a highly preferred exemplary embodiment, the filter material may have, for example, at least one mechanical hole with a predetermined hole size, through which material particles flowing through the filter device can be captured by the filter element and thus effectively separated from said supply system, in particular during the unpacking process.

[0015] In a preferred embodiment of the filter material, the pore size can be configured, in particular, so that any material particles entering the inlet of the supply system from the working area (and thus the filter device installed therein) can be effectively captured or received by the filter material. In this regard, the pore size can be configured in this case, for example, so that almost complete efficiency of the filter material can be achieved, for example, by configuring the pore size in the filter material to be smaller than the size of the material particles to be received (screen effect), so that the corresponding material particles are preferably completely blocked when they collide with the filter material. In a further exemplary embodiment, the above-mentioned pore size can also be selected, more particularly, so that, in addition to receiving potentially harmful material particles, process gas introduced into the working area of ​​the manufacturing facility can also preferably continue to pass through the used filter material without interference, thereby preferably allowing the filter device to remain usable both in the active state (gas supply active) and in the inactive state (gas supply inactive) of the supply system of the manufacturing facility.

[0016] Further advantages of the mechanical filtering structure thus created can also be achieved by further optimization of the process gas flows used.

[0017] Therefore, the aforementioned filter material can likewise be configured to further homogenize the latter process gas flow, preferably at its inlet into the working area of ​​the manufacturing facility, based on the flow characteristics of the process gas flow flowing through the filter device, so that in addition to the expansion of the process gas flow by the distribution element and the thus expanded effective area of ​​the introduced process gas flow, a gas flow profile that is as uniform as possible can also be generated by the filter device.

[0018] For this purpose, the composition of the filter material can be configured, for example, so that multiple collision processes of corresponding process gas particles on the material (e.g., pores) of the filter material can occur during the flow of the process gas through the filter material, thereby achieving, according to the law of diffusion, a higher entropy and thus a uniform local gas particle density in the process gas. In this respect, in a highly preferred exemplary embodiment, the filter material of the filter element can also particularly take on a dual role, not only efficiently protecting the integrated supply system of the manufacturing facility from invading material particles, but also achieving an improved, particularly uniform flow through the working area.

[0019] The precise adaptation of the process gas profile by the filter material can be preferably achieved in this regard by adapting any structural characteristics of the filter material, as well as the characteristics of at least one perforated plate of the distribution element, to the flow characteristics of the process gas flow through the filter device. Thus, for example, in a first preferred exemplary embodiment, at least the thickness and / or pore size of the filter material used can be configured to form a homogenized process gas flow in the working area of ​​the production facility according to the characteristics of the gas to be homogenized (e.g., the velocity, pressure, cross-sectional area, or content of the gas flow). In a second exemplary embodiment, for this purpose, the geometry of the pores (e.g., the structural orientation, spatial distribution, or density of the pores within the filter material) can also be adapted to the process gas flow, for example, by using a specifically selected material, so that the above-mentioned homogenization can be achieved not only by establishing the external characteristics of the filter material but also by establishing its internal characteristics.

[0020] It can therefore be seen that the features of the filter device, in particular the multifunctional distribution and filter elements that can be adapted to the characteristics of the process gas flow used, allow for an effective refinement of the process gases introduced into the manufacturing facility, which, in addition to the efficient suppression of particle deposits in the respective gas supply system (and therefore the potential risk of contamination), also includes the optimization of the corresponding process gas flow. Furthermore, the filter device offers the advantage that a particularly compact construction can be achieved due to the low number of device elements required, so that the filter device can preferably be configured to be integrated into any type of manufacturing facility.

[0021] In a particularly preferred exemplary embodiment, the filter device can therefore also be configured, in particular due to its extremely compact shape, to exist as an autonomous device and be able to be integrated individually or independently of the structure of the respective manufacturing facility into the manufacturing facility to be improved, but at least into the process gas supply system used therein.

[0022] Here, in order to be able to guarantee a highly favorable improvement of the process gas flow and the above-mentioned contamination prevention, the filter device can also be further preferably configured to be directly, i.e. preferably directly integrated into the working area of ​​the respective production equipment, in particular so that the fan effect generated by the at least one perforated plate can also be introduced into said working area, preferably without interaction.

[0023] Therefore, in a particularly preferred embodiment of the present invention, the filter device can be configured for this purpose to be directly integrated into a component of the manufacturing equipment that defines the working area of ​​the manufacturing equipment, such as the wall of the processing chamber used by the manufacturing equipment, or at least one inlet of the gas supply system to the working area, thereby achieving the maximum effect of the above-mentioned effect of the filter device.In a further preferred embodiment, a part of the filter device, such as the distribution element, particularly preferably, but especially at least one perforated plate of the distribution element, can also be configured to be connectable to the defining component of the manufacturing equipment, so that the filter device can function as a functional component of the manufacturing equipment (for example, as a component of the above-mentioned processing chamber wall) or even replace any component of the manufacturing equipment by being integrated into the respective manufacturing equipment, thereby not only saving further material costs, but also avoiding the use of additional components to adapt the filter device to the respective manufacturing equipment.

[0024] The integration of the filter device into the manufacturing facility itself can furthermore, if preferred, be achieved by a releasable fastening process, for example a simple screw connection, tension based on mechanical, electrical or pneumatic interaction (e.g. by introduced clamping levers), or by fastening elements already present in the manufacturing facility, such as guide rails that fit the filter device. This has the advantage, in particular, that an equally simple exchange of the filter device within the manufacturing facility is possible by simple mounting and dismounting of the filter device to the respective manufacturing facility or the associated gas supply system, so that the adaptation of the filter device to any changes within the manufacturing facility, for example in the case of a material change or process gas change, can preferably also be achieved by simply replacing the existing (i.e. currently installed in the manufacturing facility) filter device with a newer, more compatible version.

[0025] In this respect, the filter devices can preferably be configured correspondingly to adapt the required process gas flow to the new conditions (preferably before the start of the replaced production process) in the event of a replacement within the respective production facility, in particular during replacement of the materials used, process gases or general working process, at least in that a filter device already installed in the production facility is replaced by a new filter device adapted to the mentioned replacement (e.g. by using replaced filter material or perforated plates), thereby achieving an equally particularly cost-effective and simple method of adaptation.

[0026] In a further highly preferred exemplary embodiment, it may be possible that the entire filter device does not need to be replaced for the above-mentioned replacement process, but rather only individual elements of the filter device can also be configured to be replaceable, as a result of which the efficiency of the replacement process can be increased even further. For example, in the case of an individual process replacement within a manufacturing facility, such as a pure replacement of the materials used, the actual process gas flow may remain unchanged, so that it may be considered that only the provided filter elements or their filter materials need to be adapted to the new situation (e.g., by making the pore size equal to the newly used material) in order to maintain the desired filter device effect.

[0027] In order to equally incorporate this case into the functionality of the present invention, in a further exemplary embodiment, the filter device can also be configured such that, in addition to or instead of the entire filter device, at least the distribution element (or at least one perforated plate thereof) and / or the filter element can also be arranged replaceably within the filter device, so that adaptation of the filter device to changes within the production facility can also be performed by selective replacement of at least one of the above-mentioned elements.

[0028] A corresponding adaptation of the filter device or one of the elements comprised thereby can therefore preferably be understood hereinafter as a replacement of the device and / or said element by at least an optimized version.

[0029] The advantages of the above-described adaptation process arise, in particular, from the specific requirements of the filter device in each manufacturing facility. Thus, for example, by simply replacing the filter element after each manufacturing process step, any material particles collected by the filter material can be efficiently removed from the manufacturing facility or gas supply system without the need for further complex purification processes, resulting in a particularly cost-effective purification mechanism. Furthermore, the simple replacement of one of the aforementioned elements provides the possibility of adapting the characteristics of at least the filter element and / or distribution element in each case to specific conditions during the manufacturing process (e.g., the size of the material particles used and the process gas characteristics), thereby enabling a much more precise adaptation of the filter device to the characteristics of each manufacturing facility.

[0030] The replacement process itself can also be preferably carried out manually, but in particularly preferred embodiments, also in an automated manner. In this regard, the filter device can, for example, preferably be configured to open at least a portion of the filter device during the replacement process in order to replace the filter device and / or at least one of the aforementioned elements, so that a responsible operator can remove the element or device to be replaced and replace it with a new one. For this purpose, in preferred exemplary embodiments, the filter device can be equipped with one or more predetermined insertion sections configured for introducing and removing device elements, which remain accessible to the aforementioned operator even after the filter device is installed in the respective manufacturing facility, thus allowing the operator to carry out the aforementioned replacement process, preferably at any time, without affecting the manufacturing process. However, in further particularly preferred exemplary embodiments, the aforementioned replacement of the device or element can be carried out not only by a single operator, but also by automation, for example, by a replacement mechanism configured for automatic replacement, also implemented in the manufacturing facility or the filter device, so that the adaptation of the filter device can also be preferably carried out fully, but also at least semi-automatically.

[0031] Examples of such replacement mechanisms are generally not limited to specific technical operating modes and can generally comprise any type of device that allows a partially or fully automated replacement process of the aforementioned elements. In this regard, the filter device can preferably comprise, for example, a mechanical replacement mechanism, such as a mechanical filter wheel or an additional robotic arm, but in further cases also a device based on pneumatic or electrical methods (e.g., electromagnets), so that replacement of the elements contained in the filter device can preferably be carried out in a manner that is preferably adapted to the respective manufacturing facility. In further preferred cases, the aforementioned replacement mechanism can also comprise an internal storage for storing already used elements to be reused and / or replaced, whereby the replacement process can also preferably be carried out in a completely autonomous manner, i.e., without external influence by operators or sources remote from the manufacturing facility.

[0032] Furthermore, in order to be able to ensure extremely precise positioning of the individual elements in the filter device and thus a precise adaptation of the process gas flow through the filter device, the filter device can also preferably be provided with at least one adjustable guide device (adjustable filter container) for guided installation and removal of the filter elements and / or distribution elements in or from a working position provided for the operational operation of the filter device. For example, the guide device can for this purpose comprise a mechanical connection between the introduction part already mentioned above and configured for the external introduction and removal of the device elements and the last-mentioned working position, so that when the element to be replaced is introduced in the introduction part, the element can be introduced into the working position of the filter device in an automated manner, preferably by means of the guide device.

[0033] Similarly, preferably to ensure accurate positioning of the elements introduced into the filter device, the guide device can also be configured to at least guide at least one perforated plate of the distribution element and / or filter element in the respective working position only along at least two predetermined dimensions, but in a particularly preferred exemplary embodiment, only along one dimension, so that the aforementioned elements are preferably always in their preferred end position (working position) in a predetermined spatial direction within the filter device. Thus, the aforementioned guide device can comprise at least one preferably horizontally aligned linear guide adapted to the device element, such as a guide rail, a bearing, or any other type of guiding mechanism, which limits the degree of freedom of movement of one of the device elements introduced into the filter device and thus allows it to be introduced into the working position particularly efficiently. Here, the introduction itself can be carried out both manually by an operator and automatically by an internal exchange mechanism of the filter device or the respective production facility, as already mentioned. Furthermore, the guiding device and / or the filter device may also be provided with a fixing mechanism, for example a clamping device adapted to the respective device element or one of the releasable fixing possibilities already mentioned above, so that at least the filter element and / or the distribution element can also preferably be fixed in an automated manner when the working position is reached.

[0034] It should therefore be noted that due to the extremely simple and compact construction of the filter device, in combination with the effective adaptation of the individual device elements to any changes (e.g., material or process gas changes) made in the production facility, a particularly user-friendly and adaptable adaptation of the process gas flow introduced into the production facility can be ensured, in particular by efficient replacement of at least one filter element and / or distribution element of the filter device. Furthermore, the simple and therefore cost-effective design of the filter device offers many expansion possibilities.

[0035] Thus, as already mentioned above, a minimal example of the claimed filter device integrated into the gas supply system of the manufacturing insert can provide for the positioning of at least one filter element configured for filtration and homogenization on the perforated plate of the distribution element, where the filter element or the filter material provided therewith can be preferably attached to the perforated plate with respect to the process gas flow to be improved. In this respect, an equipment system comprising at least two equipment elements (filter material and perforated plate) can be formed according to the above-mentioned design, in which the process gas flowing through the filter device is first homogenized by the filter material and separated from material particles generated during the manufacturing process, and then, by interacting with the perforated plate, can be introduced into the working area of ​​the manufacturing equipment in a planar manner, i.e., as wide as possible.

[0036] However, in further embodiments of the filter device, it may also be possible to configure that further device elements can also be introduced into the filter device, so that the process gas to be treated is preferably further optimized.

[0037] Therefore, in a further preferred embodiment, the distribution element of the claimed filter device can also include, for example, at least one second perforated plate, which can preferably be arranged in the same way as the filter element of the filter device, so that the process gas flow already being treated can be initially adjusted before it hits the filter element. Here, the above-mentioned second perforated plate can optionally be formed identically to the first perforated plate of the filter device (for example, by using the same hole size, distribution or plate dimensions), thereby, for example, creating a symmetrically formed filter device and thus a particularly easily defined gas flow profile. However, in a further exemplary embodiment, the characteristics of the second perforated plate are preferably clearly different from those of the first perforated plate, and can rather be determined by the characteristics of the process gas flow used (flow velocity, pressure, cross-sectional area, etc.) and the characteristics of the filter element and the first perforated plate arranged downstream.

[0038] The latter exemplary embodiment has the advantage that the process gas flow entering the filter device can already be adapted to the interaction in the claimed filter device by the additional perforated plate introduced into the filter device. Thus, for example, depending on the selection of the hole size, the distribution of the individual perforations, or the thickness of the first perforated plate, the velocity or pressure of the process gas flow impinging on the filter device can already be changed to create optimal conditions for the subsequent homogenization and spreading of the process gas flow by the filter element and the first perforated plate, thereby further improving the effectiveness of the claimed filter device. Therefore, the second perforated plate of the distribution element can be configured to (actively) change the process gas flow impinging on the filter device by presenting predetermined characteristics (e.g., the distribution, size, and length of the perforations), preferably at least, to generate an improved process gas profile that is optimized depending on the characteristics of at least the filter element and the first perforated plate and thus introduced into the working area of ​​the manufacturing facility.

[0039] In this respect, further preferred embodiments of the present invention can also provide a filter device with at least two perforated plates, each of which can include different predetermined characteristics and can therefore be used for different effects in the claimed filter device. It should therefore be pointed out that the claimed filter device, both in its at least three-element form and in the above-mentioned embodiment defined by two device elements, thus forms a complex structure of multiple interdependent device elements, the different characteristics of which can be so closely related to each other that an optimized, i.e., preferably pure and homogenized, large-area process gas flow can be formed simply by matching all the device elements to each other.

[0040] Further advantages of the above-described embodiments may additionally result from the placement, orientation and construction of the individual device elements within the claimed filter device.

[0041] Thus, for example, as already mentioned above, a second perforated plate can preferably be arranged on the filter element, so that the change in the process gas flow into the filter device generated by the second perforated plate can be used for improved homogenization by the filter element. Here, in order to be able to likewise ensure the greatest possible effect of the second perforated plate, the second perforated plate can also preferably serve as a distinct gas inlet of the particularly claimed filter device, so that the process gas introduced into the working area can preferably enter the filter device or the working area only through the perforations inserted in the second perforated plate (and therefore depending on their properties).

[0042] The first perforated plate can furthermore be formed as a gas outlet of the equally preferably claimed filter device for optimized spreading of the final purified and homogenized process gas, so that the treated process gas can preferably be introduced unhindered into the working area of ​​the respective manufacturing equipment. For this purpose, the first perforated plate can also be configured to be integrated, for example, into the wall of a processing chamber associated with the manufacturing equipment, or at least into the gas inlet of the gas supply system of the manufacturing equipment, so that the process gas optimized by the filter device and output by the second perforated plate can be introduced directly into the working area.

[0043] Furthermore, in order to enable the most accurate possible process gas adaptation through appropriate arrangement of the various device elements, the at least two perforated plates of the claimed filter device can also be particularly preferably arranged parallel to each other, and in particularly preferred cases perpendicular to the flow direction of the introduced process gas flow. This orientation can particularly effectively prevent any shear flow in the process gas, thereby maximizing the effectiveness of the homogenization process by the filter elements and the spreading process by the first perforated plate. Furthermore, the above-mentioned orientation of the perforated plates in particular allows the claimed filter device to be configured as a linear, functional flow chamber, so that not only is a flow profile generated between the two perforated plates that is separate or independent from the rest of the gas supply system, but the area formed by these two device elements (preferably due to a uniform and homogeneous flow) can also be ideally used to measure any process gas characteristics. In this respect, the claimed filter device can also, in particularly preferred exemplary embodiments, preferably be configured to be connected to or have incorporated into the flow path generated by the filter device at least one or more process gas sensors, for example for measuring the velocity, composition or pressure of the process gas used, so that an optimal analysis of the process gas introduced can likewise be made possible by the filter device.

[0044] However, in the above-mentioned exemplary embodiment, the filter element arranged between the two perforated plates can preferably also be attached to at least the first perforated plate or be in contact with the latter, so that it is effectively prevented that material particles captured by the filter material reach the intermediate space formed by the filter device and therefore accumulate within the filter device. However, in a particularly preferred exemplary embodiment, the filter device can also preferably be configured in particular so that the filter element also fills the entire cavity created by the two perforated plates in the filter device, as a result of which not only is the above-mentioned material accumulation within the filter device avoided, but rather any turbulence occurring in the boundary layer within the process gas (for example, during the transition from air to solids) can also be effectively avoided.

[0045] In this case, in order to implement the above-mentioned features, in a first preferred exemplary embodiment, at least a portion of the filter elements can preferably be configured so that the latter can be introduced in a form-fitting manner into the above-mentioned cavities of the filter device. However, in further exemplary embodiments, not the portion of the filter elements, but in particular the portion of the cavities formed by the perforated plates, can be configured to be adaptable, so that preferably any shape and size of filter elements used can also be incorporated into the claimed filter device.

[0046] For the above-mentioned purposes, the filter device can preferably be provided with an additional adjustment mechanism, such as a clamping means, a clamping arm, or an adjustable rail device connected to at least one of the two perforated plates, by means of which at least one of the perforated plates can be displaced or tilted along at least one axis, thereby positionally adapting it to the shape of the filter element being used. In this regard, the filter device can be configured, for example, to move the at least one displaceable perforated plate along the above-mentioned axis by means of the above-mentioned adjustment mechanism, thereby preferably adjusting the distance between the two perforated plates, so that the filter element being used can be preferably positioned between the perforated plates in a form-fitting manner. In a further embodiment, the above-mentioned adjustment mechanism can also be used to fasten the at least one filter element being used between the two perforated plates, particularly by moving the at least one displaceable perforated plate closer to the other perforated plate, so that not only can a highly effective and cost-effective fastening method for introducing the filter element can be created, but also the latter can be replaced in a particularly easy and user-friendly manner by simply moving the at least one perforated plate away from the other.

[0047] It will be seen below that the above-described and claimed filter device can be used to generate a wide range of favorable advantages with respect to conventional gas introduction processes introduced into manufacturing facilities, which, due to the simultaneously compact and efficiently adaptable device elements of the filter device, can be preferably introduced into any type of manufacturing facility based on optical interaction processes.

[0048] Furthermore, manufacturing systems including the above-described filter devices are also claimed below, which also have the above-described advantages and are therefore also distinguishable from conventional manufacturing systems.

[0049] Here, the claimed manufacturing system can also include at least one or more manufacturing equipment based on optical interaction according to the above definition, and one or more embodiments of the above-defined filter device integrated into the manufacturing equipment. In this respect, the manufacturing equipment of the claimed manufacturing system can first be considered as at least one device, which includes at least one light source (e.g., laser, high-power LED, or solid-state emitter) for processing the mentioned workpiece material and / or materials, one or more optical paths generated by the light source and defined by a number of optical elements (mirrors, lenses, optical filters, etc.), and a working area defined for the manufacturing process and preferably isolated from the external environment of the manufacturing equipment, whereby the claimed manufacturing equipment can preferably be considered identical to any conventional manufacturing equipment based on optical interaction.

[0050] However, in preferred embodiments, the corresponding manufacturing equipment of the manufacturing system may also be configured to be particularly equipped for additive manufacturing of at least the workpiece, such as by means of selective laser melting (SLM).

[0051] In particular, for this purpose, the optical interaction-based manufacturing facility can preferably have at least one processing chamber, in which the workpiece material and / or materials required for the workpiece manufacturing can be introduced and processed by exposure using the light source. In this respect, the processing chamber can also be configured, in particularly preferred cases, so that the interior of the processing chamber can be used for the respective manufacturing process and thus define the current working area of ​​the manufacturing facility.

[0052] Here, the processing chamber itself is further preferably configured to be completely or hermetically closable, in particular in order to be able to meet the atmospheric conditions required for the SLM process, and may in particular be equipped with a number of chemical and / or mechanical adjustment elements, which enables the processing chamber of the manufacturing system to generate and preferably dynamically adjust (e.g. by supplying specific process gases and adjusting the pressure generated in the working area) the atmosphere required for the manufacturing process and formed in the working area, thereby enabling an extremely stable and error-free manufacturing process to be achieved.

[0053] In particular, for this purpose, the processing chamber may be provided with at least one gas inlet device, for example, coupled to the gas supply system of the manufacturing facility, by means of which the introduction of the above-mentioned process gases can be regulated and thus also the above-mentioned removal process of any material particle residues occurring in the working area can be carried out.

[0054] Thus, in a particularly preferred exemplary embodiment, the gas inlet device may comprise, for example, a gas circuit for providing process gases to be introduced into the working area of ​​the manufacturing facility and at least the aforementioned gas supply system, e.g., a plurality of valves and gas supply lines connected to the processing chamber and the gas circuit, which allows the gas inlet device to introduce a predetermined process gas or process gas mixture into the interior of the processing chamber via an inlet in contact with the processing chamber, thus adapting the working area of ​​the manufacturing facility to the atmospheric conditions of the respective manufacturing process.

[0055] In order to ensure that the process gas flow thus generated in the working area of ​​the manufacturing equipment can be used evenly to remove any material particles occurring therein, the processing chamber can furthermore be provided with at least one gas outlet, for example a further, preferably adjustable gas valve or gas connection device introduced into the processing chamber, by means of which the process gas flow introduced into the working area can be removed again from the processing chamber, thus forming a continuous process gas flow in the working area that is set up to entrain / absorb material particles occurring during the manufacturing process.

[0056] The general shape and position of any gas inlet or outlet in the manufacturing equipment, as well as the structure of the aforementioned gas inlet device, can preferably vary here depending on the manufacturing process used and the operating mode of the manufacturing equipment. However, in a particularly preferred exemplary embodiment, at least the gas supply system or the gas supply line provided therewith and used to introduce the process gas is preferably already formed flat, i.e., with a relatively large flow cross-section (e.g., at least half of the cross-section of the processing chamber used), so that, on the one hand, the widest possible flow profile of the process gas is already formed in the gas supply system, and, on the other hand, the pressure generated in the gas supply system can also be effectively reduced. Furthermore, the aforementioned gas outlet of the processing chamber can particularly preferably be arranged in the side wall of the processing chamber, preferably near the base region of the latter, which has the advantage that the process gas flow generated by the gas inlet device can be guided particularly close to the manufacturing area and therefore close to the source of the particles to be removed (processed workpiece).

[0057] In a further particularly preferred exemplary embodiment, the process gas flow through the working area of ​​the manufacturing equipment can include not only one, but preferably multiple process gas flows, each having distinct characteristics depending on the selected manufacturing process and thus capable of being used for different purposes. Thus, a preferred embodiment of the manufacturing equipment can include, for example, at least one first primary process gas flow guided along the base region of the working area to remove particle residues therein, and a second secondary process gas flow throughout the processing chamber, preferably configured to remove additional particle residues in the remaining portion of the processing chamber. In this regard, dividing the process gas flow within the processing chamber into multiple process gas flows thus generated can advantageously generate flow profiles specifically adapted to the aforementioned characteristics of particle deposits occurring within the working area, depending on the local intensity and degree of contamination. Thus, for example, the primary process gas flow can preferably have a higher flow velocity than the secondary process gas flow in order to more quickly and efficiently remove material particles more frequently found at the bottom of the processing chamber. In contrast, the secondary process gas flow is preferably slower, but much more planar, and in particularly preferred cases can also be formed as a continuous process gas flow, as a result of which a very uniform removal of particles can be ensured.

[0058] The filter device, which is configured to improve the process gas flow and protect the gas introduction system from any material deposits, can furthermore preferably be integrated directly into the gas introduction system, i.e., into at least one valve of the gas introduction system, so that the process gas flow introduced into the working area of ​​the manufacturing facility preferably comes into direct contact with the filter device, flows through the latter, and can thus optimize its properties according to the principles already mentioned above. To further ensure the greatest possible effectiveness of the filter device, the claimed filter device can also, in a preferred exemplary embodiment, be directly connected, in particular to a processing chamber of the manufacturing facility, so that the process gas flow optimized by the filter device can be introduced into the working area, preferably without interaction.

[0059] Therefore, in a highly preferred exemplary embodiment, the filter device can be configured for this purpose, in particular also to be integrated into at least the wall of the processing chamber, so that the above-mentioned optimized process gas can preferably enter the processing chamber directly after flowing through the filter device. More precisely, at least one perforated plate of the filter device configured to widen the process gas flow can be configured for this purpose, for example, preferably, to be introduceable into the above-mentioned wall of the processing chamber, so that said perforated plate can be used not only as a direct inlet for the process gas into the processing chamber, but also as a functional component (i.e., at least part of) the processing chamber.

[0060] In this regard, a preferred inlet process for process gases introduced into the working area of ​​the claimed manufacturing facility according to the present invention can include at least a three-stage introduction mechanism. Thus, in a first step, selected process gases can be introduced into a gas supply system, also provided in the gas inlet device, for example, from the aforementioned gas circuit through a gas inlet device, so that the respective process gases can be guided toward the processing chamber via the valves and gas supply lines included in the gas supply system. In a second preferred step, the process gases introduced into the gas supply system can then impinge on a filter device fluidly connected to the gas inlet device (i.e., for example, incorporated into the gas supply system), and can be introduced into the filter device based on the gas flow generated by the gas inlet device. As a result, the process gas flow is preferably at least homogenized and broadened by the implemented filter and distribution elements, and thus can be optimized for flow through the working area of ​​the manufacturing facility. Preferably, in the final step, the optimized process gas is further led out of at least one perforated plate of the filter device so that a process gas flow can be formed that is preferably optimally adapted to the conditions of the respective manufacturing process and can therefore be guided in an improved manner into the processing chamber of the respective manufacturing facility.

[0061] The above-mentioned combination of a gas supply system (or a gas supply device used for this purpose) connected to a processing chamber of a manufacturing facility and a filter device preferably integrated therein therefore has the particular advantage that not only can the gas supply system be effectively protected from any material particle deposits by the filter device, but likewise the process gas flow guided through the latter can be optimally matched to the conditions in the processing chamber.

[0062] Furthermore, as already mentioned above, the extremely compact and preferably easily replaceable construction of the claimed filter device allows for particularly simple adaptation of the device features to any replacements made within the production facility.

[0063] Thus, as mentioned above, it is conceivable, for example, that individual device elements of the filter device and / or the entire filter device in its installed state can be easily replaced with a respective optimized version (as with the above-mentioned replacement in a production facility), so that the filter device can be adapted to the new conditions very efficiently and cost-effectively, for example, in the course of a material change or in the event of a change in the process gas used (or its properties). Furthermore, it may in particular also be possible for the gas inlet device installed in the production facility to also be configured to adjust the flow characteristics of the introduced process gas flow, preferably depending on the properties of the filter device, i.e., in particular the characteristics of the distribution element and / or the filter element, whereby the operating mode of the filter device can be further improved.

[0064] In this respect, in particularly preferred exemplary embodiments, the gas inlet device can also, for example, preferably include at least one or more control devices, which preferably allow the gas inlet device to selectively exchange the predetermined characteristics of the process gas flow introduced into the filter device and thus adapt to any new features of the filter device. Thus, for example, at least one control device can preferably be configured to be coupled to a valve of the gas supply system, so that, for example, upon receiving a change signal, the control device can adapt the aforementioned characteristics of the process gas flow (e.g., pressure, chemical composition, etc.) to the new features of the filter device, thereby always achieving a process gas flow optimally matched to the filter device used. However, conversely, as already mentioned above, the filter device can also preferably be configured to be adaptable to the characteristics of the process gas introduced therein, allowing for the creation of a control system based on multiple adaptation possibilities.

[0065] Here, the exact adjustment process performed by the control device may also vary depending on the manufacturing equipment and the manufacturing process used therein. However, in the first exemplary embodiment, it may at least be possible for the above-mentioned adjustment of the process gas flow to be performed, for example, by a manual activation signal, preferably by manually inputting the above-mentioned replacement signal into the control device. In this regard, for example, after completing the adjustment of the filter device, the operator who has already performed the adjustment on the filter device can also send a predetermined signal (replacement signal) to the control device, for example, coordinated with the performed adjustment, so that the latter performs a corresponding adjustment in the gas supply system. In further cases, the replacement performed by the control device may also preferably be performed in an automated manner, in that, for example, any adjustments in the filter device can be detected by an integrated sensor and used to generate an individual replacement signal by automated data transmission (e.g., by using an internal database).

[0066] Furthermore, based on the above-mentioned characteristics of the claimed manufacturing equipment and the filter device incorporated therein, several method steps are claimed which can likewise be assigned to the claimed invention and therefore likewise be distinguished from the method steps of conventional manufacturing equipment or filter devices based on optical interactions.

[0067] More precisely, the claimed method steps relate to a method for adjusting the atmosphere in a manufacturing facility based on optical interactions, in particular an SLM facility, comprising at least one light source configured to manufacture workpieces, a plurality of optical elements for controlling the light path emanating from the light source, and a process chamber defining a working area of ​​the manufacturing facility, the method steps comprising at least - incorporating a filter device according to the above-mentioned characteristics into at least one wall of a manufacturing facility based on optical interactions, - generating a regulated process gas flow in a working area of ​​the processing chamber by introducing a process gas flow into the processing chamber that is guided through a filter device; - adjusting the process gas flow by adjusting the characteristics of the distributor element and / or the filter element of the filter device; may include:

[0068] Furthermore, the additional method steps also claimed include at least: - adjusting the process gas flow introduced into the filter device by the gas inlet device depending on the characteristics of the distributor element and / or the filter element of the filter device; - replacing at least one perforated plate and / or filter element before a material change of the production facility, the replaced perforated plate and / or filter element being adapted to the material used; may include:

[0069] In a further advantageous embodiment, a manufacturing system is proposed for manufacturing workpieces using an optical interaction-based manufacturing facility, in particular an SLM facility, where the manufacturing system can comprise an optical interaction-based manufacturing facility comprising at least one light source configured to manufacture the workpieces and / or one or more optical elements for controlling the path of light emanating from the light source and / or a process chamber defining a working area of ​​the manufacturing facility, and at least one filter device, where the filter device can be integrated into (or integrated into) a wall of the process chamber.

[0070] The manufacturing system can further include a first sensor system, which can include one or more sensors for detecting and / or determining process variables, particularly properties of gases delivered or to be delivered into the processing chamber.

[0071] The process gas supplied to the processing chamber is first introduced into a fluid chamber or inlet region before the gas flows through a filter device into the processing chamber. Here, the first sensor system can be arranged in the region of the fluid chamber (or inlet region) of the gas supply and / or upstream of the filter device. Thus, the first sensor system can be arranged behind the filter device and protected from the influence of process by-products (e.g., present in the processing chamber). Therefore, reliable detection of measured values ​​and / or process variables can be performed by the first sensor system in the region of the fluid chamber (or inlet region).

[0072] The manufacturing system may have a fluid chamber (or gas inlet box or inlet area) located adjacent, preferably directly adjacent, to a processing chamber (i.e., a working area or build space of the manufacturing facility), where the fluid chamber may be connected to a gas inlet device and thus to a gas circuit for supplying process gases introduced into the working area of ​​the manufacturing facility.

[0073] The fluid chamber preferably has a (substantially horizontally disposed) top wall and one or more adjacent side walls. Particularly preferably, the filter device is formed here as part of the wall of the fluid chamber and simultaneously as part of the wall of the processing chamber. Preferably, the sensor is arranged on at least the top wall and / or at least one side wall of the fluid chamber.

[0074] The sensors of the first sensor system may further be arranged on the top wall and / or the side wall such that they protrude from the wall surface into the fluid chamber, thereby further improving the measurement accuracy.

[0075] Advantageously, the fluid chamber may have a fluid connection to a gas circuit (which may preferably have an internal filter system for processing the process gas and a pump for transporting the process gas) via a connection opening.

[0076] Furthermore, the fluid chamber can have a stop wall arranged in front of the connection opening against which the process gas flowing into the fluid chamber can first collide after being output from the gas circuit, in order to effectively reduce any turbulence in the process gas flow already used in the fluid chamber. Advantageously, at least one sensor of the first sensor system can be arranged directly above the stop wall on the upper wall of the fluid chamber.

[0077] The advantageously arranged first sensor system may comprise one or more pressure sensors configured to detect the process pressure and / or the filter device differential pressure. Further advantageously, the sensor system may comprise one or more sensors for detecting the oxygen content in the fluid / processing chamber and / or for detecting the oxygen content in the region of the filter.

[0078] Additionally, at least one sensor can be provided to detect gas flow from the fluid chamber, and at least one temperature sensor can be provided to detect or determine the gas temperature and / or dew point of the process gas and / or the build space temperature.

[0079] Furthermore, a second sensor system may also optionally be provided to determine the process variable, which second sensor system may be located outside the fluid chamber, in particular within the processing chamber.

[0080] The method steps for manufacturing a part using the above-mentioned manufacturing system may further include at least one or more of the following steps: adjusting the process gas flow introduced into the filter device by the gas inlet device at least partially in response to the detection value of the first sensor system; generating an adjusted process gas flow in the working area of ​​the processing chamber by introducing the process gas flow guided through the filter device into the processing chamber at least partially in response to the detection value of the first sensor system; adjusting the process gas flow by adjusting the characteristics of the distribution element and / or filter element of the filter device, in particular by replacing the filter element, at least partially in response to the detection value of the first sensor system; and controlling the laser light source at least partially in response to the detection value of the first sensor system. [Brief explanation of the drawings]

[0081] [Figure 1] 1 shows a cross section of an optical interaction based manufacturing installation, in particular an SLM installation, with a filter device integrated into the wall of the processing chamber. [Figure 2] 2 shows a three-dimensional cross-sectional view of the optical manufacturing facility of FIG. 1. [Figure 3] FIG. 2 is shown with additional flow lines to show the primary and secondary process gas flows used in the manufacturing facility. [Figure 4] A further exemplary embodiment of a manufacturing facility integrated with a filter device is shown as a three-dimensional cross section, which manufacturing facility also comprises a planar gas supply device. [Figure 5] 4 is shown in vertical mirror image. [Figure 6] 6 shows a two-dimensional cross-sectional view of the filter device of FIGS. 4 and 5. FIG. [Figure 7] 1 shows a further design of the manufacturing facility. DETAILED DESCRIPTION OF THE INVENTION

[0082] In the following, exemplary embodiments of the present invention will be described in detail with reference to exemplary figures. The features of the exemplary embodiments can be combined in whole or in part, and the present invention is not limited to the described exemplary embodiments.

[0083] Figures 1 and 2 show a schematic embodiment of a first manufacturing facility FA based on optical interaction according to the claimed invention, in particular a manufacturing facility for selective laser melting, in which the material to be processed (here represented as material layer 6) can be manufactured or processed by light irradiation in a working area 4 of the manufacturing facility FA.

[0084] For this purpose, a manufacturing facility such as the manufacturing facility FA shown in Figures 1 and 2 provides at least one (laser) light source which, via a control system coupled to the manufacturing facility FA, ​​generates a light beam modified for interaction with the material to be processed, which light beam is focused, via a predetermined optical path, onto the material, which is typically located in the above-mentioned working area 4, using various optical elements, preferably integrated in the scanning head, such as focusing or scattering lenses, mirrors, optical filters, etc. Processing or manufacturing of the material / workpiece thus exposed by the focused light beam is then carried out by local and preferably continuous plastic deformation of the material introduced into the working area 4.

[0085] Thus, for example, in the illustrated SLM system, to produce any desired three-dimensional workpiece, the material to be processed is first applied in powder form in the form of a thin material layer 6 to a working area 4, preferably on a vertically movable base plate, which is moved to a processing height corresponding to the light path of the light source. For processing, the material layer 6 to be processed is then locally remelted by the aforementioned light beam focused on the material layer 6 through a protective glass 10 in the manufacturing system, forming, after solidification, a solid material layer on which, in a subsequent process step, additional material layers are again applied using a coater 8, also arranged in the manufacturing system FA, which are repeatedly melted together using the focused light beam until the desired three-dimensional material shape (workpiece) is obtained.

[0086] However, as already mentioned, due to the above-mentioned manufacturing process, the problem usually arises in state-of-the-art SLM installations in that any process residues arising during manufacturing, such as, for example, soot or material particles entering the atmosphere, can adversely affect the processing quality of the respective manufacturing installation FA, since, for example, material deposits thus arising on the protective glass 10 or a changing refractive index in the manufacturing atmosphere can result in an unfavorable refraction of the processing light beam. Furthermore, the likewise existing intrusion of material particles into any process gas supply system forces likewise complex and expensive cleaning of the latter, since otherwise, in the case of a material change that occurs, a high risk of contamination by residual particles must be assumed.

[0087] In this regard, in order to solve the above-mentioned problems, a combination of an optical manufacturing facility FA and a filter device FV, as shown in FIGS. 1 and 2, for example, has been proposed.

[0088] Here, according to the exemplary embodiment shown therein, the manufacturing facility FA comprises in particular a working area 4, in which an introduced material layer 6 can be processed by the above-mentioned manufacturing process and can preferably be used to manufacture three-dimensional workpieces. In order to be able to likewise generate the necessary or at least advantageous atmosphere for the manufacturing process here, the working area 4 is further embedded in a preferably fully hermetically lockable processing chamber P, which completely surrounds the working area 4 by a processing chamber wall identified by 2, thus allowing in particular the process gas or atmospheric conditions (e.g., a predetermined pressure) supplied to the working area 4 to be maintained in the processing chamber P and thus in the manufacturing facility FA.

[0089] To introduce these mentioned process gases, the manufacturing facility FA in this exemplary embodiment is embedded in the processing chamber P and comprises two gas inlets designated by 12 and 13, which are connected to the gas circuit of the manufacturing facility FA via two preferably separate, but in further cases also consecutive or even identical, gas inlet devices GV, thus making it possible to introduce a plurality of predetermined process gas flows into the processing chamber P. The process gases are preferably transported continuously in a circuit (gas circuit) between the processing chamber and a filter system for treating the process gases.

[0090] In the illustrated embodiment, the process gas flow thus introduced into the working area 4 of the manufacturing facility FA has an important function. Its main task is the removal of welding fumes, condensates, and welding spatter from the processing chamber. Separate oxygen monitoring and flooding are preferably implemented to maintain the oxygen concentration (e.g., <0.05% residual oxygen content). A further requirement for the function of the process gas guidance is that, in the case of maximum removal of condensates, etc., the powder bed must remain untouched so that the powder is not transported into the filter system. In this regard, it should be understood that the flow characteristics of the introduced process gas (e.g., process gas flow profile, velocity, range, etc.) are important in the present invention for both the instantaneous (process gas presentation) and long-term technical quality assurance of the manufacturing process.

[0091] Furthermore, the process gas flows introduced through the two gas inlets 12 and 13 can in principle also differ from one another.

[0092] 3 shows a schematic diagram of the flow profile entering the processing chamber P through the gas inlets 12 and 13. Thus, in the illustrated exemplary embodiment, a first process gas flow, also referred to as primary process gas flow F1, which is stronger than the second gas inlet 13, is generated by the gas inlet 12. This first process gas flow, due to the gas inlet 12 being located near the bottom of the processing chamber P, is primarily guided along the base region of the working area 4, identified by A1, and therefore primarily assumes a volume around the material layer 6. This has the advantage, in particular, that the removal (or extraction) of welding fumes and welding spatter immediately after their formation is already possible by the primary process gas flow F1 located near the material layer 6. In this respect, the primary process gas flow F1 in the present invention initially forms a main flow capable of removing a large portion of the resulting process residues, such as welding fumes, condensates, and welding spatter.

[0093] The secondary process gas flow F2 introduced through the second gas inlet 13 can, in contrast, be different from the above-mentioned primary process gas flow F1 in order that the former can extend as widely as possible, i.e., preferably throughout the entire processing chamber P, but at least over the upper portion A2, so that any residues that cannot be achieved by the primary process gas flow F1, such as rising smoke, are likewise efficiently captured by the secondary process gas flow F2. In this respect, the two process gas flows F1 and F2 entering the processing chamber P in the present invention thus form two flow profiles that are distinct from one another and preferably set to serve different purposes, with the result that an individual improvement of the particle cleaning mechanism produced by each of the above-mentioned flows can be carried out by selective adaptation of said flows.

[0094] To remove the aforementioned process gas flows F1 and F2 again, the processing chamber P also comprises a gas outlet 11, which is arranged opposite the gas inlets 12 and 13 and allows, in particular, the primary and secondary process gas flows F1 and F2 to be guided out of the processing chamber P, and thus also allows material particles trapped by said gas flows to be removed from the working area 4 of the manufacturing facility FA. For this purpose, the gas outlet 11 can also preferably be provided with a predetermined negative pressure, which in particular allows the manufacturing facility FA to remove a preset amount of process gas per unit time from the processing chamber P, and thus preferably allows the process gas concentration in the working area 4 to be maintained at a constant level. In a further preferred exemplary embodiment, the gas outlet can also be coupled to a recycling system that can purify the process gas led out of the processing chamber and then supply it again to the gas circuit of the aforementioned gas supply device GV.

[0095] In order to further improve the flow profile of the secondary process gas flow F2, in the exemplary embodiment of the production installation shown in Figures 1 to 3, the gas inlet 13 is equipped with a preferred embodiment of the likewise claimed filter device FV. Thus, in this figure, at least the already shown secondary gas flow F2 is formed by, or more precisely defined by, the filter device FV.

[0096] However, in further exemplary embodiments, it may also be possible for a further gas inlet, such as gas inlet 12, to be equipped with a filter device FV, so that the latter arrangement need not be limited to this one exemplary embodiment only.

[0097] Here, the filter device FV in this case is configured to be integrated into, in particular, a side wall 2' of the processing chamber. More precisely, in this case, the integrated filter device FV forms at least one side wall 2' of the processing chamber P after integration into the processing chamber P, in particular into itself, so that the filter device FV can be considered an integrated component of the illustrated manufacturing facility FA. As a result, this has the advantage, in particular, that a particularly planar process gas profile can be generated due to the extremely large effective or gas inlet area of ​​the filter device FV, which process gas profile can likewise be guided into the processing chamber P as unhindered as possible due to the direct contact with the working area 4.

[0098] Functionally, the illustrated filter device FV furthermore clearly comprises, in the illustrated embodiment, the three element forms already mentioned above. The filter element 18 is arranged between two perforated plates 14 and 16, shown here as perforated plates, and thus functionally extends across the entire side wall 2'. Here, the filter element 18 is specifically configured as a replaceable filter fabric, e.g., an at least two-dimensional filter nonwoven, having a predetermined mechanical pore size M and a filter width of length D3, which, depending on the above-mentioned characteristics of the filter element 18, allows both the absorption of process residues entering the filter device FV into the filter fabric and, due to the diffusion properties of the pores embedded in the filter element, an efficient homogenization of the process gas flowing through the filter device FV. Correspondingly, the filter element 18 or the filter cloth provided by the latter is in the present invention particularly configured, due to particularly adjusted characteristics (e.g. the above-mentioned pore size M, the filter width D3, as well as further properties such as the density of the filter cloth), to be able to perform the above-mentioned dual task and thus function as both a homogenized particle filter and an efficient particle filter. For this purpose, for example, at least the pore size M of the filter element 18 can be selected to be smaller than the particle size of the material used. Furthermore, it is equally possible for the filter element 18 to be provided with a specific, predetermined pore pattern that promotes homogenization of the gas flowing therethrough.

[0099] The perforated plates 14 and 16 of the filter device FV are furthermore in planar contact with the filter element 18 in the illustrated embodiment. In this respect, the filter device FV in this case forms a linear fluid chamber in which both the filter element 18 and the two perforated plates 14 and 16 are aligned parallel to one another and, in particular, perpendicular to the process gas flow introduced into the working area, as a result of which a particularly uniform distribution of the process gas can be achieved and the generation of adverse shear forces can be effectively prevented.

[0100] The first perforated plate 14, which is arranged towards the inside of the processing chamber and functions as such as well, further has a width D1 and is provided with predetermined perforations L1, for example punched perforations, which enable the perforated plate 14 to spread the process gas previously homogenized by the filter element 18 downstream and thus preferably introduce it directly into the processing chamber P. In this case, the above-mentioned properties of the perforated plate 14 are preferably adapted to at least the already mentioned characteristics of the filter element 18 (for example the pore size M and the filter width D3) so as to preferably be able to optimally process the process gas flow passing through the filter element 18 and onto the perforated plate 14.

[0101] The second perforated plate 16 arranged upstream of the filter element 18 also has a predetermined width D2 and perforations L2, which differ from those of the first perforated plate 14 but can also correspond in certain exemplary embodiments. Here, the second perforated plate 16 is in certain cases connected to a gas supply system (not shown) of the above-mentioned gas supply device GV, in particular, and serves as an upstream spreading element that allows the process gas supplied by the gas supply device GV to first impinge on the filter device FV and distribute the latter through the perforations L2 along the filter element 18 as planarly as possible.

[0102] In this regard, the interaction process within the filter device FV first provides that a specific process gas flow supplied by the gas supply device GV impinges on the perforated plate 16 connected to the gas supply device GV (or its gas supply system) and is homogenized by the latter due to interaction at the perforations L2. The process gas flow then flows into the filter element 18 (preferably a filter fleece), which further filters the process gas flow after it leaves the filter element, preferably so that a uniform gas flow profile is generated. Further flow of the homogenized gas through the perforated plate 14 further broadens the aforementioned gas flow profile again so that a (secondary) process gas flow, which preferably fills the entire processing chamber, can be guided into the working area 4. Therefore, the primary task of the filter element 18 during the build process is to homogenize the process gas flow. Here, the process gas flows through the filter element along the first direction. Furthermore, the filter element also serves as a filter or protection against mixing with powder residues, especially during the unpacking process or build operation. Thus, particle blocking / filtration occurs along a second direction, preferably opposite to the first direction. Because powder may swirl during the unpacking process, the filter element 18 is intended to prevent powder from entering the secondary flow supply area (e.g., from the processing chamber) (particularly the gas circuit, box, etc.). Therefore, the filter element 18 is provided as a kind of membrane. The process gas passes through one side of the filter element 18 (i.e., the side facing away from the processing chamber) (which has the advantage of homogenizing the flow during introduction into the processing chamber). Furthermore, during the unpacking process, the powder cannot enter the secondary flow supply element / box from the opposite direction (i.e., from the processing chamber and therefore through the side facing the processing chamber) because the secondary flow supply element / box is blocked by the filter element 18.

[0103] In this respect, it can be seen that the present filter device forms an equipment system having a plurality of interdependent and adapted equipment elements which, due to the multifunctional nature of said equipment elements, allows the generation of a process gas flow which can be matched and selectively adjusted to the working area 4 and thus generate improved atmospheric conditions in the processing chamber P used compared to the state of the art.

[0104] 4 and 5 show further exemplary embodiments of the claimed manufacturing installation FA. The embodiment shown in these figures differs from the manufacturing installation shown in FIGS. 1 to 3 in that, in this case, the perforated plates 14 and 16 do not have perforations formed throughout the entire plate, but rather the perforations are spatially distinct. Thus, for example, in this case, the perforated plate 14 has first perforations L1, denoted by L1, formed in the lower half of the perforated plate 14, while the upper half of the plate has second perforations L4. Here, the two perforations L1 and L4 can differ in particular in the size of the holes used, the distribution of the perforations, their density, or even the width of the plate used, which in turn results in the advantage that the process gas flow profile generated by the perforated plate 14 can be adjusted even more selectively (i.e., by combining different, spatially separated characteristics of the perforated plate 14).

[0105] Furthermore, it may equally well be possible for a portion of the perforated plate to have no perforations at all. Thus, for example, in Figure 4, the perforated plate 16 of the illustrated filter device FV is shown to include an upper portion that does not contain any perforations, so that the process gas flow introduced into the filter device FV by the gas supply device GV can enter the filter device FV only through the lower portion of the perforated plate 16. Thus, in this case, efficient gas inflow is generated by selective localized cutting of any perforations or other features in the filter device FV, and this gas inflow can further increase the effectiveness of the filter device FV.

[0106] 4 and 5 show preferred exemplary embodiments of a gas supply device GV connected to or incorporating a filter device FV. More precisely, the aforementioned figures show a portion of a gas supply system with a gas supply device GV, which in this exemplary embodiment is realized as a planar flow chamber 20. The dimensions of the described flow chamber 20, particularly in the vicinity of the filter device FV, are adapted to the dimensions of the filter device FV and preferably have the same dimensions as the perforated plate 16 that contacts the latter. In this respect, this extremely planar embodiment of the gas supply system has the advantage, in particular, that the process gas flow introduced into the filter device FV can be widely dispersed even before entering the perforated plate 16 and can therefore enter the filter device FV in a planar manner. Furthermore, excessively large pressure buildups in the gas supply system are thus avoided.

[0107] Furthermore, in order to be able to supply the process gas used, the illustrated gas supply system is further connected to a gas circuit (preferably having an internal filter system for treating the process gas and a pump for transporting the process gas) via a connecting opening 22. Furthermore, a stop wall (not shown) arranged in front of the connecting opening 22 is attached in the illustrated fluid chamber, against which the process gas flowing into the fluid chamber first collides after being output from the gas circuit, thus effectively reducing any turbulence in the process gas flow already used in the gas supply system.

[0108] Furthermore, in order to be able to maintain efficient control of the process gas inlet, the gas supply device GV can further comprise at least one control device for adjusting the properties of the process gas introduced through the gas circuit, as already mentioned above. In this respect, the gas supply device can be configured for this purpose in particular to adapt the properties of the process gas guided from the gas circuit, in particular the flow rate, pressure or composition of the process gas, to the properties of the filter device or generally to the properties of the production installation, so that further selective control of the generated process gas flow profile can also be carried out by adapting the gas supply device GV.

[0109] FIG. 6 shows yet again a two-dimensional cross-sectional profile of the filter device FV already shown in FIGS.

[0110] As can be seen, the two perforated plates 14 and 16 and the filter element 18 also form an apparatus system that is, in this case, oriented parallel to one another and orthogonal to the process gas flow direction, so that the process gas flow can be guided as efficiently as possible from the fluid chamber 20 through the filter device FV into the treatment chamber P. Furthermore, the clamp-like positioning of the two perforated plates 14 and 16 also offers the possibility of configuring the filter element 18 in a particularly simple manner.

[0111] Thus, for example, in this exemplary embodiment, the filter element 18 formed as a filter cloth can be introduced into the cavity between the two perforated plates 14 and 16 and simply removed from the latter to adjust any process characteristics. The perforated plates 14 and 16 thus serve both as an element for fluid treatment of the introduced process gas flow and as a holding device for the replaceable filter element 18, thereby enabling a very simple and cost-effective replacement method for the filter element 18. In this regard, for example, an operator replacing the above-mentioned filter element 18 can simply open the processing chamber P via a pre-installed door or movable wall, as shown by way of example in FIG. 1 , and manually remove the used filter element between the perforated plates 14 and 16 or insert a new filter element into the latter, so that the filter element 18 can be quickly and efficiently replaced. In further exemplary embodiments, it may also be possible for other device elements of the filter device FV, such as the perforated plates 14 and 16, to be replaceable, so that the filter device FV can also be preferably configured to be modular as a whole.

[0112] In a further exemplary embodiment according to FIG. 7 based on one or a combination of the above-described exemplary embodiments, further improvements of the described apparatus and manufacturing method are achieved, in particular by advantageous adaptation of the sensor system for detecting process parameters and / or gas properties.

[0113] In known systems, the sensor system (especially the oxygen sensor) is located directly in the processing chamber and is therefore exposed to welding fumes, condensate, and powders, which not only results in a reduced service life for the sensor system, but can also result in less accurate process control over time and lower quality parts.

[0114] 7 of the described device, it is therefore proposed to arrange the sensor system (preferably comprising one or more of sensors S1, S2, S3) upstream of the filter element 18 (with respect to the flow direction during production of the part) and / or upstream of the perforated plate 16 (with respect to the flow direction during production of the part). The sensor system can therefore preferably be arranged in the fluid chamber 20. Here, an arrangement of at least two sensors S1 and S2 opposite each other on the upper side of the fluid chamber 20 and a further sensor S3 on the side wall of the fluid chamber has proven to be particularly advantageous.

[0115] The sensor system is particularly advantageously arranged above (on the top cover of) the fluid chamber 20. Alternatively, the sensors can also be arranged above and on the side of the fluid chamber 20. This arrangement therefore allows very accurate detection of the feed gas that is guided through the fluid chamber 20, through the filter element 18 and into the processing chamber P, for example to determine the oxygen content and / or moisture content.

[0116] In a development, the gas pressure can also be determined by a sensor system placed in (or within) the fluid chamber 20. As shown in Figure 7, the filter device FV (comprising at least one perforated plate 16 and a filter element 18) is now formed as part of the wall of the fluid chamber 20 and simultaneously as part of the wall of the processing chamber P.

[0117] The placement (partially or preferably completely) of the first sensor system in the fluid chamber 20 (gas inlet box) and therefore behind the filter element (in particular behind the filter fleece or membrane) as seen from the processing chamber allows for an increased service life of the sensor system and at the same time optimized / more accurate process control. A second sensor system can optionally also be placed in the processing chamber.

[0118] The sensor is thus protected from process by-products, resulting in a longer service life. In addition to the oxygen sensor, additional sensors, such as a moisture sensor or a pressure sensor (particularly advantageously at least one oxygen partial pressure sensor and / or one nitrogen partial pressure sensor), can also be arranged there. Therefore, it is proposed to use a multi-function filter element 18, particularly to shield the sensor system (with one or more sensors S1, S2, S3) from contamination from the processing chamber P (build chamber), while simultaneously preventing harmful residual particles from entering the provided gas supply line (where the gas supply may continue) upstream, and the provided distribution element, while simultaneously ensuring the largest possible, and therefore highest-quality, gas flow profile. Furthermore, this arrangement also protects the first sensor system from contamination or damage during the unpacking process. Thus, to protect the first sensor system, particles arising during the production of the part (workpiece) are blocked by the filter material, and particles arising during the unpacking process are similarly blocked by the filter material.

[0119] The advantageously arranged (first) sensor system may include one or more pressure sensors. The pressure sensors may be configured to detect the process pressure and / or the filter differential pressure. More advantageously, the sensor system may include a sensor for detecting the oxygen content in the processing chamber and / or in the region of the filter. Additionally, a sensor for detecting the gas flow may be provided. Furthermore, a temperature sensor for detecting the gas temperature and / or the dew point of the process gas and / or the build-up space temperature may be provided. Thus, the first sensor system (preferably including sensors S1, S2, S3) is arranged behind the filter device and is protected from the influence of process by-products from the processing chamber. Thus, the gas supplied to the processing chamber P is first guided into the fluid chamber 20 before the gas flows through the filter element 18 into the processing chamber P. Thus, in the fluid chamber 20, the first sensor system can detect process variables and / or gas properties.

[0120] The features, components, and specific details can be interchanged and / or combined to create further embodiments depending on the required purpose. Any modifications within the knowledge of one skilled in the art are implicitly disclosed herewith. [Explanation of symbols]

[0121] 2. Processing chamber walls 6 material layers 4 Working area 8. Coating 10 Protective Glass 11 Gas outlet 12;13 Gas inlet 13 Distribution elements 14;16 Perforated plate 18 Filter Elements 20 Flow chamber, fluid chamber 22 Connection opening A1 base area A2 part D1 width D2 Thickness D3 Filter Width FA manufacturing equipment FV filter device L1;L2;L4 perforation, perforation M Hole size, hole P Processing chamber S1, S2, S3 sensors

Claims

1. A filter device (FV) for adjusting the atmosphere in a manufacturing facility (FA), in particular an SLM facility, based on optical interactions, comprising at least one light source configured to manufacture workpieces, a plurality of optical elements for controlling the path of light emitted from said light source, and a processing chamber (P) defining a working area (4) of said manufacturing facility (FA), a distribution element (13) for the planar introduction of a process gas flow into the working area (4) of the production facility (FA), said distribution element (13) comprising at least one perforated plate (14; 16); at least one filter element (18) for homogenizing said process gas flow; Equipped with The filter element (18) is arranged on at least one perforated plate (14; 16) of the distribution element (13), The filter device (FV) is adapted to be integrated into at least the wall (2') of the treatment chamber (P), Filter device (FV).

2. the filter device (FV) comprises at least two perforated plates (14; 16), and at least one of the perforated plates (14; 16) of the distribution element (13) and / or the filter element (18) is configured to be replaceable; A filter device (FV) according to claim 1.

3. the filter element (18) comprises a filter material configured for particle filtration; The filter material has pores (M) having a predetermined pore size, The pore size of the filter material is: The process gas guided through the distribution element (13) passes through The filter material is configured to block particles generated during the manufacturing of the workpiece, and / or to block particles generated during the unpacking process. A filter device (FV) according to at least one of the preceding claims.

4. the filter element (18) is configured to homogenize and / or filter the process gas flow guided through the distribution element (13) by adjusting at least the thickness (D3) and / or the pore size of the filter material used, A filter device (FV) according to at least claim 3.

5. The filter device (FV) comprises at least a first perforated plate (14) and a second perforated plate (16); the first perforated plate (14) of the distribution element (13) is configured as an inlet for the process gas into the filter device (FV) and the second perforated plate (16) is configured as an outlet for the process gas from the filter device (FV) to the treatment chamber (P) of the manufacturing facility (FA), At least the second perforated plate (16) is adapted to be integrated into the wall (2') of the treatment chamber (P). A filter device (FV) according to at least one of the preceding claims.

6. At least two perforated plates (14; 16) of the distribution element (13) are arranged parallel to each other so that the distribution element (13) forms a linear fluid chamber; the filter element (18) fills the cavity of the distribution element (13) provided by the at least two perforated plates (14; 16); A filter device (FV) according to at least one of the preceding claims.

7. the distribution element (13) comprises an adjustable filter vessel for the guided positioning of at least one of the perforated plates (14; 16) and / or the filter element (18) in the working position of the filter device (FV), the filter vessel is configured to guide the at least one perforated plate (14; 16) and / or the filter element (18) along at least one predetermined direction for positioning it in the working position and to fix it in the working position. A filter device (FV) according to at least one of the preceding claims.

8. the at least one perforated plate (14; 16) is configured to vary the flow behavior of the process gas flow by adjusting at least the thickness (D1; D2) and / or the size of the perforations (L1; L2; L4) arranged in the perforated plate (14; 16), A filter device (FV) according to at least one of the preceding claims.

9. The filter element (18) is formed as an antistatic filter cloth. A filter device (FV) according to at least one of the preceding claims.

10. A manufacturing system for manufacturing a workpiece using a manufacturing facility (FA), particularly an SLM facility, based on optical interaction, comprising: a manufacturing facility (FA) based on optical interaction, comprising at least one light source adapted to manufacture said workpieces, a plurality of optical elements for controlling the path of light emanating from said light source, and a processing chamber (P) defining a working area (4) of said manufacturing facility (FA); - at least one filter device (FV) according to claim 1, Equipped with the at least one filter device (FV) is configured to be integrated into the wall (2) of the processing chamber (P); Manufacturing system.

11. The optical interaction-based manufacturing equipment (FA) further comprises a gas inlet device (GV) for generating and / or introducing process gases into the working area (4) of the processing chamber (P), the gas inlet device (GV) is fluidly connected to the filter device (FV); the gas inlet device (GV) is configured to introduce process gas into the filter device (FV) and introduce the process gas through the at least one perforated plate (14; 16) of the filter device (FV) into the working area (4) of the processing chamber (P); The manufacturing system of claim 10.

12. the gas inlet device (GV) is configured to adjust the flow characteristics of the process gas flow based on the characteristics of the distribution element (13) and / or the filter element (18). The manufacturing system of claim 11 .

13. The manufacturing equipment (FA) based on optical interaction comprises a primary process gas flow (F1) guided along the base area of ​​the working area (4) for removing particle residues in the base area, and a planar secondary process gas flow (F2) for removing particle residues in the processing chamber (P), the process gas flow introduced through the filter device (FV) into the working area (4) of the manufacturing facility (FA) forms at least the secondary gas flow (F2); A manufacturing system according to at least one of the preceding claims.

14. 1. A method for adjusting the atmosphere in a manufacturing facility (FA) based on optical interactions, in particular an SLM facility, comprising at least one light source configured to manufacture a workpiece, a plurality of optical elements for controlling the path of light emanating from said light source, and a processing chamber (P) defining a working area (4) of said manufacturing facility (FA), said method comprising: - incorporating a filter device (FV) according to claim 1 into at least one wall (2') of said production facility (FA), generating a regulated process gas flow in the working area (4) of the processing chamber by introducing into the processing chamber (P) a process gas flow guided through the filter device (FV); - adjusting the process gas flow by adjusting the characteristics of the distributor element (13) and / or the filter element (18) of the filter device (FV), in particular by replacing the filter element (18); at least one of: method.

15. - adjusting the process gas flow introduced into the filter device (FV) by a gas inlet device (GV) depending on the characteristics of the distributor element (13) and / or the filter element (18) of the filter device (FV); - before a material change of the manufacturing facility (FA), changing said at least one perforated plate (14; 16) and / or said filter element (18), said changed perforated plate (14; 16) and / or said filter element (18) being adapted to said changed material; further comprising at least one of:

15. The method of claim 14.

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