Display substrate and manufacturing method therefor, and display device

Abstract

A display substrate and a manufacturing method therefor, and a display device. The display substrate comprises a base substrate, a plurality of sub-pixels, an insulating layer and a first isolation structure. Each sub-pixel comprises a light-emitting functional layer, and a first electrode and a second electrode which are located on two sides of the light-emitting functional layer in a direction perpendicular to the base substrate. The insulating layer is located between the first electrode and the base substrate, and the first isolation structure is located on a side of the insulating layer away from the base substrate. A groove in the insulating layer and the first isolation structure are at least partially located between adjacent sub-pixels, and the first isolation structure protrudes into an opening of the groove to form a first protruding portion. At least part of the first electrode and at least part of the first isolation structure are made of the same material and are arranged on the same layer, and a gap is provided between the first electrode and the first isolation structure. At least one of a plurality of film layers of the light-emitting functional layer is disconnected at the first protruding portion. By providing the first electrode and the first isolation structure, the number of process steps can be reduced, thereby simplifying the manufacturing process.

Description

Display substrate, manufacturing method thereof, and display device Technical Field

[0001] At least one embodiment of the present disclosure relates to a display substrate, a manufacturing method thereof, and a display device. Background Art

[0002] Tandem organic light-emitting display devices are composed of multiple light-emitting units connected in series. By isolating the light-emitting layers between adjacent sub-pixels, signal crosstalk can be reduced, thereby meeting the performance requirements of high brightness and low power consumption of the display device.

[0003] Summary of the Invention

[0004] At least one embodiment of the present disclosure provides a display substrate, a manufacturing method thereof, and a display device.

[0005] At least one embodiment of the present disclosure provides a display substrate, comprising: a base substrate; a plurality of sub-pixels located on the base substrate, wherein each of at least some of the sub-pixels comprises a light-emitting functional layer and a first electrode and a second electrode located on either side of the light-emitting functional layer in a direction perpendicular to the base substrate, wherein the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer comprises a plurality of film layers; and an insulating layer located between the first electrode and the base substrate. The display substrate further comprises a first isolation structure located on a side of the insulating layer away from the base substrate, wherein an orthographic projection of the first isolation structure on the base substrate overlaps with an orthographic projection of the insulating layer on the base substrate. The insulating layer comprises a groove, wherein the groove and the first isolation structure are at least partially located between adjacent sub-pixels, the first isolation structure overlaps with a projection on the base substrate of a portion of a surface of the insulating layer away from the base substrate constituting an edge of the groove, and the first isolation structure protrudes into the groove opening of the groove to form a first protrusion. At least a portion of the first electrode and at least a portion of the first isolation structure are made of the same material and are disposed on the same layer, and a gap is provided between the first electrode and the first isolation structure. At least one of the plurality of film layers is disconnected at the first protrusion.

[0006] For example, according to at least one embodiment of the present disclosure, the display substrate further includes a second isolation structure, which is stacked with the first isolation structure; the second isolation structure overlaps with a projection of a portion of the edge of the groove on the base substrate, and protrudes into the groove opening to form a second protrusion; the second protrusion overlaps with the first protrusion in a direction perpendicular to the base substrate.

[0007] For example, according to at least one embodiment of the present disclosure, the minimum dimension of the second isolation structure along the arrangement direction of the adjacent sub-pixels is not greater than the minimum dimension of the first isolation structure along the arrangement direction of the adjacent sub-pixels.

[0008] For example, according to at least one embodiment of the present disclosure, a size of the second isolation structure in a direction perpendicular to the substrate is 10 angstroms to 2000 angstroms.

[0009] For example, according to at least one embodiment of the present disclosure, the second isolation structure includes at least one of a conductive material and an insulating material.

[0010] For example, according to at least one embodiment of the present disclosure, the first electrode includes multiple electrode layers, the second isolation structure is made of the same material as at least one electrode layer of the first electrode, and the second isolation structure is located between the first isolation structure and the insulating layer.

[0011] For example, according to at least one embodiment of the present disclosure, the second isolation structure includes at least one film layer.

[0012] For example, according to at least one embodiment of the present disclosure, the minimum spacing between the first electrode and the first isolation structure in the arrangement direction of the adjacent sub-pixels is not less than 1 micron, and the ratio of the minimum spacing to the size of the sub-pixel in the arrangement direction of the adjacent sub-pixels is not greater than 2.

[0013] For example, according to at least one embodiment of the present disclosure, a ratio of a size of the first electrode in a direction perpendicular to the base substrate to a size of the first isolation structure in a direction perpendicular to the base substrate is 0.9 to 1.1.

[0014] For example, according to at least one embodiment of the present disclosure, in the arrangement direction of the adjacent sub-pixels, the ratio of the minimum dimension of the first protrusion to the minimum dimension of the first isolation structure is 0.005 to 0.2.

[0015] For example, according to at least one embodiment of the present disclosure, the groove includes a first side wall and a second side wall arranged opposite to each other in the arrangement direction of the adjacent sub-pixels; in a direction perpendicular to the substrate, at least the first side wall overlaps with the first isolation structure; the slope angle of the first side wall and the plane parallel to the contact surface between the first side wall and the first isolation structure is a first slope angle; the slope angle of the second side wall and the plane parallel to the contact surface between the first side wall and the first isolation structure is a second slope angle; the first slope angle is not greater than the second slope angle.

[0016] For example, according to at least one embodiment of the present disclosure, the first slope angle is smaller than the second slope angle, and the first slope angle is between 60° and 150°.

[0017] For example, according to at least one embodiment of the present disclosure, the display substrate further includes: a pixel defining pattern located on a side of the first electrode away from the base substrate, the pixel defining pattern including a plurality of first openings, one sub-pixel corresponding to at least one first opening, the light-emitting functional layer of the sub-pixel at least partially located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode; wherein the pixel defining pattern further includes a plurality of second openings, and the first protrusion is exposed by the second opening.

[0018] For example, according to at least one embodiment of the present disclosure, the pixel defining pattern includes a pixel defining portion surrounding the multiple first openings and the multiple second openings, and the slope angle of at least a portion of the side surface of the pixel defining portion and the plane parallel to the contact surface between the pixel defining portion and the first isolation structure is a third slope angle; the third slope angle is not greater than the first slope angle.

[0019] For example, according to at least one embodiment of the present disclosure, a ratio of a minimum dimension of the second opening along the arrangement direction of the adjacent sub-pixels to a minimum dimension of the first opening along the arrangement direction of the adjacent sub-pixels is 0.05-2.

[0020] For example, according to at least one embodiment of the present disclosure, the pixel defining portion covers the space.

[0021] For example, according to at least one embodiment of the present disclosure, the orthographic projection of the pixel defining portion on the base substrate and the orthographic projection of the first electrode on the base substrate have an overlapping portion; the minimum size of the overlapping portion along the arrangement direction of the adjacent sub-pixels is not less than 0.5 microns.

[0022] For example, according to at least one embodiment of the present disclosure, a ratio of a size of the groove opening along the arrangement direction of the adjacent sub-pixels to a size of the second opening along the arrangement direction of the adjacent sub-pixels is 0.7 to 1.5.

[0023] For example, according to at least one embodiment of the present disclosure, the maximum dimension of the groove in the direction perpendicular to the base substrate is not greater than the maximum dimension of the insulating layer in the direction perpendicular to the base substrate, and the dimension of the groove in the direction perpendicular to the base substrate is not less than 0.1 microns.

[0024] At least one embodiment of the present disclosure provides a display device, comprising the display substrate provided by any of the above embodiments.

[0025] At least one embodiment of the present disclosure provides a method for manufacturing a display substrate, the manufacturing method comprising: forming a plurality of sub-pixels on a base substrate, wherein forming the sub-pixels comprises sequentially forming a first electrode, a light-emitting functional layer and a second electrode stacked in a direction perpendicular to the base substrate, the first electrode being located between the light-emitting functional layer and the base substrate; the manufacturing method further comprises: forming an insulating material layer on the base substrate; forming a conductive material layer on a side of the insulating material layer away from the base substrate; wherein the conductive material layer is patterned to form the first electrode and an isolation structure, with a gap between the first electrode and the isolation structure; etching the insulating material layer to form a groove, wherein the isolation structure overlaps with a projection on the base substrate of a portion of a surface of the insulating material layer on a side away from the base substrate constituting an edge of the groove, and protrudes into the groove opening of the groove to form a protrusion; the light-emitting functional layer is formed after the groove is formed, the light-emitting functional layer comprises a plurality of film layers, at least one of the plurality of film layers being disconnected at the protrusion. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, rather than limiting the present disclosure.

[0027] FIG1 is a partial cross-sectional schematic diagram of a display substrate.

[0028] FIG. 2A is a partial cross-sectional schematic diagram of another display substrate.

[0029] FIG. 2B is an electron microscope image showing a local structure of another display substrate.

[0030] FIG3A is a partial plan view of a display substrate provided in an example of at least one embodiment of the present disclosure.

[0031] 3B and 3C are partial cross-sectional schematic views taken along line AA′ shown in FIG. 3A .

[0032] FIG3D is a partial cross-sectional schematic diagram of the first electrode and the first isolation structure in the display substrate shown in FIG3B .

[0033] FIG4A is a partial plan view of a display substrate provided in an example of at least one embodiment of the present disclosure.

[0034] FIG. 4B is a partial cross-sectional schematic diagram taken along line BB′ shown in FIG. 4A .

[0035] 5A to 5E are schematic flow charts of a method for manufacturing a display substrate before forming FIG. 3B , provided in an example according to at least one embodiment of the present disclosure.

[0036] 6A and 6B are schematic flow charts of a method for manufacturing a display substrate before forming FIG. 3B , provided in another example according to at least one embodiment of the present disclosure.

[0037] FIG7A is a partial plan view of a display substrate provided in an example of at least one embodiment of the present disclosure.

[0038] FIG. 7B is a partial cross-sectional schematic diagram taken along line CC′ shown in FIG. 7A .

[0039] 8A and 8B are schematic flow charts of a method for manufacturing a display substrate before forming FIG. 7B , provided in an example according to at least one embodiment of the present disclosure.

[0040] FIG9 is a partial cross-sectional schematic diagram of a display substrate provided in an example of at least one embodiment of the present disclosure. DETAILED DESCRIPTION

[0041] To make the purpose, technical solutions, and advantages of the embodiments of the present disclosure more clear, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0042] Unless otherwise defined, technical or scientific terms used in this disclosure should have the ordinary meanings understood by people with ordinary skills in the field to which this disclosure belongs. The words "first", "second" and similar terms used in this disclosure do not indicate any order, quantity or importance, but are simply used to distinguish different components. The words "include" or "comprising" and similar terms mean that the elements or objects preceding the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0043] The features such as "perpendicular", "parallel" and "same" used in this disclosure include the features such as "perpendicular", "parallel" and "same" in the strict sense, as well as the cases where "approximately perpendicular", "approximately parallel" and "approximately the same" include certain errors, taking into account the errors associated with the measurement and the measurement of specific quantities (that is, the limitations of the measurement system), and are expressed as being within the acceptable deviation range for a specific value determined by a person of ordinary skill in the art. The "center" in the embodiments of the present disclosure can include a position strictly at the geometric center and a position approximately at the center of a small area around the geometric center. For example, "approximately" can mean within one or more standard deviations, or within 10% or 5% of the value.

[0044] A tandem organic light-emitting diode (TOLED) connects multiple independent light-emitting units in series. The same current flows through each unit sequentially, allowing them to emit light together, thereby increasing brightness and efficiency. At the same current density, TOLED devices achieve significantly higher brightness and current efficiency than organic light-emitting diodes (OLEDs). They offer advantages such as high brightness, low current density, high current efficiency, and a long lifespan, demonstrating promising development prospects and practical value in the field of solid-state semiconductor light-emitting devices.

[0045] During the study, the inventors of the present application discovered that the light-emitting functional layer of the sub-pixel may include a plurality of light-emitting layers stacked in layers, and a charge generation layer (CGL) is arranged between at least two layers of the multi-layer light-emitting layers. The charge generation layer has a large conductivity. When the charge generation layer is a whole-surface film layer, the charge generation layers of two adjacent sub-pixels are continuous film layers, and there is a phenomenon of lateral charge conduction. For example, during the light-emitting stage of a certain sub-pixel (for example, a green sub-pixel), the charge transmission by the charge generation layer will cause the nearby red sub-pixel or blue sub-pixel or green sub-pixel that should not emit light to be lit, resulting in a color shift.

[0046] FIG1 is a partial cross-sectional schematic diagram of a display substrate.

[0047] As shown in Figure 1, the display substrate includes a base substrate 01, multiple sub-pixels 10, a pixel-defining pattern 30, and spacers 40. Multiple sub-pixels 10 are located on the base substrate 01. Each of at least some of the sub-pixels 10 includes a light-emitting functional layer (not shown in Figure 1), and a first electrode 11 and a second electrode (not shown in Figure 1) located on either side of the light-emitting functional layer perpendicular to the base substrate 01 (the Z direction shown in Figure 1). The first electrode 11 is located between the light-emitting functional layer and the base substrate 01. The light-emitting functional layer includes multiple film layers. The pixel-defining pattern 30 is located on the side of the first electrode 11 facing away from the base substrate 01. The pixel-defining pattern 30 includes multiple first openings 31, with at least one first opening 31 corresponding to each sub-pixel 10. The light-emitting element of each sub-pixel 10 is at least partially located within the corresponding first opening 31, and the first opening 31 is configured to expose the first electrode 11. The spacers 40 are located on the side of the pixel-defining pattern 30 facing away from the base substrate 01. The spacers 40 have an undercut structure. By using the spacer 40 having the undercut structure, at least one layer among the multiple film layers of the light-emitting functional layer can be disconnected at the spacer 40 .

[0048] During the study, the inventors of this application found that the spacer 40 has an undercut structure, and the size (thickness) of the spacer 40 in the direction perpendicular to the base substrate 01 is large, thus forming a large step. In some subsequent processes, such as the process of color filter on encapsulation (COE) or the process of enhanced efficiency structure (EES), it is easy to cause problems such as film tearing in the module stage (MDL). Moreover, the spacer 40 with an undercut structure has more concentrated stress at its edges and corners, which may cause undesirable conditions such as cracking or separation of the evaporated packaging film layer.

[0049] Figure 2A is a partial cross-sectional schematic diagram of another display substrate. Figure 2B is an electron microscope image of a partial structure of yet another display substrate. For example, the structure shown in the electron microscope image of Figure 2B may be the same as the partial film layer or partial structure of the display substrate shown in Figure 2A.

[0050] As shown in Figure 2A, the display substrate includes a base substrate 01, multiple sub-pixels 10, a pixel-defining pattern 30, an insulating layer 20, and an inorganic layer 50. Multiple sub-pixels 10 are positioned on the base substrate 01. Each of at least some of the sub-pixels 10 includes a light-emitting functional layer (not shown in Figure 2A), and a first electrode 11 and a second electrode (not shown in Figure 2A) located on either side of the light-emitting functional layer perpendicular to the base substrate 01 (the Z direction shown in Figure 2A). The first electrode 11 is located between the light-emitting functional layer and the base substrate 01. The light-emitting functional layer comprises multiple film layers. The pixel-defining pattern 30 is located on the side of the first electrode 11 facing away from the base substrate 01. The pixel-defining pattern 30 includes multiple first openings 31, with at least one first opening 31 corresponding to each sub-pixel 10. The light-emitting element of each sub-pixel 10 is at least partially located within the corresponding first opening 31, and the first opening 31 is configured to expose the first electrode 11. The insulating layer 20 is located between the first electrode 11 and the base substrate 01, and the inorganic layer 50 is located between the first electrode 11 and the insulating layer 20. The insulating layer 20 includes a groove 21. The groove 21 and the inorganic layer 50 are at least partially located between adjacent sub-pixels 10. The inorganic layer 50 overlaps with the portion of the surface of the insulating layer 20 on the side away from the base substrate 01 that forms the edge of the groove 21, and protrudes into the opening of the groove 21 to form a protrusion 51. The inorganic layer 50 forms the protrusion 51 at the groove 21 of the insulating layer 20, so that at least one of the multiple film layers of the light-emitting functional layer can be disconnected at the protrusion 51 and the groove 21.

[0051] During the study, the inventors of the present application found that: after the inorganic layer 50 is deposited, the inorganic layer 50 needs to be patterned, for example, the inorganic layer 50 is exposed and dry-etched. When the first electrode 11 is wet-etched, the insulating layer 20 will not be over-etched. However, since the inorganic layer 50 is etched using ion gas during the exposure and dry-etching processes, the insulating layer 20 will be over-etched, resulting in a large step as shown at P in Figure 2A at the junction of the inorganic layer 50 and the insulating layer 20. Therefore, as shown in Figures 2A and 2B, after the first electrode 11 is deposited, the first electrode 11 will be disconnected at the step (such as P in Figures 2A and 2B), resulting in a current interruption.

[0052] At least one embodiment of the present disclosure provides a display substrate, comprising: a base substrate; a plurality of sub-pixels located on the base substrate, wherein each of at least some of the sub-pixels comprises a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer in a direction perpendicular to the base substrate, the first electrode being located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer comprising a plurality of film layers; an insulating layer being located between the first electrode and the base substrate; wherein the display substrate further comprises a first isolation structure located on a side of the insulating layer away from the base substrate, and an orthographic projection of the first isolation structure on the base substrate overlaps with an orthographic projection of the insulating layer on the base substrate; the insulating layer comprises a groove, wherein the groove and the first isolation structure are at least partially located between adjacent sub-pixels, the first isolation structure overlaps with a projection on the base substrate of a portion of a surface of the insulating layer away from the base substrate constituting an edge of the groove, and protrudes into the groove opening of the groove to form a first protrusion; the first electrode and at least a portion of the first isolation structure are made of the same material, are arranged on the same layer as at least a portion of the first isolation structure, and are spaced apart; and at least one of the plurality of film layers is disconnected at the first protrusion.

[0053] At least one embodiment of the present disclosure provides a display device, comprising the display substrate provided by any of the above embodiments.

[0054] At least one embodiment of the present disclosure provides a method for manufacturing a display substrate, the manufacturing method comprising: forming a plurality of sub-pixels on a base substrate, wherein the formation of the sub-pixels comprises sequentially forming a first electrode, a light-emitting functional layer and a second electrode which are stacked in a direction perpendicular to the base substrate, and the first electrode is located between the light-emitting functional layer and the base substrate; the manufacturing method further comprises: forming an insulating material layer on the base substrate; forming a conductive material layer on a side of the insulating material layer away from the base substrate; wherein the conductive material layer is patterned to form a first electrode and an isolation structure, and a gap is provided between the first electrode and the isolation structure; etching the insulating material layer to form a groove, wherein the isolation structure overlaps with a projection on the base substrate of a portion of a surface of the insulating material layer away from the base substrate which constitutes an edge of the groove, and protrudes into the groove opening of the groove to form a protrusion; the light-emitting functional layer is formed after the groove is formed, and the light-emitting functional layer comprises a plurality of film layers, and at least one of the plurality of film layers is disconnected at the protrusion.

[0055] The display substrate, its manufacturing method, and the display device provided by the embodiments of the present disclosure, by providing a groove and a first isolation structure between adjacent sub-pixels in the display substrate, can cause at least one film layer of the light-emitting functional layer to be disconnected at the first protrusion of the first isolation structure that protrudes relative to the edge of the groove, which is beneficial to reducing the probability of crosstalk between adjacent sub-pixels. Moreover, by setting the first electrode and at least part of the first isolation structure to be the same material and arranged in the same layer, a process step can be saved and the process can be simplified. In addition, by providing a gap between the first electrode and the first isolation structure, it is beneficial to prevent the first isolation structure from transmitting electrical signals to the area where the sub-pixels are located.

[0056] The display substrate, its manufacturing method, and the display device are described below with reference to the accompanying drawings and through some embodiments.

[0057] Figure 3A is a partial plan view of a display substrate provided in an example of at least one embodiment of the present disclosure. Figures 3B and 3C are partial cross-sectional views taken along line AA' shown in Figure 3A. Figure 3D is a partial cross-sectional view of the first electrode and first isolation structure in the display substrate shown in Figure 3B. Figure 3C differs from Figure 3B in that, for greater clarity, Figure 3C omits portions of the light-emitting functional layer 130, second electrode 120, base substrate 01, and other film layers 02 shown in Figure 3B. For example, line AA' is parallel to the X direction.

[0058] At least one embodiment of the present disclosure provides a display substrate, as shown in Figures 3A to 3D, which includes a base substrate 01, a plurality of sub-pixels 100, an insulating layer 200, and a first isolation structure 300. The plurality of sub-pixels 100 are located on the base substrate 01, and each of at least some of the sub-pixels 100 includes a light-emitting functional layer 130 and a first electrode 110 and a second electrode 120 located on both sides of the light-emitting functional layer 130 in a direction perpendicular to the base substrate 01. For example, the direction perpendicular to the base substrate 01 is the Z direction shown in Figure 3A. The first electrode 110 is located between the light-emitting functional layer 130 and the base substrate 01, and the light-emitting functional layer 130 includes a plurality of film layers. For example, the light-emitting functional layer 130 includes a charge generation layer 133. For example, the light-emitting element can be an organic light-emitting element.

[0059] For example, the first electrode 110 may be an anode, and the second electrode 120 may be a cathode. For example, the cathode may be formed of a material with high conductivity and low work function, such as a metal material. For example, the anode may be formed of a transparent conductive material with a high work function.

[0060] As shown in Figures 3B and 3C , the insulating layer 200 is located between the first electrode 110 and the base substrate 01. The first isolation structure 300 is located on the side of the insulating layer 200 away from the base substrate 01, and the orthographic projection of the first isolation structure 300 on the base substrate 01 overlaps with the orthographic projection of the insulating layer 200 on the base substrate 01. The insulating layer 200 includes a groove 210. Along a direction perpendicular to the base substrate 01, the thickness of the insulating layer 200 excluding the location of the groove 210 is greater than the thickness of the first isolation structure 300.

[0061] As shown in FIG3B , the groove 210 and the first isolation structure 300 are at least partially located between adjacent sub-pixels 100. For example, adjacent sub-pixels 100 refer to two sub-pixels 100 with no other sub-pixels 100 disposed therebetween. The first isolation structure 300 overlaps with the projection onto the substrate 01 of a portion of the surface of the insulating layer 200 facing away from the substrate 01 that forms the edge of the groove 210, and protrudes into the groove opening 211 of the groove 210 to form a first protrusion 310. For example, a portion of the first isolation structure 300 is located at the edge of the groove 210, and a portion of the first isolation structure 300 is located at the groove opening 211, thereby forming a first protrusion 310 that covers a portion of the groove opening 211.

[0062] As shown in Figures 3B and 3D, at least a portion of the first electrode 110 is made of the same material as at least a portion of the first isolation structure 300. The term "at least a portion" may refer to at least a portion of the film layer of the first electrode and / or the first isolation structure. For example, the first electrode 110 and the first isolation structure 300 are made of exactly the same material. At least a portion of the first electrode 110 is provided on the same layer as at least a portion of the first isolation structure 300. For example, the first electrode 110 and the first isolation structure 300 are formed in the same process step, thereby saving a masking process and eliminating the need to form the inorganic layer 50 shown in Figure 2A, thereby simplifying the manufacturing process. Referring to Figure 3D, for example, the first electrode 110 includes a first electrode layer 111, a second electrode layer 112, and a third electrode layer 113, which are sequentially stacked along the Z direction on the insulating layer 200. For example, the first isolation structure 300 includes a first isolation layer 301, a second isolation layer 302, and a third isolation layer 303, which are sequentially stacked along the Z direction on the insulating layer 200. For example, the first electrode layer 111 is made of the same material as the first isolation layer 301 and is disposed in the same layer. For example, the second electrode layer 112 is made of the same material as the second isolation layer 302 and is disposed in the same layer. For example, the third electrode layer 113 is made of the same material as the third isolation layer 303 and is disposed in the same layer.

[0063] As shown in FIG3B , the first electrode 110 is formed on the flat surface of the insulating layer 200, reducing the risk of disconnection. In addition, as shown in FIG3B , the display substrate isolates the light-emitting functional layer 130 through the first isolation structure 300, and there is no need to form the light-emitting functional layer 130 on a spacer with an undercut structure (see FIG1 ), thereby reducing the risk of film rupture or separation at the corners of the spacer, and also reducing the risk of film tearing due to the large height difference between the spacer and the insulating layer. There is a gap 101 between the first electrode 110 and the first isolation structure 300 to prevent electrical conduction between the first electrode 110 and the first isolation structure 300 through the gap 101, which helps prevent the first isolation structure 300 from transmitting electrical signals to the area where the adjacent sub-pixel 100 is located.

[0064] As shown in FIG3B , at least one of the multiple film layers of the light-emitting functional layer 130 is disconnected at the first protrusion 310. In the embodiment of the present disclosure, a groove 210 and a first isolation structure 300 are provided between adjacent sub-pixels 100 in the display substrate. By setting the relative positional relationship between the first isolation structure 300 and the groove 210, at least one film layer of the light-emitting functional layer 130 can be disconnected at the first protrusion 310 of the first isolation structure 300, which protrudes relative to the edge of the groove 210. This helps reduce the probability of low-grayscale crosstalk between adjacent sub-pixels 100.

[0065] For example, as shown in FIG3B , the light-emitting functional layer 130 may include a first light-emitting layer (EML) 131, a charge generation layer (CGL) 133, and a second light-emitting layer 132, which are stacked together, with the charge generation layer 133 being located between the first light-emitting layer 131 and the second light-emitting layer 132. The charge generation layer 133 has strong conductivity, which can enable the light-emitting functional layer 130 to have the advantages of long life, low power consumption, and high brightness. For example, compared with a light-emitting functional layer without a charge generation layer, the sub-pixel can nearly double its brightness by providing a charge generation layer in the light-emitting functional layer.

[0066] For example, the above-mentioned sub-pixels including the charge generation layer adopt Tandem technology, use N / P-CGL as the heterojunction, and connect the two light-emitting layers in series. This technology realizes the series connection of dual light-emitting devices. Under the same luminous intensity, it greatly reduces the luminous current of the light-emitting device and improves the life of the organic light-emitting element, which is conducive to the application of new technologies with high lifespan such as automotive.

[0067] For example, in each sub-pixel, the light-emitting functional layer may further include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL). For example, the hole injection layer, the hole transport layer, the electron transport layer, the electron injection layer, and the charge generation layer are all common film layers of multiple sub-pixels and may be referred to as common layers. For example, at least one film layer in the light-emitting functional layer that is disconnected at the edge of the groove may be at least one film layer in the above-mentioned common layer. By disconnecting at least one film layer in the above-mentioned common layer at the edge of the groove located between adjacent sub-pixels, the probability of crosstalk between adjacent sub-pixels can be reduced.

[0068] As shown in Figures 3B and 3C , in some examples, the minimum spacing D1 between the first electrode 110 and the first isolation structure 300 in the direction in which adjacent sub-pixels 100 are arranged is no less than 1 micron, and the ratio of the minimum spacing D1 to the size of the sub-pixel 100 in the direction in which adjacent sub-pixels 100 are arranged is no greater than 1 / 2. The sub-pixel size mentioned above can refer to the size of the sub-pixel's light-emitting area in the arrangement direction, or the size of the first electrode in the sub-pixel in the arrangement direction. For example, the arrangement direction can be roughly the direction of a line connecting the centers of the light-emitting areas of adjacent sub-pixels 100 or a line connecting the closest distances, or if the light-emitting areas of adjacent sub-pixels 100 are distributed along the X-direction, the X-direction can be the X-direction. For example, in the X-direction, the minimum spacing D1 between the first electrode 110 and the first isolation structure 300 is equal to or greater than 1 micron, thereby isolating the first electrode 110 from the first isolation structure 300 and preventing electrical connection between the first electrode 110 and the first isolation structure 300. For example, in the X direction, the ratio of the minimum distance D1 between the first electrode 110 and the first isolation structure 300 to the size of the sub-pixel 100 is equal to 1 / 2 or less than 1 / 2.

[0069] For example, the sub-pixels include a first color sub-pixel, a second color sub-pixel, and a third color sub-pixel. For example, referring to FIG3A , three sub-pixels 100 represent a first color sub-pixel, a second color sub-pixel, and a third color sub-pixel, respectively. For example, the first color sub-pixel emits red light and is a red sub-pixel. For example, the second color sub-pixel emits green light and is a green sub-pixel. For example, the third color sub-pixel emits blue light and is a blue sub-pixel. For example, the area of ​​the light-emitting area of ​​the green sub-pixel is the smallest, the area of ​​the light-emitting area of ​​the blue sub-pixel is the largest, or the area of ​​the light-emitting area of ​​the red sub-pixel is the largest, and the embodiments of the present disclosure are not limited to this. For example, referring to FIG3B and FIG3C , the size of the sub-pixel in the X direction is: in the X direction, the largest size among the size of the first color sub-pixel, the size of the second color sub-pixel, and the size of the third color sub-pixel.

[0070] For example, referring to Figures 3A and 3B , the edge of the light-emitting area of ​​at least one sub-pixel 100 can be curved, and multiple first isolation structures 300 can be provided, with the multiple first isolation structures 300 spaced apart around the circumference of the light-emitting area of ​​the at least one sub-pixel 100. For example, the curvature of the edge of the first isolation structure 300 facing the light-emitting area of ​​the red sub-pixel can be no greater than the curvature of the edge of the red sub-pixel's light-emitting area facing the first isolation structure 300, thereby preventing the distance between the end of the first isolation structure 300 and the light-emitting area of ​​the red sub-pixel from being too small. For example, the curvature of the edge of the first isolation structure 300 facing the light-emitting area of ​​the green sub-pixel can be no greater than the curvature of the edge of the green sub-pixel's light-emitting area facing the first isolation structure 300, thereby preventing the distance between the end of the first isolation structure 300 and the light-emitting area of ​​the green sub-pixel from being too small. For example, the curvature of both edges of the first isolation structure 300 in the X direction can be the same.

[0071] For example, in conjunction with Figures 3A and 3B , in the X direction, the distance between the edge of the first isolation structure 300 and the edge of the light-emitting area of ​​at least one blue sub-pixel is a first distance M1, the distance between the edge of the first isolation structure 300 and the edge of the light-emitting area of ​​at least one green sub-pixel is a second distance M2, and the distance between the edge of the first isolation structure 300 and the edge of the light-emitting area of ​​at least one red sub-pixel is a third distance M3. The first distance M1 is greater than the second distance M2, and the first distance M1 is greater than the third distance M3, thereby reducing the driving voltage of the blue sub-pixel. Of course, the embodiments of the present disclosure are not limited to the X direction. The closest distance between the first isolation structure surrounding the blue sub-pixel and the edge of the light-emitting area of ​​the blue sub-pixel can be the first distance, the closest distance between the first isolation structure surrounding the green sub-pixel and the edge of the light-emitting area of ​​the green sub-pixel can be the second distance, and the closest distance between the first isolation structure surrounding the red sub-pixel and the edge of the light-emitting area of ​​the red sub-pixel can be the third distance.

[0072] For example, in conjunction with Figures 3A and 3B , the difference between the minimum distance and the maximum distance between the first isolation structure 300 and the edges of the light-emitting areas of at least one blue sub-pixel facing each other is a first difference. For example, the minimum distance between the first isolation structure 300 and the edges of the light-emitting areas of the blue sub-pixel facing each other may be N1, and the maximum distance between the first isolation structure 300 and the edges of the light-emitting areas of the blue sub-pixel facing each other may be N2. The first difference is the difference between N1 and N2. The difference between the minimum distance and the maximum distance between the first isolation structure 300 and the edges of the light-emitting areas of at least one green sub-pixel facing each other is a second difference, and the difference between the minimum distance and the maximum distance between the first isolation structure 300 and the edges of the light-emitting areas of at least one red sub-pixel facing each other is a third difference. The first difference is greater than the second difference, and the first difference is greater than the third difference.

[0073] For example, the edge of the first isolation structure 300 and the edge of the light-emitting area of ​​the blue sub-pixel can be bent in opposite directions, thereby increasing the distance between the first isolation structure 300 and the blue sub-pixel. For example, the edge of the first isolation structure and the edge of the light-emitting area of ​​the blue sub-pixel can be bent in the same direction, and the curvature of the edge of the first isolation structure is greater than the curvature of the edge of the light-emitting area of ​​the blue sub-pixel. For example, the edges of the first isolation structure 300 and the light-emitting area of ​​the green sub-pixel facing each other can be bent in the same direction. For example, the edges of the first isolation structure 300 and the light-emitting area of ​​the red sub-pixel facing each other can be bent in the same direction. For example, the edge shape of the first isolation structure 300 matches the edge shape of the light-emitting area of ​​the red sub-pixel and the edge shape of the light-emitting area of ​​the green sub-pixel, respectively.

[0074] For example, in combination with Figure 3A and Figure 3B, the ratio of the outer contour circumference of the first isolation structure 300 to the outer contour circumference of the light-emitting area of ​​at least one blue sub-pixel is a first ratio, the ratio of the outer contour circumference of the first isolation structure 300 to the outer contour circumference of the light-emitting area of ​​at least one green sub-pixel is a second ratio, and the ratio of the outer contour circumference of the first isolation structure 300 to the outer contour circumference of the light-emitting area of ​​at least one red sub-pixel is a third ratio. The first ratio is greater than the second ratio, and the first ratio is greater than the third ratio.

[0075] As shown in Figures 3B and 3C , in some examples, the ratio of the dimension H3 of the first electrode 110 in a direction perpendicular to the substrate 01 to the dimension H1 of the first isolation structure 300 in a direction perpendicular to the substrate 01 can be 0.9 to 1.1. For example, the dimension of the first electrode 110 in a direction perpendicular to the substrate 01 is the thickness H3 of the first electrode 110. The dimension of the first electrode in a direction perpendicular to the substrate can refer to the average thickness, maximum thickness, or minimum thickness at locations other than the connection between the first electrode and the transistor. For example, the dimension of the first isolation structure 300 in a direction perpendicular to the substrate 01 is the thickness H1 of the first isolation structure 300. For example, the thickness of the first isolation structure can include the average thickness, maximum thickness, or minimum thickness. For example, the ratio of the thickness H3 of the first electrode 110 to the thickness H1 of the first isolation structure 300 can be 0.95 to 1.05. For example, the ratio of the thickness H3 of the first electrode 110 to the thickness H1 of the first isolation structure 300 can be 1. For example, the first electrode 110 and the first isolation structure 300 disposed in the same layer may have substantially the same thickness, thereby simplifying the manufacturing process.

[0076] For example, the thickness H3 of the first electrode 110 may be 10 angstroms to 4000 angstroms. For example, the thickness H3 of the first electrode 110 may be 100 angstroms to 3000 angstroms. For example, the thickness H3 of the first electrode 110 may be 500 angstroms to 2000 angstroms. For example, the thickness H3 of the first electrode 110 may be 1000 angstroms to 1500 angstroms.

[0077] As shown in Figures 3B and 3C, in some examples, in the arrangement direction of adjacent sub-pixels 100, the ratio of the minimum dimension l of the first protrusion 310 to the minimum dimension L1 of the first isolation structure 300 can be 0.005 to 0.2. For example, the ratio of the minimum dimension l of the first protrusion 310 to the minimum dimension L1 of the first isolation structure 300 can be 0.01 to 0.15. For example, the ratio of the minimum dimension l of the first protrusion 310 to the minimum dimension L1 of the first isolation structure 300 can be 0.05 to 0.1. Thus, by setting the size of the first protrusion 310, the light-emitting functional layer 130 can be reliably disconnected by the first protrusion 310.

[0078] As shown in Figures 3B and 3C, in some examples, the display substrate further includes a pixel-defining pattern 500. For example, the material of the pixel-defining pattern 500 can be a transparent material or an opaque material. For example, the color of the pixel-defining pattern 500 can be black, light yellow, or transparent. For example, the material of the pixel-defining pattern 500 can include at least one of polyimide, acrylate, and siloxane. For example, the maximum dimension of the pixel-defining pattern 500 in a direction perpendicular to the base substrate 01 is 0.5 microns to 3 microns. For example, the maximum dimension of the pixel-defining pattern 500 in a direction perpendicular to the base substrate 01 is 1 micron to 2.5 microns. For example, the maximum dimension of the pixel-defining pattern 500 in a direction perpendicular to the base substrate 01 is 1.5 microns to 2 microns.

[0079] As shown in Figures 3B and 3C , the pixel-defining pattern 500 is located on a side of the first electrode 110 away from the substrate 01. The pixel-defining pattern 500 includes a plurality of first openings 510, with at least one first opening 510 corresponding to each sub-pixel 100. The light-emitting element of each sub-pixel 100 is at least partially located within the corresponding first opening 510, and the first opening 510 is configured to expose the first electrode 110. For example, at least a portion of the first electrode 110 is located between the pixel-defining pattern 500 and the substrate 01. For example, when the light-emitting functional layer 130 is formed within the first opening 510 of the pixel-defining pattern 500, the first electrode 110 and the second electrode 120 located on either side of the light-emitting functional layer 130 can drive the light-emitting functional layer 130 within the first opening 510 of the pixel-defining pattern 500 to emit light. For example, the light-emitting area mentioned above can refer to the area where the sub-pixel effectively emits light, and the shape of the light-emitting area can refer to a two-dimensional shape, for example, the shape of the light-emitting area can be the same as the shape of the first opening of the pixel-defining pattern.

[0080] As shown in Figures 3B and 3C, the pixel-defining pattern 500 further includes a plurality of second openings 520, through which the first protrusions 310 are exposed, allowing the light-emitting functional layer 130 to be disconnected through the first protrusions 310. For example, the second openings 520 can completely expose the first protrusions 310. For example, the second openings 520 can completely expose the grooves 210. For example, as shown in Figure 3B, in the X direction, the spacing between the pixel-defining portion 530 that does not overlap with the first protrusions 310 and is adjacent to the second openings 520 and the first protrusions 310 is smaller than the size of the groove opening 211 in the X direction.

[0081] As shown in FIG3B and FIG3C , in some examples, the ratio of the minimum dimension L4 of the second opening 520 along the arrangement direction of adjacent sub-pixels 100 to the minimum dimension L3 of the first opening 510 along the arrangement direction of adjacent sub-pixels 100 can be 0.05 to 2. For example, along the arrangement direction of adjacent sub-pixels 100, the ratio of the minimum dimension L4 of the second opening 520 to the minimum dimension L3 of the first opening 510 can be 0.1 to 1.5. For example, along the arrangement direction of adjacent sub-pixels 100, the ratio of the minimum dimension L4 of the second opening 520 to the minimum dimension L3 of the first opening 510 can be 0.5 to 1. For example, in the X direction, the size of the second opening 520 can be larger than the size of the first opening 510. For example, in the X direction, the size of the second opening 520 can be equal to the size of the first opening 510. For example, in the X direction, the size of the second opening 520 can be smaller than the size of the first opening 510 to prevent affecting the size of the light-emitting area.

[0082] 3B and 3C , in some examples, the pixel defining portion 530 covers the space 101. For example, both sides of the pixel defining portion 530 in the X direction can overlap the first electrode 110 and the first isolation structure 300, respectively, thereby preventing the first electrode 110 and the first isolation structure 300 from being electrically connected.

[0083] As shown in Figures 3B and 3C , in some examples, the orthographic projection of the pixel-defining portion 530 on the base substrate 01 overlaps with the orthographic projection of the first electrode 110 on the base substrate 01. The minimum dimension L5 of the overlapping portion 102 along the arrangement direction of adjacent sub-pixels 100 is no less than 0.5 microns. For example, the pixel-defining portion 530 covers a portion of the first electrode 110. For example, the overlapping portion 102 refers to the portion of the first electrode 110 adjacent to the first isolation structure 300 that overlaps with the pixel-defining portion 530. For example, the minimum dimension L5 of the overlapping portion 102 in the X direction is equal to 0.5 microns. For example, the minimum dimension L5 of the overlapping portion 102 in the X direction is greater than 0.5 microns.

[0084] As shown in Figures 3B and 3C, in some examples, the ratio of the dimension L6 of the notch opening 211 along the arrangement direction of adjacent sub-pixels 100 to the dimension L4 of the second opening 520 along the arrangement direction of adjacent sub-pixels 100 can be 0.7 to 1.5. For example, along the arrangement direction of adjacent sub-pixels 100, the ratio of the minimum dimension L6 of the notch opening 211 to the minimum dimension L4 of the second opening 520 can be 0.8 to 1.4. For example, along the arrangement direction of adjacent sub-pixels 100, the ratio of the minimum dimension L6 of the notch opening 211 to the minimum dimension L4 of the second opening 520 can be 0.9 to 1.3. For example, along the arrangement direction of adjacent sub-pixels 100, the ratio of the minimum dimension L6 of the notch opening 211 to the minimum dimension L4 of the second opening 520 can be 1 to 1.2. For example, along the arrangement direction of adjacent sub-pixels 100, the ratio of the minimum dimension L6 of the notch opening 211 to the minimum dimension L4 of the second opening 520 can be 1.1.

[0085] As shown in Figures 3B and 3C , in some examples, the maximum dimension H4 of the groove 210 in a direction perpendicular to the base substrate 01 is no greater than the maximum dimension H5 of the insulating layer 200 in a direction perpendicular to the base substrate 01, and the dimension H4 of the groove 210 in the direction perpendicular to the base substrate 01 is no less than 0.1 micrometers. For example, in the Z direction, the maximum dimension H4 of the groove 210 is the depth dimension of the groove 210, and the maximum dimension H5 of the insulating layer 200 is the maximum thickness of the insulating layer 200. For example, the depth dimension H4 of the groove 210 can be equal to 0.1 micrometers. For example, the depth dimension H4 of the groove 210 can be greater than 0.1 micrometers. For example, the groove 210 is defined in the insulating layer 200, and thus, the maximum depth dimension H4 of the groove 210 does not exceed the maximum thickness H5 of the insulating layer 200. For example, the insulating layer 200 can be a multi-layer film layer, and the maximum depth dimension H4 of the groove 210 does not exceed the sum of the maximum thicknesses of the multi-layer films.

[0086] As shown in Figures 3B and 3C, in some examples, the groove 210 includes a first sidewall 201 and a second sidewall 202 that are arranged opposite each other in the arrangement direction of adjacent sub-pixels 100. In a direction perpendicular to the substrate 01, at least the first sidewall 201 overlaps with the first isolation structure 300. The slope angle between the first sidewall 201 and the plane parallel to the contact surface between the first sidewall 201 and the first isolation structure 300 is a first slope angle α. For example, the bottom wall of the groove 210 can be a plane parallel to the contact surface between the first sidewall 201 and the first isolation structure 300, and the first slope angle α refers to the angle between the first sidewall 201 and the bottom wall of the groove 210. The slope angle between the second sidewall 202 and the plane parallel to the contact surface between the first sidewall 201 and the first isolation structure 300 is a second slope angle β. For example, the bottom wall of the groove 210 can be a plane parallel to the contact surface between the first sidewall 201 and the first isolation structure 300, and the second slope angle β refers to the angle between the second sidewall 202 and the bottom wall of the groove 210. For example, the first slope angle α is not greater than the second slope angle β. For example, the shape of the cross section of the first and second sidewalls cut by the XZ plane can be a straight line or a curve. If the cross section is a straight line, the slope angle can be the angle at the intersection of the straight line and the bottom wall in the cross section; if the cross section is a curve, the slope angle can be the angle of the tangent of the curve at the intersection of the curve and the bottom wall in the cross section.

[0087] For example, as shown in Figures 3B and 3C, the first slope angle α is different from the second slope angle β. For example, during the etching process of the groove 210, because the first isolation structure 300 is located on one side of the first sidewall 201 in the Z direction, the slope angle between the first sidewall 201 and the bottom wall of the groove 210 is different from the slope angle between the second sidewall 202 and the bottom wall of the groove 210. For example, a cross-section of the groove 210 taken parallel to the XZ plane may include a figure with an opening surrounded by three straight edges, wherein two intersecting straight edges may form a right angle, an acute angle, or an obtuse angle; a cross-section of the groove 210 taken parallel to the XZ plane may include a figure with an opening surrounded by arcuate edges, and the size of the figure along the Z direction may gradually increase along the direction indicated by the arrow in the Z direction shown in Figure 3B. For example, as shown in Figures 3B and 3C, the first slope angle α and the second slope angle β are both obtuse angles, the size of the groove 210 in the X direction gradually increases from the bottom wall of the groove 210 to the groove opening 211, and the maximum size of the groove 210 in the X direction is the size L6 of the groove opening 211.

[0088] Figure 4A is a partial plan view schematic diagram of a display substrate provided in an example of at least one embodiment of the present disclosure. Figure 4B is a partial cross-sectional schematic diagram taken along line BB' shown in Figure 4A. The display substrate shown in Figure 4B differs from the display substrate shown in Figure 3B in the number and position of the first isolation structures. The structures in the display substrate shown in Figure 4B, other than the first isolation structures, may have the same features as the corresponding structures shown in Figure 3B and will not be further described here. For example, line BB' is parallel to the X direction.

[0089] For example, as shown in Figures 3B and 3C, the first isolation structure 300 is only provided on one side near the first sidewall 201. In this case, since there is no first isolation structure 300 blocking the second sidewall 202, the first slope angle α formed after etching is smaller than the second slope angle β. For example, as shown in Figures 4A and 4B, the first isolation structure 300 includes a portion provided on one side near the first sidewall 201 and a portion provided on one side near the second sidewall 202. In this case, the second slope angle β formed after etching is substantially the same as the first slope angle α. For example, along the X direction, the two first isolation structures 300 located on either side of the edge of the groove 210 can have the same size, and the two first isolation structures 300 protruding into the groove 210 can have the same size (i.e., the two first protrusions 310 have the same size). However, the two first isolation structures located on either side of the same second opening and overlapping the second opening can also have different sizes, and the two first protrusions extending into the second opening of the two first isolation structures can have the same or different sizes. FIG4A schematically shows that the first isolation structure is provided on both sides of the second opening, but the present invention is not limited thereto. The first isolation structure may surround at least one second opening.

[0090] 4A and 4B , by providing the first isolation structure 300 on both sides of the groove 210 , the isolation effect can be further improved, and crosstalk between adjacent sub-pixels 100 caused by the transmission of electrical signals can be prevented.

[0091] For example, the shape of the first isolation structure 300 in FIG. 4A can be the same as the shape of the first isolation structure 300 in FIG. 3A . For example, as shown in FIG. 4B , the perimeters of the first isolation structures 300 located on either side of the groove 210 in FIG. 4A can be different. For example, taking a red sub-pixel as an example, among the multiple first isolation structures 300 surrounding at least one red sub-pixel, the perimeter of the first isolation structure 300 located on the side of the groove 210 away from the red sub-pixel can be greater than the perimeter of the first isolation structure 300 located on the side of the groove 210 closer to the red sub-pixel. For example, taking a green sub-pixel as an example, among the multiple first isolation structures 300 surrounding at least one green sub-pixel, the perimeter of the first isolation structure 300 located on the side of the groove 210 away from the green sub-pixel can be greater than the perimeter of the first isolation structure 300 located on the side of the groove 210 closer to the green sub-pixel. For example, taking the blue sub-pixel as an example, among the multiple first isolation structures 300 around at least one blue sub-pixel, the circumference of the first isolation structure 300 located on the side of the groove 210 close to the blue sub-pixel can be greater than the circumference of the first isolation structure 300 located on the side of the groove 210 away from the blue sub-pixel.

[0092] For example, the positional relationship between the first isolation structure 300 and the light-emitting region of the sub-pixel 100 in FIG. 4A may be the same as the positional relationship between the first isolation structure 300 and the light-emitting region of the sub-pixel 100 in FIG. 3A .

[0093] As shown in Figures 3B, 3C, 4A, and 4B, in some examples, the first slope angle α may be 60° to 150°. For example, the first slope angle α may be 75° to 135°. For example, the first slope angle α may be 90° to 120°.

[0094] As shown in Figures 3B and 3C, in some examples, the pixel-defining pattern 500 includes a pixel-defining portion 530 surrounding a plurality of first openings 510 and a plurality of second openings 520. At least a portion of a side surface of the pixel-defining portion 530 has a slope angle of a third slope angle θ with a plane parallel to the interface between the pixel-defining portion 530 and the first isolation structure 300. For example, the third slope angle θ refers to the angle between the side surface of the pixel-defining portion 530 and the upper surface of the first isolation structure 300 exposed to the second openings 520.

[0095] In some examples, the third slope angle θ is not greater than the first slope angle α. For example, the first slope angle α of the groove 210 formed by etching is greater than the third slope angle θ. For example, the first slope angle α can be substantially the same as the third slope angle θ. For example, the third slope angle θ is relatively smaller, so that the slope of the sidewall of the pixel defining portion 530 on the side closest to the first protrusion 310 is relatively larger, thereby better exposing the first protrusion 310.

[0096] As shown in FIG3C , for example, the slope angle between at least a portion of the side surface of the pixel-defining portion 530 and a plane parallel to the contact surface between the pixel-defining portion 530 and the first electrode 110 is a fourth slope angle γ. For example, the fourth slope angle γ refers to the angle between the upper surface of the first electrode 110 on the side away from the first isolation structure 300 and the pixel-defining portion 530. For example, the fourth slope angle γ is an acute angle. For example, the fourth slope angle γ can be 10° to 60°. For example, the fourth slope angle γ can be 20° to 50°. For example, the fourth slope angle γ can be 30° to 45°.

[0097] As shown in FIG3C , for example, the ratio of the angle complementary to the third slope angle θ to the fourth slope angle γ may be 0.5 to 1.5. For example, the ratio of the angle complementary to the third slope angle θ to the fourth slope angle γ may be 0.7 to 1.3. For example, the ratio of the angle complementary to the third slope angle θ to the fourth slope angle γ may be 0.9 to 1.1. For example, the angle complementary to the third slope angle θ and the fourth slope angle γ may be substantially the same.

[0098] As shown in FIG3C , for example, the slope angle between at least a portion of the side surface of the pixel-defining portion 530 and a plane parallel to the contact surface between the pixel-defining portion 530 and the first electrode 110 is a fifth slope angle φ. For example, the fifth slope angle φ refers to the angle between the upper surface of the first electrode 110 on the side closest to the first isolation structure 300 and the pixel-defining portion 530. For example, the fifth slope angle φ is an acute angle. For example, the ratio of the fifth slope angle φ to the fourth slope angle γ can be 0.5 to 1.5. For example, the ratio of the fifth slope angle φ to the fourth slope angle γ can be 0.6 to 1.4. For example, the ratio of the fifth slope angle φ to the fourth slope angle γ can be 0.8 to 1.2. For example, the ratio of the fifth slope angle φ to the fourth slope angle γ can be 0.9 to 1.1. For example, the fifth slope angle φ and the fourth slope angle γ can be substantially the same.

[0099] As shown in FIG3C , for example, the slope angle between at least a portion of the side surface of the pixel defining portion 530 and a plane parallel to the contact surface between the pixel defining portion 530 and the insulating layer 200 is a sixth slope angle λ. For example, the sixth slope angle λ is an acute angle. For example, the ratio of the sixth slope angle λ to the fourth slope angle γ may be 0.5 to 1.5. For example, the ratio of the sixth slope angle λ to the fourth slope angle γ may be 0.6 to 1.4. For example, the ratio of the sixth slope angle λ to the fourth slope angle γ may be 0.8 to 1.2. For example, the ratio of the sixth slope angle λ to the fourth slope angle γ may be 0.9 to 1.1. For example, the sixth slope angle λ and the fourth slope angle γ may be substantially the same.

[0100] 5A to 5E are schematic flow charts of a method for manufacturing a display substrate before forming FIG. 3B , provided in an example according to at least one embodiment of the present disclosure.

[0101] With reference to Figures 5A to 5E, and in conjunction with Figure 3B, at least one embodiment of the present disclosure provides a method for manufacturing a display substrate, the manufacturing method comprising: forming a plurality of sub-pixels 100 on a base substrate 01, wherein the formation of the sub-pixels 100 comprises sequentially forming a first electrode 110, a light-emitting functional layer 130, and a second electrode 120 stacked in a direction perpendicular to the base substrate 01, wherein the first electrode 110 is located between the light-emitting functional layer 130 and the base substrate 01; as shown in Figure 5A, forming an insulating material layer 901 on the base substrate 01; as shown in Figure 5B, forming a conductive material layer 902 on a side of the insulating material layer 901 away from the base substrate 01; for example, the material of the insulating material layer 901 may include an organic material, and the conductive material layer 902 may be an inorganic non-metallic material layer or a metal material layer. For example, the insulating material layer shown in Figure 5A may be an insulating material layer patterned to form a via hole exposing the source or drain of a thin film transistor, but is not limited thereto. The insulating material layer may also refer to a film layer before patterning. For example, the manufacturing method further includes forming the other film layer 02 on the base substrate 01 before forming the insulating material layer 901 .

[0102] As shown in Figures 5B and 5C, the conductive material layer 902 is patterned to form a first electrode 110 and an isolation structure (also known as the first isolation structure 300), with a gap 101 between the first electrode 110 and the first isolation structure 300; as shown in Figures 5D and 5E, the insulating material layer 901 is etched to form a groove 210, and the first isolation structure 300 and the portion of the edge of the groove 210 on the surface of the insulating material layer 901 away from the substrate 01 overlap in projection on the substrate 01, and protrude into the groove opening 211 to form a protrusion (also known as the first protrusion 310); the light-emitting functional layer is formed after the groove 210 is formed, and the light-emitting functional layer includes multiple film layers, and at least one of the multiple film layers is disconnected at the first protrusion 310.

[0103] 5A to 5E , by patterning the conductive material layer 902, the first electrode 110 and the first isolation structure 300 can be formed simultaneously in a single process, thereby saving steps. For example, the conductive material layer 901 can be wet-etched to form the first electrode 110 and the first isolation structure 300. For example, during the wet etching of the conductive material layer 901, at least one of nitric acid, phosphoric acid, acetic acid, and sulfuric acid can be used.

[0104] For example, referring to Figures 5C to 5E and Figure 3B, after forming the first electrode 110 and the first isolation structure 300, the insulating material layer can be etched to form the groove 210 before forming the pixel defining pattern 500. In this way, it is relatively easy to apply photoresist on the side of the first electrode 110 and the first isolation structure 300 away from the base substrate 01, and then form the pixel defining pattern 500 through exposure and development. For example, a mask can be used to block the portion other than the groove opening 211 to dry-etch the insulating layer 200 at the groove opening 211 to form the groove 210. The edge of the first isolation structure 300 forms an undercut structure with the edge of the groove 210. In this case, the first isolation structure 300 includes a first protrusion 310 protruding into the groove 210.

[0105] For example, referring to FIG5D , before etching to form the groove 210, the applied photoresist needs to avoid completely covering the first isolation structure 300 to facilitate etching. For example, the photoresist can cover a portion of the upper surface of the first isolation structure 300 on the side away from the base substrate 01, while exposing a portion of the upper surface. For example, the photoresist can cover the upper surface of the first isolation structure on the side away from the base substrate, while exposing the sidewalls of the first isolation structure in the X direction.

[0106] For example, referring to FIG. 5D and FIG. 5E , during the dry etching of the insulating material layer 901 , at least one of oxygen, carbon tetrafluoride, chlorine, and sulfur hexafluoride may be used.

[0107] 6A and 6B are schematic flow charts of a method for manufacturing a display substrate before forming FIG. 3B , provided in another example according to at least one embodiment of the present disclosure.

[0108] For example, referring to Figures 6A and 6B, and Figure 3B, a pixel-defining pattern 500 can be formed after forming the first electrode 110 and the first isolation structure 300. After forming the pixel-defining pattern 500, photoresist is applied to the side of the pixel-defining pattern 500 facing away from the substrate 01, and then the insulating material layer 901 is etched by exposure to form the recess 210. This prevents photoresist from remaining within the recess 210 or below the first protrusion 310 in the first isolation structure 300 (i.e., the side of the first protrusion 310 facing the recess 210). For example, a mask can be used to shield the portion other than the second opening 520, so that the insulating layer 200 below the second opening 520 can be dry-etched to form the recess 210. The edge of the first isolation structure 300 forms an undercut structure with the edge of the recess 210. In this case, the first isolation structure 300 includes the first protrusion 310 protruding into the recess 210.

[0109] Figure 7A is a partial planar schematic diagram of a display substrate provided in an example of at least one embodiment of the present disclosure. Figure 7B is a partial cross-sectional schematic diagram taken along the CC' line shown in Figure 7A. The difference between the display substrate shown in Figure 7B and the display substrate shown in Figure 3B is that it also includes a second isolation structure. The structure of the display substrate shown in Figure 7B other than the second isolation structure may have the same features as the corresponding structure shown in Figure 3B, and will not be repeated here. For example, the second isolation structure shown in Figure 7B can also be applied to the display substrate shown in Figure 4B, wherein the second isolation structure can be arranged on one side of the same second opening, or on both sides of the same second opening. For example, the CC' line is parallel to the X direction.

[0110] In some examples, as shown in Figures 7A and 7B, the display substrate further includes a second isolation structure 400, which is stacked with the first isolation structure 300. The second isolation structure 400 overlaps with a portion of the projection of the edge of the groove 210 on the base substrate 01, and protrudes into the groove opening 211 to form a second protrusion 410. The second protrusion 410 overlaps with the first protrusion 310 in a direction perpendicular to the base substrate 01. For example, the second protrusion 410 completely overlaps with the first protrusion 310. By providing the second isolation structure 400, the second protrusion 410 and the first protrusion 310 can jointly form a protrusion, and the strength of the protrusion can be improved by increasing the thickness of the protrusion.

[0111] In some examples, as shown in Figures 7A and 7B , the minimum dimension L2 of the second isolation structure 400 along the arrangement direction of adjacent sub-pixels 100 is no greater than the minimum dimension L1 of the first isolation structure 300 along the arrangement direction of adjacent sub-pixels 100, to prevent the second isolation structure 400 from being corroded during etching of the first isolation structure 300. For example, in the X direction, the size of the second isolation structure can be equal to the size of the first isolation structure. For example, in the X direction, the size of the second isolation structure 400 can be smaller than the size of the first isolation structure 300.

[0112] In some examples, as shown in FIG7B , the dimension H2 of the second isolation structure 400 in a direction perpendicular to the base substrate 01 can be 10 angstroms to 2000 angstroms. For example, the dimension of the second isolation structure 400 in a direction perpendicular to the base substrate 01 can be a thickness H2, such as an average thickness, a maximum thickness, or a minimum thickness. For example, the thickness H2 of the second isolation structure 400 can be 100 angstroms to 1500 angstroms. For example, the thickness H2 of the second isolation structure 400 can be 500 angstroms to 1000 angstroms. For example, the thickness H2 of the second isolation structure 400 can be 700 angstroms to 800 angstroms. For example, by setting the thickness of the second isolation structure 400, the strength of the protrusion can be increased and the pixel defining portion 530 can be kept flat.

[0113] For example, referring to Figures 7A and 7B , the edge of the light-emitting area of ​​at least one sub-pixel 100 can be curved, and a plurality of second isolation structures 400 can be provided, with the plurality of second isolation structures 400 spaced apart around the circumference of the at least one sub-pixel 100. For example, the plurality of second isolation structures 400 correspond one-to-one with the plurality of first isolation structures 300. For example, referring to Figure 7A , a side edge of the second isolation structure 400 near the second opening 520 coincides with a side edge of the first isolation structure 300 near the second opening 520. For example, referring to Figures 7A and 7B , the curvature of the side edge of the second isolation structure 400 near the sub-pixel 100 can be the same as the curvature of the side edge of the first isolation structure 300 near the sub-pixel. For example, the curvature of both side edges of the second isolation structure 400 in the X direction can be the same. For example, the shape of the first isolation structure 300 in Figure 7A can be the same as the shape of the first isolation structure 300 in Figure 3A . For example, the positional relationship between the first isolation structure 300 and the sub-pixel 100 in FIG. 7A may be the same as the positional relationship between the first isolation structure 300 and the sub-pixel 100 in FIG. 3A .

[0114] For example, referring to FIG7A and FIG4A , a second isolation structure may be provided on both sides of the groove 520. Referring to FIG4A , when a first isolation structure 300 is provided on each side of the groove 520, a second isolation structure may also be provided at a corresponding first isolation structure 300. For example, the second isolation structure 400 shown in FIG7A may be applied to the display substrate shown in FIG4A .

[0115] For example, with reference to Figures 7A and 7B , in the X direction, the distance between the edge of the second isolation structure 400 and the edge of the light-emitting area of ​​at least one blue sub-pixel is a fourth distance M4, the distance between the edge of the second isolation structure 400 and the edge of the light-emitting area of ​​at least one green sub-pixel is a fifth distance M5, and the distance between the edge of the second isolation structure 400 and the edge of the light-emitting area of ​​at least one red sub-pixel is a sixth distance M5. The fourth distance M4 is greater than the fifth distance M5, and the fourth distance M4 is greater than the sixth distance M6, thereby reducing the driving voltage of the blue sub-pixel. Of course, the embodiments of the present disclosure are not limited to the X direction. The closest distance between the second isolation structure surrounding the blue sub-pixel and the edge of the light-emitting area of ​​the blue sub-pixel can be the fourth distance, the closest distance between the second isolation structure surrounding the green sub-pixel and the edge of the light-emitting area of ​​the green sub-pixel can be the fifth distance, and the closest distance between the second isolation structure surrounding the red sub-pixel and the edge of the light-emitting area of ​​the red sub-pixel can be the sixth distance.

[0116] For example, in conjunction with Figures 7A and 7B , the difference between the minimum and maximum distances between the second isolation structure 400 and the edges of the light-emitting areas of at least one blue sub-pixel facing each other is a fourth difference. For example, the minimum distance between the second isolation structure 400 and the edges of the light-emitting areas of the blue sub-pixel facing each other may be N3, and the maximum distance between the second isolation structure 400 and the edges of the light-emitting areas of the blue sub-pixel facing each other may be N4. The fourth difference is the difference between N3 and N4. The difference between the minimum and maximum distances between the second isolation structure 400 and the edges of the light-emitting areas of at least one green sub-pixel facing each other is a fifth difference, and the difference between the minimum and maximum distances between the second isolation structure 400 and the edges of the light-emitting areas of at least one red sub-pixel facing each other is a sixth difference. The fourth difference is greater than the fifth difference, and the fourth difference is greater than the sixth difference.

[0117] For example, the edge of the second isolation structure 400 and the edge of the light-emitting area of ​​the blue sub-pixel can be bent in opposite directions, thereby increasing the distance between the second isolation structure 400 and the blue sub-pixel. For example, the edge of the second isolation structure and the edge of the light-emitting area of ​​the blue sub-pixel can be bent in the same direction, and the curvature of the edge of the second isolation structure is greater than the curvature of the edge of the light-emitting area of ​​the blue sub-pixel. For example, the edges of the second isolation structure 400 and the light-emitting area of ​​the green sub-pixel facing each other can be bent in the same direction. For example, the edges of the second isolation structure 400 and the light-emitting area of ​​the red sub-pixel facing each other can be bent in the same direction. For example, the edge shape of the second isolation structure 400 matches the edge shape of the light-emitting area of ​​the red sub-pixel and the edge shape of the light-emitting area of ​​the green sub-pixel, respectively.

[0118] For example, in combination with Figure 7A and Figure 7B, the ratio of the outer contour circumference of the second isolation structure 400 to the outer contour circumference of the light-emitting area of ​​at least one blue sub-pixel is a fourth ratio, the ratio of the outer contour circumference of the second isolation structure 400 to the outer contour circumference of the light-emitting area of ​​at least one green sub-pixel is a fifth ratio, and the ratio of the outer contour circumference of the second isolation structure 400 to the outer contour circumference of the light-emitting area of ​​at least one red sub-pixel is a sixth ratio. The fourth ratio is greater than the fifth ratio, and the fourth ratio is greater than the sixth ratio.

[0119] In some examples, as shown in Figures 7A and 7B, the second isolation structure 400 includes at least one of a conductive material and an insulating material. For example, the second isolation structure 400 includes at least one of a metal material, an oxide semiconductor material, an organic insulating material, and an inorganic insulating material. For example, the material of the second isolation structure 400 can be the same as or different from the material of the first isolation structure 300.

[0120] For example, as shown in FIG7B , the first isolation structure 300 can be formed using the same patterning process as the first electrode 110. For example, a material layer can be formed on the insulating layer 200 and patterned to simultaneously form the first isolation structure 300 and the first electrode 110. For example, the first electrode 110 and the first isolation structure 300 can both be single-layer structures, and the material of the first isolation structure 300 is the same as that of the first electrode 110. For example, the first electrode 110 can be made of a metal material, such as any one or more of magnesium (Mg), silver (Ag), copper (Cu), aluminum (Al), titanium (Ti), and molybdenum (Mo), or alloys of the foregoing metals, such as aluminum-neodymium alloy (AlNd) or molybdenum-niobium alloy (MoNb).

[0121] For example, as shown in FIG7B , in conjunction with FIG3D , the first electrode 110 may be a multi-layer composite structure, such as ITO / Ag / ITO, and the first isolation structure 300 may be a single-layer structure. The material of the first isolation structure 300 may be the same as the material of one layer of the first electrode 110, such as the material of the first electrode 110 being ITO / Ag / ITO and the material of the first isolation structure 300 being ITO. For example, the first isolation structure 300 may be fabricated separately, that is, the first isolation structure 300 and the first electrode 110 may be formed in separate processes. For example, when the material of the first isolation structure 300 is a single layer of ITO, the ITO-based first isolation structure 300 may be protected during the fabrication process to prevent corrosion during etching of the first electrode 110. For example, the first electrode 110 may be a multi-layer composite structure, such as Ti / Al / Ti, or a stacked structure of a metal and a transparent conductive material, such as a reflective material such as ITO / Ag / ITO or Mo / AlNd / ITO. For example, the first isolation structure 300 may be a multi-layer composite structure that is the same as the first electrode 110 , such as Ti / Al / Ti, ITO / Ag / ITO, or Mo / AlNd / ITO.

[0122] In some examples, as shown in FIG7B , the first electrode 110 includes multiple electrode layers (see FIG3D ), and the second isolation structure 400 is made of the same material as at least one electrode layer of the first electrode 110. In some examples, the second isolation structure 400 includes at least one film layer. For example, the first isolation structure 300 and the first electrode 110 are both multi-layer composite structures, and the second isolation structure 400 can be a single-layer structure. For example, the materials of the first isolation structure 300 and the first electrode 110 are both ITO / Ag / ITO, and the material of the second isolation structure 400 can be ITO. For example, the materials of the first isolation structure 300 and the first electrode 110 are both Ti / Al / Ti, and the material of the second isolation structure 400 can be Ti. For example, the materials of the first isolation structure 300 and the first electrode 110 are both ITO / Ag / ITO, and by adding additional plating and etching processes, the material of the second isolation structure 400 can be Ti.

[0123] For example, as shown in FIG7B , the first isolation structure 300 and the first electrode 110 are both multi-layer composite structures, and the second isolation structure 400 can be a multi-layer composite structure. For example, the second isolation structure 400 of the multi-layer composite structure can have the same structure as the first isolation structure 300 of the multi-layer composite structure shown in FIG3D . For example, the materials of the first isolation structure 300 and the first electrode 110 are both ITO / Ag / ITO, and the materials of the second isolation structure 400 can be ITO / Ag / ITO. For example, the materials of the first isolation structure 300 and the first electrode 110 are both Ti / Al / Ti, and the materials of the second isolation structure 400 can be Ti / Al / Ti.

[0124] Referring to Figure 7B, taking the example where the materials of the first electrode 110 and the first isolation structure 300 are ITO / Ag / ITO and the material of the second isolation structure 400 is ITO, the size (thickness) of the ITO layer in the first electrode 110 and the ITO layer in the first isolation structure 300 in the direction perpendicular to the base substrate 01 can be 10 angstroms to 2000 angstroms, the size (thickness) of the Ag layer in the direction perpendicular to the base substrate 01 can be 400 angstroms to 2000 angstroms, and the thickness H2 of the second isolation structure 400 can be 10 angstroms to 2000 angstroms.

[0125] 8A and 8B are schematic flow charts of a method for manufacturing a display substrate before forming FIG. 7B , provided in an example according to at least one embodiment of the present disclosure.

[0126] 8A and 8B , and in combination with FIG7B , at least one embodiment of the present disclosure provides a method for manufacturing a display substrate, the method comprising: forming a plurality of sub-pixels 100 on a base substrate 01, the formation of the sub-pixels 100 comprising sequentially forming a stacked first electrode 110, a light-emitting functional layer (not shown in the figure), and a second electrode (not shown in the figure) in a direction perpendicular to the base substrate 01, the first electrode 110 being located between the light-emitting functional layer and the base substrate 01; forming an insulating material layer on the base substrate 01; forming an isolation material layer on the insulating material layer, and patterning the isolation material layer to form a second isolation structure 400; and forming a conductive material layer on a side of the insulating material layer away from the base substrate 01. The conductive material layer is patterned to form a first electrode 110 and a first isolation structure 300, with a gap 101 between the first electrode 110 and the first isolation structure 300. The insulating material layer is etched to form a groove 210. The first isolation structure 300 overlaps with the projection of the portion of the insulating material layer on the side away from the substrate 01 that forms the edge of the groove 210, and protrudes into the groove opening 211 to form a first protrusion 310. The second isolation structure 400 overlaps with the projection of the portion of the insulating material layer on the side away from the substrate 01 that forms the edge of the groove 210, and protrudes into the groove opening 211 to form a second protrusion 410. The second protrusion 410 overlaps with the first protrusion 310 in a direction perpendicular to the substrate 01. The light-emitting functional layer is formed after the groove 210 is formed. The light-emitting functional layer includes multiple film layers, at least one of which is disconnected at the first protrusion 310. By forming an isolation material layer on the insulating material layer and patterning the isolation material layer to form the second isolation structure 400 , the second protrusion 410 and the first protrusion 310 can form a protrusion together, and the strength of the protrusion can be improved by increasing the thickness of the protrusion.

[0127] For example, referring to the manufacturing method of Figures 5A to 5E above, the display substrate shown in Figure 7B may also be etched to form the groove 210 first, and then the pixel defining pattern 500 is formed, to simplify the photoresist coating process. For example, referring to the manufacturing method of Figures 6A and 6B above, the display substrate shown in Figure 7B may also be etched to form the groove 210 after the pixel defining pattern 500 is formed, to prevent photoresist residue on the side of the second protrusion 410 facing the groove 210.

[0128] For example, as shown in Figures 7A to 8B , the second isolation structure 400 can be located between the first isolation structure 300 and the insulating layer 200. That is, during the manufacturing process, the second isolation structure 400 can be fabricated first, followed by the first electrode 110 and the first isolation structure 300. For example, the first isolation structure can be located between the second isolation structure and the insulating layer. That is, during the manufacturing process, the first electrode and the first isolation structure can be fabricated first, followed by the second isolation structure. For example, the material of the first isolation structure can be the same as that of a layer of the first electrode, eliminating the need to consider the potential impact of different materials during different manufacturing processes, thereby simplifying the manufacturing process.

[0129] FIG9 is a partial cross-sectional schematic diagram of a display substrate provided in an example of at least one embodiment of the present disclosure.

[0130] As shown in FIG9 , for example, the material of the second isolation structure 400 can be different from the material of the first electrode 110. For example, the thickness of the second isolation structure 400 can be set to be larger, thereby replacing the first isolation structure. For example, the material of the second isolation structure can be an inorganic insulating material. For example, a passivation layer 023 is further included between the insulating layer 200 and the base substrate 01, and the material of the second isolation structure 400 can be the same as the material of the passivation layer 023. For example, the material of the first isolation structure can also be set to be different from that of the first electrode. In this case, the position of the first isolation structure can refer to the position of the second isolation structure 400 shown in FIG9 .

[0131] For example, as shown in Figures 1 to 9, other film layers 02 are disposed between the insulating layer 200 and the base substrate 01. These other film layers 02 may include a gate insulating layer 021, an interlayer insulating layer 022, a passivation layer 023, a film layer 024 where the gate resides, data lines, various film layers within the pixel circuit (e.g., including thin-film transistors, storage capacitors, and other structures), power signal lines, reset power signal lines, reset control signal lines, and light control signal lines, among other film layers or structures. For example, the other film layers 02 may also include an intermediate film layer 020 positioned between the base substrate 01 and the gate insulating layer 021. For example, the intermediate film layer 020 may be a buffer layer or other film layer. For example, referring to Figure 8A, the other film layers 02 may include a metal layer SD (i.e., the film layer where the data lines and power signal lines reside). For example, referring to Figure 9, the other film layers 02 may include two metal layers SD1 and SD2 (e.g., the other film layers 02 may include two layers of power signal lines, which may be electrically connected). For example, a surface of the insulating layer 200 facing the base substrate 01 may be in contact with the passivation layer 023 .

[0132] For example, as shown in FIG. 1 to FIG. 9 , the first electrode 110 of the organic light emitting element can be connected to one of the source and drain of the thin film transistor in the pixel circuit through a via hole penetrating the insulating layer 200 and other film layers 02 .

[0133] For example, as shown in FIG9 , a spacer 03 is further provided on the pixel defining portion 530 of the pixel defining pattern 500 for supporting an evaporation mask for manufacturing the light-emitting layer.

[0134] At least one embodiment of the present disclosure provides a display device, including the display substrate provided by any of the above embodiments. Since the display device according to the embodiment of the present disclosure includes the above display substrate, it also has corresponding beneficial technical effects, which will not be described in detail here.

[0135] There are a few points to note:

[0136] (1) The drawings of the embodiments of the present disclosure only involve structures related to the embodiments of the present disclosure, and other structures can refer to general designs.

[0137] (2) In the absence of conflict, features in the same embodiment and different embodiments of the present disclosure may be combined with each other.

[0138] The foregoing description is merely an exemplary embodiment of the present disclosure and is not intended to limit the scope of protection of the present disclosure. The scope of protection of the present disclosure is determined by the appended claims.

Claims

1. A display substrate, comprising: a substrate substrate; a plurality of sub-pixels located on the substrate substrate, each of at least some of the sub-pixels including a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer in a direction perpendicular to the substrate substrate, the first electrode being located between the light-emitting functional layer and the substrate substrate, and the light-emitting functional layer including a plurality of film layers; an insulating layer located between the first electrode and the substrate substrate; wherein the display substrate further includes a first isolation structure located on a side of the insulating layer away from the substrate substrate, and a positive projection of the first isolation structure on the substrate substrate overlaps a positive projection of the insulating layer on the substrate substrate; the insulating layer includes a groove, at least a part of the groove and the first isolation structure are located between adjacent sub-pixels, a projection of the first isolation structure and a part of a surface of the insulating layer away from the substrate substrate that forms an edge of the groove on the substrate substrate overlaps, and protrudes into the groove opening of the groove to form a first protrusion; at least a part of the first electrode and at least a part of the first isolation structure are made of the same material and are disposed in the same layer, and there is a gap between the first electrode and the first isolation structure; at least one of the plurality of film layers is disconnected at the first protrusion.

2. The display substrate according to claim 1, further comprising a second isolation structure stacked with the first isolation structure; the second isolation structure overlaps a projection of a part of an edge of the groove on the substrate substrate, and protrudes into the groove opening to form a second protrusion; the second protrusion and the first protrusion overlap in a direction perpendicular to the substrate substrate.

3. The display substrate according to claim 2, wherein, a minimum dimension of the second isolation structure in a direction of arrangement of the adjacent sub-pixels is not greater than a minimum dimension of the first isolation structure in the direction of arrangement of the adjacent sub-pixels.

4. The display substrate according to claim 2 or 3, wherein, a dimension of the second isolation structure in a direction perpendicular to the substrate substrate is 10 Å to 2000 Å.

5. The display substrate according to any one of claims 2-4, wherein, the second isolation structure includes at least one of a conductive material and an insulating material.

6. The display substrate according to claim 5, wherein, the first electrode includes a plurality of electrode layers, the second isolation structure is made of the same material as at least one electrode layer of the first electrode, and the second isolation structure is located between the first isolation structure and the insulating layer.

7. The display substrate according to any one of claims 2-6, wherein, the second isolation structure includes at least one film layer.

8. The display substrate according to any one of claims 1-7, wherein, a minimum distance between the first electrode and the first isolation structure in a direction of arrangement of the adjacent sub-pixels is not less than 1 μm, and a ratio of the minimum distance to a dimension of the sub-pixel in the direction of arrangement of the adjacent sub-pixels is not greater than 2.

9. The display substrate according to any one of claims 1-8, wherein, The ratio of the size of the first electrode in the direction perpendicular to the substrate to the size of the first isolation structure in the direction perpendicular to the substrate is 0.9 to 1.

1.

10. The display substrate according to any one of claims 1-9, wherein, In the arrangement direction of the adjacent sub-pixels, the ratio of the minimum size of the first protrusion to the minimum size of the first isolation structure is 0.005 to 0.

2.

11. The display substrate according to any one of claims 1-10, wherein, The groove includes a first sidewall and a second sidewall oppositely arranged in the arrangement direction of the adjacent sub-pixels; in the direction perpendicular to the substrate, at least the first sidewall overlaps with the first isolation structure; The slope angle between the first sidewall and the plane parallel to the contact surface of the first sidewall and the first isolation structure is the first slope angle; The slope angle between the second sidewall and the plane parallel to the contact surface of the first sidewall and the first isolation structure is the second slope angle; The first slope angle is not greater than the second slope angle.

12. The display substrate according to claim 11, wherein, The first slope angle is less than the second slope angle, and the angle of the first slope angle is 60° to 150°.

13. The display substrate according to claim 11 or 12, further comprising: A pixel defining pattern located on the side of the first electrode away from the substrate. The pixel defining pattern includes a plurality of first openings. One sub-pixel corresponds to at least one first opening. At least a part of the light-emitting functional layer of the sub-pixel is located in the first opening corresponding to the sub-pixel, and the first opening is configured to expose the first electrode; wherein, the pixel defining pattern further includes a plurality of second openings, and the first protrusion is exposed by the second openings.

14. The display substrate according to claim 13, wherein, The pixel defining pattern includes a pixel defining portion surrounding the plurality of first openings and the plurality of second openings. The slope angle of at least a part of the side surface of the pixel defining portion with the plane parallel to the contact surface of the pixel defining portion and the first isolation structure is the third slope angle; The third slope angle is not greater than the first slope angle.

15. The display substrate according to claim 13 or 14, wherein, The ratio of the minimum size of the second opening in the arrangement direction of the adjacent sub-pixels to the minimum size of the first opening in the arrangement direction of the adjacent sub-pixels is 0.05 to 2.

16. The display substrate according to any one of claims 13-15, wherein, The pixel defining portion covers the interval.

17. The display substrate according to any one of claims 13-16, wherein, The orthographic projection of the pixel defining portion on the substrate overlaps with the orthographic projection of the first electrode on the substrate; The minimum size of the overlapping portion in the arrangement direction of the adjacent sub-pixels is not less than 0.5 microns.

18. The display substrate according to any one of claims 13-17, wherein, The ratio of the size of the groove opening along the arrangement direction of the adjacent sub-pixels to the size of the second opening along the arrangement direction of the adjacent sub-pixels is 0.7 to 1.

5.

19. The display substrate according to any one of claims 1-18, wherein, the maximum size of the groove in the direction perpendicular to the substrate is not greater than the maximum size of the insulating layer in the direction perpendicular to the substrate, and the size of the groove in the direction perpendicular to the substrate is not less than 0.1 micrometers.

20. A display device, comprising the display substrate according to any one of claims 1-19.

21. A method for manufacturing a display substrate, comprising: forming a plurality of sub-pixels on a substrate, wherein forming the sub-pixels includes sequentially forming a first electrode, a light-emitting functional layer, and a second electrode stacked in the direction perpendicular to the substrate, and the first electrode is located between the light-emitting functional layer and the substrate; the manufacturing method further includes: forming an insulating material layer on the substrate; forming a conductive material layer on a side of the insulating material layer away from the substrate; wherein, patterning the conductive material layer forms the first electrode and the isolation structure, and there is a gap between the first electrode and the isolation structure; etching the insulating material layer to form a groove, wherein a projection on the substrate of a part of the isolation structure and the surface of the insulating material layer away from the substrate that constitutes the edge of the groove overlaps, and protrudes into the groove opening of the groove to form a protrusion; the light-emitting functional layer is formed after the groove is formed, and the light-emitting functional layer includes a plurality of film layers, and at least one of the plurality of film layers is disconnected at the protrusion.

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