Display devices and electronic devices

Abstract

Provided is a display device for which the complexity of an uneven shape of a formation surface of a semi-transmissive reflection layer can be controlled.　This display device comprises: a plurality of first subpixels; a plurality of second subpixels; and a plurality of third subpixels. The first subpixels each comprise a first light-emitting element that emits first light and third light; the second subpixels each comprise a second light-emitting element that emits second light; and the third subpixels each comprise a third light-emitting element that emits first light and third light. The first light-emitting element, the second light-emitting element and the third light-emitting element each comprise: a first electrode; an organic layer including a light-emitting layer; a second electrode; and a semi-transmissive reflection layer. The first electrode and the semi-transmitting reflection layer constitute a resonator structure. The semi-transmissive reflection layer of the first light-emitting element and that of the third light-emitting element have the same height.

Description

[Technical Field]

[0001] The present disclosure relates to a display device and an electronic device including the same. [Background technology]

[0002] In recent years, organic electroluminescence (EL) display devices (hereinafter simply referred to as "display devices") have become widespread. In order to improve the light extraction efficiency of these display devices, it has been proposed to provide a resonator structure (cavity structure).

[0003] For example, Patent Document 2 (see, for example, paragraph 0067) discloses a resonator structure in which a protective layer is provided between a cathode electrode and a semi-transmissive plate (semi-transmissive reflective layer), and the film thickness of the protective layer (optical adjustment layer) is changed for each emitted color. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2016-143585 Summary of the Invention [Problem to be solved by the invention]

[0005] However, in the technology described in Patent Document 1, as described above, the thickness of the protective layer is changed for each emitted color, which results in a complex uneven shape on the surface on which the semi-transmitting plate (semi-transmissive reflective layer) is formed. Such a complex uneven shape increases the number of steps required to process the protective layer, which may lead to a decrease in productivity.

[0006] An object of the present disclosure is to provide a display device that can prevent the uneven shape of the surface on which a semi-transmissive reflective layer is formed from becoming more complex, and an electronic device that includes the same. [Means for solving the problem]

[0007] In order to solve the above-mentioned problems, the first disclosure provides: a plurality of first sub-pixels, a plurality of second sub-pixels, and a plurality of third sub-pixels; The first sub-pixel is No. 1 light-emitting element and a red filter Equipped with The second sub-pixel is No. Two light-emitting elements are provided, The third sub-pixel is No. 3 light-emitting elements And a blue filter Equipped with The first light-emitting element, the second light-emitting element, and the third light-emitting element each include a first electrode; configured to be capable of emitting white light, An organic layer including a light-emitting layer, a second electrode, and a semi-transmissive reflective layer In order a resonator structure is formed by the first electrode and the semi-transmissive reflective layer; the resonator structure of the first light-emitting element and the resonator structure of the third light-emitting element are configured to be capable of resonating red light and blue light contained in the white light; the resonator structure of the second light-emitting element is configured to resonate green light contained in the white light; In this display device, the heights of the semi-transmissive reflective layers in the first light-emitting element and the third light-emitting element are the same.

[0008] A second disclosure is an electronic device including the display device of the first disclosure. [Brief explanation of the drawings]

[0009] [Figure 1] FIG. 1 is a schematic diagram showing an example of the overall configuration of a display device according to a first embodiment of the present disclosure. [Figure 2] FIG. 2 is a cross-sectional view showing an example of the configuration of a display region 110A of the display device according to the first embodiment of the present disclosure. [Figure 3] FIG. 3 is a cross-sectional view showing an example of the configuration of the peripheral region of the display device according to the first embodiment of the present disclosure. [Figure 4] FIG. 4 is a cross-sectional view showing another example of the configuration of the peripheral region of the display device according to the first embodiment of the present disclosure. [Figure 5] 5A and 5B are cross-sectional views showing a first and second example of the configuration of an organic EL layer including a single light-emitting unit, respectively. [Figure 6] 6A and 6B are cross-sectional views showing a first and second example of the configuration of an organic EL layer including two light-emitting units, respectively. [Figure 7] FIG. 7 is a cross-sectional view showing an example of the configuration of a display device according to a second embodiment of the present disclosure. [Figure 8] FIG. 8 is a cross-sectional view showing an example of the configuration of a display device according to the first modification. [Figure 9] FIG. 9 is a cross-sectional view showing an example of the configuration of a display device according to the second modification. [Figure 10] FIG. 10 is a cross-sectional view showing an example of the configuration of a display device according to the third modification. [Figure 11] FIG. 11 is a cross-sectional view showing an example of the configuration of a display device according to the fourth modification. [Figure 12] FIG. 12 is a cross-sectional view showing an example of the configuration of a display device according to the eleventh modification. [Figure 13] FIG. 13 is a cross-sectional view showing an example of the configuration of a display device according to Modification 12. As shown in FIG. [Figure 14] FIG. 14 is a cross-sectional view showing an example of the configuration of a display device according to Modification 13. As shown in FIG. [Figure 15] FIG. 15 is a cross-sectional view showing an example of the configuration of a display device according to Modification 14. In FIG. [Figure 16] FIG. 16 is a cross-sectional view showing an example of the configuration of a display device according to Modification 15. In FIG. [Figure 17] FIG. 17 is a cross-sectional view showing an example of the configuration of a display device according to Modification 16. In FIG. [Figure 18] FIG. 18 is a cross-sectional view showing an example of the configuration of a display device according to Modification 17. As shown in FIG. [Figure 19] FIG. 19 is a cross-sectional view showing an example of the configuration of a display device according to Modification 18. As shown in FIG. [Figure 20] FIG. 20 is a cross-sectional view showing an example of the configuration of a display device according to Modification 19. As shown in FIG. [Figure 21] FIG. 21 is a cross-sectional view showing an example of the configuration of a display device according to Modification 20. As shown in FIG. [Figure 22] FIG. 22 is a cross-sectional view showing an example of the configuration of a display device according to Modification 21. As shown in FIG. [Figure 23] FIG. 23 is a cross-sectional view showing an example of the configuration of a display device according to Modification 22. As shown in FIG. [Figure 24] FIG. 24 is a cross-sectional view showing an example of the configuration of a display device according to Modification 23. In FIG. [Figure 25] FIG. 25 is a cross-sectional view showing another example of the configuration of the display device according to the twenty-third modification. [Figure 26] FIG. 26 is a plan view showing an example of a schematic configuration of a module. [Figure 27] Fig. 27A is a front view showing an example of the external appearance of a digital still camera, and Fig. 27B is a rear view showing an example of the external appearance of a digital still camera. [Figure 28] FIG. 28 is a perspective view showing an example of the appearance of a head-mounted display. [Figure 29] FIG. 29 is a perspective view showing an example of the appearance of a television device. [Figure 30] FIG. 30 is a graph showing the results of simulations 1-1 and 1-2. [Figure 31] FIG. 31 is a graph showing the results of simulations 1-2 and 2. [Figure 32] FIG. 32 is a graph showing the results of simulations 1-3 and 2. [Figure 33] FIG. 33 is a graph showing the results of simulations 3-1 and 3-4. [Figure 34] FIG. 34 is a graph showing the results of simulations 3-2 and 3-4. [Figure 35] FIG. 35 is a graph showing the results of simulations 3-3 and 3-4. [Figure 36] FIG. 36 is a graph showing the results of simulations 1-1 and 1-2. [Figure 37] FIG. 37 is a graph showing the results of simulations 1-2 and 2. [Figure 38] FIG. 38 is a graph showing the results of simulations 1-3 and 2. [Figure 39] FIG. 39 is a graph showing the results of simulations 3-1 and 3-4. [Figure 40] FIG. 40 is a graph showing the results of simulations 3-2 and 3-4. [Figure 41] FIG. 41 is a graph showing the results of simulations 3-3 and 3-4. [Figure 42] FIG. 42 is a graph showing the results of simulations 5-1 and 5-6. [Figure 43] FIG. 43 is a graph showing the results of simulations 5-2 and 5-6. [Figure 44] FIG. 44 is a graph showing the results of simulations 5-3 and 5-6. [Figure 45] FIG. 45 is a graph showing the results of simulations 7-1 and 7-8. [Figure 46] FIG. 46 is a graph showing the results of simulations 7-2 and 7-8. [Figure 47] FIG. 47 is a graph showing the results of simulations 7-3 and 7-8. DETAILED DESCRIPTION OF THE INVENTION

[0010] Embodiments of the present disclosure will be described in the following order: In all drawings of the following embodiments, the same or corresponding parts are denoted by the same reference numerals. 1. First embodiment (example of display device) 2. Second embodiment (example of display device) 3. Modifications (Modifications of the display device) 4 Application examples (electronic devices) 5 Simulation example

[0011] <1 First Embodiment> [Display device configuration] 1 is a schematic diagram showing an example of the overall configuration of a display device 10 according to a first embodiment of the present disclosure. The display device 10 has a display area 110A and a peripheral area 110B provided on the periphery of the display area 110A. Within the display area 110A, a plurality of sub-pixels 100R, a plurality of sub-pixels 100G, and a plurality of sub-pixels 100B are two-dimensionally arranged in a specified arrangement pattern, such as a matrix.

[0012] The sub-pixel 100R emits red light, the sub-pixel 100G emits green light, and the sub-pixel 100B emits blue light. In the following description, the sub-pixels 100R, 100G, and 100B are collectively referred to as sub-pixels 100 when they are not particularly distinguished from one another. The red light, blue light, and green light are examples of a first light, a second light, and a third light, respectively. The sub-pixels 100R, 100G, and 100B are examples of a first sub-pixel, a second sub-pixel, and a third sub-pixel, respectively. A combination of adjacent sub-pixels 100R, 100G, and 100B constitutes one pixel. While FIG. 1 illustrates an example in which a combination of three sub-pixels 100R, 100G, and 100B aligned in the row direction (horizontal direction) constitutes one pixel, the arrangement of the sub-pixels 100R, 100G, and 100B is not limited to this.

[0013] The peripheral region 110B is provided with a signal line driving circuit 111 and a scanning line driving circuit 112, which are drivers for displaying video. The signal line driving circuit 111 supplies a signal voltage of a video signal corresponding to luminance information supplied from a signal supply source (not shown) to selected sub-pixels 100 via signal lines 111A. The scanning line driving circuit 112 is configured with a shift register or the like that sequentially shifts (transfers) a start pulse in synchronization with an input clock pulse. When writing a video signal to each sub-pixel 100, the scanning line driving circuit 112 scans the sub-pixels 100 row by row and sequentially supplies a scanning signal to each scanning line 112A.

[0014] The display device 10 is an example of a light-emitting device. The display device 10 may be a microdisplay. The display device 10 may be provided in a VR (Virtual Reality) device, an MR (Mixed Reality) device, an AR (Augmented Reality) device, an electronic viewfinder (EVF), a small projector, or the like.

[0015] 2 is a cross-sectional view showing an example of the configuration of a display region 110A of the display device 10 according to the first embodiment of the present disclosure. The display device 10 includes a drive substrate 11, a plurality of first electrodes 12, an insulating layer 13, an organic EL layer 14, a second electrode 15, an optical adjustment layer 16, a semi-transmissive reflective layer 17, a protective layer 18, and a color filter 19.

[0016] 3 is a cross-sectional view showing an example of the configuration of the peripheral region 110B of the display device 10. The display device 10 further includes a contact portion 12A in the peripheral region 110B.

[0017] The display device 10 is a top-emission display device. The color filter 19 side of the display device 10 is the top side (display surface side), and the drive substrate 11 side of the display device 10 is the bottom side. In the following description, of the layers constituting the display device 10, the surface that is the top side of the display device 10 is referred to as the first surface, and the surface that is the bottom side of the display device 10 is referred to as the second surface.

[0018] (sub-pixel) The sub-pixel 100R includes a light-emitting element 101R that emits red light and blue light. The sub-pixel 100G includes a light-emitting element 101G that emits green light. The sub-pixel 100B includes a light-emitting element 101B that emits red light and blue light. The light-emitting elements 101R and 101B have the same configuration, including a first electrode 12, an organic EL layer 14, a second electrode 15, an optical adjustment layer 16, and a semi-transmissive reflective layer 17, in this order. The light-emitting element 101G includes a first electrode 12, an organic EL layer 14, a second electrode 15, and a semi-transmissive reflective layer 17, in this order. In the following description, the light-emitting elements 101R, 101G, and 101B will be collectively referred to as the light-emitting element 101 when not being particularly distinguished from one another.

[0019] Each of the light-emitting elements 101R, 101G, and 101B has a resonator structure, which can improve the light extraction efficiency. The resonator structure is composed of a first electrode 12 and a semi-transmissive reflective layer 17. The resonator structures of the light-emitting elements 101R and 101B have the same configuration and are configured to resonate and emphasize red and blue light contained in the white light generated in the organic EL layer 14 and emit the light toward the display surface. The resonator structure of the light-emitting element 101G is configured to resonate and emphasize green light contained in the white light generated in the organic EL layer 14 and emit the light toward the display surface.

[0020] In the resonator structures of the light-emitting elements 101R and 101B, the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 is set so that red light and blue light resonate and are emphasized. In the resonator structure of the light-emitting element 101G, the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 is set so that green light resonates and is emphasized.

[0021] The resonance condition of the resonator structure is expressed by, for example, the following equation: L=(m-Φ / 2π)×λ / 2 L: optical path length of the resonator structure m: natural number Φ: radian, phase shift amount in the first electrode 12 (may include the phase shift amount in the semi-transmissive reflective layer 17) λ: wavelength of light emitted from the organic EL layer 14

[0022] (Drive board) The drive substrate 11 is a so-called backplane. A drive circuit for driving the plurality of light-emitting elements 101, a power supply circuit for supplying power to the plurality of light-emitting elements 101, and the like (neither of which is shown) are provided on a first surface of the drive substrate 11. An insulating layer is also provided on the first surface of the drive substrate 11 so as to cover the drive circuit, power supply circuit, and the like. This makes the first surface of the drive substrate 11 flat.

[0023] The substrate body of the drive substrate 11 may be made of, for example, a semiconductor that facilitates the formation of transistors and the like, or glass or resin that has low moisture and oxygen permeability. Specifically, the substrate body may be a semiconductor substrate, glass substrate, or resin substrate. The semiconductor substrate includes, for example, amorphous silicon, polycrystalline silicon, or single crystal silicon. The glass substrate includes, for example, high strain point glass, soda glass, borosilicate glass, forsterite, lead glass, or quartz glass. The resin substrate includes, for example, at least one selected from the group consisting of polymethyl methacrylate, polyvinyl alcohol, polyvinyl phenol, polyether sulfone, polyimide, polycarbonate, polyethylene terephthalate, and polyethylene naphthalate.

[0024] (first electrode) The multiple first electrodes 12 are two-dimensionally arranged on the first surface of the drive substrate 11 in the same arrangement pattern as the multiple subpixels 100. The first electrodes 12 are anodes. When a voltage is applied between the first electrodes 12 and the second electrodes 15, holes are injected from the first electrodes 12 into the organic EL layer 14. Adjacent first electrodes 12 are electrically isolated by an insulating layer 13.

[0025] The thickness of each first electrode 12 may be the same. The first electrode 12 may be composed of, for example, a metal layer, or may be composed of a metal layer and a transparent conductive oxide layer. When the first electrode 12 is composed of a metal layer and a transparent conductive oxide layer, it is preferable that the transparent conductive oxide layer be provided on the organic EL layer 14 side, from the viewpoint of having a layer having a high work function adjacent to the organic EL layer 14.

[0026] The metal layer also functions as a reflective layer that reflects light generated in the organic EL layer 14. The metal layer contains at least one metal element selected from the group consisting of chromium (Cr), gold (Au), platinum (Pt), nickel (Ni), copper (Cu), molybdenum (Mo), titanium (Ti), tantalum (Ta), aluminum (Al), magnesium (Mg), iron (Fe), tungsten (W), and silver (Ag). The metal layer may contain at least one of the above metal elements as a constituent element of an alloy. Specific examples of the alloy include an aluminum alloy and a silver alloy. Specific examples of the aluminum alloy include AlNd and AlCu.

[0027] An underlayer (not shown) may be provided adjacent to the second surface side of the metal layer. The underlayer is intended to improve the crystal orientation of the metal layer when the metal layer is formed. The underlayer contains, for example, at least one metal element selected from the group consisting of titanium (Ti) and tantalum (Ta). The underlayer may contain the at least one metal element as a constituent element of an alloy.

[0028] The transparent conductive oxide layer contains a transparent conductive oxide, for example, at least one selected from the group consisting of transparent conductive oxides containing indium (hereinafter referred to as "indium-based transparent conductive oxides"), transparent conductive oxides containing tin (hereinafter referred to as "tin-based transparent conductive oxides"), and transparent conductive oxides containing zinc (hereinafter referred to as "zinc-based transparent conductive oxides").

[0029] Examples of indium-based transparent conductive oxides include indium tin oxide (ITO), indium zinc oxide (IZO), indium gallium oxide (IGO), indium gallium zinc oxide (IGZO), and fluorine-doped indium oxide (IFO). Among these transparent conductive oxides, indium tin oxide (ITO) is particularly preferred. This is because indium tin oxide (ITO) has a particularly low work function barrier for hole injection into the organic EL layer 14, allowing the driving voltage of the display device 10 to be particularly low. Examples of tin-based transparent conductive oxides include tin oxide, antimony-doped tin oxide (ATO), and fluorine-doped tin oxide (FTO). Examples of zinc-based transparent conductive oxides include zinc oxide, aluminum-doped zinc oxide (AZO), boron-doped zinc oxide, and gallium-doped zinc oxide (GZO).

[0030] (insulating layer) The insulating layer 13 is provided on the first surface of the drive substrate 11 in a portion between adjacent first electrodes 12. The insulating layer 13 provides insulation between adjacent first electrodes 12. The insulating layer 13 has a plurality of openings 13A. Each of the plurality of openings 13A is provided corresponding to each sub-pixel 100. More specifically, each of the plurality of openings 13A is provided on the first surface (the surface on the organic EL layer 14 side) of each first electrode 12. The first electrodes 12 and the organic EL layer 14 come into contact with each other through the openings 13A.

[0031] The insulating layer 13 may be an organic insulating layer, an inorganic insulating layer, or a laminate thereof. The organic insulating layer contains at least one selected from the group consisting of, for example, polyimide resin, acrylic resin, and novolac resin. The inorganic insulating layer contains, for example, silicon oxide (SiO x ), silicon nitride (SiN x ) and silicon oxynitride (SiO x N y ) and the like.

[0032] (Organic EL layer) The organic EL layer 14 is provided between the plurality of first electrodes 12 and the second electrodes 15. The organic EL layer 14 is provided continuously across all the subpixels 100 (i.e., the plurality of subpixels 100R, the plurality of subpixels 100G, and the plurality of subpixels 100B) in the display region 110A, and is a layer common to all the subpixels 100 in the display region 110A.

[0033] The organic EL layer 14 is an example of an organic layer including a light-emitting layer. The organic EL layer 14 is configured to be able to emit white light. The organic EL layer 14 may be an organic EL layer 14 including a single light-emitting unit, an organic EL layer 14 including two or more light-emitting units (tandem structure), or an organic EL layer 14 having a structure other than these.

[0034] The organic EL layer 14 having a single light-emitting unit has a configuration in which, from the first electrode 12 toward the second electrode 15, a hole injection layer 14HIL, a hole transport layer 14HTL, a red light-emitting layer 14REL, an emission separation layer 14SL, a blue light-emitting layer 14BEL, a green light-emitting layer 14GEL, an electron transport layer 14ETL, and an electron injection layer 14EIL are stacked in this order, as shown in FIG. 5A. Alternatively, the organic EL layer 14 having a single light-emitting unit has a configuration in which, from the first electrode 12 toward the second electrode 15, a hole injection layer 14HIL, a hole transport layer 14HTL, a blue light-emitting layer 14BEL, an emission separation layer 14SL, a yellow light-emitting layer 14YEL, an electron transport layer 14ETL, and an electron injection layer 14EIL are stacked in this order, as shown in FIG. 5B. The stacking positions of the blue light-emitting layer 14BEL and the yellow light-emitting layer 14YEL are not limited to the example shown in FIG. 5B, and the blue light-emitting layer 14BEL and the yellow light-emitting layer 14YEL may be interchanged.

[0035] 6A, the organic EL layer 14 having two light-emitting units has a configuration in which a hole injection layer 14HIL, a hole transport layer 14HTL, a green light-emitting layer 14GEL, a red light-emitting layer 14REL, an electron transport layer 14ETL, a charge generation layer 14CGL, a hole transport layer 14HTL, a blue light-emitting layer 14BEL, an electron transport layer 14ETL, and an electron injection layer 14EIL are stacked in this order from the first electrode 12 to the second electrode 15. Alternatively, the organic EL layer 14 having two light-emitting units has a configuration in which a hole injection layer 14HIL, a hole transport layer 14HTL, a blue light-emitting layer 14BEL, an electron transport layer 14ETL, a charge generation layer 14CGL, a hole transport layer 14HTL, a yellow light-emitting layer 14YEL, an electron transport layer 14ETL, and an electron injection layer 14EIL are stacked in this order from the first electrode 12 to the second electrode 15. Alternatively, as shown in FIG. The stacking positions of the blue light-emitting layer 14BEL and the yellow light-emitting layer 14YEL are not limited to the example shown in FIG. 6B, and the blue light-emitting layer 14BEL and the yellow light-emitting layer 14YEL may be interchanged.

[0036] The hole injection layer 14HIL is intended to increase the efficiency of hole injection into each light-emitting layer and suppress leakage. The hole transport layer 14HTL is intended to increase the efficiency of hole transport into each light-emitting layer. The electron injection layer 14EIL is intended to increase the efficiency of electron injection into each light-emitting layer. The electron transport layer 14ETL is intended to increase the efficiency of electron transport into each light-emitting layer. The emission separation layer 14SL is a layer that adjusts the injection of carriers into each light-emitting layer, and the emission balance of each color is adjusted by injecting electrons and holes into each light-emitting layer through the emission separation layer 14SL. The charge generation layer 14CGL supplies electrons and holes to the two light-emitting layers that sandwich the charge generation layer 14CGL.

[0037] When an electric field is applied to the red light-emitting layer 14REL, the green light-emitting layer 14GEL, the blue light-emitting layer 14BEL, and the yellow light-emitting layer 14YEL, recombination occurs between holes injected from the first electrode 12 and electrons injected from the second electrode 15, and the layers emit red light, green light, blue light, and yellow light, respectively.

[0038] (Second electrode) The second electrode 15 is disposed opposite the plurality of first electrodes 12. The second electrode 15 is disposed continuously across all of the subpixels 100 in the display region 110A and serves as a common electrode for all of the subpixels 100 in the display region 110A. The second electrode 15 is a cathode. When a voltage is applied between the first electrode 12 and the second electrode 15, electrons are injected from the second electrode 15 into the organic EL layer 14. The second electrode 15 is a transparent electrode that is transparent to light generated in the organic EL layer 14. In order to increase luminous efficiency, it is preferable that the second electrode 15 be made of a material that is as transparent as possible and has a small work function.

[0039] The second electrode 15 is composed of, for example, at least one layer of a metal layer and a transparent conductive oxide layer. More specifically, the second electrode 15 is composed of a single layer film of a metal layer or a transparent conductive oxide layer, or a laminated film of a metal layer and a transparent conductive oxide layer. When the second electrode 15 is composed of a laminated film, the metal layer may be provided on the organic EL layer 14 side, or the transparent conductive oxide layer may be provided on the organic EL layer 14 side. However, from the viewpoint of having a layer having a low work function adjacent to the organic EL layer 14, it is preferable that the metal layer be provided on the organic EL layer 14 side.

[0040] The second electrode 15 adjusts the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixel 100G. The thickness of the second electrode 15 is set so that green light, which corresponds to the color of the subpixel 100G, resonates and is emphasized in the resonator structure. While FIG. 2 shows an example in which the thickness of the second electrode 15 in the subpixel 100G is the same as the thickness of the second electrode 15 in the subpixels 100R and 100B, the thickness of the second electrode 15 in the subpixel 100G may be thinner than the thickness of the second electrode 15 in the subpixels 100R and 100B.

[0041] The metal layer contains at least one metal element selected from the group consisting of magnesium (Mg), aluminum (Al), silver (Ag), calcium (Ca), and sodium (Na). The metal layer may contain at least one of the metal elements as a constituent element of an alloy. Specific examples of the alloy include an MgAg alloy, an MgAl alloy, and an AlLi alloy. The transparent conductive oxide layer contains a transparent conductive oxide. Examples of the transparent conductive oxide include the same materials as the transparent conductive oxide of the first electrode 12 described above.

[0042] (contact part) The contact portion 12A is an auxiliary electrode that connects the second electrode 15 and an underlying wiring (not shown). The underlying wiring is provided, for example, on the first surface of the drive substrate 11. A peripheral portion 15A of the second electrode 15 extends to the peripheral region 110B. The first surface of the contact portion 12A is connected to the peripheral portion 15A of the second electrode 15. On the other hand, the second surface of the contact portion 12A is connected to the underlying wiring via a contact plug (not shown). In this specification, the peripheral portion 15A of the second electrode 15 refers to a region having a predetermined width extending inward from the periphery of the second electrode 15.

[0043] The contact portion 12A may have a closed loop shape surrounding the rectangular display region 110A in a plan view. While Fig. 1 shows an example in which the peripheral region 110B has an inverted L shape in a plan view, the peripheral region 110B may have a closed loop shape in a plan view. A specific example of the closed loop shape of the contact portion 12A and the peripheral region 110B is a rectangular ring shape.

[0044] The contact portion 12A is composed of at least one layer of a metal layer and a metal oxide layer. More specifically, the contact portion 12A is composed of a single layer of a metal layer or a metal oxide layer, or a laminated layer of a metal layer and a metal oxide layer. When the contact portion 12A is composed of a laminated layer, the metal oxide layer may be provided on the second electrode 15 side, or the metal layer may be provided on the second electrode 15 side.

[0045] Examples of materials constituting the contact portion 12A include the same materials as those of the above-described first electrode 12. Specifically, examples of materials constituting the metal layer and metal oxide layer of the contact portion 12A include the same materials as those of the metal layer and metal oxide layer of the above-described first electrode 12, respectively.

[0046] The contact portion 12A may have the same configuration as the first electrode 12. The metal layer and metal oxide layer of the contact portion 12A may be made of the same materials as the metal layer and metal oxide layer of the first electrode 12, respectively.

[0047] (Optical adjustment layer) The optical adjustment layer 16 has openings 16A in portions corresponding to the plurality of subpixels 100G. The subpixels 100R and 100B each have the optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17. As a result, the second electrode 15 and the semi-transmissive reflective layer 17 are spaced apart in the subpixels 100R and 100B. On the other hand, the subpixel 100G does not have the optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17. As a result, the second electrode 15 and the semi-transmissive reflective layer 17 are adjacent to each other in the subpixel 100G.

[0048] The optical adjustment layer 16 is transparent to the light generated in the organic EL layer 14. The thickness of the optical adjustment layer 16 is the same in the subpixels 100R and 100B. As a result, the height of the first surface of the optical adjustment layer 16 is the same in the subpixels 100R and 100B. The optical adjustment layer 16 adjusts the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in each of the subpixels 100R and 100B. The thickness of the optical adjustment layer 16 in the subpixels 100R and 100B is set so that the red light corresponding to the color of the subpixel 100R and the blue light corresponding to the color of the subpixel 100B resonate and are emphasized in the resonator structure.

[0049] The optical adjustment layer 16 may be an organic layer, an inorganic layer, or a laminate thereof. The organic layer contains at least one selected from the group consisting of, for example, polyimide resins, acrylic resins, novolac resins, paraxylylene compounds such as Parylene (registered trademark), and polymers of monomer materials used in organic EL. The inorganic layer may be, for example, silicon oxide (SiO x ), silicon nitride (SiN x ) and silicon oxynitride (SiO x N y ) and the like.

[0050] (semi-transparent reflective layer) The semi-transmissive reflective layer 17 is provided on the first surface of the optical adjustment layer 16 in the subpixels 100R and 100B, and on the first surface of the second electrode 15 in the subpixel 100G. The heights of the semi-transmissive reflective layers 17 in the subpixels 100R and 100B are the same. This prevents the surface on which the semi-transmissive reflective layer 17 is formed from becoming complex. The semi-transmissive reflective layer 17 transmits a portion of the light generated in the organic EL layer 14 and reflects the remainder. While FIG. 2 shows an example in which the semi-transmissive reflective layer 17 is separated between the subpixels 100R and 100G and between the subpixels 100G and 100B, as shown in FIG. 4, the semi-transmissive reflective layer 17 may be continuous between the subpixels 100R and 100G and between the subpixels 100G and 100B. That is, the semi-transmissive reflective layer 17 may be connected between the sub-pixels 100 in the display region 110A. In this case, the resistance of the second electrode 15 can be reduced.

[0051] 4, the peripheral edge 17A of the semi-transmissive reflective layer 17 may extend to the peripheral region 110B. In this case, the peripheral edge 17A of the semi-transmissive reflective layer 17 may be directly connected to the first surface of the contact portion 12A, or the peripheral edge 17A of the semi-transmissive reflective layer 17 may be connected to the first surface of the contact portion 12A with the peripheral edge 15A of the second electrode 15 sandwiched therebetween.

[0052] The semi-transmissive reflective layer 17 is, for example, a metal layer. The metal layer contains at least one metal element selected from the group consisting of magnesium (Mg), aluminum (Al), silver (Ag), calcium (Ca), gold (Au), copper (Cu), tin (Sn), zinc (Zn), and sodium (Na). The metal layer may contain at least one of the metal elements as a constituent element of an alloy. Specific examples of the alloy include an MgAg alloy, an MgAl alloy, and an AlLi alloy.

[0053] The semi-transmissive reflective layer 17 may be a multilayer film in which a first metal layer and a second metal layer are stacked. Of the first and second metal layers, the first metal layer may be provided on the organic EL layer 14 side. The first metal layer may contain, for example, at least one metal element selected from the group consisting of calcium (Ca), barium (Ba), lithium (Li), cesium (Cs), indium (In), magnesium (Mg), and silver (Ag). The first metal layer may contain the at least one metal element as a constituent element of an alloy. The second metal layer may contain, for example, at least one metal element selected from the group consisting of magnesium (Mg) and silver (Ag). The second metal layer may contain the at least one metal element as a constituent element of an alloy.

[0054] The semi-transmissive reflective layer 17 may be a transparent material layer containing a transparent material. The transparent material layer may have a refractive index different from that of the optical adjustment layer 16 and the second electrode 15 that are layers below the transparent material layer. The transparent material layer may have a refractive index different from that of the protective layer 18 that is a layer above the transparent material layer.

[0055] From the viewpoint of improving reflectance, the refractive index difference Δn1 between the transparent material layer and the optical adjustment layer 16 and the refractive index difference Δn2 between the transparent material layer and the second electrode 15 are preferably 0.1 or greater. Here, the refractive index difference Δn1 represents at least one of the refractive index difference at the peak wavelength of the blue light emitted from the subpixel 100B and the refractive index difference at the peak wavelength of the red light emitted from the subpixel 100R. Furthermore, the refractive index difference Δn2 between the transparent material layer and the second electrode 15 represents the refractive index difference at the peak wavelength of the green light emitted from the subpixel 100G.

[0056] From the viewpoint of improving reflectance, the refractive index difference Δn3 between the transparent material layer and the protective layer 18 is preferably 0.1 or more. Here, the refractive index difference Δn3 between the transparent material layer and the protective layer 18 represents at least one of the refractive index difference at the peak wavelength of blue light emitted from the subpixel 100B, the refractive index difference at the peak wavelength of green light emitted from the subpixel 100G, and the refractive index difference at the peak wavelength of red light emitted from the subpixel 100R.

[0057] The transparent material includes a transparent conductive oxide or a dielectric. Examples of the transparent conductive oxide include the same materials as the transparent conductive oxide of the first electrode 12. The dielectric includes, for example, at least one selected from the group consisting of oxides, nitrides, sulfides, carbides, and fluorides.

[0058] (protective layer) The protective layer 18 is provided on the first surface of the semi-transmissive reflective layer 17 and covers the plurality of light-emitting elements 101. The protective layer 18 isolates the light-emitting elements 101 from the outside air and prevents moisture from entering the light-emitting elements 101 from the external environment. In addition, when the semi-transmissive reflective layer 17 is made of a metal layer, the protective layer 18 may have a function of preventing oxidation of the metal layer.

[0059] The protective layer 18 contains, for example, an inorganic material or polymer resin with low moisture absorption. The protective layer 18 may have a single-layer structure or a multi-layer structure. When the thickness of the protective layer 18 is increased, a multi-layer structure is preferable. This is to relieve internal stress in the protective layer 18. The inorganic material is, for example, silicon oxide (SiO x ), silicon nitride (SiN x ), silicon oxynitride (SiO x N y ), titanium oxide (TiO x ) and aluminum oxide (AlO x The polymer resin includes at least one selected from the group consisting of, for example, a thermosetting resin and an ultraviolet curing resin.

[0060] (Color filter) The color filter 19 is provided on the first surface of the protective layer 18. The color filter 19 is, for example, an on-chip color filter (OCCF). The color filter 19 includes a red filter 19R, a green filter 19G, and a blue filter 19B. The red filter 19R is a filter of the same color as the red light emitted from the light-emitting element 101R. The green filter 19G is a filter of the same color as the green light emitted from the light-emitting element 101G. The blue filter 19B is a filter of the same color as the blue light emitted from the light-emitting element 101B.

[0061] Red filter 19R, green filter 19G, and blue filter 19B are provided facing light-emitting element 101R, light-emitting element 101G, and light-emitting element 101B, respectively. Red filter 19R and light-emitting element 101R form sub-pixel 100R, green filter 19G and light-emitting element 101G form sub-pixel 100G, and blue filter 19B and light-emitting element 101B form sub-pixel 100B.

[0062] The red light emitted from the light-emitting element 101R passes through the red filter 19R, whereas the blue light emitted from the light-emitting element 101R is blocked by the red filter 19R, thereby allowing red light with high color purity to be emitted from the sub-pixel 100R.

[0063] The green light emitted from the light-emitting element 101G passes through the green filter 19G, while the visible light other than the green light emitted from the light-emitting element 101G is blocked by the green filter 19G, thereby allowing the sub-pixel 100G to emit green light with high color purity.

[0064] The blue light emitted from the light-emitting element 101B passes through the blue filter 19B, whereas the red light emitted from the light-emitting element 101B is blocked by the blue filter 19B, thereby allowing blue light with high color purity to be emitted from the sub-pixel 100B.

[0065] Furthermore, a light-shielding layer may be provided between the color filters 19R, 19G, and 19B, that is, between the sub-pixels 100.

[0066] [Display device manufacturing method] An example of a method for manufacturing the display device 10 according to the first embodiment of the present disclosure will be described below.

[0067] First, a metal layer and a transparent conductive oxide layer are sequentially formed on the first surface of the drive substrate 11 by, for example, sputtering, and then the metal layer and the transparent conductive oxide layer are patterned by, for example, photolithography and etching, thereby forming a plurality of first electrodes 12.

[0068] Next, for example, by CVD (Chemical Vapor Deposition), an insulating layer 13 is formed on the first surface of the drive substrate 11 so as to cover the plurality of first electrodes 12. Next, for example, by photolithography and dry etching, openings 13A are formed in the insulating layer 13 in portions located on the first surfaces of the first electrodes 12.

[0069] Next, a hole transport layer, a red light-emitting layer, an emission separation layer, a blue light-emitting layer, a green light-emitting layer, an electron transport layer, and an electron injection layer are laminated in this order on the first surfaces of the plurality of first electrodes 12 and the first surface of the insulating layer 13, for example, by vapor deposition, to form the organic EL layer 14. Next, a second electrode 15 is formed on the first surface of the organic EL layer 14, for example, by vapor deposition or sputtering.

[0070] Next, the optical adjustment layer 16 is formed on the first surface of the second electrode 15, for example, by CVD. Next, openings 16A are formed in the optical adjustment layer 16 in portions corresponding to each subpixel 100G, for example, by photolithography and dry etching. Next, the semi-transmissive reflective layer 17 is formed on the first surface of the second electrode 15 and the first surface of the optical adjustment layer 16, for example, by vapor deposition or sputtering.

[0071] Next, a protective layer 18 is formed on the first surface of the semi-transmissive reflective layer 17 by, for example, CVD or vapor deposition so as to fill the opening 16A, and then a color filter 19 is formed on the first surface of the protective layer 18 by, for example, photolithography. In this way, the display device 10 shown in FIG. 2 is obtained.

[0072] [Action and effect] As described above, in the display device 10 according to the first embodiment, the subpixels 100R and 100B each include an optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17, and the thickness of the optical adjustment layer 16 is the same in the subpixels 100R and 100B. This allows the height of the semi-transmissive reflective layer 17 to be the same in the subpixels 100R and 100B. Therefore, compared to a display device in which the thickness of the optical adjustment layer varies depending on the color of the subpixel (see, for example, Patent Document 1), the uneven shape of the surface on which the semi-transmissive reflective layer 17 is formed (i.e., the first surface of the optical adjustment layer 16) can be prevented from becoming complex. This prevents an increase in the number of steps required to process the optical adjustment layer 16, thereby preventing a decrease in productivity. Furthermore, since each of the light emitting elements 101R, 101G, and 101B has a resonator structure, the light extraction efficiency can be improved, the luminous efficiency can be improved, and the color gamut can be expanded.

[0073] The manufacturing method of the display device 10 according to the first embodiment only includes the steps of forming the optical adjustment layer 16, etching the optical adjustment layer 16 (etching only the portion of the optical adjustment layer 16 corresponding to the subpixel 100G), and forming the semi-transmissive reflective layer 17, in addition to the manufacturing method of a conventional display device. Therefore, since only three steps are added to the manufacturing method of a conventional display device, it is possible to manufacture a display device 10 in which each subpixel 100 has a resonator structure while suppressing an increase in the number of manufacturing steps. In other words, it is possible to manufacture the display device 10 while suppressing an increase in manufacturing costs. Here, the conventional display device refers to a display device in which each subpixel does not have a resonator structure.

[0074] <2. Second embodiment> [Display device configuration] 7 is a cross-sectional view showing an example of the configuration of a display device 20 according to a second embodiment of the present disclosure. The display device 20 differs from the display device 10 according to the first embodiment in that the display region 110A further includes a plurality of sub-pixels 100IR.

[0075] (sub-pixel) The subpixel 100IR includes a light-emitting element 101IR that emits green light and infrared light (IR). The subpixel 100IR has a layer configuration similar to that of the subpixel 100G. That is, the subpixel 100IR includes a first electrode 12, an organic EL layer 14, a second electrode 15, and a semi-transmissive reflective layer 17, in this order. The infrared light is an example of a fourth light. The subpixel 100IR is an example of a fourth subpixel. In the second embodiment, the subpixel 100G includes a light-emitting element 101G that emits green light and infrared light (IR).

[0076] The subpixel 100IR has a resonator structure. The resonator structure of the subpixel 100IR is composed of a first electrode 12 and a semi-transmissive reflective layer 17. The resonator structure of the subpixels 100G and 100IR is configured to resonate and emphasize green light and infrared light contained in light generated in the organic EL layer 14 and emit the light toward the display surface. In the second embodiment, the light generated in the organic EL layer 14 includes at least white light and infrared light. In the resonator structure of the subpixels 100G and 100IR, the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 is set so that the green light and infrared light are resonated and emphasized.

[0077] (Organic EL layer) The organic EL layer 14 is provided continuously across all subpixels 100 (i.e., multiple subpixels 100R, multiple subpixels 100G, multiple subpixels 100B, and multiple subpixels 100IR) in the display region 110A, and is a layer common to all subpixels 100 in the display region 110A.

[0078] (Second electrode) The second electrode 15 adjusts the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixels 100G and 100IR. The thickness of the optical adjustment layer 16 in the subpixel 100G is set so that the green light corresponding to the subpixel 100G and the infrared light corresponding to the subpixel 100IR resonate and are emphasized in the resonator structure. While FIG. 7 shows an example in which the thickness of the second electrode 15 in the subpixels 100G and 100IR is the same as the thickness of the second electrode 15 in the subpixels 100R and 100B, the thickness of the second electrode 15 in the subpixels 100G and 100IR may be thinner than the thickness of the second electrode 15 in the subpixels 100R and 100B.

[0079] (Optical adjustment layer) The optical adjustment layer 16 has openings 16A in portions corresponding to the subpixels 100G and 100IR. The subpixels 100G and 100IR do not have the optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17. As a result, the second electrode 15 and the semi-transmissive reflective layer 17 are adjacent to each other in the subpixels 100G and 100IR. FIG. 7 shows an example in which the semi-transmissive reflective layer 17 is separated between the subpixels 100R and 100IR and between the subpixels 100G and 100B. However, the semi-transmissive reflective layer 17 may be continuous between the subpixels 100R and 100IR and between the subpixels 100G and 100B. That is, the semi-transmissive reflective layer 17 may be continuous between the subpixels 100 in the display region 110A. In this case, the resistance of the second electrode 15 can be reduced.

[0080] (semi-transparent reflective layer) The semi-transmissive reflective layer 17 is provided on the first surface of the optical adjustment layer 16 in the sub-pixels 100R and 100B, and is provided on the first surface of the second electrode 15 in the sub-pixels 100G and 100IR. The height of the semi-transmissive reflective layer 17 in the sub-pixels 100R and 100B is the same. The height of the semi-transmissive reflective layer 17 in the sub-pixels 100G and 100IR is also the same. This makes it possible to prevent the uneven shape of the surface on which the semi-transmissive reflective layer 17 is formed from becoming complex.

[0081] 7 shows an example in which the semi-transmissive reflective layer 17 is separated between the subpixels 100R and 100IR and between the subpixels 100G and 100B, but the semi-transmissive reflective layer 17 may be continuous between the subpixels 100R and 100IR and between the subpixels 100G and 100B. That is, the semi-transmissive reflective layer 17 may be continuous between the subpixels 100 in the display region 110A. In this case, the resistance of the second electrode 15 can be reduced.

[0082] (Color filter) The color filter 19 includes a red filter 19R, a green filter 19G, a blue filter 19B, and an infrared light transmitting filter 19IR. The red filter 19R, the green filter 19G, and the blue filter 19B are as described in the first embodiment. The infrared light transmitting filter 19IR is disposed opposite the light emitting element 101IR. The infrared light transmitting filter 19IR and the light emitting element 101IR form a sub-pixel 100IR. The infrared light transmitting filter 19IR is configured to transmit infrared light but block visible light, which has a wavelength range lower than that of infrared light. Note that the color filter 19 does not necessarily have to include the infrared light transmitting filter 19IR.

[0083] The green light contained in the light emitted from the light emitting element 101G passes through the green filter 19G, whereas the infrared light contained in the light emitted from the light emitting element 101IR is blocked by the green filter 19G, thereby allowing green light with high color purity to be emitted from the sub-pixel 100G.

[0084] The infrared light contained in the light emitted from the light emitting element 101IR passes through the infrared light transmitting filter 19IR, whereas the green light contained in the light emitted from the light emitting element 101IR is blocked by the infrared light transmitting filter 19IR, thereby reducing components other than infrared light and allowing highly pure infrared light to be emitted from the sub-pixel 100IR.

[0085] [Action and effect] As described above, in the display device 20 according to the second embodiment, the subpixels 100G and 100IR do not include the optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17. As a result, in the subpixels 100G and 100IR, the semi-transmissive reflective layer 17 is provided adjacent to the second electrode 15 and has the same height. Therefore, even when four types of subpixels 100, namely the subpixels 100R, 100G, 100B, and 100IR, are provided, the uneven shape of the surface on which the semi-transmissive reflective layer 17 is formed (i.e., the first surface of the optical adjustment layer 16) can be prevented from becoming complex. This prevents an increase in the number of steps required to process the optical adjustment layer 16, thereby preventing a decrease in productivity.

[0086] <3 Variations> [Variation 1] 8 is a cross-sectional view showing an example of the configuration of a display device 10A according to Modification 1. In the display device 10 according to the first embodiment, an example (see FIG. 2) has been described in which the optical adjustment layer 16 has openings 16A in portions corresponding to the plurality of sub-pixels 100G, but in the display device 10A according to Modification 1, an example will be described in which the optical adjustment layer 16 has openings 16A in portions corresponding to the plurality of sub-pixels 100R, 100B.

[0087] (sub-pixel) The subpixels 100R and 100B do not have an optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17. As a result, in the subpixels 100R and 100B, the second electrode 15 and the semi-transmissive reflective layer 17 are adjacent to each other and are at the same height. On the other hand, the subpixel 100G has an optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17. As a result, in the subpixel 100G, the second electrode 15 and the semi-transmissive reflective layer 17 are spaced apart.

[0088] (Optical adjustment layer) The optical adjustment layer 16 adjusts the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixel 100G. The thickness of the optical adjustment layer 16 in the subpixel 100G is set so that green light, which corresponds to the color of the subpixel 100G, is resonated and emphasized in the resonator structure.

[0089] (Second electrode) The second electrode 15 adjusts the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in each of the sub-pixels 100R and 100B. The thickness of the second electrode 15 in the sub-pixels 100R and 100B is set so that the red light corresponding to the color of the sub-pixel 100R and the blue light corresponding to the color of the sub-pixel 100B resonate and are emphasized in the resonator structure.

[0090] [Variation 2] 9 is a cross-sectional view showing an example of the configuration of a display device 10B according to Modification 2. In the display device 10 according to the first embodiment, an example (see FIG. 2) has been described in which the optical adjustment layer 16 has openings 16A in portions corresponding to the plurality of sub-pixels 100G, but in the display device 10B according to Modification 2, an example will be described in which the optical adjustment layer 16 has convex portions 16B in portions corresponding to the plurality of sub-pixels 100G. That is, an example will be described in which the optical adjustment layer 16 has concave portions 16C in portions corresponding to the plurality of sub-pixels 100R and the plurality of sub-pixels 100B.

[0091] (sub-pixel) The subpixel 100G includes an optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17. As a result, the second electrode 15 and the semi-transmissive reflective layer 17 are spaced apart in the subpixel 100G. The thickness of the optical adjustment layer 16 in the subpixel 100G is different from the thicknesses of the optical adjustment layer 16 in the subpixels 100R and 100B. More specifically, the thickness of the optical adjustment layer 16 in the subpixel 100G is greater than the thicknesses of the optical adjustment layer 16 in the subpixels 100R and 100B. However, the thickness of the optical adjustment layer 16 in the subpixel 100G may be smaller than the thicknesses of the optical adjustment layer 16 in the subpixels 100R and 100B.

[0092] (Optical adjustment layer) The optical adjustment layer 16 adjusts the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixel 100G. The thickness of the optical adjustment layer 16 in the subpixel 100G is set so that green light, which corresponds to the color of the subpixel 100G, is resonated and emphasized in the resonator structure.

[0093] [Variation 3] 10 is a cross-sectional view showing an example of the configuration of a display device 20A according to Modification 3. In the second embodiment, an example (see FIG. 7) was described in which the optical adjustment layer 16 has openings 16A in portions corresponding to the plurality of sub-pixels 100G, 100IR, respectively, but in the display device 10A according to Modification 3, an example will be described in which the optical adjustment layer 16 has openings 16A in portions corresponding to the plurality of sub-pixels 100R, 100B, respectively.

[0094] (sub-pixel) The subpixels 100R and 100B do not have an optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17. As a result, in the subpixels 100R and 100B, the second electrode 15 and the semi-transmissive reflective layer 17 are adjacent to each other and are at the same height. On the other hand, the subpixels 100G and 100IR have an optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17. As a result, in the subpixels 100G and 100IR, the second electrode 15 and the semi-transmissive reflective layer 17 are spaced apart from each other and are at the same height.

[0095] (Optical adjustment layer) The thickness of the optical adjustment layer 16 in the subpixels 100G and 100IR is the same. As a result, the height of the first surface of the optical adjustment layer 16 in the subpixels 100G and 100IR is the same. The optical adjustment layer 16 adjusts the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in each of the subpixels 100G and 100IR. The thickness of the optical adjustment layer 16 in the subpixels 100G and 100IR is set so that the green light corresponding to the subpixel 100G and the infrared light corresponding to the subpixel 100IR resonate and are emphasized in the resonator structure.

[0096] (Second electrode) The second electrode 15 adjusts the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in each of the sub-pixels 100R and 100B. The thickness of the second electrode 15 in the sub-pixels 100R and 100B is set so that the red light corresponding to the sub-pixel 100R and the blue light corresponding to the color of the sub-pixel 100B resonate and are emphasized in the resonator structure.

[0097] [Variation 4] 11 is a cross-sectional view showing an example of the configuration of a display device 20B according to Modification 4. In the second embodiment, an example (see FIG. 7) was described in which the optical adjustment layer 16 has openings 16A in portions corresponding to the plurality of sub-pixels 100G, 100IR, respectively. However, in the display device 10A according to Modification 4, an example will be described in which the optical adjustment layer 16 has convex portions 16B in portions corresponding to the plurality of sub-pixels 100G, 100IR, respectively. That is, an example will be described in which the optical adjustment layer 16 has concave portions 16C in portions corresponding to the plurality of sub-pixels 100R, 100B, respectively.

[0098] (sub-pixel) The subpixels 100G and 100IR include an optical adjustment layer 16 between the second electrode 15 and the semi-transmissive reflective layer 17. As a result, the second electrode 15 and the semi-transmissive reflective layer 17 are spaced apart in the subpixels 100G and 100IR. The thickness of the optical adjustment layer 16 in the subpixels 100G and 100IR is different from the thickness of the optical adjustment layer 16 in the subpixels 100R and 100B. More specifically, the thickness of the optical adjustment layer 16 in the subpixels 100G and 100IR is greater than the thickness of the optical adjustment layer 16 in the subpixels 100R and 100B. However, the thickness of the optical adjustment layer 16 in the subpixels 100G and 100IR may be less than the thickness of the optical adjustment layer 16 in the subpixels 100R and 100B.

[0099] (Optical adjustment layer) The thickness of the optical adjustment layer 16 in the subpixels 100G and 100IR is the same. As a result, the height of the first surface of the optical adjustment layer 16 in the subpixels 100G and 100IR is the same. The optical adjustment layer 16 adjusts the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in each of the subpixels 100G and 100IR. The thickness of the optical adjustment layer 16 in the subpixels 100G and 100IR is set so that the green light corresponding to the subpixel 100G and the infrared light corresponding to the subpixel 100IR resonate and are emphasized in the resonator structure.

[0100] [Variation 5] In the first embodiment and modifications 1 and 2, examples have been described in which the display devices 10, 10A, and 10B include the color filter 19, but the display devices 10, 10A, and 10B do not necessarily have to include the color filter 19. Similarly, the display devices 10C, 10D, 10E, 10F, 10G, 10H, and 10I described below do not necessarily have to include the color filter 19.

[0101] [Variation 6] In the first embodiment and Modifications 1 and 2, examples have been described in which all of the subpixels 100R, 100G, and 100B include filters. However, at least one of the subpixels 100R, 100G, and 100B may include a filter. That is, the color filter 19 may include at least one of a red filter 19R, a green filter 19G, and a blue filter 19B. For example, the color filter 19 may include a red filter 19R and a blue filter 19B. Similarly, in Modifications 11 to 13 and 17 to 19 described below, at least one of the subpixels 100R, 100G, and 100B may include a filter.

[0102] [Variation 7] In the second embodiment and Modifications 3 and 4, examples have been described in which the display devices 20, 20A, and 20B are provided with the color filter 19, but the display devices 20, 20A, and 20B may not be provided with the color filter 19. Similarly, the display devices 20C, 20D, 20E, 20F, 20G, and 20H described below may not be provided with the color filter 19.

[0103] [Variation 8] In the second embodiment and Modifications 3 and 4, examples have been described in which the subpixels 100R, 100G, 100B, and 100IR all include filters. However, at least one of the subpixels 100R, 100G, 100B, and 100IR may include a filter. That is, the color filter 19 may include at least one of the red filter 19R, the green filter 19G, the blue filter 19B, and the infrared light transmitting filter 19IR. Similarly, in Modifications 14 to 16 and 20 to 22 described below, at least one of the subpixels 100R, 100G, 100B, and 100IR may include a filter.

[0104] [Variation 9] In the first and second embodiments and Modifications 1 to 8, examples have been described in which the first electrode 12 is composed of adjacent metal layers and transparent conductive oxide layers, but an insulating layer may be provided between the metal layer and the transparent conductive oxide layer to separate them. In this case, the metal layer and the transparent conductive oxide layer may be electrically connected by a contact plug. The above configuration may also be used in Modifications 11 to 23 described below.

[0105] [Variation 10] In the first and second embodiments and modifications 1 to 8 and 11 to 23, the display devices 10, 10A, 10B, 10C, 10D, 10E, 10F, 10G, 10H, 10I, 20, 20A, 20B, 20C, 20D, 20E, 20F, 20G, and 20H (hereinafter referred to as "display device 10, etc.") may further include a filled resin layer and a counter substrate. The filled resin layer is provided between the color filter 19 and the counter substrate. The filled resin layer functions as an adhesive layer that bonds the color filter 19 and the counter substrate. The filled resin layer includes, for example, at least one resin selected from the group consisting of a thermosetting resin and an ultraviolet-curing resin.

[0106] The counter substrate is provided opposite the drive substrate 11. The counter substrate seals the plurality of light emitting elements 101, the color filter 19, etc. The counter substrate includes a material such as glass that is transparent to the colored light emitted from the color filter 19.

[0107] As described above, when the display device 10 or the like includes a counter substrate, the color filter 19 may be provided on the second surface of the counter substrate (the surface facing the organic EL layer 14).

[0108] [Variation 11] 12 is a cross-sectional view showing an example of the configuration of a display device 10C according to Modification 11. The display device 10C differs from the display device 10 according to the first embodiment (see FIG. 2) in that it further includes an etching stop layer 21.

[0109] The etching stop layer 21 is an example of an underlayer. The etching stop layer 21 can stop the progress of etching when the opening 16A is formed by etching. The etching stop layer 21 may also function as a protective layer to prevent moisture and the like from entering the second electrode 15, the organic EL layer 14, and the like from the outside. The etching stop layer 21 is transparent to light generated in the organic EL layer 14.

[0110] The etching rate of the etching stop layer 21 is slower than the etching rate of the optical adjustment layer 16. Here, the etching rate is the thickness of the layer removed by etching per unit time. The etching selectivity (S b / S a ) is preferably 5 or more, more preferably 10 or more, and even more preferably 15 or more. b / S a When the etching selectivity (S ) of the optical adjustment layer 16 to the etching stop layer 21 is 5 or more, it is possible to suppress a decrease in the thickness of the etching stop layer 21 due to the etching when the opening 16A is formed by etching. b / S a ) is the etching rate S of the etching stop layer 21 a Etching rate S of the optical adjustment layer 16 with respect to b Etching rate ratio (S b / S a )

[0111] The etching stop layer 21 is provided continuously across the plurality of subpixels 100 (i.e., the plurality of subpixels 100R, the plurality of subpixels 100G, and the plurality of subpixels 100B) in the display region 110A, and is a layer common to the plurality of subpixels 100 in the display region 110A. The subpixel 100G has the etching stop layer 21 between the second electrode 15 and the semi-transmissive reflective layer 17. The subpixel 100R and the subpixel 100B have the etching stop layer 21 and the optical adjustment layer 16, in that order, between the second electrode 15 and the semi-transmissive reflective layer 17. The etching stop layer 21 is made of, for example, a metal layer or a transparent conductive oxide layer.

[0112] The manufacturing method of the display device 10C according to variant example 11 differs from the manufacturing method of the display device 10 according to the first embodiment in that it further includes a step of forming an etching stop layer 21 between the step of forming the second electrode 15 and the step of forming the optical adjustment layer 16. In the step of forming the etching stop layer 21, the etching stop layer 21 is formed on the first surface of the second electrode 15 by, for example, vapor deposition or sputtering.

[0113] As described above, in the display device 10C according to the eleventh modification, the subpixel 100G includes the etching stop layer 21 between the second electrode 15 and the semi-transmissive reflective layer 17. This allows the etching stop layer 21 to stop the progress of etching when forming the opening 16A in the optical adjustment layer 16 by etching. This improves the processing accuracy of the depth of the opening 16A. In other words, it improves the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixel 100G.

[0114] [Variation 12] 13 is a cross-sectional view showing an example of the configuration of a display device 10D according to Modification 12. The display device 10D differs from the display device 10A according to Modification 1 (see FIG. 8) in that it further includes an etching stop layer 21.

[0115] The subpixel 100G includes an etching stop layer 21 and an optical adjustment layer 16, which are arranged in this order between the second electrode 15 and the semi-transmissive reflective layer 17. The subpixel 100R and the subpixel 100B each include an etching stop layer 21 between the second electrode 15 and the semi-transmissive reflective layer 17.

[0116] As described above, in the display device 10D according to the 12th modification, the subpixel 100R and the subpixel 100B include the etching stop layer 21 between the second electrode 15 and the semi-transmissive reflective layer 17. This allows the etching stop layer 21 to stop the progress of etching when forming the opening 16A in the optical adjustment layer 16 by etching. This improves the processing accuracy of the depth of the opening 16A. In other words, it improves the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixel 100R and the subpixel 100B.

[0117] [Variation 13] 14 is a cross-sectional view showing an example of the configuration of a display device 10E according to Modification 13. The display device 10E differs from the display device 10B according to Modification 2 (see FIG. 9) in that it includes an optical adjustment layer 22 instead of the optical adjustment layer 16, and further includes an etching stop layer 21.

[0118] Optical adjustment layer 22 includes, in order, first optical adjustment layer 22A and second optical adjustment layer 22B. More specifically, subpixel 100R and subpixel 100B include, in order, first optical adjustment layer 22A and etching stop layer 21 between second electrode 15 and semi-transmissive reflective layer 17. Subpixel 100G includes, in order, first optical adjustment layer 22A, etching stop layer 21, and second optical adjustment layer 22B between second electrode 15 and semi-transmissive reflective layer 17.

[0119] The first optical adjustment layer 22A is transparent to light generated in the organic EL layer 14. The first optical adjustment layer 22A is provided continuously across the plurality of subpixels 100 (i.e., the plurality of subpixels 100R, the plurality of subpixels 100G, and the plurality of subpixels 100B) in the display region 110A, and is a layer common to the plurality of subpixels 100 in the display region 110A.

[0120] The thickness of the first optical adjustment layer 22A in the subpixels 100R, 100G, and 100B is approximately the same. As a result, the height of the first surface of the first optical adjustment layer 22A in the subpixels 100R, 100G, and 100B is approximately the same. The first optical adjustment layer 22A can adjust the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in each of the subpixels 100R and 100B. The thickness of the first optical adjustment layer 22A in the subpixels 100R and 100B is set so that red light corresponding to the color of the subpixel 100R and blue light corresponding to the color of the subpixel 100B resonate and are emphasized in the resonator structure.

[0121] The second optical adjustment layer 22B is transparent to light generated in the organic EL layer 14. The second optical adjustment layer 22B can adjust the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixel 100G. The thickness of the second optical adjustment layer 22B in the subpixel 100G is set so that green light, which corresponds to the color of the subpixel 100G, is resonated and emphasized in the resonator structure.

[0122] The first optical adjustment layer 22A may be an organic layer, an inorganic layer, or a laminate thereof. Examples of materials for the organic layer and the inorganic layer include the same materials as those for the optical adjustment layer 16 in the first embodiment.

[0123] The second optical adjustment layer 22B may be an organic layer, an inorganic layer, or a laminate thereof. Examples of materials for the organic layer and the inorganic layer include the same materials as those for the optical adjustment layer 16 in the first embodiment.

[0124] As described above, in the display device 10E according to the thirteenth modification, the subpixels 100R and 100B include the etching stop layer 21 between the first optical adjustment layer 22A and the second optical adjustment layer 22B. This allows the etching stop layer 21 to stop the progress of etching when the openings 16A are formed in the second optical adjustment layer 22B by etching. This improves the processing accuracy of the depth of the openings 16A. In other words, it improves the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixels 100R and 100B.

[0125] [Variation 14] 15 is a cross-sectional view showing an example of the configuration of a display device 20C according to Modification 14. The display device 20C differs from the display device 20 according to the second embodiment (see FIG. 7) in that it further includes an etching stop layer 21.

[0126] The etching stop layer 21 is provided continuously across the plurality of subpixels 100 (i.e., the plurality of subpixels 100R, the plurality of subpixels 100G, the plurality of subpixels 100B, and the plurality of subpixels 100IR) in the display region 110A, and is a layer common to the plurality of subpixels 100 in the display region 110A. The subpixels 100G and 100IR have the etching stop layer 21 between the second electrode 15 and the semi-transmissive reflective layer 17. The subpixels 100R and 100B have the etching stop layer 21 and the optical adjustment layer 16, in that order, between the second electrode 15 and the semi-transmissive reflective layer 17.

[0127] As described above, in the display device 20C according to Modification 14, the subpixel 100G and the subpixel 100IR include the etching stop layer 21 between the second electrode 15 and the semi-transmissive reflective layer 17. This allows the etching stop layer 21 to stop the progress of etching when forming the opening 16A in the optical adjustment layer 16 by etching. This improves the processing accuracy of the opening 16A. In other words, it improves the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixel 100G and the subpixel 100IR.

[0128] [Variation 15] 16 is a cross-sectional view showing an example of the configuration of a display device 20D according to Modification 15. The display device 20D differs from the display device 20A according to Modification 3 (see FIG. 10) in that the display device 20D further includes an etching stop layer 21.

[0129] The subpixels 100G and 100IR each include an etching stop layer 21 and an optical adjustment layer 16, which are arranged in this order between the second electrode 15 and the semi-transmissive reflective layer 17. The subpixels 100R and 100B each include an etching stop layer 21 between the second electrode 15 and the semi-transmissive reflective layer 17.

[0130] As described above, in the display device 20D according to Modification 15, the subpixel 100R and the subpixel 100B include the etching stop layer 21 between the second electrode 15 and the semi-transmissive reflective layer 17. This allows the etching stop layer 21 to stop the progress of etching when forming the opening 16A in the optical adjustment layer 16 by etching. This improves the processing accuracy of the depth of the opening 16A. In other words, it improves the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixel 100R and the subpixel 100B.

[0131] [Variation 16] 17 is a cross-sectional view showing an example of the configuration of a display device 20E according to Modification 16. The display device 20E differs from the display device 20B according to Modification 4 (see FIG. 11) in that it includes an optical adjustment layer 22 instead of the optical adjustment layer 16, and further includes an etching stop layer 21.

[0132] Optical adjustment layer 22 includes, in order, first optical adjustment layer 22A and second optical adjustment layer 22B. More specifically, subpixel 100R and subpixel 100B include, in order, first optical adjustment layer 22A and etching stop layer 21 between second electrode 15 and semi-transmissive reflective layer 17. Subpixel 100G and subpixel 100IR include, in order, first optical adjustment layer 22A, etching stop layer 21, and second optical adjustment layer 22B between second electrode 15 and semi-transmissive reflective layer 17.

[0133] The first optical adjustment layer 22A is provided continuously across multiple subpixels 100 (i.e., multiple subpixels 100R, multiple subpixels 100G, and multiple subpixels 100B) in the display region 110A, and is a layer common to multiple subpixels 100 in the display region 110A.

[0134] The thickness of the first optical adjustment layer 22A in the subpixels 100R, 100G, 100B, and 100IR is approximately the same. As a result, the height of the first surface of the first optical adjustment layer 22A in the subpixels 100R, 100G, 100B, and 100IR is approximately the same. The first optical adjustment layer 22A can adjust the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in each of the subpixels 100R and 100B. The thickness of the first optical adjustment layer 22A in the subpixels 100R and 100B is set so that red light corresponding to the color of the subpixel 100R and blue light corresponding to the color of the subpixel 100B resonate and are emphasized in the resonator structure.

[0135] The second optical adjustment layer 22B can adjust the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 for each of the subpixels 100G and 100IR. The thickness of the second optical adjustment layer 22B for the subpixels 100G and 100IR is set so that the green light corresponding to the subpixels 100G and 100IR and the infrared light corresponding to the subpixel 100IR resonate and are emphasized in the resonator structure.

[0136] As described above, in the display device 20E according to Modification 16, the subpixel 100R and the subpixel 100B include the etching stop layer 21 between the first optical adjustment layer 22A and the semi-transmissive reflective layer 17. This allows the etching stop layer 21 to stop the progress of etching when forming the opening 16A in the second optical adjustment layer 22B by etching. This improves the processing accuracy of the depth of the opening 16A. In other words, it improves the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixel 100R and the subpixel 100B.

[0137] [Variation 17] 18 is a cross-sectional view showing an example of the configuration of a display device 10F according to Modification 17. The display device 10F differs from the display device 10 according to the first embodiment (see FIG. 2) in that it includes an optical adjustment layer 23 instead of the optical adjustment layer 16.

[0138] Like the optical adjustment layer 16 in the first embodiment, the optical adjustment layer 23 has openings 16A in portions corresponding to the plurality of subpixels 100G. The optical adjustment layer 23 includes an organic layer 23A and an inorganic layer 23B, which are arranged in this order on the first surface of the second electrode 15. Because the etching rate of the organic layer 23A is faster than the etching rate of the inorganic layer 23B, when the optical adjustment layer 23 is etched to form the openings 16A, the second electrode 15 makes it easier to stop the progress of etching.

[0139] The etching selectivity of the organic layer 23A to the inorganic layer 23B (S c / S d ) is preferably 5 or more, more preferably 10 or more, and further preferably 15 or more. c / S d ) is 5 or more, the etching selectivity (S c / S a ) can be increased. Therefore, when the opening 16A is formed in the optical adjustment layer 23 by etching, it is possible to suppress a reduction in the thickness of the second electrode 15 due to the etching. In this specification, the etching selectivity (S c / S d ) is the etching rate S of the inorganic layer 23B. d The etching rate S of the organic layer 23A relative to c Etching rate ratio (S c / S d ) represents the etching selectivity (S c / S a ) is the etching rate S of the second electrode 15. a The etching rate S of the organic layer 23A relative to c Etching rate ratio (S c / S a )

[0140] The etching selectivity of the organic layer 23A to the second electrode 15 (S c / S a) is preferably 5 or more, more preferably 10 or more, and even more preferably 15 or more. b / S a ) is 5 or more, when the opening 16A is formed in the optical adjustment layer 23 by etching, a reduction in the thickness of the second electrode 15 due to the etching can be suppressed.

[0141] The organic layer 23A may contain, for example, a known organic material used in the organic EL layer 14. Specifically, the organic layer 23A may contain, for example, at least one material selected from the group consisting of a hole transport material and an electron transport material.

[0142] The hole transport material includes at least one selected from the group consisting of, for example, poly(9,9-dioctylfluorene-alt-N-(4-butylphenyl)diphenylamine) (TFB), 4,4'-cyclohexylidenebis[N,N-bis(4-methylphenyl)benzenamine] (TAPC), N,N'-diphenyl-N,N'-di(m-tolyl)benzidine (TPD), N,N'-di(1-naphthyl)-N,N'-diphenylbenzidine (α-NPD), 4,4',4''-tri-9-carbazolyltriphenylamine (TCTA), and 4,4',4''-tris[phenyl(m-tolyl)amino]triphenylamine.

[0143] The electron transport material includes at least one selected from the group consisting of bis-4,6-(3,5-di-3-pyridylphenyl)-2-methylpyrimidine (B3PymPm), 2-(4-biphenylyl)-5-(pt-butylphenyl)-1,3,4-oxadiazole (tBu-PBD), 1,3-bis[5-(4-t-butylphenyl)-2-[1,3,4]oxadiazolyl]benzene (OXD-7), 3-(biphenyl-4-yl)-5-(4-t-butylphenyl)-4-phenyl-4H-1,2,4-triazole (TAZ), bathocuproine (BCP), and 1,3,5-tris(1-phenyl-1H-benzimidazol-2-yl)benzene (TPBi).

[0144] The organic layer 23A may contain the same organic material as the organic material contained in the organic EL layer 14. Specifically, for example, the organic layer 23A may contain the same organic material as the hole transport layer 14HTL or the electron transport layer 14ETL. In this case, the organic layer 23A can be formed using the same film formation equipment as the hole transport layer 14HTL or the electron transport layer 14ETL, thereby simplifying the manufacturing equipment. The organic layer 23A may contain a paraxylylene-based compound such as Parylene (registered trademark). The organic layer 23A may contain at least one type selected from the group consisting of thermosetting resins, ultraviolet-curing resins, and the like.

[0145] As described above, in the display device 10F according to the seventeenth modification, the optical adjustment layer 23 includes the organic layer 23A and the inorganic layer 23B in this order on the first surface of the second electrode 15. The etching selectivity (S c / S a ) is large, so when the optical adjustment layer 23 is etched to form the opening 16A, it is possible to suppress a reduction in the thickness of the second electrode 15 due to the etching. Therefore, it is possible to improve the processing accuracy of the depth of the opening 16A, and therefore it is possible to improve the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the subpixel 100G.

[0146] [Variation 18] 19 is a cross-sectional view showing an example of the configuration of a display device 10G according to Modification 18. The display device 10G differs from the display device 10A according to Modification 1 (see FIG. 8) in that the display device 10G includes an optical adjustment layer 23 instead of the optical adjustment layer 16.

[0147] Like the optical adjustment layer 16 in the first modification, the optical adjustment layer 23 has openings 16A in the portions corresponding to the plurality of sub-pixels 100R, 100B.

[0148] As described above, in the display device 10G according to the eighteenth modification, the optical adjustment layer 23 includes the organic layer 23A and the inorganic layer 23B in this order on the first surface of the second electrode 15. The etching selectivity (Sc / S a ) is large, so when the optical adjustment layer 23 is etched to form the opening 16A, it is possible to suppress a reduction in the thickness of the second electrode 15 due to the etching. Therefore, it is possible to improve the processing accuracy of the depth of the opening 16A, and therefore it is possible to improve the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the sub-pixel 100R and the sub-pixel 100B.

[0149] [Variation 19] 20 is a cross-sectional view showing an example of the configuration of a display device 10H according to Modification 19. The display device 10H differs from the display device 10B according to Modification 2 (see FIG. 9) in that it includes an optical adjustment layer 24 instead of the optical adjustment layer 16.

[0150] The optical adjustment layer 24 has convex portions 16B in portions corresponding to the plurality of sub-pixels 100G. The optical adjustment layer 24 has an inorganic layer 24A, an organic layer 24B, and an inorganic layer 24C, which are arranged in this order on the first surface of the second electrode 15. The convex portions 16B are formed by a laminate of the organic layer 24B and the inorganic layer 24C. The laminate of the organic layer 24B and the inorganic layer 24C has openings 16A in portions corresponding to the plurality of sub-pixels 100R, 100B.

[0151] Except for being made of an inorganic material, the inorganic layer 24A is similar to the first optical adjustment layer 22A (see FIG. 14) in Modification 13. The organic layer 24B and the inorganic layer 24C are similar to the organic layer 23A and the inorganic layer 23B (see FIG. 19), respectively, in Modification 19.

[0152] The etching selectivity of the organic layer 24B to the inorganic layer 24A (S f / S e ) is preferably 5 or more, more preferably 10 or more, and further preferably 15 or more. f / S eWhen the etching selectivity (S ) of the organic layer 24B to the inorganic layer 24A is 5 or more, it is possible to suppress a decrease in the thickness of the inorganic layer 24A due to etching when the opening 16A is formed in the organic layer 24B and the inorganic layer 24C by etching. f / S e ) is the etching rate S of the inorganic layer 23B. e The etching rate S of the organic layer 23A relative to f Etching rate ratio (S f / S e )

[0153] In the display device 10H according to the nineteenth modification, the optical adjustment layer 23 includes an inorganic layer 24A, an organic layer 24B, and an inorganic layer 24C in this order. The etching selectivity of the organic layer 24B to the inorganic layer 24A (S f / S e ) is large, so when the organic layer 24B and the inorganic layer 24C are etched to form the opening 16A, a reduction in the thickness of the inorganic layer 24A due to the etching can be suppressed. This improves the processing accuracy of the depth of the opening 16A, thereby improving the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the sub-pixel 100R and the sub-pixel 100B.

[0154] [Variation 20] 21 is a cross-sectional view showing an example of the configuration of a display device 20F according to Modification 20. The display device 20F differs from the display device 20 according to the second embodiment (see FIG. 7) in that it includes an optical adjustment layer 23 instead of the optical adjustment layer 16.

[0155] In the 20th modification, the optical adjustment layer 23 has openings 16A in portions corresponding to the plurality of sub-pixels 100G and the plurality of sub-pixels 100IR.

[0156] As described above, in the display device 20F according to the modification 20, the optical adjustment layer 23 includes the organic layer 23A and the inorganic layer 23B in this order on the first surface of the second electrode 15. This allows the etching selectivity (S c / S a ) can be increased. Therefore, when the optical adjustment layer 23 is etched to form the opening 16A, the progress of etching can be easily stopped by the second electrode 15. That is, the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the sub-pixel 100G and the sub-pixel 100IR can be improved.

[0157] [Variation 21] 22 is a cross-sectional view showing an example of the configuration of a display device 20G according to Modification 21. The display device 20G differs from the display device 20A according to Modification 3 (see FIG. 10) in that the display device 20G includes an optical adjustment layer 23 instead of the optical adjustment layer 16.

[0158] The optical adjustment layer 23 has openings 16A in portions corresponding to the plurality of sub-pixels 100R and 100B.

[0159] In the display device 20G according to the modification 21, the optical adjustment layer 23 includes an organic layer 23A and an inorganic layer 23B in this order on the first surface of the second electrode 15. This results in an etching selectivity (S c / S a ) can be increased. Therefore, when the optical adjustment layer 23 is etched to form the opening 16A, the progress of etching can be easily stopped by the second electrode 15. That is, the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the sub-pixel 100R and the sub-pixel 100B can be improved.

[0160] [Variation 22] 23 is a cross-sectional view showing an example of the configuration of a display device 20H according to Modification 22. The display device 20H differs from the display device 20B according to Modification 4 (see FIG. 11) in that the display device 20H includes an optical adjustment layer 23 instead of the optical adjustment layer 16.

[0161] In Modification 22, the optical adjustment layer 24 has convex portions 16B in portions corresponding to the sub-pixels 100G and 100IR, respectively. The stack of the organic layer 24B and the inorganic layer 24C has openings 16A in portions corresponding to the sub-pixels 100R and 100B, respectively.

[0162] As described above, in the display device 20H according to the modification 22, the optical adjustment layer 23 includes the inorganic layer 24A, the organic layer 24B, and the inorganic layer 24C, which are arranged in this order on the first surface of the second electrode 15. This allows the etching selectivity (S f / S e ) can be increased. Therefore, when the organic layer 24B and the inorganic layer 24C are etched to form the opening 16A, a reduction in the thickness of the inorganic layer 24A due to the etching can be suppressed. This improves the processing accuracy of the depth of the opening 16A, thereby improving the accuracy of the optical path length between the first electrode 12 and the semi-transmissive reflective layer 17 in the sub-pixel 100R and the sub-pixel 100B.

[0163] [Variation 23] 24 is a cross-sectional view showing an example of the configuration of a display device 10I according to Modification 23. The display device 10I differs from the display device 10 according to the first embodiment (see FIG. 3) in that it further includes a transparent electrode 25.

[0164] The transparent electrode 25 is an auxiliary electrode that electrically connects the semi-transmissive reflective layer 17 and the contact portion 12A. The transparent electrode 25 is transparent to the light generated in the organic EL layer 14. The transparent electrode 25 is provided on the first surface of the semi-transmissive reflective layer 17 so as to follow the unevenness formed by the multiple openings 16A. A peripheral portion 25A of the transparent electrode 25 extends to the peripheral region 110B. The peripheral portion 25A of the transparent electrode 25 may be directly connected to the first surface of the contact portion 12A, or the peripheral portion 25A of the transparent electrode 25 may be electrically connected to the first surface of the contact portion 12A so as to sandwich the peripheral portion 15A of the second electrode 15 therebetween.

[0165] The transparent electrode 25 is composed of, for example, at least one layer of a metal layer and a transparent conductive oxide layer. More specifically, the second electrode 15 is composed of a single layer film of a metal layer or a transparent conductive oxide layer, or a laminate film of a metal layer and a transparent conductive oxide layer. Examples of the metal layer include materials similar to the metal of the second electrode 15 described above. Examples of the transparent conductive oxide include materials similar to the transparent conductive oxide of the second electrode 15 described above.

[0166] In the display device 10I according to the modification 23, the display device 10I further includes the transparent electrode 25, and therefore the resistance of the second electrode 15 can be reduced.

[0167] 24 shows an example in which the semi-transmissive reflective layer 17 is separated between the subpixels 100R and 100G, and between the subpixels 100G and 100B, but as shown in FIG. 25, the semi-transmissive reflective layer 17 may be continuous between the subpixels 100R and 100G, and between the subpixels 100G and 100B. That is, the semi-transmissive reflective layer 17 may be continuous between the subpixels 100 in the display region 110A. In this case, the resistance of the second electrode 15 can be further reduced.

[0168] <4 Application Examples> (electronic equipment) The display device 10 and the like according to the first and second embodiments and their modifications can be used in various electronic devices. The display device 10 and the like may be incorporated into various electronic devices, for example, as a module as shown in FIG. 26 . This module is particularly suited to devices requiring high resolution, such as electronic viewfinders for video cameras and single-lens reflex cameras, or head-mounted displays that are used with magnification close to the eyes. This module has an exposed area 210 on one short side of the drive substrate 11 that is not covered by a counter substrate or the like. External connection terminals (not shown) are formed in this area 210 by extending the wiring of the signal line drive circuit 111 and the scanning line drive circuit 112. A flexible printed circuit (FPC) 220 for signal input / output may be connected to this external connection terminal.

[0169] (Example 1) 27A and 27B show an example of the appearance of a digital still camera 310. This digital still camera 310 is an interchangeable lens single-lens reflex type, and has an interchangeable taking lens unit (interchangeable lens) 312 located approximately in the center of the front of a camera main body 311, and a grip part 313 on the left front side for the photographer to hold.

[0170] A monitor 314 is provided at a position shifted to the left from the center on the back of the camera body 311. An electronic viewfinder (eyepiece window) 315 is provided above the monitor 314. By looking through the electronic viewfinder 315, the photographer can visually confirm the optical image of the subject guided by the photographing lens unit 312 and determine the composition. Any of the display devices 10, etc., can be used as the electronic viewfinder 315.

[0171] (Example 2) 28 shows an example of the appearance of a head-mounted display 320. The head-mounted display 320 has, for example, ear hooks 322 on both sides of a glasses-shaped display unit 321 for wearing on the user's head. As the display unit 321, any of the display devices 10, etc. can be used.

[0172] (Example 3) 29 shows an example of the appearance of a television device 330. This television device 330 has, for example, a video display screen unit 331 including a front panel 332 and a filter glass 333, and this video display screen unit 331 is configured from any of the display devices 10 etc.

[0173] <5 Simulation example> The present disclosure will be specifically described below using simulations, but the present disclosure is not limited to these simulations. In the following simulations, an organic device simulator (setfos (registered trademark), manufactured by Fluxim) was used as simulation software.

[0174] [Simulation 1-1, 1-2, 1-3, 2] Simulations 1-1, 1-2, 1-3, and 1-2 relate to display devices with a single-layer organic EL layer. The outcoupling efficiency of the display device with the structure shown in Table 1 was calculated by simulation. The display device configurations used in Simulations 1-1, 1-2, and 1-3 correspond to those shown in Figures 2, 8, and 9, respectively. However, Simulations 1-1, 1-2, and 1-3 were configured without color filters. The results of Simulations 1-1, 1-2, and 1-3 in the wavelength range of 400 nm to 800 nm are shown in Figures 30, 31, and 32, respectively. The results of Simulations 1-1, 1-2, and 1-3 in the wavelength range of 400 nm to 1000 nm are shown in Figures 36, 37, and 38, respectively. The results of Simulation 2 are shown in all of Figures 30, 31, 32, 36, 37, and 38 for comparison with the results of Simulations 1-1, 1-2, and 1-3.

[0175] [Simulations 3-1, 3-2, 3-3, 4] Simulations 3-1, 3-2, 3-3, and 4 relate to display devices with a single-layer organic EL layer. The outcoupling efficiency of a display device with the structure shown in Table 2 was determined by simulation. The display device configurations used in Simulations 3-1, 3-2, and 3-3 correspond to those shown in Figures 2, 8, and 9, respectively. However, Simulations 3-1, 3-2, and 3-3 were configured without color filters. The results of Simulations 3-1, 3-2, and 3-3 for wavelengths ranging from 400 nm to 800 nm are shown in Figures 33, 34, and 35, respectively. The results of Simulations 3-1, 3-2, and 3-3 for wavelengths ranging from 400 nm to 1000 nm are shown in Figures 39, 40, and 41, respectively. The results of Simulation 4 are shown in all of Figures 33, 34, 35, 39, 40, and 41 for comparison with the results of Simulations 3-1, 3-2, and 3-3.

[0176] [Simulations 5-1, 5-2, 5-3, 6] Simulations 5-1, 5-2, 5-3, and 6 relate to a display device equipped with a two-layer organic EL layer (a tandem-structured light-emitting unit). The outcoupling efficiency of a display device with the structure shown in Table 3 was determined by simulation. The display device configurations used in Simulations 5-1, 5-2, and 5-3 corresponded to those shown in Figures 2, 8, and 9, respectively. However, Simulations 5-1, 5-2, and 5-3 were configured without color filters. The results of Simulations 5-1, 5-2, and 5-3 for wavelengths ranging from 400 nm to 1000 nm are shown in Figures 42, 43, and 44, respectively. The results of Simulation 6 are shown in all of Figures 42, 43, and 44 for comparison with the results of Simulations 5-1, 5-2, and 5-3.

[0177] [Simulations 7-1, 7-2, 7-3, 8] Simulations 7-1, 7-2, 7-3, and 8 relate to display devices equipped with two organic EL layers (tandem-structured light-emitting units). The outcoupling efficiency of the display devices with the structures shown in Table 4 was determined by simulation. The display device configurations used in Simulations 7-1, 7-2, and 7-3 corresponded to those shown in Figures 2, 8, and 9, respectively. However, Simulations 7-1, 7-2, and 7-3 did not include color filters. The results of Simulations 7-1, 7-2, and 7-3 for wavelengths ranging from 400 nm to 1000 nm are shown in Figures 45, 46, and 47, respectively. The results of Simulation 8 are shown in Figures 45, 46, and 47 for comparison with the results of Simulations 3-1, 3-2, and 3-3.

[0178] Table 1 shows the configuration of the display device used in Simulations 1-1, 1-2, 1-3, and 1-2. [Table 1]

[0179] Table 2 shows the configuration of the display device used in Simulations 3-1, 3-2, 3-3, and 3-4. [Table 2]

[0180] Table 3 shows the configuration of the display device used in Simulations 5-1, 5-2, 5-3, and 6. [Table 3]

[0181] Table 4 shows the configuration of the display device used in Simulations 7-1, 7-2, 7-3, and 8. [Table 4]

[0182] Regarding the display device having a light-emitting unit with a single organic EL layer, the following can be seen from FIGS. 30 to 35 and 36 to 41. The outcoupling efficiencies of Simulations 1-1, 1-2, and 1-3 are higher than that of Simulation 2. Furthermore, the outcoupling efficiencies of Simulations 3-1, 3-2, and 3-3 are higher than that of Simulation 4. Therefore, when the organic EL layer has a single-layer light-emitting unit, the outcoupling efficiency can be improved by using the display device configurations shown in Figures 2, 8, and 9.

[0183] Regarding the display device having a light-emitting unit with two organic EL layers (a light-emitting unit with a tandem structure), the following can be seen from FIGS. The outcoupling efficiencies of Simulations 5-1, 5-2, and 5-3 are higher than that of Simulation 6. Furthermore, the outcoupling efficiencies of Simulations 7-1, 7-2, and 7-3 are higher than that of Simulation 8. Therefore, when the organic EL layer has two light-emitting units (light-emitting units with a tandem structure), the outcoupling efficiency can be improved by using the display device configurations shown in FIGS. 2, 8, and 9.

[0184] The first and second embodiments of the present disclosure and their modified examples have been specifically described above, but the present disclosure is not limited to the above-described first and second embodiments and their modified examples, and various modifications based on the technical ideas of the present disclosure are possible.

[0185] For example, the configurations, methods, steps, shapes, materials, and numerical values, etc., described in the first and second embodiments and their variations are merely examples, and different configurations, methods, steps, shapes, materials, and numerical values, etc., may be used as needed.

[0186] The configurations, methods, steps, shapes, materials, numerical values, etc. of the first and second embodiments and their modified examples described above can be combined with each other without departing from the spirit of the present disclosure.

[0187] Unless otherwise specified, the materials exemplified in the first and second embodiments and their modifications can be used singly or in combination of two or more.

[0188] The present disclosure may also employ the following configuration. (1) a plurality of first sub-pixels, a plurality of second sub-pixels, and a plurality of third sub-pixels; the first sub-pixel includes a first light-emitting element that emits a first light and a third light, the second sub-pixel includes a second light-emitting element that emits second light, the third sub-pixel includes a third light-emitting element that emits a first light and a third light, the first light-emitting element, the second light-emitting element, and the third light-emitting element each include a first electrode, an organic layer including a light-emitting layer, a second electrode, and a semi-transmissive reflective layer, and a resonator structure is formed by the first electrode and the semi-transmissive reflective layer; A display device, wherein the height of the semi-transmissive reflective layer in the first light-emitting element and the height of the semi-transmissive reflective layer in the third light-emitting element are the same. (2) The display device according to (1), wherein at least one of the first subpixel, the second subpixel, and the third subpixel further comprises a filter. (3) When the first sub-pixel includes the filter, the filter has the same color as the first light; When the second sub-pixel includes the filter, the filter has the same color as the second light; 3. The display device according to claim 2, wherein when the third sub-pixel includes the filter, the filter has the same color as the third light. (4) the first sub-pixel further includes a first filter having the same color as the first light; the second sub-pixel further includes a second filter having the same color as the second light; The display device according to (1), wherein the third sub-pixel further includes a third filter having the same color as the third light. (5) the first light-emitting element and the third light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer; The display device according to any one of (1) to (4), wherein the optical adjustment layer in the first light-emitting element and the optical adjustment layer in the third light-emitting element have the same thickness. (6) The display device according to (5), wherein the second electrode and the semi-transmissive reflective layer of the second light-emitting element are adjacent to each other. (7) The display device according to any one of (1) to (4), wherein the second light-emitting element further comprises an optical adjustment layer between the second electrode and the semi-transmissive reflective layer. (8) The display device according to (7), wherein the second electrode and the semi-transmissive reflective layer are adjacent to each other in the first light-emitting element and the third light-emitting element. (9) the first light-emitting element, the second light-emitting element, and the third light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer; A display device described in any one of (1) to (4), wherein the thickness of the optical adjustment layer in the second light-emitting element is different from the thickness of the optical adjustment layer in the first light-emitting element and the third light-emitting element. (10) The display device according to (9), wherein the thickness of the optical adjustment layer in the second light-emitting element is greater than the thicknesses of the optical adjustment layer in the first light-emitting element and the third light-emitting element. (11) The display device according to any one of (1) to (10), wherein the first light, the second light, and the third light are red light, green light, and blue light, respectively. (12) the first light-emitting element and the third light-emitting element are configured to be able to resonate the first light and the third light in the resonator structure, The display device according to any one of (1) to (11), wherein the second light emitting element is configured to be able to resonate the second light in the resonator structure. (13) The display device according to any one of (1) to (12), wherein the organic layer is provided across the plurality of first sub-pixels, the plurality of second sub-pixels, and the plurality of third sub-pixels. (14) further comprising a plurality of fourth sub-pixels; the fourth sub-pixel includes a fourth light-emitting element that emits second light and fourth light, the second light-emitting element further emits a fourth light, the fourth light-emitting element includes the first electrode, the organic layer, the second electrode, and the semi-transmissive reflective layer, and the first electrode and the semi-transmissive reflective layer form a resonator structure; 10. The display device according to claim 1, wherein the height of the semi-transmissive reflective layer in the second light-emitting element and the height of the semi-transmissive reflective layer in the fourth light-emitting element are the same. (15) The display device according to (14), wherein at least one of the first subpixel, the second subpixel, the third subpixel, and the fourth subpixel further comprises a filter. (16) When the first sub-pixel includes the filter, the filter has the same color as the first light; When the second sub-pixel includes the filter, the filter has the same color as the second light; When the third sub-pixel includes the filter, the filter has the same color as the third light; 16. The display device according to claim 15, wherein when the fourth sub-pixel includes the filter, the filter is configured to be able to transmit the fourth light. (17) the first sub-pixel further includes a first filter having the same color as the first light; the second sub-pixel further includes a second filter having the same color as the second light; the third sub-pixel further includes a third filter having the same color as the third light; The display device according to (14), wherein the fourth sub-pixel further includes a fourth filter configured to be able to transmit the fourth light. (18) The display device according to any one of (14) to (17), wherein the first light, the second light, the third light, and the fourth light are red light, green light, blue light, and infrared light, respectively. (19) the first light-emitting element and the third light-emitting element are configured to be able to resonate the first light and the third light in the resonator structure, The display device according to any one of (14) to (18), wherein the second light-emitting element and the fourth light-emitting element are configured to be able to resonate the second light and the fourth light in the resonator structure. (20) An electronic device comprising the display device according to any one of (1) to (19).

[0189] Furthermore, the present disclosure may also employ the following configuration. (twenty one) a plurality of first sub-pixels that emit a first light, a plurality of second sub-pixels that emit a second light, and a plurality of third sub-pixels that emit a third light; each of the first sub-pixels includes a first light-emitting element that emits the first light and the third light, and a first color filter having the same color as the first light; each of the second sub-pixels includes a second light-emitting element that emits the second light and a second color filter having the same color as the second light; each of the third sub-pixels includes a third light-emitting element that emits the first light and the third light, and a third color filter having the same color as the third light; the first light-emitting element, the second light-emitting element, and the third light-emitting element each include a first electrode, an organic layer including a light-emitting layer, a second electrode, and a semi-transmissive reflective layer, and a resonator structure is formed by the first electrode and the semi-transmissive reflective layer; A display device, wherein the height of the semi-transmissive reflective layer in the first light-emitting element and the height of the semi-transmissive reflective layer in the third light-emitting element are the same. (twenty two) the first light-emitting element and the third light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer; The display device according to (21), wherein the optical adjustment layer in the first light-emitting element and the optical adjustment layer in the third light-emitting element have the same thickness. (twenty three) The display device according to (22), wherein the second electrode and the semi-transmissive reflective layer of the second light-emitting element are adjacent to each other. (twenty four) The display device according to (21), wherein the second light-emitting element further includes an optical adjustment layer between the second electrode and the semi-transmissive reflective layer. (twenty five) The display device according to (24), wherein the second electrode and the semi-transmissive reflective layer are adjacent to each other in the first light-emitting element and the third light-emitting element. (26) the first light-emitting element, the second light-emitting element, and the third light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer; The display device according to (21), wherein the thickness of the optical adjustment layer in the second light-emitting element is different from the thickness of the optical adjustment layer in the first light-emitting element and the third light-emitting element. (27) The display device according to (26), wherein the thickness of the optical adjustment layer in the second light-emitting element is greater than the thicknesses of the optical adjustment layer in the first light-emitting element and the third light-emitting element. (28) The display device according to any one of (21) to (27), wherein the first light, the second light, and the third light are red light, green light, and blue light, respectively. (29) the first light-emitting element and the third light-emitting element are configured to be able to resonate the first light and the third light in the resonator structure, The display device according to any one of (21) to (28), wherein the second light emitting element is configured to be able to resonate the second light in the resonator structure. (30) The display device according to any one of (21) to (29), wherein the organic layer is provided across the first sub-pixels, the second sub-pixels, and the third sub-pixels. (31) further comprising a plurality of fourth sub-pixels that emit fourth light; each of the fourth sub-pixels includes a fourth light-emitting element that emits the second light and the fourth light; each of the second light-emitting elements further emits the fourth light, the fourth light-emitting element includes the first electrode, the organic layer, the second electrode, and the semi-transmissive reflective layer, and the first electrode and the semi-transmissive reflective layer form a resonator structure; The display device according to (21), wherein the height of the semi-transmissive reflective layer in the second light-emitting element and the height of the semi-transmissive reflective layer in the fourth light-emitting element are the same. (32) the first light-emitting element and the third light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer; The display device according to (31), wherein the optical adjustment layer in the first light-emitting element and the optical adjustment layer in the third light-emitting element have the same thickness. (33) The display device according to (32), wherein the second electrode and the semi-transmissive reflective layer are adjacent to each other in the second light-emitting element and the fourth light-emitting element. (34) The display device according to (31), wherein the second light-emitting element and the fourth light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer. (35) The display device according to (34), wherein the second electrode and the semi-transmissive reflective layer are adjacent to each other in the first light-emitting element and the third light-emitting element. (36) the first light-emitting element, the second light-emitting element, the third light-emitting element, and the fourth light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer; The display device according to (31), wherein the thickness of the optical adjustment layer in the second light-emitting element and the fourth light-emitting element is different from the thickness of the optical adjustment layer in the first light-emitting element and the third light-emitting element. (37) The display device according to any one of (31) to (36), wherein the first light, the second light, the third light, and the fourth light are red light, green light, blue light, and infrared light, respectively. (38) the first light-emitting element and the third light-emitting element are configured to be able to resonate the first light and the third light in the resonator structure, The display device according to any one of (31) to (37), wherein the second light-emitting element and the fourth light-emitting element are configured to be able to resonate the second light and the fourth light in the resonator structure. (39) The display device according to any one of (31) to (38), wherein the organic layer is provided across the plurality of first sub-pixels, the plurality of second sub-pixels, the plurality of third sub-pixels, and the plurality of fourth sub-pixels. (40) An electronic device comprising the display device according to any one of (1) to (39).

[0190] Furthermore, the present disclosure may also employ the following configuration. (41) a plurality of first sub-pixels, a plurality of second sub-pixels, and a plurality of third sub-pixels; the first sub-pixel includes a first light-emitting element that emits a first light and a third light, the second sub-pixel includes a second light-emitting element that emits second light, the third sub-pixel includes a third light-emitting element that emits a first light and a third light, the first light-emitting element, the second light-emitting element, and the third light-emitting element each include a first electrode, an organic layer including a light-emitting layer, a second electrode, and a semi-transmissive reflective layer, and a resonator structure is formed by the first electrode and the semi-transmissive reflective layer; A display device, wherein the height of the semi-transmissive reflective layer in the first light-emitting element and the height of the semi-transmissive reflective layer in the third light-emitting element are the same. (42) at least one of the first subpixel, the second subpixel, and the third subpixel further comprises a filter; When the first sub-pixel includes the filter, the filter has the same color as the first light; When the second sub-pixel includes the filter, the filter has the same color as the second light; 42. The display device according to claim 41, wherein when the third sub-pixel includes the filter, the filter has the same color as the third light. (43) the first sub-pixel further includes a first filter having the same color as the first light; the second sub-pixel further includes a second filter having the same color as the second light; The display device according to (41), wherein the third sub-pixel further includes a third filter having the same color as the third light. (44) the first light-emitting element and the third light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer; The display device according to any one of (41) to (43), wherein the optical adjustment layer in the first light-emitting element and the optical adjustment layer in the third light-emitting element have the same thickness. (45) The display device according to (44), wherein the second electrode and the semi-transmissive reflective layer of the second light-emitting element are adjacent to each other. (46) The display device according to (44) or (45), wherein the optical adjustment layer includes an organic layer and an inorganic layer in this order. (47) the first light-emitting element and the third light-emitting element further include a base layer and an optical adjustment layer in this order between the second electrode and the semi-transmissive reflective layer, the first light-emitting element further includes the underlayer between the second electrode and the semi-transmissive reflective layer, The display device according to any one of (41) to (43), wherein the etching rate of the underlayer is slower than the etching rate of the optical adjustment layer. (48) The display device according to any one of (41) to (43), wherein the second light-emitting element further comprises an optical adjustment layer between the second electrode and the semi-transmissive reflective layer. (49) The display device according to (48), wherein the second electrode and the semi-transmissive reflective layer are adjacent to each other in the first light-emitting element and the third light-emitting element. (50) the first light-emitting element, the second light-emitting element, and the third light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer; A display device described in any one of (41) to (43), wherein the thickness of the optical adjustment layer in the second light-emitting element is different from the thickness of the optical adjustment layer in the first light-emitting element and the third light-emitting element. (51) The display device according to (50), wherein the thickness of the optical adjustment layer in the second light-emitting element is greater than the thicknesses of the optical adjustment layer in the first light-emitting element and the third light-emitting element. (52) the first light-emitting element and the third light-emitting element are configured to be able to resonate the first light and the third light in the resonator structure, The display device according to any one of (41) to (51), wherein the second light emitting element is configured to be able to resonate the second light in the resonator structure. (53) further comprising a plurality of fourth sub-pixels; the fourth sub-pixel includes a fourth light-emitting element that emits second light and fourth light, the second light-emitting element further emits a fourth light, the fourth light-emitting element includes the first electrode, the organic layer, the second electrode, and the semi-transmissive reflective layer, and the first electrode and the semi-transmissive reflective layer form a resonator structure; The display device according to any one of (41) to (43), wherein the height of the semi-transmissive reflective layer in the second light-emitting element and the height of the semi-transmissive reflective layer in the fourth light-emitting element are the same. (54) at least one of the first subpixel, the second subpixel, the third subpixel, and the fourth subpixel further comprises a filter; When the first sub-pixel includes the filter, the filter has the same color as the first light; When the second sub-pixel includes the filter, the filter has the same color as the second light; When the third sub-pixel includes the filter, the filter has the same color as the third light; 53. The display device according to claim 53, wherein when the fourth sub-pixel includes the filter, the filter is configured to be able to transmit the fourth light. (55) the first sub-pixel further includes a first filter having the same color as the first light; the second sub-pixel further includes a second filter having the same color as the second light; the third sub-pixel further includes a third filter having the same color as the third light; The display device according to (53), wherein the fourth sub-pixel further includes a fourth filter configured to be able to transmit the fourth light. (56) the first light-emitting element and the third light-emitting element are configured to be able to resonate the first light and the third light in the resonator structure, The display device described in any one of (53) to (55), wherein the second light-emitting element and the fourth light-emitting element are configured to be able to resonate the second light and the fourth light in the resonator structure. (57) The display device according to any one of (41) to (56), wherein the organic layer comprises at least one charge generating layer. (58) Further comprising a contact portion and an auxiliary electrode, The display device according to any one of (41) to (57), wherein the auxiliary electrode electrically connects the semi-transmissive reflective layer and the contact portion. (59) Further comprising a contact portion, The display device according to any one of (41) to (57), wherein the semi-transmissive reflective layer electrically connects the second electrode and the contact portion. (60) An electronic device comprising the display device according to any one of (41) to (59). [Explanation of symbols]

[0191] 10, 10A, 10B, 10C, 10D, 10E, 10F, 10G, 10H, 10I, 20, 20A, 20B, 20C, 20D, 20E, 20F, 20G, 20H Display device 11 Drive board 12 First electrode 12A contact part 13 Insulating layer 13A aperture 14 Organic electroluminescent layer 15 Second electrode 16 Optical adjustment layer 16A aperture 16B convex part 16C Recess 17 Transflective layer 18 Protective layer 19 Color Filter 19R Red Filter 19G Green Filter 19B Blue filter 19IR IR filter 21 Etching stop layer 22A First optical adjustment layer 22B Second optical adjustment layer 22, 23, 24 Optical adjustment layer 23A, 24B organic layer 23B, 24A, 24C Inorganic layer 25 Transparent electrode 25A Periphery 100R, 100G, 100B, 100IR subpixels 101R, 101G, 101B, 101IR light emitting element 110A display area 110B Surrounding area 111 Signal line driver circuit 111A signal line 112 Scanning line driving circuit 112A scan line 310 Digital still cameras (electronic devices) 320 Head-mounted display (electronic device) 330 Television equipment (electronic equipment)

Claims

1. a plurality of first sub-pixels, a plurality of second sub-pixels, and a plurality of third sub-pixels; the first sub-pixel comprises a first light-emitting element and a red filter; the second sub-pixel comprises a second light-emitting element; the third sub-pixel includes a third light-emitting element and a blue filter; the first light-emitting element, the second light-emitting element, and the third light-emitting element each include a first electrode, an organic layer configured to be able to emit white light and including a light-emitting layer, a second electrode, and a semi-transmissive reflective layer, in that order, and a resonator structure is formed by the first electrode and the semi-transmissive reflective layer; the resonator structure of the first light-emitting element and the resonator structure of the third light-emitting element are configured to be capable of resonating red light and blue light contained in the white light, the resonator structure of the second light-emitting element is configured to resonate green light included in the white light, A display device, wherein the height of the semi-transmissive reflective layer in the first light-emitting element and the height of the semi-transmissive reflective layer in the third light-emitting element are the same.

2. A display device as described in claim 1, wherein the second subpixel further comprises a green filter.

3. the first light-emitting element and the third light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer; The display device according to claim 1 , wherein the optical adjustment layer has the same thickness in the first light-emitting element and the third light-emitting element.

4. The display device according to claim 3 , wherein the second electrode and the semi-transmissive reflective layer of the second light-emitting element are adjacent to each other.

5. The display device according to claim 3 , wherein the optical adjustment layer comprises an organic layer and an inorganic layer in this order.

6. the first light-emitting element and the third light-emitting element further include a base layer and an optical adjustment layer in this order between the second electrode and the semi-transmissive reflective layer, the second light-emitting element further includes the underlayer between the second electrode and the semi-transmissive reflective layer, The display device according to claim 1 , wherein the etching rate of the underlayer is slower than the etching rate of the optical adjustment layer.

7. The display device according to claim 1 , wherein the second light-emitting element further comprises an optical adjustment layer between the second electrode and the semi-transmissive reflective layer.

8. The display device according to claim 7 , wherein the second electrode and the semi-transmissive reflective layer are adjacent to each other in the first light-emitting element and the third light-emitting element.

9. the first light-emitting element, the second light-emitting element, and the third light-emitting element further include an optical adjustment layer between the second electrode and the semi-transmissive reflective layer; The display device according to claim 1 , wherein the thickness of the optical adjustment layer in the second light-emitting element is different from the thickness of the optical adjustment layer in the first light-emitting element and the third light-emitting element.

10. The display device according to claim 9 , wherein the thickness of the optical adjustment layer in the second light-emitting element is greater than the thicknesses of the optical adjustment layer in the first light-emitting element and the third light-emitting element.

11. further comprising a plurality of fourth sub-pixels; the fourth sub-pixel includes a fourth light-emitting element and an infrared light transmitting filter; the fourth light-emitting element includes the first electrode, the organic layer, the second electrode, and the semi-transmissive reflective layer in this order, and the first electrode and the semi-transmissive reflective layer form a resonator structure; the organic layer is configured to be capable of emitting light including the white light and infrared light, the resonator structure of the second light-emitting element and the resonator structure of the fourth light-emitting element are configured to be capable of resonating the green light and the infrared light included in the light emitted from the organic layer; The display device according to claim 1 , wherein the height of the semi-transmissive reflective layer in the second light-emitting element and the height of the semi-transmissive reflective layer in the fourth light-emitting element are the same.

12. 10. The display device of claim 1, wherein the organic layer comprises at least one charge generating layer.

13. Further comprising a contact portion and an auxiliary electrode, The display device according to claim 1 , wherein the auxiliary electrode electrically connects the semi-transmissive reflective layer and the contact portion.

14. Further comprising a contact portion, The display device according to claim 1 , wherein the semi-transmissive reflective layer electrically connects the second electrode and the contact portion.

15. An electronic device comprising the display device according to claim 1 .

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