Equipment redundancy switching optimization method and system under electromagnetic interference

Abstract

The invention provides an equipment redundancy switching optimization method and system under electromagnetic interference, and the method comprises the steps: carrying out the dynamic adjustment of an initial interference region through analyzing the attributes and outlines of influence elements, precisely delimiting an actual interference range, accurately recognizing influence equipment, and determining switching equipment; based on the selection type of the switching equipment, the standby equipment with the selection type is sorted, the switching equipment is sorted based on the number of functions, the standby equipment is matched for the switching equipment from the standby link, replacement is efficiently completed, and when standby resources are insufficient, the fixed equipment is called to take over the switching equipment function. The original function vacancy of the fixed equipment is filled by deploying the standby equipment; under the extreme condition, the function of interchange execution of the fixed device and the switching device is achieved by analyzing the limited type, it is guaranteed that the functions of a main link are complete under electromagnetic interference, and stable production operation is maintained.

Description

TECHNICAL FIELD

[0001] The present application relates to data processing technology, and in particular to a device redundancy switching optimization method and system under electromagnetic interference. BACKGROUND

[0002] In the modern industrial production process, the object sorting system is deeply integrated into multiple fields such as logistics and warehousing, intelligent manufacturing, and food processing due to its high automation and precision. Through the coordinated work of devices on the pipeline or conveying link, the system can efficiently sort objects of different shapes and specifications, greatly improving production efficiency and product quality.

[0003] The industrial production environment is full of complex and diverse electromagnetic interference sources, such as high-power motor operation and high-frequency communication device signal transmission. These interference sources interfere with the normal operation of various industrial devices in the factory area. As an important part of the industrial production process, the devices on the object sorting system link are also inevitably affected by electromagnetic interference, which may cause some parts or motors to be affected, resulting in affected devices. In the prior art, only the affected devices are replaced, and the blindly switched devices may not meet the actual operation requirements, resulting in a mismatch in function, which reduces the efficiency of the sorting system and makes it unstable after switching, and cannot guarantee the efficient and continuous operation of the sorting work.

[0004] Therefore, how to efficiently and intelligently switch the interference devices under electromagnetic interference has become a problem to be solved. SUMMARY

[0005] The present application provides a device redundancy switching optimization method and system under electromagnetic interference, which can efficiently and intelligently switch the interference devices under electromagnetic interference.

[0006] In a first aspect of the present application, a device redundancy switching optimization method under electromagnetic interference is provided, comprising: Retrieving the initial interference area of the interference source, obtaining the influence profile of the influence elements in the initial interference area, adjusting the initial interference area based on the influence profile to obtain the actual interference area; Obtaining the main chain link in the actual interference area as the influence device, obtaining the remaining main chain link as the fixed device, retrieving the interference type of the interference source, determining the switching device based on the device position and interference type of the influence device, and selecting the type of the switching device; Based on the selection type, the standby sequence of the standby device on the standby link is obtained, the external switching strategy and the standby sequence are retrieved to configure the corresponding standby replacement device for the main chain link, and the switching type of the standby replacement device is obtained. In response to the body replacement condition, a switching type of the fixed device is determined according to a fixed type of the fixed device, a selection type, and a function type of the standby device, and the standby replacement device is determined.

[0007] Optionally, in a possible implementation of the first aspect, the adjusting the initial interference region based on the influence profile to obtain an actual interference region comprises: The interference midpoint and the interference radius of the initial interference region are called, the interference radius is rotated based on the interference midpoint, and the number of intersection points of the interference radius and the influence profile is obtained in real time; at a selection position where the number of intersection points is equal to 1, the interference radius is constructed to obtain a selected radius; An element attribute of the influence element is obtained, and the element attribute comprises a reflection attribute, an enhancement attribute, and an attenuation attribute; When the element attribute is the reflection attribute, a corresponding influence profile is taken as a reflection profile, and the initial interference region is adjusted based on the reflection profile and the selected radius to obtain a shielded interference region; When the element attribute is the enhancement attribute, a corresponding influence profile is taken as an enhancement profile, and the initial interference region is adjusted based on the enhancement profile and the selected radius to obtain an enhanced interference region; When the element attribute is the attenuation attribute, a corresponding influence profile is taken as an attenuation profile, and the initial interference region is adjusted based on the attenuation profile and the selected radius to obtain an attenuated interference region.

[0008] Optionally, in a possible implementation of the first aspect, when the element attribute is the reflection attribute, a corresponding influence profile is taken as a reflection profile, and the initial interference region is adjusted based on the reflection profile and the selected radius to obtain a shielded interference region, and the adjusting the initial interference region based on the reflection profile to obtain the shielded interference region comprises: When the element attribute is the reflection attribute, a corresponding influence profile is taken as a reflection profile; An intersection point of the selected radius and the reflection profile is taken as a selected intersection point, the selected intersection point is connected with the interference midpoint to obtain a contact radius, and the reflection profile is segmented based on the selected intersection point to obtain two segmented profile lines; An enclosed region surrounded by the contact radius and the segmented profile lines is obtained, and the smallest enclosed region is taken as a normal region; A to-be-selected region composed of the selected radius and a region profile of the initial interference region is selected, and a to-be-selected region where the reflection profile is located is taken as a reflection processing region; A shielded region is obtained according to a difference set of the reflection processing region and the normal region, and a shielded interference region is obtained based on a difference set of the initial interference region and the shielded region.

[0009] Optionally, in a possible implementation manner of the first aspect, when the element attribute is determined to be an enhancement attribute, the corresponding influence contour is taken as an enhancement contour, and the initial interference region is adjusted in area based on the enhancement contour and the selected radius to obtain an enhanced interference region, including: when the element attribute is determined to be an enhancement attribute, the corresponding influence contour is taken as an enhancement contour, and the region corresponding to the enhancement contour is taken as an enhancement region; from the to-be-selected region composed of the selected radius and the region contour of the initial interference region, a to-be-selected region where the enhancement contour is located is selected as an enhancement processing region; a plurality of interference radii are constructed in the enhancement processing region as enhancement radii, intersections of each of the enhancement radii and the enhancement region are obtained to obtain an enhancement line segment corresponding to each of the enhancement radii; a number of pixel points at each of the enhancement line segments is counted to obtain an enhancement number corresponding to each of the enhancement radii, and based on the enhancement number, a corresponding enhancement radius is lengthened to obtain a lengthened point with the interference midpoint as the origin; a contour intersection point of the selected radius and the region contour of the initial interference region is obtained, adjacent lengthened points are connected, and the contour intersection point and the nearest lengthened point are connected to obtain the enhanced interference region.

[0010] Optionally, in a possible implementation manner of the first aspect, when the element attribute is determined to be an attenuation attribute, the corresponding influence contour is taken as an attenuation contour, and the initial interference region is adjusted in area based on the attenuation contour and the selected radius to obtain an attenuated interference region, including: when the element attribute is determined to be an attenuation attribute, the corresponding influence contour is taken as an attenuation contour, and the region corresponding to the attenuation contour is taken as an attenuation region; from the to-be-selected region composed of the selected radius and the region contour of the initial interference region, a to-be-selected region where the attenuation contour is located is selected as an attenuation processing region; a plurality of interference radii are constructed in the attenuation processing region as attenuation radii, intersections of each of the attenuation radii and the attenuation region are obtained to obtain an attenuation line segment corresponding to each of the attenuation radii; a number of pixel points at each of the attenuation line segments is counted to obtain an attenuation number corresponding to each of the attenuation radii, and based on the attenuation number, a corresponding attenuation radius is shortened to obtain an attenuation point with the interference midpoint as the origin; a contour intersection point of the selected radius and the region contour of the initial interference region is obtained, adjacent attenuation points are connected, and the contour intersection point and the nearest attenuation point are connected to obtain the attenuated interference region.

[0011] Optionally, in a possible implementation manner of the first aspect, the determination of the switching device based on the device position of the influence device and the interference type and the selection of the type of the switching device include: determining the running type of the influence device based on the device position of the influence device in the backbone link; when the running type of the influence device is determined in the interference type, taking the corresponding influence device as a switching device and taking the running type of the corresponding influence device as a selection type.

[0012] Optionally, in a possible implementation manner of the first aspect, the obtaining of the standby sequence based on the standby device with the selection type on the standby link, the calling of the external switching strategy and the corresponding standby replacement device and the switching type of the standby replacement device for the backbone link based on the standby sequence comprises: obtaining a standby set of the standby device with the selection type on the standby link, obtaining a type number of the function type of each standby device, performing ascending sequence sorting on the standby device in the standby set based on the type number, and obtaining a standby sequence corresponding to each switching device; obtaining a function number of the function type of the switching device, performing ascending sequence sorting on the switching device based on the function number, and obtaining a switching sequence; selecting a first switching device in the switching sequence, and selecting a first standby device in the standby sequence corresponding to the first switching device as a standby replacement device of the first switching device; updating the remaining standby sequence based on the standby replacement device to obtain an updated standby sequence; deleting the first switching device in the switching sequence to obtain an updated switching sequence, and repeating the step of selecting the first standby device in the standby sequence corresponding to the first switching device as the standby replacement device of the first switching device until the updated switching sequence does not have a switching device, obtaining a standby replacement device of the backbone link, and determining the switching type of the standby replacement device based on the device position of the standby replacement device in the backbone link.

[0013] Optionally, in a possible implementation manner of the first aspect, the determining of the switching type of the fixed device and the standby replacement device according to the fixed type of the fixed device, the selection type and the function type of the standby device in response to the main body replacement condition comprises: in response to the main body replacement condition, determining the running type of the fixed device based on the device position of the fixed device in the backbone link as a fixed type; when the switching device does not have a standby replacement device, the fixed device has the selection type of the corresponding switching device, and the standby device has the corresponding fixed type, taking the selection type as the switching type of the fixed device, switching the running type of the corresponding fixed device to the switching type, and selecting the standby device with the fixed type as the standby replacement device of the fixed device.

[0014] Optionally, in a possible implementation manner of the first aspect, the method further includes: when it is determined that the switching device does not have a backup replacement device, the fixed device has the selected type, the backup device does not have the fixed type, and the switching device has the fixed type, obtaining a limited type of the switching device according to an intersection of the function type and the interference type of the switching device; when it is determined that the limited type does not have the fixed type, switching the function type of the switching device to the fixed type, and switching the function type of the corresponding fixed device to the selected type.

[0015] In a second aspect of the present application, an electromagnetic interference device redundancy switching optimization system is provided, including: a region adjustment module configured to retrieve an initial interference region of an interference source, obtain an influence profile of an influence element in the initial interference region, perform region adjustment on the initial interference region based on the influence profile, and obtain an actual interference region; a switching device module configured to obtain main backbone devices in the actual interference region in a main backbone link as influence devices, obtain remaining main backbone devices in the main backbone link as fixed devices, retrieve an interference type of the interference source, determine a switching device based on a device position of the influence device and the interference type, and determine a selected type of the switching device; a backup device module configured to obtain a backup sequence based on the selected type of the backup devices on a backup link, retrieve an external switching strategy and the backup sequence to configure corresponding backup replacement devices for the main backbone link, and determine a switching type of the backup replacement devices; a fixed device module configured to determine a switching type of the fixed device based on a fixed type of the fixed device, the selected type, and a function type of the backup device in response to a body replacement condition, and determine a backup replacement device.

[0016] The present application has the following advantages: 1. The present application accurately determines the actual interference range by analyzing the properties of the influence elements in the initial interference region and dynamically adjusting the initial interference region based on the influence profile. This process takes into account the effects of the influence elements on the propagation of electromagnetic interference, such as the shielding effect of the reflection property, the expansion of the interference distance by the enhancement property, and the weakening of the interference distance by the attenuation property, making the actual interference region more accurate. As a result, the server can accurately identify the main backbone devices in the actual interference range as influence devices, avoiding misjudgment of devices not affected by the interference as affected objects, and providing accurate range basis for subsequent device switching, ensuring that only truly affected devices are taken measures.

[0017] 2、The application selects the backup device from the backup link according to the type of the switching device, forms a backup sequence, and forms a switching sequence according to the number of functions of the switching device, configures the backup replacement device for the switching device in turn according to the priority, and dynamically updates the backup sequence and the switching sequence after the allocation. This scheme can ensure that the switching device with single function and narrow range of optional backup device obtains the replacement resource, avoid the repeated allocation of the backup device, ensure the efficient completion of the replacement of the switching device, and maintain the normal operation of the backbone link.

[0018] 3、When the backup replacement device of the switching device cannot be found in the backup link, the server responds to the body replacement condition, calls the fixed device in the backbone link to undertake the function of the switching device, and selects the backup device in the backup link as the backup replacement device of the fixed device. This scheme can ensure the integrity of the function of the backbone link by means of the fixed device taking over the function of the switching device and the backup device filling the vacancy of the original function of the fixed device.

[0019] 4、When there is neither the backup replacement device of the switching device nor the backup replacement device of the fixed device in the backup link, the server determines the limited type by analyzing the intersection of the function type and the interference type of the switching device, and makes the function type of the switching device and the fixed device replace each other on the premise that the limited type does not contain the function type of the fixed device. This scheme can make the switching device avoid the interfered function and execute the function of the fixed device, and make the fixed device undertake the function of the switching device, so that the core function of the backbone link is maintained through the function replacement between devices. BRIEF DESCRIPTION OF DRAWINGS

[0020] Figure 1 A flowchart of the device redundancy switching optimization method under electromagnetic interference provided by the application; Figure 2 An initial interference area schematic diagram when the element attribute affecting the contour in the application is a reflection attribute; Figure 3 A schematic diagram of a reflection processing area in the application; Figure 4 A schematic diagram of an enhanced processing area in the application; Figure 5 A structure schematic diagram of the device redundancy switching optimization system under electromagnetic interference provided by the application. DETAILED DESCRIPTION

[0021] The technical scheme of the application will be described in detail in the specific embodiments. The following specific embodiments can be combined with each other, and the same or similar concepts or processes can not be described in some embodiments.

[0022] As Figure 1 shown, the application provides a device redundancy switching optimization method under electromagnetic interference, comprising: S1, calling the initial interference area of the interference source, obtaining the influence profile of the influence elements in the initial interference area, adjusting the initial interference area based on the influence profile, and obtaining the actual interference area.

[0023] It should be noted that in the process of modern industrial production, object sorting system is deeply integrated into multi-element fields such as logistics and warehousing due to its high automation and precision. The industrial production environment is full of complex and diverse electromagnetic interference sources, such as high-power motor operation, high-frequency communication equipment signal transmission, etc. These interference sources interfere with the normal operation of various industrial equipment in the factory area. As an important part of the industrial production process, the object sorting system realizes efficient sorting of objects of different shapes and specifications through the coordinated work of devices on the assembly line or conveying link. Due to the characteristics of the assembly line, each specific position has a specific work content. When the device is interfered by electromagnetic interference, the influence on the function of the device is different due to the different characteristics of electromagnetic interference. For example, device A is at position 1 of the main chain link, and position 1 is designated to sort circular products. However, device A also has the function of sorting rhombus products. If electromagnetic interference makes device A unable to sort rhombus, it can only sort circular products. At this time, the interference type is rhombus sorting, but since position 1 only requires sorting circular products, device A can still sort circular products if it is interfered by electromagnetic interference, but it cannot sort rhombus.

[0024] In the prior art, only the interfered device is replaced, but since the device function and the station position in the assembly line have a corresponding relationship, blind switching may cause function mismatch. For example, when the interference causes the device at a certain position to be unable to perform the specified function, if the standby device does not have the same function type, or the switching destroys the original function allocation logic, it will cause the sorting process to be interrupted or the efficiency to be reduced.

[0025] Therefore, the application first determines the actual influence area of electromagnetic interference to avoid device misjudgment and unnecessary switching caused by inaccurate interference area judgment. At the same time, based on the interference type of the interference source, the device position and the standby link, the standby replacement device and its switching type are determined, which can significantly improve the matching degree of the standby device and the actual demand of the main chain link, ensure the stable and efficient operation of the object sorting system in the electromagnetic interference environment, and improve the overall efficiency and quality of industrial production.

[0026] The interference source represents a source of electromagnetic interference, such as a high-power motor in operation. The initial interference area represents an area affected by the interference source preliminarily detected without considering the influencing elements in the workshop, and can be circular. The influencing element refers to an object in the initial interference area that can affect the propagation and distribution of electromagnetic interference. The influence contour is the boundary contour of the influencing element. The actual interference area refers to the area obtained by adjusting the initial interference area by analyzing the shielding, enhancing, and attenuating effects of the element properties of the influencing element on electromagnetic interference.

[0027] By analyzing the influence of metal shelves, concrete walls and other influencing elements in the industrial environment on electromagnetic wave propagation, the actual influence range of electromagnetic interference in a complex industrial environment can be more realistically reflected, and equipment misjudgment caused by incorrect interference area judgment can be avoided. This enables workers to know which devices are within the interference range, so that protective measures can be taken in advance for these devices, or maintenance or switching can be performed in a timely manner when a device fails.

[0028] In some embodiments, the step S1 (adjusting the initial interference area based on the influence contour to obtain the actual interference area) includes S11-S15: S11, call the interference midpoint and interference radius of the initial interference area, rotate the interference radius based on the interference midpoint, and obtain the number of intersection points of the interference radius and the influence contour in real time. At the selected position where the number of intersection points is equal to 1, the interference radius is constructed to obtain the selected radius.

[0029] It can be understood that, in order to determine the actual interference area, the shape of the influencing factor, i.e., the influence contour, needs to be analyzed. First, the interference midpoint and the interference radius of the initial interference area are called, the interference radius is rotated based on the interference midpoint, and the rotated interference radius intersects with the influencing element when the influencing element is in the initial interference area. The number of intersection points of the interference radius and the influence contour is obtained in real time. The number of intersection points is greater than or equal to 1. When the number of intersection points is equal to 1, it indicates that the interference radius is tangent to the influence contour. The interference radius at this time is taken as the selected radius.

[0030] The interference midpoint represents the center point of the initial interference area, the interference radius represents the straight-line distance radiating outward from the interference midpoint, the selected position refers to the intersection position of the interference radius and the influence contour when the number of intersection points is equal to 1, and the selected radius refers to the interference radius at the selected position. There are two selected radii.

[0031] S12, obtain the element properties of the influencing element, including the reflection property, the enhancement property, and the attenuation property.

[0032] It can be understood that different materials of the influencing element have different effects on electromagnetic interference. For example, some equipment can shield electromagnetic, a concrete wall can absorb part of the energy to cause interference attenuation, and some electronic equipment can enhance the local field strength due to resonance effect.

[0033] Therefore, the element attribute of the influencing element is obtained, and the element attribute includes a reflection attribute, an enhancement attribute, and an attenuation attribute.

[0034] The element attribute represents the effect characteristic of the influencing element on the propagation of electromagnetic interference, the reflection attribute represents the shielding characteristic of the influencing element on electromagnetic waves, and the shielding characteristic is that the electromagnetic interference is shielded by the influencing element and cannot continue to propagate; the enhancement attribute represents the characteristic that the influencing element enhances the electromagnetic interference and expands the interference distance, such as resonance of electronic equipment at a specific frequency, which extends the influence distance of the electromagnetic interference; and the attenuation attribute represents the characteristic that the influencing element absorbs or weakens the electromagnetic interference, such as absorption of a wall on the electromagnetic interference, which shortens the influence distance of the electromagnetic interference.

[0035] In S13, when the element attribute is determined to be the reflection attribute, the corresponding influence contour is taken as a reflection contour, and the initial interference region is regionally shielded and adjusted based on the reflection contour and the selected radius to obtain a shielded interference region.

[0036] It can be understood that when the element attribute is determined to be the reflection attribute, the influencing element blocks the straight-line propagation of the electromagnetic wave, and forms a region not affected by the electromagnetic interference behind the influencing element relative to the interference midpoint, and then the region needs to be removed from the shielding. The corresponding influence contour is taken as a reflection contour, and the initial interference region is regionally shielded and adjusted based on the reflection contour and the selected radius to remove the region not affected by the electromagnetic interference, and a shielded interference region is obtained.

[0037] The regionally shielded and adjusted indicates that the region shielded by the reflection contour is removed from the initial interference region, and the range actually affected by the interference is retained as the shielded interference region.

[0038] In some embodiments, (when the element attribute is determined to be the reflection attribute, the corresponding influence contour is taken as a reflection contour, and the initial interference region is regionally shielded and adjusted based on the reflection contour and the selected radius to obtain a shielded interference region) in S13 includes S131-S135: In S131, when the element attribute is determined to be the reflection attribute, the corresponding influence contour is taken as a reflection contour.

[0039] It can be understood that the influence contour of the influencing element with the reflection attribute is defined as the reflection contour.

[0040] S132, taking the intersection of the selected radius and the reflection profile as a selected intersection point, connecting the selected intersection point and the interference midpoint to obtain a contact radius, and segmenting the reflection profile based on the selected intersection point to obtain two segmented profile lines.

[0041] As can be understood, as shown in Figure 2 , the intersection of the selected radius and the reflection profile is taken as the selected intersection point, and since there are two selected radii, there are two selected intersection points. The selected intersection points are connected with the interference midpoint to obtain two contact radii. The reflection profile is segmented based on the selected intersection points to obtain two segmented profile lines.

[0042] Among them, the contact radius refers to the straight line segment connecting the interference midpoint and the selected midpoint, and the segmented profile line refers to the curve segment obtained by segmenting the reflection profile with the selected intersection point as the segmentation point. Two segmented profile lines form a complete reflection profile.

[0043] S133, obtaining the surrounding area surrounded by the contact radius and each segmented profile line, and selecting the smallest surrounding area as the normal area.

[0044] As can be understood, as shown in Figure 3 , when the reflection profile is segmented into two segmented profile lines, the contact radius and the two segmented profile lines will respectively surround two surrounding areas of different sizes, and the surrounding area with smaller area is selected as the normal area, because the area with larger area contains the self part of the influencing element, and the area with smaller area is the unblocked space between the interference source and the influencing element.

[0045] Among them, the surrounding area refers to the closed space surrounded by two contact radii and a single segmented profile line, and the normal area refers to the surrounding area with smaller area selected from the two surrounding areas.

[0046] S134, selecting the to-be-selected area composed of the selected radius and the area contour of the initial interference area as the reflection processing area.

[0047] As can be understood, the two selected radii and the area contour of the initial interference area will surround two different to-be-selected areas, and the to-be-selected area where the reflection profile is located is selected as the reflection processing area.

[0048] Among them, the to-be-selected area refers to the area surrounded by the two selected radii and the area contour of the initial interference area.

[0049] S135, obtaining a shielding area according to the difference set of the reflection processing area and the normal area, and obtaining a shielding interference area based on the difference set of the initial interference area and the shielding area.

[0050] It can be understood that after the definition of the reflection processing area and the normal area is completed, the area actually shielded by the reflected contour needs to be calculated. In the reflection processing area, both the normal area that is not shielded and the part shielded by the reflected contour are included, so the shielding area is obtained from the difference set of the reflection processing area and the normal area, and then the shielding area is removed from the initial interference area to obtain the shielding interference area actually affected by the electromagnetic interference, which represents the actual interference area under the condition that the influence element is of the reflection attribute.

[0051] S14, when the element attribute is determined to be an enhancement attribute, the corresponding influence contour is taken as an enhancement contour, and the initial interference area is adjusted in area increase based on the enhancement contour and the selected radius to obtain an enhancement interference area.

[0052] It can be understood that when the element attribute is determined to be an enhancement attribute, the influence element will enhance the electromagnetic interference and expand the interference distance, resulting in that the actual influence range exceeds the initial interference area. The corresponding influence contour is taken as an enhancement contour, and the initial interference area is adjusted in area increase based on the enhancement contour and the selected radius to obtain an enhancement interference area.

[0053] wherein the adjustment in area increase means expanding the initial interference area, and the enhancement interference area refers to the area obtained after the initial interference area is adjusted in area increase.

[0054] In some embodiments, the step S14 (when the element attribute is determined to be an enhancement attribute, the corresponding influence contour is taken as an enhancement contour, and the initial interference area is adjusted in area increase based on the enhancement contour and the selected radius to obtain an enhancement interference area) includes S141-S145: S141, when the element attribute is determined to be an enhancement attribute, the corresponding influence contour is taken as an enhancement contour, and the area corresponding to the enhancement contour is taken as an enhancement area.

[0055] It can be understood that the influence contour of the influence element with the enhancement attribute is defined as the enhancement contour, and the area surrounded by the enhancement contour is taken as the enhancement area.

[0056] S142, according to the selected radius and the area contour of the initial interference area, the selected area where the enhancement contour is located is taken as an enhancement processing area.

[0057] It can be understood that, as shown in Figure 4 two selected radii and the area contour of the initial interference area will enclose two different selected areas, and the selected area where the enhancement contour is located is taken as an enhancement processing area.

[0058] The to-be-selected region refers to a region surrounded by the two selected radii and the region contour of the initial interference region.

[0059] S143, constructing a plurality of interference radii as enhancement radii in the enhanced processing region, obtaining the intersection of each of the enhancement radii and the enhanced region to obtain an enhanced line segment corresponding to each of the enhancement radii.

[0060] It can be understood that a plurality of interference radii passing through the enhanced region are constructed with the interference center as the origin, and the interference radius is taken as the enhancement radius. The intersection of each enhancement radius and the enhanced region is calculated to obtain an enhanced line segment corresponding to each enhancement radius. The longer the enhanced line segment, the stronger the enhancement effect in that direction.

[0061] The enhanced line segment refers to the intersection line segment of the enhanced radius and the enhanced region.

[0062] S144, counting the number of pixel points at each of the enhanced line segments to obtain an enhancement number corresponding to each of the enhancement radii, and extending the corresponding enhancement radius based on the enhancement number with the interference midpoint as the origin to obtain an extended point.

[0063] It can be understood that after the enhanced line segment is determined, the length of the enhanced line segment needs to be converted into a quantifiable index, and the extension distance of the interference radius is determined accordingly. Each enhanced line segment is processed to count the number of pixel points on each enhanced line segment, and the enhancement number of each enhanced line segment is obtained according to the number of pixel points.

[0064] It should be noted that the enhancement number here is not necessarily equal to the number of pixel points on the enhanced line segment. When the material or structure of the influencing element is different, the gain coefficient is different, and the gain effect of electromagnetic interference is significantly different (for example, the gain of a metal resonant cavity is higher than that of a plastic shell for different influencing elements; for a single influencing element, the gain of a hollow structure is lower than that of a closed structure). If the number of pixel points of the enhanced line segment is directly equated to the enhancement number, the influence of the material or structure on the gain will be ignored, resulting in a disconnection between the extension distance and the actual enhancement effect. The enhancement number is obtained by multiplying the number of pixel points on each enhanced line segment by the corresponding enhancement radius gain coefficient. The specific gain coefficient can be determined in combination with the prior art, which will not be described here.

[0065] Further, see Figure 4 After the enhancement number corresponding to each of the enhancement radii is determined, the extension distance is calculated based on the enhancement number, that is, the extension distance is calculated by the number of added pixel points. Specifically, the extension distance refers to the product of the number of added pixel points (the enhancement number) and the unit length of the pixel points. The corresponding enhancement radius is extended by the extension distance with the interference midpoint as the origin to obtain an extended point.

[0066] The enhancement quantity refers to the number of pixel points corresponding to the distance by which the enhancement radius extends out of the initial interference area, and is a value calculated by a gain coefficient determined by the number of pixel points of the enhancement line segment and the material or structure of the influence element. The extension point refers to the end point of the extension line after the extension of the enhancement radius.

[0067] In S145, the profile intersection points of the selected radius and the region profile of the initial interference area are obtained, adjacent extension points are connected, and the profile intersection points and the nearest extension points are connected to obtain the enhanced interference area.

[0068] It can be understood that after obtaining the extension points of the respective enhancement radii through the S144 step, it is necessary to connect these discrete extension points into a continuous boundary to form a complete enhanced interference area.

[0069] The profile intersection points of the selected radius and the region profile of the initial interference area are obtained, and because there are two selected radii, there are two profile intersection points. Adjacent extension points are connected, and the profile intersection points and the nearest extension points are connected, such as the left profile intersection point connected with the leftmost extension point and the right profile intersection point connected with the rightmost extension point. The new enclosed area obtained by connecting adjacent extension points and connecting profile intersection points with the nearest extension points is the enhanced interference area, which includes the initial interference area and the newly added interference range due to the enhancement attribute.

[0070] The enhanced interference area represents the actual interference area when the influence element is of the enhancement attribute.

[0071] The profile intersection point refers to the intersection point of the selected radius and the region profile of the initial interference area.

[0072] In S15, when the element attribute is determined to be the attenuation attribute, the corresponding influence profile is taken as the attenuation profile, and the initial interference area is adjusted in the region based on the attenuation profile and the selected radius to obtain the attenuation interference area.

[0073] It can be understood that when the element attribute is determined to be the attenuation attribute, the influence element will attenuate the electromagnetic interference and reduce the interference distance, resulting in an actual influence range smaller than the initial interference area. The corresponding influence profile is taken as the attenuation profile, and the initial interference area is adjusted in the region based on the attenuation profile and the selected radius to remove the reduced range caused by the attenuation attribute to obtain the attenuation interference area.

[0074] The region attenuation adjustment means reducing the initial interference area, and removing the reduced range caused by the attenuation attribute on the initial interference area. The attenuation interference area refers to the region obtained after the region attenuation adjustment of the initial interference area.

[0075] In some embodiments, the step S15 (determining that the element attribute is an attenuation attribute, taking the corresponding influence contour as an attenuation contour, performing regional attenuation adjustment on the initial interference region based on the attenuation contour and the selected radius to obtain an attenuation interference region) comprises S151-S155: S151, when it is determined that the element attribute is an attenuation attribute, taking the corresponding influence contour as an attenuation contour, and taking the region corresponding to the attenuation contour as an attenuation region.

[0076] It can be understood that the influence contour of the influence element with the attenuation attribute is defined as the attenuation contour, and the region surrounded by the attenuation contour is taken as the attenuation region.

[0077] S152, selecting the to-be-selected region where the attenuation contour is located as an attenuation processing region according to the to-be-selected region composed of the selected radius and the region contour of the initial interference region.

[0078] It can be understood that two selected radii and the region contour of the initial interference region will enclose two different to-be-selected regions, and the to-be-selected region where the attenuation contour is located is selected as the attenuation processing region.

[0079] The to-be-selected region refers to the region enclosed by the two selected radii and the region contour of the initial interference region.

[0080] S153, constructing a plurality of interference radii as attenuation radii in the attenuation processing region, obtaining the intersection of each attenuation radius and the attenuation region to obtain an attenuation line segment corresponding to each attenuation radius.

[0081] It can be understood that a plurality of interference radii passing through the attenuation region are constructed with the interference center as the origin, and the interference radius is taken as the attenuation radius. The intersection of each attenuation radius and the attenuation region is calculated to obtain an attenuation line segment corresponding to each attenuation radius. The attenuation line segment quantifies the attenuation range in different directions. The shorter the attenuation line segment, the stronger the attenuation effect in that direction.

[0082] The attenuation line segment refers to the intersection line segment of the attenuation radius and the attenuation region.

[0083] S154, counting the number of pixel points at each attenuation line segment to obtain an attenuation number corresponding to each attenuation radius, and shortening the corresponding attenuation radius based on the attenuation number with the interference midpoint as the origin to obtain an attenuation point.

[0084] It can be understood that after the attenuation line segment is determined, the length of the attenuation line segment needs to be converted into a quantifiable index, and the shortening distance of the interference radius is determined accordingly. Each attenuation line segment is processed to count the number of pixel points on each attenuation line segment, and the attenuation number of each attenuation line segment is obtained according to the number of pixel points.

[0085] It should be noted that the number of attenuations here is not necessarily equal to the number of pixel points on the attenuation line segment. When the material or structure of the influencing element is different, the attenuation coefficient is different, and the attenuation effect on electromagnetic interference is significantly different. For example, the attenuation effect of the front of the metal shielding cover is usually stronger than the side. If the number of pixel points of the attenuation line segment is directly equated to the number of attenuations, the influence of the material or structure on the attenuation will be ignored, resulting in a disconnection between the actual attenuation effect and the shortened distance. The number of attenuations is obtained by multiplying the number of pixel points on each attenuation line segment by the corresponding attenuation radius attenuation coefficient. The specific attenuation coefficient can be determined in combination with the existing technology, and will not be described here.

[0086] Further, after determining the number of attenuations corresponding to each attenuation radius, the shortened distance is calculated based on the number of attenuations, that is, the shortened distance is calculated by reducing the number of pixel points. Specifically, the shortened distance is the product of the number of reduced pixel points (the number of attenuations) and the unit length of the pixel points. Taking the midpoint of the interference as the origin, the corresponding attenuation radius is shortened by the shortened distance to obtain the attenuation point.

[0087] Wherein, the number of attenuations refers to the number of pixel points corresponding to the distance of the attenuation radius shrinking into the initial interference region. The number is calculated by the number of pixel points of the attenuation line segment and the attenuation coefficient determined by the material or structure of the influencing element. The attenuation point refers to the endpoint after the attenuation radius is shortened.

[0088] S155, obtain the profile intersection of the selected radius and the region profile of the initial interference region, connect the adjacent attenuation points, and connect the profile intersection and the nearest attenuation point to obtain the attenuation interference region.

[0089] It can be understood that after obtaining the attenuation points of each attenuation radius through the S154 step, the discrete attenuation points need to be connected into a continuous boundary to form a complete attenuation interference region.

[0090] The profile intersection of the selected radius and the region profile of the initial interference region is obtained. Because there are two selected radii, there are two profile intersections. The adjacent attenuation points are connected, and the profile intersection and the nearest attenuation point are connected, for example, the left profile intersection is connected with the leftmost attenuation point, and the right profile intersection is connected with the rightmost attenuation point. The new enclosed area obtained by connecting the adjacent attenuation points and connecting the profile intersection and the nearest attenuation point is the attenuation interference region, which is the region of the initial interference region after attenuation adjustment.

[0091] The attenuation interference region represents the actual interference region when the influencing element has attenuation properties.

[0092] Wherein, the profile intersection refers to the intersection of the selected radius and the region profile of the initial interference region.

[0093] S2, obtaining the backbone devices in the actual interference area as the affected devices, obtaining the remaining backbone devices in the backbone link as the fixed devices, obtaining the interference type of the interference source, determining the switching device based on the device position of the affected device and the interference type, and selecting the type of the switching device.

[0094] It can be understood that after the actual interference area (such as the shielding interference area, the enhanced interference area, and the attenuated interference area) is determined, the specific influence of the actual interference area on the backbone devices in the backbone link needs to be further determined. If there is no backbone device in the actual interference area, the entire product line or device can be normally used. If there is a backbone device in the actual interference area, the backbone devices in the actual interference area in the backbone link are taken as the affected devices, and the remaining backbone devices in the backbone link are taken as the fixed devices.

[0095] It should be noted that the electromagnetic interference affects the implementation of the functions of the device, so the interference type means that the interference source has affected the implementation of some function types of the device. Obtaining the interference type of the interference source actually means obtaining the function type affected by the interference source. For example, the device A mentioned in S1 is required to sort the circular products at the No. 1 position in the backbone link, but the device A also has a function of sorting the diamond products. If the electromagnetic interference makes the device A unable to sort the diamond products, but only can sort the circular products, the interference type is diamond sorting.

[0096] Further, the switching device is determined based on the device position of the affected device and the interference type, and the type of the switching device is selected. According to the characteristics of most flow lines, each specific position has a specific work content, that is, the device position reflects the work content of the affected device. For example, the No. 1 position requires the device to perform the sorting of the circular products, the device A at the No. 1 position is in the actual interference area, and if the interference type is diamond sorting, the device A is not affected because the execution type of the device A is circular sorting and no switching is required. If the interference type is circular sorting, the device A is affected and needs to be switched, and the device A is the switching device and the circular sorting is the selected type.

[0097] The interference type means the influence category of the electromagnetic interference on the function of the device, the device position of the affected device means the station position of the affected device in the backbone link, different device positions correspond to different execution functions, the switching device means the device for replacing the affected device disturbed by the interference source, and the selected type means the function type required to be met by the switching device, which is determined by the function type of the affected device disturbed by the interference source.

[0098] In some embodiments, the step S2 (determining the switching device based on the device position of the influencing device and the interference type, and the selection type of the switching device) comprises S21-S22: S21, determining the operation type of the influencing device based on the device position of the influencing device in the backbone link.

[0099] It can be understood that in the industrial backbone link, the station position of the device is related to the functional role it undertakes, so the operation type of the influencing device is determined based on the device position of the influencing device in the backbone link.

[0100] Wherein, the operation type refers to the functional type of the device operation. For example, the No. 1 position requires the device to perform circular sorting, and the device A has both circular sorting and diamond sorting functions, but can only perform circular sorting at the No. 1 position, so the operation type of the device A is circular sorting, which is determined according to the device position.

[0101] S22, when the operation type of the influencing device is in the interference type, the corresponding influencing device is determined as the switching device, and the operation type of the corresponding influencing device is determined as the selection type.

[0102] It can be understood that the interference type may have one or more, and when the operation type of the influencing device is in the interference type, the influencing device corresponding to the operation type needs to be switched, and the corresponding influencing device is determined as the switching device, and the corresponding operation type is determined as the selection type.

[0103] S3, based on the selection type, statistics of the standby devices on the standby link to obtain a standby sequence, calling an external switching strategy and the standby sequence to configure a corresponding standby replacement device on the backbone link, and the switching type of the standby replacement device.

[0104] It can be understood that after determining the switching device and the selection type (such as "circular sorting"), the standby device suitable for the selection type needs to be selected from the standby link, and the replacement is completed in combination with the external switching strategy.

[0105] In some embodiments, the step S3 (based on the selection type, statistics of the standby devices on the standby link to obtain a standby sequence, calling an external switching strategy and the standby sequence to configure a corresponding standby replacement device on the backbone link, and the switching type of the standby replacement device) comprises S31-S35: S31, statistics of the standby devices with the selection type on the standby link to obtain a standby set of each switching device, obtaining the type number of the functional type of each standby device, based on the type number, the standby devices in the standby set are sorted in ascending order, and the standby sequence corresponding to each switching device is obtained.

[0106] It can be understood that multiple backup devices are provided on the backup link, and each backup device can also implement one or more function types. For each switching device, all backup devices on the backup link are traversed to filter out backup devices with a selected type (such as backup devices supporting 'round sorting'), to form a backup set of each switching device. For each backup device in the backup set, the number of function types possessed by the backup device is counted as a type number, and the backup devices in the backup set are sorted in ascending order based on the type number to obtain a backup sequence corresponding to each switching device. Specifically, the backup device with a smaller type number has stronger adaptability and a generally narrower optional range, and needs to be matched first.

[0107] The backup link refers to a working link deployed in parallel with the backbone link and containing multiple backup devices. The backup device refers to a redundant device pre-deployed in the backup link to quickly replace and restore the corresponding function when the backbone link device fails. The backup set refers to a set of backup devices with a selected type filtered from the backup link. The type number refers to the number of function types possessed by the backup device.

[0108] S32, obtaining a function number of function types of the switching device, and sorting the switching device in ascending order based on the function number to obtain a switching sequence.

[0109] It can be understood that for each switching device, the number of function types thereof is counted as a function number, and the switching devices are sorted in ascending order according to the function number to obtain a switching sequence. Specifically, the switching device with a smaller function number needs to be processed first because the optional backup device range thereof is narrow.

[0110] The function number refers to the number of function types possessed by the switching device.

[0111] S33, selecting a first switching device in the switching sequence, and selecting a first backup device in a backup sequence corresponding to the first switching device as a backup replacement device of the first switching device.

[0112] It can be understood that the first switching device in the switching sequence generated in step S32 is selected as the currently prioritized switching device, the backup sequence corresponding to the first switching device is called, and the first backup device in the backup sequence is selected as the backup replacement device of the first switching device.

[0113] The backup replacement device refers to a backup device selected from the backup sequence to replace a certain switching device.

[0114] S34, updating the remaining backup sequence based on the backup replacement device to obtain an updated backup sequence.

[0115] It can be understood that the standby replacement device determined in the identification S33, which may also exist in the remaining standby sequence, is deleted from the remaining standby sequence, and after the deletion, all standby sequences are updated to obtain updated standby sequences.

[0116] Wherein, the remaining standby sequence represents the standby sequence corresponding to all switching devices except the switching device of which the allocation has been completed.

[0117] S35, the first switching device in the switching sequence is deleted to obtain an updated switching sequence, and the step of selecting the first standby device in the standby sequence corresponding to the first switching device as the standby replacement device of the switching device is repeated until the updated switching sequence has no switching device, the standby replacement device of the backbone link is obtained, and the switching type of the standby replacement device is determined based on the device position of the standby replacement device configured in the backbone link.

[0118] It can be understood that the first switching device of which the standby device allocation has been completed in S33 is deleted from the current switching sequence, and the remaining switching devices constitute an updated switching sequence. The updated switching sequence is re-input into the steps of S33-S34 until the updated switching sequence has no switching device, the standby replacement device of the backbone link is obtained, and the switching type of the standby replacement device is determined based on the device position (such as No. 1 position, No. 2 position, etc.) of the standby replacement device configured in the backbone link.

[0119] Wherein, the switching type refers to the switching of the device from the originally performed inherent function type to another function type, and here the switching type of the standby replacement device is consistent with the selection type.

[0120] S4, in response to the body replacement condition, the switching type of the fixed device and the standby replacement device are determined according to the fixed type of the fixed device, the selection type and the function type of the standby device.

[0121] It should be noted that if the standby replacement device of the switching device cannot be found in the standby link, the body replacement condition is issued, the server receives and responds to the body replacement condition, calls the fixed device in the backbone link to undertake the function of the switching device, and calls the standby device in the standby link to undertake the function of the fixed device. For example, the function type of device A at position 1 includes circular sorting and diamond sorting, the interference type is circular sorting, the executed function of device A at position 1 is also circular sorting, device A cannot work, and the standby replacement device cannot be found in the standby link. According to the device B at position 2 in the backbone link, the function type of device B includes circular sorting and square sorting, and the executed function of device B at position 2 is square sorting, device B can be switched to circular sorting (circular sorting is the switching type), and a standby device capable of performing square sorting is found from the standby link and used as a standby replacement device.

[0122] In some embodiments, the step S4 (determining the switching type of the fixed device and the standby replacement device in response to the body replacement condition, according to the fixed type, the selection type of the fixed device, and the function type of the standby device) includes S41-S42: S41, in response to the body replacement condition, determining the running type of the fixed device in the backbone link as the fixed type based on the device position of the fixed device in the backbone link.

[0123] It can be understood that when the standby replacement device of the switching device cannot be found in the standby link, the body replacement condition is triggered, the server responds and starts the S4 process, and the actual running function of the fixed device at the position is extracted as the fixed type based on the device position of the fixed device in the backbone link (such as device A at position 1). For example, the function executed by device A at position 1 is circular sorting, and the fixed type is circular sorting.

[0124] Among them, the running type of the fixed device refers to the function type of the fixed device running in the backbone link.

[0125] S42, when the switching device does not have a standby replacement device, the fixed device has a selection type corresponding to the switching device, and the standby device has a fixed type corresponding to the fixed device, the selection type is used as the switching type of the fixed device, the running type of the corresponding fixed device is switched to the switching type, and the standby device with the fixed type is selected as the standby replacement device of the fixed device.

[0126] It can be understood that the S42 step has three necessary conditions: there is no backup device in the backup link that matches the selection type of the switching device, the fixed device has the selection type of the switching device, and the functional type of the backup device in the backup link has the corresponding fixed type. When the three conditions are met, the selection type is selected as the switching type of the fixed device, and the operation type of the corresponding fixed device is switched to the switching type (for example, device B is switched from square sorting to circular sorting), thereby filling the functional vacancy of the switching device, and finally screening the backup device in the backup link that matches the fixed type (such as square sorting) of the fixed device as the backup replacement device of the fixed device, to ensure the overall function of the link.

[0127] It should be noted that when the backup link has neither a backup replacement device of the switching device nor a backup replacement device of the fixed device, the overall function of the link can be realized by function exchange between the fixed device and the influencing device. In some embodiments, A1-A2 are further included: A1, when it is determined that the switching device has no backup replacement device, the fixed device has the selection type, the backup device has no fixed type, and the switching device has the fixed type, obtaining a limited type of the switching device according to the intersection of the functional type and the interference type of the switching device.

[0128] It can be understood that the A1 step has four necessary conditions: there is no backup device in the backup link that matches the selection type of the switching device, the fixed device has the selection type of the switching device, there is no backup device in the backup link that matches the fixed type of the fixed device, and the switching device has the fixed type of the fixed device. All functional types of the switching device are extracted, and the limited type of the switching device is obtained according to the intersection of the functional type and the interference type of the switching device.

[0129] The limited type refers to the intersection of the functional type and the interference type of the switching device.

[0130] It should be noted that the number of interference types can be 1 or more than 1, so the number of limited types is also more than or equal to 1.

[0131] A2, when it is determined that the limited type has no fixed type, the functional type of the switching device is switched to the fixed type, and the functional type of the corresponding fixed device is switched to the selection type.

[0132] It can be understood that if the limited type of the switching device does not contain the fixed type of the fixed device, i.e., there is no overlap between the two, the switching device will not be disturbed when performing the fixed type function, so the functional type of the switching device is switched to the fixed type, and the functional type of the corresponding fixed device is switched to the selection type.

[0133] Specifically, the function type of the switching device is switched from the original selection type to the fixed type of the fixed device, so that the switching device assumes the original function of the fixed device. Then the function type of the fixed device is switched from the original fixed type to the selection type of the switching device, so that the fixed device fills the functional vacancy of the switching device. After switching, the switching device performs the fixed type function (not disturbed), the fixed device performs the selection type function (not disturbed itself), both core functions of the backbone link are preserved, and no device is disturbed.

[0134] Referring to Figure 5 is a structural schematic diagram of an equipment redundancy switching optimization system under electromagnetic interference provided by an embodiment of the present application, comprising: The area adjustment module is configured to retrieve an initial interference area of the interference source, obtain an influence profile of an influence element in the initial interference area, perform area adjustment on the initial interference area based on the influence profile, and obtain an actual interference area. The switching device module is configured to obtain a backbone device in the actual interference area in the backbone link as an influence device, obtain the remaining backbone devices in the backbone link as fixed devices, retrieve an interference type of the interference source, determine a switching device based on the device position of the influence device and the interference type, and determine a selection type of the switching device. The standby device module is configured to obtain a standby sequence based on the selection type, obtain an external switching strategy and the standby sequence, and configure a corresponding standby replacement device for the backbone link and a switching type of the standby replacement device. The fixed device module is configured to determine a switching type of the fixed device and a standby replacement device in response to a body replacement condition, according to the fixed type, the selection type of the fixed device, and the function type of the standby device.

[0135] Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present application, and not to limit them; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that: it can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacement for part or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A method for optimizing device redundancy switching under electromagnetic interference, characterized in that, The method comprises the following steps: obtaining an initial interference area of the interference source, obtaining an influence profile of an influence element in the initial interference area, adjusting the initial interference area based on the influence profile to obtain an actual interference area; obtaining a backbone device in the actual interference area in the backbone link as an influence device, obtaining the remaining backbone devices in the backbone link as fixed devices, obtaining the interference type of the interference source, determining a switching device based on the device position of the influence device and the interference type, and selecting a type of the switching device; based on the selection type, obtaining a standby sequence of standby devices on the standby link, obtaining a corresponding standby replacement device for the backbone link based on the external switching strategy and the standby sequence, and determining a switching type of the standby replacement device; in response to the body replacement condition, determining a switching type of the fixed device based on the fixed type of the fixed device, the selection type and the function type of the standby device, and determining the standby replacement device.

2. The method of claim 1, wherein the adjusting the initial interference area based on the influence profile to obtain the actual interference area comprises: obtaining an interference midpoint and an interference radius of the initial interference area, rotating the interference radius based on the interference midpoint, and obtaining the number of intersection points of the interference radius and the influence profile in real time, constructing the interference radius at the selection position where the number of intersection points is equal to 1 to obtain a selected radius; obtaining an element attribute of the influence element, the element attribute comprising a reflection attribute, an enhancement attribute and an attenuation attribute; determining that the element attribute is the reflection attribute, taking the corresponding influence profile as a reflection profile, and adjusting the initial interference area based on the reflection profile and the selected radius to obtain a shielding interference area; determining that the element attribute is the enhancement attribute, taking the corresponding influence profile as an enhancement profile, and adjusting the initial interference area based on the enhancement profile and the selected radius to obtain an enhanced interference area; determining that the element attribute is the attenuation attribute, taking the corresponding influence profile as an attenuation profile, and adjusting the initial interference area based on the attenuation profile and the selected radius to obtain an attenuated interference area.

3. The method of claim 2, wherein the determining that the element attribute is the reflection attribute, taking the corresponding influence profile as a reflection profile, and adjusting the initial interference area based on the reflection profile and the selected radius to obtain a shielding interference area comprises: determining that the element attribute is the reflection attribute, and taking the corresponding influence profile as a reflection profile; taking the intersection point of the selected radius and the reflection profile as a selected intersection point, connecting the selected intersection point with the interference midpoint to obtain a contact radius, and segmenting the reflection profile based on the selected intersection point to obtain two segmented profile lines; obtaining an enclosed area surrounded by the contact radius and each of the segmented profile lines, and selecting the smallest enclosed area as a normal area; selecting a to-be-selected area where the reflection profile is located as a reflection processing area based on a to-be-selected area composed of the selected radius and the area profile of the initial interference area; obtaining a shielding area based on the difference set of the reflection processing area and the normal area, and obtaining the shielding interference area based on the difference set of the initial interference area and the shielding area. ​ ​ 4. The method of claim 2, wherein, when the element attribute is determined to be an enhancement attribute, a corresponding influence contour is taken as an enhancement contour, and an initial interference region is adjusted in area based on the enhancement contour and the selected radius to obtain an enhanced interference region, including: determining, when the element attribute is the enhancement attribute, the corresponding influence contour as the enhancement contour, and a region corresponding to the enhancement contour as an enhancement region; selecting, from a to-be-selected region composed of the selected radius and a region contour of the initial interference region, a to-be-selected region where the enhancement contour is located as an enhancement processing region; constructing, in the enhancement processing region, a plurality of interference radii as enhancement radii, obtaining an intersection of each of the enhancement radii and the enhancement region to obtain an enhancement line segment corresponding to each of the enhancement radii; counting a number of pixel points at each of the enhancement line segments to obtain an enhancement number corresponding to each of the enhancement radii; and based on the enhancement number, lengthening a corresponding enhancement radius with a midpoint of the interference as a starting point to obtain a lengthened point.

5. The method of claim 2, wherein, when the element attribute is determined to be an attenuation attribute, a corresponding influence contour is taken as an attenuation contour, and an initial interference region is adjusted in area based on the attenuation contour and the selected radius to obtain an attenuated interference region, including: determining, when the element attribute is the attenuation attribute, the corresponding influence contour as the attenuation contour, and a region corresponding to the attenuation contour as an attenuation region; selecting, from a to-be-selected region composed of the selected radius and a region contour of the initial interference region, a to-be-selected region where the attenuation contour is located as an attenuation processing region; constructing, in the attenuation processing region, a plurality of interference radii as attenuation radii, obtaining an intersection of each of the attenuation radii and the attenuation region to obtain an attenuation line segment corresponding to each of the attenuation radii; counting a number of pixel points at each of the attenuation line segments to obtain an attenuation number corresponding to each of the attenuation radii; and based on the attenuation number, shortening a corresponding attenuation radius with the midpoint of the interference as the starting point to obtain an attenuation point.

6. The method of claim 1, wherein, based on the device position of the influence device and the interference type, determining the switching device and the selection type of the switching device, including: determining an operation type of the influence device based on the device position of the influence device in the backbone link; and determining, when the operation type of the influence device is in the interference type, the corresponding influence device as the switching device, and the operation type of the corresponding influence device as the selection type.

7. The method of claim 1, wherein, based on the selection type, counting backup devices on a backup link to obtain a backup sequence, calling an external switching strategy and the backup sequence to configure a corresponding backup replacement device for the backbone link, and a switching type of the backup replacement device, including: ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ The backup device with the selection type on the statistical backup link obtains a backup set of each switching device, obtains a type number of the function type of each backup device, sorts the backup devices in the backup set in ascending order based on the type number, and obtains a backup sequence corresponding to each switching device; obtain the function number of the function type of the switching device, sort the switching device in ascending order based on the function number, and obtain a switching sequence; select the first switching device in the switching sequence, and select the first backup device in the backup sequence corresponding to the first switching device as the backup replacement device of the switching device; update the remaining backup sequence based on the backup replacement device to obtain an updated backup sequence; delete the first switching device in the switching sequence to obtain an updated switching sequence, and repeat the step of selecting the first backup device in the backup sequence corresponding to the first switching device as the backup replacement device of the switching device until the updated switching sequence does not have a switching device, obtaining a backup replacement device of the backbone link, and determining the switching type of the backup replacement device based on the device position of the backup replacement device configured on the backbone link.

8. The method of claim 6, wherein in response to the main body replacement condition, the switching type of the fixed device is determined based on the fixed type, the selection type of the fixed device, and the function type of the backup device, and the backup replacement device comprises: in response to the main body replacement condition, the operation type of the fixed device in the backbone link is determined as the fixed type based on the device position of the fixed device in the backbone link; when the switching device does not have a backup replacement device, the fixed device has a selection type corresponding to the switching device, and the backup device has a fixed type corresponding to the switching device, the selection type is selected as the switching type of the fixed device, the operation type of the corresponding fixed device is switched to the switching type, and the backup device with the fixed type is selected as the backup replacement device of the fixed device.

9. The method of claim 8, wherein, Further comprising: when the switching device does not have a backup replacement device, the fixed device has a selection type, the backup device does not have a fixed type, and the switching device has a fixed type, the restricted type of the switching device is obtained based on the intersection of the function type and the interference type of the switching device; when the restricted type does not have a fixed type, the function type of the switching device is switched to the fixed type, and the function type of the corresponding fixed device is switched to the selection type.

10. An electromagnetic interference under device redundancy switching optimization system, characterized in that, comprising: a region adjustment module for retrieving an initial interference region of the interference source, obtaining an influence profile of an influence element in the initial interference region, and adjusting the initial interference region based on the influence profile to obtain an actual interference region; a switching device module for obtaining a backbone device in the actual interference region in the backbone link as an influence device, obtaining the remaining backbone devices in the backbone link as fixed devices, retrieving an interference type of the interference source, determining a switching device based on the device position of the influence device and the interference type, and determining a selection type of the switching device; The standby device module is configured to count standby devices on the standby link based on the selection type to obtain a standby sequence, call an external switching strategy and the standby sequence to configure a corresponding standby replacement device for the backbone link, and determine a switching type of the standby replacement device. The fixed device module is configured to determine a switching type of the fixed device according to a fixed type of the fixed device, the selection type and a function type of the standby device in response to the body replacement condition, and determine a switching type of the standby replacement device.

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