Composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, camera module, and compound

Abstract

This composition comprises: at least one compound A selected from compounds represented by formula (1), compounds represented by formula (2), and stereoisomers thereof; a curable compound; and a solvent. The present invention also provides a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, and a camera module, each of which uses the composition.

Description

Compositions, films, optical filters, solid-state image sensors, image display devices, infrared sensors, camera modules, and compounds

[0001] This invention relates to indigo compounds and compositions containing them. Furthermore, this invention relates to films, optical filters, solid-state image sensors, image display devices, infrared sensors, and camera modules using compositions containing indigo compounds.

[0002] Video cameras, digital still cameras, and mobile phones with camera functions use solid-state image sensors for color images, such as CCDs (charge-coupled devices) and CMOS (complementary metal-oxide-semiconductor) sensors. These solid-state image sensors use silicon photodiodes, which are sensitive to infrared light, in their light-receiving sections. For this reason, infrared cut filters are sometimes provided to correct the visual sensitivity.

[0003] Infrared cut filters are manufactured using compositions containing infrared absorbents. Indigo compounds are known examples of infrared absorbents.

[0004] Patent Document 1 describes the manufacture of an infrared cut filter and the like using a composition containing a specific indigo compound.

[0005] Japanese Patent Publication No. 2022-184710

[0006] In recent years, there has been a demand for further improvements in moisture resistance and heat resistance of films obtained using compositions containing infrared absorbers. Furthermore, achieving these improvements requires maintaining the dispersion state of the composition and further enhancing its storage stability.

[0007] The object of the present invention is to provide a composition that can form a film with good storage stability and excellent moisture resistance and heat resistance. The present invention also aims to provide films, optical filters, solid-state image sensors, image display devices, infrared sensors, camera modules, and compounds.

[0008] The present invention provides the following:

[0009] <1> A composition comprising at least one compound A selected from a compound represented by formula (1), a compound represented by formula (2), and stereoisomers thereof; a curable compound; and a solvent; In the formula, A １ , A ２ , A １１ , A １２ , A ２１ , A ２２ , X １ , X ２ , X ２１ and X ２２ each independently represent a substituent, and X １ and X ２ , X ２１ and X ２２ may be linked to each other to form a ring, and R １ to R ８ , R １１ to R １８ , R ２１ to R ２８ each independently represent a hydrogen atom or a substituent, and M １ and M ２ each independently represent a metal atom or a group represented by formula (M-1), and n represents an integer of 0 or more; In the formula, * represents a bond, and L １ represents a tetravalent linking group. <2> The composition according to <1>, wherein the metal atoms represented by M １ and M ２ are Zn, Co or Ni. <3> The composition according to <1>, wherein the tetravalent linking group represented by L １ is a group represented by formula (L1-1) or formula (L1-2); In the formula, the wavy line represents a bond, and Ar Ｌ１ , Ar Ｌ１１ and Ar Ｌ１２ each independently represent an aromatic hydrocarbon group or an aromatic heterocyclic group, and L １１<1> represents a single bond or a divalent linking group. <4> The composition according to any one of <1> to <3>, further comprising at least one selected from an infrared absorber other than compound A and a chromatic coloring agent. <5> A film obtained using the composition according to any one of <1> to <4>. <6> An optical filter having the film according to <5>. <7> A solid-state image sensor having the film according to <5>. <8> An image display device having the film according to <5>. <9> An infrared sensor having the film according to <5>. <10> A camera module having the film according to <5>. <11> A compound selected from the compound represented by formula (1), the compound represented by formula (2), and their stereoisomers; In the formula, A １ A ２ A １１ A １２ A ２１ A ２２ , X １ , X ２ , X ２１ and X ２２ Each of these independently represents a substituent, X １ and X ２ , X ２１ and X ２２ They may be connected to each other to form a ring, R １ ~R ８ , R １１ ~R １８ , R ２１ ~R ２８ Each of these independently represents a hydrogen atom or a substituent, M １ and M ２ Each of these independently represents a metal atom or a group represented by formula (M-1), and n represents a non-negative integer; In the formula, * represents a bond, L １ This represents a tetravalent linking group.

[0010] According to the present invention, it is possible to provide a composition that can form a film with good storage stability and excellent moisture resistance and heat resistance. Furthermore, the present invention can provide films, optical filters, solid-state image sensors, image display devices, infrared sensors, camera modules, and compounds.

[0011] This is a schematic diagram showing one embodiment of an infrared sensor.

[0012] The present invention will be described in detail below. In this specification, "~" is used to mean that the numerical values ​​before and after it are included as the lower and upper limits. In the notation of groups (atomic groups) in this specification, notations that do not specify substituted or unsubstituted include both groups (atomic groups) with substituents and groups (atomic groups) without substituents. For example, "alkyl group" includes not only alkyl groups without substituents (unsubstituted alkyl groups) but also alkyl groups with substituents (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. In addition, examples of light used for exposure include the emission line spectrum of mercury lamps, far ultraviolet light represented by excimer lasers, extreme ultraviolet (EUV) light, X-rays, electron beams, and other active light or radiation. In this specification, "(meth)acrylate" refers to both acrylate and methacrylate, or either; "(meth)acrylic" refers to both acrylic and methacrylic, or either; and "(meth)acryloyl" refers to both acryloyl and methacryloyl, or either. In this specification, weight-average molecular weight and number-average molecular weight are defined as polystyrene equivalent values ​​measured by gel permeation chromatography (GPC). In this specification, Me in chemical formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared light refers to light (electromagnetic waves) with a wavelength of 700 to 2500 nm. In this specification, total solids refers to the total mass of the components of a composition excluding the solvent. In this specification, the term "process" includes not only independent processes but also processes that cannot be clearly distinguished from other processes, as long as the intended function of the process is achieved.

[0013] <Composition> The composition of the present invention is characterized by comprising at least one compound A selected from a compound represented by formula (1), a compound represented by formula (2), and stereoisomers thereof, a curable compound, and a solvent.

[0014] The composition of the present invention has good storage stability and can form a film with excellent moisture resistance and heat resistance. The reason for these effects is presumed to be as follows: Compound A contained in the composition of the present invention is a compound containing multiple indigo skeletons, but it is presumed that the ends (both ends for formula (1), and one end for formula (2)) are boron-complexed, resulting in high planarity and strong intermolecular interactions. For this reason, it is presumed that compound A readily forms aggregates during film formation. For this reason, the composition of the present invention containing such a compound can form a film with excellent moisture resistance and heat resistance. Furthermore, according to the inventors' research, compounds containing multiple indigo skeletons tend to aggregate easily in the composition due to strong intermolecular interactions, but it was found that the tendency to aggregate in the composition can be reduced by boron-complexing the ends. The reason for this is presumed to be that, in compounds containing multiple indigo skeletons, the NH groups of the indigo skeleton are protected by boron by boron complexing at their ends (both ends in formula (1), and one end in formula (2)), thereby suppressing the formation of intermolecular hydrogen bonds. For this reason, the composition of the present invention containing compound A exhibits excellent storage stability.

[0015] The composition of the present invention can be used as a composition for optical filters. Examples of optical filters include infrared cut filters and infrared transmission filters. Since compound A has excellent visible light transmittance and infrared shielding properties, the composition of the present invention is particularly preferred for use as a composition for infrared cut filters.

[0016] The following describes each component used in the composition of the present invention.

[0017] <<Specific Compound (at least one compound A selected from the compound represented by formula (1), the compound represented by formula (2), and their stereoisomers)>> The composition of the present invention contains at least one compound A (hereinafter also referred to as the specific compound) selected from the compound represented by formula (1), the compound represented by formula (2), and their stereoisomers. For the reason that the effects of the present invention are more pronounced, the composition of the present invention preferably contains at least one selected from the compound represented by formula (1) and its stereoisomers. The specific compound may be a pigment or a dye. The compound represented by formula (1), the compound represented by formula (2), and their stereoisomers are also compounds of the present invention. In this specification, examples of stereoisomers include cis-trans isomers, enantiomers, diastereomers, conformational isomers, etc.

[0018]

[0019] In the formula, A １ A ２ A １１ A １２ A ２１ A ２２ , X １ , X ２ , X ２１ and X ２２ Each of these independently represents a substituent, X １ and X ２ , X ２１ and X ２２ They may be connected to each other to form a ring, R １ ~R ８ , R １１ ~R １８ , R ２１ ~R ２８ Each of these independently represents a hydrogen atom or a substituent, M １ and M ２ Each of these independently represents a metal atom or a group represented by formula (M-1), and n represents a non-negative integer;

[0020]

[0021] In the formula, * represents a bond, L １ This represents a tetravalent linking group.

[0022] -A １ , A ２ , A １１ , A １２ , A ２１ and A ２２ with respect to A in Formula (1) and Formula (2)- １ , A ２ , A １１ , A １２ , A ２１ and A ２２ Each of A represents a substituent independently. A １ , A ２ , A １１ , A １２ , A ２１ and A ２２ Examples of the substituent represented by A include an aryl group, a heteroaryl group, and an alkyl group.

[0023] The number of carbon atoms of the alkyl group is preferably 1 to 30, more preferably 1 to 20, and still more preferably 1 to 12. The alkyl group includes linear, branched, and cyclic, and is more preferably linear or branched. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups exemplified by the substituent T described below, the group represented by the formula (R-100) described below, and the group represented by the formula (R-200) described below, and are preferably an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, the group represented by the formula (R-100) described below, or the group represented by the formula (R-200) described below.

[0024] The number of carbon atoms of the aryl group is preferably 6 to 30, more preferably 6 to 20, and still more preferably 6 to 12. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups exemplified by the substituent T described below, the group represented by the formula (R-100) described below, and the group represented by the formula (R-200) described below, and are preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, the group represented by the formula (R-100) described below, or the group represented by the formula (R-200) described below.

[0025] The number of carbon atoms constituting the ring of the heteroaryl group is preferably 1 to 10, more preferably 1 to 5. Examples of the types of heteroatoms constituting the ring of the heteroaryl group include nitrogen atom, oxygen atom and sulfur atom. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3, more preferably 1 to 2. The heteroaryl group is preferably a monocyclic or condensed ring having 2 to 8 condensed rings, more preferably a monocyclic or condensed ring having 2 to 4 condensed rings. The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups exemplified as the substituent T described below, the group represented by the formula (R-100) described below, and the group represented by the formula (R-200) described below, and preferably an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, the group represented by the formula (R-100) described below or the group represented by the formula (R-200) described below.

[0026] In the formulas (1) and (2), A １ , A ２ , A １１ , A １２ , A ２１ and A ２２ are each independently preferably an aryl group or a heteroaryl group.

[0027] -X １ , X ２ , X ２１ and X ２２ For - In the formulas (1) and (2), X １ , X ２ , X ２１ and X ２２ each independently represents a substituent. The substituents represented by X １ , X ２ , X ２１ and X ２２ include an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a cyano group and a halogen atom.

[0028] The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 12 carbon atoms. The aryl group may have substituents or may be unsubstituted. Examples of substituents include the group listed as substituent T later, the group represented by formula (R-100) later, and the group represented by formula (R-200) later, and preferably alkyl groups, alkoxy groups, aryl groups, heteroaryl groups, halogen atoms, the group represented by formula (R-100) later, or the group represented by formula (R-200) later.

[0029] The number of carbon atoms constituting the ring of the heteroaryl group is preferably 1 to 10, and more preferably 1 to 5. Examples of heteroatoms constituting the ring of the heteroaryl group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3, and more preferably 1 to 2. The heteroaryl group is preferably a monoring or a fused ring with 2 to 8 condensation units, and more preferably a monoring or a fused ring with 2 to 4 condensation units. The heteroaryl group may have substituents or may be unsubstituted. Examples of substituents include the group listed as substituent T later, the group represented by formula (R-100) later, and the group represented by formula (R-200) later, and is preferably an alkyl group, alkoxy group, aryl group, heteroaryl group, halogen atom, the group represented by formula (R-100) later, or the group represented by formula (R-200) later.

[0030] The number of carbon atoms in the alkoxy group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 12. The alkoxy group can be linear, branched, or cyclic, with linear or branched being more preferred. The alkoxy group may have substituents or may be unsubstituted. Examples of substituents include the group listed as substituent T later, the group represented by formula (R-100) later, and the group represented by formula (R-200) later, and is preferably an aryl group, a heteroaryl group, a halogen atom, the group represented by formula (R-100) later, or the group represented by formula (R-200) later.

[0031] The aryloxy group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 12 carbon atoms. The aryloxy group may have substituents or may be unsubstituted. Examples of substituents include the group listed as substituent T later, the group represented by formula (R-100) later, and the group represented by formula (R-200) later, and preferably alkyl groups, alkoxy groups, aryl groups, heteroaryl groups, halogen atoms, the group represented by formula (R-100) later, or the group represented by formula (R-200) later.

[0032] Examples of halogen atoms include chlorine, fluorine, bromine, and iodine atoms.

[0033] In equation (1), X １ and X ２ , X ２１ and X ２２ They may be connected to each other to form a ring. In equation (2), X １ and X ２ These may be linked to each other to form a ring. The formed ring is preferably a five-membered or six-membered ring. Examples of the formed ring include the ring represented by formula (X-1). In the following, the dashed line represents a bond with a boron atom, and R Ｘ１ ~R Ｘ４ Each of these independently represents a hydrogen atom or a substituent. Ｘ１ ~R Ｘ４ Examples of substituents represented by include the group listed in substituent T described later, the group represented by formula (R-100) described later, and the group represented by formula (R-200) described later, with halogen atoms, alkyl groups, or alkoxy groups being preferred.

[0034] In equation (1), X １ , X ２ , X ２１ and X ２２ Each of these is independently an aryl group or a heteroaryl group, or X １ and X ２ , X ２１ and X ２２It is preferable that they are linked to each other to form a ring (preferably a ring represented by formula (X-1) above), more preferably an aryl group or a heteroaryl group, and even more preferably an aryl group. In formula (2), X １ and X ２ Each of these is independently an aryl group or a heteroaryl group, or X １ and X ２ It is preferable that these groups are linked to each other to form a ring (preferably a ring represented by formula (X-1) described above), more preferably an aryl group or a heteroaryl group, and even more preferably an aryl group.

[0035] -R １ ~R ８ , R １１ ~R １８ and R ２１ ~R ２８ Regarding R in equations (1) and (2) １ ~R ８ , R １１ ~R １８ , R ２１ ~R ２８ Each of these independently represents a hydrogen atom or a substituent. １ ~R ８ , R １１ ~R １８ , R ２１ ~R ２８ Examples of substituents represented by include the group listed in substituent T described later, the group represented by formula (R-100) described later, and the group represented by formula (R-200) described later, with halogen atoms, alkyl groups, or alkoxy groups being preferred.

[0036] Examples of halogen atoms include chlorine, fluorine, bromine, and iodine atoms.

[0037] The number of carbon atoms in the alkyl group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 12. Alkyl groups can be linear, branched, or cyclic, with linear or branched being more preferred. Alkyl groups may have substituents or be unsubstituted. Substituents include the groups listed in substituent T later, the group represented by formula (R-100) later, and the group represented by formula (R-200) later, and are preferably alkoxy groups, aryl groups, heteroaryl groups, halogen atoms, the group represented by formula (R-100) later, or the group represented by formula (R-200) later.

[0038] The number of carbon atoms in the alkoxy group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 12. The alkoxy group can be linear, branched, or cyclic, with linear or branched being more preferred. The alkoxy group may have substituents or may be unsubstituted. Examples of substituents include the group listed as substituent T later, the group represented by formula (R-100) later, and the group represented by formula (R-200) later, and is preferably an aryl group, a heteroaryl group, a halogen atom, the group represented by formula (R-100) later, or the group represented by formula (R-200) later.

[0039] -M １ and M ２ Regarding - M in equations (1) and (2) １ and M ２ Each of these independently represents a metal atom or a group represented by formula (M-1).

[0040] M １ and M ２Examples of metal atoms represented by include Zn, Co, Ni, Mn, Pt, Ru, Sn, Ti, and Ba, with Zn, Co, or Ni being preferred because they can form films with excellent heat resistance and moisture resistance. Ligands may be coordinated to the metal atoms. Examples of ligands include halogen atoms (chlorine atoms, bromine atoms, fluorine atoms, etc.), heterocyclic compounds (e.g., pyridine, pyrimidine, imidazole, pyrazole, triazole, tetrazole, quinoline, 1,10-phenanthroline, etc.), protic compounds (e.g., water, methanol, ethanol, etc.), amine compounds (e.g., triethylamine, N,N,N',N'-tetramethylenediamine, ethylenediaminetetraacetic acid N,N,N',N'',N''-pentamethyldiethylenetriamine, etc.), amide compounds (e.g., N,N-dimethylacetamide, N-methylpyrrolidone, etc.), dimethyl sulfoxides, sulfolanes, nitrile compounds (e.g., acetonitrile, etc.), and phosphate ester compounds.

[0041] In the group represented by formula (M-1), L １ Examples of tetravalent linking groups represented by include: (1) aliphatic hydrocarbon groups; (2) aromatic hydrocarbon groups; (3) aromatic heterocyclic groups; (4) groups in which multiple aliphatic hydrocarbon groups are linked via single or divalent linking groups; (5) groups in which multiple aromatic hydrocarbon groups are linked via single or divalent linking groups; (6) groups in which multiple aromatic heterocyclic groups are linked via single or divalent linking groups; (7) groups in which an aromatic hydrocarbon group and an aromatic heterocyclic group are linked via single or divalent linking groups; (8) groups that combine the groups listed in (1) to (7) above with -O-; and so on.

[0042] The number of carbon atoms in the above aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, even more preferably 1 to 10, and particularly preferably 1 to 5. The number of carbon atoms in the above aromatic hydrocarbon group is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6. The above aromatic heterocyclic group is preferably a monocycle or a fused ring with 2 to 4 condensation units. The number of heteroatoms constituting the ring of the aromatic heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the aromatic heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the aromatic heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12.

[0043] The divalent linking groups in (4) to (7) above include hydrocarbon groups, heterocyclic groups, -O-, -S-, -CO-, -COO-, -OCO-, -CONH-, -NHCO-, and -SO ２ - are some examples.

[0044] The hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. Furthermore, the aliphatic hydrocarbon group may be linear, branched, or cyclic. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, even more preferably 1 to 10, and particularly preferably 1 to 5. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6. The heterocyclic group may be an aromatic heterocyclic group or a non-aromatic heterocyclic group. The heterocyclic group is preferably a monocyclic ring or a fused ring with 2 to 4 condensation units. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12.

[0045] L in equation (M-1) １ The tetravalent linking group represented is preferably a group represented by formula (L1-1) or formula (L1-2). In the formula, the wavy line represents a bond, ArＬ１ Ar Ｌ１１ and Ar Ｌ１２ Each of these independently represents an aromatic hydrocarbon group or an aromatic heterocyclic group, L １１ represents a single bond or a divalent linking group.

[0046] Ar Ｌ１ Ar Ｌ１１ and Ar Ｌ１２ The number of carbon atoms in the aromatic hydrocarbon group represented by Ar is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6. Ｌ１ Ar Ｌ１１ and Ar Ｌ１２ The aromatic heterocyclic group represented by is preferably a monocyclic ring or a fused ring with 2 to 4 condensation units. The number of heteroatoms constituting the ring of the aromatic heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the aromatic heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the aromatic heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12.

[0047] L １１ The divalent linking groups represented by include hydrocarbon groups, heterocyclic groups, -O-, -S-, -CO-, -COO-, -OCO-, -CONH-, -NHCO-, and -SO ２ - are some examples.

[0048] The hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. Furthermore, the aliphatic hydrocarbon group may be linear, branched, or cyclic. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, even more preferably 1 to 10, and particularly preferably 1 to 5. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6. The heterocyclic group may be an aromatic heterocyclic group or a non-aromatic heterocyclic group. The heterocyclic group is preferably a monocyclic ring or a fused ring with 2 to 4 condensation units. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12.

[0049] -Regarding n- In equations (1) and (2), n represents an integer greater than or equal to 0. It is preferable that n is an integer between 0 and 10, more preferably between 0 and 6, and even more preferably between 0 and 4.

[0050] - Regarding substituents T - Examples of substituents T include the following groups: halogen atoms (e.g., fluorine atoms, chlorine atoms, bromine atoms, iodine atoms), alkyl groups (preferably alkyl groups having 1 to 30 carbon atoms), cycloalkyl groups (preferably cycloalkyl groups having 5 to 30 carbon atoms), alkenyl groups (preferably alkenyl groups having 2 to 30 carbon atoms), alkynyl groups (preferably alkynyl groups having 2 to 30 carbon atoms), aryl groups (preferably aryl groups having 6 to 30 carbon atoms), heteroaryl groups (preferably heteroaryl groups having 1 to 30 carbon atoms), amino groups (preferably amino groups having 0 to 30 carbon atoms), and alkoxy groups. (Preferably an alkoxy group having 1 to 30 carbon atoms), aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), heteroaryloxy group (preferably a heteroaryloxy group having 1 to 30 carbon atoms), acyl group (preferably an acyl group having 2 to 30 carbon atoms), alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), heteroaryloxycarbonyl group (preferably a heteroaryloxy group having 2 to 30 carbon atoms) Carbonyl group), acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), sulfamo Ilamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), heteroarylthio group (preferably a heteroarylthio group having 1 to 30 carbon atoms), alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms),Aryl sulfonyl group (preferably an aryl sulfonyl group having 6 to 30 carbon atoms), aryl sulfonylamino group (preferably an aryl sulfonylamino group having 6 to 30 carbon atoms), heteroaryl sulfonyl group (preferably a heteroaryl sulfonyl group having 1 to 30 carbon atoms), heteroaryl sulfonylamino group (preferably a heteroaryl sulfonylamino group having 1 to 30 carbon atoms), alkyl sulfinyl group (preferably an alkyl sulfinyl group having 1 to 30 carbon atoms), aryl sulfinyl group (preferably an aryl sulfonyl group having 6 to 30 carbon atoms) Finyl group), heteroarylsulfinyl group (preferably a heteroarylsulfinyl group having 1 to 30 carbon atoms), ureido group (preferably a ureido group having 1 to 30 carbon atoms), hydroxyl group, nitro group, carboxyl group, sulfo group, phosphoric acid group, carboxylic acid amide group, sulfonic acid amide group, imide group, phosphino group, mercapto group, cyano group, alkylsulfino group, arylsulfino group, arylazo group, heteroarylazo group, phosphinyl group, phosphinyloxy group, phosphinylamino group, silyl group, hydrazino group, imino group. These groups may have further substituents if they are further substituted. Examples of substituents include the group described above as substituent T and the group represented by the following formula (R-100).

[0051] -For the group represented by formula (R-100)- -O-(R ｒ１ -O) ｍ -R ｒ２ ...(R-100)

[0052] In formula (R-100), R ｒ１ R represents an alkylene group having 1 to 10 carbon atoms. ｒ２ represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an aryl group having 6 to 10 carbon atoms, and m represents an integer from 1 to 30.

[0053] -Regarding the base represented by formula (R-200)- -L Ｒ１ - (Y Ｒ１ ) ｎ ...(R-200) In formula (R-200), L Ｒ１ represents a single bond or an n+1 valent linking group, Y Ｒ１represents an acidic or basic group, n represents an integer from 1 to 4, and L Ｒ１ If it is a single bond, then n is 1.

[0054] L in formula (R-200) Ｒ１ Y represents a single bond or an n+1 valent linking group. Ｒ１ If it is a basic group, L Ｒ１ It is preferable that the linking group is an n+1 valent group.

[0055] L Ｒ１ The n+1 valent linking groups represented by include aliphatic hydrocarbon groups, aromatic hydrocarbon groups, heterocyclic groups, -O-, -S-, -CO-, -COO-, -OCO-, and -SO ２ -, -NR Ｌ１０ -, -N<, -NR Ｌ１０ CO-, -CONR Ｌ１０ -, -NR Ｌ１０ SO ２ -, -SO ２ NR Ｌ１０ - and combinations thereof are examples of groups. Ｌ１０ represents a hydrogen atom, an alkyl group, or an aryl group.

[0056] The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. The aliphatic hydrocarbon group may also be linear, branched, or cyclic. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, even more preferably 1 to 10, and particularly preferably 1 to 5. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6. The heterocyclic group is preferably a monocyclic or a fused ring with 2 to 4 condensation units. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen, oxygen, or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12. The aliphatic hydrocarbon group, aromatic hydrocarbon group, and heterocyclic group may have substituents. Examples of substituents include alkyl groups and aryl groups.

[0057] Y in formula (R-200) Ｒ１Y represents an acidic or basic group. Ｒ１ Examples of acid groups represented include carboxyl groups, sulfo groups, phosphate groups, boronic acid groups, imido acid groups, and salts thereof. Examples of atoms or groups of atoms constituting the salt include alkali metal ions (Li ＋ Na ＋ _K ＋ (Ca) ２＋ Mg ２＋ Examples include ammonium ions, imidazolium ions, pyridinium ions, and phosphonium ions. Examples of imido acid groups include -SO ２ NHSO ２ R ｙ１ , -CONHSO ２ R ｙ２ , -CONHCOR ｙ３ or -SO ２ NHCOR ｙ４ Preferably, -SO ２ NHSO ２ R ｙ１ , -CONHSO ２ R ｙ２ , or -SO ２ NHCOR ｙ４ More preferably, -SO ２ NHSO ２ R ｙ１ or -CONHSO ２ R ｙ２ This is even more preferable. ｙ１ ~R ｙ４ Each of these independently represents an alkyl group or an aryl group. ｙ１ ~R ｙ４ The alkyl and aryl groups represented by may have substituents. The substituents are preferably halogen atoms, and more preferably fluorine atoms. ｙ１ ~R ｙ４ Each of these is preferably an alkyl group containing a fluorine atom or an aryl group containing a fluorine atom, and more preferably an alkyl group containing a fluorine atom. The alkyl group containing a fluorine atom has 1 to 10 carbon atoms, more preferably 1 to 5, and even more preferably 1 to 3. The aryl group containing a fluorine atom has 6 to 20 carbon atoms, more preferably 6 to 12, and even more preferably 6.

[0058] Y Ｒ１ Examples of basic groups represented by include amino groups, pyridinyl groups and their salts, ammonium groups, and phthalimidomethyl groups. Examples of atoms or groups of atoms constituting the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions. Examples of amino groups include -NR ｙ１１ R ｙ１２ Examples include the group represented by and the cyclic amino group.

[0059] -NR ｙ１１ R ｙ１２ In the group represented by R ｙ１１ and R ｙ１２ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and is preferably an alkyl group. That is, the amino group is preferably a dialkylamino group. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but linear or branched is preferred, and linear is more preferred. The alkyl group may have substituents. Examples of substituents include the substituent T mentioned above. The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have substituents. Examples of substituents include the substituent T mentioned above.

[0060] Examples of cyclic amino groups include pyrrolidine, piperidine, piperazine, and morpholine groups. These groups may further have substituents. Examples of substituents include the substituent T mentioned above.

[0061] In formula (R-200), n represents an integer from 1 to 4, preferably 1 or 2, and more preferably 1.

[0062] The specified compound may be a pigment or a dye. Furthermore, the specified compound may be a pigment derivative. When the specified compound is used as a pigment derivative, it is preferable that the specified compound is a compound having a group represented by formula (R-200) as a substituent.

[0063] Specific examples of the specified compounds include compounds 1-1 to 1-28 shown below. Compounds 1-10 and 1-11 include stereoisomers such as cis-trans isomers. In the table, Me represents a methyl group and Ac represents an acetyl group.

[0064]

[0065] In the table above, A-1 to A-7, X-1 to X-6, and L-1-1 to L-1-8 are as follows. In the structural formulas shown below, Me represents a methyl group, and the dashed lines and * represent bonds.

[0066] The maximum absorption wavelength of a particular compound is more preferably in the range of 750 to 1500 nm, even more preferably in the range of 900 to 1300 nm, and particularly preferably in the range of 1000 to 1200 nm.

[0067] Certain compounds are preferably used as infrared absorbers.

[0068] The content of the specific compound in the total solid content of the composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. Furthermore, the upper limit of the content of the specific compound is preferably 50% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less. The composition of the present invention may contain only one specific compound, or it may contain two or more. If it contains two or more, it is preferable that their total amount is within the above range. When the composition of the present invention contains two or more specific compounds, the composition of the present invention may contain a compound represented by formula (1) or its stereoisomer (hereinafter, the compound represented by formula (1) and its stereoisomer are collectively referred to as compound (1)) and a compound represented by formula (2) or its stereoisomer (hereinafter, the compound represented by formula (2) and its stereoisomer are collectively referred to as compound (2)). When the composition of the present invention contains compound (1) and compound (2), the ratio of compound (1) to compound (2) is preferably 0.1 to 100 parts by mass of compound (2) per 100 parts by mass of compound (1). The upper limit is preferably 50 parts by mass or less, and more preferably 30 parts by mass or less. The lower limit is preferably 0.5 parts by mass or more, and more preferably 1 part by mass or more.

[0069] <<Curable Compound>> The composition of the present invention contains a curable compound. Examples of curable compounds include polymerizable compounds and resins. The resin may be a non-polymerizable resin (a resin without polymerizable groups) or a polymerizable resin (a resin having polymerizable groups). Examples of polymerizable groups include ethylenically unsaturated bond-containing groups, cyclic ether groups, methylol groups, and alkoxymethyl groups. Examples of ethylenically unsaturated bond-containing groups include vinyl groups, vinylphenyl groups, allyl groups, (meth)acryloyl groups, (meth)acryloyloxy groups, and (meth)acryloylamide groups, with (meth)allyl groups, (meth)acryloyl groups, and (meth)acryloyloxy groups being preferred, and (meth)acryloyloxy groups being more preferred. Examples of cyclic ether groups include epoxy groups and oxetanyl groups, with epoxy groups being preferred.

[0070] It is preferable to use a curable compound that contains at least a resin. Furthermore, when the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable compound (preferably a polymerizable monomer that is a monomer-type polymerizable compound) as the curable compound, and it is more preferable to use a resin and a polymerizable monomer (a monomer-type polymerizable compound) having an ethylenically unsaturated bond-containing group.

[0071] (Polymerizable Compounds) Examples of polymerizable compounds include compounds having an ethylenically unsaturated bond-containing group, compounds having a cyclic ether group, compounds having a methylol group, and compounds having an alkoxymethyl group. Compounds having an ethylenically unsaturated bond-containing group can preferably be used as radical polymerizable compounds. Compounds having a cyclic ether group can preferably be used as cationic polymerizable compounds.

[0072] Examples of polymerizable compounds of the resin type include resins containing repeating units having polymerizable groups.

[0073] The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2000, and more preferably 1500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight-average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2000 to 2000000. The upper limit of the weight-average molecular weight is preferably 1000000 or less, and more preferably 500000 or less. The lower limit of the weight-average molecular weight is preferably 3000 or more, and more preferably 5000 or more.

[0074] The polymerizable monomer having an ethylenically unsaturated bond-containing group is preferably a 3- to 15-functional (meth)acrylate compound, and more preferably a 3- to 6-functional (meth)acrylate compound. Specific examples include the compounds described in paragraphs 0075-0083 of International Publication No. 2022 / 065215 and the compounds described in Taiwan Patent Application Publication No. 201832008.

[0075] Compounds containing ethylenically unsaturated bond groups include dipentaerythritol tri(meth)acrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available as KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available as KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), and dipentaerythritol hexa(meth)acrylate (commercially available as KAYARAD Examples include DPHA (manufactured by Nippon Kayaku Co., Ltd.), NK Ester A-DPH-12E (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), and compounds in which the (meth)acryloyl group of these compounds is linked via ethylene glycol and / or propylene glycol residues (e.g., SR454 and SR499, commercially available from Sartomer). Compounds containing ethylenically unsaturated bond groups include diglycerin EO (ethylene oxide) modified (meth)acrylate (commercially available as M-460; manufactured by Toagosei), pentaerythritol tetraacrylate (manufactured by Shin Nakamura Chemical Industry Co., Ltd., NK Ester A-TMMT), and 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD). Other products that can be used include HDDA, RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (both manufactured by Taisei Fine Chemical Co., Ltd.), and Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.).

[0076] As compounds containing ethylenically unsaturated bond groups, it is also preferable to use trifunctional (meth)acrylate compounds such as trimethylolpropane tri(meth)acrylate, trimethylolpropanepropylene oxide-modified tri(meth)acrylate, trimethylolpropaneethylene oxide-modified tri(meth)acrylate, isocyanurate ethylene oxide-modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0077] It is also preferable to use a compound having both an ethylenically unsaturated bond-containing group and a urethane bond (hereinafter also referred to as a polymerizable compound having a urethane bond) as the compound having an ethylenically unsaturated bond-containing group. By using such a compound, the heat resistance of the resulting film can be further improved. It is presumed that this effect is obtained because the urethane bond portion forms a physical cross-linking structure through intermolecular hydrogen bonding.

[0078] Polymerizable compounds having a urethane bond include, for example, urethane (meth)acrylates obtained by reacting a hydroxyl-containing (meth)acrylate with a polyfunctional isocyanate, and urethane (meth)acrylates obtained by reacting a polyhydric alcohol with a polyfunctional isocyanate and then reacting that with a hydroxyl-containing (meth)acrylate.

[0079] Examples of the above-mentioned (meth)acrylates having a hydroxyl group include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol ethylene oxide-modified penta(meth)acrylate, dipentaerythritol propylene oxide-modified penta(meth)acrylate, dipentaerythritol caprolactone-modified penta(meth)acrylate, glycerol acrylate methacrylate, glycerol dimethacrylate, 2-hydroxy-3-acryloylpropyl methacrylate, reaction products of epoxy group-containing compounds and carboxy(meth)acrylate, and hydroxyl group-containing polyol polyacrylate.

[0080] Examples of the polyfunctional isocyanates mentioned above include aliphatic diisocyanates such as trimethylene diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate; alicyclic diisocyanates such as isophorone diisocyanate; aromatic diisocyanates such as tolylene diisocyanate, diphenylmethylene diisocyanate, and xylene diisocyanate; and their bilets, isocyanate nulates, trimethylolpropane adducts, etc.

[0081] Polymerizable compounds having urethane bonds can also be those described in paragraphs 0308 to 0315 of Japanese Patent Application Publication No. 2022-173080.

[0082] Compounds containing ethylenically unsaturated bond-containing groups can also be compounds having acidic groups such as carboxyl groups, sulfo groups, and phosphate groups. Examples of commercially available such compounds include Arronix M-305, M-510, M-520, and Arronix TO-2349 (manufactured by Toagosei Co., Ltd.).

[0083] Compounds having an ethylenically unsaturated bond-containing group can also be compounds having a caprolactone structure. For compounds having a caprolactone structure, refer to paragraphs 0042 to 0045 of Japanese Patent Application Publication No. 2013-253224, which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.

[0084] As compounds having an ethylenically unsaturated bond-containing group, compounds having an ethylenically unsaturated bond-containing group and an alkylene oxy group can also be used. Such compounds are preferably compounds having an ethylenically unsaturated bond-containing group and an ethylene oxy group and / or a propylene oxy group, more preferably compounds having an ethylenically unsaturated bond-containing group and an ethylene oxy group, and even more preferably 3-6 functional (meth)acrylate compounds having 4 to 20 ethylene oxy groups. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having 4 ethylene oxy groups manufactured by Sartomer, and KAYARAD TPA-330, a trifunctional (meth)acrylate having 3 isobutylene oxy groups manufactured by Nippon Kayaku Co., Ltd.

[0085] As compounds containing ethylenically unsaturated bond groups, polymerizable compounds having a fluorene skeleton can also be used. Commercially available examples include Ogusol EA-0200 and EA-0300 (manufactured by Osaka Gas Chemical Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0086] As compounds containing ethylenically unsaturated bond groups, it is also preferable to use compounds that substantially do not contain environmentally regulated substances such as toluene. Examples of commercially available such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0087] As compounds having an ethylenically unsaturated bond-containing group, polymerizable compounds containing a urethane bond as described in Japanese Patent Application Publication No. 2024-070237, EBECRYL 5129 (manufactured by Daicel Ornex Co., Ltd.), EBECRYL 220 (manufactured by Daicel Ornex Co., Ltd.), KUA-9N (manufactured by KSM Co., Ltd.), and polymerizable compounds as described in Japanese Patent Application Publication No. 2024-085753 can also be used.

[0088] Compounds having a cyclic ether group include compounds having an epoxy group and compounds having an oxetanyl group, with compounds having an epoxy group being preferred. Compounds having an epoxy group include compounds having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

[0089] The compound having a cyclic ether group may be a low molecular weight compound (e.g., molecular weight less than 1000) or a high molecular weight compound (macromolecule) (e.g., molecular weight of 1000 or more; in the case of a polymer, weight-average molecular weight of 1000 or more). The weight-average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight-average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0090] As compounds having a cyclic ether group, compounds described in paragraphs 0034 to 0036 of Japanese Patent Publication No. 2013-011869, compounds described in paragraphs 0147 to 0156 of Japanese Patent Publication No. 2014-043556, compounds described in paragraphs 0085 to 0092 of Japanese Patent Publication No. 2014-089408, and compounds described in Japanese Patent Publication No. 2017-179172 can also be used.

[0091] Commercially available compounds containing a cyclic ether group include Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, EX-850 (all manufactured by Nagase ChemteX Corporation) and ADEKA RESIN. EP-4000S, EP-4003S, EP-4010S, EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (all manufactured by ADEKA Corporation), Ceroxide 2021P, Ceroxide 2081, Ceroxide 2083, Ceroxide 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (all manufactured by Daicel Corporation), Cyclomer PA ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (manufactured by Mitsubishi Chemical Corporation), Aronoxetane OXT-121, OXT-221, OX-SQ, PNOX (manufactured by Toagosei Co., Ltd.), Adegaglycyrrhizol Examples include ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (manufactured by NOF Corporation, epoxy group-containing polymer), OXT-101, OXT-121, OXT-212, OXT-221 (all manufactured by Toagosei Co., Ltd., oxetanyl group-containing monomer), OXE-10, OXE-30 (all manufactured by Osaka Organic Chemical Industry Co., Ltd., oxetanyl group-containing monomer).

[0092] Compounds having a methylol group (hereinafter also referred to as methylol compounds) include compounds in which the methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which the alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Preferred compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluryl, methylolated glycoluryl, alkoxymethylated urea, and methylolated urea. Compounds described in paragraphs 0134 to 0147 of Japanese Patent Publication No. 2004-295116 and paragraphs 0095 to 0126 of Japanese Patent Publication No. 2014-089408 can also be used.

[0093] (Resin) The composition of the present invention may use a resin as the curable compound. It is preferable to use a curable compound that contains at least a resin. The resin is used, for example, to disperse pigments and the like in the composition, or as a binder. A resin used mainly to disperse pigments and the like in the composition is also called a dispersant. However, such uses of resin are just examples, and resins can also be used for purposes other than those mentioned above. A resin having polymerizable groups also falls under the category of a polymerizable compound.

[0094] The weight-average molecular weight of the resin is preferably between 3,000 and 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

[0095] Examples of resins include (meth)acrylic resins, epoxy resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene etherphosphine oxide resins, polyimide resins, polyamide resins, polyamide-imide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, and polyurea resins. One of these resins may be used alone, or two or more may be used in mixture form. Among cyclic olefin resins, norbornene resin is preferred from the viewpoint of improving heat resistance. Examples of commercially available norbornene resins include the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Furthermore, the resins include the resin described in paragraphs 0091 to 0099 of International Publication No. 2022 / 065215, the blocked polyisocyanate resin described in Japanese Patent Publication No. 2016-222891, the resin described in Japanese Patent Publication No. 2020-122052, the resin described in Japanese Patent Publication No. 2020-111656, the resin described in Japanese Patent Publication No. 2020-139021, the resin described in Japanese Patent Publication No. 2017-138503 which includes a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain, the resin described in paragraphs 0199 to 0233 of Japanese Patent Publication No. 2020- The alkali-soluble resin described in Japanese Patent Publication No. 186325, the resin represented by Formula 1 described in Korean Published Patent No. 10-2020-0078339, the copolymer containing epoxy and acid groups described in International Publication No. 2022 / 030445, the resin described in paragraphs 0199 to 0233 of Japanese Patent Application Publication No. 2020-186373, the alkali-soluble resin described in Japanese Patent Application Publication No. 2020-186325, the resin represented by Formula 1 described in Korean Published Patent No. 10-2020-0078339, the resin described in Japanese Patent Application Publication No. 2021-134350, and the copolymer described in Japanese Patent Application Publication No. 2020-041046 can also be used. Furthermore, a resin having a fluorene skeleton can preferably be used as the resin.Examples of resins having a fluorene skeleton include the resin described in U.S. Patent Application Publication No. 2017 / 0102610. Other resins that can be used include the resin described in paragraphs 0199 to 0233 of Japanese Patent Application Publication No. 2020-186373, the alkali-soluble resin described in Japanese Patent Application Publication No. 2020-186325, the resin represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339, the resin described in Japanese Patent Application Publication No. 2021-134350, the resin described in Japanese Patent Application Publication No. 2022-174597, the resin described in Japanese Patent Application Publication No. 2024-050148, the copolymer described in International Publication No. 2024 / 134926, and the resin described in Japanese Patent Application Publication No. 2024-088596.

[0096] It is preferable to use a resin having acidic groups as the resin. Examples of acidic groups include carboxyl groups, phosphate groups, sulfo groups, and phenolic hydroxyl groups. There may be only one type of acidic group or two or more types. The resin having acidic groups can also be used as a dispersant. The acid value of the resin having acidic groups is preferably 30 to 500 mg KOH / g. The lower limit is preferably 50 mg KOH / g or more, and more preferably 70 mg KOH / g or more. The upper limit is preferably 400 mg KOH / g or less, more preferably 200 mg KOH / g or less, even more preferably 150 mg KOH / g or less, and most preferably 120 mg KOH / g or less.

[0097] It is also preferable to use a resin having polymerizable groups. The polymerizable groups are preferably ethylenically unsaturated bond-containing groups and cyclic ether groups, and more preferably ethylenically unsaturated bond-containing groups.

[0098] The resin may also preferably contain a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, an acidic dispersant (acidic resin) refers to a resin in which the amount of acidic groups is greater than the amount of basic groups. As an acidic dispersant (acidic resin), it is preferable that the amount of acidic groups is 70 mol% or more when the total amount of acidic groups and basic groups is set to 100 mol%. The acidic group of the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mg KOH / g. Furthermore, a basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acidic groups. As a basic dispersant (basic resin), it is preferable that the amount of basic groups exceeds 50 mol% when the total amount of acidic groups and basic groups is set to 100 mol%. The basic group of the basic dispersant is preferably an amino group.

[0099] The resin used as a dispersant is preferably a graft resin. Details of graft resins can be found in paragraphs 0025 to 0094 of Japanese Patent Application Publication No. 2012-255128, which are incorporated herein by reference.

[0100] The resin used as a dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of its main chain and side chains. Preferably, the polyimine-based dispersant has a main chain having a substructure with functional groups having a pKa of 14 or less, and side chains with 40 to 10,000 atoms, and contains a basic nitrogen atom in at least one of its main chain and side chains. The basic nitrogen atom is not particularly limited as long as it exhibits basic properties. For polyimine-based dispersants, refer to paragraphs 0102 to 0166 of Japanese Patent Application Publication No. 2012-255128, the contents of which are incorporated herein by reference.

[0101] The resin used as a dispersant is preferably a resin with a structure in which multiple polymer chains are bonded to the core. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Application Publication No. 2013-043962.

[0102] The resin used as a dispersant is preferably a resin containing repeating units having ethylenically unsaturated bond-containing groups in their side chains. The content of repeating units having ethylenically unsaturated bond-containing groups in their side chains is preferably 10 mol% or more, more preferably 10 to 80 mol%, and even more preferably 20 to 70 mol% of the total repeating units of the resin.

[0103] As a dispersant, the resin described in Japanese Patent Publication No. 2018-087939, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077, polyethyleneimine having polyester side chains as described in International Publication No. 2016 / 104803, the block copolymer described in International Publication No. 2019 / 125940, the block polymer having acrylamide structural units as described in Japanese Patent Publication No. 2020-066687, and the acrylic polymer described in Japanese Patent Publication No. 2020-066688. Block polymers having lylamide structural units, dispersants described in International Publication No. 2016 / 104803, triazine compounds described in Korean Patent Publication No. 10-2017-0129400, dispersants described in Japanese Patent Application Publication No. 2024-050950, triazine compounds described in Korean Patent Publication No. 10-2017-0129416, aryl-modified branched reaction products described in Japanese Patent Application Publication No. 2024-510115, pigment dispersants described in Chinese Patent Application Publication No. 109554004, and the like can also be used.

[0104] Dispersants are also available commercially, and specific examples include the DISPERBYK series from BIC-Chemie, the SOLSPERSE series from Lubrizol Nippon, the Efka series from BASF, and the Azisper series from Ajinomoto Fine Techno Co., Ltd. In addition, the products described in paragraph 0129 of Japanese Patent Publication No. 2012-137564 and paragraph 0235 of Japanese Patent Publication No. 2017-194662 can also be used as dispersants.

[0105] The content of the curable compound in the total solids of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, even more preferably 85% by mass or less, and particularly preferably 80% by mass or less.

[0106] When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 85% by mass or less, more preferably 80% by mass or less, even more preferably 70% by mass or less, and particularly preferably 60% by mass or less.

[0107] When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, even more preferably 50% by mass or less, even more preferably 30% by mass or less, and particularly preferably 20% by mass or less.

[0108] When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 85% by mass or less, more preferably 80% by mass or less, even more preferably 70% by mass or less, and particularly preferably 60% by mass or less.

[0109] When the composition of the present invention contains a compound having a cyclic ether group as a curable compound, the content of the compound having a cyclic ether group in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 85% by mass or less, more preferably 80% by mass or less, even more preferably 70% by mass or less, and particularly preferably 60% by mass or less.

[0110] When the composition of the present invention contains a resin as a curable compound, the resin content in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 85% by mass or less, more preferably 80% by mass or less, even more preferably 70% by mass or less, and particularly preferably 60% by mass or less.

[0111] When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant in the total solid content of the composition is preferably 0.1 to 40% by mass. The upper limit is preferably 25% by mass or less, and more preferably 20% by mass or less. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. Furthermore, the content of the resin as a dispersant is preferably 1 to 100 parts by mass per 100 parts by mass of pigment. The upper limit is preferably 80 parts by mass or less, more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.

[0112] The composition of the present invention may contain only one curable compound or two or more curable compounds. When two or more curable compounds are included, it is preferable that their total amount is within the above range.

[0113] <<Solvent>> The composition of the present invention contains a solvent. Examples of solvents include water and organic solvents, with organic solvents being preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For further details, please refer to paragraph 0223 of International Publication No. 2015 / 166779, which is incorporated herein by reference. In addition, ester solvents substituted with cyclic alkyl groups and ketone solvents substituted with cyclic alkyl groups can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene Examples include propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, the amount of aromatic hydrocarbons used as organic solvents (benzene, toluene, xylene, ethylbenzene, etc.) may be reduced for environmental reasons (for example, it may be reduced to 50 ppm by mass (parts per million) or less, 10 ppm by mass or less, or 1 ppm by mass or less relative to the total amount of organic solvent).

[0114] It is preferable that the metal content of the organic solvent be low. The metal content of the organic solvent is preferably, for example, 10 ppb (parts per billion) or less by mass. If necessary, an organic solvent with a metal content at the ppt (parts per trillion) level by mass may be used; such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (Chemical Daily, November 13, 2015).

[0115] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The material of the filter is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0116] Organic solvents may contain isomers (compounds with the same number of atoms but different structures). Furthermore, they may contain only one type of isomer or multiple types.

[0117] It is preferable that the peroxide content in the organic solvent is 0.8 mmol / L or less, and more preferably that it is substantially peroxide-free.

[0118] The solvent content in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, even more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, and more preferably 95% by mass or less. The composition may contain only one type of solvent, or it may contain two or more types. If it contains two or more types, it is preferable that their total amount is within the above range.

[0119] <<Other Infrared Absorbers>> The compositions of the present invention may contain infrared absorbers other than the specific compounds described above (other infrared absorbers). By further including other infrared absorbers, it is possible to form a film that can shield infrared rays over a wider wavelength range. The other infrared absorbers may be dyes or pigments (particles). Examples of other infrared absorbers include pyrrolopyrrole compounds, squarylium compounds, crokonium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, naphthalocyanine compounds, iminium compounds, quaterylene compounds, aminium compounds, azo compounds, anthraquinone compounds, porphyrin compounds, oxonol compounds, and hexaphylline compounds, and it is preferable that there be at least one selected from pyrrolopyrrole compounds, squarylium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, and naphthalocyanine compounds. Specific examples of these include the compounds described in paragraph 0114 of International Publication No. 2022 / 065215. Other infrared absorbers include the compound described in paragraph 0121 of International Publication No. 2022 / 065215, the compound described in Table 1 of U.S. Patent No. 11261172, the compounds described in paragraphs 0188-0192 of International Publication No. 2022 / 181422, the squarylium compound described in Japanese Patent Publication No. 2020-075959, the copper complex described in Korean Patent Publication No. 10-2019-0135217, the croconic acid compound described in Japanese Patent Publication No. 2021-195515, the infrared absorbing dye described in Japanese Patent Publication No. 2022-022070, and the croconium compound described in International Publication No. 2019 / 021767. , compounds described in Japanese Patent Publication No. 2019-127549, compounds described in International Publication No. 2022 / 059619, compounds described in Japanese Patent Publication No. 2022-151682, squarylium compounds described in Japanese Patent Publication No. 2022-188858, compounds described in Japanese Patent Publication No. 2022-184710, compounds described in Japanese Patent Publication No. 2022-189736, squarylium compounds described in Japanese Patent Publication No. 2023-004570, squarylium compounds described in International Publication No. 2019 / 230660, compounds described in International Publication No. 2020 / 218615, diiminium compounds described in Japanese Patent Publication No. 2023-068643,Squallium compounds described in Japanese Patent Publication No. 2023-052770, phthalocyanine compounds described in Korean Published Patent No. 10-2022-0163680, indigo monoboron complexes described in Japanese Patent Publication No. 2023-073064, phthalocyanine compounds described in Japanese Patent Publication No. 2023-066025, phthalocyanine compounds described in Japanese Patent Publication No. 2020-041127, indigo compounds described in Japanese Patent Publication No. 2023-073064, indigo compounds described in Korean Published Patent No. 10-2023-0016355 Go compounds, squarylium compounds described in International Publication No. 2019 / 230570, diiminium compounds described in Japanese Patent Publication No. 2023-095824, compounds described in Japanese Patent Publication No. 2023-159964, compounds described in Japanese Patent Publication No. 2023-176615, compounds described in Japanese Patent Publication No. 2024-500537, phthalocyanine compounds described in Japanese Patent Publication No. 2024-019936, compounds described in Korean Registered Patent No. 10-2575190, polymethine compounds described in Japanese Patent Publication No. 2024-017061 The material, boron derivative described in Chinese Patent Application Publication No. 116715690, phthalocyanine compound described in Japanese Patent Publication No. 2024-020454, compound described in Chinese Patent Application Publication No. 116891482, compound described in Japanese Patent Publication No. 2024-511242, infrared absorbing dye described in Japanese Patent Publication No. 2024-047265, infrared absorbing dye described in Japanese Patent Publication No. 2024-043503, extended phthalocyanine described in Japanese Patent Publication No. 2021-047255, described in International Publication No. 2024 / 058103 The following compounds can also be used: the compound described in Japanese Patent Publication No. 2024-071077, the infrared absorbing dye described in U.S. Patent Application Publication No. 2021 / 036251, the infrared absorbing dye described in Japanese Patent Publication No. 2024-079641, the cyanine compound described in International Publication No. 2024 / 106293, the squarylium compound described in Korean Registered Patent No. 10-2622663, the squarylium compound described in Japanese Patent Publication No. 2024-071077, and the cyanine compound described in International Publication No. 2024 / 128016.

[0120] As another infrared absorber, tungsten oxide represented by the following formula, as described in paragraph 0025 of European Patent No. 3628645, can also be used.１ ａ M ２ ｂ W ｃ O ｄ (P(O) ｎ R ｍ ) ｅ M １ M ２ represents an ammonium cation or a metal cation, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, d is 2.5 to 3, e is 0.01 to 0.75, n is 1, 2, or 3, m is 1, 2, or 3, and R represents a hydrocarbon group which may have substituents.

[0121] The content of other infrared absorbers is preferably 1 to 100 parts by mass, more preferably 3 to 60 parts by mass, and even more preferably 5 to 40 parts by mass, per 100 parts by mass of the specified compound described above. The total content of the specified compound described above and other infrared absorbers is preferably 1% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more, based on the total solid content of the composition. The upper limit of the above total content is preferably 50% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less.

[0122] <<Pigment Derivatives>> The composition of the present invention may contain pigment derivatives. Pigment derivatives are used as dispersion aids. A dispersion aid is a material used to improve the dispersibility of pigments in a composition.

[0123] Examples of pigment derivatives include compounds having at least one structure selected from the group consisting of a dye structure and a triazine structure, and an acidic group or a basic group.

[0124] Examples of the above-mentioned pigment structures include squarylium pigment structure, pyrrolopyrrole pigment structure, diketopyrrolopyrrole pigment structure, quinacridone pigment structure, anthraquinone pigment structure, diantraquinone pigment structure, benzoisoindole pigment structure, thiadin indigo pigment structure, azo pigment structure, quinophthalone pigment structure, phthalocyanine pigment structure, naphthalocyanine pigment structure, dioxazine pigment structure, perylene pigment structure, perinone pigment structure, benzimidazolone pigment structure, benzothiazole pigment structure, benzimidazole pigment structure, and benzoxazole pigment structure. Squaryllium pigment structure, pyrrolopyrrole pigment structure, diketopyrrolopyrrole pigment structure, phthalocyanine pigment structure, quinacridone pigment structure, and benzimidazolone pigment structure are preferred, and squarylium pigment structure and pyrrolopyrrole pigment structure are more preferred.

[0125] Examples of acidic groups found in pigment derivatives include carboxyl groups, sulfo groups, phosphate groups, boronic acid groups, carboxylic acid amide groups, sulfonic acid amide groups, imido acid groups, and salts thereof. Examples of atoms or groups of atoms constituting the salt include alkali metal ions (Li ＋ Na ＋ _K ＋ (Ca) ２＋ Mg ２＋ Examples include ammonium ions, imidazolium ions, pyridinium ions, and phosphonium ions. Examples of carboxylic acid amide groups include -NHCOR Ｘ１ A group represented by is preferred. As a sulfonic acid amide group, -NHSO ２ R Ｘ２ A group represented by is preferred. As an imide acid group, -SO ２ NHSO ２ R Ｘ３ , -CONHSO ２ R Ｘ４ , -CONHCOR Ｘ５ or -SO ２ NHCOR Ｘ６ A group represented by -SO is preferred, ２ NHSO ２ R Ｘ３ This is more preferable. Ｘ１ ~R Ｘ６Each of these independently represents an alkyl group or an aryl group. Ｘ１ ~R Ｘ６ The alkyl and aryl groups represented by may have substituents. The substituents are preferably halogen atoms, and more preferably fluorine atoms.

[0126] Basic groups found in pigment derivatives include amino groups, pyridinyl groups and their salts, ammonium groups, and phthalimidomethyl groups. Atoms or groups of atoms that make up the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0127] Specific examples of pigment derivatives include the compounds described in paragraphs 0037-0054 of International Publication No. 2016 / 035695, the compounds described in paragraphs 0061-0086 of International Publication No. 2017 / 146092, the compounds described in paragraphs 0017-0068 of International Publication No. 2018 / 230387, the compounds described in paragraphs 0085-0099 of International Publication No. 2020 / 054718, the compounds described in paragraph 0099 of International Publication No. 2020 / 054718, and the compounds described in paragraph 0124 of International Publication No. 2022 / 085485. Examples include substances, benzimidazolone compounds or salts thereof as described in Japanese Patent Publication No. 2018-168244, compounds having an isoindoline skeleton as described in general formula (1) of Japanese Patent No. 6996282, quinophthalone-based dye derivatives as described in Japanese Patent Publication No. 2024-046989, dispersion aids as described in Japanese Patent Publication No. 2024-066986, dispersion aids as described in Japanese Patent Publication No. 2024-066995, compounds as described in Japanese Patent Publication No. 2022-018967, and dispersion aids as described in Japanese Patent Publication No. 2024-066992.

[0128] The pigment derivative content is preferably 1 to 50 parts by mass per 100 parts by mass of pigment. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is within the above range.

[0129] <<Photopolymerization Initiator>> If the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator. There are no particular restrictions on the photopolymerization initiator, and it can be appropriately selected from known photopolymerization initiators. For example, compounds that are photosensitive to light in the ultraviolet to visible regions are preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0130] Examples of photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, and glyoxylate compounds. The photopolymerization initiator is preferably a trihalomethyltriazine compound, benzyldimethylketal compound, α-hydroxyketone compound, α-aminoketone compound, acylphosphine compound, phosphine oxide compound, metallocene compound, oxime compound, hexaarylbiimidazole compound, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound, cyclopentadiene-benzene-iron complex, halomethyloxadiazole compound, glyoxylate compound, or 3-aryl-substituted coumarin compound; more preferably an oxime compound, α-hydroxyketone compound, α-aminoketone compound, glyoxylate compound, or acylphosphine compound; even more preferably an α-aminoketone compound, glyoxylate compound, or oxime compound; and particularly preferably an oxime compound.

[0131] As photopolymerization initiators, compounds described in paragraphs 0065 to 0111 of Japanese Patent Publication No. 2014-130173, compounds described in Japanese Patent Publication No. 6301489, MATERIAL STAGE 37-60p, vol. 19, No. 3. Peroxide-based photopolymerization initiators described in 2019, photopolymerization initiators described in International Publication No. 2018 / 221177, photopolymerization initiators described in International Publication No. 2018 / 110179, photopolymerization initiators described in JP 2019-043864, photopolymerization initiators described in JP 2019-044030, peroxide-based initiators described in JP 2019-167313, aminoacetophenone-based initiators having an oxazolidine group described in JP 2020-055992, JP 2013- Oxime-based photopolymerization initiator described in Japanese Patent Publication No. 190459, polymer described in Japanese Patent Application Publication No. 2020-172619, compound represented by formula 1 described in International Publication No. 2020 / 152120, compound described in Japanese Patent Application Publication No. 2021-181406, photopolymerization initiator described in Japanese Patent Application Publication No. 2022-013379, compound represented by formula (1) described in Japanese Patent Application Publication No. 2022-015747, fluorine-containing fluorene oxime ester-based photoinitiator described in Japanese Patent Application Publication No. 2021-507058, Chinese Patent Application Publication No. 11 Initiators described in Specification No. 0764367, initiators described in Japanese Patent Publication No. 2022-518535, initiators described in International Publication No. 2021 / 175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in Japanese Patent Application Publication No. 2022-078550, compounds described in Korean Published Patent No. 10-2017-0087330, compounds described in International Publication No. 2022 / 075452, oxime ester compounds described in Chinese Patent Application Publication No. 110066225, Korean Compounds described in Japanese Patent Publication No. 10-2022-0076157, compounds described in paragraphs 0042-0062 of International Publication No. 2019 / 013112 having a triarylamine or N-arylcarbazole skeleton, oxime ester-based photopolymerization initiators described in Japanese Patent Publication No. 7219378, photopolymerization initiators described in Korean Published Patent No. 10-2021-0146174, photopolymerization initiators described in International Publication No. 2019 / 013112, photopolymerization initiators described in Japanese Patent Publication No. 2023-033731,Initiators described in Japanese Patent Publication No. 2022-515524, initiators described in Japanese Patent Publication No. 2023-517304, initiators described in Chinese Patent Application Publication No. 114149517, aminoketone compounds described in Chinese Patent Application Publication No. 115925596, compounds described in Japanese Patent Application Publication No. 2023-159489, compounds described in Japanese Patent Application Publication No. 2023-159487, compounds described in Taiwan Patent Application Publication No. 202336003, compounds described in Chinese Patent Application Publication No. 113527138, organosilicon compounds described in Japanese Patent Publication No. 2022-502526, Korean Published Patent Examples include the oxime compound described in Japanese Patent Publication No. 10-2017-0009794, the photopolymerization initiator described in Korean Published Patent Publication No. 10-2023-0033862, the oxime ester compound described in Japanese Patent Publication No. 2019-519518, the polyfunctional polymer photopolymerization initiator described in Japanese Patent Publication No. 2024-517534, the photopolymerization initiator described in International Publication No. 2024 / 085227, the compound described in Japanese Patent Publication No. 2024-521379, the photopolymerization initiator described in Japanese Patent Publication No. 2024-523053, and the oxime ester initiator described in Chinese Patent Application Publication No. 117510396.

[0132] Specific examples of hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0133] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (all manufactured by IGM Resins B.V.), and Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (all manufactured by IGM Resins B.V.), and Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (all manufactured by BASF). Commercially available acylphosphine compounds include Omnirad 819 and Omnirad TPO (both manufactured by IGM Resins B.V.), and Irgacure 819 and Irgacure TPO (both manufactured by BASF). Examples of commercially available glyoxylate compounds include Esacure 563 (manufactured by IGM Resins B.V.).

[0134] Examples of oxime compounds include the compounds described in paragraph 0142 of International Publication No. 2022 / 085485, the compounds described in Japanese Patent No. 5430746, the compounds described in Japanese Patent No. 5647738, the compounds represented by general formula (1) and the compounds described in paragraphs 0022 to 0024 of Japanese Patent Publication No. 2021-173858, and the compounds represented by general formula (1) and the compounds described in paragraphs 0117 to 0120 of Japanese Patent Publication No. 2021-170089. Specific examples of oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropane-1-one, 2-benzoyloxyimino-1-phenylpropane-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropane-1-one, and 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime). Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04, Irgacure OXE05 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, TR-PBG-305, TR-PBG-309, TR-PBG-3054, TR-PBG-3057, TR-PBG-314, TR-PBG-327, TR-PBG-345, TR-PBG-346, TR- Examples include PBG-358, TR-PBG-365, TR-PBG-380, TR-PBG-610, TR-PBG-A, TR-PBG-B (all manufactured by TRONLY), and ADEKA Optomer N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in Japanese Patent Publication No. 2012-014052). Furthermore, it is also preferable to use compounds that do not produce color or compounds that are highly transparent and resistant to discoloration as oxime compounds. Examples of commercially available products include ADEKA Arclus NCI-730, NCI-831, NCI-831E, and NCI-930 (all manufactured by ADEKA Corporation).

[0135] As photopolymerization initiators, oxime compounds having a fluorene ring, oxime compounds having a skeleton in which at least one benzene ring of the carbazole ring is a naphthalene ring, oxime compounds having a fluorine atom, oxime compounds having a nitro group, oxime compounds having a benzofuran skeleton, oxime compounds in which a substituent having a hydroxyl group is attached to the carbazole skeleton, and compounds described in paragraphs 0143 to 0149 of International Publication No. 2022 / 085485 may also be used.

[0136] As a photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

[0137] In formula (OX-1), X １ａ R represents a divalent linking group containing at least one selected from the group consisting of aromatic rings and heterocycles. １ａ R represents a hydrogen atom or an acyl group. ２ａ R represents an alkyl or aryl group. ３ａ and R ４ａ Each of these independently represents a hydrogen atom or an alkyl group, and Alk １ and Alk ２ Each of these independently represents an alkyl group, R ３ａ and R ４ａ They may be bonded together to form a ring, Alk １ and Alk ２ The elements may be joined together to form a ring, and n represents either 0 or 1.

[0138] X in equation (OX-1) １ａ Examples of divalent linking groups represented by include divalent aromatic ring groups, divalent heterocyclic groups, divalent groups formed by linking two or more aromatic ring groups via single bonds or linking groups, divalent groups formed by linking two or more heterocyclic groups via single bonds or linking groups, and divalent groups formed by linking an aromatic ring group and a heterocyclic group via single bonds or linking groups. Examples of linking groups that link aromatic ring groups to each other, heterocyclic groups to each other, or an aromatic ring group and a heterocyclic group include -CH ２ -, -O-, -CO-, -S-, -NR ｘ - And combinations thereof, etc. are examples. ｘThis represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0139] X in equation (OX-1) １ａ It is preferably a group represented by any of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6), or formula (X-8), and even more preferably a group represented by formula (X-2) or formula (X-6).

[0140] In the formula R Ｘ１ ~R Ｘ９ Each of these independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group, and * represents a bond.

[0141] R Ｘ１ ~R Ｘ９ The alkyl group represented by is preferably 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have substituents. Examples of substituents include halogen atoms, aryl groups, and heteroaryl groups.

[0142] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have substituents. Examples of substituents include halogen atoms, aryl groups, and heteroaryl groups.

[0143] R Ｘ１ ~R Ｘ９ The alkynyl group represented by is preferably 2 to 15 carbon atoms, and more preferably 2 to 10 carbon atoms. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have substituents. Examples of substituents include halogen atoms, aryl groups, and heteroaryl groups.

[0144] R Ｘ１ ~R Ｘ９The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. The aryl group may have substituents. Examples of substituents include halogen atoms, alkyl groups, alkenyl groups, alkynyl groups, and heteroaryl groups.

[0145] R Ｘ１ ~R Ｘ９ The heteroaryl group represented by is preferably a five-membered or six-membered ring. The heteroatoms of the heteroaryl group are preferably oxygen, nitrogen, and sulfur atoms. The number of heteroatoms of the heteroaryl group is preferably 1 to 3. The heteroaryl group may have substituents. Examples of substituents include halogen atoms, alkyl groups, alkenyl groups, alkynyl groups, and aryl groups.

[0146] R in equation (OX-1) １ａ represents a hydrogen atom or an acyl group, and an acyl group is preferred.

[0147] R in equation (OX-1) ２ａ R represents an alkyl group or an aryl group, and is preferably an alkyl group because the generated radical is highly reactive. ２ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have substituents, but is preferably an unsubstituted alkyl group. ２ａ The alkyl group represented by is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group. ２ａ The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. The aryl group may have substituents, but it is preferably an unsubstituted aryl group.

[0148] R in equation (OX-1) ３ａ and R ４ａEach of these independently represents a hydrogen atom or an alkyl group, and a hydrogen atom is preferred. ３ａ and R ４ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have substituents, but is preferably an unsubstituted alkyl group. ３ａ and R ４ａ These may be bonded together to form a ring. The formed ring is preferably a five-membered or six-membered ring, and more preferably a five-membered or six-membered aliphatic hydrocarbon ring.

[0149] Alk in equation (OX-1) １ and Alk ２ Each of these independently represents an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have substituents, but is preferably an unsubstituted alkyl group. Alk １ and Alk ２ The elements may be bonded together to form a ring, and it is preferable that a ring is formed. The formed ring is preferably a five-membered or six-membered ring, more preferably a five-membered or six-membered aliphatic hydrocarbon ring, and even more preferably a cyclopentane ring or a cyclohexane ring.

[0150] In formula (OX-1), n ​​represents either 0 or 1, and is preferably 0.

[0151] Specific examples of compounds represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of Japanese Patent Publication No. 2012-113104 and the compounds described in paragraph 0041 of Japanese Patent Publication No. 2012-189997.

[0152] As a photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

[0153]

[0154] In formula (OX-2), R １ｂ and R ２ｂ Each of these independently represents a substituent, R ３ｂ ~R ７ｂ Each of these independently represents a hydrogen atom or a substituent, and Ar １ｂ represents an optionally substituted aryl group or an optionally substituted heteroaryl group, and n represents 0 or 1.

[0155] R １ｂ and R ２ｂ The substituents represented by include alkyl groups and aryl groups, with alkyl groups being preferred. The number of carbon atoms in the alkyl group is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have substituents. Examples of substituents include halogen atoms, aryl groups, alkenyl groups, alkynyl groups, and heteroaryl groups. The number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. The aryl group may have substituents. Examples of substituents include halogen atoms, alkyl groups, alkenyl groups, alkynyl groups, and heteroaryl groups.

[0156] R ３ｂ ~R ７ｂ The substituents represented by include halogen atoms, alkyl groups, and aryl groups. Examples of alkyl groups and aryl groups are those mentioned above. ３ｂ ~R ７ｂ It is preferable that it is a hydrogen atom.

[0157] Ar １ｂ Ar represents an optionally substituted aryl group or an optionally substituted heteroaryl group. １ｂIt is preferable that the group is an aryl group which may have substituents. The number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. Examples of substituents include halogen atoms, alkyl groups, alkoxy groups, aryl groups, aryloxy groups, alkylthio groups, arylthio groups, nitro groups, and acyl groups, with acyl groups being preferred.

[0158] As a photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

[0159]

[0160] In formula (OX-3), Ar １ｃ Ar represents an aromatic ring group with (k+m+1) valency or a heterocyclic ring group with (k+m+1) valency. ２ｃ R represents a (k+2) valent aromatic ring group or a (k+2) valent heterocyclic group, １ｃ ~R ３ｃ Each of these independently represents a substituent, L １ｃ is a single bond or CR １１ｃ R １２ｃ Represents R １１ｃ and R １２ｃ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, X １ｃ ha-CH ２ It represents -, -N-, -O-, or -S-, where k represents 0 or 1, m represents an integer from 0 to 4, and n represents 0 or 1.

[0161] R １ｃ and R ２ｃThe substituents represented by include alkyl groups and aryl groups, with alkyl groups being preferred. The number of carbon atoms in the alkyl group is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have substituents. Examples of substituents include halogen atoms, aryl groups, alkenyl groups, alkynyl groups, and heteroaryl groups. The number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. The aryl group may have substituents. Examples of substituents include halogen atoms, alkyl groups, alkenyl groups, alkynyl groups, and heteroaryl groups. ２ｃ It is preferable that the alkyl group has a branched or cyclic structure.

[0162] R ３ｃ Examples of substituents represented by include halogen atoms, alkyl groups, alkoxy groups, aryl groups, aryloxy groups, and acyl groups, with acyl groups being preferred.

[0163] L １ｃ is a single bond or CR １１ｃ R １２ｃ Represents R １１ｃ and R １２ｃ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group. １１ｃ and R １２ｃ The alkyl and aryl groups in R １ｃ and R ２ｃ This is synonymous with alkyl and aryl groups in [the given context]. When k is 1, L １ｃ It is preferable that the bond is a single bond.

[0164] X １ｃ is, -CH ２ It represents -, -N-, -O-, or -S-, with -O- or -S- being preferred.

[0165] Ar １ｃrepresents a (k+m+1) valent aromatic ring group or a (k+m+1) valent heterocyclic group, and is preferably a (k+m+1) valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0166] Ar ２ｃ represents a (k+2) valent aromatic ring group or a (k+2) valent heterocyclic group, and is preferably a (k+2) valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0167] k represents 0 or 1, preferably 0. m represents an integer from 0 to 4, preferably 0 or 1, more preferably 1. n represents 0 or 1, preferably 0.

[0168] As a photopolymerization initiator, ketoxime ester compounds having an allyl oil oxy group at the ortho position, represented by formula (OX-4), can also be suitably used. Examples of such compounds include those described in Chinese Patent Application Publication No. 117342977.

[0169] In formula (OX-4), R １ｄ and R ２ｄ Each of these independently represents an alkyl group, an aryl group, or a heterocyclic group; R ３ｄ , R ４ｄ , R ５ｄ , R ６ｄ These are, independently, hydrogen atoms, halogen atoms, CN, and NO. ２ CF ３ ,R,OR,SR,SOR,SO ２ R represents R or NRR', where R and R' each independently represent an alkyl group or an aryl group, and when R and R' are present together, R and R' may be bonded to form a ring, and one or more -CH groups in the alkyl group or aryl group represented by R and R' ２ Each of the hyphens may be independently substituted with -O-, -N-, -S-, -CO-, -COO-, -OCO-, or a benzene ring; R ７ｄ , R８ｄ and R ９ｄ Each of these independently represents either a hydrogen atom or a methyl group.

[0170] Compounds represented by formula (OX-5) can also be suitably used as photopolymerization initiators. Examples of such compounds include those described in International Publication No. 2024 / 101219.

[0171] In formula (OX-5), R １ｅ ~R ５ｅ Each of these independently represents a hydrocarbon group which may have substituents, and n represents an integer from 0 to 4.

[0172] Specific examples of oxime compounds include the following compounds.

[0173]

[0174] The oxime compound is preferably a compound having a maximum absorption wavelength in the range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar extinction coefficient of the compound can be measured using known methods. For example, it is preferable to measure it using a spectrophotometer (Varian Cary-5 spectrophotometer) with ethyl acetate solvent at a concentration of 0.01 g / L.

[0175] As the photopolymerization initiator, a bifunctional or trifunctional or more photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, thus providing good sensitivity. Furthermore, when an asymmetric compound is used, the crystallinity decreases and the solubility in solvents, etc., improves, making precipitation less likely over time and improving the long-term stability of the composition. Specific examples of bifunctional or trifunctional or more photoradical polymerization initiators include the compounds described in paragraph 0148 of International Publication No. 2022 / 065215.

[0176] The content of the photopolymerization initiator in the total solid content of the composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less. The composition may contain only one type of photopolymerization initiator, or it may contain two or more types. If it contains two or more types, it is preferable that their total amount is within the above range.

[0177] <<Curing Agent>> If the composition of the present invention contains a compound having a cyclic ether group, it is preferable that the composition of the present invention further contains a curing agent. Examples of curing agents include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, and thiol compounds. Specific examples of curing agents include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). The curing agent may also be a compound described in paragraphs 0072 to 0078 of Japanese Patent Publication No. 2016-075720 or a compound described in Japanese Patent Publication No. 2017-036379. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, per 100 parts by mass of the compound having a cyclic ether group.

[0178] <<Chromatic Colorants>> The composition of the present invention may contain chromatic colorants. Examples of chromatic colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. The chromatic colorants may be pigments or dyes. Pigments and dyes may be used in combination. The pigments may be either inorganic pigments or organic pigments. In addition, materials in which a portion of an inorganic pigment or an organic-inorganic pigment is replaced with an organic chromophore can be used as the pigment. By replacing inorganic pigments or organic-inorganic pigments with organic chromophores, hue design can be made easier.

[0179] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined by observing the primary particles of the pigment with a transmission electron microscope and obtaining a photograph. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding equivalent circle diameter is calculated as the primary particle diameter of the pigment. In this specification, the average primary particle diameter is the arithmetic mean of the primary particle diameters of 400 primary particles of pigment. Furthermore, primary particles of pigment refer to independent particles that are not aggregated.

[0180] The crystallite size of the pigment is preferably 0.1 to 50 nm, more preferably 0.5 to 30 nm, and even more preferably 1 to 15 nm. The crystallite size can be determined from the full width at half maximum of the diffraction angle peak using an X-ray diffractometer, and is calculated using Scherrer's formula. The crystallite size of the pigment can be adjusted by known methods such as adjusting the manufacturing conditions or grinding after manufacturing.

[0181] The specific surface area of ​​the pigment is 1 to 300 m². ２ It is preferable that it be / g. The lower limit is 10m ２ It is preferable that it be 30m or more per gram. ２ It is more preferable that the amount is 1 / g or more. The upper limit is 250m ２ It is preferable that the amount is less than or equal to 200m ２It is more preferable that the value be less than or equal to / g. The specific surface area can be measured according to the BET (Brunauer, Emmett, and Teller) method and DIN 66131: determination of the specific surface area of ​​solids by gas adsorption.

[0182] The chromatic coloring agent preferably contains a pigment. The pigment content in the chromatic coloring agent is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more.

[0183] Examples of red colorants include diketopyrrolopyrrole compounds, anthraquinone compounds, azo compounds, naphthol compounds, azomethine compounds, xanthene compounds, quinacridone compounds, perylene compounds, and thioindigo compounds. Diketopyrrolopyrrole compounds, anthraquinone compounds, and azo compounds are preferred, and diketopyrrolopyrrole compounds are more preferred. Furthermore, the red colorant is preferably a pigment (red pigment), and more preferably a diketopyrrolopyrrole pigment.

[0184] Specific examples of red colorants include C.I. (Color Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, Examples of red pigments include 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294, 295, 296, and 297. In addition, as red colorants, compounds described in paragraph 0034 of International Publication No. 2022 / 085485 and brominated diketopyrrolopyrrole compounds described in Japanese Patent Application Publication No. 2020-085947 can also be used.

[0185] As the red coloring agent, C.I. Pigment Red 122, 177, 224, 254, 255, 264, 269, 272, and 291 are preferred, C.I. Pigment Red 254, 264, and 272 are more preferred, and C.I. Pigment Red 254 and 264 are even more preferred.

[0186] Examples of green colorants include phthalocyanine compounds and squarylium compounds, with phthalocyanine compounds being preferred. Furthermore, the green colorant is preferably a pigment (green pigment), and more preferably a phthalocyanine pigment.

[0187] Specific examples of green colorants include green pigments such as C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, and 66. Alternatively, zinc phthalocyanine halides, which have an average of 10 to 14 halogen atoms, 8 to 12 bromine atoms, and 2 to 5 chlorine atoms per molecule, can be used as green colorants. Specific examples include the compounds described in International Publication No. 2015 / 118720. Furthermore, compounds described in paragraph 0029 of International Publication No. 2022 / 085485, aluminum phthalocyanine compounds described in Japanese Patent Publication No. 2020-070426, and diarylmethane compounds described in Japanese Patent Publication No. 2020-504758 can also be used as green colorants.

[0188] As a green coloring agent, C.I. Pigment Green 7, 36, 58, 62, and 63 are preferred.

[0189] Examples of orange colorants include diketopyrrolopyrrole compounds and azo compounds. Preferably, the orange colorant is a pigment (orange pigment). Specific examples of orange colorants include C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, and 73 orange pigments.

[0190] Examples of yellow colorants include azo compounds, azomethine compounds, isoindoline compounds, pteridine compounds, quinophthalone compounds, and perylene compounds. The yellow colorant is preferably a pigment (yellow pigment). Specific examples of yellow colorants include C.I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125 Examples of yellow pigments include 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, and 236.

[0191] As a yellow coloring agent, a nickel azobarbiturate complex with the following structure can also be used.

[0192] As a yellow coloring agent, the compounds described in paragraphs 0031 to 0033 of International Publication No. 2022 / 085485, the methine dye described in Japanese Patent Publication No. 2019-073695, and the methine dye described in Japanese Patent Publication No. 2019-073696 can be used.

[0193] Examples of purple colorants include oxazine compounds, quinacridone compounds, perylene compounds, and indigo compounds, with oxazine compounds being preferred. The purple colorant is preferably a pigment (purple pigment). Specific examples of purple colorants include purple pigments such as C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

[0194] Examples of blue colorants include phthalocyanine compounds and squarylium compounds, with phthalocyanine compounds being preferred. The blue colorant is preferably a pigment (blue pigment). Specific examples of blue colorants include blue pigments such as C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, and 88. Furthermore, aluminum phthalocyanine compounds having a phosphorus atom can also be used as blue colorants. Specific examples include the compounds described in paragraphs 0022-0030 of Japanese Patent Publication No. 2012-247591 and paragraph 0047 of Japanese Patent Publication No. 2011-157478.

[0195] Dyes can also be used as chromatic colorants. There are no particular restrictions on the dyes used, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyromethene dyes. Xanthene dyes are preferred.

[0196] A pigment polymer can also be used as a chromatic colorant. The pigment polymer is preferably a dye that is dissolved in a solvent before use. The pigment polymer may also form particles. When the pigment polymer is in particle form, it is usually used in a dispersed state in a solvent. Particle-form pigment polymers can be obtained, for example, by emulsion polymerization, and the compound and production method described in Japanese Patent Application Publication No. 2015-214682 are specific examples. The pigment polymer has two or more pigment structures in one molecule, and preferably three or more pigment structures. There is no particular upper limit, but it can be 100 or less. The multiple pigment structures in one molecule may be the same pigment structure or different pigment structures. The weight-average molecular weight (Mw) of the pigment polymer is preferably 2000 to 50000. The lower limit is more preferably 3000 or more, and even more preferably 6000 or more. The upper limit is more preferably 30000 or less, and even more preferably 20000 or less. The pigment polymer can also be a compound described in Japanese Patent Publication No. 2011-213925, Japanese Patent Publication No. 2013-041097, Japanese Patent Publication No. 2015-028144, Japanese Patent Publication No. 2015-030742, International Publication No. 2016 / 031442, etc.

[0197] As a chromatic coloring agent, the following are used: the triarylmethane dye polymer described in Korean Published Patent No. 10-2020-0028160, the xanthene compound described in Japanese Patent Publication No. 2020-117638, the phthalocyanine compound described in International Publication No. 2020 / 174991, the isoindoline compound described in Japanese Patent Publication No. 2020-160279 or salts thereof, the compound represented by Formula 1 described in Korean Published Patent No. 10-2020-0069442, the compound represented by Formula 1 described in Korean Published Patent No. 10-2020-0069730, and the following are used: - Compound represented by formula 1 described in Japanese Patent Publication No. 2020-0069070, compound represented by formula 1 described in Korean Published Patent Publication No. 10-2020-0069067, compound represented by formula 1 described in Korean Published Patent Publication No. 10-2020-0069062, zinc halide phthalocyanine pigment described in Japanese Patent Publication No. 6809649, isoindoline compound described in Japanese Patent Publication No. 2020-180176, phenothiazine compound described in Japanese Patent Publication No. 2021-187913, zinc halide phthalocyanine described in International Publication No. 2022 / 004261, International Publication Zinc halide phthalocyanine described in Japanese Patent Publication No. 2021 / 250883, quinophthalone compound represented by formula 1 in Korean Published Patent No. 10-2020-0030759, polymer dye described in Korean Published Patent No. 10-2020-0061793, chromatic coloring agent described in Japanese Patent Publication No. 2022-029701, isoindoline compound described in International Publication No. 2022 / 014635, aluminum phthalocyanine compound described in International Publication No. 2022 / 024926, compound described in Japanese Patent Publication No. 2022-045895, International Publication No. 2022 / 0500 Compounds described in No. 51, compounds described in JP 2020-090676, compounds described in JP 2020-055956, compounds described in JP 2021-031681, compounds described in JP 2022-056354, compounds described in US Patent Application Publication No. 2021 / 0355327, compounds described in International Publication No. 2022 / 065357, compounds described in JP 2020-045436, compounds described in Korean Published Patent No. 10-2021-0146726, compounds described in JP 2018-178039,Compounds described in Chinese Patent Application Publication No. 113881244, compounds described in Chinese Patent Application Publication No. 113881245, compounds described in Chinese Patent Application Publication No. 113881246, compounds described in Japanese Patent Publication No. 2022-104822, compounds described in Japanese Patent Publication No. 2022-096701, compounds described in Japanese Patent Publication No. 2020-023652, green pigments described on pages 80-84 of the Journal of the Color Materials Association (published in 2022), compounds described in Japanese Patent Publication No. 2022-143135, compounds described in Japanese Patent Publication No. 2022-140287, International Publication No. The compound described in JP 2022 / 136308, the perylene compound described in Chinese Patent Application Publication No. 113061349, the cyanide pigment described in Korean Published Patent No. 10-2017-0018993, the isoindoline compound described in JP 2020-180176, the compound described in JP 2023-013209, the compound described in JP 2023-013166, the xanthene compound described in International Publication No. 2023 / 286526, the compound described in JP 2021-155746, the compound described in JP 2021-155747, JP The compounds described in Japanese Patent Publication No. 2021-155748, the compounds described in Japanese Patent Application Publication No. 2021-155749, the compounds described in International Publication No. 2018 / 051876, the compounds described in Japanese Patent Application Publication No. 2020-083981, the compounds described in Japanese Patent Application Publication No. 2023-056463, the compounds described in Japanese Patent Publication No. 2023-515473, the dioxane compounds described in Japanese Patent Publication No. 2022-549530, the pigment preparations described in Japanese Patent Application Publication No. 2022-061494, the diketopyrrolopyrrole pigments described in Japanese Patent Application Publication No. 2023-057917, and the compounds described in Japanese Patent Application Publication No. 2023-061273 The diketopyrrolopyrrole compounds described, the phthalocyanine described in Japanese Patent Publication No. 2023-519314, the quinophthalone described in Japanese Patent Application Publication No. 2023-080419, the phthalocyanine compounds described in Japanese Patent Application Publication No. 2023-103177, the isoindoline compounds described in Japanese Patent Application Publication No. 2020-026521, the squarylium compounds described in Korean Published Patent No. 10-2023-0043000, the squarylium compounds described in Korean Published Patent No. 10-2023-0050069, the diketopyrrolopyrrole compounds described in Japanese Patent Application Publication No. 2023-127878,Triarylmethane compounds described in Japanese Patent Publication No. 2023-150459, Triarylmethane compounds described in Japanese Patent Publication No. 2023-149735, Core-shell dyes described in Japanese Patent Publication No. 2023-123349, Xanthene compounds described in Japanese Patent Publication No. 2023-543717, Compounds described in Chinese Patent Application Publication No. 116102441, and the compounds described in Japanese Patent Publication No. 2023-150459 The compounds listed, the compounds described in Japanese Patent Publication No. 2023-167345, the compounds described in Korean Patent Publication No. 10-2023-0061078, the compounds described in Japanese Patent Publication No. 2020-183509, the colorants described in Japanese Patent Publication No. 2020-079395, the compounds represented by formula (1) described in U.S. Patent Application Publication No. 2022 / 0119643, and the compounds described in Japanese Patent Publication No. 2023-048989 The dye, the compound described in Japanese Patent Publication No. 2024-014738, the pigment described in Chinese Patent Application Publication No. 115873417, the compound described in Japanese Patent Publication No. 2024-043497, the compound described in Japanese Patent Publication No. 2021-157040, the azo pigment described in Japanese Patent Publication No. 2024-063075, the compound described in Japanese Patent Publication No. 2022-018967, the compound described in Japanese Patent Publication No. 2024-057558 The following can also be used: the quinophthalone pigment, the compound described in International Publication No. 2020 / 170957, the compound described in Chinese Patent Application Publication No. 117209388, the isoindoline compound described in Japanese Patent Publication No. 2024-079043, the phthalocyanine dye described in Korean Patent Publication No. 10-2022-0026920, the compound described in International Publication No. 2020 / 203514, etc. Furthermore, a rotaxane may be used as the coloring agent. The pigment skeleton may be used in the cyclic structure of the rotaxane, in the rod-like structure, or in both structures.

[0198] If the composition of the present invention contains a coloring agent, the content of the coloring agent in the total solid content of the composition is preferably 1 to 50% by mass. If the composition of the present invention contains two or more coloring agents, it is preferable that their total amount is within the above range.

[0199] When the composition of the present invention is used as an infrared cut filter, it is preferable that the composition of the present invention substantially does not contain a chromatic coloring agent. The statement that the composition of the present invention substantially does not contain a chromatic coloring agent means that the content of the chromatic coloring agent in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably no chromatic coloring agent at all.

[0200] <<Colorants that transmit infrared rays and block visible light>> The composition of the present invention may also contain a colorant that transmits infrared rays and blocks visible light (hereinafter also referred to as a colorant that blocks visible light). Compositions containing a colorant that blocks visible light are preferably used as compositions for forming infrared transmission filters.

[0201] The colorant that blocks visible light is preferably a colorant that absorbs light in the wavelength range from purple to red. Furthermore, the colorant that blocks visible light is preferably a colorant that blocks light in the wavelength range of 450 to 650 nm. Furthermore, the colorant that blocks visible light is preferably a colorant that transmits light in the wavelength range of 900 to 1500 nm. The colorant that blocks visible light is preferably one that satisfies at least one of the following requirements (A) and (B): (A): It contains two or more chromatic colorants, and the black color is formed by a combination of two or more chromatic colorants. (B): It contains an organic black colorant.

[0202] Examples of chromatic colorants include those mentioned above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include those described in Japanese Patent Publication No. 2010-534726, Japanese Patent Publication No. 2012-515233, and Japanese Patent Publication No. 2012-515234, and are available, for example, as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include those described in paragraphs 0016 to 0020 of Japanese Patent Publication No. 2017-226821, and C.I. Pigment Black 31 and 32. Examples of azomethine compounds include those described in Japanese Patent Publication No. 01-170601 and Japanese Patent Publication No. 02-034664, and can be obtained, for example, as "Chromofine Black A1103" manufactured by Dainichi Seika Co., Ltd.

[0203] When black is formed by a combination of two or more chromatic colorants, examples of combinations of chromatic colorants include the following embodiments (1) to (8): (1) Embodiment containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant. (2) Embodiment containing a yellow colorant, a blue colorant, and a red colorant. (3) Embodiment containing a yellow colorant, a purple colorant, and a red colorant. (4) Embodiment containing a yellow colorant and a purple colorant. (5) Embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant. (6) Embodiment containing a purple colorant and an orange colorant. (7) Embodiment containing a green colorant, a purple colorant, and a red colorant. (8) Embodiment containing a green colorant and a red colorant.

[0204] When the composition of the present invention contains a colorant that blocks visible light, the content of the colorant that blocks visible light in the total solid content of the composition is preferably 1 to 50% by mass. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 20% by mass or more, and particularly preferably 30% by mass or more.

[0205] When the composition of the present invention is used as an infrared cut filter, it is preferable that the composition of the present invention substantially does not contain a colorant that blocks visible light. The statement that the composition of the present invention substantially does not contain a colorant that blocks visible light means that the content of a colorant that blocks visible light in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably no colorant at all.

[0206] <<Surfactants>> The compositions of the present invention may contain surfactants. Various surfactants can be used, such as fluorinated surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone surfactants. The surfactant is preferably a silicone surfactant or a fluorinated surfactant. For surfactants, refer to the surfactants described in paragraphs 0238-0245 of International Publication No. 2015 / 166779, which are incorporated herein by reference.

[0207] As fluorinated surfactants, compounds described in paragraphs 0167-0173 of International Publication No. 2022 / 085485 can be used.

[0208] Examples of nonionic surfactants include the compounds described in paragraph 0174 of International Publication No. 2022 / 085485.

[0209] Examples of silicone-based surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419. Examples include OIL (manufactured by Dow Toray Industries, Inc.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (manufactured by Momentive Performance Materials), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (manufactured by Bic Chemie, Inc.), etc. Compounds with the following structure can also be used as silicone-based surfactants.

[0210] As surfactants, polymers described in International Publication No. 2021 / 131726, silicone-containing copolymers described in International Publication No. 2024 / 024440, and silicone-containing copolymers described in International Publication No. 2024 / 024441 can also be used.

[0211] The surfactant content in the total solids of the composition is preferably 0.001 to 5% by mass. The lower limit is preferably 0.005% by mass or more. The upper limit is preferably 3% by mass or less, more preferably 1% by mass or less, even more preferably 0.5% by mass or less, and particularly preferably 0.2% by mass or less. The composition may contain only one type of surfactant or two or more types. If two or more types are included, it is preferable that their total amount falls within the above range.

[0212] <<Polymerization Inhibitor>> The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerium salts, etc.), with p-methoxyphenol being preferred. The content of the polymerization inhibitor in the total solid content of the composition is preferably 0.0001 to 5% by mass. The composition may contain only one polymerization inhibitor or two or more. If two or more are included, it is preferable that their total amount is within the above range.

[0213] <<Silane Coupling Agent>> The composition of the present invention may contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, and more preferably a silane compound having a hydrolyzable group and other functional groups. A hydrolyzable group is a substituent that is directly bonded to a silicon atom and can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of hydrolyzable groups include halogen atoms, alkoxy groups, and acyloxy groups, with alkoxy groups being preferred. The silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than hydrolyzable groups include vinyl groups, styrene groups, (meth)acryloyl groups, mercapto groups, epoxy groups, oxetanyl groups, amino groups, ureido groups, sulfide groups, isocyanate groups, and phenyl groups, with (meth)acryloyl groups and epoxy groups being preferred. Examples of silane coupling agents include the compounds described in paragraph 0177 of International Publication No. 2022 / 085485 and the compounds described in Japanese Patent Publication No. 2019-183020. The content of the silane coupling agent in the total solid content of the composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, and more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The composition may contain only one type of silane coupling agent, or it may contain two or more types. If two or more types are included, it is preferable that their total amount is within the above range.

[0214] <<UV Absorbers>> The compositions of the present invention may contain UV absorbers. Examples of UV absorbers include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, and dibenzoyl compounds. The ultraviolet absorbers include compounds described in paragraphs 0038 to 0052 of Japanese Patent Publication No. 2009-217221, compounds described in paragraphs 0052 to 0072 of Japanese Patent Publication No. 2012-208374, compounds described in paragraphs 0317 to 0334 of Japanese Patent Publication No. 2013-068814, compounds described in paragraphs 0061 to 0080 of Japanese Patent Publication No. 2016-162946, compounds described in paragraphs 0059 to 0076 of International Publication No. 2016 / 181987, compounds described in paragraphs 0052 and 0074 of International Publication No. 2021 / 131355, and International Publication No. 2021 / 132247 Compounds described in paragraphs 0022 to 0024 of the publication, the compound described in paragraph 0179 of International Publication No. 2022 / 085485, the reactive triazine UV absorber described in JP 2021-178918, the UV absorber described in JP 2022-007884, the compound described in Korean Published Patent No. 10-2022-0014454, the compound described in JP 2023-013321, the compound described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967, and the compound described in JP 2023-178225 can also be used. Commercially available UV absorbers include the Tinuvin series and Uvinul series from BASF. Furthermore, an example of a benzotriazole compound is the MYUA series manufactured by Miyoshi Oil & Fat Co., Ltd. (Chemical Daily, February 1, 2016). The content of the ultraviolet absorber in the total solid content of the composition is preferably 0.01 to 30% by mass. The lower limit is preferably 0.05% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, even more preferably 10% by mass or less, and particularly preferably 5% by mass or less. The composition may contain only one type of ultraviolet absorber, or it may contain two or more types.If two or more types are included, it is preferable that their total amount falls within the above range.

[0215] <<Antioxidants>> The compositions of the present invention may contain antioxidants. Examples of antioxidants include phenolic antioxidants, amine-based antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of phenolic antioxidants include hindered phenol compounds. Phenolic antioxidants are preferably compounds having a substituent at the ortho position adjacent to the phenolic hydroxyl group. As for the substituents, substituted or unsubstituted alkyl groups having 1 to 22 carbon atoms are preferred. Antioxidants are also preferably compounds having a phenolic group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosfepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosfepin-2-yl)oxy]ethyl]amine, ethylbis(2,4-di-tert-butyl-6-methylphenyl) phosphate, and tris(2,4-di-tert-butylphenyl) phosphite. Examples of commercially available antioxidants include Adeka Stab AO-20, Adeka Stab AO-30, Adeka Stab AO-40, Adeka Stab AO-50, Adeka Stab AO-50F, Adeka Stab AO-60, Adeka Stab AO-60G, Adeka Stab AO-80, Adeka Stab AO-330, Adeka Stab AO-412S, Adeka Stab 2112, Adeka Stab PEP-36, Adeka Stab HP-10 (all manufactured by ADEKA Corporation), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). The antioxidant may also be a compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, a compound described in International Publication No. 2017 / 006600, a compound described in International Publication No. 2017 / 164024, or a compound described in Korean Published Patent No. 10-2019-0059371. The antioxidant content in the total solids of the composition is preferably 0.01 to 20% by mass. The lower limit is preferably 0.3% by mass or more, and more preferably 0.5% by mass or more. The upper limit is preferably 15% by mass or less, and even more preferably 10% by mass or less.The composition may contain only one antioxidant or two or more antioxidants. If it contains two or more antioxidants, it is preferable that their total amount falls within the above range.

[0216] <<Other Components>> The composition of the present invention may optionally contain sensitizers, fillers, thermosetting accelerators, plasticizers, and other auxiliary agents (e.g., conductive particles, defoamers, flame retardants, leveling agents, peeling accelerators, fragrances, surface tension modifiers, chain transfer agents, latent antioxidants, etc.). By appropriately including these components, properties such as film properties can be adjusted. These components can be compounds described in paragraph 0182 of International Publication No. 2022 / 085485. Furthermore, thiol compounds described in Japanese Patent Application Publication No. 2020-109068 can be used as chain transfer agents. In addition, compounds having two or more triethoxysilyl groups described in Japanese Patent Application Publication No. 2023-180607 can be used as other components.

[0217] The composition of the present invention may contain compounds derived from biomass raw materials, compounds containing radioactive carbon atoms, and compounds having a percentage modern carbon content of 50% or more. The content of compounds derived from biomass raw materials relative to the total compounds contained in the composition of the present invention may be 20% by mass or more.

[0218] The composition of the present invention is preferably substantially free of terephthalate esters. Here, "substantially free" means that the terephthalate ester content is 1,000 ppb by mass or less of the total amount of the composition, more preferably 100 ppb by mass or less, and particularly preferably zero.

[0219] From the viewpoint of environmental regulations, the composition of the present invention preferably has a melamine content of 10,000 ppm by mass or less.

[0220] The composition of the present invention preferably has a free metal content of 100 ppm or less, and more preferably 50 ppm or less. Furthermore, the free halogen content is preferably 100 ppm or less, and more preferably 50 ppm or less. Methods for reducing free metals and halogens in the composition include washing with deionized water, filtration, ultrafiltration, purification with ion exchange resin, and purification with inorganic adsorbents such as hydrotalcite.

[0221] From an environmental perspective, the use of perfluoroalkyl sulfonic acid and its salts, and perfluoroalkyl carboxylic acid and its salts may be restricted. In the composition of the present invention, when the content of the above-mentioned compounds is reduced, the content of perfluoroalkyl sulfonic acid (particularly perfluoroalkyl sulfonic acid with 6 to 8 carbon atoms in the perfluoroalkyl group) and its salts, and perfluoroalkyl carboxylic acid (particularly perfluoroalkyl carboxylic acid with 6 to 8 carbon atoms in the perfluoroalkyl group) and its salts is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, relative to the total solid content of the composition. The composition of the present invention may substantially not contain perfluoroalkyl sulfonic acid and its salts, and perfluoroalkyl carboxylic acid and its salts. For example, by using compounds that can substitute for perfluoroalkyl sulfonic acid and its salts, and perfluoroalkyl carboxylic acid and its salts, a composition substantially free of perfluoroalkyl sulfonic acid and its salts may be selected. Examples of compounds that can substitute for regulated compounds include compounds that have been excluded from regulation due to differences in the number of carbon atoms in the perfluoroalkyl group. However, the above does not preclude the use of perfluoroalkyl sulfonic acid and its salts, and perfluoroalkyl carboxylic acid and its salts. The compositions of the present invention may contain perfluoroalkyl sulfonic acid and its salts, and perfluoroalkyl carboxylic acid and its salts, to the maximum permissible extent.

[0222] From an environmental regulatory standpoint, the content of fluorine-containing compounds in the composition may be 5% by mass or less, 1% by mass or less, 100 ppm by mass or less, 1 ppm by mass or less, or substantially none at all.

[0223] <Container> There are no particular limitations on the container used to contain the composition of the present invention, and any known container can be used. Alternatively, the container described in paragraph 0187 of International Publication No. 2022 / 085485 can be used as the container.

[0224] <Method for preparing the composition> The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all components may be dissolved or dispersed simultaneously in a solvent to prepare the composition, or, if necessary, two or more solutions or dispersions containing each component in appropriate proportions may be prepared in advance and mixed at the time of use (application) to prepare the composition.

[0225] The preparation of the composition may include a process for dispersing the pigment. Examples of mechanical forces used in the pigment dispersion process include compression, squeezing, impact, shearing, and cavitation. Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high-speed impellers, sand grinders, flow jet mixers, high-pressure wet atomization, and ultrasonic dispersion. Furthermore, in the grinding of pigments using a sand mill (bead mill), it is preferable to process the material under conditions that enhance grinding efficiency, such as by using small-diameter beads or increasing the bead packing density. It is also preferable to remove coarse particles after the grinding process by filtration or centrifugation. Furthermore, the processes and dispersers for dispersing the pigments can suitably be those described in "Complete Collection of Dispersion Technologies, published by Joho Kiko Co., Ltd., July 15, 2005," "Comprehensive Data Collection on Dispersion Technologies and Industrial Applications, Focusing on Suspensions (Solid / Liquid Dispersion Systems), published by Keiei Kaihatsu Center Publishing Department, October 10, 1978," and paragraph 0022 of Japanese Patent Publication No. 2015-157893. In addition, in the process of dispersing the pigments, the pigments may be refined by a salt milling process. For materials, equipment, and processing conditions used in the salt milling process, refer to, for example, Japanese Patent Publication No. 2015-194521 and Japanese Patent Publication No. 2012-046629. Examples of bead materials used for dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. Furthermore, the beads may be inorganic compounds with a Mohs hardness of 2 or higher. The composition may contain 1 to 10,000 ppm of the above-mentioned beads.

[0226] In preparing the composition, it is preferable to filter the composition with a filter for purposes such as removing foreign matter and reducing defects. Examples of filters and filtration methods used for filtration include those described in paragraphs 0196 to 0199 of International Publication No. 2022 / 085485.

[0227] <Membrane> Next, the membrane of the present invention will be described. The membrane of the present invention is obtained from the composition of the present invention described above. The membrane of the present invention can preferably be used as an optical filter. The applications of the optical filter are not particularly limited, but examples include infrared cut filters and infrared transmission filters. Examples of infrared cut filters include infrared cut filters on the light-receiving side of a solid-state image sensor (for example, for infrared cut filters for wafer-level lenses), infrared cut filters on the back side (opposite side from the light-receiving side) of a solid-state image sensor, and infrared cut filters for ambient light sensors (for example, illuminance sensors that sense the illuminance and color tone of the environment in which an information terminal device is placed and adjust the color tone of the display, and color correction sensors that adjust the color tone). In particular, it can preferably be used as an infrared cut filter on the light-receiving side of a solid-state image sensor. Examples of infrared transmission filters include filters that block visible light and selectively transmit infrared rays of a specific wavelength or higher.

[0228] The film of the present invention may have a pattern or may be a film without a pattern (a flat film). Furthermore, the film of the present invention may be used laminated on a support, or the film of the present invention may be used after being peeled off the support. Examples of support materials include semiconductor substrates such as silicon substrates and transparent substrates.

[0229] A charge-coupled device (CCD), complementary metal-oxide-semiconductor (CMOS), photoelectric conversion layer, transparent conductive film, etc., may be formed on the semiconductor substrate used as a support. In addition, partitions that isolate each pixel may be formed on the semiconductor substrate. Examples of partitions include metal, metal oxide, and black matrix. Furthermore, if necessary, an undercoat layer may be provided on the semiconductor substrate to improve adhesion with the upper layer, prevent diffusion of materials, or flatten the substrate surface.

[0230] The transparent substrate used as a support is not particularly limited as long as it is made of a material that can transmit at least visible light. Examples include substrates made of glass, resin, etc. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymer, norbornene resin, acrylic resins such as polyacrylate and polymethyl methacrylate, urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass can also be used. A commercially available copper-containing glass is NF-50 (manufactured by AGC Techno Glass Co., Ltd.).

[0231] The thickness of the film of the present invention can be appropriately adjusted depending on the purpose. The film thickness can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

[0232] When the film of the present invention is used as an infrared cut filter, it is preferable that the film of the present invention has a maximum absorption wavelength in the range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). Furthermore, the average transmittance in the range of 700 to 720 nm is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. Furthermore, the average transmittance in the range of 400 to 550 nm is preferably 86% or more, more preferably 89% or more, even more preferably 92% or more, and particularly preferably 95% or more. Furthermore, the transmittance in the entire range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more. Furthermore, it is preferable that the transmittance at at least one point in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. In addition, when the absorbance at the maximum absorption wavelength is set to 1, the average absorbance of the film of the present invention in the wavelength range of 400 to 550 nm is preferably less than 0.030, and more preferably less than 0.025.

[0233] When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention has, for example, any of the following spectral characteristics (i1) to (i3): (i1): A filter in which the maximum transmittance in the wavelength range of 400 to 850 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum transmittance in the wavelength range of 1000 to 1500 nm is 70% or more (preferably 75% or more, more preferably 80% or more). A film having such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with a wavelength greater than 950 nm. (i2): A filter in which the maximum transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum transmittance in the wavelength range of 1100 to 1500 nm is 70% or more (preferably 75% or more, more preferably 80% or more). A film having such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with a wavelength greater than 1050 nm. (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with a wavelength greater than 1150 nm.

[0234] The film of the present invention can also be used in combination with a color filter containing a chromatic coloring agent. The color filter can be manufactured using a coloring composition containing a chromatic coloring agent. When the film of the present invention is used as an infrared cut filter and in combination with a color filter, it is preferable that the color filter is positioned on the optical path of the film of the present invention. For example, it is preferable to laminate the film of the present invention and the color filter to form a laminate. In the laminate, the film of the present invention and the color filter may or may not be adjacent in the thickness direction. If the film of the present invention and the color filter are not adjacent in the thickness direction, the film of the present invention may be formed on a support other than the support on which the color filter is formed, and other components constituting a solid-state image sensor (e.g., microlenses, planarization layers, etc.) may be interposed between the film of the present invention and the color filter.

[0235] The film of the present invention can be used in various devices such as solid-state image sensors (CCDs and CMOSs) (the imaging portion can use compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc., in addition to Si), infrared sensors, light-emitting elements, optical communication elements (both transmitting and receiving), and image display devices.

[0236] <Method for manufacturing the film> The film of the present invention can be manufactured by a process of applying the composition of the present invention.

[0237] Examples of supports include those mentioned above. Known methods such as spin coating can be used for coating the composition. For example, the coating method described in paragraph 0207 of International Publication No. 2022 / 085485 can be used.

[0238] The composition layer formed by applying the composition may be dried (pre-baked). When pre-baking is performed, the pre-baking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, and also 80°C or higher. The pre-baking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, oven, etc.

[0239] The method for manufacturing the film may further include a step of forming a pattern. Examples of pattern formation methods include a pattern formation method using photolithography and a pattern formation method using dry etching, with the pattern formation method using photolithography being preferred. However, if the film of the present invention is used as a flat film, the step of forming a pattern may not be necessary. The step of forming a pattern will be described in detail below.

[0240] (When forming a pattern by photolithography) The photolithography method for forming a pattern preferably includes a step of exposing a composition layer formed by coating the composition of the present invention in a patterned manner (exposure step), and a step of developing and removing the unexposed parts of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-bake step) may be provided. Each step will be described below.

[0241] In the exposure process, the composition layer is exposed in a pattern. For example, the composition layer can be exposed in a pattern by using a stepper exposure machine or a scanner exposure machine to expose it through a mask having a predetermined mask pattern. This allows the exposed areas to be cured.

[0242] Examples of radiation (light) that can be used during exposure include g-rays and i-rays. Additionally, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 - 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF light (wavelength 248 nm), ArF light (wavelength 193 nm), etc., and KrF light (wavelength 248 nm) is preferred. Also, light sources with longer wavelengths of 300 nm or more can be utilized.

[0243] During exposure, the light may be continuously irradiated for exposure, or pulsed irradiation for exposure (pulse exposure) may be used. Pulse exposure refers to an exposure method in which light irradiation and pause are repeated in a short time cycle (for example, at the millisecond level or below) for exposure.

[0244] The irradiation dose (exposure dose) is, for example, preferably 0.03 - 2.5 J / cm ２ and more preferably 0.05 - 1.0 J / cm ２ The oxygen concentration during exposure can be appropriately selected. In addition to performing it under the atmosphere, for example, exposure may be carried out in a low-oxygen atmosphere with an oxygen concentration of 19 vol% or less (for example, 15 vol%, 5 vol%, or substantially oxygen-free), or exposure may be carried out in a high-oxygen atmosphere with an oxygen concentration exceeding 21 vol% (for example, 22 vol%, 30 vol%, or 50 vol%). Also, the exposure illuminance can be appropriately set and is usually 1000 W / m ２ - 100000 W / m ２ (for example, 5000 W / m ２ , 15000 W / m ２ , or 35000 W / m ２ ) and can be selected from this range. The oxygen concentration and exposure illuminance can be appropriately combined with conditions. For example, an oxygen concentration of 10 vol% and an illuminance of 10000 W / m ２ , an oxygen concentration of 35 vol% and an illuminance of 20000 W / m ２ etc. can be used.

[0245] Next, the composition layer of the unexposed portion in the composition layer after exposure is developed and removed to form a pattern. The development and removal of the composition layer of the unexposed portion can be performed using a developer. As a result, the composition layer of the unexposed portion in the exposure process elutes into the developer, and only the photocured portion remains on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. Further, in order to improve the residue removability, the developer may be shaken off every 60 seconds, and the step of supplying a new developer may be repeated several times.

[0246] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. For the developer and the cleaning (rinsing) method after development, the developer and the cleaning method described in paragraph 0214 of International Publication No. 2022 / 085485 can be used.

[0247] After development, it is preferable to perform additional exposure treatment or heat treatment (post-bake) after drying. The additional exposure treatment and post-bake are post-development curing treatments for making the curing complete. The heating temperature in the post-bake is preferably, for example, 100 to 240°C, and more preferably 200 to 240°C. The post-bake can be performed continuously or batchwise using heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater so that the film after development becomes the above conditions. When performing the additional exposure treatment, the light used for exposure is preferably light with a wavelength of 400 nm or less. Further, the additional exposure treatment may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0248] (When forming a pattern by dry etching) Pattern formation by dry etching can be carried out by coating the above composition onto a support to form a composition layer, curing the composition layer to form a cured material layer, then forming a patterned photoresist layer on this cured material layer, and then using the patterned photoresist layer as a mask to dry etch the cured material layer with an etching gas. In forming the photoresist layer, it is preferable to perform a pre-bake treatment. For pattern formation by dry etching, refer to paragraphs 0010 to 0067 of Japanese Patent Application Publication No. 2013-064993, and this content is incorporated herein by reference.

[0249] <Optical Filter> The optical filter of the present invention has the film of the present invention described above. Examples of types of optical filters include infrared cut filters and infrared transmission filters.

[0250] The optical filter of the present invention may further include, in addition to the film of the present invention described above, a copper-containing layer, a dielectric multilayer film, an ultraviolet absorption layer, and the like. Examples of ultraviolet absorption layers include the absorption layer described in paragraphs 0040-0070 and 0119-0145 of International Publication No. 2015 / 099060. Examples of dielectric multilayer films include the dielectric multilayer film described in paragraphs 0255-0259 of Japanese Patent Application Publication No. 2014-041318. As a copper-containing layer, a glass substrate made of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (copper complex-containing layer) can also be used. Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorine phosphate glass. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, BG-61 (both manufactured by Schott), and CD5000 (manufactured by HOYA Corporation).

[0251] The optical filter of the present invention may be formed on a support. Examples of the support include the supports described above. Preferred substrates include transparent substrates made of materials such as glass and resin. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymer, norbornene resin, acrylic resins such as polyacrylate and polymethyl methacrylate, urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. The optical filter may also be formed by directly depositing a film on various elements.

[0252] <Solid-State Image Sensor> The solid-state image sensor of the present invention has the film of the present invention described above. The configuration of the solid-state image sensor is not particularly limited as long as it has the film of the present invention and functions as a solid-state image sensor. For example, the following configuration can be given.

[0253] The imaging device has a support on which a plurality of photodiodes constituting the light-receiving area of ​​a solid-state image sensor and a transfer electrode made of polysilicon or the like is provided. The photodiodes and transfer electrode have a light-shielding film made of tungsten or the like with an opening only for the light-receiving portion of the photodiode. The light-shielding film has a device protection film made of silicon nitride or the like formed to cover the entire surface of the light-shielding film and the light-receiving portion of the photodiode. The device protection film has the film of the present invention. Furthermore, the device protection film may have a configuration in which a light-gathering means (e.g., a microlens; the same applies hereinafter) is provided below the film of the present invention (on the side closer to the support), or a configuration in which the light-gathering means is provided on the film of the present invention. The color filter may also have a structure in which a film forming each pixel is embedded in a space partitioned, for example, in a grid pattern by partitions. In this case, it is preferable that the partitions have a lower refractive index than each pixel. Examples of imaging devices having such a structure include the devices described in Japanese Patent Application Publication No. 2012-227478 and Japanese Patent Application Publication No. 2014-179577.

[0254] <Image Display Device> The image display device of the present invention has the film of the present invention. Examples of image display devices include liquid crystal display devices and organic electroluminescent (organic EL) display devices. For definitions and details of image display devices, see, for example, "Electronic Display Devices" (by Akio Sasaki, Kogyo Chosakai Co., Ltd., published in 1990) and "Display Devices" (by Yoshiaki Ibuki, Sangyo Tosho Co., Ltd., published in 1989). Liquid crystal display devices are described, for example, in "Next-Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, Kogyo Chosakai Co., Ltd., published in 1994). There are no particular restrictions on the liquid crystal display devices to which the present invention can be applied; for example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "Next-Generation Liquid Crystal Display Technology". The image display device may also have a white organic EL element. The white organic EL element is preferably in a tandem structure. The tandem structure of organic EL elements is described in Japanese Patent Publication No. 2003-045676, supervised by Akiyoshi Mikami, "The Cutting Edge of Organic EL Technology Development - High Brightness, High Precision, Long Lifespan, and Know-how Collection," Technical Information Association, pp. 326-328, 2008, etc. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), the green region (530-580 nm), and the yellow region (580-620 nm). In addition to these emission peaks, it is even more preferable to have a maximum emission peak in the red region (650-700 nm). The film of the present invention can also be used as an infrared-transmitting film provided in an infrared communication opening formed in the frame portion of a protective plate for a display device.

[0255] <Infrared Sensor> The infrared sensor of the present invention has the film of the present invention described above. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

[0256] In Figure 1, reference numeral 110 denotes a solid-state image sensor. An infrared cut filter 111 and an infrared transmission filter 114 are arranged on the imaging area of ​​the solid-state image sensor 110. A color filter 112 is also arranged on the infrared cut filter 111. Microlenses 115 are arranged on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlenses 115.

[0257] The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter in which pixels that transmit and absorb light of a specific wavelength in the visible region are formed, and is not particularly limited; conventionally known color filters for pixel formation can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed can be used. For example, the description in paragraphs 0214 to 0263 of Japanese Patent Application Publication No. 2014-043556 can be referenced, and this content is incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0258] In the infrared sensor shown in Figure 1, an additional infrared cut filter (another infrared cut filter) may be placed on the planarization layer 116, separate from the infrared cut filter 111. Examples of other infrared cut filters include those having a copper-containing layer and / or a dielectric multilayer film. Details of these are described above. A dual bandpass filter may also be used as the other infrared cut filter.

[0259] <Camera Module> The camera module of the present invention has the film of the present invention described above. The configuration of the camera module is not particularly limited as long as it has the film of the present invention and functions as a camera module. For example, a camera module may have a configuration having a solid-state image sensor, a lens, and a circuit for processing images obtained from the solid-state image sensor. Known lenses and circuits for processing images obtained from the solid-state image sensor can be used in the camera module. Examples of camera modules can be found in Japanese Patent Application Publication No. 2016-006476 and Japanese Patent Application Publication No. 2014-197190, the contents of which are incorporated herein by reference.

[0260] <Light-Emitting Device> The film of the present invention can also be used in a light-emitting device. The configuration of the light-emitting device is not particularly limited as long as it functions as a light-emitting device, and examples include light-emitting diodes (LEDs), organic light-emitting diodes (OLEDs), quantum dot light-emitting diodes (QLEDs), and vertical cavity surface-emitting lasers (VICSELs). The film of the present invention may be formed directly on the light-emitting device, or it may be placed on the path of light emission.

[0261] <Optical Communication Elements> The film of the present invention can also be used in optical communication elements. The configuration of the optical communication element is not particularly limited as long as it functions as an optical communication element, and it may be a transmitting element or a receiving element. Examples of optical communication elements include infrared remote controls, infrared transceivers, optical interposers, and optical interconnects. The film of the present invention may be formed directly on a receiving element, directly on a transmitting element, or placed on a transmitting / receiving path.

[0262] The present invention will be further described in detail below with reference to examples. The materials, amounts used, proportions, processing content, and processing procedures shown in the following examples can be modified as appropriate, as long as they do not depart from the spirit of the present invention. In the following structural formulas, Me represents a methyl group and Ph represents a phenyl group.

[0263] <Synthesis Example> (Synthesis Example 1) Synthesis of Compound 1-1 Compound 1-1 is synthesized from Compound 1-1a, which was synthesized with reference to Japanese Patent Publication No. 2023-73064, using the following synthesis route.

[0264] In a reaction vessel, add 17.8 g (30.0 mmol) of compound 1-1a, 150 ml of tetrahydrofuran (THF), and 2.6 g (10.0 mmol) of bis(2,4-pentanedionato)zinc(II), and stir at 40°C under nitrogen for 5 hours. Then, add the reaction solution, cooled to room temperature, dropwise to 620 ml of methanol while stirring. After the dropwise addition is complete, filter off the crystals and wash with 620 ml of methanol and 620 ml of water. Dry the resulting crystals with forced air at 50°C to obtain 7.3 g of compound 1-1.

[0265] Identification data for compound 1-1: MALDI (Matrix-Assisted Laser Desorption / Ionization), TOF-MS (Time of Flight Mass Spectrometry): Calc. for [M+H] ＋ 1215.4, found 1215.4

[0266] (Synthesis Example 2) Synthesis of Compound 1-14 Compound 1-14 is synthesized from Compound 1-1a, which was synthesized with reference to Japanese Patent Publication No. 2023-73064, using the following synthesis route. In a reaction vessel, 17.8 g (30.0 mmol) of compound 1-1a, 50 ml of toluene, 50 ml of o-dichlorobenzene, and 2.3 g (10.0 mmol) of boron complex 1-14a were added. Then, 5.2 g (40.0 mmol) of diisopropylethylamine was added dropwise, and the mixture was stirred at 100°C under nitrogen for 2 hours. After that, 75 ml of methanol was added dropwise to the reaction solution cooled to room temperature. After the addition was complete, the crystals were filtered off and washed with 75 ml of methanol. The resulting crystals were air-dried at 50°C to obtain 5.3 g of compound 1-14. Identification data for compounds 1-14: MALDI (Matrix-Assisted Laser Desorption / Ionization), TOF-MS (Time of Flight Mass Spectrometry): Calc. for [M+H] ＋1311.5, found 1311.5

[0267] <Preparation of Dispersion> Mix the infrared absorber, pigment derivative, dispersion resin, and solvent of the types listed in the table below in the parts by mass listed below. Add 117 parts by mass of zirconia beads with a diameter of 0.3 mm, and disperse using a paint shaker for 5 hours. Separate the beads by filtration to produce the dispersion. The infrared absorber used should have undergone the following kneading and polishing treatment.

[0268] (Kneading and polishing conditions) 10.6 parts by mass of infrared absorbent, 149.4 parts by mass of grinding agent, and 28 parts by mass of binder are added to a Laboplast Mill (manufactured by Toyo Seiki Seisakusho Co., Ltd.), and the mixture is kneaded for 2 hours while controlling the temperature of the mixture in the apparatus to 70°C. Neutral anhydrous Glauber's salt E (average particle size (50% diameter by volume (D50)) = 20 μm, manufactured by Mitajiri Chemical Co., Ltd.) is used as the grinding agent, and diethylene glycol is used as the binder. After kneading and polishing, the mixture is washed with 20 L of 24°C water to remove the grinding agent and binder, and then treated in a heated oven at 80°C for 24 hours.

[0269]

[0270] The materials listed in the table above are as follows: (Infrared absorbers) 1-1 to 1-21, 1-25 to 1-28: Compounds shown as specific examples of the specified compounds above 1-r1: Compound with the following structure (comparative compound)

[0271] (Pigment derivatives) F-1 to F-5: Compounds with the following structure

[0272] (Dispersed Resin) E-1: Resin with the following structure (acid value = 99.1 mg KOH / g, weight average molecular weight = 38,000). The numerical values attached to the main chain represent the molar ratio of repeating units, and the numerical values attached to the side chain represent the number of repeating units. E-2: Resin with the following structure (acid value = 87.0 mg KOH / g, weight average molecular weight = 18,000). The numerical values attached to the main chain represent the molar ratio of repeating units, and the numerical values attached to the side chain represent the number of repeating units. E-3: Resin with the following structure (acid value = 85.0 mg KOH / g, weight average molecular weight = 22,000). The numerical values attached to the main chain represent the molar ratio of repeating units, and the numerical values attached to the side chain represent the number of repeating units. E-4: Resin with the following structure (acid value = 43 mg KOH / g, weight average molecular weight = 9,000). The numerical values attached to the side chain represent the molar ratio of repeating units. E-5: Block-type resin with the following structure (amine value = 90 mg KOH / g, quaternary ammonium salt value = 30 mg KOH / g, weight average molecular weight = 9,800). The numerical values attached to the main chain represent the molar ratio of repeating units. E-6: Resin with the following structure (acid value = 32.3 mg KOH / g, amine value = 45.0 mg KOH / g, weight average molecular weight = 22,900). The numerical values attached to the main chain represent the molar ratio of repeating units, and the numerical values attached to the side chain represent the number of repeating units.

[0273] (Solvent) D-1: Propylene glycol monomethyl ether acetate

[0274] <Manufacture of Composition> (Examples 1 to 40, 101 to 108, 201 to 208, Comparative Examples 1, 101, 201)Mix the materials described in the following table in the parts by mass described in the following table respectively, and then filter through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to manufacture each composition.

[0275]

[0276]

[0277]

[0278] (Dispersion) Dispersions 1 to 36, Dispersion r1: The above-mentioned dispersions 1 to 36, Dispersion r1

[0279] (Infrared absorbers) 1-22 to 1-24: Compounds 1-22 to 1-24 shown as specific examples of the specified compounds mentioned above.

[0280] (Resin) G-1: Resin with the following structure (acid value 69.2 mg KOH / g, weight-average molecular weight 10,000, the number attached to the main chain represents the molar ratio of repeating units) G-2: Resin with the following structure (acid value 91.3 mg KOH / g, weight-average molecular weight 41,000, the number attached to the main chain represents the molar ratio of repeating units) G-3: Resin with the following structure (acid value 72.2 mg KOH / g, weight-average molecular weight 19,000, the number attached to the main chain represents the molar ratio of repeating units) G-4: Resin with the following structure (acid value 110 mg KOH / g, weight-average molecular weight 10,000, the number attached to the main chain represents the molar ratio of repeating units) G-5: Resin with the following structure (acid value = 184 mg KOH / g, weight-average molecular weight 9,700, the number attached to the main chain represents the molar ratio of repeating units)

[0281] G-6: Resin with the following structure (weight-average molecular weight 137,000, number-average molecular weight 32,000, glass transition temperature 165°C) G-7: Resin with the following structure (weight-average molecular weight 188,000, number-average molecular weight 75,000, glass transition temperature 285°C) G-8: Resin with the following structure (glass transition temperature 310°C, logarithmic viscosity 0.87)

[0282] GE-1: Resin with the following structure (the values ​​for repeating units are mass ratios, weight-average molecular weight 20,000, number-average molecular weight 8,300, epoxy equivalent 284 g / eq, acid value 130 mg KOH / g, glass transition temperature 136°C) GE-2: Resin with the following structure (the values ​​for repeating units are mass ratios, weight-average molecular weight 26,100, number-average molecular weight 8,600, epoxy equivalent 355 g / eq, acid value 163 mg KOH / g, glass transition temperature 133°C) GE-3: Resin with the following structure (the values ​​for repeating units are mass ratios, weight-average molecular weight 21,100, number-average molecular weight 8,500, epoxy equivalent 355 g / eq, acid value 130 mg KOH / g, glass transition temperature 157°C) GE-4: Resin with the following structure (the values ​​for repeating units are mass ratios, weight-average molecular weight 18300, number-average molecular weight 9100, epoxy equivalent 284 g / eq, acid value 98 mg KOH / g, glass transition temperature 134°C) GE-5: Resin with the following structure (the values ​​for repeating units are mass ratios, weight-average molecular weight 22900, number-average molecular weight 8800, epoxy equivalent 316 g / eq, acid value 130 mg KOH / g, glass transition temperature 124°C)

[0283] (Photopolymerization initiator) C-1 to C-5: Compounds with the following structure

[0284] (Polymerizable compounds) B-1: A mixture of compounds with the following structure (molar ratio of left-side compound to right-side compound is 7:3) B-2: A compound with the following structure B-3: A mixture of compounds with the following structure (containing 55-63 mol% of the left-side compound) B-4: A compound with the following structure

[0285] (UV absorbers) H-1 to H-6: Compounds with the following structure

[0286] (Antioxidants) I-1 to I-6: Compounds with the following structures

[0287] (Surfactants) J-1: Compound with the following structure (weight-average molecular weight = 14000, in the formula below, the percentage indicating the proportion of repeating units is in mole percent) J-2: X-22-4741 (manufactured by Shin-Etsu Chemical Co., Ltd., silicone-based surfactant) J-3: X-22-2445 (manufactured by Shin-Etsu Chemical Co., Ltd., silicone-based surfactant)

[0288] (Polymerization inhibitor) K-1: p-methoxyphenol

[0289] (Additives) L-1 to L-3: Compounds with the following structure

[0290] (Hardening agent) P-1: Trimellitic acid P-2: 2-ethyl-4-methylimidazole P-3: Methyltetrahydrophthalic anhydride

[0291] (Solvents) D-1: Propylene glycol monomethyl ether acetate D-2: Propylene glycol monomethyl ether D-3: Cyclopentanone D-4: 3-Methoxy-N,N-dimethylpropanamide D-5: 3-Butoxy-N,N-dimethylpropanamide D-6: Methyl 3-methoxypropionate D-7: Dichloromethane D-8: Dimethylacetamide

[0292] <Membrane Manufacturing> (Manufacturing Example 1) Method for manufacturing a film using the compositions of Examples 1 to 40 and Comparative Example 1 Each composition is coated onto a glass substrate by spin coating, and the composition layer is obtained by heating it at 100°C for 2 minutes using a hot plate. The obtained composition layer is exposed to 1000 mJ / cm using an i-line stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Corporation). ２ The entire surface is exposed with the specified exposure level. Then, using a hot plate, it is heated at 180°C for 5 minutes to produce a film with a thickness of 1.0 μm.

[0293] (Manufacturing Example 2) Method for manufacturing films using the compositions of Examples 101 to 108 and Comparative Example 101 Each composition is applied to a glass substrate by spin coating, heated at 100°C for 2 minutes using a hot plate, and then heated at 200°C for 8 minutes to perform a curing treatment to obtain a film with a thickness of 1.0 μm.

[0294] (Manufacturing Example 3) Method for manufacturing films using the compositions of Examples 201 to 208 and Comparative Example 201 Each composition is cast onto a glass substrate and dried at 20°C for 8 hours, after which it is peeled off from the glass substrate. The peeled coating is further dried under reduced pressure at 100°C for 8 hours to obtain a film with a thickness of 0.1 mm, a length of 60 mm, and a width of 60 mm.

[0295] (Humidity Resistance) The obtained film is subjected to a humidity resistance test by being left in a high-temperature, high-humidity environment of 85°C and 85% relative humidity for 72 hours. For both the film before and after the humidity resistance test, the maximum absorbance (Absλmax) at wavelengths of 700 to 1500 nm and the minimum absorbance (Absλmin) at wavelengths of 400 to 700 nm are measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Tech Corporation), and the absorbance ratio is calculated using the following formula: Absorbance ratio = Absλmax / Absλmin Next, the rate of change of the absorbance ratio is calculated using the following formula, and the humidity resistance is evaluated according to the following criteria. Change in absorbance ratio (%) = |(Absorbance ratio of film before humidity resistance test - Absorbance ratio of film after humidity resistance test) / Absorbance ratio of film before humidity resistance test| × 100 A: Change in absorbance ratio ≤ 5% B: 5% < Change in absorbance ratio ≤ 10% C: 10% > Change in absorbance ratio

[0296] (Heat Resistance) The obtained film is heated to 265°C for 15 minutes using a hot plate to perform a heat resistance test. The maximum absorbance (Absλmax) at wavelengths of 700 to 1500 nm and the minimum absorbance (Absλmin) at wavelengths of 400 to 700 nm are measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Tech Corporation) both before and after the heat resistance test, and the absorbance ratio is calculated using the following formula: Absorbance ratio = Absλmax / Absλmin Next, the rate of change of the absorbance ratio is calculated using the following formula, and the heat resistance is evaluated according to the following criteria. Change in absorbance ratio (%) = |(Absorbance ratio of film before heat resistance test - Absorbance ratio of film after heat resistance test) / Absorbance ratio of film before heat resistance test| × 100 A: Change in absorbance ratio ≤ 5% B: 5% < Change in absorbance ratio ≤ 10% C: 10% > Change in absorbance ratio

[0297] (Storage Stability) The viscosity of the composition immediately after manufacturing (denoted as initial viscosity A) is measured. The composition whose viscosity has been measured is stored in a constant temperature bath at 45°C for 72 hours, and then the viscosity (denoted as post-storage viscosity B) is measured again. Note that the viscosity is measured after adjusting the temperature of the composition to 23°C. Then, the viscosity increase rate is calculated from the following formula, and the storage stability is evaluated according to the following criteria. A lower viscosity increase rate means better storage stability. Viscosity Increase Rate (%) = [(Post-storage viscosity B / Initial viscosity A) - 1] × 100 A: Viscosity increase rate is 10% or less B: Viscosity increase rate is greater than 10% and 30% or less C: Viscosity increase rate is greater than 30%

[0298]

[0299]

[0300]

[0301] As shown in the table above, the examples exhibit excellent storage stability, moisture resistance, and heat resistance.

[0302] In Example 1, the same effect can be obtained even if dispersion 101 is used instead of dispersion 1. In Example 2, the same effect can be obtained even if dispersion 102 is used instead of dispersion 2. In Example 5, the same effect can be obtained even if dispersion 103 is used instead of dispersion 5. In Example 14, the same effect can be obtained even if dispersion 104 is used instead of dispersion 14.

[0303] The infrared absorbers 1-1, 1-2, 1-5, and 1-14, the pigment derivative F-4, the dispersion resin E-4, and the solvent D-1 are the materials described above. The infrared absorbers IR-1 to IR-5 are compounds with the following structures.

[0304] <Production of Composition for Forming Infrared-Transmitting Filters> (Example 301) The materials are mixed in the proportions shown below and filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce the composition of Example 301 (composition for forming infrared-transmitting filters). Composition of Example 1: 36.99 parts by mass Pigment dispersion 1-1: 46.5 parts by mass Pigment dispersion 1-2: 37.1 parts by mass By evaluating the moisture resistance, heat resistance and storage stability of the composition of Example 301 in the same manner as in Example 1, the same effects as in Example 1 can be obtained. Furthermore, the film obtained using the composition of Example 301 can block light of visible wavelengths and transmit at least a portion of light of infrared wavelengths.

[0305] (Example 302) The materials are mixed in the following proportions and filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce the composition of Example 302 (composition for forming an infrared-transmitting filter). Composition of Example 7: 36.99 parts by mass Pigment dispersion 1-1: 46.5 parts by mass Pigment dispersion 1-2: 37.1 parts by mass By evaluating the moisture resistance, heat resistance and storage stability of the composition of Example 302 in the same manner as in Example 7, the same effects as in Example 7 can be obtained. Furthermore, the film obtained using the composition of Example 302 can block light of visible wavelengths and transmit at least a portion of light of infrared wavelengths.

[0306] (Example 303) The materials were mixed in the following proportions and filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce the composition of Example 303 (composition for forming an infrared-transmitting filter). Composition of Example 10: 22.67 parts by mass Pigment dispersion 2-1: 51.23 parts by mass By evaluating the moisture resistance, heat resistance and storage stability of the composition of Example 303 in the same manner as in Example 10, the same effects as in Example 10 can be obtained. Furthermore, the film obtained using the composition of Example 303 can block light of visible wavelengths and transmit at least a portion of light of infrared wavelengths.

[0307] (Example 304) The materials were mixed in the following proportions and filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce the composition of Example 304 (composition for forming an infrared transmission filter). Composition of Example 14: 22.67 parts by mass Pigment dispersion 2-1: 51.23 parts by mass By evaluating the moisture resistance, heat resistance and storage stability of the composition of Example 304 in the same manner as in Example 14, the same effects as in Example 14 can be obtained. Furthermore, the film obtained using the composition of Example 304 can block light of visible wavelengths and transmit at least a portion of light of infrared wavelengths.

[0308] Pigment dispersion 1-1 is prepared by mixing and dispersing a mixture of the following compositions using 0.3 mm diameter zirconia beads in a bead mill (high-pressure disperser with vacuum mechanism NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.)) for 3 hours to prepare pigment dispersion 1-1. Mixed pigment of red pigment (C.I. Pigment Red 254) and yellow pigment (C.I. Pigment Yellow 139): 11.8 parts by mass Dispersant (Disperbyk-111, manufactured by BYK Chemie): 9.1 parts by mass Propylene glycol monomethyl ether acetate: 79.1 parts by mass

[0309] Pigment dispersion 1-2 is prepared by mixing and dispersing a mixture of the following compositions using 0.3 mm diameter zirconia beads in a bead mill (high-pressure disperser with vacuum mechanism NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.)) for 3 hours to prepare pigment dispersion 1-2. Mixed pigment consisting of blue pigment (C.I. Pigment Blue 15:6) and purple pigment (C.I. Pigment Violet 23): 12.6 parts by mass Dispersant (Disperbyk-111, manufactured by BYK Chemie): 2.0 parts by mass Resin G-3: 3.3 parts by mass Cyclohexanone: 31.2 parts by mass Propylene glycol monomethyl ether acetate: 50.9 parts by mass

[0310] Pigment dispersion 2-1 is prepared by mixing 60 parts by mass of C.I. Pigment Black 32, 20 parts by mass of C.I. Pigment Blue 15:6, 20 parts by mass of C.I. Pigment Yellow 139, 80 parts by mass of dispersant (Solspers 76500, manufactured by Nippon Lubrizol Co., Ltd., solid content concentration 50% by mass), 120 parts by mass of a solution containing resin G-3 (solid content concentration 35% by mass), and 700 parts by mass of propylene glycol monomethyl ether acetate, and dispersing using a paint shaker for 8 hours.

[0311] 110: Solid-state image sensor, 111: Infrared cut filter, 112: Color filter, 114: Infrared transmission filter, 115: Microlens, 116: Planarization layer

Claims

1. A composition comprising at least one compound A selected from a compound represented by formula (1), a compound represented by formula (2), and stereoisomers thereof, a curable compound, and a solvent; In the formula, A １ , A ２ , A １１ , A １２ , A ２１ , A ２２ , X １ , X ２ , X ２１ and X ２２ each independently represent a substituent, X １ and X ２ , X ２１ and X ２２ may be linked to each other to form a ring, R １ to R ８ , R １１ to R １８ , R ２１ to R ２８ each independently represent a hydrogen atom or a substituent, M １ and M ２ each independently represent a metal atom or a group represented by formula (M-1), and n represents an integer of 0 or more; In the formula, * represents a bond, and L １ represents a tetravalent linking group.

2. Said M １ and M ２ The composition according to claim 1, wherein the metal atom represented by is Zn, Co, or Ni.

3. Said L １ The composition according to claim 1, wherein the tetravalent linking group represented by is a group represented by formula (L1-1) or formula (L1-2); In the formula, the wavy line represents a bond, Ar Ｌ１ Ar Ｌ１１ and Ar Ｌ１２ Each of these independently represents an aromatic hydrocarbon group or an aromatic heterocyclic group, L １１ represents a single bond or a divalent linking group.

4. The composition according to any one of claims 1 to 3, further comprising at least one selected from an infrared absorber other than compound A and a chromatic coloring agent.

5. A film obtained using the composition described in any one of claims 1 to 3.

6. An optical filter having the film described in claim 5.

7. A solid-state image sensor having the film described in claim 5.

8. An image display device having the film described in claim 5.

9. An infrared sensor having the film described in claim 5.

10. A camera module having the film described in claim 5.

11. Compounds selected from the compounds represented by formula (1), the compounds represented by formula (2), and their stereoisomers; In the formula, A １ A ２ A １１ A １２ A ２１ A ２２ , X １ , X ２ , X ２１ and X ２２ Each of these independently represents a substituent, X １ and X ２ , X ２１ and X ２２ They may be connected to each other to form a ring, R １ ~R ８ , R １１ ~R １８ , R ２１ ~R ２８ Each of these independently represents a hydrogen atom or a substituent, M １ and M ２ Each of these independently represents a metal atom or a group represented by formula (M-1), and n represents a non-negative integer; In the formula, * represents a bond, L １ This represents a tetravalent linking group.

Images