Pressurized electrochemical reactor

Abstract

To propose a solution that simplifies the application of this compressive force onto a stack positioned within a heating chamber. [Solution] The present invention relates to an electrochemical reactor (1), which is configured to receive a stack (10), the reactor is equipped with a support plate (22), the stack is positioned to be in contact with the support plate, and the reactor has an internal volume (V) intended to receive the stack. int ) has volume (V l The present invention further comprises a dome (30) of liquid glass frit (40) having an upper surface called the free surface (41), configured to cover the stack, and further comprises a cover gas (42) whose internal volume is positioned in contact with the free surface of the liquid frit volume, and the cover gas is subjected to a tightening pressure (P s The module is configured to be pressurized by a mechanical force proportional to the clamping pressure, which maintains the stack in a compressed state on the support plate.

Description

[Technical Field]

[0001] This invention relates to the fields of solid oxide fuel cells (SOFCs), high-temperature water electrolysis, and solid oxide water electrolysis (SOECs, also known as solid oxide electrolytic cells). More specifically, this invention relates to the maintenance of stacks used in SOFC and SOEC fuel cells. [Background technology]

[0002] Systems for producing gas and / or electricity using solid oxide fuel cells are classified into two major technological areas: cylindrical systems and planar systems. Within the scope of planar technology, SOEC (Solid Oxide Electrolytic Cell) systems or SOFC (Solid Oxide Fuel Cell) systems consist of a stack of alternating electrochemical cells, typically made of ceramic, and metal bipolar plates, which constitute the active part.

[0003] The stack, therefore, includes multiple thin interconnect plates mounted between two rigid end plates, to which a voltage difference is applied. To ensure electrical conduction across the numerous stages of these structures and the power supply to each of the cells mounted in series within the stack, a compressive force must be applied to the stack to initiate and maintain bearing in the contact zones. A compression defect, which limits the flow of current within the multilayer structure, is communicated by increased resistive losses and heat generation within the stack. Ensuring good compression of the stack during operation is an essential prerequisite for ensuring good performance.

[0004] In current industrial designs, modules that group and combine multiple stacks mounted within the same heating chamber are typically clamped by external mechanical devices that can maintain a quasi-constant compressive force by adapting to the thermal expansion of the components.

[0005] These external mechanical devices can be fixed to the stack. Self-clamping mounting is referred to as a method that allows the stack to be kept compressed between two thick flanges connected by threaded tie rods. However, self-clamping mounting has technical limitations for large stacks.

[0006] These external mechanical devices may be off-board. The stack is therefore mounted on a rigid base bearing that rests on the hearth of the heating chamber and compressed by cross members bearing by the external device. External clamping devices have many disadvantages with respect to integration, especially when it turns out that they need to be off-board outside the heating chamber.

[0007] In addition, external devices that maintain a constant force must incorporate elastic elements to adapt to geometric changes in the thermal cycle. Incorporating such elastic elements within the heating chamber is difficult. Therefore, the latter must be made from a special alloy that is suitable for the operating conditions of the stack. Consequently, applying compressive force on a stack, or on a module containing multiple stacks positioned within a heating chamber, is technically very complex due to the high operating temperatures. [Overview of the project] [Problems that the invention aims to solve]

[0008] The object of the present invention is to propose a solution that simplifies the application of this compressive force to a stack positioned within a heating chamber.

[0009] Other objectives can be achieved through this solution. [Means for solving the problem]

[0010] To achieve this object, according to one embodiment, an electrochemical reactor is provided, which is configured to receive a stack having a first face, a second face opposite the first face, and at least one outer wall connecting the first face to the second face, and is configured to operate at an operating temperature. The reactor · A support configured to ensure the passage of the supply gas to the stack, the support including a support plate, and the stack being positioned such that its second face is in contact with the support plate is provided, and the reactor · A closed dome having an internal volume, intended to receive the stack and be hermetically fixed on the support · A glass frit having a glass frit volume, positioned within the internal volume, configured to undergo a phase transition at the operating temperature of the stack, thereby forming a liquid glass frit having a liquid glass frit volume, and further configured to cover the stack, the liquid glass frit volume being smaller than the internal volume and having an upper surface called a free surface is further characterized by further comprising The internal volume further includes a so-called cover gas, the cover gas being positioned above the free surface of the liquid frit volume, in contact with the free surface of the liquid frit volume, and the cover gas being configured to be pressurized with a clamping pressure by a pressurization module, and the clamping pressure being configured to maintain the stack in a compressed state on the support plate under a mechanical force proportional to the clamping pressure.

[0011] Thus, the present invention makes it possible, by the hydrostatic effect, to maintain the pressure acting on the free surface of the glass and to be uniformly and completely transmitted onto the end plates of the stack, which does not require mechanical components.

[0012] Advantageously, the compression force transmitted to the stack is adjustable by varying the internal pressure. The proposed device thus constitutes an active system that makes it possible to continuously adjust the compression force according to the internal pressure of the stack.

[0013] In addition, another advantage of this design is to ensure a very high sealing of the stack. In fact, the outer wall of the stack, the interface between the stack and the manifold support plate, and the interface between the dome and the support plate are in the glass bath, and there is no longer a gas seal that must be ensured by seals and gaskets, but there is a seal with glass (viscous liquid). The only gas seal that is ensured is the seal of the stopper welded onto the dome. Regarding leaks in the stack, since the supply gas is at a pressure lower than the pressure of the external fluid, they can no longer escape when subjected to a counter-pressure. Crack-type defects in the gaskets that can cause gas leaks in the stack have a geometric shape (dimensions in micrometers, high degrees of twist, capillary effects, very high viscosities) that does not allow the passage of viscous fluids such as glass.

[0014] According to another aspect, a method for pressurizing an electrochemical reactor as described above is provided, the method comprising · positioning a stack on a support; · positioning and fixing a dome on the support so as to surround the stack; · filling the dome with glass frit through an opening; · fixing a stopper to the opening so as to form an internal volume of the sealed dome; · raising the temperature inside the reactor so as to reach the operating temperature; · pressurizing the reactor to a clamping pressure by means of a pressurizing module and including.

[0015] Thereby, the implementation of this compression is made smooth and is carried out quickly.

[0016] The objects, aims, and further features and advantages of the present invention will emerge most clearly from the following detailed description of one embodiment of the latter, which is illustrated by the following attached drawings.

Brief Description of the Drawings

[0017] [Figure 1A] This diagram shows a support structure according to one embodiment of the present invention. [Figure 1B] This diagram shows a support structure according to one embodiment of the present invention. [Figure 2A] This is a diagram showing a dome according to one embodiment of the present invention. [Figure 2B] This is a diagram showing a dome according to one embodiment of the present invention. [Figure 3A] This diagram shows a stack positioned on a support according to one embodiment of the present invention. [Figure 3B] This diagram shows a stack positioned on a support according to one embodiment of the present invention. [Figure 4A] This diagram illustrates the closure of a dome on a support according to one embodiment of the present invention. [Figure 4B] This diagram illustrates the closure of a dome on a support according to one embodiment of the present invention. [Figure 5A] This figure illustrates the insertion of glass frit and pressurization of the device according to one embodiment of the present invention. [Figure 5B] This figure illustrates the insertion of glass frit and pressurization of the device according to one embodiment of the present invention. [Figure 5C] This figure illustrates the insertion of glass frit and pressurization of the device according to one embodiment of the present invention. [Figure 5D] This figure illustrates the insertion of glass frit and pressurization of the device according to one embodiment of the present invention. [Figure 6A] This figure shows another embodiment of the present invention. [Figure 6B] This figure shows another embodiment of the present invention. [Modes for carrying out the invention]

[0018] The drawings are provided as examples only and do not limit the invention. They are schematic diagrams of the principle intended to facilitate understanding of the invention and are not necessarily to the scale of practical applications.

[0019] Before commencing a detailed examination of embodiments of the present invention, optional features that may be used in relation to or alternatively as an option are described below.

[0020] For example, the clamping pressure is in the range of 500 hPa to 200 kPa. s These low pressure values ​​allow for the consideration of producing pressurized chambers operating at high temperatures that accommodate both sealing interfaces and thermomechanical stresses. This clamping pressure allows for the uniform distribution of sufficient pressure to maintain the pressure acting on the stack due to the static pressure effect.

[0021] In one example, a volume of liquid glass frit covers at least a first surface and at least one outer wall of the stack to generate counterpressure. This allows the pressure acting on the stack assembly to be maintained without additional mechanical means. This also ensures a second barrier and protects at least one outer wall of the stack in the event of a localized hydrogen leak.

[0022] For example, the dome has a structure configured to fit the architecture of the stack. Thus, this dome ensures that it properly covers the stack, thereby ensuring the presence of sufficient internal volume to secure the frit volume, which is maintained by the hydrostatic effect.

[0023] In one example, the dome has a curved inner surface on at least one portion. The curved inner surface allows it to resist the internal pressure when the cover gas is pressurized, and thus resists pressure sufficient to keep the stack compressed.

[0024] For example, the dome and support are metal components. Therefore, the assembly of these elements is capable of withstanding the high temperatures and pressures used within the scope of the present invention.

[0025] In one example, the dome has an opening on the upper portion of the dome and a closing stopper intended to engage complementarily with the opening, the opening typically having dimensions between 1 and 5 cm to allow insertion of glass frit. The opening is fairly large to allow easy insertion of glass frit, but small enough to facilitate the attachment of the stopper or connector.

[0026] In one example, the reactor includes a clamping device comprising a support ring positioned on a first surface of the stack and a mechanical connector configured to connect and secure the support ring to a support plate. The clamping device thus allows the stack to be kept in contact with the cooling support plate, i.e., before the reactor is operated. However, mechanical maintenance does not allow for optimal maintenance, and additional maintenance, such as that described in the present invention by the hydrostatic effect, is required to maintain the stack in the state it was in when the reactor was operating.

[0027] In one example, the clamping device includes an insulating ring, which is positioned between a support ring and a first surface of the stack. Thus, the insulating ring avoids electrical connections between the top of the stack and the support plate, which is the manifold plate, via mechanical connections. This thus prevents reactor malfunction.

[0028] In one example, the dome includes a support flange configured to fix the dome to a support, and the reactor further includes an insulating spacer positioned between the support flange and the support plate of the support. If the immersion glass of the stack is not completely insulated, this spacer allows for limiting the leakage of parasitic currents caused by the polarization of the dome.

[0029] In one example, the dome, insulating spacer, and support plate are configured to be fastened together by contact with a mechanical device including at least one through-tightening screw. The mechanical device thus allows the dome to be flattened on the support to ensure compression of the seals positioned between each of the interfaces. The mechanical device thus allows for the sealing of the internal volume, including the liquid glass and stack, thereby ensuring the correct operation of the stack's compression during pressure increases.

[0030] For example, a mechanical device is provided with at least one insulating sleeve, the at least one insulating sleeve configured to insulate at least one through-tightening screw. In this way, the at least one insulating sleeve makes it possible to limit current loss.

[0031] For example, the operating temperature is higher than 650°C. The reactor elements can therefore withstand the operating temperature of the stack. In addition, this allows for ensuring that the glass bath is properly formed around the stack to ensure uniform pressure during reactor operation.

[0032] In one example, the reactor includes a heating block, which is positioned in contact with the outer surface of the dome. Thus, the heating block allows for the formation of a glass bath surrounding the stack as closely as possible, and in this case, the heating devices are also positioned very close to these outer walls. The glass bath is therefore formed quickly, ensuring a uniform bath that allows for the application of force through a uniform static pressure effect.

[0033] For example, the reactor has a stack, and the stack is, An upper plate having a first upper surface, wherein the first upper surface is configured to be the first surface of the stack, • Overlay of at least one electrochemical cell and at least one bipolar plate positioned along the stacking direction E, A lower plate having a second lower surface, wherein the second lower surface is configured to become the second surface of the stack, and It is equipped with.

[0034] For example, the support is made from the same material as the upper and lower plates. Producing these elements from the same single material in this way allows for limiting the thermomechanical stress caused by thermal expansion on the sealing fitted at the interface.

[0035] For example, the upper and lower plates can be made from different materials and have similar coefficients of thermal expansion. In this way, it is possible to limit the thermomechanical stress caused by thermal expansion on the sealing fitted at the interface.

[0036] Within the scope of the present invention, it is specified that “on top of,” “on top of,” “covering,” “below,” “opposite,” or equivalent phrases thereof do not necessarily mean “in contact.” Therefore, for example, the deposition, transfer, adhesion, assembly, or coating of a first element onto a second element does not necessarily mean that the two elements are in direct contact with each other, but rather that the first element covers the second element at least partially, either by being in direct contact with the second element or by being separated from the second element by at least one other element. These elements may, for example, be layers.

[0037] A layer may further consist of several sublayers of one identical material or different materials.

[0038] A preferably orthogonal system including axes X, Y, and Z is shown in Figures 1A to 6B.

[0039] The phrases "substantially," "approximately," and "about" mean "plus or minus 10%, preferably plus or minus 5%."

[0040] In the following detailed description, terms such as “horizontal,” “vertical,” “longitudinal,” “transverse,” “top,” “bottom,” “upper,” and “lower” may be used. These terms must be interpreted relative to the normal position of the electrochemical reactor assembly and the normal orientation of its position in the plane.

[0041] This invention relates to an electrochemical reactor 1. Next, the chemical reactor 1 will be described with reference to Figures 1A to 6B.

[0042] The electrochemical reactor 1 is configured to receive a stack 10. The stack 10 has a first surface 10a and a second surface 10b. The second surface 10b faces the first surface 10a. The first surface 10a and the second surface 10b may, advantageously, extend in a plane (XY). The stack 10 also has at least one outer wall. At least one outer wall of the stack 10 may, advantageously, connect the first surface 10a to the second surface 10b. The stack 10 operates at a temperature T op It is configured to operate at a temperature called . Therefore, stack 10 can be placed in a heating chamber or otherwise called an electrochemical reactor 1.

[0043] The electrochemical reactor 1 comprises a support 20. An example of the support 20 is illustrated in Figures 1A and 1B. The support 20 is configured to ensure the passage of the supply gas 21 into the stack 10. The passage of the supply gas 21 can be ensured by pipes. Advantageously, the support 20 may therefore have four pipes, two of which are configured to ensure the entry of the supply gas into the stack 10, and the remaining two pipes are configured to ensure the discharge of the supply gas from the stack 10.

[0044] The support 20 includes a support plate 22. Advantageously, the stack 10 is positioned such that its second face 10 is in contact with the support plate 22. The support 20, more specifically the support plate 22, can act as the base of the stack 10. The support plate 22 can also function as a manifold plate.

[0045] The electrochemical reactor 1 further comprises a closed dome 30. Next, the closed dome will be described with reference to FIGS. 2A and 2B.

[0046] The closed dome 30 has an internal volume V int The closed dome 30, and thus the internal volume V int is intended to receive the stack 10. The closed dome 30 is also intended to be hermetically fixed on the support 20. Preferably, at least one part of the closed dome 30 is positioned in contact with the support plate 22.

[0047] The electrochemical reactor 1 also includes a glass frit 40. The glass frit 40 has a volume V f The volume V of the glass frit 40 f is positioned within the internal volume V int of the closed dome 30. The glass frit 40 is configured to undergo a phase transition when the electrochemical reactor 1 reaches an operating temperature T op The phase transition enables the glass frit 40 to transition from a solid form (e.g., illustrated in FIG. 5B) to a liquid form (e.g., illustrated in FIG. 5D). Thus, the liquid glass frit 40 has a volume V l and the volume V of the liquid frit l is thus smaller than the internal volume V int of the closed dome 30. In addition, the liquid glass frit 40 covers the stack 10. The liquid glass frit 40 covers the stack 10 so as to cover the first face 10a of the stack 10. Preferably, the liquid glass frit 40 completely covers the stack 10. The liquid glass frit 40 also has an upper surface called the free surface 41.

[0048] Internal volume V of the closed dome 30 int This further includes a gas called cover gas 42. The cover gas 42 is positioned above the free surface 41. More specifically, the cover gas 42 contains liquid frit volume V l It is in contact with the free surface 41. Therefore, the cover gas 42 is configured to be pressurized. Pressurization can be performed by a pressurizing module. The pressurizing module may be, for example, an injection system connected to a compressor located outside the electrochemical reactor 1.

[0049] The cover gas 42 is tightened under pressure P s It is pressurized by the tightening pressure P. s The tightening pressure P s The stack 10 is configured to be kept in a compressed state on the support plate 22 under a mechanical force proportional to the load. In fact, pressurizing the cover gas 42 makes it possible to apply a compressive force transmitted by the liquid glass frit 40 without mounting any mechanical devices on the stack 10.

[0050] Excluding gravity, the balance of forces within the mechanical assembly is as follows: The force applied to the inside of stack 10 by the pressure of the supply gas 21 is equal to the product of the average pressure of the supply gas 21 and the inner surface of stack 10 to which it is applied, and the force applied to stack 10 by the cover gas 42 is equal to the pressure P of the cover gas 42 maintained within the closed dome 30. s This is equal to multiplying by the surface of the first face 10a of stack 10.

[0051] The clamping pressure P of the cover gas 42 is greater than the pressure of the supply gas 21 bonded to the surface of the first surface 10a of the stack 10. s If the force is greater than the inner surface of the stack 10, a compressive force is generated on the first surface 10 of the stack 10 and transmitted by the liquid glass frit 40.

[0052] The tightening pressure P applied sThis depends on the dimensions of the stack 10 and the pressure of the supply gas 21. For example, the tightening pressure P s The pressure ranges from 500 hPa (hectopascals) to 200 kPa (kilopascals). For example, on the first surface 10a of stack 10, which has a diameter of 112.5 mm, the pressure required to generate a compressive force is approximately 500 hPa. s These low pressure values ​​allow for the consideration of producing pressurized chambers that operate at high temperatures, accommodating both sealing interfaces and thermomechanical stresses. Thermomechanical stresses are limited with respect to high-temperature use.

[0053] The liquid glass frit 40 thus enables the uniform transmission of compressive forces in the assembly of the stack 10. Furthermore, the liquid glass frit 40 makes it possible to avoid gas leaks originating from the stack 10. In fact, according to one example, the volume V of the liquid glass frit 40 l The glass frit covers at least the first surface 10a and at least one outer wall of the stack 10 to generate counter-pressure. This thus ensures a second barrier and protects at least one outer wall of the stack 10 in the event of a localized hydrogen leak. The compression of the glass frit 40, in addition to that, ensures better sealing by generating counter-pressure that prevents runaway gases from bubbling in the glass substrate.

[0054] As described above, reactor 1 is configured to receive stack 10. Stack 10 is positioned on support plate 22 of support 20. Possible stacks 10 are shown in Figures 3A and 3B, which are described below.

[0055] In one example, the stack 10 includes an upper plate 11. The upper plate 11 may have a first surface 111. The first surface 111 of the upper plate 11 may be assimilated with the first surface 10a of the stack 10. The stack 10 may also include a lower plate 13. The lower plate 13 has a second surface 132. The second surface 132 may be assimilated with the second surface 10b of the stack 10. Between the upper plate 11 and the lower plate 13, the stack 10 may include a superposition 12 of at least one electrochemical cell and at least one bipolar plate. Advantageously, the lower plate 13, the superposition 12, and the upper plate 11 are superimposed on each other along the stacking direction E. In one example, the electrochemical reactor 1 includes a stack 10 as described above.

[0056] The upper plate 11 and the lower plate 13 can, advantageously, be made from a single, identical material. In addition, the support 20, and more specifically the support plate 22, can be made from the same material as the upper plate 11 and the lower plate 13. At least one portion of the support plate 22, the upper plate 11, and the lower plate 13 is exposed to high temperatures during the operation of the electrochemical reactor 1. Thus, producing these elements from the same single material makes it possible to limit the thermomechanical stress caused by thermal expansion on the sealing fitted at the interface.

[0057] The upper plate 11 and the lower plate 13 may, advantageously, be made from different materials having similar thermal expansion coefficients. Similar thermal expansion coefficients mean plus or minus 10. -6 ℃ -1 This means coefficients that have a difference from each other that does not exceed the difference between them. In this way, it is possible to limit the thermomechanical stress caused by thermal expansion on the sealing fitted at the interface.

[0058] For example, the electrochemical reactor 1 includes a clamping device 50. The clamping device 50 is configured to maintain compression of the low-temperature stack 10. Thus, the clamping device 50 can be positioned on the first surface 10a of the stack 10 to apply pressure in the direction of the support 20.

[0059] Therefore, the clamping device 50 may include a support ring 51. Thus, the support ring 51 is configured to be positioned on the first surface 10a of the stack 10. Similarly, the support ring 51 is positioned on the first upper surface 111 of the upper plate 11 of the stack 10. Advantageously, the support ring 51 does not completely cover the surface of the first surface 10a of the stack 10. Thus, the support ring 51 can be positioned around the periphery of the first surface 10a of the stack 10.

[0060] The clamping device 50 may also include a mechanical connector 52. The mechanical connector 52 is configured to connect the support ring 51 to the support plate 22. More specifically, the mechanical connector 52 is configured to fix the support ring 51 to the support plate 22. Thus, the mechanical connector 52 ensures contact between the second surface 10b of the stack 10 and the support plate 22 when the reactor 1 is cooling. The mechanical connector 52 may be, for example, a compression tie rod. The mechanical connector 52 is thereby positioned on the circumference of the stack 10. The clamping device 50 has at least two mechanical connectors 52. The at least two mechanical connectors 52 are positioned to have at least one symmetry on the stack axis E. Thus, the applied compressive force is uniform on the assembly of the stack 10.

[0061] Advantageously, the clamping device 50 also includes an insulating ring 53. Thus, the insulating ring 53 is positioned between the support ring 51 and the first surface 10a of the stack 10. Thus, the insulating ring 53 allows for avoidance of electrical connection between the top of the stack 10 and the support plate 22, which is the manifold plate, via a mechanical connection portion 52. Just like the support ring 51, the insulating ring 53 is positioned on the circumference of the first surface 10a of the stack 10. Preferably, the insulating ring 53 and the support ring 51 have the same dimensions.

[0062] The stack 10 can have a cylindrical or parallelepiped shape. Figures 3A to 5D show a cylindrical stack 10 in an unrestricted manner. Figures 6A and 6B show a parallelepiped stack 10 in an unrestricted manner. Therefore, in order to ensure correct operation, the enclosed dome 30 must be adapted to the shape of the stack 10. Accordingly, the enclosed dome 30 can have a structure configured to fit the architecture of the stack 10.

[0063] After the stack 10 is assembled and / or positioned on the support 20, the dome 30 may be mounted on top of the stack 10.

[0064] The dome 30 may, advantageously, include a support flange 31. The support flange 31 is configured to secure the dome 30 to the support 22. More specifically, the support flange 31 comprises a plurality of holes 35 (illustrated in Figure 2A). The holes 35 are therefore configured to align with openings 23 (illustrated in Figure 1A) present on the support plate 22 of the support 20. Thus, the support flange 31 is positioned facing the support plate 22.

[0065] The reactor 1 may further include an insulating spacer 33 positioned between the support flange 31 and the support plate 22 of the support 20. The insulating spacer 33 advantageously extends only between the support flange 31 and the support plate 22. If the immersed glass of the stack 10 is not completely insulated, this spacer 33 allows for limiting parasitic current losses caused by the polarization of the dome 30.

[0066] Therefore, the dome 30, insulating spacer 33, and support plate 22 may be configured to be in contact and fixed together by a mechanical device 34. The mechanical device 34 thus allows the dome 30 to be flattened on the support 20 to ensure compression of the seal 343 positioned between each of the interfaces. Therefore, the mechanical device 34 may comprise at least one through-tightening screw 341. At least one through-tightening screw 341 is configured to pass through at least one hole 35 and be inserted into an opening 23 in the support 20. Therefore, at least one opening 23 may have threads to allow the through-tightening screw 341 to be threaded. The mechanical device 34 includes the same number of through-tightening screws 341 as there are holes 35 in the support flange 31.

[0067] Preferably, the mechanical device 34 also includes at least one insulating sleeve 342. Thus, at least one insulating sleeve 342 is configured to insulate at least one through-tightening screw 341. In this way, at least one insulating sleeve 342 makes it possible to limit current loss. Therefore, the mechanical device 34 includes the same number of insulating sleeves 342 as the number of through-tightening screws 341 it has.

[0068] In addition, the closed dome 30 may have at least one curved inner surface in its upper portion. This curved inner surface allows resistance to the internal pressure when the cover gas 42 is pressurized. The curved inner surface means a convex inner surface.

[0069] Similarly, the dome 30 may have an opening 32 on its upper portion. The opening 32 is configured to allow the glass frit 40 to be inserted into the reactor 1 after the dome 30 has been fixed onto the support 20. To do this, the opening 32 typically has dimensions between 1 and 5 cm. The opening 32 is therefore fairly large to allow for easy insertion of the glass frit 40, but small enough to facilitate the attachment of a stopper or connector.

[0070] For example, the dome 30 may have a closing stopper 43. The stopper 43 is shown, for example, in Figures 5C and 5D. The stopper 43 is intended to engage complementaryly with the opening 32. The stopper 43 thus allows the dome 30 to be closed, and therefore the internal volume V int The opening is sealed. Therefore, the stopper 43 is configured to ensure a seal against pressurized gas. The stopper 43 is advantageously fixed to the opening 32 by welding or by a seal, such as a metal seal. Thus, the stopper 43 is sealed and fixed to the dome 30. The closing stopper 43 may advantageously have a pipe. Therefore, the pipe may be configured to produce a tap into which cover gas 42 is inserted. Thus, the pipe may be provided within the pressurized module. Thus, the cover gas 42 inserted by the pipe can be pressurized.

[0071] For example, the assembly of elements is configured to withstand the high temperatures and pressures described above. Therefore, advantageously, the dome 30 is a metal component. More specifically, the dome 30 is made of an alloy suitable for high-temperature use. Similarly, the support 20 is also a metal component. The support 20 is also made of an alloy suitable for high-temperature use. High temperature means, for example, temperatures between 600°C and 900°C.

[0072] According to one example, the operating temperature T op The temperature is higher than 650℃. Preferably, the operating temperature is T opThe temperature is less than 900°C. The elements of reactor 1 can therefore withstand the operating temperature of stack 10. In addition, the composition of glass frit 40 ensures that the melting point temperature of the glass is within the operating temperature of stack 10 T op The volume is selected to be less than the minimum. The formation of glass 40 also ensures a lightly crystallized or amorphous glassy sticky glass bath. During the initial melting of frit 40, the volume of glass V l The volume decreases (between 30 and 50%). After melting, the volume of the dome V is used to ensure that the glass substrate completely covers the stack. int is a sufficient volume V f It must be sized to allow for the filling of glass frit 40.

[0073] Therefore, during the operation of reactor 1, it is ensured that the glass 40 is in liquid form, thus ensuring a force to compress the stack 10 with the pressurized cover gas. After the stack 10 is completely immersed in the liquid glass, the pressurization of the cover gas 42 is thereby applied to the tightening pressure P. s This allows for compression under a mechanical force proportional to the pressure P applied to the free surface 41 of the liquid glass due to the static pressure effect. s The force is transmitted completely and uniformly onto the upper plate 11 of the stack 10, without the need for any mechanical components such as force distributors or support rods / plates. The compressive force transmitted to the stack 10 is the clamping pressure P s It is very easily adjustable by changing [the value]. The proposed device thus constitutes an active system that allows for continuous adjustment of the compressive force according to the internal pressure of the stack 10.

[0074] According to one example illustrated in Figures 6A and 6B, the reactor 1 includes a heating block 60. The heating block 60 can therefore be positioned in contact with the outer surface of the dome 30. Thus, the heating block 60 allows for the formation of a glass bath that surrounds the stack 10 as closely as possible, in which case the heating devices are also positioned very close to these outer walls.

[0075] Thus, the method for pressurizing electrochemical reactor 1 may include the following steps.

[0076] This method may include the step of positioning the stack 10 on the support 20.

[0077] This method may then include the step of positioning the dome 30 on the support 20. Thus, the dome 30 is positioned to surround the stack 10. The dome 30 is then secured to the support 20, which may be secured via the positioning of a mechanical clamping device 34.

[0078] This method then involves the volume V of glass frit 40. f The procedure includes filling the dome 30 with glass frit 40. This filling is therefore performed by inserting the glass frit 40 through an opening 32 located in the upper part of the dome.

[0079] This method then includes the step of fixing the stopper 43 within the opening 32. This fixing can be done by welding or via a seal. This fixing is within the internal volume V of the dome 30. int It is configured to be in an airtight state.

[0080] This method then involves the operating temperature T op This step includes raising the temperature inside reactor 1 so that it reaches a certain volume V. This step then causes the frit 40 to melt, which at the operating temperature reaches a certain volume V. l This results in a liquid glass bath containing glassy properties.

[0081] Finally, this method involves tightening pressure P s The process includes the step of pressurizing reactor 1 to a certain point. This pressurization is carried out by a pressurizing module. This module may include a compressor connected to a pipe located within the stopper 43. The pressurizing module can therefore directly inject the cover gas 42 into the internal volume of the pressurizing dome 30.

[0082] The present invention is not limited to the embodiments described above, but extends to all embodiments that fall within the scope of the present invention. [Explanation of symbols]

[0083] 1. Electrochemical reactor 10 stacks 10a First face 10b Second face 11 Upper plate 111 First upper surface 112 Second upper surface 12. Alternating arrangement of electrochemical cells and bipolar plates 13 Lower plate 131 First lower surface 132 Second lower surface 20 Support 21. Supply gas 22 Support plate 23 Opening 30 Enclosed domes 31 Support flange 32 openings 33 Insulating Spacer 34 Mechanical fastening devices 341 Tightening screw 342 Insulating Sleeve 343 Seals 35 holes 40 Glass Fritters 41 Free surface of liquid glass frit volume 42 Cover gas 43 Closure stopper 50 fastening devices 51 Support ring 52 Mechanical connection part (compression tie rod) 53 Insulating ring 60 heating blocks T op Stack operating temperature E Stacking direction V int Dome interior volume V fglass frit volume V l liquid glass frit volume P s tightening pressure

Claims

1. A stack (10) having a first surface (10a), a second surface (10b) facing the first surface (10a), and at least one outer wall connecting the first surface (10a) to the second surface (10b) is configured to receive a stack (10), and the operating temperature (T ｏｐ An electrochemical reactor (1) configured to operate in the following way: - A support (20) configured to ensure the passage of the supply gas (21) through the stack (10), wherein the support (20) includes a support plate (22), and the stack (10) is positioned such that the second surface (10b) is in contact with the support plate (22). Equipped with, • Internal volume (V) ｉｎｔ A closed dome (30) having ) and intended to receive the stack (10) and be sealed and fixed on the support, - Glass frit (40), with glass frit volume (V ｆ ) has the internal volume (V ｉｎｔ Positioned within the stack (10), the operating temperature (T ｏｐ A phase transition occurs in ) and thereafter the liquid glass frit volume (V Ｉ It is configured to form a liquid glass frit (40) having ), and is further configured to cover the stack (10), and the liquid glass frit volume (V Ｉ ) is the internal volume (V ｉｎｔ A glass frit (40) that is smaller than ) and has an upper surface called the free surface (41) It also has the following features: The internal volume (V ｉｎｔ ) further contains a gas called cover gas (42), and the cover gas (42) is positioned above the free surface (41) of the liquid glass frit volume (V Ｉ ), contacts the free surface (41) of the liquid glass frit volume (V Ｉ ), and the cover gas (42) is configured to be pressurized with a clamping pressure (P ｓ ) by a pressurization module, and the clamping pressure (P ｓ ) is configured to maintain the stack (10) in a compressed state on the support plate (22) under a mechanical force proportional to the clamping pressure (P ｓ ). An electrochemical reactor (1) characterized by this.

2. The aforementioned tightening pressure (P ｓ The electrochemical reactor (1) according to claim 1, wherein the pressure is between 500 hPa and 200 kPa.

3. The volume of the liquid glass frit (V ｌ The electrochemical reactor (1) according to claim 1, wherein the stack (10) covers at least the first surface (10a) and the at least one outer wall to generate counter-pressure.

4. The electrochemical reactor (1) according to claim 1, wherein the dome (30) has a structure configured to conform to the structure of the stack (10).

5. The electrochemical reactor (1) according to claim 1, wherein the dome (30) has a curved inner surface in at least a portion of it.

6. The electrochemical reactor (1) according to claim 1, wherein the dome (30) and the support (20) are metal parts.

7. The electrochemical reactor (1) according to claim 1, wherein the dome (30) has an opening (32) in the upper portion of the dome (30) and a closing stopper (43) intended to engage complementarily with the opening (32), and the opening (32) is typically 1 to 5 cm in size to allow insertion of the glass frit (40).

8. The electrochemical reactor (1) according to claim 1, comprising a clamping device (50), the clamping device (50) comprising a support ring (51) positioned on the first surface (10a) of the stack (10) and a mechanical connector (52), wherein the mechanical connector (52) is configured to connect and fix the support ring (51) to the support plate (22).

9. The electrochemical reactor (1) according to claim 8, wherein the clamping device (50) comprises an insulating ring (53), the insulating ring (53) being positioned between the support ring (51) and the first surface (10a) of the stack (10).

10. The electrochemical reactor (1) according to claim 1, wherein the dome (30) comprises a support flange (31) configured to fix the dome (30) to the support plate (22), and the electrochemical reactor further comprises an insulating spacer (33) positioned between the support flange (31) and the support plate (22) of the support body (20).

11. The electrochemical reactor (1) according to claim 10, wherein the dome (30), the insulating spacer (33), and the support plate (22) are configured to be in contact and fixed together by a mechanical device (34) including at least one through-tightening screw (341).

12. The electrochemical reactor (1) according to claim 11, wherein the mechanical device (34) includes at least one insulating sleeve (342), the at least one insulating sleeve (342) is configured to insulate the at least one through-tightening screw (341).

13. The operating temperature (T ｏｐ The electrochemical reactor (1) according to claim 1, wherein the temperature is higher than 650°C.

14. The electrochemical reactor (1) according to claim 1, comprising a heating block (60), wherein the heating block (60) is positioned in contact with the outer surface of the dome (30).

15. The system comprises a stack (10), and the stack (10) is - An upper plate (11) having a first upper surface (111), wherein the first upper surface (111) is configured to be the first surface (10a) of the stack (10), - A superposition (12) of at least one electrochemical cell and at least one bipolar plate positioned along the stacking direction E, - A lower plate (13) having a second lower surface, wherein the second lower surface (132) is configured to become the second surface (10b) of the stack (10), and An electrochemical reactor (1) according to any one of claims 1 to 14, comprising:

16. The electrochemical reactor (1) according to claim 15, wherein the support (20) is made from the same material as the upper plate (11) and the lower plate (13).

17. A method for pressurizing the electrochemical reactor (1) described in claim 7, - The step of positioning the stack (10) on the support (20), - The steps of positioning and fixing the dome (30) on the support (20) so as to surround the stack (10), - A step of filling the dome (30) with the glass frit (40) through the opening (32), - The internal volume (V) of the dome (30) ｉｎｔ The steps include fixing a stopper (43) to the opening (32) so that it is sealed, ・The operating temperature (T ｏｐ The steps include raising the temperature inside the electrochemical reactor so that it reaches ) - The reactor (1) is tightened by the pressurizing module and pressure (P ｓ The step of pressurizing up to ) Methods that include...

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