Information processing device, information processing method, and computer-readable recording medium
The information processing device and method enhance precision in forming films on substrates by using a prediction unit and output unit to calculate and control film thickness, addressing the challenges of imprecise film formation in existing technologies.
JP2026094320APending Publication Date: 2026-06-09TOKYO ELECTRON LTD
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- TOKYO ELECTRON LTD
- Filing Date
- 2026-03-03
- Publication Date
- 2026-06-09
AI Technical Summary
Technical Problem
Existing technologies face challenges in forming structures such as films on substrates with high precision.
Method used
An information processing device and method that includes a prediction unit to calculate predicted film thickness using a film thickness model and prior data, and an output unit to provide processing instructions based on this calculation, ensuring precise film formation on substrates.
Benefits of technology
Enables the formation of structures on substrates with high precision by accurately predicting and controlling the film thickness and pattern formation processes.
✦ Generated by Eureka AI based on patent content.
Smart Images
Figure 2026094320000001_ABST
Abstract
This disclosure provides an information processing apparatus, an information processing method, and a computer-readable recording medium capable of forming structures such as films on a substrate with high precision. [Solution] An example of an information processing device includes a prediction unit configured to calculate a predicted film thickness when the substrate is processed by the substrate processing device, based on a film thickness model representing the relationship between the state of the substrate processing device and the film thickness of the coating film formed on the surface of the substrate by the substrate processing device, and prior data indicating the state of the substrate processing device before the substrate is processed by the substrate processing device, and an output unit that outputs instruction information regarding the processing of the substrate based on the predicted film thickness before the substrate is processed by the substrate processing device.
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