High vacuum furnace temperature control method and system based on partitioned thermal field reconstruction

By reconstructing the thermal field in the high vacuum furnace and implementing PID feedback control, the problem of uneven temperature control was solved, thereby improving the coating quality and processing accuracy.

CN122406176APending Publication Date: 2026-07-17XINAN VACUUM TECH (JIANGSU) CO LTD
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Patent Information

Authority / Receiving Office
CN ยท China
Patent Type
Applications(China)
Current Assignee / Owner
XINAN VACUUM TECH (JIANGSU) CO LTD
Filing Date
2026-06-11
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing high vacuum furnaces suffer from uneven temperature control during the coating process, resulting in unstable coating quality and low processing precision.

Method used

By using a partitioned thermal field reconstruction method, the coating processing area inside the high vacuum furnace is divided into multiple processing sub-regions. Based on the cell properties and metal properties, the optimal temperature control parameter scheme is generated, and a PID control mechanism is used for feedback regulation to optimize the temperature distribution.

Benefits of technology

It achieves precise control of temperature uniformity and deposition rate during the coating process, thereby improving coating quality and processing accuracy.

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Abstract

The application discloses a high-vacuum furnace temperature control method and system based on partitioned thermal field reconstruction, and relates to the technical field of furnace temperature feedback control. The method comprises the following steps: dividing a coating processing area of a photovoltaic cell in a high-vacuum furnace according to a temperature difference distribution, and determining a plurality of processing sub-areas; performing metal deposition rate analysis, and determining a standard deposition rate curve; based on the temperature control parameter threshold values of a plurality of heating elements in the high-vacuum furnace, taking the approximation of the standard deposition rate curve as the target, performing temperature control parameter optimization according to the plurality of processing sub-areas, and generating an optimal temperature control parameter scheme; controlling the high-vacuum furnace to coat the cell to be processed according to the optimal temperature control parameter scheme, and performing feedback regulation according to a preset PID control mechanism. The technical problems that the temperature control of the high-vacuum furnace is uneven during the coating process, and the processing precision is low and the coating quality is unstable in the prior art are solved, and the technical effects that the coating quality and the processing precision are improved through multi-point temperature control optimization are achieved.
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