Devices configured to emit electric fields in presence of magnetic field suppression, technology configured to enable treatment of samples, including biological samples, using a combination of variable electric field generation and magnetic field suppression, and treatment of samples configured to facilitate enhanced behaviours and / or attributes, using such technology

Abstract

The present invention relates, in various embodiments, to technology, including devices and methods, configured to emit electric fields for the treatment of samples (for example including biological samples) via variable electric fields. Embodiments also relate to technology configured to enable treatment of a sample via a variable electric field in presence of magnetic field suppression. For example, in some embodiments the technology enables treatment of biological samples such as plant material and / or seeds.

Description

DEVICES CONFIGURED TO EMIT ELECTRIC FIELDS IN PRESENCE OF MAGNETIC FIELD SUPPRESSION, TECHNOLOGY CONFIGURED TO ENABLE TREATMENT OF SAMPLES, INCLUDING BIOLOGICAL SAMPLES, USING A COMBINATION OF VARIABLE ELECTRIC FIELD GENERATION AND MAGNETIC FIELD SUPPRESSION, AND TREATMENT OF SAMPLES CONFIGURED TO FACILITATE ENHANCED BEHAVIOURS AND / OR ATTRIBUTES, USING SUCH TECHNOLOGYFIELD OF THE INVENTION

[0001] The present invention relates, in various embodiments, to devices and methods configured to emit electric fields for the treatment of samples via variable electric fields, and to technology configured to enable treatment of a sample via a variable electric field in presence of magnetic field suppression. For example, in some embodiments the technology enables treatment of biological samples such as plant material and / or seeds. While some embodiments will be described herein with particular reference to those applications, it will be appreciated that the invention is not limited to such a field of use, and is applicable in broader contexts.BACKGROUND

[0002] Any discussion of the background art throughout the specification should in no way be considered as an admission that such art is widely known or forms part of common general knowledge in the field.

[0003] In the agriculture space, there is significant investment in research and development which seeks to improve the way in which plants grow and behave. For example, this includes genetic modification, chemical treatments, and the like, which may be applied to seeds and / or living plants to improve various specific objectives that may be relevant for a particular agricultural crop. Such objectives may include the likes of improving yield, plant size, flavour, leaf quality, resistance to environmental factors, and I or growth rate.SUMMARY OF THE INVENTION

[0004] It is an object of the present invention to overcome or ameliorate at least one of the disadvantages of the prior art, or to provide a useful alternative.

[0005] One example embodiment provides an emitter device including: a body; an elongate cavity defining formation within the body, the cavity defining formation including a sidewall which definesan elongate cavity, the cavity having at least one opening through the body defining a cavity output; an electric field generating component, wherein the electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output; and a magnetic field suppression arrangement, wherein the magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates.

[0006] One example embodiment provides a system configured to perform controlled treatment of a sample, the system including: a housing that provides a treatment zone in which the sample is positioned; and a mount configured to hold an emitter device, wherein the emitter device is configured to emit an electric field which propagates at least in a region between the device and the treatment zone thereby to induce effects in the treatment zone, wherein a magnetic field suppression arrangement is configured to suppress magnetic field in a region between the emitter and the treatment zone.

[0007] One example embodiment provides a method for applying controlled treatment to a sample, the method including: placing the biological material in a treatment zone; generating an electric field having defined attributes; inducing the electric field to affect the treatment zone; wherein magnetic fields effects are suppressed in a region through which the electric field propagates prior to reaching the treatment zone.

[0008] One example embodiment provides a method for applying controlled treatment to a sample, the method including: inducing an electric field in a region containing the sample in presence of magnetic field suppression.

[0009] One example embodiment provides an emitter device including: a body; an elongate cavity defining formation within the body, the cavity defining formation including a sidewall which defines an elongate cavity, the cavity having at least one opening through the body defining a cavity output; an electric field generating component, wherein the electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output; and a magnetic field suppression arrangement, wherein the magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates.

[0010] One example embodiment provides a system configured to perform controlled treatment of a sample, the system including: a housing that provides a treatment zone in which the sample is positioned; and a mount configured to hold an emitter device, wherein the emitter device is configured to emit an electric field which propagates at least in a region between the device and the treatmentzone thereby to induce effects in the treatment zone, wherein a magnetic field suppression arrangement is configured to suppress magnetic field in a region between the emitter and the treatment zone.

[0011] One example embodiment provides a method for applying controlled treatment to a sample, the method including: placing the biological material in a treatment zone; generating an electric field having defined attributes; inducing the electric field to affect the treatment zone; wherein magnetic fields effects are suppressed in a region through which the electric field propagates prior to reaching the treatment zone.

[0012] One example embodiment provides a method for applying controlled treatment to a sample, the method including: inducing an electric field in a region containing the sample in presence of magnetic field suppression.

[0013] One example embodiment provides an emitter device including: a body; an elongate cavity defining formation within the body, the cavity defining formation including a sidewall which defines an elongate cavity, the cavity having at least one opening through the body defining a cavity output; an electric field generating component, wherein the electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output; and a magnetic field suppression arrangement, wherein the magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates.

[0014] One example embodiment provides a system configured to perform controlled treatment of a sample, the system including: a housing that provides a treatment zone in which the sample is positioned; and a mount configured to hold an emitter device, wherein the emitter device is configured to emit an electric field which propagates at least in a region between the device and the treatment zone thereby to induce effects in the treatment zone, wherein a magnetic field suppression arrangement is configured to suppress magnetic field in a region between the emitter and the treatment zone.

[0015] One example embodiment provides a method for applying controlled treatment to a sample, the method including: placing the biological material in a treatment zone; generating an electric field having defined attributes; inducing the electric field to affect the treatment zone; wherein magnetic fields effects are suppressed in a region through which the electric field propagates prior to reaching the treatment zone.

[0016] One example embodiment provides a method for applying controlled treatment to a sample, the method including: inducing an electric field in a region containing the sample in presence of magnetic field suppression.

[0017] Further example embodiments include methods performed by systems, hardware and devices disclosed herein.

[0018] Further example embodiments include systems, devices and hardware configured to perform methods disclosed herein.

[0019] Further example embodiments are described below in the section entitled “claims”.BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Embodiments of the invention will now be described, byway of example only, with reference to the accompanying drawings in which:

[0021] FIG. 1A illustrates a system according to one embodiment.

[0022] FIG. 1 B to FIG. 1 H illustrate variations on the system of FIG. 1 A which are present in further embodiments.

[0023] FIG. 2A and FIG. 2B illustrate an emitter device according to one embodiment.

[0024] FIG. 3A to FIG. 3D illustrate a further emitter device according to an embodiment.

[0025] FIG. 4A to FIG. 4C illustrate a further emitter device according to an embodiment.

[0026] FIG. 4D illustrates a component for the device of FIG. 4A.

[0027] FIG. 5A and FIG. 5B illustrate a further emitter device according to an embodiment.

[0028] FIG. 6A and FIG. 6B illustrate a further emitter device according to an embodiment.

[0029] FIG. 7A and FIG. 7B illustrate a further emitter device.

[0030] FIG. 7C illustrates the emitter device of FIG. 7A in conjunction with an emitter holder unit.

[0031] FIG. 7D illustrates the emitter device of FIG. 7A in conjunction with an emitter holder unit and a charge distribution arrangement provided by a top plug.

[0032] FIG. 7E illustrates the emitter device of FIG. 7A in conjunction with an emitter holder unit and a charge distribution arrangement provided by a top plug, additionally in conjunction with a spacer member.

[0033] FIG. 7F illustrates the emitter device of FIG. 7A in conjunction with an emitter holder unit, a charge distribution arrangement provided by a top plug, a spacer member, and additionally in conjunction with a sample holder.

[0034] FIG. 7G provides a perspective view corresponding to FIG. 7E.

[0035] FIG. 7H provides an exploded perspective view corresponding to FIG. 7E.

[0036] FIG. 8A to FIG. 8D provide views of a plug device which acts as a charge distribution arrangement for the emitter device of FIG. 7D to 7H.

[0037] FIG 9 provides a view of the emitter holder unit also shown in FIG. 7C to 7H.

[0038] FIG. 10A and FIG. 10B illustrates the emitter device of FIG. 7A in conjunction with an emitter holder unit, a charge distribution arrangement provided by a top plug, a spacer member, and additionally in conjunction with a cuvette sample holder.

[0039] FIG. 10C and FIG. 10D show the cuvette sample holder of FIG. 10A and FIG. 10B.

[0040] FIG. 11A and FIG. 11 B illustrate an example sample container having a planar charge distribution member.

[0041] FIG. 12A and FIG. 12B illustrate an example sample container having a charge distribution member with protrusions.

[0042] FIG. 13A and FIG. 13B illustrate an example sample container having a charge distribution member shaped to provide peaks and troughs.

[0043] FIG. 14A and FIG. 14B illustrate an example arrangement including multiple emitter devices configured to influence a common target zone.

[0044] It should be noted that, whilst corresponding reference numerals have been used across the drawings, not all reference numerals have been included on all drawings forthe purposes of simplicity and clarity.DETAILED DESCRIPTION

[0045] The present invention relates, in various embodiments, to technology which facilitates the treatment of material, for example samples of biological and optionally non-biological composition, based on the generation of electric fields (for example variable electric fields) in combination with magnetic field suppression. For example, in some embodiments the technology enables treatment of biological samples such as plant material and / or seeds. While some embodiments will be described herein with particular reference to those applications, it will be appreciated that the invention is not limited to such a field of use, and is applicable in broader contexts. The invention includes embodiments relating to, for example: treatment methods and hardware (including but not limited to emitter devices) which facilitates such treatment methods.Overview of Technology

[0046] Technology described herein relates to the treatment of samples using electric fields, primarily variable electric fields. In particular, the technology relates to treatment methods and associated treatment hardware which enables the use of controlled variable electric fields to treat a sample, which may (for instance) be a biological sample. Examples of biological samples include seeds and plant material, bacteria and fungi. Experimental results gathered to date reveal advantageous results, for example in the context of encouraging enhancement of attributes I performance in relation to such seeds and plant material (some of which are provided further below). However, the technology described herein may have wider application, for example in the context of treating non-biological specimens.

[0047] In overview, the technology relates to treatment of a sample by way of an electric field which propagates through a region of space in which magnetic fields are suppressed. For example, embodiments may make use of an emitter device (for example a specialised form of antenna) which is configured to cause a variable electric field to propagate through a region of three-dimensional space, and cause effects to a treatment zone which contains the sample (or multiple distinct samples). This variable electric field propagates through a region in which hardware is configured to cause the suppression of magnetic fields. This region is disposed between the emitter device and the treatment zone in which the sample is contained. The suppression of magnetic fields allows for control over the direction and rate of emitted electrons forthe purpose of achieving electrochemical and / or biological interactions, as well as improving the efficiency of the emitter device to avoid dielectric breakdown and / or corona discharge.

[0048] An example embodiment includes a method for applying controlled treatment to a sample, the method including inducing an electric field in a region containing the sample in presence of magnetic field suppression. A further example embodiment includes applying a controlled treatment to a sample, the method including placing the sample in a treatment zone; generating an electric field having defined attributes; and inducing the electric field to affect the treatment zone. In this example embodiment magnetic fields effects are suppressed in a region through which the electric field propagates prior to reaching the treatment zone.

[0049] Example embodiments also include hardware configured to enable such treatments. For example, embodiments include systems or devices which enable inducing an electric field in a region containing the sample in presence of magnetic field suppression. Some such embodiments include a system configured to perform controlled treatment of a sample. Example systems including a housing that provides a treatment zone in which the sample is positioned. The housing may optionally comprise a chamber, which may in some cases be a resonant chamber in which the sample is positioned. The housing may optionally provide a plurality of distinct sub-housings, which may each define a distinct treatment sub-zone; and a mount configured to hold an emitter device, wherein the emitter device is configured to emit an electric field which propagates at least in a region between the device and the treatment zone thereby to induce effects in the treatment zone, wherein a magnetic field suppression arrangement is configured to suppress magnetic field in a region between the emitter and the treatment zone.

[0050] Although examples described herein focus on a single emitter device, there may be multiple emitter devices, including multiple emitter devices directed to influence a common treatment zone (and / or treatment sub-zone). For example, in some cases multiple emitter devices are directed towards a common target area from differing angles (for example opposed directions).

[0051] The emitter device technology described herein may have a wider range of uses than those currently contemplated, and various further arrangements / configurations may be used to enable treatment of various samples via such emitters. For example, arrangements including conveyors, multiple emitter devices, and the like are contemplated. The scope of the present disclosure should not be limited based on presently described configurations and / or usages of the described emitter device technology.

[0052] Hardware embodiments also include emitter devices (which are also referred to herein as antennae or antenna devices). In some embodiments such an emitter device includes a body, and an elongate cavity defining formation within the body. This cavity defining formation includes a sidewall which defines an elongate cavity inside the body, the cavity having at least one opening through the body defining a cavity output. An electric field generating component (for example adiode) is configured to selectively generate a variable electric field within the cavity. The cavity is configured, for example by way of materials and geometric attributes of the cavity, such that the variable electric field is emitted through the cavity output. The emitter device preferably includes a magnetic field suppression arrangement, this magnetic field suppression arrangement being configured to suppress magnetic field in a region through which the electric field propagates. In some embodiments the magnetic field suppression arrangement may be provided separately of the emitter device, with such an arrangement in essence providing a composite emitter device an emitter and separate magnetic field suppressor. In some embodiments the magnetic field suppression arrangement is formed integrally with the emitter device.

[0053] A number of embodiments and examples are described further below. It will be appreciated that the technology is not necessarily limited by reference to any specific details provided in these examples. However, it will be appreciated that various features from the separate examples may be combined to provide further embodiments.Terms and Terminology

[0054] The following terms and terminology are used herein, and warrant specific explanation and / or context.• Emitter device. This is used to describe a device that is configured to emit an electric field.The term “emit” is used primarily because the electric field originates from a component (for example a diode) that is contained within a partially enclosed space defined by the emitter device, such that the electric field propagates within that space and is “emitted” from that space via one or more openings. An emitter device may also be referred to as an antenna.• Propagation. Electric fields are induced in space, as opposed to being “directed” or the like (for example as would be the case with a laser or the like). However, given that the emitter devices described herein are in essence “directional”, in the sense that the electric field’s propagation is limited by characteristics of one or more openings provided by the emitter device, certain examples suggest that the electric field is emitted towards and / or propagates towards a treatment zone. Whilst such descriptions might deviate from strict technical accuracy, they enable useful high-level explanation of concepts I relationships between components.• Sample. The term “sample” is used to broadly describe any subject matter that is treated using technology disclosed herein. For example, this may be a biological sample (biological material) such as fungi, seeds, seedlings, plant material, bacteria; and other living / dead organisms in whole or in part. The technology is not intended limited by reference to specificexamples of samples. A sample may include a single item (for example one seed), a collection of items (for example a plurality of seeds), and where there is a collection of items that may optionally be homogenous or non-homogenous.• “Suppression” of magnetic fields. The term “suppression” does not require “perfect” or “absolute” suppression. Rather, the term is used to describe utilisation of active means to reduce unwanted magnetic fields in particular regions (i.e. causing a reduction relative to what would exist but for the active suppression means, for example attenuation).• Systems I device that are “configured to” perform functions. The use of “configured to” should not be read in a manner which requires a device to be actively performing a function. For example, a device configured to cause propagation of an electric field is still “configured to” cause propagation of an electric field regardless of whether it is in an active state in which a field is propagating or an inactive state in which no such field is propagating (for example when the device is inactive, including between manufacture and first use).

[0055] It should also be noted that reference throughout this specification to “one embodiment”, “some embodiments” or “an embodiment” means that a particular feature, structure or characteristic described in connection with the embodiment is included in at least one embodiment of the present invention. Thus, appearances of the phrases “in one embodiment”, “in some embodiments” or “in an embodiment” in various places throughout this specification are not necessarily all referring to the same embodiment, but may refer to one, many or all of the various embodiments. Furthermore, the particular features, structures or characteristics may be combined in any suitable manner, as would be apparent to one of ordinary skill in the art from this disclosure, in one or more embodiments.

[0056] As used herein, unless otherwise specified the use of the ordinal adjectives "first", "second", "third", etc., to describe a common object, merely indicate that different instances of like objects are being referred to, and are not intended to imply that the objects so described must be in a given sequence, either temporally, spatially, in ranking, or in any other manner.

[0057] In the claims below and the description herein, any one of the terms comprising, comprised of or which comprises is an open term that means including at least the elements / features that follow, but not excluding others. Thus, the term comprising, when used in the claims, should not be interpreted as being limitative to the means or elements or steps listed thereafter. For example, the scope of the expression a device comprising A and B should not be limited to devices consisting only of elements A and B. Any one of the terms including or which includes or that includes as used herein is also an open term that also means including at least the elements / features that follow the term, but not excluding others. Thus, including is synonymous with comprising.Example Treatment Systems

[0058] FIG. 1A illustrates an example treatment system 100, showing significant components / attributes. FIG. 1B to FIG. 1H provide further examples, and corresponding reference numerals have been used.

[0059] System 100 includes an emitter device 101 , which is configured to cause propagation of an electric field. In this example, emitter device 101 includes an opening (aperture) 120, and an electric field which originates from components within device 101 propagate beyond opening 120.

[0060] A treatment zone 102 is provided, and this treatment zone is located relative to emitter device 101 such that the electric field is enabled to treat (i.e. influence effect upon) a sample 103 that is contained within the treatment zone. The “treatment zone” 102 is in some cases notionally / functionally defined as a region in which a sample 103 is subject to being affected by way of operation of emitter 101.

[0061] In some embodiments the treatment zone is variable, for example subject to movement of emitter device 101 and / or other components which are configured to transport samples relative to emitter device 101 . Examples include: (i) the use of conveyors (such as conveyor belts and the like) which move samples relative to one or more emitter devices, such a given one or more emitter devices are able to treat different samples based on movement of the conveyor; (ii) mounting of one or more emitter devices on movable infrastructure thereby to allow those one or more emitter devices to target different samples. It will be appreciated that there are a wide range of possible configurations for implementation of the present technology in a manner which is scaled thereby to enable bulk treating of multiple samples in an automated or semi-automated manner; such technology would be understood by persons skilled in the relevant art (for example design of industrial processes).

[0062] In the example of FIG. 1 A, the treatment zone and sample are approximately axially aligned with emitter device 101 and the aperture 120 provided thereby. There is no requirement for perfect alignment; for instance in some embodiments (as described below) a distribution member, such as a charge distribution member, is used to allow the electric field provided via emitter device 101 to effect a treatment zone and samples positioned in a wider spatial area. In further embodiments there may be multiple emitter devices respectively interacting with one or more samples and / or one or more target zones (e.g. 1 :1 relationship or 1 :>1 relationship). Beyond that, in some embodiments one or more emitter devices are movable, thereby to alter a spatial relationship with respect to one or more target zones and / or samples.

[0063] A magnetic field suppression zone 104 is defined intermediate emitter device 101 and treatment zone 102 (and I or sample 103). The precise extent and geometric attributes of magnetic field suppression zone 104 may vary between embodiments; from a functional perspective, zone 104 includes at least a region defined in three-dimensional space that defines some or all of the space between emitter device 101 (or opening 120) and at least a portion of treatment zone 102. From a functional perspective, the purpose is for an electric field emitted from emitter 101 to have reduced I minimized I minimal influence from magnetic fields between the point of emission and a further point in space which is optionally defined by part of the treatment zone 102.

[0064] Field generation hardware 110 is operated thereby to cause operation of matter device 101 in a manner that results in inducting of an electric field having controlled attributes, preferably being a variable electric field (typically by providing a controlled current to emitter 101). For example, this may be achieved by setting a specific frequency, waveform, amplitude and duration on I off periods. A control system 111 is configured to control field generation hardware 110, for example based on instructions defined in computer executable code, via analogue / digital control signals, and the like. Some example embodiments make use of a ESP32 waveform generator (e.g. a waveform generator using a ESP32 microcontroller provided by Espressif Systems). Those skilled in the art should be familiar with ESP32 waveform generators, and their operation to generator various arbitrary waveforms. The field generation hardware may make use of a configuration / design based on what is disclosed, for example, in IEEE Transactions on Plasma Science (Volume: 51 , Issue: 2, February 2023) under “Fast and Flexible, Arbitrary Waveform, 20-kV, Solid-State, Impedance-Matched Marx Generator”. However, it will be appreciated that a wide range of hardware devices may be used to generate high-voltage pulses with controlled timing, shape, and high repetition rate. This may include variants of solid-state Marx generators, and other pulsed power architectures (such as pulse forming networks).

[0065] In the example of FIG. 1B, a sample container 104 is provided in treatment zone 102, and configured to hold sample 103. There may be multiple samples in a given container, or multiple containers having respective discrete samples. In some embodiments a single container is provided, this container having segregated compartments which each hold a respective sample.

[0066] In the example of FIG. 1C, sample container 106 contains a primer, for example a liquid in which sample 103 is located. Examples of primers which may be used include: distilled water; spring water; powders comprised of trace minerals; chelated liquid nutrient mixtures; fungal spores; crushed biologies; and / or agar.

[0067] The example of FIG. 1D illustrates a distribution member 130, for example a charge distribution member. The distribution member is preferably configured to enable charge associatedwith the variable electric field to be applied in respect of one or more samples which span an area that is greater than the area otherwise affected (or significantly effected) by the electric field.

[0068] In preferred embodiments, distribution member 130 is a charge distribution member formed of conductive materials. Examples of charge distribution members include:• A planar sheet of conductive material.• A planar sheet of conductive material having perforations formed therein.• A planar sheet of conductive material having perforations formed therein, and embossments I protrusions associated with formation of such perforations remaining intact.• A planar sheet of conductive material having embossments and I or other uneven formations formed on at least one surface thereof.• A planar sheet of conductive material formed to define peaks and troughs.• A sheet of conductive material formed to define fins and troughs between those fins.• A conductive netting material.• A sealed vessel containing powder or liquid that will change the properties of electrical charge provided.

[0069] It will be appreciated that other forms of distribution member may be used in further embodiments, for example based on the nature of sample, and / or the number / size / distribution of samples. A key consideration is to enhance the extent to which the electric field provided via emitter 101 affects the or each sample 103.

[0070] One or more distribution members may be used, for example:• In some embodiments a single charge distribution member is provided between the emitter device and a plurality of samples. In such examples, the charge distribution member is typically a planar member which is disposed in a plane substantially normal relative to the central axis of the emitter device (defined relative to opening 120), thereby to assist in distributing charge from a single emitter device over a broader area in that plane in which a plurality of samples 103 are located, for example as shown in FIG. 1E (which shows samples 103 labelled as 103a-103c). FIG. 1F additionally shows a container 106 with fluid 121holding multiple samples, whereas FIG 1G shows multiple containers 106 (labelled as 106a- 106c) with a single charge distribution member.• In some embodiments multiple distribution members are provided, each respectively between the emitter device and one or more samples, for example as shown in FIG. 1 H. In some embodiments a container includes a plurality of compartments each configured to hold a respective sample and a respective charge distribution member.

[0071] FIG. 11A and FIG. 11B illustrate an example sample container having a charge distribution member with protrusions. This sample container includes a plurality of separate sub-zones, which for example may each be used to hold a quantity of seeds (or another material that is to be treated vis the emitter device). For example, this may be a plastic container having an integral or inserted array of walls which define separate sub-zones in which samples (such as seeds) are able to be segregated. In this example a single common planar charge distribution member provides a base for the plurality of sub-zones. In the example of FIG. 12A and FIG. 12B, the charge distribution member includes a plurality of protrusions on its upper surface. In the example of FIG. 13A and FIG.13B the charge distribution member is shaped to provide peaks and troughs. Other similar configurations may be used, including other configurations where a charge distribution member provides increased surface area with which a sample (such as seeds) could be in contact and / or close proximity. A range of other configurations could be used, including fins, perforations, corrugations, and the like.

[0072] It should be noted that a charge distribution member is not in all cases required. Furthermore, in some embodiments, for example as described further below, a charge distribution arrangement is provided by or proximal the emitter device, thereby to more evenly distribute charge before it reaches a sample container. Such a charge distribution arrangement may negate the need for a charge distribution member at or proximal a treatment zone, and I or be used in conjunction with such a charge distribution member.

[0073] It is stressed that the sample containers shown in FIG. 11A to FIG. 13B are examples only. Whilst this shows a box style arrangement with segregation zones, a wide range of other means may be employed to hold a sample or samples. This may include the likes of: vats, bioreactors, tubs, plates, jars, tubes, conveyors, cuvettes and other objects capable of holding / maintaining a sample for treatment using an emitter as described herein.Example Emitter Devices

[0074] The present specification describes a particular category of emitter device which has been identified as being suitable for use with systems such as those in FIG. 1 A to FIG. 1 H. However:• On one hand, the systems of FIG. 1A to FIG. 1H may operate with emitter devices other than those described herein (and / or variants thereof).• On the other emitter devices of the type described herein (and / or variants thereof) may fins application with other treatment systems having drastically different characteristics to those shown in FIG. 1A to FIG. 1H.

[0075] That is, system embodiments and emitter embodiments described herein, whilst described in a context where they are intended to operate in conjunction, may take on entirely separate and independent inventive aspects / attributes. The emitter devices described herein may optionally be referred to as “electric field emitter devices”.

[0076] FIG. 2A and FIG. 2B illustrates a first example embodiment in the form of an emitter device 200, which illustrates various relevant features which are present in a range of emitter devices according to various embodiments. In broad terms, emitter device 200 is configured to cause propagation of an electric field (for example a variable electric field) through a region of three-dimensional space, whilst simultaneously causing magnetic field suppression in that same region of three-dimensional space.

[0077] It should be noted that there need not be a precise correspondence between the region in which the electric field propagates and the region in which magnetic fields are suppressed. Either may be defined by and / or include a subregion of the other. For example, there may be regions in which the electric field propagates which are not subjected to magnetic field suppression. From a functional perspective, the purpose of magnetic field suppression is to optimise for electron emission stability and density for electric field propagation between the electric field emitter device and a treatment zone and / or sample.

[0078] Example emitter device 200 includes a body having an elongate cavity defining formation within the body. This cavity defining formation includes a sidewall which defines an elongate cavity 230 within the body. That is, the emitter device includes an elongate internal space. As discussed below, this space is bounded by insulating (e.g. dielectric) materials.

[0079] The cavity has at least one opening through the body defining a cavity output I opening 202. The elongate body defines an axis for elongate cavity 230, and cavity output I opening 202 is preferably defined as an opening in a plane normal to the axis of the body / cavity. The opening may span the entire region defined by an upper edge of the sidewall; alternately a partial top cap may be used to provide a cavity output of comparatively reduced dimensions. Preferably, the elongate cavity is open at one end, and otherwise substantially sealed.

[0080] In the example of FIG. 2A / 2B, the cavity is defined by a substantially cylindrical sidewall 231 and a base wall 232. Whilst a cylindrical sidewall is shown, other sidewall shapes may be used, for example including truncated cones and alternate shapes. Sidewall shapes that are irregular along the axis of the sidewall may be used. Base wall 232 preferably has a concave internal surface. As context, the internal shape and configuration of cavity 230 is preferably defined thereby to minimise potential for “standing waves” in electric fields which propagate within the cavity. This may include avoiding angular corners and other artefacts that may result in problematic reflections.

[0081] The body and / or sidewall is preferably formed from insulating materials such as dielectric materials, for example high density polyvinyl chloride (PVC) or the like. In an example embodiment the body may be formed from one or more lengths of conventional high density PVC pipe, provided that the thickness of the pipe is suitable.

[0082] Whilst the present examples focus on the use of PVC pipe as a dielectric, a wide range of other approaches may be used, for example: other solid dielectric materials (such as polymers, polyethylene, cross-linked polyethylene, polypropylene, polytetrafluoroethylene, polyimide (Kapton), polyester (mylar)), ceramics (such as alumina, barium titanate, titanium dioxide, and zirconia), glass and glass-based materials (such as borosilicate glass, fused silica, and glass-epoxy), natural I traditional solids (such as mica, paper, silicone and rubber), liquid dielectric materials (for example various oils and deionized water), and in some cases various gaseous dielectric materials.

[0083] In the example of FIG. 2A I 2B, the body includes an upper body portion 201 having a sidewall thickness of X, and a lower body portion 203 having a sidewall thickness of Y, wherein Y>X, and preferably Y>2X or (for instance Y=2X). A base closure region 204 has a thickness of Z, wherein Z>X, and preferably Z>2X (for instance Z=2X). Having a thicker sidewall material at the base of the cavity assists in encouraging propagation of the electric field externally of the emitter device via opening 202.

[0084] Emitter 200 includes an electric field generating component. This electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output. In the example of FIG. 2A / 2B, the electric field generating component is defined by a diode 210 which includes a diode proximal end 211 which is coupled (directly or indirectly) to field generation hardware (optionally field generation hardware 110 of FIG 1A to FIG. 1H), and a diode distal end 212 which extends through the base region 204 and into cavity 230. Example diodes suitable for this purpose include silicon diodes (durable, slow electron emission) or germanium diodes (for fast electron emission). As an alternative to using a diode, the electric field generating component may include Field Emission Tips (tungsten or molybdenum), carbon nanotubes (CNTs) or graphite electrodes.

[0085] With diode 210 installed, base region 204 seals the lower end of cavity 230, although this need not be a perfect (e.g. airtight) seal. In some embodiments a cap / lid member is used to assist in the mounting of diode 210 with respect to base region 204.

[0086] Emitter 200 additionally includes a magnetic field suppression arrangement. The magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates, notably a region outside cavity 230 beyond opening 202 (for example zone 104 in the context of FIG. 1 A to FIG. 1H). In essence, this allows for propagation of the electric field emitter by emitter device 200 to propagate in space where there is suppressed (e.g. minimised) magnetic field effects, for example magnetic field effects associated with the electric field.

[0087] In the example of FIG. 2A 12B, the magnetic field suppression arrangement is provided by a conductor that is coiled around the axis of cavity 230. For instance, the conductor is wound around an external face of the upper sidewall. A conductor of this nature is illustrated in FIG. 2A I 2B and referred to as coil 220.

[0088] Coil 220 is copper conductor, preferably with an insulating laminate (e.g. enamelled) coating allowing for adjacent turns of the coil to contact one another (thereby to reduce electromagnetic complications arising from a gap between adjacent turns). Coil 220 preferably includes at least three turns, and in a preferred embodiment has five turns. However, it will be appreciated how this may be tuned based on desired magnetic field suppression properties. In a further preferred embodiment an external surface of the emitter device includes formations which are configured to receive and secure in place coil 220.

[0089] The separation between coil 220 and opening 202 of cavity 230 is preferably a distance of less than 5mm, preferably less than 2.5mm, and in preferred embodiments about 1mm. Alternately I additionally, the separation between coil 220 and the terminal lip of the sidewall that defines cavity 230 is preferably a distance of less than 5mm, preferably less than 2.5mm, and in preferred embodiments about 1 mm.

[0090] Coil 220 includes a proximal end 221 which is connected to a source of current, for example field generation hardware (optionally field generation hardware 110 of FIG 1A to FIG. 1 H), with the current through the coil providing the relevant magnetic field suppression functionality. Coil 220 has a distal end 223 which, in this example, extends into cavity 230 via an aperture 222 formed through the sidewall. The separation between aperture 222 and opening 202 of cavity 230 is preferably a distance of less than 5mm, preferably less than 2.5mm, and in preferred embodiments about 1mm. Alternately / additionally, the separation between aperture 222 and the terminal lip of the sidewall thatdefines cavity 220 is preferably a distance of less than 5mm, preferably less than 2.5mm, and in preferred embodiments about 1mm.

[0091] In a preferred embodiment, coil 220 is connected to the same field generation hardware as diode 210, and provided with the same current in synchronous manner. However, a range of alternate approaches may be present, including (but not limited to) embodiments where:• Coil 220 is connected to the same field generation hardware as diode 210, and provided with the same current in non-synchronous manner, for example out of phase or with a controlled time delay. This offers the capability of oscillating electric fields around the coil, potentially modulating the emission or altering the field shape leading to control over spatial electron emission, enabling targeted field shaping or pulsation effects.• Coil 220 is connected to the same field generation hardware 110 as diode 210, and provided with a corresponding by non-identical current in synchronous manner. This creates a uniform field interaction, effectively amplifying or shaping the electric field at the opening, thereby maximising field uniformity, reducing hotspots or field distortions to improve emission consistency and stability.• Coil 220 is connected to the same field generation hardware as diode 210, and provided with a different current. This allows for fine-tuning of field gradients, useful for precise electron or particle steering.• Coil 220 is not connected to the same field generation hardware as diode 210, and provided with the same current in synchronous manner. This allows greater control over the coil without affecting the diode’s operation, ideal for scenarios where independent modulation of field parameters is needed.• Coil 220 is not connected to the same field generation hardware as diode 210, and provided with the same current in non-synchronous manner, for example out of phase or with a controlled time delay. This allows for independent operation of the coil, introducing field variations that can disrupt or complement the diode’s output to enables complex field dynamics, such as interference patterns or multi-frequency field interactions• Coil 220 is not connected to the same field generation hardware as diode 210, and provided with a corresponding by non-identical current in synchronous manner. This allows for a combination of increased complex field dynamic capabilities not hindered by limitations imposed by the diode.• Coil 220 is not connected to the same field generation hardware as diode 210, and provided with a different current. This allows the coil’s parameters to operate entirely independent of the diode, offering maximum flexibility in field design leading to customisable field profiles for advanced applications, such as focusing, deflection, or specialised field shaping.

[0092] Preferably attributes of the winding of the coil are tuned relative to attributes of the sidewall, including but not limited to dielectric properties, physical attributes and operating conditions.

[0093] When charge is applied by application of current to diode 210 and coil 220, an electric field is induced which propagates within cavity 230 and beyond cavity 230 via opening 202. This electric field propagates in a region of three-dimensional space that includes a region generally axially extending from opening 202. The effect of coil 220 is to suppress magnetic fields in a magnetic field suppression zone that includes at least a part of that region of space. Overall, the functional objective is for propagation of the electric field to reach a treatment zone (for example a charge distribution member provided in or at the boundary of that treatment zone) with the treated sample (e.g. biological sample) to have minimal influence from magnetic fields that may complicate the delivery of specific bioelectric and electrochemical interactions. The emitter is preferably designed in such a way as to not require a positive and negative plane to be placed on either side of the treatment zone, therefore avoiding wholesale polarisation and reorientation from the target’s current location to the location of a plane.

[0094] Various characteristics / attributes of emitter 200 are defined in a conjunctive manner thereby to tune emitter 200 for defined attributes, for instance tuning for maximum utilisation of dielectric properties of the ideal / body whilst keeping power very low, and peaking at desired resonant frequencies. These characteristics / attributes include the following:• The length of cavity 230.• The diameter of cavity 230.• The thickness of the cavity sidewall (for example the thickness in region 201 and the relatively greater thickness in region 203).• The thickness of base region 204.• The shape of base region 204.• The curvature of the connection at the interface of the sidewall and base (defining the shape of that region of the cavity).• The length of coil 220.• The number of turns of coil 220.• The length of diode leg 212 that extend into cavity 230.• The rating of diode 210.• The angle of the terminal point of end of diode leg 212 of diode 210.

[0095] Some example devices with preferable dimensions are described below by reference to additional drawings. It should be noted that these dimensions are provided an examples only, and these are not intended to be limiting on the scope of further embodiments. Furthermore, not all reference numerals are provided on all drawings for the sake of clarity.

[0096] FIG. 3A-3D illustrate an emitter device 300, which makes use of a simple construction approach whereby upper body potion 201 is defined by a length of primary PVC pipe 302 of 55mm, and lower body potion 204 is defined by the combination of that PVC pipe and a secondary PVC pipe 301 of 25mm which is circumferentially mounted over primary PVC pipe 302 thereby to provide a relatively thicker lower body portion 204 (for example 2mm sidewall diameter are used for primary and secondary PVC pipes 301 and 302, thereby defining an upper body sidewall thickness of 2mm and a lower body region sidewall thickness of 4mm. A convex domed based of maximum thickness of 3mm is used to seal cavity 230 at base region 204.

[0097] Primary PVC pipe 302 has an internal diameter of 23mm and an external diameter of 27mm. Secondary PVC pipe 301 has an internal diameter of 27mm and an external diameter of 29mm. A key dimension for emitter device 300 is a distance of 45mm between the terminal end of diode 210 within cavity 230 and the opening 202 of cavity 230. Conductive coil 220 is defined by five turns of laminated 1mm copper wire, with adjacent turns contacting one another.

[0098] FIG. 4A / 4B / 4C illustrate a more complex configuration for an emitter device, in the form of emitter device 400. It will be appreciated that various features shown in the context of device 400 may be applied in the context of a device having a complexity between of device 300 and device 400 (i.e. only a subset of enhanced features of device 400 are present).

[0099] In this embodiment, the body is in essence formed from two coaxial cylinders, which are held together by a plurality of interconnecting webs (optionally manufactured as two halves and fused together). A radially inner cylinder defines upper body portion 201 and lower body portion 203, and a radially outer cylinder 401 has a sidewall which provides protection (complete or partial) to theradially inner cylinder. The webs interconnecting the inner and outer cylinders result in a plurality of air pockets 411 , some of which are sealed. The outer cylinder functionally provides a shroud which protects conductor coil 220 from being accidentally touched.[000100] In this example, conductor coil 220 is wound on a coil receiving member 420 (or guide assembly), which is circumferentially mounted onto upper body portion 201 . As best shown in FIG. 4D, member 420 includes recessed circumferential formations in its outer surface which are configured to receive and maintain the material of coil 220 in a manner which defines and secures coil 220. Preferably, coil 220 is formed onto member 420, and then member 420 mounted (e.g. using adhesive) to upper body portion 220. As with previous examples, an aperture 222 is formed in upper body potion 201 , and the distal end 223 of coil 220 extends through aperture 222. The relative positioning of aperture 222 to opening 202 is preferably about 1mm.[000101] In this example, upper body portion 201 and lower body portion 203 are integrally formed, with the interface between these potions being defined by an increase in sidewall thickness (for example a doubling, in this example from 2mm to 4mm). Base region 204 is domed, and of the same thickness as lower body portion 203.[000102] Outer cylinder 410 is sealed at one end by an outer base member 412. Outer base member 412 is connected to base region 204 by a web which defines an aperture though which diode 210 extends. A plug member 430 is also partially inserted into that aperture to assist in holding diode 210 securely in place.[000103] FIG. 5A and FIG. 5B illustrate a further embodiment in the form of an emitter 500 with several additional features that are not present in FIG. 4A / 4B / 4C. These are:• A longitudinal alignment notch 522 formed in an eternal surface of outer cylinder 410 along which an extension 520 of coil 220 is secured.• A lateral alignment notch 521 formed in a collar I stopper 540 which circumferentially protrudes from the external surface of cylinder 410, which redirects extension 520 outwardly to distal and 525.• A cover member 530 which is circumferentially mounted over outer cylinder 410 so as to abut with collar I stopper 540, thereby to provide protection to the conductor of coil 220 including extension 520.[000104] FIG. 6A and FIG. 6B illustrate a further embodiment in the form of an emitter 600 which builds on the embodiment of FIG. 5A / 5B by adding an arrangement which allows cavity 230to be filled with gases and / or liquids. This comprises an insert 601 which is coupled to a feed tube 602 through which a source of gas is supplied, and an end cap 603 which provides an opening 604 of reduced diameter relative to opening 202 (which is made redundant by the installation of end cap 603), with this reduced diameter allowing for pressure inside cavity 230 to be increased (e.g. as a result of adding gas). It will be appreciated that feed tube 602 may also be used to extract gas from cavity 230.[000105] FIG. 7A and FIG. 7B illustrate a further emitter device 700, which includes similar features to examples described further above. The following drawings show emitter device 700 in conjunction with additional components.• FIG. 7C illustrates emitter device 700 in conjunction with an emitter holder unit 701 . This emitter holder unit provides a casing to protect emitter device 7A. Emitter holder unit 701 is shown in more detail in FIG. 9.• FIG. 7D illustrates emitter device 700in conjunction with emitter holder unit 701 and a charge distribution arrangement provided by a top plug 702. Plug 702 is described in greater detail further below.• FIG. 7E illustrates emitter device 700 in conjunction with emitter holder 701 , the charge distribution arrangement provided by top plug 702, and additionally in conjunction with a spacer member 703. This spacer member is used to provide a physical measure of distance and / or position of emitter device 700 and a sample container or the like. It will be appreciated that there is significance in controlling a correct / desired degree of separation of an emitter and target, and in that regard the use of a physical spacer is useful in practice. However, of course alternate means could be employed to precisely control separation, for example a rig that is coupled (directly or indirectly) both to the emitter and to a treatment chamber (or sample, or other location in respect of which controlled separation is being managed). FIG.7G provides a perspective view corresponding to FIG. 7E. FIG. 7H provides an exploded perspective view corresponding to FIG. 7E.• FIG. 7F illustrates emitter device 700 in conjunction with emitter holder unit 701 , the charge distribution arrangement provided by top plug 702, spacer member 703, and additionally in conjunction with a sample holder 704, which is preferably formed from glass. Spacer member 703 is configured to interface with both the sample holder and the emitter device (and / or container unit) thereby to set a defined spatial relationship between the emitter device and a sample that is contained in the sample holder.• FIG. 10A and FIG. 10B illustrates the emitter device of FIG. 7A in conjunction with an emitter holder unit, a charge distribution arrangement provided by a top plug, a spacer member, and additionally in conjunction with a cuvette sample holder 1000. FIG. 10C and FIG. 10D show the cuvette sample holder 1000. A cuvette sample holder is optionally used where relevant for a given sample type / size.• FIG. 14A and FIG. 14B illustrate an example arrangement including multiple emitter devices configured to influence a common target zone. This is shown in conjunction with a cuvette holder as per FIG. 10A 1 10B, but it will be appreciated that a wide range of configurations may be adopted using multiple emitter devices directed towards a common treatment zone.[000106] It will be appreciated that the modular arrangement conveyed by these drawings may be extended to allow a given emitter device configuration to be used in a wide range of implementation environments.Emiter-Side Charge Distribution Arrangements[000107] In some embodiments, a charge distribution arrangement is provided by or proximal the emitter device. For example, in some cases the charge distribution arrangement is positioned proximal (e.g. at, over, or inside) the opening of the emitter device.[000108] In preferred embodiments, a purpose of the charge distribution arrangement is to more evenly distribute spatial distribution of electrons which leave the emitter device, thereby resulting in a more even distribution at the target zone. This assists in avoiding / mitigating “hot spots” in the target zone which are subjected to increased electron activity as a result of the electric field propagation. Various forms of charge distribution arrangement can be used to achieve such evening out of distribution, for example arrangements which result in a more even distribution for the spatial distribution of electrons which leave the emitter device across the surface area of a plane defined by the opening. It will be appreciated that this approach can be used to control both distribution and velocity of electrons which exit the emitter device.[000109] The charge distribution arrangement preferably is a container which holds a charge distribution material, and those skilled in the art will recognise a range of suitable materials. By way of example, various crystalline materials may be used, for example cyclosilicates and / or materials with a perovskite structure (such as strontium titanate, calcium titanate, lead titanate, bismuth, tourmaline, lanthanum ytterbium oxide, silicate perovskite, lanthanum manganite and others). Such charge distribution materials are preferably used in a powdered form within the charge distribution arrangement, for example with a particle / g ra in size of less than about 5-10 microns.[000110] As an example of a charge distribution arrangement, the embodiments of FIG. 7D to 7H show where the emitter device includes a charge distribution arrangement in the form of a top plug 702, which is a hollow component formed from a material, which may or may not be a dielectric material. PVC, PLA or other plastics may be used. This top plus is inserted into the cavity opening, and contains the charge distribution material within its hollow interior. The plug has a central conical region which in essence acts as a wave guide thereby to increase effectiveness of charge distribution. The angle of inflection of the conical region is preferably selected for optimal tuning of the system relative to properties of the emitter (e.g. cavity diameter, cavity length, sidewall thickness, etc). Testing has indicated potential to achieve high (e.g. 99%+) evenness in lateral charge distribution (i.e. relative to a plane defined by the emitter opening).[000111] The use of a charge distribution arrangement at the emitter side can mitigate the need for a charge distribution arrangement at the target side, although in some cased both are used. A benefit of a charge distribution arrangement as described above using a crystalline material is reduction / avoidance of magnetic field effects which can result from conductive charge distribution members.Example Use Cases[000112] Significant experimentation has been conducted using technology based on that described above. For example, this has included substantial experimentation by which seedlings of a range of species were treated (hundreds of experimental runs, across over 100,000 seedlings. There have been several notable discoveries in electrochemical reactions, and biological effects leading to an understanding that there is a frequency and amplitude interaction effect with early seedling development and phenotypical trait expression including root length, root shape, shoot length, leaf size, nodule size, hypocotyl length, cotyledon length, stem thickness, and other phenotypical expressions. Experiments have also been conducted on fungi, yeast and bacteria with increases in biomass and changes to cell behaviours.Experimental Example 1[000113] An emitter device based on the configuration of FIG 3A was used to treat canola seeds. The canola seed was filtered to 2.4mm diameterwith a tolerance of 0.2mm before submerging in a treatment chamber made of borosilicate glass containing 100mL of distilled water and a woven mesh copper charge distribution member at the base. The canola seed was able to make direct contact with the copper charge distribution member in this embodiment. The treatment chamber was placed on top of a secondary charge distribution arrangement resembling a fully enclosed plug (e.g. similar to plug 702) containing a powdered material specifically containing aluminium, boron, magnesium, lithium and potassium as well as other trace elements. Alternate charge distributionmaterials may have alternately been used. The distance between the seeds and the emitting diode was no greater than 65mm. The total voltage recorded at the point of emission was 63kkV however, in air, the total voltage was no greater than 2000V / m at the copper mesh distribution member. The arbitrary waveform generator was set to provide a specific shape waveform (however less pronounced effects can be observed with a primitive sine waveform) at a proprietary frequency that is expected to increase shoot length with the total power draw of 7.4W from the hardware during treatment. The treatment lasted 20 minutes with an asynchronous period electric field density that was asynchronously being delivered to the emitter device’s diode and magnetic suppression coil (offset by approximately 100nS to the coil). An equal number of seeds were subjected to identical conditions however without the apparatus being activated. Within an hour of treatment, seeds were sown into coir pods and placed into a climate-controlled chamber for 12 days at 20C with no light. One the 12th day the hypocotyl and cotyledon was cut from the point of emergence then measured and weighed individually. There was a statistically significant increase in hypocotyl length (>15%), hypocotyl width (>30%), wet weight (>15%) and dry biomass (>10%) comparing the treated seeds to the control seeds. This experiment was repeated 3+ times yielding statistically significant positive results.Experimental Example 2[000114] An emitter device based on the configuration of FIG 3A was used to treat pak choi seeds. The pak choi seed was submerged in a treatment chamber made of borosilicate glass containing 10OmL of distilled water. The pak choi seed made no direct contact with a copper charge distribution member in this embodiment. The treatment chamber was placed on top of a charge distribution arrangement resembling a fully enclosed plug containing powdered rare earth minerals (e.g. similar to plug 702). The distance between the seeds and the emitting diode was no greater than 65mm. The total voltage recorded at the point of emission was 63kkV however, in air, the total voltage was no greater than 1800V / m at the base of the charge distribution member. The arbitrary waveform generator was set to provide a specific shape waveform (however less pronounced effects can be observed with a primitive sine waveform) at a proprietary frequency that is expected to increase leaf size with the total power draw of 7.4W from the hardware during treatment. The treatment lasted 18 minutes with an asynchronous period electric field density that was synchronously being delivered to the emitter device’s diode and magnetic suppression coil. An equal number of seeds were subjected to identical conditions however without the apparatus being activated. Within 24 hours of treatment, the seeds were dried, placed into blind batch groupings, and sent to a commercial hydroponic growing facility. Within 14 days from treatment, seeds were sown then grow out for 28 days under typical outdoor conditions for late Spring in Brisbane, Queensland Australia. On the 28th day all the edible portion of the pak choi was harvested following commercial harvesting practices and each head weighed individually. Every effort was made to avoid introducing harvest related factors that may affect measurements. There was a statistically significant increasein edible yield (>20%) when comparing the treated seeds to the control seeds. This experiment was repeated 3+ times yielding statistically significant positive resultsExperimental Example 3[000115] An emitter device based on the configuration of FIG 3A was used to treat amino acids in solution. Samples in a quartz crystal spectrophotometry cuvette (12x12.5x45mm) at 21 °C were positioned 120mm from the emitting diode on a riser (such as spacer 703), above a charge distribution member containing powdered rare earth minerals (such as plug 702). Treatment utilised 63kV at emission (1800V / m at chamber surface) with an 8W proprietary frequency and waveform protocol for 10 minutes, delivering asynchronous fields to the diode and magnetic suppression coil. Analysis was completed within 10 minutes using spectrophotometry and evaporation tests against controls. The treatment significantly influenced amino acid behaviour (particularly in the amino acids; tyrosine and lysine). Spectrophotometry results demonstrated over 30% increase in absorption over the range of 200 nm up to 300 nm. These molecular changes may offer practical applications in the production of biologies. Altered enzymatic reaction rates and improved electron transport chains could contribute to greater metabolic efficiency and support increased agricultural yields. In biologies manufacturing, improved substrate binding and transition state stabilisation can enhance enzymatic efficiency and contribute to process stability. It would be reasonable to extend this discovery to confirm if further alterations such as enhanced n-electron delocalisation, altered aromatic ring currents, improvements to charge-transfer complexes, altered hydroxyl group orientations, and increased protein-protein interaction specificity can be achieved. In membrane systems, the results suggest frequency dependent interaction effects of the treatment however it would be reasonable to extend this discovery to confirm if enhanced ion channel gating, strengthened lipid-protein coupling, and reorganised membrane domains are occurring and contributing to improved functional dynamics along with any possible alterations to proton exchange rates catalysing critical metabolic pathways. By precisely controlling field parameters, this technology offers a promising approach to inducing targeted molecular modifications. It has the potential to enhance reaction efficiencies and streamline biologies production processes, which could reduce production costs and enable the development of compounds that are challenging to achieve with traditional methods.Experimental Example 4[000116] An emitter device based on the configuration of FIG 3A was used to treat Saccharomyces cerevisiae (S. cerevisiae) and Yarrowia lipolytica (Y. lipolytica) yeast strains. The yeast samples were prepared with standardised inoculum doses of 1x10A5 CFU / g of substrate. They were treated with a proprietary formula of frequency and duration with 40 kV supplied to the emitter and the suppression coil asynchronously. After treatment, samples were incubated at 30°C for 48 hours in two different media formulations. The first was a nitrogen-limited, high-carbohydrate mediumcontaining NaCI (154 mM), yeast extract (2.0 g / L), and glucose (50 g / L). The second was Yeast Extract Peptone Dextrose (YEPD) media, consisting of Bacto peptone (20 g / L), yeast extract (10 g / L), and glucose (20 g / L) each yeast strain was treated with two treatments across the two media formulations. Growth was quantified using colony forming unit concentrations (CFU / mL), biomass accumulation (mg / mL) and sugar reduction (Amg / mL) The treatment showed significant effects on growth, sugar reduction and biomass production in both yeast strains. In YEPD media, treated S. cerevisiae achieved a logarithmic increase in cell density (CFU / mL) of 4.07 and biomass increase of 3.25 mg / mL (+log 2.06 CFU / mL ,+ 0.05 mg / mL compared to control), while Y. lipolytica showed a log increase of 5.54 and biomass increase of 8.96 mg / mL compared to the sample at TO. The study demonstrated that the treatment of S. cerevisiae in a nutrient rich media promotes biomass accumulation and sugar reduction during fermentation compared to the control. This has significant commercial applications in the fermentation and biotechnology industries. By significantly enhancing yeast growth and biomass production, the treatment could improve the efficiency of processes such as bioethanol production, microbial protein synthesis, and high-value metabolite synthesis. The ability to optimise growth conditions in nutrient-rich media (like YEPD) demonstrates the potential of this technology as a scalable intervention for industries requiring high-yield microbial cultures.Conclusions and Interpretation[000117] The above technology provides significant advantages in a variety of contexts, in particular (but not limited to) the treatment of biological (and / or non-biological) samples in a manner that produces advantageous effects (for instance biologic and / or electrochemical effects). This in some embodiments is applied for the purposes of altering trait expression of biologies with low input wattages that can be scaled to treat a wide range of species. It should be appreciated that the technology can be scaled without increasing input wattage to achieve an even distribution over a wide distribution area, and has both biologic and electrochemical effects that are not limited to living organisms.[000118] Although specific embodiments of the present invention have been described, it will be understood by those of skill in the art that there are other embodiments that are equivalent to the described embodiments. Accordingly, it is to be understood that the invention is not to be limited by the specific illustrated embodiments, but only by the scope of the appended claims.[000119] It should be appreciated that in the above description of exemplary embodiments of the invention, various features of the invention are sometimes grouped together in a single embodiment, FIG., or description thereof for the purpose of streamlining the disclosure and aiding in the understanding of one or more of the various inventive aspects. This method of disclosure, however, is not to be interpreted as reflecting an intention that the claimed invention requires morefeatures than are expressly recited in each claim. Rather, as the following claims reflect, inventive aspects lie in less than all features of a single foregoing disclosed embodiment. Thus, the claims following the Detailed Description are hereby expressly incorporated into this Detailed Description, with each claim standing on its own as a separate embodiment of this invention.[000120] Furthermore, while some embodiments described herein include some but not other features included in other embodiments, combinations of features of different embodiments are meant to be within the scope of the invention, and form different embodiments, as would be understood by those skilled in the art. For example, in the following claims, any of the claimed embodiments can be used in any combination.[000121] Furthermore, some of the embodiments are described herein as a method or combination of elements of a method that can be implemented by a processor of a computer system or by other means of carrying out the function. Thus, a processor with the necessary instructions for carrying out such a method or element of a method forms a means for carrying out the method or element of a method. Furthermore, an element described herein of an apparatus embodiment is an example of a means for carrying out the function performed by the element for the purpose of carrying out the invention.[000122] In the description provided herein, numerous specific details are set forth. However, it is understood that embodiments of the invention may be practiced without these specific details. In other instances, well-known methods, structures and techniques have not been shown in detail in order not to obscure an understanding of this description.[000123] Similarly, it is to be noticed that the term coupled, when used in the claims, should not be interpreted as being limited to direct connections only. The terms "coupled" and "connected," along with their derivatives, may be used. It should be understood that these terms are not intended as synonyms for each other. Thus, the scope of the expression a device A coupled to a device B should not be limited to devices or systems wherein an output of device A is directly connected to an input of device B. It means that there exists a path between an output of A and an input of B which may be a path including other devices or means. "Coupled" may mean that two or more elements are either in direct physical or electrical contact, or that two or more elements are not in direct contact with each other but yet still co-operate or interact with each other.[000124] Thus, while there has been described what are believed to be the preferred embodiments of the invention, those skilled in the art will recognise that other and further modifications may be made thereto without departing from the spirit of the invention, and it is intended to claim all such changes and modifications as falling within the scope of the invention. For example,any formulas given above are merely representative of procedures that may be used. Functionality may be added or deleted from the block diagrams and operations may be interchanged among functional blocks. Steps may be added or deleted to methods described within the scope of the present invention.Statements of Embodiments of the Invention[000125] The following statements provide characterisations of embodiments of the invention which may form a basis for claims.[000126] The following statements relate to devices configured to emit electric fields in presence of magnetic field suppression, including such devices configured to facilitate treatment of samples, including biological samples.1. An emitter device including:a body;an elongate cavity defining formation within the body, the cavity defining formation including a sidewall which defines an elongate cavity, the cavity having at least one opening through the body defining a cavity output;an electric field generating component, wherein the electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output; anda magnetic field suppression arrangement, wherein the magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates.2. A device according to statement 1 wherein the electric field is a variable electric field.3. A device according to statement 1 wherein the electric field is a variable electric field having attributes defined by an electric field generation control system.4. A device according to statement 1 wherein cavity sidewall is formed of insulating material.5. A device according to statement 1 wherein the cavity sidewall is at least partially formed from a material having dielectric properties.6. A device according to statement 1 wherein the sidewall is substantially cylindrical.7. A device according to statement 1 wherein the opening is an axial opening relative to the sidewall.A device according to statement 1 wherein the opening is defined at a distal end of the cavity defining formation.A device according to statement 1 wherein the cavity is sealed at the proximal end of the cavity defining formation.A device according to statement 1 wherein the magnetic field suppression agent includes a conductor wound around the axis of the cavity.A device according to statement 10 wherein the conductor is wound proximal the distal end of the cavity.A device according to statement 11 wherein attributes of the winding of the conductor are tuned relative to attributes of the sidewall.A device according to statement 10 wherein the conductor is formed of a laminated wire, wherein adjacent windings of the conductor contact one another.A device according to statement 10 including an outer sheath which at least partially outwardly conceals the conductor.A device according to statement 10 wherein the conductor has a distal end that extends to the cavity through an aperture formed in the sidewall.A device according to statement 10 wherein the conductor and the electric field generating component are connected to a common source of current.A device according to statement 16 wherein the common source of current provides a synchronised supply to the conductor and the electric field generating component.A device according to statement 1 wherein the device is configured to cause propagation of the electric field through the cavity region into an external propagation zone, and wherein the magnetic field suppression arrangement is configured to suppress magnetic field in the external propagation zone.A device according to statement 1 wherein the cavity region has spatial attributes configured to minimise standing waves in the variable electric field.A device according to statement 1 wherein the cavity has a base wall having a concave surface.A device according to any preceding statement wherein the device includes a charge distribution arrangement.A device according to statement 21 wherein the charge distribution arrangement is positioned proximal the opening.A device according to statement 21 wherein the charge distribution arrangement is configured to more evenly distribute spatial distribution of electrons which leave the emitter device.A device according to statement 21 wherein the charge distribution arrangement is configured to more evenly distribute spatial distribution of electrons which leave the emitter device across the surface area of a plane defined by the opening.A device according to statement 21 wherein the charge distribution arrangement includes a charge distribution material.A device according to statement 25 wherein the charge distribution material includes a crystalline material.A device according to statement 25 wherein the charge distribution material includes a crystalline material in particulate form.A device according to statement 25 wherein the charge distribution material includes a crystalline material in particulate form with average grain size of less than 10 microns.A device according to statement 25 wherein the charge distribution material includes a crystalline with a perovskite structure.A device according to statement 25 wherein the charge distribution material includes a cyclosilicate material.A device according to statement 25 wherein the charge distribution is housed in a housing having a conical region which extends into the cavity.32. A device according to statement 25 wherein the charge distribution material includes a cyclosilicate material.[000127] The following statements relate to treatment of samples, including biological samples, configured to facilitate enhanced behaviours and / or attributes, using a combination of electric field generation and magnetic field suppression.1. A method for applying controlled treatment to a sample, the method including:placing the biological material in a treatment zone;generating an electric field having defined attributes;inducing the electric field to affect the treatment zone;wherein magnetic fields effects are suppressed in a region through which the electric field propagates prior to reaching the treatment zone.2. A method according to statement 1 wherein the sample includes biological material.3. A method according to statement 1 wherein the sample includes one or more seeds.4. A method according to statement 1 wherein the sample includes one or more living plant specimens.5. A method according to any preceding statement wherein the step of generating the electric field having defined attributes includes operating an emitter device that includes:a body;an elongate cavity defining formation within the body, the cavity defining formation including a sidewall which defines an elongate cavity, the cavity having at least one opening through the body defining a cavity output;an electric field generating component, wherein the electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output; anda magnetic field suppression arrangement, wherein the magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates.6. A method according to statement 5 wherein the electric field is a variable electric field.A method according to statement 5 wherein the electric field is a variable electric field having attributes defined by an electric field generation control system.A method according to statement 5 wherein cavity sidewall is formed of insulating material.A method according to statement 5 wherein the cavity sidewall is at least partially formed from a material having dielectric properties.A method according to statement 5 wherein the sidewall is substantially cylindrical.A method according to statement 5 wherein the opening is an axial opening relative to the sidewall.A method according to statement 5 wherein the opening is defined at a distal end of the cavity defining formation.A method according to statement 5 wherein the cavity is sealed at the proximal end of the cavity defining formation.A method according to statement 5 wherein the magnetic field suppression agent includes a conductor wound around the axis of the cavity.A method according to statement 14 wherein the conductor is wound proximal the distal end of the cavity.A method according to statement 15 wherein attributes of the winding of the conductor are tuned relative to attributes of the sidewall.A method according to statement 14 wherein the conductor is formed of a laminated wire, wherein adjacent windings of the conductor contact one another.A method according to statement 14 including an outer sheath which at least partially outwardly conceals the conductor.A method according to statement 14 wherein the conductor has a distal end that extends to the cavity through an aperture formed in the sidewall.A method according to statement 19 wherein the conductor and the electric field generating component are connected to a common source of current.A method according to statement 20 wherein the common source of current provides a synchronised supply to the conductor and the electric field generating component.A method according to statement 5 wherein the device is configured to cause propagation of the electric field through the cavity region into an external propagation zone, and wherein the magnetic field suppression arrangement is configured to suppress magnetic field in the external propagation zone.A method according to statement 5 wherein the cavity region has spatial attributes configured to minimise standing waves in the variable electric field.A method according to statement 5 wherein the cavity has a base wall having a concave surface.A method according to statement 5 wherein the device includes a charge distribution arrangement.A method according to statement 25 wherein the charge distribution arrangement is positioned proximal the opening.A method according to statement 25 wherein the charge distribution arrangement is configured to more evenly distribute spatial distribution of electrons which leave the emitter device.A method according to statement 25 wherein the charge distribution arrangement is configured to more evenly distribute spatial distribution of electrons which leave the emitter device across the surface area of a plane defined by the opening.A method according to statement 25 wherein the charge distribution arrangement includes a charge distribution material.A method according to statement 29 wherein the charge distribution material includes a crystalline material.A method according to statement 29 wherein the charge distribution material includes a crystalline material in particulate form.A method according to statement 29 wherein the charge distribution material includes a crystalline material in particulate form with average grain size of less than 10 microns.A method according to statement 29 wherein the charge distribution material includes a crystalline with a perovskite structure.A method according to statement 29 wherein the charge distribution material includes a cyclosilicate material.A method according to statement 29 wherein the charge distribution is housed in a housing having a conical region which extends into the cavity.A method according to statement 29 wherein the charge distribution material includes a cyclosilicate material.A method for applying controlled treatment to a sample, the method including:inducing an electric field in a region containing the sample in presence of magnetic field suppression.A method according to statement 37 wherein the sample includes biological material.A method according to statement 37 wherein the sample includes one or more seeds.A method according to statement 37 wherein the sample includes one or more living plant specimens.A method according to statement 37 wherein the step of generating the electric field having defined attributes includes operating an emitter device that includes:a body;an elongate cavity defining formation within the body, the cavity defining formation including a sidewall which defines an elongate cavity, the cavity having at least one opening through the body defining a cavity output;an electric field generating component, wherein the electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output; anda magnetic field suppression arrangement, wherein the magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates.A method according to statement 37 wherein the electric field is a variable electric field.A method according to statement 37 wherein the electric field is a variable electric field having attributes defined by an electric field generation control system.A method according to statement 37 wherein cavity sidewall is formed of insulating material.A method according to statement 37 wherein the cavity sidewall is at least partially formed from a material having dielectric properties.A method according to statement 37 wherein the sidewall is substantially cylindrical.A method according to statement 37 wherein the opening is an axial opening relative to the sidewall.A method according to statement 37 wherein the opening is defined at a distal end of the cavity defining formation.A method according to statement 37 wherein the cavity is sealed at the proximal end of the cavity defining formation.A method according to statement 37 wherein the magnetic field suppression agent includes a conductor wound around the axis of the cavity.A method according to statement 50 wherein the conductor is wound proximal the distal end of the cavity.A method according to statement 51 wherein attributes of the winding of the conductor are tuned relative to attributes of the sidewall.A method according to statement 50 wherein the conductor is formed of a laminated wire, wherein adjacent windings of the conductor contact one another.A method according to statement 50 including an outer sheath which at least partially outwardly conceals the conductor.A method according to statement 50 wherein the conductor has a distal end that extends to the cavity through an aperture formed in the sidewall.A method according to statement 55 wherein the conductor and the electric field generating component are connected to a common source of current.A method according to statement 56 wherein the common source of current provides a synchronised supply to the conductor and the electric field generating component.A method according to statement 57 wherein the device is configured to cause propagation of the electric field through the cavity region into an external propagation zone, and wherein the magnetic field suppression arrangement is configured to suppress magnetic field in the external propagation zone.A method according to statement 57 wherein the cavity region has spatial attributes configured to minimise standing waves in the variable electric field.A method according to statement 57 wherein the cavity has a base wall having a concave surface.A method according to statement 37 wherein the device includes a charge distribution arrangement.A method according to statement 61 wherein the charge distribution arrangement is positioned proximal the opening.A method according to statement 61 wherein the charge distribution arrangement is configured to more evenly distribute spatial distribution of electrons which leave the emitter device.A method according to statement 61 wherein the charge distribution arrangement is configured to more evenly distribute spatial distribution of electrons which leave the emitter device across the surface area of a plane defined by the opening.A method according to statement 64 wherein the charge distribution arrangement includes a charge distribution material.A method according to statement 65 wherein the charge distribution material includes a crystalline material.A method according to statement 65 wherein the charge distribution material includes a crystalline material in particulate form.A method according to statement 68 wherein the charge distribution material includes a crystalline material in particulate form with average grain size of less than 10 microns. A method according to statement 68 wherein the charge distribution material includes a crystalline with a perovskite structure.A method according to statement 68 wherein the charge distribution material includes a cyclosilicate material.A method according to statement 68 wherein the charge distribution is housed in a housing having a conical region which extends into the cavity.72. A method according to statement 68 wherein the charge distribution material includes a cyclosilicate material.73. A system configured to perform a method according to any preceding statement.[000128] The following statements relate to technology configured to enable treatment of samples, including biological samples, using a combination of variable electric field generation and magnetic field suppression.1. A system configured to perform controlled treatment of a sample, the system including: a housing that provides a treatment zone in which the sample is positioned; anda mount configured to hold an emitter device, wherein the emitter device is configured to emit an electric field which propagates at least in a region between the device and the treatment zone thereby to induce effects in the treatment zone, wherein a magnetic field suppression arrangement is configured to suppress magnetic field in a region between the emitter and the treatment zone.2. A system according to statement 1 wherein the sample includes a biological material.3. A system according to statement 1 wherein the magnetic field suppression arrangement is provided by the emitter device.4. A system according to statement 1 wherein the housing is configured to hold a priming agent through which the electric field propagates.5. A system according to statement 1 wherein the biological material is contained within the priming agent.6. A system according to statement 1 wherein the system includes a charge distribution member positioned intermediate the biological material and the emitter device.7. A system according to statement 1 wherein the charge distribution member includes a conductive surface.8. A system according to statement 1 wherein the charge distribution member includes a conductive surface having an irregular surface9. A system according to statement 1 wherein the charge distribution member includes a conductive surface having perforations formed therein.A system according to statement 1 wherein the charge distribution member includes a conductive surface having embossments formed thereon.A system according to statement 1 wherein the charge distribution member includes a conductive mesh.A system according to statement 1 wherein the emitter device is configured to emit the electric field in an axial direction that is perpendicular to a surface of the charge distribution member.A system according to statement 1 wherein the electric field is a variable electric field.A system according to statement 1 wherein the electric field is a variable electric field having attributes defined by an electric field generation control system.A system according to statement 1 wherein the magnetic field suppression arrangement includes a conductive coil.A system according to statement 15 wherein the magnetic field suppression arrangement includes a conductive coil that is coupled to an electric field generation control system.A system according to statement 1 wherein the emitter device includes an insulated elongate cavity having an axial opening at one end, wherein a diode is configured to discharge at an opposite end of the elongate cavity.A system according to any preceding statement wherein emitter device includes:a body;an elongate cavity defining formation within the body, the cavity defining formation including a sidewall which defines an elongate cavity, the cavity having at least one opening through the body defining a cavity output;an electric field generating component, wherein the electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output; anda magnetic field suppression arrangement, wherein the magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates.A system according to statement 18 wherein the electric field is a variable electric field.A system according to statement 18 wherein the electric field is a variable electric field having attributes defined by an electric field generation control system.A system according to statement 18 wherein cavity sidewall is formed of insulating material.A system according to statement 18 wherein the cavity sidewall is at least partially formed from a material having dielectric properties.A system according to statement 18 wherein the sidewall is substantially cylindrical.A system according to statement 18 wherein the opening is an axial opening relative to the sidewall.A system according to statement 18 wherein the opening is defined at a distal end of the cavity defining formation.A system according to statement 18 wherein the cavity is sealed at the proximal end of the cavity defining formation.A system according to statement 18 wherein the magnetic field suppression agent includes a conductor wound around the axis of the cavity.A system according to statement 27 wherein the conductor is wound proximal the distal end of the cavity.A system according to statement 28 wherein attributes of the winding of the conductor are tuned relative to attributes of the sidewall.A system according to statement 27 wherein the conductor is formed of a laminated wire, wherein adjacent windings of the conductor contact one another.A system according to statement 27 including an outer sheath which at least partially outwardly conceals the conductor.A system according to statement 27 wherein the conductor has a distal end that extends to the cavity through an aperture formed in the sidewall.A system according to statement 27 wherein the conductor and the electric field generating component are connected to a common source of current.A system according to statement 33 wherein the common source of current provides a synchronised supply to the conductor and the electric field generating component.A system according to statement 18 wherein the device is configured to cause propagation of the electric field through the cavity region into an external propagation zone, and wherein the magnetic field suppression arrangement is configured to suppress magnetic field in the external propagation zone.A system according to statement 18 wherein the cavity region has spatial attributes configured to minimise standing waves in the variable electric field.A system according to statement 18 wherein the cavity has a base wall having a concave surface.A system according to statement 18 wherein the device includes a charge distribution arrangement.A system according to statement 38 wherein the charge distribution arrangement is positioned proximal the opening.A system according to statement 38 wherein the charge distribution arrangement is configured to more evenly distribute spatial distribution of electrons which leave the emitter device.A system according to statement 38 wherein the charge distribution arrangement is configured to more evenly distribute spatial distribution of electrons which leave the emitter device across the surface area of a plane defined by the opening.A system according to statement 38 wherein the charge distribution arrangement includes a charge distribution material.A system according to statement 42 wherein the charge distribution material includes a crystalline material.A system according to statement 42 wherein the charge distribution material includes a crystalline material in particulate form.A system according to statement 42 wherein the charge distribution material includes a crystalline material in particulate form with average grain size of less than 10 microns.A system according to statement 42 wherein the charge distribution material includes a crystalline with a perovskite structure.A system according to statement 42 wherein the charge distribution material includes a cyclosilicate material.A system according to statement 42 wherein the charge distribution is housed in a housing having a conical region which extends into the cavity.A system according to statement 42 wherein the charge distribution material includes a cyclosilicate material.A method of treating a sample including operation of a system according to any preceding statement.

Claims

CLAIMS1 . An emitter device including:a body;an elongate cavity defining formation within the body, the cavity defining formation including a sidewall which defines an elongate cavity, the cavity having at least one opening through the body defining a cavity output;an electric field generating component, wherein the electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output; anda magnetic field suppression arrangement, wherein the magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates.

2. A device according to claim 1 wherein the electric field is a variable electric field.

3. A device according to any preceding claim wherein the cavity sidewall is at least partially formed from a material having dielectric properties.

4. A device according to any preceding claim wherein the sidewall is substantially cylindrical.

5. A device according to any preceding claim wherein the magnetic field suppression agent includes a conductor wound around the axis of the cavity.

6. A device according to any preceding claim wherein the device is configured to cause propagation of the electric field through the cavity region into an external propagation zone, and wherein the magnetic field suppression arrangement is configured to suppress magnetic field in the external propagation zone.

7. A device according to any preceding claim wherein the cavity region has spatial attributes configured to minimise standing waves in the variable electric field.

8. A device according to any preceding claim wherein the cavity has a base wall having a concave surface.

9. A device according to any preceding claim wherein the device includes a charge distribution arrangement positioned proximal the opening configured to more evenly distribute spatial distribution of electrons which leave the emitter device.

10. A system configured to perform controlled treatment of a sample, the system including: a housing that provides a treatment zone in which the sample is positioned; anda mount configured to hold an emitter device, wherein the emitter device is configured to emit an electric field which propagates at least in a region between the device and the treatment zone thereby to induce effects in the treatment zone, wherein a magnetic field suppression arrangement is configured to suppress magnetic field in a region between the emitter and the treatment zone.

11. A system configured to perform controlled treatment of a sample, the system including:a housing that provides a treatment zone in which the sample is positioned; and a mount configured to hold an emitter device, wherein the emitter device is configured to emit an electric field which propagates at least in a region between the device and the treatment zone thereby to induce effects in the treatment zone, wherein a magnetic field suppression arrangement is configured to suppress magnetic field in a region between the emitter and the treatment zone.

12. A system according to claim 11 wherein the sample includes a biological material.

13. A system according to claim 11 wherein the magnetic field suppression arrangement is provided by the emitter device.

14. A system according to claim 11 wherein the system includes a charge distribution member positioned intermediate the biological material and the emitter device.

15. A system according to claim 14 wherein the charge distribution member includes a conductive surface having an irregular surface.

16. A system according to any one of claims 11 to 15 wherein emitter device includes:a body;an elongate cavity defining formation within the body, the cavity defining formation including a sidewall which defines an elongate cavity, the cavity having at least one opening through the body defining a cavity output;an electric field generating component, wherein the electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output; anda magnetic field suppression arrangement, wherein the magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates.

17. A method for applying controlled treatment to a sample, the method including:placing the biological material in a treatment zone;generating an electric field having defined attributes;inducing the electric field to affect the treatment zone;wherein magnetic fields effects are suppressed in a region through which the electric field propagates prior to reaching the treatment zone.

18. A method according to claim 17 wherein the sample includes biological material.

19. A method according to claim 17 wherein the step of generating the electric field having defined attributes includes operating an emitter device that includes:a body;an elongate cavity defining formation within the body, the cavity defining formation including a sidewall which defines an elongate cavity, the cavity having at least one opening through the body defining a cavity output;an electric field generating component, wherein the electric field generating component is configured to selectively generate a variable electric field within the cavity such that the variable electric field is emitted through the cavity output; anda magnetic field suppression arrangement, wherein the magnetic field suppression arrangement is configured to suppress magnetic field in a region through which the electric field propagates.

20. A method according to claim 19 wherein the electric field is a variable electric field.

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