Radiation-based cleaning byproduct remediation

Abstract

The present invention relates to a disinfection system and method for cleaning a target device, particularly an ultrasound probe, using ultraviolet radiation within a cleaning chamber, wherein gaseous or particle byproducts are generated during irradiation and are removed from the air within the cleaning chamber.

Description

Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTRADIATION-BASED CLEANING BYPRODUCT REMEDIATIONBACKGROUNDField of the Invention[oooi] The present invention generally relates to techniques for remediating byproducts generated during radiation-based cleaning (e.g., disinfection, sterilization, etc.) of a reusable device, such as a reusable medical device.

[0002] Related Art

[0003] Any discussion of the prior art throughout the specification should in no way be considered as an admission that such prior art is widely known or forms part of common general knowledge in the field.

[0004] There are a number of reusable devices that are subject to a cleaning process between uses thereof. For example, certain types of medical devices (medical instruments) are reuseable across multiple patients. Cleaning of these reusable medical devices between use in / with different patients is required in accordance with laws, standards, guidelines, and / or internal standard operating procedures. For example, reusable medical devices, such as ultrasound probes, endoscopes, etc. are meant to be disinfected or sterilized before reuse in order to minimize the likelihood of cross-contamination between patients.SUMMARY

[0005] In one aspect, a method is provided herein. The method comprises: applying cleaning radiation to a target device disposed in a cleaning chamber, wherein application of the cleaning radiation generates gaseous or particle byproducts; and remediating the gaseous or particle byproducts.

[0006] In another aspect, a disinfection system is provided herein. The disinfection system comprises: a body defining a disinfection chamber; a door attached to the body and configured to seal the disinfection chamber; at least one radiation source configured to deliver cleaning radiation to a target device positioned in the disinfection chamber; and a remediation subsystem configured to remediate gaseous or particle byproducts generated as a result of irradiation of the target device.Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT

[0007] In another aspect, a method is provided herein. The method comprises: positioning a target device within a disinfection chamber; sealing the disinfection chamber; activating a remediation sub-system to begin remediating air within the disinfection chamber; and applying cleaning radiation to the target device while the remediation sub-system operates.

[0008] In another aspect, a cleaning apparatus is provided herein. The cleaning apparatus comprises: a housing defining an enclosed cleaning chamber; a closure mechanism configured to selectively seal the cleaning chamber; at least one radiation source positioned within the housing and configured to emit disinfecting radiation toward a target device within the cleaning chamber; and an air treatment sub-system configured to process air within the cleaning chamber to remove toxic byproducts generated during irradiation of the target device.DETAILED DESCRIPTION

[0009] In the context of a reusable device, such as a reusable medical device, the term “cleaning” is used herein to refer to disinfection, sterilization, and / or other processes that are used to decontaminate a target device. One type of cleaning is referred to as “radiation-based” cleaning. As used herein, the terms “radiation-based cleaning” or “radiation-based decontamination” are used to refer to disinfection, sterilization, and / or other processes that use radiation to decontaminate / clean a passive or active article / device, such as a passive or active reusable medical device. Radiation-based cleaning / decontamination can include, for example, application of ionizing radiation (e.g., cobalt 60 gamma rays or electron accelerators), Ultraviolet (UV) radiation (e.g., Ultraviolet-C (UV-C) radiation), Infra-red radiation, Electron-Beam Radiation, Gamma radiation, or other types of radiation to a target device to remediate contaminants at the surface of the target device.[ooio] The present inventors have discovered that application of cleaning radiation (radiation), such as UV light, to certain devices can generate byproducts, such toxic / noxious gases, particles, etc. For example, in certain examples, the cleaning radiation results in “off-gassing,” which is the release of a gas that was dissolved, trapped, absorbed, etc., in the material of the target device. Off-gassing can include, for example, sublimation, evaporation, desorption, seepage from cracks or internal volumes, gaseous products of slow chemical reactions, etc. The off-gassing could be generated as the result of a number of different interactions between the applied radiation and the disinfection environment. For example, the off-gassing could be generated as a result of interactions between the radiation and the ultrasound probeAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTplastics / polymers (e.g., generating volatile organic compounds (VOCs)), interaction between the radiation and the chamber walls / componentry, etc.[ooii] Additionally, tests were conducted by the inventors using a controlled UV test system and commercial UV-C disinfection devices where polytetrafluoroethylene (PTFE) and Acrylonitrile Butadiene Styrene (ABS) plastics were radiated under multiple wavelengths (255 nm, 265 nm, 280 nm) with varied exposure cycle times. VOCs were detected across all test conditions including short cycle times, with ABS (a common ultrasound probe material) showing the highest sensitivity and producing a broad range of harmful VOCs such as toluene, ethylbenzene, styrene, and benzene (1 -methylethyl) etc.

[0012] In order to address the above problems, the present inventors propose techniques to remediate (e.g., filter) byproducts produced by a radiation-based cleaning system (e.g., techniques for filtering or removing gases and / or particles resulting from the use of radiation in a disinfection environment). As a result, the techniques presented herein can provide a safer / more pleasant working environment for users of radiation-based cleaning systems.

[0013] The remediation techniques presented herein can be used in / with a variety of radiationbased cleaning / decontamination processes and with a number of different types of passive or active devices, sometimes generally referred to herein as “target articles” or “target devices.” Merely for ease of description, the techniques of the present invention are primarily described herein with reference to a specific type of radiation-based cleaning process in the form of UV disinfection, and with reference to a specific type of target device in the form of an ultrasound probe. It is to be appreciated that specific reference to UV disinfection is merely illustrative of one type of radiation-based cleaning process, while specific reference to ultrasound probes is merely illustrative of one type of target device. These specific examples are not intended to limit the scope of the techniques presented herein. Aspects of certain example ultrasound probes are briefly described below before describing aspects of the presented invention.

[0014] Ultrasound probes are typically tailored for specific diagnostic needs, balancing between image resolution and the ability to penetrate deep into tissues. Depending on the region of the body being examined and the condition being diagnosed, healthcare professionals will choose the most suitable probe type. Shown in FIGs. 1 A-1D are four types of ultrasound probes that can be used in different circumstances. It is to be appreciated that the examples of FIGs.1A-1D are merely illustrative and that techniques presented herein can be used with any of a number of different ultrasound probes or other types of target devices.Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT

[0015] Referring first to FIG. 1 A, shown is a convex (curvilinear) ultrasound probe 100A that includes a body 102 A, a handle 104 A, and a cable (cord) 106 A. The body 102 A includes a transducer element (not shown), such as a piezoelectric crystal, and an acoustic lens 101 A forming a curved face 103 A of the body 102A. The convex ultrasound probe 100A produces a wide field of view at a lower frequency (e.g., emits ultrasound waves in a fan-shaped beam, making them useful for imaging structures within the body such as internal organs and deep tissues). Convex ultrasound probes are widely used for abdominal, obstetric, and gynecological imaging and are able to visualize larger and deeper areas in the body, such as the uterus, liver, kidneys, and fetal structures during pregnancy.

[0016] Referring next to FIG. IB, shown is a linear probe 100B that includes a body 102B, a handle 104B, and a cable (cord) 106B. The body 102B includes a transducer element (not shown) and an acoustic lens 101B forming a flat face 103B of the body 102B. The linear ultrasound transducer 100B generates high-frequency sound waves, resulting in detailed, high-resolution images for small areas. Linear transducers are typically used for vascular imaging, musculoskeletal scans, nerve, small parts and more.

[0017] Referring next to FIG. 1 C, shown is a phased array ultrasound probe 100C that includes a body 102C, a handle 104C, and a cable (cord) 106C. The body 102C includes a transducer element (not shown) and an acoustic lens 101C forming a face 103C of the body 102C. The phased array ultrasound probe 100C uses a small array to produce sound waves at different angles. Unlike other types of transducers, all the elements in the phased array ultrasound probe 100C fire almost simultaneously but with slight time delays, allowing the beam to be steered electronically without moving the probe. That is, the sound waves are emitted at various angles by electronically controlling the timing of the pulses. This allows for creating a fan-like image that can visualize a wide area from a narrow probe position. Phased array transducers excel at imaging deep organs and areas that require a wide field of view despite limited access. These transducers are primarily used for cardiac imaging, abdominal imaging, and transcranial applications.

[0018] Finally, referring to FIG. ID, shown is an endocavity ultrasound probe 100D that includes a body 102D, a handle 104D, and a cable (cord) 106D. The body 102D includes a transducer element (not shown) and an acoustic lens 101D on a face 103D of the body 102D. The endocavity ultrasound probe 100D is designed to enter a body cavity, such as the rectum or vagina, to obtain detailed images of internal organs. Endocavity transducers provide clear, close-up images of internal organs and tissues that are difficult to visualize with externalAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTultrasound methods (e.g., used for detailed imaging of the uterus, ovaries, and surrounding pelvic structures, often used in gynecology and obstetrics).

[0019] As noted, ultrasound probes are re-usable devices that can be used for a variety of procedures including intra rectal, intra vaginal and oesophageal examination. Whilst the ultrasound probes may not need to be completely sterile in certain cases, the probes do need to be subjected to a certain amount of decontamination / cleaning (e.g., disinfection), usually high-level disinfection (“HLD”) between patients to prevent cross-contamination. In certain cases, HLD requires a 6 log reduction in microorganism load.

[0020] FIGs. 2A and 2B are diagrams illustrating an example radiation-based cleaning system, namely UV disinfection system 230 (e.g., UV disinfector), in accordance with aspects presented herein. In particular, FIG. 2A is a perspective view of the UV disinfection system 230, while FIG. 2B is a perspective view of the UV disinfection system 230 with its door open and showing an ultrasound probe 200 positioned therein. FIG. 2C is a schematic diagram showing operation of the UV disinfection system 230. FIGs. 2A, 2B, and 2C will generally be described together.

[0021] As shown, the UV disinfection system 230 comprises a housing 232 coupled to a door 234. When closed, the door 234 and housing 232 define a disinfection chamber 236. The UV disinfection system 230 includes a holding assembly, such as at least one clamp 238, for suspending the ultrasound probe 200 in the disinfection chamber 236. In the illustrated embodiment, the clamp 238 is generally positioned at the top of the disinfection chamber 236 and grips onto the cord 206 of the ultrasound probe 200 to allow the probe to be suspended within the disinfection chamber. By suspending the ultrasound probe 200 in this way, the door 234 can be closed and the disinfection process can begin. Although the door 234 is shown as being rotatably movable about a vertical axis, other door configurations may be used, so long as they provide adequate access to the disinfection chamber 236. Other arrangements of disinfection chambers are of course contemplated.

[0022] The disinfection chamber 236 may include one or more reflective surfaces arranged to facilitate reflections of UV radiation (UV light) 237 emitted from at least one radiation sources 235 such that a rapid and low temperature disinfection is achieved. Reflective materials that may be particularly useful in a disinfection chamber include, but are not limited to, aluminum, glass, magnesium, stainless steel, polyvinyl alcohol, polytetrafluoroethylene, substrate materials treated with barium sulfate-containing paints and alloys, derivatives, andAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTcopolymers thereof. In some variations, the reflective surface comprises aluminum. In other variations, the reflective surface may be formed using polytetrafluoroethylene PTFE, or PTFE and similar polymers may be coated by various means onto another substrate, to form the reflective surface. In particular embodiments, the reflective interior surfaces of the disinfection chamber are formed to be as reflective as available manufacturing techniques provide. Such an approach facilitates disinfection processes that utilize high intensity disinfection radiation carried out at low temperatures.

[0023] The interior reflective surfaces of the disinfection chamber 236 may be positioned and shaped to reduce the absorption of UV radiation 237 by the interior surfaces and instead reflect and redirect the UV radiation within the disinfection chamber 236 and onto the ultrasound probe 200 positioned within the disinfection chamber 236. The material choice and configuration of the disinfection chamber 236 may be selected to promote preferential extinction of certain UV or other wavelengths of electromagnetic energy that can contribute to increased temperatures within the disinfection chamber 236 (i.e., longer wavelengths of radiation). That is, the shape of the disinfection chamber 236 may contribute to the quick and efficient directing of radiation to the ultrasound probe 200. For example, it may be configured that the radiation passing through the middle of the disinfection chamber 236, where the ultrasound probe 200 is to be positioned, and the reflective material(s) employed in the disinfection chamber 236 may contribute to the reflection (e.g., re-radiation or re-emission) of radiation with low loss (i.e., approximately the same amount of energy returns from the surface as was incident).

[0024] In certain embodiments, the interior walls of the disinfection chamber 236 are constructed and configured to provide low loss of UV-C radiation emitted from the at least one UV radiation source 235. Such embodiments increase the likelihood that UV-C radiation useful for disinfection will be reflected one or more times inside the disinfection chamber 236 until the radiation impinges upon the ultrasound probe 200 to be disinfected where it may be absorbed and extinguished, reflected, or re-emitted. In this way, for a given amount of total energy released into the disinfection chamber 236, which also may include some amount of infrared or heat energy, an improved utility is made of the useful UV-C band energy in disinfecting the ultrasound probe 200, while reducing the amount of thermal heating of the ultrasound probe 200.

[0025] As noted above, during the UV disinfection process, the at least one UV source applies / delivers UV radiation 237 to the ultrasound probe 200 positioned within theAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTdisinfection chamber 236. Also as noted above, the application of UV radiation 237 can result in generation of gaseous and / or particle byproducts (e.g., off-gassing), such as the generation of VOCs 239 during the disinfection process. In accordance with embodiments presented herein, the UV disinfection system 230 is configured to remediate these gaseous and / or particle byproducts generated during the disinfection process. For example, shown in FIG. 2C is a remediation sub-system 240 (e.g., air treatment sub-system) in the form of a VOC filter 240 that is configured filter out (trap) the VOCs 239. As a result, the UV disinfection system 230 operates to release cleaned / filtered air 241 into the ambient environment.

[0026] In the example of FIGs. 2A-2C, the UV disinfection system 230 includes a control subsystem 222 (e.g., at least one processor 224 and memory 225) configured to control operation of the UV disinfection system 230. For example, the control sub-system 222 can operate to control (e.g. activate / deactivate) the at least one radiation source 235 to apply cleaning radiation to the ultrasound probe 200. In addition, the control sub-system 222 can operate to control (e.g., activate / deactivate) the remediation sub-system 240.

[0027] In certain examples, the control sub-system 222 is configured to monitor an air quality within the disinfection chamber 236 via a sensor 226 and adjust operation of the remediation sub-system 240 based on the monitored air quality. The sensor 226 could be configured to detect at least one of particle concentration, volatile organic compound concentration, and / or ozone concentration within the disinfection chamber.

[0028] As detailed herein, the disinfecting radiation 237 utilized can be UV-C radiation, and in embodiments that utilize UV-C radiation, the at least one radiation source 235 may be any device suitable for emitting sufficient UV-C radiation to carry out high-level disinfection. Where one source of UV-C radiation is coupled to the disinfection chamber 236, that source will emit sufficient UV-C radiation to carry out high-level disinfection. Where two or more sources of UV-C radiation are coupled to the disinfection chamber 236, the UV-C radiation sources may each be capable of emitting sufficient UV-C radiation to carry out high-level disinfection. In certain embodiments of the UV disinfection system 230 that includes two or more UV-C sources coupled to the disinfection chamber 236, such radiation sources may each, on their own, emit insufficient UV-C radiation to achieve high-level disinfection, but when the individual outputs of UV-C radiation emitted from the two or more sources are combined, the total output of UV-C radiation is sufficient to achieve high-level disinfection.Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT

[0029] A radiation source 235 may be coupled to the disinfection chamber 236 through various approaches. For example, a radiation source 235 may be locally attached to a wall of the disinfection chamber 236 to emit UV-C radiation rays or a radiation source may be remotely coupled to disinfection chamber 236. For example, radiation source may be a laser, or solid state laser diode, and may be employed as a source of disinfecting energy, along with appropriate optical conductors and couplers to emit UV-C radiation rays into the disinfection chamber 236. Further, in some embodiments, a direct or conducted source of UV radiation could be steered, via a mirror or other device, or scanned along the ultrasound probe 200. In other embodiments, the disinfection chamber 236 may include a moveable attachment assembly, which is not specifically shown, such that the ultrasound probe 200 may be positioned on the moveable base and may be moved past a stationary radiation emission region.

[0030] Though the devices, methods, and systems provided herein are primarily described with reference to UV-C radiation as the disinfecting radiation within the disinfection chamber, this is for illustrative purposes only. The radiation or energy used in the disinfection system 230 may also be or include UV-A radiation, UV-B radiation, or even non-UV radiation, alone or in various combinations. It is to be further understood that, within the disinfection chamber 236, exposure of the target device to UV radiation may be carried out in a variety of ways.

[0031] Instead of UV radiation, such as UV-C radiation, some variations of the devices taught herein may use a flash source of energy. A flash source of energy emits extremely high intensity disinfecting radiation. The flash source of energy can provide high-level disinfection of one or more contaminated articles in an acceptably short period of time. In certain embodiments, a flash source of energy may deliver disinfecting radiation to the one or more articles at such a high rate that high-level disinfection is achieved in period of time selected from 10 seconds or less, 5 seconds or less, 3 seconds or less, and 2 seconds or less. A flash source of energy as contemplated herein may be selected to deliver any selected disinfecting radiation. For instance, a disinfection system as described herein may include a flash source of energy that emits electron beam, gamma-ray, x-ray, gas-plasma, or UV-C radiation. The biologically active mechanism of disinfection of the flash source may be different for the different sources. For example, gamma-ray may fully kill a pathogen, whereas UV-C may leave the pathogen alive but biologically sterile and unable to reproduce.

[0032] Where a flash source of energy is used, one radiation source of disinfecting radiation may be used in the disinfection chamber 236. In such embodiments, to achieve generallyAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCThomogenous or uniform radiation exposure on the ultrasound probe 200, the radiation emitted by the flash source may first strike a surface that will spread and distribute the radiation before hitting the target. In this case, the target will receive primarily indirect rather than direct illumination. In other words, the disinfection device could be configured so that the radiation source, or radiation sources, of any appropriate type, are located in a different part of the disinfection chamber 236 than the ultrasound probe 200.

[0033] Since the energy spectrum emitted by some types of flash sources may be broad, a filter (not shown) may be interposed in some cases between the radiation source 235 and the ultrasound probe 200 so only the spectrum of interest is allowed to pass to the disinfection chamber 236. The filter may serve to reduce the presence within the chamber of infrared energy, which does not disinfect but will otherwise heat the disinfection chamber 236 and thus raise its temperature and that of objects contained therein. Said filters may also be useful when implemented with the other radiation sources mentioned herein. Combinations of disinfection energy sources may be used in the devices and systems described herein. Where two or more different disinfection energy sources are used, they may be applied sequentially, in parallel, or in various combinations and orders. The inclusion and use of two or more different sources of disinfecting energy may prove advantageous in situations where certain pathogens are more susceptible to a particular source of disinfection energy, and in order to reduce overall exposure of the ultrasound probe 200, it may be useful to employ a variety of radiations sources, durations, and doses to achieve acceptable disinfection for pathogens of interest.

[0034] Where the devices and systems described herein utilize UV radiation, such as UV-C radiation, the one or more UV radiation sources and / or the one or more UV radiation sensors are positioned within the disinfection chamber 236 in a manner that facilitates rapid, low temperature disinfection. In general, the configuration of the disinfection chamber 236, the sources of disinfecting radiation, and the sensors detecting disinfecting radiation will be selected to provide and confirm a selected exposure of the one or more articles to radiation and / or optimize transmission of radiation from the one or more sources to efficiently and reproducibly target an article.

[0035] As described, a disinfection chamber 236 may be coupled to a single radiation source of disinfecting radiation, such as one UV-C radiation source. In such embodiments, the radiation source may be positioned on a top or bottom of the chamber. Alternatively, depending on the positioning of the ultrasound probe 200 to be disinfected, the single radiation source may beAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTpositioned on a side of the disinfection chamber or, where the disinfection chamber includes multiple sides, at an intersection formed at an intersection of two sides. However, the devices and systems described herein are not limited to disinfection chambers having a single source of disinfecting radiation.

[0036] The disinfection chamber 236 included in the systems, devices, and methods of the present disclosure may utilize multiple radiation sources, of the same or different variety, and different embodiments of a disinfection chamber 236 having multiple sources of disinfecting radiation are detailed herein and illustrated in the accompanying figures. Such embodiments may be advantageous where the respective surfaces of the one or more ultrasound probes to be disinfected are more complex than a single flat surface. For example, an ultrasound probe to be disinfected may have two or more of a front, back, lateral, and dorsal and / or ventral surface that require disinfection. In such a scenario, it may be difficult to deliver high intensity radiation to each surface of the ultrasound probe 200 with a single source or type of disinfecting radiation.

[0037] Radiation sources that may be employed in devices and systems as described herein are available in the art, and include, for example, UV-C emitting lamps. UV-C emitting lamps, which may also be referred to herein as “tubes,” are available commercially from various sources, including Philips Lighting B. V., and can be obtained in different shapes, sizes, input energy, and UV-C output ratings. Suitable UV-C tubes for use as a UV-C energy source include low-pressure mercury vapor discharge lamps. However, the disinfection chambers are not limited to a particular UV-C source. Any source capable of emitting UV-C light within the selected UV-C wavelength at an output rating that contributes to the disinfection of the ultrasound probe 200 could be used in the devices disclosed herein. For example, in addition to or as an alternative to one or more UV-C tubes, one or more lasers, one or more Light Emitting Diodes (LEDs), arrays of sources, or combinations of types of sources designed to emit UV-C light may be used to deliver disinfecting radiation within the disinfecting chamber.

[0038] In particular embodiments, the one or more sources of UV-C radiation included in the disinfection chamber 236 provide a total UV-C output within the disinfection chamber 236 that is selected to be at least 5 Watts of radiant power. Selection of such a radiation source, which can deliver a high-power dose of radiation, may be preferred to shorten a disinfection cycle. That is, by selecting a high-power radiation source, the energy is delivered rapidly, which may reduce the duration of radiation exposure and also reduce the amount of heat generated by the radiation. In other cases, the one or more radiation sources may beAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTselected to provide a total UV-C output within the disinfection chamber 236 selected from at least 10 W, at least 15 W, at least 20 W, at least 25 W, at least 30 W, at least 40 W, at least 50 W, at least 75 W, at least 90 W, and at least 100 W of radiant power. Where UV-C sources are used as the one or more sources of disinfecting radiation, the frequency band of UV-C light emitted from the one or more sources may be selected from between about 240 nm and about 270 nm and between about 255 nm and about 265 nm. In other cases, radiation sources may output UV-A radiation (e.g., 320-400 nm), UV-B radiation (e.g., 280-320 nm), or some other form of radiation such as UV-C radiation (e.g., 100-280 nm).

[0039] It is to be appreciated that the arrangement shown in FIGs. 2A-2C is merely illustrative and that a number of different techniques could be used to remediate gaseous and / or particle byproducts resulting from the use of cleaning radiation (e.g., UV light) in a cleaning / disinfection environment. For example, activated carbon filters or other adsorbent filters could be used in certain embodiments. In addition, in certain embodiments, photocatalysts (e.g., light and titanium dioxide) could be used to generate radicals (e.g., a radical generation filter) that neutralize off-gassing. In other embodiments, a plasma filter system could be used. In still other aspects, the remediation could be in the form of a neutralizing filter. Again, it is to be appreciated that the above examples are merely illustrative and that techniques presented herein could use a variety of other types of gas / vapor filters and / or other techniques.

[0040] FIGs. 3A-3D and 4A-4D are schematic diagrams illustrating further aspects of radiation-based cleaning systems, in accordance with the techniques presented herein. Referring first to FIGs. 3A-3D, shown is a UV disinfection device 330 comprising a disinfection chamber 336 with an ultrasound probe 300 positioned therein. During a UV disinfection process, disinfecting / cleaning radiation in the form of UV light 337 is applied to the ultrasound probe 300 positioned within the disinfection chamber 336. As the UV light 337 irradiates the surface of the ultrasound probe 300, byproducts 331, such as harmful / toxic byproducts, may be released. These byproducts 331 may include, for example, gaseous compounds, such as volatile organic compounds (VOCs) 339 or other gaseous compounds, and / or solid particulate matter, shown as particles 343, such as micro plastics, which may be harmful to health of a user if breathed in. The byproducts 331 would typically either be gases, in which case they would readily mix with air, or in the case of solid or liquid particles, would typically be of small enough particle size as to be readily suspended and carried by air flow. InAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTaccordance with embodiments presented herein, the UV disinfection system 330 is configured to remediate the gaseous or particle byproducts 331 generated during the disinfection process.

[0041] More specifically, in the examples of FIGs. 3A-3D, the UV disinfection device 330 includes a remediation sub-system (e.g., air treatment sub-system) in the form of an air intake assembly 344 and outflow / outlet assembly 350. The air intake assembly 344 optionally comprises an intake filter 345 and an intake fan 346. In operation, ambient (fresh) air 347 is drawn into the disinfection chamber 336 from the ambient environment via the intake fan 346, and the air 347 may pass through the intake filter 345 to ensure that the ultrasound probe 300 is not re-contaminated by any airborne pathogens from outside the disinfection chamber 336. In one example, the intake filter 345 is a High-Efficiency Particulate Air (HEPA)filter.

[0042] Once in the disinfection chamber 336, the air 347 would pass through the disinfection chamber, carrying the gaseous or particle byproducts 331 towards the outflow assembly 350. The outflow assembly 350 can comprise, for example, an adsorption filter 348 (as shown in FIG. 3 A), a particle filter 351 (as shown in FIG. 3B), a combination of both an adsorption filter 348 and a particle filter 351 (as shown in FIG. 3C), or a single combined particle / adsorption filter 354 (as shown in FIG. 3D).

[0043] In the examples of FIGs. 3A-3D, the air passing through the disinfection chamber 336 would pass through the filter(s) at the outflow assembly 350, thereby cleaning the air to remove the byproducts. In the case of any solid or liquid particulate matter (particles), such as microplastics, a general-purpose filter may be used with suitable pore size or a HEPA filter (e.g., having a pore size of less than 0.3 microns) could be used as the particle filtering. In the case of any gaseous substances, such as VOCs, the adsorption filter may have an extremely high surface area to volume ratio such that the gaseous substances adsorb to the surface. At the exit of the outflow assembly 350, clean and safe air 341 would flow back into the room. That is, the UV disinfection system 330 operates to release cleaned / filtered air 341 into the ambient environment. In this way, at the end of a disinfection cycle, the user would open the door to the chamber and the volume of air inside the chamber should be safe and clean.

[0044] As noted above, during the UV disinfection process, at least one UV source applies / delivers UV radiation 337 to the ultrasound probe 300 positioned within the disinfection chamber 336. In the example of FIGs. 3 A-3D, the UV disinfection system 330 can further include a control sub-system 322 (e.g., at least one processor 324 and memory 325) configured to control operation of the UV disinfection system 330. For example, the controlAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTsub-system 322 can operate to control (e.g. activate / deactivate) the at least one radiation source to apply cleaning radiation to the ultrasound probe 300. In addition, the control sub-system 322 can operate to control (e.g., activate / deactivate) the remediation sub-system (e.g., the air intake assembly 344 and / or the outflow assembly 350).

[0045] In certain examples, the control sub-system 322 is configured to monitor an air quality within the disinfection chamber 336 via a sensor (not shown in FIGs. 3A-3D) and adjust operation of the remediation sub-system based on the monitored air quality. The sensor could be configured to detect at least one of particle concentration, volatile organic compound concentration, and / or ozone concentration within the disinfection chamber.

[0046] In certain examples, the control sub-system 322 is configured to operate the air intake assembly 344 and / or the outflow assembly 350 for a period of time after application of UV light 337 is terminated. For example, at the end of the disinfection cycle, UV light 337 is no longer delivered for a period of time, while the disinfection chamber 336 remains closed (e.g., the door remains locked). During this time period, the outflow assembly 350 continues to operate to ensure that, when the disinfection chamber 336 is eventually opened, the byproducts 331 have been sufficiently remediated. Alternatively, the control sub-system 322 could operate the air intake assembly 344 and / or the outflow assembly 350 until air quality within the disinfection chamber 336 meets predetermined criteria.

[0047] Referring next to FIGs. 4A-4D shown is a UV disinfection device 430 comprising a disinfection chamber 436 with an ultrasound probe 400 positioned therein. During a UV disinfection process, disinfecting / cleaning radiation in the form of UV light 437 is applied to the ultrasound probe 400 positioned within the disinfection chamber 436. As the UV light 437 irradiates the surface of the ultrasound probe 400, gaseous or particle byproducts 431, such as harmful / toxic byproducts, may be released. These byproducts 431 may include, for example, volatile organic compounds (VOCs) 439 (or other gaseous compounds) and / or solid particulate matter, shown as particles 443, such as micro plastics, which may be harmful to health of a user if breathed in. The byproducts 431 would typically either be gases, in which case they would readily mix with air, or in the case of solids / liquids, would typically be of small enough particle size as to be readily suspended and carried by air flow. In accordance with embodiments presented herein, the UV disinfection system 430 is configured to remediate the byproducts 431 generated during the disinfection process.Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT

[0048] More specifically, in the examples of FIGs. 4A-4D, the UV disinfection device 430 includes a remediation sub-system (e.g., air treatment sub-system) in the form of a recirculation assembly 455 comprises a recirculation fan 456 and a filter placed within the disinfection chamber 456. The filter could comprise, for example, an adsorption filter 448 (as shown in FIG. 4 A), a particle filter 451 (as shown in FIG. 4B), a combination of both an adsorption filter 448 and a particle filter 451 (as shown in FIG. 4C), or a single combined particle / adsorption filter 454 (as shown in FIG. 4D). In operation, the recirculation fan 456 causes air 447 within the disinfection chamber 436 to pass through the filter(s) within the disinfection chamber, thereby cleaning the air to remove the byproducts 431. As shown by arrows 457, the cleaned air is recirculated back within the recirculation fan 456 and the cleaning process can be repeated one or more times.

[0049] As noted, in the examples of FIGs. 4A-4D, the air recirculating through the disinfection chamber 436 would pass through the filter(s) at the recirculation assembly 455, thereby cleaning the air to remove the byproducts. In the case of any solid or liquid particulate matter, such as microplastics, a general-purpose filter may be used with suitable pore size or a HEPA filter (e.g., having a pore size of less than 0.3 microns) could be used as the particle filtering. In the case of any gaseous substances, such as VOCs, the adsorption filter may have an extremely high surface area to volume ratio such that the gaseous substances adsorb to the surface. In this way, at the end of a disinfection cycle, the user would open the door to the chamber and the volume of air inside the chamber should be safe and clean.

[0050] As noted above, during the UV disinfection process, at least one UV source applies / delivers UV radiation 437 to the ultrasound probe 400 positioned within the disinfection chamber 436. In the example of FIGs. 4A-4D, the UV disinfection system 430 can further include a control sub-system 422 (e.g., at least one processor 424 and memory 425) configured to control operation of the UV disinfection system 430. For example, the control sub-system 422 can operate to control (e.g., activate / deactivate) the at least one radiation source to apply cleaning radiation to the ultrasound probe 400. In addition, the control sub-system 422 can operate to control (e.g., activate / deactivate) the remediation sub-system (e.g., the a recirculation assembly 455).

[0051] In certain examples, the control sub-system 422 is configured to monitor an air quality within the disinfection chamber 436 via a sensor (not shown in FIGs. 4A-4D) and adjust operation of the remediation sub-system based on the monitored air quality. The sensor couldAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTbe configured to detect at least one of particle concentration, volatile organic compound concentration, and / or ozone concentration within the disinfection chamber.

[0052] In certain examples, the control sub-system 422 is configured to operate the recirculation assembly 455 for a period of time after application of UV light 437 is terminated. For example, at the end of the disinfection cycle, UV light 437 is no longer delivered for a period of time, while the disinfection chamber 436 remains closed (e.g., the door remains locked). During this time period, the recirculation assembly 455 continues to operate to ensure that, when the disinfection chamber 436 is eventually opened, the byproducts 431 have been sufficiently remediated. Alternatively, the control sub-system 422 could operate the recirculation assembly 455 until air quality within the disinfection chamber 436 meets predetermined criteria.

[0053] As noted above, certain aspects presented herein use an adsorption filter to remediate byproducts generated during a radiation-based cleaning process. The adsorption filter could include, for example, activated carbon, activated alumina, electrostatic adsorptive media, etc. Additionally, also as noted above, certain aspects presented herein use a particle filter to remediate byproducts generated during a radiation-based cleaning process. The particle filter could include, for example, a High Efficiency Particulate Air (HEP A) filter, an Ultra Low Particle Air (ULPA) filter, a Pl, P2 or P3 filter, an N95, N99, or N100 filter, etc. As further noted above, certain aspects presented herein use a combined particle / adsorption. The particle / adsorption could be an activated carbon impregnated polyester.

[0054] FIG. 5 is a flowchart of a method 580, in accordance with embodiments presented herein. The method 580 begins at 582 where at least one radiation source of a cleaning system delivers / applies cleaning radiation to a target device disposed in a cleaning chamber, wherein application of the cleaning radiation generates gaseous or particle byproducts. At 582, the cleaning system remediates the gaseous or particle byproducts.

[0055] In certain embodiments presented herein, the cleaning chamber / componentry can be coated in, or made from, materials that wouldn’t off-gas when exposed to cleaning radiation. Similarly, target devices to be cleaned via cleaning radiation may be made from / coated with materials that wouldn’t off-gas when exposed to cleaning radiation. For example, the medical device could be made from a fluoropolymer that is more resistant to, for example, UV radiation. Provided below in Table 1 is a list of potential fluoropolymers that can be used in accordance with these examples. That is, embodiments of the invention encompass cleaning systems and / orAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTmedical devices that are formed from any of the materials listed below such that they are more resistant to degradation during a radiation-based cleaning cycle, and the manufacture of such medical devices. For example, in some embodiments, an ultrasound probe is formed from PTFE. Relatedly, embodiments of the invention further encompass subjecting such medical devices to a radiation-based cleaning cycle.Table 1Polymer Abbreviation Type UVC_254_Resistance Ethylene-CTFE copolymer ECTFE Fluoroplastic GoodEif 14 copoly -nor 04:x>d~Exceite?tTFE- copolymer PEP Fluoroplastic Excellent vistyl ether copolyrrter PFA Fiuoroplestrc Etteiisaf F’csIytetrtsfh.iCirGethyleoe PTFE Fluoroplastic Excellent Poiyvioyiicferie fhx-kis? PV1X riuorepteic VDF-TrFE copolymer P^F-TrFE} Fluoroplastic Good VI> F~TrF' E-C. EFE ter poiymer FrVDF-irtE <; Fd Fiuo-epdstir: Good VDP-TrFE-CFE terpolymer P(VL4-TrFE-CFE) Fluoroplastic Poiychlorotriffuoroe'hyfene PCIFE Fiuoroplcsiic CiOOtl VDF-co-HFP VDF-HFP copolymer (F& WI) Fiuoroeiastomer Uolmoem / G ratio ■ specif it: Terpc4yme: X.4TF£, HFP. Vi> F (FKM#2) THV Fiuo-ottlssiomer Uriks?osvfy’6f»de-sp-?dlk Polymer of VDF. 7F£, (FKGdtj V7P (FKVP4) Fiuoroelastomer Unki'iOWiyiGrade-specifc Good [dremicai / heat}: t; V data PerOuorpelestomi::' 44- FMVG FFKM Fiu;.'>r>5ek:s$i'jr<;ortFE / Propylene copolymer FEPM (TFE / P) F i uo -oelasto me? <i<k -sp'Kifx. Copolymer of ethylene, IFF, 1-iFP I. HiP Fluoroplastic GoodFluoroethylene-vinyl ether copolymer Fluoroplastic / FEVE S500P(co<mrrq Coatirx;

[0056] FIG. 6 is an example medical device, namely an ultrasound probe 600, at least partially formed using a UV resistant material. More specifically, shown in FIG. 6 is a convex (curvilinear) ultrasound probe that includes a body 602, a handle 604, and a cable (cord) 606. The body 602 includes a transducer element (not shown), such as a piezoelectric crystal, and an acoustic lens 601 forming a curved face 603 of the body 602. In this example, the body 602, handle 604, and the optionally the cable 606 are formed from, or at least coated in, a UV resistant material (e.g., one of the materials shown in Table 1, such as PTFE).

[0057] FIG. 7 is a schematic diagram illustrating a disinfection chamber 736, in accordance with embodiments presented herein. In this example, an inner surface 760 of the disinfection chamber 736 is coated with a layer of a UV resistant material 762 (e.g., one of the materials shown in Table 1, such as PTFE).Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT

[0058] FIG. 8 is a flowchart of a method 880, in accordance with embodiments presented herein. The method 880 includes 882 where at least one radiation source of a cleaning system delivers / applies cleaning radiation to a target device disposed in a cleaning chamber. The target device is at least partially formed from, or at least coated in, a UV resistant material (e.g., one of the materials shown in Table 1, such as PTFE).

[0059] Aspects of the techniques presented herein have primarily been described with reference to radiation-based cleaning processes / systems. It is to be appreciated that the techniques presented herein could be used with other types of cleaning processes / systems, such as chemistry-based disinfection processes / systems that could similarly create byproducts and / or release harmful chemical during a cleaning process.

[0060] As noted, merely for ease of illustration, the techniques presented herein are primarily described with reference to medical device cleaning. However, it will be appreciated that the invention is not limited to use with cleaning medical devices and that, instead, the techniques presented herein can be used to in association with the cleaning of a number of different devices / instruments used in any of a number of different applications. The above discussion is not meant to suggest that the disclosed technology is only suitable for implementation within systems akin to that shown or described herein. In general, additional configurations can be used to practice the processes and systems herein and / or some aspects described can be excluded without departing from the processes and systems disclosed herein.

[0061] This disclosure described some aspects of the present technology. Other aspects can, however, be embodied in many different forms and should not be construed as limited to the aspects set forth herein. Rather, these aspects were provided so that this disclosure was thorough and complete and fully conveyed the scope of the possible aspects to those skilled in the art.

[0062] According to certain aspects, systems and non-transitory computer readable storage media are provided. The systems are configured with hardware configured to execute operations analogous to the methods of the present disclosure. The one or more non-transitory computer readable storage media comprise instructions that, when executed by one or more processors, cause the one or more processors to execute operations analogous to the methods of the present disclosure.

[0063] Similarly, where steps of a process are disclosed, those steps are described for purposes of illustrating the present methods and systems and are not intended to limit the disclosure to aAtty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTparticular sequence of steps. For example, the steps can be performed in differing order, two or more steps can be performed concurrently, additional steps can be performed, and disclosed steps can be excluded without departing from the present disclosure. Further, the disclosed processes can be repeated.

[0064] It is also to be appreciated that the embodiments presented herein are not mutually exclusive and that the various embodiments may be combined with another in any of a number of different manners.

Claims

Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCTCLAIMSWhat is claimed is:

1. A method, comprising:applying cleaning radiation to a target device disposed in a cleaning chamber, wherein application of the cleaning radiation generates gaseous or particle byproducts; and remediating the gaseous or particle byproducts.

2. The method of claim 1, wherein remediating the gaseous or particle byproducts includes:removing the gaseous or particle byproducts from air within the cleaning chamber while the cleaning chamber remains closed.

3. The method of claim 1, wherein remediating the gaseous or particle byproducts includes:filtering air in the cleaning chamber with at least one filter to remove the gaseous or particle byproducts.

4. The method of claim 3, wherein filtering the air in the cleaning chamber with the at least one filter comprises:filtering the air in the cleaning chamber with at least one particle filter.

5. The method of claim 3, wherein filtering the air in the cleaning chamber with the at least one filter comprises:filtering the air in the cleaning chamber with at least one adsorption filter.

6. The method of claim 3, wherein filtering the air in the cleaning chamber with the at least one filter comprises:filtering the air in the cleaning chamber with at least one adsorption filter and at least one particle filter.

7. The method of claim 3, wherein filtering the air in the cleaning chamber with the at least one filter comprises:filtering the air in the cleaning chamber with a combined particle / adsorption filter.Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT8. The method of claim 3, wherein filtering the air in the cleaning chamber with the at least one filter comprises:filtering the air in the cleaning chamber with an activated carbon filter.

9. The method of claim 1, wherein remediating the gaseous or particle byproducts includes:drawing air from an ambient environment into the cleaning chamber via an air intake assembly;circulating the air through the cleaning chamber to an outflow assembly for discharge from the cleaning chamber to the ambient environment; andfiltering the air at the outflow assembly before discharge to the ambient environment.

10. The method of claim 9, wherein the air intake assembly includes at least one intake fan to draw the air from the ambient environment and circulate the air through the cleaning chamber.

11. The method of claim 9, wherein the air intake assembly includes at least one intake filter to filter the air before the air is circulated through the cleaning chamber.

12. The method of claim 1, wherein remediating the gaseous or particle byproducts includes:drawing air present in the cleaning chamber through a recirculation assembly for recirculation within the cleaning chamber; andfiltering the air at the recirculation assembly before recirculation to the cleaning chamber.

13. The method of claim 12, wherein the recirculation assembly includes at least one recirculation fan to draw the air from the cleaning chamber through the recirculation assembly.

14. The method of claim 1, wherein applying cleaning radiation to a target device comprises:delivering ultraviolet (UV) radiation to the target device.Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT15. The method of claim 1, wherein applying cleaning radiation to a target device comprises:delivering Gamma radiation to the target device.

16. The method of claim 1, wherein the target device is an ultrasound probe.

17. A disinfection system, comprising:a body defining a disinfection chamber;a door attached to the body and configured to seal the disinfection chamber;at least one radiation source configured to deliver cleaning radiation to a target device positioned in the disinfection chamber; anda remediation sub-system configured to remediate gaseous or particle byproducts generated as a result of irradiation of the target device.

18. The disinfection system of claim 17, wherein the remediation sub-system operates to remove gaseous or particle byproducts from air within the disinfection chamber while the disinfection chamber remains closed.

19. The disinfection system of claim 17, wherein the remediation sub-system includes at least one filter configured to filter air in the disinfection chamber to remove the gaseous or particle byproducts.

20. The disinfection system of claim 19, wherein the at least one filter comprises at least one particle filter.

21. The disinfection system of claim 19, wherein the at least one filter comprises at least one adsorption filter.

22. The disinfection system of claim 19, wherein the at least one filter comprises at least at least one adsorption filter and at least one particle filter.

23. The disinfection system of claim 19, wherein the at least one filter comprises a combined particle / adsorption filter.Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT24. The disinfection system of claim 19, wherein the at least one filter comprises an activated carbon filter.

25. The disinfection system of claim 17, wherein the remediation sub-system comprises:an air intake assembly configured to draw air from an ambient environment into the disinfection chamber and circulate the air through the disinfection chamber; andan outflow assembly configured to discharge air from the disinfection chamber to the ambient environment,wherein the outflow assembly is configured to filtering the air before discharge to the ambient environment.

26. The disinfection system of claim 25, wherein the air intake assembly includes at least one intake fan to draw the air from the ambient environment and circulate the air through the disinfection chamber to the outflow assembly.

27. The disinfection system of claim 25 wherein the air intake assembly includes at least one intake filter to filter the air before the air is circulated through the disinfection chamber.

28. The disinfection system of claim 17, wherein the remediation sub-system comprises:a recirculation assembly configured to draw air present in the disinfection chamber therethrough for recirculation within the disinfection chamber,wherein the recirculation assembly is configured to filter the air before recirculation to the disinfection chamber.

29. The disinfection system of claim 28, wherein the recirculation assembly includes at least one recirculation fan to draw the air from the disinfection chamber through the recirculation assembly.

30. The disinfection system of claim 17, wherein the at least one radiation source comprises at least one ultraviolet (UV) radiation source.

31. The disinfection system of claim 17, wherein the at least one radiation source comprises at least one Gamma radiation source.Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT32. The disinfection system of claim 17, further comprising:a holding assembly configured to suspend the target device within the disinfection chamber.

33. The disinfection system of claim 32, wherein the target device is an ultrasound probe, and wherein the holding assembly comprises:at least one clamp disposed configured to receive and grip a cord of the ultrasound probe to suspend the ultrasound probe in the disinfection chamber.

34. The disinfection system of claim 17, further comprising:a control sub-system configured to control operation of the at least one radiation source and the remediation sub-system.

35. The disinfection system of claim 34, wherein the control sub-system is configured to:activate the remediation sub-system before activating the at least one radiation source; maintain operation of the remediation sub-system during irradiation of the target device; andcontinue operation of the remediation sub-system after deactivating the at least one radiation source.

36. The disinfection system of claim 34, wherein the control sub-system comprises:at least one sensor configured to monitor air quality within the disinfection chamber; anda processor configured to control the remediation sub-system based on data from the at least one sensor.

37. The disinfection system of claim 36, wherein the at least one sensor comprises at least one of a particle sensor, a volatile organic compound sensor, and an ozone sensor.Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT38. A method, comprising:positioning a target device within a disinfection chamber;sealing the disinfection chamber;activating a remediation sub-system to begin remediating air within the disinfection chamber; andapplying cleaning radiation to the target device while the remediation sub-system operates.

39. The method of claim 38, wherein activating the remediation sub-system comprises:activating at least one fan to circulate air within the disinfection chamber through at least one filter.

40. The method of claim 38, further comprising:monitoring air quality within the disinfection chamber; andadjusting operation of the remediation sub-system based on the monitored air quality.

41. The method of claim 40, wherein monitoring air quality comprises:detecting at least one of particle concentration, volatile organic compound concentration, and ozone concentration within the disinfection chamber.

42. The method of claim 38, further comprising:continuing operation of the remediation sub-system after ceasing application of the cleaning radiation.

43. The method of claim 42, wherein continuing operation of the remediation sub-system after ceasing application of the cleaning radiation comprises:operating the remediation sub-system for a predetermined time period after ceasing application of the cleaning radiation.

44. The method of claim 42, wherein continuing operation of the remediation sub-system after ceasing application of the cleaning radiation comprises:operating the remediation sub-system until air quality within the disinfection chamber meets predetermined criteria.Atty. Docket No. 1462.0037i Client Ref. No. NAN0060PCT45. A cleaning apparatus, comprising:a housing defining an enclosed cleaning chamber;a closure mechanism configured to selectively seal the cleaning chamber;at least one radiation source positioned within the housing and configured to emit disinfecting radiation toward a target device within the cleaning chamber; andan air treatment sub-system configured to process air within the cleaning chamber to remove toxic byproducts generated during irradiation of the target device.

46. The cleaning apparatus of claim 45, wherein the air treatment system comprises: at least one filter positioned to filter air circulating within the cleaning chamber.

47. The cleaning apparatus of claim 46, wherein the at least one filter comprises:a high-efficiency particulate air (HEPA) filter configured to remove particulate contaminants from the air.

48. The cleaning apparatus of claim 46, wherein the at least one filter comprises:an activated carbon filter configured to adsorb gaseous contaminants from the air.

49. The cleaning apparatus of claim 45, wherein the air treatment system comprises: at least one fan configured to move air through the cleaning chamber; and a filter assembly positioned in fluid communication with the fan.

50. The cleaning apparatus of claim 49, wherein the filter assembly is positioned upstream of the fan relative to air flow direction.

51. The cleaning apparatus of claim 49, wherein the filter assembly is positioned downstream of the fan relative to air flow direction.

52. The cleaning apparatus of claim 45, wherein the at least one radiation source comprises at least one ultraviolet light source.

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