Gas chromatograph processing device and heat countermeasure method therefor

Abstract

To reduce heat transfer from a catalytic part to a valve part in a processing device for gas chromatograph.SOLUTION: A processing device 100 for gas chromatograph for oxidizing or redoxing gas components separated by a column 11 of a gas chromatograph 10, includes a catalytic part 2 having an oxidation catalyst and a reduction catalyst, a valve part 3 switching a pathway between an oxidation pathway L1 guiding the gas components to the oxidation catalyst and a redox pathway L2 guiding the gas components to the oxidation catalyst and the reduction catalyst, and a partition part 6 provided between the catalytic part 2 and the valve part 3 for partitioning between the catalytic part 2 and the valve part 3.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present invention relates to a gas chromatograph processing device and a thermal management method therefor. [Background technology]

[0002] BACKGROUND ART Conventionally, as shown in Patent Document 1, a gas chromatograph processing device has been considered that oxidizes or oxidizes / reduces gas components separated by a column of a gas chromatograph and leads the gas components to a detector such as an FID detector.

[0003] This gas chromatograph processing device comprises a catalyst section having an oxidation catalyst and a reduction catalyst, and a valve section that switches between a flow path that flows the separated gas components only through the oxidation catalyst and a flow path that flows the separated gas components through both the oxidation catalyst and the reduction catalyst. By switching the flow path using the valve section, the separated gas components are oxidized or oxidized / reduced depending on the component being processed.

[0004] However, in the catalyst section, the oxidation catalyst and reduction catalyst are heated to a desired catalyst temperature (for example, 400°C), and the heat from the catalyst section is transferred to the valve section, which may cause the valve section to exceed its heat resistance temperature and break down. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] International Publication No. WO2015 / 083794 Summary of the Invention [Problem to be solved by the invention]

[0006] Therefore, the present invention has been made in consideration of the above-mentioned problems, and its main objective is to reduce the heat transfer from the catalyst section having an oxidation catalyst and a reduction catalyst to the valve section in a gas chromatograph processing device. [Means for solving the problem]

[0007] That is, the gas chromatograph processing device of the present invention is a gas chromatograph processing device that oxidizes or redoxes gas components separated by a gas chromatograph column, and is characterized by comprising: a catalyst unit having an oxidation catalyst and a reduction catalyst; a valve unit that switches between an oxidation path that guides the gas components to the oxidation catalyst or an oxidation-reduction path that guides the gas components to the oxidation catalyst and the reduction catalyst; and a partition unit that is provided between the catalyst unit and the valve unit and that separates the catalyst unit from the valve unit.

[0008] In such a gas chromatograph processing apparatus, a partition is provided between the catalyst unit and the valve unit to separate them, thereby reducing heat transfer from the catalyst unit to the valve unit. As a result, the valve unit can be prevented from exceeding its heat-resistant temperature. For example, when oxidizing and reducing chlorine compounds, the catalyst temperature must be raised to 600°C to ensure 100% reaction. However, by providing the partition, heat transfer from the catalyst unit to the valve unit is reduced, allowing the valve unit to be kept below its heat-resistant temperature. In a configuration without a partition, if the catalyst temperature is raised to 600°C, heat transfer from the catalyst unit to the valve unit would heat the valve unit to approximately 200°C, exceeding the valve unit's heat-resistant temperature. Furthermore, by providing the partition, the temperature of the valve section can be controlled to a constant value regardless of heat from the catalyst section, and changes in the flow rate due to changes in the temperature of the valve section can be prevented. When gas components oxidized or oxidized-reduced by the gas chromatograph processing device are detected with a detector such as an FID detector, baseline noise or drift can be reduced, and a decrease in minimum detection sensitivity due to increased noise can be prevented.

[0009] As a specific embodiment of the partition section, the gas chromatograph processing device of the present invention further comprises a first cover body covering the catalyst section and a second cover body covering the valve section, and it is desirable that at least one of the first cover body or the second cover body has the partition section. By covering the catalyst section with the first cover body and the valve section with the second cover body in this way, the accommodation space for the catalyst section and the accommodation space for the valve section can be separated, which makes it possible to suppress heat transfer from the catalyst section to the valve section and to easily control the temperatures of the catalyst section and the valve section, respectively.

[0010] It is desirable that the first cover body and the second cover body each have the partition portion, and that the partition portion of the first cover body and the partition portion of the second cover body are arranged at a predetermined distance from each other. With this configuration, an air layer can be formed between the partitions of the first and second cover bodies, which also improves the heat insulating effect, making it even more difficult for heat from the catalyst section to be transmitted to the valve section.

[0011] In order to make it difficult for heat from the catalyst section to be transmitted to the valve section, a heat insulating material may be provided between the partition section of the first cover body and the partition section of the second cover body.

[0012] In order to adjust the temperature of the catalyst section or the valve section to a desired temperature, it is desirable that the catalyst section has a catalyst temperature adjustment section, or the valve section has a valve temperature adjustment section.

[0013] As a specific arrangement of the valve section, it is desirable that the valve section be provided above the catalyst section. If the valve section is provided above the catalyst section, heat from the catalyst section is likely to be transferred to the valve section by convection, but by providing a partition section as in the present invention, heat from the catalyst section is less likely to be transferred to the valve section.

[0014] As for the peripheral structure of the catalyst unit and the valve unit, a pipe constituting the oxidation path or the oxidation-reduction path is provided between the catalyst unit and the valve unit. In order to avoid this pipe and to make it difficult for heat from the catalyst unit to be transmitted to the valve unit by providing a partition unit between the catalyst unit and the valve unit, it is desirable that a slit be formed in the partition unit to avoid the pipe.

[0015] As a specific configuration for supporting the catalyst section and the valve section, the gas chromatograph processing apparatus of the present invention may further include a support for supporting the catalyst section and the valve section. In this configuration, in order to prevent heat from the catalyst section from being transmitted to the valve section via the support, it is desirable to provide a heat insulating section between the catalyst section and the support, or between the valve section and the support.

[0016] Furthermore, the thermal management method for a gas chromatograph processing device according to the present invention is a thermal management method for a gas chromatograph processing device that oxidizes or oxidizes / reduces gas components separated by a gas chromatograph column, and is characterized in that a partition is provided between a catalyst section having an oxidation catalyst and a reduction catalyst and a valve section that switches between an oxidation path that leads the gas components to the oxidation catalyst or an oxidation / reduction path that leads the gas components to the oxidation catalyst and the reduction catalyst, to separate the catalyst section and the valve section. [Effects of the Invention]

[0017] According to the present invention as described above, in a gas chromatograph processing apparatus, it is possible to reduce the heat transfer from the catalyst section to the valve section. [Brief explanation of the drawings]

[0018] [Figure 1] 1 is a diagram schematically illustrating the configuration of a gas chromatograph processing device according to one embodiment of the present invention. [Figure 2] FIG. 2 is a diagram schematically illustrating a flow path configuration of the gas chromatograph processing device of the embodiment. [Figure 3]FIG. 2 is a schematic diagram showing (a) an oxidation pathway L1 and (b) an oxidation-reduction pathway L2 in the same embodiment. [Figure 4] 2A is a cross-sectional view seen from the front, schematically showing the specific configuration of a gas chromatograph processing device according to the embodiment, and FIG. 2B is a control block diagram. [Figure 5] 2 is a cross-sectional side view schematically showing a specific configuration of the gas chromatograph processing device of the embodiment. FIG. [Figure 6] 3 is a perspective view schematically showing the configuration of (a) a first cover body and (b) a second cover body of the embodiment. FIG. DETAILED DESCRIPTION OF THE INVENTION

[0019] A gas chromatograph processing apparatus according to one embodiment of the present invention will be described below with reference to the drawings. Note that, for ease of understanding, all of the drawings shown below are drawn in a schematic manner, with appropriate omissions or exaggerations. Identical components are designated by the same reference numerals, and their description will be omitted where appropriate.

[0020] <Device configuration> The gas chromatograph processing device 100 of this embodiment is provided, for example, between a column 11 and a detector 12 of a gas chromatograph 10 that analyzes a sample gas, and oxidizes or redoxes gas components (hereinafter referred to as separated components) separated by the column 11 and delivers them to the detector 12. The detector 12 can be changed as appropriate depending on the type of sample gas, such as a flame ionization detector (FID), a thermal conductivity detector (TCD), or a thermionic ionization detector (FTD).

[0021] 1, this gas chromatograph processing device 100 is attached to the top surface of an oven 13 that heats, for example, a column 11 of a gas chromatograph 10. As shown in FIGS. 1 and 2, the gas chromatograph processing device 100 has an inlet port P1 into which separated components are introduced from the column 11, and an outlet port P2 from which oxidized or redox separated components are discharged to a detector 12 of the gas chromatograph 10. The inlet port P1 and the outlet port P2 are connected by pipes H1 to H5 that form an oxidation pathway L1 (see FIG. 3(a)) and an oxidation-reduction pathway L2 (see FIG. 3(b)), which will be described later.

[0022] Specifically, as shown in Figures 2 to 5, the gas chromatograph processing device 100 includes a catalyst unit 2 having an oxidation catalyst and a reduction catalyst, and a valve unit 3 that switches between an oxidation path L1 (see Figure 3(a)) that guides the separated components only to the oxidation catalyst, and an oxidation-reduction path L2 (see Figure 3(b)) that guides the separated components to both the oxidation catalyst and the reduction catalyst. The catalyst unit 2 and the valve unit 3 are housed in a housing C that has, for example, a rectangular parallelepiped shape, as shown in Figures 4 and 5.

[0023] The catalyst section 2 has an oxidation catalyst section 21 in which an oxidation catalyst is filled in the flow path through which the separated components flow, a reduction catalyst section 22 in which a reduction catalyst is filled in the flow path through which the separated components flow, and a catalyst temperature control section 23 for controlling the temperature of the oxidation catalyst and the reduction catalyst.

[0024] Here, the oxidation catalyst is a metal catalyst made of a high-valence metal such as palladium (Pd) or platinum (Pt), or a metal oxide such as copper oxide. The oxidation catalyst oxidizes the separated components, such as hydrocarbons and alcohols, and promotes the reaction that generates carbon dioxide (CO2) and other gases.

[0025] The reduction catalyst is a metal catalyst made of, for example, nickel, ruthenium, or rhodium, etc. The reduction catalyst promotes the reaction of reducing the carbon dioxide (CO2) to produce, for example, methane (CH4).

[0026] The upstream end of the oxidation catalyst section 21 is connected to an inlet port P1 into which the separated components are introduced, and the downstream end of the oxidation catalyst section 21 is connected via a valve section 3 to an outlet port P2.

[0027] 2 and 3, the upstream end of the oxidation catalyst unit 21 and the inlet port P1 are connected by a first connecting pipe H1, and the downstream end of the oxidation catalyst unit 21 and the valve unit 3 are connected by a second connecting pipe H2. Here, the oxidation catalyst unit 21 is configured to be detachable from the first connecting pipe H1 and the second connecting pipe H2, allowing the oxidation catalyst unit 21 to be replaced. The valve unit 3 and the outlet port P2 are connected by a third outlet pipe H3.

[0028] An oxidation gas inlet passage 4 for introducing an oxidation gas such as air for oxidizing the separated components is connected to the first connection pipe H1, which is upstream of the oxidation catalyst section 21. The oxidation gas inlet passage 4 is provided with a flow rate controller (MFC) 41 for controlling the flow rate of the oxidation gas.

[0029] An upstream end of the reduction catalyst section 22 is connected to the oxidation catalyst section 21 via the valve section 3, and a downstream end of the reduction catalyst section 22 is connected to the outlet port P2 via the valve section 3.

[0030] 2 and 3, the upstream end of the reduction catalyst unit 22 and the valve unit 3 are connected by a fourth connection pipe H4, and the downstream end of the reduction catalyst unit 22 and the valve unit 3 are connected by a fifth connection pipe H5. Here, the reduction catalyst unit 22 is configured to be detachable from the fourth connection pipe H4 and the fifth connection pipe H5, and the reduction catalyst unit 22 can be replaced.

[0031] Furthermore, a reducing gas introduction path 5 for introducing a reducing gas such as hydrogen for reducing the separated components is connected to the pipe between the oxidation catalyst section 21 and the reduction catalyst section 22, here the second connection pipe H2. The reducing gas introduction path 5 is provided with a flow rate controller (MFC) 51 for controlling the flow rate of the reducing gas.

[0032] The catalyst temperature adjustment section 23 is provided around the oxidation catalyst section 21 that houses the oxidation catalyst and the reduction catalyst section 22 that houses the reduction catalyst, and adjusts the temperatures of the oxidation catalyst and the reduction catalyst to a desired catalyst temperature (for example, 400 to 600°C).

[0033] 4 and 5, the catalyst temperature adjustment unit 23 includes a heating block 231 provided in contact with the oxidation catalyst unit 21 and the reduction catalyst unit 22, and a heating unit 232, such as a cartridge heater, built into the heating block 231. The heating unit 232 is controlled by a control unit CTL. Specifically, the control unit CTL controls the amount of heat generated by the heating unit 232 by controlling an adjuster AD (e.g., a semiconductor control element such as a solid-state relay (SSR)) that adjusts the current or voltage supplied from a power source E based on the temperature detected by a temperature sensor TS provided in the heating block 231. As a result, the temperatures of the oxidation catalyst and the reduction catalyst are adjusted to the desired catalyst temperatures by the heating unit 232 via the heating block 231.

[0034] The valve section 3 switches between an oxidation line L1 (see Figure 3(a)) in which the separated components flow only through the oxidation catalyst section 21, and an oxidation-reduction line L2 (see Figure 3(b)) in which the separated components flow through the oxidation catalyst section 21 and the reduction catalyst section 22.

[0035] 2 and 3, the valve section 3 has a first connection port 3p1 to which the second connection pipe H2 downstream of the oxidation catalyst section 21 is connected, a second connection port 3p2 to which the fourth connection pipe H4 upstream of the reduction catalyst section 22 is connected, a third connection port 3p3 to which the fifth connection pipe H5 downstream of the reduction catalyst section 22 is connected, a fourth connection port 3p4 to which the third connection pipe H3 is connected for delivering the oxidized or oxidized-reduced separated components to the detector 12, and a valve mechanism 31 that switches which of the connection ports 3p1 to 3p4 are connected. The valve mechanism 31 may be configured to manually switch which connection ports 3p1 to 3p4 are connected, or may be configured to automatically switch which connection ports 3p1 to 3p4 are connected under the control of a control section.

[0036] Specifically, as shown in FIG. 3(a), the valve mechanism 31 connects the first connection port 3p1 and the fourth connection port 3p4, so that the separated components that have passed through the oxidation catalyst section 21 and been oxidized are guided to the third connection pipe H3 and discharged from the discharge port P2 without flowing to the reduction catalyst section 22 (oxidation path L1).

[0037] Furthermore, as shown in FIG. 3(b), the valve mechanism 31 connects the first connection port 3p1 with the second connection port 3p2 and connects the third connection port 3p3 with the fourth connection port 3p4, so that the separated components that have passed through the oxidation catalyst section 21 and been oxidized flow to the reduction catalyst section 22, are reduced while passing through the reduction catalyst section 22, are led to the third connection pipe H3, and are discharged from the discharge port P2 (oxidation-reduction path L2).

[0038] The valve section 3 also has a valve temperature regulator 33 for regulating the temperature of a flow path block 32 provided with internal flow paths that communicate the valve mechanism 31 and the connection ports 3p1 to 3p4. The valve temperature regulator 33 is provided around the valve mechanism 31 and the flow path block 32, and regulates the temperatures of the valve mechanism 31 and the flow path block 32 to desired temperatures.

[0039] Specifically, the valve temperature regulator 33 regulates the temperature to a temperature (100°C) at which condensation does not occur in the valve section 3, and as shown in Figures 4 and 5, it has a heating block 331 provided in contact with the valve mechanism 31 and the flow path block 32, and a heating section 332 such as a cartridge heater built into the heating block 331. The current or voltage supplied to the heating section 332 is controlled by a control section (not shown), and the heating section 332 regulates the temperatures of the valve mechanism 31 and the flow path block 32 to desired temperatures via the heating block 331. The heating block 331 is provided with a temperature sensor (not shown) for controlling the temperature.

[0040] <Partition configuration> The gas chromatograph processing apparatus 100 of this embodiment has a configuration that makes it difficult for heat to be transferred from the catalyst section 2 to the valve section 3. Specifically, as shown in Figures 4 and 5, the gas chromatograph processing apparatus 100 includes a partition section 6 that is provided between the catalyst section 2 and the valve section 3 and that partitions the catalyst section 2 from the valve section 3, thereby reducing heat transfer from the catalyst section 2 to the valve section 3.

[0041] In this embodiment, the catalyst section 2 and the valve section 3 are configured such that the catalyst section 2 is arranged below and the valve section 3 is arranged above in the up-down direction (vertical direction), and the partition section 6 is arranged, for example, along the horizontal direction between the catalyst section 2 and the valve section 3 arranged above and below.

[0042] In this embodiment, the device further includes a first cover body 7 that covers the catalyst section 2 and a second cover body 8 that covers the valve section 3, and each of the first cover body 7 and the second cover body 8 is configured to have a partition section 6.

[0043] Specifically, as shown in Figures 4, 5 and 6(a), the first cover body 7 covers the periphery (front side and both left and right sides) of the catalyst section 2 excluding the rear side, and the upper side of the catalyst section 2. An upper wall section 7a of this first cover body 7 covering the upper side of the catalyst section 2 becomes the partition section 6 arranged between the catalyst section 2 and the valve section 3. The material of the first cover body 7 may be a metal with low thermal conductivity (or high thermal insulation), such as stainless steel, or may be an insulating material, such as quartz, glass wool or glass fiber.

[0044] 4, 5, and 6(b), the second cover body 8 covers the periphery (front side and both left and right sides) of the valve section 3 excluding the rear side, and the underside of the valve section 3. The lower wall section 8a of this second cover body 8 covering the underside of the valve section 3 becomes the partition section 6 arranged between the catalyst section 2 and the valve section 3. The material of the second cover body 8 may be a metal with low thermal conductivity (or high thermal insulation), such as stainless steel, or may be an insulating material, such as quartz, glass wool, or glass fiber.

[0045] The partition section 6 (lower wall section 7a) of the first cover body 7 and the partition section 6 (upper wall section 8a) of the second cover body 8 are formed with linear slits S, for example extending in the front-to-rear direction, to avoid the piping connecting the catalyst section 2 and the valve section 3 (for example, the above-mentioned connecting piping H2, H4, H5, etc.). In this embodiment, the slits S formed in the partition section 6 of the first cover body 7 and the slits S formed in the partition section 6 of the second cover body 8 have the same shape, and two slits S are formed on each side. Multiple pipes can be inserted into each slit S. Here, the piping between the catalyst section 2 and the valve section 3 (for example, the above-mentioned connecting piping H2, H4, H5, etc.) is bent so that it is arranged in a row when viewed from the front, to make it easier to insert the piping into the linear slits S.

[0046] Furthermore, the partitions 6 of the first cover body 7 and the partitions 6 of the second cover body 8 are arranged with a predetermined distance between them. With this configuration, an air layer AL is formed between the partitions 6 of the first cover body 7 and the partitions 6 of the second cover body 8, improving heat insulation. Note that a heat insulating material such as quartz, glass wool, or glass fiber may be provided between the partitions 6 of the first cover body 7 and the partitions 6 of the second cover body 8.

[0047] Furthermore, in this embodiment, as shown in Fig. 5, the catalyst section 2 and the valve section 3 are supported on their rear sides by a support 9. The support 9 is fixed inside the housing C. Heat insulating sections 91, 92 are provided between at least the catalyst section 2 or the valve section 3 and the support 9. The heat insulating sections 91, 92 may be made of a heat insulating material such as quartz or glass wool. This makes it difficult for heat from the catalyst section 2 to be transmitted to the valve section 3 via the support 9.

[0048] Additionally, the first cover body 7 and the second cover body 8 are fixed to the support body 9 with screws. Fixing slits 8S are formed in the left and right side walls of the second cover body 8 so that it can be slid and temporarily fixed without removing the screws from the support body 9. This makes it easier to attach the second cover body 8.

[0049] <Effects of this embodiment> In the gas chromatograph processing apparatus 100 of this embodiment configured as described above, the partition unit 6 is provided between the catalyst unit 2 and the valve unit 3, separating the catalyst unit 2 and the valve unit 3. This reduces heat transfer from the catalyst unit 2 to the valve unit 3. As a result, the valve unit 3 is prevented from exceeding its heat-resistant temperature. For example, when a chlorine compound or the like needs to be oxidized and reduced, the catalyst temperature needs to be raised to 600°C to ensure 100% reaction. However, by providing the partition unit 6, heat transfer from the catalyst unit 2 to the valve unit 3 is reduced, allowing the valve unit 3 to be kept below its heat-resistant temperature (e.g., 225°C). In a configuration without the partition unit 6, when the catalyst temperature is raised to 600°C, heat transfer from the catalyst unit 2 to the valve unit 3 heats the valve unit 3 to approximately 200°C, resulting in the valve unit 3 being heated to above its heat-resistant temperature.

[0050] Furthermore, by providing the partition section 6, the temperature of the valve section 3 can be controlled to a constant temperature regardless of the heat from the catalyst section 2, and it is possible to prevent changes in flow rate due to temperature changes in the valve section 3. When components oxidized or oxidized-reduced by the gas chromatograph processing device 100 are detected by a detector 12 such as an FID detector, it is possible to reduce baseline noise or drift, and it is possible to prevent a decrease in minimum detection sensitivity due to an increase in noise.

[0051] Furthermore, in the housing C that houses the catalyst unit 2 and the valve unit 3 with the catalyst unit 2 located below and the valve unit 3 located above, a partition unit 6 is provided between the catalyst unit 2 and the valve unit 3, so that the top surface C1 of the housing C can be prevented from becoming too hot due to heat from the catalyst unit 2. In addition, because the catalyst unit 2 is covered with the first cover body 7, it is also possible to prevent the side surface of the housing C from becoming too hot. This improves the safety of the processing apparatus 100.

[0052] <Other embodiments> For example, in the above embodiment, the partition section is provided on each of the first cover body and the second cover body, but the partition section may be provided on either the first cover body or the second cover body. Also, the partition section may be divided into two in a plane, one of the divided sections may be provided on the first cover body, and the other of the divided sections may be provided on the second cover body, so that the first cover body and the second cover body form a single partition section.

[0053] Alternatively, the first and second cover bodies may not be provided, and a partition such as a partition plate may be provided between the catalyst section 2 and the valve section 3. In this case, the partition may be made of a metal with low thermal conductivity (or high thermal insulation), such as stainless steel, or an insulating material such as quartz, glass wool, or glass fiber.

[0054] Furthermore, in the above embodiment, the first cover body and the second cover body are provided, but it is also possible to provide a configuration in which one of the first cover body and the second cover body is not provided.

[0055] Furthermore, the partitioning portion may be provided on the first cover body and the second cover body, or may be provided separately from them.

[0056] Furthermore, in the above embodiment, the catalyst section and the valve section are arranged vertically, but the positional relationship between the catalyst section and the valve section is not limited to this, and they may be arranged, for example, horizontally or upside down.

[0057] Additionally, although the valve temperature adjusting section in the above embodiment is configured to adjust the temperature of the valve section by heating, it may also be configured to have a cooling section for adjusting the temperature of the valve section to a constant temperature.

[0058] In addition, various modifications and combinations of the embodiments may be made as long as they do not go against the spirit of the present invention. [Explanation of symbols]

[0059] 100 Gas chromatograph processing device 10. Gas chromatograph 11. Column 21. Oxidation catalyst section 22 Reduction catalyst section 2. Catalyst section L1···oxidative pathway L2···redox pathway 3. Valve section 6. Partition 7. First cover body 8 Second cover body H1~H5...piping S...slit 23...Temperature control section for catalyst 33. Valve temperature control unit 9...Support 91....Insulation section

Claims

1. A gas chromatograph processing device for oxidizing or redox-oxidizing a gas component separated by a column of a gas chromatograph, comprising: a catalyst section having an oxidation catalyst and a reduction catalyst; a valve unit that switches between an oxidation path that guides the gas component to the oxidation catalyst and an oxidation-reduction path that guides the gas component to the oxidation catalyst and the reduction catalyst; a first cover body that covers the catalyst portion; a second cover body that covers the valve portion; a partition section provided between the catalyst section and the valve section to separate the catalyst section and the valve section, The gas chromatograph processing apparatus, wherein the first cover body and the second cover body each have the partition portion.

2. 2. The gas chromatograph processing apparatus according to claim 1, wherein the partition portion of the first cover body and the partition portion of the second cover body are disposed at a predetermined distance from each other.

3. 3. The gas chromatograph processing apparatus according to claim 2, wherein a heat insulating material is provided between the partition portion of the first cover body and the partition portion of the second cover body.

4. 4. The gas chromatograph processing apparatus according to claim 1, wherein the catalyst section includes a catalyst temperature regulator, or the valve section includes a valve temperature regulator.

5. The gas chromatograph processing apparatus according to claim 1 , wherein the valve section is provided above the catalyst section.

6. a pipe constituting the oxidation path or the oxidation-reduction path is provided between the catalyst unit and the valve unit, The gas chromatograph processing apparatus according to claim 1 , wherein the partition section is formed with a slit for avoiding the piping.

7. a support member for supporting the catalyst portion and the valve portion, The gas chromatograph processing apparatus according to claim 1 , further comprising a heat insulating section provided between the catalyst section and the support, or between the valve section and the support.

8. A thermal management method for a gas chromatograph processing device that oxidizes or oxidizes / reduces gas components separated by a column of the gas chromatograph, comprising: a partition section for separating the catalyst section from the valve section is provided between a catalyst section having an oxidation catalyst and a reduction catalyst and a valve section for switching between an oxidation path for guiding the gas component to the oxidation catalyst and an oxidation-reduction path for guiding the gas component to the oxidation catalyst and the reduction catalyst, A thermal control method for a gas chromatograph processing device, comprising covering the catalyst section with a first cover body, covering the valve section with a second cover body, and providing the partition section on each of the first cover body and the second cover body, thereby reducing the transfer of heat from the catalyst section to the valve section.

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