Charged particle source control device
The charged particle source control device with a composite extraction electrode addresses vacuum deterioration and resolution issues by controlling brightness and angular current density, ensuring high resolution and signal-to-noise ratio even with large currents, and minimizing emitter damage.
Patent Information
- Application Number
- PCT/JP2024/011554
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-03-25
- Publication Date
- 2025-10-02
AI Technical Summary
Existing charged particle sources face issues with vacuum deterioration, poor signal-to-noise ratio, and reduced resolution due to large emission angles and aperture limitations, leading to emitter damage and aberrations.
A charged particle source control device with a composite extraction electrode comprising an electric field suppression electrode and an extraction electrode, where potentials are applied independently to control the potential distribution and electric field strength at the emitter tip, allowing for adjustable brightness and angular current density without vacuum degradation.
Maintains high resolution and signal-to-noise ratio while enabling large current emission, reducing emitter damage and aberrations, and allowing for compact microscope designs.
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Figure JP2024011554_02102025_PF_FP_ABST
Abstract
Description
Charged particle source control device
[0001] The present invention relates to a device for controlling the brightness and angular current density of a charged particle beam emitted from a charged particle source in a charged particle gun equipped with the charged particle source.
[0002] As an example of a charged particle emission device, a cold-cathode field emission electron gun will be described with reference to the drawings. Figure 6 shows a conventional cold-cathode field emission electron gun. The cold-cathode field emission electron gun is housed in a high-vacuum container (not shown). An electric field is formed between the emitter 101 and the extraction electrode 102 by an extraction voltage applied to the extraction electrode 102. A particularly strong electric field is formed at the tip of the emitter 101, causing electrons (charged particles 104) to be emitted from the tip of the emitter 101. The strength of the electric field is shown as the density of equipotential lines 107 representing the potential distribution between the emitter 101 and the extraction electrode 102. As shown in the figure, the density of the equipotential lines 107 at the tip of the emitter 101 is extremely high, indicating a strong electric field. An acceleration voltage is applied to the emitter 101 from an acceleration power supply 108. An extraction voltage is applied to the extraction electrode 102 from an extraction power supply 109.
[0003] P. Kruit, M. Bezuijen, J.E. Barth, “Source brightness and useful beam current of carbon nanotubes and other very small emitters”, Journal of Applied Physics, 30 January 2006, Volume 99, 024315; K. Kasuya, M. Fujita, “Electron Guns and Sources (Part 2) – Vacuum Technology and Optical Technology –”, Microscopes, Japan Society of Microscopy, April 30, 2018, Vol. 53, No. 1, pp. 36-41
[0004] As shown in Figure 7, in order to emit charged particles 104 from the emitter 101, a sufficiently strong electric field must be formed at the tip of the emitter 101. Figure 6 shows a case in which a strong electric field is formed at the tip of the emitter 101, using a cold cathode field emission electron gun as an example. Arc-shaped equipotential lines 107 are densely formed near the tip of the emitter 101 according to the surface shape, and the emitted charged particles 104 (electrons) fly in the direction normal to the equipotential lines 107, forming a virtual light source 114 where the charged particle trajectory asymptote 113 of the charged particles 104 (electrons) emitted in each direction intersects at a minimum. When the emitter 101 is viewed from downstream, the emitted charged particles 104 appear to be emitted from the virtual light source 114. Therefore, it is common to use a charged particle beam formed by charged particles 104 (electrons) emitted from the emission surface of the emitter 101 with a large emission angle, and the angle is limited by an aperture 115 located between the emitter 101 and a sample (not shown). However, if the emission angle 116 is limited to a small angle, the number of charged particles 104 passing through the aperture 115 decreases, and when the electron beam passing through the aperture 115 is used in, for example, a charged particle microscope, the signal-to-noise ratio of the observed value becomes extremely poor. Furthermore, if the hole diameter of the aperture 115 is increased to increase the emission angle 116 in order to improve the signal-to-noise ratio, the aberration of an electron lens (not shown) located downstream of the emitter 101 becomes large. Therefore, when used in, for example, a charged particle microscope, the diameter of the charged particle beam at the sample (not shown) becomes large, resulting in poor resolution. Furthermore, if the emission angle of the charged particle beam is large, most of the charged particles 104 (electrons) forming the charged particle beam collide with the extraction electrode 102 or the aperture 115 (not shown), generating secondary electrons 117 and gas molecules 118 from the surfaces of the extraction electrode 102 or the aperture 115. The emitted secondary electrons 117 are accelerated and collide with the emitter 101, damaging the emitter 101, and the emitted gas molecules 118 deteriorate the degree of vacuum, reducing the amount of emission and inducing damage to the emitter 101 due to discharge.
[0005] An object of the present invention is to solve the above-mentioned problems of the prior art and to provide a charged particle source device which does not deteriorate the degree of vacuum even when a large current is emitted from the emitter, and which can maintain high resolution without reducing the signal-to-noise ratio even when the angle of the electron beam emitted from the emitter is limited.
[0006] In order to solve the above problems, the charged particle source control device of the present invention is characterized in that, in a charged particle gun equipped with a charged particle source, it is equipped with an emitter that emits charged particles, and a composite extraction electrode consisting of an electric field suppression electrode arranged directly below the emitter and an extraction electrode arranged directly below the electric field suppression electrode.
[0007] The charged particle source control device is characterized in that, in the composite extractor electrode, potentials are applied independently to the electric field suppression electrode and the extractor electrode.
[0008] The charged particle source control device is characterized in that, in the composite extractor electrode, the potential applied to the electric field suppression electrode is lower than the potential applied to the extractor electrode.
[0009] The charged particle source control device is characterized in that, in the composite extraction electrode, a potential distribution protrudes in a convex shape toward the emitter side from a hole in the electric field suppression electrode.
[0010] The charged particle source control device is also characterized in that the emitter tip is disposed so as to pierce the potential distribution that exudes in a convex shape, and a concave potential distribution is formed at the emitter tip.
[0011] The charged particle source control device is also characterized in that, in the composite extraction electrode, the side of the hole in the emitter-side surface of the electric field suppression electrode is bowl-shaped or inclined.
[0012] The charged particle source control device is also characterized in that, in the composite extraction electrode, the ratio L / r of the radius r of the hole in the electric field suppression electrode to the distance L between the electric field suppression electrode and the tip of the emitter is 1 or less.
[0013] In addition, in the charged particle source control device, the emitter is any one of a thermionic electron emission source, a thermal field emission electron source, a cold cathode electron source, a nanotip, a carbon nanotube, a superconducting electron source, a stacked electron source, an emitter array, a liquid metal ion source, and a helium ion source.
[0014] The charged particle source control device is also characterized in that, in the composite extraction electrode, the combined voltage {Vsu, Vex} of the voltage Vsu applied to the electric field suppression electrode and the voltage Vex applied to the extraction electrode is used to operate the composite extraction electrode as a single electron lens.
[0015] The charged particle source control device is characterized in that it adjusts the amount of emission current by changing the electric field strength applied to the tip of the emitter by means of the combined voltage {Vsu, Vex}.
[0016] The charged particle source control device is also characterized in that it changes the potential distribution between the emitter and the composite extraction electrode using the combined voltage {Vsu, Vex} to adjust the trajectory of the charged particles emitted from the emitter.
[0017] The charged particle source control device is characterized in that it adjusts the amount of emission current and the trajectory of the charged particles by the combined voltage {Vsu, Vex}.
[0018] The charged particle source control device is also characterized in that it keeps the electric field strength applied to the emitter tip constant by using the combined voltage {Vsu, Vex}, and adjusts the trajectory of the emitted charged particles while maintaining the emission current constant.
[0019] The charged particle source control device is characterized in that it adjusts the converted brightness and angular current density of the emitted charged particle beam by the combined voltage {Vsu, Vex}.
[0020] Although a high brightness charged particle source has high brightness, its angular current density is small, and brightness drops significantly when a large current flows. However, the present invention can minimize the drop in brightness even when a large current flows.
[0021] By adjusting the voltages applied to the two electrodes, the characteristics (brightness, angular current density) of the charged particle beam emitted from the charged particle source can be set to a high brightness mode or a large angular current density mode.
[0022] The high brightness mode and the large angular current density mode are not separate, but the degree of the two modes can be continuously changed.
[0023] When the present invention is applied to a charged particle microscope, the sample surface can be analyzed with high spatial resolution in the high brightness mode, and the sample surface can be analyzed with a large current while maintaining high spatial resolution in the large angular current density mode.
[0024] When the present invention is applied to a charged particle microscope, the degree of high brightness mode and large angular current density mode can be continuously changed according to the characteristics of the sample to be observed, thereby enabling observation under optimal conditions for the sample.
[0025] In the high angular current density mode, the emission angle of the emitted charged particle beam becomes small, so the charged particles do not collide with the electrode to which voltage is applied to extract the charged particles, and gas is not generated from the electrode, which does not cause a deterioration in the vacuum around the emitter.In addition, because the charged particles do not collide with the electrode, contaminants do not adhere to the electrode surface, and the emitter is not damaged by discharge caused by the attached particles becoming charged.
[0026] When the present invention is applied to a charged particle microscope, the angular current density can be changed, so there is no need for an electron lens for adjusting the amount of current on the sample side as viewed from the emitter, and the charged particle microscope can be made compact.
[0027] When the present invention is applied to a charged particle microscope, the charged particles emitted from the emitter can be made immediately parallel to the optical axis, so that a sample can be observed with a highly coherent charged particle beam.
[0028] When the present invention is applied to a charged particle microscope, the emission angle is small and the diameter of the charged particle beam does not deviate significantly from the optical axis, so that the aberration generated by the electron lens located on the sample side as viewed from the emitter can be kept small, and even when the charged particle beam is focused on the surface of the sample, the spread of the diameter of the charged particle beam due to aberration is small.
[0029] When this invention is applied to a charged particle microscope specialized for semiconductor sample inspection, the sample surface can be observed and measured with high spatial resolution even when the amount of current irradiated onto the sample is large, thereby reducing the time required for sample observation and increasing measurement speed.
[0030] When the present invention is applied to a transmission electron microscope, a sample can be observed with a highly coherent charged particle beam.
[0031] When the present invention is applied to a charged particle microscope equipped with an emitter having a tip radius of 10 nm or less, a sample can be observed with a highly coherent charged particle beam having a high current density.
[0032] Fig. 1 is a schematic diagram showing an embodiment of the present invention; Fig. 2 is a schematic diagram explaining an example of operation of a composite extraction electrode according to the present invention; Fig. 3 is a schematic diagram explaining an example of operation of a composite extraction electrode according to the present invention; Fig. 4 is a charged particle trajectory diagram explaining an example of operation of a composite extraction electrode according to the present invention; Fig. 5 is a schematic diagram showing another embodiment of a charged particle gun according to the present invention; Fig. 6 is a schematic diagram showing the configuration of a conventional charged particle gun; Fig. 7 is a schematic diagram explaining the operation of a conventional charged particle gun.
[0033] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Note that components having the same functions will be assigned the same reference numerals, and repeated description thereof may be omitted.
[0034] The charged particle source control device of the present invention is characterized in that, in a charged particle gun equipped with a charged particle source, it comprises an emitter that emits charged particles, a composite extraction electrode composed of an electric field suppression electrode arranged directly below the emitter on an optical axis centered on the emitter, and an extraction electrode arranged directly below the electric field suppression electrode, and a voltage applied to the electric field suppression electrode and a voltage applied to the extraction electrode form a potential distribution that seeps out in a convex shape from a hole in the electric field suppression electrode toward the emitter, thereby forming a strong electric field at the tip of the emitter.
[0035] In the composite extraction electrode, potentials are applied independently to the electric field suppression electrode and the extraction electrode, and the potential applied to the electric field suppression electrode is lower than the potential applied to the extraction electrode.
[0036] A potential distribution protrudes in a convex shape from the hole in the electric field suppression electrode toward the emitter, and the tip of the emitter is positioned so as to pierce the protruding potential distribution in a convex shape, so that a concave potential distribution is formed at the tip of the emitter.
[0037] The side of the hole in the emitter-side surface of the electric field suppression electrode is bowl-shaped or inclined, and the ratio L / r of the radius r of the hole in the electric field suppression electrode to the distance L between the electric field suppression electrode and the tip of the emitter is 1 or less.
[0038] The emitter may be, for example, a thermionic electron source, a thermal field emission electron source, a cold cathode electron source, a nanotip, a carbon nanotube, a superconducting electron source, a stacked electron source, an emitter array, a liquid metal ion source, or a helium ion source.
[0039] An embodiment of the present invention is shown in Figure 1. A detailed description will be given below with reference to the drawings. A composite extractor electrode 106, located directly below an emitter 101 that emits charged particles 104, comprises an electric field suppression electrode 103 and an extractor electrode 102 located directly below the electric field suppression electrode 103. When a voltage is applied to each electrode, a convex potential distribution spreads from the holes in the electric field suppression electrode 103 toward the emitter 101 between the emitter 101 and the electric field suppression electrode 103. In the figure, the potential distribution is represented by equipotential lines 107, and a high density of the equipotential lines 107 indicates a strong electric field strength. The emitter 101 is positioned so that it penetrates the convex potential distribution, creating a strong electric field at the tip of the emitter 101. The charged particles 104 are emitted from the tip of the emitter 101 by the strong electric field, and the emitted charged particles 104 fly away due to a force acting in the normal direction of the equipotential lines 107, so that the emitted charged particles 104 fly away without deviating significantly from the optical axis 105 due to the convex potential distribution.
[0040] To easily explain the convex potential distribution, the potential of the suppressor electrode 103 is assumed to be the same as that of the emitter 101. A high voltage is applied to the extractor electrode 102, causing the charged particles 104 to be emitted from the tip of the emitter 101. However, the electric field suppressor electrode 103 causes the potential distribution seeping out of the holes in the suppressor electrode 103 to be convex on the emitter 101 side. In other words, the electric field suppressor electrode 103 only contributes to making the shape of the potential distribution created by the voltage applied to the extractor electrode 102 convex. However, the electric field suppressor electrode 103 does not necessarily have to be the same potential as the emitter 101, and a voltage may be applied to the electric field suppressor electrode 103. In other words, the composite extractor electrode 106 can change the shape of the potential distribution and the electric field strength applied to the tip of the emitter 101 by applying voltages to the electric field suppressor electrode 103 and the extractor electrode 102. For example, the shape of the potential distribution can be changed while maintaining constant the electric field strength applied to the tip of the emitter 101. This makes it possible to change the trajectory of the charged particles 104 while keeping the amount of emitted current constant.
[0041] 2 shows a case where a voltage Vsu and a voltage Vex are applied to the field suppression electrode 103 and the extraction electrode 102, respectively, which constitute the composite extraction electrode 106. The combination of voltages {Vsu, Vex} causes the composite extraction electrode 106 to function as an electron lens. The voltage combination changes the shape of the potential distribution indicated by the equipotential lines 107, which in turn changes the electric field strength applied to the tip of the emitter 101, thereby changing the quantity (amount of current) of charged particles 104 emitted from the emitter 101 and the trajectories of the charged particles 104. When two voltage combinations, {Vsu1, Vex1} and {Vsu2, Vex2}, are applied, the charged particles emitted by the voltage combinations are explicitly shown as charged particles (Vsu1, Vex1) 104a and charged particles (Vsu2, Vex2) 104b, respectively. If the electric potential is kept constant downstream of the extraction electrode 102, the charged particle 104 moves straight without receiving any force. Therefore, the asymptote of the trajectory of the charged particle 104 is drawn as a charged particle trajectory asymptote (Vsu1, Vex1) 113a and a charged particle trajectory asymptote (Vsu2, Vex2) 113b depending on the voltage combination, and a virtual light source (Vsu1, Vex1) 114a and a virtual light source (Vsu2, Vex2) 114b are formed at the positions where they intersect with the optical axis 105, respectively.
[0042] 3 shows the difference in the potential distribution shape at the tip of the emitter 101 and the trajectory of the charged particles 104 when the electric field suppression electrode 103 is present and when it is not. Fig. 3(a) shows the case without the electric field suppression electrode 103, which is a conventional configuration and method in which the charged particles 104 are emitted from the emitter 101 only by the voltage applied to the extraction electrode 102. A wedge-shaped potential distribution is formed at the tip of the emitter 101. Fig. 3(b) shows the case in which the electric field suppression electrode 103 is disposed between the emitter 101 and the extraction electrode 102, and the convex potential distribution seeps out from the hole in the electric field suppression electrode 103 between the emitter 101 and the electric field suppression electrode 103. The emitter 101 is positioned so as to penetrate the convex potential distribution, and the charged particles 104 (Vsu, Vex) emitted from the emitter 101 are subjected to a force in the direction of the optical axis 105. This allows the emission angle 116 of the charged particles 104 (Vsu, Vex) to be smaller than that shown in FIG. 3( a). FIG. 3( c) explicitly illustrates the composite extractor electrode 106, which is composed of the electric field suppression electrode 103 and the extractor electrode 102 shown in FIG. 3( b). The composite extractor electrode 106 can be treated as if it were a single electrode, and can simultaneously change both the shape of the potential distribution and the electric field strength. This makes it possible to simultaneously change the converted luminance Br and the angular current density I' using the composite extractor electrode 106. The above-mentioned operation will now be described in detail.
[0043] The indexes for evaluating the performance of the emitter 101 are the converted luminance Br and the angular current density I', which are expressed by Equations 1 and 2, respectively.
[0044]
[0045]
[0046] where, I: amount of emission current [A], r: radius of light source [m], θ: charged particle emission angle [rad], V: extraction voltage [V], and π: circumference constant.
[0047] The converted luminance Br is a conserved quantity, does not change at any convergence point on the axis, and is specific to the emitter 101. The emission current I includes factors attributable to the physical properties of the emitter 101 (e.g., work function, crystallinity, orientation, etc.) and factors attributable to the external environment of the emitter 101 (e.g., vacuum level, temperature, electric field strength F applied to the emitter surface, etc.). However, it is assumed that factors other than the electric field strength F are constant, and the emission current I is a function of only the electric field strength F. Therefore, if the electric field strength F at the tip of the emitter 101 is constant, the emission current I is also constant. In the case shown in Figure 3(a), the emission current I is uniquely determined by the voltage applied to the extraction electrode 101. Furthermore, since the potential distribution and electric field strength are uniquely determined, the trajectory of the charged particle 104 (Vex) emitted from the emitter 101 is also determined, and the emission angle 116 is also determined. On the other hand, when the composite extractor electrode 106 shown in Figures 3(b) and 3(c) is used, the emission current amount I, the trajectory of the charged particle 104 (Vsu, Vex), and the emission angle 116 are determined by the combination of the voltage combinations {Vsu, Vex}. In this case, the luminance Br is also calculated by Equation 1 and Equation 2, but the extractor voltage V in Equation 1 becomes the voltage Vex applied to the extractor electrode 102. The emission current amount I, the light source radius r, and the charged particle emission angle θ change depending on the voltage Vex and the voltage applied to the field suppression electrode 103. Here, the light source radius r refers to the virtual light source 114 (Vsu, Vex). When the composite extractor electrode 106 is considered as a single electrode, the converted luminance Br is calculated by reflecting the magnitude of the aberration (spherical aberration and chromatic aberration) caused by the lens action of the composite extractor electrode in the magnitude of the virtual light source 114 (Vsu, Vex). ~Now, consider a case where two voltage combinations {Vsu, Vex} are set, {Vsu1, Vex1} and {Vsu2, Vex2}, so that the emission current amount I is constant. Since the charged particles 104 (Vsu, Vex) are subjected to a force in the normal direction of the equipotential lines, in the composite extractor electrode 106, if the voltage applied to the electric field suppression electrode 103 is increased, the charged particles 104 (Vsu, Vex) move in a direction diverging from the optical axis, and if the voltage applied to the extractor electrode 102 is increased, the charged particles 104 (Vsu, Vex) move in a direction converging toward the optical axis. Now, change the state where the two voltage combinations are equal, {Vsu0, Vex0}, to a state where Vex1<Vex0<Vex2. Because Vex1 becomes smaller, Vsu1 must be set to Vsu1>Vsu0 in order to maintain the emission amount I. In this case, the charged particles 104a (Vsu1, Vex1) diverge more. Also, since Vex2 becomes larger, Vsu2<Vsu0 must be satisfied in order to maintain the emission amount I. In this case, the charged particles 104b (Vsu2, Vex2) converge more. Also, the converted brightness of each electric field combination can be expressed by Equations 3 and 4, respectively, from Equations 1 and 2.
[0048] The index for {Vsu1, Vex1} is expressed as 1, and the index for {Vsu2, Vex2} is expressed as 2.
[0049]
[0050]
[0051] Now, since the emission amount I is constant, the electric field strength F applied to the tip of the emitter 101 is also constant, so the converted brightnesses expressed by equations 3 and 4 are equal (Br1 = Br2. Therefore, r2 is given by equation 5.
[0052]
[0053] Since θ1>θ2 and Vex1<Vex2, it is not necessarily the case that r1<r2. However, as described above, if the composite extraction electrode 106 is regarded as one electrode, aberration due to the lens action formed by the electrode is added, and the virtual light source becomes larger than r2 (denoted as r3), and the converted luminance Br2 decreases (this is called Br2 ~ The converted brightness Br2 ~ becomes a new conserved quantity. On the other hand, the angular current density I' becomes larger as the emission angle 116 (θ2) becomes smaller, as shown in Equation 2. Therefore, by adjusting the voltage combination {Vsu, Vex}, the converted luminance Br2 ~ The angular current density I' can be changed by changing the converted luminance Br2 ~ However, if the composite extraction electrode 106 is disposed within 1 mm from the tip of the emitter 101, the charged particles 104 (Vsu, Vex) are close to the optical axis 105, so the aberration is reduced, and the converted luminance Br2 ~ Therefore, by adjusting the voltages applied to the electric field suppression electrode 103 and the extraction electrode 102 that constitute the composite extraction electrode 106, the reduction in the converted luminance Br2 ~ and the angular current density I' are in a trade-off relationship.
[0054] In particular, in the case of a field emission electron source called a high brightness electron source, the field emission electron source has high brightness but is not suitable for devices requiring a large current because of its small angular current density. However, when the composite extraction electrode 106 is used, the converted brightness Br2 ~ The optimal converted luminance Br2 is determined by the trade-off relationship between the angular current density I' and the ~ and the angular current density I' can be adjusted to the above.
[0055] 4A shows the calculation results of the potential distribution and the trajectory of the charged particle 104 (electron) when the emitter 101 is used as a field emission electron source and the composite extractor electrode 106 is used, and the charged particle 104 (electron) is emitted from the emitter 101 with an emission current of 10 nA using a combination of voltages {Vsu=150 V, Vex=150 V} applied to the extractor electrode 102 and the extractor electrode 102 constituting the composite extractor electrode 106. 9 [A / m 2 / sr / V], angular current density 7.22×10 -7 [A / sr]. Figure 4(b) shows the calculation results of the potential distribution and the trajectory of the charged particle 104 (electron) when the emitter 101 is the same as that shown in Figure 4(a), the composite extractor electrode 106 is used, and the charged particle 104 (electron) is emitted from the emitter 101 with a combination of voltages {Vsu = 0 V, Vex = 6000 V} applied to the extractor electrode 102 and the extractor electrode 102 constituting the composite extractor electrode 106. The electric field strength applied to the tip of the emitter 101 shown in Figure 4(a) is the same, and the emission current is also the same. Equivalent luminance 2.65 x 10 8 [A / m 2 / sr / V], angular current density 7.97×10 -5 [A / sr]. In this way, a trade-off relationship between the converted luminance and the angular current density is established.
[0056] The charged particle source control device of the present invention is characterized in that, in a charged particle gun equipped with a charged particle source, it comprises: an emitter that emits charged particles; a composite extraction electrode consisting of an electric field suppression electrode arranged directly below the emitter on an optical axis centered on the emitter and an extraction electrode arranged directly below the electric field suppression electrode; a suppression electrode arranged from the tip of the emitter to the emitter needle side; and a voltage applied to the electric field suppression electrode, a voltage applied to the extraction electrode, and a voltage applied to the suppression electrode, which form a potential distribution that seeps out in a convex shape from a hole in the electric field suppression electrode toward the emitter, thereby forming a strong electric field at the tip of the emitter.
[0057] An embodiment of the present invention is shown in Figure 5. A detailed description will be given below with reference to the drawings. The operation of this embodiment is the same as that of embodiment 1, except that a suppression electrode 111, located on the emitter needle side from the tip of the emitter 101, repels thermoelectrons 120 emitted from the emitter needle when a temperature is applied to the emitter 101, preventing them from flying toward the sample (not shown). Furthermore, the equivalent luminance and angular current density are optimally adjusted by combining the voltages applied to the electric field suppression electrode 103, the extraction electrode 102, and the suppression electrode 111, respectively.
[0058] Although the present invention has been described above as an example of an embodiment, it is not limited to this example and includes a method for controlling the brightness and angular density of a charged particle beam emitted from a charged particle source.
[0059] 101: Emitter 102: Extraction electrode 103: Electric field suppression electrode 104: Charged particle 104a: Charged particle (Vsu1, Vex1) 104b: Charged particle (Vsu2, Vex2) 105: Optical axis 106: Composite extraction electrode 107: Equipotential line 108: Acceleration power supply 109: Extraction power supply 110: Electric field suppression power supply 111: Suppression electrode 112: Charged particle beam 113: Charged particle trajectory asymptote 113a: Charged particle trajectory asymptote (Vsu1, Vex1) 113b Charged particle trajectory asymptote (Vsu2, Vex2) 114: Virtual light source 114a: Virtual light source (Vsu1, Vex1) 114b: Virtual light source (Vsu2, Vex2) 115: Aperture 116: Emission angle 117: Secondary electron 118: Gas molecule 119: Suppression power source 120: Thermionic electron
Claims
1. A charged particle source control device for a charged particle gun equipped with a charged particle source, comprising: an emitter that emits charged particles; and a composite extraction electrode consisting of an electric field suppression electrode arranged directly below the emitter and an extraction electrode arranged directly below the electric field suppression electrode.
2. The charged particle source control device according to claim 1, wherein in said composite extraction electrode, potentials are applied independently to said electric field suppression electrode and said extraction electrode.
3. A charged particle source control device according to claim 1, wherein in said composite extraction electrode, the potential applied to said field suppression electrode is lower than the potential applied to said extraction electrode.
4. A charged particle source control device according to claim 1, wherein in said composite extraction electrode, a potential distribution protrudes in a convex shape from the hole in said electric field suppression electrode toward said emitter side.
5. A charged particle source control device according to claim 4, characterized in that the emitter tip is arranged to pierce the potential distribution that exudes in a convex shape, and a concave potential distribution is formed at the emitter tip.
6. A charged particle source control device according to claim 1, wherein in said composite extraction electrode, the side of the hole in the emitter-side surface of said field suppression electrode is bowl-shaped or inclined.
7. A charged particle source control device according to claim 1, characterized in that in the composite extraction electrode, the ratio L / r of the radius r of the hole in the electric field suppression electrode to the distance L between the electric field suppression electrode and the tip of the emitter is 1 or less.
8. The charged particle source control device according to claim 1, wherein the emitter is any one of a thermionic electron emission source, a thermal field emission electron source, a cold cathode electron source, a nanotip, a carbon nanotube, a superconducting electron source, a stacked electron source, an emitter array, a liquid metal ion source, and a helium ion source.
9. A charged particle source control device as described in claim 1, characterized in that in the composite extraction electrode, the combined voltage {Vsu, Vex} of the voltage Vsu applied to the electric field suppression electrode and the voltage Vex applied to the extraction electrode is used to operate the composite extraction electrode as a single electron lens.
10. A charged particle source control device according to claim 9, wherein the intensity of the electric field applied to the tip of the emitter is changed by the combined voltage {Vsu, Vex} to adjust the amount of emission current.
11. The charged particle source control device according to claim 9, wherein the combined voltage {Vsu, Vex} is used to change the potential distribution between the emitter and the composite extraction electrode, thereby adjusting the trajectory of the charged particles emitted from the emitter.
12. The charged particle source control device according to claim 9, wherein the amount of emission current and the trajectory of the charged particles are adjusted by the combined voltage {Vsu, Vex}.
13. A charged particle source control device according to claim 9, characterized in that the combined voltage {Vsu, Vex} keeps the electric field strength applied to the tip of the emitter constant, and adjusts the trajectory of the emitted charged particles while maintaining the emission current constant.
14. The charged particle source control device according to claim 9, wherein the combined voltage {Vsu, Vex} adjusts the converted brightness and angular current density of the emitted charged particle beam.
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