A continuous-pulse column vector fiber laser cleaning system

Abstract

This invention discloses a continuous-pulse column vector fiber laser cleaning system, comprising a laser generation module, a beam transmission and scanning module, and a motion control module. The laser generation module employs a continuous-pulse column vector laser, which integrates a control module capable of switching between continuous and pulsed output modes. It also integrates a polarization control system capable of freely switching between radial and angular polarization modes according to cleaning process requirements, and selecting to emit either a radially or angularly polarized beam. Within the reliable architecture of a time-sharing hybrid cleaning system, this laser cleaning system utilizes the unique spatial polarization and energy distribution characteristics of a column vector beam to replace the traditional fundamental mode Gaussian beam, achieving a significantly improved advanced laser cleaning system in terms of cleaning quality, process versatility, and overall efficiency.

Description

Technical Field

[0001] This invention relates to the field of laser cleaning technology, and more specifically to a continuous-pulse column vector fiber laser cleaning system. Background Technology

[0002] Laser cleaning technology, as an efficient, environmentally friendly, and non-contact advanced surface treatment method, has shown significant advantages in paint removal, rust removal, oil removal, and oxide layer cleaning in fields such as high-end equipment manufacturing, precision parts processing, and cultural heritage protection. Industrial cleaning lasers are mainly divided into two categories based on their time-output characteristics: continuous lasers and pulsed lasers. These two types differ significantly in their processing mechanisms and application effects, exhibiting both advantages and complementarity. Continuous lasers, with their high average power and long depth of focus, offer advantages such as high material removal rates and a wide cleanable linewidth on a macroscopic scale, resulting in outstanding cleaning efficiency. However, their continuous energy injection easily leads to heat accumulation effects on the surface and subsurface of the processed material, resulting in process risks such as substrate thermal damage and recast layer formation when processing heat-sensitive substrates or high-threshold contaminants. In contrast, pulsed lasers utilize their extremely high peak power and extremely short pulse duration to achieve "cold processing" removal of materials mainly through instantaneous mechanical effects such as photoablation and shock waves. They have the advantages of small heat-affected zone, high processing accuracy, and good cleaning quality. However, their generally existing average power limitation makes cleaning efficiency a major bottleneck when dealing with large areas or thick layers of contaminants.

[0003] To balance cleaning efficiency and processing quality, the industry has proposed a hybrid cleaning technology approach that combines continuous laser and pulsed laser.

[0004] In hybrid laser cleaning technology, time-sharing hybrid cleaning systems are considered the preferred solution for balancing efficiency and quality due to their simple control, low cost, and ability to effectively avoid synchronization interference. However, this system, and indeed all existing hybrid cleaning technologies, still suffer from a fundamental and unresolved technical bottleneck: they universally employ a traditional fundamental mode Gaussian beam as the working light source. This common choice leads to significant deficiencies in cleaning uniformity, efficiency limits, and material adaptability, specifically manifested as follows: The uneven energy distribution of Gaussian beams limits the uniformity and quality of cleaning: Existing time-sharing systems use fundamental mode Gaussian beams with an inherent intensity distribution that is high in the center and decreases towards the edges. When used to scan and clean a two-dimensional area, the energy superposition in the overlapping areas of the scanning trajectory forms an uneven energy envelope, directly leading to uneven distribution of cleaning depth or effect within the working area, resulting in a "zebra stripe" phenomenon where the center is over-cleaned and the edges are not properly cleaned. This inherent energy distribution characteristic severely limits the cleaning quality of the system in applications requiring highly consistent surfaces, becoming a primary obstacle to improving the process.

[0005] The beam shape is singular, lacking the ability to actively control energy distribution and polarization state: Existing technologies lack effective active control over two key physical parameters of the output beam—spatial intensity distribution and polarization state. The fixed shape of the Gaussian beam prevents the system from flexibly adjusting the energy profile of the beam spot according to the characteristics of different contaminants or substrates. For example, it is impossible to generate a ring-shaped beam spot to achieve more uniform energy injection. Simultaneously, its uniform spatial polarization state limits the ability to optimize the material's absorption efficiency of laser energy, control the direction of thermal diffusion, or induce specific physicochemical reactions using polarization characteristics.

[0006] Insufficient adaptability to special materials: Due to the fixed beam shape and polarization state, existing systems are severely incompatible with materials exhibiting anisotropic optical or thermal properties (such as single-crystal silicon, anisotropic crystals, and composite materials). The uniform polarization of a Gaussian beam cannot match the differences in absorption characteristics of anisotropic materials, making it difficult to achieve efficient and uniform energy coupling, thus limiting the application scope of laser cleaning technology in high-end manufacturing and precision machining.

[0007] There are bottlenecks in optimizing cleaning efficiency and thermal management: In continuous laser mode, the concentrated energy at the center of the Gaussian beam, while beneficial for rapid heating and material removal, can easily cause localized thermal damage to heat-sensitive substrates. In pulsed laser mode, the high-energy characteristics at the center help to overcome the ablation threshold, but uniformity issues remain. Existing technologies, while avoiding inter-mode interference through time-division multiplexing, are limited by the Gaussian beam itself, making it difficult to achieve breakthroughs in improving overall cleaning efficiency and optimizing the heat-affected zone. Summary of the Invention

[0008] To address the shortcomings of existing technologies, this invention provides a continuous-pulse column-vector fiber laser cleaning system. Within the reliable architecture of a time-division hybrid cleaning system, this system employs a column-vector fiber laser as the core light source. Utilizing the unique spatial polarization and energy distribution characteristics of the column-vector beam, it replaces the traditional fundamental mode Gaussian beam, systematically solving the core pain points of existing technologies in terms of cleaning uniformity, flexibility, and material adaptability caused by inherent defects in the light source. This results in an advanced laser cleaning system that significantly improves cleaning quality, process versatility, and overall performance.

[0009] A continuous-pulse column vector fiber laser cleaning system includes a laser generation module, a beam transmission and scanning module, and a motion control module; The laser generating module adopts a continuous-pulse column vector laser. The continuous-pulse column vector laser integrates a control module and can switch between continuous output mode and pulse output mode. It also integrates a polarization control system and can freely switch between radial polarization and angular polarization modes according to the cleaning process requirements, and select to emit radially polarized beams or angularly polarized beams. The beam transmission and scanning module includes a collimating and expanding beam system, a two-dimensional scanning galvanometer, a focusing lens, and a protective lens arranged sequentially along the optical path. The motion control module includes a control system and a three-dimensional motion system. The control system is used to realize the intelligent control of the laser cleaning system, and the three-dimensional motion system is used to carry and accurately position the workpiece to be cleaned.

[0010] As a preferred embodiment of the above technical solution, the radially polarized beam is suitable for application scenarios that require a high-intensity longitudinal electric field to enhance material absorption or pursue an extremely small focused spot to improve peak power density; the angularly polarized beam is suitable for materials that are sensitive to heat input or application scenarios that require an extremely uniform energy distribution throughout the entire spot's effective area.

[0011] As a preferred embodiment of the above technical solution, the collimation and beam expansion system is used to collimate the laser beam and adjust its diameter to meet the incident requirements of the subsequent scanning system; the two-dimensional scanning galvanometer is used to drive the laser beam to scan in a two-dimensional plane according to a preset trajectory; the focusing lens focuses the scanned beam; and the protective lens is used to prevent splashes generated during the cleaning process from contaminating the internal optical components.

[0012] As a preferred embodiment of the above technical solution, the control system, as the control center of the entire system, is responsible for coordinating the switching of the working mode of the continuous-pulse column vector laser, controlling the polarization control system inside the laser to select the output radially polarized or angularly polarized beam, controlling the scanning path and speed of the two-dimensional scanning galvanometer, and controlling the motion of the three-dimensional motion system.

[0013] As a preferred embodiment of the above technical solution, the wavelength of the column vector light source emitted by the continuous-pulse column vector laser covers the visible light band, near-infrared band, mid-infrared band, far-infrared band, and ultraviolet band.

[0014] As a preferred embodiment of the above technical solution, the pulse width of the column vector light source emitted by the continuous-pulse column vector laser covers femtoseconds, picoseconds, nanoseconds, microseconds, and milliseconds.

[0015] As a preferred embodiment of the above technical solution, a cooling system is also included, which serves as an auxiliary system for cooling the laser cleaning system.

[0016] Compared with the prior art, the beneficial effects of the present invention are as follows: 1. By introducing the unique annular spot and uniform energy distribution characteristics of the cylindrical vector beam to replace the traditional Gaussian beam, uniform and consistent energy injection is achieved into the working area, thereby fundamentally improving the consistency of cleaning depth and effect.

[0017] 2. By employing fiber lasers capable of outputting columnar vector beams (such as radially polarized and angularly polarized beams), the system is endowed with the ability to flexibly select beams of different polarization states according to cleaning requirements. Utilizing the characteristics of strong longitudinal electric field after focusing radially polarized light and uniform ring energy distribution after focusing angularly polarized light, the system can achieve optimized treatment of different contaminants and substrates, significantly improving the system's process flexibility and adaptability.

[0018] 3. By introducing and utilizing the axisymmetric spatial polarization state of the cylindrical vector beam, it can be matched with the characteristics of anisotropic materials, optimize the energy absorption and thermal process, and broaden the application scope of laser cleaning technology in high-end process scenarios such as processing special materials and achieving low-damage fine cleaning.

[0019] 4. While retaining all the advantages of the time-sharing working mode (such as simple control and no inter-mode interference), the thermal management capability in the continuous laser mode and the shock wave uniformity in the pulsed laser mode are further improved by optimizing the energy distribution of the column vector beam. This ensures the cleaning quality while tapping the potential of the time-sharing working system in terms of cleaning efficiency. Attached Figure Description

[0020] Figure 1 The diagram shows three cylindrical vector beams with different polarization characteristics; where (a) is a radially polarized beam; (b) is an angularly polarized beam; and (c) is a mixed polarized beam.

[0021] Figure 2 The diagrams show the focusing of radially polarized beams and angularly polarized beams; where (a) is a schematic diagram of focusing a radially polarized beam and (b) is a schematic diagram of focusing an angularly polarized beam.

[0022] Figure 3 This is a schematic diagram of the overall framework of the system of the present invention.

[0023] The attached figures are labeled as follows: 1-Continuous-pulse column vector laser, 2-Control system, 3-Cooling system, 4-Collimation and beam expansion system, 5-Two-dimensional scanning galvanometer, 6-Focusing lens, 7-Protective lens, 8-Three-dimensional motion system. Detailed Implementation

[0024] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0025] The present invention will now be described in further detail with reference to the accompanying drawings: Based on the polarization characteristics of cylindrical vector beams, they can be classified into radially polarized beams, angularly polarized beams, and mixed-polarized beams, such as... Figure 1 As shown. Due to the unique distribution of zero intensity at the center of the beam caused by the polarization singularity, it exhibits the following... Figure 1 The donut-shaped transverse field distribution shown gives the columnar vector light unique characteristics.

[0026] The cylindrical vector light, under high numerical aperture focusing conditions, produces a focal electric field distribution different from the fundamental mode beam, and the total focal intensity is: Among them, the radially polarized beam generates an enhanced longitudinal electric field component at the focal center. An angularly polarized beam forms a ring-shaped intensity distribution, and its focal peak intensity can be expressed as: in: The peak intensity of the fundamental mode beam under the same incident power; >1 indicates the center peak enhancement factor after the radially polarized beam is focused; ≤1 indicates the relative peak attenuation factor of the angularly polarized beam at the axis.

[0027] Therefore, by selecting different cylindrical vector polarization structures, the present invention achieves controllable adjustment of local energy density, thereby significantly improving laser cleaning efficiency.

[0028] For a pulsed column vector beam, the power density at the pulsed laser surface is: in For pulse energy, The effective area.

[0029] Because radially polarized beams have a smaller equivalent focal spot area, Enhancement, making: Therefore, it is easier to exceed the desorption threshold of pollutants. This improves pulse cleaning efficiency and reduces energy requirements.

[0030] Continuous lasers primarily remove pollutants through thermal evaporation, vaporization, and gas flow. The temperature rise is caused by: in: A is the absorptivity, P is the incident power, and V is the heated volume.

[0031] Assuming the incident beam is radially polarized, the pupil field is: Under high NA focusing conditions, the electric field of the radially polarized beam in the focal neighborhood is given by the Richards-Wolf integral: Where k is the laser wavenumber and f is the focal length of the focusing lens. The polar angle of the beam. Let φ be the radial coordinate of the focal region, φ be the azimuth angle, z be the axial coordinate of the focal region, and E be the electric field intensity.

[0032] If the incident beam is angularly polarized at this time, the pupil field is: Under high NA focusing conditions, the electric field of the angularly polarized beam in the focal neighborhood is given by the Richards-Wolf integral: The pupil field of radially polarized light consists of a radially polarized component. After high-NA focusing, the intensity of its focused field is mainly concentrated along the longitudinal direction, and the longitudinal electric field distribution is relatively uniform. This distribution characteristic makes it better suited to acting in directions perpendicular to the processing plane, such as penetrating the internal regions of structures like micro-holes and grooves. In contrast, the pupil field of angularly polarized light consists of an angularly polarized component. After high-NA focusing, the electric field of the focused field is mainly concentrated in the transverse processing plane. The transverse electric field concentration is higher, allowing it to directly act on areas parallel to the processing plane, making it suitable for processing or cleaning needs on planar surfaces.

[0033] When this method is applied to laser cleaning, the specific polarization structure characteristics of the focused light field are crucial. For example... Figure 2 As shown in (a), radially polarized light, under tight focusing, produces a significant longitudinal electric field component, i.e., strong electric field oscillations exist in the direction of light propagation. In contrast, as Figure 2As shown in (b), after angularly polarized light is tightly focused, its electric field is mainly maintained in the transverse plane perpendicular to the optical axis and exhibits a symmetrical ring distribution, while the longitudinal electric field is very weak.

[0034] In cleaning and processing scenarios, the two polarization states of vector light exhibit advantages that traditional linearly polarized light does not possess: radially polarized light has a small focused spot, higher peak power obtained by focusing, a flat-topped intensity distribution, no Gaussian strong points in the intensity distribution, uniform absorption in all directions for anisotropic and isotropic materials, and a uniform longitudinal electric field that can reach the interior of vertical gaps that are difficult for ordinary light to cover, effectively removing contaminants hidden therein; the lateral concentrated electric field of angularly polarized light can precisely act on planar surfaces, efficiently treating particles and residual films on substrates such as wafers, while avoiding damage to the substrate. The combination of the two can cover cleaning needs of different forms.

[0035] By adjusting the energy distribution of the column vector beam, the power density at the focal point can be maximized (radial polarization) or homogenized (angular polarization), which can effectively improve heating efficiency and decontamination efficiency.

[0036] To address the characteristics of the aforementioned cylindrical vector beam, this invention proposes a continuous-pulse cylindrical vector fiber laser cleaning system, such as... Figure 3 As shown, it includes a laser generation module, a beam transmission and scanning module, and a motion control module; The laser generating module adopts a continuous-pulse column vector laser 1. The continuous-pulse column vector laser 1 integrates a control module and can switch between continuous output mode and pulse output mode. It also integrates a polarization control system and can freely switch between radial polarization and angular polarization modes according to the cleaning process requirements and select to emit radially polarized beams or angularly polarized beams. The beam transmission and scanning module includes a collimating and beam expanding system 4, a two-dimensional scanning galvanometer 5, a focusing lens 6, and a protective lens 7 arranged sequentially along the optical path; The motion control module includes a control system 2 and a three-dimensional motion system 8. The control system 2 is used to realize the intelligent control of the laser cleaning system, and the three-dimensional motion system 8 is used to carry and accurately position the workpiece to be cleaned.

[0037] In this embodiment, the radially polarized beam is suitable for applications requiring a high-intensity longitudinal electric field to enhance material absorption or to pursue an extremely small focused spot to improve peak power density; the angularly polarized beam is suitable for materials sensitive to heat input or applications requiring an extremely uniform energy distribution throughout the entire spot's effective area.

[0038] In this embodiment, the collimation and beam expansion system 4 is used to collimate the laser beam and adjust its diameter to meet the incident requirements of the subsequent scanning system; the two-dimensional scanning galvanometer 5 is used to drive the laser beam to scan in a two-dimensional plane according to a preset trajectory; the focusing lens 6 focuses the scanned beam; and the protective lens 7 is used to prevent splashes generated during the cleaning process from contaminating the internal optical components.

[0039] In this embodiment, the control system 2 serves as the control center of the entire system. It is responsible for coordinating the switching of the working mode of the continuous-pulse column vector laser 1, controlling the polarization control system inside the laser to select the output radially polarized or angularly polarized beam, controlling the scanning path and speed of the two-dimensional scanning galvanometer 5, and controlling the motion of the three-dimensional motion system 8.

[0040] In this embodiment, the wavelength of the column vector light source emitted by the continuous-pulse column vector laser 1 covers all visible to far-infrared light bands, preferably from 532±10nm in the visible light band, to 1060±10nm, 1080±10nm, and 1550±10nm in the near-infrared band, to 2000±10nm and 3~5μm in the mid-infrared band, 9~14μm in the far-infrared band, and 355nm in the ultraviolet band.

[0041] In this embodiment, a cooling system 3 is also included. The cooling system 3 serves as an auxiliary system for cooling the laser cleaning system. Specifically, the cooling system 3 exchanges heat with the continuous-pulse vector laser 1 and optical components that may generate heat through circulating coolant, ensuring that each core component operates stably at a suitable temperature, thus guaranteeing the stability of the output power and the system lifespan.

[0042] The working principle of this invention is as follows.

[0043] The operator first sets the cleaning process parameters in the human-machine interface of the control system 2, including selecting the working mode of the continuous-pulse column vector laser 1 (continuous or pulsed), setting the beam polarization type (radial polarization or angular polarization), setting the laser power, pulse parameters (when in pulse mode), scanning speed, scanning pattern, and the movement speed of the three-dimensional motion system 8. After the system is started, the cooling system 3 starts working first to ensure the thermal stability of the system. Subsequently, the control system 2 controls the continuous-pulse column vector laser 1 to operate in a time-division multiplexing manner between continuous output mode and pulsed output mode according to the preset process program, and can freely switch the output of radially polarized beams or angularly polarized beams as needed through the polarization control system inside the laser.

[0044] In practical applications, operators can flexibly select the most suitable polarization state of the cylindrical vector beam based on the characteristics of the material to be cleaned and the type of contaminants: Radially polarized beams can be used when dealing with scenarios requiring a high-intensity longitudinal electric field to enhance material absorption (such as for certain metallic materials) or where a very small focused spot is desired to increase peak power density (such as when processing high-threshold contaminants in pulsed mode). Radially polarized light produces a significant longitudinal electric field component under high numerical aperture focusing, which is beneficial for stronger interactions with materials.

[0045] When processing materials sensitive to heat input, or when an extremely uniform energy distribution is required across the entire beam's effective area (such as processing large-area uniform coatings or semiconductor materials with extremely high thermal uniformity requirements), angularly polarized beams can be selected. Angularly polarized light, after focusing, forms a more uniform annular intensity distribution, effectively avoiding localized overheating and achieving uniform heating or ablation.

[0046] For example, the system can first control the continuous-pulse column vector laser 1 to operate in continuous mode and select angular polarization. Utilizing its uniform annular energy distribution, it performs rapid and uniform pre-cleaning of the workpiece surface, effectively avoiding localized thermal damage caused by excessively high energy at the center of the Gaussian beam. After this step is completed, the control system 2 switches the continuous-pulse column vector laser 1 to pulse mode and selects radial polarization. Utilizing its high peak power density and enhanced longitudinal electric field, it performs fine cleaning and removes stubborn contaminants from the same area. Throughout the process, the two-dimensional scanning galvanometer 5 is responsible for rapid pattern scanning within a small area, while the three-dimensional motion system 8 drives the cleaning head to perform slow, large-range movements. The combination of these two systems enables efficient, uniform, and highly adaptable cleaning of the workpiece surface.

[0047] This invention combines a mature and reliable time-sharing working mode with an innovative cylindrical vector beam light source. Without requiring complex synchronization control, it utilizes the unique spatial energy distribution and polarization characteristics of the cylindrical vector beam, especially the controllable switching capability between radial and angular polarization. This effectively overcomes the core defects of existing time-sharing systems, such as poor cleaning uniformity and insufficient adaptability to special materials caused by the use of Gaussian beams, and provides a brand-new, highly flexible laser cleaning solution.

[0048] The first key aspect of this invention is the use of a switchable polarization cylindrical vector laser source for laser cleaning. This technology employs a single continuous-pulse cylindrical vector laser 1 as the core light source. This laser can operate in a time-division multiplexing mode between continuous and pulsed output modes and can freely switch between radial and angular polarization cylindrical vector beams via an internal polarization control system. This technology utilizes the unique axisymmetric polarization characteristics and annular spot energy distribution of cylindrical vector beams to replace traditional Gaussian beams, fundamentally solving the cleaning uniformity problem caused by the uneven energy distribution of Gaussian beams in existing time-division multiplexing cleaning systems.

[0049] The second key aspect of this invention is the ability to switch between any two polarizations, such as continuous radial polarization and angular polarization, and pulsed radial polarization and angular polarization, to meet the needs of different processing techniques. This technology relies on the aforementioned switchable polarization cylindrical vector laser source, enabling switching between radial and angular polarization in continuous output mode as well as switching between the two polarization states in pulsed output mode. It also supports cross-mode polarization switching, such as directly switching from continuous radial polarization to pulsed angular polarization. This multi-dimensional switching capability allows for matching the appropriate beam mode to different cleaning objects and process requirements: for deep cleaning of three-dimensional structures such as micropores, a continuous radial polarized beam is used, utilizing its uniform longitudinal electric field to penetrate deep into the crevices; for surface contaminants on planar substrates, a pulsed angular polarized beam is used, achieving efficient and precise surface cleaning through a concentrated transverse electric field; and for complex workpieces with both planar and three-dimensional structures, different polarization modes can be switched in a time-division manner to meet the cleaning needs of different areas.

[0050] The third key point of this invention is the use of a cylindrical vector light source with wavelengths covering the visible to far-infrared range and pulse widths covering multiple time scales for laser cleaning. The cylindrical vector light source used in this technology has an output wavelength that covers all visible to far-infrared light bands, preferably from 532±10nm in the visible light band, to 1060±10nm, 1080±10nm, and 1550±10nm in the near-infrared band, to 2000±10nm and 3~5μm in the mid-infrared band, 9~14μm in the far-infrared band, and 355nm in the ultraviolet band. Simultaneously, the pulse width can cover multiple time scales such as femtoseconds, picoseconds, nanoseconds, microseconds, and milliseconds, and it also supports continuous output mode. Different wavelengths of column vector beams have different thresholds and absorption characteristics for various contaminants (such as organic residues, metal oxides, and micron particles) and substrate materials (such as metals, semiconductors, and polymers). Beams with different pulse widths correspond to different energy action mechanisms (such as femtosecond cold processing and nanosecond thermal stripping). This technology, through the combination of broad spectrum and multi-pulse parameters, can select matching light source parameters for different cleaning objects, avoiding problems such as low cleaning efficiency and substrate damage in single wavelength or pulse mode.

[0051] The fourth key aspect of this invention is a composite cleaning process based on the polarization selection of cylindrical vector laser beams. This technology, by controlling the pulse-to-continuous switchable mode and the operating mode and polarization state selection of radial and angular cylindrical vector lasers, combined with scanning path and motion trajectory control, forms a variety of cleaning process combinations suitable for different materials and contaminants. This technology overcomes the limitations of traditional single-laser cleaning, achieving high-quality, low-damage cleaning of special materials through the uniform energy distribution and polarization selectivity of the cylindrical vector laser beam.

[0052] The above are merely preferred embodiments of the present invention and are not intended to limit the present invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A continuous-pulse column vector fiber laser cleaning system, characterized in that: It includes a laser generation module, a beam transmission and scanning module, and a motion control module; The laser generating module uses a continuous-pulse column vector laser, which integrates a control module that can switch between continuous output mode and pulse output mode. It also integrates a polarization control system that can freely switch between radial polarization and angular polarization modes and select to emit radially polarized beams or angularly polarized beams according to the cleaning process requirements. The beam transmission and scanning module includes a collimating and expanding beam system, a two-dimensional scanning galvanometer, a focusing lens, and a protective lens arranged sequentially along the optical path. The motion control module includes a control system and a three-dimensional motion system. The control system is used to realize the intelligent control of the laser cleaning system, and the three-dimensional motion system is used to carry and accurately position the workpiece to be cleaned.

2. The continuous-pulse column vector fiber laser cleaning system according to claim 1, characterized in that: The radially polarized beam is suitable for applications requiring a high-intensity longitudinal electric field to enhance material absorption or to pursue an extremely small focused spot to improve peak power density; the angularly polarized beam is suitable for materials sensitive to heat input or applications requiring an extremely uniform energy distribution throughout the entire spot's effective area.

3. The continuous-pulse column vector fiber laser cleaning system according to claim 1, characterized in that: The collimation and beam expansion system is used to collimate the laser beam and adjust its diameter to meet the incident requirements of the subsequent scanning system; the two-dimensional scanning galvanometer is used to drive the laser beam to scan in a two-dimensional plane according to a preset trajectory. The focusing lens focuses the scanned beam, and the protective lens is used to prevent splashes generated during the cleaning process from contaminating the internal optical components.

4. The continuous-pulse column vector fiber laser cleaning system according to claim 1, characterized in that: The control system, as the control center of the entire system, is responsible for coordinating the switching of the working mode of the continuous-pulse column vector laser, controlling the polarization control system inside the laser to select the output radially polarized or angularly polarized beam, controlling the scanning path and speed of the two-dimensional scanning mirror, and controlling the motion of the three-dimensional motion system.

5. The continuous-pulse column vector fiber laser cleaning system according to claim 1, characterized in that: The wavelength of the column vector light source emitted by the continuous-pulse column vector laser covers the visible light band, near-infrared band, mid-infrared band, far-infrared band, and ultraviolet band.

6. The continuous-pulse column vector fiber laser cleaning system according to claim 5, characterized in that: The pulse width of the column vector light source emitted by the continuous-pulse column vector laser covers femtoseconds, picoseconds, nanoseconds, microseconds, and milliseconds.

7. The continuous-pulse column vector fiber laser cleaning system according to claim 1, characterized in that: It also includes a cooling system, which serves as an auxiliary system for cooling the laser cleaning system.

Images