Shower head having a face plate with multiple plenums and a central gas distribution port
Patent Information
- Authority / Receiving Office
- KR · KR
- Patent Type
- Applications
- Current Assignee / Owner
- LAM RES CORP
- Filing Date
- 2024-11-13
- Publication Date
- 2026-07-21
AI Technical Summary
Conventional showerheads in semiconductor fabrication systems face issues with non-uniform gas distribution, particularly in the central region of the substrate, leading to depletion of process gases and contamination between multiple showerheads, due to complications arising from dual-plenum designs where inner gas inlets block outer inlets and central gas distribution ports are absent.
A dual-plenum showerhead design with center-fed plenums and isolated gas passages, featuring a first and second gas passage with respective inlets, and a face plate with distributed gas distribution ports, along with center-feeding plenums and columns to ensure uniform gas distribution and prevent contamination, using a carrier assembly for fixed positioning and annular gas curtains.
The design ensures uniform gas distribution across the substrate, preventing gas depletion and contamination, thereby enhancing processing consistency and efficiency in semiconductor fabrication.
Smart Images

Figure P1020267019705_ABST