Wandering star wheel for grinding double surfaces of quartz plate

Abstract

The wandering star wheel comprises a body, the body is provided with a liquid flowing hole and a space ring hole, a space ring is arranged in the space ring hole, the space ring is provided with a fixing hole used for containing the quartz plate, and the outer edge of the space ring is provided with a fixing protrusion to abut against the opening edge of the space ring hole. The space ring hole is round so that the space ring can rotate relative to the body, and a rubber strip is arranged on the opening edge of the fixing hole so as to abut against the quartz plate. According to the wandering star wheel for grinding the double faces of the quartz plate, smooth circulation of liquid is guaranteed through the liquid flowing holes, and the stable machining environment is maintained; the circular space ring hole allows the space ring to rotate relatively, the quartz plate is promoted to rotate automatically, and the surface uniformity and precision are improved; fixing protrusions on the outer edges of the space rings reduce friction and increase the autorotation speed; the rubber strip at the edge of the fixing hole provides buffering, vibration and impact are reduced, the defect occurrence rate is reduced, and the product yield is remarkably improved.

Description

Technical Field

[0001] The invention belongs to the field of quartz plate processing, and in particular relates to a planetary wheel for double-sided grinding of a quartz plate. Background Art

[0002] In recent years, with the rapid development of the semiconductor industry, especially the rising demand and output of domestic semiconductor components, the technical requirements for high-precision quartz plates and optical quartz plates used as semiconductor substrates have also been increasing. In this context, the requirements for quartz plate processing technology, especially double-sided grinding and polishing technology, have become more stringent.

[0003] Traditionally, the planetary wheel used for double-sided grinding and polishing of quartz plates is mainly to place the quartz plate to be processed by directly opening a hole slightly larger than the product size on the planetary wheel body through a milling machine. This design is intended to increase the number and efficiency of products processed in a single time. However, when faced with quartz plates that require higher precision processing, this method has some limitations:

[0004] Since the quartz plate is in direct contact with the planetary wheel, the edge of the quartz plate is prone to chipping during processing, which places high demands on the precision and stability of the grinding equipment. In addition, in the traditional double-sided grinding and polishing process, the quartz plate can only revolve but cannot rotate, which may cause over-grinding or over-polishing of local areas, thereby reducing the overall processing accuracy of the product. Summary of the invention

[0005] The present application provides a planetary wheel for double-sided grinding of a quartz plate, so as to solve the problem of chipping at the edge of the quartz plate caused by direct contact between the quartz plate and the planetary wheel in traditional double-sided grinding and polishing of a quartz plate, as well as the problem of over-grinding or over-polishing of a local area of ​​the quartz plate and low overall processing accuracy caused by the quartz plate only being able to revolve but not to rotate.

[0006] The technical solution adopted in this application is:

[0007] A planetary wheel for double-sided grinding of a quartz plate, the planetary wheel comprising a main body, the main body being provided with a liquid flow hole and a spacer hole, a spacer being provided in the spacer hole, the spacer being provided with a fixing hole for accommodating the quartz plate, a fixing protrusion being provided on the outer edge of the spacer to abut against the edge of the spacer hole, the spacer hole being circular so that the spacer can rotate relative to the main body, and a rubber strip being provided on the edge of the fixing hole to abut against the quartz plate.

[0008] The planetary wheel for double-sided grinding of quartz plates of the present application also has the following additional technical features:

[0009] The outer edge of the spacer is provided with a plurality of fixing protrusions facing the edge of the spacer hole. The plurality of fixing protrusions are evenly arranged along the outer edge of the spacer, and the fixing protrusions abut against the edge of the spacer hole.

[0010] A plurality of rubber strips are arranged at the edge of the fixing hole, the rubber strips are raised relative to the edge of the fixing hole, the rubber strips are in contact with the quartz plate, and the plurality of rubber strips surround the quartz plate.

[0011] The rubber strip is provided with a crest and a trough on the side abutting against the quartz plate, the crest and the trough are arranged at intervals, the crest is convex relative to the trough, and the crest abuts against the quartz plate.

[0012] The edge of the fixing hole is provided with a plurality of grooves, and the rubber strips are arranged in at least some of the grooves.

[0013] The body is provided with a liquid flow hole, and the liquid flow hole is arranged at the center of the body, and / or,

[0014] The body is provided with a plurality of the liquid flow holes, the plurality of the liquid flow holes are arranged around the axis of the body, and at least one liquid flow hole is arranged between adjacent spacer holes.

[0015] The planetary wheel is provided with a plurality of the spacer holes, the distances between the plurality of the spacer holes and the axis of the planetary wheel are equal, and the plurality of the spacer holes are evenly arranged around the axis of the planetary wheel.

[0016] A lower fixed plate is arranged at the lower side of the body, and a supporting protrusion is provided on the lower side surface of the body so as to form a liquid gap between the planetary wheel and the lower fixed plate, and the liquid gap is communicated with the liquid flow hole.

[0017] A plurality of the supporting protrusions surround the axis of the body, and at least one supporting protrusion is disposed between adjacent spacer holes.

[0018] The supporting protrusion has an arc-shaped transition surface, and the arc-shaped transition surface abuts against the lower fixed plate.

[0019] Due to the adoption of the above technical solution, the beneficial effects achieved by this application are as follows:

[0020] 1. The planetary wheel for double-sided grinding of quartz plates provided by the present invention has a flow hole on the planetary wheel body, which ensures that the grinding liquid and the polishing liquid can flow smoothly between the upper and lower plates. This improvement is conducive to maintaining a stable processing environment, ensuring the consistency of the removal efficiency of the upper and lower surfaces, and further improving the processing quality.

[0021] In addition, the spacer hole is circular so that the spacer can rotate relative to the body. Since the spacer hole is designed to be circular, the spacer can rotate relatively in the planetary wheel body. This ensures that the quartz plate placed in the fixed hole can not only revolve with the planetary wheel, but also achieve a certain degree of rotation. This dual movement method helps to prevent excessive grinding or polishing of local areas of the quartz plate, thereby improving the surface uniformity and precision after processing. Moreover, the outer edge of the spacer is provided with a fixed protrusion to abut against the edge of the spacer hole. The fixed protrusion reduces the contact area between the spacer and the body, and can reduce the friction between the spacer and the body during the grinding and polishing process, thereby increasing the rotation speed during product processing.

[0022] A rubber strip is arranged along the fixed hole to abut against the quartz plate. The rubber material has good buffering performance, which can effectively reduce the vibration and impact force of the quartz plate during processing, reduce the probability of defects such as edge collapse and cracks, and thus improve the product yield.

[0023] 2. As a preferred embodiment of the present invention, the outer edge of the spacer is provided with a plurality of fixed protrusions facing the edge of the spacer hole, and the plurality of fixed protrusions are evenly arranged along the outer edge of the spacer, and the fixed protrusions abut against the edge of the spacer hole. By evenly arranging a plurality of fixed protrusions on the outer edge of the spacer, this design not only ensures a firm connection between the spacer and the planetary wheel body, but also prevents displacement or shaking during processing, thereby significantly improving the stability of the system. At the same time, the fixed protrusions reduce the total contact area and only contact at specific points, effectively reducing friction and wear problems, promoting the smooth rotation of the spacer, and thus enhancing the rotation of the quartz plate.

[0024] In addition, this design allows the pressure to be evenly distributed to each support point, avoiding deformation or damage caused by local overpressure and extending the service life of the components. Since the fixed protrusion only occupies part of the contact surface, the remaining part forms a gap that is conducive to the circulation of grinding and polishing liquids, optimizing the liquid flow path, ensuring cooling and lubrication effects, and improving processing efficiency and quality.

[0025] The evenly distributed fixing protrusions make the spacer easy to install, and the best assembly position can be found by slight rotation, reducing the circumferential positioning operation required for the spacer installation. The replacement of spacers of different specifications also becomes quick and easy, increasing the flexibility and adaptability of the equipment.

[0026] 3. As a preferred embodiment of the present invention, the rubber strip is provided with a crest and a trough on the side abutting the quartz plate, the crest and the trough are arranged at intervals, the crest is convex relative to the trough, and the crest abuts the quartz plate. By providing the crest on the rubber strip, not only the good elasticity and buffering performance of the rubber material itself are fully utilized, but also these characteristics are further enhanced. The crest can effectively absorb the vibration energy brought by the external impact, play a role of buffering protection, and prevent the quartz plate from being damaged by hard collision. At the same time, the crest is distributed on the entire rubber strip, so that the pressure applied to the quartz plate can be evenly dispersed, ensuring the stable position of the quartz plate during the processing, and avoiding the deformation or stress concentration caused by excessive local pressure. In addition, the design of the crest increases the friction between the rubber strip and the quartz plate, effectively preventing the quartz plate from sliding unnecessarily during the processing, which is crucial to maintaining the correct posture of the quartz plate during double-sided grinding and polishing, thereby significantly improving the processing accuracy and product quality.

[0027] In addition, due to the presence of the wave crests and troughs, tiny channels are formed between the rubber strip and the quartz plate. These channels facilitate the circulation of grinding and polishing liquids, ensuring that the liquids can evenly cover the surface of the quartz plate, improving processing efficiency and ensuring the consistency of removal of the upper and lower surfaces.

[0028] At the same time, the design of the crest and trough allows the rubber strip to adjust its shape within a certain range to adapt to quartz plates of different thicknesses or specifications. This flexibility allows the same planetary wheel to be used for processing multiple types of quartz plates, increasing the versatility and economy of the equipment.

[0029] 4. As a preferred embodiment of the present invention, the edge of the fixing hole is provided with a plurality of grooves, and the rubber strip is provided in at least part of the grooves. The presence of the grooves provides a clear installation position for the rubber strip, ensuring that the rubber strip can be accurately fixed at a predetermined position. This not only simplifies the assembly process, but also ensures that the rubber strip will not be easily displaced during use, thereby improving the accuracy and stability of the placement of the quartz plate. Moreover, after the rubber strip is embedded in the groove, the contact between the quartz plate and the body is closer, increasing the friction. This effectively prevents the quartz plate from sliding during the processing process, ensures its correct posture during double-sided grinding and polishing, thereby improving the processing accuracy.

[0030] In addition, the design of multiple grooves allows the rubber strips to be evenly distributed at multiple points, thereby dispersing the pressure applied to the quartz plate. This avoids deformation or stress concentration caused by excessive local pressure and ensures the flatness and consistency of the quartz plate throughout the entire processing process.

[0031] 5. As a preferred embodiment of the present invention, the body is provided with a liquid flow hole, and the liquid flow hole is arranged at the center of the body. The liquid flow hole at the center ensures that the grinding liquid and the polishing liquid can be evenly diffused from the center to the surroundings to cover the entire surface of the quartz plate. This helps to achieve consistency in the removal efficiency of the upper and lower surfaces and avoid processing quality problems caused by uneven liquid distribution.

[0032] Since the flow hole is located in the center, the liquid flow will not generate eccentric torque on the spacer or quartz plate, thereby reducing the risk of component displacement caused by liquid impact and maintaining the stability and processing accuracy of the system. Moreover, the design of a single flow hole simplifies the manufacturing process of the planetary wheel body, reducing production complexity and cost. In addition, the flow hole in the center position is also convenient for docking with the external liquid supply system, improving the overall integration of the equipment. At the same time, as the only liquid entry point, the central flow hole also simplifies daily maintenance and cleaning. Operators only need to focus on one location to complete the necessary cleaning tasks, reducing maintenance time and difficulty. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] The drawings described herein are used to provide a further understanding of the present invention and constitute a part of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings:

[0034] Figure 1 A top view of the main body according to an embodiment of the present invention;

[0035] Figure 2 is a top view of the spacer in one embodiment of the present invention, wherein the quartz plate is fixed in the fixing hole;

[0036] Figure 3 for Figure 2 A magnified schematic diagram of the middle A area;

[0037] Figure 4 It is a schematic structural diagram of the spacer ring in one embodiment of the present invention;

[0038] Figure 5 A top view of the planetary wheel according to an embodiment of the present invention;

[0039] Figure 6 A top view of the planetary wheel and the lower fixed plate assembly structure in another embodiment of the present invention;

[0040] Figure 7 It is a vertical cross-sectional schematic diagram of the planetary wheel and the lower fixed plate combined structure in one embodiment of the present invention;

[0041] Figure 8 for Figure 7A magnified schematic diagram of area B.

[0042] in:

[0043] 1. Spacer hole; 2. Liquid flow hole; 3. Support protrusion; 4. Main body; 5. Spacer; 6. Rubber strip; 6. Crest part; 6. Valley part; 7. Quartz plate; 8. Fixing protrusion; 9. Groove; 10. Lower fixed plate; 11. Fixing hole; 12. Liquid gap. DETAILED DESCRIPTION

[0044] In order to more clearly illustrate the overall concept of the present invention, a detailed description is given below in an exemplary manner in conjunction with the accompanying drawings.

[0045] In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention may also be implemented in other ways different from those described herein. Therefore, the protection scope of the present invention is not limited to the specific embodiments disclosed below.

[0046] In addition, in the description of the present invention, it should be understood that the orientations or positional relationships indicated by the terms "top", "bottom", "inside", "outside", "axial", "radial", "circumferential", etc. are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0047] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or a communication; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0048] In the present invention, unless otherwise clearly specified and limited, the first feature "on" or "under" the second feature may be that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. In the description of this specification, the description with reference to the terms "implementation method", "example", "one embodiment", "example" or "specific example" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in an appropriate manner in any one or more embodiments or examples.

[0049] like Figures 1 to 5 As shown, a planetary wheel for double-sided grinding of a quartz plate, the planetary wheel comprises a main body 4, the main body 4 is provided with a liquid flow hole 2 and a spacer hole 1, a spacer 5 is provided in the spacer hole 1, the spacer 5 is provided with a fixing hole 11 for accommodating the quartz plate 7, the outer edge of the spacer 5 is provided with a fixing protrusion 8 to abut against the edge of the spacer hole 1, the spacer hole 1 is circular so that the spacer 5 can rotate relative to the main body 4, and the edge of the fixing hole 11 is provided with a rubber strip 6 to abut against the quartz plate 7.

[0050] It should be noted that the rubber strip 6 in the present invention is a structure made of rubber material. Similarly, flexible materials (such as silicone or other high-performance elastomers) can also be used to replace the traditional rubber strip 6 as a buffer layer, and the present invention does not limit this. The rubber strip 6 usually has excellent elasticity and durability, and can provide more effective buffer protection. Moreover, for quartz plates 7 with irregular shapes or special requirements, the rubber strip 6 can better fit the surface and ensure stable support.

[0051] In addition, the spacer 5 and the body 4 are modular structures, allowing users to quickly replace different spacers 5 according to actual needs, simplifying the assembly and disassembly process, and facilitating daily maintenance and cleaning. Users can select the most suitable spacer 5 for combination according to the specific quartz plate 7 grinding task, which improves the adaptability and efficiency of the system.

[0052] The body 4 is the basic structure of the planetary wheel, and is provided with a fluid hole 2 and a spacer hole 1. The fluid hole 2 is used to guide the grinding liquid and the polishing liquid to be evenly distributed to the entire processing area, ensuring the consistency of the removal efficiency of the upper and lower surfaces, while providing cooling and lubrication. The spacer hole 1 is a circular design, allowing the spacer 5 to rotate relatively therein, so as to promote the self-rotation movement of the quartz plate 7 during the processing process and avoid local over-grinding or over-polishing.

[0053] The spacer 5 is placed in the spacer hole 1, and a plurality of fixing protrusions 8 are provided on the outer edge, which abut against the edge of the spacer hole 1, ensuring a stable connection between the spacer 5 and the body 4, preventing deviation or shaking, and improving the stability of the system. The fixing protrusions 8 reduce the total contact area between the spacer 5 and the body 4, reduce friction, promote the smooth rotation of the spacer 5 and its internal quartz plate 7, reduce wear, and extend the service life.

[0054] A fixing hole 11 is provided inside the spacer 5 for accommodating the quartz plate 7 to be processed. A rubber strip 6 is provided at the edge of the fixing hole 11, and the rubber strip 6 abuts against the quartz plate 7, providing a buffering protection effect and reducing the risk of damage to the edge of the quartz plate 7. The rubber strip 6 increases the friction between the rubber strip 6 and the quartz plate 7, preventing the quartz plate 7 from sliding, maintaining the correct processing posture, and improving the processing accuracy.

[0055] Through the self-rotation function of the spacer 5 and the buffer protection of the rubber strip 6, the quartz plate 7 can maintain a stable and uniform motion state during the processing, effectively avoiding the phenomenon of local over-grinding or over-polishing, and significantly improving the surface quality of the final product. The presence of the rubber strip 6 not only reduces the direct contact area between the quartz plate 7 and the tooling, reduces the probability of defects such as edge collapse and cracks, but also significantly improves the product yield. This design optimizes the support and protection mechanism of the quartz plate 7, providing a reliable guarantee for high-precision processing.

[0056] As a preferred embodiment of the present invention, Figure 2 , Figures 4 to 6 As shown, the outer edge of the spacer 5 is provided with a plurality of fixing protrusions 8 facing the edge of the spacer hole 1, and the plurality of fixing protrusions 8 are evenly arranged along the outer edge of the spacer 5, and the fixing protrusions 8 abut against the edge of the spacer hole 1. This design is intended to optimize the connection and movement characteristics between the spacer 5 and the body 4, so as to improve the stability and efficiency during the processing.

[0057] The multiple fixing protrusions 8 ensure that the spacer 5 can be accurately installed in the spacer hole 1 of the body 4, provide reliable mechanical positioning, and prevent the spacer 5 from shifting or shaking during the processing. At the same time, the design of the fixing protrusions 8 reduces the contact area between the spacer 5 and the body 4, reduces the friction between the two, promotes the smooth rotation of the spacer 5, and further enhances the self-rotation movement of the quartz plate 7.

[0058] Since the fixing protrusions 8 are evenly distributed on the outer edge of the spacer 5, the pressure applied to the spacer 5 can be evenly dispersed to each supporting point, thereby avoiding deformation or stress concentration caused by excessive local pressure and extending the service life of the spacer 5 and the body 4.

[0059] The fixing protrusion 8 only occupies a part of the contact surface between the spacer 5 and the body 4, and the rest forms a tiny gap, which is conducive to the circulation of grinding liquid and polishing liquid between the upper and lower plates of the planetary wheel. The optimized liquid flow path ensures the cooling and lubrication effect, and improves the processing efficiency and quality.

[0060] In addition, the evenly distributed fixing protrusions 8 make it easy to install the spacer 5 into the body 4, and the best assembly position can be found by slight rotation. In addition, if it is necessary to replace the spacer 5 of different specifications, the disassembly and assembly operation can also be completed quickly, which increases the flexibility and adaptability of the equipment.

[0061] It should be noted that the fixing protrusion 8 and the spacer 5 are of an integrated design, which facilitates integrated processing and manufacturing and also increases the stability of the fixing protrusion 8 on the spacer 5.

[0062] As a preferred embodiment of the present invention, Figure 2 , Figures 4 to 6 As shown, a plurality of rubber strips 6 are provided at the edge of the fixing hole 11, the rubber strips 6 are raised relative to the edge of the fixing hole 11, the rubber strips 6 are in contact with the quartz plate 7, and the plurality of rubber strips 6 surround the quartz plate 7. The plurality of rubber strips 6 surround the quartz plate 7, aiming to optimize the support and protection mechanism of the quartz plate 7, and improve the stability and product quality during the processing.

[0063] The design of the rubber strip 6 protruding relative to the edge of the fixing hole 11 increases the contact thickness between the rubber strip 6 and the quartz plate 7, which can more effectively absorb the vibration energy caused by external impact, play a better buffering role, and prevent the quartz plate 7 from being damaged due to hard collision. Multiple rubber strips 6 surround the quartz plate 7, reducing the actual contact area between the rubber strip 6 and the quartz plate 7. The smaller contact area reduces the risk of damage to the edge of the quartz plate 7, especially avoiding scratches or edge collapse that may be caused by large-area contact.

[0064] In addition, multiple rubber strips 6 surround the quartz plate 7, so that the pressure applied to the quartz plate 7 can be evenly distributed to each supporting point. This not only helps to maintain the stable position of the quartz plate 7 during the processing, but also avoids deformation or stress concentration problems caused by excessive local pressure, ensuring the flatness and consistency of the quartz plate 7 throughout the processing. The design of the rubber strip 6 increases the friction between the rubber strip 6 and the quartz plate 7, effectively preventing the quartz plate 7 from sliding unnecessarily during the processing. This is crucial to maintaining the correct posture of the quartz plate 7 during double-sided grinding and polishing, thereby improving processing accuracy and product quality.

[0065] Thirdly, the design of the surrounding rubber strip 6 provides a certain flexibility, allowing the position of the rubber strip 6 to be adjusted or the rubber strip 6 of different thicknesses to be replaced to adapt to quartz plates 7 of different sizes or shapes. This flexibility enhances the versatility and adaptability of the planetary wheel system and reduces production costs.

[0066] It should be noted that the present invention does not limit the connection method between the rubber strip 6 and the edge of the fixing hole 11. Embedded installation (such as Figures 2 to 6As shown, a plurality of grooves 9 are provided on the edge of the fixing hole 11 of the spacer 5, and the rubber strip 6 is embedded in these grooves 9), adhesive fixation (using a high-strength adhesive to directly stick the rubber strip 6 to the edge of the fixing hole 11 of the spacer 5), mechanical fixation (fixing the rubber strip 6 to the spacer 5 by mechanical means such as snaps, screws or other fasteners).

[0067] As an example of this implementation, Figures 2 to 6 As shown, the rubber strip 6 is provided with a crest portion 61 and a trough portion 62 on the side abutting against the quartz plate 7, the crest portion 61 and the trough portion 62 are arranged at intervals, the crest portion 61 is raised relative to the trough portion 62, and the crest portion 61 abuts against the quartz plate 7. This unique design is intended to optimize the support, protection and various performances of the quartz plate 7 during processing.

[0068] The crest 61 is in direct contact with the quartz plate 7, while the trough 62 is not in contact with the quartz plate 7, which reduces the actual contact area between the rubber strip 6 and the quartz plate 7. The smaller contact area reduces the risk of damage to the edge of the quartz plate 7, especially avoiding scratches or edge collapse that may be caused by large-area contact.

[0069] Moreover, the design of the wave crest 61 enhances the elasticity of the rubber strip 6, which can more effectively absorb the vibration energy caused by external impact, play a better buffering and protective role, and prevent the quartz plate 7 from being damaged by hard collision. The design of the wave crest 61 increases the friction between the rubber strip 6 and the quartz plate 7, effectively preventing the quartz plate 7 from sliding unnecessarily during the processing. This is crucial for maintaining the correct posture of the quartz plate 7 during double-sided grinding and polishing, thereby improving processing accuracy and product quality.

[0070] In addition, a plurality of wave peaks 61 are distributed on the entire rubber strip 6, so that the pressure applied to the quartz plate 7 can be evenly dispersed to each supporting point. This not only helps to maintain the stable position of the quartz plate 7 during the processing, but also avoids deformation or stress concentration problems caused by excessive local pressure, ensuring the flatness and consistency of the quartz plate 7 during the entire processing process.

[0071] The design of the crest portion 61 and the trough portion 62 provides a certain flexibility, allowing the rubber strip 6 to adjust its shape within a certain range to adapt to quartz plates 7 of different thicknesses or specifications. This flexibility enhances the versatility and adaptability of the planetary wheel system and reduces production costs.

[0072] It should be noted that the present invention does not limit the structure of the rubber strip 6 , and any one of the following embodiments may be adopted, or a combination thereof may be used.

[0073] Embodiment 1: The rubber strip 6 is made of a multi-layer composite material, each layer having different physical properties. The inner layer is made of a highly elastic material, and the outer layer is made of a wear-resistant material, forming a progressive buffer structure with good wear resistance. Different combinations of material layers can be selected according to different processing requirements, such as high temperature resistance, corrosion resistance and other characteristics.

[0074] Embodiment 2: Adding a specific texture or pattern on the wave crest surface. By designing convex points, grids or other textures, the friction between the wave crest surface and the quartz plate 7 is increased to prevent sliding. The texture design not only improves functionality, but also increases visual beauty, and is suitable for high-end product processing.

[0075] Embodiment 3: The wave crest can be designed in a circular, elliptical, trapezoidal or other shapes.

[0076] As another example of this implementation, Figures 2 to 6 As shown, the edge of the fixing hole 11 is provided with a plurality of grooves 9, and the rubber strips 6 are provided in at least some of the grooves 9. This design is intended to optimize the support and protection mechanism of the quartz plate 7 and ensure stability and efficiency during processing.

[0077] The groove 9 provides a clear installation position for the rubber strip 6, ensuring that it can be accurately fixed on the predetermined position and will not be easily displaced. By embedding the rubber strip 6 into the groove 9, the installation can be completed quickly, reducing the assembly time and complexity.

[0078] In addition, after the rubber strip 6 is embedded in the groove 9, a more stable buffer layer is formed. When the quartz plate 7 is subjected to external impact or vibration, the rubber strip 6 can absorb energy more effectively, reduce the vibration transmitted to the quartz plate 7, and play a better protective role. Moreover, the design of the groove 9 enables the rubber strip 6 to contact the quartz plate 7 at a specific point, reducing the possibility of large-area direct contact and reducing the probability of defects such as edge collapse and cracks. The design of multiple grooves 9 allows the rubber strip 6 to be evenly distributed at multiple points, thereby dispersing the pressure applied to the quartz plate 7. This avoids deformation or stress concentration problems caused by excessive local pressure, and ensures the flatness and consistency of the quartz plate 7 throughout the entire processing process.

[0079] It can be understood that the thickness of the rubber strip 6 is greater than the depth of the groove 9 , so that the rubber strip 6 is raised relative to the edge of the fixing hole 11 .

[0080] The present invention does not limit the number and position of the liquid flow holes 2, and any one of the following embodiments may be adopted.

[0081] Embodiment 1: Figure 1 , Figure 5 and Figure 6As shown, the body 4 is provided with a liquid flow hole 2, and the liquid flow hole 2 is provided at the center of the body 4. The liquid flow hole 2 at the center ensures that the grinding liquid and the polishing liquid can be evenly diffused from the center to the surroundings, covering the entire surface of the quartz plate 7. This helps to achieve consistency in the removal efficiency of the upper and lower surfaces, and avoids processing quality problems caused by uneven liquid distribution.

[0082] Since the liquid flow hole 2 is located in the center, the liquid flow will not generate an eccentric torque on the spacer 5 or the quartz plate 7, thereby reducing the risk of component displacement caused by liquid impact and maintaining the stability and processing accuracy of the system. Moreover, the design of a single liquid flow hole 2 simplifies the manufacturing process of the main body 4 and reduces production complexity and cost. In addition, the liquid flow hole 2 in the center position is also convenient for docking with the external liquid supply system, improving the overall integration of the equipment. At the same time, the central liquid flow hole 2, as the only liquid entry point, also simplifies daily maintenance and cleaning work. The operator only needs to focus on one position to complete the necessary cleaning tasks, reducing maintenance time and difficulty.

[0083] Embodiment 2: The body 4 is provided with a plurality of the liquid flow holes 2, which are arranged around the axis of the body 4, and at least one liquid flow hole 2 is arranged between adjacent spacer holes 1. The plurality of liquid flow holes 2 are arranged around the axis of the body 4, ensuring that the grinding liquid and the polishing liquid can be sprayed evenly from multiple directions to the entire processing area, especially for the quartz plate 7 of larger size or complex shape, more comprehensive coverage can be achieved. Moreover, since the liquid flow holes 2 are arranged in a surrounding manner, the liquid flow will not produce a significant eccentric torque on the spacer 5 or the quartz plate 7, reducing the risk of component displacement caused by liquid impact, and maintaining the stability and processing accuracy of the system.

[0084] In addition, the design of multiple flow holes 2 enables the liquid to reach the working area that needs lubrication and cooling in the shortest time, reducing waiting time and improving processing speed. At the same time, multi-point liquid inlet helps maintain a constant processing environment and ensures the stability of process parameters. Each flow hole 2 can guide the liquid to act directly on the high-temperature area or key contact point, improving the cooling and lubrication efficiency, extending the tool life, and reducing the risk of thermal deformation.

[0085] Although the number of flow holes 2 is increased, the design of the surrounding arrangement is relatively regular, which simplifies the manufacturing process of the body 4 and reduces the production complexity and cost. The design of multiple flow holes 2 reduces the risk of clogging. The surrounding arrangement of the flow holes 2 helps to maintain the center of gravity balance of the quartz plate 7 in the spacer 5 and promotes its smooth rotation. This is very important for preventing local over-grinding or over-polishing and improving the uniformity and precision of the processed surface.

[0086] It should be noted that the present invention can also combine the above-mentioned embodiment 1 and embodiment 2 for use, opening a liquid flow hole 2 at the center of the body 4 and arranging multiple liquid flow holes 2 around the axis of the body 4 .

[0087] As a preferred embodiment of the present invention, Figure 1 , Figure 5 and Figure 6 As shown, the planetary wheel is provided with a plurality of the spacer holes 1, the distances between the plurality of the spacer holes 1 and the axis of the planetary wheel are equal, and the plurality of the spacer holes 1 are evenly arranged around the axis of the planetary wheel.

[0088] Multiple spacer holes 1 are evenly arranged around the axis of the planetary wheel, so that the force applied to each spacer 5 can be evenly dispersed. This avoids deformation or stress concentration caused by local overload and enhances the overall stability of the system. Since the distance between the spacer holes 1 and the axis is equal, each spacer 5 can work under the same conditions, ensuring that the quartz plate 7 maintains a stable support state during the entire processing process. At the same time, the evenly arranged spacer holes 1 allow each spacer 5 and the quartz plate 7 inside it to rotate around the axis of the planetary wheel at the same speed, ensuring the consistency and accuracy of the processing. The symmetrical arrangement of the spacer holes 1 reduces the vibration and shaking caused by asymmetric torque and improves the stability during the processing.

[0089] In addition, the user can choose to use part or all of the spacer holes 1 according to actual processing requirements, and flexibly adjust the number of quartz plates 7 processed each time. Each spacer hole 1 can independently install or remove the spacer 5, which is convenient for quick replacement and maintenance, increasing the flexibility and adaptability of the system. Even if a certain spacer hole 1 has a problem, the other spacer holes 1 can still work normally without affecting the overall processing process, thereby improving the reliability and fault tolerance of the system. Moreover, the evenly arranged spacer holes 1 are relatively regular, which simplifies the manufacturing process of the body 4 and reduces the production complexity and cost.

[0090] As a preferred embodiment of the present invention, Figures 6 to 8 As shown, a lower fixed plate 10 is disposed at the lower side of the body 4 , and a supporting protrusion 3 is provided on the lower side of the body 4 so that a liquid gap 12 is formed between the planetary wheel and the lower fixed plate 10 , and the liquid gap 12 is connected to the liquid flow hole 2 .

[0091] It is understandable that in the planetary wheel system for double-sided grinding of quartz plates, the lower fixed plate 10 is a key component located below the body 4. It works in conjunction with the planetary wheel to ensure effective circulation of liquid, temperature control and stability of mechanical support during grinding and polishing.

[0092] The liquid gap 12 is connected to the liquid flow hole 2, forming a complete liquid flow path, ensuring that the grinding liquid and polishing liquid can flow smoothly from the liquid flow hole 2 and evenly cover the entire processing area. By designing a reasonable liquid gap 12, the dead angle in the liquid flow is reduced, the utilization rate of the liquid is improved, and the problems of local overheating or uneven processing are avoided. The existence of the liquid gap 12 allows the liquid to directly act on the high-temperature area between the planetary wheel and the lower fixed plate 10, especially the place where the quartz plate 7 contacts the grinding tool most frequently, thereby improving the cooling efficiency, extending the tool life, and reducing the risk of thermal deformation. The flow of liquid in the liquid gap 12 helps to take away heat, keep the temperature of the entire processing environment stable, and further improve the processing quality.

[0093] As an example of this implementation, Figure 1 As shown, a plurality of the support protrusions 3 surround the axis of the body 4, and at least one support protrusion 3 is provided between adjacent spacer holes 1. The plurality of support protrusions 3 are arranged around, so that the force applied to the planetary wheel and the lower fixed plate 10 can be evenly dispersed, avoiding deformation or stress concentration caused by local overload, and enhancing the overall stability of the system. The support protrusions 3 can absorb and buffer external impacts to a certain extent, reduce the possibility of vibration transmission to the quartz plate 7, and maintain the stability of the processing process.

[0094] In addition, the design of the support protrusion 3 helps to maintain the center of gravity balance of the quartz plate 7 in the spacer 5, and promotes its smooth rotation. This is very important for preventing local over-grinding or over-polishing and improving the surface uniformity and precision after processing. Appropriate support protrusions 3 can reduce the direct contact between the planetary wheel and the lower fixed plate 10, reduce friction, and enhance the stability and durability of the system.

[0095] It should be noted that the support protrusion 3 can be installed and removed by means of buckles, screws or other quick connection devices, which reduces assembly time and complexity. In addition, the user can quickly adjust the position or height of the support protrusion 3 according to specific processing requirements (such as changes in the thickness or specifications of the quartz plate 7) without having to redesign or manufacture the entire body 4.

[0096] Alternatively, the support protrusion 3 and the body 4 may be integrated into one design, that is, the support protrusion 3 and the body 4 or other key components are manufactured into a whole by injection molding, casting or welding. This design is intended to enhance structural strength, simplify the manufacturing process, and improve the stability and reliability of the system.

[0097] As another example of this embodiment, the support protrusion 3 has an arc-shaped transition surface, and the arc-shaped transition surface abuts against the lower fixed plate 10. The arc-shaped transition surface changes the contact between the support protrusion 3 and the lower fixed plate 10 from point contact to line contact or surface contact, reducing local stress concentration and avoiding damage caused by hard contact. The arc-shaped transition surface can better disperse the pressure applied to the support protrusion 3, ensure uniform support between the planetary wheel and the lower fixed plate 10, and improve the overall stability of the system.

[0098] At the same time, the arc-shaped transition surface provides a smoother liquid flow path, reduces the turbulence and resistance of the liquid in the contact area, and promotes the smooth flow of grinding and polishing liquids. Reasonable arc-shaped design reduces dead angles in liquid flow, improves liquid utilization, and avoids problems such as local overheating or uneven processing.

[0099] Anything not described in the present invention can be achieved by adopting or drawing on existing technologies.

[0100] The various embodiments in this specification are described in a progressive manner, and the same or similar parts between the various embodiments can be referenced to each other, and each embodiment focuses on the differences from other embodiments.

[0101] The above description is only an embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent substitution, improvement, etc. made within the spirit and principle of the present invention should be included in the scope of the claims of the present invention.

Claims

1. A planetary wheel for double-sided grinding of a quartz plate, characterized in that: The planetary wheel includes a main body, which is provided with a liquid flow hole and a spacer hole. A spacer is provided in the spacer hole, and the spacer is provided with a fixing hole for accommodating the quartz plate. The outer edge of the spacer is provided with a fixing protrusion to abut against the edge of the spacer hole. The spacer hole is circular so that the spacer can rotate relative to the main body, and the edge of the fixing hole is provided with a rubber strip to abut against the quartz plate.

2. The planetary wheel for double-sided grinding of a quartz plate according to claim 1, characterized in that: The outer edge of the spacer is provided with a plurality of fixing protrusions facing the edge of the spacer hole. The plurality of fixing protrusions are evenly arranged along the outer edge of the spacer, and the fixing protrusions abut against the edge of the spacer hole.

3. The planetary wheel for double-sided grinding of a quartz plate according to claim 1, characterized in that: A plurality of rubber strips are arranged at the edge of the fixing hole, the rubber strips are raised relative to the edge of the fixing hole, the rubber strips are in contact with the quartz plate, and the plurality of rubber strips surround the quartz plate.

4. The planetary wheel for double-sided grinding of a quartz plate according to claim 3, characterized in that: The rubber strip is provided with a crest and a trough on the side abutting against the quartz plate, the crest and the trough are arranged at intervals, the crest is convex relative to the trough, and the crest abuts against the quartz plate.

5. The planetary wheel for double-sided grinding of a quartz plate according to claim 3, characterized in that: The edge of the fixing hole is provided with a plurality of grooves, and the rubber strips are arranged in at least some of the grooves.

6. The planetary wheel for double-sided grinding of a quartz plate according to claim 1, characterized in that: The body is provided with a liquid flow hole, and the liquid flow hole is arranged at the center of the body, and / or, The body is provided with a plurality of the liquid flow holes, the plurality of the liquid flow holes are arranged around the axis of the body, and at least one liquid flow hole is arranged between adjacent spacer holes.

7. The planetary wheel for double-sided grinding of a quartz plate according to claim 1, characterized in that: The planetary wheel is provided with a plurality of the spacer holes, the distances between the plurality of the spacer holes and the axis of the planetary wheel are equal, and the plurality of the spacer holes are evenly arranged around the axis of the planetary wheel.

8. The planetary wheel for double-sided grinding of a quartz plate according to claim 1, characterized in that: A lower fixed plate is arranged at the lower side of the body, and a supporting protrusion is provided on the lower side surface of the body so as to form a liquid gap between the planetary wheel and the lower fixed plate, and the liquid gap is communicated with the liquid flow hole.

9. The planetary wheel for double-sided grinding of a quartz plate according to claim 8, characterized in that: A plurality of the supporting protrusions surround the axis of the body, and at least one supporting protrusion is disposed between adjacent spacer holes.

10. The planetary wheel for double-sided grinding of a quartz plate according to claim 8, characterized in that: The supporting protrusion has an arc-shaped transition surface, and the arc-shaped transition surface abuts against the lower fixed plate.

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