Triangular principal pole design with a natural leading edge taper to maximize areal density capacity in perpendicular magnetic recording.

Abstract

This invention provides a main magnetic pole design method and a writing head that maximize the areal density capacity in direct magnetic recording (PMR). [Solution] A principal magnetic pole (MP) design method having a triangular shape and a leading edge taper to maximize surface density capacity, wherein the leading edge taper is included on the leading shield (LS) to form a taper angle on the MP to concentrate magnetic flux on the MP 102. The MP may be shifted away from the LG to provide an additional leading gap (LG) portion on the front side of the MP, and the taper angle may be larger than the LG in the additional LG portion. The MP design results in a larger MP surface area on the air bearing surface (ABS) and a larger magnetic flux to the medium bit.

Description

Technical Field

[0001] Embodiments of the present invention relate to the field of perpendicular magnetic recording (PMR) write heads for hard disk drives (HDDs). More specifically, embodiments of the present invention relate to a main pole design that is triangular and has a leading edge taper in order to maximize areal density capacity.

Background Art

[0002] Large amounts of digital data can be stored on disk drives such as hard disk drives (HDDs). A disk drive may include a head that interacts with a magnetic recording medium (e.g., a disk) to read and write magnetic data on the disk. For example, a disk drive may include a write head that is positioned near the disk and can change the magnetization of the disk as it passes directly beneath.

[0003] Disk drives can utilize various techniques to write to a disk. For example, perpendicular magnetic recording (PMR) can relate to the fact that magnetic bits on the disk are oriented perpendicular (e.g., either up or down) to the disk surface. PMR recording can increase the storage density on the disk by aligning the poles of magnetic elements on the disk perpendicular to the surface of the disk.

Summary of the Invention

[0004] This embodiment relates to a main magnetic pole design that is triangular in shape and has a leading edge taper in order to maximize surface density capacity. The design may include a leading edge taper on the leading shield (LS) to form a taper angle on the MP in order to concentrate the magnetic flux on the MP. The MP may be shifted away from the LG to provide an additional leading gap (LG) portion in front of the MP, and the taper angle may be larger than the LG in the additional LG portion. The MP design can result in a larger MP surface area on the air bearing surface (ABS) and a larger magnetic flux to the medium bit.

[0005] In a first exemplary embodiment, a write head is provided. The write head may include a main pole (MP) configured to apply magnetic flux to write medium bits to a recording medium. The MP may be triangular in shape. The write head may also include a trailing shield, a side shield (SS), a reading shield (LS), and a write shield (WS) configured to recover magnetic flux.

[0006] The write head may also include a leading edge taper on the LS to form a tapered angle on the MP in order to concentrate the magnetic flux on the MP. The write head may also include side gaps (SG) between the MP and SS on both sides of the MP tip. The write head may also include a leading gap (LG) between the MP and LS. The MP may be shifted away from the LG to provide an additional LG portion on the leading side of the MP, and the taper angle may be larger than the LG in the additional LG portion. The write head may also include a coil wound around the MP via a magnetic PP3 shield configured to direct the write current to saturate the MP magnetization.

[0007] In some examples, the write head may include a write gap (WG) positioned between the main magnetic pole and the trailing shield. The WG may include a non-magnetic conductor, an insulator, or a magnetic GMR or 2E+n element.

[0008] In some examples, SG is composed of a non-magnetic material that is either a conductor or an insulator, and LG is composed of the same material as SG. In some examples, the WG between the hot seed layer and the MP has a length equal to the width of the HS layer, along the SS and LS.

[0009] In some examples, the write head may include an insulating layer placed between the SG and SS. In some examples, the magnetic pole width (PWA), the height of the MP equal to the magnetic pole thickness (PT), and the side arm angle equal to the bevel angle (BA) have a triangular shape.

[0010] In some examples, the MP is shifted away from the LG by vertically shifting the LET mask, and after the LET is shifted, the LG and any additional LG portions are deposited to create a trench that defines the triangular shape of the MP.

[0011] In some examples, the LG and additional LG portions are deposited within a narrow SSCD opening to create a trench defining the triangular shape of the MP. In some cases, the SSCD opening results in a narrower PWA after the chemical mechanical polishing (CMP) process, and the CMP position is vertically shifted.

[0012] In another exemplary embodiment, a device is provided. This device may include a main magnetic pole (MP) and a leading shield (LS). The device may also include a leading edge taper on the LS to form a taper angle on the MP. The device may also include a leading gap (LG) between the MP and the LS. The MP may be shifted away from the LG to provide an additional LG portion in front of the MP.

[0013] In some examples, the taper angle is larger in the additional LG portion than in the LG between MP and LS. In some examples, the device may also include a trailing shield (TS), a side shield (SS), a write shield (WS), a side gap (SG) between the MP and SS, and a coil wound around the MP via a magnetic PP3 shield.

[0014] In some examples, the device may also further include a write gap (WG) positioned between the main pole and the trailing shield, the WG comprising either a non-magnetic electrical conductor, an insulator, or a magnetic GMR or 2E+n element, the SG consisting of a non-magnetic material that is either a conductor or an insulator, and the LG consisting of the same material as the SG.

[0015] In some examples, the WG between the hot seed layer and the MP has a length equal to the width of the HS layer, along the SS and LS. In some examples, the magnetic pole width (PWA), the height of the MP equal to the magnetic pole thickness (PT), and the side arm angle equal to the bevel angle (BA) have a triangular shape.

[0016] In some examples, the MP is shifted away from the LG by vertically shifting the LET mask, and after the LET is shifted, the LG and any additional LG portions are deposited to create a trench that defines the triangular shape of the MP.

[0017] In some examples, the LG and additional LG portions are deposited within a narrow SSCD opening to create a trench defining the triangular shape of the MP, the SSCD opening resulting in a narrow PWA after the chemical mechanical polishing (CMP) process, and the CMP position is shifted vertically.

[0018] In another exemplary embodiment, a method is provided. This method may include providing a leading edge tapered (LET) mask adjacent to the main magnetic pole (MP) of a write head. The method may also include forming the LET and a reading shield (LS) based on an LET mask shifted perpendicular to the MP. The method may also include depositing a reading gap (LG) adjacent to the LS, wherein the MP is shifted away from the LG to provide an additional LG portion in front of the MP, and the taper angle of the LET is greater in the additional LG portion than in the LG.

[0019] In some examples, the MP is shifted away from the LG by vertically shifting the LET mask, and after the LET is shifted, the LG and any additional LG portions are deposited to create a trench that defines the triangular shape of the MP.

[0020] In some examples, the LG and additional LG portions are deposited within a narrow SSCD opening to create a trench defining the triangular shape of the MP, the SSCD opening resulting in a narrow PWA after the chemical mechanical polishing (CMP) process, and the CMP position is shifted vertically.

[0021] Other features and advantages of embodiments of the present invention will become apparent from the accompanying drawings and the following detailed description. Embodiments of the present invention are shown as examples, not as limitations, in the drawings of the accompanying drawings, where similar reference numerals indicate similar elements. [Brief explanation of the drawing]

[0022] [Figure 1A] This is an exemplary non-dual light shield (nDWS) structure according to an embodiment of the present disclosure. [Figure 1B] FIG. is a diagram of an ABS of an exemplary write head having a trapezoidal main pole according to an embodiment of the present disclosure. [Figure 2] FIG. 2A shows an exemplary MP shape of an ABS of a trapezoidal MP design according to an embodiment of the present disclosure. FIG. 2B shows an exemplary MP shape of an ABS of a triangular MP according to an embodiment of the present disclosure. FIG. 2C shows an exemplary MP shape of an ABS of an MP structure as described herein according to an embodiment of the present disclosure. [Figure 3] FIG. 3A shows the vertical magnetic field from a write head as a function of PT according to an embodiment of the present disclosure. FIG. 3B shows the vertical magnetic field from a write head as a function of PWB for different PWA groups according to an embodiment of the present disclosure. [Figure 4] FIG. 4A is a diagram of an ABS of an MP and a corresponding side view for several designs with PWB>0 according to an embodiment of the present disclosure. FIG. 4B is a diagram of an ABS of an MP and a corresponding side view for a design with PWB<0 according to an embodiment of the present disclosure. [Figure 5A] FIG. is a diagram and a side view of an ABS of an MP design (PWB>0) according to an embodiment of the present disclosure. [Figure 5B] FIG. is a diagram and a side view of an ABS of an MP design as described herein according to an embodiment of the present disclosure. [Figure 6] FIG. SA shows a trapezoidal MP and a CMP process expanding towards a standard SSCD aperture according to an embodiment of the present disclosure. FIG. 6B shows a narrower SSCD aperture for developing the disclosed triangular MP design that can narrow the PWA according to an embodiment of the present disclosure. FIG. 6C shows a CMP shift that matches the target PWA in this design according to an embodiment of the present disclosure. [Figure 7A] FIG. shows variations in PWA, PT, and LG in other designs (PWB>0) according to an embodiment of the present disclosure. [Figure 7B] FIG. shows variations in PWA, PT, and LG in this design (PWB<0) according to an embodiment of the present disclosure. [Modes for carrying out the invention]

[0023] Disk drives can utilize various techniques for writing to disks. For example, perpendicular magnetic recording (PMR) may involve aligning magnetic bits on the disk perpendicular to the disk surface (for example, either up or down). PMR recording can increase the storage density on the disk by aligning the poles of the magnetic elements on the disk perpendicular to the disk surface.

[0024] Technological advancements in disk drives are continuously integrating more components into a single device, generating massive amounts of electronic data. Annual data generation is projected to reach 175 zettabytes by 2025. While the availability of such vast amounts of data is attractive for facilitating new applications, storing and processing such massive amounts of data is limited by existing technological bottlenecks. To keep pace with the increasing demand for storage, International Data Corporation predicts that it will need to ship more than 22 zettabytes of storage capacity across all media types from 2018 to 2025, with nearly 59% of that projected capacity needing to come from the hard disk drive (HDD) industry. Therefore, a continued increase in areal density capacity (ADC) in HDDs is desired to address the growing demand for data storage.

[0025] The development of ADCs largely depends on reducing the size of the media bits and the write head structure to match smaller particles. The former can be achieved by increasing the coercivity of the media particles in perpendicular magnetic recording (PMR). However, limitations in ADC scaling can arise due to the reduced performance of the reduced write head operating at GHz frequencies. Therefore, there is growing interest in improving the performance of HDD record heads.

[0026] Figure 1A shows an exemplary non-dual write-shielded (nDWS) structure 100A having a main pole (MP) 102, a reading shield (LS) 104, a side shield (SS) 106, a write shield (WS) 108, an upper yoke (TY) 112, and a return pole (PP3) 110. The TY and PP3 can be electrically isolated using a thin insulator. Figure 1B shows Figure 100B of an exemplary write head ABS having a trapezoidal main pole having a long base PWA, a short base PWB, and a height PT.

[0027] Many write head designs may use a principal magnetic pole (MP) to apply a perpendicular magnetic field to the media bits (see Figure 1A), and the shape of the MP on the air bearing surface (ABS) is trapezoidal (see Figure 1B). The longer base of the trapezoidal MP is called the PWA, the shorter base is called the PWB, and the height of the trapezoidal MP is called the PT (see Figure 2A). Therefore, the area of ​​the MP on the ABS is defined as follows: JPEG2026079776000002.jpg15170

[0028] The angle of the trapezoidal legs relative to the height is sometimes called the bevel angle (BA), which can be fixed in the process with a process variation of ±1°. As write head technology moves to narrower PWAs to reduce the erase width of the write bubble, the PWB is also narrowed by the fixed BA. Therefore, the MP area in ABS can result in a reduction of the total magnetic flux to the media bits.

[0029] This embodiment relates to a main magnetic pole design that is triangular in shape and has a leading edge taper in order to maximize surface density capacity. This design may include a leading edge taper on the leading edge (LS) to form a taper angle on the MP in order to concentrate the magnetic flux on the MP. The MP may be shifted away from the LG to provide an additional LG portion in front of the MP, and the taper angle may be larger than that in the additional LG portion than in the LG. The MP design can result in a larger MP surface area on the air bearing surface (ABS) and a larger magnetic flux to the medium bit.

[0030] Figure 2A shows an exemplary MP shape 200A of ABS for a trapezoidal MP design. Figure 2B shows an exemplary MP shape 200B of ABS for a triangular MP. Figure 2C shows an exemplary MP shape 200C of ABS for an MP structure described herein.

[0031] The height PT of the trapezoid may be increased to compensate for the MP area in the ABS. However, the shape of the MP in the ABS may ultimately be a triangle (as PWB→0) (see Figure 2B), and PT may be a constant determined by BA and PWA as given by the following equation. JPEG2026079776000003.jpg15170

[0032] Therefore, the MP area can be kept constant, and the total magnetic flux on the medium bits can also be kept constant. Furthermore, longer PTs may cause additional sidetrack erases while operating on the outer disk regime due to the induced skew angle.

[0033] Figure 3A shows the vertical magnetic field 300A from the write head as a function of PT. Figure 3B shows the vertical magnetic field 300B from the write head as a function of PWB for different PWA groups.

[0034] Furthermore, if the PT is long, the magnetic flux concentrates at the ends due to shape anisotropy, reducing the overall writing performance of the write head. Therefore, by increasing the PT, the MP area is expanded, and writing performance can be improved up to a certain height due to the enhanced magnetic flux (see Figure 3A). Beyond a certain PT value, writing performance begins to decrease (see Figure 3A). This trade-off creates a point at which performance is optimized for specific values ​​of PT and PWB.

[0035] Other write head designs can have wider PWA groups, resulting in optimized performance through a wider PWB. In these designs, further narrowing the PWB corresponds to a performance degradation due to a longer PT and reduced write performance caused by shape anisotropy (Figure 3B). However, this design can use much narrower PWAs, and in these designs, the point at which performance is optimized shifts to a narrower PWB. In this respect, it corresponds to a relatively long PT to have a larger MP area, but not long enough to cause shape anisotropy degradation. Nevertheless, the benefits gained from increasing the PT or MP area saturate to the triangular limit (i.e., PWB=0) because the BA is relatively fixed. Thus, PWA-driven scaling can reach its limit.

[0036] Figure 4A shows the ABS diagram and corresponding side view of the MP400A for several designs where PWB > 0. Figure 4B shows the ABS diagram and corresponding side view of the MP400B for designs where PWB < 0.

[0037] Herein, this embodiment relates to a novel MP design that can facilitate the scaling of the write head beyond the PWA design group limited by PWB=0. In this MP design, the MP shape in ABS may be triangular, but the triangular MP may be moved upward to create an additional gap on the front side (Figure 2C). The additional leading gap can correspond to a PWB inversion, i.e., PWB<0 (see dotted line in Figure 2C). In this design, the additional leading gap may be accompanied by a naturally formed additional leading edge taper (LET) angle that is much shallower than the design LET angle in the design leading gap (see Figure 4B). Some designs with PWB>0 may have a single LET angle that matches a design target value of about 32-38° (see Figure 4A). The additional LET angle that is naturally formed for PWB<0 may be about 20-26°. The additional leading gap and LET angle can also result in a thicker MP on the side view (Figure 4B), and therefore can have a larger MP volume compared to other designs. For example, a naturally formed 23° LET angle can increase the MP thickness by approximately 6% along the downtrack direction. The design of the present invention may have an additional leading gap with an additional steeper LET angle that shifts the optimized performance point toward PWB < 0 for even narrower PWA groups (see Figure 3B). Thus, this design can help facilitate the future scaling of write head technology for enhanced ADCs.

[0038] This design may be combined with other design topologies. Other design topologies include, but are not limited to, energy-assisted or current-assisted perpendicular magnetic recording, including different design domains, for example, conventional designs in which assist current is injected between the MP and trailing shield (TS) through a write gap material, and conventional designs in which part of the assist current flows between the MP and TS through a WG material, part of the assist current flows between the MP and leading shield (LS) through a leading gap material, and the remainder of the assist current flows between the MP and side shield (SS) through a side gap (SS) material. In some designs, the assist current between the MP and SS can be blocked using an interfacial oxide layer placed at the interface between the SS and the side gap material. In some designs, all or part of the assist current can flow through a giant magnetoresistance (GMR) device in the write gap. The disclosed designs may have similar reliability margins and device resistances to conventional designs.

[0039] This MP structure can be achieved using two process techniques: (1) LET mask shift and (2) SSCD mask shift. In these processes, the LET may be grown first together with the leading shield (LS). Subsequently, the SS may be grown according to the BA. Next, the leading gap material and side gap material are deposited according to the target thickness of the leading gap (LG) and side gap (SG). Finally, the holes formed by the leading and side gap materials may be filled with MP material, and the MP shape depends on the parameters set in the previous process step.

[0040] Figure 5A is a diagram and side view of the ABS of MP design (PWB>0) 500A. Figure 5B is a diagram and side view of the ABS of MP design 500B described herein. Triangular MPs and associated leading gap openings with additional LET angles can be achieved by vertical shifting of the LET. As shown in Figures 5A to 5B, the present design may include MP502, hot seed (HS)504, LET506, and LS508.

[0041] In other designs where PWB > 0, the LET height may be the same as the LS height, as shown in Figure 5A. This MP design with PWB < 0 can be achieved by vertically shifting the LET, so that the LET height can be smaller than the LS height, as shown in Figure 5B. The LET can be shifted by a value between -10 nm and +30 nm to achieve PWBs between +2 nm and -10 nm, respectively. After growing the LS and LET, the LG and SG materials can be deposited, resulting in a triangular shape for the MP. The shape of the additional leading gap, and the associated naturally developed steeper LET angle, can be determined by the thickness of the LG and SG, as well as the nature of the angle of attack on the side shield (SS) side. This process technique allows for a reduction in the LET volume and the formation of a sharp gap between the LS and MP, as shown in Figure 5B. Thus, to continue scaling the head design toward PWB < 0, the LET volume can be reduced and an even steeper gap can be created between the MP and LS.

[0042] Figure 6A shows trapezoidal MP and CMP processes expanding toward a standard SSCD aperture. Figure 6B shows a narrower SSCD aperture for developing the disclosed triangular MP design, which can narrow the PWA. Figure 6C shows a CMP shift that matches the target PWA in this design.

[0043] Another process technique to achieve the disclosed MP design is to horizontally narrow the opening between the left and right portions of the SS (see Figures 6A-6C). In this technique, the left and right portions of the SS edge can be closer to each other while the LET volume remains the same. However, in order to maintain the same PWA, the plane of the PWA shifts upward, and the SS becomes relatively thicker. On the other hand, in the LET shift technique, the LET volume may decrease, but the SS thickness and PWA plane can remain the same. In this technique, the LET and LS can be grown on the substrate first, and then the SS can be grown using an SSCD mask. The SG and LG materials can then be deposited according to the target SG and LG thickness, which can create trenches for the MP material to be deposited, and the trenches determine the shape of the MP.

[0044] In some MP designs (PWB>0), the SSCD opening is sufficiently large that the trenches created by SG and LG material deposition provide a trapezoidal MP in ABS (see Figure 6(a)). When the SSCD opening is narrower, the MP shape in ABS may be triangular with an additional leading gap corresponding to a steeper natural LET angle (see Figure 6B). In some process techniques, chemical mechanical polishing (CMP) can be performed on the top of the MP to define the PWA area according to a target value. In the narrow SSCD opening techniques described herein, the PWA may be narrowed at the CMP location (see Figure 6B). Therefore, it may be necessary to shift the CMP location vertically upward to match the target PWA requirement.

[0045] Figure 7A shows the variability of PWA, PT, and LG in another design (PWB>0) 700A. Figure 7B shows the variability of PWA, PT, and LG in this design (PWB<0) 700B.

[0046] Process variability between other design processes and the current design process can be compared using Monte Carlo simulations as shown in Figures 7A and 7B. The BA variability in both designs may be approximately ±1° from the nominal value, which can be approximately 11°. The PWA variability may be approximately ±4nm, with the nominal PWA set to approximately 30nm. The variability parameters of the other processes may be set as the standard variability typically observed in the other design processes. The expected process variability of PT can be calculated for both the other designs (PWB>0) and the current design (PWB<0). In the other designs, the simulation suggests a lower nominal PT value of approximately 69nm. However, PT and PWA have independent distributions, resulting in a larger distribution of PWA / PT ratios in the range of 0.35–0.75 (see Figure 7A). However, the PT and PWA distributions correlate with this design, which has a longer nominal PT (approximately 83 nm), resulting in a narrower PWA / PT distribution in the range of 0.3 to 0.5 (see Figure 7B). The PWA / PT ratio distribution can be determined by the tan(BA) distribution. Therefore, this design can provide a denser distribution for PWA and PT designs, resulting in a denser distribution of performance parameters within the wafer and across various wafers.

[0047] Nevertheless, other design processes can result in a tighter distribution for LGs with nominal settings close to the target value (see Figure 7A). This design process can result in a wider distribution for LGs (see Figure 7B), which may have minimal impact on write performance.

[0048] This embodiment relates to a magnetic write head design in a scaled head structure for a hard disk drive storage device that improves the magnetic flux applied to the media bits and maximizes the improvement of the magnetic density capacity (ADC).

[0049] A first exemplary embodiment may include a baseline non-dual write shield (nDWS) based write head structure (Figure 1A). This structure may include a main magnetic pole (MP) that provides a strong, concentrated magnetic flux for writing media bits.

[0050] The structure may also include a trailing shield (TS) made of a magnetic material for collecting magnetic flux. The structure may also include a write gap (WG) between the MP and the TS, which may consist of a non-magnetic conductor, an insulator, or a magnetic GMR or 2E+n element. The structure may also include a side shield (SS), a reading shield (LS), and a write shield (WS) made of a magnetic material to prevent magnetic flux from diverting away from the MP tip and reaching the medium bits.

[0051] The structure may also include a leading edge taper (LET) on the LS to form a tapered angle on the MP that helps concentrate the magnetic flux on the MP. The structure may also include side gaps (SG) between the MP and SS on both sides of the MP tip, made of a non-magnetic material that may be either a conductor or an insulator. The structure may also include a leading gap (LG) between the MP and LS, which may be made of the same material as the SG. The structure may also include a coil wound around the MP via a magnetic PP3 shield that requires a time-dependent write current to saturate the MP magnetization.

[0052] The WG material between the hot seed (HS) and MP may have a length equal to the hot seed width (along the lengths of SS and LS). The thickness of the WG material may be equal to the thickness of the WG of the write head. The height of the WG material may be greater than the eTHd height of the HS (see Figure 1B).

[0053] SG may have a thin insulator between the SG material and SS (see Figure 1B). The MP structure may also be triangular, in which case the base of the triangle may be equal to the pole width (PWA), the height of the triangle may be equal to the pole thickness (PT), and the side arm angle may be equal to the bevel angle (BA) (see Figures 2B to 2C).

[0054] This MP structure may differ from another trapezoidal MP structure having a shorter base equal to a shorter pole width (PWB) and PWB > 0 (see Figure 2A). This MP structure may have a longer PT that results in a larger MP surface area on the air bearing surface (ABS) for a given PWA design objective (see Figures 2B-2C). A larger MP surface area can provide a larger magnetic flux to the medium bit.

[0055] This MP can be made thicker in the side view (see Figure 4B), which can result in a larger MP volume and greater magnetic flux concentration compared to other MP designs. This MP structure can open additional LGs corresponding to PWB ≤ 0 (see Figures 2B-2C). These additional LGs are accompanied by additional, steeper LET angles that form naturally during the growth process (see Figure 4B).

[0056] Additional LGs and corresponding steeper LET angles can improve write performance and shift the optimized performance regime toward PWB < 0 for narrower PWA design goals (see Figure 3).

[0057] This MP design can be achieved by shifting the LET mask vertically (see Figure 5). After moving the LET downwards, gap material may be deposited according to the design specifications. The deposited gap material can form trenches that define the shape of the MP.

[0058] The volume of the write head's LET layer can be reduced by an LET shift accompanied by a sharp gap between the LS and MP layers (see Figure 5). This MP design can also be achieved by using a narrower SSCD opening compared to other processes (see Figure 6). By depositing gap material within the narrower SSCD opening, a trench can be fabricated, defining the triangular shape of the MP with additional naturally developed LET.

[0059] A narrower SSCD opening can result in a narrower PWA after the chemical mechanical polishing (CMP) step (see Figure 6B). The CMP position can be shifted vertically upward to meet PWA requirements (see Figure 6C).

[0060] The process variability of PWA and PT in this MP design can be reduced compared to other designs and processes (see Figures 7A-7B). Since the PWA and PT distributions in this MP design can be correlated, a tighter PWA / PT distribution can be obtained compared to other designs. This tighter distribution can result in denser performance parameters with less variability.

[0061] The process variability of the LG and SG in this MP design and its corresponding process may be wider than that of other designs and processes (see Figures 7A-7B). However, such variability may have a minimal impact on the performance parameter distribution.

[0062] The terms “top,” “bottom,” “up,” “down,” and “x,” “y,” and “z” used herein should be understood as convenient terms indicating the spatial relationships of related parts, rather than specific spatial or gravitational directions. Therefore, these terms are intended to encompass assemblies of components, regardless of whether the assembly is oriented in the drawings and described in the specification, inverted from that direction, or in any other rotational direction.

[0063] It will be understood that the term “invention” as used herein should not be construed to mean that only a single invention having a single essential element or group of elements is presented. Similarly, it will be understood that the term “invention” may encompass several distinct innovations, each of which may be considered a distinct invention. Although the invention has been described in detail with respect to preferred embodiments and their drawings, it will be apparent to those skilled in the art that various adaptations and modifications of embodiments of the invention can be achieved without departing from the spirit and scope of the invention. Accordingly, it will be understood that the above detailed description and accompanying drawings are not intended to limit the scope of the invention, and the invention should be inferred solely from the claims and their appropriately interpreted legal equivalents.

Claims

1. It is a write head, A principal magnetic pole (MP) configured to apply magnetic flux for writing medium bits to a recording medium, the principal magnetic pole (MP) having a triangular shape, A trailing shield configured to recover the aforementioned magnetic flux, Side shield (SS), reading shield (LS), and write shield (WS), A leading edge taper on the LS for forming a taper angle on the MP in order to concentrate the magnetic flux, The side gap (SG) between the MP and the SS, A leading gap (LG) between the MP and the LS, wherein the MP is shifted away from the LG to provide an additional LG portion in front of the MP, and the taper angle is greater in the additional LG portion than in the LG, A write head comprising: a coil wound around the MP via a magnetic PP3 shield, configured to direct the write current so as to saturate the MP magnetization.

2. The write head according to claim 1, comprising a write gap (WG) disposed between the main magnetic pole and the trailing shield, the WG including a non-magnetic conductor, an insulator, or a magnetic GMR or a 2E+n element.

3. The writing head according to claim 1, wherein the SG is made of a non-magnetic material that is either a conductor or an insulator, and the LG is made of the same material as the SG.

4. The write head according to claim 1, wherein the WG between the hot seed layer and the MP has a length equal to the width of the HS layer along the SS and LS.

5. The writing head according to claim 1, further comprising an insulating layer disposed between the SG and the SS.

6. The writing head according to claim 1, wherein the MP has the triangular shape having a pole width (PWA), a height of the MP equal to the pole thickness (PT), and a side arm angle equal to the bevel angle (BA).

7. The write head according to claim 1, wherein the MP is shifted away from the LG by vertically shifting the LET mask, and after the LET is shifted, the LG and the additional LG portion are deposited to create a trench defining the triangular shape of the MP.

8. The write head according to claim 1, wherein the LG and the additional LG portion are deposited within a narrow SSCD opening to create a trench defining the triangular shape of the MP.

9. The method according to claim 8, wherein the SSCD opening results in a narrow PWA after a chemical mechanical polishing (CMP) process, and the CMP position is vertically shifted.

10. It is a device, The principal magnetic pole (MP) and, Leading Shield (LS) and, A leading edge taper on the LS for forming a taper angle on the MP, A device comprising: a leading gap (LG) between the MP and the LS, wherein the MP is shifted away from the LG to provide an additional LG portion in front of the MP;

11. The device according to claim 10, wherein the taper angle in the additional LG portion is larger than the LG between the MP and the LS.

12. Trailing shield (TS) and, Side shields (SS) and, Write shield (WS), The side gap (SG) between the MP and the SS, The device according to claim 10, comprising a coil wound around the MP via a magnetic PP3 shield.

13. The device according to claim 12, further comprising a write gap (WG) disposed between the main magnetic pole and the trailing shield, wherein the WG comprises a non-magnetic electrical conductor, an insulator, or a magnetic GMR or 2E+n element, the SG is composed of a non-magnetic material that is either a conductor or an insulator, and the LG is composed of the same material as the SG.

14. The write head according to claim 1, wherein the WG between the hot seed layer and the MP has a length equal to the width of the HS layer along the SS and LS.

15. The writing head according to claim 1, wherein the MP has a triangular shape having a pole width (PWA), a height of the MP equal to the pole thickness (PT), and a side arm angle equal to the bevel angle (BA).

16. The write head according to claim 1, wherein the MP is shifted away from the LG by vertically shifting the LET mask, and after the LET is shifted, the LG and the additional LG portion are deposited to create a trench defining the triangular shape of the MP.

17. The write head according to claim 1, wherein the LG and the additional LG portion are deposited within a narrow SSCD opening to create a trench defining the triangular shape of the MP, the SSCD opening resulting in a narrow PWA after a chemical mechanical polishing (CMP) process, and the CMP position is vertically shifted.

18. It is a method, A leading edge tapered (LET) mask is provided adjacent to the main magnetic pole (MP) of the write head, Based on the LET mask which is shifted perpendicularly to the MP, the LET and the leading shield (LS) are formed. A method comprising depositing a leading gap (LG) adjacent to the LS, wherein the MP is shifted away from the LG to provide an additional LG portion in front of the MP, and the taper angle of the LET is greater in the additional LG portion than in the LG.

19. The method according to claim 18, wherein the MP is shifted away from the LG by vertically shifting the LET mask, and after the LET is shifted, the LG and the additional LG portion are deposited to create a trench defining the triangular shape of the MP.

20. The method according to claim 18, wherein the LG and the additional LG portion are deposited within a narrow SSCD opening to create a trench defining the triangular shape of the MP, the SSCD opening resulting in a narrow PWA after a chemical mechanical polishing (CMP) process, and the CMP position is vertically shifted.

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