Display panel
By designing central and peripheral subpixels in the OLED display panel and using isolation structures of different widths for electrical connection and aperture ratio optimization, the problem of low pixel aperture ratio was solved, improving the quality of the display panel and reducing manufacturing costs.
Patent Information
- Application Number
- PCT/CN2025/082446
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-04-11
- Filing Date
- 2025-03-13
- Publication Date
- 2025-10-16
AI Technical Summary
How to increase the pixel aperture ratio of OLED display panels to improve the lifespan and quality of the display panels.
Design a display panel structure in which subpixels are divided into central subpixels and peripheral subpixels, and are isolated by isolation structures of different widths. Electrical connection is achieved through the first-width isolation structure, and the second-width isolation structure is narrowed to improve the aperture ratio.
By increasing the aperture ratio of sub-pixels, the quality of the display panel is improved, and the process difficulty and manufacturing cost are reduced.
Smart Images

Figure CN2025082446_16102025_PF_FP_ABST
Abstract
Description
Display panel
[0001] The present application claims priority to the Chinese patent application No. 2024104377994, filed on April 11, 2024, entitled “Display panel”, which is incorporated by reference in its entirety.
TECHNICAL FIELD
[0002] The present application relates to the technical field of display, in particular to a display panel.
BACKGROUND
[0003] OLED (Organic Light-Emitting Diode) is called organic electroluminescent diode. OLED display technology has many advantages such as full solid state, active light emitting, high contrast, ultra-thin, low power consumption, fast response speed, wide working range, easy to realize flexible display and 3D display, etc., so it is applied in many display screens at present, such as applied in TV and mobile display devices. The pixel aperture ratio of OLED display panel is one of the important factors to determine the quality of display panel, and the larger the pixel aperture is, the more conducive to improving the service life of display panel, so how to increase the pixel aperture of display panel is an important issue in the field of display.
SUMMARY
[0004] The present application aims to provide a display panel.
[0005] The present application provides a display panel, comprising: a substrate provided with a pixel definition layer, the pixel definition layer having a plurality of pixel openings; a pixel group comprising a plurality of sub-pixels arranged in the pixel openings, wherein one of the sub-pixels is a center sub-pixel, and the remaining plurality of sub-pixels are peripheral sub-pixels surrounding the center sub-pixel, and adjacent pixel groups share one peripheral sub-pixel; an isolation structure protruding from the pixel definition layer and surrounding the pixel openings, the isolation structure comprising a first isolation structure and a second isolation structure, the first isolation structure being located between two adjacent peripheral sub-pixels, and the second isolation structure being located between an adjacent center sub-pixel and a peripheral sub-pixel; the width of the orthographic projection of at least part of the first isolation structure and at least part of the second isolation structure on the substrate is a first width, the width of the orthographic projection of at least part of the second isolation structure on the substrate is a second width, the first width is greater than the second width, and the cathodes of adjacent sub-pixels are electrically connected through the isolation structure of the first width.
[0006] In an example embodiment of the present application, the central sub-pixel has a quadrilateral shape in orthographic projection on the substrate, the peripheral sub-pixel has a hexagonal shape in orthographic projection on the substrate, and each pixel group has four peripheral sub-pixels, which are arranged one by one corresponding to the four sides of the central sub-pixel; the six sides of the peripheral sub-pixel include two straight sides and four oblique sides, the two straight sides are arranged opposite to each other and respectively face one central sub-pixel, and the four oblique sides respectively correspond to the other four peripheral sub-pixels; the first isolation structure is arranged corresponding to the oblique side, and the second isolation structure is arranged corresponding to the straight side.
[0007] In an example embodiment of the present application, the second isolation structure includes a transverse isolation structure and a longitudinal isolation structure, the transverse isolation structure extends in a first direction, the longitudinal isolation structure extends in a second direction, the first direction is perpendicular to and intersects with the second direction; at least one of the transverse isolation structure and the longitudinal isolation structure has the first width.
[0008] In an example embodiment of the present application, all the transverse isolation structures have the first width, and all the longitudinal isolation structures have the second width; or, all the longitudinal isolation structures have the first width, and all the transverse isolation structures have the second width.
[0009] In an example embodiment of the present application, all the transverse isolation structures have a first width, part of the longitudinal isolation structures have the first width, and part of the longitudinal isolation structures have a second width, and the longitudinal isolation structures having the first width and the longitudinal isolation structures having the second width are alternately arranged in the first direction; or, all the longitudinal isolation structures have a first width, part of the transverse isolation structures have the first width, and part of the transverse isolation structures have a second width, and the transverse isolation structures having the first width and the transverse isolation structures having the second width are alternately arranged in the second direction.
[0010] In an example embodiment of the present application, the central sub-pixel has a rectangular shape in orthographic projection on the substrate, and the peripheral sub-pixel has a parallelepiped shape in orthographic projection on the substrate; the orthographic projection of the first isolation structure on the substrate as a whole constitutes a plurality of arrayed rectangles; and the orthographic projection of the second isolation structure on the substrate as a whole constitutes a plurality of arrayed X shapes.
[0011] In an example embodiment of the present application, the isolation structure comprises a main layer and a roof layer arranged in sequence, the roof layer is arranged protruding towards the pixel opening relative to the main layer; the isolation structure has conductivity or insulation; the main layer of the first isolation structure has conductivity, for electrically connecting cathodes of adjacent peripheral sub-pixels.
[0012] In an example embodiment of the present application, the roof layer of the first isolation structure and the roof layer of the second isolation structure both have insulation, and are formed in the same patterning process; the main layer of the first isolation structure and the main layer of the second isolation structure are both conductive layers, and are formed in the same patterning process.
[0013] In an example embodiment of the present application, in the isolation structure with the first width, the main layer has conductivity and the roof layer has insulation; in the isolation structure with the second width, the main layer has insulation and the roof layer has conductivity; wherein in the isolation structure with the first width and the isolation structure with the second width, the roof layer in the isolation structure with the second width and the main layer in the isolation structure with the first width are formed in the same patterning process, and the main layer in the isolation structure with the second width and the pixel definition layer use the same insulating material.
[0014] In an example embodiment of the present application, the isolation structure comprises a main layer and a roof layer arranged in sequence, the roof layer is arranged protruding towards the pixel opening relative to the main layer; the isolation structure has conductivity or insulation; the main layer of the first isolation structure has conductivity, for electrically connecting cathodes of adjacent peripheral sub-pixels.
[0015] The display panel has the following beneficial effects: the substrate is provided with a pixel definition layer, the pixel definition layer has a plurality of pixel openings; the sub-pixels are arranged in the pixel openings, the sub-pixels include center sub-pixels and peripheral sub-pixels, adjacent pixel groups share one peripheral sub-pixel; a plurality of sub-pixels are arranged one by one in the pixel openings; an isolation structure is arranged protruding from the pixel definition layer and surrounds the pixel openings, the isolation structure includes first isolation structures and second isolation structures, the first isolation structures are located between two adjacent peripheral sub-pixels, and the second isolation structures are located between adjacent center sub-pixels and peripheral sub-pixels; the width of the orthographic projection of at least part of the first isolation structures and at least part of the second isolation structures on the substrate is a first width, the width of the orthographic projection of at least part of the second isolation structures on the substrate is a second width, the first width is greater than the second width, and the cathodes of adjacent sub-pixels are electrically connected through the isolation structure with the first width. The sub-pixels of the pixel group are divided into center sub-pixels and peripheral sub-pixels, so that the first isolation structures and the second isolation structures with different widths are arranged between the center sub-pixels and the peripheral sub-pixels and between adjacent peripheral sub-pixels, and the widths of part of the first isolation structures and part of the second isolation structures are reduced, the isolation structure with the first width is electrically connected with the cathodes of the sub-pixels to realize the electrical connection of adjacent sub-pixels, and the isolation structure with the second width is narrowed to improve the opening area of the two side sub-pixels, so that the opening rate of the sub-pixels is improved, and the quality of the display panel is improved.
[0016] Other features and advantages of the present application will become apparent from the following detailed description, or will be learned by practice of the present application.
[0017] It should be understood that the general description above and the following detailed description are only exemplary and explanatory, and cannot limit the present application.
BRIEF DESCRIPTION OF DRAWINGS
[0018] The drawings incorporated into the specification and forming part of the specification, show embodiments consistent with the present application, and together with the specification, serve to explain the principles of the present application. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.
[0019] Fig. 1 is a structural schematic diagram of a display panel in an embodiment of the present application;
[0020] Fig. 2 is a structural schematic diagram of a first embodiment of a pixel group in an embodiment of the present application;
[0021] Fig. 3 is a structural schematic diagram of a second embodiment of a pixel group in an embodiment of the present application;
[0022] Fig. 4 is a structural schematic diagram of a third embodiment of a pixel group in the embodiment of the present application;
[0023] Fig. 5 is a sectional schematic diagram of a first embodiment of an isolation structure in the embodiment of the present application;
[0024] Fig. 6 is a sectional schematic diagram of a second embodiment of an isolation structure in the embodiment of the present application;
[0025] Fig. 7 is a sectional schematic diagram of a third embodiment of an isolation structure in the embodiment of the present application;
[0026] Fig. 8 is a sectional schematic diagram of a fourth embodiment of an isolation structure in the embodiment of the present application;
[0027] Fig. 9 is a sectional schematic diagram of a fifth embodiment of an isolation structure in the embodiment of the present application.
[0028] Legend: 100, substrate; 200, pixel definition layer; 210, pixel opening; 300, pixel group; 310, sub-pixel; 311, center sub-pixel; 312, peripheral sub-pixel; 312A, straight side; 312B, oblique side; 400, isolation structure; 401, main body layer; 402, eave layer; 410, first isolation structure; 420, second isolation structure; 421, lateral isolation structure; 422, longitudinal isolation structure; D1, first width; D2, second width; D3, third width; D4, fourth width.
DETAILED DESCRIPTION
[0029] Example implementations will now be described more fully with reference to the accompanying drawings. Example implementations can be implemented in any
[0030] Moreover, described features, structures, or characteristics can be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided, such as examples of programming, software modules, user selections, network transactions, database queries, database structures, hardware modules, hardware- specific details and
[0031] The application will be described in further detail below with reference to the drawings and specific embodiments. It should be noted that the technical features involved in each of the embodiments of the application described below can be combined with each other as long as there is no conflict. The embodiments described below by referring to the drawings are exemplary and are intended to explain the application, but cannot be understood as a limitation of the application.
[0032] It should be noted that "multiple" mentioned in this paper refers to two or more than two. The association between the associated objects described by "and / or" indicates that there can be three relationships, for example, A and / or B can represent three cases: A exists alone, A and B exist together, and B exists alone. The character " / " generally represents a "or" relationship between the associated objects before and after it.
[0033] OLED (Organic Light-Emitting Diode) is called organic electroluminescent diode. OLED display technology has many advantages such as full solid state, active light emitting, high contrast, ultra-thin, low power consumption, fast response speed, wide working range, easy to realize flexible display and 3D display, etc. Therefore, it is currently applied in many display screens, such as applied in television and mobile display devices. The pixel aperture ratio of OLED display panel is one of the important factors to determine the quality of the display panel. The larger the pixel aperture is, the more conducive to improving the service life of the display panel. Therefore, how to increase the pixel aperture of the display panel is an important issue in the display field.
[0034] To solve the above technical problems, referring to FIG. 1 to FIG. 8, the present application provides a display panel, comprising a substrate 100, a pixel group 300 and an isolation structure 400. The pixel group 300 and the isolation structure 400 are arranged on the substrate 100, the pixel group 300 comprises a plurality of sub-pixels 310, and isolation between adjacent sub-pixels 310 is realized by the isolation structure 400. The substrate 100 is provided with a pixel definition layer 200, the pixel definition layer 200 has a plurality of pixel openings 210; the pixel group 300 comprises a plurality of sub-pixels 310 arranged in the pixel openings 210, wherein one sub-pixel 310 is a center sub-pixel 311, and the remaining plurality of sub-pixels 310 are peripheral sub-pixels 312 surrounding the center sub-pixel 311, and adjacent pixel groups 300 share one peripheral sub-pixel 312; the isolation structure 400 is arranged protruding from the pixel definition layer 200 and surrounds the pixel opening 210, the isolation structure 400 comprises a first isolation structure 410 and a second isolation structure 420, the first isolation structure 410 is located between two adjacent peripheral sub-pixels 312, and the second isolation structure 420 is located between adjacent center sub-pixels 311 and peripheral sub-pixels 312; the width of the orthographic projection of at least part of the first isolation structure 410 and at least part of the second isolation structure 420 on the substrate 100 is a first width D1, the width of the orthographic projection of at least part of the second isolation structure 420 on the substrate 100 is a second width D2, the first width D1 is greater than the second width D2, and the cathodes of adjacent sub-pixels 310 are electrically connected through the isolation structure 400 with the first width D1. The sub-pixels 310 of the pixel group 300 are divided into center sub-pixels 311 and peripheral sub-pixels 312, so that the first isolation structure 410 and the second isolation structure 420 with different widths are arranged between the center sub-pixels 311 and the peripheral sub-pixels 312 and between adjacent peripheral sub-pixels 312, and the width of part of the first isolation structure 410 and part of the second isolation structure 420 is reduced, the isolation structure 400 with the first width D1 realizes electrical connection of adjacent sub-pixels 310 with the cathodes of the sub-pixels 310, and the isolation structure 400 with the second width D2 is narrowed to improve the opening area of the two side sub-pixels 310, so as to improve the opening rate of the sub-pixels 310, thereby improving the quality of the display panel.
[0035] In some embodiments, the substrate 100 can be a glass substrate or an organic substrate. The organic substrate includes a substrate layer, a planar layer, and a driving circuit. The material of the planar layer can be polyimide (PI) and polyamide (PEN). The driving circuit can be a thin film transistor (TFT) circuit layer, which is used to drive the light-emitting layer of the OLED. The TFT circuit layer includes a plurality of arrayed driving circuit units. Each driving circuit unit can include a TFT device and a capacitor. Each driving circuit unit corresponds to an anode and an organic light-emitting layer. The TFT device can be a low temperature poly-silicon (LTPS) type or a metal-oxide semiconductor (MOS) type, such as an indium gallium zinc oxide (IGZO) metal-oxide semiconductor type.
[0036] In some embodiments, the material of the pixel definition layer 200 can be an organic material, an inorganic coating layer disposed on an organic material, or an inorganic material. The organic material of the pixel definition layer 200 includes, but is not limited to, polyimide. The inorganic material of the pixel definition layer 200 includes, but is not limited to, silicon oxide (SiO), silicon nitride (Si3N4), silicon oxynitride (Si3N4O), magnesium fluoride (MgF2), or a combination thereof.
[0037] In some embodiments, the sub-pixels 310 are used to emit different colors of light, and a plurality of sub-pixels 310 emit light to display an image. Each pixel is superimposed and mixed by the red, green, and blue sub-pixels 310 to achieve white display, and different color displays are achieved by controlling the light-emitting degree of the different color sub-pixels 310.
[0038] In some embodiments, the sub-pixel 310 includes an anode, an organic light-emitting layer, and a cathode. The anode is disposed on the substrate 100 in the pixel accommodation area; the organic light-emitting layer is disposed on the anode; and the cathode is disposed on the organic light-emitting layer.
[0039] Further, the anode is disposed between the pixel definition layer 200 and the substrate 100. The anode is spaced apart from the substrate 100 on one side surface. The material of the anode includes, but is not limited to, chromium, titanium, gold, silver, copper, aluminum, ITO, combinations thereof, or other suitable conductive materials. The organic light-emitting layer is used to emit red light, blue light, or green light when powered on, and the organic light-emitting layer can include one or more of HIL (Hole Injection Layer), HTL (Hole Transfer Layer), EML (Emitting Layer), and ETL (Electron Transfer Layer). The cathode is disposed on the side of the organic light-emitting layer away from the anode, and the material of the cathode includes, but is not limited to, chromium, titanium, gold, silver, copper, aluminum, ITO, combinations thereof, or other suitable conductive materials. The material of the cathode can be the same as or different from the material of the anode, and is specifically set according to the actual situation.
[0040] In some embodiments, referring to FIGS. 1 and 2, the first direction extends along the width direction of the center sub-pixel 311, and the second direction extends along the length direction of the center sub-pixel 311, and the first direction and the second direction are perpendicular.
[0041] In some embodiments, referring to FIGS. 1 to 3, the orthographic projection shape of the center sub-pixel 311 on the substrate 100 is a quadrilateral, the orthographic projection shape of the peripheral sub-pixel 312 on the substrate 100 is a hexagon, and each pixel group 300 has four peripheral sub-pixels 312, and the four peripheral sub-pixels 312 are disposed one by one corresponding to the four sides of the center sub-pixel 311; the six sides of the peripheral sub-pixel 312 include two straight sides 312A and four oblique sides 312B, the two straight sides 312A are oppositely disposed and respectively face one center sub-pixel 311, and the four oblique sides 312B respectively correspond to the other four peripheral sub-pixels 312; the first isolation structure 410 is disposed corresponding to the oblique side 312B, and the second isolation structure 420 is disposed corresponding to the straight side 312A. In this way, four peripheral sub-pixels 312 are disposed around the center sub-pixel 311, and the peripheral sub-pixel 312 is set as a hexagon by the peripheral sub-pixel 312, which increases the area of the peripheral sub-pixel 312, so that the width of part of the isolation structure 400 can be set smaller. Further, the straight side 312A of the peripheral sub-pixel 312 is a side extending in the first direction, and the oblique side 312B is a side extending at an angle to the first direction, and the angle of each straight side 312A and each oblique side 312B is the same, and the angle of each oblique side 312B and the oblique side 312B is the same. The two center sub-pixels 311 and the peripheral sub-pixel 312 are isolated by disposing the second isolation structure 420 between the straight side 312A and the center sub-pixel 311, and the adjacent peripheral sub-pixels 312 are isolated by disposing the first isolation structure 410 between the adjacent oblique sides 312B.
[0042] Further, referring to FIGS. 2 and 3, the orthographic projection of the center sub-pixel 311 on the substrate 100 is a rectangle, and the orthographic projection of the peripheral sub-pixel 312 on the substrate 100 is a parallelogram; the orthographic projection of the first isolation structure 410 on the substrate 100 constitutes a plurality of arrayed rectangles; and the orthographic projection of the second isolation structure 420 on the substrate 100 constitutes a plurality of arrayed X shapes. The peripheral sub-pixel 312 is arranged as a parallelogram, which can be distributed on four sides corresponding to the center sub-pixel 310, and the space for arranging the first isolation structure 410 is provided between the oblique sides of adjacent peripheral sub-pixels 312, so that the first isolation structure 410 of the X shape has a common part, thereby reducing the area of the first isolation structure 410 and further improving the pixel aperture ratio of the peripheral sub-pixel 312. The rectangle and the parallelogram are regular patterns, and the regular pattern can reduce the process difficulty of the sub-pixel 310. Therefore, the first isolation structure 410 and the second isolation structure 420 can be arranged to form regular rectangles and X shapes, so as to reduce the process difficulty of the isolation structure 400 and further reduce the process difficulty of the display panel.
[0043] Further, referring to FIGS. 2 and 3, the second isolation structure 420 includes a horizontal isolation structure 421 and a vertical isolation structure 422, the horizontal isolation structure 421 extends in a first direction, the vertical isolation structure 422 extends in a second direction, the first direction is perpendicular to and intersects with the second direction; at least part of the horizontal isolation structure 421 and at least part of the vertical isolation structure 422 have a first width D1. The second isolation structure 420 with the first width D1 can ensure that the cathodes on the opposite sides thereof are electrically connected, thereby forming a transmission network of the cathode signal.
[0044] In the first embodiment, referring to FIG. 2, all the horizontal isolation structures 421 have the first width D1, and all the vertical isolation structures 422 have a second width D2. By setting the width of the horizontal isolation structure 421 to be greater than the width of the vertical isolation structure 422, the pixel aperture ratio in the second direction can be improved at least, and the transmission of the cathode signal in the first direction can be achieved at least. Since the second isolation structures 420 with the same width are arranged in the same direction, and the second isolation structures 420 with different widths are arranged in different directions, the design is more convenient.
[0045] In the second embodiment, all the vertical isolation structures 422 have the first width D1, and all the horizontal isolation structures 421 have the second width D2. By setting the width of the vertical isolation structure 422 to be greater than the width of the horizontal isolation structure 421, the pixel aperture ratio in the first direction can be improved at least, and the transmission of the cathode signal in the second direction can be achieved at least.
[0046] In the third embodiment, as shown in FIG. 3, all of the transverse isolation structures 421 have the first width D1, part of the longitudinal isolation structures 422 have the first width D1, part of the longitudinal isolation structures 422 have the second width D2, and the longitudinal isolation structures 422 having the first width D1 and the longitudinal isolation structures 422 having the second width D2 are arranged alternately in the first direction. By setting the width of part of the longitudinal isolation structures 422 to be the same as the width of all of the transverse isolation structures 421, and setting the width of all of the transverse isolation structures 421 to be greater than the width of the other part of the longitudinal isolation structures 422, the pixel aperture ratio of part of the central sub-pixels 311 or the peripheral sub-pixels 312 in the second direction can be improved. In addition, the longitudinal isolation structures 422 of the two widths are arranged alternately in the first direction, and this arrangement makes the distribution of the longitudinal isolation structures 422 of the two widths more uniform, which can improve the pixel aperture ratio while ensuring the uniformity of the cathode signal transmission.
[0047] In the fourth embodiment, all of the longitudinal isolation structures 422 have the first width D1, part of the transverse isolation structures 421 have the first width D1, part of the transverse isolation structures 421 have the second width D2, and the transverse isolation structures 421 having the first width D1 and the transverse isolation structures 421 having the second width D2 are arranged alternately in the second direction. By setting the width of part of the transverse isolation structures 421 to be the same as the width of all of the longitudinal isolation structures 422, and setting the width of all of the longitudinal isolation structures 422 to be greater than the width of the other part of the transverse isolation structures 421, the pixel aperture ratio of part of the central sub-pixels 311 or the peripheral sub-pixels 312 in the first direction can be improved.
[0048] In some embodiments, in the pixel group 300, one longitudinal isolation structure 422 is set to have the first width D1, the other longitudinal isolation structure 422 and two transverse isolation structures 421 are set to have the second width D2; and / or, one transverse isolation structure 421 is set to have the first width D1, the other transverse isolation structure 421 and two longitudinal isolation structures 422 are set to have the second width D2. In addition, the transverse isolation structures 421 and the longitudinal isolation structures 422 can also be arranged according to actual conditions. For example, when arranging the transverse isolation structures 421 having the first width D1 and the second width D2, a plurality of transverse isolation structures 421 having the first width D1 can be arranged continuously first, and then a plurality of transverse isolation structures 421 having the second width D2 can be arranged continuously.
[0049] In the first embodiment, as shown in FIG. 4, four first isolation structures 410 are arranged between the four adjacent peripheral sub-pixels 312, and part of the first isolation structures 410 can be set to have the first width D1 and part of the second isolation structures 420 can be set to have the second width D2 according to actual conditions.
[0050] In the second embodiment, all the first isolation structures 410 have the first width D1, and part of the second isolation structures 420 have the first width D1 and part of the second isolation structures 420 have the second width D2. That is, only the isolation structures 400 corresponding to the central sub-pixels 311 are subjected to the narrow processing, and the isolation structures 400 corresponding to the inclined edges of the edge sub-pixels 312 are not subjected to the narrow processing. This is because the edge sub-pixels 312 around the first isolation structures 410 are densely distributed. For example, in FIG. 4, four first isolation structures 410 are connected to form an X shape, and the X shape corresponds to four edge sub-pixels 312. Therefore, the first isolation structures 410 are not subjected to the narrow processing, so as to ensure that the cathodes of the densely arranged sub-pixels 312 can pass through the first isolation structures 410 to achieve better electrical connection effect. In addition, the inclined edges of the edge sub-pixels 312 corresponding to the X shape are usually shorter than the straight edges. Therefore, even if the first isolation structures 410 are subjected to the narrow processing, the saved area is relatively small. The second isolation structures 420 correspond to the straight edges, and the straight edges are longer, which is beneficial to obtain more saved area and improve the pixel aperture ratio.
[0051] In the third embodiment, the first isolation structures 410 can also be subjected to the narrow processing. The number or total length of the first isolation structures 410 subjected to the narrow processing can be less than the number or total length of the second isolation structures 420 subjected to the narrow processing, so as to obtain a larger aperture ratio and take into account the electrical connection effect of the cathodes and the isolation structures 400. That is, the number of the first isolation structures 410 having the second width can be less than the number of the second isolation structures 420 having the second width, and / or the total length of the first isolation structures 410 having the second width can be less than the total length of the second isolation structures 420 having the second width. It can be understood that the length direction is perpendicular to the width direction.
[0052] In some embodiments, referring to FIGS. 5 to 9, the isolation structures 400 have conductivity or insulation. The isolation structures 400 include a main body layer 401 and a roof layer 402 arranged in sequence. The roof layer 402 is protrudingly arranged towards the pixel opening 210 relative to the main body layer 401. The roof layer 402 is protrudingly arranged towards the pixel opening 210 relative to the main body layer 401, so that the cross-sectional area of the roof layer 402 is set to be greater than the cross-sectional area of the main body layer 401. Therefore, different evaporation angles can be formed when the light-emitting layer and the cathode of the sub-pixel 310 are evaporated, and the mask plate required by the conventional evaporation can be removed through the above design, so as to reduce the manufacturing cost of the display panel.
[0053] In some embodiments, as shown in FIGS. 5-9, the body layer 401 and the eave layer 402 are shown. Taking the body layer 401 and the eave layer 402 as an example, without considering other structural cross-section lines, the body layer 401 or the eave layer 402 having electrical conductivity is represented by a cross-section line extending in a first direction; and the body layer 401 or the eave layer 402 having insulation is represented by a cross-section line extending at an angle to the first direction.
[0054] In some embodiments, as shown in FIG. 5, the orthogonal projection of the isolation structure 400 having the first width D1 on the substrate 100 actually means that the eave layer 402 of the isolation structure 400 has the first width D1, and the width of the body layer 401 of the isolation structure 400 has a third width D3, which is less than the first width D1. The orthogonal projection of the isolation structure 400 having the second width D2 on the substrate 100 actually means that the eave layer 402 of the isolation structure 400 has the second width D2, and the width of the body layer 401 of the isolation structure 400 has a fourth width D4, which is less than the second width D2. The first width D1 is greater than the second width D2, and the fourth width D4 is less than the third width D3.
[0055] In some embodiments, as shown in FIGS. 5-7, at least the body layer 401 of the isolation structure 400 having the first width D1 has electrical conductivity, and is used to electrically connect the cathodes of adjacent peripheral sub-pixels 312.
[0056] In some embodiments, as shown in FIG. 5, in the isolation structure 400 having the first width D1, the body layer 401 has electrical conductivity, and the eave layer 402 has insulation; in the isolation structure 400 having the second width D2, the body layer 401 has electrical conductivity, and the eave layer 402 has insulation; and in the isolation structure 400 having the first width D1 and the isolation structure 400 having the second width D2, the body layer 401 and the eave layer 402 are formed in the same patterning process. The electrical connection between the cathodes of adjacent sub-pixels 310 is achieved by the body layer 401, and the insulation effect of the body layer 401 and other structures can also be achieved by the eave layer 402. The body layer 401 and the eave layer 402 can be formed in the same patterning process, which can reduce the process and save the manufacturing cost of the display panel.
[0057] In some embodiments, referring to FIG. 6, in the isolation structure 400 with the first width D1, the main body layer 401 has the electrical conductivity, and the roof layer 402 has the insulation. Thus, the electrical connection of the adjacent sub-pixels 310 can be achieved by the main body layer 401, and the insulation effect of the main body layer 401 and other structures can be achieved by the roof layer 402. In the isolation structure 400 with the second width D2, the main body layer 401 has the insulation, and the roof layer 402 has the electrical conductivity. Thus, the adjacent sub-pixels 310 can be isolated by the main body layer 401, and the other structures of the display panel, such as the pixel electrode, can be reused by the roof layer 402. In the isolation structure 400 with the first width D1 and the isolation structure 400 with the second width D2, the roof layer 402 in the isolation structure 400 with the second width D2 and the main body layer 401 in the isolation structure 400 with the first width D1 are formed in the same patterning process, and the main body layer 401 in the isolation structure 400 with the second width D2 and the pixel definition layer 200 adopt the same insulating material. Thus, the main body layer 401 and the roof layer 402 can be formed in the same patterning process, the process is reduced, and the manufacturing cost of the display panel is saved. The main body layer 401 in the isolation structure 400 with the second width D2 and the pixel definition layer 200 adopt the same insulating material, the main body layer 401 can be formed when the pixel definition layer 200 is formed, and the process is also saved.
[0058] In some embodiments, referring to FIG. 7, in the isolation structure 400 with the first width D1, the main body layer 401 has the electrical conductivity, and the roof layer 402 has the insulation. In the isolation structure 400 with the second width D2, the main body layer 401 and the roof layer 402 both have the insulation. Details are not repeated here.
[0059] In some embodiments, in the isolation structure 400 with the first width D1 and the isolation structure 400 with the second width D2, the main body layer 401 and the roof layer 402 both have the insulation, are formed in the same patterning process, and the main body layer 401 and the pixel definition layer 200 adopt the same insulating material. For example, referring to FIG. 8, in the isolation structure 400 with the second width D2, the main body layer 401 and the roof layer 402 both have the insulation, are formed in the same patterning process, and the main body layer 401 and the pixel definition layer 200 adopt the same insulating material. While achieving the isolation effect of the adjacent sub-pixels 310, the width of the main body layer 401 and the roof layer 402 can be smaller due to the lack of electrical conductivity, and the pixel opening 210 can be further increased.
[0060] In some embodiments, referring to FIG. 9, in the isolation structure 400 with the second width D2, the main body layer 401 has the insulation, and the roof layer 402 has the electrical conductivity. Details are not repeated here.
[0061] In the present application, the sub-pixels 310 of the pixel group 300 are divided into the center sub-pixel 311 and the peripheral sub-pixel 312, so that the first isolation structure 410 and the second isolation structure 420 with different widths are arranged between the center sub-pixel 311 and the peripheral sub-pixel 312 and between adjacent peripheral sub-pixels 312, and the width of part of the first isolation structure 410 and part of the second isolation structure 420 is reduced. The isolation structure 400 with the first width D1 realizes the electrical connection of adjacent sub-pixels 310 with the cathode of the sub-pixel 310, and the isolation structure 400 with the second width D2 is narrowed to improve the opening area of the two side sub-pixels 310, so as to improve the quality of the display panel by improving the aperture ratio of the sub-pixel 310. The main body layer 401 and the eave layer 402 of the isolation structure 400 are optimized in layout, which can further reduce the width of the isolation structure 400 while realizing the isolation effect of adjacent sub-pixels 310. Structures with similar functions are formed in the same patterning process, which can save the process and reduce the manufacturing cost of the display panel.
[0062] In the present application, unless otherwise explicitly specified and limited, the terms "provided with", "connected", and the like should be understood broadly, for example, can be fixedly connected, or can be detachably connected, or can be integrated; can be mechanically connected, or can be electrically connected; can be directly connected, or can be indirectly connected through an intermediate medium, or can be the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meanings of the above terms in the present application can be understood according to the specific circumstances.
[0063] In the description of the present specification, the description referring to the terms "some embodiments" and the like means that the specific features, structures, materials or characteristics described in connection with the embodiments are contained in at least one embodiment of the present application. In the present specification, the illustrative description of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any appropriate manner in any one or more embodiments or examples. In addition, those skilled in the art can combine and combine the different embodiments or examples described in the present specification and the features of the different embodiments or examples without contradiction.
[0064] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limiting the present application. Those skilled in the art can make changes, modifications, replacements and variations to the above embodiments within the scope of the present application, and any changes or modifications made in accordance with the claims and the specification of the present application shall be within the scope of the present application.
Claims
1. A display panel, wherein: include: A substrate is provided with a pixel definition layer, wherein the pixel definition layer has a plurality of pixel openings; a pixel group comprising a plurality of sub-pixels disposed in the pixel opening, wherein one of the sub-pixels is a central sub-pixel, and the remaining plurality of the sub-pixels are peripheral sub-pixels surrounding the central sub-pixel, and adjacent pixel groups share one peripheral sub-pixel; an isolation structure protruding from the pixel definition layer and surrounding the pixel opening, the isolation structure comprising a first isolation structure and a second isolation structure, the first isolation structure being located between two adjacent peripheral sub-pixels, and the second isolation structure being located between the adjacent central sub-pixel and the peripheral sub-pixel; The width of the orthographic projection of at least part of the first isolation structure and at least part of the second isolation structure on the substrate is a first width, the width of the orthographic projection of at least part of the second isolation structure on the substrate is a second width, the first width is greater than the second width, and the cathodes of adjacent sub-pixels are electrically connected through the isolation structure of the first width.
2. The display panel according to claim 1, wherein Four first isolation structures are provided between four adjacent peripheral sub-pixels, some of the first isolation structures are configured to have the first width, and some of the second isolation structures are configured to have the second width.
3. The display panel according to claim 1, wherein: There are four first isolation structures between four adjacent peripheral sub-pixels, each of the first isolation structures has a first width, some of the second isolation structures have the first width, and some of the second isolation structures have a second width.
4. The display panel according to claim 1, wherein: include: The orthographic projection shape of the central sub-pixel on the substrate is a quadrilateral, the orthographic projection shape of the peripheral sub-pixels on the substrate is a hexagon, and each pixel group has four peripheral sub-pixels, which are arranged in a one-to-one correspondence with the four sides of the central sub-pixel.
5. The display panel according to claim 4, wherein: include: The six side edges of the peripheral sub-pixel include two straight edges and four oblique edges, the two straight edges are arranged opposite to each other and respectively face the central sub-pixel, the four oblique edges respectively correspond to the other four peripheral sub-pixels, the first isolation structure is arranged corresponding to the oblique edges, and the second isolation structure is arranged corresponding to the straight edges. The display panel according to claim 5 , wherein: The second isolation structure includes a transverse isolation structure and a longitudinal isolation structure, the transverse isolation structure extends in a first direction, and the longitudinal isolation structure extends in a second direction, the first direction extends along the width direction of the central sub-pixel, and the second direction extends along the length of the central sub-pixel, the first direction is perpendicular to and intersects with the second direction; at least part of the transverse isolation structure and / or at least part of the longitudinal isolation structure has the first width.
7. The display panel according to claim 6, wherein: All of the transverse isolation structures have the first width, and all of the longitudinal isolation structures have the second width.
8. The display panel according to claim 6, wherein: All of the longitudinal isolation structures have the first width, and all of the transverse isolation structures have the second width.
9. The display panel according to claim 6, wherein: All the transverse isolation structures have a first width, some longitudinal isolation structures have a first width, some longitudinal isolation structures have a second width, and the longitudinal isolation structures with the first width and the longitudinal isolation structures with the second width are alternately arranged in the first direction.
10. The display panel according to claim 6, wherein: All the longitudinal isolation structures have a first width, some transverse isolation structures have a first width, some transverse isolation structures have a second width, and the transverse isolation structures with the first width and the transverse isolation structures with the second width are alternately arranged in the second direction.
11. The display panel according to claim 1, wherein: The orthographic projection of the central sub-pixel on the substrate is a rectangle, and the orthographic projection of the peripheral sub-pixel on the substrate is a parallelepiped; the orthographic projection of the first isolation structure as a whole on the substrate constitutes a plurality of rectangles arranged in an array; the orthographic projection of the second isolation structure as a whole on the substrate constitutes a plurality of X-shaped arrays.
12. The display panel according to claim 1, wherein: The isolation structure is conductive or insulating, and includes a main layer and an eaves layer arranged in sequence, wherein the eaves layer is protruded toward the pixel opening relative to the main layer; at least the main layer in the isolation structure with the first width is conductive and is used to electrically connect the cathodes of adjacent peripheral sub-pixels.
13. The display panel according to claim 12, wherein: In the isolation structure having the first width, the main body layer has conductivity, and the eaves layer has insulation; In the isolation structure having the second width, the main body layer has conductivity, and the eaves layer has insulation.
14. The display panel according to claim 13, wherein: In the isolation structure with the first width and the isolation structure with the second width, the main body layer and the eaves layer of both are formed in the same patterning process.
15. The display panel according to claim 12, wherein: In the isolation structure having the first width, the main body layer has conductivity, and the eaves layer has insulation; In the isolation structure having the second width, the main body layer has insulation properties, and the eaves layer has conductivity.
16. The display panel according to claim 14, wherein: In the isolation structure having the first width and the isolation structure having the second width, the eaves layer in the isolation structure having the second width and the main layer in the isolation structure having the first width are formed in the same patterning process, and the main layer in the isolation structure having the second width and the pixel definition layer use the same insulating material.
17. The display panel according to claim 1, wherein: The isolation structure includes a main layer and an eaves layer arranged in sequence, and the eaves layer is protruded toward the pixel opening relative to the main layer; in the isolation structure with the first width and the isolation structure with the second width, the main layer and the eaves layer of both are insulating and are formed in the same graphic process, and the main layer and the pixel definition layer of both use the same insulating material.
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