Integrated processing equipment

Abstract

The integrated processing equipment includes a base (100), a rotation device (200) and a flow guide device (300). The rotation device (200) includes a tilt angle adjustment unit (210) and a rotation unit (220), the tilt angle adjustment unit (210) is installed on the base (100), the rotation unit (220) is connected to the tilt angle adjustment unit (210), the rotation unit (220) is configured to mount a workpiece and rotate the workpiece around a first axis (001), and the tilt angle adjustment unit (210) is configured to drive the rotation unit (220) to rotate the workpiece around a second axis (002) having an included angle with respect to the first axis (001). The flow guide device (300) includes a frame (310), a liquid storage section (320), and a flow guide section (330), the frame (310) is connected to the tilt angle adjustment unit (210), the liquid storage section (320) and the flow guide section (330) are both connected to the frame (310), the liquid storage section (320) is configured to transport the liquid to the flow guide section (330), and the liquid can flow through the flow guide section (330) to the workpiece located on the rotation unit (220). The integrated processing equipment can adjust the distance from the fluid to the workpiece surface and reduce the impact force by adjusting the tilt angle of the workpiece relative to the horizontal plane as needed, and can also adjust the speed of the fluid flowing on the workpiece surface, which makes it easier to control the processing quality and improves the yield of the final product.

Description

Technical Field

[0001] [Cross - reference to Related Applications] The present invention claims the priority of the Chinese patent application No. 202210406069.9 titled "Integrated Processing Equipment" filed with the China National Intellectual Property Administration on April 18, 2022, and the entire content thereof is incorporated herein by reference. The present invention relates to the field of processing technologies, and more specifically, to integrated processing equipment.

Background Art

[0002] The development process is an intermediate process in the photolithography process. Its purpose is to remove a part of the photoresist on the wafer to form a three - dimensional physical pattern, thereby accurately copying the circuit structure on the mask onto the photoresist layer of the silicon wafer. In the development process, the fluid and the photoresist in the exposed area undergo an acid - base neutralization reaction, and after development, the residues from the reaction are removed by deionized water. The key point of development is to confirm that the feature size (the minimum line width of semiconductor devices in integrated circuit manufacturing) meets the requirements. If the feature size meets the requirements, all geometric features generated during processing are considered to meet the requirements. There are three types of conventional development processes: immersion development, continuous spray development, and rotary immersion development. In conventional continuous spray development, while rotating the wafer at a speed of 100 r / min to 500 r / min, a mist - like fluid is sprayed onto the wafer.

[0003] As a result of intensive research, the inventors have discovered that existing developing devices have the disadvantages of a narrow application range and high costs.

Summary of the Invention

Problems to be Solved by the Invention

[0004] The present invention aims to provide an integrated processing equipment that can process workpieces of various sizes and has the advantages of high adaptability, a wide range of applications, and low cost. [Means for solving the problem]

[0005] An embodiment of the present invention is realized as follows. The present invention provides an integrated processing equipment, Includes a base, a rotating device and a flow guide device, The rotating device includes a tilt angle adjustment unit and a rotating unit, the tilt angle adjustment unit is mounted on the base, the rotating unit is connected to the tilt angle adjustment unit, the rotating unit is configured to place a workpiece on it and rotate the workpiece around a first axis, and the tilt angle adjustment unit is configured to drive the rotating unit to rotate around a second axis having an angle with respect to the first axis. The flow guide device includes a frame, a liquid reservoir, and a flow guide section, the frame being connected to the tilt angle adjustment unit, the liquid reservoir and the flow guide section both being connected to the frame, the liquid reservoir being configured to transport liquid to the flow guide section, and the liquid being able to flow through the flow guide section to a workpiece located on the rotating unit.

[0006] In a possible embodiment, the tilt angle adjustment unit includes a first drive unit and a mounting base, wherein the first drive unit is connected to the base, the mounting base is connected to the first drive unit, and the first drive unit is configured to drive the mounting base to rotate around the first axis. Both the rotating unit and the frame are connected to the mounting base.

[0007] In possible embodiments, the mounting base is provided with a liquid collection tank and a liquid outlet communicating with the liquid collection tank, the base is provided with a liquid collection chamber, the liquid outlet communicates with the liquid collection chamber, the rotating unit is installed inside the liquid collection tank, and the liquid collection tank is configured to collect liquid that falls from the workpiece and to allow the fallen liquid to enter the liquid collection chamber through the liquid outlet.

[0008] In a possible embodiment, the rotating unit includes a second drive unit, a rotating disk, and a positioning component, wherein the second drive unit is connected to the mounting base, the rotating disk is connected to the second drive unit, the second drive unit is configured to drive the rotating disk to rotate around the second axis, the positioning component is connected to the rotating disk, and the positioning component is configured to position a workpiece on the rotating disk.

[0009] In a possible embodiment, the positioning component includes a plurality of clamp blocks, each of which is connected to the rotating disk, and the plurality of clamp blocks jointly define a clamping area for clamping a workpiece, and at least one of the plurality of clamp blocks is configured to move relative to the rotating disk to adjust the size of the clamping area.

[0010] In possible embodiments, the flow guide is provided with a liquid discharge side, and the flow guide is movably connected to the frame and used to adjust the distance between the liquid discharge side and the workpiece located on the rotating unit by adjusting the distance between the liquid discharge side and the frame.

[0011] In possible embodiments, the flow guide is slidably connected to the frame in the extending direction of the second axis so as to adjust the distance between the liquid discharge side and the frame.

[0012] In possible embodiments, the flow guide device also includes a locking unit, which is simultaneously connected to the flow guide section and the frame, and the locking unit has a switchable locked state and an unlocked state, in the locked state the flow guide section is fixed to the frame in the direction of the extension of the second axis, and in the unlocked state the flow guide section is slidable to the frame in the direction of the extension of the second axis.

[0013] In a possible embodiment, the liquid reservoir is slidably connected to the frame in the extending direction of the second axis so as to adjust the distance of the liquid reservoir from the flow guide.

[0014] In a possible embodiment, the liquid storage section is provided with a first chamber and a second chamber that are independent of each other, the first chamber having a first outlet and configured to store a fluid, and the second chamber having a second outlet and configured to store a cleaning liquid. [Effects of the Invention]

[0015] The beneficial effects of the present invention are as follows: In summary, the integrated processing equipment provided by the present invention can be applied to developing scenarios. Specifically, when developing a workpiece, the workpiece is placed on a rotating unit, and the inclination angle of the workpiece relative to the horizontal plane is adjusted by an inclination angle adjustment unit according to the thickness and size of the workpiece. In other words, the inclination angle of the workpiece relative to the flow guide is adjusted, resulting in less impact force on the workpiece surface from the flow guide, making it less likely to damage the workpiece surface and resulting in high development quality. Because the angle between the workpiece and the flow guide can be adjusted as needed according to the thickness and size of the workpiece, it can be adapted to developing workpieces of different sizes, ensuring development quality, and has a wide range of applications. This eliminates the need to design dedicated developing equipment for workpieces of different sizes, thus reducing costs. [Brief explanation of the drawing]

[0016] To more clearly explain the technical solutions of the embodiments of the present invention, the drawings that need to be used in the embodiments are briefly described below. It should be understood that the following drawings only show specific embodiments of the present invention and should not be construed as limiting the scope. A person skilled in the art can also obtain other related drawings based on these drawings without creative efforts.

[0017] [Figure 1] It is a schematic structural view of the integrated processing equipment according to an embodiment of the present invention from a certain perspective. [Figure 2] It is a schematic structural view of the integrated processing equipment according to an embodiment of the present invention from another perspective. [Figure 3] It is a schematic partial structural view of the integrated processing equipment according to an embodiment of the present invention. [Figure 4] It is a schematic structural view of the rotating disk and positioning components according to an embodiment of the present invention. [Figure 5] It is a schematic structural view of the frame body and locking unit according to an embodiment of the present invention. [Figure 6] It is a schematic structural view of the locking unit according to an embodiment of the present invention. [Figure 7] It is a schematic structural view of the flow guiding part according to an embodiment of the present invention. [Figure 8] It is a schematic structural view of the liquid storage part according to an embodiment of the present invention.

Modes for Carrying Out the Invention

[0018] To make the objectives, technical solutions and advantages of the embodiments of the present invention clearer, together with the drawings of the embodiments of the present invention, the technical solutions in the embodiments of the present invention are clearly and completely described below. Obviously, the described embodiments are some but not all of the embodiments of the present invention. Usually, the components of the embodiments of the present invention shown and described in the drawings can be arranged and designed in various different configurations.

[0019] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed present invention, but is merely intended to represent selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the scope of protection of the present invention.

[0020] In the following figures, the same reference numerals and characters represent the same items. It should be understood that once an item is defined in one figure, subsequent figures do not require further definition and description.

[0021] In the description of the present application, the directions or positional relationships indicated by terms such as "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. are the directions or positional relationships shown based on the drawings, the directions and positional relationships in which the application product is usually placed during use, and are only for the convenience of explaining the present invention and simplifying the description. It does not indicate or imply that the mentioned device or element must face a specific direction and be constructed and operate in a specific direction, and therefore it should be understood that it does not limit the present invention. Also, terms such as "first", "second", "third", etc. are only for distinguishing the description and should not be construed as indicating or implying relative importance.

[0022] Also, terms such as "horizontal" and "vertical" do not mean that the parts need to be completely horizontal or hanging. Even if they are slightly inclined, it doesn't matter. For example, "horizontal" only means that its direction is more horizontal than "vertical", and does not mean that the structure must be completely horizontal. It is okay if it is slightly inclined.

[0023] In the description of the present invention, and unless otherwise specifically stated and limited, the terms “installation,” “attachment,” “interconnection,” and “connection” should be understood in a broad sense, for example, and can be fixed connections, removable connections, or integrated connections; they can be mechanical or electrical connections; they can be direct connections, indirect connections via an intermediary, or internal connections between two components. Those skilled in the art will understand the specific meaning of the above terms in the present invention on a case-by-case basis.

[0024] Currently, in the field of semiconductor processing, when developing a workpiece, it is common practice to place the workpiece on a rotating disk and then apply a fluid to the surface of the workpiece while the workpiece rotates continuously to achieve development in all directions. After positioning the workpiece on the rotating disk, the angle of the rotating disk is fixed, and the angle of the workpiece relative to the horizontal plane is fixed and cannot be adjusted. Therefore, if the workpiece size is different, the height between the workpiece and the fluid outlet side changes, and when the fluid reaches the surface of the workpiece, the impact force changes. Furthermore, this impact force makes the workpiece more susceptible to damage, reducing the yield of the final product.

[0025] With this in mind, and referring to Figures 1 to 8, the inventors have designed an integrated processing facility usable in the developing field. By adjusting the inclination angle of the workpiece relative to the horizontal plane as needed, the distance from the fluid to the workpiece surface can be adjusted, reducing impact forces. Furthermore, the velocity of the developer flowing over the workpiece surface can be adjusted, making it easier to control the development quality and improving the yield of the final product.

[0026] Referring to Figures 1 to 3, in this embodiment, the integrated processing equipment includes a base 100, a rotating device 200, and a flow guide device 300. The base 100 is for fixing to a support surface such as a workbench or the ground. The rotating device 200 includes a tilt angle adjustment unit 210 and a rotating unit 220. The tilt angle adjustment unit 210 is installed on the base 100, and the rotating unit 220 is connected to the tilt angle adjustment unit 210. The rotating unit 220 is configured to place a workpiece on it and rotate the workpiece around a first axis 001. The tilt angle adjustment unit 210 is configured to drive the rotating unit 220 to rotate around a second axis 002 that has an angle with respect to the first axis 001. The flow guide device 300 comprises a frame 310, a liquid storage section 320, and a flow guide section 330. The frame 310 is connected to the tilt angle adjustment unit 210, and both the liquid storage section 320 and the flow guide section 330 are connected to the frame 310. The liquid storage section 320 is configured to transport liquid to the flow guide section 330, and the liquid can flow through the flow guide section 330 to a workpiece located on the rotating unit 220.

[0027] In this embodiment, the first axis 001 is perpendicular to the second axis 002, and the second axis 002 basically coincides with the horizontal plane. Clearly, in other embodiments, the first axis 001 and the second axis 002 may have other angle constraints other than 0° and 90°. At the same time, the second axis 002 may have an angle constraint other than 0° with respect to the horizontal plane.

[0028] In this embodiment, as an optional configuration, the base 100 is installed as a square base, and the base 100 has a first plate surface and a second plate surface facing each other, the first plate surface being fixed to a support surface, the second plate surface facing upward, and two mounting blocks 130 are installed on the second plate surface, both of which are rectangular blocks, and the two mounting blocks 130 are spaced apart. Each mounting block 130 has a bearing hole, and the two bearing holes of the two mounting blocks 130 are installed coaxially. Furthermore, a liquid collection chamber 110 is installed on the base 100, the liquid collection chamber 110 has an opening located on the second plate surface, and a water pump 120 is installed inside the liquid collection chamber 110.

[0029] Referring to Figure 2, in this embodiment, as an optional configuration, the tilt angle adjustment unit 210 includes a first drive unit 211, a mounting base 212, and bearings (not shown). The first drive unit 211 is configured as a motor and is fixed to the second plate surface. There are two bearings, which are fitted into bearing holes in the two mounting blocks 130, respectively. The output shaft of the first drive unit 211 is simultaneously inserted into the inner rings of the two bearings. In this way, the output shaft of the first drive unit 211 is rotatably connected to the two mounting blocks 130 around the second shaft 002 via the two bearings. The mounting base 212 is fixed to the output shaft of the first drive unit 211 and is rotatable with the output shaft. That is, after the mounting base 212 is attached to the output shaft, the mounting base 212 and the output shaft are fixed relative to each other in the circumferential direction of the output shaft. For example, the mounting base 212 can be fixedly connected to the output shaft via splines or pins. Furthermore, the mounting base 212 includes a connected base body 2121 and a plate body 2122, the base body 2121 being fitted to the outside of the output shaft and fixedly connected to the output shaft. The plate body 2122 is equipped with a liquid collection tank 2123 and a liquid outlet 2124 communicating with the liquid collection tank 2123. A through hole is provided in the center of the liquid collection tank 2123, the through hole is a cylindrical hole, and a sealed bearing is installed inside the through hole. The liquid in the liquid collection tank 2123 can be discharged into the liquid collection chamber 110 via the liquid outlet 2124.

[0030] In other embodiments, as an optional configuration, the tilt angle adjustment unit 210 also includes an angle measuring instrument, which is connected to the first drive unit 211 and configured to detect the rotation angle of the output shaft of the first drive unit 211, thereby obtaining the rotation angle of the mounting base 212, further obtaining the angle of the mounting base 212 with respect to the horizontal plane, and finally obtaining the angle of the workpiece with respect to the horizontal plane.

[0031] Referring to Figures 1 and 4, in this embodiment, as an optional configuration, the rotating unit 220 includes a second drive unit 221, a rotating disk 222, and a positioning component 223, the second drive unit 221 being configured as a motor. The second drive unit 221 is fixed on the base body 2121, and the output shaft of the second drive unit 221 is inserted into a sealed bearing, and the output shaft of the second drive unit 221 extends into the liquid collection tank 2123. The rotating disk 222 may be a circular disk. The rotating disk 222 is located inside the liquid collection tank 2123. The rotating disk 222 is fixedly connected to the output shaft. The axis of the rotating disk 222 is collinear with the axis of the output shaft. The positioning component 223 is located on the rotating disk 222, and the positioning component 223 is for positioning the workpiece on the rotating disk 222 so that the workpiece does not move relative to the rotating disk 222 during the developing process.

[0032] In a selectable configuration, the positioning component 223 includes multiple positioning blocks, each connected to a rotating disk 222, and at least one of the positioning blocks is slidable relative to the rotating disk 222 along its radial direction, thereby adjusting the position of the positioning block relative to the rotating disk 222. The multiple positioning blocks are configured to clamp a workpiece together, and the multiple positioning blocks jointly define a clamping area. It should be understood that as the positioning blocks move relative to the rotating disk 222, the size of the clamping area changes, allowing for adaptation to clamping various workpieces and enabling a wide range of applications and low cost.

[0033] Each of the positioning blocks can be slidably mounted relative to the rotating disk 222, allowing for a wide and flexible adjustment range and enabling clamping of a wider variety of workpieces. Of course, in other embodiments, only one of the positioning blocks can be configured to be movable relative to the rotating disk 222, thereby achieving the function of adjusting the size of the clamping area.

[0034] Furthermore, the positioning block can be fixed to the rotating disk 222 by screws, and the rotating disk can have multiple screw holes. By screwing the screws into different screw holes, the position of the positioning block relative to the rotating disk 222 in the radial direction can be changed, allowing the workpiece to be stably clamped without changing the size of the clamping area after adjusting the size of the clamping area.

[0035] Referring to Figure 5, in this embodiment, as an optional configuration, the frame 310 includes a fixing plate 311, a fixing rod 312, and an adjustment rod 313. The fixing plate 311 is configured as a rectangular plate and is fixed to the base body 2121 by screws. One end of the fixing rod 312 is connected to the fixing plate 311, and the other end is connected to the adjustment rod 313. There are two fixing rods 312 and two adjustment rods 313. One end of each of the two fixing rods 312 is connected to the base body 2121, and the other ends of the two fixing rods 312 are fixedly connected to the two adjustment rods 313, respectively. Both of the two adjustment rods 313 are perpendicular to the second axis 002 and are spaced apart in the direction of extension of the second axis 002.

[0036] Furthermore, each adjustment rod 313 is slidably connected to a corresponding fixed rod 312. The sliding direction of the adjustment rods 313 and fixed rods 312 is parallel to the guiding direction of the flow guide section 330, which guides the liquid and directs it to the workpiece. In this way, when the size of the workpiece located on the rotating disk 222 is small, the position of the adjustment rods 313 relative to the fixed rods 312 can be adjusted to move the flow guide section 330 closer to or further away from the workpiece, allowing the liquid flowing out of the flow guide section 330 to fall smoothly onto the workpiece.

[0037] In this embodiment, as a selectable configuration, the flow guide section 330 is slidably fitted to the frame 310 via a locking unit 340. The locking unit 340 has a mutually switchable locked state and an unlocked state. In the locked state, the flow guide section 330 is fixed to the frame 310 in the extending direction of the second axis 002, and in the unlocked state, the flow guide section 330 is slidable to the frame 310 in the extending direction of the second axis 002. In this way, the flow guide section 330 can move relative to the frame 310, and thereby move relative to the rotating disk 222, adjusting the distance between the flow guide section 330 and the rotating disk 222, and finally adjusting the distance between the flow guide section 330 and the workpiece surface located on the rotating disk 222. With this design, the position of the flow guide 330 is adjusted according to the workpiece thickness, the distance between the flow guide 330 and the workpiece is always maintained within a reasonable distance range, the liquid guided by the flow guide 330 and flowing from the liquid discharge side 331 of the flow guide 330 onto the surface of the workpiece can uniformly cover the surface of the workpiece, thereby improving work quality.

[0038] Referring to Figure 6, as a selectable configuration, the locking unit 340 includes a plurality of engagement rods 341, with at least one engagement rod 341 mounted on each adjustment rod 313, and each engagement rod 341 is provided with annular projections 342 arranged at equal intervals in the axial direction of the engagement rod 341. The number of engagement rods 341 on each adjustment rod 313 may be one, two, three, etc.

[0039] Referring to Figure 7, as a selectable configuration, the flow guide section 330 is installed as a square plate, with one side of the flow guide section 330 designated as the liquid discharge side 331. The flow guide section 330 is provided with clamp holes 332 that penetrate the flow guide section 330 in the thickness direction, and the clamp holes 332 include a communicating first hole section 3321 and a second hole section 3322, both of which are arc-shaped holes, and the diameter of the first hole section 3321 is larger than the space of the second hole section 3322. The number of clamp holes 332 on the flow guide section 330 is designed according to the number of engagement rods 341, with the number of clamp holes 332 being equal to the number of engagement rods 341, corresponding one to one, and each engagement rod 341 can be inserted into the corresponding clamp hole 332. Furthermore, the engagement rod 341 is movable between the first hole 3321 and the second hole 3322. When the engagement rod 341 is located in the first hole 3321, the locking unit 340 is unlocked, and the engagement rod 341 is relatively movable relative to the flow guide section 330 in the axial extension direction of the first hole 3321. This allows the position of the flow guide section 330 to be adjusted. After moving to the set position, the engagement rod 341 is slid into the second hole 3322 and engages with the flow guide section 330 using the annular projection 342. At this time, the locking unit 340 is locked, and the flow guide section 330 and the engagement rod 341 remain fixed along the axial extension direction of the engagement rod 341. The adjustment operation of the position of the flow guide section 330 relative to the frame 310 is convenient and flexible.

[0040] Clearly, in other embodiments, the flow guide section 330 can also be installed to rotate together with the frame 310, and the distance between the liquid discharge side 331 and the workpiece can also be adjusted.

[0041] Referring to Figure 8, in this embodiment, as an optional configuration, the liquid storage section 320 is equipped with a first chamber and a second chamber that are independent of each other. The first chamber has a first outlet 321 and a first inlet, and is configured to store a fluid, which may be a developer or the like. The second chamber has a second outlet 322 and a second inlet, and is configured to store a cleaning solution. During actual work, if development is required, the fluid is replenished into the first chamber through the first inlet, and the fluid is discharged from the first outlet 321 and falls onto the flow guide section 330, flowing onto the workpiece surface from the liquid discharge side 331 of the flow guide section 330. If the workpiece needs to be cleaned after development is complete, the cleaning solution in the second chamber is discharged from the second outlet 322 and flows onto the workpiece surface through the flow guide section 330.

[0042] Furthermore, both the first outlet 321 and the second outlet 322 are strip-shaped openings, and both extend along the direction of extension of the second axis 002. This allows the liquid flowing out from the first outlet 321 and the second outlet 322 to form a curtain of water, enabling it to flow more uniformly towards the guide section 330.

[0043] In this embodiment, the integrated processing equipment operates, for example, as follows: The workpiece is placed on the rotating disk 222, and the workpiece is clamped onto the rotating disk 222 by moving the positioning block. Next, the mounting base 212 is rotated using the tilt angle adjustment unit 210, thereby changing the tilt angle with respect to the horizontal plane while operating the rotating disk 222, workpiece, rotating unit 220, and flow guide device 300. After the tilt angle adjustment is complete, the height of the flow guide plate relative to the workpiece is adjusted, and then the workpiece is developed and washed. Of course, in other steps, it is also possible to first adjust the distance between the flow guide plate and the workpiece, and then adjust the tilt angle of the workpiece.

[0044] The integrated processing equipment provided by this embodiment can process workpieces of different shapes and sizes. The workpiece size includes the outer dimensions and thickness, and the workpiece shape can be circular, rectangular, etc., offering a wide processing range, broad application range, and low cost. At the same time, the inclination angle and distance of the workpiece relative to the flow guide plate can be adjusted according to the requirements of the workpiece to meet various processing needs and improve processing quality.

[0045] This integrated processing equipment can also be used in other work scenarios such as acid coating and coating.

[0046] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Those skilled in the art can make various modifications and variations to the present invention. Changes, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention shall be within the scope of protection of the present invention. [Explanation of symbols]

[0047] 001-1st axis 002-Second axis 100-Base 110-Liquid Collection Chamber 120-Water pump 130 - Mounting Block 200-Rotating device 210 - Tilt Angle Adjustment Unit 211-First drive unit 212-Mounting base 2121 - Base Unit 2122-plate 2123 - Liquid collection tank 2124-Liquid outlet 220-Rotating Unit 221-Second drive unit 222-Rotating Disc 223 - Positioning Component 300-Direction device 310-frame body 311-Fixing plate 312 - Fixed Rod 313 - Adjustment Rod 320-Liquid Storage Section 321-Exit 1 322-Second Exit 330-Direction part 331-Liquid discharge side 332-Clamping Hole 3321-1st hole 3322-Second hole 340-Lock Unit 341 - Mooring Rod 342-Annular projection

Claims

1. It is an integrated processing facility, Includes a base, a rotating device and a flow guide device, The rotating device includes a tilt angle adjustment unit and a rotating unit, the tilt angle adjustment unit is mounted on the base, the rotating unit is connected to the tilt angle adjustment unit, the rotating unit is configured to place a workpiece on it and rotate the workpiece around a first axis, and the tilt angle adjustment unit is configured to drive the rotating unit to rotate around a second axis having an angle with respect to the first axis. The flow guide device includes a frame, a liquid reservoir, and a flow guide section, the frame being connected to the tilt angle adjustment unit, the liquid reservoir and the flow guide section both being connected to the frame, the liquid reservoir being configured to transport liquid to the flow guide section, and the liquid being able to flow through the flow guide section to a workpiece located on the rotating unit. A liquid discharge side is installed in the aforementioned flow guide section. The flow guide is movably connected to the frame and adjusts the distance between the liquid discharge side and the frame, thereby adjusting the distance between the liquid discharge side and the workpiece located on the rotating unit. The flow guide section is slidably connected to the frame in the extending direction of the first axis so as to adjust the distance between the liquid discharge side and the frame, The integrated processing equipment is characterized in that the flow guide device also includes a locking unit, the locking unit is simultaneously connected to the flow guide section and the frame, the locking unit has a switchable locked state and an unlocked state, in the locked state the flow guide section is fixed to the frame in the extending direction of the first axis, and in the unlocked state the flow guide section is slidable to the frame in the extending direction of the first axis.

2. The tilt angle adjustment unit includes a first drive unit and a mounting base, the first drive unit being connected to the base, the mounting base being connected to the first drive unit, and the first drive unit being configured to drive the mounting base to rotate around the second axis. The integrated processing equipment according to claim 1, characterized in that both the rotating unit and the frame are connected to the mounting base.

3. The integrated processing equipment according to claim 2, characterized in that the mounting base is provided with a liquid collection tank and a liquid outlet communicating with the liquid collection tank, the base is provided with a liquid collection chamber, the liquid outlet communicates with the liquid collection chamber, the rotating unit is installed inside the liquid collection tank, and the liquid collection tank is configured to collect liquid that has fallen from the workpiece and to allow the fallen liquid to enter the liquid collection chamber through the liquid outlet.

4. The integrated machining equipment according to claim 2, wherein the rotating unit includes a second drive unit, a rotating disk, and a positioning component, the second drive unit being connected to the mounting base, the rotating disk being connected to the second drive unit, the second drive unit being configured to drive the rotating disk to rotate around the first axis, the positioning component being connected to the rotating disk, and the positioning component being configured to position a workpiece on the rotating disk.

5. The integrated machining equipment according to claim 4, wherein the positioning component includes a plurality of clamp blocks, each of which is connected to the rotating disk, the plurality of clamp blocks jointly define a clamping area for clamping a workpiece, and at least one of the plurality of clamp blocks is configured to move relative to the rotating disk to adjust the size of the clamping area.

6. The integrated processing equipment according to claim 1, characterized in that the liquid storage section is slidably connected to the frame in the extending direction of the first axis so as to adjust the distance of the liquid storage section to the flow guide section.

7. The integrated processing equipment according to claim 6, wherein the liquid storage section is provided with a first chamber and a second chamber that are independent of each other, the first chamber has a first outlet and is configured to store a fluid, and the second chamber has a second outlet and is configured to store a cleaning liquid.

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