Atomization core, atomizer, and electronic atomization device

Abstract

The present application relates to the technical field of electronic atomization devices, and relates in particular to an atomization core, an atomizer, and an electronic atomization device. The atomization core provided in the present application comprises a porous substrate, a heating element, and a transition layer bonded between the porous substrate and the heating element. The transition layer contains an inorganic material component. The atomization core provided in the present application has excellent service life, and avoids issues such as dry burning.

Description

Atomizing core, atomizer and electronic atomizing device

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to the Chinese patent application filed with the China Patent Office on August 17, 2023, with application number 202311040870.7 and invention name “A kind of atomizing core, atomizer and electronic atomizing device”, the entire contents of which are incorporated by reference into this application. Technical Field

[0003] The present application relates to the technical field of electronic atomization devices, and in particular to an atomization core, an atomizer, and an electronic atomization device. Background Art

[0004] Existing electronic atomization devices typically use an atomizer core to atomize the atomizing medium. The atomizer core typically comprises a porous matrix and a heating element. Existing technology typically uses porous ceramics as the porous matrix and a conductive metal material as the heating element. The conductive metal heating element is typically embedded within the porous ceramic matrix for securement. This approach results in atomizer cores with a short lifespan and is prone to dry-burning.

[0005] Summary of the Invention

[0006] The purpose of this application is to overcome the defects of the prior art atomizer core, such as short life and easy dry burning, and to provide an atomizer core, an atomizer and an electronic atomization device.

[0007] To achieve the above objectives, this application adopts the following technical solutions:

[0008] An atomizer core, comprising a porous substrate, a heating element, and a transition layer bonded between the porous substrate and the heating element;

[0009] The transition layer contains inorganic material components.

[0010] Optionally, the transition layer contains a glass phase component;

[0011] and / or, the porous matrix contains a glassy phase component and / or a ceramic phase component;

[0012] Optionally, the softening point temperature of the glass in the transition layer is 400°C-1100°C.

[0013] Optionally, the content of the inorganic material component in the transition layer is greater than 80 wt %;

[0014] Optionally, the content of the inorganic material component in the transition layer is greater than 90 wt %;

[0015] Optionally, the content of the inorganic material component in the transition layer is 100 wt %.

[0016] Optionally, the transition layer at least partially fills and / or covers the porous matrix;

[0017] Optionally, the transition layer at least partially fills and / or covers the area where the heating element contacts the porous matrix;

[0018] Optionally, the area on the porous substrate that is not in contact with the heating element is at least partially not filled and / or covered by the transition layer.

[0019] Optionally, the transition layer fills part of the pores of the porous matrix to form an embedded structure;

[0020] And / or, the transition layer is a dense structure.

[0021] Optionally, the thickness of the transition layer is 20-200 μm;

[0022] Optionally, the transition layer has a thickness of 100-160 μm.

[0023] Optionally, the transition layer comprises aluminosilicate glass and / or barium silicate glass;

[0024] And / or, the composition of the porous matrix includes soda-lime silicate glass and / or borosilicate glass.

[0025] Optionally, the porosity of the porous matrix is ​​20%-90%;

[0026] Optionally, the porosity of the porous matrix is ​​40-80%.

[0027] Optionally, the average pore size of the porous matrix is ​​10-300 μm;

[0028] Optionally, the average pore size of the porous matrix is ​​15-60 μm;

[0029] Optionally, the average pore size of the porous matrix is ​​20-50 μm.

[0030] Optionally, the pores of the porous matrix include at least one of ordered straight through pores, ordered curved through pores or disordered pores.

[0031] Optionally, the heating element is a metal mesh or a metal sheet;

[0032] And / or, the material of the heating element is selected from at least one of an iron-based alloy material and a nickel-based alloy material;

[0033] Optionally, the heating element is selected from at least one of stainless steel and iron-chromium-aluminum.

[0034] Optionally, the heating element is in a rhombus or honeycomb shape.

[0035] Optionally, the heating element has a thickness of 20-200 μm;

[0036] Optionally, the heating element has a thickness of 50-120 μm.

[0037] Optionally, at least part of the surface of the heating element has a micro-nano structure;

[0038] Optionally, the surface roughness Ra of the heating element with micro-nano structure is 100-300nm.

[0039] Optionally, the ratio of the area of ​​the porous matrix filled and / or covered by the transition layer to the area of ​​the porous matrix covered by the heating element is (0.8-1.2):1;

[0040] Optionally, the ratio of the area of ​​the porous matrix filled and / or covered by the transition layer to the area of ​​the porous matrix covered by the heating element is 1:1.

[0041] The present application provides an atomizer, comprising the atomizing core as described above.

[0042] The present application also provides an electronic atomization device, comprising the atomizer and power supply assembly as described above.

[0043] Beneficial effects of this application:

[0044] The atomizer core provided herein comprises a porous substrate, a heating element, and a transition layer bonded between the porous substrate and the heating element; the transition layer comprises an inorganic material. The transition layer is disposed between the heating element and the porous substrate, and the transition layer secures the two together. The resulting atomizer core has an excellent service life and avoids problems such as dry burning. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] In order to more clearly illustrate the specific implementation methods of the present application or the technical solutions in the prior art, the following is a brief introduction to the drawings required for use in the specific implementation methods or the description of the prior art. Obviously, the drawings described below are some implementation methods of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0046] FIG1 is a schematic cross-sectional view of the atomizer core provided in Example 1 of the present application;

[0047] FIG2 is a cross-sectional SEM image of the atomizer core provided in Example 1 of the present application;

[0048] FIG3 is a schematic diagram of the shape of the heating element on the atomizer core provided by the present application;

[0049] Figure 4 is a photo of the atomizer core of Example 1 of the present application;

[0050] FIG5 is an SEM image of the atomizing surface of the atomizer core of Example 1 of the present application;

[0051] FIG6 is a comparison diagram of the temperature rise curves of the heating element during the temperature field test of each sample in Example 1 of the present application;

[0052] FIG7 is a diagram of the infrared temperature field area distribution of each sample during the temperature field test in Example 1 of the present application;

[0053] Explanation of the reference numerals: 1-porous matrix, 2-heating element, 3-transition layer. DETAILED DESCRIPTION

[0054] The following examples are provided to further better understand the present application, but are not limited to the best implementation mode described herein, and do not limit the content and protection scope of the present application. Any product identical or similar to the present application obtained by anyone under the inspiration of the present application or by combining the features of the present application with other prior arts shall fall within the scope of protection of the present application.

[0055] If no specific experimental steps or conditions are specified in the examples, the conventional experimental steps or conditions described in the literature in this field can be used. If the manufacturer of the reagents or instruments is not specified, they are all commercially available conventional reagents.

[0056] Existing electronic atomization devices usually use an atomizer core to atomize the atomizing medium. Among them, the atomizer core usually includes a porous matrix and a heating element. The existing technology usually uses porous ceramics as the porous matrix and conductive metal materials as the heating element. The conductive metal heating element usually needs to be fixed by embedding it in the porous ceramic matrix. The inventor's research found that when the above method is used to fix the heating element such as the heating wire, heating net or heating sheet, only a few points embedded in the porous matrix are in close contact with the matrix. The rest of the heating element is not in close contact with the porous matrix, and there is a certain distance between the porous matrix and the heating element. This loose contact method will further cause the following problems: First, the thermal resistance between the heating element and the porous matrix is ​​large. Due to the low thermal conductivity of air and the atomizing medium, the heat of the heating element is concentrated on the heating element, and it is not easy to transfer and disperse the heat to the entire atomizing surface. It is easy to cause local high temperature, which in turn causes dry burning; at the same time, local high temperature also accelerates the formation of carbon deposits, affecting the taste and service life of the atomizer core. Second, since most of the heating element is not in close contact with the porous matrix, its deformation is not constrained. In the case of thermal shock, the deformation of each part of the heating element is not consistent, which can easily cause excessive local deformation, resulting in warping, fracture, etc., affecting the service life. Third, the gap between the heating element and the porous matrix has poor consistency; due to its sintering and solidification process, the porous matrix has a certain shrinkage rate, resulting in poor consistency in the gap. Excessive gaps cause insufficient liquid supply to the heating element, resulting in problems such as dry burning; in particular, poor consistency causes large differences in smoke, resulting in poor taste consistency, affecting the consumer experience. Therefore, the atomizer core obtained in this way has a short lifespan and is prone to problems such as dry burning.

[0057] Based on the above analysis, the present application provides an atomizer core to solve and improve the above-mentioned specific technical problems. As shown in Figure 1, the atomizer core includes a porous matrix 1, a heating element 2, and a transition layer 3 bonded between the porous matrix and the heating element; the transition layer contains an inorganic material component. For the convenience of description, the present application refers to a surface of the porous matrix provided with a transition layer and a heating element as an atomizing surface, and the liquid atomizing medium is guided to the atomizing surface for atomization under capillary action; the surface opposite to the atomizing surface is called a liquid absorption surface, which is used to absorb the liquid atomizing medium. The distance between the atomizing surface and the liquid absorption surface is the thickness of the porous matrix. Since a transition layer is provided between the heating element and the porous matrix, and the two are bonded and fixed by the transition layer, there is no gap between the two. At the same time, since the transition layer contains inorganic material components, its thermal conductivity is much greater than that of air. Therefore, on the one hand, the heat on the heating element is quickly and efficiently directed to the atomizing surface of the porous matrix, and the heat is transferred and dispersed to the entire atomizing surface, avoiding local high temperature and dry burning. On the other hand, the transition layer is bonded to the heating element so that its deformation under thermal shock is subject to certain constraints. At the same time, since the temperature of the atomizing surface is more uniform, the deformation of each part of the heating element tends to be consistent, avoiding warping, fracture, etc., and extending its service life. On the third hand, there is no gap between the porous matrix and the heating element in the atomizing core of the present application, so the oil film on the atomizing surface can be more evenly distributed, and the liquid supply to the heating element can be more efficiently avoided, avoiding insufficient liquid supply. Therefore, the atomizing core of the present application solves the above-mentioned problems of the prior art at the same time, improves the service life of the atomizing core, and avoids problems such as dry burning.

[0058] In some optional embodiments, the inorganic material content of the transition layer is greater than 80 wt %. Alternatively, the inorganic material content of the transition layer is greater than 90 wt %. In a particularly optional embodiment, the inorganic material content of the transition layer is 100 wt %. It is understood that since inorganic material systems generally have higher thermal conductivity, thermal stability, and safety, a higher content of the inorganic material in the transition layer leads to better performance.

[0059] In some optional embodiments, the transition layer contains a glass phase component. It will be understood that glass is an amorphous inorganic non-metallic material, and the glass phase is a solid phase having the above-mentioned amorphous inorganic non-metallic characteristics. The glass phase in the present application can be sintered from a slurry containing glass powder. The advantage of the glass phase is that during the sintering and molding process, it has a certain fluidity and bonding effect, which is conducive to achieving good contact and bonding with the contact surface of the heating element, and better filling the gap between the heating element and the porous matrix.

[0060] As shown in Figures 1 and 2, in some optional embodiments, the transition layer has a dense structure. The dense structure has higher thermal conductivity and better mechanical properties, which can enhance the bonding strength between the heating element and the transition layer.

[0061] In some optional embodiments, the transition layer at least partially fills and / or covers the porous matrix. Specifically, as shown in Figure 2, the transition layer can fill part of the pores of the porous matrix to form an embedded structure. The transition layer is used to bond and fix the metal heating element to the surface of the porous matrix. The embedded structure formed by the transition layer and the porous matrix can effectively improve the bonding strength between the two to avoid warping of the heating element and increase the service life. Based on this embedded structure, it is almost impossible for the transition layer to separate from the porous matrix without destroying the porous matrix. Furthermore, the transition layer has no pores and is densely filled between the heating element and the porous matrix, which also improves the thermal conductivity and quickly introduces heat into the porous matrix to achieve good atomization effect and reduce the probability of dry burning. Furthermore, during sintering and solidification, the porous matrix and the transition layer embedded in the porous matrix are embedded due to a certain fluidity, the bonding strength is further enhanced, and the service life is further guaranteed. Specifically, the transition layer can also cover the porous matrix. This is manifested in that part of the transition layer only covers the surface of the porous matrix, and this part of the transition layer does not penetrate into the pores to fill. The transition layer that does not penetrate into the pores can achieve the bonding and fixation of the porous matrix and the heating element alone, or it can be used in conjunction with the transition layer filled in the pores to achieve the bonding and fixation of the porous matrix and the heating element. It can be understood that filling the porous matrix with the transition layer will reduce the porosity of the porous matrix in this area to a certain extent, as well as reduce the proportion of open pores in this area; thereby affecting the liquid conduction effect of this area. Covering the porous matrix with the transition layer will reduce the proportion of open pores in this area to a certain extent, which will also affect the liquid conduction effect of this area.

[0062] In some optional embodiments, the transition layer at least partially fills and / or covers the area where the heating element is in contact with the porous matrix. This achieves a close bond between the heating element and the porous matrix. It can also be understood that the transition layer with a dense structure filled and / or covered in the porous matrix will reduce the porosity of the porous matrix and reduce the liquid conduction effect of this part. Therefore, the corresponding area filled only in the contact area between the heating element and the porous matrix can ensure the high liquid conduction effect of other parts of the porous matrix, that is, reduce the impact on the porosity and opening rate of the atomizing surface. Therefore, in some optional embodiments, the area on the porous matrix that is not in contact with the heating element is at least partially not filled and / or covered by the transition layer to achieve a good liquid conduction effect; it can be understood that the ideal situation is that in the planar direction of the atomizing surface of the porous matrix, the transition layer fills and / or covers the porous matrix area corresponding to the heating element, while other areas are not filled and / or covered by the transition layer. Ideally, the ratio of the area of ​​the porous matrix filled and / or covered by the transition layer to the area of ​​the porous matrix covered by the heating element is (0.8-1.2):1, achieving both strength and liquid conductivity within this range. Optionally, the ratio of the area of ​​the porous matrix filled and / or covered by the transition layer to the area of ​​the porous matrix covered by the heating element is 1:1. As shown in Figure 5, in this embodiment, the porous matrix region outside the heating element has a good pore structure, achieving good liquid conductivity in this region.

[0063] In some optional embodiments, the thickness of the transition layer is 20-200 μm; optionally, the thickness of the transition layer is 100-160 μm. For example, the thickness of the transition layer can be 100 μm, 102 μm, 105 μm, 107 μm, 110 μm, 112 μm, 115 μm, 117 μm, 120 μm, 122 μm, 125 μm, 127 μm, 130 μm, 132 μm, 135 μm, 137 μm, 140 μm, 142 μm, 145 μm, 147 μm, 150 μm, 152 μm, 155 μm, 157 μm, or 160 μm. The filling of the porous matrix by the transition layer in the thickness direction will also affect the liquid conduction in the thickness direction to a certain extent. Therefore, the thickness of the transition layer should be selected so as not to affect the normal heating and atomization function of the atomizer core and at the same time not to reduce the overall bonding strength. The above thickness range ensures good bonding strength and liquid conduction effect.

[0064] In some optional embodiments, the thickness of the transition layer can be non-uniform; the maximum thickness of the non-uniform transition layer is 60-200 μm. For example, the maximum thickness can be 60 μm, 70 μm, 80 μm, 90 μm, 100 μm, 110 μm, 120 μm, 130 μm, 140 μm, 150 μm, 160 μm, 170 μm, 180 μm, 190 μm, or 200 μm. Because the surface of the porous substrate is uneven in some embodiments, the thickness of the transition layer at the minimum thickness can be much smaller than the thickness at the maximum thickness. For example, the minimum thickness of the transition layer can be 0.1-30 μm. Generally, the better the surface flatness of the porous substrate, the more uniform the thickness of the transition layer.

[0065] In some optional embodiments, the transition layer of the present application is made of glass powder as a raw material. The glass powder is conventional glass powder in the art and can be obtained commercially. The softening point of the glass in the transition layer is 400°C-1100°C. It can be understood that silicon dioxide is the main component of the transition layer, and other components of the transition layer include aluminum oxide, calcium oxide, barium oxide, zinc oxide, etc., which are used to adjust the softening point of the glass to improve the sintering and curing temperature and the fluidity of the glass. It should be noted that the softening point temperature should not be too low, and it should at least be greater than the upper limit of the maximum temperature range in which the atomizing core can operate. At the same time, the softening point temperature of the glass in the transition layer should not be too high, and it should at least be less than the molding temperature or destruction temperature of the porous matrix to avoid affecting the structural stability of the porous matrix. Furthermore, the components of the transition layer include aluminosilicate glass and / or barium silicate glass.

[0066] In some optional embodiments, the porosity of the porous matrix is ​​20%-90%. Optionally, the porosity of the porous matrix is ​​40-80%. For example, the porosity of the porous matrix can be selected to be 40%, 42%, 45%, 46%, 48%, 50%, 51%, 53%, 56%, 58%, 59%, 60%, 61%, 63%, 65%, 67%, 69%, 70%, 71%, 72%, 74%, 75%, 76%, 77%, 78%, 79%, 80%.

[0067] In some optional embodiments, the average pore size of the porous matrix is ​​10-300 μm. Alternatively, the average pore size of the porous matrix is ​​15-60 μm. Alternatively, the average pore size of the porous matrix is ​​20-50 μm. For example, the average pore size of the porous matrix can be 20 μm, 21 μm, 22 μm, 23 μm, 24 μm, 25 μm, 26 μm, 27 μm, 28 μm, 29 μm, 30 μm, 31 μm, 32 μm, 33 μm, 34 μm, 35 μm, 36 μm, 37 μm, 38 μm, 39 μm, 40 μm, 41 μm, 42 μm, 43 μm, 45 μm, 46 μm, 47 μm, 48 μm, 49 μm, or 50 μm.

[0068] In some optional embodiments, the pores of the porous matrix include at least one of ordered straight through pores, ordered tortuous through pores, or disordered pores.

[0069] In some optional embodiments, the porous matrix contains a glass phase component and / or a ceramic phase component. The present application does not specifically limit the porous matrix. The porous matrix can be a ceramic porous matrix mainly composed of ceramic components, or a glass porous matrix mainly composed of glass components, or a glass ceramic porous matrix. The porous matrix has a porous structure inside, and liquid conduction is achieved by capillary effect. The glass in the porous matrix has a softening point temperature of 600-1200°C; optionally, the porous matrix is ​​a glass ceramic porous matrix. Furthermore, the components of the glass ceramic porous matrix include soda lime silicate glass and / or borosilicate glass.

[0070] In some optional embodiments, the transition layer and the porous matrix both contain glass phase components, and the composition of the porous matrix and the transition layer matches, which helps to improve the bonding strength, reduce warping, and increase the service life; at the same time, the similar composition can make the porous matrix and the transition layer have basically the same expansion coefficient, which can increase the service life under the thermal shock of the atomizer core application.

[0071] In some optional embodiments, the raw material components of the porous matrix include glass powder, and further, the glass powder is composed of silicon oxide, boron oxide, sodium oxide, calcium oxide, and aluminum oxide.

[0072] In some optional embodiments, the porous substrate, transition layer, and heating element are bonded together by sintering and curing. The sintering and curing temperature is 800-1100°C, and the sintering and curing time is 8-12 minutes. At this curing temperature, the softening point of glass is reached. Especially when both the porous substrate and the transition layer have a glass phase, sintering at a higher temperature can also produce good fluidity and interlocking of the porous substrate and the transition layer. Therefore, the bond strength between the porous substrate and the transition layer is further improved, warping is reduced, and the service life is increased.

[0073] The present application does not specifically limit the specific preparation method of the porous matrix or the pore-forming method thereof. Typically, but not limiting, in some optional embodiments, the preparation method of the porous matrix includes the following steps:

[0074] 1) mixing raw glass bubbles with a binder, a slip agent, and water and extruding the mixture to obtain a green body;

[0075] 2) subjecting the green body in step 1) to a first sintering, a second sintering, and a third sintering to obtain a porous glass-ceramic substrate;

[0076] Optionally, in step 1), the binder may be an organic binder; specifically, the binder is selected from at least one of methyl cellulose, hydroxyethyl cellulose, and hydroxypropyl methyl cellulose; the slip agent may be an aliphatic hydrocarbon slip agent, such as paraffin wax or metal stearate; specifically, the slip agent is sodium stearate.

[0077] Optionally, the extrusion molding pressure in step 1) is 1-30 bar. Most of the glass bubbles do not break during the extrusion molding process, maintaining their complete spherical shape. Therefore, the extrusion molding pressure can be appropriately adjusted based on the compressive strength of the selected glass bubbles.

[0078] Optionally, the first temperature of the first sintering in step 2) is at least 200° C., for example, 300° C. to 400° C., and / or the first dwell time is at least 1 minute, for example, 1 to 10 hours. During the sintering process at this temperature, substances such as solvents and binders in the green body are removed.

[0079] Optionally, the second temperature for the second sintering is greater than 400°C and less than the softening point of the glass of the glass bubbles; for example, 500°C, 600°C, 700°C, etc., and the second dwell time is at least 1 minute, for example, 1 to 10 hours. The second temperature is greater than 400°C and less than the softening point of the glass of the glass bubbles. This is intended to maintain the original morphology of the green body. At the same time, because the temperature is already above 400°C, the glass components in the glass bubbles begin to undergo a phase transition. The disordered glass phase partially crystallizes into a crystalline phase within this temperature range, and the glass bubbles transform into glass-ceramic bubbles, or the proportion of the crystalline phase in the glass bubbles begins to increase. Simultaneously, due to this transition, some glass bubbles begin to rupture, forming at least one opening. Therefore, the sintering time within this temperature range can be appropriately adjusted to adjust the crystallinity of the porous glass-ceramic. It is understood that the raw glass bubbles themselves may also contain a certain proportion of crystalline phases, which can shorten the sintering time during this process.

[0080] Optionally, the third temperature of the third sintering is greater than the softening point of the glass. Specifically, the softening point temperature of the glass is less than 900°C. The third residence time can be at least 1 minute, for example, 1 to 10 hours. At this temperature, the glass component has fluidity, so the adjacent glass ceramic bubbles are directly bonded to each other, and the glass ceramic bubbles are bonded to form a porous glass ceramic matrix with an integrated structure; at the same time, because the glass ceramic bubbles still have crystalline phase components, the crystalline phase components serve as a skeleton so that their morphology does not collapse and still maintains a basically complete morphology. In addition, the glass ceramic bubbles further crack to form a large number of openings, which are interconnected to form pores, and the pores extend through the porous glass ceramic matrix and reach the surface of the porous glass ceramic matrix.

[0081] The third temperature is higher than the softening point of the glass of the glass bubbles. The glass-ceramic bubbles are heated to at least the softening temperature of the amorphous glass, causing most of the glass-ceramic bubbles to open due to expansion of the gas within the bubbles. Simultaneously, the heating causes adjacent glass-ceramic bubbles to sinter together, forming a bond. Overall, the bonded open glass-ceramic bubbles form pores within a porous glass-ceramic matrix, effectively improving atomization efficiency and liquid conduction in atomizers and electronic atomization devices.

[0082] In some optional embodiments, the mass ratio of glass bubbles to binder, slip agent, and water is (100-200):(10-50):(1-10):(45-150).

[0083] In some optional embodiments, the glass composition of the glass bubbles can be soda-lime silicate glass, borosilicate glass, or other glass. Specifically, the glass composition can include Si: 40-44 wt%, O: 45-52 wt%, Na: 2-5 wt%, Ca: 2-6 wt%, Mg: 0.1-0.5 wt%, Al: 0.1-0.5 wt%, or can include: SiO2 74-85 wt%, CaO 6.5-10 wt%, B2O3 5-9 wt%, Al2O3 0.4-2 wt%, Fe2O3 0.01-1 wt%, Na2O 1-3 wt%, and K2O 0.1-0.5 wt%.

[0084] In some optional embodiments, step 1) further includes adding a pore-forming agent. Optionally, the pore-forming agent is selected from at least one of starch, polymethyl methacrylate (PMMA), polystyrene (PS), and graphite. Optionally, the average particle size of the pore-forming agent can range from 1 to 150 μm. It is understood that the addition of the pore-forming agent can further increase the porosity of the porous glass-ceramic matrix while maintaining the strength of the raw glass bubbles.

[0085] In some optional embodiments, step 1) further includes a second inorganic material. The second inorganic material can be at least one of clay, talc, silica, and alumina. The melting point or softening point of the above material is higher than the softening point of the glass in the glass bubble.

[0086] In some optional embodiments, the mass ratio of glass bubbles to binder, slip agent, water, pore former, and second inorganic material is (100-200): (10-50): (1-10): (45-150): (0-70): (0-9).

[0087] The porous matrix prepared by the above preparation method is a porous glass-ceramic matrix (denoted as the first porous matrix), including a plurality of glass-ceramic bubbles; wherein adjacent glass-ceramic bubbles are directly bonded to each other by sintering; at least part of the glass-ceramic bubbles have openings; the holes in the glass-ceramic bubbles with openings are interconnected through the openings to form pores, and the pores extend through the porous glass-ceramic matrix and reach the surface of the porous glass-ceramic matrix. In this application, the pores with disordered extension direction of this pore structure are referred to as disordered pores. The pores of this porous matrix include disordered pores and are a glass-ceramic porous matrix, that is, the porous matrix contains glass phase components and ceramic phase components. In this application, the porous matrix with the above structure is named the first porous matrix.

[0088] Typically, but not limiting, in some other optional embodiments, the method for preparing the porous matrix comprises the following steps:

[0089] 1) stacking ablative organic screens to form a three-dimensional organic template;

[0090] 2) Filling the ceramic slurry into the three-dimensional organic template, drying, degreasing, and sintering to obtain the ceramic matrix.

[0091] Optionally, the method for preparing the ceramic slurry comprises the following steps: mixing silicon dioxide, potassium feldspar, an organic monomer, a cross-linking agent and water, adjusting the pH, and grinding to obtain the ceramic slurry.

[0092] Optionally, after ablation, the three-dimensional organic template forms three-dimensional pores in the ceramic matrix.

[0093] Optionally, the material of the organic material screen is an organic polymer material; and / or,

[0094] The organic polymer material includes one of a polyamide material and a polyester material.

[0095] Optionally, the material of the organic material mesh is selected from at least one of nylon and polyethylene terephthalate.

[0096] Optionally, the organic material mesh in step 1) is made by weaving organic material threads alternately through warp and weft threads.

[0097] Optionally, the weaving method may be plain weaving, and the organic material threads may be woven alternately by 1 warp and 1 weft.

[0098] Optionally, the diameters of the warp and weft may be the same or different, ranging from 10 to 200 microns.

[0099] Optionally, the diameter of the warp is 10-80 microns;

[0100] Optionally, the diameter of the weft is 10-150 microns.

[0101] Optionally, the spacing between adjacent warp threads is 20-300 microns, and the spacing between adjacent weft threads is 20-300 microns;

[0102] Optionally, the spacing between adjacent warp threads is 20-150 microns, and the spacing between adjacent weft threads is 20-150 microns.

[0103] Optionally, the organic material screen further comprises a step of fixing it with an outer frame;

[0104] Optionally, the outer frame is a metal outer frame.

[0105] Optionally, the number of layers of the organic material screen after stacking in step 1) is 50-500, and the thickness after stacking is 2-10 mm. Optionally, there can be a certain distance between adjacent layers, for example, the distance between layers can be 10-100 microns.

[0106] Optionally, after stacking the organic material screens in step 1), the step further includes fixing the stacked screens with a clamp.

[0107] Optionally, the method for preparing the ceramic slurry in step 2) comprises the following steps: mixing ceramic powder, organic monomer, cross-linking agent and water, adjusting pH, and grinding to obtain the ceramic slurry.

[0108] Optionally, the mass ratio of the ceramic powder, the organic monomer, the cross-linking agent and water is (60-80): (2-5): (0.2-2): (15-40); and / or,

[0109] The organic monomer is acrylamide, and the cross-linking agent is N,N'-methylenebisacrylamide.

[0110] Optionally, the method for preparing the ceramic slurry further includes the step of adding an initiator and a catalyst to the ceramic slurry.

[0111] Optionally, the mass ratio of the organic monomer, initiator, and catalyst is (1-10):(0.1-1):(0.1-1);

[0112] The initiator is ammonium persulfate;

[0113] The catalyst is tetramethylethylenediamine.

[0114] Optionally, the ceramic powder includes silicon dioxide and a sintering aid;

[0115] The mass ratio of the silicon dioxide to the sintering aid is (55-95): (5-30).

[0116] Optionally, the sintering aid is potassium feldspar.

[0117] Optionally, the grinding speed is 50-100 rpm and the grinding time is 24-36 h; and / or,

[0118] The pH value of the ceramic slurry is adjusted to 8-10 during preparation; and / or,

[0119] The pH regulator is ammonia or tetramethylammonium hydroxide;

[0120] Optionally, the grinding may be ball milling.

[0121] Optionally, the mass concentration of ammonia in the ammonia water is 5-39%.

[0122] Optionally, the drying temperature in step 2) is 25-60° C. and the drying time is 24-120 h; and / or,

[0123] The degreasing temperature in step 2) is 450-500° C. and the degreasing time is 1800-2400 min; and / or,

[0124] The sintering temperature in step 2) is 1150-1200° C., and the sintering time is 1200-1800 min.

[0125] The optional ambient humidity of the drying step is 30-80%. Ambient humidity refers to the relative humidity of the environment. Maintaining the ambient humidity at 30-80% is beneficial to preventing cracks from forming on the ceramic substrate during the drying process.

[0126] The above-mentioned method is to construct a three-dimensional organic template, pour ceramic slurry, and degrease and sinter to form a dense ceramic (referred to as the second porous matrix) with an interconnected through-hole structure. The ceramic porous matrix has a longitudinal through-hole structure that runs through the upper and lower surfaces (liquid absorption surface and atomization surface) of the ceramic matrix in a vertical direction, and a transverse curved through-hole structure connected to the longitudinal through-hole.

[0127] Similarly, in other optional embodiments, the three-dimensional organic template used in the above preparation process is replaced with a two-dimensionally extending organic template, that is, a fiber template consisting solely of organic material threads extending through the upper and lower surfaces (liquid absorption surface and atomization surface) of the ceramic substrate. A substantially similar scheme is employed to prepare a ceramic porous substrate having a longitudinal through-hole structure extending vertically through the upper and lower surfaces (liquid absorption surface and atomization surface) of the ceramic substrate. Because the fibers of the organic template in the above scheme can be in a straight-through state, the through-hole structure can be an ordered straight-through hole.

[0128] In other optional embodiments, the ordered straight through holes or ordered curved through holes can also be prepared on a dense substrate by laser drilling or etching. The dense substrate can be a ceramic substrate or a glass substrate. The above preparation method is prior art and will not be repeated here.

[0129] In summary, in the present application, the pore structure with substantially the same extension direction of this pore structure is referred to as ordered pores. The porous matrix of this porous structure includes ordered pores extending in the thickness direction, and also includes ordered pores extending in the direction parallel to the atomizing surface. It will be appreciated that in some other embodiments, only ordered pores extending in the thickness direction may be included. At the same time, since the ordered pores run through the entire porous matrix, and the through-holes can be in a vertical or curved state, they are also referred to as ordered straight-through holes or ordered curved through-holes in the present application. Therefore, in some embodiments, the pores of the porous matrix include ordered straight-through holes or ordered curved through-holes. Depending on the raw materials used, the material of the porous matrix can be ceramic and / or glass. In the present application, the porous matrix with this structure is named as the second porous matrix.

[0130] Typically but not limiting, in some other optional embodiments, the method for preparing the porous matrix comprises the following steps: preparing the porous matrix by molding glass and fiber materials and pore-forming agent powder.

[0131] Generally, for the five close-packing patterns of equal-diameter spheres: simple cubic close packing, with a coordination number of 6 and a packing density of 52.4%; orthorhombic close packing, with a coordination number of 8 and a packing density of 60.5%; tetragonal close packing, with a coordination number of 10 and a packing density of 69.8%; and face-centered cubic close packing and hexagonal close packing, with a coordination number of 12 and a packing density of 74.2%. To obtain a porous glass material with multidirectional interconnected pores, the pore-forming agent is added according to a designed volume ratio based on the close packing, i.e., the volume of the pore-forming agent accounts for 60-75% of the total material volume, and optionally, the volume of the pore-forming agent accounts for 70-75% of the total volume.

[0132] Glass powder acts as a bonding skeleton. Fine glass powder can be evenly dispersed throughout the system, making the porous glass pore distribution more uniform and well-connected after sintering. At the same time, fine glass powder can shorten the sintering time and reduce the flow of glass at high temperatures, thereby improving efficiency while increasing the uniformity of the overall material. The fiber component in this case acts as a skeleton support. For the preparation of porous materials with a pore size of 70-80 microns and a pore throat of 30-40 microns, a supporting fiber skeleton of 70-150 microns can be selected. Generally, small-sized fibers or ceramic particles do not affect the overall scaffolding structure. After sintering, small-sized fibers or ceramic particles are wrapped by glass powder and aggregated at the fiber bonding point (pore-forming agent gap) to form support endpoints.

[0133] The porous glass includes a skeleton and multi-directional interconnected pores, wherein the skeleton includes a fiber skeleton serving as a scaffolding structure and a glass covering adhesive layer serving as a bonding and stabilizing agent; the fiber skeleton has a length of 70-150 microns, a skeleton diameter of 15-45 microns, and a weight percentage range of 12-45%; the fiber skeleton material is a high-temperature resistant ceramic fiber material, including alumina, mullite, zirconia, etc., the fiber diameter is 10-40 microns, and the length is 10-150 microns, wherein the effective fiber length serving as the scaffolding structure is 70-150 microns; the glass covering adhesive layer includes glass material and fibers or ceramic powder that do not serve as a scaffolding structure, and the weight percentage range is 55-88%.

[0134] Optionally, the preparation method of the porous glass material generally includes the following steps: mixing glass powder, fiber components, and pore-forming agents to prepare a green body, performing debinding, and sintering.

[0135] Optionally, the fiber component has a diameter of 3-30 μm and a length of 20-500 μm;

[0136] Optionally, the fiber component has a diameter of 10-25 μm and a length of 20-150 μm.

[0137] Optionally, the aspect ratio of the fiber component is 1-10, and optionally, the aspect ratio of the fiber with a length of 50-150 μm is 2-5;

[0138] And / or, in the fiber component, fibers with a fiber length of more than 50 μm account for 25%, optionally, account for more than 40%; further optionally, account for 40-100%.

[0139] Based on the total mass of the glass powder and the fiber component, the glass powder accounts for 40-62%, and the fiber component accounts for 38-60%;

[0140] And / or, the amount of the pore former is 0.3-2.5 times the total mass of the glass powder and fiber components.

[0141] Select any one of the following processes: tape casting, injection molding, dry pressing, and gel casting to prepare the green body;

[0142] The above-mentioned processes for preparing green compacts are all known in the art, and appropriate processing aids may be added depending on the selected process. Typically, and not limitingly, the injection molding process involves mixing the mixed materials with injection molding additives (paraffin wax, polyethylene, and dispersants) in an internal mixer at high temperature until uniform, followed by injection molding to produce a green compact of a desired shape. The injection molding additives are used in an amount of 5-50% of the total mass of the mixed materials, and the dispersing aid is selected from dibutyl phthalate.

[0143] And / or, the debinding temperature is 200-800°C, and the debinding time is 5-50h; optionally, the debinding temperature is 200-350°C.

[0144] And / or, the sintering temperature is 900-1250° C. or 1180-1320° C., and the sintering time is 10-180 min.

[0145] Optionally, the method for preparing the porous glass satisfies at least one of the following (1)-(5):

[0146] (1) The softening temperature of the glass powder is 600-1200°C; the softening point of the selected fiber raw material is above the sintering temperature in the preparation method and can play a skeleton role;

[0147] (2) The particle size of the glass powder is less than 10 μm, and optionally, the particle size is less than 3000 mesh;

[0148] (3) The fiber component is at least one of silicon carbide fiber, silicon nitride fiber, aluminum silicate fiber, quartz fiber, mullite fiber, alumina fiber, hydroxyapatite fiber, and zirconium oxide fiber;

[0149] (4) The pore-forming agent material is one or a mixture of materials such as carbon powder, polystyrene, polymethyl methacrylate, polylactic acid, polyvinyl alcohol, polyethylene terephthalate, engineering plastics, starch, cellulose, sawdust, and graphite powder that can be decomposed, volatilized, or burned at high temperatures;

[0150] (5) The particle size of the pore former is 10-300 μm, and optionally, the average particle size of the pore former is 80 μm. A porous glass material with better connectivity can be obtained by adjusting the addition ratio of pore formers of different diameters.

[0151] In order to obtain porous glass with this special pore structure, the glass raw materials and fiber materials are pretreated as follows:

[0152] (1) The particle size of the glass powder raw material is less than 10 microns, and glass powder with a mesh size of less than 3000 can be used. In order to obtain glass powder with uniform particle size, commercially available glass powder can be milled in a high-energy planetary ball mill at a speed of 200-500 r / min using ethanol as a solvent for 3-5 hours, and then dried and sieved before use.

[0153] (2) The fiber can be a high-temperature resistant fiber such as mullite fiber, zirconia fiber or alumina fiber. In this case, mullite fiber can be selected, with a fiber diameter of 10-25 microns, a length of less than 100 microns, and a fiber aspect ratio of 1-10. Generally, commercially available 2-5 mm short-cut fibers are first crushed to less than 0.5 mm using a crusher, and then high-energy planetary ball milling is performed for 2-8 hours using ethanol as a solvent and stearic acid as a grinding aid at a ball milling speed of 100-400 r / min. Optionally, ball milling can be performed at 300 r / min for 6 hours. The ball-milled fibers are washed with ethanol, dried, and passed through a 100-mesh sieve to obtain the target fibers.

[0154] Optionally, the porous glass with multi-directional interconnected pores is prepared by injection molding, and the preparation method is as follows:

[0155] Glass, fiber, and pore-forming agent are mixed in a certain proportion and mixed in a three-dimensional mixer for 2 hours until uniform. The pore-forming agent is a spherical pore-forming agent with a particle size of 10-300 microns. Optionally, the pore-forming agent has a diameter of 80 microns or a diameter of 50 microns. The mixed material and injection molding additives (paraffin, polyethylene and dispersant) are mixed in a high-temperature mixer until uniform, and then prepared into a green body of a specified shape by injection molding. Heat to 200°C in 200 minutes, and then heat to 500°C at 0.5°C per minute, wherein a 2-hour insulation time is set at 240°C, 280°C, 300°C, and 350°C respectively, and then heat to 1180°C-1320°C at 5°C per minute, keep warm for 30 minutes, and cool naturally to room temperature. In general, a better debinding process can be obtained based on the thermogravimetric curve of the pore-forming agent.

[0156] Alternatively, the porous glass with multi-directional interconnected pores can be prepared by directly densely packing hollow glass microspheres and then sintering. Generally, the particle size of the hollow glass microspheres selected is 50-120 microns, and optionally, the particle size of the hollow glass microspheres is 80-100 microns. Generally, the porous matrix can be prepared by gel injection molding, first heating the hollow glass microspheres to 80°C, then adding them to a sol solution at 80°C, stirring and degassing, and injecting them into a mold at a pressure of 5MPa. After cooling to form a gel blank, the blank is dried at 50°C, and then sintered at 1000°C for 30 minutes. After natural cooling, a porous glass matrix is ​​obtained.

[0157] The above-described preparation method yields a porous glass with multidirectionally connected pores (denoted as the third porous matrix), comprising a skeleton and multidirectionally connected pores. The multidirectionally connected pores are spherical and interconnected with at least six surrounding pores. As described above, the pores in this porous matrix are primarily disordered. The porous matrix primarily contains a glassy phase.

[0158] In some optional embodiments, the heating element is a metal mesh or sheet. It is understood that the metal mesh or sheet itself has a dense structure. The transition layer has a certain bonding effect during high-temperature sintering, and has a good bonding effect with the dense metal mesh or sheet, thereby improving the overall bonding strength of the heating element, transition layer, and porous substrate, preventing warping, extending the service life of the atomizer core, and solving the problem of dry burning.

[0159] In some optional embodiments, at least part of the surface of the heating element has a micro-nano structure. The micro-nano structure is a microscopic structure of a certain size provided on the surface of the heating element, and the size range is usually below the micron level. Providing a micro-nano structure on the contact surface with the transition layer can improve the bonding performance between the transition layer and the heating element; providing a micro-nano structure on the atomizing surface of the heating element can enhance the inlet taste of the atomized medium. The formation method of the micro-nano structure can be selected from at least one of sandblasting, laser etching, and chemical corrosion. Optionally, the roughness (Ra) of the surface of the heating element with the micro-nano structure is 100-300nm.

[0160] In some optional embodiments, the heating element material is selected from at least one of iron-based alloy materials and nickel-based alloy materials; further, the heating element is selected from at least one of stainless steel and iron-chromium-aluminum.

[0161] In some optional embodiments, the thickness of the heating element is 20-200 μm; optionally, the thickness of the heating element is 50-120 μm. For example, the thickness of the heating element can be 50 μm, 55 μm, 60 μm, 65 μm, 70 μm, 75 μm, 80 μm, 85 μm, 90 μm, 95 μm, 100 μm, 105 μm, 110 μm, 112 μm, 115 μm, or 120 μm.

[0162] For example, the present application may choose stainless steel with low resistivity, generally with a thickness of 20-200 μm and a line width of 60-80 μm, or iron-chromium-aluminum, with a thickness of 50-120 μm and a line width of 60-100 μm.

[0163] In some optional embodiments, the resistance of the heating element is 0.5-1.5Ω. For example, the resistance of the heating element can be 0.5Ω, 0.6Ω, 0.7Ω, 0.8Ω, 0.9Ω, 1Ω, 1.1Ω, 1.2Ω, 1.3Ω, 1.4Ω, or 1.5Ω.

[0164] In some optional embodiments, the shape of the heating element is a rhombus or a honeycomb. For example, as shown in Figures 3 and 4, the heating element can be composed of multiple rhombuses or multiple honeycomb shapes. Furthermore, the heating element is composed of 1-15 holes in a rhombus or 1-15 holes in a honeycomb.

[0165] In some optional embodiments, the present application provides a method for preparing the above-mentioned atomizer core without specific limitation, and can optionally include the following steps:

[0166] The transition layer slurry is coated on the heating element, and then the heating element coated with the transition layer slurry is attached to the porous substrate, sintered and solidified, and cooled to obtain the atomizing core.

[0167] Optionally, the method includes the following steps: coating one side of the heating element with a transition layer slurry, attaching the side of the heating element coated with the transition layer slurry to a porous substrate, sintering and solidifying, and cooling to obtain the atomizing core; the transition layer in the atomizing core is bonded between the porous substrate and the heating element.

[0168] Alternatively, the method includes the following steps: coating one side of the porous substrate with a transition layer slurry, which can be applied through a screen template according to the shape of the heating element; then attaching the heating element to the area of ​​the porous substrate coated with the transition layer slurry, sintering and solidifying, and cooling to obtain the atomizing core; the transition layer in the atomizing core is bonded between the porous substrate and the heating element.

[0169] In an optional embodiment, the sintering and curing temperature is 800-1000° C., the sintering and curing time is 8-12 min; the sintering and curing heating rate is 8-30° C. / min; and the cooling is natural cooling to room temperature.

[0170] In an optional embodiment, the thickness of the transition layer slurry is 20-100 μm. In addition to raw material powders such as glass powder, the transition layer slurry also includes organic carriers such as solvents and binders. The solvent can generally be water-based or alcohol-based (e.g., terpineol), and the binder can be a cellulose-based material such as methyl cellulose or ethyl cellulose.

[0171] In an optional embodiment, the mass ratio of the raw material powder, the solvent and the binder in the transition layer slurry is (70-200): (50-150): (20-80).

[0172] In some optional embodiments, the method for preparing the atomizer core may further include applying pressure using an external template during sintering and solidification.

[0173] The present application also provides an atomizer comprising the aforementioned atomizer core. The atomizer further comprises a liquid storage tank for storing liquid atomizing medium and directing the atomizing medium to the atomizer core. The atomizer core can atomize the atomizing medium to generate an aerosol when powered.

[0174] The present application also provides an electronic atomization device, comprising the above-mentioned atomizer and a power supply assembly, wherein the power supply assembly is used to supply power to the atomizer in a preset manner.

[0175] In the following embodiments of the present application, the porous substrate and its preparation method are as follows:

[0176] The first porous matrix comprises a plurality of glass ceramic bubbles; wherein adjacent glass ceramic bubbles are directly bonded to each other by sintering; at least some of the glass ceramic bubbles have openings; the cavities within the glass ceramic bubbles with openings are interconnected through the openings to form pores, and the pores extend through the porous glass ceramic matrix and reach the surface of the porous glass ceramic matrix.

[0177] The preparation method of the first porous matrix comprises the following steps:

[0178] 1) 100 g of glass bubbles (the raw material glass bubbles are soda-lime silicate glass, with particle size parameters: D10 = 18.61 μm, D50 = 39.38 μm, D90 = 69.47 μm, and a porosity of 84.8% within the glass bubble monomer; and the main components are Si: 41.647 wt %, O: 49.375 wt %, Na: 3.778 wt %, Ca: 4.619 wt %, Mg: 0.201 wt %, and Al: 0.379 wt %), 25 g of hydroxyethyl cellulose, 2.5 g of sodium stearate, and 48 g of water, and extruded to obtain a green body at a molding pressure of 23 bar;

[0179] 2) The green body in step 1) is subjected to a first sintering, a second sintering and a third sintering to obtain a porous glass-ceramic matrix, wherein the first sintering temperature is 220°C, the first sintering time is 2 hours, the second sintering temperature is 600°C, the second sintering time is 2 hours, the third sintering temperature is 1200°C, the third sintering time is 1 hour, and finally, the green body is naturally cooled in the furnace to obtain a porous glass-ceramic matrix.

[0180] The porosity of the porous matrix was measured by mercury intrusion porosimetry and was 62.01%, with an average pore diameter of 18.4 μm.

[0181] The second porous matrix has a longitudinal through-hole structure that vertically penetrates the upper and lower surfaces (liquid absorption surface and atomization surface) of the ceramic matrix and a transverse curved through-hole structure connected to the longitudinal through-hole.

[0182] The preparation method of the second porous matrix comprises the following steps:

[0183] 1) nylon yarn is woven into a mesh by alternating warp and weft threads using a plain weave method. The warp thread diameter of the mesh is 40 microns, the spacing between adjacent warps is 80 microns, and the weft thread diameter is 40 microns, the spacing between adjacent weft threads is 80 microns. The mesh is fixed with a metal frame and then stacked and fixed with a clamp to form a three-dimensional organic template. The number of stacked layers is 80, and the thickness after stacking is 4 mm.

[0184] 2) 70g of silica powder, 10g of potassium feldspar (a sintering aid), 4g of acrylamide, 1g of N,N'-methylenebisacrylamide, and 15g of water were mixed, the pH adjusted to 8.5 with 15% ammonia water, and ball milled at 50 rpm for 24 hours to obtain a ceramic slurry. 1g of ammonium persulfate and 0.5g of tetramethylethylenediamine were added to the ceramic slurry, stirred evenly, and then filled into the three-dimensional organic template. The slurry was dried, degreased, and sintered to form a porous ceramic matrix. The three-dimensional organic template was ablated to form three-dimensional pores within the matrix. The drying environment was 50% humidity, 45°C for 72 hours, degreasing at 500°C for 1800 minutes, and sintering at 1150°C for 1200 minutes.

[0185] The third porous matrix includes a skeleton and multi-directional connected pores, wherein the multi-directional connected pores are spherical pores connected with at least six pores around them.

[0186] The preparation method of the third porous matrix comprises the following steps:

[0187] Glass powder was ball-milled in a planetary ball mill at a speed of 300 r / min for 3 hours using ethanol as a solvent, dried, and sieved to obtain glass powder with a particle size of less than 5 microns. The crushed mullite chopped fibers were planetarily ball-milled in ethanol as a solvent at a speed of 300 r / min for 6 hours using stearic acid as a grinding aid, washed with ethanol, dried, and sieved with 100 mesh to obtain fiber raw materials. 13 volumes of glass powder (density 2.5 g / mL), 12 volumes of fiber (density 2.8 g / mL, the same below), and 75 volumes of PMMA (80 microns) pore-forming agent were mixed in a three-dimensional mixer for 2 hours. The mixed materials were added to an internal mixer, and 20% paraffin, 5% polyethylene, and 5% dispersing aid (dibutyl phthalate) were added. The mixture was mixed at 180°C for 2 hours and then prepared into a green body through an injection molding machine. The microscopic morphology is as follows: in one plane, the pore-forming agent is closely stacked with the surrounding 6 pore-forming agents, and the pore-forming agent has a face-centered close-packed or hexagonal close-packed tendency. The temperature was raised to 200°C over 200 minutes, then increased at 0.5°C / minute to 500°C. The temperature was then held at 240°C, 280°C, 300°C, and 350°C for 2 hours. The temperature was then raised at 5°C / minute to 1180°C, held for 30 minutes, and naturally cooled to room temperature. This yielded a porous glass material with a fiber volume fraction of 48%. The micromorphology of the sintered porous glass matrix revealed a densely packed pore-forming agent, leaving a porous structure. Within the same plane, the pores created by the pore-forming agent interconnected with approximately six surrounding pores. Mercury intrusion porosimetry revealed a porosity of 72.0% and an average pore diameter of 40 microns.

[0188] Example 1

[0189] This embodiment provides an atomizer core, comprising the following steps:

[0190] A transition layer slurry was applied to one side of an 8-hole diamond-shaped 430 stainless steel mesh heating element. The slurry had a thickness of 50 μm. The transition layer slurry consisted of glass powder, terpineol, and methyl cellulose in a mass ratio of 100:80:20. The heating element had a thickness of 50 μm and a resistance of 0.7 Ω. The heating element, coated with the transition layer slurry, was then attached to a first porous substrate. The temperature was raised to 1000°C and sintered for 10 minutes at a rate of 10°C / min. The element was then naturally cooled to room temperature to obtain the atomizer core. The transition layer in the atomizer core was bonded between the porous substrate and the heating element.

[0191] The structural features of the atomizer core prepared in this embodiment are shown in Figures 1, 2, 4 and 5. Figure 1 is a schematic cross-sectional view of the atomizer core, and Figure 2 is an SEM cross-sectional view of the atomizer core. As shown in the figure, the transition layer is bonded between the porous matrix and the heating element, and the transition layer is partially filled into the porous matrix. As shown in Figures 4 and 5, the transition layer is filled in the area where the heating element and the porous matrix are in contact. The pore structure of the area on the atomizing surface of the porous matrix that is not in contact with the heating element is complete and is not covered by the transition layer. The ratio of the area of ​​the porous matrix filled with the transition layer to the area of ​​the porous matrix covered by the heating element is approximately 1:1. As shown in Figure 2, the transition layer fills part of the pores of the porous matrix to form an embedded structure, and the transition layer structure is dense. Furthermore, the maximum thickness of the transition layer is about 140 μm, and the minimum thickness is about 20 μm.

[0192] Example 2

[0193] This embodiment provides an atomizer core, comprising the following steps:

[0194] A transition layer slurry was applied to one side of an 8-hole diamond-shaped iron-chromium-aluminum mesh heating element. The slurry had a thickness of 50 μm. The transition layer slurry consisted of glass powder, terpineol, and methyl cellulose in a mass ratio of 200:150:80. The heating element had a thickness of 100 μm and a resistance of 1.1 Ω. The heating element, coated with the transition layer slurry, was then attached to a first porous substrate. The temperature was raised to 1000°C and sintered for 10 minutes at a rate of 8°C / min. The element was then naturally cooled to room temperature to obtain the atomizer core. The transition layer in the atomizer core was bonded between the porous substrate and the heating element.

[0195] The atomizer core prepared in this embodiment has the same or similar structural features as those in Example 1, which will not be described in detail here. Unlike the previous embodiment, the maximum thickness of the transition layer in this embodiment is about 70 μm and the minimum thickness is about 30 μm.

[0196] Example 3

[0197] This embodiment provides an atomizer core, comprising the following steps:

[0198] A transition layer slurry is applied to one side of an 8-hole diamond-shaped 430 stainless steel sheet heating element. The slurry has a thickness of 50 μm. The transition layer slurry comprises glass powder, pine alcohol, and methyl cellulose in a mass ratio of 100:80:20. The heating element has a thickness of 50 μm, a resistance of 0.7 Ω, and is sandblasted on both sides to form a micro-nano structure to change the surface roughness. The heating element coated with the transition layer slurry is then attached to the first porous substrate. The temperature is raised to 1000°C and sintered for 12 minutes at a heating rate of 30°C / min. The atomizer core is then naturally cooled to room temperature to obtain the atomizer core. The transition layer in the atomizer core is bonded between the porous substrate and the heating element.

[0199] The atomizer core prepared in this embodiment has the same or similar structural features as those in Example 1 and will not be described in detail here. Unlike the previous embodiment, the surface of the heating element in this embodiment has a micro-nano structure with a roughness of Ra = 100-300nm.

[0200] Example 4

[0201] This embodiment provides an atomizer core, comprising the following steps:

[0202] A transition layer slurry is applied to one side of an 8-hole diamond-shaped iron-chromium-aluminum mesh heating element. The slurry has a thickness of 50 μm. The transition layer slurry comprises glass powder, pine alcohol, and methyl cellulose in a mass ratio of 100:80:20. The heating element has a thickness of 100 μm, a resistance of 1.1 Ω, and is sandblasted on both sides to form a micro-nano structure to change the surface roughness. The heating element coated with the transition layer slurry is then attached to the first porous substrate. The temperature is raised to 1000°C and sintered for 10 minutes at a heating rate of 8°C / min. The atomizer core is then naturally cooled to room temperature to obtain the atomizer core. The transition layer in the atomizer core is bonded between the porous substrate and the heating element.

[0203] The atomizer core prepared in this embodiment has similar structural features to those in Example 3, and will not be described in detail here.

[0204] Example 5

[0205] This embodiment provides an atomizer core, comprising the following steps:

[0206] A transition layer slurry is coated on one side of an 8-hole diamond-shaped 430 stainless steel mesh heating element. The slurry has a thickness of 50 μm. The transition layer slurry comprises glass powder, pine alcohol, and methyl cellulose in a mass ratio of 100:80:20. The heating element has a thickness of 50 μm, a resistance of 0.7 Ω, and is sandblasted on both sides to form a micro-nano structure to change the surface roughness. The heating element coated with the transition layer slurry is then attached to the first porous substrate. The temperature is raised to 1000°C and sintered for 10 minutes at a heating rate of 8°C / min. The atomizer core is then naturally cooled to room temperature to obtain the atomizer core. The transition layer in the atomizer core is bonded between the porous substrate and the heating element.

[0207] The atomizer core prepared in this embodiment has similar structural features to those in Example 3, and will not be described in detail here.

[0208] Example 6

[0209] This embodiment provides an atomizer core, comprising the following steps:

[0210] A transition layer slurry is applied to one side of an 8-hole diamond-shaped 316L stainless steel mesh heating element. The slurry has a thickness of 50 μm. The transition layer slurry comprises glass powder, pine alcohol, and methyl cellulose in a mass ratio of 100:80:20. The heating element has a thickness of 50 μm, a resistance of 0.8 Ω, and is sandblasted on both sides to form a micro-nano structure to change the surface roughness. The heating element coated with the transition layer slurry is then attached to the first porous substrate. The temperature is raised to 1000°C and sintered for 10 minutes at a heating rate of 8°C / min. The atomizer core is then naturally cooled to room temperature to obtain the atomizer core. The transition layer in the atomizer core is bonded between the porous substrate and the heating element.

[0211] The atomizer core prepared in this embodiment has similar structural features to those in Example 3, and will not be described in detail here.

[0212] Example 7

[0213] This embodiment provides an atomizer core, comprising the following steps:

[0214] A transition layer slurry was applied to one side of an 8-hole diamond-shaped 430 stainless steel mesh heating element. The slurry had a thickness of 50 μm. The transition layer slurry consisted of glass powder, terpineol, and methyl cellulose in a mass ratio of 100:80:20. The heating element had a thickness of 50 μm and a resistance of 0.7 Ω. The heating element, coated with the transition layer slurry, was then attached to a third porous substrate. The temperature was raised to 1000°C and sintered for 12 minutes at a rate of 30°C / min. The element was then naturally cooled to room temperature to obtain the atomizer core. The transition layer in the atomizer core was bonded between the porous substrate and the heating element.

[0215] The atomizer core prepared in this embodiment has similar structural features to those of the aforementioned embodiment 1, and will not be described in detail here.

[0216] Example 8

[0217] This embodiment provides an atomizer core, comprising the following steps:

[0218] A transition layer slurry was applied to one side of an 8-hole diamond-shaped 430 stainless steel mesh heating element. The slurry had a thickness of 50 μm. The transition layer slurry consisted of glass powder, terpineol, and methyl cellulose in a mass ratio of 100:80:20. The heating element had a thickness of 50 μm and a resistance of 0.7 Ω. The heating element, coated with the transition layer slurry, was then attached to a second porous substrate. The temperature was raised to 1000°C and sintered for 12 minutes at a rate of 30°C / min. The element was then naturally cooled to room temperature to obtain the atomizer core. The transition layer in the atomizer core was bonded between the porous substrate and the heating element.

[0219] The atomizer core prepared in this embodiment has similar structural features to those in Example 1 and will not be described in detail here. Unlike the previous embodiment, the second porous matrix in this embodiment has ordered pores, so the infiltration depth of the transition layer is relatively uniform.

[0220] Test Example 1

[0221] The atomizer cores of Examples 1-6 of this application were tested for dry-burning life and wet-burning life. Dry-burning life refers to the following: when the heating element is heated in a bare chip, a cycle test is performed under the power (7.5-8W) with a 3s on / off test condition to judge the condition of the heating element bare chip. This can be used to judge the bonding strength performance. If the strength is insufficient, the heating element will warp off the substrate or break during the test. Wet-burning life refers to the following: when the heating element is normally installed in the atomizer and inhaled, a cycle test is performed under the power (7.5-8W) with a 3s on / off test condition to judge the condition of the heating element in the atomizer. This can be used to judge the bonding strength performance. If the strength is insufficient, the heating element will warp off the substrate, break or fail during the test. When judging the failure situation, failure is considered to be met if one of the following conditions is met: 1. The resistance of the atomizer core changes significantly (for example, the resistance value caused by the breaking or falling of the heating element increases significantly by more than 20% of the original resistance); 2. The amount of mist output is less than half of the initial atomization amount. The test conditions and test results of this test case are shown in Table 1.

[0222] Table 1

[0223] As shown in Table 1, in the actual use environment of thermal shock in the atomizer core, since most of the heating element is in close contact with the porous matrix, its deformation is constrained. In the case of thermal shock, the deformation of each part of the heating element is relatively consistent and constrained, making it less likely to warp or break, thereby extending the service life of the atomizer core.

[0224] Test Example 2

[0225] Temperature field testing was performed on multiple samples of the atomizer cores prepared in Examples 1 and 2 of this application. An infrared thermometer was used to measure the temperature distribution of the atomizer cores, and the temperature distribution was then statistically analyzed. The test results are shown in Table 2 and Figures 6 and 7. The highest temperature of the heating element was approximately 292°C. As shown in Figure 7, which shows multiple different samples prepared in Example 1, the temperature field distribution differences between the different samples were small, indicating good product consistency.

[0226] Table 2 Temperature field test

[0227] Test Example 3

[0228] The atomizers corresponding to the atomizer cores of Examples 1, 7, and 8 were tested for smoke volume and noise. Smoke volume decay refers to the difference between the minimum and maximum smoke volumes within a preset life cycle; smoke volume decay = (maximum smoke volume - minimum smoke volume) / maximum smoke volume * 100%. Typically, smoke volume exhibits a decaying trend, with the maximum smoke volume being the initial smoke volume and the minimum smoke volume being the final smoke volume. The test conditions were a constant power of 8W, and the test atomization matrix was a commercially available tobacco-flavored liquid atomization medium (Crane Dance Tower). The test results are shown in Table 3.

[0229] Table 3

[0230] Combined with the results of Test Examples 2 and 3, the atomizer cores prepared in the present application also exhibit excellent consistency and a long service life. The technical benefits of this excellent consistency are reflected in the following aspects: First, there is good consistency between different samples from the same batch. As shown in Figure 6, the temperature curves of the three samples in Example 1 (denoted as V7-1, V7-2, and V7-3) show minimal differences. The inventors believe that the provision of a transition layer improves the consistency of the spacing between the heating element and the porous substrate, reducing the impact of deformation of the porous substrate and the heating element, thereby improving product consistency between different samples. Second, the consistency of the same sample over its life cycle is demonstrated by low vapor attenuation and long life. As shown in Table 3, over a usage cycle of ≥500 puffs, at 500 puffs, Example 7 exhibits approximately 15.3% attenuation, while Example 1 exhibits only 5.3% attenuation, significantly lower than the attenuation achieved in the prior art. Furthermore, the puff noise level is consistently below 40 decibels. Generally, the level of puff noise provides a comprehensive reflection of the atomizer core's liquid supply capacity and atomization performance. Excessive noise usually reflects problems such as localized dry burning of the atomizer core and excessively thick oil film. As shown in Figure 7, the temperature field distribution of the different samples in Example 1 is highly consistent, and the temperature field distribution on the atomizing surface of the atomizer core is improved, avoiding localized high temperatures and reducing the occurrence of dry burning.

[0231] Combined with the above test results and analysis, the present application has made comprehensive improvements and upgrades in at least multiple dimensions, such as the temperature field distribution of the atomizer core, the consistency of the atomizer core, the service life, the mechanical properties, and dry burning, thereby improving the performance of the atomizer core and solving the problems existing in the prior art.

[0232] Obviously, the above embodiments are merely examples for clarity of explanation and are not intended to limit the implementation methods. Those skilled in the art will readily appreciate that other variations or modifications based on the above descriptions are possible. It is not necessary and impossible to enumerate all implementation methods here. Obvious variations or modifications arising therefrom remain within the scope of protection of this application.

Claims

1. An atomizer core, characterized in that: The atomizing core comprises a porous matrix, a heating element, and a transition layer bonded between the porous matrix and the heating element; The transition layer contains inorganic material components.

2. The atomizer core according to claim 1, characterized in that: The transition layer contains a glass phase component; and / or, the porous matrix contains glass phase components and / or ceramic phase components; Optionally, the softening point temperature of the glass in the transition layer is 400°C-1100°C.

3. The atomizer core according to claim 1 or 2, characterized in that: The content of inorganic material components in the transition layer is greater than 80wt%; Optionally, the content of the inorganic material component in the transition layer is greater than 90wt%; Optionally, the content of the inorganic material component in the transition layer is 100 wt %.

4. The atomizer core according to any one of claims 1 to 3, characterized in that: The transition layer at least partially fills and / or covers the porous matrix; Optionally, the transition layer at least partially fills and / or covers the area where the heating element contacts the porous matrix; Optionally, the area on the porous substrate that is not in contact with the heating element is at least partially not filled and / or covered by the transition layer.

5. The atomizer core according to any one of claims 1 to 4, characterized in that: The transition layer fills part of the pores of the porous matrix to form an embedded structure; And / or, the transition layer is a dense structure.

6. The atomizer core according to any one of claims 1 to 5, characterized in that: The thickness of the transition layer is 20-200 μm; Optionally, the transition layer has a thickness of 100-160 μm.

7. The atomizer core according to any one of claims 1 to 6, characterized in that: The composition of the transition layer includes aluminosilicate glass and / or barium silicate glass; And / or, the composition of the porous matrix includes soda-lime silicate glass and / or borosilicate glass.

8. The atomizer core according to any one of claims 1 to 7, characterized in that: The porosity of the porous matrix is ​​20%-90%; Optionally, the porosity of the porous matrix is ​​40-80%.

9. The atomizer core according to any one of claims 1 to 8, characterized in that: The average pore size of the porous matrix is ​​10-300 μm; Optionally, the average pore size of the porous matrix is ​​15-60 μm; Optionally, the average pore size of the porous matrix is ​​20-50 μm.

10. The atomizer core according to any one of claims 1 to 9, characterized in that: The pores of the porous matrix include at least one of ordered straight through pores, ordered curved through pores or disordered pores.

11. The atomizer core according to any one of claims 1 to 10, characterized in that: The heating element is a metal mesh or a metal sheet; And / or, the material of the heating element is selected from at least one of an iron-based alloy material and a nickel-based alloy material; Optionally, the heating element is selected from at least one of stainless steel and iron-chromium-aluminum.

12. The atomizer core according to any one of claims 1 to 11, characterized in that: The shape of the heating element is rhombus or honeycomb.

13. The atomizer core according to any one of claims 1 to 12, characterized in that: The thickness of the heating element is 20-200 μm; Optionally, the heating element has a thickness of 50-120 μm.

14. The atomizer core according to any one of claims 1 to 13, characterized in that: At least part of the surface of the heating element has a micro-nano structure; Optionally, the surface roughness Ra of the heating element with micro-nano structure is 100-300nm.

15. The atomizer core according to any one of claims 1 to 14, characterized in that: The ratio of the area of ​​the porous matrix filled and / or covered by the transition layer to the area of ​​the porous matrix covered by the heating element is (0.8-1.2):1; Optionally, the ratio of the area of ​​the porous matrix filled and / or covered by the transition layer to the area of ​​the porous matrix covered by the heating element is 1:

1.

16. An atomizer, characterized in that: Comprising the atomizer core as described in any one of claims 1-15.

17. An electronic atomization device, characterized in that: It comprises the atomizer and power supply assembly as claimed in claim 16.

Images