Method for manufacturing oxide sintered bodies

The method for producing oxide sintered bodies using high-purity In, Ga, and Zn oxides with controlled manufacturing processes effectively reduces impurities, enhancing the performance of TFTs and sputtering targets by achieving low impurity levels and improved physical properties.

JP7873737B2Active Publication Date: 2026-06-12MITSUI MINING & SMELTING CO LTD
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Patent Information

Application Number
JP2024570664
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2023-08-01
Filing Date
2024-07-29
Publication Date
2026-06-12
Estimated Expiration
2044-07-29

AI Technical Summary

Technical Problem

Existing oxide sintered bodies contain high levels of impurities, which are not adequately addressed by current manufacturing methods, and stricter purity requirements are needed for advanced semiconductor applications.

Method used

A method involving the use of high-purity (6N or higher) oxides of In, Ga, and Zn as raw materials, combined with oxide grinding and mixing media free of impurities, ultrapure water as a dispersion medium, and specific casting and surface treatment processes to minimize impurity incorporation, particularly using dry ice blasting to remove surface contaminants.

Benefits of technology

The method significantly reduces impurity content in oxide sintered bodies, achieving a total impurity level of 10 ppm or less, enabling high-performance TFTs and sputtering targets with improved properties such as low bulk resistance and high relative density.

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Abstract

The method for producing an oxide sintered body according to the present invention uses, as a raw material, an oxide including two or more elements selected from In, Ga, and Zn, the method satisfying (a) to (c). (a) An oxide having a purity of 6N or more is used as the raw material. (b) The medium for pulverization and mixing is formed from an oxide including no element other than the elements selected as the raw material. (c) Slurry is obtained by using ultrapure water as a dispersion medium.
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