Method for producing methylsulfonic acid with low sulfate residue
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- WANHUA CHEM GRP CO LTD
- Filing Date
- 2023-12-12
- Publication Date
- 2026-06-22
AI Technical Summary
The existing production methods for methylsulfonic acid result in high sulfate and heavy impurity contents, exceeding 50 ppm, which negatively impact product quality and require extensive purification, particularly in the electronics and electrical industries, leading to issues like plating slag formation during electroplating.
A method involving controlled dimethyl polysulfide content in raw materials, using a catalyst and oxidizing agent in a kettle-type reactor, followed by post-treatment to produce methylsulfonic acid with reduced sulfate and heavy impurities, achieving a content of less than 1 ppm.
The method produces high-quality methylsulfonic acid suitable for high-precision industries, simplifies purification processes, reduces energy consumption, and improves product stability, with minimal color change over time.
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