Wide-field scanning imaging system, method, sequencer, and biological recognition method

By driving the scanning galvanometer in the super-resolution detection system to adjust the propagation direction of structured light, the field of view of structured light is broadened, and the problem of reduced field utilization after the resolution is improved is solved, and efficient detection efficiency and panoramic scanning effect are achieved.

WO2025043479A1PCT designated stage expired Publication Date: 2025-03-06MGI TECH CO LTD

Patent Information

Application Number
PCT/CN2023/115502
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-08-29
Publication Date
2025-03-06

AI Technical Summary

Technical Problem

In the process of improving the resolution and beam shrinkage ratio of the super-resolution detection system, the imaging field of structured light is limited, resulting in a decrease in imaging efficiency and the inability to fully utilize the imaging field of objective lenses and cameras.

Method used

By driving the propagation direction of structured light on the scanning galvanometer, scanning the entire surface of the sample to be detected is achieved, widening the field of view of structured light, thereby making full use of the imaging field of view of the objective lens and the camera while maintaining high resolution.

Benefits of technology

It improves the detection efficiency of the super-resolution detection system, solves the problem of reduced field of view utilization, and is suitable for panoramic scanning of large-size samples to be detected.

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Abstract

A wide-field scanning imaging system, comprising: a light source module (11) for emitting light source light; a light modulation module (12) located on the light path of the light source light and comprising a structured light generation element (121) for modulating the light intensity and phase of the light source light to generate structured light and emitting the structured light; a scanning module (13) located on the emergent light path of the structured light and comprising a scanning galvanometer (131) which is rotatable about a first axial direction and a second axial direction perpendicular to the first axial direction to adjust the propagation direction of the structured light, so that the structured light adjusted by the scanning galvanometer (131) traverses a sample to be tested to generate testing light; an imaging module (14) located on the light path of the testing light and comprising a camera (143) for acquiring the testing light; and a controller (15) respectively electrically connected to the scanning module (13) and the imaging module (14) and configured to synchronously output a driving signal to the scanning module (13) and the imaging module (14) so as to synchronize the deflection of the scanning galvanometer (131) with the exposure of the camera (143). An imaging method of the wide-field scanning imaging system, a super-resolution-based sequencer, and a super-resolution-based biological recognition method are provided.
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Description

Wide-field scanning imaging system and method, sequencer, and biometric identification method Technical Field

[0001] The present application relates to the field of optical microscopy imaging technology, and in particular to a wide-field scanning imaging system, a wide-field scanning imaging method, a sequencer based on super-resolution, and a biometric identification method based on super-resolution. Background Art

[0002] Gene sequencing (detecting the arrangement sequence of four bases on nucleic acid samples) has promoted the development of biological science and medicine and has broad application prospects.

[0003] Currently, super-resolution detection systems are commonly used for gene sequencing. The above-mentioned super-resolution detection system includes a digital micromirror device (DMD), an objective lens and a camera. The DMD is used to modulate structured light, the objective lens is used to project the above-mentioned structured light onto the biological sample, the fluorescent substance carried by the biological sample is excited by the structured light to generate detection light, and the camera is used to generate a super-resolution image of the biological sample based on the detection light. Super-resolution reconstruction based on the super-resolution image can obtain the biological characteristics of the biological sample. When the above-mentioned structured light is projected onto the biological sample, a light and dark stripe pattern can be generated on the surface of the biological sample.

[0004] To ensure a sufficiently high spatial frequency for super-resolution reconstruction, the fringe periodicity of the structured light needs to be close to 2NA / λ (NA is the numerical aperture of the objective lens, and λ is the wavelength of the structured light). To meet this fringe periodicity, the super-resolution detection system's beam reduction ratio needs to be increased. However, an excessively large beam reduction ratio will limit the structured light's imaging field of view, making it difficult to fully utilize the imaging field of view of the objective lens and camera, thereby reducing the imaging efficiency of the super-resolution detection system.

[0005] Summary of the Invention

[0006] A first aspect of the present application provides a wide-field scanning imaging system, comprising:

[0007] A light source module, for emitting light from a light source;

[0008] A light modulation module is located in the optical path of the light source, and includes a structured light generating element that modulates the light intensity and phase of the light source to generate structured light and emit the structured light;

[0009] a scanning module, located in the outgoing optical path of the structured light, comprising a scanning galvanometer, wherein the scanning galvanometer can rotate about a first axis and a second axis perpendicular to each other to adjust the propagation direction of the structured light, and the structured light adjusted by the scanning galvanometer traverses the sample to be detected to generate detection light;

[0010] an imaging module, located in the optical path of the detection light, and comprising a camera for collecting the detection light; and

[0011] A controller is electrically connected to the scanning module and the imaging module respectively, and is configured to synchronously output a driving signal to the scanning module and the imaging module so as to synchronize the deflection of the scanning galvanometer with the exposure of the camera.

[0012] A second aspect of the present application provides an imaging method of a wide-field scanning imaging system, wherein the wide-field scanning imaging system includes a scanning galvanometer and a camera;

[0013] The wide-field scanning imaging method comprises:

[0014] Light source emitting step: emitting light from a light source and generating structured light by modulating the intensity and phase of the light from the light source and emitting the structured light; and

[0015] Scanning and image acquisition steps: a scanning galvanometer receives the structured light and rotates around the first axis and the second axis respectively to adjust the propagation direction of the structured light and passes the adjusted structured light through the sample to be detected to generate detection light, and synchronously drives the camera to collect the detection light and generate an image.

[0016] The third aspect of the present application provides a super-resolution sequencer, comprising:

[0017] A light source module, for emitting light from a light source;

[0018] A light modulation module is located in the optical path of the light source, and includes a structured light generating element that modulates the light intensity and phase of the light source to generate structured light and emit the structured light;

[0019] a scanning module, located in the outgoing optical path of the structured light, comprising a scanning galvanometer, wherein the scanning galvanometer can rotate about a first axis and a second axis perpendicular to each other to adjust the propagation direction of the structured light, and the structured light adjusted by the scanning galvanometer traverses the sample to be detected to generate detection light;

[0020] an imaging module, located in the optical path of the detection light, comprising a camera for collecting the detection light and generating a super-resolution image; and

[0021] A controller is electrically connected to the scanning module and the imaging module, respectively, and is configured to synchronously output drive signals to the scanning module and the imaging module to synchronize the deflection of the scanning galvanometer with the exposure of the camera; and identify feature information of the sample to be detected based on the super-resolution image.

[0022] A fourth aspect of the present application provides a biometric recognition method based on super-resolution, comprising:

[0023] Light source emitting step: emitting light source light of a predetermined wavelength and modulating the intensity and phase of the light source light to generate structured light;

[0024] Scanning and image acquisition steps: driving the scanning galvanometer to rotate around a first axis and a second axis perpendicular to each other to adjust the propagation direction of the structured light, passing the adjusted structured light through the sample to be detected to generate detection light, and synchronously driving the camera to collect the detection light and generate a super-resolution image; and

[0025] Identification step: identifying feature information of the sample to be detected based on the super-resolution image.

[0026] The wide-field scanning imaging system, wide-field scanning imaging method, super-resolution-based sequencer and super-resolution-based biometric identification method mentioned in the present application drive the scanning module through a controller to adjust the propagation direction of the structured light around the first axis and the second axis respectively, so that the structured light can be projected to different areas of the sample to be detected in succession, and with the continuous adjustment of the propagation direction, the structured light can scan the entire surface of the sample to be detected. This is equivalent to widening the field of view of the structured light while improving the resolution and the beam reduction ratio. This is conducive to fully utilizing the imaging field of view of other optical structures (such as objective lenses and cameras) in the super-resolution detection system, improving the detection efficiency of the super-resolution detection system, and solving the problem of reduced field of view utilization caused by improving the resolution and the beam reduction ratio. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] FIG1 is a module structure diagram of a super-resolution-based biometric recognition device according to an embodiment of the present application.

[0028] FIG2 is a diagram showing the optical path structure of a biometric recognition device based on super-resolution according to an embodiment of the present application.

[0029] FIG3 is a schematic diagram of the planar structure of the structured light generating element in FIG2 .

[0030] FIG4 is a schematic structural diagram of the deflection state of each micro-mirror in FIG3 .

[0031] FIG5A is a schematic diagram showing a corresponding relationship between a deflection state of a micro-mirror and a vertical stripe pattern formed on a sample to be inspected.

[0032] FIG5B is a schematic diagram showing another correspondence between the deflection state of the micro-mirror and the vertical stripe pattern formed on the sample to be detected.

[0033] FIG5C is a schematic diagram showing another correspondence between the deflection state of the micro-mirror and the vertical stripe pattern formed on the sample to be detected.

[0034] FIG. 6A is a schematic diagram illustrating a corresponding relationship between a deflection state of a micro-mirror and a horizontal stripe pattern formed on a sample to be detected.

[0035] FIG6B is a schematic diagram showing another correspondence between the deflection state of the micro-mirror and the horizontal stripe pattern formed on the sample to be detected.

[0036] FIG6C is a schematic diagram showing another correspondence between the deflection state of the micro-mirror and the horizontal stripe pattern formed on the sample to be detected.

[0037] FIG. 7 is a schematic diagram showing the propagation direction of structured light guided by the scanning galvanometer in FIG. 2 at different angles.

[0038] FIG8 is a schematic diagram of the scanning process of structured light on the sample to be detected.

[0039] FIG9 is a flow chart of a biometric identification method according to an embodiment of the present application.

[0040] FIG10 is a schematic diagram of a waveform of a driving signal output by a controller.

[0041] Description of main component symbols

[0042] Biometric device 10

[0043] Light source module 11

[0044] The first light source and the second light source 111

[0045] Multimode fiber 112

[0046] First lens 113

[0047] Second lens 114

[0048] Optical modulation module 12

[0049] Structured light generating element 121

[0050] Micro mirror 122

[0051] The third lens 123

[0052] Scanning module 13

[0053] Scanning galvanometer 131

[0054] Fourth lens 132

[0055] Fifth lens 133

[0056] Imaging module 14

[0057] Filter 141

[0058] Tube mirror 142

[0059] Camera 143

[0060] Controller 15

[0061] Objective 161

[0062] Light guiding element 162

[0063] Dichroic mirror 163

[0064] Initial angle position X0

[0065] First angle position X1

[0066] Second angular position X2

[0067] Light source L1

[0068] Structured Light L2

[0069] Field of view F0

[0070] Detection light L3

[0071] Steps S1, S2, S3, S4, S5, S6

[0072] Samples to be tested 20

[0073] First Area 21

[0074] Second area 22

[0075] Third Area 23

[0076] Platform 30

[0077] The following specific implementation methods will further illustrate the present application in conjunction with the above-mentioned drawings. DETAILED DESCRIPTION

[0078] In order to more clearly understand the above-mentioned objectives, features and advantages of the present application, the present application is described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be noted that the embodiments of the present application and the features therein can be combined with each other in the absence of conflict.

[0079] The following description sets forth many specific details to facilitate a full understanding of the present application. The embodiments described are only a portion of the embodiments of the present application, not all of the embodiments. All other embodiments derived by persons of ordinary skill in the art based on the embodiments of the present application without creative effort are intended to fall within the scope of protection of the present application.

[0080] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art to which this application pertains. The terms used herein in the specification of this application are for the purpose of describing specific embodiments only and are not intended to limit this application.

[0081] The present application provides a widefield scanning imaging system and an imaging method for a widefield scanning imaging system, which are applied to the field of microscopic imaging technology, such as structured light super-resolution imaging scenarios, projection-based widefield illumination imaging scenarios, and beam shaping scenarios. In this embodiment, the application of a widefield scanning imaging system and an imaging method for a widefield scanning imaging system to a structured light super-resolution imaging scenario is used as an example. Specifically, this embodiment provides a biometric identification device based on super-resolution and a biometric identification method based on super-resolution. The biometric identification device of this embodiment is, for example, a sequencer.

[0082] Referring to Figure 1 , the biometric identification device 10 of the present application is used to detect characteristic information of a sample 20 to be detected. The sample 20 to be detected can be a biological sample, such as a nucleic acid sample (DNA or RNA), protein, or cell. The biometric identification device 10 is used to detect biological information of the sample 20 to be detected. In this embodiment, the sample 20 to be detected is a nucleic acid sample, and the biological information is the base sequence information of the sample 20 to be detected.

[0083] In this embodiment, the sample 20 to be tested is carried on a platform 30. The platform 30 can translate on the plane where it is located, thereby driving the sample 20 to be tested to translate.

[0084] The biometric recognition device 10 includes a light source module 11, a light modulation module 12, a scanning module 13, an imaging module 14 and a controller 15, wherein the controller 15 is electrically connected to the light source module 11, the light modulation module 12, the scanning module 13 and the imaging module 14, respectively, and is used to control the working processes of the light source module 11, the light modulation module 12, the scanning module 13 and the imaging module 14 respectively.

[0085] The light source module 11 is used to emit light source L1. The light modulation module 12 is located on the optical path of the light source L1 and is used to receive the light source L1 and modulate the intensity distribution and phase of the light source L1 to generate structured light L2. The light modulation module 12 is also used to emit structured light L2.

[0086] The scanning module 13 is located in the optical path of the structured light L2, and is used to project the structured light L2 onto the sample to be detected 20. It is controlled by the controller 15 to adjust the emission angle (or emission direction) of the structured light L2. When the emission angle of the structured light L2 is different, the position on the sample to be detected 20 is also different. Therefore, by continuously changing the emission angle of the structured light L2, the structured light L2 can be projected to different positions on the sample to be detected 20 in turn, so that each position on the surface of the sample to be detected 20 is covered by the structured light L2 in turn. In this embodiment, the process of continuously changing the emission angle of the structured light L2 so that the structured light L2 traverses the sample to be detected 20 is defined as the scanning process of the sample to be detected 20 by the structured light L2.

[0087] Different types of bases on the sample 20 to be detected are marked with different fluorescent substances. When the structured light L2 irradiates the sample 20 to be detected, the different fluorescent substances are excited to produce fluorescence of different wavelengths. In this embodiment, the fluorescence produced by the excited fluorescent substances is defined as detection light L3.

[0088] The imaging module 14 is located in the optical path of the detection light L3 , and is configured to receive the detection light L3 and generate a plurality of super-resolution images of the sample to be detected 20 according to the detection light L3 .

[0089] The controller 15 is used to control the on / off switching of the light source module 11, the modulation method of the light source light L1 by the light modulation module 12, the emission angle of the structured light L2 by the scanning module 13, and the acquisition of the multiple super-resolution images by the imaging module 14. The controller 15 is also used to perform super-resolution reconstruction based on the multiple super-resolution images, thereby obtaining base sequence information of the sample 20 to be tested.

[0090] In this embodiment, the biometric recognition device 10 operates through multiple detection cycles, with the platform 30 maintaining a fixed position throughout each detection cycle. After each detection cycle, the platform 30 is translated to the next position, and the super-resolution detection system 20 begins the next detection cycle. This repeated translation of the platform 30 completes multiple detection cycles, ensuring that the structured light L2 covers the surface of the sample 20 to be detected. This completes a scan of the sample 20 by the structured light L2.

[0091] Please refer to FIG. 2 , in which the dotted line represents the propagation path of the light (light source light L1 , structured light L2 , detection light L3 ), and the arrow on the dotted line represents the propagation direction of the light.

[0092] In this embodiment, the light source module 11 includes first and second light sources 111, and a multimode optical fiber 112 connecting the first and second light sources 111, 111, respectively. The first light source 111 is configured to emit light of a first wavelength, and the second light source 112 is configured to emit light of a second wavelength. In this embodiment, the first wavelength is a red laser, and the second wavelength is a green laser. The first and second wavelengths are coupled into the multimode optical fiber 112 and emitted together as light source light L1.

[0093] The light source module 11 also includes a lens assembly, which is used to collimate and evenly distribute the light source L1. In this embodiment, the lens assembly includes a first lens 113 and a second lens 114. The first lens 113 and the second lens 114 are arranged in sequence on the optical path of the light source L1. The first lens 113 and the second lens 114 are used to jointly expand and collimate the light source L1. On the one hand, it meets the requirements for the field of view area in the subsequent optical path, and on the other hand, it realizes the conversion of the light source L1 into parallel light with uniform light intensity distribution. In other embodiments, the expansion and collimation of the light source L1 can also be achieved by one lens. In this embodiment, the expansion and collimation of the light source L1 are achieved by the first lens 113 and the second lens 114, which is beneficial to improving the uniformity of the light source L1.

[0094] In a modified embodiment, the light source module 11 may include a larger number of light sources, and each light source is used to emit laser light of a different wavelength. The number of light sources in the light source module 11 may depend on the type of fluorescent substance on the sample 20 to be detected. In another modified embodiment, the light source module 11 may include a single light source that emits light of one wavelength. The type of light source in the light source module 11 may be a light-emitting diode (LED), a laser, etc. This application does not limit the type or number of light-emitting devices in the light source module 11, nor does it limit the wavelength or number of wavelengths of the light source light L1.

[0095] In this embodiment, the light modulation module 12 includes a structured light generating element 121. The structured light generating element 121 is used to modulate the intensity distribution and phase of the received light source light L1 to generate structured light L2.

[0096] Referring to Figure 3 , in this embodiment, the structured light generating element 121 is a digital micromirror device (DMD). The structured light generating element 121 includes a plurality of aluminum micromirrors 122 arranged in a common plane. The micromirrors 122 are arranged in a micromirror array comprising multiple rows and columns. In this embodiment, each micromirror 122 is substantially rectangular.

[0097] Each micro-reflector 122 can be deflected about its diagonal. Referring to FIG. 4 , each micro-reflector 122 has three deflection states (hereinafter, the orientation is based on FIG. 4 ): deflected 12° to the left along its diagonal (defined as the "ON" state); deflected -12° to the right along its diagonal (defined as the "OFF" state); and deflected 0° (defined as the initial state). The "ON" state of the micro-reflector 122 is a highly reflective state. When the micro-reflector 122 is in the "ON" state, it reflects the structured light L2 at an angle of +12°, causing the structured light L2 to appear as a bright field when projected onto the surface of the sample 20 to be inspected. The "OFF" state of the micro-reflector 122 is a non-reflective state. When the micro-reflector 122 is in the "OFF" state, it reflects the structured light L2 at an angle of -12°, causing the structured light L2 to appear as a dark field on the surface of the sample 20 to be inspected. The initial state of the micro-reflector 122 is a non-operating state. By adjusting the deflection state of each micro-mirror 122 in the structured light generating element 121 , the shape of the structured light L2 emitted by the structured light generating element 121 can be adjusted (ie, the pattern of the light spot formed by the structured light L2 on the surface of the sample 20 to be detected can be adjusted).

[0098] In this embodiment, the structured light generating element 121 modulates the light source L1 into stripe-shaped structured light L2. That is, when the structured light L2 is projected onto the sample 20 to be inspected, a light spot pattern of alternating light and dark stripes arranged in parallel is formed on the surface of the sample 20 to be inspected.

[0099] Figures 5A through 5C illustrate three correspondences between the deflection states of micromirrors 122 in structured light generating element 121 and the stripe patterns formed by structured light L2. In Figures 5A through 5C , micromirrors 122 in the "ON" state are filled, while micromirrors 122 in the "OFF" state are blank. Based on the orientations shown in Figures 5A through 5C , the stripe patterns shown in Figures 5A through 5C are defined as vertical stripes.

[0100] In this embodiment, each four rows of micro-mirrors 122 correspond to one stripe period. That is, during a certain period, two adjacent rows of micro-mirrors 122 are controlled to be in the "ON" state, while the other two rows of micro-mirrors 122 are controlled to be in the "OFF" state. The four rows of micro-mirrors 122 can then modulate the structured light L2 to form a bright stripe and a dark stripe arranged adjacently.

[0101] By adjusting the deflection state of all micro-mirrors 122 in the structured light generating element 121, a specific stripe pattern can be formed on the surface of the sample 20 to be detected. When the light spot pattern is formed on the surface of the sample 20 to be detected, FIG5B shows the phase of the structured light L2. When the light spot pattern is formed on the surface of the sample 20 to be detected, FIG5C shows the phase of the structured light L2. Similarly, by adjusting the deflection state of all micro-mirrors 122 in the structured light generating element 121, the three phases shown in FIG6A to FIG6C can also be modulated. The horizontal stripe pattern formed by the structured light L2 on the sample to be detected 20.

[0102] The biometric identification device 10 of this embodiment uses a three-step phase shift detection method. That is, the biometric identification device 10 operates in multiple detection cycles. In each detection cycle, the biometric identification device 10 collects six super-resolution images of the sample 20 to be detected. In this embodiment, in each detection cycle, the phase is modulated successively. Phase Phase The structured light L2 can form a vertical stripe pattern to illuminate the sample 20 to be tested, so as to collect three super-resolution images respectively, and then modulate the phase Phase Phase The structured light L2 can form a horizontal stripe pattern to illuminate the sample 20 to collect three super-resolution images respectively, and a total of six super-resolution images are collected in each detection cycle. The controller 15 can obtain the base sequence information of the sample 20 to be detected based on the six super-resolution images.

[0103] 2 , the light modulation module 12 of this embodiment further includes a third lens 123 . The third lens 123 is located on the optical path of the structured light L2 and is configured to receive the structured light L2 reflected by the structured light generating element 121 and scale the structured light L2 to direct it to the scanning module 13 .

[0104] In an alternative embodiment, the structured light generating element 121 may be another device, such as a liquid crystal spatial light modulation (LCSLM), a deformable mirror, or a microlens array. In this embodiment, the use of a DMD as the structured light generating element helps save costs and maintain a high refresh rate.

[0105] In this embodiment, the scanning module 13 includes a scanning galvanometer 131. In other embodiments, a polygonal mirror scanner or a resonant scanner may be used to replace the scanning galvanometer 131.

[0106] In this embodiment, the scanning galvanometer mirror 131 is used to reflect the received structured light L2. When the structured light L2 is incident on the scanning galvanometer mirror 131, the scanning galvanometer mirror 131 is used to reflect the structured light L2 onto the surface of the sample 20 to be tested. When the deflection angle of the scanning galvanometer mirror 131 is different, the structured light L2 incident at the same incident angle will be emitted by the scanning galvanometer mirror 131 at different reflection angles. As a result, the structured light L2 will be emitted from the scanning galvanometer mirror 131 in different directions. The propagation direction of the structured light L2 in the subsequent optical path will also be different, so that the structured light L2 can be projected onto different positions on the sample 20 to be tested.

[0107] In this embodiment, the structured light L2 emitted from the structured light generating element 121 contains diffraction lights of multiple orders. When the scanning galvanometer 131 reflects the structured light L2, it is also used to filter out the diffraction lights in the structured light L2 except for the diffraction orders of 0 and ±1, so as to enhance the contrast of the striped light spot formed by the structured light L2.

[0108] For the structured light L2 emitted from the scanning galvanometer 131, the light spot formed on the surface of the sample to be detected 20 is usually difficult to completely cover the surface of the sample to be detected 20. If the light spot of the structured light L2 on the sample to be detected 20 does not completely cover the surface of the sample to be detected 20, the complete base sequence information of the sample to be detected 20 cannot be detected. In this embodiment, by driving the deflection of the scanning galvanometer 131 and adjusting the angle of the scanning galvanometer 131, the propagation direction of the structured light L2 emitted by the scanning galvanometer 131 can be adjusted, thereby adjusting the position where the structured light L2 is projected onto the sample to be detected 20. By continuously changing the propagation direction of the structured light L2, the structured light L2 can be projected to different positions on the sample to be detected 20 in turn, thereby expanding the field of view of the structured light L2. After multiple detection cycles, the entire surface of the sample to be detected 20 can be scanned.

[0109] In this embodiment, the scanning galvanometer mirror 131 can rotate around a first axial direction and a second axial direction respectively, wherein the first axial direction and the second axial direction are perpendicular to each other.

[0110] Please refer to Figure 7, which illustrates the process of deflection of the scanning galvanometer mirror 131 about the first axis. The scanning galvanometer mirror 131 is defined as having an initial angular position X0 (the initial angular position X0 is the angular position at which the deflection angle between the scanning galvanometer mirror 131 and the optical axis is 0). When the scanning galvanometer mirror 131 is at the initial angular position, the structured light L2 reflected by the scanning galvanometer mirror 131 propagates along the principal optical axis and ultimately impinges on the first region 21 on the sample 20 to be detected. When the scanning galvanometer mirror 131 is at the first angular position X1, the structured light L2 reflected by the scanning galvanometer mirror 131 is offset relative to the principal optical axis (the offset angle is equal to the angle at which the scanning galvanometer mirror 131 is deflected), thereby causing the structured light L2 to ultimately be projected onto the second region 22 on the sample 20 to be detected. When the scanning galvanometer mirror 131 is at the second angular position X2, the structured light L2 reflected by the scanning galvanometer mirror 131 is also offset relative to the principal optical axis, thereby causing the structured light L2 to ultimately be projected onto the third region 23 on the sample 20 to be detected. The first region 21 , the second region 22 and the third region 23 do not completely overlap.

[0111] The deflection process of the scanning galvanometer 131 around the second axis is substantially similar to the deflection process around the first axis, and thus will not be described in detail.

[0112] In this embodiment, the scanning module 13 further includes a fourth lens 132 and a fifth lens 133 sequentially located on the optical path of the structured light L2. The fourth lens 132 and the fifth lens 133 form a 4f lens group for jointly projecting the structured light L2 onto the sample 20 to be inspected.

[0113] Figure 8 illustrates the movement of the field of view F0 of structured light L2 on the surface of the sample 20 to be detected. In this embodiment, the field of view F0 of structured light L2 is roughly rectangular, and the surface of the sample 20 to be detected is also roughly rectangular. By driving the scanning galvanometer 131 to continuously deflect by the controller 15, the field of view F0 formed by the structured light L2 on the sample 20 to be detected can be continuously moved. During a detection cycle of the biometric recognition device 10, the field of view F0 formed by the structured light L2 on the sample 20 to be detected covers a target area on the surface of the sample 20 to be detected, that is, the structured light L2 completes the scanning of a target area of ​​the sample 20 to be detected.

[0114] The arrows in Figure 8 indicate the direction of movement of the field of view F0, where the long side and short side of the sample 20 to be inspected are defined as being in the X and Y directions, respectively. When the scanning galvanometer mirror 131 deflects about the first axis, the field of view of the structured light L2 moves in the X direction. When the scanning galvanometer mirror 131 deflects about the second axis, the field of view of the structured light L2 moves in the Y direction.

[0115] In this embodiment, in the first time period, the controller 15 first drives the scanning galvanometer 131 to deflect at a uniform speed around the first axis, so that the field of view F0 of the structured light L2 moves at a uniform speed along the X direction on the surface of the sample 20 to be detected, until the scanning galvanometer 131 deflects to the maximum deflection angle around the first circumferential axis. When the scanning galvanometer 131 deflects to the maximum deflection angle around the first circumferential axis, it enters the second time period, and the controller 15 drives the scanning galvanometer 131 to deflect at a uniform speed around the second axis, so that the field of view F0 of the structured light L2 moves a preset distance along the Y direction on the surface of the sample 20 to be detected to change the field of view of the structured light L2. The controller 15 continues the driving mode of the first and second time periods until the structured light L2 scans a target area of ​​the sample 20 to be detected. In this embodiment, the size of the target area is mainly related to the maximum field of view of the objective lens in the system.

[0116] The time it takes for the structured light L2 to scan a target area on the surface of the sample 20 to be inspected corresponds to the time it takes to capture a super-resolution image during one inspection cycle. By modulating six types of structured light L2 to scan the target area once each, six super-resolution images of the sample 20 to be inspected can be captured. The time it takes to capture six super-resolution images corresponds to one inspection cycle.

[0117] Referring again to Figure 2 , when structured light L2 illuminates sample 20, the fluorescent material within the sample 20 is stimulated to produce fluorescence (defined as detection light L3 in this embodiment). The first and second wavelengths of light within light source L1 excite the fluorescent material within the sample 20 to produce fluorescence of different wavelengths. That is, detection light L3 includes a first detection light beam corresponding to the first wavelength and a second detection light beam corresponding to the second wavelength. These first and second detection lights produce fluorescence of different wavelengths.

[0118] In this embodiment, the imaging module 14 includes a first detection channel and a second detection channel that are independent of each other. The first detection light is guided to the first detection channel to generate a super-resolution image, and the second detection light is guided to the second detection channel to generate a super-resolution image.

[0119] In other embodiments, the light source module 11 can emit light of four different wavelengths, the detection light L3 includes fluorescence of four wavelengths, and the imaging module 14 includes four detection channels to respectively receive the fluorescence of the four wavelengths to generate a super-resolution image.

[0120] In this embodiment, the first and second detection channels have essentially the same structure and function. The first detection channel will be used as an example for the following description. The first detection channel includes a filter 141, a tube lens 142, and a camera 143, which are sequentially arranged along the optical path of the first detection light in the detection light L3. Filter 141 is used to filter out wavelengths other than the first detection light, and tube lens 142 is used to focus the first detection light onto camera 143. Camera 143 is used to generate a super-resolution image based on the first detection light.

[0121] In this embodiment, during the process of the structured light L2 scanning the sample to be detected 20, the sample to be detected 20 continues to generate detection light L3, and the camera 143 is continuously in an exposure state to collect a super-resolution image of the sample to be detected 20 according to the detection light L3, and synchronously ends the exposure when the structured light L2 scan ends.

[0122] The biometric recognition device 10 also includes an objective lens 161, a light guiding element 162, and a dichroic mirror 163. The objective lens 161 is located on the optical path of the structured light L2 and the detection light L3, and is located between the sample to be detected 20 and the imaging module 14. It is used to make the structured light L2 vertically incident on the sample to be detected 20, and is used to guide the detection light L3 from the sample to be detected 20 to the imaging module 14. In this embodiment, the light guiding element 162 is a dichroic mirror. The light guiding element 162 is located on the optical path of the structured light L2 and the detection light L3, and is located between the objective lens 161 and the imaging module 14. It is used to reflect the structured light L2 from the scanning module 13 to the objective lens 161, and to transmit the detection light L3 from the objective lens 161 to the imaging module 14. The dichroic mirror 163 is located on the optical path of the detection light L3 and is used to receive the detection light L3 from the light guiding element 162 and reflect the first detection light in the detection light L3 to the first detection channel and transmit the second detection light in the detection light L3 to the second detection channel.

[0123] In this embodiment, the surface from which the structured light generating element 121 emits the structured light L2 is conjugate to the object plane of the objective lens 161. The front focal plane of the third lens 123 (i.e., the surface from which the scanning galvanometer 131 reflects the structured light L2) is conjugate to the back focal plane of the objective lens 161. This allows the structured light L2 to be focused by the fifth lens 133 onto the back focal plane of the objective lens 161. The structured light L2 emitted by the objective lens 161 is a parallel beam, achieving wide-field structured light illumination at the front focal plane (object plane) of the objective lens 161. The striped structured light L2 generated by the optical modulation module 12 can be scaled to the object plane while ensuring consistent phase information. Furthermore, the image plane (i.e., the imaging surface of the camera 143) is conjugate to the surface from which the structured light generating element 121 emits the structured light L2 and the front focal plane of the fourth lens 132, facilitating the camera 143's reception of the detection light L3.

[0124] In this embodiment, the scanning galvanometer 131 is located on a conjugate plane of the object plane spectrum plane (i.e., the Fourier plane) of the objective lens 161, and the structured light generating element 121 is located on a conjugate plane of the object plane of the objective lens 161. In this way, the structured light L2 generated by the structured light generating element 121 can be projected onto the surface of the sample 20 to be inspected in the form of wide-field parallel light.

[0125] In this embodiment, the surface of the sample 20 to be inspected is conjugate to the image plane of the camera 143. After passing through the fourth lens 132 and the fifth lens 133, the plane formed by the first and second axes of the scanning galvanometer 131 in the paraxial region is conjugate to the back focal plane of the objective lens 161. That is, after passing through the fourth lens 132 and the fifth lens 133, the light beam is focused at the intersection of the back focal plane of the objective lens 161 and the principal optical axis of the structured light L2.

[0126] In this embodiment, the controller 15 includes a signal transmitter, an image acquisition card, and a computer. The computer transmits drive signals through the signal transmission controller to drive the first light source 111, the second light source 111, the scanning galvanometer 131, and the camera 143. This controls the on / off switching of the first light source 111 and the second light source 111, the deflection angle of the scanning galvanometer 131, and the exposure time of the camera 143. The computer is also used to process the super-resolution image to obtain base sequence information of the sample 20 to be tested. The image acquisition card is used to store images captured by the camera.

[0127] 9 , this embodiment further provides a biometric identification method based on super-resolution, which is applied to the controller 15 in the biometric identification device 10 based on super-resolution. The biometric identification method based on super-resolution includes the following steps.

[0128] Step S1, light source emission step: emitting light source light of a predetermined wavelength and modulating the intensity and phase of the light source light to generate structured light.

[0129] Step S2, scanning and image acquisition step: drive the scanning galvanometer to rotate around the first and second axes perpendicular to each other to adjust the propagation direction of the structured light, pass the adjusted structured light through the sample to be detected to generate detection light, and synchronously drive the camera to collect the detection light and generate a super-resolution image.

[0130] Step S3, verification step: detecting whether the light intensity uniformity of the obtained super-resolution image reaches a preset threshold.

[0131] If the answer in step S3 is yes, step S4 is executed to determine whether a preset number of super-resolution images have been collected.

[0132] If the answer in step S3 is no, step S5 is executed to reset the driving signal and step S2 is executed again.

[0133] If the answer in step S4 is yes, step S6 is executed, which is an identification step: identifying feature information of the sample to be detected based on the super-resolution image.

[0134] In step S1 of this embodiment, the controller 15 outputs a target fringe image to the structured light generating element 121 and also outputs a switching signal to the first light source 111 and the second light source 111 to control the first light source 111 and the second light source 111 to turn on and off. The target fringe image is an image of the fringe pattern that can be formed by the structured light L2 modulated by the structured light generating element 121 during the current time period. The controller 15 sends the target fringe image to the structured light generating element 121 in the form of a digital signal. Based on the target fringe image, the structured light generating element 121 determines which deflection state each micro-mirror 122 needs to maintain in order to modulate the structured light L2 consistent with the target fringe image, and controls the deflection of each micro-mirror 122 to the corresponding deflection state.

[0135] In step S2 of this embodiment, the controller 15 synchronously outputs driving signals to the scanning galvanometer mirror 131 and the camera 143 , so that the scanning galvanometer mirror 131 and the camera 143 are synchronously in working state.

[0136] Please refer to Figure 10 , where the horizontal axis represents time and the vertical axis represents voltage level. In this embodiment, the controller 15 sends a TTL trigger signal T1 at a fixed frequency and duty cycle to the camera 143 to control the start and stop times of the camera 143's exposure. The controller 15 also outputs a first voltage signal T2 and a second voltage signal T3 to the scanning mirror 131 to control the deflection of the scanning mirror 131 about the first and second axes, respectively. The deflection angle of the scanning mirror 131 is controlled by the voltage values.

[0137] Figure 10 shows the waveforms of the various drive signals during the acquisition of one super-resolution image within a detection cycle. As shown in Figure 10 , the moment when scanning mirror 131 begins scanning and the moment when camera 143 begins exposure are synchronized, and the moment when the scanning mirror stops scanning and the moment when the camera stops exposure are also synchronized. The term "synchronization" in this embodiment does not necessarily mean exact identicality; as long as the system's tolerance is acceptable, synchronization is considered to be achieved.

[0138] In this embodiment, the biometric recognition device 10 needs to capture six super-resolution images during one detection cycle. After capturing each super-resolution image, the controller 15 first turns off the first and second light sources 111, stops the deflection of the scanning mirror 131, and stops the exposure of the camera 143. It then turns on the first and second light sources 111, drives the deflection of the scanning mirror 131, and controls the camera 143 to begin exposure, thereby starting to capture the next super-resolution image. That is, after completing step S2, the controller 15 also includes the steps of turning off the first and second light sources 111, stopping the deflection of the scanning mirror 131, and stopping the exposure of the camera 143.

[0139] In order to ensure the accuracy of the super-resolution image, it is necessary to ensure the synchronization of the driving signal output by the controller 15. In this embodiment, step S3 determines whether the driving signal is synchronized by verifying whether the uniformity of the super-resolution image reaches a preset threshold. In this embodiment, the above-mentioned preset threshold is set to 80%. That is, when the uniformity of the super-resolution image is greater than or equal to 80%, the super-resolution image is considered to meet the requirements and can be used to subsequently obtain the nucleic acid sequence information of the sample 20 to be tested. If the uniformity of the super-resolution image is less than or equal to 80%, it is considered that the synchronization of the driving signal is poor, and it is judged that the super-resolution image generated at this time does not meet the requirements.

[0140] When the controller 15 determines that the super-resolution image does not meet the requirements, it executes step S5 to reset the driving signal, and executes step S2 again to resynchronize the output driving signal to obtain a new super-resolution image.

[0141] As previously mentioned, the biometric recognition device 10 of this embodiment employs a three-step phase-shift detection method, requiring the generation of six super-resolution images to obtain base sequence information for the sample 20 to be tested. If the super-resolution image is determined to meet the requirements in step S3, step S4 is executed to determine whether six super-resolution images have been acquired. If six super-resolution images have been acquired, step S6 is executed to terminate the detection process. Specifically, the controller 15 outputs a switch signal to turn off the first and second light sources 111, and outputs a drive signal to terminate the deflection of the scanning mirror 131 and the exposure of the camera 143.

[0142] If the answer in step S4 is no, that is, if it is determined that six super-resolution images have not been collected, the next target fringe image is replaced and step S1 is continued. The controller 15 outputs a driving signal to turn on the first light source 111, the second light source 111, the scanning galvanometer 131 and the camera 143 to collect the next super-resolution image until six super-resolution images are collected.

[0143] In a pair of proportional super-resolution detection systems and super-resolution detection methods, in order to ensure that the super-resolution detection system has a sufficiently high spatial frequency for super-resolution reconstruction, the fringe period frequency of the structured light needs to be close to 2NA / λ to achieve a two-fold resolution improvement. Therefore, the super-resolution detection system is required to meet a specific beam reduction ratio to achieve the above-mentioned fringe period frequency. The imaging field of view of the structured light on the object plane is determined by the size of the structured light generating element and the beam reduction ratio (imaging field of view = size of the structured light generating element / bundle reduction ratio). It can be seen that an excessively large beam reduction ratio will severely limit the imaging field of view of the structured light, making it difficult to fully utilize the full field of view of the objective lens and camera in the super-resolution detection system, which greatly reduces the imaging efficiency. Especially for large-sized samples to be detected, in order to make the structured light cover the entire surface of the sample to be detected, the platform carrying the sample to be detected needs to be moved frequently. On the one hand, this results in a longer time consumption, and on the other hand, it also increases the complexity and instability of the system.

[0144] Taking a super-resolution detection system with a light source wavelength of 640nm, a magnification of 20, an objective lens with a focal length of 10mm and a numerical aperture of 0.85 as an example, the theoretically achievable resolution limit of this super-resolution detection system is (690×0.61) / 0.85=495nm. For example, using a structured light generator with 2560×1600 pixels and a pixel size of 7.56μm, four pixels on the DMD generate a fringe period. To achieve 1.5x super-resolution imaging (resolution of 330nm), the period of a set of fringe structured light is approximately 920nm. This means that the fringe structured light illumination pattern generated by the structured light generator needs to be narrowed by a factor of 33 and projected onto the object surface, resulting in a limited field of view of 580μm×360μm. The field of view of a traditional objective lens has a diameter of approximately 1.2mm, so the effective field of view of the structured light generated by projection only utilizes 18% of the objective lens's full field of view.

[0145] Increasing the beam reduction ratio of structured light can reduce the fringe period of structured light, thereby continuing to improve the resolution of the imaging system, but the corresponding effective illumination field of view will continue to decrease, and the utilization rate of the full field of view of the objective lens will also continue to decrease accordingly.

[0146] To address the issue of reduced field of view utilization caused by the process of improving resolution and beam reduction ratio, in this embodiment, the controller 15 drives the scanning galvanometer mirror 131 to continuously deflect at a uniform speed, thereby guiding the structured light L2 to different positions on the sample 20 to be inspected, thereby scanning various areas on the surface of the sample 20 to be inspected. The above process allows the structured light L2 to be projected not only onto a fixed area of ​​the sample 20 to be inspected, but also onto multiple areas of the sample 20 to be inspected through the deflection process of the scanning galvanometer mirror 131. This is equivalent to expanding the field of view of the structured light L2, thereby improving the utilization of the imaging field of view of the objective lens 161 and the camera 143.

[0147] Taking the structured light generating element 121 with a resolution of 2560×1600 and a pixel size of 7.56 μm as an example, a 30-fold zoom ratio is achieved through the objective lens 161 (focal length f=10 mm), and the original field of view of the structured light L2 (the field of view that can be formed by direct projection, see the field of view F0 shown in FIG7 ) is approximately 0.5 mm×0.36 mm. The scanning of the sample to be detected 20 by the structured light L2 is achieved through the deflection process of the scanning galvanometer 131, which is equivalent to expanding the field of view of the structured light L2 to 1.2 mm×1.2 mm (expanded by more than 5 times), which achieves the maximum field of view achievable by the objective lens 161, which is conducive to the full utilization of the field of view of the objective lens 161, and is also conducive to the full utilization of the field of view of the camera 143.

[0148] That is, the biometric identification device 10 and the biometric identification method of the embodiment of the present application drive the scanning galvanometer 131 to deflect around the first axis and the second axis through the controller 15, thereby adjusting the propagation direction of the structured light L2, so that the structured light L2 can be projected to different positions of the sample to be detected 20 in succession. This is equivalent to widening the field of view of the structured light L2 (equivalent to widening the field of view F0 to the size of the above-mentioned target area) while improving the resolution and the beam reduction ratio, which is conducive to making full use of the imaging field of view of the objective lens 161 and the camera 143, and also reduces the number of times the platform 20 is moved, which is conducive to improving the detection efficiency of the biometric identification device 10, and solves the problem of reduced field of view utilization caused by the process of improving the resolution and the beam reduction ratio.

[0149] On the other hand, in the process of uniform deflection of the scanning galvanometer 131 to drive the uniform scanning of the structured light L2, because the exposure time of each pixel in the field of view is basically the same, the illumination field obtained by scanning is more uniform than the traditional Gaussian beam (the light intensity distribution of the Gaussian beam follows the Gaussian distribution curve, and there is a problem of strong energy in the center and weak energy on both sides). The large field of view and wide field illumination formed by the scanning method is close to the energy distribution of a parallel beam, and has a very high lighting efficiency.

[0150] Furthermore, the illumination beam (structured light L2) generated by scanning is more suitable for panoramic scanning imaging of large samples than traditional Gaussian illumination beams. Widefield scanning and area array camera acquisition methods offer greater flexibility and can be applied to other widefield illumination microscopy techniques, expanding the effective field of view and improving the uniformity of the illumination light field.

[0151] Furthermore, the super-resolution detection system of the embodiment of the present application has low overall structural complexity and is easy to implement.

[0152] The wide-field scanning imaging system and the wide-field scanning imaging method of this embodiment can achieve all the beneficial effects of the super-resolution-based biometric identification device and the super-resolution-based biometric identification method described above.

[0153] Those skilled in the art should recognize that the above embodiments are merely intended to illustrate the present application and are not intended to limit the present application. As long as they are within the spirit of the present application, appropriate changes and modifications to the above embodiments are within the scope of protection claimed in the present application.

Claims

1. A wide-field scanning imaging system, characterized in that: include: A light source module, used for emitting light from a light source; A light modulation module is located on the optical path of the light source, and includes a structured light generating element that modulates the light intensity and phase of the light source to generate structured light and emit it; A scanning module is located on the outgoing optical path of the structured light, and includes a scanning galvanometer. The scanning galvanometer can rotate around a first axis and a second axis that are perpendicular to each other to adjust the propagation direction of the structured light. The structured light adjusted by the scanning galvanometer traverses the sample to be detected to generate detection light. An imaging module, located in the optical path of the detection light, including a camera for collecting the detection light; as well as A controller is electrically connected to the scanning module and the imaging module respectively, and the controller is configured to synchronously output a driving signal to the scanning module and the imaging module so as to synchronize the deflection of the scanning galvanometer with the exposure of the camera.

2. The wide-field scanning imaging system according to claim 1, characterized in that: The scanning module also includes a 4f lens group located between the scanning galvanometer and the sample to be detected.

3. The wide field scanning imaging system according to claim 2, characterized in that: The imaging module includes an objective lens located between the camera and the sample to be detected and a light guiding element located between the objective lens and the camera. The structured light is transmitted to the light guiding element through the 4f lens group, reflected by the light guiding element to the objective lens, and projected to the sample to be detected through the objective lens. The first axial direction and the second axial direction are conjugate with the back focal plane of the objective lens in the plane formed by the paraxial region of the scanning galvanometer.

4. The wide field scanning imaging system according to claim 3, characterized in that: The structured light generating element is a micro-mirror array, and the controller is connected to the micro-mirror array to control the phase of the structured light modulated by the micro-mirror array.

5. The wide field scanning imaging system according to claim 3, characterized in that: The light guiding element is a dichroic mirror, and the detection light is transmitted to the camera through the dichroic mirror.

6. The wide field scanning imaging system according to claim 3, characterized in that: The light source module includes a first light source emitting light of a first wavelength, a second light source emitting light of a second wavelength, and a multimode optical fiber connecting the first light source and the second light source. The controller is electrically connected to the light source module to control the switching of the first light source and the second light source.

7. The wide field scanning imaging system according to claim 6, characterized in that: The detection light includes first detection light corresponding to the first wavelength light and second detection light corresponding to the second wavelength light.

8. The wide field scanning imaging system according to claim 7, characterized in that: The imaging module includes a first detection channel corresponding to receiving the first detection light, a second detection channel corresponding to receiving the second detection light, and a dichroic mirror arranged on the side of the light guiding element away from the objective lens, the dichroic mirror is configured to separate the first detection light and the second detection light and guide them to the first detection channel and the second detection channel respectively, and the first detection channel and the second detection channel respectively include a camera.

9. An imaging method of a wide-field scanning imaging system, characterized in that: The wide-field scanning imaging system includes a scanning galvanometer and a camera; The wide-field scanning imaging method comprises: Light source emitting step: emitting light from a light source and generating structured light by modulating the light intensity and phase of the light from the light source and emitting the structured light; and Scanning and image acquisition steps: the scanning galvanometer receives the structured light and rotates around the first axis and the second axis respectively to adjust the propagation direction of the structured light and passes the adjusted structured light through the sample to be detected to generate detection light, and synchronously drives the camera to collect the detection light and generate an image.

10. The imaging method according to claim 9, characterized in that: The light source emitting step includes: using a micro-mirror array to modulate the phase of the structured light.

11. The imaging method according to claim 9, characterized in that: In the scanning step, the structured light is projected onto the sample to be detected through the scanning galvanometer and a 4f lens group located between the scanning galvanometer and the sample to be detected.

12. The imaging method according to claim 11, wherein: In the image acquisition step, the detection light is transmitted to the camera via the objective lens, and the plane formed by the first axial direction and the second axial direction in the paraxial region of the scanning galvanometer is conjugate with the back focal plane of the objective lens.

13. The imaging method according to claim 9, characterized in that: The light source light includes a first wavelength light and a second wavelength light, and the light source emission step includes: emitting the first wavelength light and the second wavelength light simultaneously and modulating them accordingly to generate the corresponding structured light.

14. The imaging method according to claim 13, wherein: The image acquisition step includes: respectively acquiring first detection light corresponding to the first wavelength light and second detection light corresponding to the second wavelength light in different detection channels.

15. A super-resolution sequencer, characterized in that: include: A light source module, used for emitting light from a light source; A light modulation module is located on the optical path of the light source, and includes a structured light generating element that modulates the light intensity and phase of the light source to generate structured light and emit it; A scanning module is located on the outgoing optical path of the structured light, and includes a scanning galvanometer. The scanning galvanometer can rotate around a first axis and a second axis that are perpendicular to each other to adjust the propagation direction of the structured light. The structured light adjusted by the scanning galvanometer traverses the sample to be detected to generate detection light. An imaging module, located in the optical path of the detection light, comprising a camera for collecting the detection light and generating a super-resolution image; as well as A controller is electrically connected to the scanning module and the imaging module respectively, and is configured to synchronously output a driving signal to the scanning module and the imaging module so that the deflection of the scanning galvanometer is synchronized with the exposure of the camera; and identify the feature information of the sample to be detected according to the super-resolution image.

16. The super-resolution sequencer according to claim 15, characterized in that: The scanning module also includes a 4f lens group located between the scanning galvanometer and the sample to be detected.

17. The super-resolution sequencer according to claim 16, characterized in that: The imaging module includes an objective lens located between the camera and the sample to be detected and a light guiding element located between the objective lens and the camera. The structured light is transmitted to the light guiding element through the 4f lens group, reflected by the light guiding element to the objective lens, and projected to the sample to be detected through the objective lens. The first axial direction and the second axial direction are conjugate with the back focal plane of the objective lens in the plane formed by the paraxial region of the scanning galvanometer.

18. The super-resolution sequencer according to claim 15, characterized in that: The structured light generating element is a micro-mirror array, and the controller is connected to the micro-mirror array to control the phase of the structured light modulated by the micro-mirror array.

19. The super-resolution sequencer according to claim 15, characterized in that: The light guiding element is a dichroic mirror, and the detection light is transmitted to the camera through the dichroic mirror.

20. The super-resolution sequencer according to claim 15, characterized in that: The light source module includes a first light source emitting light of a first wavelength, a second light source emitting light of a second wavelength, and a multimode optical fiber connecting the first light source and the second light source. The controller is electrically connected to the light source module to control the switching of the first light source and the second light source.

21. The super-resolution sequencer according to claim 18, characterized in that: The detection light includes first detection light corresponding to the first wavelength light and second detection light corresponding to the second wavelength light.

22. The super-resolution sequencer according to claim 19, characterized in that: The imaging module includes a first detection channel corresponding to receiving the first detection light, a second detection channel corresponding to receiving the second detection light, and a dichroic mirror arranged on the side of the light guiding element away from the objective lens, the dichroic mirror is configured to separate the first detection light and the second detection light and guide them to the first detection channel and the second detection channel respectively, and the first detection channel and the second detection channel respectively include a camera.

23. The super-resolution sequencer according to any one of claims 15 to 22, characterized in that: The sample to be detected is a biological sample, and the controller is used to obtain biological information of the sample to be detected.

24. The super-resolution sequencer according to claim 23, characterized in that: The sample to be detected is a nucleic acid sample, and the characteristic information is the base sequence information of the sample to be detected.

25. A biometric identification method based on super-resolution, characterized in that: include: Light source emitting step: emitting light source light of a predetermined wavelength and modulating the light intensity and phase of the light source light to generate structured light; Scanning and image acquisition steps: driving the scanning galvanometer to rotate around a first axis and a second axis perpendicular to each other to adjust the propagation direction of the structured light, passing the adjusted structured light through the sample to be detected to generate detection light, and synchronously driving the camera to collect the detection light and generate a super-resolution image; as well as Identification step: identifying feature information of the sample to be detected based on the super-resolution image.

26. The biometric identification method based on super-resolution according to claim 25, characterized in that: In the light source emission step, the structured light of different phases is generated successively by using a micro-mirror array; The method comprises: performing the scanning and image acquisition steps based on the structured light of different phases respectively to obtain a plurality of images corresponding to the structured light of different phases; The identification step includes: performing super-resolution reconstruction according to the multiple images to form a super-resolution image and identifying feature information of the sample to be detected based on the super-resolution image.

27. The biometric identification method based on super-resolution according to claim 26, characterized in that: Also includes: Verification step: detecting the light intensity uniformity of the super-resolution image obtained under the single phase structured light, and comparing the light intensity uniformity with a preset threshold, and performing the identification step based on the comparison result.

28. The biometric identification method based on super-resolution according to claim 26, characterized in that: In the light source emission step, a micro-mirror array is used to successively generate the structured lights of six different phases.

29. The super-resolution-based biometric identification method according to any one of claims 26 to 18, characterized in that: The sample to be detected is a biological sample; The identification step includes: performing super-resolution reconstruction according to the different images to form a super-resolution image and identifying the biological information of the sample to be detected based on the super-resolution image.

30. The biometric identification method based on super-resolution as claimed in claim 29, characterized in that: The identification step includes: performing super-resolution reconstruction according to the different images to form a super-resolution image and identifying the base sequence information of the sample to be detected based on the super-resolution image.

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