Cleaning device and cleaning system

Abstract

A cleaning device and a cleaning system. The cleaning device is used for cleaning the surface of a heating assembly (40), and the cleaning device comprises an insulating housing (10), a first electrode (20), and a second electrode (30). The insulating housing (10) is provided with an accommodating cavity (10a). The first electrode (20) and the second electrode (30) are spaced apart in the accommodating cavity (10a). The first electrode (20) and the second electrode (30) are energized to generate a plasma arc, and the plasma arc is used for cleaning the surface of the heating assembly (40).

Description

A cleaning device and cleaning system

[0001] Cross-reference to related applications

[0002] This application is based on and claims priority to Chinese Patent Application No. 2024116037565, filed on November 11, 2024, the entire contents of which are incorporated herein by reference. Technical Field

[0003] This application relates to the field of aerosol generation device technology, and in particular to a cleaning device and cleaning system. Background Technology

[0004] In related technologies, aerosol generating articles used with aerosol generating devices include an aerosol forming matrix. The heating element of the aerosol generating device employs central heating, with the central heating element inserted into the aerosol generating matrix for heating. When the aerosol forming matrix generates aerosols during heating, non-volatile organic residues from the aerosol forming matrix remain and accumulate on the surface of the heating element. Therefore, the surface of the central heating element needs to be cleaned. Cleaning of the central heating element is mainly achieved through physical scrubbing, however, these methods are ineffective. Physical scrubbing can easily damage the heating element of the heating assembly and is difficult to clean thoroughly, making the cleaning process inconvenient for users. Summary of the Invention

[0005] This application aims to at least partially address one of the technical problems in the related art.

[0006] Therefore, this application provides a cleaning device for cleaning the surface of a heating element, the cleaning device comprising:

[0007] First electrode;

[0008] The second electrode, the first electrode and the second electrode are spaced apart and can generate a plasma arc when both are energized, the plasma arc being used to clean the surface of the heating component.

[0009] In one embodiment, the cleaning device further includes an insulating shell having a receiving cavity, within which the first electrode and the second electrode are disposed.

[0010] In one embodiment, the highest temperature of the plasma arc is greater than or equal to 400°C.

[0011] In one embodiment, the receiving cavity is used so that the heating component can be at least partially contained within the receiving cavity when the cleaning device cleans the heating component.

[0012] In one embodiment, the cross-sectional dimension of at least a portion of the receiving cavity is larger than the cross-sectional dimension of the heating element, so that the cavity wall of the receiving cavity and the heating element are at least partially spaced apart;

[0013] When the cleaning device cleans the heating component, at least a portion of the heating component is located within the space between the first electrode and the second electrode.

[0014] In one embodiment, the first electrode and the second electrode are spaced apart along the extension direction of the receiving cavity.

[0015] In one embodiment, at least one of the first electrode and the second electrode extends circumferentially along the cavity wall of the receiving cavity.

[0016] In one embodiment, the first electrode is located at the top of the receiving cavity, and the second electrode is located on the side wall of the receiving cavity; or, both the first electrode and the second electrode are located on the side wall of the receiving cavity.

[0017] In one embodiment, at least one of the first electrode and the second electrode is a ring electrode.

[0018] In one embodiment, the heating component includes a heating section, and the distance between the first electrode and the second electrode is greater than or equal to 40% of the length of the heating section.

[0019] In one embodiment, the heating component includes a heating section located between the first electrode and the second electrode.

[0020] In one embodiment, the minimum distance between the first electrode and the heating section is greater than or equal to 0.2 mm and less than or equal to 2 mm; and / or,

[0021] The minimum distance between the second electrode and the heating section is greater than or equal to 0.2 mm and less than or equal to 2 mm.

[0022] In one embodiment, both the first electrode and the second electrode extend along the axial direction of the receiving cavity, and are spaced apart along the radial direction of the receiving cavity.

[0023] In one embodiment, the heating component includes a heating section along the extension direction of the receiving cavity, wherein the length of at least one of the first electrode and the second electrode is greater than or equal to 40% of the length of the heating section.

[0024] In one embodiment, the minimum distance between the first electrode and / or the second electrode and the heating component is greater than or equal to 0.2 mm and less than or equal to 3 mm.

[0025] In one embodiment, at least one of the first electrode and the second electrode may be movable along the extension direction of the receiving cavity.

[0026] In one embodiment, the cleaning device further includes a magnetic component disposed between the first electrode and the second electrode to cause the plasma arc to rotate circumferentially along the receiving cavity.

[0027] In one embodiment, the current flowing through the first electrode and the second electrode is direct current.

[0028] In one embodiment, the magnetic component is disposed on the outer peripheral side of the insulating shell and extends circumferentially along the outer wall of the insulating shell; and / or,

[0029] The magnetic assembly includes a plurality of magnetic elements, each of which is disposed on the outer periphery of the insulating shell and arranged circumferentially spaced along the outer wall of the insulating shell; and / or,

[0030] The cleaning device includes a plurality of magnetic components, each of which is disposed on the outer periphery of the insulating shell and spaced apart along the extension direction of the receiving cavity.

[0031] In one embodiment, the cleaning device includes a plurality of electrode pairs formed by the first electrode and the second electrode, wherein the plurality of electrode pairs are arranged alternately and spaced apart circumferentially along the cavity wall of the receiving cavity, and / or, the plurality of electrode pairs are arranged spaced apart along the extension direction of the receiving cavity.

[0032] In one embodiment, the cleaning device further includes a power supply assembly that can provide a high voltage of at least 1000V to the first and second electrodes.

[0033] This application provides a cleaning device for cleaning the surface of a heating element. The cleaning device includes an insulating shell, a first electrode, and a second electrode. The insulating shell has a receiving cavity. The first electrode and the second electrode are spaced apart within the receiving cavity. When the first electrode and the second electrode are energized, a plasma arc is generated, which is used to clean the surface of the heating element. Therefore, on the one hand, the plasma arc can effectively remove dirt formed by atomized substances adhering to the surface of the heating element, improving cleaning efficiency and enhancing the cleaning effect. On the other hand, the plasma arc cleaning method is relatively gentle and will not adversely affect the structure and performance of the heating element, thereby extending the service life of the heating element.

[0034] This application provides a cleaning system, including an aerosol generating device and a cleaning device. The aerosol generating device includes a heating component, and the cleaning device includes a first electrode and a second electrode. The first electrode and the second electrode are spaced apart and can generate a plasma arc when energized. The plasma arc is used to clean the surface of the heating component. Attached Figure Description

[0035] Figure 1 is a schematic diagram of the cleaning device according to the first embodiment of this application;

[0036] Figure 2 is a schematic diagram of the cleaning device according to the second embodiment of this application;

[0037] Figure 3 is a schematic diagram of the cleaning device according to the third embodiment of this application;

[0038] Figure 4 is a cross-sectional view of AA in Figure 3. Detailed Implementation

[0039] In this application, the terms "extension direction," "radial," or "positional relationship" are based on the orientation or positional relationship shown in Figure 1. It should be understood that these orientational terms are only for the convenience of describing this application and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as limiting this application.

[0040] One embodiment of this application provides a cleaning device, as shown in Figures 1, 3 and 4. The cleaning device is used to clean the surface of the heating component 40. The cleaning device includes an insulating shell 10, a first electrode 20 and a second electrode 30.

[0041] The insulating shell 10 has a receiving cavity 10a.

[0042] The first electrode 20 and the second electrode 30 are spaced apart within the receiving cavity 10a. When the first electrode 20 and the second electrode 30 are energized, a plasma arc is generated. The plasma arc is used to clean the surface of the heating element 40. The first electrode 20 and the second electrode 30 generate a plasma arc by passing a high voltage, which is generally above 1KV, and generally above 5KV during the arc initiation stage.

[0043] Specifically, the cleaning device of this application is used to clean the outer surface of the heating component 40.

[0044] For example, the heating element 40 is the heating element 40 of an aerosol generating device. The specific structural form of the heating element 40 is not limited; for example, the heating element 40 is a central heating element.

[0045] The shape of the heating element 40 is not limited. For example, the heating element 40 can be cylindrical or sheet-shaped.

[0046] For ease of description, this application uses the heating element 40 as an example of the heating element 40 of the aerosol generating device.

[0047] The heating element 40 can be a plasma heating element 40, or other types of heating elements 40, such as a resistive heating element or an electromagnetic heating element.

[0048] It should be noted that plasma is a state of matter containing a large number of charged particles and neutral atoms and molecules, and maintaining overall electrical neutrality. Plasma can be generated by the ionization of gas under the influence of an electric field.

[0049] The temperature of the plasma arc varies depending on the specific circumstances. For example, the highest temperature of the plasma arc is greater than or equal to 400°C. Therefore, the plasma arc can better clean the surface of the heating element 40, improving its cleaning effect.

[0050] It should be noted that the cleaning device can be equipped with its own power supply component, which can supply power to the first electrode 20 and the second electrode 30 of the cleaning device.

[0051] For example, the cleaning device also includes a power supply assembly that can provide a high voltage of at least 1000V to the first electrode 20 and the second electrode 30. For example, the high voltage provided by the power supply assembly to the first electrode 20 and the second electrode 30 may be 1000V, 5kV, or 10kV.

[0052] It should be noted that the power supply component is electrically connected to the first electrode 20 and the second electrode 30 respectively to generate a plasma arc. At this time, the voltage at the high-voltage output terminal of the power supply is greater than or equal to 5kV. For example, the voltage at the high-voltage output terminal of the power supply component is 5kV or 10kV. After the plasma arc is formed, the power supply component maintains the voltage at the high-voltage output terminal of the plasma arc at greater than or equal to 1000V.

[0053] In some embodiments, the cleaning device may not have a power supply component, but instead be electrically connected to the power supply component on the aerosol generating device, thereby using the power supply component on the aerosol generating device to supply power to the first electrode 20 and the second electrode 30.

[0054] The type of current passing through the first electrode 20 and the second electrode 30 is not limited.

[0055] For example, the current flowing through the first electrode 20 and the second electrode 30 is direct current.

[0056] For example, the current flowing through the first electrode 20 and the second electrode 30 is alternating current. In this case, the frequency of the alternating current is greater than or equal to 50kHz and less than or equal to 200kHz. For example, the frequency of high-voltage alternating current is 50kHz, 100kHz, 150kHz, or 200kHz.

[0057] The structure of the first electrode 20 and the second electrode 30 is not limited, as long as the first electrode 20 and the second electrode 30 can generate a plasma arc.

[0058] For example, the first electrode can be a ring electrode or an arc-shaped electrode. This can increase the uniformity of the electric field intensity distribution between the electrodes, making plasma generation more stable.

[0059] For example, the second electrode can be a ring electrode or an arc-shaped electrode. This can increase the uniformity of the electric field intensity distribution between the electrodes, making plasma generation more stable.

[0060] The orientation of the first electrode 20 and the second electrode 30 is not limited.

[0061] For example, the first electrode 20 and the second electrode 30 are arranged circumferentially between each other in the receiving cavity 10a.

[0062] For example, the first electrode 20 and the second electrode 30 are spaced apart along the extension direction of the receiving cavity 10a. When the insulating shell 10 is a tube, the cross-section of the receiving cavity 10a is circular, and the extension direction is the axial direction of the tube.

[0063] Specifically, the distance between the first electrode 20 and the second electrode 30 is not limited, as long as the plasma arc generated by the first electrode 20 and the second electrode 30 can clean the heating component 40.

[0064] The positions of the first electrode 20 and the second electrode 30 within the receiving cavity 10a are not limited.

[0065] For example, the first electrode 20 is located at the top of the receiving cavity 10a, and the second electrode 30 is located on the side wall of the receiving cavity 10a.

[0066] For example, the first electrode 20 and the second electrode 30 are both located on the side wall of the receiving cavity 10a.

[0067] The material of the insulating shell 10 is not limited.

[0068] For example, the insulating shell 10 is made of quartz or ceramic. The insulating shell 10 may be a quartz tube with an opening at one end.

[0069] This application provides a cleaning device for cleaning the surface of a heating element 40. The cleaning device includes an insulating shell 10, a first electrode 20, and a second electrode 30. The insulating shell 10 has a receiving cavity 10a. The first electrode 20 and the second electrode 30 are spaced apart within the receiving cavity 10a. When the first electrode 20 and the second electrode 30 are energized, a plasma arc is generated, which is used to clean the surface of the heating element 40. Therefore, on the one hand, the plasma arc can effectively remove dirt formed by aerosol adhesion on the surface of the heating element 40, improving cleaning efficiency and enhancing cleaning effect. On the other hand, the plasma arc cleaning method involves high temperature, resulting in a better cleaning effect.

[0070] In one embodiment, referring to FIG1, the receiving cavity 10a is used to at least partially house the heating component 40 when the cleaning device cleans it. Thus, the plasma arc constrained by the receiving cavity 10a is limited to pass through the outer surface of the heating component 40, thereby achieving a better cleaning effect on the heating component 40.

[0071] Specifically, the statement that the heating element 40 can be at least partially housed in the receiving cavity 10a means that either a portion of the heating element 40 can be housed in the receiving cavity 10a, or the entire heating element 40 can be housed in the receiving cavity 10a.

[0072] In one embodiment, referring to Figure 1, the cross-sectional dimension of at least a portion of the receiving cavity 10a is larger than the cross-sectional dimension of the heating element 40, so that the cavity wall of the receiving cavity 10a and at least a portion of the heating element 40 are spaced apart. The first electrode 20 and the second electrode 30 are disposed on the inner wall of the receiving cavity 10a. When the cleaning device cleans the heating element 40, at least a portion of the heating element 40 is located within the space between the first electrode 20 and the second electrode 30. Thus, on the one hand, the plasma arc randomly travels within the space between the cavity wall of the receiving cavity 10a and the heating element 40, forming arcs at different locations, and the plasma arc is distributed throughout the entire space, thereby making the cleaning of the heating element 40 more comprehensive. On the other hand, since at least a portion of the heating element 40 is located within the space between the first electrode 20 and the second electrode 30, the plasma arc generated by the first electrode 20 and the second electrode 30 has a better cleaning effect on the heating element 40.

[0073] Specifically, the first electrode 20 and the second electrode 30 are respectively connected to a power source. When the voltage is high enough, a high-voltage current is conducted between the first electrode 20 and the second electrode 30, creating a strong electric field in the gap between them. This strong electric field breaks down the air (or other electrically neutral gases, such as nitrogen or argon, filling the gap) in the gap, thereby generating a plasma arc between the first electrode 20 and the second electrode 30. The plasma arc randomly travels within the space between the cavity wall of the housing 10a and the heating element 40, forming arcs at different locations throughout the entire gap. Due to the constraint of the insulating shell 10, the plasma arc is confined to the outer surface of the heating element 40. Furthermore, the arc itself has a high temperature and high energy density, and dirt adhering to the outer surface of the heating element 40 is physically or chemically removed through physical and chemical effects such as arc etching, burning, sputtering, and impact, thus achieving the cleaning of the outer surface of the heating element 40.

[0074] The size of the insulating shell 10 is not limited, as long as the cross-sectional dimension of its receiving cavity 10a is larger than the cross-sectional dimension of the heating element 40.

[0075] Because of the insulating shell 10, the plasma arc can be constrained and confined between the outer surface of the heating element 40 and the cavity wall of the receiving cavity 10a, thereby enabling better cleaning of the outer surface of the heating element 40 and improving safety performance.

[0076] In one embodiment, referring to FIG1, at least one of the first electrode 20 and the second electrode 30 extends circumferentially along the cavity wall of the receiving cavity 10a. This allows the electric arc between the first electrode 20 and the second electrode 30 to make greater contact with the outer surface of the heating element 40, thereby improving cleaning efficiency.

[0077] Specifically, the extension of at least one of the first electrode 20 and the second electrode 30 along the circumferential wall of the receiving cavity 10a means that the first electrode 20 extends along the circumferential wall of the receiving cavity 10a, the second electrode 30 extends along the circumferential wall of the receiving cavity 10a, or both the first electrode 20 and the second electrode 30 extend along the circumferential wall of the receiving cavity 10a.

[0078] It should be noted that the surfaces of the first electrode 20 and the second electrode 30 are not completely smooth. The plasma arc will wander randomly in the circumferential position. That is to say, the plasma arc will be generated in different positions. After a period of time, the wandering trajectory of the plasma arc will cover the outer surface of the heating component 40.

[0079] In one embodiment, referring to FIG1, the heating component 40 includes a heating section 41, and the distance between the first electrode 20 and the second electrode 30 is greater than or equal to 40% of the length of the heating section 41. For example, the distance between the first electrode 20 and the second electrode 30 is 40%, 60%, 70%, 80%, 90%, or 100% of the length of the heating section 41. This allows the plasma arc to have sufficient coverage on the surface of the heating section 41, thereby improving the cleaning effect.

[0080] Specifically, the heating section 41 of the heating component 40 is a region used in conjunction with the aerosol generating article to heat the aerosol generating article.

[0081] Heating section 41 generally refers to the section extending downwards from the top of heating element 40 by a distance greater than or equal to 5mm and less than or equal to 20mm.

[0082] For example, the heating section 41 is located between the first electrode 20 and the second electrode 30, so that the plasma arc can better clean the heating section 41, thereby improving the cleaning effect.

[0083] The distance between the first electrode 20 and the heating section 41 is unlimited.

[0084] For example, the minimum distance between the first electrode 20 and the heating section 41 is greater than or equal to 0.2 mm and less than or equal to 2 mm. For instance, the minimum distance between the first electrode 20 and the heating section 41 is 0.2 mm, 0.5 mm, 1 mm, 1.5 mm, or 2 mm. By controlling the distance within the above range, the plasma arc can effectively remove dirt and impurities from the surface of the heating section 41.

[0085] The distance between the second electrode 30 and the heating section 41 is unlimited.

[0086] For example, the minimum distance between the second electrode 30 and the heating section 41 is greater than or equal to 0.2 mm and less than or equal to 2 mm. For instance, the minimum distance between the second electrode 30 and the heating section 41 is 0.2 mm, 1 mm, 1.5 mm, or 2 mm. By controlling the distance within the above range, the plasma arc can effectively remove dirt and impurities from the surface of the heating section 41.

[0087] In one embodiment, referring to Figures 3 and 4, both the first electrode 20 and the second electrode 30 extend along the axial direction of the receiving cavity 10a and are spaced apart along the radial direction of the receiving cavity 10a. Thus, the axial extension of the first electrode 20 and the second electrode 30 along the receiving cavity 10a achieves coverage of the plasma arc on the heating component 40 along the extension direction of the receiving cavity 10a, improving the cleaning effect. On the other hand, the spaced-apart arrangement of the first electrode 20 and the second electrode 30 along the radial direction of the receiving cavity 10a can reduce the distance between the first electrode 20 and the second electrode 30 to a certain extent, making the electric field between them stronger, reducing the requirement for high voltage, and further improving the cleaning efficiency.

[0088] Specifically, the distance between the first electrode 20 and the heating component 40 is not limited.

[0089] For example, the minimum distance between the first electrode 20 and the heating element 40 is greater than or equal to 0.2 mm and less than or equal to 3 mm. For instance, the distance between the first electrode 20 and the heating element 40 can be 0.2 mm, 0.5 mm, 1 mm, 2 mm, or 3 mm. Controlling the distance between them within the above range allows the arc plasma to effectively clean the outer surface of the heating element 40, thereby enhancing the cleaning effect on the heating element 40.

[0090] The distance between the second electrode 30 and the heating element 40 is not limited.

[0091] For example, the minimum distance between the second electrode 30 and the heating element 40 is greater than or equal to 0.2 mm and less than or equal to 3 mm. For instance, the distance between the second electrode 30 and the heating element 40 can be 0.2 mm, 0.5 mm, 1 mm, 2 mm, or 3 mm. Controlling the distance between them within the above range allows the arc plasma to effectively clean the outer surface of the heating element 40, thereby enhancing the cleaning effect on the heating element 40.

[0092] In one embodiment, referring to Figures 3 and 4, the heating assembly 40 includes a heating section 41 extending along the accommodating cavity 10a, wherein the length of at least one of the first electrode 20 and the second electrode 30 is greater than or equal to 40% of the length of the heating section 41. This allows the plasma arc to have sufficient coverage on the surface of the heating section 41, thereby improving the cleaning effect.

[0093] For example, along the extending direction of the receiving cavity 10a, the length of the first electrode 20 may be greater than or equal to 40% of the length of the heating section 41. For instance, the length of the first electrode 20 may be 40%, 60%, 70%, 80%, 90%, or 100% of the length of the heating section 41.

[0094] For example, along the extending direction of the receiving cavity 10a, the length of the second electrode 30 may be greater than or equal to 40% of the length of the heating section 41. For instance, the length of the second electrode 30 may be 40%, 60%, 70%, 80%, 90%, or 100% of the length of the heating section 41.

[0095] In one embodiment, referring to Figures 1 and 2, at least one of the first electrode and the second electrode 30 is movable along the extending direction of the receiving cavity 10a. This allows for flexible adjustment of the relative positions of the first electrode 20 and the second electrode 30 with the heating element 40, thereby enabling better matching of heating elements 40 of different sizes. This allows the plasma arc to thoroughly clean the surfaces of different heating elements 40, thereby improving the cleaning quality and effect.

[0096] Specifically, the fact that at least one of the first electrode 20 and the second electrode 30 can move along the extension direction of the receiving cavity 10a means that only the first electrode 20 can move along the extension direction of the receiving cavity 10a, only the second electrode 30 can move along the extension direction of the receiving cavity 10a, or both the first electrode 20 and the second electrode 30 can move along the extension direction of the receiving cavity 10a.

[0097] In one embodiment, referring to FIG2, the cleaning device further includes a magnetic component 50 disposed between the first electrode 20 and the second electrode 30, so as to cause the plasma arc to rotate along the inner wall of the receiving cavity 10a. Thus, the magnetic component 50 generates a magnetic field having radial and axial components along the receiving cavity 10a, causing the plasma arc to rotate circumferentially around the inner wall of the receiving cavity 10a under the action of the Ampere force. This allows the cleaning range of the plasma arc to cover the entire outer surface of the heating component 40, thereby improving the cleaning effect.

[0098] Specifically, the structure of the magnetic component 50 is not limited, as long as it can generate a magnetic field that causes the plasma arc to rotate along the inner wall of the receiving cavity 10a.

[0099] For example, magnetic component 50 includes a permanent magnet.

[0100] For example, the magnetic component 50 includes an electromagnetic coil.

[0101] The location of the magnetic component 50 is not limited.

[0102] For example, the magnetic component 50 is disposed on the outer periphery of the insulating shell 10 and extends circumferentially along the outer wall of the insulating shell 10. As a result, a relatively uniform magnetic field environment can be generated around the insulating shell 10, allowing the plasma arc to rotate stably and uniformly around the inner wall of the receiving cavity 10a under the action of the magnetic field, thereby improving the cleaning effect.

[0103] Specifically, the length of the magnetic component 50 extending circumferentially along the outer wall of the insulating shell 10 is unlimited.

[0104] For example, the magnetic component 50 extends in an arc shape along the circumferential direction of the outer wall of the insulating shell 10.

[0105] For example, the magnetic component 50 extends in a ring shape along the circumference of the outer wall of the insulating shell 10.

[0106] It is understood that when the magnetic component 50 includes a ring-shaped permanent magnet, the ring-shaped permanent magnet is disposed on the outer surface of the insulating shell 10, the insulating shell 10 is inserted inside the ring-shaped permanent magnet, and the inner diameter of the ring-shaped permanent magnet is larger than the outer diameter of the insulating shell 10.

[0107] The magnetic component 50 is positioned anywhere between the first electrode 20 and the second electrode 30.

[0108] For example, the magnetic component 50 is positioned at an intermediate location between the first electrode 20 and the second electrode 30.

[0109] For example, the magnetic component 50 is disposed between the first electrode 20 and the second electrode 30 and on the side closer to the first electrode 20.

[0110] For example, the magnetic component 50 is disposed between the first electrode 20 and the second electrode 30 and on the side closer to the second electrode 30.

[0111] In one embodiment, referring to Figure 2, the magnetic component 50 includes multiple magnetic elements, each disposed on the outer periphery of the insulating shell 10 and spaced circumferentially along the outer wall of the insulating shell 10. Therefore, because the multiple magnetic elements are spaced circumferentially along the outer wall of the insulating shell 10, the strength and direction of the magnetic field can be precisely adjusted by changing parameters such as the type, number, and spacing of the magnetic elements. This facilitates the creation of the most suitable magnetic field environment based on factors such as the degree of contamination and surface material of the heating component 40, enabling the plasma arc to clean the heating component 40 with the optimal rotation trajectory and speed, thereby improving the cleaning effect.

[0112] In one embodiment, referring to Figure 2, the cleaning device includes multiple magnetic components 50, each magnetic component 50 being disposed on the outer periphery of the insulating shell 10 and spaced apart along the extension direction of the receiving cavity. Thus, by spaced multiple magnetic components 50 along the extension direction of the receiving cavity, different magnetic field environments can be generated, thereby enabling more precise control of the plasma arc movement. This allows the plasma arc to clean the heating component 40 with a more suitable trajectory and speed according to its different positions and contamination levels, significantly improving the cleaning effect and effectively removing stubborn dirt from the surface of the heating component 40.

[0113] In one embodiment, referring to Figures 3 and 4, the cleaning device includes multiple electrode pairs formed by a first electrode 20 and a second electrode 30, which are arranged alternately and at intervals along the circumferential wall of the receiving cavity 10a. This improves the cleaning effect of the cleaning device on the heating component 40.

[0114] Specifically, the structure of the first electrode 20 is not limited.

[0115] For example, the first electrode 20 is an electrode sheet.

[0116] For example, the first electrode 20 is a strip electrode.

[0117] The structure of the second electrode 30 is not limited.

[0118] For example, the second electrode 30 is an electrode sheet.

[0119] For example, the second electrode 30 is a strip electrode.

[0120] It is understandable that when the first electrode 20 and the second electrode 30 are electrode sheets or strip electrodes, plasma arcs are generated at the edges of the first electrode 20 and the second electrode 30.

[0121] In one embodiment, referring to Figure 3, multiple electrode pairs are arranged along the extension direction of the receiving cavity. This allows the extension direction of the heating element 40 to be subjected to the action of the plasma arc, thereby improving the cleaning effect of the heating element 40.

[0122] In one specific embodiment, the cleaning device includes two first electrodes 20 and two second electrodes 30. The two first electrodes 20 are arranged radially opposite to each other along the insulating shell 10, and the two second electrodes 30 are arranged radially opposite to each other along the insulating shell 10. The line connecting the two first electrodes 20 is perpendicular to the line connecting the two second electrodes 30, and the first electrodes 20 and second electrodes 30 are arranged alternately and spaced apart along the circumferential wall of the receiving cavity 10a. Along the extending direction of the insulating shell 10, the extending length of the first electrodes 20 and the second electrodes 30 is greater than the extending length of the heating element 40.

[0123] In one specific embodiment, the cleaning device further includes a control module, a display screen, and function buttons. The control module includes a power board (including a boost module and an inverter module) and a boost transformer. When the output voltage needs to be DC voltage, it also includes a rectifier module.

[0124] One embodiment of this application also provides a cleaning system, which includes an aerosol generating device and a cleaning device. The aerosol generating device includes a heating element, and the cleaning device includes a first electrode and a second electrode. The first and second electrodes are spaced apart and energized to generate a plasma arc, which is used to clean the surface of the heating element. The cleaning system includes a power supply component that provides a high-voltage output to generate a plasma arc between the first and second electrodes. The power supply component can be the power supply component of the aerosol generating device itself or a power supply component independently provided for the cleaning device. When cleaning the heating element, the cleaning device needs to be used in conjunction with the aerosol generating device to clean the surface of the heating element using the plasma arc generated between the first and second electrodes. After cleaning, the cleaning device can be removed. The cleaning device here can be any of the cleaning devices in the above embodiments.

[0125] In the above embodiments, during the cleaning process, the highest operating temperature of the plasma is greater than or equal to 200°C, for example, 200°C, 250°C, 300°C, or 400°C; preferably greater than or equal to 400°C, for example, 400°C, 450°C, 500°C, or 600°C.

[0126] In the description of this application, the references to terms such as "in one embodiment," "in some embodiments," "in a specific embodiment," or "exemplary," etc., refer to a specific feature, structure, material, or characteristic described in connection with that embodiment or example, which is included in at least one embodiment or example of the embodiments of this application. In this application, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Furthermore, without contradiction, those skilled in the art can combine the different embodiments or examples described in this application, as well as the features of the different embodiments or examples.

[0127] The above description is merely a preferred embodiment of this application and is not intended to limit the application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application are included within the protection scope of this application.

Claims

1. A cleaning device for cleaning the surface of a heating element, the cleaning device comprising: First electrode; The second electrode, the first electrode and the second electrode are spaced apart and can generate a plasma arc when both are energized, the plasma arc being used to clean the surface of the heating component.

2. The cleaning device according to claim 1, further comprising an insulating shell having a receiving cavity, wherein the first electrode and the second electrode are disposed within the receiving cavity.

3. The cleaning device according to claim 2, wherein when the cleaning device cleans the heating component, the highest temperature of the plasma arc is greater than or equal to 400°C.

4. The cleaning device according to claim 2, wherein the receiving cavity is used so that the heating component can be at least partially received within the receiving cavity when the cleaning device cleans the heating component.

5. The cleaning device according to claim 4, wherein the cross-sectional dimension of at least a portion of the receiving cavity is larger than the cross-sectional dimension of the heating component, such that the cavity wall of the receiving cavity and the heating component are at least partially spaced apart; when the cleaning device cleans the heating component, at least a portion of the heating component is located within the space between the first electrode and the second electrode.

6. The cleaning apparatus according to any one of claims 2-5, wherein the first electrode and the second electrode are spaced apart along the extending direction of the receiving cavity.

7. The cleaning apparatus of claim 6, wherein at least one of the first electrode and the second electrode extends circumferentially along the cavity wall of the receiving cavity.

8. The cleaning device according to claim 7, wherein the first electrode is located at the top of the receiving cavity and the second electrode is located on the side wall of the receiving cavity; or, both the first electrode and the second electrode are located on the side wall of the receiving cavity.

9. The cleaning device according to claim 7, wherein at least one of the first electrode and the second electrode is a ring electrode.

10. The cleaning device according to claim 6, wherein the heating component includes a heating section, and the distance between the first electrode and the second electrode is greater than or equal to 40% of the length of the heating section.

11. The cleaning device according to claim 6, wherein the heating component includes a heating section, at least a portion of which is located between the first electrode and the second electrode.

12. The cleaning device according to claim 6, wherein the heating component includes a heating section, the minimum distance between the first electrode and the heating section is greater than or equal to 0.2 mm and less than or equal to 2 mm; and / or, the minimum distance between the second electrode and the heating section is greater than or equal to 0.2 mm and less than or equal to 2 mm.

13. The cleaning device according to any one of claims 2-5, wherein the first electrode and the second electrode both extend along the axial direction of the receiving cavity, and are spaced apart along the radial direction of the receiving cavity.

14. The cleaning device of claim 13, wherein the heating component includes a heating section along the extension direction of the receiving cavity, and the length of at least one of the first electrode and the second electrode is greater than or equal to 40% of the length of the heating section.

15. The cleaning device according to claim 13, wherein the minimum distance between the first electrode and / or the second electrode and the heating component is greater than or equal to 0.2 mm and less than or equal to 3 mm.

16. The cleaning apparatus according to any one of claims 2-5, wherein at least one of the first electrode and the second electrode is movable along the extension direction of the receiving cavity.

17. The cleaning apparatus according to any one of claims 2-12, further comprising a magnetic component disposed between the first electrode and the second electrode to cause the plasma arc to rotate circumferentially along the receiving cavity.

18. The cleaning apparatus according to claim 17, wherein the first electrode and the second electrode are energized with direct current.

19. The cleaning apparatus of claim 17, wherein the magnetic component is disposed on the outer peripheral side of the insulating shell and extends circumferentially along the outer wall of the insulating shell; and / or, The magnetic assembly includes a plurality of magnetic elements, each of which is disposed on the outer periphery of the insulating shell and arranged circumferentially spaced along the outer wall of the insulating shell; and / or, The cleaning device includes a plurality of magnetic components, each of which is disposed on the outer periphery of the insulating shell and spaced apart along the extension direction of the receiving cavity.

20. The cleaning device according to any one of claims 2-5, the cleaning device comprising a plurality of electrode pairs formed by the first electrode and the second electrode, the plurality of electrode pairs being arranged alternately and spaced apart circumferentially along the cavity wall of the receiving cavity, and / or, the plurality of electrode pairs being arranged spaced apart along the extension direction of the receiving cavity.

21. The cleaning apparatus according to any one of claims 2-5, further comprising a power supply assembly capable of providing a high voltage of at least 1000V to the first electrode and the second electrode.

22. A cleaning system comprising an aerosol generating device and a cleaning device, the aerosol generating device including a heating element, and the cleaning device comprising: First electrode; The second electrode, the first electrode and the second electrode are spaced apart and can generate a plasma arc when both are energized, the plasma arc being used to clean the surface of the heating component.

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