Cleaning system and cleaning method

Abstract

The present invention provides a cleaning system and a cleaning method in which the usability of the cleaning system can be enhanced.　This cleaning system is for cleaning a nozzle 83a provided with a discharge nozzle 83b and a suction nozzle 83c, and comprises: a cleaning tank 120; an operation control unit for controlling a discharge operation and a suction operation; and an assisting unit 122 provided to the cleaning tank 120, the assisting unit 122 being for assisting with removal of deposits adhering to the outside of the nozzle 83a by a first cleaning liquid W1 discharged from the discharge nozzle 83b. When the deposits are to be removed in an arrangement state, the operation control unit adjusts a discharge flow rate of the first cleaning liquid W1 by the discharge nozzle 83b such that deposits are removed by the first cleaning liquid W1 discharged from the discharge nozzle 83b and then assisted by the assisting unit.

Description

Washing system and washing method

[0001] The present invention relates to a washing system and a washing method.

[0002] Conventionally, a system for cleaning nozzles used in an automatic analyzer has been proposed. In such a system, for example, first, a cleaning liquid is discharged from the discharge part of the nozzle into the cleaning tank, and the cleaning liquid flowing down along the outer peripheral surface of the suction part of the nozzle provided so as to contact the discharge part of the nozzle is sucked by the suction part of the nozzle. Next, after once stopping the suction of the cleaning liquid by the suction part of the nozzle and a predetermined amount of cleaning liquid has accumulated in the cleaning tank, the discharge of the cleaning liquid by the discharge part of the nozzle is stopped. Then, a system for cleaning the suction part of the nozzle by sucking the cleaning liquid in the cleaning tank by the suction part of the nozzle in a state where the suction part of the nozzle is immersed in the cleaning liquid in the cleaning tank is disclosed (for example, see Patent Document 1).

[0003] Japanese Patent Application Laid-Open No. 2015-215277

[0004] By the way, in recent years, regardless of whether the discharge part and the suction part of the nozzle are provided so as to contact each other, deposits composed of the components of the cleaning liquid used for cleaning the suction part of the nozzle adhere to the outside of the part of the nozzle that is not immersed in the cleaning liquid. Therefore, there is an increasing need to remove the deposits. However, in the above conventional system, as described above, it only cleans the suction part of the nozzle. For example, since an operator has to manually remove the above deposits, there is a problem that the work becomes troublesome. Therefore, there is room for improvement from the viewpoint of the usability of the system.

[0005] The present invention is for solving the problems in the above prior art, and an object thereof is to provide a washing system and a washing method capable of enhancing the usability of the washing system.

[0006] To solve the above-mentioned problems and achieve the objective, the cleaning system according to claim 1 is a cleaning system for cleaning a nozzle comprising: a discharge nozzle capable of discharging a first cleaning liquid for cleaning a discharge nozzle and a second cleaning liquid different from the first cleaning liquid, which is a second cleaning liquid for cleaning a suction nozzle; and a suction nozzle capable of sucking up the first cleaning liquid and the second cleaning liquid discharged from the discharge nozzle, wherein the system comprises: a cleaning tank for collecting the first cleaning liquid or the second cleaning liquid discharged from the discharge nozzle; a discharge operation for discharging the first cleaning liquid or the second cleaning liquid from the discharge nozzle into the cleaning tank; and a suction operation for sucking up the first cleaning liquid or the second cleaning liquid discharged into the cleaning tank into the suction nozzle. The operation control means for controlling the operation, and the auxiliary means provided in the cleaning tank for assisting in the removal of deposits adhering to the outside of the nozzle, which consist of components contained in the second cleaning liquid, by the first cleaning liquid discharged from the discharge nozzle, wherein the operation control means adjusts the discharge flow rate of the first cleaning liquid from the discharge nozzle so that, when the deposits are to be removed, the deposits are removed by the first cleaning liquid discharged from the discharge nozzle and then assisted by the auxiliary means, in an arrangement where the discharge port of the discharge nozzle and the suction nozzle are positioned in the cleaning tank such that the discharge port of the discharge nozzle is positioned above the suction port of the suction nozzle.

[0007] The cleaning system according to claim 2 is the cleaning system according to claim 1, wherein the operation control means adjusts the discharge flow rate of the second cleaning liquid by the discharge nozzle so that, in the arrangement, when the suction nozzle is cleaned with the second cleaning liquid, the second cleaning liquid discharged from the discharge nozzle is not assisted by the auxiliary means, so that the discharged second cleaning liquid does not come into contact with the discharge nozzle.

[0008] The cleaning system according to claim 3 is the cleaning system according to claim 1 or 2, wherein the auxiliary means is configured such that, in the arrangement, the upper end of the auxiliary means is positioned above the attachment portion on the nozzle to which the deposits adhere.

[0009] The cleaning system according to claim 4 is the cleaning system according to claim 3, wherein the auxiliary means is a curved first auxiliary part, and the first auxiliary part is capable of covering a part of the side surface of the nozzle in the arrangement state.

[0010] The cleaning system according to claim 5 is the cleaning system according to claim 3, wherein the auxiliary means comprises a first auxiliary part capable of covering a part of the side surface of the nozzle in the arranged state, and a ring-shaped second auxiliary part provided on the first auxiliary part, the second auxiliary part capable of covering the area around the attachment portion and / or the portion near the same of the nozzle in the arranged state.

[0011] The cleaning method according to claim 6 is a cleaning method for cleaning a nozzle, comprising a cleaning system, a discharge nozzle capable of discharging a first cleaning liquid for cleaning the discharge nozzle and a second cleaning liquid different from the first cleaning liquid, which is a second cleaning liquid for cleaning the suction nozzle, and a suction nozzle capable of sucking up the first cleaning liquid and the second cleaning liquid discharged from the discharge nozzle, wherein the cleaning system comprises a cleaning tank for collecting the first cleaning liquid or the second cleaning liquid discharged from the discharge nozzle, an operation control means for controlling a discharge operation that discharges the first cleaning liquid or the second cleaning liquid from the discharge nozzle into the cleaning tank and a suction operation that sucks up the first cleaning liquid or the second cleaning liquid discharged into the cleaning tank into the suction nozzle, and auxiliary means provided in the cleaning tank, wherein the deposits adhering to the outside of the nozzle consist of components contained in the second cleaning liquid. The cleaning method comprises auxiliary means for assisting in the removal of the deposits by the first cleaning liquid discharged from the discharge nozzle, and includes a discharge step in which the operation control means discharges the first cleaning liquid or the second cleaning liquid into the cleaning tank from the discharge nozzle in an arrangement in which the discharge nozzle and the suction nozzle are arranged such that the discharge port of the discharge nozzle is located above the suction port of the suction nozzle in the cleaning tank, and a suction step in which the operation control means, after the discharge step, causes the first cleaning liquid or the second cleaning liquid discharged into the cleaning tank to be sucked into the suction nozzle, wherein the discharge step includes adjusting the discharge flow rate of the first cleaning liquid by the discharge nozzle so that when the deposits are removed, the deposits are removed by the first cleaning liquid that has been discharged in the discharge step and then assisted by the auxiliary means.

[0012] According to the cleaning system described in claim 1, the operation control means adjusts the discharge flow rate of the first cleaning liquid from the discharge nozzle so that, when adhering material is to be removed in the configured state, the adhering material is removed by the first cleaning liquid which is discharged from the discharge nozzle and then assisted by the auxiliary means. Therefore, compared to the conventional technology (a technology that cleans only the suction nozzle with cleaning liquid), it is possible to remove adhering material that adheres to the nozzle. Thus, the effort required for the removal work can be reduced, and the usability of the cleaning system can be improved.

[0013] According to the cleaning system described in claim 2, in the configured state, when the suction nozzle is being cleaned with the second cleaning liquid, the operation control means adjusts the discharge flow rate of the second cleaning liquid from the discharge nozzle so that the second cleaning liquid discharged from the discharge nozzle does not come into contact with the discharge nozzle, by ensuring that the second cleaning liquid does not come into contact with the discharge nozzle. Therefore, when the suction nozzle is being cleaned, it is possible to avoid the second cleaning liquid coming into contact with the discharge nozzle and to suppress the adhesion of deposits to the discharge nozzle.

[0014] According to the cleaning system described in claim 3, the auxiliary means is configured such that, in the arranged state, the upper end of the auxiliary means is positioned above the attachment portion on the nozzle where the deposits adhere. Compared to the case where the upper end of the auxiliary part and the attachment portion on the nozzle are at the same position, the deposits can be effectively removed by the first cleaning liquid, thereby enhancing the function of the auxiliary means.

[0015] According to the cleaning system described in claim 4, the auxiliary means is a curved first auxiliary part, and the first auxiliary part is capable of covering a part of the side surface of the nozzle in its arranged state. Compared to the case where the first auxiliary part is flat, the first cleaning liquid can effectively remove deposits, and the function of the auxiliary means can be further enhanced.

[0016] According to the cleaning system described in claim 5, the auxiliary means comprises a first auxiliary part capable of covering a part of the side surface of the nozzle in its arranged state, and a ring-shaped second auxiliary part provided on the first auxiliary part, which is capable of covering the area around the attachment portion of the nozzle and / or its vicinity in its arranged state. Compared to the case where only the first auxiliary part is provided, the first cleaning liquid can be efficiently applied to the attachment portion of the nozzle and / or its vicinity when the deposits adhering to the nozzle are removed, and the deposits can be effectively removed.

[0017] According to the cleaning method described in claim 6, in the discharge step, the operation control means includes adjusting the discharge flow rate of the first cleaning liquid by the discharge nozzle so that when the adhering material is removed, the adhering material is removed by the first cleaning liquid that is discharged in the discharge step and then assisted by the auxiliary means. Therefore, compared to the conventional technique (a technique in which only the suction nozzle is cleaned with cleaning liquid), it is possible to remove the adhering material that adheres to the nozzle. Thus, the effort required for the removal work can be reduced, and the usability of the cleaning system can be improved.

[0018] This is a plan view showing an overview of an analytical apparatus according to an embodiment of the present invention. This is a perspective view of the cleaning tank seen from above. This is a perspective view of the cleaning tank seen from below. This is a longitudinal cross-sectional view of the cleaning tank. This is a cross-sectional view taken along the line A-A in Figure 4. This is a block diagram showing the electrical configuration of the first control unit. This is a diagram showing the first discharge process, corresponding to Figure 5. This is a diagram showing the second discharge process, corresponding to Figure 5. This is a diagram showing a modified auxiliary unit, corresponding to Figure 4. This is a cross-sectional view taken along the line B-B in Figure 9.

[0019] The following describes in detail embodiments of the cleaning system and cleaning method according to the present invention with reference to the attached drawings. First, the basic concept of the embodiment [I] will be described, then the specific details of the embodiment [II] will be described, and finally, modifications of the embodiment [III] will be described. However, the present invention is not limited by the embodiments.

[0020] [I] Basic Concepts of the Embodiment First, the basic concepts of the embodiment will be explained. The embodiment generally relates to a cleaning system and cleaning method for cleaning a nozzle, which comprises a discharge nozzle capable of discharging a first cleaning liquid and a second cleaning liquid, and a suction nozzle capable of sucking up the first cleaning liquid and the second cleaning liquid discharged from the discharge nozzle.

[0021] Here, "first cleaning solution" refers to a liquid used to clean the discharge nozzle, and is a concept that includes, for example, purified water (such as ion-exchanged water or sterile water), pure water, etc., but in this embodiment, it will be described as purified water.

[0022] Furthermore, the "second cleaning solution" is a different solution from the first cleaning solution and refers to a solution used to clean the suction nozzle. This concept includes, for example, a water-soluble liquid containing a substance that precipitates salt when dried (for example, Tris, NaCl, a surfactant, etc.). In this embodiment, it will be described as a water-soluble cleaning solution containing NaCl.

[0023] Furthermore, "cleaning" means removing dirt from the nozzle.

[0024] Furthermore, the "analytical device" to which the washing system is applied is a device for analyzing a sample in a reaction vessel, as described later, in the reaction line described later. This analytical device is a concept that includes, for example, an automated analyzer for separating, identifying, and analyzing target substances, but in this embodiment, it is described as an automated analyzer for performing analysis of samples such as blood using CLEIA (Chemiluminescent Enzyme Immunoassay), which uses an enzyme and a luminescent substrate as labeling substances.

[0025] [II] Specific details of the embodiment Next, the specific details of the embodiment will be described.

[0026] (Configuration) First, the configuration of the analytical apparatus to which the cleaning system according to the embodiment is applied will be described.

[0027] In the following explanation, the X direction in Figure 1 will be referred to as the left-right direction of the analyzer (-X direction is the left direction of the analyzer, and +X direction is the right direction of the analyzer), the Y direction in Figure 1 will be referred to as the front-back direction of the analyzer (+Y direction is the front direction of the analyzer, and -Y direction is the rear direction of the analyzer), and the Z direction in Figure 2 will be referred to as the up-down direction of the analyzer (+Z direction is the up direction of the analyzer, and -Z direction is the down direction of the analyzer).

[0028] As shown in Figure 1, the analytical apparatus 1 sequentially transports reaction vessels C3 (for example, resin containers) for reacting the sample and reagents to multiple predetermined locations, performs various predetermined operations at each of these locations to perform the analysis, and discards the reaction vessels C3 after the analysis.

[0029] As shown in Figure 1, this analytical apparatus 1 includes a reaction vessel supply unit 10, a reagent storage unit 20, a sample storage unit 30, a tip supply unit 42, a reaction vessel transport unit 50, a reagent dispensing unit 60, a sample dispensing unit 70, a reaction tank 80, a tip collection unit 92, a photometric unit 101, a state detection unit 103, a cleaning system 110, a first control unit 140, and a second control unit 150.

[0030] Furthermore, to explain the connection configuration of each part in this analytical apparatus 1, specifically, each of the functional units such as the reaction vessel supply unit 10, reagent storage unit 20, sample storage unit 30, reaction vessel transport unit 50, reagent dispensing unit 60, sample dispensing unit 70, reaction tank 80, photometric unit 101, state detection unit 103, and cleaning system 110 are connected to the first control unit 140 via wiring (for example, electrical wiring or optical cables, etc.) not shown, and can be operated under the control of the first control unit 140.

[0031] Furthermore, a "functional unit" refers to a unit necessary to realize each function of the analytical device 1, and includes, for example, a unit that operates under the control of the first control unit 140 using sensors, actuators, etc.

[0032] (Configuration - reaction vessel supply unit, reagent storage unit, sample storage unit, tip supply unit) The reaction vessel supply unit 10 is a reaction vessel storage and alignment means for accommodating and aligning multiple reaction vessels C3 before use, and is configured using, for example, a known parts feeder.

[0033] The reagent storage unit 20 is a reagent storage means for storing reagent containers C1 (for example, magnetic particle liquid bottles, labeled body solution bottles, sample diluent bottles, etc.) containing reagents at a predetermined temperature, and is configured using, for example, a known reagent refrigerator.

[0034] The specimen storage unit 30 is a specimen storage means for storing a plurality of specimen containers C2 (for example, known test tube-shaped containers), and is configured using a known storage unit that, for example, houses a plurality of specimen racks R that hold at least one or more specimen containers C2 by the specimen dispensing unit 70, or has the function of transporting specimens to a position where they can be aspirated.

[0035] The chip supply unit 42 is a chip storage and alignment means for storing and aligning multiple chip units before use, and is configured using, for example, a known parts feeder.

[0036] (Configuration - Reaction Vessel Transport Unit) The reaction vessel transport unit 50 is a reaction vessel transport means for transporting the reaction vessel C3, which is housed in the reaction vessel supply unit 10, to the reaction line 81 of the reaction tank 80. It is configured using, for example, a known transport mechanism that can move in a three-dimensional direction, and as shown in Figure 1, it is located near the reaction vessel supply unit 10 and the reaction tank 80.

[0037] (Configuration - Reagent Dispensing Unit) The reagent dispensing unit 60 is for dispensing reagents from the reagent container C1 stored in the reagent storage unit 20 to the reaction vessel C3 which has been transported to the reaction line 81 of the reaction vessel 80. This reagent dispensing unit 60 is configured using a known dispensing device (for example, a dispensing device that combines a known robot arm using a stepper motor, etc. with a suction and discharge mechanism using a pump) equipped with a dispensing nozzle that can move in a three-dimensional direction (not shown; hereinafter referred to as "reagent dispensing nozzle"), and as shown in Figure 1, it is located in the vicinity of the reagent storage unit 20 and the reaction vessel 80.

[0038] (Configuration - Sample Dispensing Unit) The sample dispensing unit 70 is for dispensing samples from sample containers C2 stored in the sample storage unit 30 to reaction vessel C3 located on the reaction line 81 of the reaction vessel 80. As shown in Figure 1, the sample dispensing unit 70 is located in the vicinity of the sample storage unit 30 and the reaction vessel 80.

[0039] Further, the sample dispensing unit 70 is configured using, for example, a known dispensing device. Specifically, it includes a dispensing nozzle (hereinafter referred to as the "sample dispensing nozzle", not shown in the figure) that can move in three-dimensional directions, and a sample dispensing syringe (not shown in the figure) that discharges or aspirates a sample to the sample dispensing nozzle through a sample dispensing flow path not shown in the figure.

[0040] Here, since there is a risk that the tip of the sample dispensing nozzle may be contaminated by the discharge or aspiration of the sample from the sample dispensing nozzle, in order to avoid such problems, in the embodiment, a chip portion not shown in the figure is provided on the sample dispensing nozzle.

[0041] Here, the chip portion is formed of, for example, a resin chip (as an example, a pipette chip), and is provided detachably with respect to the sample dispensing nozzle.

[0042] (Configuration - Reaction Tank) The reaction tank 80 is a tank for reacting a sample and a reagent in a plurality of reaction vessels C3. As shown in FIG. 1, this reaction tank 80 includes a reaction line 81, a cleaning unit 83, and a substrate dispensing unit 84.

[0043] (Configuration - Reaction Tank - Reaction Line) The reaction line 81 is a reaction means for reacting a sample and a reagent in a plurality of reaction vessels C3. This reaction line 81 is configured using, for example, a known conveying type reaction line (as an example, an annular reaction line), etc.

[0044] Further, as shown in FIG. 1, a plurality of hole portions 81a for detachably accommodating the reaction vessel C3 from above are provided in this reaction line 81.

[0045] (Configuration - Reaction Tank - Washing Unit) The washing unit 83 applies the magnetic force of a magnet from the outside to the reaction vessel C3, collects the magnetic particle reagent and the immune complex bound thereto on the inner surface of the reaction vessel C3, dispenses a separation washing liquid (for example, the second washing liquid, etc.) not shown into the reaction vessel C3, and repeats the washing operation of sucking (the operation related to so-called "B / F separation"), thereby washing away the inner surface of the reaction vessel C3 while leaving the magnetic particle reagent collected on the inner surface of the reaction vessel C3 and the immune complex bound thereto. As shown in FIG. 1, at least one or more of these washing units 83 are provided in the vicinity of the reaction line 81 (in FIG. 1, four are provided).

[0046] Further, the washing unit 83 is configured using, for example, a known washing device.

[0047] Specifically, as shown in FIGS. 4 and 5, the washing unit 83 includes nozzles 83a (in FIG. 4, two nozzles 83a are provided) and a moving unit (not shown in the figure. For example, it is composed of a known moving mechanism that can move in the two-dimensional or three-dimensional direction) for moving the nozzles 83a in the two-dimensional or three-dimensional direction.

[0048] Further, the nozzle 83a includes a discharge nozzle 83b, a suction nozzle 83c, and a nozzle housing portion 83d.

[0049] Among these, the discharge nozzle 83b is capable of discharging the first washing liquid W1 in FIG. 8 and the second washing liquid W2 in FIG. 7. This discharge nozzle 83b is configured using, for example, a known discharge nozzle, and is connected via a first supply tank (not shown in the figure) that supplies the first washing liquid W1 and a first discharge flow path (not shown in the figure), and is also connected via a second supply tank (not shown in the figure) that supplies the second washing liquid W2 and a second discharge flow path (not shown in the figure).

[0050] Further, the suction nozzle 83c is capable of sucking the first washing liquid W1 and the second washing liquid W2 discharged from the discharge nozzle 83b. This suction nozzle 83c is configured using, for example, a known suction nozzle 83c that is longer than the discharge nozzle 83b, and is connected via a waste liquid tank (not shown in the figure) that stores the first washing liquid W1 and the second washing liquid W2 sucked by the suction nozzle 83c and a suction flow path (not shown in the figure).

[0051] Furthermore, while the method of installing the discharge nozzle 83b and the suction nozzle 83c is arbitrary, in this embodiment, as shown in Figures 4 and 5, the discharge port of the discharge nozzle 83b is located above the suction port of the suction nozzle 83c, and the discharge nozzle 83b and the suction nozzle 83c are installed in close proximity so that the first cleaning liquid W1 or the second cleaning liquid W2 discharged from the discharge nozzle 83b flows along the suction nozzle 83c.

[0052] However, the invention is not limited to this, and for example, the discharge port of the discharge nozzle 83b may be located above the suction port of the suction nozzle 83c, and the discharge nozzle 83b and the suction nozzle 83c may be spaced apart by a predetermined distance so that the first cleaning liquid W1 or the second cleaning liquid W2 discharged from the discharge nozzle 83b does not flow along the suction nozzle 83c.

[0053] Furthermore, the nozzle housing section 83d is for housing a portion of the discharge nozzle 83b and a portion of the suction nozzle 83c. This nozzle housing section 83d is formed as a long tubular body, and as shown in Figure 4, the lower end of the nozzle housing section 83d is positioned above the lower end of the discharge nozzle 83b and the lower end of the suction nozzle 83c, and a portion of the discharge nozzle 83b and a portion of the suction nozzle 83c are housed within the nozzle housing section 83d.

[0054] (Configuration - Reaction Vessel - Substrate Dispensing Unit) Returning to Figure 1, the substrate dispensing unit 84 dispenses the substrate (substrate solution) supplied from the substrate solution tank (not shown) into the reaction vessel C3 via a pump (not shown). This substrate dispensing unit 84 is configured using, for example, a known dispensing device, and is located near the reaction line 81, as shown in Figure 1.

[0055] (Configuration - Tip Removal Outer Part) The tip removal outer part 92 is a tip removal means for removing the tip attached to the sample dispensing nozzle of the sample dispensing unit 70. As shown in Figure 1, this tip removal outer part 92 is located near the tip supply unit 42.

[0056] Furthermore, the tip removal outer casing 92 is constructed using, for example, a known removal tool. Specifically, as shown in Figure 1, the tip removal outer casing 92 comprises an inverted L-shaped tip removal outer casing body 92a and a rectangular tip-side notch 92b formed on the upper side piece of the tip removal outer casing body 92a.

[0057] (Configuration - Photometric Unit) The photometric unit 101 measures the amount of chemiluminescence of the product of the enzymatic reaction. This photometric unit 101 is configured using, for example, a known photometric device (for example, a photometric device capable of counting the number of photons using a photomultiplier tube), and is located near the reaction line 81, as shown in Figure 1.

[0058] (Configuration - State Detection Unit) The state detection unit 103 is a state detection means that detects whether the chip unit is attached. This state detection unit 103 is configured using, for example, a known sensor (for example, an imaging means such as a camera), and is provided in the vicinity of the reaction line 81, as shown in Figure 1.

[0059] (Configuration - Cleaning System) The cleaning system 110 is for cleaning the nozzle 83a of the cleaning unit 83, and as shown in Figures 1 and 5, it includes a cleaning tank 120 and an overflow detection unit 130.

[0060] (Configuration - Cleaning System - Cleaning Tank) Returning to Figure 1, the cleaning tank 120 is for collecting the first cleaning liquid W1 or the second cleaning liquid W2 discharged from the discharge nozzle 83b of the cleaning unit 83. Each of these cleaning tanks 120 is provided in the vicinity of each cleaning unit 83, specifically, as shown in Figure 1, they are provided inside the reaction line 81.

[0061] Furthermore, as shown in Figures 2 to 5, the cleaning tank 120 includes a cleaning tank body 121, an auxiliary section 122, and a discharge section 123.

[0062] (Configuration - Cleaning System - Cleaning Tank - Cleaning Tank Body) Returning to Figure 2, the cleaning tank body 121 is the basic structure of the cleaning tank 120, and is formed from a block-shaped body made of resin (or metal), and is fixed to a fixed object (not shown) provided inside the analytical device 1 via a fixing member (for example, a fixing flange, etc.).

[0063] Furthermore, while the specific shape and size of the washing tank body 121 are arbitrary, in this embodiment they are set as follows.

[0064] In other words, the planar shape of the washing tank body 121 is set to be rectangular. However, it is not limited to this, and may be set to a circular or elliptical shape, for example.

[0065] Furthermore, the length of the cleaning tank body 121 in the left-right direction is set to a length that allows the two auxiliary parts 122 to be accommodated inside the cleaning tank 120 (specifically, inside the first housing part 121a described later), and may be set to be longer than the sum of the left-right lengths of the two auxiliary parts 122 (for example, it may be set to be about twice the sum of the left-right lengths of the auxiliary parts 122).

[0066] Furthermore, the length of the cleaning tank body 121 in the front-to-back direction is set to a length that allows the two auxiliary parts 122 to be accommodated inside the cleaning tank 120 (specifically, inside the first housing part 121a described later), and may be set to be longer than the length of the auxiliary parts 122 in the front-to-back direction (for example, it may be set to be about twice the length of the auxiliary parts 122 in the front-to-back direction).

[0067] Furthermore, the vertical length of the cleaning tank body 121 is set to a length that allows the entire auxiliary section 122 to be accommodated inside the cleaning tank 120 (specifically, inside the first housing section 121a, which will be described later). For example, it may be set to be longer than the vertical length of the auxiliary section 122 (for example, it may be set to be about twice the vertical length of the auxiliary section 122).

[0068] Furthermore, as shown in Figures 2 to 5, the washing tank body 121 is provided with a first housing section 121a, a second housing section 121b, and a connecting section 121c.

[0069] (Configuration - Cleaning system - Cleaning tank - Cleaning tank body - First housing section) Returning to Figure 2, the first housing section 121a is for housing the auxiliary section 122. As shown in Figure 2, this first housing section 121a is formed in the shape of a groove that is recessed downward from the upper end of the cleaning tank body 121.

[0070] Furthermore, while the specific shape and size of the first housing section 121a are arbitrary, in this embodiment they are set as follows.

[0071] In other words, the planar shape of the first housing section 121a is set to be rectangular. However, it is not limited to this, and may be set to be circular or elliptical, for example.

[0072] Furthermore, the length of the first housing section 121a in the left-right direction is set to a length that allows the two auxiliary sections 122 to be housed within the first housing section 121a. For example, it may be set to be shorter than the left-right length of the washing tank body 121, and longer than the sum of the left-right lengths of the two auxiliary sections 122.

[0073] Furthermore, the length of the first housing section 121a in the front-to-back direction is set to a length that allows the two auxiliary sections 122 to be housed within the first housing section 121a. For example, it may be set to be shorter than the length of the washing tank body 121 in the front-to-back direction, and longer than the length of the auxiliary sections 122 in the front-to-back direction.

[0074] Furthermore, the vertical length of the first housing section 121a is set to a length that allows the entire auxiliary section 122 to be housed within the first housing section 121a. For example, it may be set to be shorter than the vertical length of the washing tank body 121 and longer than the vertical length of the auxiliary section 122 (for example, it may be set to about half the vertical length of the washing tank body 121).

[0075] (Configuration - Cleaning system - Cleaning tank - Cleaning tank body - Second storage section) The second storage section 121b is for storing the first cleaning liquid W1 or the second cleaning liquid W2. As shown in Figures 4 and 5, the second storage section 121b is formed in the shape of a groove that is recessed downward from the bottom portion of the first storage section 121a.

[0076] Furthermore, while the specific shape and size of the second housing section 121b are arbitrary, in this embodiment they are set as follows.

[0077] In other words, the planar shape of the second housing section 121b is set to be circular. However, it is not limited to this, and may be set to a rectangular or elliptical shape, for example.

[0078] Furthermore, the diameter of the second housing section 121b is set to a length that can accommodate the suction nozzle 83c of the cleaning section 83. For example, it may be set to be larger than the outer diameter of the suction nozzle 83c of the cleaning section 83, and the diameter of the second housing section 121b may decrease as it goes downwards.

[0079] Furthermore, the vertical length of the second housing section 121b is set to such a length that, when the suction nozzle 83c of the cleaning section 83 is cleaned with the second cleaning liquid W2, the entire portion of the suction nozzle 83c of the cleaning section 83 that is to be cleaned is immersed in the second cleaning liquid W2 accumulated in the second housing section 121b and the connecting section 121c. For example, it may be set to a length of about half the vertical length of the suction nozzle 83c of the cleaning section 83.

[0080] (Configuration - Cleaning system - Cleaning tank - Cleaning tank body - Connection part) Returning to Figure 4, the connection part 121c is for connecting the second housing part 121b and the auxiliary part 122. As shown in Figures 4 and 5, this connection part 121c is formed into a cylindrical body and is provided between the second housing part 121b and the auxiliary part 122.

[0081] Furthermore, while the specific shape and size of the connecting portion 121c are arbitrary, in this embodiment they are set as follows.

[0082] In other words, the planar shape of the connecting portion 121c is set to be annular. However, it is not limited to this, and may be set to a rectangular or elliptical shape, for example.

[0083] Furthermore, the inner diameter of the connecting portion 121c is set to a length that can accommodate the suction nozzle 83c of the cleaning portion 83. For example, it may be set to be larger than the outer diameter of the suction nozzle 83c of the cleaning portion 83.

[0084] Furthermore, the vertical length of the connecting portion 121c is set to such a length that, when the suction nozzle 83c of the cleaning portion 83 is cleaned with the second cleaning liquid W2, the entire portion of the suction nozzle 83c of the cleaning portion 83 that is to be cleaned is immersed in the second cleaning liquid W2 accumulated in the second storage portion 121b and the connecting portion 121c. For example, it may be set to a length of about one-quarter of the vertical length of the suction nozzle 83c of the cleaning portion 83.

[0085] (Configuration - Cleaning System - Cleaning Tank - Auxiliary Section) Returning to Figure 4, the auxiliary section 122 is an auxiliary means for assisting in the removal of deposits (not shown) adhering to the outside of the nozzle 83a of the cleaning section 83 by the first cleaning liquid W1 discharged from the discharge nozzle 83b of the cleaning section 83.

[0086] Here, "adhering to the outside of nozzle 83a" means, for example, adhering to the outside of discharge nozzle 83b (specifically, the outer peripheral surface and / or the end on the discharge side of discharge nozzle 83b), the outside of suction nozzle 83c (specifically, the outer peripheral surface of suction nozzle 83c that overlaps with discharge nozzle 83b or the portion nearby thereto), or / or the outside of nozzle housing 83d (specifically, the outer peripheral surface and / or the lower end of nozzle housing 83d) (that is, adhering to the portion of nozzle 83a that is not immersed in the second cleaning liquid W2 when suction nozzle 83c is cleaned by the second cleaning liquid W2). However, in this embodiment, it will be explained as adhering to the outside of discharge nozzle 83b.

[0087] Furthermore, "adhered matter" refers to components contained in the second cleaning liquid W2. In this embodiment, this adhering matter is described as salt that crystallizes after the second cleaning liquid W2 discharged from the discharge nozzle 83b of the cleaning unit 83 adheres to the outside of the discharge nozzle 83b of the cleaning unit 83 and then dries.

[0088] However, this is not limited to the above. For example, if the suction nozzle 83c of the cleaning unit 83 is close to the discharge nozzle 83b of the cleaning unit 83, the salt may crystallize when the second cleaning liquid W2 discharged from the discharge nozzle 83b adheres to the outer surface of the suction nozzle 83c of the cleaning unit 83 and dries, or / or the discharged second cleaning liquid W2 enters the space between the discharge nozzle 83b and the suction nozzle 83c, then rises by capillary action, adheres to the nozzle housing 83d, and dries, resulting in crystallized salt.

[0089] Furthermore, "assisting" means guiding the first cleaning liquid W1 discharged from the discharge nozzle 83b of the cleaning unit 83 via the auxiliary unit 122 to the adhering portion of the nozzle 83a so that the adhering material can be removed by the first cleaning liquid W1.

[0090] Furthermore, the "adhesion portion of nozzle 83a" refers to the portion of the nozzle 83a of the cleaning unit 83 to which adhering material adheres. In this embodiment, it is described as the portion of the outer circumferential surface of the discharge nozzle 83b of the cleaning unit 83, from the end on the discharge side to a predetermined height (for example, about 5 mm to 10 mm).

[0091] As shown in Figures 4 and 5, two of these auxiliary sections 122 are provided within the first housing section 121a and are connected to the second housing section 121b via connecting sections 121c.

[0092] Furthermore, although the specific configuration of the auxiliary part 122 is arbitrary, in this embodiment, the auxiliary part 122 is configured such that, in its arranged state, its upper end is positioned above the attachment portion of the nozzle 83a of the cleaning unit 83.

[0093] Here, "arrangement state" refers to the state in which the discharge nozzle 83b and suction nozzle 83c are arranged in the washing tank 120 such that the discharge port of the discharge nozzle 83b of the washing unit 83 is located above the suction port of the suction nozzle 83c of the washing unit 83, as shown in Figures 4 and 5.

[0094] Furthermore, the details of the configuration of the auxiliary unit 122 are as follows.

[0095] In other words, as shown in Figures 4 and 5, the auxiliary part 122 includes a first auxiliary part 122a and a notch 122b.

[0096] (Configuration - Cleaning system - Cleaning tank - Auxiliary section - First auxiliary section) Returning to Figure 4, the first auxiliary section 122a is the basic structure of the auxiliary section 122 and is formed from a plate-like body made of resin (or metal).

[0097] Furthermore, while the specific shape and size of the first auxiliary part 122a are arbitrary, in this embodiment they are set as follows.

[0098] In other words, the shape of the first auxiliary part 122a is set to be curved so that, when positioned, it can cover a part of the side surface (specifically, the outer circumferential surface) of the nozzle 83a of the cleaning unit 83.

[0099] Specifically, as shown in Figures 4 and 5, the curvature direction of the first auxiliary part 122a is set to be approximately the same as the curvature direction of the rear side (specifically, the -Y direction side) of the outer circumferential surface of the discharge nozzle 83b of the cleaning unit 83 (in Figures 4 and 5, it is an arc shape that is convex toward the rear). However, this is not limited to this, and for example, the curvature direction of the first auxiliary part 122a may be set to be different from the curvature direction of the rear side of the outer circumferential surface of the discharge nozzle 83b of the cleaning unit 83 (for example, an arc shape that is convex toward the front).

[0100] The curvature of the first auxiliary portion 122a may be set to be smaller than or the same as the curvature of the back portion of the outer surface of the discharge nozzle 83b of the cleaning portion 83.

[0101] Furthermore, the length of the first auxiliary section 122a in the left-right direction is set to be longer than the sum of the left-right lengths of the discharge nozzle 83b and suction nozzle 83c of the cleaning section 83, and may be set to, for example, 5 mm to 7 mm.

[0102] Furthermore, the length of the first auxiliary section 122a in the front-to-back direction is set to be longer than the length of the discharge nozzle 83b of the cleaning section 83 in the front-to-back direction, and may be set to, for example, 5 mm to 7 mm.

[0103] Furthermore, the vertical length of the first auxiliary part 122a is set such that, in its configuration, the upper end of the first auxiliary part 122a is positioned above the attachment point of the nozzle 83a of the cleaning unit 83.

[0104] For example, in the arranged state, it is preferable to set the length such that the upper end of the first auxiliary part 122a is located about 20 mm above the attachment portion of the nozzle 83a of the cleaning part 83, and as an example, it may be set to about 22 mm to 25 mm.

[0105] However, the length is not limited to this, and for example, the upper end of the first auxiliary part 122a may be set to be less than 20 mm above the attachment portion of the nozzle 83a of the cleaning unit 83, or the upper end of the first auxiliary part 122a may be set to be more than 20 mm above the attachment portion of the nozzle 83a of the cleaning unit 83.

[0106] With this first auxiliary part 122a, compared to the case where the first auxiliary part 122a is flat, the first cleaning liquid W1 can effectively remove deposits, thereby enhancing the function of the auxiliary part 122.

[0107] (Configuration - Cleaning system - Cleaning tank - Auxiliary section - Notch) Returning to Figure 4, the notch 122b is for adjusting the amount and / or range of the first cleaning liquid W1, which is assisted by the auxiliary section 122, that comes into contact with the discharge nozzle 83b of the cleaning section 83. This notch 122b is provided at the edge end of the first auxiliary section 122a and / or in its vicinity.

[0108] Specifically, as shown in Figures 4 and 5, the notches 122b are provided at the upper end and its vicinity, the left end and its vicinity, and the right end and its vicinity, respectively, of the first auxiliary portion 122a.

[0109] However, this is not limited to the above, and for example, the notch 122b may be provided in only one or two of the following portions of the first auxiliary portion 122a: the upper end and its vicinity, the left end and its vicinity, or the right end and its vicinity.

[0110] As described above, the auxiliary part 122 allows for more effective removal of deposits by the first cleaning liquid W1 compared to the case where the upper end of the auxiliary part 122 and the attachment portion of the nozzle 83a of the cleaning unit 83 are in the same position, thereby enhancing the function of the auxiliary part 122.

[0111] (Configuration - Cleaning System - Cleaning Tank - Discharge Section) Returning to Figure 3, the discharge section 123 is for discharging the first cleaning liquid W1 or the second cleaning liquid W2, which becomes unnecessary when the suction nozzle 83c of the cleaning section 83 is cleaned with the second cleaning liquid W2 and when the deposits described later are removed, to the waste liquid tank. This discharge section 123 is formed of a tubular body and, as shown in Figures 3 and 4, is provided between the bottom portion of the first storage section 121a and the waste liquid tank located below, with the axial direction of the discharge section 123 aligned with the vertical direction.

[0112] Furthermore, while the specific shape and size of the discharge section 123 are arbitrary, in this embodiment they are set as follows.

[0113] In other words, the planar shape of the discharge section 123 is set to an annular shape. However, it is not limited to this, and for example, it may be set to a rectangular annular shape or an elliptical annular shape.

[0114] Furthermore, the inner diameter of the discharge section 123 is set to be such that the discharge flow rate of the first cleaning liquid W1 (or second cleaning liquid W2) from the discharge section 123 exceeds the discharge flow rate of the first cleaning liquid W1 (or second cleaning liquid W2) from the discharge nozzle 83b of the cleaning section 83. For example, it may be set to be larger than or the same as the diameter of the second housing section 121b.

[0115] Furthermore, the vertical length of the discharge section 123 is set to the length from the bottom of the first storage section 121a to the waste liquid tank.

[0116] (Configuration - Cleaning System - Cleaning Tank - Other Configurations) The method for forming the cleaning tank 120 is arbitrary, but in this embodiment, the cleaning tank body 121, auxiliary section 122, and discharge section 123 are integrally formed by molding a resin material using a known molding method (for example, injection molding).

[0117] However, the invention is not limited to this, and for example, the washing tank body 121, auxiliary section 122, and discharge section 123 may be formed by individually molding each of them and then connecting the washing tank body 121, auxiliary section 122, and discharge section 123 using a known connection method.

[0118] (Configuration - Washing System - Overflow Detection Unit) The overflow detection unit 130 is an overflow detection means for detecting whether the first washing liquid W1 or the second washing liquid W2 accumulated in the washing tank 120 has overflowed to the outside of the washing tank 120. This overflow detection unit 130 is configured, for example, using a known overflow detection sensor and is provided outside the washing tank 120.

[0119] Specifically, as shown in Figure 5, the overflow detection unit 130 is positioned to abut against the back portion of the first housing portion 121a of the washing tank 120, and is fixed to the washing tank 120 by a fixing device (not shown) inserted through a second mounting hole 125 formed in the first housing portion 121a.

[0120] For example, if the first cleaning liquid W1 or the second cleaning liquid W2 is being discharged by the discharge nozzle 83b of the cleaning unit 83, and the overflow detection unit 130 detects that the first cleaning liquid W1 or the second cleaning liquid W2 has overflowed outside the cleaning tank 120, a detection signal indicating this detection is transmitted to the first control unit 140, which may then stop the discharge of the first cleaning liquid W1 or the second cleaning liquid W2 by the discharge nozzle 83b of the cleaning unit 83, and / or cause the output unit of the second control unit 150 (described later) to output warning information indicating that the first cleaning liquid W1 or the second cleaning liquid W2 has overflowed outside the cleaning tank 120.

[0121] (Configuration - First Control Unit) The first control unit 140 is a first control means that controls each part of the analyzer 1. Specifically, the first control unit 140 is a computer configured with a CPU, various programs interpreted and executed on the CPU (including basic control programs such as the OS, and application programs that are launched on the OS and realize specific functions), and internal memory such as RAM for storing various data (the same applies to the control unit body of the second control unit 150, which will be described later).

[0122] Furthermore, the first control unit 140, in terms of functional concept, includes an operation control unit 141, as shown in Figure 6.

[0123] The operation control unit 141 is an operation control means for controlling the discharge operation and the suction operation.

[0124] Here, "discharge operation" refers to the operation of discharging the first cleaning liquid W1 or the second cleaning liquid W2 from the discharge nozzle 83b of the cleaning unit 83 into the cleaning tank 120 (specifically, the second storage unit 121b).

[0125] Furthermore, "suction operation" refers to the operation of drawing the first cleaning liquid W1 or the second cleaning liquid W2 discharged into the cleaning tank 120 (specifically, the second storage section 121b) into the suction nozzle 83c of the cleaning section 83.

[0126] Although the operation control unit 141 is a component of the "cleaning system" in the claims, for the sake of explanation, it will be described as being provided in the first control unit 140.

[0127] Further details of the processing performed by this first control unit 140 will be described later.

[0128] (Configuration - Second Control Unit) Returning to Figure 1, the second control unit 150 is a second control means that communicates with the first control unit 140 and controls the first control unit 140. As shown in Figure 1, the second control unit 150 is electrically connected to the first control unit 140 via wiring 2 and includes an operation unit, a communication unit, an output unit, a control unit body, and a storage unit (all of which are not shown).

[0129] Of these, the operation unit is an operating means that receives operation input to the second control unit 150.

[0130] Furthermore, the communication unit is a communication means for communicating with the first control unit 140 and external devices (not shown) (for example, a host device for a Laboratory Information System (LIS)).

[0131] Furthermore, the output unit is an output means that outputs various types of information based on the control of the second control unit 150, and is configured using, for example, known display means, printing means, or audio output means.

[0132] Furthermore, the control unit body is the main body of the second control unit 150.

[0133] Furthermore, the storage unit stores programs and various data necessary for the operation of the first control unit 140 and the second control unit 150, and is configured using a known rewritable recording medium; for example, a rewritable non-volatile recording medium such as flash memory can be used.

[0134] With the analytical device 1 described above, the sample in the reaction vessel C3 can be automatically analyzed in the reaction line 81.

[0135] Furthermore, since the analyzer 1 is equipped with a cleaning system 110, it is possible to remove deposits adhering to the nozzle 83a of the cleaning unit 83, compared to the conventional technology described above (a technology that cleans only the suction nozzle with a cleaning solution). Therefore, the effort required for the above removal work can be reduced, and the usability of the cleaning system 110 can be improved.

[0136] (Cleaning Method) Next, we will explain the cleaning method performed in the analytical apparatus 1 configured as described above.

[0137] The cleaning method is a method for cleaning the nozzles 83a (specifically, the discharge nozzle 83b and the suction nozzle 83c) of the cleaning unit 83 using the cleaning system 110 described above. This cleaning method includes a first placement step, a first discharge step, a transfer step, a B / F separation step, a second placement step, an immersion step, a first suction step, a second discharge step, and a second suction step.

[0138] Furthermore, although the premise of the cleaning method is arbitrary, in this embodiment, the analyzer 1 is in a state where the process of analyzing the sample in the reaction vessel C3 is being performed in the reaction line 81, neither the first cleaning solution W1 nor the second cleaning solution W2 is accumulated in the cleaning tank 120, and the nozzle 83a of the cleaning unit 83 is positioned in a standby position (for example, a position different from the arrangement state position and the B / F separation operation position described later, such as a position near the cleaning tank 120).

[0139] (Cleaning Method - First Placement Process) First, the first placement process will be explained.

[0140] The first placement step is a placement step for positioning the nozzle 83a of the cleaning unit 83 to a position where it is in a placed state (hereinafter referred to as the "placed state position").

[0141] Specifically, the first control unit 140 moves the nozzle 83a of the cleaning unit 83 horizontally and / or vertically from the standby position to the deployed position using the movement part of the cleaning unit 83, based on movement information pre-stored in the storage unit of the second control unit 150.

[0142] However, this is not limited to this; for example, an operator may manually move the nozzle 83a of the cleaning unit 83 from the standby position to the deployed position (the same applies to the moving process and the second deployment process).

[0143] "Movement information" refers to information that shows the movement position and / or distance of the nozzle 83a of the cleaning unit 83 when the cleaning method is executed, chronologically (and / or per process).

[0144] (Cleaning Method - First Discharge Process) Next, the first discharge process will be explained.

[0145] The first discharge step is a discharge step that occurs after the first placement step, in which the operation control unit 141 discharges the second cleaning liquid W2 from the discharge nozzle 83b of the cleaning unit 83 into the cleaning tank 120.

[0146] Specifically, the operation control unit 141 cleans the suction nozzle 83c of the cleaning unit 83 by discharging the second cleaning liquid W2 supplied from the second supply tank through the second discharge channel from the discharge nozzle 83b of the cleaning unit 83 toward the second storage section 121b of the cleaning tank 120.

[0147] More specifically, as shown in Figure 7, when the suction nozzle 83c of the cleaning unit 83 is cleaned with the second cleaning liquid W2, the operation control unit 141 adjusts the discharge flow rate of the second cleaning liquid W2 from the discharge nozzle 83b of the cleaning unit 83 so that the second cleaning liquid W2 discharged from the discharge nozzle 83b of the cleaning unit 83 is not assisted by the auxiliary unit 122, and the discharged second cleaning liquid W2 does not come into contact with the discharge nozzle 83b of the cleaning unit 83.

[0148] In this case, the method for setting the discharge flow rate is arbitrary, but in this embodiment, the discharge flow rate is set so that the second cleaning liquid W2 discharged from the discharge nozzle 83b of the cleaning unit 83 is not assisted by the auxiliary unit 122. For example, if the volume of the second storage unit 121b of the cleaning tank 120 is 300 μL, it may be set to 500 μL / second to 700 μL / second.

[0149] This first discharge step allows the suction nozzle 83c of the cleaning unit 83 to be cleaned before the B / F separation step, enabling accurate operation of the B / F separation process in the reaction line 81. Furthermore, when the suction nozzle 83c of the cleaning unit 83 is cleaned, the second cleaning liquid W2 can be prevented from coming into contact with the discharge nozzle 83b of the cleaning unit 83, thereby suppressing the adhesion of deposits to the discharge nozzle 83b of the cleaning unit 83. Additionally, it prevents the second cleaning liquid W2 from entering the reaction vessel C3 during the B / F separation step, which could result in insufficient B / F separation performance.

[0150] (Cleaning Method - Transfer Process) Next, the transfer process will be explained.

[0151] The moving process is a process that takes place after the first discharge process to move the nozzle 83a of the cleaning unit 83 from its initial position to a position where operations related to B / F separation in the reaction line 81 are performed (hereinafter referred to as the "B / F separation operation position").

[0152] Specifically, the first control unit 140 moves the nozzle 83a of the cleaning unit 83 horizontally and / or vertically from the position to the B / F separation operation position based on the movement information stored in the storage unit of the second control unit 150.

[0153] (Washing Method - B / F Separation Process) Next, the B / F separation process will be explained.

[0154] The B / F separation process is a step that takes place after the transfer process and involves performing operations related to B / F separation in the reaction line 81.

[0155] Specifically, the first control unit 140 performs B / F separation operations on the reaction vessel C3 in the reaction line 81, thereby washing away the inner surface of the reaction vessel C3, leaving behind the magnetic particle reagent and the immunocomplexes bound to it that have accumulated on the inner surface of the reaction vessel C3.

[0156] (Cleaning Method - Second Placement Process) Next, the second placement process will be explained.

[0157] The second placement step is a placement step performed after the B / F separation step to position the nozzle 83a of the washing unit 83 in the designated position.

[0158] Specifically, the first control unit 140 moves the nozzle 83a of the cleaning unit 83 horizontally and / or vertically from the B / F separation operation position to the placement position based on the movement information stored in the storage unit of the second control unit 150.

[0159] In this case, since the second cleaning liquid W2 discharged in the first discharge step is stored in the second storage section 121b of the cleaning tank 120, the suction nozzle 83c of the cleaning section 83 is immersed in the second cleaning liquid W2.

[0160] (Cleaning Method - Immersion Process) Next, the immersion process will be explained.

[0161] The immersion step is a step performed after the second placement step to immerse the suction nozzle 83c of the cleaning unit 83 in the second housing section 121b of the cleaning tank 120 for a predetermined time (for example, 1 to 2 seconds).

[0162] Specifically, the operation control unit 141 determines whether a predetermined time has elapsed since the suction nozzle 83c of the cleaning unit 83 was immersed in the second cleaning liquid W2 in the second housing section 121b of the cleaning tank 120 in the second placement step, and cleans the suction nozzle 83c of the cleaning unit 83 by continuing the immersion until it is determined that the predetermined time has elapsed.

[0163] This immersion process allows the suction nozzle 83c of the cleaning unit 83 to be cleaned after the B / F separation process, and removes the dirt on the suction nozzle 83c of the cleaning unit 83 that was generated by the B / F separation process.

[0164] (Cleaning Method - First Suction Step) Next, the first suction step will be explained.

[0165] The first suction step is a suction step performed after the first discharge step (specifically, after the immersion step), in which the operation control unit 141 causes the second cleaning liquid W2 discharged into the cleaning tank 120 in the first discharge step to be drawn into the suction nozzle 83c of the cleaning unit 83.

[0166] Specifically, the operation control unit 141 uses the suction nozzle 83c of the cleaning unit 83 to suck up the second cleaning liquid W2 in the second storage section 121b of the cleaning tank 120, thereby sending the sucked-up second cleaning liquid W2 to the waste liquid tank via the suction channel.

[0167] (Cleaning Method - Second Discharge Process) Next, the second discharge process will be explained.

[0168] The second discharge step is a discharge step in which the operation control unit 141 discharges the first cleaning liquid W1 from the discharge nozzle 83b of the cleaning unit 83 into the cleaning tank 120 after the second placement step (specifically, after the first suction step).

[0169] Specifically, the operation control unit 141 removes deposits adhering to the outside of the nozzle 83a (discharge nozzle 83b) of the cleaning unit 83 by discharging the first cleaning liquid W1 supplied from the first supply tank through the first discharge channel from the discharge nozzle 83b of the cleaning unit 83 toward the second storage section 121b of the cleaning tank 120.

[0170] More specifically, as shown in Figure 8, the operation control unit 141 adjusts the discharge flow rate of the first cleaning liquid W1 from the discharge nozzle 83b of the cleaning unit 83 so that when the deposits are removed, the deposits are removed by the first cleaning liquid W1 which is discharged from the discharge nozzle 83b of the cleaning unit 83 and then assisted by the auxiliary unit 122.

[0171] In this case, the method for setting the discharge flow rate is arbitrary, but in this embodiment, the discharge flow rate is set to a level that allows the first cleaning liquid W1 discharged from the discharge nozzle 83b of the cleaning unit 83 to be assisted by the auxiliary unit 122. For example, if the volume of the second storage unit 121b of the cleaning tank 120 is 300 μL, the flow rate may be set to 1200 μL / second to 1400 μL / second.

[0172] This second discharge step makes it possible to remove deposits adhering to the nozzle 83a of the cleaning unit 83, compared to the conventional technique described above (a technique in which only the suction nozzle is cleaned with cleaning solution). Therefore, the effort required for the above removal work can be reduced, and the usability of the cleaning system 110 can be improved.

[0173] (Cleaning Method - Second Suction Step) Next, we will explain the second suction step.

[0174] The second suction step is a suction step that occurs after the second discharge step, in which the operation control unit 141 causes the second cleaning liquid W2 discharged into the cleaning tank 120 in the second discharge step to be sucked into the suction nozzle 83c of the cleaning unit 83.

[0175] Specifically, the operation control unit 141 uses the suction nozzle 83c of the cleaning unit 83 to suck up the first cleaning liquid W1 in the second storage section 121b of the cleaning tank 120, thereby sending the sucked-up first cleaning liquid W1 to the waste liquid tank via the suction channel.

[0176] With the cleaning method described above, it is possible to keep the nozzle 83a of the cleaning unit 83 clean when performing operations related to B / F separation in the reaction line 81.

[0177] For example, the first discharge step and the first suction step may be performed after the immersion step and the first suction step have been performed. Also, the second discharge step and the second suction step may be performed after the second discharge step and the second suction step have been performed.

[0178] Furthermore, the cycle of the above-described series of steps in the cleaning method (first placement step, first discharge step, transfer step, B / F separation step, second placement step, immersion step, first suction step, second discharge step, and second suction step) may be performed only once, or it may be performed repeatedly multiple times.

[0179] (Effects of the Embodiment) As described above, according to the embodiment, when deposits are to be removed in the configured state, the operation control unit 141 adjusts the discharge flow rate of the first cleaning liquid W1 from the discharge nozzle 83b so that the deposits are removed by the first cleaning liquid W1 which is discharged from the discharge nozzle 83b and then assisted by the auxiliary unit 122. Therefore, compared to the conventional technology (a technology that cleans only the suction nozzle with cleaning liquid), deposits adhering to the nozzle 83a can be removed. Thus, the effort required for the removal work can be reduced, and the usability of the cleaning system 110 can be improved.

[0180] Furthermore, in the configured state, when the suction nozzle 83c is being cleaned with the second cleaning liquid W2, the operation control unit 141 adjusts the discharge flow rate of the second cleaning liquid W2 from the discharge nozzle 83b so that the second cleaning liquid W2 discharged from the discharge nozzle 83b is not assisted by the auxiliary unit 122, and the discharged second cleaning liquid W2 does not come into contact with the discharge nozzle 83b. Therefore, when the suction nozzle 83c is being cleaned, it is possible to avoid the second cleaning liquid W2 coming into contact with the discharge nozzle 83b, and to suppress the adhesion of deposits to the discharge nozzle 83b.

[0181] Furthermore, in the arranged state, the auxiliary part 122 is configured such that its upper end is positioned above the attachment portion on the nozzle 83a where the deposits adhere. Compared to the case where the upper end of the auxiliary part 122 and the attachment portion on the nozzle 83a are at the same position, the deposits can be effectively removed by the first cleaning liquid W1, thereby enhancing the function of the auxiliary part 122.

[0182] Furthermore, the auxiliary part 122 is a curved first auxiliary part 122a, and in its arranged state, it is possible to cover a part of the side surface of the nozzle 83a along the curved first auxiliary part 122a. Compared to the case where the first auxiliary part 122a is flat, the first cleaning liquid W1 can effectively remove deposits, and the function of the auxiliary part 122 can be further enhanced.

[0183] Furthermore, in the discharge process, the operation control unit 141 adjusts the discharge flow rate of the first cleaning liquid W1 by the discharge nozzle 83b so that when the adhering material is removed, the adhering material is removed by the first cleaning liquid W1 which is discharged in the discharge process and then assisted by the auxiliary unit 122. Therefore, compared to the conventional technology (a technology that cleans only the suction nozzle with cleaning liquid), it is possible to remove the adhering material that adheres to the nozzle 83a. Thus, the effort required for the removal work can be reduced, and the usability of the cleaning system 110 can be improved.

[0184] [III] Modifications of the Embodiments The embodiments of the present invention have been described above, but the specific configurations and means of the present invention can be arbitrarily modified and improved within the scope of the technical idea of ​​each invention described in the claims. Such modifications will be described below.

[0185] (Regarding the problems to be solved and the effects of the invention) First, the problems to be solved and the effects of the invention are not limited to those described above. The present invention may solve problems not described above, produce effects not described above, solve only some of the problems described, or produce only some of the effects described.

[0186] (Regarding distribution and integration) Furthermore, the electrical components described above are functional concepts and do not necessarily need to be physically configured as shown in the diagram. In other words, the specific forms of distribution and integration of each part are not limited to those shown in the diagram, and all or part of them can be functionally or physically distributed or integrated in any unit according to various loads and usage conditions.

[0187] (Regarding shape, numerical values, structure, and time series) With regard to the components illustrated in the embodiments and drawings, the shape, numerical values, or the interrelationship of the structure or time series of multiple components can be arbitrarily modified and improved within the scope of the technical concept of the present invention.

[0188] (Regarding the analytical device) In the above embodiment, the analytical device 1 was described as being equipped with a chip removal external 92, but it is not limited to this, and for example, the chip removal external 92 may be omitted.

[0189] (Regarding the reaction vessel) In the above embodiment, it was explained that the reaction vessel 80 has one reaction line 81, but this is not limited to this, and for example, there may be two or more. In this case, it is desirable that the reagent dispensing unit 60 and the sample dispensing unit 70 be configured to dispense into multiple reaction lines 81.

[0190] Furthermore, although the above embodiment described the reaction line 81 as a transport-type reaction line, it is not limited to this, and for example, it may be a fixed-type reaction line.

[0191] Furthermore, although the above embodiment described the cleaning section 83 of the reaction tank 80 as having two nozzles 83a, it is not limited to this, and for example, it may have only one nozzle 83a. In this case, the cleaning tank 120 may have only one auxiliary section 122.

[0192] (Regarding the state detection unit) In the above embodiment, the state detection unit 103 was described as an imaging means, but it is not limited to this, and may be a pressure sensor or a light sensor (for example, an infrared sensor).

[0193] (Regarding the deposits) In the above embodiment, it was explained that the deposits adhere to the outside of the discharge nozzle 83b, but the explanation is not limited to this, and for example, they may adhere to the outside of the suction nozzle 83c and / or the outside of the nozzle housing 83d.

[0194] In this case, for example, the first auxiliary part 122a may be configured to cover a part of the side surface of the suction nozzle 83c and / or the nozzle housing part 83d when in its arranged state (specifically, the shape, length in the left-right direction, length in the front-back direction, and length in the up-down direction of the first auxiliary part 122a are set to cover a part of the side surface). Also, in the second discharge step of the cleaning method, the operation control unit 141 may adjust the discharge flow rate of the first cleaning liquid W1 from the discharge nozzle 83b of the cleaning unit 83 so that when the deposits attached to the suction nozzle 83c and / or the nozzle housing part 83d are removed, the deposits are removed by the first cleaning liquid W1 which is discharged from the discharge nozzle 83b of the cleaning unit 83 and then assisted by the auxiliary part 122.

[0195] (Regarding the cleaning system) In the above embodiment, the cleaning system 110 is described as being equipped with an overflow detection unit 130. However, it is not limited to this, and for example, if the capacity of the cleaning tank body 121 is large, or if the discharge capacity of the discharge unit 123 is large, the overflow detection unit 130 may be omitted.

[0196] Furthermore, although the above embodiment describes the cleaning tank 120 of the cleaning system 110 as being located inside the reaction line 81, it is not limited to this configuration and may be located outside the reaction line 81, for example.

[0197] (Regarding the cleaning unit) In the above embodiment, the cleaning unit 83 was described as having a movable part, but it is not limited to this, and for example, the movable part may be omitted.

[0198] In this case, for example, the cleaning method may include only the first discharge step, the first suction step, the second discharge step, and the second suction step. Furthermore, in the cleaning method, the first discharge step, the first suction step, the second discharge step, and the second suction step may be performed in the configured state without moving the nozzle 83a of the cleaning unit 83.

[0199] (Regarding the auxiliary part) In the above embodiment, it was explained that the auxiliary part 122 is configured such that its upper end is located above the attachment portion of the nozzle 83a of the cleaning unit 83. However, the configuration is not limited to this, and for example, the upper end of the auxiliary part 122 may be configured to be at the same height as the attachment portion of the nozzle 83a of the cleaning unit 83.

[0200] Furthermore, although the above embodiment describes the auxiliary portion 122 as having a notch 122b, it is not limited to this, and for example, the notch 122b may be omitted.

[0201] Furthermore, although the above embodiment describes the auxiliary unit 122 as comprising only one first auxiliary unit 122a, it is not limited to this, and for example, it may comprise multiple first auxiliary units 122a. In this case, for example, the first auxiliary unit 122a may be provided with a discharge opening for discharging the first cleaning liquid W1 (or second cleaning liquid W2) to the outside of the auxiliary unit 122.

[0202] Furthermore, although the first auxiliary portion 122a was described as having a curved shape in the above embodiment, it is not limited to this, and may be flat, for example.

[0203] Furthermore, although the above embodiment described the auxiliary portion 122 as comprising a first auxiliary portion 122a and a notch portion 122b, it is not limited to this. For example, as shown in Figures 9 and 10, the auxiliary portion 122 may comprise a first auxiliary portion 122a, a second auxiliary portion 122c, and a notch portion 122b.

[0204] Of these, the first auxiliary part 122a is part of the basic structure of the auxiliary part 122 and is configured to cover a part of the side surface of the nozzle 83a (discharge nozzle 83b) of the cleaning unit 83 when in its arranged state.

[0205] Specifically, as shown in Figures 9 and 10, the first auxiliary portion 122a is formed in a curved shape, similar to the first auxiliary portion 122a in the embodiment.

[0206] Furthermore, the second auxiliary part 122c is another part of the basic structure of the auxiliary part 122, is formed in a ring shape, and is provided on the first auxiliary part 122a as shown in Figures 9 and 10.

[0207] This second auxiliary part 122c is configured to cover the area around the attachment portion of the nozzle 83a of the cleaning unit 83 and / or its vicinity when in its positioned state.

[0208] Specifically, the inner diameter of the second auxiliary portion 122c is set to a shape that allows the discharge nozzle 83b and suction nozzle 83c of the cleaning portion 83 to be inserted. Furthermore, as shown in Figures 9 and 10, the second auxiliary portion 122c is positioned at the upper end of the first auxiliary portion 122a such that, in its configuration, the discharge nozzle 83b and suction nozzle 83c of the cleaning portion 83 are inserted into the second auxiliary portion 122c, and the area around the attachment portion of the nozzle 83a of the cleaning portion 83 and / or its vicinity is surrounded by the second auxiliary portion 122c.

[0209] Furthermore, as shown in Figures 9 and 10, the notches 122b are provided at the left end and its vicinity, and at the right end and its vicinity, respectively.

[0210] With this auxiliary part 122, compared to the case where only the first auxiliary part 122a is provided, when deposits adhering to the discharge nozzle 83b of the cleaning unit 83 are removed, the first cleaning liquid W1 can be efficiently applied to the adhering portion of the nozzle 83a and / or its vicinity (specifically, the first cleaning liquid W1 can be reliably applied to the entire circumference of the adhering portion of the nozzle 83a with a small discharge flow rate (consumption) of the first cleaning liquid W1), and the deposits can be effectively removed.

[0211] (Regarding the cleaning method) In the above embodiment, the cleaning method was described as including a first placement step, a first discharge step, and a moving step. However, it is not limited to this, and for example, the first placement step, the first discharge step, and the moving step may be omitted.

[0212] In this case, for example, during the immersion process, the operation control unit 141 may immerse the suction nozzle 83c of the cleaning unit 83 in the second cleaning liquid W2 by discharging the second cleaning liquid W2 from the discharge nozzle 83b of the cleaning unit 83 into the cleaning tank 120. The operation control unit 141 may then determine whether a predetermined time has elapsed since the suction nozzle 83c of the cleaning unit 83 was immersed in the second cleaning liquid W2 in the second storage section 121b of the cleaning tank 120, and continue the immersion until it is determined that the predetermined time has elapsed, thereby cleaning the suction nozzle 83c of the cleaning unit 83.

[0213] Furthermore, although the above embodiment describes the second discharge step and the second suction step being performed after the first suction step, this is not limited to this. For example, if a known detection sensor or an operator detects that there is an object attached to the outside of the nozzle 83a of the cleaning unit 83 before the first suction step, the second placement step may be performed as needed, followed by the second discharge step and the second suction step. Alternatively, the second discharge step and the second suction step may be performed at a time when all the sample analysis processes have been completed (for example, at the time of the final processing).

[0214] (Note) The cleaning system in Note 1 is a cleaning system for cleaning nozzles comprising: a discharge nozzle capable of discharging a first cleaning liquid for cleaning the discharge nozzle and a second cleaning liquid different from the first cleaning liquid, which is for cleaning the suction nozzle; and a suction nozzle capable of sucking up the first cleaning liquid and the second cleaning liquid discharged from the discharge nozzle, the system comprising: a cleaning tank for collecting the first cleaning liquid or the second cleaning liquid discharged from the discharge nozzle; and operation control means for controlling a discharge operation that discharges the first cleaning liquid or the second cleaning liquid from the discharge nozzle into the cleaning tank and a suction operation that sucks up the first cleaning liquid or the second cleaning liquid discharged into the cleaning tank into the suction nozzle. The operation control means comprises an auxiliary means provided in the cleaning tank for assisting in the removal of deposits adhering to the outside of the nozzle, which consist of components contained in the second cleaning liquid, by the first cleaning liquid discharged from the discharge nozzle, wherein the operation control means adjusts the discharge flow rate of the first cleaning liquid from the discharge nozzle so that, when the deposits are to be removed, the deposits are removed by the first cleaning liquid discharged from the discharge nozzle and then assisted by the auxiliary means, in an arrangement where the discharge port of the discharge nozzle and the suction nozzle are positioned in the cleaning tank such that the discharge port of the discharge nozzle is positioned above the suction port of the suction nozzle.

[0215] The cleaning system described in Appendix 2, in the cleaning system described in Appendix 1, the operation control means adjusts the discharge flow rate of the second cleaning liquid by the discharge nozzle so that, in the arrangement, when the suction nozzle is cleaned with the second cleaning liquid, the second cleaning liquid discharged from the discharge nozzle is not assisted by the auxiliary means, so that the discharged second cleaning liquid does not come into contact with the discharge nozzle.

[0216] The cleaning system of Appendix 3 is configured such that, in the cleaning system of Appendix 1 or 2, the upper end of the auxiliary means is positioned above the portion of the nozzle to which the deposits adhere in the arrangement described above.

[0217] The cleaning system of Appendix 4 is the cleaning system of Appendix 3, wherein the auxiliary means is a curved first auxiliary part, and the first auxiliary part is capable of covering a part of the side surface of the discharge nozzle in the arrangement described above.

[0218] The cleaning system of Appendix 5 is the cleaning system of Appendix 3, wherein the auxiliary means comprises a first auxiliary part capable of covering a part of the side surface of the discharge nozzle in the arrangement, and a ring-shaped second auxiliary part provided on the first auxiliary part, which is capable of covering the area around the attachment portion and / or the portion near the same of the nozzle in the arrangement.

[0219] The cleaning method described in Appendix 6 is a cleaning method for cleaning a nozzle, comprising a cleaning system, a discharge nozzle capable of discharging a first cleaning solution for cleaning the discharge nozzle and a second cleaning solution different from the first cleaning solution, which is a second cleaning solution for cleaning the suction nozzle, and a suction nozzle capable of sucking up the first cleaning solution and the second cleaning solution discharged from the discharge nozzle, wherein the cleaning system comprises a cleaning tank for collecting the first cleaning solution or the second cleaning solution discharged from the discharge nozzle, operation control means for controlling a discharge operation that discharges the first cleaning solution or the second cleaning solution from the discharge nozzle into the cleaning tank and a suction operation that sucks up the first cleaning solution or the second cleaning solution discharged into the cleaning tank into the suction nozzle, and auxiliary means provided in the cleaning tank, wherein the deposits adhering to the outside of the nozzle consist of components contained in the second cleaning solution and are discharged The cleaning method comprises auxiliary means for assisting in the removal of the deposits by the first cleaning liquid discharged from the discharge nozzle, and includes a discharge step in which the operation control means discharges the first cleaning liquid or the second cleaning liquid into the cleaning tank from the discharge nozzle in an arrangement in which the discharge nozzle and the suction nozzle are arranged such that the discharge port of the discharge nozzle is located above the suction port of the suction nozzle in the cleaning tank, and a suction step in which the operation control means, after the discharge step, causes the first cleaning liquid or the second cleaning liquid discharged into the cleaning tank to be sucked into the suction nozzle, wherein the discharge step includes the operation control means adjusting the discharge flow rate of the first cleaning liquid from the discharge nozzle so that when the deposits are removed, the deposits are removed by the first cleaning liquid that has been discharged in the discharge step and then assisted by the auxiliary means.

[0220] (Effects of the Appendix) According to the cleaning system described in Appendix 1, the operation control means adjusts the discharge flow rate of the first cleaning liquid from the discharge nozzle so that when adhering material is to be removed in the installed state, the adhering material is removed by the first cleaning liquid which is discharged from the discharge nozzle and then assisted by the auxiliary means. Therefore, compared to the conventional technology (a technology that cleans only the suction nozzle with cleaning liquid), it is possible to remove adhering material that adheres to the discharge nozzle. Thus, the effort required for the above removal work can be reduced, and the usability of the cleaning system can be improved.

[0221] According to the cleaning system described in Appendix 2, in the configured state, when the suction nozzle is being cleaned with the second cleaning liquid, the operation control means adjusts the discharge flow rate of the second cleaning liquid from the discharge nozzle so that the discharged second cleaning liquid does not come into contact with the discharge nozzle, by ensuring that the second cleaning liquid discharged from the discharge nozzle is not assisted by the auxiliary means. Therefore, when the suction nozzle is being cleaned, it is possible to avoid the second cleaning liquid coming into contact with the discharge nozzle and to suppress the adhesion of deposits to the discharge nozzle.

[0222] According to the cleaning system described in Appendix 3, the auxiliary means is configured such that, in its arrangement, the upper end of the auxiliary means is positioned above the attachment portion on the nozzle where the deposits adhere. Compared to the case where the upper end of the auxiliary part and the attachment portion on the nozzle are at the same position, the deposits can be effectively removed by the first cleaning liquid, thereby enhancing the function of the auxiliary means.

[0223] According to the cleaning system described in Appendix 4, the auxiliary means is a curved first auxiliary part, and the first auxiliary part is capable of covering a part of the side surface of the discharge nozzle in its arranged state. Compared to the case where the first auxiliary part is flat, the first cleaning liquid can effectively remove deposits, and the function of the auxiliary means can be further enhanced.

[0224] According to the cleaning system described in Appendix 5, the auxiliary means comprises a first auxiliary part capable of covering a part of the side surface of the discharge nozzle in its arranged state, and a ring-shaped second auxiliary part provided on the first auxiliary part, which is capable of covering the area around the attachment portion of the nozzle and / or its vicinity in its arranged state. Compared to the case where only the first auxiliary part is provided, when deposits adhering to the discharge nozzle are removed, the first cleaning liquid can be efficiently applied to the attachment portion of the nozzle and / or its vicinity, and the deposits can be effectively removed.

[0225] According to the cleaning method described in Appendix 6, in the discharge step, the operation control means includes adjusting the discharge flow rate of the first cleaning liquid by the discharge nozzle so that when the adhering material is removed, the adhering material is removed by the first cleaning liquid that is discharged in the discharge step and then assisted by the auxiliary means. Therefore, compared to the conventional technology (a technology that cleans only the suction nozzle with cleaning liquid), it is possible to remove the adhering material that adheres to the discharge nozzle. Thus, the effort required for the removal work can be reduced, and the usability of the cleaning system can be improved.

[0226] 1. Analytical device 2. Wiring 10. Reaction vessel supply unit 20. Reagent storage unit 30. Sample storage unit 42. Tip supply unit 50. Reaction vessel transport unit 60. Reagent dispensing unit 70. Sample dispensing unit 80. Reaction tank 81. Reaction line 81a. Hole 83. Washing unit 83a. Nozzle 83b. Discharge nozzle 83c. Suction nozzle 83d. Nozzle housing unit 84. Substrate dispensing unit 92. Tip removal outer part 92a. Tip removal outer part main body 92b. Tip side notch 101. Photometric unit 103. State detection unit 110. Washing system 120. Washing tank 121. Washing tank main body 121a. First housing unit 121b. Second housing unit 121c. Connection unit 122. Auxiliary unit 122a. First auxiliary unit 122b. Notch 122c. Second auxiliary unit 123 Discharge section 124a First mounting hole 125 Second mounting hole 130 Overflow detection section 140 First control unit 141 Operation control unit 150 Second control unit C1 Reagent container C2 Sample container C3 Reaction vessel R Sample rack W1 First washing solution W2 Second washing solution

Claims

1. A cleaning system for cleaning a nozzle, comprising: a discharge nozzle capable of discharging a first cleaning solution for cleaning the discharge nozzle and a second cleaning solution different from the first cleaning solution, which is for cleaning the suction nozzle; and a suction nozzle capable of sucking up the first cleaning solution and the second cleaning solution discharged from the discharge nozzle, the system comprising: a cleaning tank for collecting the first cleaning solution or the second cleaning solution discharged from the discharge nozzle; operation control means for controlling a discharge operation that causes the first cleaning solution or the second cleaning solution to be discharged from the discharge nozzle into the cleaning tank and a suction operation that causes the first cleaning solution or the second cleaning solution discharged into the cleaning tank to be sucked up by the suction nozzle; and auxiliary means provided in the cleaning tank for assisting in the removal of deposits adhering to the outside of the nozzle, which consist of components contained in the second cleaning solution, by the first cleaning solution discharged from the discharge nozzle. A cleaning system in which, in an arrangement where the discharge nozzle and the suction nozzle are positioned in the cleaning tank such that the discharge port of the discharge nozzle is positioned above the suction port of the suction nozzle, when the deposits are to be removed, the discharge flow rate of the first cleaning liquid discharged from the discharge nozzle and then assisted by the auxiliary means removes the deposits.

2. The cleaning system according to claim 1, wherein the operation control means adjusts the discharge flow rate of the second cleaning liquid by the discharge nozzle so that, in the arrangement, when the suction nozzle is cleaned with the second cleaning liquid, the second cleaning liquid discharged from the discharge nozzle is not assisted by the auxiliary means, so that the discharged second cleaning liquid does not come into contact with the discharge nozzle.

3. The cleaning system according to claim 1 or 2, wherein, in the arrangement described above, the auxiliary means is configured such that the upper end of the auxiliary means is positioned above the portion of the nozzle to which the deposits adhere.

4. The cleaning system according to claim 3, wherein the auxiliary means is a curved first auxiliary part, and the first auxiliary part is capable of covering a part of the side surface of the nozzle in the arrangement described above.

5. The cleaning system according to claim 3, wherein the auxiliary means comprises a first auxiliary part capable of covering a part of the side surface of the nozzle in the arranged state, and a ring-shaped second auxiliary part provided on the first auxiliary part, the second auxiliary part capable of covering the area around the attachment portion and / or the portion near the same of the nozzle in the arranged state.

6. A cleaning method for cleaning a nozzle, comprising a cleaning system, a discharge nozzle capable of discharging a first cleaning solution for cleaning the discharge nozzle and a second cleaning solution different from the first cleaning solution, which is for cleaning the suction nozzle, and a suction nozzle capable of sucking up the first cleaning solution and the second cleaning solution discharged from the discharge nozzle, wherein the cleaning system comprises a cleaning tank for collecting the first cleaning solution or the second cleaning solution discharged from the discharge nozzle, operation control means for controlling a discharge operation that causes the first cleaning solution or the second cleaning solution to be discharged from the discharge nozzle into the cleaning tank and a suction operation that causes the first cleaning solution or the second cleaning solution discharged into the cleaning tank to be sucked up by the suction nozzle, and auxiliary means provided in the cleaning tank for assisting in the removal of deposits adhering to the outside of the nozzle, which consist of components contained in the second cleaning solution, by the first cleaning solution discharged from the discharge nozzle, and the cleaning method is A cleaning method comprising: a discharge step in which the operation control means discharges the first cleaning liquid or the second cleaning liquid into the cleaning tank from the discharge nozzle in an arrangement in which the discharge nozzle and the suction nozzle are positioned such that the discharge port of the discharge nozzle is located above the suction port of the suction nozzle in the cleaning tank; and a suction step in which the operation control means, after the discharge step, causes the first cleaning liquid or the second cleaning liquid discharged into the cleaning tank to be sucked into the suction nozzle, wherein in the discharge step, the operation control means adjusts the discharge flow rate of the first cleaning liquid by the discharge nozzle so that when the adhering material is removed, the adhering material is removed by the first cleaning liquid that has been discharged in the discharge step and then assisted by the auxiliary means.

Images