Hand, transfer device, and substrate processing device

Abstract

To suppress falling of a substrate from a hand when the substrate is received from a top ring and to position the substrate in a prescribed seating region.SOLUTION: The hand for holding a substrate comprises: a hand body 620; a plurality of seating members 630 attached to the hand body 620 to seat the substrate; a plurality of guide members 640 attached to the hand body 620 at prescribed intervals from each other so as to surround a seating region SA in which the substrate is seated; and a plurality of positioning members 650 attached to the hand body 620 at prescribed intervals from each other so as to surround the seating region SA. Each of the guide members 640 has a substrate reception surface 642 inclined downward toward the seating region SA. Each of the positioning members 650 has a positioning part 652 that comes into contact with the outer edge of the seating region.SELECTED DRAWING: Figure 9C

Description

Technical Field

[0001] The present application relates to a hand, a transfer device, and a substrate processing device.

Background Art

[0002] In recent years, substrate processing devices have been used to perform various processes on substrates such as semiconductor wafers. As an example of a substrate processing device, a CMP (Chemical Mechanical Polishing) device for performing polishing processes and the like on a substrate can be mentioned.

[0003] As described in Patent Document 1, a CMP device includes a polishing device for performing a polishing process on a substrate, a cleaning device for performing a cleaning process and a drying process on the substrate, and a load / unload device for delivering the substrate to the polishing device and receiving the substrate that has been subjected to the cleaning process and the drying process by the cleaning device. Further, the CMP device includes a transfer device for transferring the substrate between the polishing device, the cleaning device, and the load / unload device. The CMP device sequentially performs various processes of polishing, cleaning, and drying while transferring the substrate by the transfer device.

[0004] The transfer device includes a hand for holding the substrate and a drive mechanism for moving the hand. The hand includes a plurality of pins on which the substrate is seated. As described in Patent Document 1, each of the plurality of pins has a first inclined surface inclined upward with respect to the horizontal direction and a second inclined surface formed above the first inclined surface and inclined downward with respect to the horizontal direction. This transfer device is configured to suppress the substrate from falling when the seating position of the substrate is displaced due to the acceleration during substrate transfer and the end portion of the substrate abuts against the second inclined surface.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0006] However, there is room for improvement in the prior art in suppressing the dropping of the substrate when receiving the substrate from the top ring and positioning the substrate in a predetermined seating area.

[0007] That is, when receiving the substrate from the top ring, by supplying fluid to the adsorption surface of the substrate adsorbed on the membrane of the top ring, the substrate is detached from the membrane. In this case, there is no problem when the substrate is detached from the membrane while maintaining a horizontal state. However, when only one side of the substrate is detached from the membrane, the substrate may come down to the transfer device in an inclined state. Even in such a case, it is required to receive the substrate without dropping it from the transfer device and position it in a predetermined seating area.

[0008] Therefore, an object of the present application is to suppress the substrate from dropping from the hand when receiving the substrate from the top ring and to position the substrate in a predetermined seating area.

Means for Solving the Problems

[0009] According to one embodiment, there is provided a hand for holding a substrate, the hand including a hand body, a plurality of seating members attached to the hand body on which the substrate is seated, and a plurality of guide members attached to the hand body at a predetermined interval from each other so as to surround a seating area where the substrate is seated. And a plurality of positioning members attached to the hand body at a predetermined interval from each other so as to surround the seating area, each of the plurality of guide members has a substrate receiving surface inclined downward toward the seating area, and each of the plurality of positioning members has a positioning portion in contact with the outer edge of the seating area, and a hand is disclosed. The body has a plurality of positioning members attached thereto, and a hand is disclosed.

Brief Description of the Drawings

[0010]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6A

Figure 6B

Figure 6C

Figure 7A

Figure 7B

Figure 7C

Figure 8A

Figure 8B

Figure 8C

Figure 9A

Figure 9B

Figure 9C

Figure 10A

Figure 10B

Figure 11A

Figure 11B

Figure 11C

[0011] Hereinafter, a hand, a transfer device, and a substrate processing device according to an embodiment of the present invention will be described with reference to the drawings. In the drawings described below, the same or corresponding components are denoted by the same reference numerals, and redundant descriptions are omitted.

[0012] <Polishing device> FIG. 1 is a plan view showing the overall configuration of a CMP device as an example of a substrate processing device according to an embodiment of the present invention. As shown in FIG. 1, the CMP device 1000 includes a substantially rectangular housing 1. The interior of the housing 1 is partitioned by partition walls 1a and 1b into a load / unload device 2, a polishing device 3, and a cleaning device 4. The load / unload device 2, the polishing device 3, and the cleaning device 4 are each independently assembled and independently evacuated. Further, the cleaning device 4 includes a power supply member that supplies power to the polishing device and a control device 5 that controls the processing operation.

[0013] <Load / unload device> The load / unload device 2 holds a large number of objects to be processed (for example, disk-shaped substrates (wafers) There are provided two or more (four in this embodiment) front load members 20 on which a substrate cassette for stocking is placed. These front load members 20 are arranged adjacent to the housing 1 and arrayed along the width direction (direction perpendicular to the longitudinal direction) of the polishing apparatus. The front load members 20 can be mounted with an open cassette, a SMIF (Standard Manufacturing Interface) pod, or a FOUP (Front Opening Unified Pod). Here, the SMIF and the FOUP are sealed containers that can house a substrate cassette inside and maintain an environment independent of the external space by covering it with a partition wall.

[0014] Also, a traveling mechanism 21 is laid along the arrangement of the front load members 20 in the load / unload apparatus 2. On the traveling mechanism 21, two transfer robots (loader, transfer mechanism) 22 that can move along the arrangement direction of the substrate cassettes are installed. The transfer robot 22 can access the substrate cassette mounted on the front load member 20 by moving on the traveling mechanism 21. Each transfer robot 22 is provided with two hands vertically. The upper hand is used when returning the processed substrate to the substrate cassette. The lower hand is used when taking out the substrate before processing from the substrate cassette. In this way, the upper and lower hands can be used properly. Further, the lower hand of the transfer robot 22 is configured to be able to invert the substrate.

[0015] <Polishing apparatus> The polishing apparatus 3 is an apparatus for polishing (planarizing) a substrate. The polishing apparatus 3 includes a first polishing apparatus 3A, a second polishing apparatus 3B, a third polishing apparatus 3C, and a fourth polishing apparatus 3D. The first polishing apparatus 3A, the second polishing apparatus 3B, the third polishing apparatus 3C, and the fourth polishing apparatus 3D are arrayed along the longitudinal direction of the polishing apparatus as shown in FIG. 1.

[0016] As shown in Fig. 1, the first polishing apparatus 3A includes a polishing table 30A to which a polishing pad (abrasive tool) 10 having a polishing surface is attached, a top ring 31A for holding a substrate and pressing it against the polishing pad 10 on the polishing table 30A for polishing, a polishing liquid supply nozzle 32A for supplying a polishing liquid or a dressing liquid (e.g., pure water) to the polishing pad 10, a dresser 33A for dressing the polishing surface of the polishing pad 10, and an atomizer 34A for ejecting a mixed fluid of a liquid (e.g., pure water) and a gas (e.g., nitrogen gas) or a liquid (e.g., pure water) to remove slurry, polishing products on the polishing surface, and polishing pad residues by dressing.

[0017] Similarly, the second polishing apparatus 3B includes a polishing table 30B, a top ring 31B, a polishing liquid supply nozzle 32B, a dresser 33B, and an atomizer 34B. The third polishing apparatus 3C includes a polishing table 30C, a top ring 31C, a polishing liquid supply nozzle 32C, a dresser 33C, and an atomizer 34C. The fourth polishing apparatus 3D includes a polishing table 30D, a top ring 31D, a polishing liquid supply nozzle 32D, a dresser 33D, and an atomizer 34D.

[0018] Since the first polishing apparatus 3A, the second polishing apparatus 3B, the third polishing apparatus 3C, and the fourth polishing apparatus 3D have the same configuration as each other, only the first polishing apparatus 3A will be described below.

[0019] Fig. 2 is a perspective view schematically showing the first polishing apparatus 3A. The top ring 31A is supported by a top ring shaft 36. A polishing pad 10 is attached to the upper surface of the polishing table 30A. The upper surface of the polishing pad 10 forms a polishing surface for polishing the substrate W. Note that fixed abrasive grains can also be used instead of the polishing pad 10. The top ring 31A and the polishing table 30A are configured to rotate around their axes as indicated by the arrows. The substrate W is held by vacuum suction on the lower surface of the top ring 31A. During polishing, the polishing liquid supply nozzle With the polishing liquid supplied from the nozzle 32A to the polishing surface of the polishing pad 10, the substrate W to be polished is pressed against the polishing surface of the polishing pad 10 by the top ring 31A and polished.

[0020] <Cleaning device> FIG. 3 is a plan view and a side view schematically showing the configuration of the cleaning device. FIG. 3(a) is a plan view showing the cleaning device 4, and FIG. 3(b) is a side view showing the cleaning device 4. As shown in FIGS. 3(a) and 3(b), the cleaning device 4 is partitioned into a roll cleaning chamber 190, 300, a first transfer chamber 191, a pen cleaning chamber 192, a second transfer chamber 193, a drying chamber 194, and a third transfer chamber 195.

[0021] In the roll cleaning chamber 190, an upper roll cleaning module 201A and a lower roll cleaning module 201B arranged along the vertical direction are disposed. The upper roll cleaning module 201A and the lower roll cleaning module 201B are cleaning machines that clean the substrate by pressing two rotating roll sponges against the front and back surfaces of the substrate while supplying the cleaning liquid to the front and back surfaces of the substrate. A temporary placement table 204 for the substrate is provided between the upper roll cleaning module 201A and the lower roll cleaning module 201B. In the roll cleaning chamber 300, an upper roll cleaning module 300A and a lower roll cleaning module 300B similar to the upper roll cleaning module 201A and the lower roll cleaning module 201B disposed in the roll cleaning chamber 190 are arranged.

[0022] In the pen cleaning chamber 192, an upper pen cleaning module 202A and a lower pen cleaning module 202B arranged along the vertical direction are disposed. The upper pen cleaning module 202A and the lower pen cleaning module 202B are cleaning machines that clean a substrate by pressing a rotating pen sponge against the surface of the substrate while supplying a cleaning liquid to the surface of the substrate and swinging in the radial direction of the substrate. A temporary placement table 203 for the substrate is provided between the upper pen cleaning module 202A and the lower pen cleaning module 202B. In addition, a temporary placement table 180 for the substrate W installed on a frame (not shown) is disposed on the side of the first transfer chamber 191.

[0023] In the drying chamber 194, an upper drying module 205A and a lower drying module 205B arranged along the vertical direction are disposed. Filter fan devices 207A and 207B for supplying clean air into the drying modules 205A and 205B, respectively, are provided above the upper drying module 205A and the lower drying module 205B.

[0024] In the first transfer chamber 191, a first transfer device 209 capable of moving up and down is disposed. In the second transfer chamber 193, a second transfer device 210 capable of moving up and down is disposed. In the third transfer chamber 195, a third transfer device 213 capable of moving up and down is disposed. The first transfer device 209, the second transfer device 210, and the third transfer device 213 are respectively movably supported by support shafts 211, 212, and 214 extending in the vertical direction. The first transfer device 209, the second transfer device 210, and the third transfer device 213 have a lifting drive mechanism such as a motor inside and are movable up and down along the support shafts 211, 212, and 214. The first transfer device 209 has upper and lower two-stage hands similar to the transfer robot 22. As shown by the dotted line in Fig. 3(a), the lower hand of the first transfer device 209 is disposed at a position where it can access the above-described temporary placement table 180. When the lower hand of the first transfer device 209 accesses the temporary placement table 180, a shutter (not shown) provided in the partition wall 1b opens.

[0025] The first transfer device 209 operates to transfer the substrate W among the temporary placement table 180, the upper roll cleaning module 201A, the lower roll cleaning module 201B, the temporary placement table 204, the temporary placement table 203, the upper pen cleaning module 202A, and the lower pen cleaning module 202B. When transferring the substrate before cleaning (the substrate with slurry attached), the first transfer device 209 uses the lower hand, and when transferring the substrate after cleaning, it uses the upper hand.

[0026] The second transfer device 210 operates to transfer the substrate W among the upper pen cleaning module 202A, the lower pen cleaning module 202B, the temporary placement table 203, the upper drying module 205A, and the lower drying module 205B. Since the second transfer device 210 only transfers the cleaned substrate, it is equipped with only one hand. The transfer robot 22 shown in FIG. 1 takes out the substrate from the upper drying module 205A or the lower drying module 205B using the upper hand and returns the substrate to the substrate cassette. When the upper hand of the transfer robot 22 accesses the drying modules 205A and 205B, a shutter (not shown) provided in the partition wall 1a opens.

[0027] The third transfer device 213 operates to transfer the substrate W among the upper roll cleaning module 300A, the lower roll cleaning module 300B, and the temporary placement table 204. When transferring the substrate before cleaning (the substrate with slurry attached), the third transfer device 213 uses the lower hand, and when transferring the substrate after cleaning, it uses the upper hand.

[0028] <Transfer Device> Next, a conveying device for conveying a substrate will be described. As shown in FIG. 1, a first linear transporter (conveying device) 6 is disposed adjacent to the first polishing device 3A and the second polishing device 3B. The first linear transporter 6 is a device that conveys a substrate between four conveying positions (the first conveying position TP1, the second conveying position TP2, the third conveying position TP3, and the fourth conveying position TP4 in order from the load / unload device side) along the direction in which the polishing devices 3A and 3B are arranged.

[0029] Also, a second linear transporter (conveying device) 7 is disposed adjacent to the third polishing device 3C and the fourth polishing device 3D. The second linear transporter 7 is a device that conveys a substrate between three conveying positions (the fifth conveying position TP5, the sixth conveying position TP6, and the seventh conveying position TP7 in order from the load / unload device side) along the direction in which the polishing devices 3C and 3D are arranged.

[0030] The substrate is conveyed to the polishing devices 3A and 3B by the first linear transporter 6. The top ring 31A of the first polishing device 3A moves between the polishing position and the second conveying position TP2 by the swinging operation of the top ring head. Therefore, the substrate is delivered to the top ring 31A at the second conveying position TP2. Similarly, the top ring 31B of the second polishing device 3B moves between the polishing position and the third conveying position TP3, and the substrate is delivered to the top ring 31B at the third conveying position TP3. The top ring 31C of the third polishing device 3C moves between the polishing position and the sixth conveying position TP6, and the substrate is delivered to the top ring 31C at the sixth conveying position TP6. The top ring 31D of the fourth polishing device 3D moves between the polishing position and the seventh conveying position TP7, and the substrate is delivered to the top ring 31D at the seventh conveying position TP7.

[0031] At the first transfer position TP1, a lifter 11 for receiving a substrate from the transfer robot 22 is arranged. The substrate is passed from the transfer robot 22 to the first linear transporter 6 via the lifter 11. A shutter (not shown) is provided in the partition wall 1a, positioned between the lifter 11 and the transfer robot 22, and the shutter is opened during the transfer of the substrate so that the substrate is passed from the transfer robot 22 to the lifter 11. Also, a swing transporter 12 is arranged between the first linear transporter 6, the second linear transporter 7, and the cleaning device 4. The swing transporter 12 has a hand movable between the fourth transfer position TP4 and the fifth transfer position TP5. The transfer of the substrate from the first linear transporter 6 to the second linear transporter 7 is performed by the swing transporter 12. The substrate is transported by the second linear transporter 7 to the third polishing device 3C and / or the fourth polishing device 3D. Also, the substrate polished by the polishing device 3 is transported to the cleaning device 4 via the swing transporter 12.

[0032] FIG. 4 is a perspective view schematically showing the first linear transporter 6. The first linear transporter 6 includes first, second, third, and fourth hands 600-1, 600-2, 600-3, and 600-4 for holding a substrate. The first linear transporter 6 also includes a support member 610 for supporting the first to fourth hands 600-1 to 600-4, respectively. The first linear transporter 6 further includes a drive mechanism 680 for moving the first to fourth hands 600-1 to 600-4 via the support member 610. The drive mechanism 680 includes three lifting drive mechanisms (for example, a motor drive mechanism or an air cylinder using a ball screw) 680A, 680B, and 680C for moving the second, third, and fourth hands 600-2, 600-3, and 600-4 up and down, respectively, three linear guides 682A, 682B, and 682C for horizontally movably supporting the first to fourth hands 600-1 to 600-4, and three horizontal drive mechanisms 684A, 684B, and 684C for driving the first to fourth hands 600-1 to 600-4 in the horizontal direction. In the present embodiment, each of the horizontal drive mechanisms 684A, 684B, and 684C has a pair of pulleys 686, a belt 687 wound around these pulleys 686, and a servo motor 688 for rotating either one of the pair of pulleys.

[0033] The first hand 600-1 is supported by the first linear guide 682A and is driven by the first horizontal drive mechanism 684A to move between the first transfer position TP1 and the fourth transfer position TP4. The first hand 600-1 is a pass hand for receiving a substrate from the lifter 11 and passing it to the second linear transporter 7. Therefore, when the substrate is polished by the third polishing device 3C and the fourth polishing device 3D without being polished by the first polishing device 3A and the second polishing device 3B, the first hand 600-1 is used. The first hand 600-1 is not provided with a lifting drive mechanism and can move only in the horizontal direction.

[0034] The second hand 600-2 is supported by the second linear guide 682B and driven by the second horizontal drive mechanism 684B to move between the first transfer position TP1 and the second transfer position TP2. This second hand 600-2 functions as an access hand for transporting the substrate from the lifter 11 to the first polishing apparatus 3A. That is, the second hand 600-2 moves to the first transfer position TP1, where it receives the substrate from the lifter 11. Then, the second hand 600-2 moves again to the second transfer position TP2, where it delivers the substrate held by the second hand 600-2 to the top ring 31A. A first lifting drive mechanism 680A is connected to the second hand 600-2, and they are configured to move horizontally integrally. When delivering the substrate to the top ring 31A, the second hand 600-2 is driven by the first lifting drive mechanism 680A to rise, and after delivering the substrate to the top ring 31A, it is driven by the first lifting drive mechanism 680A to descend.

[0035] The third hand 600-3 and the fourth hand 600-4 are supported by the third linear guide 682C. The third hand 600-3 and the fourth hand 600-4 are connected to each other by an air cylinder 692, and they are driven by the third horizontal drive mechanism 684C to move horizontally integrally. The air cylinder 692 functions as a gap adjustment mechanism for adjusting the gap between the third hand 600-3 and the fourth hand 600-4. The reason for providing this air cylinder (gap adjustment mechanism) 692 is that the gap between the first transfer position TP1 and the second transfer position TP2 and the gap between the second transfer position TP2 and the third transfer position TP3 may be different. The air cylinder 692 is capable of performing a gap adjustment operation during the movement of the third hand 600-3 and the fourth hand 600-4. nd 600-4 to perform a gap adjustment operation during their movement.

[0036] The second lifting drive mechanism 680B is connected to the third hand 600-3, and the third lifting drive mechanism 680C is connected to the fourth hand 600-4. The third hand 600-3 and the fourth hand 600-4 can be lifted independently. The third hand 600-3 moves between the first transfer position TP1, the second transfer position TP2, and the third transfer position TP3. At the same time, the fourth hand 600-4 moves between the second transfer position TP2, the third transfer position TP3, and the fourth transfer position TP4.

[0037] The third hand 600-3 functions as an access hand for transporting the substrate from the lifter 11 to the second polishing device 3B. That is, the third hand 600-3 moves to the first transfer position TP1, receives the substrate from the lifter 11 here, and then moves to the third transfer position TP3, and operates to transfer the substrate to the top ring 31B. The third hand 600-3 also functions as an access hand for transporting the substrate polished by the first polishing device 3A to the second polishing device 3B. That is, the third hand 600-3 moves to the second transfer position TP2, receives the substrate from the top ring 31A here, and then moves to the third transfer position TP3, and operates to transfer the substrate to the top ring 31B. When transferring the substrate between the third hand 600-3 and the top ring 31A or the top ring 31B, the third hand 600-3 is driven by the second lifting drive mechanism 680B to rise, and after the substrate transfer is completed, it is driven by the second lifting drive mechanism 680B to descend.

[0038] The fourth hand 600-4 functions as an access hand for transporting the substrate polished by the first polishing device 3A or the second polishing device 3B to the swing transporter 12. That is, the fourth hand 600-4 moves to the second transfer position TP2 or the third transfer position TP3, receives the substrate polished from the top ring 31A or the top ring 31B here, and then moves to the fourth transfer position TP4. When receiving the substrate from the top ring 31A or the top ring 31B, the fourth hand 600-4 is driven by the third lifting drive mechanism 680C to rise, and after receiving the substrate, it is driven by the third lifting drive mechanism 680C to descend.

[0039] The second linear transporter 7 is different from the first linear transporter 6 in that it does not include components corresponding to the first hand 600-1, but has basically the same configuration as the first linear transporter 6 in other respects, so detailed description is omitted.

[0040] <Hand> Next, the details of the hand will be described. Since the first to fourth hands 600-1 to 600-4 have the same configuration, only one hand (for convenience, referred to as "hand 600") will be described. FIG. 5 is a perspective view schematically showing the configuration of the hand.

[0041] As shown in FIG. 5, the hand 600 includes a hand body 620 and a plurality (five in this embodiment) of seating members 630-1 to 630-5 attached to the hand body 620. The hand body 620 is a plate-like member formed in a substantially U shape so as to surround the seating area SA of the substrate. The seating members 630-1 to 630-5 are members on which the substrate sits. The seating members 630-1 to 630-5 are attached to the hand body 620 at intervals from each other so as to surround the seating area SA. In this embodiment, an example in which the hand 600 includes five seating members 630-1 to 630-5 is shown, but the number of the seating members 630 is arbitrary. The hand 600 may include three or more seating members 630 that can hold the substrate W as horizontally as possible and evenly distribute the weight of the substrate W.

[0042] The seating members 630-1 to 630-5 are classified into two types depending on the presence or absence of a seating sensor for detecting that the substrate has seated on the hand 600. In the present embodiment, the seating members 630-1, 630-3, and 630-5 are provided with seating sensors, and the seating members 630-2 and 630-4 are not provided with seating sensors. Hereinafter, in order to distinguish between the two, the seating members 630-1, 630-3, and 630-5 are appropriately referred to as "first seating members", and the seating members 630-2 and 630-4 are referred to as "second seating members". Figure 6A is a perspective view schematically showing the configuration of the first seating member. Figure 6B is a cross-sectional view taken along line B-B of Figure 6A. Figure 6C is a cross-sectional view taken along line C-C of Figure 6A. As shown in Figures 6A to 6C, each of the first seating members 630-1, 630-3, and 630-5 includes a pedestal 631 attached to the hand body 620, a shaft member 632 supported by the hand body 620 via the pedestal 631, and a lever member 634 supported by the shaft member 632. The lever member 634 is a rod-shaped member disposed in a groove formed in the pedestal 631. The lever member 634 includes a first end portion 634-1 having a seating portion 634-1a on which the substrate seats, and a second end portion 634-2 provided on the opposite side of the first end portion 634-1 with the shaft member 632 interposed therebetween. The lever member 634 is supported by the shaft member 632 such that the first end portion 634-1 protrudes into the seating region SA.

[0043]

[0044] ​Further, the first seating members 630-1, 630-3, 630-5 each include a biasing member 636 for applying a force to rotate the lever member 634 to the lever member 634. The biasing member 636 applies a force to the lever member 634 to rotate the lever member 634 so that the second end 634-2 moves downward. Therefore, when the substrate is not seated on the lever member 634 as shown by the broken line in FIG. 6B, the second end 634-2 is in a state of moving downward. The biasing member 636 is a compression spring in this embodiment. Specifically, one end of the compression spring is attached to a housing 639 that covers the upper part of the lever member 634, and the other end is configured to be attached to the bottom surface of a hole 634b formed on the upper surface of the lever member 634 on the second end 634-2 side from the shaft member 632. Note that the biasing member 636 is not limited to a compression spring, and any member that can apply the above-described biasing force to the lever member 634 is applicable as long as it is an elastic body such as rubber.

[0045] The first seating members 630-1, 630-3, 630-5 each further include a seating sensor 638 for detecting that the substrate has been seated on the hand 600. Specifically, the seating sensor 638 is configured to detect that the second end 634-2 has moved upward. That is, when the substrate is not seated on the lever member 634 in FIG. 6B, the biasing member 636 biases the lever member 634 so that the second end 634-2 is positioned downward as shown by the broken line. On the other hand, when the substrate is seated on the seating portion 634-1a of the lever member 634, the lever member 634 rotates about the shaft member 632 due to the weight of the substrate, and the first end 634-1 moves downward while the second end 634-2 moves upward. A magnet 634-2a is provided at the second end 634-2 of the lever member 634. The seating sensor 638 includes a magnetic sensor that detects that the magnet 634-2a has moved upward. When the magnet 634-2a moves upward and approaches the magnetic sensor, the seating sensor 638 detects a change in magnetoresistance, thereby detecting that the second end 634-2 has moved upward, in other words, that the substrate has been seated on the seating portion 634-1a of the lever member 634.

[0046] Note that a wiring cover 622 is provided along the outer shape of the hand body 620 on the hand body 620. The cable connected to the seating sensor 638 is wired through the inside of the wiring cover 622. Further, the first seating members 630-1, 630-3, 630-5 include a housing 639 configured to cover the second end portion 634-2 of the lever member 634 and the seating sensor 638.

[0047] According to the present embodiment, the accuracy of detecting the seating of the substrate can be improved. That is, in the prior art, the seating detection was performed using an optical sensor provided in the seating portion 634-1a. Here, the seating portion 634-1a is located at a position protruding into the seating area SA, and the seating area SA contains cleaning water used for the cleaning process and slurry used for the polishing process. Therefore, the light of the optical sensor is diffusely reflected by the cleaning water or the slurry, and as a result, false detection of the substrate seating may occur. On the other hand, in the present embodiment, the seating sensor 638 is configured to perform the seating detection by detecting the upward movement of the second end portion 634-2. The second end portion 634-2 is on the opposite side of the first end portion 634-1 including the seating portion 634-1a with the shaft member 632 interposed therebetween, and is away from the seating area SA. Therefore, it is difficult to be affected by external disturbances caused by the cleaning water or the slurry. As a result, the accuracy of detecting the seating of the substrate can be improved. Further, in the present embodiment, since the second end portion 634-2 and the seating sensor 638 are covered by the housing 639, it is even more difficult to be affected by external disturbances caused by the cleaning water or the slurry. As a result, the accuracy of detecting the seating of the substrate can be improved.

[0048] Note that in this embodiment, the seating sensor 638 is shown as an example of an auto-switch type sensor that detects the magnet 634-2a provided at the second end 634-2 with a magnetic sensor, but it is not limited to this. For example, the seating sensor 638 may include an optical sensor having a light projecting component and a light receiving component. In this case, the light projecting component and the light receiving component are arranged in the vicinity of the second end 634-2. The lever member 634 is supported by the shaft member 632 so as to shield between the light projecting component and the light receiving component when the second end 634-2 moves upward. Thereby, when the substrate is not seated on the lever member 634, the second end 634-2 is positioned downward, and the light receiving component can detect the light output from the light projecting component. On the other hand, when the second end 634-2 moves upward, the light receiving component can no longer detect the light output from the light projecting component, so that it can be detected that the substrate has been seated on the lever member 634.

[0049] In this embodiment, it is determined that the seat is occupied when the magnet 634-2a moves between the positions of the two-dot chain line and the solid line in FIG. 6B. In this embodiment, the position of the seating sensor 638 is arranged beside (side surface of) the second end 634-2, but it may be provided at the position of the lower surface of the bolt of the housing 639 facing the upper surface of the magnet 634-2a. Further, the seating sensor 638 may include an electric sensor. In this case, a first electrical contact is provided at the second end 634-2 of the lever member 634. The seating sensor 638 has a second electrical contact that contacts the first electrical contact when the second end 634-2 moves upward, and can detect that the substrate has been seated on the lever member 634 by a change in voltage. Further, the seating sensor 638 may include a piezoelectric sensor (pressure sensor) or a strain gauge type sensor. In this case, a piezoelectric sensor (pressure sensor) or a strain gauge type sensor is installed at the tip or the contact portion of the end of the second end 634-2, and it can be detected that the substrate has been seated on the lever member 634 by detecting a change in pressure or a change in strain. Further, the seating member described in this embodiment is applicable not only to a movable hand, but also to a temporary placement table for a substrate during conveyance or a positioning table for aligning the direction of a notch or an orifice.

[0050] FIG. 7A is a perspective view schematically showing the configuration of the second seating member. The second seating members 630-2 and 630-4 are different from the first seating members 630-1, 630-3, and 630-5 in that they do not include the biasing member 636 and the seating sensor 638. Since the other components have the same functions, the components having the same functions are denoted by the same reference numerals. As shown in FIG. 7A, each of the second seating members 630-2 and 630-4 includes a pedestal 631 attached to the hand body 620, a shaft member 632 supported by the hand body 620 via the pedestal 631, and a lever member 634 supported by the shaft member 632. The lever member 634 includes a first end 634-1 having a seating portion 634-1a on which the substrate is seated, and a second end 634-2 provided on the opposite side of the first end 634-1 with the shaft member 632 interposed therebetween. The lever member 634 is supported by the shaft member 632 such that the first end 634-1 protrudes into the seating area SA. The lever member 634 and the shaft member 632 are covered by a housing 639.

[0051] Also, as shown in FIGS. 6 and 7A, each of the seating members 630-1 to 630-5 includes a pair of bearings 633 for supporting both ends of the shaft member 632, and a pair of elastic members 635 for supporting the pair of bearings 633. In this embodiment, the elastic member 635 is a spring member. One end of the spring member is attached to the lower surface of the bearing 633, and the other end is attached to the bottom surface of a hole formed in the upper surface of the hand body 620. With this configuration, the lever member 634 is supported by the hand body 620 via the elastic member 635. Note that the elastic member 635 is not limited to a spring member, and any member that can absorb the pressing load from the top ring may be used.

[0052] FIG. 7B is a diagram schematically showing the transfer of the substrate from the hand to the top ring. FIG. 7B schematically shows the cross section of line B-B in FIG. 8A described later. The top ring 31 includes an annular retainer ring 312, a membrane 320 surrounded by the retainer ring 312, and the like. As shown in FIG. 7B, the housing 639 of the seating member has an L-shaped cross section. The retainer ring 312 is arranged to be accommodated in the space surrounded by the L shape of the housing 639 when the substrate W is transferred from the hand 600 to the top ring 31. Thereby, the positional relationship between the hand 600 and the top ring 31 can be easily confirmed. Further, as shown in FIG. 7B, when the substrate W is transferred from the hand to the top ring 31, the membrane 320 is pressed against the substrate W for vacuum suction. In this regard, the lever member 634 on which the substrate W is seated is supported by the hand main body 620 via the elastic member 635. Therefore, when the substrate W is pushed down by the membrane 320, the elastic member 635 absorbs the pressing load.

[0053] According to the present embodiment, the pressing load from the top ring can be absorbed more stably. That is, in the prior art, the hand is configured to include two upper and lower blades (an upper blade and a lower blade), and the elastic member is provided between the blades to absorb the pressing load from the top ring. In this case, when the membrane of the top ring is pressed against the substrate W, the entire upper blade receives the pressing load. Therefore, for example, when the membrane hits only one side of the substrate W, a part of the upper blade may be pushed down and the upper blade may tilt, resulting in unstable absorption of the pressing load.

[0054] In contrast, in the present embodiment, since each of the seating members 630-1 to 630-5 has an elastic member 635 that supports the lever member 634, the hand body 620 can be configured with a single sheet, and the cost can be reduced. In addition, since each of the lever members 634 of the seating members 630-1 to 630-5 is supported by a single hand body 620 via the elastic member 635, for example, when the membrane 320 hits against the substrate W on one side, any one of the seating members 630-1 to 630-5 corresponding to the hitting location absorbs the pressing load, so the hand body 620 is difficult to tilt. As a result, according to the present embodiment, the pressing load from the top ring can be more stably absorbed. Note that for a hand (for example, the first hand 600-1) among the first to fourth hands 600-1 to 600-4 that does not receive the pressing load from the top ring, the elastic member 635 may not be provided. Further, the hand 600 of the present embodiment supports and fixes the substrate W, and furthermore, the method of inserting and arranging the substrate W into the support portion is to drop the substrate W horizontally. The hand 600 of the present embodiment does not grip the substrate W by horizontally moving the hand 600 from both side surface directions of the substrate W and sandwiching it.

[0055] Note that in the above embodiment, each of the seating members 630-1 to 630-5 has been shown as an example including a pair of bearings 633 for supporting both ends of the shaft member 632 and a pair of elastic members 635 for supporting the pair of bearings 633, but the present invention is not limited thereto. Hereinafter, modified examples of the pair of bearings 633 and the pair of elastic members 635 will be described. FIG. 7C is a cross-sectional view taken along the line C'-C' in FIG. 6A. As shown in FIG. 7C, each of the seating members 630-1 to 630-5 may include a bearing 633' for supporting both ends of the shaft member 632. The bearing 633' is a single member that extends across both ends of the shaft member 632 below the shaft member 632. Further, as shown in FIG. 7C, each of the seating members 630-1 to 630-5 may include a single elastic member 635' that supports the center of the lower surface of the bearing 633'.

[0056] According to this modification, similar to the above-described embodiment, since the lever members 634 of the seating members 630-1 to 630-5 are supported by a single hand body 620 via the elastic members 635', the pressing load from the top ring can be absorbed more stably.

[0057] <Guide member and positioning member> Next, the guide member and the positioning member provided on the hand 600 will be described. FIG. 8A is a plan view schematically showing the configuration of the hand. FIG. 8B is a perspective view schematically showing the configuration of the guide member. FIG. 8C is a cross-sectional view schematically showing the configuration of the guide member.

[0058] As shown in FIG. 8, the hand 600 includes a plurality (four in this embodiment) of guide members 640. The plurality of guide members 640 are attached to the hand body 620 at a predetermined interval from each other so as to surround the seating area SA. Each of the plurality of guide members 640 has a columnar guide body 641 extending in the vertical direction and a substrate receiving surface 642 formed on the guide body 641 so as to incline downward toward the seating area SA. A support member 644 for supporting the guide body 641 is fixed to the lower surface of the hand body 620. Further, a cylindrical member 645 is attached to the through hole of the hand body 620. The guide body 641 is inserted into the cylindrical member 645 and is supported by the support member 644 via an elastic member 646 (spring member). Thereby, the load applied to the guide body 641 can be absorbed by the elastic member 646.

[0059] Since the substrate receiving surface 642 is formed on the guide body 641, as shown in FIG. 8A, a substrate scooping diameter WC larger than the diameter of the seating area SA is provided. The substrate scooping diameter WC is the diameter of a circle connecting the upper ends of the substrate receiving surfaces 642 of the plurality of guide bodies 641. Even if the substrate is passed outside the seating area SA when the hand 600 receives the substrate from the top ring, the hand 600 can seat the substrate in the seating area SA as long as it is within the range of the substrate scooping diameter WC. This point will be described later in conjunction with the positioning member described below.

[0060] FIG. 9A is a plan view schematically showing the configuration of the hand. FIG. 9B is a perspective view schematically showing the configuration of the positioning member. FIG. 9C is a side view schematically showing the configuration of the positioning member. As shown in FIGS. 9A to 9C, the hand 600 includes a plurality (four in this embodiment) of positioning members 650. The plurality of positioning members 650 are attached to the hand body 620 at a predetermined interval from each other so as to surround the seating area SA. Each of the plurality of positioning members 650 has a positioning portion 652 that contacts the outer edge of the seating area SA. Specifically, each positioning member 650 includes a positioning post 654 formed in a cylindrical shape extending vertically upward from the upper surface of the hand body 620, and the positioning portion 652 is formed on the side surface of the positioning post 654 where the substrate W contacts. By making the positioning member 650 a cylindrical positioning post 654, the contact area between the substrate and the positioning post 654 can be reduced, so that defects on the substrate surface can be reduced.

[0061] As shown in FIG. 9A, the four positioning members 650 are with adjacent positioning members 650 They are arranged so that the intervals are approximately equal. Equalizing the intervals between adjacent positioning members 650 (arranging the four positioning members 650 at 90° intervals) has the effect of suppressing the substrate W from protruding from the hand 600 during the conveyance of the substrate W (especially during horizontal conveyance). In the present embodiment, due to the shape of the hand body 620 (the upper limit of the dimension in the longitudinal direction of the hand body 620), the positioning members 650 are not arranged completely equally, but are arranged approximately equally, so that the substrate W can be suppressed from protruding from the hand 600 during the conveyance of the substrate W. Further, when there is a possibility that the substrate W rides on the positioning member 650 described below, it is also possible to prevent the substrate W from falling from the facing position of the riding portion. Further, as shown in FIG. 9A, the four positioning members 650 are arranged such that the diameter of the circle connecting the respective positioning portions 652 (substrate positioning diameter WP) includes a slight margin with respect to the diameter of the substrate W. Further, as shown in FIG. 9C, the lower end 642a of the substrate receiving surface 642 is formed at a position corresponding to the outer edge of the seating region SA. The diameter of the circle connecting the positioning members 650 needs to be larger than the diameter of the circle connecting the lower end 642a of the substrate receiving surface 642 of the guide member 640. This is because there is a possibility that the substrate W rides on the positioning member 650. Further, the positioning member 650 needs to be located inside the inner diameter of the retainer ring 312. This is to prevent contact with the membrane when delivering the substrate W to the top ring 31.

[0062] According to the present embodiment, when receiving the substrate W from the top ring 31, it is possible to suppress the substrate W from falling from the hand and to position the substrate W in a predetermined seating area SA. That is, when the hand 600 receives the substrate W from the top ring 31, fluid is supplied to the adsorption surface of the substrate W adsorbed to the membrane 320 of the top ring 31, so that the substrate W is detached from the membrane 320. In this case, there is no problem when the substrate W is detached from the membrane 320 while maintaining a horizontal state. However, when only one side of the substrate W is detached from the membrane 320, the substrate W may fall onto the hand 600 in an inclined state. In such a case, according to the present embodiment, one side of the inclined substrate W falls inside the outer edge of the seating area SA. However, since the lever members 634 of the seating members 630-1 to 630-5 protrude into the seating area SA, one side of the substrate W is supported by the seating portion 634-1a of any one of the lever members 634. Subsequently, the opposite side of the substrate W falls. However, since one side is supported by the lever member 634 inside the outer edge of the seating area SA, the opposite side of the substrate W is supported by the substrate receiving surface 642 formed on the guide body 641 at the opposing position. Since the substrate receiving surface 642 is inclined downward toward the seating area SA, the substrate W is seated in the seating area SA as the opposite side of the substrate W slides down the substrate receiving surface 642. At this time, a plurality of positioning members 650 having positioning portions 652 in contact with the outer edge of the seating area SA are arranged around the seating area SA, so that the substrate W is positioned in the seating area SA.

[0063] <Hand support> Next, a mechanism for attaching the hand 600 to the support member 610 will be described. FIG. 10A is a perspective view schematically showing the configuration of the hand and the hand support. FIG. 10B is an enlarged perspective view of the hand support portion of FIG. 10A. As shown in FIGS. 10A and 10B, the first linear transporter 6 includes a hand support 660 for attaching the hand 600 to the support member 610 as shown in FIG. 4. The hand support 660 is a member configured to support the lower surface 620b of the hand body 620 and is fixed to the hand body 620 by bolts 662. The hand support 660 has bolt holes 660a and 660b for fixing the hand support 660 to the support member 610. By fixing the hand support 660 and the support member 610 with bolts, the hand 600 can be attached to the support member 610.

[0064] Note that, in the embodiment of FIG. 10, an example of directly attaching the hand support 660 to the support member 610 is shown, but the present invention is not limited thereto. Hereinafter, hand supports of other embodiments will be described. FIG. 11A is a perspective view schematically showing the attachment of the hand to the support member. FIG. 11B is a perspective view schematically showing the configuration of the hand support. FIG. 11C is a side view and a plan view schematically showing the configuration of the hand support.

[0065] As shown in FIGS. 11A to 11C, the hand support 670 includes a first hand support 672 attached to the hand 600 and a second hand support 674 attached to the support member 610. The first hand support 672 is a plate-like member configured to support the lower surface of the hand body 620. The first hand support 672 has bolt holes 672a for fixing the first hand support 672 to the hand body 620 by bolts.

[0066] The second hand support 674 includes a plate-shaped lower support 674-1 and a plate-shaped upper support 674-3 that are spaced apart, and a connecting member 674-2 that connects both ends thereof, and has a shape like a substantially U-shaped groove. A connecting region 674c into which the first hand support 672 is inserted is formed between the lower support 674-1 and the upper support 674-3. The upper support 674-3 has bolt holes 674-3a and 674-3b for fixing the second hand support 674 to the support member 610 with bolts.

[0067] As shown in FIG. 11C, the hand body 620 is fixed to the first hand support 672 by bolts 662. Further, a pin hole 672b for connecting the first hand support 672 and the second hand support 674 by a pin 675 is formed in the first hand support 672. Further, a tapered surface 672c that tapers toward the second hand support 674 is formed on the bottom surface 672f of the first hand support 672. Further, a notch 672d having a trapezoidal shape in plan view is formed on the side surface 672g of the first hand support 672 on the side of the second hand support 674. A pair of tapered surfaces 672e are formed on the leg portion having a trapezoidal shape in the notch 672d. In the present embodiment, an example in which a notch 672d having a trapezoidal shape in plan view is formed is shown, but the shape of the notch 672d is arbitrary.

[0068] On the other hand, a pin hole 674-1b for connecting the first hand support 672 and the second hand support 674 by a pin 675 is formed in the lower support 674-1. Further, a tapered surface 674-1c that is inclined corresponding to the tapered surface 672c is formed in the connecting region 674c. Specifically, a tapered surface 674-1c that inclines upward toward the connecting member 674-2 is formed on the upper surface 674-1a of the lower support 674-1. The tapered surface 674-1c is inclined corresponding to the tapered surface 672c.

[0069] In addition, in the connection region 674c, a protrusion 674-2d having a tapered surface 674-2e inclined corresponding to a pair of tapered surfaces 672e of the leg portion of the trapezoidal shape of the notch 672d is formed. Specifically, the protrusion 674-2d is formed to protrude from the connection member 674-2 toward the first hand support 672 side. The protrusion 674-2d has a shape corresponding to the notch 672d and is trapezoidal in plan view. A pair of tapered surfaces 674-2e are formed on the leg portion of the trapezoidal shape of the protrusion 674-2d. In this embodiment, an example is shown in which the notch 672d is formed in the first hand support 672 and the protrusion 674-2d is formed in the second hand support 674, but the present invention is not limited to this. For example, a notch may be formed in the second hand support 674, and a protrusion having a shape corresponding to the notch may be formed in the first hand support 672.

[0070] The hand support 670 of the present embodiment can attach the hand 600 to the support member 610 by inserting the first hand support 672 into the connection region 674c and connecting the first hand support 672 and the second hand support 674 with the pin 675. to.

[0071] According to the hand support 670 of the present embodiment, the hand 600 can be attached to the support member 610 at an accurate position in a short time. That is, since there are concerns about wear and the like for the components of the hand 600, particularly the seating members 630-1 to 630-5 that come into contact with the substrate, it is desirable to replace them regularly. In order to perform component replacement, an operation of removing the hand 600 from the support member 610 and then attaching it again to the support member 610 after component replacement occurs. Here, for example, when the hand support 660 is directly attached to the support member 610 as shown in FIG. 10, it is difficult to position the hand 600, and it takes time and the work efficiency is poor to perform the attachment with high accuracy.

[0072] In contrast, according to the hand support 670, when inserting the first hand support 672 into the connection region 674c, the tapered surface 672c is guided by the tapered surface 674-1c, and the pair of tapered surfaces 672e are guided by the tapered surfaces 674-2e. Therefore, the first hand support 672 can be easily positioned at an accurate position within the connection region 674c. And once the first hand support 672 is positioned accurately, the positions of the pin holes 672b and 674-1b are aligned. Thus, by inserting the pin 675, the first hand support 672 and the second hand support 674 can be easily connected without performing bolt tightening. In the present embodiment, an example where the first hand support 672 is attached to the hand 600 and the second hand support 674 is attached to the support member 610 is shown, but it is not limited thereto. The first hand support 672 may be attached to the support member 610 and the second hand support 674 may be attached to the hand 600.

[0073] As described above, several embodiments of the present invention have been explained. However, the above-described embodiments of the invention are for facilitating the understanding of the present invention and do not limit the present invention. The present invention can be modified and improved without departing from its gist, and it goes without saying that equivalents of the present invention are included therein. Also, within the scope of solving at least a part of the above-described problems or achieving at least a part of the effects, any combination or omission of each component described in the claims and the specification is possible.

[0074] This application discloses, as one embodiment, a hand for holding a substrate, the hand including: a hand body; a plurality of seating members attached to the hand body on which the substrate is seated; a plurality of guide members attached to the hand body at a predetermined interval from each other so as to surround a seating area where the substrate is seated; and a plurality of positioning members attached to the hand body at a predetermined interval from each other so as to surround the seating area. Each of the plurality of guide members has a substrate receiving surface that slopes downward toward the seating area, and each of the plurality of positioning members has a positioning portion that contacts the outer edge of the seating area.

[0075] Furthermore, this application discloses, as one embodiment, a hand in which each of the plurality of positioning members includes a positioning post formed in a cylindrical shape.

[0076] Furthermore, this application discloses, as one embodiment, a hand in which each of the plurality of seating members includes a shaft member supported by the hand body and a lever member supported by the shaft member. The lever member includes a first end having a seating portion on which the substrate is seated and a second end provided on the opposite side of the first end with the shaft member interposed therebetween. At least a part of the plurality of seating members further includes a biasing member for applying a force to the lever member to rotate the lever member so that the second end moves downward, and a seating sensor configured to detect that the second end has moved upward.

[0077] Furthermore, this application discloses, as one embodiment, a hand in which a magnet is provided at the second end of the lever member, and the seating sensor includes a magnetic sensor for detecting that the magnet has moved upward.

[0078] Furthermore, this application discloses, as one embodiment, a hand in which the seating sensor includes an optical sensor having a light projecting component and a light receiving component, and the lever member is supported by the shaft member so as to shield between the light projecting component and the light receiving component when the second end moves upward.

[0079] Furthermore, in one embodiment, the present application discloses a hand, wherein a first electrical contact is provided at the second end of the lever member, and the seating sensor includes an electrical sensor having a second electrical contact that contacts the first electrical contact when the second end moves upward.

[0080] Furthermore, in one embodiment, the present application discloses a hand, wherein at least a part of the plurality of seating members further includes a housing configured to cover the second end of the lever member and the seating sensor.

[0081] Furthermore, in one embodiment, the present application discloses a hand, wherein the plurality of seating members are attached to the hand body at a predetermined interval from each other so as to surround a seating area where the substrate is seated, and the lever member is supported by the shaft member such that the first end protrudes into the seating area.

[0082] Furthermore, in one embodiment, the present application discloses a hand, wherein each of the plurality of seating members includes a bearing for supporting both ends of the shaft member and an elastic member for supporting the bearing.

[0083] Furthermore, in one embodiment, the present application further includes a support member for supporting the hand and a hand support for attaching the hand to the support member. The hand support includes a first hand support attached to either the hand or the support member, and a second hand support attached to the other of the hand and the support member. A tapered surface that tapers toward the second hand support is formed on the bottom surface of the first hand support, and the second hand support has a connection region into which the first hand support is inserted. A tapered surface that is inclined corresponding to the tapered surface of the first hand support is formed in the connection region.

[0084] Furthermore, in one embodiment, the present application discloses a hand in which a notch is formed on a side surface of the first hand support on the second hand support side, and a protrusion having a tapered surface inclined corresponding to the tapered surface formed in the notch is formed in the connection region.

[0085] Furthermore, in one embodiment, the present application discloses a conveying device including the hand according to any one of the above and a drive mechanism for moving the hand.

[0086] Furthermore, in one embodiment, the present application discloses a substrate processing device including a polishing device configured to polish a substrate, a cleaning device configured to clean the substrate, and the conveying device according to any one of the above configured to convey the substrate processed by the polishing device or the cleaning device.

Description of Reference Numerals

[0087] 6 First linear transporter (conveying device) 7 Second linear transporter (conveying device) 600 Hand 600-1 First hand 600-2 Second hand 600-3 Third hand 600-4 Fourth hand 610 Support member 620 Hand body 630 Seating member 631 Pedestal 632 Shaft member 634 Lever member 634-1 First end 634-1a Seating portion 634-2 Second end 634-2a Magnet 635 Elastic member 636 Biasing member 638 Seating sensor 639 Housing 640 Guide member 641 Guide body 642 Substrate receiving surface 680 Driving mechanism 650 Positioning member 652 Positioning part 654 Positioning post 660 Hand support 670 Hand support 672 First hand support 672c Tapered surface 672d Notch 672e Tapered surface 672f Bottom surface 672g Side surface 674 Second hand support 674-1c Tapered surface 674-2d Protrusion 674-2e Tapered surface 674c Connection region 1000 CMP apparatus SA Seating area W Substrate

Claims

1. A hand for holding a substrate, wherein the hand includes a hand body, a plurality of seating members attached to the hand body on which the substrate is seated, and a plurality of guide members attached to the hand body at a predetermined interval from each other so as to surround a seating area where the substrate is seated, and a plurality of positioning members attached to the hand body at a predetermined interval from each other so as to surround the seating area, each of the plurality of guide members has a substrate receiving surface that slopes downward toward the seating area, each of the plurality of positioning members has a positioning portion that contacts the outer edge of the seating area, each of the plurality of seating members includes a shaft member supported by the hand body, and a lever member supported by the shaft member, the lever member including a first end having a seating portion on which the substrate is seated, and a second end provided on the opposite side of the first end with the shaft member interposed therebetween, each of the plurality of seating members includes a bearing for supporting both ends of the shaft member, and an elastic member for supporting the bearing, and is provided with, a hand.

2. each of the plurality of positioning members includes a positioning post formed in a cylindrical shape, The hand according to claim 1.

3. At least a part of the plurality of seating members further includes a biasing member for applying a force to the lever member to rotate the lever member so that the second end moves downward, and a seating sensor configured to detect that the second end has moved upward, The hand according to claim 1 or 2.

4. a magnet is provided at the second end of the lever member, the seating sensor includes a magnetic sensor that detects that the magnet has moved upward, The hand according to claim 3.

5. the seating sensor includes an optical sensor having a light emitting component and a light receiving component, the lever member is supported by the shaft member so as to block between the light emitting component and the light receiving component when the second end moves upward, The hand according to claim 3.

6. a first electrical contact is provided at the second end of the lever member, the seating sensor includes an electrical sensor having a second electrical contact that contacts the first electrical contact when the second end moves upward, The hand according to claim 3.

7. At least a part of the plurality of seating members further includes a housing configured to cover the second end of the lever member and the seating sensor. The hand according to any one of claims 3 to 6.

8. The plurality of seating members are attached to the hand body at a predetermined interval from each other so as to surround a seating area on which the substrate is seated. The lever member is supported by the shaft member such that the first end projects into the seating area. The hand according to any one of claims 1 to 7.

9. A hand for holding a substrate, The hand includes a hand body, a plurality of seating members attached to the hand body on which the substrate is seated, a plurality of guide members attached to the hand body at a predetermined interval from each other so as to surround a seating area on which the substrate is seated, and a plurality of positioning members attached to the hand body at a predetermined interval from each other so as to surround the seating area. Each of the plurality of guide members has a substrate receiving surface that slopes downward toward the seating area. Each of the plurality of positioning members has a positioning portion that contacts the outer edge of the seating area. The hand A support member for supporting the hand, A hand support for attaching the hand to the support member, Further includes The hand support includes a first hand support attached to either the hand or the support member, and a second hand support attached to the other of the hand and the support member. A tapered surface that tapers toward the second hand support is formed on the bottom surface of the first hand support. The second hand support has a connection area into which the first hand support is inserted, and a tapered surface that is inclined corresponding to the tapered surface of the first hand support is formed in the connection area. Hand

10. A notch is formed in the side surface of the first hand support on the side of the second hand support. A protrusion having a tapered surface that is inclined corresponding to the tapered surface formed in the notch is formed in the connection area. The hand according to claim 9.

11. The hand according to any one of claims 1 to 10, and A drive mechanism for moving the hand, Including, a transfer device.

12. A polishing device configured to polish a substrate A cleaning device configured to clean a substrate, The transfer device according to claim 11, configured to transfer a substrate processed by the polishing device or the cleaning device, A substrate processing apparatus comprising:

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