Stage apparatus, exposure apparatus, inspection apparatus, and device manufacturing method
The stage device with a dual-slider configuration and air pads prevents galling by maintaining slider stability, suitable for clean and vacuum environments, enhancing semiconductor manufacturing processes.
Patent Information
- Application Number
- JP2023511705
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2021-04-01
- Filing Date
- 2022-03-31
- Publication Date
- 2025-09-19
- Estimated Expiration
- 2042-03-31
AI Technical Summary
In stack-type stage devices, the movement of the first slider causes load fluctuations on the first guide, leading to tilting and potential galling due to contact with the second guide, which supports the first guide.
The stage device incorporates a first slider supported by a second slider with two spaced slider portions and a connecting section, along with air pads and support legs, to maintain stability and prevent contact between the sliders and guides.
This configuration ensures stable movement of the sliders, preventing galling and maintaining rigidity, suitable for use in clean environments and vacuum conditions, and is applicable in semiconductor manufacturing equipment.
Smart Images

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Abstract
Description
[Technical Field]
[0001] The present invention relates to a stage apparatus, an exposure apparatus, an inspection apparatus, and a device manufacturing method. [Background technology]
[0002] 2. Description of the Related Art Exposure apparatuses and inspection apparatuses used in the manufacturing process of semiconductor devices include a stage for moving a substrate to be exposed. This stage is supported and positioned by, for example, guides.
[0003] Conventionally, a stage device called a stack type, which has one guide each in the first and second directions, has been proposed (for example, Patent Document 1). This stack type stage device generally comprises a first slider, a first guide that guides the movement of the first slider in the first direction, a second slider that supports the first guide, and a second guide that guides the movement of the second slider in the second direction. [Prior art documents] [Patent documents]
[0004] [Patent Document 1] Japanese Patent Application Publication No. 5-57558 Summary of the Invention [Problem to be solved by the invention]
[0005] In a stack-type stage device, when the first slider moves, a load fluctuation occurs on the first guide, causing the first guide to tilt around the second direction, and a moment around the second guide may be generated on the second slider supporting the first guide, which may cause galling when the second slider comes into contact with the second guide.
[0006] The present invention has been made in view of the above circumstances, and its purpose is to provide a technique capable of preventing galling caused by contact of the slider with the guide. [Means for solving the problem]
[0007] In order to solve the above problem, a stage device according to one embodiment of the present invention comprises a first slider, a first guide that guides the movement of the first slider in a first direction, a second slider that includes two slider portions that are spaced apart from each other in the first direction and support the first guide from below, and a second guide that guides the movement of the second slider.
[0008] Another aspect of the present invention is an exposure apparatus, which includes the above-described stage apparatus, and positions a substrate by means of the stage apparatus.
[0009] Yet another aspect of the present invention is an inspection apparatus, which includes the above-described stage apparatus, and positions a substrate by the stage apparatus.
[0010] Yet another aspect of the present invention is a device manufacturing method, which includes the step of manufacturing a device using the above-described exposure apparatus.
[0011] Any combination of the above components, or mutual substitution of the components or expressions of the present invention between devices, methods, systems, etc., are also valid aspects of the present invention. [Effects of the Invention]
[0012] According to the present invention, it is possible to prevent the slider from coming into contact with the guide and to achieve stable movement of the slider. [Brief explanation of the drawings]
[0013] [Figure 1] FIG. 1 is a perspective view of a stage device according to an embodiment. [Figure 2] FIG. 2 is a perspective view of a Y-axis guide and a Y-axis slider of the stage device of FIG. [Figure 3] FIG. 2 is a cross-sectional view of the stage device of FIG. [Figure 4] FIG. 4 is a cross-sectional view taken along line AA in FIG. [Figure 5] FIG. 2 is a diagram showing an example in which the stage device of FIG. 1 is incorporated into a vacuum chamber. [Figure 6] FIG. 2 is a diagram showing an example in which the stage device of FIG. 1 is incorporated into an exposure apparatus. [Figure 7] FIG. 10 is a cross-sectional view of a stage device according to a modified example. DETAILED DESCRIPTION OF THE INVENTION
[0014] Hereinafter, identical or equivalent components, parts, and steps shown in each drawing will be assigned the same reference numerals, and redundant explanations will be omitted where appropriate. Furthermore, the dimensions of the parts in each drawing will be enlarged or reduced as appropriate to facilitate understanding. Furthermore, some parts that are not important for explaining the embodiments will be omitted from the drawings.
[0015] FIG. 1 is a perspective view showing a stage device 100 according to an embodiment. FIG. 2 is a perspective view of a Y-axis guide 16 and a Y-axis slider 18 of the stage device 100 of FIG. 1. For convenience of explanation, as shown in the figure, an XYZ Cartesian coordinate system is defined in which the direction in which an X-axis guide 12 (described later) extends is the X-axis direction, the direction in which a Y-axis guide 16 (described later) extends that is perpendicular to the X-axis direction is the Y-axis direction, and the direction perpendicular to both is the Z-axis direction. Stage device 100 is called a stack-type XY stage, and positions an object in the X-axis direction (first direction) and the Y-axis direction (second direction perpendicular to the first direction).
[0016] Stage device 100 is a stack-type stage device. Stage device 100 comprises an X-axis guide 12, an X-axis slider 14, a Y-axis guide 16, a Y-axis slider 18, and a table 20. X-axis guide 12 and X-axis slider 14 are upper axis guide and upper axis slider, respectively, and Y-axis guide 16 and Y-axis slider 18 are lower axis guide and lower axis slider, respectively. In other words, Y-axis guide 16 and Y-axis slider 18 are disposed below X-axis guide 12 and X-axis slider 14.
[0017] The X-axis guide 12 is an elongated member that is long in the X-axis direction. The X-axis guide 12 has a concave cross section perpendicular to the X-axis direction, although this is not a limitation. The X-axis slider 14 has a rectangular parallelepiped shape, although this is not a limitation, and is housed inside the X-axis guide 12. The X-axis slider 14 moves in the X-axis direction while being guided by the X-axis guide 12. Although this is not a limitation, in this embodiment, the X-axis slider 14 forms an air slide together with the X-axis guide 12, and is floated relative to the X-axis guide 12 by compressed gas supplied between them, and moves along the X-axis guide 12 without contacting the X-axis guide 12. The X-axis slider 14 may be driven, for example, by an air servo.
[0018] Y-axis slider 18 supports X-axis guide 12 from below. Y-axis slider 18 moves in the Y-axis direction while being guided by Y-axis guide 16. Therefore, X-axis guide 12 supported by Y-axis slider 18, and therefore X-axis slider 14, move in the Y-axis direction as Y-axis slider 18 moves in the Y-axis direction.
[0019] Table 20 is fixed to X-axis slider 14. An object to be processed, such as a semiconductor wafer, is placed on table 20. By moving X-axis slider 14 in the X-axis direction and Y-axis slider 18 in the Y-axis direction, table 20 can be moved in the X-axis and Y-axis directions, and the object can be positioned in the X-axis and Y-axis directions.
[0020] Figure 3 is a cross-sectional view of stage device 100 taken along a plane perpendicular to the Y-axis direction. Figure 3 shows a cross section taken along a plane passing through connecting portion 35 of Y-axis slider 18. Table 20 is not shown in Figure 3.
[0021] Y-axis guide 16 is a box-shaped member with an opening at the center of its top surface in the X-axis direction. Y-axis guide 16 includes a bottom wall 22, a first side wall 24, a second side wall 26, a first top wall 28, and a second top wall 30.
[0022] The bottom wall 22 is a plate member having a rectangular shape in a plan view. The first side wall 24 and the second side wall 26 are upright walls that are long in the Y-axis direction. The first side wall 24 stands upright at one end (the left end in FIG. 3) of the bottom wall 22 in the Y-axis direction, and the second side wall 26 stands upright at the other end (the right end in FIG. 3). The first side wall 24 and the second side wall 26 face each other in the X-axis direction.
[0023] The first upper wall 28 and the second upper wall 30 are rectangular plate members that are long in the Y-axis direction in a plan view. The first upper wall 28 and the second upper wall 30 are fixed to the upper ends of the first side wall 24 and the second side wall 26 so as to extend from the upper ends of the first side wall 24 and the second side wall 26 toward each other.
[0024] The Y-axis slider 18 is housed inside the Y-axis guide 16. The Y-axis slider 18 includes a first slider portion 32 and a second slider portion 34 spaced apart from each other in the X-axis direction, and two connecting portions 35 connecting the first slider portion 32 and the second slider portion 34. The number of connecting portions 35 is not particularly limited, and may be one or three or more.
[0025] In the following, the two slider sections 32, 34 will be described as the side closer to the center of the Y-axis slider 18 in the X-axis direction (i.e., the side closer to the connecting section 35) being the inner side of the two slider sections 32, 34, and the side farther away (i.e., the side opposite the connecting section 35) being the outer side of the two slider sections 32, 34.
[0026] The first slider portion 32 includes a rectangular parallelepiped first main body portion 66 and a first support leg portion 68 fixed to the upper surface of the first main body portion 66. The outer portion of the first main body portion 66 in the X-axis direction (the left portion in FIG. 3 ) is housed in a space surrounded by the bottom wall 22, the first side wall 24, and the first upper wall 28.
[0027] Lower air pads 36, side air pads 38, and upper air pads 40 are provided on the bottom surface 66a, outer side surface 66b, and top surface 66c of the first main body portion 66, which face the bottom wall 22, the first side wall 24, and the first top wall 28. The air pads (restraint members) 36-40 eject compressed gas supplied from an air supply system (not shown) into the gap between the first main body portion 66 and the Y-axis guide 16. This creates a high-pressure gas layer in the gap, causing the air pads 36-40 and the first main body portion 66 to float above the Y-axis guide 16. The air pads 36-40 may be provided on the opposing surface of the Y-axis guide 16 facing the first main body portion 66, instead of on the outer peripheral surface of the first main body portion 66. In either case, the compressed gas ejected from the air pads 36-40 restricts the first main body portion 66 from moving up and down and outward in the X-axis direction relative to the Y-axis guide 16.
[0028] An outer side surface 66b of the first main body portion 66 is formed with a first air servo chamber 42 for driving the first slider portion 32 as will be described later.
[0029] The second slider portion 34 includes a rectangular parallelepiped second main body portion 70 and a second support leg portion 72 fixed to the upper surface of the second main body portion 70. The outer portion of the second main body portion 70 in the X-axis direction (the right-hand portion in FIG. 3 ) is housed in a space surrounded by the bottom wall 22, the second side wall 26, and the second top wall 30.
[0030] Lower air pads 46, side air pads 48, and upper air pads 50 are provided on the bottom surface 70a, outer side surface 70b, and top surface 70c of the second main body portion 70, which face the bottom wall 22, the second side wall 26, and the second top wall 30. The air pads (restraint members) 46-50 eject compressed gas supplied from an air supply system (not shown) into the gap between the second main body portion 70 and the Y-axis guide 16. This creates a high-pressure gas layer in the gap, causing the air pads 46-50 and, ultimately, the second main body portion 70 to float above the Y-axis guide 16. The air pads 46-50 may be provided on the opposing surface of the Y-axis guide 16 facing the second main body portion 70, instead of on the outer peripheral surface of the second main body portion 70. In either case, the compressed gas ejected from the air pads 46-50 restrains the second main body portion 70 from moving up and down and outward in the X-axis direction relative to the Y-axis guide 16.
[0031] A second air servo chamber 52 for driving the second slider portion 34 is formed on the outer side surface 70b of the second main body portion 70 as will be described later.
[0032] Exhaust grooves 54, 56, and 58 for differential evacuation are formed on the outer peripheral surface of the first main body portion 66 of the first slider portion 32 so as to surround the air pads 36-40 and the first air servo chamber 42. The exhaust groove 54 is open to the atmosphere. The exhaust groove 54 may be connected to an exhaust pump (not shown). The exhaust grooves 56 and 58 are connected to exhaust pumps (not shown) for setting the pressure inside the exhaust grooves to a low vacuum pressure level and a medium vacuum pressure level, respectively, and exhaust compressed gas supplied from the air pads 36-40 of the first main body portion 66 and the first air servo chamber 42 to the outside.
[0033] Exhaust grooves 60, 62, and 64 for differential exhaust are formed on the outer peripheral surface of the second main body portion 70 of the second slider portion 34 so as to surround the air pads 46-50 and the second air servo chamber 52. The exhaust grooves 60, 62, and 64 are configured in the same manner as the exhaust grooves 54, 56, and 58 of the first main body portion 66.
[0034] The stage device 100 can be used in a vacuum environment by preventing compressed gas from leaking out from the gap between the Y-axis guide 16 and the Y-axis slider 18. However, when the stage device 100 is used in an atmospheric pressure environment, there is no need to provide such an exhaust groove.
[0035] The first support leg 68 is placed on and fixed to a portion 66d of the upper surface 66c of the first main body 66 that protrudes more inward in the X-axis direction (to the right in FIG. 3) than the first upper wall 28. The second support leg 72 is placed on and fixed to a portion 70d of the upper surface 70c of the second main body 70 that protrudes more inward in the X-axis direction (to the left in FIG. 3) than the second upper wall 30. The first support leg 68 and the second support leg 72 support the X-axis guide 12.
[0036] The movable range R of the center of gravity G of the X-axis slider 14, which moves as the X-axis slider 14 moves, falls between the center in the X-axis direction of the first support leg 68 that supports the X-axis guide 12 and the center in the X-axis direction of the second support leg 72. In other words, the X-axis guide 12 is supported at two support positions: the center in the X-axis direction of the first support leg 68 and the center in the X-axis direction of the second support leg 72, and the movable range R of the center of gravity G of the X-axis slider 14 falls between these two support positions.
[0037] The lower air pad 36, the upper air pad 40, and the first support leg 68 are arranged in the X-axis direction so that the center of the lower air pad 36 is located between the center of the upper air pad 40 and the center of the first support leg 68 (in other words, the support position that supports the X-axis guide 12, or in other words the position where the load of the X-axis guide 12 is applied). More specifically, the lower air pad 36, the upper air pad 40, and the first support leg 68 are arranged in the order of the center in the X-axis direction of the first support leg 68, the center in the X-axis direction of the lower air pad 36, and the center in the X-axis direction of the upper air pad 40, from the inside to the outside in the X-axis direction.
[0038] The lower air pad 46, the upper air pad 50, and the second support leg 72 are arranged in the X-axis direction so that the center of the lower air pad 46 is located between the center of the upper air pad 50 and the center of the second support leg 72 (in other words, the support position that supports the X-axis guide 12, or in other words the position where the load of the X-axis guide 12 is applied). More specifically, the lower air pad 46, the upper air pad 50, and the second support leg 72 are arranged so that, from the inside to the outside in the X-axis direction, the center of the second support leg 72 in the X-axis direction, the center of the lower air pad 46 in the X-axis direction, and the center of the upper air pad 50 in the X-axis direction are aligned in this order.
[0039] Although not particularly limited, in the illustrated example, connecting portion 35 is a rod member extending in the X-axis direction and has a rectangular cross section perpendicular to the X-axis direction. The total cross-sectional area perpendicular to the X-axis direction of two connecting portions 35 is smaller than the cross-sectional area perpendicular to the X-axis direction of first main body portion 66 and second main body portion 70. This allows for a reduction in the weight of Y-axis slider 18 compared to when Y-axis slider 18 is formed as a single large slider portion, i.e., compared to when Y-axis slider 18 is formed as a single large rectangular parallelepiped member.
[0040] The connecting portion 35 connects the first slider portion 32 and the second slider portion 34 so that the distance between them in the X-axis direction does not change. In the illustrated example, the end faces 35a, 35b of the connecting portion 35 in the X-axis direction are directly connected to the inner end faces 66e, 70e of the main bodies 66, 70. Note that the connecting portion 35 may be connected to the inner end faces 66e, 70e of the main bodies 66, 70 via, for example, elastic hinges so that the main bodies 66, 70 can be slightly displaced in the Z-axis direction relative to the connecting portion 35.
[0041] Figure 4 is a cross-sectional view taken along line AA in Figure 3. The principle by which Y-axis slider 18 moves relative to Y-axis guide 16 will be described with reference to Figure 4. Stage device 100 further includes a first partition wall 74 and a second partition wall 76. Figure 4 exaggerates the gaps between Y-axis guide 16 and slider sections 32, 34 and between partition walls 74, 76 and air servo chambers 42, 52. In reality, these gaps are on the order of a few microns, for example.
[0042] First partition wall 74 is fixed to Y-axis guide 16 and divides first air servo chamber 42 axially into two air servo chambers 42a and 42b. Air supply systems 80a and 80b are connected to the two air servo chambers 42a and 42b, respectively, to allow compressed gas to flow in and out. Air supply systems 80a and 80b include servo valves 82a and 82b and compressed gas supply sources 84a and 84b, respectively.
[0043] Second partition 76 is fixed to Y-axis guide 16 and divides second air servo chamber 52 axially into two air servo chambers 52a and 52b. Air supply systems 86a and 86b are connected to the two air servo chambers 52a and 52b, respectively, to allow compressed gas to flow in and out. Air supply systems 86a and 86b include servo valves 88a and 88b and compressed gas supply sources 90a and 90b, respectively.
[0044] When compressed gas is supplied to air pads 36-40, 46-50, Y-axis slider 18 floats slightly relative to Y-axis guide 16 as described above. In this state, if compressed gas is supplied to air servo chambers 42a, 52a and compressed gas is discharged from air servo chambers 42b, 52b, partitions 74, 76 act as pistons, causing slider sections 32, 34 and therefore Y-axis slider 18 to move downward in the figure. In this way, by controlling the supply and discharge of compressed gas, Y-axis slider 18 can be moved to any position relative to Y-axis guide 16.
[0045] Next, the effects of this embodiment will be described. In a conventional stack-type stage device, when the X-axis slider moves, load fluctuations occur in the X-axis guide, causing the X-axis guide to tilt about the Y-axis direction. This generates a moment about the Y-axis guide on the Y-axis slider supporting the X-axis guide, potentially resulting in contact and galling of the Y-axis slider with the Y-axis guide. In contrast, in the stage device 100 according to this embodiment, the Y-axis slider 18 includes two slider sections 32, 34 that support the X-axis guide 12 and a connecting section 35 that connects the two slider sections 32, 34. In other words, the Y-axis slider 18 can support the X-axis guide 12 over a correspondingly longer support span because of the connecting section 35 between the two slider sections 32, 34. This increases the support rigidity about the Y-axis direction compared to when the X-axis guide 12 is supported over a shorter support span without the connecting section 35. As a result, contact and galling of the Y-axis slider 18 with the Y-axis guide 16 is prevented.
[0046] Furthermore, according to stage device 100 of the embodiment, the movable range R of the center of gravity G of X-axis slider 14, which moves as X-axis slider 14 moves, is contained between the two support legs 68, 72 (i.e., two support positions) that support X-axis guide 12. In other words, the movable range R of the center of gravity G of X-axis slider 14 is contained within the support span of Y-axis slider 18. This makes it possible to prevent X-axis guide 12 from tilting about the Y-axis direction when movement of X-axis slider 14 causes a load fluctuation on X-axis guide 12, and as a result, galling caused by contact between Y-axis slider 18 and Y-axis guide 16 is further suppressed.
[0047] Furthermore, according to stage device 100 of the embodiment, the lower air pad, upper air pad, and support legs are arranged so that the lower air pad is located between the upper air pad and the support legs in the X-axis direction. This prevents the slider section from tilting about the Y-axis direction when a downward load is applied to the slider section via the support legs as the X-axis slider 14 moves, and as a result, galling caused by contact between the Y-axis slider 18 and the Y-axis guide 16 is further suppressed.
[0048] Next, an application example of this embodiment will be described.
[0049] Stage device 100 according to the embodiment may be incorporated as a component of equipment or devices used in clean environments such as clean rooms, vacuum chambers, etc. For example, stage device 100 according to the embodiment is suitable for precisely controlling the position of a work table on which a semiconductor wafer or the like to be processed is placed in semiconductor manufacturing equipment such as an exposure apparatus, ion implantation apparatus, heat treatment apparatus, etching apparatus, sputtering apparatus, or inspection apparatus.
[0050] Figure 5 is a diagram showing an example in which stage device 100 is incorporated into a vacuum chamber. The air supply system is not shown in Figure 5. Stage device 100 is supported on a base 202. Base 202 is supported on a vibration isolation table 204. Vibration isolation table 204 absorbs vibrations from the floor where stage device 100 is placed, suppressing vibrations of base 202 and therefore stage device 100.
[0051] The stage apparatus 100 is housed in a vacuum chamber 200. A predetermined degree of vacuum is maintained inside the vacuum chamber 200. In other words, in this example, the stage apparatus 100 is used in a vacuum environment (vacuum atmosphere).
[0052] In stage device 100, the slider and guide form an air slide, floating above the guide and moving along the guide without contacting it. Therefore, unlike when a rolling bearing or linear guide is used between the slider and guide, no lubricating oil or fine dust particles are generated from the sliding surface, and the inside of vacuum chamber 200 can be kept clean.
[0053] 6 is a diagram showing an example in which stage apparatus 100 is incorporated into an exposure apparatus. Exposure apparatus 300 is used in the manufacture of various devices such as semiconductor devices such as semiconductor integrated circuits, micromachines, and thin-film magnetic heads.
[0054] The stage device 100 positions a wafer W as a substrate. The light source 302 and optical system 304 expose and transfer the pattern of a reticle (mask) 306 onto each region of the positioned wafer W using a step-and-scan method.
[0055] The device manufacturing method will now be described. A reticle 306 is created based on the designed circuit pattern. Meanwhile, a wafer W is created using a predetermined material such as silicon. Next, a circuit is formed on the wafer W using lithography technology using the reticle 306 and the wafer W. Specifically, the circuit pattern of the reticle 306 is transferred onto the wafer W by exposure using an exposure apparatus 300. Next, the wafer W with the transferred circuit pattern is made into semiconductor chips. This process includes, for example, well-known assembly processes (dicing, bonding) and packaging processes (chip encapsulation). Finally, the semiconductor device is inspected using an inspection apparatus. In this process, a stage apparatus 100, which is a component of the inspection apparatus, positions the semiconductor device and inspects the positioned semiconductor device.
[0056] The present invention has been described above based on an embodiment. This embodiment is merely an example, and it will be understood by those skilled in the art that various modifications are possible in the combination of each component and each treatment process, and that such modifications are also within the scope of the present invention. Modifications will be described below.
[0057] (Variation 1) FIG. 7 is a cross-sectional view of a stage device 100 according to a modified example. FIG. 7 corresponds to FIG. 3. In this modified example, the Y-axis slider 18 does not have an air servo chamber. Instead, the stage device 100 has a linear motor 92. In other words, the Y-axis slider 18 is driven by the linear motor 92 rather than an air servo. The linear motor 92 includes a magnet 94 fixed to the Y-axis slider 18 and a plurality of electromagnets 96 fixed to the Y-axis guide 16 so as to be aligned in the Y-axis direction. In this example, the magnet 94 is fixed to the connecting portion 35, but this is not limiting. For example, the magnet 94 may be fixed to at least one of the first slider portion 32 and the second slider portion 34. According to this embodiment, the same effects as those of the above-described embodiment can be achieved.
[0058] Any combination of the above-described embodiments and modifications is also useful as an embodiment of the present invention. A new embodiment resulting from the combination combines the effects of the combined embodiments and modifications. It will also be understood by those skilled in the art that the functions to be performed by each constituent element in the claims can be realized by each component shown in the embodiments and modifications, either alone or in combination. [Industrial Applicability]
[0059] The present invention relates to a stage apparatus, an exposure apparatus, an inspection apparatus, and a device manufacturing method. [Explanation of symbols]
[0060] 12 X-axis guide, 14 X-axis slider, 16 Y-axis guide, 18 Y-axis slider, 32 first slider portion, 34 second slider portion, 35 connecting portion, 36, 46 Lower air pad, 40,50 Upper air pad, 100 Stage device.
Claims
1. A first slider; a first guide that guides the movement of the first slider in a first direction; a second slider including two slider portions spaced apart from each other in the first direction and supporting the first guide from below; a second guide that guides the movement of the second slider; A stage apparatus comprising:
2. 10. The stage apparatus according to claim 1, wherein the stage apparatus is used in a vacuum environment.
3. 3. A stage apparatus according to claim 1, wherein the second slider includes a connecting portion that connects the two slider portions.
4. 4. The stage device according to claim 3, wherein a cross-sectional area of the connecting portion perpendicular to the first direction is smaller than a cross-sectional area of the slider portion perpendicular to the first direction.
5. 5. A stage device according to claim 1, wherein the first slider and / or the second slider are driven by an air servo.
6. 5. A stage apparatus according to claim 1, wherein the second slider is driven by a linear motor.
7. A stage device described in any one of claims 1 to 6, wherein the first guide has a concave cross section perpendicular to the first direction.
8. 8. A stage device according to claim 1, wherein the movable range of the center of gravity of the first slider, which moves in conjunction with the movement of the first slider, is between two support positions in the first direction at which the two slider portions support the first guide.
9. 9. A stage device according to claim 1, further comprising a restraining member for restraining the two slider portions from moving in the vertical direction relative to the second guide when the two slider portions are not in contact with the second guide.
10. The stage apparatus according to claim 9, wherein the restraining member is an air pad.
11. the restraint members are upper and lower air pads that are disposed on the upper and lower surfaces of the two slider portions and that inject compressed gas toward the opposing surfaces of the second guide, 10. The stage device according to claim 9, which relies on claim 8, wherein the lower air pad is provided between the upper air pad and the support position in the first direction.
12. a stage device according to any one of claims 1 to 11; an exposure apparatus that positions the substrate using the stage device;
13. a stage device according to any one of claims 1 to 11; An inspection apparatus that positions the substrate using the stage device.
14. A device manufacturing method comprising the step of manufacturing a device using the exposure apparatus according to claim 12.
15. A first slider; a first guide that guides the movement of the first slider in a first direction; a second slider including two slider portions spaced apart from each other in the first direction and supporting the first guide from below; a second guide that guides the movement of the second slider, The stage device in which the first slider and the second slider are driven by an air servo.
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