Display substrate and its manufacturing method, display device

Abstract

To provide a display substrate, a method for manufacturing the display substrate, and a display device.SOLUTION: A display substrate (200 / 300 / 400) includes an opening region (2011 / 3011 / 4011), a display region (201 / 301 / 401) surrounding the opening region (2011 / 3011 / 4011), and a first barrier wall (2012 / 3012 / 4012) surrounding the opening region (2011 / 3011 / 4011) between the display region (201 / 301 / 401) and the opening region (2011 / 3011 / 4011). A first barrier wall (2012 / 3012 / 4012) includes a first metal layer structure having a recessed part (2012A / 3012A / 4012A) in at least one side surface surrounding the opening region (2011 / 3011 / 4011). The display substrate has an imaging device integrated in the display region of the display substrate and exhibits a more desirable sealing effect.SELECTED DRAWING: Figure 2B

Description

[Technical field]

[0001] The embodiments of the present disclosure relate to a display substrate, a manufacturing method thereof, and a display device. [Background technology]

[0002] Currently, the displays of display devices are moving toward larger screens and full screens. In general, display devices (e.g., mobile phones, tablet computers, etc.) have an image pickup device (or imaging device), which is generally installed outside the display area. However, since a certain position is required for mounting the image pickup device, this is disadvantageous for full-screen or narrow-frame display designs. For example, the image pickup device is combined with the display area of ​​the display, and a spare position for the image pickup device is left in the display area, thereby maximizing the display area of ​​the display. Summary of the Invention [Means for solving the problem]

[0003] At least one embodiment of the present disclosure provides a display substrate having an aperture region and a display region surrounding the aperture region, the display region including a first barrier wall between the display region and the aperture region, the first barrier wall including a first metal layer structure having a recess on at least one side surrounding the aperture region.

[0004] For example, in a display substrate according to at least one embodiment of the present disclosure, the display area includes an electrode pattern including a second metal layer structure, and the first metal layer structure and the second metal layer structure have the same structure and include the same material.

[0005] For example, a display substrate according to at least one embodiment of the present disclosure further includes a base substrate, the first metal layer structure including a first metal sublayer on a first side of the base substrate and a second metal sublayer on a side of the first metal sublayer away from the base substrate, and an orthogonal projection of the first metal sublayer onto the base substrate is located within an orthogonal projection of the second metal sublayer onto the substrate, thereby forming the recess.

[0006] For example, in a display substrate according to at least one embodiment of the present disclosure, the first metal layer structure further includes a third metal sublayer located on the first side of the base substrate, the first metal sublayer being on a side of the third metal sublayer away from the base substrate, and an orthogonal projection of the first metal sublayer onto the base substrate being located within an orthogonal projection of the third metal sublayer onto the substrate.

[0007] For example, in a display substrate according to at least one embodiment of the present disclosure, an orthogonal projection of the second metal sub-layer onto the base substrate lies within an orthogonal projection of the third metal sub-layer onto the base substrate.

[0008] For example, in a display substrate according to at least one embodiment of the present disclosure, the thickness of the first metal sub-layer is greater than the thickness of the second metal sub-layer and the thickness of the third metal sub-layer.

[0009] For example, in a display substrate according to at least one embodiment of the present disclosure, the first metal sub-layer has a thickness of 150 nm-900 nm, the second metal sub-layer has a thickness of 30 nm-300 nm, and the third metal sub-layer has a thickness of 30 nm-300 nm.

[0010] For example, in the display substrate according to at least one embodiment of the present disclosure, the opening direction of the recess is parallel to the base substrate.

[0011] For example, in the display substrate according to at least one embodiment of the present disclosure, a second barrier wall is further included between the display area and the aperture area; The second barrier wall surrounds the opening region, has the same structure as the first barrier wall, and is provided on the side of the first barrier wall away from the opening region.

[0012] For example, in a display substrate according to at least one embodiment of the present disclosure, the display region further includes a first electrode layer used to form a light-emitting element, a second electrode layer, and an organic functional layer between the first electrode layer and the second electrode layer, and the organic functional layer is divided by a side of the first barrier wall having the recess.

[0013] For example, in a display substrate according to at least one embodiment of the present disclosure, the second electrode layer is a cathode layer, and the cathode layer is divided by a side surface of the first barrier wall having the recess.

[0014] For example, a display substrate according to at least one embodiment of the present disclosure further includes an image sensor and / or an infrared sensor, the image sensor and / or the infrared sensor being bonded to the base substrate and whose orthogonal projection onto the base substrate at least partially overlaps with the aperture area.

[0015] For example, in a display substrate according to at least one embodiment of the present disclosure, the rate at which the material of the first metal sublayer is etched by the action of an etching solution for etching and forming the first metal layer structure is greater than the rate at which the material of the second metal sublayer is etched.

[0016] For example, in a display substrate according to at least one embodiment of the present disclosure, the material of the first metal sub-layer includes aluminum or copper, and the material of the second metal sub-layer includes titanium or molybdenum.

[0017] For example, in a display substrate according to at least one embodiment of the present disclosure, the first barrier wall further includes an insulating layer structure located on the first side of the base substrate, and the first metal layer structure is on the side of the insulating layer structure away from the base substrate.

[0018] For example, in a display substrate according to at least one embodiment of the present disclosure, the insulating layer structure includes a plurality of sub-insulating layers.

[0019] A manufacturing method for a display substrate according to at least one embodiment of the present disclosure includes the steps of forming an aperture region and a display region surrounding the aperture region, and forming a first barrier wall between the display region and the aperture region, the first barrier wall including a first metal layer structure surrounding the aperture region and having a recess on at least one side surrounding the aperture region.

[0020] For example, in a manufacturing method according to at least one embodiment of the present disclosure, the aperture area is formed by laser cutting or mechanical punching.

[0021] For example, in a manufacturing method according to at least one embodiment of the present disclosure, the step of forming the display area includes a step of forming an electrode pattern simultaneously with forming a first metal layer structure, the electrode pattern including a second metal layer structure formed from the same film layer as the first metal layer structure.

[0022] For example, in a manufacturing method according to at least one embodiment of the present disclosure, the step of forming the first barrier wall includes the steps of forming a first metallic material layer on a first side of a base substrate and forming a second metallic material layer on a side of the first metallic material layer away from the base substrate, performing a first etching on the first metallic material layer and the second metallic material layer to form the electrode pattern and an initial barrier wall, and performing a second etching on the initial barrier wall to form the first barrier wall, wherein the second etching is wet etching and the etching rate of the first metallic material layer is made higher than the etching rate of the second metallic material layer by an etching solution used, thereby forming the recess.

[0023] For example, in a manufacturing method according to at least one embodiment of the present disclosure, the step of forming the first barrier wall includes the steps of sequentially forming a third metal material layer, a first metal material layer and a second metal material layer on a first side of a base substrate, performing a first etching on the third metal material layer, the first metal material layer and the second metal material layer to form the electrode pattern and an initial barrier wall, and performing a second etching on the initial barrier wall to form the first barrier wall, wherein the second etching is wet etching, and the recess is formed by using an etching solution that etches the first metal material layer at a rate faster than the second metal material layer and the third metal material layer.

[0024] For example, in the manufacturing method according to at least one embodiment of the present disclosure, the first etching is a dry etching.

[0025] For example, in a manufacturing method according to at least one embodiment of the present disclosure, the step of forming the display area further includes a step of forming a first electrode layer used in a light-emitting element, a second electrode layer, and an organic functional layer between the first electrode layer and the second electrode layer, wherein an etching solution used in the second etching is the same as an etching solution used to etch and form the first electrode layer, and the organic functional layer is divided by a side of the first barrier wall having the recess.

[0026] For example, in a manufacturing method according to at least one embodiment of the present disclosure, the step of forming the first barrier wall includes the steps of forming a first metallic material layer on a first side of a base substrate, forming a second metallic material layer on a side of the first metallic material layer away from the base substrate, and performing wet etching once on the first metallic material layer and the second metallic material layer, wherein the rate at which the first metallic material layer is etched by an etching solution used in the wet etching is greater than the rate at which the second metallic material layer is etched.

[0027] For example, in a manufacturing method according to at least one embodiment of the present disclosure, the method further includes a step of forming a second barrier wall between the display area and the aperture area, the second barrier wall surrounding the aperture area and formed on the side of the first barrier wall away from the aperture area, and formed from the same film layer as the first barrier wall.

[0028] At least one embodiment of the present disclosure provides a display device including any one of the display substrates described above. [Brief description of the drawings]

[0029] In order to more clearly explain the technical solutions of the embodiments of the present invention, the drawings of the embodiments are briefly described below. It is apparent that the drawings in the following description are only related to some embodiments of the present invention, and do not limit the present disclosure.

[0030] [Figure 1A] FIG. 1A is a schematic plan view of a display substrate. [Figure 1B] FIG. 1B is a schematic cross-sectional view of the display substrate taken along line A-A in FIG. 1A. [Figure 2A] FIG. 2A is a schematic plan view of a display substrate according to some embodiments of the present disclosure. [Figure 2B] FIG. 2B is a schematic cross-sectional view of the display substrate taken along line B-B in FIG. 2A. [Figure 2C]FIG. 2C is another schematic cross-sectional view taken along line B-B of the display substrate in FIG. 2A. [Diagram 3] FIG. 3 is a cross-sectional schematic diagram of a barrier wall in a display substrate according to some embodiments of the present disclosure. [Figure 4] FIG. 4 is a cross-sectional schematic diagram of a barrier wall in a display substrate according to some embodiments of the present disclosure. [Figure 5A] FIG. 5A is a schematic plan view of another display substrate according to some embodiments of the present disclosure. [Figure 5B] FIG. 5B is a schematic cross-sectional view taken along line CC of the display substrate in FIG. 2A. [Figure 5C] FIG. 5C is another schematic cross-sectional view taken along line CC of the display substrate in FIG. 2A. [Figure 6] FIG. 6 is a cross-sectional schematic diagram of a barrier wall in another display substrate according to some embodiments of the present disclosure. [Figure 7] FIG. 7 is a schematic cross-sectional view of a barrier wall in another display substrate according to some embodiments of the present disclosure. [Figure 8A] FIG. 8A is a schematic plan view of yet another display substrate according to some embodiments of the present disclosure. [Figure 8B] FIG. 8B is a schematic cross-sectional view taken along line D-D of the display substrate in FIG. 8A. [Figure 9] FIG. 9 is a schematic cross-sectional view of a barrier wall in yet another display substrate according to some embodiments of the present disclosure. [Figure 10] FIG. 10 is a schematic cross-sectional view of a barrier wall in yet another display substrate according to some embodiments of the present disclosure. [Figure 11] FIG. 11 is a schematic cross-sectional view of a barrier wall in yet another display substrate according to some embodiments of the present disclosure. [Figure 12A] FIG. 12A is a schematic plan view of a manufacturing process of a display substrate according to some embodiments of the present disclosure. [Figure 12B] FIG. 12B is a schematic plan view of a manufacturing process of a display substrate according to some embodiments of the present disclosure. [Figure 13A]FIG. 13A is a schematic cross-sectional view of a display substrate in a manufacturing process according to some embodiments of the present disclosure. [Figure 13B] FIG. 13B is a schematic cross-sectional view of a display substrate in a manufacturing process according to some embodiments of the present disclosure. [Figure 13C] FIG. 13C is a schematic cross-sectional view of a display substrate in a manufacturing process according to some embodiments of the present disclosure. [Figure 14] FIG. 14 is a schematic diagram of a display device according to some embodiments of the present disclosure. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0031] In order to make the objectives, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention are described below clearly and completely with reference to the drawings of the embodiments of the present invention. It is clear that the described embodiments are only some embodiments of the present disclosure, and are not all embodiments. Based on the described embodiments of the present disclosure, all other embodiments that a person skilled in the art can obtain without requiring creative efforts are all within the scope of the present disclosure.

[0032] Unless otherwise defined, technical or scientific terms used in this disclosure should have the common meaning understood by those skilled in the art. The terms "first", "second" and similar terms used in this disclosure do not imply order, number or importance, but are merely used to distinguish different components. Similar terms such as "include" or "comprise" mean that the element or item preceding the term includes the elements or items listed after the term and their equivalents, without excluding other elements or items. Similar terms such as "connected" or "coupled" are not limited to physical or mechanical connections, but can include either direct or indirect electrical connections. "Top", "bottom", "left", "right" and the like only indicate relative positional relationships, and the relative positional relationships change when the absolute position of the object being described is changed.

[0033] In order to maximize the display area of ​​the display device, an imaging device provided with the display device may be integrated into the display area and the imaging device may be disposed within the display area.

[0034] For example, Fig. 1A shows a schematic plan view of a display substrate used in a display device, and Fig. 1B is a schematic cross-sectional view of the display substrate taken along line AA in Fig. 1A. As shown in Fig. 1A, a display substrate 100 includes a display region 101, which includes a pixel array and has an aperture 1011 in the pixel array, which serves as a reserve position for an imaging device (not shown), which is provided on the back side of the display substrate 100, which is opposite to the display side, and which captures an image through the aperture 1011. In this way, the imaging device is incorporated into the display region 101 of the display substrate 100.

[0035] The display area 101 has light-emitting elements for display, which are, for example, organic light-emitting diodes. The organic functional layer 103 and the electrode layer 104 of the multiple light-emitting elements in all or part of the display area 101 are usually formed over the entire surface of the display area 101. Therefore, when sealing is performed using the sealing layer 105, it is often difficult to seal the area located near the opening 1011, or even if the area is sealed, it is often difficult to ensure the sealing effect of this area. At this time, as shown in FIG. 1B, impurities such as water, oxygen, etc. may enter the inside of the display area 101 from the opening 1011 along the organic functional layer 103 and the electrode layer 104 formed over the entire surface, contaminating the functional materials of the display area 101, thereby deteriorating the performance of these functional materials and ultimately impairing the display effect of the display area 101.

[0036] At least one embodiment of the present disclosure provides a display substrate having an aperture region and a display region surrounding the aperture region, the display substrate including a first barrier wall between the display region and the aperture region surrounding the aperture region, the first barrier wall including a first metal layer structure having a recess on at least one side surrounding the aperture region.

[0037] At least one embodiment of the present disclosure provides a method for manufacturing a display substrate, the method including the steps of forming a display region and an aperture region, and forming a first barrier wall between the display region and the aperture region, wherein the display region surrounds the aperture region, the first barrier wall surrounds the aperture region and includes a first metal layer structure, and a recess is formed on at least one side of the first metal layer structure surrounding the aperture region.

[0038] At least one embodiment of the present disclosure provides a display device including the display substrate described above.

[0039] Hereinafter, a display substrate, a manufacturing method thereof, and a display device according to some embodiments of the present disclosure will be described with reference to some specific examples.

[0040] At least one embodiment of the present disclosure provides a display substrate, in which FIG. 2A shows a schematic plan view of the display substrate, and FIG. 2B is a schematic cross-sectional view of the display substrate taken along line B-B in FIG. 2A.

[0041] 2A and 2B, the display substrate 200 includes an aperture region 2011 and a display region 201 surrounding the aperture region 2011, and includes a first barrier wall 2012 between the display region 201 and the aperture region 2011 surrounding the aperture region 2011, and the first barrier wall 2012 includes a first metal layer structure having a recess 2012A on at least one side surrounding the aperture region 2011. The aperture region 2011 allows light from the display side of the display substrate (the upper side in FIG. 2B) to be transmitted through the display substrate and reach the back side of the display substrate (the lower side in FIG. 2B).

[0042] For example, the first metal layer structure shown in FIG. 2B has recesses 2012A on both the side of the first metal layer structure facing the opening region 2011 and the side opposite the opening region 2011, but in other examples of this embodiment, the first metal layer structure may have recesses 2012A on one side.

[0043] For example, in this embodiment, the display area 201 includes a pixel array for performing display operations, the pixel array is formed by arranging a plurality of pixel units in an array, the pixel unit includes a driving circuit, a light emitting circuit, etc., and therefore the display area 201 further includes an electrode pattern, and the electrode pattern includes a second metal layer structure having the same structure and material as the first metal layer structure. For example, the first metal layer structure and the second metal layer structure can be formed in the same layer in the manufacturing process and have the same multi-layer structure, and furthermore, since the materials of the corresponding layers in the first metal layer structure and the second metal layer structure are both the same, they can be formed in the same film layer.

[0044] For example, as shown in Fig. 2B, the display area 201 includes a pixel array, and a plurality of pixel units in the pixel array include a plurality of display light-emitting elements and a drive circuit for driving the light-emitting elements. For example, the light-emitting elements include components such as an electrode layer and an organic functional layer, and the drive circuit includes components such as a thin film transistor and a capacitor.

[0045] As shown in FIG. 2B, the light-emitting element includes a first electrode layer 218, a second electrode layer 204, and an organic functional layer between the first electrode layer 218 and the second electrode layer 204. The organic functional layer includes, for example, an organic light-emitting material layer 220 and an auxiliary light-emitting layer 203. The auxiliary light-emitting layer 203 is, for example, an electron transport layer or an electron injection layer. At least a part of the organic functional layer used in the light-emitting element in the plurality of pixel units, for example, the auxiliary light-emitting layer 203 and the second electrode layer 204, is usually formed over the entire surface in the display region 201. At this time, the organic functional layer is divided by a side having a recess 2012A of the first barrier wall 2012. For example, the first electrode layer 218 is an anode layer (or is also called a pixel electrode layer), and the second electrode layer 204 is a cathode layer. The cathode layer is also divided by a side having a recess 1012A of the first barrier wall 2012. As a result, even if the organic functional layer and second electrode layer 204 located closer to the opening region 2011 are contaminated with impurities such as water and oxygen, the organic functional layer and second electrode layer 204 are blocked by the first barrier wall 2012, and these contaminating impurities do not spread to the portions of the organic functional layer and second electrode layer 204 used for light emission of the light-emitting element. For example, a part of the organic functional layer and a part of the second electrode layer 204 are formed on the top of the first barrier wall 2012, but these parts are separated from the other parts.

[0046] For example, the thin film transistor includes a gate electrode 211 and a source drain electrode 212, and the capacitor includes a first electrode 213, a second electrode 214, and a first insulating layer 215 between the first electrode 213 and the second electrode 214. For example, the gate electrode 211 or the source drain electrode 212 can be realized as an electrode pattern having a second metal layer structure. For example, FIG. 2B shows the source drain electrode 212 including a second metal layer structure. At this time, the first metal layer structure of the first barrier wall 2012 is the same as the second metal layer structure of the source drain electrode 212 and includes the same material. For example, the first metal layer structure of the first barrier wall 2012 and the second metal layer structure of the source drain electrode 212 are formed in the same layer and have the same multilayer structure, so that the first metal layer structure of the first barrier wall 2012 and the second metal layer structure of the source drain electrode 212 can be formed using the same film layer in the manufacturing process of the display substrate 200. For example, in some instances, both the first metal layer structure and the second metal layer structure have a multi-layer structure, such as a two-layer structure or a three-layer structure.

[0047] For example, as shown in Fig. 2B, the display substrate 200 further includes a base substrate 202, the display region 201 is in the base substrate 202, and the base substrate 202 has an aperture 2021 located in an aperture region 2011. For example, the opening direction of the recess in the first metal layer structure of the first barrier wall 2012 is parallel to the base substrate 202. For example, in the embodiment of Fig. 2B, the base substrate 202 is arranged horizontally, and the opening direction of the recess is horizontal.

[0048] 3, the first metal layer structure of the first barrier wall 2012 includes a two-layer metal layer structure of a first metal sublayer 20121 and a second metal sublayer 20122. The first metal sublayer 20121 is on a first side (the side where the light-emitting element is formed, the upper side in the figure) of the base substrate 202, and the second metal sublayer 20122 is on a side of the first metal sublayer 20121 away from the base substrate 202 (the upper side in the figure), and the orthogonal projection of the first metal sublayer 20121 onto the base substrate 202 is located within the orthogonal projection of the second metal sublayer 20122 onto the base substrate 202, thereby forming a recess 2012A on the side of such a two-layer stack. In this case, when forming an organic functional layer and a second electrode layer 204 on the base substrate 202 on which the first barrier wall 2012 is formed, the organic functional layer and the second electrode layer 204 can be separated by the first barrier wall 2012, thereby blocking the path through which impurities such as water and oxygen enter the interior of the display area 201.

[0049] For example, in one example, as shown in FIG. 4, the first metal layer structure of the first barrier wall 2012 includes a three-layer metal layer structure of a first metal sublayer 20121, a second metal sublayer 20122, and a third metal sublayer 20123, the third metal sublayer 20123 being on a first side (top side in the figure) of the base substrate 202, the first metal sublayer 20121 being on a side of the third metal sublayer 20123 facing away from the base substrate 202 (top side in the figure), and the second metal sublayer 20122 being on a side of the third metal sublayer 20123 facing away from the base substrate 202 (top side in the figure). , the first metal sub-layer 20121 is on the side away from the base substrate 202 (upper side in the figure), the orthogonal projection of the first metal sub-layer 20121 onto the base substrate 202 is located within the orthogonal projection of the second metal sub-layer 20122 onto the base substrate 202, and the orthogonal projection of the first metal sub-layer 20121 onto the base substrate 202 is also located within the orthogonal projection of the third metal sub-layer 20123 onto the base substrate 202, thereby forming a recess 2012A on the side of the stack of such three layers. At this time, when the organic functional layer and the second electrode layer 204 are formed on the base substrate 202 on which the first barrier wall 2012 is formed, the organic functional layer and the second electrode layer 204 can be separated by the first barrier wall 2012, so that the path through which impurities such as water and oxygen enter the inside of the display region 201 is blocked.

[0050] For example, in some instances, the orthogonal projection of the second metal sub-layer 20122 onto the base substrate 202 is located within the orthogonal projection of the third metal sub-layer 20123 onto the base substrate 202. At this time, the orthogonal projection of the third metal sub-layer 20123 onto the base substrate 202 is maximized, which increases the bonding strength between the first metal layer structure of the first barrier wall 2012 and the display substrate, improves the stability of the first metal layer structure, and helps the first barrier wall 2012 separate the organic functional layer and the second electrode layer 204.

[0051] For example, FIG. 2B shows an example having such a three-layer metal layer structure, in which the second metal layer structure of the source / drain electrode 212 includes a metal sublayer 2123 in the same layer as the third metal sublayer 20123, a metal sublayer 2121 in the same layer as the first metal sublayer 20121, and a metal sublayer 2122 in the same layer as the second metal sublayer 20122.

[0052] 2B, the second metal layer structure of the source / drain electrodes 212 in the thin film transistor is formed of the same layer as the first metal layer structure and has the same multi-layer structure, i.e., a three-layer metal layer structure. This allows the first metal layer structure of the first barrier wall 2112 and the second metal layer structure of the source / drain electrodes 212 to be formed in the same manufacturing process using the same film layer in the manufacturing process of the display substrate 200, thereby simplifying the process.

[0053] For example, in the first metal layer structure of the first barrier wall 2012, the thickness of the first metal sublayer 20121 is greater than the thicknesses of the second metal sublayer 20122 and the third metal sublayer 20123, making it easier to form a recess and to separate the organic material layer 203 and the second electrode layer 204 by the first barrier wall 2012, thereby further improving the barrier effect of the first barrier wall 2012. For example, the thickness of the first metal sub-layer 20121 is 150nm-900nm, for example, 200nm, 400nm, 600nm or 800nm, the thickness of the second metal sub-layer 20122 is 30nm-300nm, for example, 100nm, 150nm or 200nm, and the thickness of the second metal sub-layer 20123 is 30nm-300nm, for example, 100nm, 150nm or 200nm, etc. For example, in one example, the thickness of the first metal sub-layer 20121 is 600nm, the thickness of the second metal sub-layer 20122 is 200nm, and the thickness of the third metal sub-layer 20123 is 200nm, in this case, the first barrier wall 2012 can fully exert the barrier effect.

[0054] For example, in some embodiments of the present disclosure, the material of the second metal sub-layer 20122 and the material of the third metal sub-layer 20123 may be the same, and the material of the first metal sub-layer 20121 and the material of the second metal sub-layer 20122 have different etching rates during etching. For example, the first metal layer structure having the recess 2012A can be easily formed during manufacturing by making the rate at which the material of the first metal sub-layer 20121 is etched higher than the rate at which the material of the second metal sub-layer 20122 is etched by the action of an etchant for etching and forming the first metal layer structure.

[0055] For example, in some embodiments, the material of the first metal sublayer 20121 includes a metal or alloy thereof, such as aluminum or copper, the material of the second metal sublayer 20122 includes a metal or alloy thereof, such as titanium or molybdenum, and the material of the third metal sublayer 20123 is the same as the material of the second metal sublayer 20122 and includes a metal or alloy thereof, such as titanium or molybdenum. Due to the action of the etching solution for etching and forming the electrode structure of the display substrate, for example, the second electrode layer 204, the etching rate of aluminum or copper is greater than the etching rate of titanium or molybdenum. This allows the first metal sublayer 20121, the second metal sublayer 20122, and the third metal sublayer 20123 to be etched to form the recess 2012A while etching and forming the electrode structure, such as the second electrode layer 204.

[0056] For example, in some examples, when the first metal layer structure adopts a two-layer structure, the material combinations of the first metal sublayer 20121 and the second metal sublayer 20122 may include aluminum / titanium, aluminum / molybdenum, copper / titanium, copper / molybdenum, etc., and when the first metal layer structure adopts a three-layer structure, the material combinations of the third metal sublayer 20123, the first metal sublayer 20121 and the second metal sublayer 20122 may be titanium / aluminum / titanium, molybdenum / aluminum / molybdenum, titanium / copper / titanium, or molybdenum / copper / molybdenum, etc.

[0057] For example, in some embodiments of the present disclosure, as shown in Fig. 2B, the display substrate 200 further includes an image sensor and / or an infrared sensor, which is bonded to the base substrate 202, for example, to a side of the base substrate 202 away from the light emitting elements, and whose orthogonal projection onto the base substrate 202 at least partially overlaps with the aperture region 2011, for example, the image sensor and / or the infrared sensor is provided at a position indicated by reference numeral 210 in the figure. Thus, the image sensor and / or the infrared sensor can realize functions such as graphic gathering, face recognition, infrared sensing, etc. through the aperture region 2011.

[0058] In some examples of this embodiment, the display substrate 200 further includes a second insulating layer 216 covering the capacitor, a flat layer 217 for flattening the driving circuit, a pixel definition layer 219 for defining the pixel array, a columnar spacer 208 for forming a sealed space, a sealing layer 205 for sealing, and a second sealing layer 206 and a third sealing layer 207 for further enhancing the sealing effect, but these are not described in the embodiments of this disclosure. In this embodiment, one of the source / drain electrodes 212 of the thin film transistor is connected to the first electrode layer 218, so that this thin film transistor can be used as a driving transistor, that is, the magnitude of the light-emitting current flowing through the light-emitting element in response to the applied data signal is controlled to control the gray scale of the pixel unit during display.

[0059] For example, the sealing layer 205 is an inorganic sealing layer including a material such as silicon oxide or silicon nitride, the second sealing layer 206 is an organic sealing layer including an organic material such as polyimide, and the third sealing layer 207 is an inorganic sealing layer including a material such as silicon oxide or silicon nitride. For example, in the example of FIG. 2B, the sealing layer 205, the second sealing layer 206, and the third sealing layer 207 all extend to the side of the first barrier wall 2012 near the open area 2011, so that all three sealing layers seal the first barrier wall 2012. In another example, as shown in FIG. 2C, the sealing layer 205 extends to the side of the first barrier wall 2012 near the open area 2011, and the second sealing layer 206 and the third sealing layer 207 all terminate on the side of the first barrier wall 2012 near the display area 201. In addition, since the organic material has a relatively weak ability to block water and oxygen, the second sealing layer 206 containing the organic material is terminated at a position far away from the open area 201 to prevent impurities such as water and oxygen from entering the inside of the display area 201 through the second sealing layer 206. For example, in some examples, the sealing layer 205 and the third sealing layer 207 extend to the side of the first barrier wall 2012 close to the open area 2011, and only the second sealing layer 206 is terminated on the side of the first barrier wall 2012 close to the display area 201. This example can also prevent impurities such as water and oxygen from entering the inside of the display area 201 through the second sealing layer 206 containing the organic material. The embodiments of the present disclosure do not limit the specific installation manner of the sealing layer 205, the second sealing layer 206, and the third sealing layer 207.

[0060] In some embodiments of the present disclosure, for example, the periphery of the aperture area 2011 of the display panel may include one or more barrier walls, i.e., multiple barrier walls, such as two, three, four, five, etc., to enhance the barrier effect.

[0061] For example, the display substrate shown in Figures 5A and 5B includes two barrier walls, Figure 5A being a schematic plan view of the display substrate, and Figure 5B being a schematic cross-sectional view of the display substrate taken along line CC in Figure 5A.

[0062] 5A and 5B, the display substrate 300 includes a display region 301 and an aperture region 3011 surrounding the aperture region 3011, and includes a first barrier wall 3012 and a second barrier wall 3013 between the display region 301 and the aperture region 3011, and the first barrier wall 3012 and the second barrier wall 3013 surround the aperture region 3011. The second barrier wall 3013 is provided on a side of the first barrier wall 3012 away from the aperture region 3011 at a predetermined distance. The first barrier wall 3012 and the second barrier wall 3013 both include a first metal layer structure, and at least one side surface surrounding the opening region 3011 of the first metal layer structure of the first barrier wall 3012 has a recess 3012A, and at least one side surface surrounding the opening region 3011 of the first metal layer structure of the second barrier wall 3013 has a recess 3013A.

[0063] The display area 301 includes an electrode pattern including a second metal layer structure, as in the above embodiment, and the first metal layer structure of the first barrier wall 3012 and the second barrier wall 3013 is the same as the second metal layer structure and includes the same material. For example, the first metal layer structure and the second metal layer structure in the first barrier wall 3012 and the second barrier wall 3013 are formed in the same layer and have the same multi-layer structure.

[0064] For example, the display area 301 includes a pixel array, and a plurality of pixel units in the pixel array include a plurality of display light-emitting elements and a driving circuit for driving the light-emitting elements. For example, the driving circuit includes components such as thin film transistors and capacitors.

[0065] As shown in FIG. 5B, the light-emitting element includes a first electrode layer 318, a second electrode layer 304, and an organic functional layer between the first electrode layer 320 and the second electrode layer. The organic functional layer includes, for example, an organic light-emitting material layer 210 and an auxiliary light-emitting layer 303. At least a part of the organic functional layer, for example, the auxiliary light-emitting layer 303 and the second electrode layer 304, is usually formed over the entire surface in the display area 301, and in this case, the organic functional layer is divided by the side having the recesses 3012A / 3013A of the first barrier wall 3012 and the second barrier wall 3013. For example, the first electrode layer 318 is an anode layer (also called a pixel electrode layer), and the second electrode layer 304 is a cathode layer, and the cathode layer is also divided by the side having the recesses 1012A / 3013A of the first barrier wall 2012 and the second barrier wall 3013. As a result, if the organic functional layer and second electrode layer 304 located closer to the opening region 3011 are contaminated with impurities such as water and oxygen, the organic functional layer and second electrode layer 304 are blocked by the first barrier wall 3012, preventing the contamination from spreading to the portions of the organic functional layer and second electrode layer 304 used for the emission of light by the light-emitting element. For example, the organic functional layer and the second electrode layer 304 are also formed on the first barrier wall 3012, but these portions are separated from the other portions.

[0066] Similarly, the thin film transistor includes a gate electrode 311, a source drain electrode 312, etc., and the capacitor includes a first electrode 313, a second electrode 314, and a first insulating layer 315 between the first electrode 313 and the second electrode 314. For example, the gate electrode 311 or the source drain electrode 312 can be realized as an electrode pattern having a second metal layer structure. For example, as shown in FIG. 5B, the source drain electrode 312 includes a second metal layer structure, and the first metal layer structure of the first barrier wall 3012 and the second barrier wall 3013 is formed in the same layer as the second metal layer structure of the source drain electrode 312 and has the same multi-layer structure, so that the first metal layer structure of the first barrier wall 3012 and the second barrier wall 3013 and the second metal layer structure of the source drain electrode 312 can be formed using the same film layer in the manufacturing process of the display substrate 300. For example, in some instances, both the first metal layer structure and the second metal layer structure have a multi-layer structure, such as a two-layer structure or a three-layer structure.

[0067] In this embodiment, as shown in Figures 6 and 7, the first metal layer structure of the first barrier wall 3012 and the second barrier wall 3013 is basically the same as that of the above embodiment, and the specific description can be referred to the above embodiment. Note that similar symbols indicate the same configuration, and the description thereof will be omitted in this embodiment.

[0068] 5B, the display substrate 300 further includes a base substrate 302, which has an aperture 3021 located in the aperture region 3011. For example, the opening direction of the recess in the first metal layer structure of the first barrier wall 3012 and the second barrier wall 3013 is parallel to the base substrate 202.

[0069] For example, the display substrate 300 further includes an image sensor and / or an infrared sensor. The image sensor and / or the infrared sensor are bonded to the base substrate 302, for example, to a side of the base substrate 302 that is away from the light emitting elements, and an orthogonal projection onto the base substrate 302 at least partially overlaps with the aperture region 3011, for example, the image sensor and / or the infrared sensor are provided at a position indicated by reference numeral 310 in the drawing. This allows the image sensor and / or the infrared sensor to realize functions such as graphic gathering, face recognition, and infrared sensing through the aperture region 3011.

[0070] Similarly, in some examples of this embodiment, the display substrate 300 further includes components such as a second insulating layer 316 covering the capacitor, a planar layer 317 for planarizing the driving circuit, a pixel definition layer 319 for defining the pixel array, a columnar spacer 308 for forming a sealed space, a sealing layer 305 for sealing, and a second sealing layer 306 and a third sealing layer 307 for further enhancing the sealing effect, but the description of these components is omitted in the embodiments of this disclosure. In the example of this embodiment, one of the source / drain electrodes 312 of the thin film transistor is connected to the first electrode layer 318, so that this thin film transistor can be used as a driving transistor, that is, the magnitude of the light-emitting current flowing through the light-emitting element in response to the applied data signal is controlled to control the gray scale of the pixel unit during display.

[0071] For example, the sealing layer 305 is an inorganic sealing layer including a material such as silicon oxide or silicon nitride, the second sealing layer 306 is an organic sealing layer including an organic material such as polyimide, and the third sealing layer 307 is an inorganic sealing layer including a material such as silicon oxide or silicon nitride. For example, in the example of FIG. 5B, the sealing layer 305, the second sealing layer 306, and the third sealing layer 307 all extend to the side of the first barrier wall 3012 close to the open area 3011, so that all three sealing layers seal the first barrier wall 3012 and the second barrier wall 3013. In another example, as shown in FIG. 5C, the sealing layer 305 extends to the side of the first barrier wall 3012 close to the open area 3011, and the second sealing layer 306 and the third sealing layer 307 all end between the first barrier wall 3012 and the second barrier wall 3013. For example, in some examples, the sealing layer 305 and the third sealing layer 307 may extend to a side of the first barrier wall 3012 close to the open area 3011, and only the second sealing layer 306 may be stopped between the first barrier wall 3012 and the second barrier wall 3013. For example, in some examples, the sealing layer 305 and the third sealing layer 307 may extend to a side of the first barrier wall 3012 close to the open area 3011, and only the second sealing layer 306 may be stopped on a side of the second barrier wall 3013 close to the display area 301. The embodiments of the present disclosure are not limited to a specific location of each sealing layer.

[0072] In some embodiments of the present disclosure, the first barrier wall includes, in addition to the first metal layer structure described above, for example, an insulating layer structure, and the first metal layer structure is stacked on the insulating layer structure to form a first barrier wall having a more multi-layer structure, thereby enhancing the barrier effect.

[0073] For example, the display substrate shown in Figures 8A and 8B includes a first barrier wall having a first metal layer structure and an insulating layer structure, where Figure 8A is a schematic plan view of the display substrate, and Figure 8B is a schematic cross-sectional view of the display substrate along line DD in Figure 8A.

[0074] As shown in Figures 8A and 8B, the display substrate 400 includes an opening region 401 and a display region 4011, and a first barrier wall 4012 between the display region 401 and the opening region 4011, the display region 401 surrounding the opening region 4011, the first barrier wall 4012 surrounding the opening region 4011, the first barrier wall 4012 including a first metal layer structure and an insulating layer structure, and the first metal layer structure has a recess 4012A on at least one side surrounding the opening region 4011.

[0075] In one example, as shown in FIG. 9, the first barrier wall 4012 includes a first metal layer structure 4012B and an insulating layer structure 4012C. The structure of the first metal layer structure 4012B is basically the same as that of the above-mentioned embodiment, and similar reference numerals indicate the same configuration, and the description thereof will be omitted here. The insulating layer structure 4012C includes at least one insulating layer, which is obtained, for example, by etching an insulating layer formed below the first metal layer structure 4012B. As shown in FIG. 9, the insulating layer structure 4012C has a rectangular cross section, and at this time, at least a part 403 of the organic functional layer and the second electrode layer 404 formed after the first barrier wall 4012 may be divided by the side of the insulating layer structure 4012C of the first barrier wall 3012.

[0076] 10, for convenience of the process, the cross section of the insulating layer structure 4012C of the first barrier wall 4012 may be formed into a regular trapezoidal shape, and in this case, the organic functional layer and the second electrode layer 404 formed after the first barrier wall 4012 extend to the first metal layer structure 4012B along the side surface of the insulating layer structure 4012C of the first barrier wall 3012, and are then cut off by the side surface of the first metal layer structure 4012B. In this case, the contact area between the sealing layer 405 formed on the second electrode layer 404 and the second electrode layer 404 becomes larger, so that the sealing effect by the sealing layer 405 is improved.

[0077] On the other hand, the insulating layer structure 4012C usually contains an inorganic material (e.g., silicon nitride, silicon oxide, etc.), and in this case, if an inorganic insulating layer is provided at the edge of the opening region 4011, the inorganic insulating layer is likely to crack when the opening region 4011 is formed, and the crack is likely to spread inside the display region of the display substrate. In this embodiment, the insulating layer formed below the first metal layer structure 4012B is etched to form the insulating layer structure 4012C of the first barrier wall 4012, so that the inorganic insulating layer is eliminated at the edge of the opening region 4011, or the material of the inorganic insulating layer located at the edge of the opening region 4011 is reduced. This can reduce the propagation path of the crack, and the formed first barrier wall 4012 can prevent the crack from spreading further.

[0078] For example, the display substrate shown in FIG. 8B has a first barrier wall 4012 as shown in FIG. 10, and the insulating layer structure 4012C of the first barrier wall 4012 includes multiple sub-insulating layers, such as a sub-insulating layer in the same layer as the first insulating layer 415 and the second insulating layer 416. For example, in some other embodiments, the insulating layer structure 4012C may further include a sub-insulating layer in the same layer as the buffer layer 4020 above the base substrate 4012, and the buffer layer 4020 may be further etched to expose a portion of the surface of the base substrate 402, and the exposed portion of the surface may be directly contacted with the organic functional layer to be formed later. For example, in some other embodiments, the insulating layer structure 4012C may further include a sub-insulating layer in the same layer as the gate insulating layer 430 above the buffer layer 4020. For example, in some other embodiments, the insulating layer structure 4012C may include only one or two sub-insulating layers, and the embodiments of the present disclosure do not particularly limit the number of layers of the insulating layer structure 4012C.

[0079] Similarly to the above embodiment, the display area 401 further includes an electrode pattern, and the electrode pattern includes a second metal layer structure having the same structure and containing the same material as the first metal layer structure. For example, the first metal layer structure and the second metal layer structure are formed in the same layer and have the same multi-layer structure.

[0080] For example, the display area 401 includes a pixel array, and a plurality of pixel units in the pixel array include a plurality of display light-emitting elements and a driving circuit for driving the light-emitting elements. For example, the driving circuit includes components such as thin film transistors and capacitors.

[0081] As shown in FIG. 8B, the light-emitting element includes a first electrode layer 418, a second electrode layer 404, and an organic functional layer between the first electrode layer 420 and the second electrode layer 404. The organic functional layer includes an organic light-emitting material layer 420 and an auxiliary light-emitting layer 403. At least a part of the organic functional layer, for example, the auxiliary light-emitting layer 403 and the second electrode layer 404, is usually formed over the entire surface in the display region 401. At this time, the organic functional layer is divided by a side having a recess 4012A of the first barrier wall 4012. For example, the first electrode layer 418 is an anode layer, and the second electrode layer 404 is a cathode layer, and the cathode layer is also divided by a side having a recess 4012A of the first barrier wall 4012. For example, a part of the organic functional layer and the second electrode layer 404 are formed on the top of the first barrier wall 4012, but these parts are separated from other parts.

[0082] Similarly, the thin film transistor includes structures such as a gate electrode 411 and a source drain electrode 412, and the capacitor includes a first electrode 413, a second electrode 414, and a first insulating layer 415 between the first electrode 413 and the second electrode 414. For example, the gate electrode 411 or the source drain electrode 412 can be realized as an electrode pattern having a second metal layer structure. For example, as shown in FIG. 8B, the source drain electrode 412 includes a second metal layer structure, and the second metal layer structure of the source drain electrode 412 is formed in the same layer as the first metal layer structure of the first barrier wall 4012 and has the same multi-layer structure, so that in the manufacturing process of the display substrate 400, the first metal layer structure of the first barrier wall 4012 and the second metal layer structure of the source drain electrode 412 can be formed using the same film layer. For example, in some examples, both the first metal layer structure and the second metal layer structure have a multi-layer structure such as a two-layer structure or a three-layer structure.

[0083] As shown in FIG. 8B, the display substrate 400 further includes a base substrate 402, which has an aperture 4021 located in the aperture region 4011.

[0084] For example, the display substrate 400 further includes an image sensor and / or an infrared sensor, which is bonded to the base substrate 402, for example, to a side of the base substrate 402 that is away from the light emitting elements, and whose orthogonal projection onto the base substrate 402 at least partially overlaps with the aperture region 4011, for example, the image sensor and / or the infrared sensor is provided at a position indicated by reference numeral 410 in the drawing. This allows the image sensor and / or the infrared sensor to realize functions such as graphic gathering, face recognition, and infrared sensing through the aperture region 4011.

[0085] Similarly, in some examples of this embodiment, the display substrate 400 further includes a second insulating layer 416 covering the capacitor, a flat layer 417 for flattening the driving circuit, a pixel definition layer 419 for defining the pixel array, a columnar spacer 408 for forming a sealed space, a sealing layer 405 for sealing, and a second sealing layer 406 and a third sealing layer 407 for further enhancing the sealing effect, but the description is omitted in the embodiments of this disclosure. In the example of this embodiment, one of the source-drain electrodes 412 of the thin film transistor is connected to the first electrode layer 418, so that this thin film transistor can be a driving transistor, that is, the magnitude of the light-emitting current flowing through the light-emitting element according to the applied data signal is controlled to control the gray scale of the pixel unit during display. For example, the above-mentioned embodiments can be referred to for the installation of the sealing layer 405, the second sealing layer 406, and the third sealing layer 407, and the description is omitted here.

[0086] For example, in other examples of this embodiment, the display substrate 400 may be formed to include one or more barrier walls, i.e., multiple barrier walls, which can provide multiple layers of protection to the display area 401, as shown in Figures 5A and 11.

[0087] A method for manufacturing a display substrate according to at least one embodiment of the present disclosure includes forming a display area and an aperture area, and forming a first barrier wall between the display area and the aperture area, the display area surrounding the aperture area, the first barrier wall including a first metal layer structure surrounding the aperture area and having a recess on at least one side surrounding the aperture area.

[0088] For example, in one example, the step of forming the display area includes a step of forming an electrode pattern simultaneously with the formation of a first metal layer structure, the electrode pattern includes a second metal layer structure, and the first metal layer structure and the second metal layer structure are formed using the same film layer. For example, the first metal layer structure and the second metal layer structure are multi-layer electrode structures such as two layers, three layers, etc.

[0089] For example, when a first metal layer structure and a second metal layer structure are formed as a two-layer electrode structure, the step of forming an electrode pattern simultaneously with the formation of the first barrier wall includes the steps of forming a first metal material layer on a first side of a base substrate and forming a second metal material layer on a side of the first metal material layer away from the base substrate, performing a first etching on the first metal material layer and the second metal material layer to form an electrode pattern and an initial barrier wall, and then performing a second etching on the initial barrier wall to form a first barrier wall, the second etching being wet etching, and the rate at which the first metal material layer is etched by the etching solution used being greater than the rate at which the second metal material layer is etched, thereby forming a recess.

[0090] For example, when the first metal layer structure and the second metal layer structure are formed as a three-layer electrode structure, the step of forming the electrode pattern simultaneously with the formation of the first barrier wall includes the steps of forming a third metal material layer, the first metal material layer and the second metal material layer in sequence on a first side of the base substrate, performing a first etching on the third metal material layer, the first metal material layer and the second metal material layer to form the electrode pattern and the initial barrier wall, and performing a second etching on the initial barrier wall to form the first barrier wall, wherein the second etching is wet etching, and the rate at which the first metal material layer is etched by the etching solution used is made greater than the rate at which the second metal material layer and the third metal material layer are etched, thereby forming the recess.

[0091] For example, the step of forming the display region further includes a step of forming a first electrode layer, a second electrode layer, and an organic functional layer between the first electrode layer and the second electrode layer, which are used for the light-emitting element located in the display region, and the etching solution used for the second etching is the same as the etching solution used for etching and forming the first electrode layer. Thus, the first barrier wall can be formed simultaneously with the formation of the electrode pattern and the first electrode layer, without increasing the number of process steps in the conventional method.

[0092] For example, in some other embodiments, the first metal layer structure and the second metal layer structure can be formed using a single wet etching process. For example, the step of forming the electrode pattern simultaneously with the formation of the first barrier wall includes the steps of forming a first metal material layer on a first side of the base substrate, forming a second metal material layer on a side of the first metal material layer away from the base substrate, and performing a single wet etching process on the first metal material layer and the second metal material layer, and the rate at which the first metal material layer is etched by the etching solution used in the wet etching is set to be higher than the rate at which the second metal material layer is etched, thereby forming a recess in a single wet etching process. This method is also applicable to the formation of a first metal layer structure and a second metal layer structure having a three-layer structure, and a description thereof will be omitted here.

[0093] Hereinafter, manufacturing methods according to some embodiments of the present disclosure will be described in detail by taking the formation of a display substrate 200 shown in FIGS. 2A and 2B as an example.

[0094] 12A, first, a display area 201 and an aperture area 2011 are formed. The aperture area 2011 is formed by opening an aperture at a position 20111.

[0095] 13A-13C, the formation of the display region 201 includes the formation of components such as light-emitting elements used in the pixel array and a drive circuit for driving the light-emitting elements. For example, the first barrier wall 2012 formed between the display region 201 and the opening region 2011 is formed in the same layer as the multiple functional layers in the display region 201. The embodiments of the present disclosure do not limit the specific structures of the light-emitting elements of the pixel array and the drive circuit for driving the light-emitting elements.

[0096] 12A, first, a driving circuit layer is formed on the base substrate 202, and then a configuration of a thin film transistor, a storage capacitor, etc. is formed. For example, each film layer of the configuration of a thin film transistor, a storage capacitor, etc. is formed in order on the base substrate 202 by a patterning process. One patterning process includes, for example, steps of forming a photoresist, exposing, developing, and etching.

[0097] For example, the manufacturing process is simplified by forming the gate electrode 211 of the thin film transistor and the first electrode 213 of the storage capacitor in the same film layer and the same patterning process. For example, the gate electrode 211 and the first electrode 213 of the storage capacitor include a metal or alloy material such as aluminum, titanium, cobalt, etc. First, a gate electrode material layer is formed by a sputtering method, a deposition method, etc., and then the gate electrode material layer is patterned to form the patterned gate electrode 211 and the first electrode 213 of the storage capacitor.

[0098] For example, the source / drain electrodes 212 of the thin film transistor can be formed as a multi-layer electrode structure in which a titanium material layer, an aluminum material layer, and a titanium material layer are formed in sequence, for example, by sputtering or deposition, and then the three material layers are patterned by the same patterning process to form a three-layer electrode structure of titanium 2121 / aluminum 2122 / titanium 2123 constituting the source / drain electrodes 212, and also form an initial first barrier wall 20120 surrounding the position 20111 where the opening region 2011 is to be formed. For example, the etching used in the above patterning process is dry etching, and thereby the side surfaces of the formed source / drain electrodes 212 and the initial first barrier wall 20120 are flat.

[0099] As shown in FIG. 13B, after the formation of each film layer of the thin film transistor and the storage capacitor is completed, a planar layer 217, a first electrode layer 218, and a pixel definition layer 219 are formed, and then an organic functional layer including an organic light emitting material layer 220 and an auxiliary light emitting layer 203, etc. is formed in the opening of the pixel definition layer 219.

[0100] For example, the flat layer 217 can be formed by a patterning process using an organic material such as a resin material or an inorganic material such as silicon nitride or silicon oxide, and the formed flat layer 217 has a via, so that the first electrode layer 218 to be formed later is connected to the source / drain electrode 212 through the via.

[0101] For example, the first electrode layer 218 is formed on the flat layer 217 by a patterning process. For example, the first electrode layer 218 is an anode layer, and the material of the first electrode layer 218 includes a metal oxide such as ITO or IZO, or a metal such as Ag, Al, or Mo, or an alloy thereof. For example, the first electrode layer 218 is formed on the flat layer 217 by a patterning process, and the first electrode layer 218 is connected to the source-drain electrode 212 through a via in the flat layer 217.

[0102] For example, in the etching process for patterning the first electrode layer 218, the etching solution used simultaneously etches the initial first barrier wall 20120. The etching rate of the aluminum located in the middle layer in the three-layer electrode structure of titanium / aluminum / titanium constituting the first barrier wall 20120 is set to be greater than the etching rate of the titanium located on both the upper and lower sides, thereby forming a recess on the side surface of the initial first barrier wall 20120.

[0103] For example, a pixel definition layer 219 exposing the first electrode layer 218 is formed on the first electrode layer 218 by a patterning process. For example, the material of the pixel definition layer 219 includes an organic material such as a resin material, or an inorganic material such as silicon nitride or silicon oxide, and the formed pixel definition layer 219 has an opening for an organic functional layer of a light-emitting element and the second electrode layer 204 to be formed later.

[0104] For example, as shown in Fig. 13B, an organic light-emitting material layer 220 can be formed in the opening of pixel definition layer 219 by inkjet recording, deposition, etc. Next, as shown in Fig. 13C, a columnar spacer 208, an auxiliary light-emitting layer 203, and a second electrode layer 204 are formed on pixel definition layer 219 on which organic light-emitting material layer 220 has been formed.

[0105] For example, the columnar spacer 208 can be formed by a patterning process using an organic material such as a resin material or an inorganic material such as silicon nitride or silicon oxide, and the columnar spacer 2026 forms a sealed space for a sealing layer to be formed later.

[0106] For example, the auxiliary light-emitting layer 203 and the second electrode layer 204 are formed over the entire surface by vapor deposition, deposition, inkjet printing, or the like. The organic light-emitting material layer 220 includes a light-emitting material capable of emitting light in colors such as red, green, and blue, and the auxiliary light-emitting layer 203 is, for example, an electron injection layer or an electron transport layer. The second electrode layer 204 is, for example, a cathode layer, and the material of the second electrode layer 204 includes a metal such as Mg, Ca, Li, or Al or an alloy thereof, a metal oxide such as IZO or ZTO, or an organic material having a conductive property such as PEDOT / PSS (poly 3,4-ethylenedioxythiophene / polystyrene sulfonate). At this time, the organic functional layer and the second electrode layer 204 formed over the entire surface are divided by the side of the first barrier wall 2012 having a recess, and since both sides of the first barrier wall 2012 in the figure have a recess, the organic functional layer and the second electrode layer 204 are completely blocked by the first barrier wall 2012.

[0107] As a result, even if the organic functional layer and the second electrode layer 204 are contaminated in a portion close to the opening region 2011 of the first barrier wall 2012, the barrier action of the first barrier wall 2012 prevents impurities such as water and oxygen from diffusing and extending to the light-emitting portion of the organic functional layer and the second electrode layer 204. For example, the organic functional layer and the second electrode layer 204 are formed also on the first barrier wall 2012.

[0108] For example, the sealing layer 205 can be formed on the second electrode layer 204 by chemical vapor deposition, physical vapor deposition, coating method, etc. The sealing layer 205 can seal and protect the functional structures located in the display area. For example, the second sealing layer 206 and the third sealing layer 207 may be formed on the sealing layer 205. The second sealing layer 206 can flatten the sealing layer 205, and the third sealing layer 207 can be formed as an outer layer seal. For example, the sealing layer 205 and the third sealing layer 207 are made of inorganic materials such as silicon nitride, silicon oxide, silicon oxynitride, etc., and the second sealing layer 206 is made of organic materials such as polyimide (PI), epoxy resin, etc. As a result, the sealing layer 205, the second sealing layer 206 and the third sealing layer 207 are formed as a composite sealing layer that protects the functional structures in the display area in a multi-layer manner, and has a better sealing effect.

[0109] In some embodiments of the present disclosure, other required functional film layers may be formed in the display area 201 as needed, and these film layers can be formed by conventional methods, so the description will be omitted here.

[0110] For example, after the formation of the display area is completed, an aperture area 2011 is formed in the location 20111 as shown in Figure 12B. For example, the location 20111 is apertured by laser cutting or mechanical punching to form the aperture area 2011.

[0111] For example, since the open area 2011 penetrates the base substrate 202, an opening is also formed on the base substrate 202. An image sensor, an infrared sensor, or other configuration may be attached to the open position and may be connected to, for example, a central processing unit or the like by a signal. For example, the image sensor, infrared sensor, or other configuration may be provided on the side of the base substrate 202 that is away from the light emitting structure (i.e., the non-display side of the display substrate), and various functions such as photography, face recognition, and infrared sensing can be realized via the open area 2011.

[0112] In the embodiment of the present invention, the thin film transistor is shown as a top gate type, but the embodiment of the present invention is not limited thereto, and may be, for example, a bottom gate type. For example, the driving circuit may include a plurality of thin film transistors, which may be of a top gate type or a bottom gate type, and may be of an N type or a P type, and the embodiment of the present disclosure is not limited thereto.

[0113] In some embodiments of the present disclosure, the light-emitting element is an organic light-emitting diode or a quantum dot light-emitting diode, for example, the organic light-emitting diode may be a top-gate emitting type, a bottom emitting type, or a double-sided emitting type, and the organic functional layer of the organic light-emitting diode may be a composite layer including an organic light-emitting material layer and other auxiliary light-emitting layers such as an electron injection layer, an electron transport layer, a hole transport layer, a hole injection layer, etc. The embodiments of the present disclosure are not limited to the specific structure or type of the organic light-emitting diode.

[0114] For example, the manufacturing method of some embodiments of the present disclosure can also form a display substrate as shown in Figures 5A and 5B. However, what is different from the above examples is that when forming a display substrate as shown in Figures 5A and 5B, a second barrier wall is further formed between the display area and the aperture area of ​​the display substrate, and this second barrier wall surrounds the aperture area and is formed on the side of the first barrier wall away from the aperture area. In this case, the second barrier wall can be formed using the same film layer as the first barrier wall, so that the multi-layer barrier wall formed without increasing the process steps can exhibit a better barrier effect.

[0115] For example, the manufacturing method of some embodiments of the present disclosure can also form a display substrate as shown in Figures 8A and 8B, but the difference from the above examples is that when forming a display substrate as shown in Figures 8A and 8B, the step of forming a first barrier wall further includes a step of etching an insulating layer located below the first metal layer structure of the first barrier wall, and this etching may be performed before forming the first metal layer structure, or after forming the first metal layer structure, or may be performed simultaneously with etching of other insulating layers (e.g., etching of a via where the source drain electrode 412 is located), so that a first barrier wall with better barrier effect can be obtained without increasing the process steps.

[0116] At least one embodiment of the present disclosure further provides a display device, and as shown in Fig. 14, a display device 500 includes any display substrate according to the embodiments of the present disclosure, and is shown in the figure as a display device 200. The display device 500 may be any product or part having a display function, such as a tablet, a television, a display, a notebook computer, a digital photo frame, a navigation system, etc., and the embodiments of the present disclosure are not limited thereto.

[0117] Additionally, the following points need to be explained:

[0118] (1) The drawings of the embodiments of the present disclosure relate only to the structures of the embodiments of the present disclosure, and for other structures, reference may be made to the general design.

[0119] (2) For clarity, in the figures illustrating the embodiments of the present disclosure, the thicknesses of layers or regions have been exaggerated or reduced, i.e., the figures are not drawn to actual scale. For example, when an element such as a layer, film, region, or substrate is described as being located "on" or "under" another element, it will be understood that the element may be located "directly" on or "under" the other element, or there may be intervening elements.

[0120] (3) Unless there is a contradiction, the embodiments and features of the embodiments of the present disclosure may be combined with each other to obtain new embodiments.

[0121] The above are only specific embodiments of the present disclosure, but the scope of the present disclosure is not limited thereto, and those skilled in the art should easily understand that any modification or replacement within the technical scope disclosed in the present disclosure falls within the scope of protection of the present disclosure. Therefore, the scope of protection of the present disclosure should be in accordance with the scope of protection of the claims. [Explanation of symbols]

[0122] 201 Display area 200 Display board 300 Display board 301 Display area 400 Display board 401 Display area 2011 Open pore area 2012 First Barrier Wall 2012A Recess 3011 Open pore area 3012 First Barrier Wall 3012A Recess 4011 Open pore area 4012 First Barrier Wall 4012A Recess

Claims

1. A display substrate having an aperture region and a display region surrounding the aperture region, the display substrate including a first barrier wall between the display region and the aperture region and surrounding the aperture region; the first barrier wall includes a first metal layer structure having a recess on at least one side surrounding the aperture region; Further comprising a base substrate; The first metal layer structure comprises: a first metal sub-layer on a first side of the base substrate; a second metal sub-layer on a side of the first metal sub-layer away from the base substrate; an orthogonal projection of the first metal sub-layer onto the base substrate is located within an orthogonal projection of the second metal sub-layer onto the base substrate, thereby forming the recess; the first barrier wall further comprises an insulating layer structure located on the first side of the base substrate, the first metal layer structure being on a side of the insulating layer structure facing away from the base substrate; A display substrate, wherein the first metal sub-layer is above the insulating layer structure and the orthogonal projection of the first metal sub-layer onto the base substrate lies within the orthogonal projection of the insulating layer structure onto the base substrate.

2. the display area includes an electrode pattern including a second metal layer structure; The display substrate of claim 1 , wherein the first metal layer structure and the second metal layer structure have the same structure and include the same material.

3. The first metal layer structure further includes a third metal sub-layer located on the first side of the base substrate; 2. The display substrate of claim 1, wherein the first metal sublayer is on a side of the third metal sublayer away from the base substrate, and an orthogonal projection of the first metal sublayer onto the base substrate lies within an orthogonal projection of the third metal sublayer onto the base substrate.

4. an orthogonal projection of the second metal sub-layer onto the base substrate lies within an orthogonal projection of the third metal sub-layer onto the base substrate; The display substrate of claim 3 , wherein an orthogonal projection of the third metal sub-layer onto the base substrate lies within an orthogonal projection of the insulating layer structure onto the base substrate.

5. The display substrate of claim 3 , wherein the thickness of the first metal sub-layer is greater than the thickness of the second metal sub-layer and the thickness of the third metal sub-layer.

6. 6. The display substrate of claim 5, wherein the first metal sub-layer has a thickness of 150 nm-900 nm, the second metal sub-layer has a thickness of 30 nm-300 nm, and the third metal sub-layer has a thickness of 30 nm-300 nm.

7. 7. The display substrate according to claim 1, wherein an opening direction of the recess is parallel to the base substrate.

8. a second barrier wall between the display area and the aperture area; 2 . The display substrate according to claim 1 , wherein the second barrier wall surrounds the aperture region, has the same structure as the first barrier wall, and is provided on a side of the first barrier wall away from the aperture region.

9. 2. The display substrate according to claim 1, wherein the display region further includes a first electrode layer for forming a light-emitting element, a second electrode layer, and an organic functional layer between the first electrode layer and the second electrode layer, and the organic functional layer is divided by a side of the first barrier wall having the recess.

10. 10. The display substrate according to claim 9, wherein the second electrode layer is a cathode layer, and the cathode layer is divided by a side surface of the first barrier wall having the recess.

11. further comprising an image sensor and / or an infrared sensor; The display substrate according to claim 1 , wherein the image sensor and / or the infrared sensor are bonded to the base substrate and an orthogonal projection onto the base substrate at least partially overlaps with the aperture region.

12. 2. The display substrate of claim 1, wherein the etching rate of the material of the first metal sub-layer is greater than the etching rate of the material of the second metal sub-layer by the action of an etching solution for etching and forming the first metal layer structure.

13. the material of the first metal sub-layer comprises aluminum or copper; The display substrate of claim 12 , wherein the material of the second metal sub-layer comprises titanium or molybdenum.

14. The display substrate according to claim 1 , wherein the insulating layer structure includes a plurality of insulating sub-layers.

15. A display device comprising the display substrate according to claim 1 .

16. A display substrate having an aperture region and a display region surrounding the aperture region, the display substrate including a first barrier wall between the display region and the aperture region and surrounding the aperture region; the first barrier wall includes a first metal layer structure having a recess on at least one side surrounding the aperture region; Further comprising a base substrate; The first metal layer structure comprises: a first metal sub-layer on a first side of the base substrate; a second metal sub-layer on a side of the first metal sub-layer away from the base substrate; an orthogonal projection of the first metal sub-layer onto the base substrate is located within an orthogonal projection of the second metal sub-layer onto the base substrate, thereby forming the recess; the display region further includes a first electrode layer for forming a light-emitting element, a second electrode layer, and an organic functional layer between the first electrode layer and the second electrode layer, the organic functional layer being divided by a side of the first barrier wall having the recess; A display substrate, wherein an orthogonal projection onto the base substrate of an organic functional layer or a cathode layer located above the first metal layer structure overlies an orthogonal projection onto the base substrate of a second metal sub-layer.

17. the display area includes an electrode pattern including a second metal layer structure; 17. The display substrate of claim 16, wherein the first metal layer structure and the second metal layer structure have the same structure and include the same material.

18. the first metal layer structure further includes a third metal sub-layer located on the first side of the base substrate; 17. The display substrate of claim 16, wherein the first metal sublayer is on a side of the third metal sublayer away from the base substrate, and an orthogonal projection of the first metal sublayer onto the base substrate lies within an orthogonal projection of the third metal sublayer onto the base substrate.

19. 20. The display substrate of claim 18, wherein an orthogonal projection of the second metal sub-layer onto the base substrate lies within an orthogonal projection of the third metal sub-layer onto the base substrate.

20. The display substrate of claim 3 , wherein the thickness of the first metal sub-layer is greater than the thickness of the second metal sub-layer and the thickness of the third metal sub-layer.

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