A magnetically actuated lock fixes substrate holding members without contact passages, reducing solution buildup and easing cleaning.
Distributed clampers with lock and semi-lock claws hold large thin substrates flat for double-sided electroplating while limiting solution retention.
Vertical wafer modules replace long linear baths to cut tool footprint while preserving maintenance access and parallel electrochemical processing.
A support structure enables seed-layer-free copper electroplating on solar cells, reducing wafer breakage, masking steps, and silver use.
A substrate holder seal ring with a specific opening diameter ratio controls electric field density during electroplating.
Segmented wafer holders with inflatable clamping resolve assembly time versus reliability trade-offs while maximizing treatable surface area.
A membrane-less anode chamber forces electrolyte flow through a composite meshed anode to enhance oxidation and irrigation.
Segmentation and dynamics principles enable a single holder to switch between single-side and double-side plating by attaching a non-conductive dummy substrate.
A plating chuck cover plate shields the notch area electric field to prevent excessive metal deposition on adjacent patterned regions.
A substrate holder uses a rigid positioning member driven by a mechanical actuator to center semiconductor wafers.