Shutter device, lithography device, and article manufacturing method

Abstract

To provide a technique advantageous in improving rigidity of shutter blades.SOLUTION: A shutter device that allows exposure light to pass or blocks the light comprises: a rotation source which drives to rotate a rotation axis; a hub connected to the rotation axis; and shutter blades fixed to the hub, where the hub has a holding face holding the shutter blades, the holding face includes a first region and a second region which do not belong to the same plane, the shutter blades are fixed to the hub by a first fastening part in the first region and fixed to the hub by a second fastening part in the second region.SELECTED DRAWING: Figure 4

Description

[Technical Field]

[0001] The present invention relates to a shutter device, a lithography device and a method for manufacturing an article. [Background technology]

[0002] In a lithography method for manufacturing an article such as a semiconductor device, an exposure apparatus may be used to transfer a pattern from a master to a substrate. In the exposure apparatus, a shutter device may be used to control the exposure time or exposure dose. The shutter device includes shutter blades that block exposure light. A state in which the exposure light is blocked by the shutter blades is a non-irradiation state in which the substrate is not irradiated with the exposure light, while a state in which the exposure light is not blocked by the shutter blades is an irradiation state in which the substrate is irradiated with the exposure light. The shutter device can switch between the non-irradiation state and the irradiation state by rotating the shutter blades with a rotating source. To improve the throughput of the exposure apparatus, it is necessary to increase the rotational speed of the shutter blades, which can require the shutter blades to be lighter. However, reducing the shutter blade weight can reduce the rigidity of the shutter blades.

[0003] Patent Document 1 describes a shutter blade device in which the shutter blade is fixed to the rotating shaft of a motor while being sandwiched between a boss and a presser plate. The shutter blade is fixed by a bolt that threads into the boss and the presser plate. The boss has a first pressing member that includes two first pressing portions that press a first surface of the shutter blade. The presser plate has a second pressing member that includes a second pressing portion that presses a second surface of the shutter blade. The second pressing portion is located at a position corresponding to the position between the two first pressing portions, causing the shutter blade to deform, thereby increasing the rigidity of the shutter blade. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2008-141016 Summary of the Invention [Problem to be solved by the invention]

[0005] In the configuration described in Patent Document 1, the first and second pressing portions for deforming the shutter blades are located away from the bolts, which limits the force that can be applied to the shutter blades by the first and second pressing portions, potentially limiting the deformation of the shutter blades and the resulting improvement in rigidity.

[0006] An object of the present invention is to provide an advantageous technique for improving the rigidity of a shutter blade. [Means for solving the problem]

[0007] One aspect of the present invention relates to a shutter device that allows exposure light to pass through or blocks it, the shutter device comprising a rotation source that rotates a rotating shaft, a hub connected to the rotating shaft, and shutter blades fixed to the hub, the hub having a holding surface that holds the shutter blades, the holding surface including a first region and a second region that do not belong to the same plane, the shutter blades being fixed to the hub in the first region by a first fastening portion and in the second region by a second fastening portion. [Effects of the Invention]

[0008] According to the present invention, an advantageous technique is provided for improving the rigidity of the shutter blades. [Brief explanation of the drawings]

[0009] [Figure 1] FIG. 1 is a diagram showing the configuration of an exposure apparatus (lithography apparatus) according to an embodiment. [Figure 2] FIG. 1 is a diagram showing the configuration of a shutter device according to an embodiment. [Figure 3] FIG. 2 is a diagram showing the structure of a hub according to an embodiment. [Figure 4] FIG. 1 is a diagram showing the configuration of a shutter device according to an embodiment. [Figure 5] 10 is an exaggerated view of the deformed shutter blades. [Figure 6] FIG. [Figure 7] FIG. [Figure 8] FIG. 10 is a diagram showing a third modified example. [Figure 9] FIG. 10 is a diagram showing a fourth modified example. [Figure 10] FIG. 10 is a diagram showing a fifth modified example. [Figure 11] FIG. 10 is a diagram showing a sixth modified example. [Figure 12] FIG. 13 is a diagram showing a seventh modified example. DETAILED DESCRIPTION OF THE INVENTION

[0010] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the scope of the invention claimed. Although multiple features are described in the embodiments, not all of these multiple features are necessarily essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same reference numerals are used to designate the same or similar components, and redundant explanations will be omitted.

[0011] 1 shows the configuration of an exposure apparatus 100 according to one embodiment. The exposure apparatus 100 is an example of a lithography apparatus that uses light to transfer a pattern of an original 2 onto a substrate 3. In addition to an exposure apparatus, other examples of lithography apparatuses include an imprint apparatus.

[0012] The exposure apparatus 100 may include a light source 1, a shutter device 4, an original stage 5, a projection optical system 6, and a substrate stage 7. The exposure apparatus 100 may also include a controller 13 that controls the operation of the exposure apparatus 100. The exposure apparatus 100 may be configured as a scanner (scanning exposure apparatus) or as a stepper. The light source 1 generates exposure light. For example, a mercury lamp, a laser light source, or an EUV light source may be used as the light source 1.

[0013] The original stage 5 can be positioned in two-dimensional directions parallel to a plane perpendicular to the optical axis (Z axis) of the projection optical system 6 (i.e., the XY plane) and in rotation around the optical axis (Z axis) (i.e., the θZ direction), thereby positioning the original 2. The original stage 5 can be driven by a driving mechanism (not shown). A reflecting mirror 8 can be disposed on the original stage 5. A laser interferometer 10 can be disposed opposite the reflecting mirror 8. The two-dimensional position and rotation angle of the original stage 5 can be measured in real time by the laser interferometer 10, and the measurement results can be provided to the control unit 13. The control unit 13 can control the driving mechanism of the original stage 5 based on the measurement results from the laser interferometer 10, and position the original 2 held by the original stage 5.

[0014] The projection optical system 6 includes multiple optical elements and projects the pattern of the original 2 onto the substrate 3 at a predetermined magnification. A photosensitive agent (resist) is applied to the substrate 3, and a latent image pattern is formed in the photosensitive agent by projecting the pattern of the original 2 onto the photosensitive agent. The substrate stage 7 can include, for example, a Z stage that holds the substrate 3, an XY stage that supports the Z stage, and a base that supports the XY stage. The substrate stage 7 can be driven by a driving mechanism such as a linear motor.

[0015] A reflecting mirror 9 may be arranged on the substrate stage 7. A laser interferometer 11 may be arranged at a position opposite the reflecting mirror 9. The position of the substrate stage 7 may be measured in real time by the laser interferometer 11, and the measurement results may be provided to the control unit 13. The control unit 13 may control the drive mechanism of the substrate stage 7 based on the measurement results from the laser interferometer 11, and position the substrate 3 held by the substrate stage 7.

[0016] When the exposure apparatus 100 is configured as a stepper, in the exposure process in which the substrate 3 is exposed with the substrate stage 7 settled, the exposure light generated by the light source 1 is irradiated onto the substrate 3. On the other hand, in the step process in which the substrate stage 7 is moved, the exposure light generated by the light source 1 is not irradiated onto the substrate 3. The shutter device 4 is disposed between the light source 1 and the original stage 5, and passes or blocks the exposure light. The shutter device 4 passes the exposure light in the exposure process and blocks the exposure light in the step process. The shutter device 4 is configured to switch between irradiating and not irradiating the substrate 3 with the exposure light, and its operation is controlled by the control unit 13. The configuration of the shutter device 4 will be described below as an example.

[0017] FIG. 2 is a diagram showing the configuration of a shutter device 4 according to one embodiment. The shutter device 4 may include a rotation source 43 (e.g., a motor) that rotates a rotation shaft 44, a hub 42 connected to the rotation shaft 44, and shutter blades 41 fixed to the hub 42. The shutter blades 41 have blocking portions 411 that block the exposure light EL from the light source 1 and passing portions 412 that allow the exposure light EL to pass. In the example shown in FIG. 2, the shutter blades 41 have three blocking portions 411 and three passing portions 412, but the numbers of these portions can be determined arbitrarily. When starting exposure of the substrate 3, the control unit 13 rotates the shutter blades 41 to change from a blocking state in which the exposure light EL is blocked by the blocking portions 411 to a non-blocking state in which the exposure light EL is passed by the passing portions 412. On the other hand, when the exposure of the substrate 3 is to be completed, the control unit 13 rotates the shutter blade 41 again, changing the state from the non-blocking state in which the exposure light EL is passed by the passing portion 412 to the blocking state in which the exposure light EL is blocked by the blocking portion 411.

[0018] The structure of the hub 42 that holds the shutter blade 41 will now be described by way of example. Fig. 3 shows an example of the structure of the hub 42 according to one embodiment. Figs. 4(a) to 4(c) show an example of the state in which the shutter blade 41 is attached to the hub 42 according to one embodiment. Fig. 4(a) shows the entire shutter blade 41, Fig. 4(b) shows a part of the shutter blade 41, and Fig. 4(c) shows a cross section taken along line AA of Fig. 4(b). Although Fig. 4(c) shows a gap between the hub 42 and the shutter blade 41, the hub 42 and the shutter blade 41 may be in contact with each other partially or entirely.

[0019] The shutter blade 41 may have at least one blade, preferably multiple blades 41a, 41b, and 41c. Each of the multiple blades 41a, 41b, and 41c includes a region that functions as the aforementioned blocking portion 411. The hub 42 has a holding surface HS that holds the shutter blade 41. The shutter blade 41 is fixed to the hub 42 by multiple fastening portions 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c, and 19c. The shutter blade 41 may have multiple openings 51a, 52a, 53a, 51b, 52b, 53b, 51c, 52c, and 53c. The multiple fastening portions 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c, and 19c may include bolts that pass through these openings. Alternatively, all or some of the multiple fastening portions 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c, and 19c may be configured by welding or adhesive. When welding or adhesive is applied, openings for the bolts are not required. When bolts are used as fastening portions, toothed washers (lock washers) may be disposed between the shutter blades 41 and the bolt bearing surfaces. The teeth of the toothed washer scratch the bearing surface, increasing friction and preventing the bolt from loosening.

[0020] The first side surface of the hub 42 will now be described. The holding surface HS of the hub 42 may include first regions 14a, 14b, and 14c that belong to the same plane (plane P). The holding surface HS may also include second regions 15a, 15b, and 15c that do not belong to the plane P to which the first regions 14a, 14b, and 14c belong. The first regions 14a, 14b, and 14c may be formed, for example, as flat surfaces (flat regions) that belong to the plane P. The second regions 15a, 15b, and 15c may be formed, for example, as curved surfaces.

[0021] The holding surface HS may include a first region 14a and a second region 15a that do not belong to the same plane (plane P). The holding surface HS may include a first region 14b and a second region 15b that do not belong to the same plane (plane P). The holding surface HS may include a first region 14c and a second region 15c that do not belong to the same plane (plane P). Here, examples of the first region and the second region that do not belong to the same plane include (1) a form in which the first region belongs to plane P and the second region does not belong to plane P, or (2) a form in which the second region belongs to a plane and the first region does not belong to plane P. Examples of a form in which a certain region does not belong to plane P include (1) a form in which the region belongs to a plane parallel to plane P, (2) a form in which the region belongs to a plane intersecting plane P, or (3) a form in which the region is formed by a curved surface. 3 and 4 show an example in which the first regions 14a, 14b, and 14c are formed by planes belonging to the plane P, and the second regions 15a, 15b, and 15c are formed by curved surfaces spaced apart from the plane P.

[0022] Blade 41a of shutter blade 41 is fixed to hub 42 in the first region 14a by first fastening portion 17a, and is fixed to hub 42 in the second region 15a by second fastening portion 18a. Blade 41b of shutter blade 41 is fixed to hub 42 in the first region 14b by first fastening portion 17b, and is fixed to hub 42 in the second region 15b by second fastening portion 18b. Blade 41c of shutter blade 41 is fixed to hub 42 in the first region 14c by first fastening portion 17c, and is fixed to hub 42 in the second region 15c by second fastening portion 18c. When fixed to hub 42, shutter blade 41 may have first contact portions CP1 that contact the first regions 14a, 14b, and 14c, and second contact portions CP2 that contact the second regions 15a, 15b, and 15c. Such a configuration is advantageous for improving the rigidity of the shutter blades 41 and reducing variations in assembly of the shutter device 4.

[0023] Shutter blade 41 has a plurality of first openings 51a, 51b, 51c and a plurality of second openings 52a, 52b, 52c. First fastening portions 17a, 17b, 17c may include first bolts that pass through first openings 51a, 51b, 51c, respectively, and are fastened to screw holes 61a, 61b, 61c of hub 42. Second fastening portions 18a, 18b, 18c may include a plurality of second bolts that pass through second openings 52a, 52b, 53c, and are fastened to screw holes 62a, 62b, 62c of hub 42.

[0024] As described above, the first regions 14a, 14b, and 14c and the second regions 15a, 15b, and 15c are arranged so as not to belong to the same plane (plane P). Therefore, the blade 41a of the shutter blade 41 is fastened to the hub 42 by the first fastening portion 17a and the second fastening portion 18a, and is deformed by the force (fastening force) received from the first fastening portion 17a, the second fastening portion 18a, and the hub 42. Similarly, the blade 41b of the shutter blade 41 is fastened to the hub 42 by the first fastening portion 17b and the second fastening portion 18b, and is deformed by the force received from the first fastening portion 17b, the second fastening portion 18b, and the hub 42. Similarly, blade 41c of shutter blade 41 is fastened to hub 42 by first fastening portion 17c and second fastening portion 18c, and is deformed by the forces received from first fastening portion 17c, second fastening portion 18c, and hub 42. In other words, shutter blade 41 is forcibly deformed by being fixed to hub 42 by the fastening portions.

[0025] Fig. 5 shows an example of a deformed state of the shutter blade 41. Note that Fig. 5 emphasizes the deformation of the shutter blade 41. When the shutter blade 41 is deformed by the forces it receives from the fastening portions 17a, 18a, 19a, 17b, 18b, 19b, 17c, 18c, and 19c and the hub 42, the moment of inertia of the area increases compared to when such deformation is not allowed. This improves the rigidity of the shutter blade 41.

[0026] When shutter blades having a curved shape such as that shown in FIG. 5 are manufactured by press working or a 3D printer, it is difficult to mirror-finish the shutter blades. On the other hand, according to this embodiment, shutter blades 41 having a flat shape before being attached to hub 42 are manufactured, and then, by attaching them to hub 42, they can be deformed to improve rigidity. Therefore, in this embodiment, it is easy to mirror-finish the shutter blades 41. By mirror-finishing the shutter blades 41, it is possible to reduce the absorption of exposure light by the shutter blades 41. This is advantageous for reducing deformation and melting of the shutter blades 41 due to heat.

[0027] The hub 42 may be understood as having a second side as follows. On the second side, the holding surface HS includes a first region 14a, a second region 15a, and a third region 14b. The second region 15a is disposed between the first region 14a and the third region 14b, and the first region 14a and the third region 14b belong to an imaginary plane (plane P), while the second region 15a does not belong to the imaginary plane (plane P). The shutter blade 41 is fixed to the hub 42 by a third fastening portion 19a in the third region 14b. The second region 15a may be configured as a curved surface. Alternatively, the second region 15a may be configured as a plane parallel to the imaginary plane (plane P). The second region 15a is recessed with respect to the first region 14a and the third region 14b, for example. The shutter blade 41 has a plurality of third openings 53a, 53b, and 53c. The third fastening portions 19a, 19b, and 19c may include first bolts that pass through the third openings 53a, 53b, and 53c, respectively. The third fastening portions 19a, 19b, and 19c may include third bolts that pass through the third openings 53a, 53b, and 53c, respectively, and are fastened to the screw holes 63a, 63b, and 63c of the hub 42.

[0028] Modifications of the above embodiment will be described below. Matters not mentioned in the following description may follow the description of the above embodiment.

[0029] FIG. 6 shows a first modified example. FIG. 6 corresponds to the cross section AA of FIG. 4(b). As illustrated in FIG. 6, the first region 14a of the holding surface HS of the hub 42 may be configured as a first plane belonging to an imaginary plane (plane P), and the second region 15a of the holding surface HS may be configured as a second plane not belonging to the imaginary plane to which the first plane belongs. The second plane may or may not be parallel to the first plane. On another side, the holding surface HS includes the first region 14a, the second region 15a, and the third region 14b. The second region 15a is disposed between the first region 14a and the third region 14b, and the first region 14a and the third region 14b belong to the imaginary plane (plane P), and the second region 15a is configured as a second plane not belonging to the imaginary plane (plane P). The second region 15a is recessed relative to the first region 14a and the third region 14b.

[0030] A second modified example is shown in FIG. 7. FIG. 7 corresponds to the cross section AA of FIG. 4(b). As illustrated in FIG. 7, the first region 14a of the holding surface HS of the hub 42 is formed by a first plane that belongs to an imaginary plane (plane P), and the second region 15a of the holding surface HS is formed by a second plane that does not belong to the imaginary plane to which the first plane belongs. The second plane may or may not be parallel to the first plane. On another side, the holding surface HS includes the first region 14a, the second region 15a, and the third region 14b. The second region 15a is disposed between the first region 14a and the third region 14b. The holding surface HS may have a convex shape formed by the first region 14a, the second region 15a, and the third region 14b.

[0031] A third modified example is shown in FIG. 8. FIG. 8 corresponds to the cross section AA of FIG. 4(b). As illustrated in FIG. 8, the holding surface HS includes a first region 14a, a second region 15a, and a third region 14b. The second region 15a is disposed between the first region 14a and the third region 14b. The first region 14a, the second region 15a, and the third region 14b may be formed as planes that are not parallel to each other. The holding surface HS may have a convex shape formed by the first region 14a, the second region 15a, and the third region 14b. The first region 14a and the third region 14b may be inclined regions.

[0032] A fourth modified example is shown in Fig. 9. Fig. 9 corresponds to the AA cross section of Fig. 4(b). The hub 42 may include a base 421 connected to the rotation shaft 44, and a spacer 30 disposed between the base 421 and the shutter blade 41. The surface of the base 421 includes the first region 14a (and the third region 14b), and the surface of the base 421 includes the second region 15a. In this way, forming the hub 42 with the base 421 and the spacer 30 can facilitate the manufacture of the hub 42.

[0033] FIG. 10 shows a fifth modified example. FIG. 10 corresponds to the cross section AA of FIG. 4(b). The support surface HS of the shutter blade 41 may include a curved surface 71 connecting the first region 14a and the second region 15a. The support surface HS may also include a curved surface 72 connecting the second region 15a and the third region 14b. This configuration is advantageous for reducing stress applied to the shutter blade 41 by the boundary between the first region 14a and the second region 15a and / or the boundary between the second region 15a and the third region 14b. This can contribute to improving the durability of the shutter blade 41 or the shutter device 4. It is preferable that at least the portions of the first region 14a, the second region 15a, and the third region 14b where the screw holes 61a, 61b, and 61c are provided are flat. This configuration is also advantageous for reducing stress applied to the shutter blade 41.

[0034] FIG. 11 shows a sixth modified example. FIG. 11 corresponds to the AA cross section of FIG. 4(b). The sixth modified example is a modification of the fifth modified example. The holding surface HS of the shutter blade 41 may have an asymmetric shape with respect to an imaginary plane VP that includes the central axis of the rotation shaft 44 and the center of the second fastening portion 18a. The fifth modified example shown in FIG. 10 may be understood as an example in which the holding surface HS of the shutter blade 41 has a symmetric shape with respect to an imaginary plane VP that includes the central axis of the rotation shaft 44 and the center of the second fastening portion 18a. In the fifth modified example shown in FIG. 10, the inclination angle of the portion of the shutter blade 41 that covers the curved surface 72 of the holding surface HS of the hub 42 (the inclination angle with respect to the imaginary plane VP and a plane perpendicular to the rotation shaft 44) is θ1. 11, the inclination angle (the inclination angle with respect to the imaginary plane VP and the plane perpendicular to the rotation axis 44) of the portion of the shutter blade 41 that covers the curved surface 72 of the holding surface HS of the hub 42 is θ2, where θ2<θ1. The shutter blade 41 of the fifth modified example reduces air resistance during rotation more than the shutter blade 41 of the fourth modified example, and therefore reduces the lift force acting during rotation.

[0035] 12 shows a seventh modified example. In the seventh modified example, the shutter blade 41 is made up of a plurality of members, each of which includes one blade 60. In other words, the shutter blade 41 can include a plurality of blades 60 that are splittable and separable from one another when the fastening by the bolts 17 is released. The hub 42 has a flat surface 14 and a curved surface 15, and each blade 60 is fastened to the flat surface 14 and the curved surface 15 by the bolts 17, thereby deforming. By making the shutter blade 41 out of a plurality of members, the processing costs can be reduced.

[0036] Below, an article manufacturing method for manufacturing an article using a lithography apparatus, such as the exposure apparatus 100, is described. The article may be, for example, a semiconductor IC element, a liquid crystal display element, or a MEMS. The article manufacturing method may include a transfer step in which a pattern on an original is transferred to a substrate using the lithography apparatus, and a processing step in which the substrate that has undergone the transfer step is processed to obtain the article. When the lithography apparatus is an exposure apparatus, the transfer step may include an exposure step in which a substrate (such as a wafer or glass substrate) coated with a photosensitive agent is exposed to light, and a development step in which the substrate (photosensitive agent) that has undergone the exposure step is developed. When the lithography apparatus is an imprint apparatus, the transfer step may include a contact step in which an original is brought into contact with an imprint material on a substrate, a curing step in which the imprint material is cured, and a separation step in which the original is separated from the cured imprint material. The processing steps may include, for example, etching, resist stripping, dicing, bonding, packaging, and the like.

[0037] The disclosure in this specification and the accompanying drawings includes the following inventions. (Item 1) A shutter device that allows or blocks exposure light, a rotation source that rotates the rotation shaft; a hub connected to the rotating shaft; a shutter blade fixed to the hub; the hub has a holding surface that holds the shutter blade; the support surface includes a first region and a second region that are not coplanar; The shutter blade is fixed to the hub in the first region by a first fastening portion and in the second region by a second fastening portion. A shutter device characterized by: (Item 2) the shutter blade has a first opening and a second opening; The first fastening portion includes a first bolt passing through the first opening, and the second fastening portion includes a second bolt passing through the second opening. 2. The shutter device according to item 1, (Item 3) the shutter blade is fastened to the hub by the first fastening portion and the second fastening portion, and is deformed by forces received from the first fastening portion, the second fastening portion, and the hub. 3. The shutter device according to item 2, wherein: (Item 4) the shutter blade has a contact portion that contacts the first region and a contact portion that contacts the second region when the shutter blade is fixed to the hub; 4. The shutter device according to any one of items 1 to 3, wherein: (Item 5) The holding surface has the first area formed of a flat surface and the second area formed of a curved surface. 5. The shutter device according to any one of items 1 to 4, wherein: (Item 6) The first area is formed by a first plane, and the second area is formed by a second plane that does not belong to the virtual plane to which the first plane belongs. 5. The shutter device according to any one of items 1 to 4, wherein: (Item 7) the support surface further includes a third region; the second region is disposed between the first region and the third region, the first region and the third region belong to a virtual plane, the second region does not belong to the virtual plane, The shutter blade is fixed to the hub in the third region by a third fastening portion. 5. The shutter device according to any one of items 1 to 4, wherein: (Item 8) The second region is configured with a curved surface. 8. The shutter device according to item 7, wherein: (Item 9) The second region is formed by a plane parallel to the virtual plane. 8. The shutter device according to item 7, (Item 10) 10. The shutter device according to any one of items 7 to 9, wherein the second region is recessed relative to the first region and the third region. (Item 11) The holding surface includes a curved surface connecting the first region and the second region, and a curved surface connecting the second region and the third region. Item 11. The shutter device according to item 10. (Item 12) The holding surface has an asymmetric shape with respect to an imaginary plane including the central axis of the rotation shaft and the center of the second fastening portion. Item 12. The shutter device according to item 11. (Item 13) the first region, the second region, and the third region form a convex shape; 10. The shutter device according to any one of items 7 to 9, wherein: (Item 14) the support surface further includes a third region; the second region is disposed between the first region and the third region, the first region, the second region, and the third region are respectively formed of planes that are not parallel to each other, The shutter blade is fixed to the hub in the third region by a third fastening portion. 5. The shutter device according to any one of items 1 to 4, wherein: (Item 15) the holding surface has a convex shape formed by the first region, the second region, and the third region; Item 15. The shutter device according to item 14. (Item 16) the hub includes a base connected to the rotation shaft and a spacer disposed between the base and the shutter blade; a surface of the base includes the first region, and a surface of the spacer includes the second region; 5. The shutter device according to any one of items 1 to 4, wherein: (Item 17) The shutter blade is composed of a plurality of members. 17. The shutter device according to any one of items 1 to 16, (Item 18) A lithography apparatus that transfers a pattern from an original onto a substrate using light, comprising: 18. An exposure apparatus comprising the shutter device according to any one of items 1 to 17, which is arranged to control irradiation of the substrate with exposure light. (Item 19) A transfer step of transferring a pattern of the original onto a substrate using the lithography apparatus according to item 18; a processing step of obtaining an article by processing the substrate that has undergone the transfer step; A method for manufacturing an article, comprising:

[0038] The invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0039] 4: shutter device, 41: shutter blade, 42: hub, 43: rotation source, 44: rotation shaft, HS: holding surface, 14a, 14b, 14c: first region, 15a, 15b, 15c: second region

Claims

1. A shutter device that allows or blocks exposure light, a rotation source that rotates the rotation shaft; a hub connected to the rotating shaft; a shutter blade fixed to the hub; the hub has a holding surface that holds the shutter blade; the holding surface includes a first region and a second region that are not coplanar; the shutter blade is fixed to the hub in the first region by a first fastening portion and in the second region by a second fastening portion; A shutter device characterized by:

2. the shutter blade has a first opening and a second opening; The first fastening portion includes a first bolt passing through the first opening, and the second fastening portion includes a second bolt passing through the second opening.

2. The shutter device according to claim 1.

3. the shutter blade has a contact portion that contacts the first region and a contact portion that contacts the second region when the shutter blade is fixed to the hub; 2. The shutter device according to claim 1.

4. The holding surface has a first region formed of a flat surface and a second region formed of a curved surface.

2. The shutter device according to claim 1.

5. the first area is configured by a first plane, and the second area is configured by a second plane that does not belong to the virtual plane to which the first plane belongs; 2. The shutter device according to claim 1.

6. the support surface further includes a third region; the second region is disposed between the first region and the third region, the first region and the third region belong to a virtual plane, the second region does not belong to the virtual plane, the shutter blade is fixed to the hub in the third region by a third fastening portion; 2. The shutter device according to claim 1.

7. The second region is configured with a curved surface.

7. The shutter device according to claim 6.

8. The second region is formed by a plane parallel to the virtual plane.

7. The shutter device according to claim 6.

9. The shutter device according to claim 6 , wherein the second region is recessed relative to the first region and the third region.

10. The holding surface includes a curved surface connecting the first region and the second region, and a curved surface connecting the second region and the third region.

10. The shutter device according to claim 9.

11. The holding surface has an asymmetric shape with respect to an imaginary plane including a central axis of the rotation shaft and a center of the second fastening portion.

11. The shutter device according to claim 10.

12. the first region, the second region, and the third region form a convex shape; 7. The shutter device according to claim 6.

13. the support surface further includes a third region; the second region is disposed between the first region and the third region, the first region, the second region, and the third region are formed by planes that are not parallel to each other, the shutter blade is fixed to the hub in the third region by a third fastening portion; 2. The shutter device according to claim 1.

14. the holding surface has a convex shape defined by the first region, the second region, and the third region.

14. The shutter device according to claim 13.

15. the hub includes a base connected to the rotation shaft and a spacer disposed between the base and the shutter blade; a surface of the base includes the first region, and a surface of the spacer includes the second region; 2. The shutter device according to claim 1.

16. The shutter blade is composed of a plurality of members.

2. The shutter device according to claim 1.

17. A lithography apparatus that transfers a pattern from an original onto a substrate using light, comprising:

17. A lithographic apparatus comprising a shutter device according to any preceding claim, arranged to control the irradiation of the substrate with exposure light.

18. a transfer step of transferring a pattern of a master onto a substrate using the lithography apparatus according to claim 17; a processing step of obtaining an article by processing the substrate that has undergone the transfer step; A method for manufacturing an article, comprising:

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