Gas analyzers, fluid control systems, gas analysis programs, gas analysis methods

Abstract

To provide devices, systems, programs, and methods for improving vaporization efficiency in order to bring the actual concentration of process gas closer to the ideal concentration. [Solution] A gas analyzer used in a fluid control system for controlling a process gas obtained by vaporizing a liquid or solid material, comprising: a first concentration calculation unit for calculating the concentration of the process gas; a second concentration calculation unit for calculating the concentration of at least the by-product gases generated in a side reaction separate from the main reaction that generates the process gas; an output unit that determines and outputs a parameter to be changed, which is a parameter whose setting value should be changed among the parameters set in a plurality of devices constituting the fluid control system, based on the first actual concentration, which is the concentration of the process gas calculated by the first concentration calculation unit, and the second actual concentration, which is the concentration of the by-product gases calculated by the second concentration calculation unit; and an adjustment unit that receives the output parameter to be changed and adjusts the setting value of the parameter to be changed.

Description

Technical Field

[0001] The present invention relates to a gas analyzer, a fluid control system, a gas analysis program, and a gas analysis method.

Background Art

[0002] In a conventional semiconductor manufacturing system, there is one that generates a process gas by vaporizing a liquid material or a solid material and supplies the process gas to a chamber.

[0003] In such a system, not only the main reaction of vaporizing a liquid material or a solid material to generate a process gas but also side reactions different from the main reaction occur, such as liquefaction or decomposition of the process gas.

[0004] Therefore, the actual concentration of the process gas (hereinafter referred to as the actual concentration) does not match the ideal concentration (hereinafter referred to as the ideal concentration) that would be obtained if the main reaction proceeded ideally. Conversely, depending on what side reactions are occurring, the ratio of the ideal concentration to the actual concentration (hereinafter referred to as the vaporization efficiency) changes.

[0005] However, since it is difficult to identify the occurring side reactions, when trying to make the process gas reach a desired concentration, according to the conventional technical common sense, rather than trying to improve the vaporization efficiency, the usage amount of the liquid material or the solid material is increased.

[0006] However, when the material is expensive, problems such as an increase in the cost incurred in the manufacturing process and an increase in the cost of the final product occur.

Prior Art Documents

Patent Documents

[0007]

Patent Document 1

Summary of the Invention

[0008] Therefore, the present invention was made to solve the above-mentioned problems, and its main objective is to improve vaporization efficiency in order to bring the actual concentration of the process gas closer to the ideal concentration. [Means for solving the problem]

[0009] In other words, the gas analyzer according to the present invention is a gas analyzer used in a fluid control system for controlling a process gas obtained by vaporizing a liquid or solid material, and is characterized by comprising: a first concentration calculation unit for calculating the concentration of the process gas; a second concentration calculation unit for calculating the concentration of at least the by-product gas produced in a side reaction which is a reaction separate from the main reaction that produces the process gas; a comparison unit that compares a first actual concentration, which is the concentration of the process gas calculated by the first concentration calculation unit, with a first ideal concentration, which is the concentration of the process gas when the main reaction proceeds ideally, and also compares a second actual concentration, which is the concentration of the by-product gas calculated by the second concentration calculation unit, with a second ideal concentration, which is the concentration of the by-product gas when the main reaction proceeds ideally; and an output unit that determines and outputs a parameter to be changed, which is a parameter whose set value should be changed among the parameters set in the equipment constituting the fluid control system, based on the comparison result of the comparison unit.

[0010] With a gas analyzer configured in this way, there is a relationship between the magnitudes of the first actual concentration and the first ideal concentration, and the magnitudes of the second actual concentration and the second ideal concentration, and between these and the side reactions that occur. Based on the comparison results of these concentrations, the analyzer determines and outputs the parameters to be changed. By changing the setting values ​​of these parameters, the vaporization efficiency can be improved, and consequently, the actual concentration of the process gas can be brought closer to the ideal concentration.

[0011] Preferably, the parameter to be changed is the heating temperature of the piping through which the process gas flows, the heating temperature of the vaporizer that vaporizes the liquid material or the solid material, the set flow rate of the vaporizer, or the concentration of the liquid material. By changing the settings of these parameters, it is possible to suppress the progression of side reactions when liquefaction or decomposition of process gases or redissolution of materials occurs, thereby improving vaporization efficiency.

[0012] If the comparison result from the comparison unit indicates that the first actual concentration is lower than the first ideal concentration, and the difference between the second actual concentration and the second ideal concentration is below a threshold, then there is a high probability that liquefaction of the process gas is occurring. Therefore, in this case, it is preferable that the output unit outputs the heating temperature of the piping as the parameter to be changed. This approach allows us to suppress the liquefaction of process gases by increasing the heating temperature of the piping.

[0013] If the comparison result from the comparison unit indicates that the first actual concentration is lower than the first ideal concentration, the difference between the second actual concentration and the second ideal concentration exceeds a threshold, and the second actual concentration is higher than the second ideal concentration, then there is a high probability that the process gas is decomposing. Therefore, in this case, it is preferable that the output unit outputs the heating temperature of the vaporizer or the set flow rate of the vaporizer as the parameter to be changed. With this approach, the decomposition of the process gas can be suppressed by increasing the carrier gas flow rate, lowering the vaporizer heating temperature, or decreasing the vaporizer flow rate.

[0014] If the comparison result of the comparison unit indicates that the first actual concentration is lower than the first ideal concentration, the difference between the second actual concentration and the second ideal concentration exceeds a threshold, and the second actual concentration is lower than the second ideal concentration, then there is a high probability that one of the side reactions, either liquefaction or decomposition of the process gas, or redissolution of the material, is occurring. Therefore, in this case, it is preferable that the output unit outputs the heating temperature of the piping, the heating temperature of the vaporizer, the set flow rate of the vaporizer, or the concentration of the liquid material as the parameter to be changed. With this approach, the progression of side reactions can be suppressed by appropriately changing the settings of the parameters that are being modified as output.

[0015] Preferably, the system further includes an adjustment unit that receives the parameter to be changed output from the output unit and adjusts the setting value of the parameter to be changed. With this configuration, the adjustment of the settings for the parameters to be changed can be automated.

[0016] It is preferable that the output unit outputs the parameter to be changed in a way that is easily visible. With this configuration, users can identify the parameters that need to be changed to improve vaporization efficiency, and then improve vaporization efficiency by changing the settings of those parameters based on their experience, for example.

[0017] It is preferable that the first concentration calculation unit and the second concentration calculation unit calculate the concentration based on the output signal output from a common photodetector. This approach allows for the calculation of process gas and by-product gas concentrations using a common photodetector, enabling the device to be made more compact and reducing manufacturing costs.

[0018] Furthermore, a fluid control system comprising a vaporizer for vaporizing the liquid material or the solid material, and a fluid control device for controlling the process gas, the liquid material, or the carrier gas, is also one aspect of the present invention.

[0019] Furthermore, the gas analysis program according to the present invention is used in a fluid control system for controlling a process gas obtained by vaporizing a liquid or solid material, and is characterized in that it causes a computer to perform the function of an output unit that determines and outputs parameters to be changed, which are parameters among the parameters set in the equipment constituting the fluid control system, based on the comparison results of the comparison unit. The program is characterized in that it causes a computer to perform the function of an output unit that determines and outputs parameters to be changed, which are parameters among the parameters set in the equipment constituting the fluid control system, based on the comparison results of the comparison unit. The program is used in a fluid control system for controlling a process gas obtained by vaporizing a liquid or solid material, and unit that performs the function of an output unit that determines and outputs parameters to be

[0020] In addition, the gas analysis method according to the present invention is a gas analysis method used in a fluid control system for controlling a process gas obtained by vaporizing a liquid material or a solid material, and is characterized by comprising: a first concentration calculation step for calculating the concentration of the process gas; a second concentration calculation step for calculating the concentration of at least the by-product gas produced in a side reaction which is a reaction separate from the main reaction that produces the process gas; a comparison step for comparing a first actual concentration, which is the concentration of the process gas calculated by the first concentration calculation unit, with a first ideal concentration, which is the concentration of the process gas when the main reaction proceeds ideally, and for comparing a second actual concentration, which is the concentration of the by-product gas calculated by the second concentration calculation unit, with a second ideal concentration, which is the concentration of the by-product gas when the main reaction proceeds ideally; and an output step for determining and outputting a parameter to be changed, which is a parameter whose set value should be changed among the parameters set in the equipment constituting the fluid control system, based on the comparison result of the comparison unit.

[0021] According to such a gas analysis program and gas analysis method, the same operational effects as those of the above-described gas analyzer can be achieved.

[0022] Further, the gas analyzer according to the present invention is a gas analyzer that analyzes a compound gas generated in a main reaction in which a solid material vaporizes and a by-product gas generated in a side reaction different from the main reaction, and includes a first concentration calculation unit that calculates the concentration of the compound gas, a second concentration calculation unit that calculates the concentration of the by-product gas, a first actual concentration that is the concentration of the compound gas calculated by the first concentration calculation unit, and a first ideal concentration that is the concentration of the compound gas when the main reaction proceeds ideally, and compares the first actual concentration with the first ideal concentration, and compares a second actual concentration that is the concentration of the by-product gas calculated by the second concentration calculation unit with a second ideal concentration that is the concentration of the by-product gas when the main reaction proceeds ideally, and a comparison unit, and an output unit that outputs an analysis result based on the comparison by the comparison unit.

[0023] According to the gas analyzer configured as described above, since there is a correlation between the magnitude relationship between the first actual concentration and the first ideal concentration, the magnitude relationship between the second actual concentration and the second ideal concentration, and the occurring side reaction, by comparing these concentrations and outputting the analysis result, it becomes easier to identify the factors when a difference occurs between the first actual concentration and the first ideal concentration. As a result, it becomes easier to determine the parameters for which the set value should be changed in order to improve the vaporization efficiency, the vaporization efficiency can be improved, and ultimately, the actual concentration of the process gas can be made closer to the ideal concentration.

[0024] Furthermore, the gas analysis program according to the present invention is a program used in a gas analyzer that analyzes compound gases produced in a main reaction in which a solid material vaporizes and by-product gases produced in a side reaction separate from the main reaction, and is characterized in that it causes a computer to perform functions as an output unit that compares a first actual concentration, which is the concentration of the compound gas calculated by the first concentration calculation unit, with a first ideal concentration, which is the concentration of the compound gas when the main reaction proceeds ideally, and also compares a second actual concentration, which is the concentration of the by-product gas calculated by the second concentration calculation unit, with a second ideal concentration, which is the concentration of the by-product gas when the main reaction proceeds ideally, and outputs the analysis results based on the comparison by the comparison unit.

[0025] Furthermore, the gas analysis method according to the present invention is a gas analysis method for analyzing compound gases produced in a main reaction in which a solid material vaporizes and by-product gases produced in a side reaction separate from the main reaction, and is characterized by comprising an analysis step of comparing a first actual concentration, which is the calculated concentration of the compound gas, with a first ideal concentration, which is the concentration of the compound gas when the main reaction proceeds ideally, and comparing a second actual concentration, which is the calculated concentration of the by-product gas, with a second ideal concentration, which is the concentration of the by-product gas when the main reaction proceeds ideally, and an output step of outputting the analysis results based on the comparison in the analysis step.

[0026] Furthermore, the gas analyzer according to the present invention is a gas analyzer for analyzing compound gases and by-product gases generated in a main reaction in which a solid material vaporizes, and is characterized by comprising: a first concentration calculation unit for calculating the concentration of the compound gas; a second concentration calculation unit for calculating the concentration of the by-product gas; and an output unit that outputs a first actual concentration, which is the concentration of the compound gas calculated by the first concentration calculation unit, and a first ideal concentration, which is the concentration of the compound gas when the main reaction proceeds ideally, in a comparable manner, and also outputs a second actual concentration, which is the concentration of the by-product gas calculated by the second concentration calculation unit, and a second ideal concentration, which is the concentration of the by-product gas when the main reaction proceeds ideally. [Effects of the Invention]

[0027] According to the present invention described above, vaporization efficiency can be improved, and the actual concentration of the process gas can be brought closer to the ideal concentration. [Brief explanation of the drawing]

[0028] [Figure 1] A schematic diagram showing a fluid control system incorporating a gas analyzer according to the first embodiment of the present invention. [Figure 2] A diagram showing chemical reaction equations to illustrate the types of side reactions in the same embodiment. [Figure 3] A schematic diagram showing the configuration of the concentration monitor in the same embodiment. [Figure 4] A functional block diagram illustrating the functions of the information processing unit in this embodiment. [Figure 5] A flowchart illustrating the initial operation of the information processing device of the same embodiment. [Figure 6] A flowchart illustrating the latter half of the operation of the information processing device according to this embodiment. [Figure 7] A functional block diagram illustrating the functions of the information processing unit in a modified example of the first embodiment. [Figure 8] A schematic diagram showing a fluid control system incorporating a gas analyzer in a modified example of the first embodiment. [Figure 9]A flowchart illustrating the latter half of the operation of the information processing device in a modified example of the first embodiment. [Figure 10] A schematic diagram showing a fluid control system incorporating a gas analyzer in a modified example of the first embodiment. [Figure 11] A flowchart illustrating the latter half of the operation of the information processing device in a modified example of the first embodiment. [Figure 12] A schematic diagram illustrating an embodiment in which a solid material is used in a modified example of the first embodiment. [Figure 13] A diagram showing chemical reaction equations to explain the types of side reactions that occur when using the same solid material. [Figure 14] A flowchart illustrating the operation of the information processing unit when using the same solid material. [Figure 15] A functional block diagram illustrating the functions of the information processing unit in the second embodiment of the present invention. [Figure 16] A flowchart illustrating the operation of the information processing device according to this embodiment. [Figure 17] A functional block diagram illustrating the functions of the information processing unit in a modified example of the second embodiment. [Modes for carrying out the invention]

[0029] <<First Embodiment>> A gas analyzer according to the first embodiment of the present invention will be described below with reference to the drawings.

[0030] As shown in Figure 1, the gas analyzer 100 of this embodiment constructs a fluid control system 200 that controls the gas supplied to a predetermined gas supply space S, and measures the concentration of that gas.

[0031] First, let me explain the fluid control system 200. As shown in Figure 1, this fluid control system 200 supplies process gas to a process chamber, which is a gas supply space S of a semiconductor manufacturing apparatus. Specifically, it comprises a vaporizer 10 that vaporizes a liquid or solid material, and a gas supply path L1 that supplies the process gas, which is the result of the liquid or solid material vaporized by the vaporizer 10, to the process chamber S.

[0032] The vaporizer 10 is used to vaporize a liquid material or a solid material by heating and / or reducing the pressure. It may vaporize a liquid material obtained by mixing a compound with water, or it may vaporize a liquid obtained by dissolving a solid material, or it may sublimate a solid material.

[0033] The following describes the case where an aqueous solution of hydrogen peroxide (H2O2) mixed with water (H2O) is used as the liquid material, adjusted to the desired concentration.

[0034] The vaporizer 10 of this embodiment includes a heater (not shown) for heating the liquid material and a nozzle (not shown) for ejecting and vaporizing the liquid material. However, the specific configuration of the vaporizer 10 is not limited to this. For example, the vaporizer 10 may be a bubbling type that vaporizes the liquid material while supplying a carrier gas into a tank containing the liquid material, or a baking type that vaporizes the liquid material or solid material by placing a tank containing the liquid material or solid material in a constant temperature bath.

[0035] In this configuration, the vaporizer 10 is connected to a material introduction channel L2 through which the liquid material stored in the storage unit 20 is introduced, and to a carrier gas introduction channel L3 through which the carrier gas is introduced. The storage unit 20 is connected to a pressurized gas introduction channel L4 through which the pressurized gas is introduced. The material introduction channel L2 is equipped with a first mass flow controller MFC1, which is a fluid control device for controlling the flow rate of the liquid material, and the carrier gas introduction channel L3 is equipped with a second mass flow controller MFC2, which is a fluid control device for controlling the flow rate of the carrier gas. Although oxygen is used as the carrier gas and pressurized gas in this configuration, nitrogen, argon, or hydrogen may be used depending on the type of liquid material.

[0036] As shown in Figure 1, the gas supply passage L1 connects the vaporizer 10 and the gas supply space S, and carries the process gas and its by-product gases generated by the main reaction in the vaporizer 10. In this embodiment, the process gas is hydrogen peroxide gas, and the by-product gas is H2O gas. Along with these gases, the carrier gas and the pressurized gas, oxygen, also flow through the gas supply passage L1.

[0037] In this embodiment, the by-product gas is generated as a by-product in the main reaction, as described above, but it can also be generated by a side reaction separate from the main reaction. In other words, the concentration of the by-product gas can fluctuate depending on what side reaction is occurring, and can even fluctuate the concentration of the process gas.

[0038] Therefore, the present invention lies in recognizing the technical significance of monitoring the concentration of by-product gases, which will be described in detail below.

[0039] As shown in Figure 2, the side reactions in this embodiment include the liquefaction of the process gas (hydrogen peroxide gas), the decomposition of the process gas (hydrogen peroxide gas), and the redissolution of the by-product gas (H2O gas) into the liquefied water.

[0040] Next, we will describe the gas analyzer 100 incorporated into the fluid control device described above.

[0041] As shown in Figure 1, the gas analyzer 100 includes a concentration monitor 30 installed in the gas supply path L1 and an information processing unit 40 that acquires the output signal from the concentration monitor 30. Note that the concentration monitor 30 does not necessarily have to be installed in the gas supply path L1; for example, it may be installed in a branch channel branched off from the gas supply path L1.

[0042] The concentration monitor 30 analyzes the target component contained in the gas using infrared absorption spectroscopy. Specifically, as shown in Figure 3, it comprises a light source unit 31 containing a light source that irradiates the gas with infrared light X, and a detection unit 32 containing a photodetector that detects the infrared light X transmitted through the gas. The light intensity signal of the infrared light X detected by the photodetector is output as an output signal to the information processing unit 40.

[0043] The information processing unit 40 is a general-purpose or dedicated computer equipped with a CPU, memory, AD converter, DA converter, etc., and may be integrated with the density monitor 30 or may be a separate unit from the density monitor 30.

[0044] The information processing unit 40 then functions as a first concentration calculation unit 41, a second concentration calculation unit 42, an ideal concentration storage unit 43, a comparison unit 44, and an output unit 45, as shown in Figure 4, through the cooperation of the CPU and its peripheral devices according to the gas analysis program stored in a predetermined area of ​​the memory.

[0045] The gas concentration mentioned below may refer to either the component concentration of the gas or its partial pressure.

[0046] The operation of the information processing unit 40 in this embodiment will be explained below, along with a description of the functions of each part, with reference to Figures 4 and 5.

[0047] The first concentration calculation unit 41 calculates the concentration of hydrogen peroxide gas, which is the process gas (hereinafter also referred to as the first actual concentration). Specifically, it receives a light intensity signal, which is the output signal from the photodetector, and performs calculations on the value indicated by this light intensity signal to calculate the concentration of hydrogen peroxide gas contained in the gas flowing through the gas supply path L1 as the first actual concentration. This calculation process uses first calibration curve data that shows the relationship between the value indicated by the light intensity signal and the first actual concentration. This first calibration curve data is stored in the calibration curve data storage unit 46 set in a predetermined area of ​​the memory (see Figure 4).

[0048] The second concentration calculation unit 42 calculates the concentration of the by-product gas H2O gas (hereinafter also referred to as the second actual concentration). Specifically, it receives a light intensity signal, which is the output signal from the photodetector, and performs calculations on the value indicated by this light intensity signal to calculate the concentration of H2O gas contained in the gas flowing through the gas supply path L1 as the second actual concentration. This calculation process uses second calibration curve data that shows the relationship between the value indicated by the light intensity signal and the second actual concentration. This second calibration curve data is stored in the calibration curve data storage unit 46 set in a predetermined area of ​​the memory (see Figure 4).

[0049] In this embodiment, the first concentration calculation unit 41 and the second concentration calculation unit 42 are configured to calculate the first and second actual concentrations, respectively, based on the output signal output from a common photodetector. This allows for a more compact device and a reduction in manufacturing costs. However, the first concentration calculation unit 41 and the second concentration calculation unit 42 may also be configured to calculate the first and second actual concentrations, respectively, based on the output signals output from separate photodetectors.

[0050] The ideal concentration storage unit 43 is set in a predetermined area of ​​the memory and stores the first ideal concentration, which is the concentration of hydrogen peroxide gas when the main reaction described above proceeds ideally, and the second ideal concentration, which is the concentration of H2O gas when the main reaction described above proceeds ideally.

[0051] The first ideal concentration can be calculated in advance, for example, before the start of the control process by the fluid control system 200. Specifically, it can be calculated based on the theoretical concentration of hydrogen peroxide (specifically, the volume fraction of hydrogen peroxide) which can be theoretically determined using the titration concentration obtained by actually measuring the concentration of hydrogen peroxide contained in the aqueous solution stored in the reservoir 20 by titration, etc., and the total flow rate of the gas flowing through the concentration monitor 30 (the sum of the flow rates of hydrogen peroxide gas, H2O gas, and oxygen gas).

[0052] One example of a specific method for calculating the first ideal concentration is as follows: First, the molar concentration of hydrogen peroxide in the aqueous solution stored in the reservoir 20 is measured by titration using a redox reaction, and the weight percentage concentration of the hydrogen peroxide is determined by measuring the weight of the aqueous solution.

[0053] Next, based on the mass percentage concentration mentioned above and the set flow rate of the first mass flow controller MFC1, the weight of hydrogen peroxide solution per unit time supplied to the vaporizer 10 and the weight of water per unit time supplied to the vaporizer 10 are determined.

[0054] Then, by converting these weights to volume, the volume of hydrogen peroxide gas generated in the vaporizer 10 and flowing to the concentration monitor 30 per unit time (i.e., volumetric flow rate), and the volume of H2O gas generated in the vaporizer 10 and flowing to the concentration monitor 30 per unit time (i.e., volumetric flow rate) can be determined.

[0055] On the other hand, the volume of carrier gas (oxygen) per unit time that is sent to the vaporizer 10 and flows into the concentration monitor 30 (i.e., the volumetric flow rate) is determined from the set flow rate of the second mass flow controller MFC.

[0056] In this way, the volumetric flow rates of hydrogen peroxide gas, H2O gas, and oxygen gas flowing through the concentration monitor 30 can be determined, and the flow rate of hydrogen peroxide gas relative to the sum of these flow rates can be set as the first ideal concentration. Furthermore, the calculation of the first ideal concentration is not limited to this method; various calculation methods may be adopted based on the common technical knowledge of those skilled in the art.

[0057] This theoretical concentration is the concentration of hydrogen peroxide gas when 100% of the aqueous solution stored in the reservoir 20 vaporizes, or in other words, the concentration of hydrogen peroxide gas when only the main reaction described above occurs.

[0058] While this theoretical concentration may be used as the first ideal concentration, in this embodiment, the first ideal concentration is set considering that the compound gas decreases considerably due to condensation, for example, during the process from the storage unit 20 to the concentration monitor 30. That is, since there is a difference between the theoretical concentration and the concentration measured by the concentration monitor 30 (referred to as the effective concentration), the ratio of the effective concentration to the theoretical concentration is determined in advance, and the concentration obtained by multiplying the theoretical concentration by this ratio is set as the first ideal concentration. Alternatively, the effective concentration may be used as the first ideal concentration without determining this ratio.

[0059] The second ideal concentration, like the first ideal concentration, can be calculated in advance, for example, before the start of the control process by the fluid control system 200. Specifically, it can be calculated based on the theoretical concentration of H2O (specifically, the volume fraction of H2O) which can be theoretically determined using the titration concentration described above and the total flow rate of gas flowing through the concentration monitor 30. Here, the concentration obtained by multiplying this theoretical concentration by the ratio described above is taken as the second ideal concentration. Alternatively, the concentration of H2O gas measured in advance by the concentration monitor 30 before the start of the control process by the fluid control system 200 may also be used as the second ideal concentration. Furthermore, an example of a specific method for calculating the second ideal concentration is the same as the method for calculating the first ideal concentration described above.

[0060] The first ideal concentration and the second ideal concentration calculated in this manner are input from an external source, for example, via an input means, and stored in the ideal concentration storage unit 43. Alternatively, the information processing unit 40 may be equipped with a function as an ideal concentration calculation unit that calculates the first ideal concentration and the second ideal concentration, and the first ideal concentration and the second ideal concentration calculated by this ideal concentration calculation unit may be stored in the ideal concentration storage unit 43.

[0061] The comparison unit 44 compares the first actual concentration with the first ideal concentration, and also compares the second actual concentration with the second ideal concentration. Specifically, it determines the relative magnitudes of the first actual concentration and the first ideal concentration, and also determines the relative magnitudes of the second actual concentration and the second ideal concentration.

[0062] More specifically, as shown in Figure 5, the comparison unit 44 first compares the first actual concentration and the first ideal concentration to determine whether the difference between the first actual concentration and the first ideal concentration is below a threshold (S1).

[0063] Then, if the difference between the first actual concentration and the first ideal concentration is below a predetermined threshold, the comparison unit 44 determines that the main reaction described above is proceeding ideally (S2).

[0064] On the other hand, in S1, if the difference between the first actual concentration and the first ideal concentration exceeds a predetermined threshold, the comparison unit 44 determines the relative magnitudes of the first actual concentration and the first ideal concentration (S3) to determine whether a side reaction other than the main reaction is occurring, or whether there is an abnormality on the gas analyzer 100 side (S4, S5).

[0065] Specifically, if the first actual concentration is higher than the first ideal concentration in S3, the comparison unit 44 determines that there is an abnormality on the device side (S4). Examples of abnormalities include calibration errors and various setting errors such as the first calibration curve data and the second calibration curve data mentioned above.

[0066] In contrast, if the first actual concentration in S3 is lower than the first ideal concentration, the comparison unit 44 determines that a side reaction other than the main reaction is occurring (S5).

[0067] Furthermore, the decisions in S2, S4, and S5 described above do not necessarily have to be made by the comparison unit 44; for example, the user may make the decisions, or these decisions may be omitted altogether.

[0068] In this case, if the first actual concentration is determined to be lower than the first ideal concentration in S3 as described above, the ratio of the first actual concentration to the first ideal concentration (hereinafter also referred to as the vaporization efficiency) will be less than 100%.

[0069] In contrast, the fluid control system 200 of this embodiment is configured to change the setting values ​​of various devices that make up the fluid control system 200 in accordance with any side reactions that may be occurring, in order to bring the vaporization efficiency closer to 100%.

[0070] More specifically, after determining in S3 above that the first actual concentration is lower than the first ideal concentration, the comparison unit 44 compares the second actual concentration and the second ideal concentration to determine whether the difference between the second actual concentration and the second ideal concentration is below a threshold (S6).

[0071] Then, based on the comparison results of the comparison unit 44, the output unit 45 determines and outputs the parameters to be changed, which are parameters among the parameters set in the equipment constituting the fluid control system 200 whose set values ​​should be changed in order to suppress side reactions. The output of the parameters to be changed by the comparison unit 44 is a signal that distinguishes the determined parameters to be changed from other parameters to be changed, such as a signal indicating the name of the parameters to be changed.

[0072] The fluid control system 200 includes equipment for vaporizing liquid or solid materials, and equipment for guiding the generated process gas to the process chamber S. Examples include a reservoir 20 for containing liquid material, a first mass flow controller MFC1 for controlling the flow rate of liquid material, a second mass flow controller MFC2 for controlling the flow rate of carrier gas, a vaporizer 10, piping (not shown) forming the gas supply passage L1, or a heater (not shown) for heating this piping.

[0073] In this embodiment, the internal or external memory of the information processing unit 40 stores judgment information, such as a table consisting of candidate comparison results from S6 and S8 performed by the comparison unit 44 and one or more parameters to be changed associated with those candidates. The output unit 45 uses this judgment information and the comparison results from each of the steps performed by the comparison unit 44 to determine and output the parameters to be changed. The storage unit may be a component of the information processing unit 40, a component of a computer separate from the information processing unit 40 in the fluid control system 200, or it may be located outside the fluid control system 200, such as a client server.

[0074] Here, if the comparison result of the comparison unit 44 in S6 indicates that the difference between the second actual concentration and the second ideal concentration is below the threshold, there is a high probability that liquefaction of the process gas flowing through the gas supply path L1 is occurring as a side reaction.

[0075] Therefore, in this case, that is, if the comparison result of the comparison unit 44 in S3 indicates that the first actual concentration is lower than the first ideal concentration, and the comparison result of the comparison unit 44 in S6 indicates that the difference between the second actual concentration and the second ideal concentration is below a threshold, the output unit 45 outputs the heating temperature of the piping forming the gas supply path L1 as a parameter to be changed (S7).

[0076] This allows us to suppress liquefaction, which may be occurring as a side reaction, by increasing the heating temperature of this piping.

[0077] In this configuration, the information processing unit 40 of this embodiment, as shown in Figure 4, further includes the function of an adjustment unit 47 that receives the parameter to be changed output from the output unit 45 and adjusts the setting value of the parameter to be changed.

[0078] In other words, when the output unit 45 outputs the heating temperature of the piping as a parameter to be changed, the adjustment unit 47 adjusts that heating temperature to a target temperature calculated based on the vaporization efficiency described above, for example, or raises it by a predetermined fixed temperature.

[0079] Furthermore, if the heating temperature is adjusted (increased) and the process returns to S7, in other words, if it is determined in S6 that the difference between the second actual concentration and the second ideal concentration is below a threshold, the output unit 45 may be configured to output the heating temperature of the piping again as a parameter to be changed.

[0080] On the other hand, as shown in Figure 5, if the comparison result in S6 shows that the difference between the second concentration and the second ideal concentration exceeds a threshold, the comparison unit 44 determines the relative magnitudes of the second actual concentration and the second ideal concentration (S8).

[0081] Furthermore, if the comparison result of the comparison unit 44 in S8 indicates that the second actual concentration is higher than the second ideal concentration, there is a high probability that decomposition of the process gas flowing through the gas supply path L1 is occurring as a side reaction.

[0082] Therefore, in this case, that is, if the comparison result of the comparison unit 44 in S3 indicates that the first actual concentration is lower than the first ideal concentration, and the comparison result of the comparison unit 44 in S6 indicates that the difference between the second concentration and the second ideal concentration exceeds a threshold, and the comparison result of the comparison unit 44 in S8 indicates that the second actual concentration is higher than the second ideal concentration, then the output unit 45 outputs at least one of the following parameters to be changed: the heating temperature of the vaporizer 10, the set flow rate of the vaporizer 10, or the set flow rate of the second mass flow controller MFC2 (S9). In the configuration of Figure 1, the set flow rate of the vaporizer 10 is the set flow rate of the first mass flow controller MFC1.

[0083] Subsequently, the adjustment unit 47 described above is configured to lower the heating temperature of the vaporizer 10, decrease the set flow rate of the first mass flow controller MFC1 as the set flow rate of the vaporizer 10, or increase the set flow rate of the second mass flow controller MFC2, thereby suppressing the decomposition of process gas that may be occurring as a side reaction.

[0084] Thus, when there are multiple options for parameters to be modified in order to suppress side reactions, the output unit 45 may output all of these parameters at once, or it may output them one by one.

[0085] In this embodiment, the output unit 45 is configured to output the parameters to be changed one by one in order, based on a pre-set priority order, when there are multiple options for the parameters to be changed to be output.

[0086] To explain in more detail, using the operation of S9 as an example, the output unit 45 first outputs the set flow rate of the second mass flow controller MFC2 as the parameter to be changed.

[0087] If the flow rate setting of the second mass flow controller MFC2 is adjusted (increased) and the process returns to S9, in other words, if the second actual concentration is again determined to be higher than the second ideal concentration in S8, the output unit 45 then outputs the heating temperature of the vaporizer 10 as the parameter to be changed.

[0088] If the heating temperature of the vaporizer 10 is adjusted (lowered) and the process returns to S9, in other words, if the second actual concentration is again determined to be higher than the second ideal concentration in S8, the output unit 45 outputs the set flow rate of the first mass flow controller MFC1, which is the set flow rate of the vaporizer 10, as the parameter to be changed.

[0089] If, after the set flow rate of the first mass flow controller MFC1 has been adjusted (increased), the system still returns to S9, in other words, if it is determined again in S8 that the second actual concentration is higher than the second ideal concentration, the output unit 45 may be configured to output, for example, an error signal indicating this.

[0090] Now, returning to the comparison in S8 in Figure 5, if the comparison result of the comparison section 44 in S8 indicates that the second actual concentration is lower than the second ideal concentration, there is a high probability that one or more side reactions are occurring, such as liquefaction or decomposition of the process gas, or redissolution of the material.

[0091] Therefore, in this case, that is, if the comparison result of the comparison unit 44 in S3 indicates that the first actual concentration is lower than the first ideal concentration, and the comparison result of the comparison unit 44 in S6 indicates that the difference between the second concentration and the second ideal concentration exceeds a threshold, and the comparison result of the comparison unit 44 in S8 indicates that the second actual concentration is lower than the second ideal concentration, then the output unit 45 outputs at least one of the following as a parameter to be changed: the heating temperature of the piping forming the gas supply path L1, the heating temperature of the vaporizer 10, the set flow rate of the first mass flow controller MFC1 which is the set flow rate of the vaporizer 10, or the set flow rate of the second mass flow controller MFC2 (S10).

[0092] In this case, if one or more side reactions such as liquefaction, decomposition, or redissolution are occurring, measures to lower the temperature of the piping etc. are effective against decomposition, while measures to raise the temperature of the piping etc. are effective against liquefaction and redissolution, resulting in a counter-reaction between the two measures.

[0093] Therefore, the adjustment unit 47 of this embodiment is configured to first lower the temperature of the piping, etc., taking into consideration that peroxides are being handled as process gas, and then to raise the temperature of the piping, etc., if the side reaction is still not improved.

[0094] More specifically, as shown in Figure 6, the adjustment unit 47 first lowers the heating temperature of the piping that forms the gas supply passage L1 (S11).

[0095] Then, the adjustment unit 47 determines whether the side reaction has improved (S12), and if it has improved, it terminates the adjustment.

[0096] As an example of how to determine whether or not the side reaction has improved, for instance, if, after adjusting the temperature and other parameters in the adjustment unit 47, the second actual concentration is determined to be higher than the second ideal concentration in S8 of Figure 5, the adjustment unit 47 will determine that the side reaction has improved. Conversely, if the second actual concentration remains lower than the second ideal concentration, the adjustment unit 47 will determine that the side reaction has not improved.

[0097] Another example is a method in which, after adjusting the temperature, etc., in the adjustment unit 47, if the flow shown in Figure 5 is followed and the process returns to S10, the adjustment unit 47 determines that the side reaction has not been improved; otherwise, the adjustment unit 47 determines that the side reaction has been improved.

[0098] On the other hand, if the adjustment unit 47 determines in S12 that the side reaction has not been improved, it then lowers the heating temperature of the vaporizer 10 (S13).

[0099] Then, the adjustment unit 47, similar to S12, determines whether or not the side reaction has improved (S14), and if it has improved, the adjustment is terminated.

[0100] On the other hand, if the adjustment unit 47 determines in S14 that the side reaction has not been improved, it then controls, for example, a concentration adjustment device (not shown) to lower the concentration of the aqueous solution in the storage container 20 (S15).

[0101] Then, the adjustment unit 47, similar to S12, determines whether or not the side reaction has improved (S16), and if it has improved, the adjustment is terminated.

[0102] On the other hand, if the adjustment unit 47 determines in S16 that the side reaction has not been improved, it increases the heating temperature of the piping that forms the gas supply passage L1 (S17).

[0103] In this case, it is preferable to return the adjustment values ​​made in S11, S13, and S15 back to their original settings before adjustment, and then increase the heating temperature of the piping in S17. However, it is also acceptable to increase the heating temperature of the piping in S17 without returning some or all of the settings in S11, S13, and S15 back to their original settings.

[0104] Then, the adjustment unit 47, similar to S12, determines whether or not the side reaction has improved (S18), and if it has improved, the adjustment is terminated.

[0105] On the other hand, if the adjustment unit 47 determines in S18 that the side reaction has not been improved, it then raises the heating temperature of the vaporizer 10 (S19).

[0106] Then, the adjustment unit 47, similar to S12, determines whether or not the side reaction has improved (S20), and if it has improved, the adjustment is terminated.

[0107] On the other hand, if the adjustment unit 47 determines in S20 that the side reaction has not been improved, it then increases the concentration of the solution (S15), thereby ending the adjustment process.

[0108] Furthermore, the adjustments in S11, S13, S15, S17, S19, and S21 do not necessarily all need to be performed by the adjustment unit 47; some or all of these adjustments may be performed manually by the user.

[0109] With the gas analyzer 100 configured in this way, the first actual concentration and the first ideal concentration are compared, and the second actual concentration and the second ideal concentration are compared. Based on these comparison results, the parameters to be changed are determined and output. By adjusting the setting values ​​of these parameters, the progress of any side reactions that may be occurring can be suppressed. As a result, vaporization efficiency can be improved, making it possible to bring the actual concentration of the process gas closer to the ideal concentration.

[0110] Furthermore, since the information processing unit 40 also functions as an adjustment unit 47, the adjustment of the setting values ​​of the parameters to be changed can be automated.

[0111] Furthermore, the present invention is not limited to the above first embodiment.

[0112] For example, in the first embodiment, the output unit 45 output the parameter to be changed to the adjustment unit 47, but as shown in Figure 7, it may also output the parameter to be changed to a display or the like. With this configuration, users can identify the parameters that need to be changed to improve vaporization efficiency, and then improve vaporization efficiency by changing the settings of those parameters based on their experience, for example.

[0113] Furthermore, while the fluid control system 200 in the first embodiment vaporized a liquid material by ejecting it from a nozzle, it may also be a bubbling type, as shown in Figure 8, which vaporizes a liquid material or molten solid material by heating and bubbling it.

[0114] Specifically, this fluid control system 200 includes a vaporization tank 11 for containing a liquid or solid material, a carrier gas introduction channel L3 for introducing a carrier gas to vaporize the material by bubbling it into the vaporization tank 11, a mass flow controller MFC3 which is a fluid control device provided in the carrier gas introduction channel L3, and a gas supply channel L1 for supplying the gas vaporized by the vaporization tank 11 to a gas supply space S such as a chamber. In other words, in this embodiment, the vaporization tank 11 and the carrier gas introduction channel L3 function as a vaporizer 10 for vaporizing the liquid or solid material.

[0115] In this configuration, the components of the fluid control system 200 include the vaporizer 10, mass flow controller MFC3, piping forming the gas supply passage L1, piping forming the carrier gas introduction passage L3, and heaters for heating these pipes.

[0116] Furthermore, the parameters that can be changed include the solution temperature in the vaporization tank 11, the solution concentration in the vaporization tank 11, the heating temperature of the vaporizer 10, the set flow rate of the vaporizer 10, the heating temperature of the piping forming the gas supply path L1, and the heating temperature of the piping forming the carrier gas introduction path L3. In the configuration shown in Figure 8, the set flow rate of the vaporizer 10 is the set flow rate of the mass flow controller MFC3.

[0117] Here, the operation of the information processing device 4 in the configuration of Figure 8 can be the same as in the embodiment described above, from S1 to S9 in Figure 5. Therefore, an example of the operation after various parameters to be changed are output in S10 will be explained using hydrogen peroxide solution, with reference to Figure 9. Note that the steps that are common to the operation in Figure 6, such as the step of determining whether or not the side reaction has improved, will not be explained. First, in order to prevent disassembly, the adjustment unit 47 lowers the heating temperature of the gas supply passage L1 piping (S11). Subsequently, if the adjustment unit 47 determines that the side reaction has not improved, it then lowers the temperature of the solution in the vaporization tank 11 (S13). If it still determines that the side reaction has not improved, it lowers the concentration of the solution in the vaporization tank 11 (S15). Furthermore, if the adjustment unit 47 determines that the side reaction has not yet improved, it reduces the set flow rate of the mass flow controller MFC3 (Sa1) to check whether reducing the amount of hydrogen peroxide supplied to the gas supply path L1 contributes to suppressing the decomposition reaction.

[0118] Subsequently, the adjustment unit 47 determines whether the side reaction has improved (Sa2). If the side reaction has not improved, the adjustment unit 47 increases the heating temperature of the gas supply passage L1 to suppress liquefaction and / or redissolution (S17). Subsequently, if the adjustment unit 47 determines that the side reaction has not improved, it increases the heating temperature of the carrier gas introduction passage L3 (S19) in order to prevent the oxygen gas from taking away the temperature of the hydrogen peroxide gas and H2O gas flowing through the gas supply passage L1. If it still determines that the side reaction has not improved, it increases the solution concentration in the vaporization tank 11 (S21).

[0119] Furthermore, the fluid control system 200 may be a baking type, as shown in Figure 10, in which a vaporizer 12 containing a liquid or solid material is placed in a constant temperature bath 13 to vaporize the liquid or solid material. Note that the constant temperature bath 13 is not necessarily required.

[0120] Specifically, this fluid control system 200 comprises the vaporizer 12 and constant temperature bath 13 described above, a gas supply path L1 that supplies the gas vaporized by the vaporizer 12 to a gas supply space S such as a chamber, and a mass flow controller MFC4, which is a fluid control device provided in the gas supply path L1 and located inside the constant temperature bath 13.

[0121] In this configuration, the components of the fluid control system include a vaporizer 12, a constant temperature bath 13, a mass flow controller MFC4, piping forming the gas supply passage L1, and a heater for heating the piping.

[0122] Furthermore, the parameters that can be changed include the heating temperature of the vaporizer 12, the set flow rate of the vaporizer 12, the set temperature of the constant temperature bath 13, and the heating temperature of the piping forming the gas supply path L1. In the configuration shown in Figure 10, the set flow rate of the vaporizer 12 is the set flow rate of the mass flow controller MFC4.

[0123] Here, the operation of the information processing device 4 in the configuration of Figure 10 can be the same as in the embodiment described above, from S1 to S9 in Figure 5. Therefore, an example of the operation after various parameters to be changed are output in S10 will be explained using hydrogen peroxide solution, with reference to Figure 11. Note that the steps that are common to the operation in Figure 6, such as the step of determining whether or not the side reaction has improved, will not be explained. First, in order to prevent disassembly, the adjustment unit 47 lowers the heating temperature of the gas supply passage L1 piping (S11). Subsequently, if the adjustment unit 47 determines that the side reaction has not improved, it lowers the solution temperature in the vaporizer 12 (S13), and if it still determines that the side reaction has not improved, it lowers the set temperature of the constant temperature bath 13 (S15). Furthermore, if the adjustment unit 47 determines that the side reaction has not yet improved, it will either reduce the set flow rate of the mass flow controller MFC4 or lower the solution concentration in the vaporizer 12 (Sb1) to confirm whether reducing the amount of hydrogen peroxide supplied to the gas supply path L1 contributes to suppressing the decomposition reaction.

[0124] Subsequently, the adjustment unit 47 determines whether the side reaction has improved (Sa2). If the side reaction has not improved, the adjustment unit 47 increases the heating temperature of the gas supply passage L1 to suppress liquefaction and / or redissolution (S17). Subsequently, if the adjustment unit 47 determines that the side reaction has not improved, it raises the set temperature of the constant temperature bath 13 (S19). If it still determines that the side reaction has not improved, it considers the possibility that hydrogen peroxide gas and / or H2O gas exceeding the saturated vapor pressure is flowing through the gas supply passage L1, and either reduces the set flow rate of the mass flow controller MFC4 or lowers the solution concentration in the vaporizer 12 (S21).

[0125] In the first embodiment, a mixture of hydrogen peroxide (H2O2) and water (H2O) was used as the liquid material, but a mixture of formaldehyde and water, or a mixture of peracetic acid and water, or even a variety of other liquid materials not limited to aqueous solutions may be used.

[0126] Furthermore, examples of solid materials include W(CO)6 (hexacarbonyltungsten).

[0127] When using this solid material, the main reactions occur in the vaporization tank 12 and the gas supply space S which is the process chamber. Specifically, as shown in Figure 12, W(CO)6 gas is produced as the process gas in the vaporization tank 12, and CO gas is produced as a by-product gas in the process chamber.

[0128] On the other hand, possible side reactions when using this solid material include, as shown in Figure 13, the decomposition of the process gas before it reaches the process chamber, the decomposition of the process gas occurring separately from this decomposition, and the liquefaction and / or solidification of the process gas.

[0129] Here, if the main reaction described above proceeds ideally, no decomposition of the process gas should occur before reaching the process chamber, and the by-product gas, CO gas, should not be flowing into the gas supply path L1. In other words, the second ideal concentration is zero. That is, the by-product gas in this embodiment is a gas that does not occur in the ideally proceeding main reaction, but only in its side reaction.

[0130] Therefore, in this case, the concentration monitor 30 plays the role of confirming that no CO gas is flowing through the gas supply path L1, as shown in Figure 12.

[0131] An example of the operation of the information processing device in this embodiment is the flow shown in Figure 14. Note that the flow from T1 to T6 is the same as S1 to S6 in the first embodiment, and a detailed explanation is omitted.

[0132] If the comparison result of the comparison unit 44 at T6 indicates that the difference between the second actual concentration and the second ideal concentration is below the threshold, then, as described above, the second ideal concentration is zero, and therefore, there is a high probability that liquefaction and / or solidification of the process gas flowing through the gas supply path L1 is occurring as a side reaction.

[0133] Therefore, in this case, that is, when the comparison result of the comparison unit 44 at T3 indicates that the first actual concentration is lower than the first ideal concentration, and the comparison result of the comparison unit 44 at T6 indicates that the difference between the second actual concentration and the second ideal concentration is below a threshold, the output unit 45 outputs the heating temperature of the piping forming the gas supply path L1 as a parameter to be changed (T7), and by raising the heating temperature of this piping, liquefaction and / or solidification that may be occurring as a side reaction can be suppressed.

[0134] On the other hand, if the comparison result at T6 shows that the difference between the second concentration and the second ideal concentration exceeds a threshold, there is a high probability that the decomposition of the process gas is occurring as a side reaction.

[0135] Therefore, in this case, that is, when the comparison result of the comparison unit 44 at T3 indicates that the first actual concentration is lower than the first ideal concentration, and the comparison result of the comparison unit 44 at T6 indicates that the difference between the second actual concentration and the second ideal concentration exceeds a threshold, the output unit 45 outputs the heating temperature of the piping forming the gas supply path L1 as a parameter to be changed (T8), and by lowering the heating temperature of this piping, the decomposition of the process gas that may be occurring as a side reaction can be suppressed.

[0136] Furthermore, some of the functions of the first embodiment may be performed by a machine learning unit that processes calculations using a machine learning algorithm. For example, one or both of the functions of the output unit 45 or the adjustment unit 47 may be performed by the machine learning unit.

[0137] <<Second Embodiment>> Next, a second embodiment of the gas analyzer according to the present invention will be described.

[0138] The gas analyzer according to this embodiment is a gas analyzer that analyzes compound gases produced in the main reaction in which a solid material vaporizes and by-product gases generated in a side reaction separate from the main reaction. The configuration and operation of the information processing device differ from those of the above embodiment, and these will be described in detail below.

[0139] As shown in Figure 15, the information processing unit 50 of this embodiment functions as a first concentration calculation unit 51, a second concentration calculation unit 52, an ideal concentration storage unit 53, a comparison unit 54, and an output unit 55. Note that the gas concentration described below may refer to the component concentration of the gas or to the partial pressure of the gas. The operation of the information processing unit 50 in this embodiment will be explained below, along with a description of the functions of each part.

[0140] The first concentration calculation unit 51 calculates the concentration of the compound gas W(CO)6 gas (hereinafter also referred to as the first actual concentration). Specifically, it receives a light intensity signal, which is the output signal from the photodetector, and performs calculations on the value indicated by this light intensity signal to calculate the concentration of W(CO)6 gas contained in the gas flowing through the gas supply path L1 as the first actual concentration. This calculation process uses first calibration curve data that shows the relationship between the value indicated by the light intensity signal and the first actual concentration. This first calibration curve data is stored in the calibration curve data storage unit 56 set in a predetermined area of ​​the memory (see Figure 15).

[0141] The second concentration calculation unit 52 calculates the concentration of CO gas, a by-product gas (hereinafter also referred to as the second actual concentration). Specifically, it receives a light intensity signal, which is the output signal from the photodetector, and performs calculations on the value indicated by this light intensity signal to calculate the concentration of CO gas contained in the gas flowing through the gas supply path L1 as the second actual concentration. This calculation process uses second calibration curve data, which shows the relationship between the value indicated by the light intensity signal and the second actual concentration. This second calibration curve data is stored in the calibration curve data storage unit 56, which is set in a predetermined area of ​​the memory (see Figure 15).

[0142] In this embodiment, the first concentration calculation unit 51 and the second concentration calculation unit 52 are configured to calculate the first and second actual concentrations, respectively, based on output signals output from a common photodetector, thereby enabling the device to be made more compact and reducing manufacturing costs. However, the first concentration calculation unit 51 and the second concentration calculation unit 52 may also be configured to calculate the first and second actual concentrations, respectively, based on output signals output from separate photodetectors.

[0143] The ideal concentration storage unit 53 is set in a predetermined area of ​​the memory and stores the first ideal concentration, which is the concentration of W(CO)6 gas when the main reaction described above proceeds ideally, and the second ideal concentration, which is the concentration of CO gas when the main reaction described above proceeds ideally.

[0144] The first ideal concentration can be calculated in advance, for example, before the start of the control process by the fluid control system 200. Specifically, as shown in Figures 1 and 8, in a configuration in which the process gas, W(CO)6 gas, is pumped by a carrier gas, the first ideal concentration can be theoretically determined from the volume fraction of the total flow rate of the gas flowing through the concentration monitor 30 and the set flow rate of the carrier gas. On the other hand, as shown in Figure 12, in a configuration in which no carrier gas is used, the theoretical concentration of W(CO)6 gas is 100%.

[0145] As described above, the theoretical concentration may be used as the first ideal concentration. However, considering that the vaporization process in this embodiment involves heating a solid material under high vacuum, which places a high load on the substance, decomposition may occur simultaneously with the main reaction described above. In this case, a difference will arise between the theoretical concentration and the concentration measured by the concentration monitor 30 (effective concentration). Therefore, the ratio of the effective concentration to the theoretical concentration may be determined in advance, and the concentration obtained by multiplying the theoretical concentration by this ratio may be used as the first ideal concentration. Alternatively, the effective concentration may be used as the first ideal concentration without determining this ratio.

[0146] The second ideal concentration, like the first ideal concentration, can be calculated in advance, for example, before the start of the control process by the fluid control system 200. In this embodiment, if the main reaction proceeds ideally, no CO gas is generated, and the theoretically determined concentration is 0%.

[0147] This theoretical concentration can be used as the second ideal concentration, or, considering the decomposition due to the high vacuum conditions mentioned above, the second ideal concentration can be set to a few percent by volume.

[0148] The first ideal concentration and the second ideal concentration calculated in this manner are input from an external source, for example, via an input means, and stored in the ideal concentration storage unit 53. However, the information processing unit 50 may be equipped with a function as an ideal concentration calculation unit that calculates the first ideal concentration and the second ideal concentration, and the first ideal concentration and the second ideal concentration calculated by this ideal concentration calculation unit may be stored in the ideal concentration storage unit 53.

[0149] The comparison unit 54 compares the first actual concentration with the first ideal concentration, and also compares the second actual concentration with the second ideal concentration. Specifically, it determines the relative magnitudes of the first actual concentration and the first ideal concentration, and also determines the relative magnitudes of the second actual concentration and the second ideal concentration.

[0150] The comparison unit 54 of this embodiment is configured to compare the first actual concentration and the first ideal concentration to determine whether a side reaction other than the main reaction is occurring, and to determine whether there is an abnormality on the device side.

[0151] More specifically, as shown in Figure 16, the comparison unit 54 first compares the first actual concentration and the first ideal concentration (S'1). If the difference between the first actual concentration and the first ideal concentration is below a predetermined threshold, the comparison unit 54 determines that the main reaction described above is proceeding ideally (S'2).

[0152] On the other hand, in S'1, if the difference between the first actual concentration and the first ideal concentration exceeds a predetermined threshold, the comparison unit 54 determines the relative magnitudes of the first actual concentration and the first ideal concentration (S'3) to determine whether a side reaction other than the main reaction is occurring, or whether there is an abnormality on the apparatus side (S'4, S'5).

[0153] Specifically, if the first actual concentration is higher than the first ideal concentration, the comparison unit 54 determines that there is an abnormality on the device side (S'4). Examples of abnormalities include calibration failures and errors in setting various settings such as the first calibration curve data, the second calibration curve data, and vaporization efficiency mentioned above.

[0154] In contrast, if the first actual concentration is lower than the first ideal concentration, the comparison unit 54 determines that a side reaction separate from the main reaction is occurring (S'5).

[0155] If the comparison unit 54 determines that a side reaction is occurring in S'5, it identifies the type of side reaction based on the comparison result between the second actual concentration and the second ideal concentration. The types of side reactions include, as described above, the decomposition of W(CO)6 gas generated before reaching the process chamber, the decomposition of W(CO)6 gas generated separately from this decomposition, and the liquefaction and / or solidification of W(CO)6 gas (see Figure 13). The type of side reaction identified by the comparison unit 54 only needs to include at least one of these decomposition, liquefaction, and solidification.

[0156] In this embodiment, the comparison unit 54 compares the second actual concentration and the second ideal concentration (S'6), and if the difference between the second actual concentration and the second ideal concentration is less than or equal to a predetermined threshold, it is determined that liquefaction and / or solidification of W(CO)6 gas has occurred as a side reaction (S'7).

[0157] On the other hand, in S'6, if the difference between the second actual concentration and the second ideal concentration exceeds a predetermined threshold, the comparison unit 54 determines that the decomposition of W(CO)6 gas is occurring as a side reaction (S'8).

[0158] Thus, the analysis results from the comparison unit 54 include at least the comparison results between the first actual concentration and the first ideal concentration, and the comparison results between the second actual concentration and the second ideal concentration. Furthermore, the analysis results of this embodiment also include various judgment results determined based on those comparison results, namely whether or not there is an abnormality on the device side, whether or not a side reaction other than the main reaction is occurring, and the type of side reaction occurring (decomposition, liquefaction, and / or solidification).

[0159] In this embodiment, the internal or external memory of the information processing unit 50 stores judgment information, such as a table consisting of candidate comparison results of S'1, S'3, and S'6 from the comparison unit 54 and the one or more judgment results associated with those candidates. The comparison unit 54 uses this judgment information and the comparison results from each of the steps described above to derive one or more judgment results. The storage unit described above may be a component of the information processing unit 50, a component of a computer separate from the information processing unit 50 in the fluid control system 200, or it may be located outside the fluid control system 200, such as a client server.

[0160] The analysis results based on the comparison by the comparison unit 54 are then output in a visible format by the output unit 55. Specifically, the output unit 55 outputs some or all of the information included in the analysis results in a visible format, and is configured to display on the display whether there is a malfunction on the device side, whether an adverse reaction has occurred, and the type of adverse reaction. The output unit 55 may also print the analysis results onto paper or the like.

[0161] With the gas analyzer 100 of this embodiment configured in this way, the analysis results are output by comparing the first actual concentration and the first ideal concentration, which are the concentrations of W(CO)6 gas. This makes it possible to determine whether there is a difference between the first actual concentration and the first ideal concentration, that is, whether the main reaction is proceeding ideally. Furthermore, by comparing the second actual concentration and the second ideal concentration, which represent the CO gas concentration, and outputting the analysis results, it becomes easier to identify the most probable cause of the difference between the first actual concentration and the first ideal concentration from among various factors that cannot be determined by comparing only the first actual concentration and the first ideal concentration, such as a malfunction on the equipment side or the occurrence of side reactions such as decomposition, liquefaction, or solidification of W(CO)6 gas. In turn, it becomes easier to take appropriate measures to reduce the difference between the first actual concentration and the first ideal concentration.

[0162] However, the present invention is not limited to the embodiments described above.

[0163] For example, in the above embodiment, the output unit 55 output that there is an abnormality on the device side, that a side reaction is occurring, and the type of the side reaction, but it may output only some of these. Alternatively, it may display the comparison result (magnitude relationship) between the first actual concentration and the first ideal concentration, and the comparison result (magnitude relationship) between the second actual concentration and the second ideal concentration. In this case, the comparison unit 54 does not need to determine that there is an abnormality on the device side, that a side reaction is occurring, or the type of the side reaction.

[0164] Furthermore, the output unit 55 may output the first actual concentration and the first ideal concentration in a comparable manner, and also output the second actual concentration and the second ideal concentration in a comparable manner, for example, on a display, without outputting the analysis results from the comparison unit 54. In this case, the information processing unit 50 does not need to have the function of the comparison unit 54.

[0165] Furthermore, as described in the second embodiment, the information processing unit 50 may also function as an ideal concentration calculation unit 57 that calculates the first ideal concentration and the second ideal concentration, as shown in Figure 17. Specifically, as described in the explanation of the first ideal concentration and the second ideal concentration in the above embodiment, a difference arises between the theoretical concentration and the effective concentration due to decomposition caused by heating under high vacuum. For example, if the ratio between the theoretical concentration and the effective concentration is input in advance, the ideal concentration calculation unit 57 can calculate the first ideal concentration and the second ideal concentration using this ratio.

[0166] The information processing unit 50 may also be equipped with a notification function that notifies the system when the difference between the first actual concentration and the first ideal concentration exceeds a predetermined threshold, as a result of the comparison unit comparing the first actual concentration and the first ideal concentration.

[0167] Furthermore, some of the functions of the first concentration calculation unit 51, second concentration calculation unit 52, comparison unit 54, and output unit 55 of the information processing unit 50 may be provided by another computer, or the ideal concentration storage unit 53 may be set in a predetermined area of ​​external memory separate from the memory of the information processing unit 50.

[0168] Furthermore, some of the functions of the second embodiment may be performed by a machine learning unit that processes calculations using a machine learning algorithm. For example, one or both of the functions of the comparison unit 54 or the output unit 55 may be performed by the machine learning unit.

[0169] Furthermore, various modifications and combinations of the embodiments are permitted, as long as they do not contradict the spirit of the present invention. [Explanation of Symbols]

[0170] 100... Gas analyzer 200... Fluid control system S...Gas supply space 10. Vaporizer L1... Gas supply channel 30...Concentration Monitor 40, 50... Information Processing Section 41, 51...1st concentration calculation section 42, 52...Second concentration calculation section 43, 53...Ideal concentration storage section 44, 54...Comparison section Output section of 45, 55... 46, 56... Calibration curve data storage section 47...Adjustment section

Claims

1. A gas analyzer used in a fluid control system for controlling process gases obtained by vaporizing liquid or solid materials, A first concentration calculation unit for calculating the concentration of the process gas, A second concentration calculation unit calculates the concentration of at least the by-product gas produced in a side reaction, which is a reaction separate from the main reaction that generates the process gas. Based on the first actual concentration, which is the concentration of the process gas calculated by the first concentration calculation unit, and the second actual concentration, which is the concentration of the by-product gas calculated by the second concentration calculation unit, an output unit determines and outputs the parameter to be changed, which is a parameter whose set value should be changed among the parameters set in the plurality of devices constituting the fluid control system. A gas analyzer comprising: an adjustment unit that receives the parameter to be changed output from the output unit and adjusts the set value of the parameter to be changed.

2. The gas analyzer according to claim 1, wherein the adjustment unit adjusts the heating temperature to a target temperature calculated based on vaporization efficiency, or increases it by a predetermined fixed temperature, when the parameter to be changed is the heating temperature of the piping.

3. The gas analyzer according to claim 1 or 2, wherein the output unit determines and outputs the parameter to be changed from among a plurality of parameters set in the equipment, including at least one of the heating temperature of the piping through which the process gas flows, the heating temperature of the vaporizer that vaporizes the liquid material or the solid material, the set flow rate of the vaporizer, and the concentration of the liquid material.

4. The gas analyzer according to claim 1 or 2, wherein the first concentration calculation unit and the second concentration calculation unit calculate the concentration based on an output signal output from a common photodetector.

5. A vaporizer for vaporizing the liquid or solid material, A fluid control device that controls the process gas, the liquid material, or the carrier gas, A fluid control system comprising a gas analyzer according to claim 1 or 2.

6. A gas analysis program used in a fluid control system for controlling process gases obtained by vaporizing liquid or solid materials, A first concentration calculation unit for calculating the concentration of the process gas, A second concentration calculation unit calculates the concentration of at least the by-product gas produced in a side reaction, which is a reaction separate from the main reaction that generates the process gas. Based on the first actual concentration, which is the concentration of the process gas calculated by the first concentration calculation unit, and the second actual concentration, which is the concentration of the by-product gas calculated by the second concentration calculation unit, an output unit determines and outputs the parameter to be changed, which is a parameter whose set value should be changed among the parameters set in the plurality of devices constituting the fluid control system. A gas analysis program that receives the parameter to be changed output from the output unit and causes the computer to perform the function of an adjustment unit to adjust the set value of the parameter to be changed.

7. A gas analysis method used in a fluid control system for controlling process gases obtained by vaporizing liquid or solid materials, A first concentration calculation step for calculating the concentration of the process gas, A second concentration calculation step involves calculating the concentration of at least the by-product gas produced in a side reaction, which is a reaction separate from the main reaction that generates the process gas. An output step that determines and outputs the parameters to be changed, which are parameters whose set values ​​should be changed, from among the parameters set in the plurality of devices constituting the fluid control system, based on the first actual concentration, which is the concentration of the process gas calculated in the first concentration calculation step, and the second actual concentration, which is the concentration of the by-product gas calculated in the second concentration calculation step. A gas analysis method comprising: an adjustment step of receiving the parameter to be changed output in the output step and adjusting the set value of the parameter to be changed.

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