Salt, acid generator, resist composition, and method for producing resist patterns
The use of a specific acid generator salt in resist compositions enhances CD uniformity in resist patterns, addressing the uniformity challenges of existing technologies.
JP7878931B2Active Publication Date: 2026-06-23SUMITOMO CHEM CO LTD
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Patent Information
- Application Number
- JP2022084703
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2021-05-28
- Filing Date
- 2022-05-24
- Publication Date
- 2026-06-23
- Estimated Expiration
- 2042-05-24
AI Technical Summary
Technical Problem
Existing resist compositions do not achieve satisfactory CD uniformity in resist patterns.
Method used
A resist composition containing a specific acid generator salt represented by formula (I), which includes a sulfonate anion and a cation with varying substituents and linkages, is used to form resist patterns.
Benefits of technology
The resist composition enables the production of resist patterns with improved CD uniformity.
✦ Generated by Eureka AI based on patent content.
Abstract
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.SOLUTION: There are provided a salt represented by a formula (I), an acid generator, and a resist composition containing the same. [In the formula, R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group or a hydrocarbon group and A1 and A2 each represent a hydrocarbon group, provided that the hydrocarbon groups may have a substituent and -CH2- contained in the hydrocarbon groups may be substituted with -O-, -CO-, -S- or -SO2-; m1 represents an integer of 1-5, m2, m4, m5 and m8 represent integers of 0-5, and m7 represents an integer of 0-4, provided that 1≤m1+m7≤5 and 0≤m2+m8≤5; and AI- represents an organic anion.]SELECTED DRAWING: None
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