Gas flow regulation method and reaction device

By real-time detection and adjustment of the pressure difference between the inside and outside of the reaction chamber, and optimization of the inlet airflow rate using a PID control algorithm, the problem of pressure fluctuations between the inside and outside of the chamber affecting the oxidation annealing process was solved, resulting in more stable processing effects and higher efficiency.

WO2026000313A1PCT designated stage Publication Date: 2026-01-02LAPLACE (XIAN) TECH CO LTD
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Patent Information

Application Number
PCT/CN2024/102124
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-06-27
Publication Date
2026-01-02

AI Technical Summary

Technical Problem

In the semiconductor product processing, fluctuations in the pressure difference between the inside and outside of the cavity affect the oxidation annealing effect, and existing technologies are unable to effectively reduce this impact.

Method used

By installing differential pressure detection devices and flow rate regulating devices in the reaction device, the gas pressure difference inside and outside the chamber is detected in real time. The flow rate proportional coefficient and set value are calculated based on the pressure difference, and the inlet air flow rate is adjusted to stabilize the gas pressure difference within the preset range. The adjustment parameters are optimized using a PID control algorithm.

Benefits of technology

It effectively reduces the impact of pressure fluctuations inside and outside the chamber on the oxidation annealing process, improves the stability and efficiency of the process, reduces the vacuuming process, and lowers production costs.

✦ Generated by Eureka AI based on patent content.

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Abstract

A gas flow regulation method and a reaction device (100). The gas flow regulation method comprises: acquiring a gas pressure difference (S31, S51); calculating a flow proportionality coefficient on the basis of the gas pressure difference, a pressure difference preset value, and regulation parameters (S32, S53); calculating a flow set value on the basis of the flow proportionality coefficient and a flow preset value (S33, S54); and outputting the flow set value to a flow regulating member (30), and returning to the step of acquiring a gas pressure difference (S34, S55). The reaction device (100) comprises a cavity (10), a pressure difference detecting member (20), and a flow regulating member (30); the cavity (10) is connected to the flow regulating member (30) and the pressure difference detecting member (20); the pressure difference detecting member (20) is used for detecting the gas pressure difference between the inside and the outside of the cavity (10); and the flow regulating member (30) is used for regulating the gas inlet flow rate of the cavity (10) on the basis of a flow set value. The reaction device (100) can adjust the flow set value of the flow regulating member (30) in real time on the basis of the gas pressure difference between the inside and the outside of the cavity (10), so that the gas pressure difference between the inside and the outside of the cavity (10) is maintained within a gas pressure difference fluctuation range required by oxidation annealing treatment, thereby reducing the impact of the fluctuation of the gas pressure difference between the inside and the outside of the cavity (10) on oxidation annealing treatment.
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Description

Gas flow regulation method and reaction device TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor product processing, and in particular to a gas flow regulation method and reaction device. BACKGROUND

[0002] In the process of semiconductor product processing, a sheet-shaped material applied to the product needs to be processed through an oxidation annealing process. The sheet-shaped material can be accommodated in a cavity. Without vacuumizing the cavity, pressure fluctuations will occur in the exhaust system connected to the cavity, causing fluctuations in the pressure difference between the inside and outside of the cavity, thereby affecting the effect of the oxidation annealing process. Therefore, how to reduce the influence of the pressure difference between the inside and outside of the cavity on the effect of the oxidation annealing process is still a problem to be solved in the related field.

[0003] SUMMARY

[0004] In view of the above, it is necessary to provide a gas flow regulation method and reaction device to solve the above defects.

[0005] In a first aspect, embodiments of the present application provide a gas flow regulation method applied to a reaction device, the reaction device comprising a cavity, a pressure difference detection member and a flow regulation member, the cavity being connected to the flow regulation member and the pressure difference detection member, the pressure difference detection member being configured to detect a pressure difference between the inside and outside of the cavity, and the flow regulation member being configured to adjust an inlet flow rate of the cavity according to a flow set value. The gas flow regulation method comprises: obtaining a pressure difference; calculating a flow proportionality coefficient according to the pressure difference, a pressure difference preset value and a regulation parameter; calculating a flow set value according to the flow proportionality coefficient and a flow preset value; outputting the flow set value to the flow regulation member, and returning to the step of obtaining the pressure difference.

[0006] Optionally, the regulation parameter is a PID control parameter, and the calculation of the flow proportionality coefficient according to the pressure difference, the pressure difference preset value and the regulation parameter comprises: calculating a difference value of the pressure difference and the pressure difference preset value; and calculating the difference value and the regulation parameter according to a PID algorithm to obtain the flow proportionality coefficient.

[0007] Optionally, the calculation of the flow set value according to the flow proportionality coefficient and the flow preset value comprises: multiplying the flow proportionality coefficient and the flow preset value to obtain the flow set value.

[0008] Optionally, before obtaining the pressure difference, the gas flow regulation method further comprises: debugging the regulation parameter and the flow set value.

[0009] Optionally, the debugging the adjustment parameter and the flow setting value comprises: obtaining a real-time pressure difference; in response to not being in a timing state and the pressure difference being within a first difference interval from a pressure difference preset value, entering the timing state; in response to being in the timing state and a timing duration not reaching a preset time, returning to the step of obtaining the real-time pressure difference; in response to being in the timing state and the timing duration reaching the preset time, ending the timing state; and in response to a plurality of pressure differences obtained within the preset time not satisfying a stable condition, adjusting the adjustment parameter and / or the flow preset value according to a debugging rule.

[0010] Optionally, after obtaining the real-time pressure difference, the debugging the adjustment parameter and the flow setting value further comprises: in response to not being in the timing state and the pressure difference not being within the first difference interval from the pressure difference preset value, returning to the step of obtaining the real-time pressure difference.

[0011] Optionally, the preset time comprises a first time period and a second time period, and the stable condition comprises: within the first time period after starting timing, there is no pressure difference in the plurality of pressure differences that exceeds a second difference interval, wherein the first difference interval is contained in the second difference interval; and within the second time period after the first time period, a proportion of pressure differences in the plurality of pressure differences that exceed the first difference interval is lower than a preset proportion.

[0012] Optionally, the adjustment parameter is a PID control parameter, the adjustment parameter comprises a flow proportionality coefficient and an integral parameter, and the debugging rule comprises: when there is a pressure difference in the first time period after starting timing that exceeds the second difference interval and the flow proportionality coefficient is a maximum value, increasing the flow preset value; and when, within the second time period after the first time period, the proportion of pressure differences that exceed the first difference interval is greater than or equal to the preset proportion, decreasing the proportionality parameter and / or increasing the integral parameter.

[0013] Optionally, before obtaining the pressure difference, the gas flow adjustment method further comprises: determining, by the pressure difference detection member, whether the gas pressure inside the cavity is less than the gas pressure outside the cavity; in response to the gas pressure inside the cavity being greater than or equal to the gas pressure outside the cavity, returning to the step of determining, by the pressure difference detection member, whether the gas pressure inside the cavity is less than the gas pressure outside the cavity; and in response to the gas pressure inside the cavity being less than the gas pressure outside the cavity, performing the step of obtaining the pressure difference.

[0014] In a second aspect, an embodiment of the present application provides a reaction device, comprising: a cavity, one end of the cavity being configured to be connected to an exhaust device, and the other end being configured to be connected to an air inlet device; a pressure difference detection member, the pressure difference detection member being connected to the cavity, and the pressure difference detection member being configured to detect a pressure difference between inside and outside the cavity; a flow adjustment member, the flow adjustment member being configured to be connected between the cavity and the air inlet device, and the flow adjustment member being configured to adjust an air inlet flow rate of the cavity according to a flow setting value; and a processor, the processor being connected to the pressure difference detection member and the flow adjustment member, and the processor being configured to execute the gas flow adjustment method of any one of the above.

[0015] The gas flow adjusting method and the reaction device provided by the embodiments of the present application can obtain the gas pressure difference between the inside and the outside of the cavity in real time, and adjust the flow setting value of the flow adjusting member in real time according to the gas pressure difference, so that the gas pressure difference between the inside and the outside of the cavity can be maintained within the fluctuation range of the gas pressure difference required by the oxidation annealing process, and the influence of the fluctuation of the gas pressure difference between the inside and the outside of the cavity on the oxidation annealing process is reduced. BRIEF DESCRIPTION OF DRAWINGS

[0016] Fig. 1 is a first schematic view of a reaction device according to an embodiment of the present application.

[0017] Fig. 2 is a second schematic view of a reaction device according to an embodiment of the present application.

[0018] Fig. 3 is a first flowchart of a gas flow adjusting method according to an embodiment of the present application.

[0019] Fig. 4 is a second flowchart of a gas flow adjusting method according to an embodiment of the present application.

[0020] Fig. 5 is a third flowchart of a gas flow adjusting method according to an embodiment of the present application.

[0021] Fig. 6 is a fourth flowchart of a gas flow adjusting method according to an embodiment of the present application.

[0022] Fig. 7 is a fifth flowchart of a gas flow adjusting method according to an embodiment of the present application.

[0023] Main element symbol explanation: 100, reaction device; 200, gas inlet device; 300, gas outlet device; 400, electronic device; 10, cavity; 20, pressure difference detecting member; 30, flow adjusting member; 40, processor; 50, communication module; 60, air extraction valve. DETAILED DESCRIPTION

[0024] The technical solutions in the embodiments of the present application will be described clearly and completely below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, but not all the embodiments of the present application.

[0025] The multiple in the present application refers to two or more. In addition, it should be understood that in the description of the present application, the words “first”, “second”, etc. are only used for distinguishing the purpose of description, and cannot be understood as indicating or implying relative importance, nor can be understood as indicating or implying order.

[0026] In the description of the embodiments of the present application, the word "exemplary" or "for example" is used to mean "an example of" or "an example, only. Any implementation or design solution described as "exemplary" or "for example" in the embodiments of the present application should not be construed as being superior or more advantageous than other implementations or design solutions.

[0027] Referring to FIG. 1, a reaction device 100 is shown, according to an embodiment of the present application. The reaction device 100 can accommodate a carrier and a plurality of sheet materials carried by the carrier.

[0028] In the embodiments of the present application, the type of the sheet materials is not specifically limited. For example, the sheet materials can be, but are not limited to, applied to silicon wafers, silicon carbide wafers and wafer.

[0029] In an embodiment, the reaction device 100 can include a cavity 10. The cavity 10 can accommodate a carrier and a plurality of sheet materials carried by the carrier. A heating assembly (not shown) can be arranged in the cavity 10, and can heat the sheet materials in the cavity 10. One end of the cavity 10 is connected to an air inlet device 200, and the other end is connected to an air outlet device 300. The cavity 10 can be connected to the air inlet device 200 and the air outlet device 300 through pipes. The air inlet device 200 can transmit the gas required for the oxidation annealing process to the cavity 10, and the air outlet device 300 can discharge the exhaust gas generated after the oxidation annealing process from the cavity 10.

[0030] It can be understood that the air inlet device 200 can deliver oxygen and nitrogen to the cavity 10. The oxygen can participate in the oxidation annealing process of the sheet materials, and the nitrogen can adjust the air pressure in the cavity 10. The air outlet device 300 can be a common exhaust pipe system in a plant where the reaction device 100 is located. The exhaust gas generated after the oxidation annealing process and part of the nitrogen can flow from the cavity 10 to the air outlet device 300, and be recycled or discharged through the air outlet device 300.

[0031] Referring to FIG. 2, in the embodiments of the present application, the reaction device 100 can further include a differential pressure detection member 20, a flow rate adjustment member 30 and a processor 40. The differential pressure detection member 20 is fixedly installed on the cavity 10, and can detect the air pressure difference between the inside and outside of the cavity 10. The flow rate adjustment member 30 is located between the air inlet device 200 and the cavity 10, and can be connected to the air inlet device 200 and the cavity 10 through pipes. The flow rate adjustment member 30 can adjust the air inlet flow rate of the cavity 10. The processor 40 can be communicatively connected to the differential pressure detection member 20 and the flow rate adjustment member 30.

[0032] In the embodiments of the present application, the fixed mounting and fixed connection manner is not specifically limited. For example, the fixed manner can include, but is not limited to, welding fixation, bolt fixation, etc.

[0033] In the embodiments of the present application, the communication connection manner is not specifically limited. For example, the communication connection can be a wired communication connection realized through a bus or the like. For another example, the communication connection can be a wireless communication connection realized through 3G, 4G, 5G, Bluetooth, wireless local area network, cellular network, etc.

[0034] It can be understood that the differential pressure detection member 20 can be a differential pressure gauge commonly used in the related field. When the air pressure inside the cavity 10 is less than the air pressure outside, the reading of the differential pressure detection member 20 can be negative; when the air pressure inside the cavity 10 is greater than the air pressure outside, the reading of the differential pressure detection member 20 can be positive.

[0035] It can be understood that the output flow of the air inlet device 200 is maintained unchanged when the air inlet device 200 delivers air to the cavity 10, and the flow regulating member 30 located between the air inlet device 200 and the cavity 10 can regulate the volume or mass of air passing through the flow regulating member 30 per unit time, so as to regulate the air inlet flow rate of the cavity 10. For example, the flow regulating member 30 can be a mass flow controller (MFC).

[0036] It can be understood that the processor 40 can obtain the air pressure difference inside and outside the cavity 10 from the differential pressure detection member 20, and then output a flow setting value to the flow regulating member 30 according to the air pressure difference inside and outside the cavity 10, so that the flow regulating member 30 can adjust the air inlet flow rate of the cavity 10 according to the flow setting value.

[0037] The exhaust device 300 is connected with a plurality of processing devices or equipment during operation, each of which can discharge exhaust gas to the exhaust device 300, and the number of processing devices or equipment discharging exhaust gas to the exhaust device 300 at the same time period changes the air pressure in the exhaust device 300, thereby affecting the air pressure in the cavity 10; and the exhaust device 300 works at different power at different time periods, and the change of the power of the exhaust device 300 changes the transmission speed of the exhaust device 300 to the exhaust gas, thereby changing the air pressure in the exhaust device 300, thereby affecting the air pressure in the cavity 10. That is, the exhaust device 300 is easy to cause the fluctuation of the air pressure difference between the inside and outside of the cavity 10. Among them, the plurality of processing devices or equipment can perform process treatment on the sheet material, and the process performed by the plurality of processing devices or equipment can be the same as or different from the process performed by the reaction device 100, and the embodiments of the present application do not limit this. For example, when the processes performed by the plurality of processing devices or equipment are different from the process performed by the reaction device 100, the processes performed by the plurality of processing devices or equipment can include, but are not limited to, boron diffusion, phosphorus diffusion, plasma enhanced chemical vapor deposition (PECVD), etc.

[0038] The oxidation annealing treatment in the cavity 10 needs to maintain the air pressure difference between the inside and outside of the cavity 10 in a preset pressure difference interval to be stable. After the processor 40 obtains the air pressure difference in real time through the pressure difference detection piece 20, the air flow rate of the cavity 10 can be adjusted through the flow adjusting piece 30 according to the change of the air pressure difference between the inside and outside of the cavity 10, thereby adjusting the air pressure in the cavity 10, so that when the air pressure difference between the inside and outside of the cavity 10 fluctuates, the air pressure difference between the inside and outside of the cavity 10 is stabilized in the preset pressure difference interval by adjusting the air flow rate of the cavity 10, which can improve the stability of the oxidation annealing treatment and improve the treatment effect of the sheet material after the oxidation annealing treatment.

[0039] In the embodiments of the present application, the pressure difference interval is not specifically limited, for example, the pressure difference interval can be (-40, +20), and the unit is Pa. Among them, the air pressure difference detected by the pressure difference detection piece 20 is the difference between the air pressure in the cavity 10 and the air pressure outside the cavity 10. The values in the pressure difference interval are the differences between the air pressure in the cavity 10 and the air pressure outside the cavity 10, and when the value is negative, the air pressure in the cavity 10 is less than the air pressure outside the cavity 10; when the value is positive, the air pressure in the cavity 10 is greater than the air pressure outside the cavity 10.

[0040] In the embodiments of the present application, the plurality of sheet materials can be subjected to the oxidation annealing treatment under normal pressure (for example, the pressure difference between the inside and the outside of the cavity 10 is between -40 Pa and +20 Pa), compared with the general scheme in the related art in which the plurality of sheet materials are subjected to the oxidation annealing treatment under a vacuum low pressure condition (for example, the pressure difference between the inside and the outside of the cavity 10 is equal to or lower than -1000 Pa), the reaction device 100 provided by the embodiments of the present application can save the vacuumizing process when the oxidation annealing treatment is performed, thereby improving the efficiency of the oxidation annealing treatment. Meanwhile, the reaction device 100 can omit the dry pump and the butterfly valve used for vacuumizing the cavity 10 in the general scheme, and can reduce the production cost of the reaction device 100.

[0041] In the embodiments of the present application, the type of the processor 40 is not specifically limited. For example, the processor 40 can be, but is not limited to, a general central processing unit (CPU), a microprocessor, a programmable logic controller (PLC), an application-specific integrated circuit (ASIC), or one or more integrated circuits for controlling the program execution of the above scheme.

[0042] For example, the processor 40 can be a PLC. The differential pressure detection member 20 can output the detection result to the processor 40 in the form of an analog signal, the processor 40 can perform sliding filtering on the received analog signal, and then convert the analog signal into a digital signal, and determine the pressure difference between the inside and the outside of the cavity 10 according to the digital signal.

[0043] It can be understood that the processor 40 can be communicatively connected with an electronic device 400. The worker can output information to the processor 40 by operating the electronic device 400, so that the processor 40 stores the information or triggers the work of other components of the reaction device 100 according to the information.

[0044] It can be understood that the electronic device 400 can be a device having human-computer interaction function, communication function and information processing function. In the embodiments of the present application, the type of the electronic device 400 is not specifically limited. For example, the electronic device 400 can be, but is not limited to, a personal computer, an industrial computer, a smart phone, a tablet computer, etc.

[0045] In some embodiments, the reaction device 100 can further include a communication module 50 electrically connected between the processor 40 and the flow adjusting member 30. The communication module 50 can realize the communication connection between the processor 40 and the flow adjusting member 30.

[0046] It can be understood that the communication module 50 can realize the wired communication connection between the processor 40 and the flow regulating member 30 through a serial port or a bus. For example, the processor 40 and the flow regulating member 30 can realize the communication connection based on the EtherCAT bus through the communication module 50.

[0047] In some embodiments, the reaction device 100 can further comprise an exhaust valve 60. The exhaust valve 60 is connected between the cavity 10 and the exhaust device 300, and the exhaust valve 60 can drive the gas in the cavity 10 to be discharged into the exhaust device 300.

[0048] It can be understood that the exhaust valve 60 can be a valve without opening degree adjustment function. The exhaust valve 60 can be opened to realize the communication between the cavity 10 and the exhaust device 300, and can be closed to disconnect the communication between the cavity 10 and the exhaust device 300. The exhaust gas in the cavity 10 can enter the exhaust device 300 through the opened exhaust valve 60.

[0049] It can be understood that the exhaust valve 60 can be in communication connection with the processor 40, and the processor 40 can control the opening and closing of the exhaust valve 60.

[0050] In the embodiments of the present application, the type of the exhaust valve 60 is not specifically limited. For example, the exhaust valve 60 can be, but is not limited to, a diaphragm valve or a flapper valve.

[0051] It can be understood that the valves between the flow regulating member 30 and the gas inlet device 200 and between the flow regulating member 30 and the cavity 10 can be provided, and the type of the valve can be the same as that of the exhaust valve 60, which is not limited in the embodiments of the present application.

[0052] Please refer to FIG. 3, which shows the flow chart of the gas flow regulating method in the embodiments of the present application. It can be understood that the processor 40 can realize the adjustment of the gas inlet flow rate of the cavity 10 according to the real-time gas pressure difference by executing the gas flow regulating method, so as to stabilize the gas pressure difference between the inside and outside of the cavity 10 in the preset pressure difference interval.

[0053] The gas flow regulating method can comprise the following steps S31 to S34:

[0054] Step S31: Obtain the gas pressure difference.

[0055] It can be understood that step S31 can be executed in the process of the oxidation annealing treatment in the cavity 10. The processor 40 can obtain the real-time gas pressure difference between the inside and outside of the cavity 10 through the pressure difference detection member 20. The gas pressure difference can be the difference between the gas pressure in the cavity 10 and the gas pressure outside the cavity 10.

[0056] Step S32: Calculate the flow proportionality coefficient according to the gas pressure difference, the pressure difference preset value and the regulating parameter.

[0057] It can be understood that the pressure difference preset value can be a value preset by the worker to the processor 40 through the electronic device 400 before the gas flow adjustment method is executed. The pressure difference preset value can be a pressure difference that can enable the oxidation annealing process to be stably performed in the cavity 10. The worker can select a value in the pressure difference interval as the pressure difference preset value according to experience or according to a preset rule. The preset rule can include selecting a median value in the pressure difference interval as the pressure difference preset value, and selecting a value that is selected as the pressure difference preset value most frequently when the step S32 is executed multiple times as the pressure difference preset value, and the like. For example, the pressure difference preset value can be -10 Pa.

[0058] It can be understood that the adjustment parameter can be a value preset by the worker to the processor 40 through the electronic device 400 before the gas flow adjustment method is executed. In the embodiments of the present application, the type of the adjustment parameter is not specifically limited. For example, the adjustment parameter can be, but is not limited to, a PID control parameter, wherein the PID control parameter can include a proportional parameter, an integral parameter, and a differential parameter.

[0059] Referring to FIG. 4, in some embodiments, the manner of calculating the flow proportionality coefficient according to the pressure difference, the pressure difference preset value, and the adjustment parameter can include the following steps S41 and S42. It can be understood that the steps S41 and S42 are sub-steps of the step S32.

[0060] Step S41: calculating a difference between the pressure difference and the pressure difference preset value.

[0061] It can be understood that after the processor 40 obtains the real-time pressure difference through the pressure difference detection member 20, the processor 40 can obtain the difference by subtracting the pressure difference preset value from the pressure difference.

[0062] Step S42: calculating the difference and the adjustment parameter according to a PID algorithm to obtain the flow proportionality coefficient.

[0063] It can be understood that the processor 40 can input the difference calculated in the step S41 into the PID algorithm, and then the PID algorithm is executed to obtain the flow proportionality coefficient. The PID control algorithm is an algorithm that can perform operations on the input algorithm deviation value according to a preset function relationship of the PID control parameter (for example, the proportional parameter, the integral parameter, and the differential parameter), and obtain an operation result that can adjust the deviation value. In the embodiments of the present application, the deviation value input to the PID algorithm is the difference between the pressure difference and the pressure difference preset value, and the operation result obtained by calculation is the flow proportionality coefficient. The flow proportionality coefficient is in the interval of (0, 1].

[0064] It can be understood that after the step S42 is executed, the step S33 can be entered.

[0065] Please continue to refer to FIG. 3, step S33: calculating the flow set value according to the flow ratio coefficient and the flow preset value.

[0066] It can be understood that the flow preset value can be a value preset by the staff to the processor 40 through the electronic device 400 before the gas flow adjustment method is executed. The flow preset value can be an upper limit value of the volume or mass of the gas allowed to flow through the flow detection member in a unit of time, and the flow preset value can be less than or equal to the upper limit value of the volume or mass of the gas actually loadable by the flow detection member in a unit of time. The flow preset value can be obtained according to the rated parameters of the flow detection member and the experimental results or experience of the staff. The embodiments of the present application do not limit the specific value of the flow preset value. For example, the preset flow preset value can be in the interval of (0, 2) with the unit of liter / minute (L / MIN).

[0067] In some embodiments, the way of calculating the flow set value according to the flow ratio coefficient and the flow preset value can be: multiplying the flow ratio coefficient and the flow preset value, and the product is the flow set value.

[0068] In this way, after step S33 is executed, a flow set value less than or equal to the flow preset value can be obtained. The air inlet flow rate corresponding to the flow set value can adjust the air pressure difference between the inside and outside of the cavity 10 to be close to the pressure difference preset value.

[0069] Step S34: outputting the flow set value to the flow adjustment member 30.

[0070] It can be understood that after the processor 40 obtains the flow set value, the processor 40 can output the flow set value to the flow adjustment member 30, so that the flow adjustment member 30 adjusts the air inlet flow rate of the cavity 10 according to the received flow set value, to adjust the air pressure difference between the inside and outside of the cavity 10, so that the air pressure difference is close to the pressure difference preset value.

[0071] It can be understood that after step S34 is executed, the processor 40 can return to step S31 to obtain the real-time air pressure difference again, and continue to update the flow set value according to the air pressure difference obtained at this time, so that the air pressure difference between the inside and outside of the cavity 10 can be continuously adjusted to be close to the pressure difference preset value.

[0072] When the air pressure in the cavity 10 changes due to the influence of the exhaust device 300, the steps S31 to S34 executed in a cycle can timely adjust the air inlet flow rate of the cavity 10, so as to timely adjust the air pressure difference between the inside and outside of the cavity 10, so that the oxidation annealing process in the cavity 10 can be stably carried out, and the probability that the sheet material has poor oxidation annealing process due to the change of the air pressure in the environment can be reduced.

[0073] It can be understood that when the gas pressure difference is equal to the pressure difference preset value, i.e. the difference is 0, the flow rate set value calculated by the processor 40 can be equal to the current flow rate set value of the flow rate detection member, and the flow rate set value of the flow rate adjusting member 30 is not changed at this time.

[0074] Please refer to FIG. 5, in other embodiments, the gas flow rate adjusting method can include steps S51 to S55. Among them, step S51 is the same as or similar to step S31 shown in FIG. 3, and steps S53 to S55 are the same as or similar to steps S32 to S34 shown in FIG. 3, which will not be repeated here. Compared with FIG. 3, the method in FIG. 5 further includes the following step S52.

[0075] Step S52: Determine whether the gas pressure difference is equal to the pressure difference preset value.

[0076] Among them, in response to the gas pressure difference being equal to the pressure difference preset value, return to step S51 to execute steps S51 to S55 again. In response to the gas pressure difference being not equal to the pressure difference preset value, enter step S53.

[0077] It can be understood that when it is determined that the gas pressure difference is equal to the pressure difference preset value, the flow rate proportion parameter and the flow rate set value can no longer be calculated, the computing power of the processor 40 can be saved, and the execution efficiency of the gas flow rate adjusting method can be improved.

[0078] Please refer to FIG. 6, in some embodiments, the gas flow rate adjusting method can further include the following step S61.

[0079] Step S61: Determine whether the gas pressure inside the cavity 10 is less than the gas pressure outside the cavity 10 by the pressure difference detection member 20.

[0080] Among them, in response to the gas pressure inside the cavity 10 being greater than or equal to the gas pressure outside the cavity 10, return to step S61; in response to the gas pressure inside the cavity 10 being less than the gas pressure outside the cavity 10, execute step S31 or step S51.

[0081] It can be understood that the processor 40 can obtain the gas pressure difference detected by the pressure difference detection member 20, which is the difference between the gas pressure inside the cavity 10 and the gas pressure outside the cavity 10. By determining whether the gas pressure difference is positive or negative, the processor 40 can determine whether the gas pressure inside the cavity 10 is less than the gas pressure outside the cavity 10. When the gas pressure difference is negative, the gas pressure inside the cavity 10 is less than the gas pressure outside the cavity 10; when the gas pressure difference is positive, the gas pressure inside the cavity 10 is greater than the gas pressure outside the cavity 10.

[0082] It is understandable that during the oxidation annealing process, the cavity 10 needs to be supplied with the gas required for the oxidation annealing process. During this process, the pressure difference between the inside and outside of the cavity 10 needs to be maintained within a pressure difference range, such as (-40, +20), where most values ​​are less than 0. Therefore, before the oxidation annealing process, the cavity 10 needs to be evacuated. Once the pressure inside the cavity 10 is lower than the pressure outside, the gas inlet device 200 can then supply gas into the cavity 10 to perform the oxidation annealing process on the sheet material within the cavity 10. When the gas inlet device 200 supplies gas into the cavity 10, steps S31 to S34 in Figure 3, or steps S51 to S55 in Figure 5, can be executed to adjust the pressure difference towards a preset pressure difference value. In this way, before the processor 40 executes S31 and S51 to adjust the pressure difference inside and outside the cavity 10, the pressure difference inside and outside the cavity 10 can be made close to or within the pressure difference range, thereby improving the efficiency of pressure difference adjustment.

[0083] In some embodiments, before step S61 in FIG6 is performed, the gas flow rate regulation method may further include the step of: adjusting the regulation parameters and the flow rate setpoint.

[0084] It is understandable that before performing the oxidation annealing treatment on the sheet material, the reaction device 100 can conduct multiple experiments on the oxidation annealing treatment and adjust the preset adjustment parameters and flow rate settings during the experiments to reduce the situation where the gas pressure difference adjustment efficiency is poor or the gas pressure difference cannot be maintained within the pressure difference range during the oxidation annealing treatment.

[0085] Please refer to Figure 7. In some embodiments, adjusting the parameters and flow rate setpoints may include the following steps S71 to S78:

[0086] Step S71: Obtain the real-time air pressure difference.

[0087] The principle of step S71 is the same as or similar to that of step S31 in Figure 3. For details, please refer to Figure 3 and its related descriptions. It will not be repeated here.

[0088] It is understandable that after each execution of step S71, the processor 40 will sequentially execute steps that are the same as or similar to steps S32 to S34. That is, after each acquisition of real-time air pressure difference, the processor 40 will execute the steps of calculating the flow rate ratio coefficient based on the air pressure difference, the preset value of the pressure difference, and the adjustment parameters; calculating the flow rate setpoint based on the flow rate ratio coefficient and the preset value of the flow rate; and outputting the flow rate setpoint. In this way, after each acquisition of air pressure difference, the processor 40 can cause the flow rate regulator 30 to adjust the airflow rate of the cavity 10 according to the received flow rate setpoint, so as to adjust the air pressure difference inside and outside the cavity 10.

[0089] Step S72: Determine whether in the timing state.

[0090] Wherein, in response to not in the timing state, enter step S73; in response to in the timing state, enter step S75.

[0091] It can be understood that the processor 40 has a timing function, and can start timing in response to a preset trigger condition to enter the timing state.

[0092] Step S73: Determine whether the difference between the pressure difference and the pressure difference preset value is within the first difference interval.

[0093] Wherein, in response to the difference not being within the first difference interval, return to step S71; in response to the difference being within the first difference interval, execute step S74.

[0094] In the embodiments of the present application, the first difference interval is not specifically limited. For example, the first difference interval can be an open interval, and the upper limit and the lower limit of the first difference interval can be 110% of the pressure difference preset value and 90% of the pressure difference preset value, and the larger of the two values is the upper limit and the smaller is the lower limit.

[0095] Step S74: Enter the timing state and return to step S71.

[0096] It can be understood that when the reaction device 100 starts the experiment of the oxidation annealing process, the difference between the pressure difference and the pressure difference preset value is large, so before the pressure difference decreases to enter the first difference interval, the processor 40 will execute steps S71 to S73 multiple times to obtain the real-time pressure difference multiple times, calculate the corresponding flow setting value according to the time sequence, and output the flow setting value to the flow adjusting part 30 multiple times. When the pressure difference decreases to enter the first difference interval, the processor 40 starts to enter the timing state, thereby starting the timing.

[0097] It can be understood that in the case of fixed adjustment parameter and flow preset value, the pressure difference in the pressure difference-time curve will approach the pressure difference preset value as time increases, and when the difference between the pressure difference and the pressure difference preset value is less than 10% of the pressure difference preset value, the pressure difference has been adjusted to approach the pressure difference preset value, at which time the timing can be started, and the convergence and stability of the curve can be determined in the time after the timing starts.

[0098] Step S75: Determine whether the timing duration reaches the preset time.

[0099] Wherein, in response to the timing duration reaching the preset time, enter step S76 and step S77; in response to the timing duration not reaching the preset time, return to step S71.

[0100] Step S76: End the timing state.

[0101] It can be understood that after the end of the timing state, the processor 40 no longer performs timing and clears the time length that has been timed. When the processor 40 performs step S74 again, the processor 40 can start timing from zero again.

[0102] Step S77: Determine whether the plurality of air pressure differences obtained within the preset time meet the stability condition.

[0103] Among them, in response to the plurality of air pressure differences not meeting the stability condition, step S78 is entered. In response to the plurality of air pressure differences meeting the stability condition, the process is ended; at this time, the adjustment parameters and the flow setting value set in the processor 40 can be applied to the processes performed in steps S31 to S34 or steps S51 to S55, so that the adjustment parameters and the flow setting value can no longer be tested and adjusted.

[0104] It can be understood that the preset time can include a first time period and a second time period. The stability condition can include: within the first time period after the start of timing, there is no air pressure difference exceeding the second difference interval in the plurality of air pressure differences; and within the second time period after the first time period, the proportion of air pressure differences exceeding the first difference interval in the plurality of air pressure differences is lower than the preset proportion.

[0105] In the embodiments of the present application, the lengths of the first time period and the second time period are not specifically limited. For example, the length of the first time period and the length of the second time period can both be 10 seconds, and the second time period is located after the first time period, and the length of time elapsed from the start of timing to the end of the second time period is 20 seconds.

[0106] It can be understood that the preset time after the start of timing can include a plurality of periodic time periods, and the processor 40 can cyclically perform step S71 in each periodic time period and continuously obtain real-time air pressure differences and adjust the air pressure difference between the inside and outside of the adjustment cavity 10. The processor 40 can save the plurality of air pressure differences obtained within the preset time after the start of timing, and draw an air pressure difference-time curve according to all the air pressure differences obtained from the start of the experiment of the reaction device 100 to the current time. The processor 40 can output the air pressure difference-time curve to the electronic device 400 for the staff to view, and update the curve after each time the air pressure difference is obtained. In the embodiments of the present application, the length of the periodic time is not specifically limited. For example, the length of the periodic time can be 4 milliseconds.

[0107] It can be understood that the first difference interval is contained in the second difference interval. In the embodiments of the present application, the second difference interval is not specifically limited. For example, the second difference interval can be an open interval, and the upper limit and the lower limit of the second difference interval can be 120% of the pressure difference preset value and 80% of the pressure difference preset value, and the larger of the two values is the upper limit and the smaller of the two values is the lower limit.

[0108] It can be understood that the processor 40 can first determine whether the pressure difference exceeding the second difference interval occurs in the first time period after starting timing. If the pressure difference exceeding the second difference interval occurs, it can be determined that the pressure difference-time curve does not converge, and it can be determined that the plurality of pressures do not satisfy the stable condition.

[0109] If the plurality of pressure differences in the first time period after starting timing are all located in the second difference interval, the processor 40 can determine that the interval of the pressure difference-time converges, and continue to determine whether the plurality of pressure differences obtained in the second time period after the first time period exceed the first difference interval. When the pressure difference exceeding the first difference interval occurs, the processor 40 can count.

[0110] If the number of pressure differences exceeding the first difference interval in the second time period exceeds the preset proportion at the end of the second time period, the processor 40 can determine whether the number of pressure differences exceeding the first difference interval in the second time period exceeds the preset proportion. If not, it can be determined that the pressure difference-time curve is stable, and the plurality of pressure differences satisfy the stable condition. The currently used adjustment parameter and flow set value applied to the gas flow adjustment method can realize the stabilization of the pressure difference in the pressure difference interval in the process of the oxidation annealing treatment. If it exceeds, it can be determined that the pressure difference-time curve converges but is not stable, and the plurality of pressure differences do not satisfy the stable condition.

[0111] In the embodiment of the present application, the preset proportion is not specifically limited. For example, the preset proportion can be 90%.

[0112] It can be understood that the processor 40 can first determine whether the pressure difference-time curve converges in the first time period, and then determine whether the pressure difference-time curve is stable in the second time period. When it is determined that the curve does not converge, it can not be determined whether the curve is stable, and step S78 is entered.

[0113] Step S78: adjusting the adjustment parameter and / or the flow preset value according to the debugging rule.

[0114] It can be understood that the adjustment parameter can be a PID control parameter, and the adjustment parameter can include a proportional parameter, an integral parameter and a differential parameter.

[0115] The debugging rule can include: when the pressure difference exceeding the second difference interval exists in the first time period after starting timing, and the flow proportionality coefficient is the maximum value, the flow preset value is increased; and when the proportion of the pressure difference exceeding the first difference interval is greater than or equal to the preset proportion in the second time period after the first time period, the proportional parameter is reduced and / or the integral parameter is increased.

[0116] It can be understood that, in the process of executing step S77, if the processor 40 determines that the air pressure difference exceeding the second difference interval exists in the first time period, the processor 40 can determine whether the proportional coefficient reaches the maximum (for example, equal to 1) when executing step S78. If the proportional coefficient reaches the maximum, the air flow rate allowed to pass through the flow regulating member 30 and the air inlet flow rate of the cavity 10 at this time can not meet the demand of the oxidation annealing process for oxygen, and therefore the processor 40 can increase the flow preset value to increase the air flow rate allowed to pass through the flow regulating member 30, so as to increase the air inlet flow rate of the cavity 10.

[0117] It can be understood that, in the process of executing step S77, if the processor 40 determines that the air pressure difference exceeding the second difference interval exists in the first time period, the processor 40 can adjust the proportional coefficient and / or the integral parameter when executing step S78. The proportional parameter can be reduced by one unit adjustment value, and / or the integral parameter can be increased by one unit adjustment value.

[0118] For example, when the air pressure difference-time curve converges in the first time period, and is unstable at the time after the first time period, the proportional parameter can be reduced by one unit adjustment value. When the air pressure difference-time curve converges in the first time period, is unstable in the second time period, and is stable at the time after the second time period, the integral parameter can be increased by one unit adjustment value.

[0119] It can be understood that, each time the processor 40 adjusts the adjusting parameter, the corresponding parameter can be increased or decreased by one preset unit adjustment value. The proportional parameter, the integral parameter and the differential parameter can correspond to independent unit adjustment values respectively, and the specific values of the unit adjustment values of the adjusting parameters are not limited in the embodiments of the present application. For example, the unit adjustment value of the proportional parameter is 2, the unit adjustment value of the integral parameter is 20, and the unit adjustment value of the differential parameter is 0.1.

[0120] Similarly, each time the processor 40 adjusts the flow preset value, the flow preset value can be increased or decreased by one corresponding preset unit adjustment value. The unit adjustment value of the flow preset value is not specifically limited in the embodiments of the present application.

[0121] In other embodiments, the debugging rules can also include other rules. In some cases, the processor 40 can adjust the adjusting parameter and / or the flow preset value according to all the debugging rules. In other cases, the processor 40 can adjust the adjusting parameter and / or the flow preset value according to part of the debugging rules, and the worker can operate the electronic device 400 to adjust the adjusting parameter and / or the flow preset value according to the remaining debugging rules.

[0122] It can be understood that after the adjustment of the adjustment parameter and / or the flow preset value is completed, the process of adjusting the adjustment parameter and / or the flow preset value is ended. Then the staff can trigger the reaction device 100 to test again, and the processor 40 can execute steps S71 to S77 again to determine whether the adjusted adjustment parameter and flow preset value can meet the requirements of the oxidation annealing process. If yes, the adjustment is stopped; if not, step S78 is entered again to adjust the adjustment parameter and / or the flow preset value.

[0123] In other embodiments, steps S72 to S78 shown in FIG. 7 can be executed by the staff by operating the electronic device 400.

[0124] It can be understood that the reaction device 100 and the gas flow control method provided by the embodiments of the present application can stabilize the pressure difference between the inside and outside of the cavity 10 within the preset pressure difference interval, so that the pressure difference between the inside and outside of the cavity 10 can be maintained within the fluctuation range of the pressure difference required by the oxidation annealing process, thereby reducing the influence of the fluctuation of the pressure difference between the inside and outside of the cavity 10 on the oxidation annealing process.

[0125] Meanwhile, in the reaction device 100 provided by the embodiments of the present application, the plurality of sheet-shaped materials can be subjected to oxidation annealing treatment under normal pressure (for example, the pressure difference between the inside and outside of the cavity 10 is between -40 Pa and +20 Pa). Compared with the general scheme in the related art in which the plurality of sheet-shaped materials are subjected to oxidation annealing treatment under vacuum low pressure conditions (for example, the pressure difference between the inside and outside of the cavity 10 is equal to or lower than -1000 Pa), the reaction device 100 provided by the embodiments of the present application can save the vacuum pumping process when performing oxidation annealing treatment, thereby improving the efficiency of the oxidation annealing treatment. Meanwhile, the reaction device 100 can omit the dry pump and the butterfly valve used for pumping the cavity 10 in the general scheme, thereby reducing the production cost of the reaction device 100.

[0126] The embodiments of the present application also provide a storage medium. The storage medium can store a computer program. When the reaction device 100 runs the computer program, the reaction device 100 can execute the gas flow adjustment method shown in FIGS. 3 to 7.

[0127] It can be understood that the storage medium provided by the embodiments of the present application has the same or similar beneficial effects as the beneficial effects of the reaction device 100 and the gas flow control method described above, and will not be described here again.

[0128] It will be apparent to those skilled in the art that the application is not limited to the details of the above-exemplified embodiments and that the present application can be implemented in other particular forms without departing from the spirit or essential characteristics of the application. The present embodiments are therefore considered in all respects to be illustrative and not restrictive, the scope of the application being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.

Claims

1. A gas flow rate regulation method, applied to a reaction apparatus, characterized in that, The reaction device includes a cavity, a differential pressure detection element, and a flow rate regulating element. The cavity is connected to the flow rate regulating element and the differential pressure detection element. The differential pressure detection element is used to detect the gas pressure difference inside and outside the cavity. The flow rate regulating element is used to adjust the gas inlet velocity of the cavity according to a set flow rate value. The gas flow rate regulating method includes: Obtain the pressure difference; Calculate the flow rate proportionality coefficient based on the pressure difference, the preset pressure difference value, and the adjustment parameters. The flow rate setting value is calculated based on the flow rate ratio coefficient and the preset flow rate value; The flow rate setpoint is output to the flow rate regulator, and the process returns to the step of obtaining the pressure difference.

2. The gas flow rate regulation method as described in claim 1, characterized in that, The adjustment parameter is a PID control parameter, and the calculation of the flow rate proportional coefficient based on the pressure difference, the preset pressure difference value, and the adjustment parameter includes: Calculate the difference between the pressure difference and the preset pressure difference value; The flow rate ratio coefficient is obtained by calculating the difference and the adjustment parameters using the PID algorithm.

3. The gas flow rate regulation method as described in claim 1, characterized in that, The step of calculating the flow rate setting value based on the flow rate ratio coefficient and the preset flow rate value includes: The flow rate ratio coefficient is multiplied by the flow rate preset value to obtain the flow rate setting value.

4. The gas flow rate regulation method as described in claim 1, characterized in that, Before obtaining the pressure difference, the gas flow rate regulation method further includes: Adjust the adjustment parameters and the flow rate setting value.

5. The gas flow rate regulation method as described in claim 4, characterized in that, The adjustment of the adjustment parameters and the flow rate setting value includes: Obtain the real-time pressure difference; When not in a timing state, and the difference between the pressure difference and the preset pressure difference value is within a first difference range, the timing state is entered. In response to being in the timing state and the timing duration not reaching the preset time, return to the step of obtaining the real-time air pressure difference; In response to being in the timing state and the timing duration reaching the preset time, the timing state ends; In response to multiple pressure differences obtained within the preset time not meeting the stability conditions, the adjustment parameters and / or the preset flow rate value are adjusted according to the debugging rules.

6. The gas flow rate regulation method as described in claim 5, characterized in that, After obtaining the real-time pressure difference, adjusting the adjustment parameters and the flow rate setpoint further includes: When not in a timing state and the difference between the pressure difference and the preset pressure difference value is not within a first difference range, the step of obtaining the real-time pressure difference is returned.

7. The gas flow rate regulation method as described in claim 5, characterized in that, The preset time includes a first time period and a second time period, and the stability conditions include: During the first time period after the start of timing, none of the multiple pressure differences exceed the second difference interval, wherein the first difference interval is included in the second difference interval; and During the second time period following the first time period, the proportion of the pressure differences that exceed the first difference range is lower than a preset ratio.

8. The gas flow rate regulation method as described in claim 7, characterized in that, The adjustment parameters are PID control parameters, including a flow proportional coefficient and an integral parameter. The debugging rules include: When a pressure difference exceeding the second difference range exists within the first time period after the start of timing, and the flow rate proportionality coefficient is at its maximum value, the preset flow rate value is increased; and When the proportion of the air pressure difference exceeding the first difference range is greater than or equal to the preset proportion during the second time period following the first time period, the proportion parameter is reduced and / or the integral parameter is increased.

9. The gas flow rate regulation method as described in claim 1, characterized in that, Before obtaining the pressure difference, the gas flow rate regulation method further includes: The differential pressure detection device is used to determine whether the air pressure inside the cavity is less than the air pressure outside. In response to the air pressure inside the cavity being greater than or equal to the air pressure outside, the process returns to the step of determining whether the air pressure inside the cavity is less than the air pressure outside by means of the differential pressure detection device. In response to the fact that the air pressure inside the cavity is less than the air pressure outside, the step of obtaining the air pressure difference is performed.

10. A reaction apparatus, characterized in that, include: A cavity, one end of which is used to connect to an exhaust device and the other end of which is used to connect to an intake device; A differential pressure detection element is connected to the cavity and is used to detect the pressure difference between the inside and outside of the cavity. A flow regulator is used to connect the cavity and the air intake device, and the flow regulator is used to adjust the air intake speed of the cavity according to the flow setting value; A processor connected to the differential pressure detection element and the flow regulating element, the processor being used to execute the gas flow regulating method as described in any one of claims 1 to 9.

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