Method for creating processing data of photoelectric conversion layer, program, method for processing photoelectric conversion layer, and method for manufacturing photoelectric conversion device

Abstract

Provided is a method for creating processing data of a photoelectric conversion layer for allowing a photoelectric conversion device to display a graphic pattern. The method of the present disclosure is a method for creating processing data of a photoelectric conversion layer for forming a plurality of drawing grooves in the photoelectric conversion layer and displaying a graphic pattern in a predetermined region of the photoelectric conversion layer by means of the plurality of drawing grooves in a plan view. In the method: a first design line pattern representing a first gradation and a second design line pattern representing a second gradation darker than the first gradation are formed; a first region and a second region divided by a contour of a target graphic pattern are determined; the first design line pattern is disposed in the first region and the second design line pattern is disposed in the second region; and position information of the design lines disposed in the first region and the second region is recorded.

Description

Method for Creating Processing Data of Photoelectric Conversion Layer, Program, Method for Processing Photoelectric Conversion Layer, and Method for Manufacturing Photoelectric Conversion Device

[0001] The present disclosure relates to a method for creating processing data of a photoelectric conversion layer, a program, a method for processing the photoelectric conversion layer, and a method for manufacturing a photoelectric conversion device.

[0002] Photoelectric conversion devices applicable to building materials for housing, vehicles, etc. are known. In addition to power generation performance, designability may be required for photoelectric conversion devices. For example, Patent Document 1 discloses a photoelectric conversion device (thin-film solar cell module) having colored characters, symbols, patterns, etc. when viewed from the light-receiving surface side.

[0003] Japanese Patent Application Laid-Open No. 2002-343998

[0004] However, in the photoelectric conversion device of Patent Document 1, although characters, symbols, etc. are displayed, it may be difficult to display complex patterns such as paintings. Therefore, it is required to be applicable regardless of the type and complexity of the pattern and to make it easier to process the photoelectric conversion layer for displaying the pattern.

[0005] An object of the present disclosure is to solve the above problems and to provide a method for creating processing data of a photoelectric conversion layer for displaying a pattern on the photoelectric conversion layer.

[0006] The method of the present disclosure is a method for creating processing data of the photoelectric conversion layer for displaying a pattern by forming a plurality of drawing grooves penetrating in the thickness direction in the photoelectric conversion layer and displaying the pattern by the plurality of drawing grooves in a predetermined region in the photoelectric conversion layer in a plan view along the thickness direction. The method forms a first design line pattern representing a first gradation and a second design line pattern representing a second gradation darker than the first gradation, determines a first region and a second region divided by the contour of the target pattern, arranges the first design line pattern in the first region and the second design line pattern in the second region, and records the position information of the design lines arranged in the first region and the second region.

[0007] According to this disclosure, a method for creating processing data for a photoelectric conversion layer to display a pattern on the photoelectric conversion layer can be provided.

[0008] This is a schematic top view showing an example of a photoelectric conversion device according to the first embodiment. This is a schematic end view along the IIA-IIA line shown in Figure 1. This is a schematic end view along the IIB-IIB line shown in Figure 1. This is a schematic enlarged top view showing a part of area A of the pattern display area DR shown in Figure 1. This is a schematic end view along the IVA-IVA line shown in Figure 3. This is a schematic end view along the IVB-IVB line shown in Figure 3. This is a schematic end view along the IVC-IVC line shown in Figure 3. This is a schematic top view illustrating a part of the display pattern shown in the pattern display area DR in the first embodiment. This is a schematic top view showing a further enlarged part of the area shown in Figure 5. This is a schematic top view showing an example of a display pattern. This is a schematic top view showing another example of a display pattern. This is a schematic process end view showing a method for manufacturing the photoelectric conversion device 100. This is a schematic process end view showing a method for manufacturing the photoelectric conversion device 100. This is a schematic process end view showing the manufacturing method of the photoelectric converter 100. This is a schematic process end view showing the manufacturing method of the photoelectric converter 100. This is a schematic process end view showing the manufacturing method of the photoelectric converter 100. This is a schematic process end view showing the manufacturing method of the photoelectric converter 100. This is a schematic process end view showing the manufacturing method of the photoelectric converter 100. This is a schematic process end view showing the manufacturing method of the photoelectric converter 100. This is a schematic process end view showing the manufacturing method of the photoelectric converter 100. This is a flowchart showing an example of a method for creating drawing data. This is a flowchart showing an example of a design line pattern formation process. This is a diagram showing an example of a basic unit. This is a schematic diagram showing an example of a first design line pattern. This is a schematic diagram showing an example of a second design line pattern. This is a schematic diagram showing a design line pattern of modified example 1. This is a schematic diagram showing a design line pattern of modified example 2. This is a diagram showing an example of a target pattern 400T. This is a schematic diagram showing the process of arranging design lines on a target pattern. This is a schematic diagram showing the process of arranging design lines on a target pattern. This is a schematic diagram showing the process of arranging design lines onto a target pattern. This is a schematic diagram showing the process of arranging design lines onto a target pattern. This is a schematic diagram showing the first pattern used for arranging common design lines. This is a schematic diagram showing the second pattern used for arranging dedicated design lines. This is a schematic diagram showing the patterns used for arranging common and dedicated design lines.This is a schematic diagram showing another example of the process of arranging design lines on a target pattern. This is a schematic diagram showing another example of the process of arranging design lines on a target pattern. This is a schematic diagram showing the method of creating drawing data for Example 1. This is a schematic diagram showing the method of creating drawing data for Example 1, and shows an example of a design line pattern. This is a schematic diagram showing another example of a design line pattern for Example 1. This is a schematic diagram showing another example of a display pattern for Example 1. This is a schematic diagram showing an example of a design line pattern for Example 2. This is a schematic diagram showing an example of a display pattern for Example 2. This is a schematic top view illustrating a part of the display pattern shown in the pattern display area DR in the second embodiment. This is a diagram showing an example of a basic unit. This is a schematic diagram showing an example of a first design line pattern. This is a schematic diagram showing an example of a second design line pattern. This is a schematic diagram showing a design line pattern for Modified Example 3. This is a schematic diagram showing a design line pattern for Modified Example 4. This is a diagram showing an example of a design line pattern for Example 3. This is a schematic diagram showing an example of a display pattern for Example 3. This is a diagram showing another example of a design line pattern for Example 3. This is a schematic diagram showing another example of the display pattern in Example 3. This is a diagram showing an example of the design line pattern in Example 4. This is a schematic diagram showing an example of the display pattern in Example 4.

[0009] Embodiments of this disclosure will be described below with reference to the drawings. However, this disclosure is not limited by these embodiments. Furthermore, substantially identical components are denoted by the same reference numerals in the drawings, and redundant descriptions have been omitted where appropriate. For illustrative purposes, the dimensions of elements in the drawings may be exaggerated and are not necessarily to scale.

[0010] Furthermore, for the sake of clarity, the following terms will be used to indicate directions such as "up," "down," "right," "left," and "side," assuming the conditions of normal use. However, this does not mean that the usage conditions of the photoelectric converter related to this disclosure are limited.

[0011] In the diagrams described below, the mutually orthogonal X, Y, and Z axes are schematically shown for reference. In the following description, when simply referred to as the X direction, Y direction, or Z direction, it refers to the respective axis direction, including the two opposite directions (e.g., the -X direction and the +X direction).

[0012] 《First Embodiment》 Hereinafter, an example of a photoelectric conversion device according to an embodiment of the present disclosure will be described with reference to the drawings. In the photoelectric conversion device of this embodiment, the power generation unit including the photoelectric conversion layer has a pattern display area on which patterns such as pictures and characters are displayed. The patterns are formed using the photoelectric conversion layer and are visible from the light-receiving surface side and / or the opposite side (back side) of the light-receiving surface of the photoelectric conversion device.

[0013] (Basic Configuration of the Photoelectric Converter) The basic configuration of the photoelectric converter of this embodiment will be explained with reference to Figures 1 to 2B. Figure 1 is a schematic top view showing an example of the photoelectric converter of this embodiment. Figure 2A is a schematic end view along the line IIA-IIA shown in Figure 1. Figure 2B is a schematic end view along the line IIB-IIB shown in Figure 1.

[0014] The photoelectric conversion device 100 shown in Figures 1 to 2B is a photoelectric conversion module. The photoelectric conversion device 100 can be applied to building materials such as windows, roofs, and exterior walls of buildings. Here, a photoelectric conversion module is used as an example, but in this specification, a "photoelectric conversion device" may be any device that includes a power generation unit comprising a photoelectric conversion layer and a pair of electrodes, and may be a photoelectric conversion element with a power generation unit formed on a substrate, or a photoelectric conversion module having a structure in which the photoelectric conversion element (power generation unit) is sealed.

[0015] As shown in Figures 1 to 2B, the photoelectric conversion device 100 comprises a first substrate 1 and a second substrate 2, a power generation unit 3 including a photoelectric conversion layer, a pair of extraction electrodes 4A and 4B electrically connected to the power generation unit 3, a sealing member 6, and a filler material 7. In Figure 1, the filler material 7 and the second substrate 2 are not shown.

[0016] In this specification, the direction corresponding to the thickness direction of the photoelectric conversion layer is referred to as the "Z direction." The Z direction is the stacking direction of the laminate, which includes the electrodes and photoelectric conversion layer constituting the power generation unit 3. "Plan view" refers to a plan view taken from the Z direction. Furthermore, within a plane perpendicular to the Z direction, mutually orthogonal directions are referred to as the X direction and the Y direction. Here, the directions parallel to two adjacent sides on the rectangular main surface of the first substrate 1 are referred to as the X direction and the Y direction, respectively. Note that the shapes of these substrates are not limited to the examples shown.

[0017] As shown in Figures 2A and 2B, the first substrate 1 and the second substrate 2 face each other in the Z direction, with the power generation unit 3 in between. The peripheral edges of the first substrate 1 and the second substrate 2 are sealed from the outside by a sealing member 6. In this example, the first substrate 1 and the second substrate 2 are arranged so that the main surface 1a of the first substrate 1 and the main surface 2a of the second substrate 2 face each other. The photoelectric converter 100 is, for example, a double-sided light-receiving module that receives light from the back surface 1b (sometimes called the "light-receiving surface") opposite to the main surface 1a of the first substrate 1. The photoelectric converter 100 may also be a single-sided light-receiving module.

[0018] The main surface 1a of the first substrate 1 and the main surface 2a of the second substrate 2, together with the sealing member 6, define a sealing space in which the power generation unit 3 is located. A light-transmitting filler 7 may be placed between the power generation unit 3 and the second substrate 2.

[0019] The first substrate 1 and the second substrate 2 are, for example, glass substrates or resin substrates. The first substrate 1 is translucent. This allows power generation to be performed using light incident on the power generation unit 3 from the first substrate 1 side. The second substrate 2 may also be translucent. In this embodiment, both the first substrate 1 and the second substrate 2 are translucent. This allows the pattern formed on the power generation unit 3 to be visible from both the first substrate 1 side and the second substrate 2 side, as will be described later. In this specification, "translucency" means transmittance to visible light. "Having translucency" means, for example, that the transmittance of visible light is 50% or more, preferably 70% or more.

[0020] The power generation unit 3 is located on the main surface 1a of the first substrate 1. As shown in Figure 1, the power generation unit 3 may be located across substantially the entire main surface 1a.

[0021] As shown in Figures 2A and 2B, the power generation unit 3 comprises a laminate (hereinafter referred to as the "power generation layer") 30 including a lower electrode layer 31 and an upper electrode layer 33, and a photoelectric conversion layer 32 located between the lower electrode layer 31 and the upper electrode layer 33 in the Z direction.

[0022] The lower electrode layer 31 is located between the photoelectric conversion layer 32 and the first substrate 1. The lower electrode layer 31 is translucent. The upper electrode layer 33 may also be translucent. In this embodiment, both the lower electrode layer 31 and the upper electrode layer 33 are translucent transparent conductive layers. The transparent conductive layer may be a metal oxide layer such as indium tin oxide (ITO) or indium zinc oxide (IZO), or a fluorine-doped tin oxide (FTO) layer.

[0023] The photoelectric conversion layer 32 is an opaque layer that is not transparent to light. "Not transparent to light" means that the transmittance of visible light is lower than that of the lower electrode layer 31, for example, less than 20%, preferably less than 10%.

[0024] The photoelectric conversion layer 32 is, for example, a perovskite layer containing a perovskite compound (perovskite semiconductor) as a photoelectric conversion material. The perovskite compound is a perovskite crystal structure represented by the chemical formula ABX3 and a structure having a similar crystal. A is a monovalent cation, B is a divalent cation, and X is a halogen anion.

[0025] The power generation layer 30 may further include an electron transport layer and / or a hole transport layer, as needed. In the example shown in Figures 2A and 2B, the power generation layer 30 further includes an electron transport layer (n-type semiconductor layer) 34 on the first substrate 1 side of the photoelectric conversion layer (i-type semiconductor layer) 32, and a hole transport layer (p-type semiconductor layer) 35 on the second substrate 2 side. The power generation layer 30 may also include layers other than those described above. For example, a molybdenum oxide layer may be placed between the p-type semiconductor layer and the upper electrode layer. The stacking order in the power generation layer 30 is not limited to the example shown, and the p-type semiconductor layer, i-type semiconductor layer, and n-type semiconductor layer may be arranged in this order from the first substrate 1 side.

[0026] The power generation unit 3 includes at least one solar cell 8. In the example shown in Figure 1, multiple solar cells 8 are arranged in the X direction on the main surface 1a. Two adjacent solar cells 8 are connected in series.

[0027] Extraction electrodes 4A and 4B are electrodes with lower resistivity (electrical resistivity) than, for example, the electrodes used in the power generation unit 3. In the illustrated example, extraction electrodes 4A and 4B are located at the +X side and -X side edges of the main surface 1a of the first substrate 1. Extraction electrode 4A is electrically connected to the solar cell 8 located on the leftmost side (-X side) of the power generation unit 3. Extraction electrode 4B is electrically connected to the solar cell 8 located on the rightmost side (+X side) of the power generation unit 3.

[0028] In the power generation unit 3, the current flows from one side of the extraction electrodes 4A and 4B to the other, generally along the X direction. Each of the extraction electrodes 4A and 4B may extend from the sealing space, through the sealing member 6, and to the outside of the sealing member 6.

[0029] Referring to Figure 2A, an example of the configuration of the solar cell 8 will be described. The lower electrode layer 31 is separated into a plurality of lower electrodes LE by separation grooves 81. The n-type semiconductor layer 34, photoelectric conversion layer 32, p-type semiconductor layer 35, and upper electrode layer 33 are separated into a plurality of parts by separation grooves 82. In this example, the photoelectric conversion layer 32 is separated into a plurality of photoelectric conversion parts PV by separation grooves 82, and the upper electrode layer 33 is separated into a plurality of upper electrodes UE. Separation grooves 81 and 82 are grooves that extend in a direction (for example, the Y direction) intersecting the direction of current flow (X direction).

[0030] Each of the solar cells 8 comprises a lower electrode LE and an upper electrode UE facing each other in the Z direction, and a photoelectric conversion unit PV located between these electrodes. In two adjacent solar cells 8, the upper electrode UE of one solar cell is electrically connected to the lower electrode LE of the other solar cell, for example, within a hole 83 that penetrates the n-type semiconductor layer 34, the photoelectric conversion layer 32, and the p-type semiconductor layer 35. In this way, a plurality of solar cells 8 constituting the power generation unit 3 are connected in series.

[0031] As shown in Figure 1, the power generation unit 3 has a pattern display area DR on which a pattern is displayed in a plan view (a plan view from the Z direction). In this example, the pattern display area DR is located only in a part of the power generation unit 3 in a plan view, but it may be located across the entire surface of the power generation unit 3. In the following description, the pattern prepared or created at the design stage and intended to be displayed may be referred to as the "target pattern," and the pattern displayed in the pattern display area DR in the photoelectric converter after manufacturing may be referred to as the "display pattern" to distinguish them.

[0032] (Pattern display area DR) The structure of the pattern display area in this embodiment will be described below with reference to the drawings. Figure 3 is a schematic enlarged top view showing a part of area A of the pattern display area DR shown in Figure 1. Figure 4A is a schematic end view along the IVA-IVA line shown in Figure 3. Figure 4B is a schematic end view along the IVB-IVB line shown in Figure 3. Figure 4C is a schematic end view along the IVC-IVC line shown in Figure 3. The second substrate 2 and the filler material 7 are not shown in Figures 4A to 4C.

[0033] As shown in Figures 3 to 4B, the pattern display area DR of the power generation unit 3 is provided with a plurality of drawing grooves 5 that penetrate the photoelectric conversion layer 32 in the thickness direction (Z direction). The drawing grooves 5 are grooves used for drawing patterns such as characters, pictures, and designs.

[0034] As shown in Figure 3, each drawing groove 5 has two ends (sometimes called the "first end" and the "second end") 51 and 52 in a plan view, and extends linearly along the X direction between the two ends 51 and 52. Multiple drawing grooves 5 are arranged at intervals in the Y direction.

[0035] In this embodiment, the multiple drawing grooves 5 include two or more grooves with different lengths in the X direction. For example, at least some of the drawing grooves 5 have both ends 51, 52 inside the photoelectric conversion layer 32 in a plan view, and are openings located inside the photoelectric conversion layer 32 in a plan view. The multiple drawing grooves 5 may also include grooves that have only one end inside the photoelectric conversion layer 32 in a plan view, or grooves that extend in the X direction so as to cross the photoelectric conversion layer 32. When the drawing groove completely crosses the photoelectric conversion layer in a plan view, the "end of the drawing groove" refers to an opening located on the outer surface of the photoelectric conversion layer on the +X side or -X side.

[0036] In this embodiment, the drawing groove 5 extends substantially parallel to the direction (X direction) in which the current flows in the power generation unit 3. The "direction in which the current flows" is, in a plan view, the direction in which the current flows, for example, between the extraction electrodes, and in this case, the direction in which it flows between the series-connected solar cells 8. Note that the direction in which the drawing groove 5 extends is not limited to the X direction.

[0037] In addition to the drawing grooves 5, the pattern display area DR may also have separation grooves 82 for separating two adjacent solar cells 8. In this case, the drawing grooves 5 may intersect with the separation grooves 82 between adjacent solar cells 8. For example, some of the drawing grooves 5 may extend across multiple solar cells 8.

[0038] The pattern display area DR contains multiple areas r1 and r2 with different area ratios of the drawing grooves 5. A virtual line L1 located at the boundary between the multiple areas r1 and r2 is perceived as the outline of the pattern, thereby representing the pattern. In this specification, the virtual line L1 perceived as the outline of the pattern is called the "boundary." To make the explanation easier to understand, in the drawings, a portion of the virtual boundary may be shown as a solid line.

[0039] The display pattern shown in Figure 3 includes a first region r1 and a second region r2 in which the area ratio of the drawing groove 5 is smaller than that of the first region r1. In Figure 3, the virtual boundary (hereinafter referred to as the "first boundary") L1 between the first region r1 and the second region r2 is shown by a solid line. The first boundary L1 may include straight sections, curved sections, or both. By freely extending the first boundary L1 in any direction, for example, in a direction intersecting the X or Y direction, a desired pattern can be displayed.

[0040] The drawing groove 5 includes a common groove 5a that extends from the first region r1 across the first boundary L1 to the second region r2, and a dedicated groove 5b that extends from the first region r1 to the first boundary L1 and has one end 51 at the first boundary L1. The common groove 5a and the dedicated groove 5b are located in the first region r1. The common groove 5a is located in the second region r2, but the dedicated groove 5b is not. Therefore, the area ratio of the drawing groove 5 is higher in the first region r1 due to the absence of the dedicated groove 5b. The first boundary L1 can be visually recognized as the outline of a design because the ends 51 of the dedicated groove 5b are arranged at a distance from each other.

[0041] The drawing groove 5 is formed, for example, to penetrate the upper electrode layer 33 and the photoelectric conversion layer 32, exposing the lower electrode layer 31. In the example shown in Figures 4B and 4C, the drawing groove 5 is defined by a bottom surface 53, inner surfaces 5s1 and 5s2 that face each other and extend in the X direction, an inner end surface 5t1 located between the inner surfaces 5s1 and 5s2 at one end 51, and an inner end surface 5t2 located between the inner surfaces 5s1 and 5s2 at the other end 52. The bottom surface 53 exposes the lower electrode layer 31 and the main surface 1a of the first substrate 1 located below the separation groove 81. The photoelectric conversion layer 32 is exposed on the inner surfaces 5s1 and 5s2 and the inner end surfaces 5t1 and 5t2.

[0042] The drawing groove 5 may be a groove that penetrates the photoelectric conversion layer 32 in the power generation layer 30. On the bottom surface 53, the surface portion of the lower electrode layer 31 may also be removed, or the lower electrode layer 31 may be removed over the thickness direction, and the first substrate 1 may be exposed on the bottom surface 53. Alternatively, when the layer (for example, the n-type semiconductor layer 34) between the lower electrode layer 31 and the photoelectric conversion layer 32 has light transmissivity, that layer may be exposed on the bottom surface 53 of the drawing groove 5.

[0043] As shown in FIG. 4C, in a plan view, the region 37 overlapping each drawing groove 5 does not have the photoelectric conversion layer 32, and thus is a non-power generation region that does not contribute to power generation. In the present embodiment, since this region 37 is composed only of members having light transmissivity (the first substrate 1, the second substrate 2, and the lower electrode layer 31), it is a light transmissive region that transmits visible light in the Z direction. On the other hand, the region 38 located between the drawing grooves 5 in a plan view is a power generation region that contributes to power generation. Since this region 38 includes the non-light transmissive photoelectric conversion layer 32, it is a non-light transmissive region that is less likely to transmit visible light than the region 37 overlapping the drawing groove 5.

[0044] Therefore, in a plan view, the transmittance of visible light in the region can be changed according to the ratio (area ratio) of the area of the drawing groove 5 in each region r1, r2 of the power generation unit 3. The "area of the drawing groove 5" is the opening area of the photoelectric conversion layer 32 formed by the drawing groove 5, and when the side surface of the drawing groove 5 is tapered, it corresponds to the area of the bottom surface 53 of the drawing groove 5. In this specification, the area ratio of the drawing groove 5 may be simply referred to as the "opening ratio".

[0045] In the present embodiment, the widths w1 of the plurality of drawing grooves 5 are designed to be equal, and the opening ratio is changed by varying the arrangement pitch of the drawing grooves 5 in each region r1, r2. Specifically, in the first region r1, the arrangement pitch of the drawing grooves 5 is smaller than that in the second region r2, and the drawing grooves 5 are arranged more densely. Therefore, the opening ratio of the first region r1 is larger than that of the second region r2.

[0046] When looking at the symbol display area DR along the Z direction, since the aperture ratio of the first area r1 is larger than that of the second area r1 and it is easier to transmit visible light, it is brighter than the second area r2. Also, the first area r1 and the second area r2 in which the drawing groove 5 is formed are brighter than the area where the drawing groove 5 is not formed (the area with an aperture ratio of substantially 0%). Thus, since the gradation (brightness) of each area r1, r2 can be made different by the difference in the aperture ratio, gradation expression becomes possible.

[0047] Since the separation grooves 82 between the solar cells 8 are arranged substantially uniformly over the entire surface of the power generation unit 3 including the symbol display area DR, it is difficult to affect the symbol (change in gradation).

[0048] In this embodiment, the width w1 (FIG. 4C) of the drawing groove 5 in the Y direction is larger than, for example, the width ws (FIG. 4A) of the separation groove 82 in the X direction. The width w1 of the drawing groove 5 may be, for example, twice or more the width ws of the separation groove 82. As an example, the width w1 of the drawing groove 5 is 200 μm and the width of the separation groove 82 is 80 μm. By making the width w1 of the drawing groove 5 larger than the width of the separation groove 82, the influence of the separation groove 82 on the symbol (change in gradation) can be suppressed and the symbol can be made easier to visually recognize.

[0049] <Specific Example of Symbol>FIG. 5 is a top view illustrating a part of the display symbol in the symbol display area DR, and also shows enlarged views of each area of the display symbol.

[0050] As shown in FIG. 5, in the symbol display area DR, a display symbol 200 of a character is formed by a plurality of drawing grooves 5 including a common groove 5a and a dedicated groove 5b. The character is an excerpt of the face part of "Panasonic's shopkeeper". However, the form of the forelock and the corners of the mouth are changed.

[0051] The symbol display area DR has, in a plan view, a first area r1 in which the drawing grooves 5 are arranged at an array pitch p1, a second area r2 in which the drawing grooves 5 are arranged at an array pitch p2 larger than the array pitch p1, and a third area r3 in which the drawing grooves 5 are not formed. In this example, the face of the character (parts excluding the eyes, nose, and mouth) is in the first area r1, the mouth and the forelock are in the second area r2, and the eyes and the nose are in the third area r3.

[0052] As shown in Figure 5, in the first region r1, drawing grooves 5 with a width w1 are arranged in the Y direction with a distance v1 between them. The drawing grooves 5 include a plurality of common grooves 5a and two dedicated grooves 5b placed between two adjacent common grooves 5a. If the width w1 is 1, the distance v1 between grooves is 4, and the arrangement pitch p1 of the drawing grooves 5 in the Y direction is 5. The opening ratio of the first region r1 is 20%.

[0053] In the second region r2, drawing grooves 5 with width w1 are arranged in the Y direction with a distance v2 between them. All of the drawing grooves 5 are common grooves 5a, and are located in the same position in the Y direction as the common grooves 5a in the first region r1. Therefore, at the first boundary L1 between the first region r1 and the second region r2, the common grooves 5a of the first region r1 and the second region r2 are connected to each other to form a single groove. If the width w1 is 1, the distance v2 is 14, and the arrangement pitch p2 of the drawing grooves 5 in the Y direction is 15. The opening ratio of the second region r2 is 6.7%.

[0054] Since no drawing groove 5 is formed in the third region r3, the opening ratio is 0%.

[0055] Therefore, by changing the aperture ratio, the brightness (transmittance of visible light) levels of the first region r1, the second region r2, and the third region r3 can be made different. In this example, the pattern can be represented in three shades: the first region r1 having a first brightness (white), the second region r2 having a second brightness (intermediate color) that is darker than the first brightness, and the third region r3 having a third brightness (black) that is darker than the second brightness.

[0056] Table 1 shows the aperture ratio, array pitch, and gradation of each region. In this specification, if the number of gradations is N, the brightness of each region is represented by gradation g (where g is an integer from 0 to (N-1)). For example, the value of g for the darkest region (e.g., a region where no drawing grooves are formed) is set to 0 (zero), the value of g for the brightest region is set to N-1, and the value of g increases as the brightness level increases. The value of g indicates the relative brightness with respect to other regions.

[0057]

[0058] Thus, the pattern (display pattern) 200 shown in Figure 5 can be formed by combining multiple regions r1 to r3 with different gradations.

[0059] In a planar view, the first region r1 (e.g., face) and the second region r2 (e.g., mouth) are arranged adjacent to each other. The first boundary L1 between the first region r1 and the second region r2 is a virtual line corresponding to the contour of the mouth. The first boundary L1 includes a portion that extends in a direction intersecting the X direction. This makes it possible to create different gradations along the X direction.

[0060] The third region r3 may be located adjacent to the first region r1 or the second region r2 in a plan view. For example, the third region r3 may be surrounded by the first region r1 or the second region r2 in a plan view.

[0061] In Figure 5, for example, the third region r3 (e.g., the eye) is an island-like region surrounded by the first region r1 (e.g., the face) (i.e., located inside the first region r1). The second boundary L2 between the first region r1 and the third region r3 is a virtual line corresponding to the outline of the eye. Of the drawing grooves 5, the groove that extends from the first region r1 to the second boundary L2 (e.g., groove 5c) has one end 52c at the second boundary L2. The second boundary L2 can be seen as an outline line because the ends of the drawing grooves 5 are arranged at a distance from each other.

[0062] The multiple drawing grooves 5 arranged in the first region r1 include a pair of drawing grooves 5c and 5d, respectively, located on both sides of the third region r3 in the X direction. The positions of the drawing grooves 5c and 5d in the Y direction are approximately equal. The drawing grooves 5c and 5d have ends 52c and 52d, respectively, at positions in the second boundary L2 that are opposite each other in the X direction. With this configuration, one groove appears to extend in the X direction, jumping over the third region r3, making it easier to visually recognize the second boundary L2 of the third region r3 as the outline of the pattern.

[0063] In Figure 5, in the first region r1, the drawing grooves 5 (including the common groove 5a and the dedicated groove 5b) are arranged at regular intervals, but they do not have to be arranged at regular intervals. For example, in the first region r1 and the second region r2, the drawing grooves 5 only need to be arranged periodically along the Y direction. "Periodic arrangement" includes not only cases where the drawing grooves 5 are arranged at equal intervals in the Y direction, but also cases where the same arrangement pattern is repeated. In the first region r1, if the same arrangement pattern is repeated, the arrangement pitch p1 refers to the average arrangement pitch of the drawing grooves 5 in that arrangement pattern. The same applies to the second region r2, where the arrangement pitch p2 refers to the average arrangement pitch.

[0064] Each drawing groove 5 may be formed by scanning the laser once (aperture width: w1). Alternatively, one drawing groove 5 may be formed by n scans (n ​​is an integer of 2 or more) (aperture width: for example, w1 / n). In this case, the groove formed by one scan is called a "sub-groove". The n sub-grooves are connected to each other in the Y direction to constitute one drawing groove 5. When the drawing groove 5 is in contact with the first boundary L1 or the second boundary L2, the position of the end of each sub-groove in the X direction may be set so that the shape of the boundary becomes closer to the contour of the target pattern.

[0065] In this embodiment, when the outline of the target pattern (for example, the outline of an eye) is circular, instead of forming a groove that extends in a ring shape along the outline, the outline is represented by making the opening ratio of the drawing groove 5 different inside the circle and around the circle. For this reason, upon closer examination, the outline of the target pattern and the boundary L1 of the areas r1 and r2 that are actually perceived as outlines may not perfectly coincide. However, as will be explained below, by utilizing the position of the end of the sub-groove, it is possible to form a boundary that is closer to the outline of the target figure.

[0066] Figure 6 is a top view that further enlarges a portion of the area shown in Figure 5. Figure 6 shows the area including the second boundary L2 between the third area r3, which is the eye, and the first area r1, which is the face. The second boundary L2 corresponds to the outline of the eye. In the target design, the outline of the eye is curved (for example, circular).

[0067] As shown in Figure 6, the two drawing grooves 5e and 5f adjacent to the second boundary L2 are each composed of five sub-grooves 50 formed by five laser scans.

[0068] The drawing groove 5e has an end portion 52 located at the second boundary L2. The drawing groove 5e is composed of five openings 501 to 505 (shown as solid lines for clarity) extending in the X direction. In this example, each of the openings 501 to 505 is a single sub-groove 50. At the end portion 52, the positions of the opening ends of the openings 501 to 505 in the X direction are different. Here, the opening end of an opening located higher up (+Y side) is located further towards the +X side. As a result, the shape of the end portion 52 of the drawing groove 5e in plan view becomes stepped, making it easier to perceive as a curved contour. Therefore, a pseudo-curved contour can be represented.

[0069] In Figure 6, the opening ends of the five sub-grooves 50 of the drawing groove 5e are all at different positions in the X direction. However, the opening ends of two or more adjacent sub-grooves 50 may be at the same position in the X direction. In this case, these sub-grooves 50 may be indistinguishable from each other and may form a single opening.

[0070] The drawing groove 5f has a side surface located at the second boundary L2. In the portion of the drawing groove 5f located at the second boundary L2, there are fewer sub-grooves 50 (two in this case) and it is narrower than in other portions. In this example, the drawing groove 5f has openings 511 to 514. Each of these openings 511 to 513 is a single sub-groove 50. Each of the openings 511 to 513 has an opening end at the second boundary L2. The opening 514 does not have an opening end at the second boundary L2 and extends without crossing the second boundary L2. The opening 514 is, for example, an opening formed by connecting two sub-grooves 50. Therefore, the drawing groove 5f has a portion including openings 511 to 514 (width: w1) and a portion including only opening 514 (width: 0.4 × w1). Thus, in a plan view, the shape of the side surface of the drawing groove 5f can be made stepped or have a notched section. Therefore, a second boundary that is closer to (more faithful to) the outline of the target pattern can be formed.

[0071] Figures 7A and 7B are top views illustrating the display patterns in the pattern display area DR, respectively. In Figures 7A and 7B, as in Figure 5, the character's face is represented in areas r1 to r3 with different aperture ratios. The character in display pattern 201 in Figure 7A was formed using an excerpt of the face of "Panasonic's Shop Boy" as the target pattern. The display pattern 200 in Figure 7B is the same as in Figure 5. In the surface pattern 200 of Figure 7B, the shape of the boundary visible as the bangs and mouth contour differs from that of display pattern 201 in Figure 7A. Specifically, in the display pattern 200 of Figure 7B, compared to the display pattern 201 in Figure 7A, the boundary visible as the bangs and mouth contour (the boundary between the first area r1 and the second area r2) extends to cross more drawing grooves 5 and / or to have a larger inclination angle (closer to 90°) with respect to the drawing grooves 5. As a result, in the display pattern 200 of Figure 7B, the outlines of the mouth and bangs are easier to see than in the display pattern 201 of Figure 7A, allowing the pattern to be displayed more clearly.

[0072] (Effects) In the photoelectric conversion device 100 of this embodiment, the power generation unit 3 is provided with a plurality of drawing grooves 5 that penetrate the photoelectric conversion layer 32 in the thickness direction (Z direction). Each of the drawing grooves 5 has an end in a plan view and is a straight line extending from the end in a first direction (X direction). In a plan view, the power generation unit 3 includes a first region r1 and a second region r2 that are adjacent to each other, and the first boundary L1 between the first region r1 and the second region r2 includes a portion that intersects with the X direction. In a plan view, two or more drawing grooves 5 extend in the second direction (Y direction) at intervals in the first region r1 and the second region r2. In a plan view, the area ratio of the drawing grooves 5 in the first region r1 is greater than the area ratio of the drawing grooves 5 in the second region r2.

[0073] With the above configuration, a pattern is displayed on the surface of the power generation unit 3 by utilizing the difference in area ratio (aperture ratio) of the drawing grooves 5 in the photoelectric conversion layer 32. More complex patterns can be represented by combining linear drawing grooves 5 that extend in the X direction. Furthermore, for example, the transmittance of visible light can be made different in the first region r1 and the second region r2, so a pattern can be represented by the difference in brightness (gradation). Therefore, a photoelectric conversion device 100 with excellent design can be provided.

[0074] Since the first boundary L1 includes a portion that intersects with the X direction, it becomes possible to change the aperture ratio along the X direction. The first boundary L1 may further include a portion that intersects with the Y direction, so it becomes possible to change the aperture ratio along the Y direction. Thus, according to this embodiment, by using a linear drawing groove 5 that extends in one direction (in this case, the X direction), it is possible to change the density of the drawing groove 5 not only in the X direction but also in the Y direction, thereby changing the gradation. Therefore, it becomes possible to display a pattern with arbitrarily changed gradation in two dimensions.

[0075] Furthermore, with the above configuration, a pattern can be displayed by forming the drawing grooves 5, which extend in the same direction, at pre-designed positions. Also, the wiring structure does not need to be complex to display the pattern. Therefore, the design can be enhanced without complicating the design or manufacturing process.

[0076] Furthermore, since drawing grooves 5 (e.g., openings) of a predetermined line width are formed in the photoelectric conversion layer 32, the display pattern 200 can be formed on the photoelectric conversion layer 32 without significantly reducing the area of ​​the power generation region that contributes to power generation within the photoelectric conversion layer 32. Therefore, a significant decrease in power generation performance due to the formation of the display pattern 200 can be suppressed.

[0077] Furthermore, according to this embodiment, by freely arranging the first region r1 and the second region r2 in the pattern display area DR of the power generation unit 3, it is possible to express everything from simple patterns such as stars and letters to complex patterns with curves and even paintings. Therefore, a higher level of design quality can be achieved than in Patent Document 1.

[0078] In the photoelectric converter 100 of this embodiment, the multiple drawing grooves 5 include a groove (common groove) 5a that extends from the first region r1 across the first boundary L1 to the second region r2. With this configuration, the design and processing of the drawing grooves 5 can be made easier. In addition, the positions of some of the grooves (common groove) 5a in the Y direction can be aligned between the first region r1 and the second region r2. This makes it easier to visually perceive the difference in aperture ratio between these regions r1 and r2 as the outline of the figure.

[0079] In the photoelectric converter 100 of this embodiment, the arrangement pitch p1 of the drawing grooves 5 in the first region r1 is smaller than the arrangement pitch p2 of the drawing grooves 5 in the second region r2. With this configuration, the gradation of the two regions r1 and r2 can be easily made different.

[0080] According to this embodiment, the plurality of drawing grooves 5 include, in a plan view, a plurality of common grooves 5a extending from a first region r1 across a first boundary L1 to a second region r2, and at least one dedicated groove 5b positioned between two adjacent common grooves 5a. The dedicated groove 5b extends from the first region r1 to the first boundary L1 and has an end 51 at the first boundary L1. With this configuration, the common grooves 5a make the design and processing of the drawing grooves 5 easier, while the end 51 of the dedicated groove 5b represents (makes visible) the first boundary L1.

[0081] According to this embodiment, the power generation unit 3 further includes a third region r3 having a smaller aperture ratio than the second region r1. The third region r3 is, for example, a region in which no drawing groove 5 is formed. In a plan view, the third region r3 may be adjacent to or surrounded by the first region r1 or the second region r2. The second boundary L2 between the first region r1 or the second region r2 and the third region r3 may include a portion that intersects in the X direction. With such a configuration, it becomes possible to display patterns with at least three shades.

[0082] According to this embodiment, the boundaries L1 and L2, which are visible as the outline of the pattern, are represented by the ends 51 and 52 of the drawing grooves 5, which are arranged at a distance from each other. In other words, the outline is composed of multiple points, not lines. With this configuration, it is possible to display a desired pattern while suppressing the aperture ratio and ensuring power generation performance. For example, even if the outline of the target pattern extends in the Y direction, it is not necessary to form drawing grooves that extend in the Y direction, thus reducing the impact on power generation performance.

[0083] According to this embodiment, as shown in Figure 6, the multiple drawing grooves 5 include grooves 5e and 5f composed of multiple openings connected in the Y direction. The width of each of the multiple openings in the Y direction is smaller than the width w1 of the drawing groove 5 in the first region r1 and the second region r2. The multiple openings include a first opening and a second opening, which have different lengths in the X direction. With this configuration, depending on the position of the end (opening end) of each opening, a step can be formed at the end 51, 52 or side of the drawing groove 5 to match the contour of the design, making it possible to more closely approximate the designed contour. For example, it becomes easier to represent curved contours.

[0084] In the photoelectric converter 100 of this embodiment, as shown in Figure 4C, when viewing the power generation unit 3 along the Z direction, the region 37 overlapping with each drawing groove 5 is a non-power generation region that does not contribute to power generation, and the region 38 located between two adjacent drawing grooves 5 is a power generation region that contributes to power generation. With this configuration, it is possible to enhance the design while ensuring the amount of power generated. As an example, the aperture ratio of the first region r1 in the power generation unit 3 may be set to, for example, 20% or less. By setting an upper limit on the aperture ratio, the decrease in power generation performance due to the drawing of patterns can be kept within a predetermined range.

[0085] In this embodiment, the direction in which the drawing groove 5 extends and the direction in which the current flows in the power generation unit 3 (for example, the direction in which the current flows from one of the extraction electrodes 4A and 4B to the other) are substantially parallel. With this configuration, it is possible to suppress the obstruction of the current flow by the drawing groove 5.

[0086] In the photoelectric conversion device 100 of this embodiment, the power generation unit 3 has multiple solar cells 8 arranged in the X direction at intervals from each other in a plan view and electrically connected in series. At least one of the drawing grooves 5 intersects with a separation groove 82 formed in the photoelectric conversion layer 32 to separate adjacent solar cells 8 in a plan view. With this configuration, the drawing grooves 5 can be placed at any position without being restricted by the arrangement or configuration of the solar cells 8.

[0087] According to this embodiment, the width w1 of the drawing groove 5 is greater than the width of the separation groove 82, for example, twice as much or more. This configuration makes it easier to see the pattern using the drawing groove 5, and reduces the influence of the separation groove 82 on the design.

[0088] The photoelectric conversion device 100 of this embodiment further comprises a translucent first substrate 1 supporting the power generation unit 3. The power generation unit 3 includes a photoelectric conversion layer 32, a translucent lower electrode layer 31 located on the first substrate 1 side of the photoelectric conversion layer 32, and an upper electrode layer 33 located on the opposite side of the photoelectric conversion layer 32 from the first substrate 1. The plurality of drawing grooves 5 penetrate at least the upper electrode layer 33 and the photoelectric conversion layer 32 in the Z direction. The photoelectric conversion layer 32 is a non-translucent layer with a lower visible light transmittance than the lower electrode layer 31.

[0089] The photoelectric conversion device 100 further comprises a translucent second substrate 2 facing the first substrate 1 and the power generation unit 3 in the Z direction, and a translucent filler material 7 located between the power generation unit 3 and the second substrate 2. A portion of the filler material 7 may be located inside the drawing groove 5. The power generation unit 3 is sealed between the first substrate 1 and the second substrate 2 together with the filler material 7. With this configuration, in a photoelectric conversion module in which the power generation unit 3 is sealed, a pattern can be displayed within the sealed space. Furthermore, with the above configuration, by sealing the power generation unit 3 between the first substrate 1 and the second substrate 2 with the sealing member 6, moisture and oxygen are less likely to penetrate from the outside to the power generation unit 3, thereby suppressing deterioration of the photoelectric conversion layer (especially the perovskite layer) 32. In addition, the photoelectric conversion layer exposed on the inner surfaces 5s1 and 5s2 of the drawing groove 5 can be protected by the filler material 7. Furthermore, with the above configuration, since the filler material 7 is light-transmitting, the photoelectric converter 100 can function as a double-sided light-receiving module.

[0090] According to this embodiment, since both the filler 7 and the substrates 1 and 2 are translucent materials, the display pattern 200 formed on the power generation unit 3 is visible from both the first substrate 1 side and the second substrate 2 side. This further enhances the design appeal.

[0091] The configuration of the photoelectric conversion device in this embodiment is not limited to the above configuration. For example, the power generation unit 3 may consist of a single solar cell, and separation grooves may not be formed in the photoelectric conversion layer. Also, for example, in a photoelectric conversion device used in a window, through grooves for light collection may be provided in the photoelectric conversion layer, separate from the design.

[0092] The materials and shapes of each component are not particularly limited. The photoelectric conversion layer 32 may be any opaque photoelectric conversion layer and may contain photoelectric conversion materials other than perovskite compounds. In the photoelectric conversion device 100, the first substrate 1 and the second substrate 2 are translucent, but the second substrate 2 may be opaque. In this case, the pattern is visible only from the light-receiving surface 1b side.

[0093] (Method of manufacturing the photoelectric converter) An example of a method of manufacturing the photoelectric converter 100 will be described below with reference to Figures 8A to 8I. Figures 8A to 8I are schematic cross-sectional diagrams of the manufacturing process of the photoelectric converter 100, and each shows a part of the cross-section along the X direction.

[0094] First, as shown in Figure 8A, a first substrate 1 is prepared on which a transparent conductive film 310 is formed on the main surface 1a. The transparent conductive film 310 is, for example, an FTO film. A glass substrate may be used as the first substrate 1, and the transparent conductive film 310 may be formed on the main surface of the glass substrate by known methods such as sputtering or coating. Alternatively, a substrate whose main surface 1a is covered with a transparent conductive film 310 (for example, an FTO substrate covered with an FTO film) may be used.

[0095] Next, as shown in Figure 8B, the transparent conductive film 310 is patterned by a known method. Here, a plurality of separation grooves 81 are formed in the transparent conductive film 310 along the Y direction by laser processing (aperture width: for example, 40 μm). This forms a lower electrode layer 31 including a plurality of lower electrodes LE.

[0096] Next, as shown in Figure 8C, a laminated film 320 including a photoelectric conversion film 321 is formed on the main surface 1a of the first substrate 1 so as to cover the lower electrode layer 31. Each film in the laminated film 320 can be formed by methods such as spin coating or inkjet.

[0097] In this embodiment, first, an n-type semiconductor film 341 (for example, an SnO2 film) is applied to the main surface 1a using an inkjet method and dried. Then, an i-type semiconductor film (for example, a perovskite film) is applied on top of the n-type semiconductor film 341 as a photoelectric conversion film 321 using an inkjet method and dried. Subsequently, a p-type semiconductor film 351 (for example, a PTAA film) is applied on top of the photoelectric conversion film 321 using an inkjet method and dried. By repeating this application and drying process, a laminated film 320 can be formed.

[0098] Next, as shown in Figure 8D, a plurality of holes 83 are formed in the laminated film 320, in which the lower electrode LE is exposed. Here, each hole 83 is formed by laser processing (aperture width: for example, 80 μm).

[0099] Next, as shown in Figure 8E, a transparent conductive film 330 is formed so as to cover the laminated film 320. The transparent conductive film 330 is, for example, an ITO film. After this, as shown in Figure 8F, the portion of the laminate, which includes the lower electrode layer 31, the laminated film 320, and the transparent conductive film 330, that is located in the peripheral region of the first substrate 1 is removed, for example, by laser processing.

[0100] Next, as shown in Figure 8G, the laminated film 320 and the transparent conductive film 330 are patterned using a known method to form separation grooves 82 that expose the lower electrode layer 31. Here, a plurality of separation grooves 82 are formed in the transparent conductive film 330 and the laminated film 320 along the Y direction by laser processing (aperture width: for example, 80 μm). As a result, an upper electrode layer 33 including a plurality of upper electrodes UE is formed from the transparent conductive film 330. Also, a photoelectric conversion layer 32 including a plurality of photoelectric conversion units PV is formed from the photoelectric conversion film 321. Each photoelectric conversion unit PV is arranged, for example, to straddle two adjacent lower electrodes LE in the X direction. Similarly, the n-type semiconductor film 341 and the p-type semiconductor film 351 are also formed to form an n-type semiconductor layer 34 and a p-type semiconductor layer 35, respectively, which include a plurality of separated portions.

[0101] In this way, a power generation unit 3 is obtained that includes a plurality of solar cells 8 arranged in the X direction. Each solar cell 8 has a laminated structure comprising a lower electrode LE, an upper electrode UE, and a photoelectric conversion unit PV located between these electrodes LE and UE in the Z direction. Each upper electrode UE is electrically connected within a hole 83 to the lower electrode LE of the solar cell 8 adjacent to the right side (+X side).

[0102] Next, as shown in Figure 8H, the portion of the power generation layer 30 located in the region where the extraction electrodes are formed is removed, exposing a portion 31a and 31b of the lower electrode layer 31. In this example, the portions of the power generation layer 30 located at the +X and -X side edges of the main surface 1a of the first substrate 1 are removed.

[0103] Furthermore, for example, a plurality of drawing grooves 5 that penetrate at least the upper electrode layer 33 and the photoelectric conversion layer 32 are formed by laser processing. In this embodiment, a drawing groove 5 (width: w1) composed of n sub-grooves (width: w1 / n) is formed by performing n scans along the X direction. As an example, a drawing groove 5 with a width w1 of 200 μm may be formed by forming a plurality (in this case, five) of sub-grooves by laser processing (aperture width: 40 μm).

[0104] As will be described later, in this embodiment, drawing grooves 5 are formed using a laser processing device with drawing data created based on design rules and target patterns. Each drawing groove 5 is formed at a predetermined position and extends in the X direction for a predetermined length. The drawing data will be described in detail later.

[0105] It is preferable that the inner surfaces 5s1, 5s2 (see Figure 3) and inner end surfaces 5t1, 5t2 of the drawing groove 5 are substantially perpendicular to the main surface 1a. If the inner surfaces 5s1, 5s2 and inner end surfaces 5t1, 5t2 are tapered surfaces inclined with respect to the main surface 1a, the bottom surface 53 of the drawing groove 5 may be formed to have a predetermined width w1 and length.

[0106] After forming the drawing groove 5, an inspection process may be performed. In the inspection process, for example, an inspection device is used to compare the display pattern formed on the power generation unit 3 with the target pattern using image recognition, and to check whether there is any misalignment with the target pattern. Even if there is a misalignment, if it is possible to bring it closer to the target pattern by further laser processing, additional laser processing (repair process) can be performed. For example, if the length or depth of the drawing groove is insufficient, the shape (length, depth) can be made to conform to the target pattern by scanning the laser at that position. On the other hand, repair cannot be performed on drawing grooves that are longer than the target pattern.

[0107] Next, as shown in Figure 8I, extraction electrodes 4A and 4B are formed on the exposed portions 31a and 31b of the lower electrode layer 31, respectively. Each of the extraction electrodes 4A and 4B is formed to be electrically connected to one of the electrodes of the solar cell, the one on the +X side and the one on the -X side. The extraction electrodes 4A and 4B may be electrodes containing low-resistance metals such as Cu, Al, or Ag. For example, the extraction electrodes 4A and 4B may be formed by joining copper wire coated with solder (tab wire) onto the lower electrode layer 31 by soldering.

[0108] After forming the extraction electrodes 4A and 4B, a filler material 7 is placed above the power generation unit 3, and the second substrate 2 is placed so as to face the first substrate 1 with the power generation unit 3 and the filler material 7 in between. As the filler material 7, for example, a filler sheet containing polyolefin (PO) is used. Instead of polyolefin, resins such as ethylene-vinyl acetate copolymer (EVA) or polyvinyl butyral (PVB) may be used as the filler material. Lamination may be performed after this.

[0109] Next, a sealing member (e.g., butyl rubber) 6 is formed between the first substrate 1 and the second substrate 2 to seal the power generation unit 3. Here, the sealing member 6 is positioned to surround the power generation unit 3 and the filler material 7 when viewed from the Z direction. As the material for the sealing member 6, for example, rubber such as butyl rubber, thermoplastic resin such as ethylene-vinyl alcohol copolymer (EVOH), or a combination thereof can be used. The extraction electrodes 4A and 4B may extend through the sealing member 6 to the outside of the photoelectric converter 100. In this way, the photoelectric converter 100 is manufactured.

[0110] The method for manufacturing the photoelectric converter is not limited to the method described above. In the above description, the sealing member 6 was placed and sealed after lamination, but lamination may also be performed after sealing (sealing) by placing the sealing member 6.

[0111] (Method for creating drawing data) In this embodiment, design lines corresponding to the drawing grooves are placed on the target pattern (the pattern to be displayed) to create processing data for the drawing grooves (referred to as "processing data" or "drawing data"). The drawing data includes information such as the width of the design lines and the positions of the start and end points of the design lines. After this, the power generation layer is laser processed using the drawing data to form drawing grooves at positions corresponding to each design line. In this specification, a pattern with design lines added to the target pattern is called a "design line pattern," and is distinguished from a "display pattern," which is a pattern represented by drawing grooves.

[0112] The following describes how to create drawing data. Figure 9 is a flowchart showing an example of how to create drawing data. As shown in Figure 9, the method for creating drawing data includes determining the design line pattern (S10), recognizing the outline of the target pattern (S20), determining the assignment of the design line pattern to the target pattern (S30), placing the design lines on the target pattern (creation of the design line pattern) (S40), and creating the drawing data (S50).

[0113] <S10: Determination of Design Line Pattern> Figure 10 is a flowchart showing an example of the design line pattern determination process. As shown in Figure 10, the design line pattern determination process S10 includes determining the design rules (S11), determining the basic units (S12), and determining the design line pattern (S13). The determination of the design line pattern (S13) includes at least determining the first design line pattern (S131) ​​and determining the second design line pattern (S132). The first design line pattern is a pattern for displaying a first grayscale, and the second design line pattern is, for example, a pattern for displaying a second grayscale that is darker than the first grayscale.

[0114] Although not shown in the diagram, if a different gradation from both the first and second gradations is required, for example, a gradation between the first and second gradations, the determination of a third design line pattern can be included in the determination of the design line pattern (S13).

[0115] <S11: Determination of Design Rules> First, the design rules for the design line pattern are determined. The design rules may be determined individually for each pattern, taking into consideration, for example, the complexity of the target pattern and the size of the pattern display area DR. Alternatively, a unified rule may be applied regardless of the pattern. As design rules, for example, the maximum aperture ratio M and the number of grayscale levels N are determined.

[0116] - Determination of the maximum aperture ratio M The maximum aperture ratio M is the maximum area ratio of the writing grooves in the photoelectric conversion layer. In this embodiment, since the photoelectric conversion layer is scribed away, the maximum aperture ratio corresponds to the maximum amount that can be scribed away for the writing grooves (maximum scribe amount). The maximum aperture ratio M is the upper limit of the aperture ratio in the brightest region (for example, the first region r1 shown in Figure 5).

[0117] When the aperture ratio due to the drawing grooves increases, the area contributing to the power generation region decreases, resulting in a decrease in power generation performance. On the other hand, to enhance the design of the pattern, it is preferable to increase the maximum aperture ratio due to the drawing grooves. This is because it is possible to increase the difference in aperture ratio between regions, making it easier to express complex patterns more clearly. Therefore, in this embodiment, in order to achieve both power generation performance and design aesthetics, the maximum aperture ratio M is predetermined as a design rule.

[0118] As an example, the required area of ​​the power generation region is determined from the power generation amount of the photoelectric converter (the minimum required amount), and the proportion of the area of ​​the photoelectric converter layer that can be removed as a drawing groove (an area that may be left as a non-power generation region) is calculated so as to secure this power generation area. This proportion may be called the maximum aperture ratio M. The maximum aperture ratio M is not particularly limited, but may be set to, for example, 30% or less, preferably 20% or less. Here, we will explain using the case where the maximum aperture ratio is 20% (referred to as the "20% rule") as an example.

[0119] Next, the number of gradations (brightness) N to be used to represent the pattern is determined. This determines the number of design line patterns required. As mentioned above, the number of gradations is determined by the area ratio (aperture ratio) of the drawing groove.

[0120] The number of gradations N is not particularly limited, but may be 2 to 4 gradations (N = 2 to 4). If the number of gradations N is small, it is difficult to represent complex patterns. On the other hand, in this embodiment, if the number of gradations N is too large (for example, 5 gradations or more), it may be difficult to visually distinguish the differences in gradations. Here, we will explain using the case of 3 gradations (N = 3) which includes a region that does not include drawing grooves (gradation 0) and two regions with different brightness levels (gradation 1 and 2). In this case, two types of design line patterns are required to be applied to the regions that become gradation 1 and 2. The method for forming the two types of design line patterns (S12 to S13) will be explained below with reference to Figures 11A to 11C.

[0121] <S12: Determination of the basic unit> First, as shown in Figure 11A, the basic unit U is determined based on the maximum aperture ratio M.

[0122] The basic unit U consists of a design line 9 corresponding to a drawing groove (non-power generation area) and a space 10 corresponding to an area located between the drawing grooves (power generation area). In this example, following the 20% rule, the Y-direction width (line width) dw of the design line 9 and the Y-direction width (space width) dv1 of the space 10 are set such that the ratio of the area of ​​the non-power generation area shown by the design line 9 to the area of ​​the basic unit U is 20% or less, that is, the ratio of the power generation area shown by the space 10 is 80% or more. As an example, the ratio of the line width dw to the space width dv1 is set to dw:dv1 = 1:4 so that the area ratio of the design line 9 is 20%.

[0123] Here, we will explain an example of how to define the size of the basic unit U. In this embodiment, for example, the size of the basic unit U is set to a rectangle with a length du in the X direction of 10 mm and a length in the Y direction of 2 mm, and the design lines are designed accordingly.

[0124] First, set the width (length in the X direction) du of the basic unit U to the same size as, for example, the width (width in the X direction) of the solar cell (e.g., 10 mm).

[0125] Next, the width dw of the design line is set. The width dw of the design line is set such that, for example, if the drawing groove after processing has that width, visible light passes through the power generation section in the thickness direction via the drawing groove, allowing the drawn display pattern to be recognized. In this example, the width dw of one design line is set to 0.2 mm. Subsequently, the length in the Y direction of the basic unit U is set based on the width dw. For example, assuming a design with four grayscale levels (including a black pattern), three design lines (one common design line and two dedicated design lines) are required. Therefore, the width (Y direction) of the design line must be a maximum of three lines, i.e., 0.6 mm (= 0.2 mm × 3 lines). If the maximum area ratio of the design line is set to 30%, then even when using three design lines, in order to secure a 70% power generation area, the length in the Y direction of the basic unit U must be 2 mm (= 0.6 mm × (10 / 3)). Similarly, assuming a design with three tones (including a black pattern), two design lines are required (one common design line and one dedicated design line). Therefore, the width of the design lines (in the Y direction) must be a maximum of two lines, i.e., 0.4 mm (= 0.2 mm x 2 lines). If the maximum area ratio of the design lines is set at 20%, then even when using two design lines, in order to secure an 80% power generation area, the length of the basic unit U in the Y direction must be 2 mm (= 0.4 mm x (10 / 2)).

[0126] The size and definition method of the basic unit U described above are merely examples. The size of the basic unit U is not limited to that described above and should be set appropriately according to the overall size of the photoelectric conversion device and the performance of the photoelectric conversion materials used.

[0127] <S13: Determination of design line pattern> First, as shown in Figure 11B, the first design line pattern PT1 is determined using the basic unit U to be applied to the area that is, for example, the brightest first tone (tone 2 in this example) (S131).

[0128] In this example, the first design line pattern PT1 is a pattern in which the basic unit U is arranged in the Y direction (hereinafter referred to as the "basic pattern"). In the first design line pattern PT1, design lines 9 with line width dw are arranged in the Y direction with a distance (space width) dv1 between them, so dw:dv1 = 1:4, and the area ratio R1 of the design lines 9 is 20%.

[0129] Next, some of the design lines 9a in the first design line pattern PT1 are designated as "common design lines," and the remaining design lines 9b are designated as "dedicated design lines." As an example, in the first design line pattern PT1, multiple (in this case, two) basic units U1 and U2 arranged in the Y direction may be considered as one set, and one or more (in this case, one) design lines from each set may be designated as dedicated design lines 9b, with the rest being common design lines 9a. The common design lines 9a and dedicated design lines 9b correspond to the common grooves 5a and dedicated grooves 5b shown in Figure 5, respectively.

[0130] The first design line pattern PT1 is a pattern in which design lines with line width dw are arranged in the Y direction, and does not have to be a basic pattern. For example, the first design line pattern PT1 may be a pattern formed by moving some of the design lines from a basic pattern in the Y direction.

[0131] Next, as shown in Figure 11C, a second design line pattern PT2 is determined to be applied to a region that is darker than the first design line pattern PT1, resulting in a second grayscale (grayscale 1 in this example) (S132).

[0132] In this example, the second design line pattern PT2 is determined by removing the dedicated design line 9b from the first design line pattern PT1, in which the common design lines 9a are arranged in the Y direction. In the second design line pattern PT2, the design lines 9 (all of which are common design lines 9a in this case) with line width dw are arranged in the Y direction with a distance dv2 (>dv1) between them. dw:dv2 = 1:9, and the area ratio R2 of the design lines 9 is 10%.

[0133] Table 2 shows the area ratio, arrangement pitch, and gradation of each design line pattern. The gradation shown in Table 2 represents the brightness level when drawing grooves are formed according to each design line pattern. The area ratio and arrangement pitch of design line 9 correspond to the area ratio (opening ratio) and arrangement pitch of the drawing grooves when drawing grooves are processed according to design line 9.

[0134] In this example, to represent the darkest gradation (gradation 0), pattern PTb, which does not have design lines (only in the power generation area), is also used. Pattern PTb is called the "black pattern". Also, as shown in Table 2, pattern PT1, which has the largest area ratio, is called the "white pattern".

[0135]

[0136] The area ratio and arrangement pitch of the design lines are not limited to the examples shown in Table 2. By deleting two or more dedicated design lines from the first design line pattern PT1, a second design line pattern PT2 with a smaller design line area ratio can be formed. This allows for a greater increase in the difference in area ratio between the two design line patterns PT1 and PT2. This is explained in Modification Example 1 below.

[0137] Furthermore, although the above example shows a number of gradations N of 3, it is also possible to increase the number of gradations N to 4 or more. For example, by varying the number of dedicated design lines deleted from the first design line pattern PT1, it is possible to form two or more design line patterns that represent intermediate colors. This will be explained in Modification Example 2 below.

[0138] - Modification 1 of the design line pattern Figure 12 shows modification 1 of the design line pattern.

[0139] The first design line pattern PT1 in Modification 1 is a basic pattern with basic units U arranged in the same way as in Figure 11B. However, in Modification 1, the three basic units U1 to U3 arranged in the Y direction in the first design line pattern PT1 are considered as one set. From each set, the design lines 9 of basic units U2 and U3 are designated as dedicated design lines 9b1 and 9b2 (sometimes collectively referred to as "dedicated design line 9b"), and the design line 9 of basic unit U1 is designated as a common design line 9a.

[0140] The second design line pattern PT2 is formed by deleting dedicated design lines 9b1 and 9b2 from the first design line pattern PT1. In the second design line pattern PT2, dw:dv2 = 1:14, and the area ratio R2 of design line 9 is 6.7%.

[0141] Table 3 shows the area ratio, arrangement pitch, and gradation of each design line pattern in Modification 1.

[0142] - Modification 2 of the design line pattern Figure 13 shows modification 2 of the design line pattern. Modification 2 differs from modification 1 in that it uses four design line patterns to achieve four grayscale levels (N=4).

[0143] The first design line pattern PT1 in Modification 2 is the same as the first design line pattern PT1 in Modification 1. Similar to Modification 1, the basic units U1 to U3 in the first design line pattern PT1 are set together, the design lines 9 of basic units U2 and U3 are designated as dedicated design lines 9b1 and 9b2, and the design line 9 of basic unit U1 is designated as a common design line 9a.

[0144] The second design line pattern PT2 is formed by deleting only one of the dedicated design lines (in this case, dedicated design line 9b2) from the first design line pattern PT1. In the second design line pattern PT2, the dedicated design line 9b1 is positioned between the two common design lines 9, with distances dv21 and dv22 from the two common design lines 9, respectively. In the second design line pattern PT2, dw:dv21:dv22 = 1:4:9, the average arrangement pitch dp2 of the design lines 9 when the line width dw is 1 is 7.5, and the area ratio R2 of the design lines 9 is approximately 13.3%.

[0145] Furthermore, the third design line pattern PT3 is formed by deleting two dedicated design lines 9b1 and 9b2 from the first design line pattern PT1. In the third design line pattern PT3, only the common design line 9a is arranged with a distance dv3 between them. In the third design line pattern PT3, dw:dv3 = 1:14, the average arrangement pitch dp3 of the design lines 9 is 15, and the area ratio R3 of the design lines 9 is 6.7%.

[0146] Table 4 shows the area ratio, arrangement pitch, and gradation of each design line pattern in Modification 2. In this Modification, as shown in Table 4, the second design line pattern PT2 and the third design line pattern PT3 are used to represent intermediate gradations 1 and 2 with different brightness levels.

[0147] In the example in Figure 13, three tones may be represented using only design line patterns PT1, PT2, and PTb. Furthermore, in the first design line pattern PT1, the number of tones N can be further increased by, for example, increasing the number of basic units U that make up one set. Increasing the number of basic units U that make up one set increases the number of dedicated design lines for each set. This allows for the creation of a wider variety of design line patterns by varying the number and position of dedicated design lines to be deleted when forming design line patterns for intermediate colors.

[0148] <S20: Recognizing the outline of the target pattern> Next, using Figures 14A to 14E, we will explain the process from recognizing the outline of the target pattern (S20) to creating drawing data (S50). Here, we will use the design line patterns PT1, PT2, and PTb shown in Figure 12 and Table 3.

[0149] Figure 14A is an example of a target pattern 400T. In this example, for example, a rhombus 402 and a circle 403 located inside the rhombus 402 are drawn in a rectangular drawing area 401.

[0150] The target pattern 400T may be designed, for example, on CAD and imported into a personal computer as CAD data. The outline of the target pattern 400T is recognized by importing it into the personal computer or by direct input. Specifically, the outlines of the rhombus 402 and the circle 403, and, if necessary, the outline of the drawing area 401 are recognized.

[0151] Next, the target pattern 400T is identified by defining multiple parts of its contour. Here, the first part d1 enclosed by the contour of the circle 403, the second part d2 located between the contour of the circle 403 and the contour of the rhombus 402, and the third part d3 outside the rhombus 402 are identified.

[0152] <S30: Determining the assignment of design line patterns to the target pattern> Next, it is determined which gradation (design line pattern) to assign to which parts d1 to d3 of the target pattern 400T. Here, as shown in Figure 14A, the brightest first design line pattern PT1 is assigned to the first part d1, the darkest black pattern PTb is assigned to the third part d3 which is the background, and the second design line pattern PT2 with an intermediate brightness is assigned to the second part d2.

[0153] <S40: Placing design lines on the target pattern> Next, design lines 9 are placed on each part d1 to d3 of the target pattern 400T according to the assigned design line pattern. There are no particular limitations on the method of placing the design lines 9, but here we will explain using the case where a common design line 9a and a dedicated design line 9b are placed separately across the entire drawing area as an example.

[0154] Figure 15A shows a first pattern used for arranging common design lines on the target pattern. Figure 15B shows a second pattern used for arranging dedicated design lines on the target pattern.

[0155] The first pattern 420 contains only the common design lines 9a of the respective design line patterns PT1 and PT2. The second pattern 430 contains only the dedicated design lines 9b of the first design line pattern PT1. Therefore, when the first pattern 420 and the second pattern 430 are superimposed, the first design line pattern PT1 is obtained.

[0156] Next, as shown in Figures 14B to 14E, the design lines are placed on the target pattern using the first pattern 420 and the second pattern 430.

[0157] First, as shown in Figure 14B, the first pattern 420 is superimposed over the entire drawing area 401. Next, as shown in Figure 14C, the common design line 9a located in the unnecessary portion (here, the third portion d3) is removed. Similarly, as shown in Figure 14D, the second pattern 430 is superimposed over the entire drawing area 401. Next, as shown in Figure 14E, the dedicated design line 9b located in the unnecessary portion (here, the second portion d2 and the third portion d3) is removed. In this way, the design line pattern 400D is obtained by arranging the design lines 9, including the common design line 9a and the dedicated design line 9b, on the target pattern 400T.

[0158] In the first part d1 of the design line pattern 400D, a common design line 9a and a dedicated design line 9b are arranged using the first design line pattern PT1. In the second part d2, only the common design line 9a is arranged using the second design line pattern PT2. The common design line 9a located in the first part d1 and the common design line 9a located in the second part d2 are connected to each other across the outline of the circle 403, forming a single design line. No design lines are placed in the third part d3.

[0159] The common design line 9a and the dedicated design line 9b shown in the design line pattern 400D in Figure 14E are, respectively, design lines for machining the drawing grooves.

[0160] In Figures 14B to 14E, common design lines and dedicated design lines are arranged separately. However, it is also possible to place all design lines across the entire drawing area 401 and then remove any unnecessary design lines.

[0161] Figures 16A to 16C are schematic diagrams showing other examples of how design lines are arranged. In this example, as shown in Figure 16A, a pattern 440 is used to arrange all the design lines (common design lines and dedicated design lines). When using the same target pattern 400T as shown in Figure 14A, first, as shown in Figure 16B, the pattern 440 is superimposed over the entire drawing area 401 to arrange the common design lines 9a and dedicated design lines 9b. Next, as shown in Figure 16C, unnecessary parts of these design lines 9a and 9b are removed. Here, the common design line 9a located in the third part d3 and the dedicated design lines 9b located in the second part d2 and the third part d3 are removed. This results in the design line pattern 400D.

[0162] <S50: Creation of drawing data> Next, drawing data is created based on the design line pattern 400D. The drawing data includes position information of the start and end points of each processing design line (common design line and dedicated design line). The position information may be, for example, the coordinates (X, Y) of the start and end points in the drawing area 401. For example, if the coordinates of the start point are (5, 5) and the coordinates of the end point are (10, 5), it can be seen that the design line is a straight line with a distance of 5 extending in the X direction. The drawing data may also include, for example, information on the line width of each processing design line.

[0163] Furthermore, as described above with reference to Figure 6, when a drawing groove is formed by multiple sub-grooves, sub-design lines corresponding to each sub-groove may be placed on the target pattern. In this case, the positions of the ends of the multiple sub-design lines included in a single design line 9 in the X direction may be made different from each other so as to follow the contour of the target pattern. In this case, the position information of the drawing data includes the coordinates of the start and end points of the multiple sub-design lines that constitute each processing design line. The drawing data may also include information on the line width and number of sub-design lines that constitute the processing design line.

[0164] Next, the created drawing data is recorded, for example, on a computer-readable recording medium. As mentioned above, the drawing data is input to a laser processing device and used to process the drawing grooves. Each drawing groove is formed by laser processing so as to extend linearly from the starting point to the ending point of the corresponding processing design line.

[0165] (Example 1) Example 1 describes a method for creating drawing data based on a target pattern and forming a display pattern 200 (Figure 7B) using the drawing data. Figures 17A to 17C show the method for creating the drawing data in Example 1.

[0166] In this embodiment, first, as shown in Figure 17A, the outline of the target pattern 200T of the character's face is drawn. The character is an excerpt of the face of "Panasonic's Shop Boy," however, the shape of the bangs and corners of the mouth have been changed. Next, the design rules and design line patterns are determined. In this embodiment, the maximum aperture ratio M is set to 20%, the number of gradations N is set to 3, and the design line patterns PT1, PT2, and PTb shown in Figure 12 and Table 3 are used.

[0167] Next, the contour of the target pattern 200T in Figure 17A is recognized, the bangs, face, eyes, nose, and mouth are identified, and one of the design line patterns is assigned to each part. In this embodiment, the first design line pattern PT1 (grayscale 2) is assigned to the character's face part (excluding the eyes, nose, and mouth) 411, the second design line pattern PT2 (grayscale 1) is assigned to the mouth and bangs part 412, and the black pattern PTb (grayscale 0) is assigned to the eyes and nose part 413.

[0168] Next, as shown in Figure 17B, the first pattern 420 (Figure 15A) is superimposed over the entire drawing area, and then the common design lines 9a are removed from the eye and nose portions 413 where they are unnecessary.

[0169] Next, as shown in Figure 17C, the second pattern 430 (Figure 15B) is superimposed over the entire drawing area, and then the dedicated design lines 9b are removed from the mouth and bangs area 412 and the eye and nose area 413. In this way, a design line pattern 200D is obtained in which the common design lines 9a and the dedicated design lines 9b are applied to predetermined areas.

[0170] Next, the position information of the common design line 9a and dedicated design line 9b (design line for processing) of the design line pattern 200D is recorded to create drawing data. The position information may also be the position information (XY coordinates) of the start and end points of each of the multiple sub-design lines that make up each design line 9a and 9b.

[0171] Next, drawing data including the position information is input to the laser processing device. The laser output of the laser processing device is set so that a groove of a depth that exposes the lower electrode layer 31 is formed. Furthermore, the laser aperture width is set so that the drawing groove 5 has a predetermined width corresponding to the width of the processing design line.

[0172] Next, the laser processing device is operated according to the drawing data, and laser processing is performed on the power generation section to form multiple drawing grooves 5 (common grooves 5a and dedicated grooves 5b) in the power generation section 3. Here, the common groove 5a is formed at the position corresponding to the common design line 9a, and the dedicated groove 5b is formed at the position corresponding to the dedicated design line 9b. In this way, as shown in Figure 7B, a drawing groove pattern 200 (display pattern) using the multiple drawing grooves 5 can be displayed in the pattern display area DR of the power generation section.

[0173] Figure 18 shows the design line pattern created in Example 1 using other target patterns (the clothing and hands of the character (Panasonic's store mascot)). Figure 19 shows the display pattern formed based on the design line pattern shown in Figure 18.

[0174] The design line pattern 210D shown in Figure 18 can also be formed in the same manner as in Figures 17A to 17C. In this example, the first design line pattern PT1 (grayscale 2) is assigned to the hand portion 414 of the target pattern character, the second design line pattern PT2 (grayscale 1) is assigned to the clothing portion 415, and the black pattern PTb (grayscale 0) is assigned to the background portion 416, with design lines 9 placed in each portion 414 to 416.

[0175] Next, drawing data including positional information for each design line 9 shown in the design line pattern 210D of Figure 18 is created using the same method as described above, and laser processing of the power generation unit is performed using this data. In this way, a display pattern 210 showing the character's clothes and hands can be formed, as shown in Figure 19. In the display pattern 210, the hands are in a bright (2-tone) first region r1, the clothes are in a medium brightness (1-tone) second region r2, and the background is in a dark (0-tone) third region r3.

[0176] (Example 2) Figure 20 shows the design line pattern of Example 2. Figure 21 shows the display pattern formed based on the design line pattern of Figure 20. Example 2 differs from Example 1 in that it forms a display pattern with 4 grayscale levels (N=4). The method for creating the drawing data of Example 2 will be described below.

[0177] In this embodiment, the target design uses the same character clothing and hand design as in Figure 18. However, in this embodiment, the clothing has a polka dot pattern. The design rules are a maximum aperture ratio M of 20% and a number of gradations N of 4. The design line patterns used are the first design line patterns PT1 to the third design line patterns PT3 shown in Figure 13 and Table 4, and the black pattern PTb.

[0178] Next, similar to Example 1, the outlines of the target character's clothing (including the polka dot pattern) and hands are recognized, and design lines 9 are placed. Here, the first design line pattern PT1 (3 gradation) is assigned to the hand portion 414, the second design line pattern PT2 (2 gradation) is assigned to the polka dot portion of the clothing 417, the third design line pattern PT3 (1 gradation) is assigned to the clothing portion (excluding the polka dot pattern) 415, and the black pattern PTb (0 gradation) is assigned to the background portion 416. After this, design lines 9 are placed on each portion 414 to 417. In this way, the design line pattern 220D shown in Figure 20 is obtained.

[0179] As an example of the arrangement of design lines 9, a first pattern (e.g., Figure 15A) may be used for the arrangement of common design lines 9a, and a second pattern consisting only of dedicated design line 9b1 and a third pattern consisting only of dedicated design line 9b2 may be used for the arrangement of dedicated design lines 9b (see, for example, Figure 15B). Alternatively, a pattern including all design lines (e.g., Figure 16A) may be used to form common design lines 9a and dedicated design lines 9b1 and 9b2 across the entire drawing area, and then unnecessary parts may be deleted.

[0180] In the design line pattern 220D, multiple common design lines 9a and multiple dedicated design lines 9b1 are arranged in the polka dot pattern area 417. Each dedicated design line 9b1 is placed between two adjacent common design lines 9a.

[0181] The common design line 9a located in the polka dot pattern area 417 extends from the polka dot pattern area 417 across the garment area 415 to the hand area 414. The dedicated design line 9b1 located in the polka dot pattern area 417 has its end on the outline of the polka dot pattern and does not extend to the garment area 415. Therefore, the area ratio of the design line 9 in the polka dot pattern area 417 is larger than that of the garment area 415 by the amount of the dedicated design line 9b1 (it appears brighter after grooving). In the hand area 414, two dedicated design lines 9b1 and 9b2 are positioned between adjacent common design lines 9a. Therefore, after grooving, the hand area 414 appears even brighter than the polka dot pattern area 417.

[0182] The special design line 9b1 of the polka dot section 417 is in the same position in the Y direction as one of the special design lines 9b1 of the hand section 414. Therefore, the special design line 9b1 appears to jump over the clothing section 415 and connect to the special design line 9b1 of the hand section 414.

[0183] Next, drawing data including positional information for each design line shown in the design line pattern 220D of Figure 20 is created, and this data is used to perform laser processing on the power generation layer. In this way, a display pattern 220 showing the character's clothes and hands is formed, as shown in Figure 21. In the display pattern 220, the hands are in a bright (3-tone) first region r1, the polka dot pattern of the clothes is in a second region r2 (2-tone), the clothes are in a third region r3 (1-tone), which is darker than the polka dot pattern, and the background is in a dark (0-tone) fourth region r4. In Figure 21, a virtual boundary L3 between the second region r2 and the third region r3 of the polka dot pattern is shown by a solid line.

[0184] (Effects) In this embodiment, the method for creating processing data (drawing data) for a photoelectric conversion layer to form drawing grooves involves forming a first design line pattern representing a first grayscale and a second design line pattern representing a second grayscale that is darker than the first grayscale. Next, as shown in Figure 17A, a first region (e.g., face portion 411) and a second region (e.g., bangs and mouth portion 412) divided by the contour of the target pattern 200T are determined. Subsequently, as shown in Figures 17B and 17C, the first design line pattern is placed in the first region and the second design line pattern is placed in the second region, and the positional information of the design lines 9 placed in the first and second regions is recorded.

[0185] According to the above method, processing data (drawing data) for processing the photoelectric conversion layer to form drawing grooves can be easily created. The drawing data created by this method can be applied to various laser processing devices. When processing the photoelectric conversion layer, for example, drawing grooves can be formed so that the ends are positioned at the start and end points of the design lines according to the drawing data. Therefore, by using the drawing data, the processing of the photoelectric conversion layer for forming the display pattern 200 based on the target pattern 200T can be made easier. Furthermore, in the above method, since design line patterns can be assigned to each part 411 to 413 of the target pattern 200T, it can also be applied to complex patterns.

[0186] Furthermore, using the method described above, it is possible to easily determine multiple types of design line patterns to be assigned to the target pattern 200T.

[0187] In this embodiment, a third design line pattern may be formed to represent a third brightness level between the first and second gradations. As shown in Figure 20, the third design line pattern may be placed in a third region of the target pattern (for example, the polka dot pattern portion 417 shown in Figure 20). In addition, in this embodiment, a pattern PTb without design lines may be used to represent a fourth gradation that is darker than the first and second gradations. As shown in Figure 17C, a pattern PTb without design lines may be placed in a fourth region of the target pattern (for example, the eye and nose portion 413). In this way, by increasing the types of design line patterns used, it is possible to easily create drawing data that can enhance the design quality of the display pattern.

[0188] In this embodiment, the first design line pattern consists of a common design line 9a and a dedicated design line 9b, and the second design line pattern consists of the common design line 9a. The common design line 9a may be formed across the first region and the second region.

[0189] The fourth region is surrounded by the first region, and the dedicated design line 9b of the first region may be formed by jumping over the fourth region.

[0190] In this embodiment, each of the design lines 9 placed in the first and second regions may be composed of multiple sub-design lines, each having a width smaller than the width of the design line. In this case, the position information of the drawing data includes the position information of the ends of the multiple sub-design lines. The positions of the ends of the multiple sub-design lines may be offset in the X direction at the boundary between the first and second regions. With this configuration, when placing the design line pattern on the target pattern, the positions in the X direction of the ends of the multiple sub-design lines that constitute the same design line 9 can be made different depending on the contour. Therefore, a display pattern 200 that is more faithful to the target pattern 200T can be formed.

[0191] Furthermore, in the drawing data creation method of this embodiment, for example, a first design line pattern PT1 is determined in which design lines 9 extending linearly along the X direction and having a line width dw are arranged periodically in the Y direction. By removing some of the design lines (dedicated design lines) 9b from the design lines 9 arranged in the first design line pattern PT1, a second design line pattern PT2 is determined in which the remaining design lines (common design lines) 9a are arranged periodically in the Y direction. Next, the contour of the target pattern 200T is recognized, and a first part (e.g., face part 411) to which the first design line pattern PT1 is assigned, and a second part (e.g., bangs and mouth part 412) adjacent to the first part to which the second design line pattern PT2 is assigned, are determined. Subsequently, design lines 9 are placed in the first part using the first design line pattern PT1, and design lines 9 are placed in the second part using the second design line pattern PT2. At this time, the design lines 9 are arranged such that each of the design lines 9a of the second part connects to one of the design lines 9 of the first part (common design line 9a) at the boundary where the first part and the second part intersect in the X direction. The areas of the first and second parts where the design lines 9 are arranged correspond to the areas in the predetermined pattern display area DR of the photoelectric conversion layer where the drawing grooves 5 are formed. The positional information of the start and end points of each of the design lines 9 arranged in the first and second parts is recorded as drawing data.

[0192] The first width dw of the design line 9 and the space width dv1, which is the distance between two adjacent design lines 9, may be determined so that the area ratio of the design line 9 is less than or equal to the upper limit, thereby forming a basic unit U. The first design line pattern PT1 is created by repeating this basic unit U. This makes it easy to form a design line pattern that satisfies design rules such as the maximum opening ratio M.

[0193] The drawing data may be created using a computer. Alternatively, a program (or program product) may be created to cause a computer to execute some or all of the above methods for creating the drawing data, and the drawing data may be created using this program. The program may be recorded on a computer-readable recording medium.

[0194] The method for processing the photoelectric conversion layer in this embodiment involves inputting the drawing data for processing formed by the above method into a processing device, and processing the photoelectric conversion layer using the processing device to form a plurality of drawing grooves. Processing the photoelectric conversion layer includes scanning a laser beam (for example, in the X direction) from a position corresponding to the start point to a position corresponding to the end point of a design line in a predetermined pattern display area of ​​the photoelectric conversion layer. With this configuration, regardless of the complexity or size of the pattern, it is possible to more easily form a plurality of drawing grooves of a predetermined length at a predetermined position and display the pattern.

[0195] 《Second Embodiment》 In the first embodiment described above (for example, Figure 5), multiple regions with different area ratios (aperture ratios) of the drawing grooves are provided in the photoelectric conversion layer by varying the arrangement pitch of the drawing grooves. In contrast, the second embodiment differs from the configuration of the first embodiment in that multiple regions with different aperture ratios are provided in the photoelectric conversion layer by varying the width of the drawing grooves.

[0196] Figure 22 is a top view illustrating a portion of the display pattern in the pattern display area DR, and also shows enlarged views of each area of ​​the display pattern. As shown in Figure 22, the pattern display area DR has a display pattern 230 of the face of a character ("Panasonic Shop Boy") formed by a plurality of drawing grooves 5. In the following, we will mainly explain the differences from the first embodiment (Figure 5), and will omit redundant explanations as appropriate.

[0197] In this embodiment as well, the pattern display area DR has a plurality of drawing grooves 5 arranged in a plan view. Each drawing groove 5 extends linearly along the X direction.

[0198] The display pattern 230 shown in Figure 22 has a first region r1 and a second region r2 in which drawing grooves 5 are arranged, and a third region r3 in which no drawing grooves 5 are arranged. In this example, the character's face (excluding the eyes, nose, and mouth) is in the first region r1, the mouth and bangs are in the second region r2, and the eyes and nose are in the third region r3. The width w2 of the drawing grooves 5 in the first region r1 is greater than the width w1 of the drawing grooves 5 in the second region r2. This makes it possible to make the opening ratio of the first region r1 greater than that of the second region r2. As shown in the figure, the arrangement pitch of the drawing grooves 5 in the first region r1 and the second region r2 may be designed to be the same.

[0199] In the example shown in Figure 22, at least one of the drawing grooves 5 (for example, groove 5k) extends from the first region r1 across the first boundary L1 to the second region r2. Groove 5k has a wide portion 55 that is wider in the Y direction and a narrow portion 56 that is narrower than the wide portion 55. Groove 5k is positioned such that the wide portion 55 is located in the first region r1 (face portion) and the narrow portion 56 is located in the second region r2 (mouth portion). In this way, by partially narrowing the width of one drawing groove 5, it is possible to make the widths of the drawing grooves 5 in the first region r1 and the second region r2 different while aligning their positions in the Y direction.

[0200] In this embodiment, each drawing groove 5 has a common groove 5a that extends from a first region r1 across a first boundary L1 to a second region r2, and a dedicated groove 5b that extends from the first region r1 to the first boundary L1 and has one end 51b at the first boundary L1. The common groove 5a and the dedicated groove 5b are connected in the Y direction to constitute one drawing groove 5. Therefore, each drawing groove 5 can have a wide portion 55 composed of the common groove 5a and the dedicated groove 5b, and a narrow portion 56 that includes the common groove 5a but does not include the dedicated groove 5b.

[0201] As shown in Figure 22, in a plan view, a step 54 is formed on the side surface of a drawing groove (e.g., groove 5k) that extends across the first boundary L1 by the end 51b of the dedicated groove 5b. The step 54 is located on the first boundary L1. The first boundary L1 can be seen as an outline because the step 54 of the drawing groove 5k (i.e., the end 51b of the dedicated groove 5b) is arranged at intervals.

[0202] As shown in an enlarged view in Figure 22, in the first region r1, a wide section 55, composed of a common groove 5a and a dedicated groove 5b, is arranged in the Y direction with a distance v3 between them. The width w2 of the drawing groove 5 (width of the wide section 55) in the first region r1 is the sum of the width w1 of the common groove 5a and the width w3 of the dedicated groove 5b. For example, the ratio of width w2 to distance v3 is w2:v3 = 1:4, and the opening ratio is 20%. The width w2 of the wide section 55 is, for example, three times the width w1 of the common groove 5a.

[0203] On the other hand, in the second region r2, a narrow section 56 consisting only of a common groove 5a with width w1 is arranged in the Y direction at a distance v4. As an example, the ratio of the width of the drawing groove 5 (width of the common groove 5a) w1 to the distance v4 in the second region r2 is w1:v4 = 1:14, and the opening ratio of the second region r2 is 6.7%.

[0204] In Figure 22, the width w3 of the dedicated groove 5b is twice the width w1 of the common groove 5a, but the ratio of these widths is not particularly limited. The widths of the common groove 5a and the dedicated groove 5b can be adjusted, for example, by the number of laser scans (number of sub-grooves). Therefore, the aperture ratios of each region r1 and r2 are not particularly limited as long as they are less than or equal to the maximum aperture ratio M, and can be set as appropriate.

[0205] As shown in Table 5, in this embodiment as well, the pattern 230 can be represented in three gradations by the first region r1 of gradation 2, the second region r2 of gradation 1, and the third region r3 of gradation 0.

[0206]

[0207] In this embodiment of the photoelectric conversion device, the width w2 in the Y direction of the drawing groove 5 in the first region r1 is greater than the width w1 in the Y direction of the drawing groove 5 in the second region r2. With this configuration, the gradations of the two regions r1 and r2 can be easily made different. Furthermore, compared to the configuration of the first embodiment, the width of the power generation region located between the drawing grooves 5 can be increased when the aperture ratio is the same. Therefore, the influence of the formation of the drawing grooves 5 on power generation performance can be reduced. Moreover, compared to the configuration of the first embodiment, the number of inner surfaces 5s1 and 5s2 of the drawing grooves 5 can be reduced when the aperture ratio is the same. Therefore, the total area of ​​the photoelectric conversion layer exposed on the inner surfaces 5s1 and 5s2 of the drawing grooves 5 can be reduced, thus reducing the damage to the photoelectric conversion layer 32 caused by the formation of the drawing grooves.

[0208] In this embodiment, as in the first embodiment, the filler material 7 is also placed inside the drawing groove 5 (see Figure 8I). With this configuration, the photoelectric conversion layer exposed on the inner surfaces 5s1 and 5s2 of the drawing groove 5 can be protected. Since the filler material 7 is translucent, it does not hinder the visibility of the surface pattern. Furthermore, because the filler material 7 is translucent, it becomes possible to make the photoelectric conversion device 100 function as a double-sided light-receiving module.

[0209] According to this embodiment, at least one groove 5k of the plurality of drawing grooves 5 has a step 54 in plan view at the first boundary L1, which makes the width w2 of the first region r1 larger than the width w1 of the second region r2. The step 54 is formed by the end of the dedicated groove 5b. With this configuration, the design and processing of the drawing grooves 5 are made easier by the common groove 5a, and the first boundary L1 can be represented (made visible) by the arrangement of the steps 54.

[0210] (Method for creating drawing data) The photoelectric converter of this embodiment can also be manufactured in the same manner as the first embodiment. Furthermore, drawing data can be created in the same manner as the first embodiment. However, in this embodiment, the design line pattern of the drawing data differs from that of the first embodiment.

[0211] Figures 23A to 23C show the method for forming the design line pattern in this embodiment. Below, we will mainly explain the differences from the first embodiment, and redundant explanations will be omitted as appropriate.

[0212] Similar to the first embodiment, the maximum aperture ratio M and the number of grayscale levels N are determined (S11). Here, the maximum aperture ratio M is set to 20% and the number of grayscale levels N is set to 3.

[0213] As shown in Figure 23A, the basic unit U is determined based on the maximum aperture ratio M (S12). In this example, the basic unit U is the same as in the first embodiment and consists of a design line 9 with width dw and a space 10 with width dv1. The ratio of the line width dw to the space width dv1 is set to dw:dv1 = 1:4 so that the area ratio of the design line 9 is 20%.

[0214] Next, in a basic pattern in which multiple basic units U are arranged in the Y direction, a portion of the design lines 9 are designated as common design lines 9a, and the remaining design lines are designated as dedicated design lines 9b. As an example, multiple (in this case, two) basic units U arranged in the Y direction may be considered as a set, and a portion of the design lines from each set may be designated as common design lines 9a, and the remaining design lines as dedicated design lines 9b. The common design lines 9a are the design lines corresponding to the common groove 5a shown in Figure 22, and the dedicated design lines 9b are the design lines corresponding to the dedicated groove 5b shown in Figure 22.

[0215] Next, as shown in Figure 23B, the dedicated design line 9b in the basic pattern is moved in the Y direction so as to be tangent to the common design line 9a, forming a single wide line 90. The wide line 90 has the sum of the widths of the common design line 9a and the dedicated design line 9b. In this way, a first design line pattern PT1 in which the wide lines 90 are arranged is obtained (S131). In the first design line pattern PT1, wide lines 90 with line width dw1 (= dw × 2) are arranged in the Y direction with a distance dv1 between them. In this example, dw1:dv1 = 1:4, and the area ratio R1 of the design line 9 is 20%.

[0216] Next, as shown in Figure 23C, the dedicated design line 9b is removed from the first design line pattern PT1 in Figure 23B to form the second design line pattern PT2 (S132). In the second design line pattern PT2, common design lines 9a with line width dw2 (<dw1) are arranged with a distance dv2 in the Y direction. In this example, dw2:dv2 = 1:9, and the area ratio R2 of the design lines 9 is 10%.

[0217] In this embodiment as well, the first design line pattern PT1 is used to represent a bright first tone (tone 2), and the second design line pattern PT2 is used to represent a second tone (tone 1) that is darker than the first design line pattern PT1. A black pattern (tone 0) without design lines may also be used.

[0218] - Modification 3 of the design line pattern Figure 24 shows modification 3 of the design line pattern.

[0219] In the third modified example, three basic units U arranged in the Y direction in the basic pattern are treated as a set, and two design lines 9 from each set of basic units U are designated as dedicated design lines 9b1 and 9b2, while the remaining design line 9 is designated as a common design line 9a.

[0220] Next, as shown in Figure 24, the two dedicated design lines 9b1 and 9b2 of each pair are moved in the Y direction to the common design line 9a to form a wide line 90. The wide line 90 has the sum of the widths of the dedicated design lines 9b1 and 9b2 and the common design line 9a. In this way, a first design line pattern PT1 is obtained in which wide lines 90 with line width dw1 (= dw × 3) are arranged in the Y direction with a distance dv1 between them. In this example, dw1:dv1 = 1:4, and the area ratio R1 of the design line 9 is 20%.

[0221] Next, dedicated design lines 9b1 and 9b2 are removed from the first design line pattern PT1. This creates a second design line pattern PT2 in which the common design line 9a is arranged in the Y direction with a distance dv2 between them. In this example, dw2:dv2 = 1:14, and the area ratio R2 of the design line 9 is 6.7%.

[0222] In this modified example, the first design line pattern PT1 is used to represent the brightest gradation 2, the second design line pattern PT2 is used to represent the intermediate gradation 1, and the black pattern PTb is used to represent the darkest gradation 0.

[0223] ・4 Modified Design Line Patterns In this embodiment as well, by varying the number of design lines removed from the first design line pattern PT1, two or more design line patterns showing intermediate colors can be formed.

[0224] Figure 25 shows a modified example 4 of the design line pattern. Modified example 4 differs from modified example 3 in that it uses four design line patterns to achieve four grayscale levels (N=4).

[0225] The first design line pattern PT1 shown in Figure 25 is the same as the first design line pattern PT1 in Modification 3 (Figure 24).

[0226] In this modified example, a wide line 91 is formed by removing only one of the dedicated design lines (in this case, the dedicated design line 9b2) from the first design line pattern PT1. The wide line 91 has a total width dw2 of the common design line 9a and the dedicated design line 9b1. In this way, the wide lines 91 are arranged in the Y direction with a distance dv2 between them to obtain the second design line pattern PT2. In this example, dw2:dv2 = 2:13, and the area ratio R2 of the design line 9 is approximately 13.3%.

[0227] Furthermore, both dedicated design lines 9b1 and 9b2 are removed from the first design line pattern PT1. As a result, the common design line 9a forms a third design line pattern PT3, which is arranged in the Y direction with a distance dv3 between them. In this example, dw3:dv3 = 1:14, and the area ratio R2 of the design line 9 is 6.7%.

[0228] In modified example 4, the first design line pattern PT1 is used to represent the brightest gradation 3, the second design line pattern PT2 is used to represent the intermediate gradation 2, the third design line pattern PT3 is used to represent the intermediate gradation 1, and the black pattern PTb is used to represent the darkest gradation 0.

[0229] <S20: Recognition of the outline of the target pattern ~ S50: Creation of drawing data> After determining the design line pattern using the method described above, the target pattern is recognized and design lines are placed on each part of the target pattern using the same method as in the first embodiment. The method of placing the design lines is not particularly limited. A first pattern (for example, Figure 15A) may be used to form only the common design line 9a, and a second pattern (for example, Figure 15B) may be used to form only the dedicated design line 9b. Alternatively, a pattern including the common design line 9a and the dedicated design line 9b (for example, Figure 16A) may be used to place these design lines 9a and 9b over the entire drawing area, and then unnecessary parts may be removed.

[0230] Next, drawing data including positional information for each design line is created, similar to the first embodiment. By using the obtained drawing data to perform laser processing on the power generation layer, a pattern can be displayed on the surface of the power generation layer.

[0231] In this embodiment, the first design line pattern PT1 is a pattern in which a wide line 90 composed of two or more design lines 9a and 9b is arranged at a distance from each other in the Y direction, and the second design line pattern PT2 is a pattern in which some of the design lines 9b of the two or more design lines that make up the wide line 90 are removed. By creating drawing data using such a pattern, it becomes easier to process the photoelectric conversion layer to form drawing grooves with different line widths in each region.

[0232] Note that each design line pattern is not limited to the examples shown in Figures 23 to 25. For example, the first design line pattern PT1 may include design lines of width dw (common design lines or dedicated design lines) in addition to wide lines. Also, the method of forming the design line pattern is not limited to the above. For example, if the maximum aperture ratio M is sufficiently large, the basic pattern may be used as the first design line pattern PT1, and the second design line pattern PT2 may be formed by narrowing the width of each design line in the first design line pattern PT1.

[0233] (Example 3) Next, an example of the method for creating drawing data in this embodiment will be described. Figure 26 shows the design line pattern of Example 3. In Figure 26, the face of a character ("Panasonic Shop Boy") is used as the target pattern. Figure 27 shows the display pattern formed based on the design line pattern of Figure 26.

[0234] In this embodiment, the maximum aperture ratio M is set to 20%. The number of grayscale levels N is set to 3, and the first design line pattern PT1 and the second design line pattern PT2 and the black pattern PTb shown in Figure 24 are used.

[0235] In this embodiment, as in Embodiment 1, the outline of the target pattern is recognized, and the parts of the bangs, face, eyes, nose, and mouth are identified. Next, the first design line pattern PT1 is assigned to the character's face part (excluding the eyes, nose, and mouth) 411, the second design line pattern PT2 is assigned to the mouth and bangs part 412, and the black pattern PTb is assigned to the eyes and nose part 413. Subsequently, design lines are placed on each part 411 to 413 of the target pattern along the assigned design line patterns. In this way, the design line pattern 230D shown in Figure 26 is obtained.

[0236] Next, the positional information of each design line in the design line pattern 230D is recorded to create drawing data. Then, similar to Example 1, laser processing is performed according to the drawing data to form a common groove 5a at the position corresponding to the common design line 9a in the power generation layer, and a dedicated groove 5b at the position corresponding to the dedicated design line 9b.

[0237] In this way, as shown in Figure 27, a display pattern 230 can be formed using multiple drawing grooves 5. The character's face is in a bright (2-tone) first region r1, the bangs and mouth are in a second region r2 with intermediate brightness (1-tone), and the eyes and nose are in a dark (0-tone) third region r3.

[0238] Figure 28 shows another example of the design line pattern of Example 3. In Figure 28, the character's clothing and hands are used as the target pattern. Figure 29 shows a display pattern formed based on the design line pattern shown in Figure 28.

[0239] The design line pattern 240D shown in Figure 28 can also be formed in the same manner as described above. Here, the first design line pattern PT1 (grayscale 2) is assigned to the hand portion 414, the second design line pattern PT2 (grayscale 1) is assigned to the clothing portion 415, and the black pattern PTb (grayscale 0) is assigned to the background portion 416.

[0240] Next, drawing data including positional information for each design line shown in the design line pattern 240D is created, and laser processing of the power generation layer is performed using this data. In this way, a display pattern 240 showing the character's clothes and hands can be formed, as shown in Figure 29. In the display pattern 240, the hands are in a bright (2-tone) first region r1, the clothes are in a medium brightness (1-tone) second region r2, and the background is in a dark (0-tone) third region r3.

[0241] (Example 4) Figure 30 shows the design line pattern of Example 4, and Figure 31 is a top view showing the drawing groove pattern (display pattern) formed in the pattern display area DR of the power generation unit using the drawing data of Example 4. Example 4 differs from Example 3 in that it displays the pattern using 4 grayscale levels (N=4). The method for creating the drawing data of Example 4 will be described below.

[0242] In this embodiment, the maximum aperture ratio M is set to 20%. The number of grayscale levels N is set to 4, and the first design line patterns PT1 to PT3 and the black pattern PTb shown in Figure 25 are used.

[0243] In this embodiment as well, the outlines of the character's clothing and hands are recognized and design line patterns are assigned in the same manner as in Embodiment 3. Here, the first design line pattern PT1 (3 gradation) is assigned to the hand portion 414, the second design line pattern PT2 (2 gradation) is assigned to the polka dot portion 417 of the clothing, the third design line pattern PT3 (1 gradation) is assigned to the portion of the clothing other than the polka dot portion 415, and the black pattern PTb (0 gradation) is assigned to the background portion 416. After this, design lines 9 are placed on each portion 414 to 417. In this way, the design line pattern 250D shown in Figure 30 is formed.

[0244] For the arrangement of the design lines 9, one example may be to use a first pattern consisting of common design lines 9a (for example, Figure 15A), a second pattern consisting only of dedicated design lines 9b1, and a third pattern consisting only of dedicated design lines 9b2 (see, for example, Figure 15B). Alternatively, a pattern including all design lines (for example, Figure 16A) may be used to form a wide line 90 across the entire drawing area, and then unnecessary parts may be deleted.

[0245] The polka dot pattern area 417 has a wide line 91 consisting of a common design line 9a and a dedicated design line 9b1. The common design line 9a extends from the polka dot pattern area 417 to the clothing area 415 and the hand area 414. Only the common design line 9a is present in the clothing area 415, and there are no dedicated design lines. Therefore, the polka dot pattern area 417 has a larger area ratio of design lines than the clothing area 415 due to the presence of the dedicated design line 9b1 (it appears brighter after grooving). The hand area 414 has a wide line 90 consisting of the common design line 9a and two dedicated design lines 9b1 and 9b2. Therefore, after grooving, the hand area 414 appears even brighter than the polka dot pattern area 417.

[0246] One of the dedicated design lines 9b1 of the polka dot pattern section 417 and one of the dedicated design lines 9b1 of the hand section 414 are in the same position in the Y direction. Therefore, it appears as if the dedicated design line 9b1 jumps over the clothing section 415 and connects to the dedicated design line 9b1 of the hand section 414.

[0247] Next, drawing data including positional information for each design line shown in the design line pattern 250D of Figure 30 is created, and laser processing of the power generation layer is performed using this data. In this way, a display pattern 250 showing the character's clothes and hands is formed, as shown in Figure 31. In the display pattern 250, the hands are in a bright (3-tone) first region r1, the polka dot pattern of the clothes is in a second region r2 (2-tone), the parts of the clothes other than the polka dot pattern are in a third region r3 (1-tone), which is darker than the polka dot pattern, and the background is in a dark (0-tone) fourth region r4. In Figure 31, a virtual boundary L3 between the second region r2 and the third region r3 of the polka dot pattern is shown by a solid line.

[0248] This disclosure is not limited to the embodiments and examples described above, and design modifications are possible without departing from the spirit of this disclosure. Furthermore, by appropriately combining the configurations of any embodiment among the various embodiments illustrated (including modifications), the effects of each can be achieved.

[0249] <Outline of Embodiments> <Item 1> A method for creating processing data for a photoelectric conversion layer, wherein a plurality of drawing grooves are formed in the photoelectric conversion layer and penetrate in the thickness direction, and a pattern is displayed in a predetermined area of ​​the photoelectric conversion layer by the plurality of drawing grooves in a plan view along the thickness direction, the method comprising: forming a first design line pattern representing a first gradation and a second design line pattern representing a second gradation that is darker than the first gradation, each of which represents an arrangement of design lines corresponding to a drawing groove; determining a first area and a second area divided by the contour of a target pattern; arranging the first design line pattern in the first area and the second design line pattern in the second area; and recording positional information of the design lines arranged in the first area and the second area. <Item 2> The method according to Item 1, wherein a third design line pattern is formed to represent a third brightness between the first and second gradations, the target pattern has a third region, and the third design line pattern is placed in the third region. <Item 3> The method according to Item 1 or 2, wherein a pattern without design lines is formed to represent a fourth gradation that is darker than the first and second gradations, the target pattern has a fourth region, and the pattern without design lines is placed in the fourth region. <Item 4> The method according to any one of Items 1 to 3, wherein the first design line pattern consists of a common design line and a dedicated design line, and the second design line pattern consists of a common design line. <Item 5> The method according to Item 4, wherein the common design line and the dedicated design line are in contact. <Item 6> The method according to Item 4 or 5, wherein the common design line is formed spanning the first region and the second region. <Item 7> The method according to any one of items 4 to 6, wherein the target pattern has a fourth region, the pattern without the design line is placed in the fourth region, the fourth region is surrounded by the first region, and the dedicated design line of the first region is formed by jumping over the fourth region. <Item 8> The method according to any one of items 4 to 7, wherein the end of the dedicated design line is located at the boundary between the first region and the second region.<Item 9> The method according to any one of items 1 to 8, wherein each of the design lines placed in the first region and the second region is composed of a plurality of sub-design lines with a width smaller than the width of the design line, and the position information includes position information of the ends of the plurality of sub-design lines. <Item 10> The method according to item 9, wherein the positions of the ends of the plurality of sub-design lines are offset in the X direction at the boundary portion between the first region and the second region. <Item 11> The method according to any one of items 1 to 10, wherein an upper limit is set for the area ratio of the design line, and the first design line pattern is determined such that the area ratio of the design line is less than or equal to the upper limit. <Item 12> The method according to any one of items 1 to 11, wherein the design line extends linearly in a first direction from a starting point to an ending point, and the boundary between the first region and the second region includes a portion that intersects with the first direction. <Item 13> A method for processing a photoelectric conversion layer, comprising: inputting processing data formed by the method of any one of Items 1 to 12 into a processing device; processing the photoelectric conversion layer using the processing device to form the plurality of drawing grooves; and the processing of the photoelectric conversion layer comprising scanning a laser beam in the predetermined region of the photoelectric conversion layer from a position corresponding to the start point to a position corresponding to the end point of a design line based on the position information. <Item 14> A method for manufacturing a photoelectric conversion device, comprising: preparing a laminate including the photoelectric conversion layer and a pair of electrode layers facing each other with the photoelectric conversion layer in the thickness direction; inputting processing data formed by the method of any one of Items 1 to 12 into a processing device; processing the laminate using the processing device to form the plurality of drawing grooves; and the processing of the laminate comprising scanning a laser beam from one surface side of the laminate in the predetermined region of the photoelectric conversion layer from a position corresponding to the start point to a position corresponding to the end point of a design line based on the position information.<Item 15> A method for creating processing data for a photoelectric conversion layer, wherein a plurality of drawing grooves are formed in the photoelectric conversion layer and penetrate in the thickness direction, and a pattern is displayed in a predetermined area of ​​the photoelectric conversion layer by the plurality of drawing grooves in a plan view along the thickness direction, the method comprising: determining a first design line pattern in which design lines extending linearly in a first direction and having a first width are periodically arranged in a second direction perpendicular to the first direction; determining a second design line pattern in which the remaining design lines are periodically arranged in the second direction by removing some of the design lines arranged in the first design line pattern; preparing a target pattern to be displayed; recognizing the contour of the target pattern, and determining a first part to which the first design line pattern is assigned, and a second part adjacent to the first part to which the second design line pattern is assigned, among a plurality of parts defined by the contour. A method for creating processing data, wherein, at the boundary between the first part and the second part intersecting the first direction, design lines are arranged in the first part using the first design line pattern, and design lines are arranged in the second part using the second design line pattern, such that each design line of the second part connects to one of the design lines of the first part, the areas of the first part and the second part in which the design lines are arranged correspond to the areas in the predetermined area of ​​the photoelectric conversion layer in which the plurality of drawing grooves are formed, and the positional information of the start and end points of each of the design lines arranged in the first part and the second part is recorded as processing data. <Item 16> A program for causing a computer to perform the method described in any one of items 1 to 12 and 15.<Item 17> A drawing method for drawing a pattern on the surface of a cell having a laminated structure including a photoelectric conversion layer by scraping the photoelectric conversion layer, wherein an upper limit is set for the area ratio of the portion of the photoelectric conversion layer that is scraped in the region on the surface where the pattern is drawn, the drawing method comprises: preparing a target pattern to be drawn on the surface, defining the outline of the target pattern, arranging a first design line pattern (PT1 (Figure 12)) in a first region (r1 (Figure 6), 411 (Figure 17C)) enclosed by the outline, and the first design line pattern is designed so that the area ratio of the design lines does not exceed the upper limit. <Item 18> The drawing method according to Item 17, wherein the target pattern is divided into a plurality of regions (r1, r3 (Figure 6), 411, 413 (Figure 17C)) including the first region by the contour, the gradation is set for each of the plurality of regions, the number of design lines per unit area in each of the plurality of regions is determined according to the gradation, and the area ratio of the design lines in the region with the brightest gradation among the plurality of regions (r1 (Figure 6), 411 (Figure 17C)) is set so as not to exceed the upper limit. <Item 19> A method for creating processing data for a photoelectric conversion layer, for drawing a pattern on the surface of a cell having a laminated structure including a photoelectric conversion layer by scraping the photoelectric conversion layer, comprising: preparing a target pattern to be drawn on the surface; defining the outline of the target pattern; recognizing a first region and a second region (r1, r3 (Figure 6), 411, 413 (Figure 17C)) adjacent to each other and separated by the outline; setting a first tone in the first region (r1, 411) and a second tone darker than the first tone in the second region (r3, 413); arranging a design line pattern (PT1 (Figure 12)) representing the first tone in the first region; and recording positional information of the first ends of a plurality of first design lines (9 (Figure 17C), design lines corresponding to groove 5e in Figure 6) arranged in the first region. A method wherein the first ends of the plurality of first design lines are arranged at a distance from each other along the contour, defining a contour line (L2 (Figure 6)) that divides the first region and the second region.<Item 20> The method according to Item 19, wherein the first design line is composed of a plurality of first sub-design lines (corresponding to sub-grooves 501 to 505 in Figure 6

[0163] ) arranged in the width direction (Y) of the first design line (design line corresponding to groove 5e in Figure 6), the ends of the plurality of first sub-design lines on the first end side are arranged along the contour to define the contour line (L2 (Figure 6)), at the first end of at least one first design line, the positions of the ends of at least two first sub-design lines are shifted along the contour in the extending direction (X) of the first design line, and the position information includes position information of the ends of the plurality of first sub-design lines. <Item 21> The method according to Item 19, wherein a second design line (a design line corresponding to groove 5f in Figure 6) having a notch along the contour is arranged in the first region, the second design line is composed of a plurality of second sub-design lines (corresponding to sub-grooves 511 to 514 in Figure 6

[0163] ) arranged in the width direction (Y) of the second design line, some of the plurality of second sub-design lines (511 to 513) extend to the contour and have ends that define the contour line (L2 (Figure 6)), and the other second sub-design line (514) does not have ends at a position that defines the contour line.

[0250] The method for creating processing data for a photoelectric conversion layer, the program, the method for processing a photoelectric conversion layer, and the method for manufacturing a photoelectric conversion device according to this disclosure are useful because they allow patterns to be displayed on the photoelectric conversion layer. For example, they can enhance the design of photoelectric conversion devices applied to building materials and the like.

[0251] 1. First substrate 1a, 2a Main surface 2. Second substrate 3. Power generation section 4A, 4B Extraction electrodes 5, 5c-5k Drawing groove 5a Common groove 5b Dedicated groove 5s1, 5s2 Inner surface 5t1, 5t2 Inner end surface 6. Sealing member 7. Filler material 8. Solar cell 9. Design line 9a Common design line 9b, 9b1, 9b2 Dedicated design line 10. Space 30. Power generation layer 31. Lower electrode layer 32. Photoelectric conversion layer 33. Upper electrode layer 34. n-type semiconductor layer 35. p-type semiconductor layer 50. Sub-grooves 51, 52, 52c, 52d End 53. Bottom surface 54. Step 55. Wide section 56. Narrow section 81, 82. Separation groove 90, 91. Wide line 100. Photoelectric conversion device 200, 201, 210, 220, 230, 240, 250 Display patterns 200D, 210D, 220D, 230D, 240D, 250D, 400D Design line patterns 200T, 400T Target patterns 411 Face area 412 Bangs and mouth area 413 Eyes and nose area 414 Hand area 415 Clothing area 416 Background area 417 Polka dot area 420 First pattern 430 Second pattern 440 Pattern 501-505, 511-514 Openings d1-d3 First part-Third part DR Pattern display area dv1 Basic unit space width dw Line width L1 First boundary L2 Second boundary L3 Third boundary PT1 First design line pattern PT2 Second design line pattern PT3 Third design line pattern PTb Black pattern PV Photoelectric conversion section r1-r4 First to fourth regions U, U1, U2, U3 Basic unit LE Lower electrode UE Upper electrode v1, v2, v3, v4 Distance between drawing grooves w1, w2, w3 Width of drawing grooves

Claims

1. A method for creating processing data for a photoelectric conversion layer, wherein a plurality of drawing grooves are formed in the photoelectric conversion layer, and a pattern is displayed in a predetermined area of ​​the photoelectric conversion layer by the plurality of drawing grooves in a plan view, the method comprising: forming a first design line pattern representing a first grayscale and a second design line pattern representing a second grayscale that is darker than the first grayscale; determining a first area and a second area divided by the contour of a target pattern; arranging the first design line pattern in the first area and the second design line pattern in the second area; and recording positional information of the design lines arranged in the first area and the second area.

2. The method according to claim 1, wherein a third design line pattern is formed that represents a third brightness level between the first and second levels, the target pattern has a third region, and the third design line pattern is placed in the third region.

3. The method according to claim 1, wherein the design line-less pattern has a fourth grayscale that is darker than the first grayscale and the second grayscale, the target design has a fourth region, and the design line-less pattern is placed in the fourth region.

4. The method according to claim 1, wherein the first design line pattern consists of a common design line and a dedicated design line, and the second design line pattern consists of a common design line.

5. The method according to claim 4, wherein the common design line and the dedicated design line are in contact.

6. The method according to claim 4, wherein the common design line is formed spanning the first region and the second region.

7. The method according to claim 4, wherein the target pattern has a fourth region, a pattern without the design lines is placed in the fourth region, the fourth region is surrounded by the first region, and the dedicated design lines of the first region are formed by jumping over the fourth region.

8. The method according to claim 4, wherein the end of the dedicated design line is located at the boundary between the first region and the second region.

9. The method according to claim 1, wherein each of the design lines arranged in the first region and the second region is composed of a plurality of sub-design lines having a width smaller than the width of the design line, and the position information includes position information of the ends of the plurality of sub-design lines.

10. The method according to claim 9, wherein the positions of the ends of the plurality of sub-design lines are offset in the X direction at the boundary portion between the first region and the second region.

11. The method according to claim 1, wherein an upper limit is set for the area ratio of the design lines, and the first design line pattern is determined such that the area ratio of the design lines is less than or equal to the upper limit.

12. The method according to claim 1, wherein the design line extends linearly in a first direction from a starting point to an ending point, and the boundary between the first region and the second region includes a portion that intersects with the first direction.

13. A method for processing a photoelectric conversion layer, comprising: inputting processing data formed by the method according to any one of claims 1 to 12 into a processing device; and forming the plurality of drawing grooves by processing the photoelectric conversion layer using the processing device, wherein the processing of the photoelectric conversion layer includes scanning a laser beam in the predetermined region of the photoelectric conversion layer based on the position information of the design line.

14. A method for manufacturing a photoelectric converter, comprising: preparing a laminate including the photoelectric conversion layer and a pair of electrode layers facing each other with the photoelectric conversion layer in the thickness direction; inputting processing data formed by the method of any one of claims 1 to 12 into a processing device; forming the plurality of drawing grooves by processing the laminate using the processing device; and the processing of the laminate comprising scanning a laser beam from one surface side of the laminate in the predetermined region of the photoelectric conversion layer based on the position information of the design line.

15. A method for creating processing data for a photoelectric conversion layer, wherein a plurality of drawing grooves are formed in the photoelectric conversion layer, and a pattern is displayed in a predetermined area of ​​the photoelectric conversion layer in a plan view by the plurality of drawing grooves, the method comprising: determining a first design line pattern in which design lines extending linearly in a first direction and having a first width are periodically arranged in a second direction perpendicular to the first direction; determining a second design line pattern in which the remaining design lines are periodically arranged in the second direction by removing some of the design lines arranged in the first design line pattern; preparing a target pattern to be displayed; recognizing the contour of the target pattern, and determining a first portion to which the first design line pattern is assigned, and a second portion adjacent to the first portion to which the second design line pattern is assigned, among a plurality of portions defined by the contour. A method for creating processing data, comprising: arranging design lines in the first portion using the first design line pattern at the boundary between the first portion and the second portion intersecting the first direction, such that each design line of the second portion connects to one of the design lines of the first portion; arranging design lines in the second portion using the second design line pattern; the regions of the first portion and the second portion where the design lines are arranged corresponding to the regions of the photoelectric conversion layer where the plurality of drawing grooves are formed; and recording the positional information of the start and end points of each of the design lines arranged in the first portion and the second portion as processing data.

16. A program for causing a computer to perform the method according to any one of claims 1 to 12.

17. A drawing method for drawing a pattern on the surface of a cell having a laminated structure including a photoelectric conversion layer by scraping the photoelectric conversion layer, wherein an upper limit is set for the area ratio of the portion of the photoelectric conversion layer that is scraped in the region on the surface where the pattern is drawn, the drawing method comprises: preparing a target pattern to be drawn on the surface, defining the outline of the target pattern, arranging a first design line pattern in a first region enclosed by the outline, and the first design line pattern being designed such that the area ratio of the design lines does not exceed the upper limit.

18. The drawing method according to claim 17, wherein the target pattern is divided into a plurality of regions including the first region by the contour, the gradation is set for each of the plurality of regions, the number of design lines per unit area in each of the plurality of regions is determined according to the gradation, and the area ratio of the design lines in the region with the brightest gradation among the plurality of regions is set so as not to exceed the upper limit.

19. A method for creating processing data for a photoelectric conversion layer, for drawing a pattern on the surface of a cell having a laminated structure including a photoelectric conversion layer by scraping the photoelectric conversion layer, comprising: preparing a target pattern to be drawn on the surface; defining the outline of the target pattern; recognizing a first region and a second region adjacent to each other and separated by the outline; setting a first tone in the first region and a second tone darker than the first tone in the second region; arranging a design line pattern representing the first tone in the first region; recording positional information of the first ends of a plurality of first design lines arranged in the first region; and arranging the first ends of the plurality of first design lines at a distance from each other along the outline, defining an outline line that divides the first region and the second region.

20. The method according to claim 19, wherein the first design line is composed of a plurality of first sub-design lines arranged in the width direction of the first design line, the ends of the plurality of first sub-design lines on the first end side are positioned along the contour to define the contour line, at least at the first end of one first design line, the positions of the ends of at least two first sub-design lines are offset along the contour in the direction of extension of the first design line, and the position information includes position information of the ends of the plurality of first sub-design lines.

21. The method according to claim 19, wherein a second design line having a notch along the contour is arranged in the first region, the second design line is composed of a plurality of second sub-design lines arranged in the width direction of the second design line, some of the plurality of second sub-design lines extend to the contour and have ends that define the contour line, and the other second sub-design lines do not have ends that define the contour line.

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