Ion irradiation transmission electron microscopy sample preparation method and storage medium

Abstract

This invention discloses a sample preparation method and storage medium for ion irradiation transmission electron microscopy, comprising: cutting a metal sheet to obtain a blanking sheet; acquiring surface images and / or thickness distribution information of the blanking sheet, identifying candidate blanking regions, and determining the effective ion irradiation region; determining the target blanking position and target blanking posture, so that the target observation area of ​​the blanked sample covers the effective ion irradiation region; inputting candidate die parameters and image features and thickness features corresponding to the target blanking position and target blanking posture into a trained optimization model to determine the target die parameters; using a punch and die corresponding to the target die parameters to blank at the target blanking position and target blanking posture, and simultaneously forming a directional positioning notch, a repositioning reference mark, and a liquid exchange auxiliary structure; and performing a forming quality re-inspection on the blanked sample for subsequent precision thinning, corrosion immersion, and transmission electron microscopy observation.

Description

Technical Field

[0001] This invention relates to the field of mold manufacturing, and specifically to a method for sample preparation and storage medium for ion irradiation transmission electron microscopy. Background Technology

[0002] With the deepening research on nuclear energy materials, reactor structural materials, and materials used in irradiated environments, the microstructural evolution and corrosion behavior characterization of metallic or alloy materials after ion irradiation have received increasing attention. Transmission electron microscopy (TEM), due to its high spatial resolution, can provide detailed observation of irradiation-induced defects, precipitate evolution, dislocation structures, and localized corrosion damage characteristics, and has become an important analytical tool in the study of the microstructure of ion-irradiated materials. Especially in scenarios requiring comparison of microstructural changes in the same region before and after exposure to corrosive media, how to prepare TEM samples that retain the effective ion irradiation layer while facilitating subsequent repeated localization and observation has become a key technical issue in related research.

[0003] In existing technologies, the preparation of transmission electron microscope (TEM) samples typically employs methods such as mechanical thinning, blanking, dual-jet electrolytic thinning, and focused ion beam cutting and transfer. Conventional circular sample preparation methods often rely on standard shapes, which, while convenient for loading, often fail to ensure stable coverage of the target observation area within the effective ion irradiation region for samples with shallow ion irradiation depths. Furthermore, it is difficult to achieve repeated observation of the same area before and after subsequent etching and immersion. Another approach involves focused ion beam cutting and welding the micro-sample to a support. While this allows for some localized sampling, the welded structure is susceptible to galvanic corrosion in corrosive media due to the potential difference between dissimilar metals. Additionally, there is a risk of sample detachment during transfer and immersion, affecting the accuracy and stability of subsequent characterization results. Moreover, existing blanking sample preparation methods often rely on manual experience to select the blanking area and die parameters, lacking collaborative analysis of surface defects, thickness distribution, and the location of the ion irradiation area, resulting in poor consistency and applicability of the prepared samples.

[0004] Therefore, existing technologies have at least the following problems: First, it is difficult to balance the quality of the candidate punching area and the position of the effective ion irradiation area during sample preparation, ensuring that the target observation area of ​​the punched sample stably covers the effective ion irradiation area; second, it is difficult to achieve repeated positioning observation of the same area before and after corrosion while ensuring sample loading adaptability; third, existing welded micro-area sampling schemes are prone to introducing galvanic corrosion and sample detachment risks; fourth, existing mold design and punching process lack coordinated optimization of sample surface condition, punching position, punching posture, and mold parameters, easily causing edge tearing, overall warping, and observation area shift. Therefore, it is necessary to propose an ion irradiation transmission electron microscopy sample preparation method and mold to improve the accuracy, stability, and repeatability of subsequent observations. Summary of the Invention

[0005] To achieve the above and other related objectives, this invention discloses a method for sample preparation using ion irradiation transmission electron microscopy, comprising: Cut the metal or alloy material into sheets of a predetermined size and grind them to the desired consistency. Thick, resulting in a thin sheet to be punched; Collect surface images and / or thickness distribution information of the sheet to be punched, identify candidate punching areas, and determine the effective area for ion irradiation; Based on the candidate punching region and the effective ion irradiation region, the target punching position and target punching posture are determined so that the target observation area of ​​the punched sample covers the effective ion irradiation region. The candidate die parameters, along with the image features and thickness features corresponding to the target punching position and the target punching posture, are input into the trained optimization model to determine the target die parameters. Using a punch and die corresponding to the target die parameters, blanking is performed at the target blanking position according to the target blanking posture to form a die with a maximum outer diameter of [missing information]. The sample shape is determined, and orientation positioning notches, repositioning reference marks, and liquid exchange auxiliary structures are formed simultaneously. The forming quality of the punched samples is re-inspected. Qualified samples are cleaned, numbered, and sealed for subsequent precision thinning, etching immersion, and transmission electron microscopy observation.

[0006] Preferably, acquiring the surface image and / or thickness distribution information of the sheet to be punched includes: The thin sheet to be punched is imaged or its contour measured using at least one of an industrial camera with a microscope lens and coaxial light source, a metallurgical microscope, a white light interferometer, or a laser confocal device. The collected results are then input into the defect identification model to identify scratches, holes, inclusions, indentations, edge cracks, and areas of abnormal thickness, and the candidate punching areas are output. The defect identification model is any one of convolutional neural networks, U-Net networks, Mask R-CNN networks, visual Transformer networks, or combinations thereof.

[0007] Preferably, determining the effective ion irradiation area includes: The effective ion irradiation area is determined based on the ion beam spot size, scan trajectory record, reference markers set before irradiation, or differences in surface features after irradiation. Determining the target punching position and target punching attitude based on the candidate punching region and the effective ion irradiation region includes: The effective ion irradiation region is registered with the candidate punching region to generate multiple candidate punching positions and candidate punching postures. The target punching position and target punching posture that make the sample target observation area cover the effective ion irradiation region are selected according to the coverage. The coverage rate is determined according to the following formula: in, This represents the projected area of ​​the effective region for ion irradiation. This represents the area of ​​the target observation region of the sample. Indicates coverage rate.

[0008] Preferably, when determining the target punching position and the target punching posture, the coverage is controlled. Not lower than the preset coverage threshold Furthermore, the target punching position is located within the candidate punching area to reduce the risk of edge crack propagation, thickness anomaly areas falling into the target observation area, or the irradiated area deviating from the target observation area after punching. This represents the coverage threshold.

[0009] Preferably, the optimization model is used to output the forming safety probability, edge deformation prediction value, warpage prediction value, and target observation area offset prediction value corresponding to the candidate mold parameters; The optimized model was obtained through joint training of finite element stamping simulation samples and historical actual sample preparation samples. The optimization model is represented in the following form: in, This represents the optimization model. This indicates the optimization of model parameters. This represents a surface image of the sheet to be punched. This indicates the defect distribution results. Indicates thickness distribution information. Indicates the effective area for ion irradiation. Indicates the candidate mold parameters. Indicates the candidate's stance on arbitration. This represents the probability of safe forming.

[0010] Preferably, the candidate mold parameters satisfy the following definition: in, Indicates the diameter of the sample's outer shape. Indicates the length of the directional positioning notch. Indicates the width of the directional positioning notch. Indicates the radius of the edge-release fillet. This indicates the number of shallow tanks in the liquid exchange auxiliary structure. This indicates the width of the shallow groove in the liquid exchange auxiliary structure. This indicates the distance between the repositioning reference mark and the outer edge of the sample. The target die parameters are determined by optimizing the forming safety probability under the conditions of satisfying the coverage threshold, the maximum plastic deformation threshold, and the maximum warpage threshold constraints.

[0011] Preferably, when punching the sheet to be punched using a punch and die corresponding to the target die parameters, the die clearance between the punch and die is 3% to 8% of the thickness of the sheet to be punched; and at least one of low-speed punching, graded loading, and edge clamping is used to reduce the risk of sample edge tearing, overall warping, or local stress concentration.

[0012] Preferably, the directional positioning notch, the repositioning reference mark, and the liquid exchange auxiliary structure are all located in the non-primary observation area of ​​the sample; the repositioning reference mark is any one of a cross shape, a triangle, a short arc shape, or a dot matrix shape; the liquid exchange auxiliary structure is a shallow groove structure or a local decompression texture structure; and before and after the sample is corroded and soaked, the same area is repeatedly positioned and observed using the directional positioning notch and the repositioning reference mark.

[0013] In a second aspect, the present invention discloses a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the method described thereon.

[0014] This invention combines candidate punching region identification, effective ion irradiation region determination, target punching position and orientation determination, die parameter optimization, and specialized stamping forming. This enables the target observation area of ​​the prepared sample to more stably cover the effective ion irradiation region, thereby improving the accuracy of microstructure characterization after irradiation. Simultaneously, by forming directional positioning notches, repositioning reference marks, and liquid exchange auxiliary structures on the sample, repeated positioning observation of the same area before and after corrosion immersion can be achieved, improving sample stability during immersion. Furthermore, this invention eliminates the need for welding to fix the sample, effectively avoiding galvanic corrosion and sample transfer / detachment problems caused by potential differences between dissimilar metals. Through synergistic optimization of punching position, punching orientation, and die parameters, the risks of sample edge tearing, overall warping, and observation area shift are reduced, thereby improving sample consistency and applicability. Attached Figure Description

[0015] The above and other features, advantages, and aspects of the embodiments of this disclosure will become more apparent from the accompanying drawings and the following detailed description. The drawings are provided for a better understanding of the invention and are not intended to limit the scope of this disclosure. In the drawings, the same or similar reference numerals denote the same or similar elements, wherein: Figure 1 This is a flowchart of a method according to an embodiment of the present invention. Detailed Implementation

[0016] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0017] Reference Figure 1 This invention provides a method for sample preparation for ion irradiation transmission electron microscopy (TEM) and a stamping die for implementing the method. It is suitable for microstructure characterization, comparative observation of the same area before and after corrosion, and corrosion resistance analysis of metallic or alloy materials after ion irradiation. This method addresses the problems of shallow effective ion irradiation layers, the difficulty of ensuring stable coverage of the effective ion irradiation area by traditional circular sample preparation, and the susceptibility of samples cut by focused ion beams and welded to a support to galvanic corrosion during immersion and easy detachment during transfer. Through candidate punching area identification, determination of the effective ion irradiation area, determination of the target punching position and orientation, optimization model to determine target die parameters, dedicated die punching, and forming quality re-inspection, samples suitable for subsequent precision thinning, corrosion immersion, and TEM observation are obtained.

[0018] In this embodiment, a metal or alloy material irradiated with ions is first selected as the object to be processed. The material can be austenitic stainless steel, iron-chromium-aluminum alloy, zirconium alloy, or other metal materials that require evaluation of post-irradiation microstructure evolution and corrosion resistance. The original material is cut into sheets of a predetermined size using wire cutting, precision cutting, or other low-damage cutting methods, preferably into sheets of a predetermined size. The sheet material was then subjected to progressive mechanical grinding to reduce its thickness to a minimum. The resulting sheet is then punched. Preferably, the mechanical grinding gradually transitions from coarse-grit sandpaper to fine-grit sandpaper, and deburring is performed on the edges of the sheet after grinding to reduce stress concentration and crack initiation during subsequent punching. More preferably, anhydrous ethanol, acetone, or other cleaning solutions suitable for metal surfaces can be used to pre-clean the sheet to remove adhering particles and oil.

[0019] Preferably, surface images and / or thickness distribution information of the sheet to be punched are acquired before punching. Surface image acquisition can be achieved using an industrial camera with a microscope lens and coaxial light source, or using a metallurgical microscope; thickness distribution information acquisition can be achieved using a white light interferometer, a laser confocal microscope, or other surface profile measurement equipment. Through the above acquisition process, surface images and / or thickness distribution information of the sheet to be punched are formed, providing basic data for subsequent candidate punching area identification and target punching position determination.

[0020] The collected results are input into a defect recognition model to identify scratches, holes, inclusions, indentations, edge cracks, and areas of abnormal thickness on the sheet to be punched, and to output candidate punching regions. The defect recognition model can be any of a convolutional neural network, a U-Net network, a Mask R-CNN network, a visual Transformer network, or a combination thereof. Preferably, before inputting the model, the surface image undergoes brightness equalization, noise suppression, edge enhancement, and scale normalization to improve the stability and accuracy of defect recognition. This step removes areas with obvious surface damage, local thickness abnormalities, or a high risk of edge crack propagation from the surface of the sheet to be punched, thus identifying suitable areas for punching as candidate punching regions.

[0021] After obtaining the candidate punching regions, the effective ion irradiation region is determined. The effective ion irradiation region can be determined based on the ion beam spot size, scan trajectory records, reference markers set before irradiation, or differences in surface features after irradiation. Preferably, the effective ion irradiation region is registered with the candidate punching regions to generate multiple candidate punching positions and multiple candidate punching postures. Further, the target punching position and target punching posture are selected according to coverage, ensuring that the target observation area of ​​the sample covers the effective ion irradiation region. The coverage is determined according to the following formula: in, This represents the projected area of ​​the effective region for ion irradiation. This represents the area of ​​the target observation region of the sample. Indicates coverage rate.

[0022] Preferably, when determining the target punching position and the target punching posture, the coverage is controlled. Not lower than the preset coverage threshold Furthermore, the target punching location is positioned within the candidate punching area to reduce the risk of edge crack propagation, thickness anomalies falling into the target observation area, or the effective ion irradiation area deviating from the target observation area after punching. This indicates the coverage threshold. Through the above registration and screening process, the effective area of ​​ion irradiation can be made to fall into the target observation area of ​​the sample as much as possible, thus providing a positional basis for subsequent observation of the microstructure evolution of the same area before and after corrosion.

[0023] In a preferred embodiment of the present invention, to avoid relying solely on manual experience to determine the die geometry parameters, candidate die parameters, along with image features and thickness features corresponding to the target punching position and target punching posture, are input into a trained optimization model to determine the target die parameters. The optimization model outputs the forming safety probability, edge deformation prediction, warpage prediction, and target observation area offset prediction values ​​corresponding to the candidate die parameters. The optimization model is obtained through joint training using finite element stamping simulation samples and historical actual sample preparation samples. The finite element stamping simulation samples reflect the influence of changes in die clearance, edge radius, material thickness, and loading method on edge plastic deformation and overall warpage. Historical actual sample preparation samples reflect the forming quality, target observation area coverage, and subsequent loading stability of actual samples under different parameter combinations. The optimization model can be a convolutional neural network, a visual Transformer network, a multilayer perceptron network, or a combination thereof.

[0024] Preferably, the optimization model is represented in the following form: in, This represents the optimization model. This indicates the optimization of model parameters. This represents a surface image of the sheet to be punched. This indicates the defect distribution results. Indicates thickness distribution information. Indicates the effective area for ion irradiation. Indicates the candidate mold parameters. Indicates the candidate's stance on arbitration. This represents the forming safety probability. The forming safety probability is used to characterize the likelihood that, under the current candidate die parameters and candidate punching posture, the sample will meet the requirements for edge quality, flatness, target observation area coverage, and subsequent loading after punching.

[0025] Preferably, the candidate mold parameters satisfy the following definition: in, Indicates the diameter of the sample's outer shape. Indicates the length of the directional positioning notch. Indicates the width of the directional positioning notch. Indicates the radius of the edge-release fillet. This indicates the number of shallow tanks in the liquid exchange auxiliary structure. This indicates the width of the shallow groove in the liquid exchange auxiliary structure. This indicates the distance between the repositioning reference mark and the outer edge of the sample. This represents the die clearance between the punch and die. The target die parameters are determined by optimizing the forming safety probability while satisfying constraints on the coverage threshold, maximum plastic deformation threshold, and maximum warpage threshold. Preferably, the sample outer diameter... Control as an agreement This is to meet the loading requirements of the transmission electron microscope sample rod.

[0026] The stamping die is manufactured according to the determined target mold parameters. The stamping die includes a mating punch and a die, which together form a sample shape blanking structure, a directional positioning notch forming structure, a repositioning reference mark forming structure, an edge release structure, and a liquid exchange auxiliary structure. The sample shape blanking structure is used to form a maximum outer diameter of... Transmission electron microscope samples; directional positioning notch forming structure is used to form directional positioning notches in non-primary observation areas of the sample to define the sample loading orientation; repositioning reference mark forming structure is used to form repositioning reference marks in non-primary observation areas of the sample to repeat positioning of the same area before and after corrosion immersion; edge slow-release structure is used to reduce stress concentration at the punched edge; liquid exchange auxiliary structure is used to improve the liquid exchange capacity during sample immersion.

[0027] Preferably, the depth of the directional positioning notch is The repositioning reference mark can be any one of a cross shape, triangle, short arc, or lattice shape; the edge release structure can adopt a rounded corner transition form, with a corner radius of [missing information]. The liquid exchange auxiliary structure is a shallow groove structure or a localized decompression texture structure, and is located in a non-primary observation area of ​​the sample to avoid obstructing or interfering with the target observation area. More preferably, the maximum outer diameter of the punch matches the maximum inner diameter of the die to achieve the maximum outer diameter while ensuring the punching clearance. The sample.

[0028] In a preferred embodiment of the present invention, the above-mentioned stamping die is used to stamp the sheet to be stamped. Before stamping, the sheet to be stamped is placed at a predetermined position and angle on the stamping station according to the target stamping position and the target stamping posture, so that the effective area of ​​ion irradiation falls into the target observation area of ​​the sample. A punch and a die corresponding to the target die parameters are used to stamp at the target stamping position and according to the target stamping posture, and the sample shape, orientation positioning notch, repositioning reference mark and liquid exchange auxiliary structure are formed simultaneously in one stamping process. Preferably, the die gap between the punch and the die is 3% to 8% of the thickness of the sheet to be stamped. For materials with obvious tendency to become brittle after irradiation or poor plasticity, it is preferable to use at least one of low-speed stamping, staged loading and edge clamping to reduce the risk of sample edge tearing, overall warping or local stress concentration.

[0029] After punching, the resulting samples undergo a re-inspection of their forming quality. The re-inspection includes checking for edge burrs, crack propagation length, overall warping, integrity of the orientation positioning notch, clarity of the repositioning reference mark, and the offset of the target observation area relative to the effective ion irradiation area. Preferably, the re-inspection can be conducted using microscopic observation, image measurement, or automated visual inspection. Samples with obvious edge tears, excessive warping, damaged orientation positioning notches, or unclear repositioning reference marks are rejected. Samples with intact dimensions, meeting forming quality requirements, and whose target observation area covers the effective ion irradiation area are cleaned with alcohol, numbered, and sealed for subsequent precision thinning, etching immersion, and transmission electron microscopy observation.

[0030] In subsequent use, the sample obtained by the above method will be precisely thinned and then immersed in a corrosive medium. Preferably, the corrosive medium is... NaCl solution, soaking time is approximately Before and after immersion, the same area was repeatedly observed using the directional positioning notch and repositioning reference mark on the sample. Since this invention eliminates the need for welding to fix the sample to the dissimilar metal support during sample preparation, it avoids galvanic corrosion caused by electrode potential differences between the weld points, the sample, and the support, and also reduces the risk of sample detachment during transfer. Furthermore, the edge-release structure and liquid exchange auxiliary structure further enhance the integrity and stability of the sample during the corrosion immersion process.

[0031] As a specific embodiment, ion-irradiated 316L stainless steel can be used as the material to be processed. The sample is first cut into... The sheet material is then ground using graded sandpaper to approximately [size missing]. Thickness is obtained to produce a thin sheet to be punched. Subsequently, a microscopic vision system is used to acquire surface images of both sides of the sheet, and combined with thickness distribution information to identify scratch areas and areas of abnormal thickness, outputting candidate punching areas. Then, the effective ion irradiation area is determined based on the ion irradiation beam spot area, and the effective ion irradiation area is registered with the candidate punching areas to obtain multiple candidate punching positions and attitudes. Through coverage screening, the target punching position and attitude that cover the target observation area of ​​the sample with the effective ion irradiation area are determined. Afterwards, the candidate die parameters, along with the image features and thickness features corresponding to the target punching position and attitude, are input into an optimization model to determine the target die parameters. Among these, the sample outer diameter... Set as an approximation mold gap The thickness of the sheet to be punched is set to approximately 5%. The directional positioning notch is placed in a non-primary observation area of ​​the sample, the repositioning reference mark is placed at a preset distance from the outer edge of the sample, and the liquid exchange auxiliary structure is placed in the non-primary observation area. Then, using the corresponding stamping die, a single punching operation is performed at the target punching position according to the target punching posture to obtain a maximum outer diameter of [missing information]. The samples were re-inspected and confirmed to have no obvious edge tears or excessive warping. They were then cleaned with alcohol, numbered, sealed, and stored for subsequent precision thinning, NaCl solution immersion, and transmission electron microscopy observation. The samples prepared through this example allow for repeated positioning observation of the same area before and after corrosion using directional positioning notches and repositioning reference marks, without exhibiting the galvanic corrosion problems common in traditional welded samples.

[0032] Preferably, without departing from the technical concept of this invention, the specific network structure of the defect identification model and optimization model, the specific type of the visual acquisition device, the specific geometry of the directional positioning notch, the specific style of the repositioning reference mark, and the specific dimensional parameters of the liquid exchange auxiliary structure can all be adjusted according to the mechanical properties of the material to be tested, irradiation conditions, subsequent loading methods, and observation requirements. Any technical solution employing this invention—identifying candidate punching regions, determining the effective ion irradiation region, determining the target punching position and target punching posture, determining the target mold parameters using an optimization model, and forming the directional positioning notch, repositioning reference mark, and liquid exchange auxiliary structure using a dedicated stamping die—can achieve the same technical effects as this invention.

[0033] It will be understood by those skilled in the art that, unless otherwise defined, all terms used herein (including technical and scientific terms) have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. It should also be understood that terms such as those defined in general dictionaries should be understood to have the meaning consistent with their meaning in the context of the prior art, and should not be interpreted in an idealized or overly formal sense unless specifically defined.

[0034] For the sake of simplicity, the method embodiments are described as a series of actions. However, those skilled in the art should understand that the embodiments of the present invention are not limited to the described order of actions, because according to the embodiments of the present invention, some steps can be performed in other orders or simultaneously. Furthermore, those skilled in the art should also understand that the embodiments described in the specification are preferred embodiments, and the actions involved are not necessarily essential to the embodiments of the present invention.

[0035] As can be seen from the above description of the embodiments, those skilled in the art can clearly understand that this application can be implemented by means of software plus necessary general-purpose hardware platforms. Based on this understanding, the technical solution of this application, in essence, or the part that contributes to the prior art, can be embodied in the form of a software product. This computer software product can be stored in a storage medium, such as ROM / RAM, magnetic disk, optical disk, etc., and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute the methods described in various embodiments or some parts of the embodiments of this application.

[0036] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for sample preparation by ion irradiation transmission electron microscopy, characterized in that, include: Cut the metal or alloy material into sheets of a predetermined size and grind them to the desired consistency. Thick, resulting in a thin sheet to be punched; Collect surface images and / or thickness distribution information of the sheet to be punched, identify candidate punching areas, and determine the effective area for ion irradiation; Based on the candidate punching region and the effective ion irradiation region, the target punching position and target punching posture are determined so that the target observation area of ​​the punched sample covers the effective ion irradiation region. The candidate die parameters, along with the image features and thickness features corresponding to the target punching position and the target punching posture, are input into the trained optimization model to determine the target die parameters. Using a punch and die corresponding to the target die parameters, blanking is performed at the target blanking position according to the target blanking posture to form a die with a maximum outer diameter of [missing information]. The sample shape is determined, and orientation positioning notches, repositioning reference marks, and liquid exchange auxiliary structures are formed simultaneously. The forming quality of the punched samples is re-inspected. Qualified samples are cleaned, numbered, and sealed for subsequent precision thinning, etching immersion, and transmission electron microscopy observation.

2. The method according to claim 1, characterized in that, The acquisition of the surface image and / or thickness distribution information of the sheet to be punched includes: The thin sheet to be punched is imaged or its contour measured using at least one of an industrial camera with a microscope lens and coaxial light source, a metallurgical microscope, a white light interferometer, or a laser confocal device. The collected results are then input into the defect identification model to identify scratches, holes, inclusions, indentations, edge cracks, and areas of abnormal thickness, and the candidate punching areas are output. The defect identification model is any one of convolutional neural networks, U-Net networks, Mask R-CNN networks, visual Transformer networks, or combinations thereof.

3. The method according to claim 1, characterized in that, The determination of the effective ion irradiation area includes: The effective ion irradiation area is determined based on the ion beam spot size, scan trajectory record, reference markers set before irradiation, or differences in surface features after irradiation. Determining the target punching position and target punching attitude based on the candidate punching region and the effective ion irradiation region includes: The effective ion irradiation region is registered with the candidate punching region to generate multiple candidate punching positions and candidate punching postures. The target punching position and target punching posture that make the sample target observation area cover the effective ion irradiation region are selected according to the coverage. The coverage rate is determined according to the following formula: in, This represents the projected area of ​​the effective region for ion irradiation. This represents the area of ​​the target observation region of the sample. Indicates coverage rate.

4. The method according to claim 3, characterized in that, When determining the target punching position and the target punching posture, control the coverage rate. Not lower than the preset coverage threshold Furthermore, the target punching position is located within the candidate punching area to reduce the risk of edge crack propagation, thickness anomaly areas falling into the target observation area, or the irradiated area deviating from the target observation area after punching. This represents the coverage threshold.

5. The method according to claim 1, characterized in that, The optimization model is used to output the forming safety probability, edge deformation prediction value, warpage prediction value, and target observation area offset prediction value corresponding to the candidate mold parameters. The optimized model was obtained through joint training of finite element stamping simulation samples and historical actual sample preparation samples. The optimization model is represented in the following form: in, This represents the optimization model. This indicates the optimization of model parameters. This represents a surface image of the sheet to be punched. This indicates the defect distribution results. Indicates thickness distribution information. Indicates the effective area for ion irradiation. Indicates the candidate mold parameters. Indicates the candidate's stance on arbitration. This represents the probability of safe forming.

6. The method according to claim 5, characterized in that, The candidate mold parameters satisfy the following definition: in, Indicates the diameter of the sample's outer shape. Indicates the length of the directional positioning notch. Indicates the width of the directional positioning notch. Indicates the radius of the edge-release fillet. This indicates the number of shallow tanks in the liquid exchange auxiliary structure. This indicates the width of the shallow groove in the liquid exchange auxiliary structure. This indicates the distance between the repositioning reference mark and the outer edge of the sample. The target die parameters are determined by optimizing the forming safety probability under the conditions of satisfying the coverage threshold, the maximum plastic deformation threshold, and the maximum warpage threshold constraints.

7. The method according to claim 1, characterized in that, When punching the sheet to be punched using a punch and die corresponding to the target die parameters, the die clearance between the punch and die is 3% to 8% of the thickness of the sheet to be punched; and at least one of the following methods is used: low-speed punching, graded loading, and edge clamping to reduce the risk of sample edge tearing, overall warping, or local stress concentration.

8. The method according to claim 1, characterized in that, The directional positioning notch, the repositioning reference mark, and the liquid exchange auxiliary structure are all located in the non-primary observation area of ​​the sample; the repositioning reference mark is any one of a cross shape, a triangle, a short arc shape, or a dot matrix shape; the liquid exchange auxiliary structure is a shallow groove structure or a local decompression texture structure; and before and after the sample is corroded and soaked, the same area is repeatedly positioned and observed using the directional positioning notch and the repositioning reference mark.

9. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the program is executed by the processor, it implements the method described in any one of claims 1-8.

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