Parallel polynomial gradient computation system and method based on cmos synapse transistor
By combining a parallel array architecture and voltage pulse programming in the floating substrate operation mode of CMOS neural synaptic transistors, high-precision polynomial gradient calculations were achieved, solving the process compatibility and reliability issues of memristor solutions, reducing production costs, and improving the manufacturability and computational efficiency of the system.
Patent Information
- Application Number
- CN202610439444.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-03
- Publication Date
- 2026-06-26
- Estimated Expiration
- 2046-04-03
AI Technical Summary
In existing technologies, memristor solutions suffer from problems such as incompatibility between manufacturing processes and standard CMOS processes, low device yield, large differences between devices, state drift, and high power consumption, making it difficult to achieve high-precision parallel polynomial gradient calculations.
By employing CMOS synaptic transistors in floating substrate operation mode and combining them with a parallel array architecture, the conductivity state of the CMOS transistors is adjusted through a voltage pulse programming circuit to achieve dual-mode characteristics of neuronal and synaptic behavior. A neuromorphic computing system based on standard CMOS process is constructed. Utilizing mature CMOS process manufacturing technology, new materials such as memristors and back-end integration processes are avoided, resulting in a highly reliable, low-power, and easily integrated parallel polynomial gradient computing system. This solves the problems of poor process compatibility, low yield, and large device differences faced by memristor solutions, and achieves high-precision polynomial gradient calculation.
It achieves high-precision polynomial gradient calculation based on standard CMOS process, reduces production cost, improves system manufacturability and yield, overcomes device differences and state drift problems in memristor schemes, supports short-term and long-term flexibility, and shortens calculation time.