Core-shell particle, composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, and method for producing core-shell particle

Abstract

Provided are: core-shell particles each having a core part and a shell part covering the surface of the core part, the core parts containing an infrared-absorbing organic pigment, the shell parts containing an inorganic material, and the core-shell particles satisfying condition 1; a method for producing the particles; a composition containing the particles; a film; an optical filter; a solid-state imaging element; an image display device; and an infrared sensor.　Condition 1: The core-shell particles in an amount of 0.01 parts by mass are immersed for one hour in 100 parts by mass of a solvent which is selected from o-dichlorobenzene, N-methyl-2-pyrrolidone, chloroform, cyclohexanone, dimethylacetamide, and carbon disulfide, and in which the amount of the infrared-absorbing organic pigment dissolved at 25°C is 0.1 g / L or more, and then the core-shell particles are recovered by a centrifugal sedimentation method, and the weight reduction rate thereof calculated from the formula is 10% or less. The weight reduction rate (%) =⎢1-(M2 / M1)⎢×100, wherein M1 is the mass of the core-shell particles before immersion in the solvent, and M2 is the mass of the core-shell particles after immersion in the solvent.

Description

Core-shell particles, composition, film, optical filter, solid-state imaging device, image display device, infrared sensor, and method for producing core-shell particles

[0001] The present invention relates to core-shell particles having an infrared-absorbing organic pigment as a core portion and a method for producing the same, and also to a composition, film, optical filter, solid-state imaging device, image display device, and infrared sensor each containing the core-shell particles.

[0002] Video cameras, digital still cameras, and mobile phones with camera functions use solid-state image sensors for color imaging, such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors). These solid-state image sensors use silicon photodiodes that are sensitive to infrared light in their light-receiving sections. For this reason, an infrared cut filter is sometimes used to correct visibility.

[0003] The infrared cut filter is produced using a composition containing an infrared absorber.

[0004] Patent Document 1 discloses a general formula WyOz (where W is tungsten, O is oxygen, 2.2≦z / y≦2.999) or / and a general formula MxWyOz (where M is H, He, alkali metal, alkaline earth metal, rare earth element, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Si, Ge, Sn, Pb, Sb, B, F, P, S, Se, Br, Te, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, The present invention relates to a surface-treated infrared-absorbing fine particle, the surface of which is coated with a coating film containing one or more elements selected from the group consisting of one or more elements selected from Bi, I, and Yb, W is tungsten, O is oxygen, and 0.001≦x / y≦1, 2.0≦z / y≦3.0), a hydrolysis product of a metal chelate compound, a polymer of a hydrolysis product of a metal chelate compound, a hydrolysis product of a metal cyclic oligomer compound, and a polymer of a hydrolysis product of a metal cyclic oligomer compound.

[0005] Japanese Patent Application Laid-Open No. 2020-117576

[0006] The longer the wavelength of absorption of an organic pigment, the narrower its band gap becomes, making it difficult for the pigment to achieve a HOMO (Highest Occupied Molecular Orbital)-LUMO (Lowest Unoccupied Molecular Orbital) level that allows for compatibility with various resistances (heat, light, radicals, oxidation, reduction, etc.). As a result, infrared-absorbing organic pigments tend to be easily decomposed by light irradiation or the influence of water, etc., and their spectral characteristics tend to deteriorate over time. For this reason, there is room for further improvement in the lightfastness and moisture resistance of infrared-absorbing organic pigments.

[0007] It should be noted that Patent Document 1 is an invention relating to surface-treated infrared-absorbing fine particles of a specific tungsten oxide, and does not describe or suggest anything about the light resistance or moisture resistance of infrared-absorbing organic pigments.

[0008] Therefore, an object of the present invention is to provide core-shell particles having excellent light resistance and moisture resistance. Another object of the present invention is to provide a composition, film, optical filter, solid-state imaging device, image display device, and infrared sensor containing the core-shell particles. Another object of the present invention is to provide a method for producing core-shell particles.

[0009] The present invention provides the following:

[0010] <1> Core-shell particles having a core portion and a shell portion covering the surface of the core portion, wherein the core portion contains an infrared absorbing organic pigment, and the shell portion contains an inorganic material, and the core-shell particles satisfy the following condition 1; condition 1: after immersing 0.01 part by mass of the core-shell particles for 1 hour in 100 parts by mass of a solvent selected from o-dichlorobenzene, N-methyl-2-pyrrolidone, chloroform, cyclohexanone, dimethylacetamide, and carbon disulfide, in which the solubility of the infrared absorbing organic pigment at 25°C is 0.1 g / L or more, the core-shell particles are recovered by centrifugal sedimentation, and the weight loss rate calculated by the following formula is 10% or less; weight loss rate (%)=|1−(M ２ / M １ ) | x 100 M １ is the mass of the core-shell particle before immersion in the solvent, and M２ is the mass of the core-shell particle after immersion in the solvent. <2> The core-shell particle according to <1>, wherein the shell portion is formed by atomic layer deposition. <3> The core-shell particle according to <1> or <2>, wherein the shell portion is an oxide or nitride containing an element selected from Si, Ti, Hf, Al, Zr, Ta, and Ru. <4> The core-shell particle according to any one of <1> to <3>, wherein the shell portion has a thickness of 1 to 20 nm. <5> The core-shell particle according to any one of <1> to <4>, wherein the infrared absorbing organic pigment is at least one selected from a pyrrolopyrrole compound, a squarylium compound, a croconium compound, a polymethine compound, an indigo compound, a phthalocyanine compound, a naphthalocyanine compound, a diiminium compound, a dithieno compound, a quinoid compound, and a rylene compound. <6> The core-shell particle according to any one of <1> to <5>, wherein the infrared absorbing organic pigment has an absorption maximum in a wavelength range of 800 to 2000 nm. <7> The core-shell particle according to any one of <1> to <6>, wherein the core-shell particle has an absorption maximum in a wavelength range of 800 to 2000 nm. <8> The core-shell particle according to any one of <1> to <7>, wherein the average particle size of the core-shell particle is 100 nm or less. <9> A composition comprising the core-shell particle according to any one of <1> to <8> and a solvent. <10> The composition according to <9>, further comprising a resin. <11> The composition according to <9> or <10>, further comprising a polymerizable compound and a photopolymerization initiator. <12> A film obtained using the composition according to any one of <9> to <11>. <13> An optical filter having a film according to <12>. <14> A solid-state imaging device having a film according to <12>. <15> An image display device having a film as defined in <12>. <16> An infrared sensor having a film as defined in <12>. <17> A method for producing core-shell particles having a core portion and a shell portion covering a surface of the core portion, comprising forming a film containing an inorganic material by atomic layer deposition on a surface of the core portion containing an infrared absorbing organic pigment to form the shell portion.

[0011] According to the present invention, it is possible to provide core-shell particles having excellent light resistance and moisture resistance. The present invention also provides a composition, film, optical filter, solid-state imaging device, image display device, and infrared sensor containing the core-shell particles. The present invention also provides a method for producing the core-shell particles.

[0012] FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor.

[0013] The present invention will be described in detail below. In this specification, the term "to" is used to mean that the numerical values ​​before and after the term are included as the lower and upper limits. In the description of groups (atomic groups) in this specification, a term without specifying whether it is substituted or unsubstituted encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only unsubstituted alkyl groups (unsubstituted alkyl groups) but also substituted alkyl groups (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light typified by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other actinic rays or radiation. As used herein, "(meth)acrylate" refers to either or both of acrylate and methacrylate, "(meth)acrylic" refers to either or both of acrylic and methacrylic, and "(meth)acryloyl" refers to either or both of acryloyl and methacryloyl. As used herein, weight-average molecular weight and number-average molecular weight are defined as polystyrene equivalent values ​​measured by gel permeation chromatography (GPC). As used herein, Me in chemical formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. As used herein, infrared light refers to light (electromagnetic waves) with a wavelength of 700 to 2500 nm. As used herein, total solids refers to the total mass of all components of a composition excluding the solvent. As used herein, the term "process" refers not only to an independent process, but also to a process that cannot be clearly distinguished from other processes, as long as the intended effect of the process is achieved.

[0014] <Core-shell particle> The core-shell particle of the present invention is a core-shell particle having a core portion and a shell portion covering the surface of the core portion, wherein the core portion contains an infrared absorbing organic pigment, and the shell portion contains an inorganic material, and is characterized in that the core-shell particle satisfies the following condition 1:

[0015] Condition 1: 0.01 part by mass of the core-shell particles is immersed for 1 hour in 100 parts by mass of a solvent selected from o-dichlorobenzene, N-methyl-2-pyrrolidone, chloroform, cyclohexanone, dimethylacetamide, and carbon disulfide, in which the solubility of the infrared absorbing organic pigment at 25°C is 0.1 g / L or more, and the core-shell particles are recovered by centrifugal sedimentation, and the weight loss rate calculated by the following formula is 10% or less; weight loss rate=|1−(M ２ / M １ ) | x 100 M １ is the mass of the core-shell particle before immersion in the solvent, and M ２ is the mass of the core-shell particle after immersion in the solvent.

[0016] The core-shell particles of the present invention satisfy the above-mentioned condition 1, and therefore the surface of the infrared absorbing organic pigment is tightly coated with a shell portion composed of an inorganic material. Therefore, the shell portion can efficiently suppress decomposition of the infrared absorbing organic pigment by radicals, water, and the like, and the core-shell particles can be made to have excellent light fastness and moisture resistance.

[0017] The weight loss rate in the above condition 1 is preferably 8% or less, more preferably 5% or less, even more preferably 3% or less, and particularly preferably 1% or less.

[0018] In the above condition 1, the "solvent in which the amount of the infrared absorbing organic pigment dissolved is 0.1 g / L or more" is preferably o-dichlorobenzene, N-methyl-2-pyrrolidone, chloroform, cyclohexanone, dimethylacetamide, or carbon disulfide.

[0019] In the above-mentioned condition 1, the core-shell particles can be recovered by a known centrifugal sedimentation method, such as a method using a tabletop ultracentrifuge (Optima Max-XP, manufactured by Beckman Coulter) at 25°C, 150,000 rpm, and 5 hours.

[0020] The average particle size of the core-shell particles is preferably 100 nm or less, more preferably 80 nm or less, and even more preferably 70 nm or less. The average particle size of the core-shell particles can be determined from a photograph obtained by observation using a transmission electron microscope (TEM). Specifically, the projected area of ​​the core-shell particles is determined, and the corresponding circle-equivalent diameter is calculated as the particle size of the core-shell particles. In this specification, the average particle size of the core-shell particles is the arithmetic mean value of the particle sizes of 100 core-shell particles.

[0021] The maximum absorption wavelength of the core-shell particles is preferably in the wavelength range of 700 to 2000 nm, more preferably in the wavelength range of 800 to 2000 nm, even more preferably in the wavelength range of 900 to 2000 nm, and even more preferably in the wavelength range of 1000 to 2000 nm. The maximum absorption wavelength of the core-shell particles can be evaluated by measuring the spectrum of a film in which the particles are dispersed. The composition of the film in which the core-shell particles are dispersed is not particularly limited, as long as the core-shell particles can exist in an undissolved state.

[0022] The fact that the particles are core-shell particles can be confirmed by combining elemental analysis with a scanning electron microscope (SEM) and sputtering to confirm the composition distribution in the depth direction of the particles. For example, when sputtering and elemental analysis are performed in combination, the signals derived from the elements in the shell portion decrease and the signals derived from the elements in the core portion increase, which indicates that the particles are core-shell particles.

[0023] -Core- The core of the core-shell particle contains an infrared absorbing organic pigment.

[0024] The absorption maximum wavelength of the infrared-absorbing organic pigment is preferably in the wavelength range of 700 to 2000 nm, more preferably in the wavelength range of 800 to 2000 nm, even more preferably in the wavelength range of 900 to 2000 nm, and even more preferably in the wavelength range of 1000 to 2000 nm. Infrared-absorbing organic pigments with absorption maximum wavelengths on the longer wavelength side generally tend to have poor light fastness and moisture fastness, so the effects of the present invention are more pronounced when an infrared-absorbing organic pigment with absorption maximum wavelengths on the longer wavelength side is used. The absorption maximum wavelength of the infrared-absorbing organic pigment can be measured in the same manner as the absorption maximum wavelength of the core-shell particles described above.

[0025] Examples of the infrared absorbing organic pigment include pyrrolopyrrole compounds, squarylium compounds, croconium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, naphthalocyanine compounds, diiminium compounds, dithieno compounds, quinoid compounds, and rylene compounds, and at least one selected from pyrrolopyrrole compounds, indigo compounds, squarylium compounds, croconium compounds, and polymethine compounds is preferred.

[0026] The pyrrolopyrrole compound includes a compound represented by formula (PP-1).

[0027] In the formula, Rp １ and Rp ２ Rp each independently represents an alkyl group, an aryl group, or a heteroaryl group; ３ ~RP ６ each independently represents a hydrogen atom or a substituent, ７ and Rp ８ are each independently -BRp １１ Rp １２ represents Rp １１ and Rp １２ each independently represents a substituent, １１ and Rp １２ may be bonded to each other to form a ring.

[0028] Rp １ and Rp２ The alkyl group, aryl group, and heteroaryl group represented by may have a substituent or may be unsubstituted. Examples of the substituent include the groups listed as the substituent T described later and the group represented by formula (R-100) described later.

[0029] In formula (PP-1), Rp １ and Rp ２ are each independently preferably an alkyl group or an aryl group, more preferably an aryl group.

[0030] Rp ３ ~RP ６ Examples of the substituent represented by the formula (I) include an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heteroaryloxycarbonyl group, an acyloxy group, an amino group, an acylamino group, an alkoxycarbonylamino group, an aryloxycarbonylamino group, a heteroaryloxycarbonylamino group, a sulfonylamino group, a sulfamoyl group, a carbamoyl group, an alkylthio group, an arylthio group, a heteroarylthio group, an alkylsulfonyl group, an arylsulfonyl group, a heteroarylsulfonyl group, an alkylsulfinyl group, an arylsulfinyl group, a heteroarylsulfinyl group, a ureido group, a phosphoric acid amide group, a mercapto group, a sulfo group, a carboxy group, a nitro group, a hydroxamic acid group, a sulfino group, a hydrazino group, an imino group, a silyl group, a hydroxy group, a halogen atom, and a cyano group.

[0031] Rp in formula (PP-) ３ and Rp ４ one of Rp is a heteroaryl group and the other is an electron-withdrawing group; ５ and Rp ６ Preferably, one of the groups is a heteroaryl group and the other is an electron-withdrawing group. The heteroaryl group may have a substituent. Examples of the substituent include the groups listed as the substituent T described below.

[0032] Here, a substituent with a positive Hammett σp value (sigma para value) acts as an electron-withdrawing group. In this specification, a substituent with a Hammett σp value of 0.2 or more can be exemplified as an electron-withdrawing group. The σp value is preferably 0.25 or more, more preferably 0.3 or more, and particularly preferably 0.35 or more. There is no particular upper limit, but it is preferably 0.80 or less. Specific examples of electron-withdrawing groups include a cyano group (0.66), a carboxy group (-COOH: 0.45), an alkoxycarbonyl group (for example, -COOCH ３ : 0.45), aryloxycarbonyl groups (e.g., —COOCH ３ : 0.44), carbamoyl group (e.g., —CONH ２ : 0.36), alkylcarbonyl groups (e.g., —COCH ３ : 0.50), arylcarbonyl groups (e.g., -COPh: 0.43), alkylsulfonyl groups (e.g., -SO ２ CH ３ : 0.72), arylsulfonyl groups (e.g., —SO ２ The electron-withdrawing group is preferably a cyano group, an alkylcarbonyl group, an alkylsulfonyl group, or an arylsulfonyl group, and more preferably a cyano group. ３ and Rp ４ One of the above, and Rp ５ and Rp ６ and (b) are each preferably a cyano group. Here, Ph represents a phenyl group. For the Hammett σp value, see paragraphs 0024 and 0025 of JP-A-2009-263614, the contents of which are incorporated herein by reference.

[0033] Rp ７ and Rp ８ are each independently -BRp １１ Rp １２ represents Rp １１ and Rp １２ Rp each independently represents a substituent. １１ and Rp １２Examples of the substituent represented by include a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, and a heteroaryloxy group, and it is preferably a halogen atom, an alkyl group, an aryl group, or a heteroaryl group, more preferably a halogen atom, an alkyl group, or an aryl group, and even more preferably an aryl group. The alkyl group, the alkenyl group, the aryl group, the heteroaryl group, the alkoxy group, the aryloxy group, and the heteroaryloxy group may have a substituent. Examples of the substituent include the groups listed as the substituent T described below.

[0034] The group represented by formula (R-100) is shown below.

[0035] In the formula, Rp １ａ represents an alkyl group, an aryl group, or a heteroaryl group; ３ａ ~RP ６ａ each independently represents a hydrogen atom or a substituent, ７ａ and Rp ８ａ are each independently -BRp １１ Rp １２ represents Rp １１ and Rp １２ each independently represents a substituent, １１ and Rp １２ may be bonded to each other to form a ring, Lp １ represents a single bond or a divalent linking group.

[0036] Rp in formula (R-100) １ａ , Rp ３ａ ~RP ８ａ is Rp in formula (PP-1). １ , Rp ３ ~RP ８ The same applies to the preferred range.

[0037] Lp of formula (R-100) １ represents a single bond or a divalent linking group. Examples of the divalent linking group include an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, —O—, —S—, and —NR Ｌ１ -, -CO-, -COO-, -OCO-, -SO２ - or a group consisting of a combination thereof. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 20, more preferably 2 to 20, even more preferably 2 to 10, and particularly preferably 2 to 5. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The aliphatic hydrocarbon group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 18, more preferably 6 to 14, and even more preferably 6 to 10. The aromatic hydrocarbon group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below. The heterocyclic group is preferably a monocyclic ring or a fused ring having 2 to 4 rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and even more preferably 1 to 12. The heterocyclic group may have a substituent. Examples of the substituent include the groups exemplified as the substituent T described below.

[0038] The squarylium compound may be a compound represented by formula (SQ-1), and the croconium compound may be a compound represented by formula (CR-1). In formula (SQ-1), As １ and As ２ each independently represents an aryl group, a heterocyclic group, or a group represented by formula (As-1); １１ and As １２ each independently represents an aryl group, a heterocyclic group, or a group represented by formula (As-1); In the formula, * represents a bond, and Rs １ ~Rs ３ each independently represents a hydrogen atom or an alkyl group; As ３ represents a heterocyclic group; ｓ１ represents an integer of 0 or more, １ and Rs. ２ may be bonded to each other to form a ring, Rs １ and As ３ may be bonded to each other to form a ring, Rs２ and Rs. ３ may be bonded to each other to form a ring, ｓ１ If Rs is 2 or more, multiple Rs ２ and Rs. ３ may be the same or different.

[0039] As １ , As ２ , As １１ and As １２ The aryl group represented by is preferably 6 to 48 carbon atoms, more preferably 6 to 22 carbon atoms, and particularly preferably 6 to 12 carbon atoms. １ , As ２ , As １１ and As １２ The aryl group represented by the formula (I) may have a substituent. Examples of the substituent include the groups exemplified as the substituent T described below.

[0040] As １ , As ２ , As ３ , As １１ and As １２ The heterocyclic group represented by is preferably a 5- or 6-membered heterocyclic group. The heterocyclic group is preferably a monocyclic heterocyclic group or a heterocyclic group having 2 to 8 fused rings, more preferably a monocyclic heterocyclic group or a heterocyclic group having 2 to 4 fused rings, more preferably a monocyclic heterocyclic group or a heterocyclic group having 2 or 3 fused rings, and particularly preferably a monocyclic heterocyclic group or a heterocyclic group having 2 fused rings. Examples of heteroatoms constituting the ring of the heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom, with a nitrogen atom and a sulfur atom being preferred. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3, more preferably 1 to 2. As １ , As ２ , As ３ , As １１ and As １２ The heterocyclic group represented by may have a substituent. Examples of the substituent include the groups exemplified as the substituent T described below.

[0041] Rs in formula (As-1) １ ~Rs ３ Rs each independently represents a hydrogen atom or an alkyl group.１ ~Rs ３ The number of carbon atoms in the alkyl group represented by Rs is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, and is preferably linear or branched. １ ~Rs ３ is preferably a hydrogen atom.

[0042] n in formula (As-1) ｓ１ represents an integer of 0 or more. ｓ１ is preferably an integer of 0 to 2, more preferably 0 or 1, and even more preferably 0.

[0043] In formula (As-1), Rs １ and Rs. ２ may be bonded to each other to form a ring, Rs １ and As ３ may be bonded to each other to form a ring, Rs ２ and Rs. ３ may be bonded to each other to form a ring. When forming the above ring, the linking group is preferably a divalent linking group selected from the group consisting of -CO-, -O-, -NH-, an alkylene group having 1 to 10 carbon atoms, and a combination thereof. The alkylene group as the linking group may be unsubstituted or may have a substituent. Examples of the substituent include the groups listed as the substituent T described below.

[0044] Examples of polymethine compounds include compounds represented by formula (PM-1) and salts of compounds represented by formula (PM-1) with counter ions. When the compound represented by formula (PM-1) is positively charged (cationic), the counter ion constituting the salt is a counter anion, and when the compound represented by formula (PM-1) is negatively charged (anionic), the counter ion constituting the salt is a counter cation.

[0045] In formula (PM-1), Rpm １ ~ Rpm ５ each independently represents a hydrogen atom or a substituent, n represents an integer of 1 or more, ２ ~ Rpm ４ may be bonded to form a ring, Rpm１ and T １ may be bonded to form a ring, Rpm ５ and T ２ may be bonded to form a ring, T １ and T ２ each independently represents an aryl group or a heterocyclic group.

[0046] Rpm １ ~ Rpm ５ The substituent represented by is a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a nitro group, a cyano group, -OR Ｌ１ , -C(=O)R Ｌ１ , -C(=O)OR Ｌ１ , -OC(=O)R Ｌ１ , -NR Ｌ１ R Ｌ２ , -NHC(=O)R Ｌ１ , —C(═O)NR Ｌ１ R Ｌ２ , -NHC(=O)OR Ｌ１ , -OC(=O)NR Ｌ１ R Ｌ２ , -NHC(=O)NR Ｌ１ R Ｌ２ , -SR Ｌ１ , -S(=O) ２ R Ｌ１ , -S(=O) ２ OR Ｌ１ , -NHS(=O) ２ R Ｌ１ or -S(=O) ２ NR Ｌ１ R Ｌ２ It is preferable that R Ｌ１ and R Ｌ２ each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a heterocyclic group.

[0047] The phthalocyanine compound includes a compound represented by formula (PC-1).

[0048] In formula (PC-1), R ｐｃ１ ~R ｐｃ１６ each independently represents a hydrogen atom or a substituent; M ２represents two hydrogen atoms or a metal atom which may be coordinated with a ligand.

[0049] R ｐｃ１ ~R ｐｃ１６ Examples of the substituent represented by include the groups exemplified as the substituent T described below, and are preferably an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkylsulfonyl group, or an arylsulfonyl group.

[0050] M ２ are Pd, Cu, Zn, Pt, Ni, TiO, Co, Fe, Mn, Sn, SnCl ２ , AlCl, AlOH, Si(OH) ２ , VO or InCl.

[0051] The naphthalocyanine compound includes a compound represented by formula (NPC-1).

[0052] In formula (NPC-1), R ｎｐ１ ~R ｎｐ２４ each independently represents a hydrogen atom or a substituent; M ３ represents two hydrogen atoms or a metal atom which may be coordinated with a ligand.

[0053] R ｎｐ１ ~R ｎｐ２４ Examples of the substituent represented by include the groups exemplified as the substituent T described below, and are preferably an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkylsulfonyl group, or an arylsulfonyl group.

[0054] M ３ are Pd, Cu, Zn, Pt, Ni, TiO, Co, Fe, Mn, Sn, SnCl ２ , AlCl, AlOH, Si(OH) ２ , VO or InCl.

[0055] The specific dye compound having a pyrrolopyrrole dye structure includes a compound represented by formula (PP-1).

[0056] The diiminium compound includes a compound represented by formula (DIM-1).

[0057] In the formula, R ｉｍ１ ~R ｉｍ８ each independently represents an alkyl group, an alkenyl group, an aryl group, or a heteroaryl group.

[0058] R ｉｍ１ ~R ｉｍ８ The alkyl group, alkenyl group, aryl group and heteroaryl group represented by may have a substituent. Examples of the substituent include the groups exemplified as the substituent T described below.

[0059] Examples of the substituent T include the following groups: a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heteroaryl group (preferably a heteroaryl group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably or an aryloxy group having 6 to 30 carbon atoms), a heteroaryloxy group (preferably a heteroaryloxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heteroaryloxycarbonyl group (preferably a heteroaryloxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), group), acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), sulfamoylamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), carboxylic acid a bamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heteroarylthio group (preferably a heteroarylthio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms),an arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a heteroarylsulfonyl group (preferably a heteroarylsulfonyl group having 1 to 30 carbon atoms), a heteroarylsulfonylamino group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 30 carbon atoms), an arylsulfinyl group (preferably an arylsulfinyl group having 6 to 30 carbon atoms), a heteroarylsulfinyl group (preferably a heteroarylsulfinyl group having 1 to 30 carbon atoms), a ureido group (preferably a ureido group having 1 to 30 carbon atoms), a hydroxy group, a nitro group, a carboxy group, a sulfo group, a phosphoric acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imido group, a phosphino group, a mercapto group, a cyano group, an alkylsulfino group, an arylsulfino group, an arylazo group, a heteroarylazo group, a phosphinyl group, a phosphinyloxy group, a phosphinylamino group, a silyl group, a hydrazino group, or an imino group. When these groups are groups that can be further substituted, they may further have a substituent. Examples of the substituent include the groups described above for the substituent T.

[0060] The content of the infrared absorbing organic pigment in the core is preferably 40 to 100% by mass, more preferably 50 to 100% by mass, and even more preferably 60 to 100% by mass.

[0061] The core portion of the core-shell particle may further contain at least one selected from a pigment derivative and a resin. According to this embodiment, the infrared absorbing organic pigment in the core portion can be coated with less aggregation. Examples of the pigment derivative and resin include the materials described in the composition section below. The content of the pigment derivative is preferably 30 parts by mass or less, more preferably 20 parts by mass or less, per 100 parts by mass of the infrared absorbing organic pigment. The lower limit can be 1 part by mass or more.

[0062] The content of the resin is preferably 100 parts by mass or less, and more preferably 60 parts by mass or less, relative to 100 parts by mass of the infrared absorbing organic pigment. The lower limit can be 1 part by mass or more.

[0063] -Shell Portion- The shell portion of the core-shell particle contains an inorganic material. The shell portion is preferably composed of an oxide or nitride containing an element selected from Si, Ti, Hf, Al, Zr, Ta, and Ru. Specific examples include SiO ２ , TiO ２ , HfO ２ , Al ２ O ３ , ZrO ２ , Ta ２ O ５ , RuO ２ , TiN, SiN, etc., and SiO is preferred because of its versatility as a raw material. ２ or Al ２ O ３ It is preferable that:

[0064] The thickness of the shell portion is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 1 to 20 nm because this allows for core-shell particles with a high color value. The thickness of the shell portion can be measured by combining elemental analysis with a scanning electron microscope (SEM) and sputtering, and calculating the shell thickness from the amount of sputtering treatment until the composition of the internal particle becomes visible.

[0065] The shell portion can be formed by methods such as atomic layer deposition, sol-gel, and chemical vapor deposition (CVD), and atomic layer deposition is preferred because it can form a thin, dense film and minimize damage to the core portion during film formation. That is, the shell portion is preferably formed by atomic layer deposition. Atomic layer deposition is a film formation method that utilizes the self-controllability of atoms to deposit atoms layer by layer by repeatedly introducing and exhausting a precursor.

[0066] <Method for producing core-shell particles> The method for producing core-shell particles of the present invention is a method for producing core-shell particles having a core portion and a shell portion covering the surface of the core portion, and is characterized in that the shell portion is formed by forming a film containing an inorganic material by atomic layer deposition on the surface of the core portion containing an infrared absorbing organic pigment.

[0067] According to the production method of the present invention, a shell portion composed of a dense film containing an inorganic material can be formed on the surface of the core portion, thereby making it possible to produce core-shell particles with excellent light resistance and moisture resistance.Furthermore, dispersion characteristics can also be improved.The core-shell particles obtained by the production method of the present invention preferably satisfy the above-mentioned condition 1.

[0068] The shell portion can be formed by the atomic layer deposition method as follows.

[0069] A core material containing an infrared absorbing organic pigment is placed in an ALD (Atomic Layer Deposition) chamber, and adsorption groups such as hydroxyl groups are formed on the surface of the core material (adsorption group step).

[0070] Examples of the infrared-absorbing organic pigment include the infrared-absorbing organic pigment described above in the section on the core-shell particles of the present invention. The core material may further include at least one selected from a resin and a pigment derivative. Examples of the pigment derivative and resin include the materials described in the section on the composition below. The content of the pigment derivative is preferably 30 parts by mass or less, and more preferably 20 parts by mass or less, per 100 parts by mass of the infrared-absorbing organic pigment. The lower limit can be 1 part by mass or more. The content of the resin is preferably 100 parts by mass or less, and more preferably 60 parts by mass or less, per 100 parts by mass of the infrared-absorbing organic pigment. The lower limit can be 1 part by mass or more.

[0071] The adsorption group is formed by adding O ３ Examples of such methods include introducing a gas to form hydroxyl groups on the surface of the core material, or introducing water vapor to form hydroxyl groups. Next, excess gas in the chamber is exhausted (exhaust step 1). Next, a precursor gas is introduced into the chamber, and the precursor reacts with the adsorption groups formed on the surface of the pigment powder (precursor gas introduction step). Examples of precursors include bisethylmethylsilane and trisdimethylaminosilane. Next, excess gas in the chamber is exhausted (exhaust step 2).

[0072] A film having a desired thickness is formed by repeating a cycle of the adsorption group step, the exhaust step 1, the precursor gas introduction step, and the exhaust step 2 multiple times.

[0073] Through these steps, a shell portion made of a film containing an inorganic material can be formed on the surface of the core portion.

[0074] <Composition> The composition of the present invention is characterized by containing the above-described core-shell particles of the present invention and a solvent.

[0075] The composition of the present invention can be used as a composition for an optical filter. Examples of optical filters include an infrared cut filter and an infrared transmission filter. Since the compound represented by formula (1) has excellent visible light transmittance and infrared shielding properties, the composition of the present invention is particularly preferably used as a composition for an infrared cut filter.

[0076] Each component used in the composition of the present invention will be described below.

[0077] <<Core-shell particles>> The composition of the present invention contains the core-shell particles of the present invention described above. The content of the core-shell particles in the total solid content of the composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, even more preferably 1% by mass or more, and still more preferably 5% by mass or more. The upper limit of the content of the core-shell particles is preferably 80% by mass or less, more preferably 70% by mass or less, even more preferably 60% by mass or less, still more preferably 50% by mass or less, even more preferably 40% by mass or less, and particularly preferably 30% by mass or less. The composition of the present invention may contain only one type of core-shell particle, or may contain two or more types. When two or more types are contained, the total amount thereof preferably falls within the above range.

[0078] <<Solvent>> The composition of the present invention contains a solvent. Examples of the solvent include water and organic solvents, and organic solvents are preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details of these, please refer to paragraph 0223 of WO 2015 / 166779, the contents of which are incorporated herein by reference. Furthermore, ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether ... Examples of suitable ethylene glycol monomethyl ether acetate include 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, it may be preferable to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, the amount may be 50 ppm by mass (parts per million) or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

[0079] The metal content of the organic solvent is preferably low. The metal content of the organic solvent is preferably, for example, 10 parts per billion (ppb) by mass or less. If necessary, an organic solvent having a metal content of ppt (parts per trillion) by mass may be used, and such an organic solvent is provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0080] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0081] The organic solvent may contain isomers (compounds having the same number of atoms but different structures). The organic solvent may contain only one type of isomer or multiple types of isomers.

[0082] The organic solvent preferably has a peroxide content of 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0083] The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, still more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0084] <<Resin>> The composition of the present invention can contain a resin. The resin is blended, for example, for the purpose of dispersing particles, etc. in the composition or for the purpose of using as a binder. Note that a resin used mainly for dispersing particles, etc. in a composition is also called a dispersant. However, such a use of the resin is only an example, and the resin can also be used for purposes other than such a use.

[0085] The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4,000 or more, more preferably 5,000 or more.

[0086] Examples of the resin include (meth)acrylic resin, epoxy resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, and polyurea resin. One of these resins may be used alone, or two or more of them may be mixed and used. From the perspective of improving heat resistance, norbornene resin is preferable as the cyclic olefin resin. Examples of commercially available norbornene resins include the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Further, as the resin, the resins described in paragraph numbers 0091 to 0099 of International Publication No. 2022 / 065215, the block polyisocyanate resin described in JP-A-2016-222891, the resin described in JP-A-2020-122052, the resin described in JP-A-2020-111656, the resin described in JP-A-2020-139021, the resin containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain described in JP-A-2017-138503, the resins described in paragraphs 0199 to 0233 of JP-A-2020-186373, the alkali-soluble resin described in JP-A-2020-186325, the resin represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339, the copolymer containing an epoxy group and an acid group described in International Publication No. 2022 / 030445, the resins described in paragraphs 0199 to 0233 of JP-A-2020-186373, the alkali-soluble resin described in JP-A-2020-186325, the resin represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339, the resin described in JP-A-2021-134350, and the copolymer described in JP-A-2020-041046 can also be used. Further, as the resin, a resin having a fluorene skeleton can also be preferably used.Examples of resins having a fluorene skeleton include resins described in U.S. Patent Application Publication No. 2017 / 0102610.

[0087] It is preferable to use a resin having acid groups as the resin. Examples of acid groups include carboxy groups, phosphate groups, sulfo groups, and phenolic hydroxy groups. These acid groups may be of one type or two or more types. The resin having acid groups can be used, for example, as an alkali-soluble resin. The acid value of the resin having acid groups is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, even more preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less. The weight-average molecular weight (Mw) of the resin having acid groups is preferably 5,000 to 100,000, more preferably 5,000 to 50,000. The number-average molecular weight (Mn) of the resin having acid groups is preferably 1,000 to 20,000.

[0088] The resin having an acid group preferably contains a repeating unit having an acid group on a side chain, and more preferably contains 5 to 70 mol% of the repeating units having an acid group on a side chain based on all repeating units of the resin. The upper limit of the content of repeating units having an acid group on a side chain is preferably 50 mol% or less, more preferably 30 mol% or less. The lower limit of the content of repeating units having an acid group on a side chain is preferably 10 mol% or more, more preferably 20 mol% or more.

[0089] For resins having acid groups, please refer to the descriptions in paragraphs

[0558] to

[0571] of JP 2012-208494 A (corresponding to paragraphs

[0685] to

[0700] of U.S. Patent Application Publication No. 2012 / 0235099 A) and paragraphs

[0076] to

[0099] of JP 2012-198408 A, the contents of which are incorporated herein by reference. Alternatively, commercially available resins having acid groups can be used. There are no particular limitations on the method for introducing acid groups into the resin, and examples include the method described in Japanese Patent No. 6,349,629 A. Furthermore, examples of methods for introducing acid groups into the resin include a method in which an acid anhydride is reacted with a hydroxy group generated by a ring-opening reaction of an epoxy group to introduce the acid group.

[0090] A resin having a basic group can also be used as the resin. The resin having a basic group is preferably a resin containing a repeating unit having a basic group in the side chain, more preferably a copolymer having a repeating unit having a basic group in the side chain and a repeating unit not containing a basic group, and even more preferably a block copolymer having a repeating unit having a basic group in the side chain and a repeating unit not containing a basic group. The resin having a basic group can also be used as a dispersant. The amine value of the resin having a basic group is preferably 5 to 300 mgKOH / g. The lower limit is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more. The upper limit is preferably 200 mgKOH / g or less, more preferably 100 mgKOH / g or less.

[0091] Commercially available resins having basic groups include DISPERBYK-161, 162, 163, 164, 166, 167, 168, 174, 182, 183, 184, 185, 2000, 2001, 2050, 2150, 2163, 2164, and BYK-LPN6919 (all manufactured by BYK-Chemie), and Solsperse 112. 00, 13240, 13650, 13940, 24000, 26000, 28000, 32000, 32500, 32550, 32600, 33000, 34750, 35100, 35200, 37500, 38500, 39000, 53095, 56000, 7100 (all manufactured by The Lubrizol Group, Japan), Efka PX 4300, 4330, 4046, 4060, 4080 (all manufactured by BASF), and the like. In addition, the resin having a basic group may be the block copolymer (B) described in paragraphs 0063 to 0112 of JP-A-2014-219665, the block copolymer A1 described in paragraphs 0046 to 0076 of JP-A-2018-156021, or the vinyl resin having a basic group described in paragraphs 0150 to 0153 of JP-A-2019-184763, the contents of which are incorporated herein by reference.

[0092] The composition of the present invention also preferably contains both a resin having an acid group and a resin having a basic group. According to this embodiment, the storage stability of the composition can be further improved. When a resin having an acid group and a resin having a basic group are used in combination, the content of the resin having a basic group is preferably 20 to 500 parts by mass, more preferably 30 to 300 parts by mass, and even more preferably 50 to 200 parts by mass per 100 parts by mass of the resin having an acid group.

[0093] It is also preferable to use a resin having an aromatic carboxy group as the resin. In a resin having an aromatic carboxy group, the aromatic carboxy group may be contained in the main chain of the repeating unit or may be contained in a side chain of the repeating unit. It is preferable that the aromatic carboxy group is contained in the main chain of the repeating unit. In this specification, an aromatic carboxy group refers to a group having a structure in which one or more carboxy groups are bonded to an aromatic ring. In the aromatic carboxy group, the number of carboxy groups bonded to the aromatic ring is preferably 1 to 4, and more preferably 1 to 2. Examples of resins having an aromatic carboxy group include the resins described in paragraphs 0082 to 0107 of WO 2021 / 166858.

[0094] It is also preferable to use a resin having a polymerizable group as the resin. The polymerizable group is preferably an ethylenically unsaturated bond-containing group or a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

[0095] The resin preferably contains a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the term "acidic dispersant (acidic resin)" refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As the acidic dispersant (acidic resin), a resin in which the amount of acid groups is 70 mol% or more is preferred when the total amount of the acid groups and the basic groups is taken as 100 mol%. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxy group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the term "basic dispersant (basic resin)" refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As the basic dispersant (basic resin), a resin in which the amount of basic groups is greater than 50 mol% is preferred when the total amount of the acid groups and the basic groups is taken as 100 mol%. The basic group possessed by the basic dispersant is preferably an amino group.

[0096] The resin used as the dispersant is preferably a graft resin. For details of the graft resin, please refer to the description in paragraphs 0025 to 0094 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0097] The resin used as the dispersant is preferably a resin having an aromatic carboxy group, such as those mentioned above.

[0098] The resin used as the dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure containing a functional group with a pKa of 14 or less and a side chain having 40 to 10,000 atoms, and having a basic nitrogen atom in at least one of the main chain and the side chain. There are no particular restrictions on the basic nitrogen atom, as long as it is a nitrogen atom that exhibits basicity. For details about polyimine-based dispersants, please refer to the description in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0099] The resin used as a dispersant is preferably a resin having a structure in which multiple polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP-A-2013-043962.

[0100] The resin used as a dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in a side chain is preferably 10 mol % or more, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %, of all repeating units of the resin.

[0101] As the dispersant, the resin described in JP 2018-087939 A, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077 A, polyethyleneimine having a polyester side chain described in WO 2016 / 104803, block copolymers described in WO 2019 / 125940 A, block polymers having an acrylamide structural unit described in JP 2020-066687 A, block polymers having an acrylamide structural unit described in JP 2020-066688 A, dispersants described in WO 2016 / 104803, and the like can also be used.

[0102] Dispersants are also available as commercially available products, and specific examples thereof include the DISPERBYK series manufactured by BYK-Chemie, the SOLSPERSE series manufactured by Lubrizol Japan, the Efka series manufactured by BASF, and the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Ltd. In addition, the products described in paragraph 0129 of JP 2012-137564 A and the products described in paragraph 0235 of JP 2017-194662 A can also be used as dispersants.

[0103] When the composition of the present invention contains a resin, the content of the resin in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less. The content of the resin having an acid group in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less. The content of the alkali-soluble resin in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less.

[0104] The content of the dispersant is preferably 5 to 100 parts by mass relative to 100 parts by mass of the core-shell particles. The lower limit is preferably 10 parts by mass or more, more preferably 15 parts by mass or more, and even more preferably 20 parts by mass or more. The upper limit is preferably 80 parts by mass or less, more preferably 60 parts by mass or less, and even more preferably 50 parts by mass or less.

[0105] The composition of the present invention may contain only one type of resin or two or more types. When two or more types of resins are contained, the total amount thereof is preferably within the above range.

[0106] <<Polymerizable Compound>> The composition of the present invention may contain a polymerizable compound. As the polymerizable compound, known compounds that can be crosslinked by radicals, acids, or heat can be used. The polymerizable compound is preferably, for example, a compound having an ethylenically unsaturated bond-containing group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a (meth)allyl group, and a (meth)acryloyl group. The polymerizable compound used in the present invention is preferably a radically polymerizable compound.

[0107] The polymerizable compound may be in any chemical form, such as a monomer, prepolymer, or oligomer, but is preferably a monomer. The molecular weight of the polymerizable compound is preferably 100 to 2500. The upper limit is more preferably 2000 or less, and even more preferably 1500 or less. The lower limit is more preferably 150 or more, and even more preferably 250 or more.

[0108] The polymerizable compound is preferably a compound containing three or more ethylenically unsaturated bond-containing groups, more preferably a compound containing 3 to 15 ethylenically unsaturated bond-containing groups, and even more preferably a compound containing 3 to 6 ethylenically unsaturated bond-containing groups. Furthermore, the polymerizable compound is preferably a trifunctional to 15-functional (meth)acrylate compound, and more preferably a trifunctional to hexafunctional (meth)acrylate compound. Specific examples of the polymerizable compound include the compounds described in paragraphs 0075 to 0083 of WO 2022 / 065215.

[0109] Preferred polymerizable compounds include dipentaerythritol triacrylate (commercially available product: KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (commercially available product: KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds having a structure in which the (meth)acryloyl group is bonded via an ethylene glycol and / or propylene glycol residue (e.g., SR454, SR499, commercially available from Sartomer). Examples of polymerizable compounds include diglycerin EO (ethylene oxide) modified (meth)acrylate (commercially available product: M-460, manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), and 1,6-hexanediol diacrylate (KAYARAD, manufactured by Nippon Kayaku Co., Ltd.). HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), and the like can also be used.

[0110] As the polymerizable compound, trifunctional (meth)acrylate compounds such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate can also be used. Commercially available trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0111] The polymerizable compound may also be a polymerizable compound having a urethane bond. Examples of the polymerizable compound having a urethane bond include a urethane (meth)acrylate obtained by reacting a (meth)acrylate having a hydroxy group with a polyfunctional isocyanate, and a urethane (meth)acrylate obtained by reacting a polyhydric alcohol with a polyfunctional isocyanate and then reacting the resulting mixture with a (meth)acrylate having a hydroxy group.

[0112] Examples of the (meth)acrylate having a hydroxy group include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol ethylene oxide-modified penta(meth)acrylate, dipentaerythritol propylene oxide-modified penta(meth)acrylate, dipentaerythritol caprolactone-modified penta(meth)acrylate, glycerol acrylate methacrylate, glycerol dimethacrylate, 2-hydroxy-3-acryloylpropyl methacrylate, a reaction product of an epoxy group-containing compound and a carboxy(meth)acrylate, and a hydroxy group-containing polyol polyacrylate.

[0113] Examples of the polyfunctional isocyanate include aliphatic diisocyanates such as trimethylene diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate; alicyclic diisocyanates such as isophorone diisocyanate; aromatic diisocyanates such as tolylene diisocyanate, diphenylmethylene diisocyanate, and xylene diisocyanate; and biuret derivatives, isocyanate nurate derivatives, and trimethylolpropane adducts thereof.

[0114] As the polymerizable compound having a urethane bond, the compounds described in paragraphs 0308 to 0315 of JP-A No. 2022-173080 can also be used.

[0115] When a polymerizable compound having a urethane bond is used as the polymerizable compound, the content of the polymerizable compound having a urethane bond in the total amount of polymerizable compounds contained in the composition is preferably 50% by mass or more, more preferably 70% by mass or more, and even more preferably 90% by mass or more.

[0116] The polymerizable compound may also be a polymerizable compound having an acid group such as a carboxy group, a sulfo group, or a phosphate group. Commercially available products of such compounds include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).

[0117] The polymerizable compound may also be a polymerizable compound having a caprolactone structure. For compounds having a caprolactone structure, see paragraphs 0042 to 0045 of JP 2013-253224 A, the contents of which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120, which are commercially available as a series from Nippon Kayaku Co., Ltd.

[0118] The polymerizable compound may also be a polymerizable compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group. Such a polymerizable compound is preferably a polymerizable compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, more preferably a polymerizable compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a tri- to hexa-functional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Commercially available products include, for example, SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer Corporation, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

[0119] The polymerizable compound may also be a polymerizable compound having a fluorene skeleton. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0120] The content of the polymerizable compound in the total solid content of the composition is preferably 1 to 40% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 35% by mass or less, more preferably 30% by mass or less. The composition of the present invention may contain only one type of polymerizable compound, or may contain two or more types. When two or more types are contained, the total amount thereof preferably falls within the above range.

[0121] <<Photopolymerization initiator>> When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light in the ultraviolet to visible region is preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0122] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, or a 3-aryl-substituted coumarin compound, more preferably a compound selected from an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, and an acylphosphine compound, and even more preferably an oxime compound.Further, as the photopolymerization initiator, compounds described in paragraphs 0065 to 0111 of JP-A No. 2014-130173, compounds described in Japanese Patent No. 6301489, compounds described in MATERIAL STAGE 37-60pp, vol. 19, No. 3, 2019, a photopolymerization initiator described in WO 2018 / 221177, a photopolymerization initiator described in WO 2018 / 110179, a photopolymerization initiator described in JP 2019-043864 A, a photopolymerization initiator described in JP 2019-044030 A, a peroxide-based initiator described in JP 2019-167313 A, an aminoacetophenone-based initiator having an oxazolidine group described in JP 2020-055992 A, an oxime-based photopolymerization initiator described in JP 2013-190459 A, a polymer described in JP 2020-172619 A, a compound represented by formula 1 described in WO 2020 / 152120, JP 2021-18140 Compounds described in Patent Publication No. 6, photopolymerization initiators described in JP-A-2022-013379, compounds represented by the formula (1) described in JP-A-2022-015747, fluorine-containing fluorene oxime ester photoinitiators described in JP-T-2021-507058, initiators described in Chinese Patent Application Publication No. 110764367, initiators described in JP-T-2022-518535, initiators described in WO 2021 / 175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in JP-A-2022-078550, compounds described in Korean Patent Publication No. 10-2017-0087330, compounds described in WO 2022 / 075452, and the like.

[0123] Specific examples of hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0124] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (all manufactured by IGM Resins B.V.), and Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (all manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (all manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (all manufactured by BASF), etc.

[0125] Examples of oxime compounds include compounds described in paragraph 0142 of WO 2022 / 085485, compounds described in Japanese Patent No. 5430746, compounds described in Japanese Patent No. 5647738, compounds represented by the general formula (1) of JP 2021-173858 A and compounds described in paragraphs 0022 to 0024, compounds represented by the general formula (1) of JP 2021-170089 A and compounds described in paragraphs 0117 to 0120, oxime ester compounds described in Chinese Patent Application Publication No. 110066225, compounds described in Korean Patent Publication No. 10-2022-0076157, compounds described in paragraphs 0042 to 0062 of WO 2019 / 013112 having a triarylamine or N- arylcarbazole skeleton, and the like. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), and the like. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (manufactured by BASF), TR-PBG-301, TR-PBG-304, and TR-PBG-327 (manufactured by TRONLY), and ADEKA OPTOMER N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP-A-2012-014052). Furthermore, it is also preferable to use, as the oxime compound, a compound that is not colorable or a compound that is highly transparent and does not easily discolor. Commercially available products include ADEKA ARCLES NCI-730, NCI-831, and NCI-930 (manufactured by ADEKA Corporation).

[0126] As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxy group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022 / 085485 can also be used.

[0127] As the photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

[0128] In formula (OX-1), X １ａ represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocyclic ring; １ａ represents a hydrogen atom or an acyl group; R ２ａ represents an alkyl group or an aryl group; R ３ａ and R ４ａ each independently represents a hydrogen atom or an alkyl group; Alk １ and Alk ２ each independently represents an alkyl group; R ３ａ and R ４ａ may be bonded to form a ring, Alk １ and Alk ２ may be bonded to form a ring, and n represents 0 or 1.

[0129] X in formula (OX-1) １ａ Examples of the divalent linking group represented by include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic rings are bonded via a single bond or a linking group, a divalent group in which two or more heterocycles are bonded via a single bond or a linking group, and a divalent group in which an aromatic ring and a heterocycle are bonded via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic rings, heterocyclic groups, or aromatic rings and heterocycles include -CH ２ -, -O-, -CO-, -S-, -NR ｘ - and groups combining these. ｘrepresents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0130] X in formula (OX-1) １ａ is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6). In the formula R Ｘ１ ~R Ｘ９ each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0131] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0132] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0133] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkynyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0134] R Ｘ１ ~R Ｘ９The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

[0135] R Ｘ１ ~R Ｘ９ The heterocyclic group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0136] R in formula (OX-1) １ａ represents a hydrogen atom or an acyl group, and is preferably an acyl group. １ａ The acyl group represented by is —C(O)—R １０１ It is preferable that R １０１ represents an aryl group or a heterocyclic group, and is preferably an aryl group.

[0137] R １０１ The number of carbon atoms in the aryl group represented by R is preferably 6 to 20, and more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. １０１ The aryl group represented by is preferably a phenyl group, a methylphenyl group or a naphthyl group, more preferably a methylphenyl group or a naphthyl group.

[0138] R １０１ The heterocyclic group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0139] R in formula (OX-1)２ａ represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high. ２ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R ２ａ The alkyl group represented by R is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group. ２ａ The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

[0140] R in formula (OX-1) ３ａ and R ４ａ R each independently represents a hydrogen atom or an alkyl group, and is preferably a hydrogen atom. ３ａ and R ４ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R ３ａ and R ４ａ may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0141] Alk of formula (OX-1) １ and Alk ２each independently represents an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. Alk １ and Alk ２ may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

[0142] In formula (OX-1), n ​​represents 0 or 1, and is preferably 0.

[0143] Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP-A No. 2012-113104 and the compound described in paragraph 0041 of JP-A No. 2012-189997.

[0144] As the photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

[0145] In formula (OX-2), R １ｂ and R ２ｂ each independently represents a substituent, R ３ｂ ~R ７ｂ each independently represents a hydrogen atom or a substituent, Ar １ｂ represents an aromatic ring group or a heterocyclic group which may have a substituent; n represents 0 or 1;

[0146] R １ｂ and R ２ｂExamples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, even more preferably 6 to 10 carbon atoms, and particularly preferably 6 carbon atoms. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

[0147] R ３ｂ ~R ７ｂ Examples of the substituent represented by R include a halogen atom, an alkyl group, and an aryl group. Examples of the alkyl group and the aryl group include those described above. ３ｂ ~R ７ｂ is preferably a hydrogen atom.

[0148] Ar １ｂ represents an aromatic ring group or a heterocyclic group which may have a substituent, Ar １ｂ is preferably an aromatic ring group which may have a substituent. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferred. Examples of the acyl group include the acyl groups described above.

[0149] As the photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

[0150] In formula (OX-3), Ar １ｃ represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group; Ar ２ｃ represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group; R １ｃ ~R ３ｃeach independently represents a substituent; １ｃ is a single bond or CR １１ｃ R １２ｃ represents R １１ｃ and R １２ｃ each independently represents a hydrogen atom, an alkyl group, or an aryl group; １ｃ represents -O- or -S-; k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

[0151] R １ｃ and R ２ｃ Examples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, even more preferably 6 to 10 carbon atoms, and particularly preferably 6 carbon atoms. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. R ２ｃ is preferably an alkyl group having a branched or cyclic structure.

[0152] R ３ｃ Examples of the substituent represented by include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, and an acyl group, and an acyl group is preferred. Examples of the acyl group include the acyl groups described above.

[0153] Ar １ｃ represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0154] Ar ２ｃrepresents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0155] k represents 0 or 1, and is preferably 0.

[0156] m represents an integer of 0 to 4, preferably 0 or 1, and more preferably 1.

[0157] Specific examples of oxime compounds that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[0158]

[0159] The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferably measured using a spectrophotometer (Varian Cary-5 spectrophotometer) at a concentration of 0.01 g / L using ethyl acetate as a solvent.

[0160] As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, thereby obtaining good sensitivity. Furthermore, when a compound with an asymmetric structure is used, crystallinity is reduced and solubility in solvents is improved, making it less likely to precipitate over time, thereby improving the stability of the composition over time. Specific examples of bifunctional or trifunctional or higher functional photoradical polymerization initiators include the compounds described in paragraph 0148 of WO 2022 / 065215.

[0161] The content of the photopolymerization initiator in the total solid content of the composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less. The composition of the present invention may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are contained, the total amount thereof preferably falls within the above range.

[0162] <<Pigment Derivative>> The composition of the present invention may contain a pigment derivative. The pigment derivative is used as a dispersing aid. A dispersing aid is a material that enhances the dispersibility of the pigment in the composition.

[0163] Examples of the pigment derivative include a compound having at least one structure selected from the group consisting of a dye structure and a triazine structure, and an acid group or a basic group.

[0164] Examples of the dye structure include a squarylium dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a quinacridone dye structure, an anthraquinone dye structure, a dianthraquinone dye structure, a benzisoindole dye structure, a thiazine indigo dye structure, an azo dye structure, a quinophthalone dye structure, a phthalocyanine dye structure, a naphthalocyanine dye structure, a dioxazine dye structure, a perylene dye structure, a perinone dye structure, a benzimidazolone dye structure, a benzothiazole dye structure, a benzimidazole dye structure, and a benzoxazole dye structure. Of these, a squarylium dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a phthalocyanine dye structure, a quinacridone dye structure, and a benzimidazolone dye structure are preferred, and a squarylium dye structure and a pyrrolopyrrole dye structure are more preferred.

[0165] Examples of the acid group possessed by the pigment derivative include a carboxy group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imidic acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li ＋ , Na ＋ , K. ＋ etc.), alkaline earth metal ions (Ca ２＋ , Mg ２＋ Examples of the carboxylic acid amide group include -NHCOR, ... Ｘ１ As the sulfonic acid amide group, a group represented by -NHSO is preferred. ２ R Ｘ２ As the imide acid group, a group represented by -SO ２ NHSO ２ R Ｘ３ , -CONHSO ２ R Ｘ４ , -CONHCOR Ｘ５ or -SO ２ NHCOR Ｘ６ A group represented by the formula: ２ NHSO ２ R Ｘ３ is more preferred. Ｘ１ ~R Ｘ６R each independently represents an alkyl group or an aryl group. Ｘ１ ~R Ｘ６ The alkyl group and aryl group represented by may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom.

[0166] Examples of basic groups possessed by the pigment derivative include amino groups, pyridinyl groups and their salts, ammonium salts, and phthalimidomethyl groups. Examples of atoms or atomic groups that constitute the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0167] Specific examples of pigment derivatives include compounds described in paragraphs 0037 to 0054 of WO 2016 / 035695, compounds described in paragraphs 0061 to 0086 of WO 2017 / 146092, compounds described in paragraphs 0017 to 0068 of WO 2018 / 230387, compounds described in paragraphs 0085 to 0099 of WO 2020 / 054718, compounds described in paragraph 0099 of WO 2020 / 054718, compounds described in paragraph 0124 of WO 2022 / 085485, benzimidazolone compounds or salts thereof described in JP-A-2018-168244, and compounds having an isoindoline skeleton described in the general formula (1) of Japanese Patent No. 6996282.

[0168] The content of the pigment derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount be in the above range.

[0169] <<Compound Having a Cyclic Ether Group>> The composition of the present invention may contain a compound having a cyclic ether group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group.

[0170] The compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 2000, or even less than 1000) or a high molecular weight compound (macromolecule) (for example, a molecular weight of 1000 or more, or in the case of a polymer, a weight average molecular weight of 1000 or more). The weight average molecular weight of the epoxy compound is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0171] The compound having a cyclic ether group is preferably a compound having an epoxy group (hereinafter also referred to as an epoxy compound). As the compound having a cyclic ether group, the compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, 0147 to 0156 of JP-A-2014-043556, 0085 to 0092 of JP-A-2014-089408, and the compounds described in JP-A-2017-179172 can also be used.

[0172] As the epoxy compound, an epoxy resin can be preferably used. Examples of epoxy resins include epoxy resins that are glycidyl ethers of phenolic compounds, epoxy resins that are glycidyl ethers of various novolac resins, alicyclic epoxy resins, aliphatic epoxy resins, heterocyclic epoxy resins, glycidyl ester epoxy resins, glycidyl amine epoxy resins, epoxy resins obtained by glycidylating halogenated phenols, condensates of silicon compounds having epoxy groups with other silicon compounds, and copolymers of polymerizable unsaturated compounds having epoxy groups with other polymerizable unsaturated compounds. The epoxy equivalent of the epoxy resin is preferably 310 to 3,300 g / eq, more preferably 310 to 1,700 g / eq, and even more preferably 310 to 1,000 g / eq.

[0173] Commercially available examples of compounds having a cyclic ether group include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (all manufactured by NOF Corporation, epoxy group-containing polymers).

[0174] The content of the compound having a cyclic ether group in the total solid content of the composition is preferably 0.1 to 20% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less. The composition of the present invention may contain only one type of compound having a cyclic ether group, or may contain two or more types. When two or more types are used, the total amount thereof preferably falls within the above range.

[0175] <<Curing Agent>> When the composition of the present invention contains a compound having a cyclic ether group, it is preferable that the composition of the present invention further contains a curing agent. Examples of curing agents include amine compounds, acid anhydride compounds, amide compounds, phenolic compounds, polycarboxylic acids, and thiol compounds. Specific examples of curing agents include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). The curing agent may also be the compounds described in paragraphs 0072 to 0078 of JP 2016-075720 A or the compounds described in JP 2017-036379 A. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, per 100 parts by mass of the compound having a cyclic ether group.

[0176] <<Other Infrared Absorbents>> The composition of the present invention can contain an infrared absorbent (other infrared absorbent) other than the core-shell particles of the present invention described above. The other infrared absorbent may be a dye or a pigment (particles). Examples of other infrared absorbents used as pigments (particles) include those whose surfaces are not coated with an inorganic material.

[0177] Examples of the other infrared absorbers include pyrrolopyrrole compounds, polymethine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, and metal borides, and at least one selected from squarylium compounds and phthalocyanine compounds is preferred.

[0178] Examples of the pyrrolopyrrole compound include the compounds described in paragraphs 0016 to 0058 of JP-A-2009-263614, the compounds described in paragraphs 0037 to 0052 of JP-A-2011-068731, and the compounds described in paragraphs 0010 to 0033 of WO 2015 / 166873. Examples of squarylium compounds include compounds described in paragraphs 0044 to 0049 of JP 2011-208101 A, compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169 A, compounds described in paragraph 0040 of WO 2016 / 181987 A, compounds described in JP 2015-176046 A, compounds described in paragraph 0072 of WO 2016 / 190162 A, and compounds described in JP 2016-07464 A. Compounds described in paragraphs 0196 to 0228 of Patent Publication No. 9, compounds described in paragraph 0124 of JP-A-2017-067963, compounds described in WO 2017 / 135359, compounds described in JP-A-2017-114956, compounds described in Japanese Patent No. 6197940, compounds described in WO 2016 / 120166, compounds described in Table 1 of U.S. Pat. No. 11261172, and the like. Examples of polymethine compounds include compounds described in paragraphs 0044 to 0045 of JP 2009-108267 A, compounds described in paragraphs 0026 to 0030 of JP 2002-194040 A, compounds described in JP 2015-172004 A, compounds described in JP 2015-172102 A, compounds described in JP 2008-088426 A, compounds described in paragraph 0090 of WO 2016 / 190162 A, compounds described in JP 2017-031394 A, compounds described in JP 2021-134350 A, compounds described in WO 2021 / 085372 A, and compounds described in paragraphs 0188 to 0192 of WO 2022 / 181422 A. Examples of croconium compounds include compounds described in JP-A-2017-082029 and compounds described in JP-A-2016-079331.Examples of iminium compounds include compounds described in JP-T-2008-528706, compounds described in JP-A-2012-012399, compounds described in JP-A-2007-092060, and compounds described in paragraphs 0048 to 0063 of WO 2018 / 043564. Examples of phthalocyanine compounds include compounds described in paragraph 0093 of JP-A-2012-077153, oxytitanium phthalocyanine described in JP-A-2006-343631, compounds described in paragraphs 0013 to 0029 of JP-A-2013-195480, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, and compounds described in WO 2020 / 071470. Examples of naphthalocyanine compounds include the compounds described in paragraph 0093 of JP 2012-077153 A and the compounds described in JP 2022-173080 A. Examples of dithiolene metal complexes include the compounds described in Japanese Patent No. 5733804 A. Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. For details on tungsten oxide, see paragraph 0080 of JP 2016-006476 A, the contents of which are incorporated herein by reference. Examples of metal borides include lanthanum boride. A commercially available lanthanum boride product is LaB. ６ -F (manufactured by Nippon Shinkinzoku Co., Ltd.). Furthermore, as the metal boride, compounds described in WO 2017 / 119394 can also be used. Commercially available indium tin oxide products include F-ITO (manufactured by Dowa Hitec Co., Ltd.).

[0179] Examples of the infrared absorber include squarylium compounds described in JP-A-2017-197437, squarylium compounds described in JP-A-2017-025311, squarylium compounds described in WO 2016 / 154782, squarylium compounds described in Japanese Patent No. 5884953, squarylium compounds described in Japanese Patent No. 6036689, squarylium compounds described in Japanese Patent No. 5810604, squarylium compounds described in paragraph 0 of WO 2017 / 213047, squarylium compounds described in ...9, squarylium compounds described in WO 2017 / 213049, squarylium compounds described in WO 2017 / 21304 JP-A-2018-054760, paragraphs 0019 to 0075, pyrrole ring-containing compounds described in JP-A-2018-040955, paragraphs 0078 to 0082, pyrrole ring-containing compounds described in JP-A-2018-002773, paragraphs 0043 to 0069, squarylium compounds having an aromatic ring at the amide α-position described in JP-A-2018-041047, paragraphs 0024 to 0086 compounds, amide-linked squarylium compounds described in JP-A-2017-179131, compounds having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in JP-A-2017-141215, dihydrocarbazole bis-type squarylium compounds described in JP-A-2017-082029, asymmetric compounds described in paragraphs 0027 to 0114 of JP-A-2017-068120, and pyrrole ring-containing compounds described in JP-A-2017-067963 A compound (carbazole type), a phthalocyanine compound described in Japanese Patent No. 6251530, a compound described in JP 2019-127549 A, a compound described in WO 2022 / 059619 A, a compound described in JP 2022-151682 A, a compound described in JP 2022-188858 A, a compound described in JP 2022-184710 A, a compound described in JP 2022-189736 A, and the like can also be used.

[0180] As another infrared absorber, tungsten oxide represented by the following formula described in paragraph 0025 of European Patent No. 3628645 can also be used: １ ａ M ２ｂ W ｃ O ｄ (P(O) ｎ R ｍ ) ｅ M １ , M ２ represents an ammonium cation or a metal cation, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, d is 2.5 to 3, e is 0.01 to 0.75, n is 1, 2 or 3, m is 1, 2 or 3, and R represents a hydrocarbon group which may have a substituent.

[0181] The composition of the present invention can be used in combination with other infrared absorbents.It is also preferable that the composition of the present invention is substantially free of other infrared absorbents.The phrase "the composition of the present invention is substantially free of other infrared absorbents" means that the content of other infrared absorbents in the total solid content of the composition of the present invention is 0.01 mass% or less, preferably 0.001 mass% or less, and more preferably no other infrared absorbents are contained.

[0182] <<Chromatic Colorant>> The composition of the present invention can contain a chromatic colorant. Examples of chromatic colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. The chromatic colorant may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment. Furthermore, the pigment may be a material in which an inorganic pigment or an organic-inorganic pigment is partially substituted with an organic chromophore. Substituting an inorganic pigment or an organic-inorganic pigment with an organic chromophore makes it easier to design the hue. Furthermore, the pigment used as the chromatic colorant may be a core-shell particle whose surface is coated with an inorganic material.

[0183] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined from an image photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment. In this specification, the average primary particle diameter is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, primary particles of the pigment refer to independent particles that are not aggregated.

[0184] The crystallite size of the pigment, determined from the half-width of a peak derived from any crystal plane in an X-ray diffraction spectrum obtained using CuKα radiation as an X-ray source, is preferably 0.1 to 100 nm, more preferably 0.5 to 50 nm, even more preferably 1 to 30 nm, and particularly preferably 5 to 25 nm.

[0185] The specific surface area of ​​the pigment is 1 to 300 m ２ / g. The lower limit is 10 m ２ / g or more, and ２ / g or more is more preferable. ２ / g or less, and ２ The value of the specific surface area can be determined according to the BET (Brunauer, Emmett and Teller) method in accordance with DIN 66131: Determination of the specific surface area of ​​solids by gas adsorption.

[0186] The chromatic colorant preferably contains a pigment. The content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of the pigment include the following.

[0187] Color Index (C.I.) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 13 8,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228,231,232 (methine-based), 233 (quinoline-based), 234 (aminoketone-based), 235 (aminoketone-based), 236 (aminoketone-based), etc. (all yellow pigments), C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (all orange pigments), C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294 (xanthene type, Organo Ultramarine, Bluish Red), 295 (monoazo type), 296 (diazo type),297 (aminoketone system) and the like (above, red pigments), C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine system), 65 (phthalocyanine system), 66 (phthalocyanine system) and the like (above, green pigments), C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane system), 61 (xanthene system) and the like (above, purple pigments), C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (all blue pigments).

[0188] As a green colorant, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used. Specific examples include the compounds described in WO 2015 / 118720. Furthermore, as a green colorant, the compounds described in paragraph 0029 of WO 2022 / 085485, the aluminum phthalocyanine compounds described in JP 2020-070426 A, and the diarylmethane compounds described in JP 2020-504758 A can also be used.

[0189] As the blue colorant, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraphs

[0022] to

[0030] of JP-A No. 2012-247591 and paragraph

[0047] of JP-A No. 2011-157478.

[0190] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of WO 2022 / 085485, the methine dyes described in JP-A 2019-073695, and the methine dyes described in JP-A 2019-073696 can be used.

[0191] As the red colorant, the compound described in paragraph 0034 of WO 2022 / 085485 and the brominated diketopyrrolopyrrole compound described in JP-A 2020-085947 can also be used.

[0192] Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes. Furthermore, the dyes can also include thiazole compounds described in JP-A-2012-158649, azo compounds described in JP-A-2011-184493, and azo compounds described in JP-A-2011-145540.

[0193] Examples of chromatic colorants include triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in JP 2020-117638 A, phthalocyanine compounds described in WO 2020 / 174991 A, isoindoline compounds or salts thereof described in JP 2020-160279 A, ​​compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069442 A, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730 A, and compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730 A. Compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069070, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in JP 2020-180176, phenothiazine compounds described in JP 2021-187913, halogenated zinc phthalocyanines described in WO 2022 / 004261, Halide zinc phthalocyanine described in Publication No. 2021 / 250883, quinophthalone compound represented by formula 1 of Korean Patent Publication No. 10-2020-0030759, polymer dye described in Korean Patent Publication No. 10-2020-0061793, colorant described in JP-A-2022-029701, isoindoline compound described in WO 2022 / 014635, aluminum phthalocyanine compound described in WO 2022 / 024926, compound described in JP 2022-045895, WO 2022 / 05005 Compounds described in JP-A-2020-090676, compounds described in JP-A-2020-055956, compounds described in JP-A-2021-031681, compounds described in JP-A-2022-056354, compounds described in US Patent Application Publication No. 2021 / 0355327, compounds described in WO 2022 / 065357, compounds described in JP-A-2020-045436, compounds described in Korean Patent Publication No. 10-2021-0146726, compounds described in JP-A-2018-178039,Compounds described in Chinese Patent Application Publication No. 113881244, compounds described in Chinese Patent Application Publication No. 113881245, compounds described in Chinese Patent Application Publication No. 113881246, compounds described in JP-A-2022-104822, compounds described in JP-A-2022-096701, compounds described in JP-A-2020-023652, green pigments described in Journal of the Color Materials Association (published in 2022) pages 80 to 84, compounds described in JP-A-2022-143135, compounds described in JP-A-2022-14 Compounds described in WO 2022 / 136308, perylene compounds described in Chinese Patent Application Publication No. 113061349, cyan pigments described in Korean Patent Publication No. 10-2017-0018993, isoindoline compounds described in JP 2020-180176, compounds described in JP 2023-013209, compounds described in JP 2023-013166, and xanthene compounds described in WO 2023 / 286526 can also be used. The chromatic colorant may be a rotaxane, and the dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-shaped structure, or in both structures.

[0194] When the composition of the present invention contains a chromatic colorant, the content of the chromatic colorant in the total solid content of the composition is preferably 1 to 50 mass %. When the composition of the present invention contains two or more chromatic colorants, the total amount thereof is preferably within the above range.

[0195] When the composition of the present invention is used for an infrared cut filter, it is preferable that the composition of the present invention is substantially free of a chromatic colorant. Note that, "the composition of the present invention is substantially free of a chromatic colorant" means that the content of the chromatic colorant in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no chromatic colorant.

[0196] <<Coloring material that transmits infrared light and blocks visible light>> The composition of the present invention may also contain a coloring material that transmits infrared light and blocks visible light (hereinafter also referred to as a coloring material that blocks visible light). A composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.

[0197] The coloring material that blocks visible light is preferably a coloring material that absorbs light in the violet to red wavelength region. Furthermore, the coloring material that blocks visible light is preferably a coloring material that blocks light in the wavelength region of 450 to 650 nm. Furthermore, the coloring material that blocks visible light is preferably a coloring material that transmits light in the wavelength region of 900 to 1500 nm. The coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B): (A): Contains two or more types of chromatic coloring agents, and forms black by combining two or more types of chromatic coloring agents. (B): Contains an organic black coloring agent.

[0198] Examples of chromatic colorants include those described above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include compounds described in JP-A-2010-534726, JP-A-2012-515233, and JP-A-2012-515234, and are available, for example, as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, C.I. Pigment Black 31, 32, and the like. Examples of the azomethine compound include compounds described in JP-A Nos. 01-170601 and 02-034664, and are available as "Chromofine Black A1103" manufactured by Dainichiseika Color & Chemicals Co., Ltd.

[0199] When a black color is formed by combining two or more chromatic colorants, the combination of chromatic colorants may include, for example, the following embodiments (1) to (8): (1) An embodiment containing a yellow colorant, a blue colorant, a violet colorant, and a red colorant; (2) An embodiment containing a yellow colorant, a blue colorant, and a red colorant; (3) An embodiment containing a yellow colorant, a violet colorant, and a red colorant; (4) An embodiment containing a yellow colorant and a violet colorant; (5) An embodiment containing a green colorant, a blue colorant, a violet colorant, and a red colorant; (6) An embodiment containing a violet colorant and an orange colorant; (7) An embodiment containing a green colorant, a violet colorant, and a red colorant; (8) An embodiment containing a green colorant and a red colorant.

[0200] When the composition of the present invention contains a coloring material that blocks visible light, the content of the coloring material that blocks visible light in the total solid content of the composition is preferably 1 to 50 mass %. The lower limit is preferably 5 mass % or more, more preferably 10 mass % or more, even more preferably 20 mass % or more, and particularly preferably 30 mass % or more.

[0201] When the composition of the present invention is used for an infrared cut filter, it is preferable that the composition of the present invention is substantially free of a coloring material that blocks visible light. Here, "the composition of the present invention is substantially free of a coloring material that blocks visible light" means that the content of the coloring material that blocks visible light in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no coloring material that blocks visible light.

[0202] <<Surfactant>> The composition of the present invention may contain a surfactant. As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant may be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. For details of the surfactant, reference may be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015 / 166779, the contents of which are incorporated herein by reference.

[0203] As the fluorine-based surfactant, the compounds described in paragraphs 0167 to 0173 of WO 2022 / 085485 can be used.

[0204] Examples of nonionic surfactants include the compounds described in paragraph 0174 of WO 2022 / 085485.

[0205] Examples of silicone surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419. OIL (all manufactured by Dow Toray Industries, Inc.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie). As the silicone surfactant, compounds having the following structure can also be used.

[0206] The content of the surfactant in the total solid content of the composition is preferably 0.001 to 5% by mass. The lower limit is preferably 0.005% by mass or more. The upper limit is preferably 3% by mass or less, more preferably 1% by mass or less, even more preferably 0.5% by mass or less, and particularly preferably 0.2% by mass or less. The composition may contain only one type of surfactant, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0207] <<Polymerization Inhibitor>> The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), with p-methoxyphenol being preferred. The content of the polymerization inhibitor in the total solids content of the composition is preferably 0.0001 to 5 mass%. The composition may contain only one type of polymerization inhibitor, or two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0208] <<Silane Coupling Agent>> The composition of the present invention can contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, and more preferably a silane compound having a hydrolyzable group and other functional groups. The hydrolyzable group refers to a substituent directly bonded to a silicon atom that can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, with an alkoxy group being preferred. The silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of functional groups other than the hydrolyzable group include a vinyl group, a styryl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, with a (meth)acryloyl group and an epoxy group being preferred. Examples of silane coupling agents include the compounds described in paragraph 0177 of WO 2022 / 085485 and the compounds described in JP 2019-183020 A. The content of the silane coupling agent in the total solid content of the composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

[0209] <<Ultraviolet Absorber>> The composition of the present invention may contain an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, and dibenzoyl compounds. Specific examples of such compounds include the compounds described in paragraphs 0038 to 0052 of JP 2009-217221 A, paragraphs 0052 to 0072 of JP 2012-208374 A, paragraphs 0317 to 0334 of JP 2013-068814 A, paragraphs 0061 to 0080 of JP 2016-162946 A, paragraphs 0052 and 0074 of WO 2021 / 131355, and paragraphs 0022 to 0024 of WO 2021 / 132247, the contents of which are incorporated herein by reference. Commercially available ultraviolet absorbers include the Tinuvin series and Uvinul (Uvinal) series manufactured by BASF Corporation. Further, examples of benzotriazole compounds include the MYUA series manufactured by Miyoshi Oil & Fats (The Chemical Daily, February 1, 2016). The ultraviolet absorber may also be the compounds described in the Examples below, or the compounds described in paragraphs 0049-0059 of Japanese Patent No. 6268967 and paragraphs 0059-0076 of International Publication No. 2016 / 181987. The content of the ultraviolet absorber in the total solids content of the composition is preferably 0.01 to 30% by mass. The lower limit is preferably 0.05% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, even more preferably 10% by mass or less, and particularly preferably 5% by mass or less. The composition may contain only one type of ultraviolet absorber, or two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0210] <<Antioxidant>> The composition of the present invention may contain an antioxidant. Examples of antioxidants include phenolic antioxidants, amine antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of phenolic antioxidants include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxy group (ortho position). The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330, ADK STAB AO-412S, ADK STAB 2112, ADK STAB PEP-36, ADK STAB HP-10 (all manufactured by ADEKA Corporation), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). The antioxidant may be a compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, a compound described in International Publication No. WO 2017 / 006600, a compound described in International Publication No. WO 2017 / 164024, or a compound described in Korean Patent Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the composition is preferably 0.01 to 20% by mass. The lower limit is preferably 0.3% by mass or more, and more preferably 0.5% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less.The composition may contain only one antioxidant or two or more antioxidants. When two or more antioxidants are contained, the total amount thereof is preferably within the above range.

[0211] <<Other Components>> The composition of the present invention may contain, as necessary, sensitizers, fillers, heat curing accelerators, plasticizers, and other auxiliaries (e.g., conductive particles, antifoaming agents, flame retardants, leveling agents, release accelerators, fragrances, surface tension modifiers, chain transfer agents, latent antioxidants, etc.). By appropriately incorporating these components, properties such as film physical properties can be adjusted. As these components, compounds described in paragraph 0182 of WO 2022 / 085485 can be used.

[0212] From the viewpoint of environmental regulations, the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts may be restricted. When the content of the above-mentioned compounds in the composition of the present invention is reduced, the content of perfluoroalkyl sulfonic acids (particularly perfluoroalkyl sulfonic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts, and perfluoroalkyl carboxylic acids (particularly perfluoroalkyl carboxylic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts is preferably in the range of 0.01 ppb to 1000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, based on the total solids content of the composition. The composition of the present invention may be substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. For example, by using a compound that can replace perfluoroalkyl sulfonic acid and its salt, and a compound that can replace perfluoroalkyl carboxylic acid and its salt, a composition that is substantially free of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt may be selected. Examples of compounds that can replace restricted compounds include compounds that are exempt from restrictions due to differences in the number of carbon atoms in the perfluoroalkyl group. However, the above does not preclude the use of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt. The composition of the present invention may contain perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt within the maximum allowable range.

[0213] From the viewpoint of environmental regulations, the content of the fluorine-containing compound in the composition may be 5% by mass or less, 1% by mass or less, 100 ppm by mass or less, or 1 ppm by mass or less, or may be substantially free of the fluorine-containing compound.

[0214] The composition of the present invention preferably has a free metal content of 100 ppm by mass or less, more preferably 50 ppm by mass or less. The free halogen content is preferably 100 ppm by mass or less, more preferably 50 ppm by mass or less. Methods for reducing the free metals and halogens in the composition include washing with ion-exchanged water, filtration, ultrafiltration, purification with an ion-exchange resin, and purification with an inorganic adsorbent such as hydrotalcite.

[0215] <Storage container> The storage container for the composition of the present invention is not particularly limited, and a known storage container can be used. In addition, the container described in paragraph 0187 of WO 2022 / 085485 can be used as the storage container.

[0216] <Method for Preparing Composition> The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all components may be simultaneously dissolved or dispersed in a solvent to prepare the composition, or, if necessary, two or more solutions or dispersions in which the respective components are appropriately blended may be prepared in advance, and these may be mixed at the time of use (at the time of application) to prepare the composition.

[0217] The preparation of the composition may include a process for dispersing the pigment. In the process for dispersing the pigment, mechanical forces used to disperse the pigment include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. Furthermore, when grinding the pigment in a sand mill (bead mill), it is preferable to use small-diameter beads, increase the bead packing ratio, or otherwise increase the grinding efficiency under such conditions. Furthermore, it is preferable to remove coarse particles after the grinding process by filtration, centrifugation, or the like. In addition, the process and disperser for dispersing pigments can be suitably used, for example, the process and disperser described in "Dispersion Technology Encyclopedia," published by Joho Kiko Co., Ltd., July 15, 2005, or "Dispersion Technology and Industrial Applications Focused on Suspension (Solid / Liquid Dispersion System) - Comprehensive Data Collection," published by the Management Development Center Publishing Department, October 10, 1978, or paragraph 0022 of JP 2015-157893 A. In addition, in the process for dispersing pigments, the pigment may be subjected to a salt milling process to refine the pigment. For details on the materials, equipment, processing conditions, etc. used in the salt milling process, see, for example, JP 2015-194521 A and JP 2012-046629 A. Examples of materials for beads used in dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of an inorganic compound having a Mohs hardness of at least 2. The composition may contain 1 to 10,000 ppm of the beads.

[0218] When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter, reducing defects, etc. Examples of the types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022 / 085485.

[0219] <Film> Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, but examples include infrared cut filters and infrared transmission filters. Examples of infrared cut filters include infrared cut filters on the light-receiving side of a solid-state imaging device (e.g., as an infrared cut filter for a wafer-level lens), infrared cut filters on the back side (opposite the light-receiving side) of a solid-state imaging device, and infrared cut filters for ambient light sensors (e.g., an illuminance sensor that senses the illuminance and color tone of the environment in which an information terminal device is placed and adjusts the color tone of the display, or a color correction sensor that adjusts the color tone). In particular, it can be preferably used as an infrared cut filter on the light-receiving side of a solid-state imaging device. Examples of infrared transmission filters include filters that block visible light and selectively transmit infrared rays of a specific wavelength or more.

[0220] The film of the present invention may have a pattern or may be a film without a pattern (flat film). The film of the present invention may be used by being laminated on a support, or may be used by being peeled off from the support. Examples of the support include semiconductor substrates such as silicon substrates and transparent substrates.

[0221] A charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a photoelectric conversion layer, a transparent conductive film, or the like may be formed on the semiconductor substrate used as a support. Furthermore, a partition wall is formed on the semiconductor substrate to separate each pixel. Examples of the partition wall include a metal, a metal oxide, and a black matrix. Furthermore, if necessary, an undercoat layer may be provided on the semiconductor substrate to improve adhesion with an upper layer, prevent diffusion of substances, or flatten the substrate surface.

[0222] The transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light. Examples of substrates include substrates made of glass, resin, and the like. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.).

[0223] The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more.

[0224] When the film of the present invention is used as an infrared cut filter, it is preferable that the film of the present invention has a maximum absorption wavelength in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). Furthermore, the average transmittance in the wavelength range of 700 to 720 nm is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. Furthermore, the average transmittance in the wavelength range of 400 to 550 nm is preferably 86% or more, more preferably 89% or more, even more preferably 92% or more, and particularly preferably 95% or more. Furthermore, the transmittance over the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more. The transmittance at at least one point in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. Furthermore, when the absorbance at the maximum absorption wavelength of the film of the present invention is taken as 1, the average absorbance in the wavelength range of 400 to 550 nm is preferably less than 0.030, more preferably less than 0.025.

[0225] When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention has, for example, any one of the following spectral characteristics (i1) to (i3). (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with wavelengths longer than 950 nm. (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with wavelengths longer than 1050 nm. (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with wavelengths longer than 1150 nm.

[0226] The film of the present invention can also be used in combination with a color filter containing a chromatic colorant. The color filter can be produced using a coloring composition containing a chromatic colorant. When the film of the present invention is used as an infrared cut filter and is used in combination with the film of the present invention and a color filter, it is preferable that the color filter is arranged on the optical path of the film of the present invention. For example, it is preferable to use the film of the present invention and a color filter stacked together to form a laminate. In the laminate, the film of the present invention and the color filter may or may not be adjacent to each other in the thickness direction. When the film of the present invention and the color filter are not adjacent to each other in the thickness direction, the film of the present invention may be formed on a support other than the support on which the color filter is formed, and other members constituting a solid-state imaging device (e.g., microlenses, planarization layers, etc.) may be interposed between the film of the present invention and the color filter.

[0227] The film of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors) (the imaging section can be made of compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc., in addition to Si), infrared sensors, light-emitting elements, optical communication devices (for both transmission and reception), and image display devices.

[0228] <Method for Producing Film> The film of the present invention can be produced through a step of applying the composition of the present invention.

[0229] Examples of the support include those described above. As a method for applying the composition, a known method such as spin coating can be used. For example, the application method described in paragraph 0207 of WO 2022 / 085485 can be used.

[0230] The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or can be 80°C or higher. The prebaking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

[0231] The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferred. Note that when the film of the present invention is used as a flat film, the step of forming a pattern does not need to be performed. The step of forming a pattern will be described in detail below.

[0232] (When forming a pattern by photolithography) The pattern formation method by photolithography preferably includes a step of patternwise exposing a composition layer formed by applying the composition of the present invention (exposure step), and a step of developing and removing the unexposed portions of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

[0233] In the exposure step, the composition layer is exposed to light in a pattern. For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like, through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0234] Examples of radiation (light) that can be used for exposure include g-line and i-line. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), with KrF line (wavelength 248 nm) being preferred. Long-wave light sources of 300 nm or more can also be used.

[0235] The exposure may be performed by continuous irradiation with light or by pulsed irradiation (pulse exposure), which is an exposure method in which light irradiation and pauses are repeated in short cycles (for example, milliseconds or less).

[0236] The irradiation amount (exposure amount) is, for example, 0.03 to 2.5 J / cm ２ is preferred, and 0.05 to 1.0 J / cm ２ The oxygen concentration during exposure can be appropriately selected. In addition to exposure in the atmosphere, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). The exposure illuminance can be appropriately set, and is usually 1000 W / m ２ ~100000W / m ２ (For example, 5000 W / m ２ , 15000W / m ２ , or 35,000 W / m ２ The oxygen concentration and exposure illuminance may be appropriately combined. For example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m ２ , oxygen concentration 35% by volume, illuminance 20,000 W / m ２ etc.

[0237] Next, the unexposed portions of the composition layer after exposure are developed and removed to form a pattern. The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, and only the photocured portions remain on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. Furthermore, to improve residue removability, the process of shaking off the developer every 60 seconds and then supplying fresh developer may be repeated several times.

[0238] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. Regarding the developer and the washing (rinsing) method after development, the developer and washing method described in paragraph 0214 of WO 2022 / 085485 can be used.

[0239] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). The additional exposure treatment or post-baking is a post-development curing treatment to ensure complete curing. The heating temperature in post-baking is preferably, for example, 100 to 240°C, more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to achieve the above conditions for the developed film. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may also be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0240] (When forming a pattern by a dry etching method) Pattern formation by a dry etching method can be performed by a method such as applying the composition to a support to form a composition layer, curing the formed composition layer to form a cured layer, then forming a patterned photoresist layer on the cured layer, and then dry etching the cured layer using an etching gas as a mask. In forming the photoresist layer, it is preferable to perform a pre-bake treatment. For pattern formation by a dry etching method, the description in paragraphs 0010 to 0067 of JP 2013-064993 A can be referred to, and the contents thereof are incorporated herein by reference.

[0241] <Optical Filter> The optical filter of the present invention has the above-described film of the present invention. Types of optical filters include infrared cut filters and infrared transmission filters.

[0242] In addition to the above-described film of the present invention, the optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc. Examples of ultraviolet absorbing layers include the absorbing layers described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015 / 099060. Examples of dielectric multilayer films include the dielectric multilayer films described in paragraphs 0255 to 0259 of Japanese Patent Application Laid-Open No. 2014-041318. Examples of copper-containing layers include glass substrates made of copper-containing glass (copper-containing glass substrates) and layers containing copper complexes (copper complex-containing layers). Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass products include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, and BG-61 (all manufactured by Schott Corporation), and CD5000 (manufactured by HOYA Corporation).

[0243] The optical filter of the present invention may be formed on a support. Examples of the support include those described above. Preferred substrates include transparent substrates made of materials such as glass and resin. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Furthermore, the optical filter may be formed directly on various elements.

[0244] <Solid-state imaging device> The solid-state imaging device of the present invention has the above-described film of the present invention. The configuration of the solid-state imaging device is not particularly limited as long as it has a configuration having the film of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

[0245] The solid-state imaging device has a support on which a plurality of photodiodes constituting a light-receiving area and transfer electrodes made of polysilicon or the like are disposed; a light-shielding film made of tungsten or the like is disposed on the photodiodes and transfer electrodes, with only the light-receiving portions of the photodiodes being opened; a device protective film made of silicon nitride or the like is disposed on the light-shielding film so as to cover the entire light-shielding film and the light-receiving portions of the photodiodes; and a film of the present invention is disposed on the device protective film. Furthermore, the device protective film may have a light-focusing means (e.g., a microlens, etc.; the same applies hereinafter) disposed below the film of the present invention (on the side closer to the support), or a light-focusing means disposed on the film of the present invention. Furthermore, the color filter may have a structure in which a film forming each pixel is embedded in a space partitioned, for example, in a lattice pattern, by partition walls. In this case, the partition walls preferably have a lower refractive index than each pixel. Examples of imaging devices having such a structure include the devices described in JP 2012-227478 A and JP 2014-179577 A.

[0246] <Image Display Device> The image display device of the present invention has the film of the present invention. Examples of image display devices include liquid crystal display devices and organic electroluminescence (organic EL) display devices. Definitions and details of image display devices are described, for example, in "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Nobuaki Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). Liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). There are no particular limitations on the liquid crystal display device to which the present invention can be applied, and the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology." The image display device may have a white organic EL element. The white organic EL element preferably has a tandem structure. The tandem structure of organic EL elements is described in, for example, JP 2003-045676 A and Akiyoshi Mikami, editor, "The Frontline of Organic EL Technology Development - High Brightness, High Precision, Long Life, and Know-How Collection," Technical Information Association, pp. 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), green region (530-580 nm), and yellow region (580-620 nm). It is more preferable that the spectrum has a maximum emission peak in the red region (650-700 nm) in addition to these emission peaks. The film of the present invention can also be used as an infrared-transmitting film provided in an opening for infrared communication formed in the frame portion of a protective plate for a display device.

[0247] <Infrared Sensor> The infrared sensor of the present invention has the above-described film of the present invention. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

[0248] 1 , reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on an imaging region of the solid-state imaging element 110. A color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

[0249] The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of specific wavelengths in the visible range, and is not particularly limited, and a conventionally known color filter for forming pixels can be used. For example, a color filter formed with red (R), green (G), and blue (B) pixels can be used. For example, the description in paragraphs 0214 to 0263 of JP 2014-043556 A can be referred to, and the contents of this specification are incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0250] In the infrared sensor shown in FIG. 1 , an infrared cut filter (another infrared cut filter) other than the infrared cut filter 111 may be disposed on the planarization layer 116. Examples of the other infrared cut filter include those having a copper-containing layer and / or a dielectric multilayer film. Details of these filters are as described above. Furthermore, a dual bandpass filter may be used as the other infrared cut filter.

[0251] <Camera Module> The camera module of the present invention has the above-described film of the present invention. The configuration of the camera module is not particularly limited as long as it has a configuration including the film of the present invention and functions as a camera module. For example, a camera module can be configured to have a solid-state image sensor, a lens, and a circuit for processing images obtained from the solid-state image sensor. Known lenses and circuits for processing images obtained from the solid-state image sensor used in the camera module can be used. Examples of camera modules include the camera modules described in JP 2016-006476 A and JP 2014-197190 A, the contents of which are incorporated herein by reference.

[0252] <Light-emitting element> The film of the present invention can also be used for a light-emitting element. The configuration of the light-emitting element is not particularly limited as long as it functions as a light-emitting element, and examples thereof include light-emitting diodes (LEDs), organic light-emitting diodes (OLEDs), quantum dot light-emitting diodes (QLEDs), and vertical-cavity surface-emitting lasers (VISELs). The film of the present invention may be formed directly on the light-emitting element, or may be disposed on the light-emitting path.

[0253] <Optical Communication Element> The film of the present invention can also be used in an optical communication element. The configuration of the optical communication element is not particularly limited as long as it functions as an optical communication element, and it may be a transmitting element or a receiving element. Examples of optical communication elements include infrared remote controls, infrared transceivers, optical interposers, and optical interconnections. The film of the present invention may be formed directly on a receiving element, or may be formed directly on a transmitting element, or may be disposed on a transmitting / receiving path.

[0254] The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, treatment details, treatment procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. In the structural formulas shown below, pH represents a phenyl group.

[0255] <Production of Core-Shell Particles> (Production of Core-Shell Particles P-1) The pigment powder shown in the column for core material in the table below was placed in an ALD (Atomic Layer Deposition) chamber (Suga Manufacturing Co., Ltd., SAL100B), and ３ Gas was introduced into the chamber to form hydroxy groups on the surface of the pigment powder. Next, bisethylmethylsilane (BEMAS) gas was introduced into the chamber as a precursor gas, and the hydroxy groups formed on the surface of the pigment powder reacted with BEMAS. After that, excess gas was exhausted. Next, O ３ By introducing gas, BEMAS and O, which were bonded to the hydroxyl group in the previous reaction, ３ Then, the excess gas was exhausted. Then, the introduction and exhaust of BEMAS gas, the O ３ The introduction and exhaust of gas constitute one cycle, and the above cycle is repeated until the thickness shown in the coating thickness column of the table below is reached, forming SiO on the surface of the pigment powder. ２ A layer (shell portion) was formed to obtain core-shell particles P-1. The chamber temperature was 250°C, the raw material bottle temperature was 60°C, and the substrate rotation speed was 5 rpm. The identity of the obtained particles as core-shell particles was confirmed by combining elemental analysis with a scanning electron microscope (SEM) and sputtering to confirm the composition distribution in the particle depth direction.

[0256] (Production of Core-Shell Particles P-2 to P-10, P-13 to P-16, and P-c1) Core-shell particles P-2 to P-10 and P-13 to P-15 were produced in the same manner as for core-shell particle P-1, except that the type of pigment powder, the type of precursor gas, and the number of cycles were changed.

[0257] (Production of Core-Shell Particles P-11, P-12, and P-r1) The pigment powder shown in the column for core material in the table below was placed in pure water and stirred, and then aluminum chloride hexahydrate was added to the core-shell particles in an amount of 1:1 based on the weight of the pigment powder. ２ O ３ The resulting solution was stirred for 1 hour at 85° C. After that, caustic soda was added to adjust the pH to 9, and the solution was stirred for 1 hour at 85° C. to coat the surface of the pigment powder with an Al coating having a thickness shown in the coating thickness column in the table below. ２ O ３After repeated decantation washing (washing with water), the particles were dried to obtain core-shell particles P-11, P-12, and P-r1.

[0258] <Measurement of Weight Loss Rate> 0.01 parts by mass of core-shell particles were immersed in 100 parts by mass of chloroform, and after immersion for 1 hour at room temperature while stirring with a stirrer, the core-shell particles were recovered by centrifugal sedimentation. Recovery by centrifugal sedimentation was carried out using a tabletop ultracentrifuge (Optima Max-XP, manufactured by Beckman Coulter) at 25°C, 150,000 rpm, and for 5 hours. The weights of the core-shell particles before and after immersion in the solvent were measured, and the weight loss rate of the core-shell particles was calculated using the following formula. Chloroform is a solvent in which the dissolution amount of the pigment described in the column for core member at 25°C is 0.1 g / L or more. Weight loss rate (%) = |1 - (M ２ / M １ ) | x 100 M １ is the mass of the core-shell particle before immersion in the solvent, and M ２ is the mass of the core-shell particles after immersion in the solvent. 6: Weight loss rate (%) is 1% or less 5: Weight loss rate (%) is greater than 1% and less than 3% 4: Weight loss rate (%) is greater than 3% and less than 5% 3: Weight loss rate (%) is greater than 5% and less than 10% 2: Weight loss rate (%) is greater than 10% and less than 20% 1: Weight loss rate (%) is greater than 20%

[0259] <Measurement of Maximum Absorption Wavelength> The maximum absorption wavelength of the core-shell particles and pigment was determined by performing spectroscopic measurement in the wavelength range of 400 to 2000 nm on a film in which each core-shell particle and pigment was dispersed using a spectrophotometer (MSV-5700, manufactured by JASCO Corporation), and the wavelength of the peak top present at the longest wavelength within the range was determined as the maximum absorption wavelength. The film used for measuring the maximum absorption wavelength was a composition based on the composition of Example 1 described below, in which only the particles were replaced with the same amount of core-shell particles or pigment. Each composition was applied to a glass substrate using a spin coater (manufactured by Mikasa Co., Ltd.) so that the film thickness after pre-baking would be 0.8 μm, to form a coating film. Next, the film was heated (pre-baked) at 100° C. for 120 seconds using a hot plate, and then exposed to 1000 mJ / cm using an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Corporation). ２ After the entire surface was exposed to an exposure amount of 1000 nm, the film was again heated (post-baked) at 200° C. for 300 seconds using a hot plate, and the film thus formed was used. A: The maximum absorption wavelength is greater than 900 nm. B: The maximum absorption wavelength is 900 nm or less.

[0260]

[0261] (Core Materials) A-ppb-1: Compound having the following structure (infrared absorbing organic pigment, maximum absorption wavelength exceeding 900 nm, pyrrolopyrrole compound) IR2: Compound having the following structure (infrared absorbing organic pigment, maximum absorption wavelength exceeding 900 nm, squarylium compound) IR3: Compound having the following structure (infrared absorbing organic pigment, maximum absorption wavelength exceeding 900 nm, indigo compound) IR4: Compound having the following structure (infrared absorbing organic pigment, maximum absorption wavelength exceeding 900 nm, diiminium compound) IR5: Compound having the following structure (infrared absorbing organic pigment, maximum absorption wavelength exceeding 900 nm, polymethine compound)

[0262] PR254: C.I. Pigment Red 254 (red pigment, chromatic organic pigment, maximum absorption wavelength is less than 700 nm)

[0263] <Preparation of Dispersion Liquid> The pigments, derivatives, dispersing resins, and solvents of the types shown in the table below were mixed in the parts by mass shown in the table below, and 117 parts by mass of zirconia beads having a diameter of 0.3 mm were further added. A dispersion treatment was carried out for 5 hours using a paint shaker, and the beads were separated by filtration to prepare a dispersion liquid.

[0264]

[0265] The materials listed in the table above are as follows:

[0266] (Pigments) P-11 to P-16, P-r1, P-c1: the above-mentioned core-shell particles P-11 to P-16, P-r1, P-c1 PB15:6: C.I. Pigment Blue 15:6 (blue pigment) A-ppb-1: the above-mentioned compound A-ppb-1 (infrared absorbing organic pigment, maximum absorption wavelength exceeds 900 nm)

[0267] (Derivatives) Sy-1 and Sy-2: Compounds having the following structures

[0268] (Dispersion Resin) D-1: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 20,000, acid value: 36 mg KOH / g, amine value: 47 mg KOH / g) D-2: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 12,000, acid value: 99.6 mg KOH / g, amine value: 108.9 mg KOH / g) D-3: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 20,000, acid value: 74.7 mgKOH / g) D-4: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 20,000, acid value: 61.8 mgKOH / g)

[0269] (Solvents) S-1: Propylene glycol monomethyl ether acetate (PGMEA) S-2: Propylene glycol monomethyl ether (PGME) S-3: Cyclopentanone

[0270] <Preparation of Composition> The materials shown in the table below were mixed in the parts by mass shown in the table below, respectively, and stirred. The mixture was then filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to prepare a composition.

[0271]

[0272]

[0273]

[0274]

[0275] The materials listed in the table above are as follows:

[0276] (Dispersion) Dispersion 1 to 22, r1, r2, c1, c2: the above-mentioned dispersions 1 to 22, r1, r2, c1, c2

[0277] (Resin) B-1: Resin having the following structure (the numerical values ​​attached to the main chain are the molar ratios of repeating units, weight average molecular weight 30,000, acid value 112.8 mgKOH / g) B-2: Resin having the following structure (the numbers attached to the main chain are the molar ratios of repeating units, weight average molecular weight 11,000, acid value 31.8 mgKOH / g) B-3: Resin having the following structure (the numbers attached to the main chain are the molar ratios of repeating units, weight average molecular weight 14,000, acid value 79.3 mgKOH / g)

[0278] (Polymerizable monomer) M-1: M-305 (manufactured by Toagosei Co., Ltd.) M-2: NK ester A-DPH-12E (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) M-3: M-521 (manufactured by Toagosei Co., Ltd.)

[0279] (Photopolymerization initiator) I-1: Irgacure OXE01 (manufactured by BASF, oxime compound) I-2: Irgacure OXE02 (manufactured by BASF, oxime compound) I-3: ADEKA Arcles NCI-831 (manufactured by ADEKA Corporation, oxime compound) I-4: Omnirad 2959 (manufactured by IGM Resins B.V., α-hydroxyketone compound)

[0280] (Surfactants) Su-1: KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., silicone surfactant) Su-2: SH8400 (manufactured by Dow-Toray Industries, Inc., silicone surfactant)

[0281] (Additives) A-1: ​​p-methoxyphenol (polymerization inhibitor) A-2: Compound having the following structure (ultraviolet absorber) A-3: Avobenzone (ultraviolet absorber) A-4: Adekastab AO-80 (manufactured by ADEKA Corporation, antioxidant) A-5: Adekastab LA-82 (manufactured by ADEKA Corporation, antioxidant) A-6: EHPE3150 (manufactured by Daicel Corporation, epoxy compound) A-7: Denacol EX-614 (Nagase ChemteX Corporation, epoxy compound) A-8: Compound having the following structure (silane coupling agent) A-9: KBM-502 (Shin-Etsu Chemical Co., Ltd., silane coupling agent)

[0282] (Solvents) S-1: Propylene glycol monomethyl ether acetate (PGMEA) S-2: Propylene glycol monomethyl ether (PGME) S-3: Cyclopentanone

[0283] <Evaluation of Light Resistance> Each composition was applied to a glass substrate using a spin coater (manufactured by Mikasa Co., Ltd.) to form a coating film so that the film thickness after pre-baking would be 0.8 μm. Next, the coating film was heated (pre-baked) at 100° C. for 120 seconds using a hot plate, and then exposed to 1000 mJ / cm using an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Corporation). ２ After the entire surface was exposed to light with an exposure amount of 1000 nm, the film was again heated at 200° C. for 300 seconds (post-baking) using a hot plate to obtain a film.２ After forming a 100 nm thick vapor-deposited film, the film was placed in a light resistance tester (illuminance 5,000 Lx, temperature 50°C, humidity 50%) for 3 months to carry out a light resistance test. The spectroscopic characteristics of the film before and after the light resistance test were measured using a spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation), and the absorbance retention was calculated using the following formula, and the light resistance was evaluated according to the following criteria. Absorbance retention = (absorbance A ２ / absorbance A １ )×100 Absorbance A １ : The absorbance of the film before the light resistance test, which is the absorbance at the maximum absorption wavelength (λa nm) which is the longest wavelength in the wavelength range of 400 to 2000 nm. Absorbance A ２ : The absorbance of the film after the light resistance test, absorbance A １ Absorbance at the wavelength (λa nm) measured 5: Absorbance retention rate exceeds 95% 4: Absorbance retention rate is more than 90% but not more than 95% 3: Absorbance retention rate is more than 85% but not more than 90% 2: Absorbance retention rate is more than 50% but not more than 85% 1: Absorbance retention rate is 50% or less

[0284] <Evaluation of Moisture Resistance> Each composition was applied to a glass substrate using a spin coater (manufactured by Mikasa Co., Ltd.) to form a coating film so that the film thickness after pre-baking would be 0.8 μm. Next, the coating film was heated (pre-baked) at 100° C. for 120 seconds using a hot plate, and then exposed to 1000 mJ / cm using an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Corporation). ２ After the entire surface was exposed to light with an exposure amount of 1000 nm, the film was again heated (post-baked) at 200°C for 300 seconds using a hot plate to obtain a film. The obtained film was placed in an incubator at 85°C and 95% humidity and stored for 3 months to undergo a moisture resistance test. The spectroscopic characteristics of the film before and after the moisture resistance test were measured using a spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation), and the absorbance retention was calculated using the following formula, and the moisture resistance was evaluated according to the following criteria. Absorbance retention = (absorbance A １２ / absorbance A １１ )×100 Absorbance A １１ : The absorbance of the film before the moisture resistance test, which is the absorbance at the maximum absorption wavelength (λa nm) that is the longest wavelength in the wavelength range of 400 to 2000 nm. Absorbance A １２: The absorbance of the film after the moisture resistance test, absorbance A １ Absorbance at the wavelength (λa nm) measured 5: Absorbance retention rate exceeds 95% 4: Absorbance retention rate is more than 90% but not more than 95% 3: Absorbance retention rate is more than 85% but not more than 90% 2: Absorbance retention rate is more than 50% but not more than 85% 1: Absorbance retention rate is 50% or less

[0285] <Evaluation of Spectral Characteristics> Each composition was applied to a glass substrate using a spin coater (manufactured by Mikasa Co., Ltd.) to form a coating film so that the film thickness after post-baking would be 0.8 μm. Next, the coating film was heated (pre-baked) at 100° C. for 120 seconds using a hot plate, and then exposed to 1000 mJ / cm using an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Corporation). ２ After the entire surface was exposed to an exposure amount of 1000 nm, the film was again heated (post-baked) at 200°C for 300 seconds using a hot plate to obtain a film. The spectral characteristics of the obtained film were measured using a spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation). From the measured values, the absorbance A at the maximum absorption wavelength, which is the longest wavelength in the wavelength range of 400 to 2000 nm, was ２１ The absorbance A at the maximum absorption wavelength, which is the longest wavelength in the wavelength range of 400 to 2000 nm, was determined in the same manner using compositions in which the core-shell particles contained in each composition were replaced with uncoated pigment. ２２ The spectral performance was evaluated according to the following criteria: A: A ２１ / A ２２ is 2.0 or less B: A ２１ / A ２２ is greater than 2.0 and less than or equal to 3.0 C:A ２１ / A ２２ is greater than 3.0

[0286]

[0287] As shown in the above table, the examples were excellent in light resistance and moisture resistance.

[0288] 110: solid-state imaging element, 111: infrared cut filter, 112: color filter, 114: infrared transmission filter, 115: microlens, 116: planarization layer

Claims

1. A core-shell particle having a core portion and a shell portion covering a surface of the core portion, wherein the core portion contains an infrared absorbing organic pigment, and the shell portion contains an inorganic material, and the core-shell particle satisfies the following condition 1; condition 1: after immersing 0.01 part by mass of the core-shell particle for 1 hour in 100 parts by mass of a solvent selected from o-dichlorobenzene, N-methyl-2-pyrrolidone, chloroform, cyclohexanone, dimethylacetamide, and carbon disulfide, in which the solubility of the infrared absorbing organic pigment at 25° C. is 0.1 g / L or more, the core-shell particle is recovered by centrifugal sedimentation, and the weight loss rate calculated from the following formula is 10% or less; weight loss rate (%)=|1-(M ２ / M １ ) | x 100 M １ is the mass of the core-shell particle before immersion in the solvent, and M ２ is the mass of the core-shell particle after immersion in the solvent.

2. The core-shell particle according to claim 1, wherein the shell portion is formed by atomic layer deposition.

3. The core-shell particle according to claim 1 or 2, wherein the shell portion is an oxide or nitride containing an element selected from the group consisting of Si, Ti, Hf, Al, Zr, Ta and Ru.

4. The core-shell particle according to claim 1 or 2, wherein the shell portion has a thickness of 1 to 20 nm.

5. The core-shell particle according to claim 1 or 2, wherein the infrared absorbing organic pigment is at least one selected from the group consisting of pyrrolopyrrole compounds, squarylium compounds, croconium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, naphthalocyanine compounds, diiminium compounds, dithieno compounds, quinoid compounds and rylene compounds.

6. The core-shell particle according to claim 1 or 2, wherein the infrared absorbing organic pigment has a maximum absorption wavelength in the wavelength range of 800 to 2000 nm.

7. The core-shell particle according to claim 1 or 2, wherein the core-shell particle has a maximum absorption wavelength in the wavelength range of 800 to 2000 nm.

8. The core-shell particles according to claim 1 or 2, wherein the average particle size of the core-shell particles is 100 nm or less.

9. A composition comprising the core-shell particles according to claim 1 and a solvent.

10. The composition of claim 9 further comprising a resin.

11. The composition according to claim 9 or 10, further comprising a polymerizable compound and a photopolymerization initiator.

12. A film obtained using the composition according to claim 9.

13. An optical filter having the film according to claim 12.

14. A solid-state imaging device having the film according to claim 12.

15. An image display device having the film according to claim 12.

16. An infrared sensor having a film according to claim 12.

17. A method for producing core-shell particles having a core portion and a shell portion covering the surface of the core portion, comprising forming a film containing an inorganic material by atomic layer deposition on the surface of the core portion containing an infrared absorbing organic pigment to form the shell portion.

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