Acidic cleaning solution for aluminum-based metallic material
The acidic cleaning solution with balanced inorganic acids, trivalent iron ions, and surfactants with specific cloud points addresses foaming issues, enabling efficient and cost-effective cleaning of aluminum-based metal materials.
WO2026141288A1PCT designated stage Publication Date: 2026-07-02NIPPON PAINT SURF CHEM CO LTD
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- NIPPON PAINT SURF CHEM CO LTD
- Filing Date
- 2025-12-22
- Publication Date
- 2026-07-02
AI Technical Summary
Technical Problem
Existing cleaning solutions for aluminum-based metal materials, particularly those containing surfactants, suffer from excessive foaming, making the cleaning process difficult and costly, especially when performed at low temperatures.
Method used
An acidic cleaning solution comprising specific ratios of inorganic acids, trivalent iron ions, and surfactants with varying cloud points, including polyoxyalkylene alkyl ethers, is used to achieve effective cleaning while suppressing foaming.
Benefits of technology
The solution effectively removes contaminants like aluminum oxides and oils while minimizing foaming, enhancing cleaning efficiency and reducing operational costs by allowing low-temperature processing.
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Abstract
The present invention addresses the problem of providing an acidic cleaning solution for an aluminum-based metallic material, the acidic cleaning solution being capable of suppressing foaming while achieving favorable cleaning properties. One embodiment for solving the aforementioned problem is an acidic cleaning solution for an aluminum-based metallic material that comprises 0.01-25 g / L of at least one inorganic acid selected from the group consisting of sulfuric acid, nitric acid, nitrous acid, and phosphoric acid; 0.05-4.0 g / L of trivalent iron ions; and 0.1-10 g / L of a surfactant, wherein the surfactant includes a surfactant A: a polyoxyalkylene alkyl ether having a cloud point of 80°C or more, a surfactant B: a polyoxyalkylene alkyl ether having a cloud point of 50-60°C, and a surfactant C: a polyoxyalkylene alkyl ether having a cloud point of 40°C or less, and wherein the cloud point is measured in accordance with JIS K 3211: 1990.
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