Indication device

Abstract

Increasing the number of photomasks used in the fabrication process of a display device containing transistors Furthermore, it improves the reliability of transistors. [Solution] Photolithography process and etching process for forming island-shaped semiconductor layers By omitting steps, the process is carried out without increasing the number of photomasks. Specifically, in a liquid crystal display device... In other words, to reduce damage caused by processes such as gate electrode formation and etching. Steps to form a protective layer, steps to form source electrodes and drain electrodes, contact holes It is fabricated using five photolithography steps: a step to form the element, a step to form the pixel electrode, and a step to form the pixel electrode. Furthermore, in one aspect of the present invention, the liquid crystal display device is formed simultaneously with the process of forming the contact holes. It has grooves for dividing the semiconductor layer.

Claims

[Claim 1] A transistor having a gate electrode, a semiconductor layer, a protective layer, a first electrode, and a second electrode, A first wire electrically connected to the gate electrode, A second wire electrically connected to the first electrode, A pixel electrode electrically connected to the aforementioned two electrodes, Capacitive wiring and It has a groove and, The protective layer has a region that is in contact with the upper surface of the semiconductor layer. The semiconductor layer and the protective layer are provided so as to overlap the first wiring, the second wiring, the pixel electrode, and the capacitive wiring. The first electrode is electrically connected to the semiconductor layer at a first opening provided in the protective layer. The second electrode is electrically connected to the semiconductor layer at a second opening provided in the protective layer. The groove portion is provided on the first wiring, crossing in the direction of the line width of the first wiring. The groove portion is provided on the capacitance wiring, crossing in the direction of the line width of the capacitance wiring. The groove portion is provided in a direction parallel to the direction in which the second wiring extends, and extends beyond the end of the pixel electrode, in a display device.

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