Gas quality maintenance in a laser discharge chamber
By employing performance scans to optimize gas injection parameters in DUV laser discharge chambers, the method addresses the inefficiencies of conventional gas replenishment, achieving reduced gas and power consumption while maintaining chamber performance.
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- CYMER INC
- Filing Date
- 2025-11-21
- Publication Date
- 2026-07-02
AI Technical Summary
Conventional gas replenishment processes in DUV laser discharge chambers are costly due to excessive gas consumption and power usage, particularly when the laser radiation source is idle for extended periods.
Implement a method that includes performance scans before and after refill operations to determine optimal gas injection parameters, adjusting the frequency and amount of gas injection based on chamber health and efficiency changes, thereby optimizing gas usage and reducing unnecessary refills.
This approach reduces gas consumption and power usage by dynamically adjusting gas injection periodicity and size, minimizing unnecessary operations and extending the time between refills while maintaining chamber performance.
Smart Images

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