Information processing device, inference device, machine learning device, information processing method, inference method, and machine learning method

The information processing device and machine learning method address the inadequacies of existing cleaning tool management by predicting tool states based on operating conditions, enhancing substrate processing reliability and efficiency.

JP7763140B2Active Publication Date: 2025-10-31EBARA CORP
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Patent Information

Application Number
JP2022056744
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-03-30
Publication Date
2025-10-31
Estimated Expiration
2042-03-30

AI Technical Summary

Technical Problem

Existing methods for managing the condition of cleaning tools in substrate processing apparatuses are inadequate, as they rely solely on cumulative usage counts and time, failing to account for varying operating states and conditions, leading to inaccurate assessments of tool wear and contamination.

Method used

An information processing device and machine learning method that utilizes substrate processing apparatus data to learn correlations between operating states and cleaning tool conditions, enabling predictive analysis of cleaning tool states through machine learning models.

Benefits of technology

Accurately predicts the state of cleaning tools based on operating conditions, allowing for more precise management and timely maintenance, thereby improving the reliability and efficiency of substrate processing.

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Abstract

To provide an information processing device, an inference device, a machine learning device, an information processing method, an inference method, and a machine learning method, capable of properly predicting a cleaning tool state according to an operating state of a substrate processing device.SOLUTION: In a substrate processing system, an information processing device 5 comprises: an information acquisition unit 500; and a state prediction unit 501. A substrate processing device comprises: a substrate holding unit for holding a substrate; a cleaning fluid supply unit for supplying a substrate cleaning fluid to the substrate; a substrate cleaning unit for rotatably supporting a cleaning tool, bringing the cleaning tool into contact with the substrate to clean the substrate; and a cleaning tool cleaning unit for cleaning the cleaning tool with a cleaning tool cleaning fluid. The information acquisition unit acquires operating state information including substrate holding unit state information, cleaning fluid supply unit state information, substrate cleaning unit state information, and cleaning tool cleaning unit state information as operating states of when the substrate processing device is operated.SELECTED DRAWING: Figure 15
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