Measuring array for determining the position of a projection exposure system
The optical measuring arrangement with 2D retroreflectors and controlled beam properties in a resonator cavity addresses the challenge of accurate large-distance measurement, enhancing stability and efficiency in projection and lithography systems.
WO2026114664A1PCT designated stage Publication Date: 2026-06-04CARL ZEISS SMT GMBH
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- CARL ZEISS SMT GMBH
- Filing Date
- 2025-11-14
- Publication Date
- 2026-06-04
Smart Images
Figure EP2025083065_04062026_PF_FP_ABST
Abstract
The invention relates to an optical measuring array (100) for measuring the distance of a component relative to a reference along at least one measuring axis, comprising a sensor (101) having a sensor head (102) and a measurement target (103) which is connected or can be connected to the component, wherein the sensor head (102) has an incoupling mirror (104), for coupling in a measurement beam (106), and an end mirror (105), which mirrors enclose a resonator cavity (107) of an optical resonator, and wherein the measurement target (103) is designed to deflect the measurement beam (106) back and forth between the mirrors (104, 105, 108, 109) of the sensor head (102). The sensor head (102) additionally comprises at least two retroreflectors (108, 109).
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