Shower head faceplate with angled gas distribution channel for semiconductor processing tools

Abstract

A showerhead faceplate for a semiconductor processing chamber is provided that includes one or more sets of gas distribution passages through the showerhead faceplate that extend at least partially along axes that are at an oblique angle relative to a central axis of the showerhead faceplate. Such angled gas distribution passages may be used to tailor the gas flow characteristics of such a showerhead faceplate to produce various desired gas flow behaviors for gases delivered to a wafer through such a showerhead faceplate.

Description

Technical Field

[0001] (Cross - Reference to Related Applications) The PCT application form is submitted simultaneously with this specification as part of this application. Each application for which this application claims benefit or priority, as identified by the PCT application form submitted simultaneously, is hereby incorporated by reference in its entirety and made a part of this specification for all practical purposes.

Background Art

[0002] Semiconductor processing tools generally use a "showerhead" that distributes semiconductor processing gas across the entire surface of a substrate or wafer supported inside a semiconductor processing chamber by a pedestal or chuck. The showerhead typically features a faceplate that includes a number of gas distribution passages, such as holes, that face the wafer and deliver processing gas through the faceplate from one or more internal volumes of the showerhead during semiconductor processing operations. There are two general classes of showerheads used in semiconductor processing tools, namely, "chandelier" type showerheads and "embedded" showerheads. A chandelier type showerhead typically has a structure resembling a disk that houses the gas distribution passages, one or more internal plenums for distributing the processing gas to these gas distribution passages, and a stem - like portion that is connected to or extends from the top side of the disk - like structure and connects to or extends through the ceiling of the processing chamber in which the chandelier type showerhead is located. The stem - like portion supports the disk - like structure inside the processing chamber and also serves to route the processing gas to one or more plenums inside the disk - like structure. An embedded showerhead has no stem - like portion or equivalent structure and is rather simply mounted on the wall of the semiconductor processing chamber and often actually serves as a lid for the semiconductor processing chamber.

[0003] The showerhead faceplate may, in various implementations, be a separate component from the rest of the showerhead, or it may be an integral part of the showerhead, for example, brazed or welded together with other structures to form a single structure. Some showerheads may feature an open internal plenum, one or more large volumes fluidly connected to, for example, a processing gas inlet and a plurality of gas distribution passages, while others may incorporate a gas distribution plate, which may be an internal structure of the showerhead that works to set a path for processing gas from the processing gas inlet of the showerhead to various gas distribution passages in the showerhead faceplate.

[0004] This specification presents various designs for showerhead faceplates featuring one or more angled gas distribution passages. [Overview of the project] [Means for solving the problem]

[0005] Details of one or more implementations of the subject matter described herein are shown in the accompanying drawings and the following description. Other features, modes, and advantages will become apparent from the specification, drawings, and claims. The implementations described include, but are not limited to, the following specific implementations.

[0006] In some implementations, a device may be provided that includes a showerhead faceplate having a plurality of gas distribution passages extending from a first side of the showerhead faceplate to a second side of the showerhead faceplate opposite the first side. In such implementations, the first and second sides may define the average central plane of the showerhead faceplate. The second side of the showerhead faceplate may face and be exposed to a wafer support located inside a semiconductor processing chamber when the showerhead faceplate is installed in the semiconductor processing chamber as part of the showerhead of the semiconductor processing chamber. The showerhead faceplate may have an inner region and an outer region surrounding the inner region when viewed along a central axis perpendicular to the average central plane, and the boundary between the inner and outer regions may coincide with the inner circumferential wall surface of the showerhead when viewed along the central axis when the showerhead faceplate is installed in the semiconductor processing chamber as part of the showerhead of the semiconductor processing chamber. The gas distribution passages within a first subset of gas distribution passages among a plurality of gas distribution passages may extend at least partially along the axis of a first oblique angle with respect to the central axis, and the gas distribution passages within the first subset of gas distribution passages may be entirely located within a first annular area within an inner area.

[0007] In some implementations, the gas distribution passages within a first subset of gas distribution passages may be arranged in the outermost circular pattern of a plurality of concentric circular patterns of gas distribution passages, each gas distribution passage within a first subset of gas distribution passages may intersect the first side of the shower head faceplate at a location closer to the central axis than where each gas distribution passage within a first subset of gas distribution passages intersects the second side of the shower head faceplate, and one or more of the circular patterns may be located within a circular pattern having a first subset of gas distribution passages inside, each being a circular pattern of gas distribution passages extending along a direction parallel to the central axis.

[0008] In some implementations, the gas distribution passages within a gas distribution passage may be arranged in a circular pattern of multiple concentric circular patterns of gas distribution passages that are radially adjacent to the outermost circular pattern of the circular pattern, and each gas distribution passage within a first subset of gas distribution passages may intersect the first side of the shower head faceplate at a location closer to the central axis than where each gas distribution passage within a first subset of gas distribution passages intersects the second side of the shower head faceplate, and one or more of the circular patterns may be located inside a circular pattern having a first subset of gas distribution passages inside, and are circular patterns of gas distribution passages extending along a direction parallel to the central axis.

[0009] In some such implementations, the outermost circular pattern of the gas distribution pathways may be the circular pattern of a second subset of the gas distribution pathways, and the gas distribution pathways within the second subset of the gas distribution pathways may extend along a direction parallel to the central axis.

[0010] In some alternative implementations of this kind, the outermost circular pattern of the gas distribution pathways may be the circular pattern of a second subset of the gas distribution pathways, and the gas distribution pathways within the second subset of the gas distribution pathways may extend at least partially along the axis of the second oblique angle with respect to the central axis.

[0011] In some such implementations, the first and second angles may be the same.

[0012] In some implementations, the gas distribution passages in a first subset of gas distribution passages may be arranged in the innermost circular pattern of gas distribution passages in a plurality of concentric circular patterns of gas distribution passages, and each gas distribution passage in a first subset of gas distribution passages may intersect with a second side of the shower head faceplate at a location closer to the central axis than where each gas distribution passage in a first subset of gas distribution passages intersects with a first side of the shower head faceplate, and one or more of the circular patterns may be located outside the circular pattern having the first subset of gas distribution passages inside, and each is a circular pattern of gas distribution passages extending along a direction parallel to the central axis.

[0013] In some such implementations of the device, the innermost circular pattern of gas distribution passages may be a circular pattern of multiple clusters of gas distribution passages, where each cluster of gas distribution passages has one or more gas distribution passages in a first subset of gas distribution passages.

[0014] In some implementations of the device, the gas distribution path in the first subset of gas distribution paths may be the gas distribution path closest to the central axis.

[0015] In some implementations of the device, an additional subset of the gas distribution passages among the multiple gas distribution passages may extend at least partially along the axis of a second oblique angle with respect to the central axis, the first oblique angle may be different from the second oblique angle, and the gas distribution passages among the additional subset of the gas distribution passages may also be located within the first annular region.

[0016] In some implementations of the device, an additional subset of the gas distribution passages among the multiple gas distribution passages may extend at least partially along an axis parallel to the central axis, and the gas distribution passages among the additional subset of the gas distribution passages may also be located within the first annular region.

[0017] In some implementations of the device, a first subset of gas distribution passages within a gas distribution passage may be arranged in a pattern of numerous concentric circles.

[0018] In some of the implementations discussed so far, the angle between the central axis and the axis over which the gas distribution passages of each circular pattern extend, at least partially, may be the same for each circular pattern.

[0019] In some other versions of the implementations discussed so far, the angle between the central axis and the axis through which the gas distribution passages of each circular pattern extend at least partially may increase in correlation with the increasing diameter of each circular pattern.

[0020] In some other versions of the implementations discussed so far, the angle between the central axis and the axis through which the gas distribution passages of each circular pattern extend, at least partially, may decrease in correlation with the increasing diameter of each circular pattern.

[0021] In some versions of the implementations discussed so far, each gas distribution channel in the first subset of gas distribution channels may follow a straight path through the showerhead faceplate. In some other versions of the implementations discussed so far, each gas distribution channel in the first subset of gas distribution channels may follow a non-linear path through the showerhead faceplate.

[0022] In some versions of the implementations discussed so far, each gas distribution passage in the first subset of gas distribution passages may follow a branching path through the showerhead faceplate and may have an inlet opening on the first side of the showerhead faceplate and two or more outlet openings on the second side of the showerhead faceplate.

[0023] In some such implementations, each branch path for a gas distribution passage in a first subset of gas distribution passages may have multiple parts including an inlet portion and a number of outlet portions, each inlet portion of each gas distribution passage in a first subset of gas distribution passages may have a first end terminating at an inlet opening for that gas distribution passage, each outlet portion of each gas distribution passage in a first subset of gas distribution passages may have a first end terminating at one of the outlet openings for that gas distribution passage, each inlet portion and outlet portion of each gas distribution passage in a first subset of gas distribution passages may have a second end that is fluidly connected to one another inside the showerhead faceplate, and at least two of the outlet portions for each gas distribution passage in a first subset of gas distribution passages may be of equal length.

[0024] In some other such implementations of the device, each branch path for a gas distribution passage in a first subset of gas distribution passages may have a plurality of parts including an inlet portion and a plurality of outlet portions, each inlet portion of each gas distribution passage in a first subset of gas distribution passages may have a first end terminating at an inlet opening for that gas distribution passage, each outlet portion of each gas distribution passage in a first subset of gas distribution passages may have a first end terminating at one of the outlet openings for that gas distribution passage, each inlet portion and outlet portion of each gas distribution passage in a first subset of gas distribution passages may have a second end that is fluidically connected to one another inside the showerhead faceplate, and at least two of the outlet portions for each gas distribution passage in a first subset of gas distribution passages may be of different lengths.

[0025] In some implementations of the device, at least two of the outlet portions for each gas distribution passage in a first subset of gas distribution passages may have different cross-sectional areas in the corresponding cross-sectional plane, and each cross-sectional plane may be perpendicular to a portion of the branch path following the corresponding outlet portion.

[0026] In some implementations of the device, the inlet portion of each gas distribution passage in the first subset of gas distribution passages may have a cross-sectional area that is different from one or more of the cross-sectional areas of the outlet portions for that gas distribution passage in the corresponding cross-sectional plane, and each cross-sectional plane may be perpendicular to a portion of the branching path along which the corresponding portion continues.

[0027] In some of the implementations discussed above, the gas distribution passages in the second subset of gas distribution passages among the plurality of gas distribution passages may be arranged inside a second annular region inside the inner region, and the first annular region may be different from the second annular region.

[0028] In some such implementations, the gas distribution passages in the second subset of gas distribution passages may extend along an axis parallel to the central axis.

[0029] In some implementations, the second annular region may have an inner boundary and an outer boundary, the first annular region and the second annular region may be concentric, and the first annular region may be positioned inside the inner boundary.

[0030] In some implementations, the first annular region may have an inner boundary and an outer boundary, the first annular region and the second annular region may be concentric, and the second annular region may be positioned inside the inner boundary.

[0031] In some implementations, a number of concentric rings of gas distribution passages may be present inside the second subset of gas distribution passages.

[0032] In some of the implementations discussed above, the apparatus may further include a semiconductor processing chamber, a showerhead, and a wafer support. In such implementations, the showerhead may be positioned above the wafer support within the semiconductor processing chamber, and the wafer support may have a circular wafer support area of ​​diameter D configured to support a semiconductor wafer having a nominal diameter D, and the showerhead faceplate may be installed within the showerhead such that a second side of the showerhead faceplate faces the wafer support, and there should be no structure between the showerhead faceplate and at least 90% of the wafer support area.

[0033] In some such implementations, the device may include a gas distribution plate located inside a showerhead, having an outlet port configured to supply a processing gas to a gas distribution passage.

[0034] The following discussion will refer to the following figure, which is not intended to limit the scope but is provided simply to facilitate the discussion. [Brief explanation of the drawing]

[0035] [Figure 1] A simplified diagram of an example semiconductor processing unit is shown.

[0036] [Figure 2] A simplified diagram of another example of a semiconductor processing device is shown.

[0037] [Figure 3] This shows a cross-sectional view of the plan view of an example showerhead.

[0038] [Figure 4] This shows a partial cross-sectional view of a showerhead faceplate installed in an example of a semiconductor processing unit.

[0039] [Figure 5] An isometric view of an example of a shower head faceplate is shown. [Figure 6] An example of a shower head faceplate is shown in the top view. [Figure 7] This shows a side cross-sectional view of an example of a shower head faceplate.

[0040] [Figure 8] Figure 5 shows an isometric view of an example of a shower head faceplate similar to the shower head faceplate in Figure 5, but with a contoured lower section. [Figure 9] Figure 6 shows a top view of an example of a shower head faceplate, similar to the shower head faceplate in Figure 6, but with a contoured lower section. [Figure 10] Figure 7 shows a side cross-sectional view of an example of a shower head faceplate, similar to the shower head faceplate in Figure 7, but with a contoured lower section.

[0041] [Figure 11] An isometric view of another example of a showerhead faceplate is shown. [Figure 12] A top view of another example of a showerhead faceplate is shown. [Figure 13] A side cross-sectional view of another example of a showerhead faceplate is shown.

[0042] [Figure 14] This is an isometric view of an example of a shower head faceplate similar to the one in Figure 11, but with a contoured lower section. [Figure 15] Figure 12 shows a top view of an example of a shower head faceplate, similar to the shower head faceplate in Figure 12, but with a contoured lower section. [Figure 16] Figure 13 shows a side cross-sectional view of an example of a shower head faceplate, similar to the shower head faceplate shown in Figure 13, but with a contoured lower section.

[0043] [Figure 17]This shows a partial cross-sectional view of another example of a showerhead faceplate installed in an example of a semiconductor processing unit.

[0044] [Figure 18] An isometric view of another example of a showerhead faceplate is shown. [Figure 19] A top view of another example of a showerhead faceplate is shown. [Figure 20] A side cross-sectional view of another example of a showerhead faceplate is shown.

[0045] [Figure 21] This is an isometric view of an example of a shower head faceplate similar to the one in Figure 18, but with a contoured lower section. [Figure 22] Figure 19 shows a top view of an example of a shower head faceplate, similar to the shower head faceplate in Figure 19, but with a contoured lower section. [Figure 23] Figure 20 shows a side cross-sectional view of an example of a shower head faceplate, similar to the shower head faceplate in Figure 20, but with a contoured lower section.

[0046] [Figure 24] This shows a cross-sectional view of another example of a showerhead faceplate installed in a semiconductor processing unit.

[0047] [Figure 25] This shows a cross-sectional view of a portion of another example of a showerhead faceplate installed in an example of a semiconductor processing unit.

[0048] [Figure 26] This shows a cross-sectional view of a portion of another example of a showerhead faceplate installed in an example of a semiconductor processing unit.

[0049] [Figure 27]This shows a cross-sectional view of another example of a showerhead faceplate installed in a semiconductor processing unit.

[0050] [Figure 28] This shows a partial cross-sectional view of an example of an additional showerhead faceplate installed in a semiconductor processing unit.

[0051] [Figure 29] This shows a partial cross-sectional view of another example of a showerhead faceplate installed in an example of a semiconductor processing unit. [Modes for carrying out the invention]

[0052] Examples of various embodiments are illustrated in the accompanying drawings and further described below. It will be understood that the discussion herein is not intended to limit the claims to the specific embodiments described. Rather, it is intended to include alternative forms, modifications, and equivalent forms that may be included within the spirit and scope of the invention as defined by the accompanying claims. The following description provides numerous specific details to enable a full understanding of the invention. The invention may be carried out without including some or all of these specific details. In other examples, well-known processing operations are not described in detail to avoid unnecessarily obscuring the invention.

[0053] Figure 1 shows a simplified diagram of an example of a semiconductor processing apparatus. Figure 1 shows apparatus 100 including a semiconductor processing chamber 102 having a wafer support 104 and a showerhead 110 located inside. Figure 1 shows only half of the various structures depicted in apparatus 100, and it will be recognized that the other half may be similar in appearance, though not necessarily so. To illustrate this general symmetry, a central axis 138 is shown in Figure 1, and a portion of the apparatus to the left of the central axis 138 is omitted. The wafer support 104 has a wafer support area 106 that may be used to support a wafer 108 inside the semiconductor processing chamber 102 during wafer processing operations. As shown in Figure 1, the wafer support 104 is positioned below the showerhead 110 so that the processing gas flowing through the showerhead 110 flows onto the wafer 108 and over the entire surface of the wafer 108, as indicated by the dotted arrows.

[0054] The shower head 110 is a chandelier-type shower head with a stem-like portion 122 connected to a back plate 124. The back plate 124 has a number of holes through which threaded fasteners 120 are inserted. A ring-like circumferential wall 128 may be held to the back plate 124 using the threaded fasteners 120. The circumferential wall 128 may have circumferential shelf-like projections or other retaining structures around the inner outer circumference of the circumferential wall 128, which may engage with the shower head face plate 112 to support the shower head face plate 112. The circumferential wall 128 may also have an inner circumferential wall surface 130 that at least partially defines the internal volume of the shower head 110. It will be recognized that other shower head designs conceivable within the scope of this disclosure may utilize other circumferential wall structures, such as simply extensions of the back plate 124 and / or the shower head face plate 112, including circumferential walls in contact therewith.

[0055] The showerhead faceplate 112 may have multiple gas distribution passages 126 passing through it. While the illustrated showerhead faceplate has relatively inaccurate spacing between the gas distribution passages 126, it will be understood that there may be hundreds or thousands of such gas distribution passages 126 extending from a first side 132 of the showerhead faceplate 112 through the showerhead faceplate 112 to a second side 134 of the showerhead faceplate 112, which is exposed to and opposed by the wafer support 104 when the showerhead faceplate 112 is mounted on the showerhead 110. The first side 132 and the second side 134 may define an average central plane 136 between them. While one or both of the first side 132 and the second side 134 are shown in Figure 1 as essentially planar, it will be understood that in some implementations they may have a contour, or if not, a non-planar contour.

[0056] Average central plane 136, as used herein, may refer to a reference plane positioned and oriented such that the average and maximum distances between the average central plane and those planes are minimized for one or more surfaces. The average central plane of a component or part of a component should be understood as the average central plane defined by the principal plane of such component or part of a component, for example, the larger surface of such component or part of a component, excluding, for example, small holes or other minute features that do not significantly affect the overall shape of the component or part of a component. For example, in a filter, its average central plane is defined by the inner and outer surfaces of the bowl portion of the filter, but not by the inner surfaces of the hundreds or thousands of holes passing through the filter, nor by the surfaces of the grip portion of the filter (if any).

[0057] When the term "showerhead faceplate" is used herein, it should be understood that it refers to a structure that is part of a semiconductor processing showerhead and has a surface with an opening leading to a gas distribution passage, facing the wafer support when installed inside the showerhead within a semiconductor processing chamber. The showerhead faceplate is typically the component or element of the showerhead closest to the wafer being processed in such a semiconductor processing chamber, and generally there is no other structure of the semiconductor processing chamber or tool between the showerhead faceplate and at least 90% of the wafer support area of ​​the wafer support positioned beneath it (at least, during normal wafer processing operations, the wafer handling robot may, of course, insert an end effector into this space during wafer loading / unloading operations, but these transient instances do not occur during wafer processing operations). The wafer that may be supported by the wafer support area is, of course, not actually a component or structure of the semiconductor processing chamber or tool. In practice, there is little to no structure of the semiconductor processing chamber or tool between the wafer support and the showerhead faceplate, although in some cases an edge ring may be used. The edge ring encircles the wafer and may overlap the thin annular outer region of the wafer (and consequently, the wafer support region). Generally speaking, this may result in some structure (the inner edge of the edge ring) placed between the showerhead faceplate and the wafer support region, with such overlap being well less than 10% of the wafer support region area.

[0058] In the apparatus 100 of Figure 1, the showerhead 110 also includes a gas distribution plate 114 that includes several gas distribution plate passages 118 that distribute the processed gas to a plurality of gas distribution ports 116 within the gas distribution plate 114 adjacent to the first side 132 of the showerhead faceplate 112. The gas distribution plate 114 may be designed to provide a predetermined gas flow distribution to a variety of gas distribution passages 126 made to suit a variety of desired processing conditions.

[0059] Figure 2 shows a simplified diagram of another example of a semiconductor processing apparatus. Apparatus 100 in Figure 2 is identical to apparatus 100 in Figure 1, except that it does not include a gas distribution plate 114 and therefore simply has an open inner plenum volume that works to provide processing gases delivered to the gas distribution passage 126 through a gas inlet in the stem portion 122.

[0060] Not only for the showerheads of the types shown in Figures 1 and 2, but also for embedded showerheads with similar internal designs, various types of angled gas distribution passages, or combinations of angled and non-angled (i.e., parallel to the central axis) gas distribution passages, as discussed below, may be used. Such showerheads may also, in some implementations, serve as electrodes in, for example, a charge-coupled plasma processing chamber.

[0061] Figure 3 shows a cross-sectional view of a plan view of an example showerhead, i.e., a view along the central axis 138. To make it clear, the showerhead 110 has an inner area 142 that is rounded by an outer area 144. The boundary 140 between the inner area 142 and the outer area 144 may coincide with the inner circumferential wall surface 130 of the circumferential wall 128.

[0062] In some embodiments, the showerhead faceplate 112 shown in Figures 1 and 2 is a showerhead faceplate in which all the gas distribution passages 126 inside the inner area 142 of the showerhead faceplate 112 are holes with a central axis parallel to the central axis 138. However, in some embodiments, a showerhead faceplate 112 featuring at least some gas distribution passages 126 extending at least partially along an axis at an angle to the central axis 138 may provide the ability to fine-tune or otherwise modify the gas flow out of such a showerhead faceplate 112 to suit the needs of various treatments. For example, a showerhead faceplate with angled gas distribution passages may allow a gas distribution plate developed for a particular treatment, such as the gas distribution plate 114 in Figure 1, to be used for another purpose in other treatments that benefit from the delivery of gas from at least some points on the underside of the showerhead faceplate that do not align with the location of the gas distribution ports of the gas distribution plate, such as the gas distribution port 116. By using angled gas distribution passages, it is possible to adapt a specific gas distribution plate design so that it can be used with a number of different faceplates. In some embodiments, the showerhead 110 may have gas distribution passages that terminate at different locations on the wafer-facing side of the showerhead faceplate 112, but at the same or nearly the same location on the gas distribution plate-facing side of the showerhead faceplate 112. This allows the gas distribution profile of each such showerhead to be modified or adjusted by positioning the gas distribution passage outlet holes, and does not necessarily require modifying the gas distribution plate 114 used with the showerhead to have gas distribution ports that match in the same location. This avoids the potential costs associated with developing, testing, and qualifying a new gas distribution plate or a new showerhead faceplate for each such showerhead.

[0063] One of a given showerhead faceplate 112 or a subset 126 of gas distribution passages may include such angled gas distribution passages or partially angled gas distribution passages 126. Each such subset may be contained within a corresponding annular area of ​​the showerhead faceplate 112, and in some cases, two or more subsets may be contained within a common annular area of ​​the showerhead faceplate 112. In other cases, the subset may include gas distribution passages 126 arranged within two or more annular areas, within which other gas distribution passages 126 are located.

[0064] Figure 4 shows a partial cross-sectional view of an example of a showerhead faceplate installed in an example of a semiconductor processing apparatus. In Figure 4, the showerhead 410 is shown on the wafer support 404 and the wafer 408. Only a portion of the showerhead 410 is shown, with a portion to the left of the central axis 438 omitted, as is a portion of the showerhead faceplate 412 located between the curved fracture lines. Generally, it will be understood that the portion of the showerhead faceplate 412 located between the fracture lines may also have a gas distribution passage 426 passing through it.

[0065] As can be seen in Figure 4, the showerhead faceplate 412 has a first side 432 and a second side 434, and gas distribution passages 426 and 426' may extend through the showerhead faceplate 412 from the first side 432 to the second side 434. The circumferential wall surface 430 of the circumferential wall 428 serves to define the inner area of ​​the showerhead faceplate 412 in which the gas distribution passages 426 and 426' may be located.

[0066] As can be seen from Figure 4, the gas distribution passage 426 closest to the central axis 438 of the shower head faceplate 412 is a hole with a central axis parallel to the central axis 438, i.e., without an angle. However, the gas distribution passage 426' furthest from the central axis 438 is a hole extending along an axis at an angle to the central axis 438. In this example, the gas distribution passages 426' furthest from the central axis 438 are angled such that the point where such gas distribution passages 426' intersect the first side 432 of the shower head faceplate 412 is closer to the central axis 438 than the point where those gas distribution passages 426' intersect the second side 434 of the shower head faceplate 412.

[0067] In some implementations similar to the implementation in Figure 4, the showerhead faceplate may have a first circular array of gas distribution passages, for example, extending along an axis oblique to the central axis. The gas distribution passages within the first circular pattern may extend at least partially along an axis at an angle between approximately 40° and 65° with respect to an axis parallel to the central axis, for example, between approximately 50° and 55°. In some implementations, these gas distribution passages may be angled such that the points where they intersect with a first side of the showerhead faceplate are closer to the central axis of the showerhead faceplate than the points where they intersect with a second side of the showerhead faceplate. In this specification, when we refer to a circular pattern, we will understand that we are referring to a nominal circular pattern, which includes both a perfect circular pattern (where items within the circular pattern are positioned to coincide with locations that are perfectly evenly spaced around the circumference of a circle) and a generally circular pattern (where the pattern may have items that deviate slightly from such a perfect circular pattern, for example, having a subset of items positioned at locations less than 1% to 2% of the diameter of the circular pattern from the positions of the "perfect" circular pattern).

[0068] Figures 5, 6, and 7 depict isometric, top, and side section views of an example of a showerhead faceplate such as the one described above, and it should be understood that the following discussion may refer to this example, but the examples shown are not limited to the following discussion. Figures 5, 6, and 7 show a showerhead faceplate 512 having a first side 532 and a second side 534 (which typically faces the wafer being processed when the showerhead faceplate 512 is in active use). The showerhead faceplate 512 includes several gas distribution passages 526, including obliquely angled gas distribution passages 526' arranged in a circular pattern around the central axis 538 of the showerhead faceplate 512, extending between the first side 532 and the second side 524.

[0069] In some implementations, there may also be a number of additional concentric circular patterns of gas distribution passages similarly arranged around the central axis 538 of the showerhead faceplate. For example, there may be additional concentric circular patterns such as 5, 6, 7, 8, 9, 10 of gas distribution passages extending through the showerhead faceplate. In some examples, some of the circular patterns of gas distribution passages may be circular patterns of much smaller circular patterns of gas distribution passages, for example, small circular patterns of gas distribution passages (such as 0.1 inches to 0.5 inches (2.54 mm to 12.7 mm) in diameter) may themselves be arranged within one or more concentric circular patterns. For example, the showerhead faceplate 512 contains a total of seven concentric circular patterns of gas distribution passages (including a first circular pattern containing the angled gas distribution passage 526'). The innermost circular pattern of gas distribution passages shown in Figures 5 and 6 is actually a circular pattern of small clusters of gas distribution passages 526', and that cluster is also arranged within each such cluster in smaller circular patterns.

[0070] Generally speaking, small clusters of gas distribution passages, such as those discussed above, may be used in place of a single gas distribution passage, or in any arrangement of gas distribution passages discussed herein. For example, any circular pattern of gas distribution passages may also be implemented as a circular pattern of clusters of gas distribution passages. Moreover, such clusters may consist of all oblique gas distribution passages, all non-oblique passages (i.e., extending along an axis parallel to the central axis), or a mixture of both.

[0071] In Figures 5 to 7, the first circular pattern of the gas distribution passage 526' is located between the outermost (non-oblique) circular pattern of the gas distribution passage 526 and the second circular pattern of the gas distribution passage 526, which is radially inward from the outermost circular pattern of the gas distribution passage 526.

[0072] In some such implementations, there may be seven additional concentric patterns of gas distribution passages, the innermost concentric pattern containing, in some examples, a subset of gas distribution passages arranged in much smaller circular patterns (the center of each smaller circular pattern centering in the location of the larger concentric circular pattern). Some or all of the gas distribution passages within such additional concentric circular patterns of the gas distribution passage may extend along an axis parallel to the central axis of the showerhead faceplate. In some other such implementations, each circular pattern of the gas distribution passage may have 6 to 14, and in some cases 8 to 12, additional gas distribution passages within each circular pattern, compared to the number of gas distribution passages in the next smallest diameter circular pattern (or, in the case of the innermost circular pattern, several sets of gas distribution passages). Such additional concentric circular patterns may have a larger diameter than the diameter of the circular patterns of the multiple sets of gas distribution passages. For example, each circular pattern may have a radius that is generally about 0.5 inches to 1 inch (about 12.7 mm to 25.4 mm) larger than the radius of the next nearest smaller circular pattern (with respect to where the gas distribution passage intersects the first side of the showerhead faceplate). In such a configuration, the gas distribution passages may have a diameter of, for example, about 0.02 inches to 0.04 inches (0.508 mm to 1.016 mm).

[0073] In some such implementations, the radial spacing between the circular pattern of the angled gas distribution passage and one or more adjacent circular patterns of the gas distribution passage may be greater or smaller than those discussed above. For example, in some implementations, the first circular pattern of the angled gas distribution passage may be positioned radially between two other circular patterns of the gas distribution passage, and the gas distribution passage of the first circular pattern intersects the first side of the showerhead faceplate at a location within the circular pattern having a radius in the range of 0.1 inches to 0.2 inches (2.54 mm to 5.08 mm) of the radius of the nearest circular pattern inside the first circular pattern. In some other such implementations, the other circular pattern of the gas distribution passage, which is radially outward from the first circular pattern and radially close to the first circular pattern, may be positioned radially outward from the first circular pattern such that all locations where the gas distribution passage intersects the first and second sides of the showerhead faceplate are entirely between two circular patterns radially close to the first circular pattern. When the term “radially adjacent” is used herein in relation to a concentric circular pattern or concentric circles, it refers to two of a particular type of item or feature (such as a circular pattern) that are concentrically arranged and do not have other examples of that item or feature in between. As a result, in a set of five concentric rings, the third ring is radially adjacent to the second and fourth rings, but not to the first and fifth rings.

[0074] In some implementations, showerhead faceplates, as shown in Figures 5-7, may be provided to increase the residence time of the processing gas along the outer circumference of the wafer being processed. For example, the showerhead faceplates in Figures 5-7 may be used with a gas distribution plate (not shown, see, for example, Figure 1) that uses a zoning approach, having, for example, a distribution port for using a first gas to deliver gas under a first flow condition inside a circular area, and a second gas distribution port for delivering gas under a second flow condition outside the circular area. Such a gas distribution plate may have, for example, two rings for the second gas distribution port and multiple rings for the first gas distribution port. The two rings for the second gas distribution port may typically be used within the showerhead faceplate to supply gas to two corresponding outer rings of a gas distribution passage under a second flow condition. Similarly, the multiple rings for the first gas distribution port may typically be used within such a showerhead faceplate to supply gas to the corresponding inner rings of a gas distribution passage under a first flow condition.

[0075] Referring to the showerhead faceplates of Figures 5 to 7, in some embodiments, an angled gas distribution passage 526' within a first circular pattern may be used to deliver gas from the outermost ring of the first gas distribution port of the zoned gas distribution plate disclosed above, so that the gas is directed outwards from the underside of the showerhead faceplate at a location outside the circular area. For example, in Figures 5 to 7, the circular area contains a hole in which the angled gas distribution passage 526' intersects with the first side 532. As a result, the outermost ring of the first gas distribution port supplies gas under first flow conditions to two concentric rings of gas distribution passages, namely the gas distribution passage 526' of the showerhead faceplate 512 and the ring of the gas distribution passage 526 immediately radially inward from there. Simultaneously, the two rings of the second gas distribution port supply gas under the second flow condition to only the single outer ring of the gas distribution passage 526 of the showerhead faceplate 512, i.e., to the outermost ring of the gas distribution passage 526. Such an arrangement may guide more gas closer to the wafer edge than can be achieved with a showerhead faceplate having only a non-angled vertical gas distribution passage corresponding to the location of the gas distribution port on the gas distribution plate, and such gas may remain embedded across the entire wafer edge (for example, positioned almost directly below the outermost ring of the gas distribution passage 526). As a result, the showerhead faceplates of Figures 5–7 may provide increased uniformity at the wafer edge compared to a non-angled distribution showerhead faceplate used with the same gas distribution plate.

[0076] Figures 8, 9, and 10 show isometric, top, and side cross-sectional views of an example of a showerhead faceplate similar to those in Figures 5, 6, and 7, but with a contoured underside. The contoured underside of the showerhead faceplate may be configured to correct the plasma distribution of the plasma that may be directly beneath the showerhead faceplate. For example, the showerhead faceplate may act as an electrode in the plasma generation situation, and the contour of the showerhead faceplate may facilitate enhanced plasma stability and reduced non-uniformity in wafer processing performed using the showerhead faceplate.

[0077] For example, as shown in Figures 8, 9, and 10, the lower surface of the showerhead faceplate 512 may be curved (for example, convex) in the central area and concave in the outer area. In other words, the lower surface may transition from a circular convex central area to an annular concave outer area, and the thickness may change in both the central and concave areas. For example, the lower surface may be contoured such that the thickness or distance between the upper and lower surfaces of the showerhead faceplate 512 decreases in a curved manner from the center of the showerhead faceplate 512 into the outer area of ​​the showerhead faceplate 512. The lower surface may be further contoured such that the thickness or distance between the upper and lower surfaces of the showerhead faceplate 512 increases in a curved manner in the outer area of ​​the showerhead faceplate 512 before it begins to decrease again near the outer circumference of the showerhead faceplate 512 or begins to remain flat.

[0078] In some additional such implementations, there may be a number of concentric circular patterns of gas distribution passages extending along an axis oblique to the central axis of the showerhead faceplate. For example, in some implementations, the first circular pattern may be the next outermost circular pattern of gas distribution passages within the showerhead faceplate, and the showerhead faceplate may include a second circular pattern, which is the outermost circular pattern of gas distribution passages, radially adjacent to the first circular pattern. Both the first and second circular patterns may include gas distribution passages that extend at least partially along an axis oblique to an axis parallel to the central axis of the showerhead faceplate, such that, for example, the location where each such gas distribution passage intersects the first side is closer to the central axis of the showerhead faceplate than the location where those same gas distribution passages intersect the second side of the showerhead faceplate.

[0079] Figures 11, 12, and 13 show isometric, top, and side section views of another example of a showerhead faceplate having two circular patterns of obliquely angled gas distribution passages. It can be assumed that the showerhead faceplate 1112 in Figures 11-13 is similar to the showerhead faceplate 512, and that the features indicated by the callout having the same last two digits as the corresponding callout in Figures 5-7 are similar to the features in Figures 5-7 having the same last two digits. Accordingly, the foregoing description of such similar elements relating to Figures 5-7 is also applicable to such similars in this case unless it is particularly evident to show otherwise. In Figures 11-13, the outermost circular pattern of the gas distribution passage 1126' is the second circular pattern, and the circular pattern of the gas distribution passage 1126' immediately radially inside the second circular pattern is the first circular pattern.

[0080] In some such implementations, there may be additional concentric circular patterns of gas distribution passages located inside the first circular pattern, i.e., having a diameter smaller than the diameter of the first circular pattern. Such additional concentric circular patterns may be spaced apart radially, for example, similar to those discussed above. One or more of the gas distribution passages inside these additional concentric circular patterns inside the first circular pattern, and in at least one example all of these gas distribution passages, may extend along an axis parallel to the central axis of the showerhead faceplate. In some implementations, there may be a circular area 1111 where the gas distribution passages of the first circular pattern are entirely inside the circular area, and the gas distribution passages of the second circular pattern are entirely outside the circular area 1111.

[0081] Figures 14, 15, and 16 show isometric, top, and side section views of an example of a shower head faceplate similar to those in Figures 11, 12, and 13, but with a contoured lower section.

[0082] Figure 17 shows an alternative arrangement, and Figure 17 shows a cross-sectional view of a portion of another example of a showerhead faceplate installed in an example of a semiconductor processing apparatus. Many of the various elements shown in Figure 17 (and the other remaining figures) are similar to those shown in Figure 4, and the same reference numbers with the same last two digits are used to indicate such similar elements in Figure 17 (and the other remaining figures). The reader is expected to refer to the above discussion regarding Figure 4 for a discussion of such elements, and for the sake of brevity, such elements will not be described in more detail below unless necessary in context.

[0083] As can be seen from Figure 17, the gas distribution passage 1726 furthest from the central axis 1738 of the shower head faceplate 1712 is a hole with a central axis parallel to the central axis 1738. However, the gas distribution passage 1726' closest to the central axis 1738 is a hole extending along an axis oblique to the central axis 1738. In this example, the gas distribution passages 1726' closest to the central axis 1738 are angled such that the point where such gas distribution passages 1726' intersect the first side 1732 of the shower head faceplate 1712 is further from the central axis 1738 than the point where those gas distribution passages 1726' intersect the second side 1734 of the shower head faceplate 1712.

[0084] Such an arrangement may increase the flow velocity of the gas induced through the angled gas distribution passage 1726' across the entire wafer in a radially inward direction relative to the central axis 1738, compared to the gas flow obtained from the non-angled gas distribution passage 1726. This may result in such gas having a longer residence time across the entire wafer and moving first toward the center of the wafer before moving toward the outer edge of the wafer.

[0085] In some implementations similar to the implementation shown in Figure 17, the showerhead faceplate may have, for example, a circular pattern of multiple sets of multiple gas distribution passages, where at least one of the gas distribution passages in each set extends along an axis oblique to the central axis.

[0086] Figures 18, 19, and 20 show isometric, top, and side section views of another example of a showerhead faceplate having such an arrangement of gas distribution passages. It may be assumed that the showerhead faceplate 1812 in Figures 18-20 is similar to the showerhead faceplate 512, and that the features indicated by the callout having the same last two digits as the corresponding callouts in Figures 5-7 are similar to the features in Figures 5-7 having the same last two digits. Accordingly, the foregoing description of such similar elements relating to Figures 5-7 is also applicable to such similars in this case unless it is particularly evident to show otherwise.

[0087] Such circular arrays may have nominal diameters between, for example, 1 inch and 2 inches (25.4 mm and 50.8 mm), or between approximately 1.3 inches and 1.4 inches (approximately 33.02 mm and 35.56 mm). Each set of gas distribution passages may have three sets of three gas distribution passages arranged to form a triangular pattern where the three gas distribution passages intersect with the first side of the showerhead faceplate, with a 3-item circular array diameter between, for example, 0.1 inches and 0.25 inches (2.54 mm and 6.35 mm), or between approximately 0.15 inches (3.81 mm) or 0.2 inches (5.08 mm). In some examples, the number of gas distribution passages in each set of gas distribution passages may be four or more, for example, 4, 5, 6, etc. In some examples, each of several sets of gas distribution passages may include at least two gas distribution passages extending through the showerhead faceplate along a direction substantially parallel to the central axis, and one or more of the remaining gas distribution passages in each such set extend at least in part along one or more axes at one or more angles relative to the central axis or an axis parallel to the central axis. In Figures 18–20, in each set of three gas distribution passages shown by the innermost circular pattern of gas distribution passages, the gas distribution passage 1826' is angled, while the other two gas distribution passages 1826 in each such set are not angled.

[0088] For example, in some such implementations, the angled gas distribution passages in each pair of gas distribution passages may be at an inward angle of, for example, 30°, between approximately 20° and 40° with respect to an axis parallel to the central axis of the showerhead faceplate, and as a result, such gas distribution passages are closer to the central axis of the showerhead faceplate when exiting the second side of the showerhead faceplate (opposite the first side of the showerhead faceplate) than when exiting the first side of the showerhead faceplate. In some such implementations, there may also be a number of additional concentric circular patterns of gas distribution passages similarly arranged around the central axis of the showerhead faceplate. For example, there may be additional concentric circular patterns such as 5, 6, 7, 8, 9, 10 of gas distribution passages extending through the showerhead faceplate. In some such implementations, there may be seven additional concentric patterns of gas distribution passages. In some other such implementations, each circular pattern of gas distribution passages may have between 6 and 14, or in some cases between 8 and 12, additional gas distribution passages within the circular pattern, compared to the number of gas distribution passages in the next smallest diameter circular pattern (or, with respect to the innermost circular pattern, several sets of gas distribution passages). Such additional concentric circular patterns may have a larger diameter than the diameter of the circular pattern of multiple sets of gas distribution passages, for example, each circular pattern may have a radius about 0.5 inches to 1 inch (about 12.7 mm to 25.4 mm) larger than the radius of the next nearest smaller circular pattern (with respect to where the gas distribution passages intersect the first side of the showerhead faceplate). In such implementations, the gas distribution passages may have a diameter of, for example, about 0.02 inches to 0.04 inches (0.508 mm to 1.016 mm).

[0089] As shown in Figures 18-20, a showerhead faceplate having, for example, an angled gas distribution passage near the center of the showerhead faceplate may provide enhanced wafer uniformity near the center of the wafer. For example, in some examples, a hole or opening near the center of the showerhead faceplate may inevitably increase the risk of hollow cathode discharge events due to increased radio frequency energy near the center of the showerhead faceplate, so it may be desirable to avoid having a gas distribution passage exiting the showerhead faceplate near the center of the showerhead faceplate. However, omitting the gas distribution passage from the center of the showerhead faceplate may create a dead zone at the center of the wafer, resulting in poor gas delivery and consequently causing wafer non-uniformity. Using a gas distribution passage such as an angled gas distribution passage 1826' to guide the gas to both radially inward locations and locations closer to the wafer center (but not close enough to pose a risk of hollow cathode discharge) may help ensure proper delivery of the processing gas to the center of the wafer. For example, the combination of the gas delivery point being closer to the center of the wafer and the velocity vector of the gas flow from the gas distribution passage 1826' being radially inward may work to increase the gas flow to the very center of the wafer during processing, thereby reducing non-uniformity at the wafer center.

[0090] Figures 21, 22, and 23 show isometric, top, and side section views of an example of a shower head faceplate similar to those in Figures 18, 19, and 20, but with a contoured lower section.

[0091] It will also be recognized that the arrangements shown in Figures 4 and 17 may include arrangements in which multiple concentric patterns of angled gas distribution passages exist, for example, concentric rings such as 2, 3, and 4 of such angled gas distribution passages. In some extreme cases, all gas distribution passages may be angled in one of the illustrated orientations, for example, angled radially inward (as shown in Figure 17) or angled radially outward (as shown in Figure 4). Furthermore, it will also be recognized that additional arrangements of angled gas distribution passages may be used in some mounting configurations in which radially inward angled gas distribution passages may be located furthest from the central axis of the showerhead faceplate, or in some mounting configurations in which radially outward angled gas distribution passages may be located closest to the central axis of the showerhead faceplate.

[0092] For clarity, a reference to a radially inward-angled gas distribution passage or portion thereof should be understood as referring to a gas distribution passage or portion thereof that extends along an axis that increases in distance from the first side of the shower head faceplate and decreases in distance from the second side of the shower head faceplate, thus moving closer to the central axis of the shower head faceplate. Conversely, a reference to a radially outward-angled gas distribution passage or portion thereof should be understood as referring to a gas distribution passage or portion thereof that extends along an axis that increases in distance from the first side of the shower head faceplate and decreases in distance from the second side of the shower head faceplate, thus moving further away from the central axis of the shower head faceplate.

[0093] It will be further recognized that in some implementations, there may be multiple annular regions of the showerhead faceplate, each featuring an angled gas distribution passage angled at different angles with respect to the central axis of the showerhead faceplate. For example, there may be a first annular region with a gas distribution passage extending along an axis at angle X with respect to the central axis of the showerhead faceplate, and a second annular region surrounding the first annular region and having a gas distribution passage extending along an axis at angle Y with respect to the central axis of the showerhead faceplate, where X and Y are different.

[0094] Figure 24 shows a partial cross-sectional view of yet another example of a showerhead faceplate installed in an example of a semiconductor processing apparatus. The showerhead faceplate 2412 in Figure 24 is similar to the showerhead faceplate shown in Figure 4, and a subset of angled gas distribution passages 2426' (shown in this figure with dashed lines to indicate that the angled gas distribution passages 2426' are "behind" the non-angled gas distribution passages 2426) is located near the outer edge, close to the boundary between the circumferential region and the inner region of the showerhead faceplate 2412 (as defined by the inner circumferential wall surface 2430). However, the showerhead faceplate 2412 also has another subset of non-angled gas distribution passages 2426 located in generally the same locations, for example, along the same circular path but between the locations where the gas distribution passages 2426' are located. As a result, the outermost ring of gas distribution passages may feature, for example, alternating gas distribution passages 2426 and 2426' around the circumference.

[0095] Figure 25 shows a partial cross-sectional view of another example of a showerhead faceplate installed in an example of a semiconductor processing unit. The arrangement in Figure 25 is similar to the arrangements in Figures 17 and 24, and is somewhat a hybrid of the arrangements in Figures 17 and 24, and features a gas distribution passage 2526' closest to the central axis 2538, arranged circumferentially between gas distribution passages 2526 that are angled radially inward and not angled with respect to the central axis 2538.

[0096] It will be recognized that the arrangements shown in Figures 24 and 25 may also include arrangements in which a number of concentric patterns of angled and non-angled gas distribution passages spaced around the circumference exist, for example, in which concentric rings such as 2, 3, and 4 of such angled and non-angled gas distribution passages spaced around the circumference exist. In some extreme cases, such angled and non-angled gas distribution passages spaced around the circumference (angled in any orientation shown, for example, angled radially inward (as shown in Figure 25) or angled radially outward (as shown in Figure 25)) may extend across the entire showerhead faceplate. Furthermore, it will be recognized that additional arrangements of angled and non-angled gas distribution passages spaced around the circumference may be used in several mounting configurations in which the circumferentially spaced angled and non-angled gas distribution passages, with angled passages radially inward, are positioned as far away from the central axis of the showerhead faceplate, or in several mounting configurations in which the circumferentially spaced angled and non-angled gas distribution passages, with angled passages radially outward, are positioned as close to the central axis of the showerhead faceplate.

[0097] It will be recognized that the arrangements shown in Figures 24 and 25 may also include arrangements in which there are multiple concentric patterns of angled gas distribution passages (and not necessarily including non-angled gas distribution passages) spaced circumferentially, extending along axes at different angles to the central axis of the showerhead faceplate, rather than along the same angle. For example, there may be two sets of angled gas distribution passages within a given annular area of ​​the showerhead faceplate, where one set of angled gas distribution passages is generally arranged circumferentially between the other set of angled gas distribution passages. However, the angled gas distribution passages within each set of angled gas distribution passages within that annular area may extend along axes at different oblique angles to the central axis of the showerhead faceplate.

[0098] Figure 26 shows a partial cross-sectional view of another example of a showerhead faceplate installed in an example of a semiconductor processing apparatus. In Figure 26, multiple gas distribution passages 2626 are arranged in a number of concentric patterns, and the gas distribution passages 2626 in the concentric pattern are angled radially inward at increasingly smaller angles with respect to the central axis 2638 as the diameter of each circular pattern of gas distribution passages 2626 increases. In other words, the angle between the central axis 2638 and the axis on which each circular pattern of gas distribution passages 2626 extends at least partially decreases in correlation with the increasing diameter of each circular pattern.

[0099] Such an arrangement may result in the gas flowing through the showerhead having a stronger flow bias toward the center of the wafer at the center of the showerhead faceplate, and a radially inward flow that is hardly biased toward the outer edge of the showerhead.

[0100] Figure 27 shows a partial cross-sectional view of yet another example of a showerhead faceplate installed in an example of a semiconductor processing apparatus. In Figure 27, multiple gas distribution passages 2726 are arranged in a number of concentric patterns, and the gas distribution passages 2726 in the concentric pattern are angled radially outward at an increasingly larger angle with respect to the central axis 2738 as the diameter of each circular pattern of gas distribution passages 2726 increases. In other words, the angle between the central axis 2738 and the axis on which the gas distribution passages 2726 in each circular pattern extend at least partially increases in correlation with the increasing diameter of each circular pattern.

[0101] Such an arrangement causes the gas flowing through the showerhead to have a stronger flow bias toward the outer edge of the wafer near the outer edge of the showerhead faceplate, and a flow that is hardly directed radially outward toward the center of the showerhead.

[0102] Similarly, it will be recognized that arrangements such as those in Figures 26 and 27 may also be merged with other arrangements. For example, a showerhead faceplate may have a first annular area in which flat gas distribution passages are provided, and a second annular area surrounding the first annular area in which the gas distribution passages are arranged in a number of concentric circular patterns, the gas distribution passages in the concentric pattern becoming radially outward at increasingly larger angles with respect to the central axis as the diameter of each circular pattern of gas distribution passages increases.

[0103] Figure 28 shows a partial cross-sectional view of an additional showerhead faceplate installed in an example of a semiconductor processing apparatus. In Figure 28, the gas distribution passage 2826' flows through a branching path 2862 through the showerhead faceplate. In this example, the gas distribution passage 2826' is characterized by multiple portions including an inlet portion 2868 and an outlet portion 2870. Each inlet portion 2868 may have a first end terminating at an inlet opening 2864 located on a first side 2832. Correspondingly, each outlet portion 2870 may have a first end terminating at a corresponding outlet opening 2866 located on a second side 2834. The inlet portion 2868 and outlet portion 2870 for a given gas distribution passage 2826' may also have second ends that are fluidly connected to each other inside the shower head faceplate 2812, thereby allowing the gas flowing through these gas distribution passages 2826' via the corresponding inlet opening 2864 to be divided into multiple gas flows exiting these gas distribution passages 2826' via the outlet opening 2866 of these gas distribution passages 2826'.

[0104] For the purposes of this disclosure, the term “fluidically connected” is used with respect to volumes, plenums, holes, etc., that may be connected to one another to form a fluid connection, similar to how the term “electrically connected” is used with respect to components that are connected together to form an electrical connection. The term “fluidically placed between” may be used, where used, to refer to a component, volume, plenum, or hole that is fluidly connected to at least two other components, volumes, plenums, or holes such that a fluid flowing from one of those components, volumes, plenums, or holes to the other or another of those components, volumes, plenums, or holes first flows through the “fluidically placed between” component before reaching the other or another of those components, volumes, plenums, or holes. For example, if a pump is fluidically placed between a reservoir and a discharge, the fluid flowing from the reservoir to the discharge will first flow through the pump before reaching the discharge.

[0105] In the implementation shown in Figure 28, the outlet portions 2870 are of equal length, which may provide generally equal flow resistance in each outlet portion 2870, resulting in generally equal distribution of flow between each outlet portion 2870. However, it will be recognized that other implementations may feature branching gas distribution passages where the outlet portions do not all have to be of the same length. This example may be understood in Figure 29, which shows a cross-sectional view of a portion of another example of a showerhead faceplate installed in an example of a semiconductor processing apparatus. Figure 29 shows a gas distribution passage 2926' featuring outlet portions 2970 of unequal length according to a branching path. As a result, outlet portions 2970 terminating at outlet openings 2966 located further from the central axis 2938 are longer than outlet portions 2970 terminating at outlet openings 2966 closer to the central axis 2838.

[0106] Such an arrangement may be configured such that gas is supplied in a single flow rate to an inlet opening 2964 of the shower head faceplate 2912, and then divided into gas flows with different flow rates through a number of outlet openings 2966 of the shower head faceplate 2912.

[0107] Furthermore, while a gas distribution passage following a branching path is shown as following a two-dimensional branching path in Figures 28 and 29, it will also be recognized that it may follow a three-dimensional branching path, for example, where there are three or four outlet portions radiating outward from a single inlet portion, and the branches of the branching path do not necessarily all reside in the same plane. It will also be recognized that a gas distribution passage following a branching path may feature inlet and outlet portions having different cross-sectional dimensions. For example, an inlet portion for a branching gas distribution passage may have a larger cross-sectional area than an outlet portion fluidly connected to the inlet portion, so that sufficient gas flow enters the inlet portion and, once divided, provides appropriate gas delivery through each of the outlet portions. In some implementations, one or more outlet portions for a given branching gas distribution passage may also have a different cross-sectional area from one or more other outlets of the branching gas distribution passage. For clarity, when referring to the cross-sectional area of ​​a gas distribution channel or a portion thereof, it should be understood that such a cross-sectional area refers to the cross-sectional area in the corresponding cross-sectional plane perpendicular to the path or axis through which the gas distribution channel or portion thereof extends.

[0108] Furthermore, while the gas distribution passages discussed herein may generally be essentially linear, for example, a hole extending through the showerhead faceplate along a linear axis, it will be recognized that some gas distribution passages may essentially follow non-linear paths. For example, a branching gas distribution passage will always follow at least one non-linear path because a branch exists within the path. However, it will also be understood that even non-branching gas distribution passages may follow non-linear paths. For example, in some gas distribution passages, the gas distribution passage may include an inlet portion and an outlet portion that are fluidly connected within the showerhead faceplate, however, the inlet portion and the outlet portion may extend along axes that are non-coincident and non-parallel to each other, for example, one axis may be parallel to the central axis of the showerhead faceplate and the other axis may be oblique to the central axis of the showerhead faceplate. Alternatively, both portions may extend along axes at different oblique angles to the central axis of the showerhead faceplate.

[0109] Furthermore, while the gas distribution passages discussed herein may typically be provided as holes with a circular cross-section, it will be further recognized that other cross-sectional shapes may be used as well. For example, when using electrical discharge machining (EDM) instead of conventional mechanical hole drilling, such as sinker EDM or high-speed hole drilling EDM, the resulting holes do not need to be constrained to a circular cross-section.

[0110] The showerhead faceplates discussed above include various mounting configurations shown as flat showerhead faceplates, where, for example, the bottom and top surfaces of the showerhead faceplate are planar. However, it should be understood that one or both of the top and / or bottom surfaces of such a showerhead faceplate may have a contoured surface, i.e., a non-planar side (for example, the showerhead faceplates in Figures 8-10, 14-16, or 21-23). ​​For example, in some mounting configurations, the bottom surface of such a showerhead faceplate (the surface facing the wafer during processing) may be contoured such that it is closest to the wafer at the center (during use), and then gradually tilts away from the wafer as the radial distance from the central axis of the showerhead faceplate increases.

[0111] If there are any order indicators, such as (a), (b), (c), ..., etc., it should be understood that in this disclosure and claims, they do not imply any particular order or sequence, except to the extent to which such order or sequence is explicitly indicated. For example, if there are three steps labeled (i), (ii), and (iii), it should be understood that these steps may be performed in any order (or even simultaneously, unless otherwise indicated as a contraindication). For example, if step (ii) involves handling an element created in step (i), it should be understood that step (ii) may be considered to have taken place at some point after step (i). Similarly, if step (i) involves handling an element created in step (ii), the reverse should be understood. Furthermore, it should be understood that the use of the order indicator "first" in this specification, for example "first item," should not be interpreted as implicitly or essentially suggesting the existence of a "second" instance, for example "second item."

[0112] When used herein, phrases such as "for each <item> in one or more <items>" or "each <item> in one or more <items>" should be understood to include both groups of single items and groups of multiple items; that is, "for each" is used in a programming language to refer to each item in any population of the items mentioned. For example, if the population of items mentioned is a single item, "each" refers only to that single item (despite the fact that the dictionary definition of "each" often defines a term referring to "any one of two or more things") and does not mean that there must be at least two of those items. Similarly, the terms "tuple" or "subset" should not be considered to necessarily include multiple items, and it should be understood that a tuple or subset can include only one member or many members (unless otherwise indicated in the context).

[0113] It should be recognized that all combinations of the aforementioned concepts (provided that such concepts are not mutually contradictory) are intended to be part of the subject matter of the invention disclosed herein. More specifically, all combinations of claimed subject matter appearing at the end of this disclosure are intended to be part of the subject matter of the invention disclosed herein. Furthermore, it should be recognized that any technical terms expressly adopted herein, which may also appear in any disclosure incorporated by reference, should be interpreted in a manner most consistent with the specific concepts disclosed herein.

[0114] While the above disclosure focuses on specific examples of one or more implementations, it should be understood that the disclosure is not limited to the examples discussed, but may also apply to similar variations and mechanisms, and that such similar variations and mechanisms are also considered to fall within the scope of this disclosure. The present invention can also be realized in the following embodiments, for example. Application Example 1: It is a device, A shower head faceplate having multiple gas distribution passages extending from a first side of the shower head faceplate to a second side of the shower head faceplate opposite to the first side. Equipped with, The first side and the second side define the average central plane of the shower head faceplate, The second side of the shower head faceplate is exposed to and faces a wafer support positioned inside the semiconductor processing chamber when the shower head faceplate is installed inside the semiconductor processing chamber as part of the shower head of the semiconductor processing chamber. The shower head faceplate has an inner area and an outer periphery area that surrounds the inner area when viewed along a central axis perpendicular to the average central plane. The boundary between the inner area and the outer area, when viewed along the central axis, coincides with the inner circumferential wall surface of the shower head when the shower head faceplate is installed in the semiconductor processing chamber as part of the shower head of the semiconductor processing chamber. The gas distribution passages in the first subset of the gas distribution passages among the plurality of gas distribution passages extend at least partially along an axis of a first oblique angle with respect to the central axis, The gas distribution passages in the first subset of the gas distribution passages are arranged in a device in which the entire gas distribution passages are located inside a first annular area inside the inner area. Application example 2: The apparatus of Application Example 1, The gas distribution passages in the first subset of the gas distribution passages are arranged in the outermost circular pattern of the multiple concentric circular patterns of the gas distribution passages. Each of the gas distribution passages in the first subset of the gas distribution passages intersects the first side of the shower head faceplate at a location closer to the central axis than where each of the gas distribution passages in the first subset of the gas distribution passages intersects the second side of the shower head faceplate, The apparatus wherein one or more of the circular patterns are circular patterns of gas distribution passages arranged inside the circular pattern having a first subset of the gas distribution passages inside, and each extends along a direction parallel to the central axis. Application Example 3: The apparatus of Application Example 1, The gas distribution passages in the first subset of the gas distribution passages are arranged in a circular pattern among a plurality of concentric circular patterns of gas distribution passages that are radially adjacent toward the outermost circular pattern. Each of the gas distribution passages in the first subset of the gas distribution passages intersects the first side of the shower head faceplate at a location closer to the central axis than where each of the gas distribution passages in the first subset of the gas distribution passages intersects the second side of the shower head faceplate, An apparatus comprising one or more circular patterns arranged within the circular pattern having a first subset of the gas distribution passages inside, wherein the circular patterns of the gas distribution passages extend along a direction parallel to the central axis. Application Example 4: The apparatus of application example 3, The outermost circular pattern of the gas distribution passage is the circular pattern of a second subset of the gas distribution passage. The gas distribution passage in the second subset of the gas distribution passage is a device that extends along a direction parallel to the central axis. Application Example 5: The apparatus of application example 3, The outermost circular pattern of the gas distribution passage is the circular pattern of a second subset of the gas distribution passage. A device wherein the gas distribution passages in the second subset of the gas distribution passages extend at least partially along an axis of a second oblique angle with respect to the central axis. Application example 6: The apparatus of application example 5, wherein the first angle and the second angle are the same. Application example 7: The apparatus of Application Example 1, The gas distribution passages in the first subset of the gas distribution passages are arranged in the innermost circular pattern of the gas distribution passages among the plurality of concentric circular patterns of the gas distribution passages. Each of the gas distribution passages in the first subset of the gas distribution passages intersects with the second side of the shower head faceplate at a location closer to the central axis than where each of the gas distribution passages in the first subset of the gas distribution passages intersects with the first side of the shower head faceplate, An apparatus in which one or more of the circular patterns are circular patterns of gas distribution passages located outside the range of the circular pattern having a first subset of the gas distribution passages inside, and each extends along a direction parallel to the central axis. Application Example 8: The apparatus of Application Example 7, wherein the innermost circular pattern of the gas distribution passage is a circular pattern of multiple clusters of gas distribution passages, and each cluster of gas distribution passages has one or more of the gas distribution passages in a first subset of the gas distribution passages. Application example 9: The apparatus of application example 7 or 8, wherein the gas distribution passage in the first subset of gas distribution passages is the gas distribution passage closest to the central axis. Application Example 10: The apparatus of Application Example 1, An additional subset of the gas distribution passages among the plurality of gas distribution passages extends at least partially along a second oblique axis with respect to the central axis, The first angle differs from the second angle, The gas distribution passages among the additional subset of the gas distribution passages are also devices located inside the first annular area. Application Example 11: The apparatus of Application Example 1, The additional subset of the gas distribution passages among the plurality of gas distribution passages extends at least partially along an axis parallel to the central axis, The gas distribution passages among the additional subset of the gas distribution passages are also devices located inside the first annular area. Application Example 12: The apparatus of Application Example 1, wherein the gas distribution passages in the first subset of the gas distribution passages are arranged in a plurality of concentric circular patterns. Application Example 13: An apparatus according to any one of Application Examples 1 to 12, wherein the angle between the central axis and the axis through which the gas distribution passages of each circular pattern extend at least partially is the same for each circular pattern. Application Example 14: An apparatus according to any one of Application Examples 1 to 12, wherein the angle between the central axis and the axis through which the gas distribution passages of each circular pattern extend at least partially increases as a function of the increasing diameter of each circular pattern. Application Example 15: An apparatus according to any one of Application Examples 1 to 12, wherein the angle between the central axis and the axis through which each of the circular patterns extends at least partially is reduced as a function of the increasing diameter of the circular pattern. Application Example 16: An apparatus according to any one of Application Examples 1 to 15, wherein each of the gas distribution passages in the first subset of the gas distribution passages follows a linear path through the showerhead faceplate. Application Example 17: An apparatus according to any one of Application Examples 1 to 15, wherein each of the gas distribution passages in the first subset of the gas distribution passages follows a non-linear path through the showerhead faceplate. Application Example 18: An apparatus according to any one of Application Examples 1 to 12, wherein each of the gas distribution passages in the first subset of the gas distribution passages has an inlet opening on the first side of the shower head faceplate and two or more outlet openings on the second side of the shower head faceplate, following a branching path through the shower head faceplate. Application Example 19: The apparatus of application example 18, Each of the branch paths for the gas distribution passage in the first subset of the gas distribution passage has a plurality of parts, including an inlet portion and a plurality of outlet portions. Each of the gas distribution passages in the first subset of the gas distribution passages has a first end that terminates at the inlet opening for the gas distribution passage, Each outlet portion of each gas distribution passage in the first subset of the gas distribution passage has a first end that terminates at one of the outlet openings for the gas distribution passage, Each of the gas distribution passages in the first subset of the gas distribution passages has a second end that is fluidly connected to each other inside the shower head faceplate. An apparatus in which at least two of the outlet portions of each gas distribution passage in the first subset of the gas distribution passages are of the same length. Application Example 20: The apparatus of application example 18, Each of the branch paths for the gas distribution passage in the first subset of the gas distribution passage has a plurality of parts, including an inlet portion and a plurality of outlet portions. Each of the gas distribution passages in the first subset of the gas distribution passages has a first end that terminates at the inlet opening for the gas distribution passage, Each of the outlet portions of each gas distribution passage in the first subset of the gas distribution passage has a first end that terminates at one of the outlet openings for the gas distribution passage, Each of the gas distribution passages in the first subset of the gas distribution passages has a plurality of second ends that are fluidly connected to one another inside the shower head faceplate. A device in which at least two of the outlet portions of each gas distribution passage in the first subset of the gas distribution passages are of different lengths. Application Example 21: Apparatus of application example 19 or 20, Of the first subset of the gas distribution passages, at least two of the outlet portions for each gas distribution passage have different cross-sectional areas within the corresponding cross-sectional plane. A device in which each of the aforementioned cross-sectional planes is perpendicular to a portion of the branching path following the corresponding discharge portion. Application Example 22: An apparatus according to any one of the application examples 19 to 21, Each of the gas distribution passages in the first subset of the gas distribution passages has a cross-sectional area in the corresponding cross-sectional plane that is different from the cross-sectional area of ​​one or more of the discharge portions for the gas distribution passage, A device in which each of the aforementioned cross-sectional planes is perpendicular to a portion of the branch path following the corresponding portion. Application Example 23: An apparatus according to any one of the application examples 1 to 22, The gas distribution passages in the second subset of the gas distribution passages among the plurality of gas distribution passages are located inside the second annular area inside the inner area. The first annular area is a different device from the second annular area. Application Example 24: Apparatus of Application Example 23, wherein the gas distribution passages in the second subset of the gas distribution passages extend along an axis parallel to the central axis. Application Example 25: Apparatus of application example 23 or 24, The second annular area has an internal boundary and an external boundary, The first annular area and the second annular area are concentric, The first annular area is a device located within the range of the internal boundary. Application Example 26: Apparatus of application example 23 or 24, The first annular area has an internal boundary and an external boundary, The first annular area and the second annular area are concentric, The second annular area is a device located within the range of the internal boundary. Application Example 27: An apparatus according to any one of Application Examples 23 to 26, wherein a plurality of concentric rings of the gas distribution passage are located inside a second subset of the gas distribution passage. Application Example 28: An apparatus according to any one of Application Examples 1 to 27, further comprising the semiconductor processing chamber, the shower head, and the wafer support, The shower head is positioned above the wafer support inside the semiconductor processing chamber. The wafer support has a circular wafer support area with a diameter D configured to support a semiconductor wafer having a nominal diameter D, The shower head faceplate is installed inside the shower head such that the second side of the shower head faceplate faces the wafer support. An apparatus in which no structure exists between the shower head faceplate and at least 90% of the wafer support area. Application Example 29: The apparatus of application example 28, further comprising a gas distribution plate disposed inside the shower head, having an outlet port configured to supply a processed gas to the gas distribution passage. Application Example 30: An apparatus according to any one of Application Examples 1 to 29, wherein the second side of the shower head faceplate has a profile that forms a non-planar contour. Application Example 31: It is a shower head, Gas distribution plate and A shower head face plate having a plurality of gas distribution passages extending from a first side of the shower head face plate to a second side of the shower head face plate opposite to the first side, The first side of the shower head faceplate faces the gas distribution plate, The second side of the shower head faceplate does not face the gas distribution plate when the shower head faceplate is installed in the semiconductor processing chamber. The shower head faceplate has an inner area and an outer area surrounding the inner area. The inner area of ​​the shower head faceplate includes a first subset of the plurality of gas distribution passages, The gas distribution passages in the first subset of the gas distribution passages extend at least partially along an oblique axis parallel to the central axis of the shower head faceplate, The outer area of ​​the shower head faceplate includes only the second subset of the plurality of gas distribution passages. The gas distribution passage in the second subset of the gas distribution passage is a shower head that extends along an axis parallel to the central axis of the shower head. Application Example 32: A shower head according to application example 31, wherein the second side of the shower head faceplate is contoured.

Claims

1. It is a device, A shower head faceplate having a plurality of gas distribution passages extending from a first side of the shower head faceplate to a second side of the shower head faceplate opposite to the first side. Equipped with, The first side and the second side define the average central plane of the shower head faceplate, The second side of the showerhead faceplate is configured to face a wafer support placed inside the semiconductor processing chamber and to be exposed to the plasma. The gas distribution passages in the first subset of the gas distribution passages among the plurality of gas distribution passages extend at least partially along a first oblique axis with respect to the central axis perpendicular to the average central plane of the shower head faceplate, The gas distribution passages in the second subset of the gas distribution passages among the plurality of gas distribution passages extend along a direction parallel to the central axis and are arranged in the outermost circular pattern of the gas distribution passages. The gas distribution passages in the first subset of the gas distribution passages are arranged in a first circular pattern of gas distribution passages that is smaller than the outermost circular pattern of the gas distribution passages and is located radially inward of the outermost circular pattern of the gas distribution passages. The apparatus wherein each gas distribution passage in the first subset of the gas distribution passages intersects the first side of the shower head faceplate at a location closer to the central axis than the location where the gas distribution passage intersects the second side of the shower head faceplate.

2. The apparatus according to claim 1, wherein each of the gas distribution passages in the first subset of the gas distribution passages follows a linear path between the first side of the shower head faceplate and the second side of the shower head faceplate.

3. The apparatus according to claim 1, An additional subset of the gas distribution passages among the plurality of gas distribution passages extends at least partially along a second oblique axis with respect to the central axis, The first angle differs from the second angle, The gas distribution passages among the additional subsets of the gas distribution passages are also devices located inside the outermost circular pattern of the gas distribution passages.

4. The apparatus according to claim 1, The additional subset of the gas distribution passages among the plurality of gas distribution passages extends at least partially along an axis parallel to the central axis, The gas distribution passage, among the additional subset of the gas distribution passage, is also a device located inside the outermost circular pattern of the gas distribution passage.

5. The apparatus according to claim 1, wherein the gas distribution passages in a first subset of the gas distribution passages are arranged in a plurality of concentric circular patterns.

6. The apparatus according to any one of claims 2 to 5, wherein the angle between the central axis and the axis through which the first subset of the gas distribution passages extends at least partially is the same.

7. The apparatus according to claim 5, wherein the angle between the central axis and the axis on which the first subset of the gas distribution passages extends at least partially is increasing as a function of the increasing diameter of each of the multiple concentric circular patterns.

8. An apparatus according to any one of claims 1 to 5, wherein each of the gas distribution passages in the first subset of the gas distribution passages follows a linear path through the shower head faceplate.

9. The apparatus according to any one of claims 1, 3, 4, and 5, wherein each of the gas distribution passages in a first subset of the gas distribution passages follows a non-linear path through the showerhead faceplate.

10. The apparatus according to claim 1, The apparatus wherein the first circular pattern is concentric with the outermost circular pattern.

11. The apparatus according to claim 1, A device in which multiple concentric rings of a gas distribution passage exist within a second subset of the gas distribution passage.

12. The apparatus according to claim 1, further comprising the semiconductor processing chamber, shower head, and wafer support, The shower head is positioned above the wafer support inside the semiconductor processing chamber. The wafer support has a circular wafer support area with a diameter D configured to support a semiconductor wafer having a nominal diameter D, The shower head faceplate is installed inside the shower head so that the second side of the shower head faceplate faces the wafer support. An apparatus in which no structure exists between the shower head faceplate and at least 90% of the wafer support area.

13. The apparatus according to claim 12, further comprising a gas distribution plate disposed inside the shower head, having an outlet port configured to supply a processed gas to the gas distribution passage.

14. A shower head faceplate having a plurality of gas distribution passages extending from a first side of the shower head faceplate to a second side of the shower head faceplate opposite to the first side. Equipped with, The first side and the second side define the average central plane of the shower head faceplate, The second side of the showerhead faceplate is configured to face a wafer support placed inside the semiconductor processing chamber and to be exposed to the plasma. The gas distribution passages in the first subset of the gas distribution passages among the plurality of gas distribution passages extend at least partially along a first oblique axis with respect to the central axis perpendicular to the average central plane of the shower head faceplate, The gas distribution passages in the first subset of the gas distribution passages are arranged in a first circular pattern of gas distribution passages. Each gas distribution passage in the first subset of the gas distribution passages intersects the first side of the shower head faceplate at a location closer to the central axis than where the gas distribution passage intersects the second side of the shower head faceplate, Each of the first subsets of the gas distribution passages has an inlet opening on the first side of the shower head face plate and two or more outlet openings on the second side of the shower head face plate, following a branching path through the shower head face plate. An apparatus wherein at least one of the outlet openings of each of the gas distribution passages in the first subset of gas distribution passages is further from the central axis than the inlet opening of that gas distribution passage.

15. The apparatus according to claim 14, Each of the branch paths for the gas distribution passage in the first subset of the gas distribution passage has a plurality of parts, including an inlet portion and a plurality of outlet portions. Each of the gas distribution passages in the first subset of the gas distribution passages has a first end that terminates at the inlet opening for that gas distribution passage. Each outlet portion of each gas distribution passage in the first subset of the gas distribution passage has a first end that terminates at one of the outlet openings for that gas distribution passage, Each of the gas distribution passages in the first subset of the gas distribution passages has a second end that is fluidly connected to each other inside the shower head faceplate. A device in which at least two of the outlet portions of each gas distribution passage in the first subset of the gas distribution passages are of the same length.

16. The apparatus according to claim 14, Each of the branch paths for the gas distribution passage in the first subset of the gas distribution passage has a plurality of parts, including an inlet portion and a plurality of outlet portions. Each of the gas distribution passages in the first subset of the gas distribution passages has a first end that terminates at the inlet opening for that gas distribution passage. Each of the outlet portions of each gas distribution passage in the first subset of the gas distribution passage has a first end that terminates at one of the outlet openings for that gas distribution passage, Each of the gas distribution passages in the first subset of the gas distribution passages has a plurality of second ends that are fluidly connected to each other inside the shower head faceplate. A device in which at least two of the outlet portions of each gas distribution passage in the first subset of the gas distribution passages are of different lengths.

17. The apparatus according to claim 16, Of the outlet portions of each gas distribution passage in the first subset of the gas distribution passages, at least two have different cross-sectional areas within the corresponding cross-sectional plane. A device in which each of the aforementioned cross-sectional planes is perpendicular to a portion of the branching path following the corresponding discharge portion.

18. The apparatus according to claim 17, Each of the gas distribution passages in the first subset of the gas distribution passages has a cross-sectional area in the corresponding cross-sectional plane that is different from the cross-sectional area of ​​one or more of the discharge portions for that gas distribution passage, A device in which each of the aforementioned cross-sectional planes is perpendicular to a portion of the branch path following the corresponding portion.

19. The apparatus according to any one of claims 1 to 9, The gas distribution passages in the first subset of the gas distribution passages are located inside the first annular region. The gas distribution passages in the second subset of the gas distribution passages among the plurality of gas distribution passages are located inside the second annular area. The first annular region is a different device from the second annular region.

20. The apparatus according to claim 19, wherein the gas distribution passage in the second subset of the gas distribution passage extends along an axis parallel to the central axis.

21. The apparatus according to claim 19, The second annular area has an internal boundary and an external boundary, The first annular region and the second annular region are concentric, The first annular area is a device located within the range of the internal boundary.

22. The apparatus according to claim 19, The first annular area has an internal boundary and an external boundary, The first annular region and the second annular region are concentric, The second annular area is a device located within the range of the internal boundary.

23. The apparatus according to claim 19, wherein a plurality of concentric rings of the gas distribution passage are located inside a second subset of the gas distribution passage.

24. The apparatus according to any one of claims 1 to 9, further comprising the semiconductor processing chamber, shower head, and wafer support, The shower head is positioned above the wafer support inside the semiconductor processing chamber. The wafer support has a circular wafer support area with a diameter D configured to support a semiconductor wafer having a nominal diameter D, The shower head faceplate is installed inside the shower head so that the second side of the shower head faceplate faces the wafer support. An apparatus in which no structure exists between the shower head faceplate and at least 90% of the wafer support area.

25. The apparatus according to claim 24, further comprising a gas distribution plate disposed inside the shower head, having an outlet port configured to supply a processed gas to the gas distribution passage.

26. The apparatus according to any one of claims 1 to 5 and 14 to 18, wherein the second side of the shower head faceplate has a profile that forms a non-planar contour.

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