A backing plate for a target assembly

CN122235652APending Publication Date: 2026-06-19KONFOONG MATERIALS INTERNATIONAL CO LTD
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Patent Information

Application Number
CN202610392947.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-03-27
Publication Date
2026-06-19

AI Technical Summary

Technical Problem

During sputtering, particles from the deposition chamber environment can enter the sealed tank when the air is broken, causing abnormal discharge and affecting the stability of the sputtering process.

Method used

Design a backplate for a target assembly with an annular sealing groove on its surface and an exhaust groove connected around it, including a first groove and a second groove. The second groove is shorter than the first groove, and the included angle between the two is an acute angle. The exhaust groove is provided with a threaded groove and a perforated plate or screen to filter the gas and reduce the probability of particles entering the sealing groove.

Benefits of technology

It significantly reduces the probability of particles entering the sealing tank in the deposition chamber environment during cavitation, reduces abnormal discharge, ensures stable sputtering operations, and reduces the number of particles on the film surface to less than 40, with the optimal scheme reaching less than 10.

✦ Generated by Eureka AI based on patent content.

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Abstract

This invention relates to a backplate for a target assembly, specifically to the field of target materials. The backplate for the target assembly has an annular sealing groove surrounding its center on its surface. At least one venting groove is radially connected to the annular sealing groove. The venting groove includes a first groove connecting the annular sealing groove and the edge of the backplate, and a second groove connecting the annular sealing groove and extending towards the center of the backplate. The length of the second groove is less than the length of the first groove. The angle between the line connecting the center of the second groove and the center of the backplate and the line connecting the center of the first groove and the center of the backplate is an acute angle. The backplate for the target assembly provided by this invention, through the design of specific venting grooves, significantly reduces the probability of particles in the deposition chamber environment entering the sealing groove during venting, thereby reducing the occurrence of abnormal discharges during subsequent sputtering and ensuring the stable operation of the sputtering process.
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Citation Information

Patent Citations

  • Sputtering target material and sputtering device

    CN103014639A

  • Machining method of high-precision miniature groove

    CN108857292A

  • Ultrahigh pure aluminum sputtering target material and rolling method thereof

    CN110205590A