High-toughness glass, method for preparing same, and use thereof

Abstract

This invention discloses a high-strength and high-toughness glass, its preparation method, and its applications. The high-strength and high-toughness glass comprises the following components in weight percentage: silicon dioxide 65%-75%; boron trioxide 1%-4%; aluminum trioxide 3%-7%; lithium oxide 5%-10%; sodium oxide 2%-6%; potassium oxide 0%-2.5%; magnesium oxide 1%-5%; zirconium dioxide 3%-6%; phosphorus pentoxide 1%-3%; and cerium dioxide 4.5%-5.0%. The technical problem to be solved is to significantly improve the strength and toughness of the glass by selecting a specific formulation.

Description

Technical Field

[0001] This invention relates to the field of special glass, specifically to a high-strength and tough glass, its preparation method, and its applications. Background Technology

[0002] Space photovoltaics is at a critical stage of rapid evolution from "satellite power supply technology" to "core of space energy system". Currently, triple-junction gallium arsenide cells are the mainstream, and heterojunction (HJT) silicon-based cells are rapidly penetrating. In the future, it will break through to perovskite tandem and space solar power stations. The market size is expected to reach hundreds of billions of US dollars by 2030, with explosive growth along with commercial spaceflight. Radiation-resistant glass is a key material connecting space energy sources and spacecraft, serving as the core protective "mask" for space photovoltaic cells. Its crucial roles in space are primarily fourfold: First, it protects against high-energy radiation, preventing module failure: blocking high-energy particles such as electrons and protons from space, preventing glass blackening due to radiation and damage to the battery's semiconductor structure, ensuring long-term stable photovoltaic power generation; second, it ensures high light transmittance without affecting power generation efficiency: high visible light transmittance while precisely filtering harmful ultraviolet rays, protecting both the battery and encapsulation materials without sacrificing the photoelectric conversion of sunlight; third, it resists the erosion of the extreme space environment: resisting atomic oxygen oxidation and micrometeorite impacts, and withstanding extreme thermal cycles, preventing glass cracking and module aging and detachment; fourth, it provides lightweight structural protection: with an ultra-thin, high-strength design, it protects the batteries while meeting the engineering requirements for spacecraft weight reduction and flexible solar panel folding.

[0003] Achieving both high strength and high radiation resistance has become a key research and development direction for radiation-resistant glass. Currently, the main reported method for improving the strength of radiation-resistant glass is chemical tempering. However, for ultra-thin glass (thickness below 0.12mm), chemical tempering of radiation-resistant glass can easily cause warping, resulting in weak bonding with the battery substrate. Summary of the Invention

[0004] In view of this, the main objective of the present invention is to provide a high-strength and high-toughness glass, its preparation method and application. The technical problem to be solved is to significantly improve the strength and toughness of the glass by selecting a specific formulation.

[0005] The objective of this invention and the technical problem it solves are achieved through the following technical solution. This invention proposes a high-strength and high-toughness glass, comprising the following components by weight percentage: silicon dioxide 65%-75%; boron trioxide 1%-4%; aluminum trioxide 3%-7%; lithium oxide 5%-10%; sodium oxide 2%-6%; potassium oxide 0%-2.5%; magnesium oxide 1%-5%; zirconium dioxide 3%-6%; phosphorus pentoxide 1%-3%; and cerium dioxide 4.5%-5.0%.

[0006] The objectives of this invention and the technical problems solved can be further achieved by the following technical measures.

[0007] Preferably, the aforementioned high-strength and high-toughness glass comprises the following components in weight percentage: silicon dioxide 70%-75%; boron trioxide 1%-2%; aluminum trioxide 3%-6%; lithium oxide 6%-8%; sodium oxide 4%-6%; potassium oxide 0%-1.0%; magnesium oxide 1%-2%; zirconium dioxide 3%-4.5%; phosphorus pentoxide 1%-2%; and cerium dioxide 4.8%-5.0%.

[0008] Preferably, the aforementioned high-strength and high-toughness glass has a bending strength of 265 MPa or higher and a fracture toughness of ≥1.0 MPa·m. 1 / 2 Transmittance T≥90.5%@400nm, T≥92%@450nm-1100nm.

[0009] The objectives of this invention and the technical problems it solves can be further achieved by the following technical measures. This invention proposes a method for preparing high-strength and high-toughness glass, comprising the following steps: S1 Weigh out the corresponding raw materials according to the content of each component of high strength and toughness glass, and mix them evenly; S2 involves melting the uniformly mixed raw materials at high temperature, clarifying and homogenizing them using mechanical stirring, forming them through a discharge process, and then annealing them to obtain a glass blank. S3 involves microcrystallizing the glass blank to obtain the high-strength and tough glass.

[0010] The objectives of this invention and the technical problems solved can be further achieved by the following technical measures.

[0011] Preferably, in the aforementioned method for preparing high-strength and tough glass, in step S1, the silicon dioxide is introduced in the form of quartz sand, the aluminum oxide is introduced in the form of aluminum oxide, the boron oxide is introduced in the form of boric acid, the lithium oxide is introduced in the form of lithium oxide, lithium carbonate, or lithium nitrate, the sodium oxide is introduced in the form of sodium oxide, sodium carbonate, or sodium nitrate, the potassium oxide is introduced in the form of potassium oxide, potassium carbonate, or potassium nitrate, the magnesium oxide is introduced in the form of magnesium oxide, magnesium carbonate, or magnesium nitrate, the zirconium dioxide is introduced in the form of zirconium oxide, zirconium carbonate, or zirconium nitrate, the phosphorus pentoxide is introduced in the form of phosphorus pentoxide or ammonium dihydrogen phosphate, and the cerium dioxide is introduced in the form of cerium oxide, cerium carbonate, or cerium nitrate.

[0012] Preferably, in the aforementioned method for preparing high-strength and tough glass, in step S2, the high-temperature melting temperature is 1550℃-1610℃, and the time is 5h-10h.

[0013] Preferably, in the aforementioned method for preparing high-strength and tough glass, in step S2, the mechanical stirring speed is 40 rpm-60 rpm and the time is 5 h-10 h.

[0014] Preferably, in the aforementioned method for preparing high-strength and tough glass, in step S2, the temperature for the material forming process is 1150℃-1200℃, and the preheating temperature is 300℃-450℃.

[0015] Preferably, in the aforementioned method for preparing high-strength and tough glass, in step S2, the annealing temperature is 530℃-560℃ and the time is 1h-4h.

[0016] Preferably, in the aforementioned method for preparing high-strength and tough glass, in step S3, the microcrystallization treatment includes nucleation treatment and crystallization treatment; the nucleation temperature is 550℃-600℃, and the nucleation time is 6h-16h; the crystallization temperature is 660℃-700℃, and the crystallization time is 1h-2h.

[0017] The objectives of this invention and the technical problems it solves can also be achieved by the following technical measures. This invention proposes a spacecraft comprising a space photovoltaic cell, wherein the space photovoltaic cell is provided with the aforementioned high-strength and tough glass.

[0018] The objectives of this invention and the technical problems it solves can also be achieved by the following technical measures. This invention proposes a radiation protection material, wherein the radiation protection material is made of the aforementioned high-strength and tough glass.

[0019] Compared with existing technologies, the high-strength and high-toughness glass, its preparation method, and its applications described in this invention have the following beneficial effects: The high-strength and high-toughness glass provided by this invention contains a relatively large amount of zirconium dioxide and phosphorus pentoxide as nucleating agents for composite microcrystallization. After microcrystallization, the flexural strength of the radiation-resistant glass increases from 70 MPa to over 265 MPa, and the fracture toughness is ≥1.0 MPa·m. 1 / 2 Transmittance T≥90.5%@400nm, T≥92%@450nm-1100nm.

[0020] The high-strength and tough glass composition provided by this invention contains a high content of cerium dioxide. At the same time, the nanocrystals generated by microcrystallization reduce the glass irradiation color center, thereby improving the glass's resistance to high-energy electron irradiation and ensuring that the glass transmittance attenuation rate after irradiation is ≤0.2%.

[0021] 3. The high-strength and tough glass composition provided by the present invention contains a high content of zirconium dioxide, and the chemical stability of the glass is significantly improved by the nanocrystals generated by microcrystallization, and the water resistance stability is not lower than HBG1 level.

[0022] The above description is merely an overview of the technical solution of the present invention. In order to better understand the technical means of the present invention and to implement it in accordance with the contents of the specification, the preferred embodiments of the present invention are described in detail below. Detailed Implementation

[0023] To further illustrate the technical means and effects adopted by the present invention to achieve its intended purpose, the following detailed description, in conjunction with preferred embodiments, provides a high-strength and tough glass, its preparation method, and its specific implementation methods, structures, features, and effects according to the present invention. In the following description, different "embodiments" or "embodiments" do not necessarily refer to the same embodiment. Furthermore, specific features, structures, or characteristics in one or more embodiments can be combined in any suitable form.

[0024] Unless otherwise specified, all materials and reagents mentioned below are commercially available products well-known to those skilled in the art; unless otherwise specified, all methods described are methods known in the art. Unless otherwise defined, the technical or scientific terms used should have the ordinary meaning understood by those skilled in the art. Where specific experimental steps or conditions are not specified below, they can be performed according to the conventional experimental steps or conditions described in the literature in this field.

[0025] A high-strength and high-toughness glass according to some embodiments of the present invention comprises the following components in weight percentage: silicon dioxide 65%-75%; boron trioxide 1%-4%; aluminum oxide 3%-7%; lithium oxide 5%-10%; sodium oxide 2%-6%; potassium oxide 0%-2.5%; magnesium oxide 1%-5%; zirconium dioxide 3%-6%; phosphorus pentoxide 1%-3%; and cerium dioxide 4.5%-5.0%. Silicon dioxide, boron trioxide, and aluminum oxide are the basic components, while lithium oxide, sodium oxide, potassium oxide, magnesium oxide, zirconium dioxide, phosphorus pentoxide, and cerium dioxide are the functional components of the glass provided in the embodiments of the present invention. These basic components and the functional components are used together to prepare the high-strength and high-toughness glass.

[0026] In some optional embodiments, the high-strength and tough glass comprises the following components in weight percentage: silicon dioxide 70%-75%; boron trioxide 1%-2%; aluminum trioxide 3%-6%; lithium oxide 6%-8%; sodium oxide 4%-6%; potassium oxide 0%-1.0%; magnesium oxide 1%-2%; zirconium dioxide 3%-4.5%; phosphorus pentoxide 1%-2%; and cerium dioxide 4.8%-5.0%.

[0027] In the above technical solution, the roles and contents of each component are selected as follows: Silica is an important network former for the high-strength and tough glass provided by this invention, which can improve the glass-forming ability, strength, and chemical stability of the glass. This invention controls the weight percentage of silica to 65%-75%, preferably 70%-75%, which ensures both a homogeneous glass and high chemical stability. If the weight percentage of this component is below 65%, the glass-forming ability and chemical properties deteriorate; if the weight percentage of this component exceeds 75%, the glass viscosity increases significantly, making it difficult to obtain a homogeneous body.

[0028] Boron trioxide is an important network formant in the high-strength and tough glass provided by this invention, which can improve the glass-forming ability. This invention controls the weight percentage of boron trioxide to 1%-4%, preferably 1%-2%, which not only obtains a homogeneous glass body but also lowers the glass melting temperature. If the weight percentage of this component is less than 1%, the glass-forming ability deteriorates; if the weight percentage of this component exceeds 4%, the high-energy electron irradiation attenuation rate of the glass increases.

[0029] Aluminum oxide (A₂O₃) is a crucial network intermediate in the high-strength and tough glass provided by this invention. It can adjust the glass network structure and improve glass-forming ability. This invention controls the weight percentage of A₂O₃ to 3%-7%, preferably 3%-6%, which ensures both a homogeneous glass body and excellent high-energy electron irradiation attenuation rate. If the weight percentage of this component is below 3%, the glass-forming ability deteriorates; if the weight percentage of this component exceeds 7%, the glass viscosity increases significantly, making it difficult to obtain a homogeneous body.

[0030] Lithium oxide is an essential component for high-strength and tough glass to reduce melting temperature and facilitate microcrystallization. In this invention, the weight percentage of lithium oxide is controlled at 5%-10%, preferably 6%-8%. If the weight percentage of this component is less than 5%, the glass melting temperature increases, glass-forming properties deteriorate, and microcrystallization becomes difficult to achieve reinforcement; if the weight percentage of this component exceeds 10%, the chemical stability of the glass deteriorates.

[0031] Sodium oxide is an essential component for reducing the melting temperature of high-strength and tough glass. In this invention, the weight percentage of sodium oxide is controlled at 2%-6%, preferably 4%-6%. If the weight percentage of this component is less than 4%, the glass melting temperature increases, and the glass-forming properties deteriorate; if the weight percentage of this component exceeds 8%, it leads to a decrease in the chemical stability of the glass.

[0032] Potassium oxide is an essential component for high-strength and tough glass to reduce its melting temperature. In this invention, the weight percentage of potassium oxide is controlled to be 0%-2.5%, preferably 0%-1%. If the weight percentage of this component exceeds 2%, the chemical stability of the glass deteriorates.

[0033] Magnesium oxide is an essential component for high-strength and tough glass to reduce melting temperature and improve chemical stability. In this invention, the weight percentage of magnesium oxide is controlled at 1%-5%, preferably 1%-2%. If the weight percentage of this component is less than 1%, the glass melting temperature is high and the chemical stability deteriorates; if the weight percentage of this component exceeds 5%, it leads to poor glass-forming properties.

[0034] Zirconia is an essential component for high-strength and tough glass to achieve excellent chemical stability and microcrystallization. In this invention, the weight percentage of zirconium dioxide is controlled at 3%-6%, preferably 3%-4.5%. If the weight percentage of this component is less than 3%, the chemical stability of the glass deteriorates, its crystallization ability is poor, and its bending strength and fracture toughness are low; if the weight percentage of this component exceeds 6%, it leads to an increased tendency for glass crystallization, reduced light transmittance, and difficulty in obtaining transparent microcrystalline glass.

[0035] Phosphorus pentoxide is an essential component for the microcrystallization of high-strength and tough glass. In this invention, the weight percentage of phosphorus pentoxide is controlled at 1%-3%, preferably 1%-2%. If the weight percentage of this component is less than 1%, the glass's crystallization ability is poor; if the weight percentage of this component exceeds 3%, it leads to an increased tendency for glass crystallization, reduced light transmittance, and difficulty in obtaining transparent microcrystalline glass.

[0036] Cerium dioxide is an essential component for high-strength and tough glass to resist high-energy electron irradiation. In this invention, the weight percentage of cerium dioxide is controlled at 4.5%-5%, preferably 4.8%-5%. If the weight percentage of this component is less than 4.5%, the glass's resistance to high-energy electron irradiation deteriorates, and the light transmittance of the glass decreases significantly after irradiation; if the weight percentage of this component exceeds 5%, it leads to severe glass discoloration, resulting in low light transmittance before irradiation.

[0037] Tests showed that the high-strength and high-toughness glass has a bending strength of over 265 MPa and a fracture toughness of ≥1.0 MPa·m. 1 / 2 Transmittance T≥90.5%@400nm, T≥92%@450nm-1100nm.

[0038] Some embodiments of the present invention also provide a method for preparing high-strength and high-toughness glass, comprising the following steps: S1 Weigh the corresponding raw materials according to the content of each component of high strength and toughness glass, and mix them evenly in a Pt-10Rh crucible; the silicon dioxide is introduced in the form of quartz sand, the aluminum oxide is introduced in the form of aluminum oxide, the boron oxide is introduced in the form of boric acid, the lithium oxide is introduced in the form of lithium oxide, lithium carbonate or lithium nitrate, the sodium oxide is introduced in the form of sodium oxide, sodium carbonate or sodium nitrate, the potassium oxide is introduced in the form of potassium oxide, potassium carbonate or potassium nitrate, the magnesium oxide is introduced in the form of magnesium oxide, magnesium carbonate or magnesium nitrate, the zirconium dioxide is introduced in the form of zirconium oxide, zirconium carbonate or zirconium nitrate, the phosphorus pentoxide is introduced in the form of phosphorus pentoxide or ammonium dihydrogen phosphate, and the cerium dioxide is introduced in the form of cerium oxide, cerium carbonate or cerium nitrate. S2 involves uniformly mixing the raw materials in a Pt-10Rh crucible and then melting it in a high-temperature melting furnace at 1550℃-1610℃ for 5-10 hours. If the melting temperature is below 1550℃, the glass melting effect will be poor, and stones will be present. If the melting temperature is above 1610℃, the glass viscosity will be very low, ammonium difluoride will volatilize significantly, and the glass will have heavy coloration and low light transmittance. If the melting time is less than 5 hours, the glass melting effect will be poor, and stones will be present. If the melting time is longer than 10 hours, the pentoxide content will increase. The volatilization of phosphorus oxide and boron trioxide is accelerated, causing the glass properties to deviate from the design. Mechanical stirring is used to clarify and homogenize the glass. After being formed by die casting at 1150℃-1200℃ to a preheated mold at 300℃-450℃, the glass blank is annealed at 530℃-560℃ for 1-4 hours to obtain a glass blank. If the die casting temperature is below 1150℃, the glass viscosity is too high, resulting in poor flowability and making die casting impossible. If the die casting temperature is above 1200℃, the glass viscosity is too low, making it difficult to control the die casting rate. Furthermore, if the preheated mold temperature is too low... If the temperature is below 300℃, the formed glass will crack; if the preheating temperature of the mold is above 450℃, glass is prone to sticking to the mold, affecting continuous forming; if the annealing temperature is below 530℃, the annealing effect of the glass will be poor, and cracking will occur; if the annealing temperature is above 560℃, the glass will soften and deform; if the annealing time is less than 1 hour, the annealing effect of the glass will be poor, and cracking will easily occur; if the annealing time is longer than 4 hours, it will easily lead to increased energy consumption and increased costs; the mechanical stirring is: during the melting process, a paddle is used. The glass is stirred using a stirrer at a speed of 40-60 rpm for 5-10 hours. If the stirring speed is below 40 rpm, the glass will not be well clarified and homogenized, resulting in poor optical uniformity and even the presence of stones. If the stirring speed is above 60 rpm, the reliability of the stirring equipment will decrease, making it difficult to operate stably for a long time, and the molten glass will be prone to splashing. If the stirring time is less than 5 hours, the glass will not be well clarified and homogenized. If the stirring time is more than 10 hours, it will easily lead to increased energy consumption and costs.

[0039] S3 involves microcrystallizing the glass blank in a crystallization furnace to obtain transparent, high-strength, and tough glass; the microcrystallization process includes nucleation and crystallization; the nucleation temperature is 550℃-600℃, and the nucleation time is 6h-16h; the crystallization temperature is 660℃-700℃, and the crystallization time is 1h-2h. If the nucleation temperature is below 550℃, the glass cannot nucleate and no crystal nuclei can form. If the nucleation temperature is above 600℃, the crystal nuclei will grow, affecting the glass's light transmittance. If the nucleation time is less than 6 hours, enough crystal nuclei cannot precipitate inside the glass. If the nucleation time is longer than 16 hours, the crystal nuclei will grow abnormally, reducing light transmittance. If the crystallization temperature is below 660℃, the crystal nuclei cannot grow rapidly, failing to significantly improve the glass's mechanical properties. If the crystallization temperature is above 700℃, the crystal nuclei will grow abnormally, severely reducing the glass's light transmittance. If the crystallization time is less than 1 hour, the crystal nuclei precipitated in the glass cannot grow significantly, failing to significantly improve the glass's mechanical properties. If the crystallization time is longer than 2 hours, the crystal nuclei will grow abnormally, reducing light transmittance.

[0040] Some embodiments of the present invention also provide a spacecraft comprising a space photovoltaic cell on which the aforementioned high-strength and tough glass is disposed. This arrangement, in addition to ensuring a high-energy radiation attenuation rate of less than 0.2%, significantly improves the glass strength and enhances its resistance to mechanical impact.

[0041] Some embodiments of the present invention also provide a radiation protection material, which employs the aforementioned high-strength and tough glass. This radiation protection material can be used as a cover sheet for space photovoltaics, a satellite thermal control protection substrate, and an observation window in the nuclear power field, exhibiting a high-energy radiation attenuation rate of less than 0.2%.

[0042] In the above technical solution, the high-strength and high-toughness glass of the present invention contains a relatively large amount of zirconium dioxide and phosphorus pentoxide as nucleating agents for composite microcrystallization. After microcrystallization, the flexural strength of the radiation-resistant glass is increased from 70 MPa to over 265 MPa, and the fracture toughness is increased from 0.6 MPa·m. 1 / 2 Increased to 1.0 MPa·m 1 / 2 The transmittance is T≥90.5%@400nm and T≥92%@450nm-1100nm. The high-strength and tough glass contains a high content of cerium dioxide, and the nanocrystals generated by microcrystallization reduce the glass's irradiation color center, thereby improving the glass's resistance to high-energy electron irradiation and ensuring that the transmittance attenuation rate after irradiation is ≤0.2%. Furthermore, the high-strength and tough glass contains a high content of zirconium dioxide, and the nanocrystals generated by microcrystallization significantly improve the glass's chemical stability, with water resistance not lower than HBG1 level. This solves the problems of poor strength and toughness in existing technologies and expands its application fields.

[0043] The present invention will be further described below with reference to specific embodiments, but this should not be construed as a limitation on the scope of protection of the present invention. Some non-essential improvements and adjustments made by those skilled in the art based on the above description of the present invention still fall within the scope of protection of the present invention. Example 1

[0044] Weigh the corresponding weights of raw materials according to the glass composition in Table 1, and mix them evenly to obtain a batch. Add the batch to a Pt-4Rh crucible and melt it at 1550℃ for 10 hours. Mechanically stir the molten glass using a frame stirrer at 40 rpm for 10 hours. Using a pouring method, form the homogenized molten glass into a mold preheated at 300℃, with a forming temperature of 1150℃. Anneal the formed glass at 530℃ for 4 hours, then turn off the annealing furnace power. Subsequently, the obtained glass blank undergoes microcrystallization treatment: nucleation temperature at 550℃ for 16 hours, crystallization temperature at 660℃ for 1 hour, and finally, perform performance tests on the obtained high-strength and tough glass. Example 2

[0045] Weigh the corresponding weights of raw materials according to the glass composition in Table 1, and mix them evenly to obtain a batch. Add the batch to a Pt-4Rh crucible and melt it at 1610℃ for 5 hours. Mechanically stir the molten glass using a frame stirrer at 60 rpm for 5 hours. Using a pouring method, form the homogenized molten glass into a mold preheated at 300℃, with a forming temperature of 1200℃. Anneal the formed glass at 540℃ for 1 hour, then turn off the annealing furnace power. Subsequently, the obtained glass blank undergoes microcrystallization treatment: nucleation temperature at 600℃ for 6 hours, crystallization temperature at 680℃ for 2 hours, and finally, perform performance tests on the obtained high-strength and tough glass. Example 3

[0046] Weigh the corresponding weights of raw materials according to the glass composition in Table 1, and mix them evenly to obtain a batch. Add the batch to a Pt-4Rh crucible and melt it at 1580℃ for 8 hours. Mechanically stir the molten glass using a frame stirrer at 50 rpm for 8 hours. Using a pouring method, form the homogenized molten glass into a mold preheated at 450℃, with a forming temperature of 1160℃. Anneal the formed glass at 560℃ for 2 hours, then turn off the annealing furnace power. Subsequently, the obtained glass blank undergoes microcrystallization treatment: nucleation temperature at 580℃ for 12 hours, crystallization temperature at 700℃ for 1 hour, and finally, perform performance tests on the obtained high-strength and tough glass. Example 4

[0047] Weigh the corresponding weights of raw materials according to the glass composition in Table 1, and mix them evenly to obtain a batch. Add the batch to a Pt-4Rh crucible and melt it at 1600℃ for 6 hours. Mechanically stir the molten glass using a frame stirrer at 50 rpm for 6 hours. Using a pouring method, form the homogenized molten glass into a mold preheated at 400℃, with a forming temperature of 1200℃. Anneal the formed glass at 560℃ for 4 hours, then turn off the annealing furnace power. Subsequently, the obtained glass blank undergoes microcrystallization treatment: nucleation temperature at 580℃ for 10 hours, crystallization temperature at 680℃ for 1 hour, and finally, perform performance tests on the obtained high-strength and tough glass. Example 5

[0048] Weigh the corresponding weights of raw materials according to the glass composition in Table 1, and mix them evenly to obtain a batch. Add the batch to a Pt-4Rh crucible and melt it at 1580℃ for 7 hours. Mechanically stir the molten glass using a frame stirrer at 60 rpm for 8 hours. Using a pouring method, form the homogenized molten glass into a mold preheated at 350℃, with a forming temperature of 1150℃. Anneal the formed glass at 550℃ for 4 hours, then turn off the annealing furnace power. Subsequently, the obtained glass blank undergoes microcrystallization treatment: nucleation temperature at 560℃ for 16 hours, crystallization temperature at 680℃ for 2 hours, and finally, perform performance tests on the obtained high-strength and tough glass. Example 6

[0049] Weigh the corresponding weights of raw materials according to the glass composition in Table 1, and mix them evenly to obtain a batch. Add the batch to a Pt-4Rh crucible and melt it at 1580℃ for 5 hours. Mechanically stir the molten glass using a frame stirrer at 40 rpm for 10 hours. Using a pouring method, form the homogenized molten glass into a mold preheated at 400℃, with a forming temperature of 1170℃. Anneal the formed glass at 530℃ for 4 hours, then turn off the annealing furnace power. Subsequently, the obtained glass blank undergoes microcrystallization treatment: nucleation temperature at 570℃ for 14 hours, crystallization temperature at 680℃ for 2 hours, and finally, perform performance tests on the obtained high-strength and tough glass.

[0050] Comparative Example 1 Weigh the corresponding weights of raw materials according to the glass components in Table 1. The glass preparation method is the same as in Example 6.

[0051] Comparative Example 2 Weigh the corresponding weights of raw materials according to the glass components in Table 1. The glass preparation method is the same as in Example 6.

[0052] Comparative Example 3 Weigh the raw materials according to the glass components in Table 1, and prepare the glass using the same method as in Example 6. No microcrystallization treatment was performed during the glass preparation process.

[0053] The high-strength and high-toughness glasses prepared in Examples 1-6 and Comparative Examples 1-3 of the present invention were subjected to performance tests in the following manner. The specific performance test results are shown in Table 1.

[0054] The light transmittance attenuation rate was tested according to the method specified in GJB 1976A-2021 "Specification for Radiation-resistant Glass Cover Sheets for Space Use".

[0055] The flexural strength was tested according to the method in GB / T 37781-2019 "Test Method for Bending Strength of Glass Materials".

[0056] Fracture toughness was tested according to the method of GB / T 37900-2019 "Test Method for Hardness and Fracture Toughness of Ultrathin Glass - Small Load Vickers Hardness Indentation Method".

[0057] The light transmittance was tested according to the method in JC / T 185-2013 "Optical Quartz Glass".

[0058] Water resistance stability was tested according to the method of GB / T6582-2021 "Particle test method and classification of water resistance of glass at 98℃", and the test results are shown in Table 1.

[0059] Table 1. Composition and performance test results of high-strength and tough glasses in Examples 1-6 and Comparative Examples 1-3

[0060] As can be seen from Table 1, the high-strength and high-toughness glass prepared in Examples 1-6 of this invention exhibits excellent comprehensive performance, with a bending strength ≥265MPa and a fracture toughness ≥1.0MPa·m. 1 / 2 The glass in Comparative Example 1 exhibits the following characteristics: high-energy electron irradiation attenuation rate ≤0.2%, light transmittance T≥90.5%@400nm, T≥92%@450nm-1100nm, and water resistance stability of HBG1. In contrast, the glass in Comparative Example 2 lacks zirconium dioxide and phosphorus pentoxide, making microcrystallization difficult, resulting in low flexural strength and fracture toughness, as well as poorer chemical stability, classifying it as HBG2. The glass in Comparative Example 2, lacking cerium dioxide, exhibits extremely poor resistance to high-energy electron irradiation. The glass blank in Comparative Example 3 was not microcrystallized, leading to low flexural strength and fracture toughness.

[0061] The high-strength and tough glass of Example 1 was processed into an ultra-thin cover sheet with a thickness of 0.1 mm, which was used as a protective cover sheet for triple-junction gallium arsenide space photovoltaic cells in spacecraft. This ultra-thin cover sheet showed no significant darkening of the color center under long-term irradiation by high-energy electrons and protons in space, with a high-energy electron irradiation attenuation rate of 0.16%, a bending strength of 265 MPa, and a fracture toughness of 1.0 MPa·m. 1 / 2 It can withstand atomic oxygen erosion, micrometeorite impact and extreme temperature cycle shock, without warping or cracking; its water resistance stability reaches HBG1 level, with low vacuum gas release and no risk of pollution, meeting the requirements of long service life and high reliability for spacecraft. Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit it. Although the present invention has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention, and all such modifications or substitutions should be covered within the scope of the claims of the present invention.

[0062] Numerous specific details are set forth in this specification. However, it will be understood that embodiments of the invention may be practiced without these specific details. In some embodiments, well-known methods, structures, and techniques have not been shown in detail so as not to obscure the understanding of this specification.

[0063] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not describe the various possible combinations separately.

[0064] Furthermore, various different embodiments of the present invention can be combined in any way, as long as they do not violate the spirit of the present invention, they should also be regarded as the content disclosed by the present invention.

[0065] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of the present invention shall still fall within the scope of the technical solution of the present invention.

Claims

1. A high-strength and high-toughness glass, characterized in that, It includes the following components by weight percentage: silicon dioxide 65%-75%; boron trioxide 1%-4%; aluminum trioxide 3%-7%; lithium oxide 5%-10%; sodium oxide 2%-6%; potassium oxide 0%-2.5%; magnesium oxide 1%-5%; zirconium dioxide 3%-6%; phosphorus pentoxide 1%-3%; and cerium dioxide 4.5%-5.0%.

2. The high-strength and high-toughness glass as described in claim 1, characterized in that, The high-strength and tough glass comprises the following components in weight percentage: silicon dioxide 70%-75%; boron trioxide 1%-2%; aluminum trioxide 3%-6%; lithium oxide 6%-8%; sodium oxide 4%-6%; potassium oxide 0%-1.0%; magnesium oxide 1%-2%; zirconium dioxide 3%-4.5%; phosphorus pentoxide 1%-2%; and cerium dioxide 4.8%-5.0%.

3. The high-strength and high-toughness glass as described in claim 1, characterized in that, The high-strength and high-toughness glass has a bending strength of ≥265MPa and a fracture toughness ≥1.0MPa·m. 1 / 2 Transmittance T≥90.5%@400nm, T≥92%@450nm-1100nm.

4. A method for preparing high-strength and high-toughness glass, characterized in that, Includes the following steps: S1 Weigh out the corresponding raw materials according to the content of each component of high strength and toughness glass, and mix them evenly; S2 involves melting the uniformly mixed raw materials at high temperature, clarifying and homogenizing them using mechanical stirring, forming them through a discharge process, and then annealing them to obtain a glass blank. S3 involves microcrystallizing the glass blank to obtain the high-strength and tough glass.

5. The method for preparing high-strength and tough glass as described in claim 4, characterized in that, In step S1, the silica is introduced in the form of quartz sand, the alumina is introduced in the form of alumina, the boron trioxide is introduced in the form of boric acid, the lithium oxide is introduced in the form of lithium oxide, lithium carbonate or lithium nitrate, the sodium oxide is introduced in the form of sodium oxide, sodium carbonate or sodium nitrate, the potassium oxide is introduced in the form of potassium oxide, potassium carbonate or potassium nitrate, the magnesium oxide is introduced in the form of magnesium oxide, magnesium carbonate or magnesium nitrate, the zirconium dioxide is introduced in the form of zirconium oxide, zirconium carbonate or zirconium nitrate, the phosphorus pentoxide is introduced in the form of phosphorus pentoxide or ammonium dihydrogen phosphate, and the cerium dioxide is introduced in the form of cerium oxide, cerium carbonate or cerium nitrate.

6. The method for preparing high-strength and tough glass as described in claim 4, characterized in that, In step S2, the high-temperature melting temperature is 1550℃-1610℃, and the time is 5h-10h.

7. The method for preparing radiation-resistant glass as described in claim 4, characterized in that, In step S2, the mechanical stirring speed is 40 rpm-60 rpm, and the time is 5 h-10 h; the temperature for material extrusion forming is 1150℃-1200℃, and the preheating temperature is 300℃-450℃; the annealing temperature is 530℃-560℃, and the time is 1 h-4 h.

8. The method for preparing radiation-resistant glass as described in claim 4, characterized in that, In step S2 and step S3, the microcrystallization treatment includes nucleation treatment and crystallization treatment; the nucleation temperature is 550℃-600℃ and the nucleation time is 6h-16h; the crystallization temperature is 660℃-700℃ and the crystallization time is 1h-2h.

9. A spacecraft, characterized in that, It includes a space photovoltaic cell array, wherein the space photovoltaic cells are provided with the high-strength and tough glass as described in any one of claims 1-3.

10. A radiation protection material, characterized in that, The radiation protection material is the high-strength and tough glass described in any one of claims 1-3.

Images